[go: up one dir, main page]

TWI864863B - Double-side vacuum film lamination apparatus and double-side vacuum film lamination method - Google Patents

Double-side vacuum film lamination apparatus and double-side vacuum film lamination method Download PDF

Info

Publication number
TWI864863B
TWI864863B TW112125005A TW112125005A TWI864863B TW I864863 B TWI864863 B TW I864863B TW 112125005 A TW112125005 A TW 112125005A TW 112125005 A TW112125005 A TW 112125005A TW I864863 B TWI864863 B TW I864863B
Authority
TW
Taiwan
Prior art keywords
film
substrate
lamination
cavity
double
Prior art date
Application number
TW112125005A
Other languages
Chinese (zh)
Other versions
TW202502566A (en
Inventor
劉育成
陳明宗
Original Assignee
志聖工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 志聖工業股份有限公司 filed Critical 志聖工業股份有限公司
Priority to TW112125005A priority Critical patent/TWI864863B/en
Application granted granted Critical
Publication of TWI864863B publication Critical patent/TWI864863B/en
Publication of TW202502566A publication Critical patent/TW202502566A/en

Links

Images

Landscapes

  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
  • Laminated Bodies (AREA)

Abstract

A double-side vacuum film lamination apparatus includes an upper chamber, a lower chamber, an upper laminator, a lower laminator and a substrate carrier mechanism. The lower chamber is disposed corresponding to the upper chamber. The upper laminator is movably disposed on the upper chamber, and the lower laminator is movably disposed on the lower chamber. The substrate carrier mechanism is disposed between the upper laminator and the lower laminator. The upper chamber and the lower chamber are movable with respect to the substrate carrier mechanism so as to be in close contact with the substrate carrier mechanism.

Description

雙面真空壓膜裝置及雙面真空壓膜方法 Double-sided vacuum lamination device and double-sided vacuum lamination method

本發明係關於壓膜技術,特別是一種雙面真空壓膜裝置及雙面真空壓膜方法。 The present invention relates to lamination technology, in particular to a double-sided vacuum lamination device and a double-sided vacuum lamination method.

按,在半導體或電子零組件的產業中,會需要在基板上貼附膜料(含麥拉膜(Mylar))以當作後續製程的建構層或是接著劑。一般而言,會先拾取膜料後透過傳動機構搬運至對應到基板的貼膜工作區域,接著推壓膜料以完成將膜料壓合至基板表面的作業。 In the semiconductor or electronic component industry, it is necessary to attach film materials (including Mylar) to the substrate as a building layer or adhesive for subsequent processes. Generally speaking, the film material is first picked up and then transported to the film attachment work area corresponding to the substrate through a transmission mechanism, and then the film material is pushed to complete the operation of pressing the film material to the substrate surface.

在基板的相對兩表面貼膜的雙面壓膜製程被廣泛應用於相關的技術領域中。在現有的雙面壓膜製程中,壓膜機先將膜料壓合至基板的其中一表面,隨後此基板移出壓膜機並在另一個工作站以人工操作或機械自動化操作等方式被翻面,接著已翻面的此基板被再次輸送至壓膜機並於另一表面壓合膜料。然而,由於膜料特性與製程良率提升的要求,現有的壓膜機以及雙面壓膜製程已經難以滿足業界需求。 The double-sided lamination process of laminating the opposite surfaces of the substrate is widely used in related technical fields. In the existing double-sided lamination process, the laminator first presses the film material onto one surface of the substrate, then the substrate is removed from the laminator and turned over at another workstation by manual operation or mechanical automation, and then the turned-over substrate is transported to the laminator again and the film material is pressed onto the other surface. However, due to the requirements for improving the film material properties and process yield, the existing laminators and double-sided lamination processes have been unable to meet the needs of the industry.

鑒於上述問題,本發明提供一種雙面真空壓膜裝置及雙面真空壓膜方法,有助於改善現有雙面壓膜製程的生產良率不佳的問題。 In view of the above problems, the present invention provides a double-sided vacuum lamination device and a double-sided vacuum lamination method, which helps to improve the problem of poor production yield of the existing double-sided lamination process.

本發明所揭露之雙面真空壓膜裝置包含一上腔體、一下腔體、一上壓膜件、一下壓膜件以及一基板承載機構。下腔體對應上腔體設置。上壓膜件可移動地設置於上腔體。下壓膜件可移動地設置於下腔體。基板承載機構設置於上壓膜件與下壓膜件之間,且上腔體和下腔體可相對基板承載機構移動,以與基板承載機構密合。 The double-sided vacuum lamination device disclosed in the present invention comprises an upper cavity, a lower cavity, an upper lamination component, a lower lamination component and a substrate supporting mechanism. The lower cavity is arranged corresponding to the upper cavity. The upper lamination component can be movably arranged in the upper cavity. The lower lamination component can be movably arranged in the lower cavity. The substrate supporting mechanism is arranged between the upper lamination component and the lower lamination component, and the upper cavity and the lower cavity can move relative to the substrate supporting mechanism to be tightly fitted with the substrate supporting mechanism.

本發明所揭露之雙面真空壓膜方法包含:以一上壓膜件拾取一上膜料和以一下壓膜件拾取一下膜料;將承載有一基板的一基板承載機構提供至上壓膜件和下壓膜件之間;形成容置上壓膜件、下壓膜件及基板承載機構的一真空環境;以及將上膜料和下膜料分別壓合於基板的相對兩表面。 The double-sided vacuum lamination method disclosed in the present invention includes: picking up an upper film material with an upper lamination component and picking up a lower film material with a lower lamination component; providing a substrate supporting mechanism carrying a substrate between the upper lamination component and the lower lamination component; forming a vacuum environment for accommodating the upper lamination component, the lower lamination component and the substrate supporting mechanism; and respectively pressing the upper film material and the lower film material onto two opposite surfaces of the substrate.

根據本發明揭露之雙面真空壓膜裝置及雙面真空壓膜方法,透過基板承載機構的移動將基板運送至兩個壓膜件之間。上腔體和下腔體可相對基板承載機構移動以與基板承載機構密合,並且隨後進行壓膜作業。在進行壓膜作業的過程中,由於膜料於腔體內部會先與要壓合的基板接觸,而會在腔體真空度已達適合條件後,再將膜材放置於基板上進行壓膜,可減少膜材與基板沾黏影響提升良率。 According to the double-sided vacuum lamination device and double-sided vacuum lamination method disclosed in the present invention, the substrate is transported between two lamination parts by moving the substrate support mechanism. The upper cavity and the lower cavity can move relative to the substrate support mechanism to fit closely with the substrate support mechanism, and then perform lamination. During the lamination process, since the film material will first contact the substrate to be pressed inside the cavity, and the film material will be placed on the substrate for lamination after the vacuum degree of the cavity has reached a suitable condition, the adhesion between the film material and the substrate can be reduced to improve the yield.

以上關於本發明內容之說明及以下實施方式之說明 係用以示範與解釋本發明之原理,並提供本發明之專利申請範圍更進一步之解釋。 The above description of the content of the present invention and the following description of the implementation method are used to demonstrate and explain the principle of the present invention and provide a further explanation of the scope of the patent application of the present invention.

1:雙面真空壓膜裝置 1: Double-sided vacuum lamination device

10:切膜模組 10: Film cutting module

110:膜承載座 110: Membrane carrier

111:上表面 111: Upper surface

112:下表面 112: Lower surface

120:架膜輪 120: Film mounting wheel

130:膜輸送輪 130: Membrane conveyor wheel

140:廢膜回收輪 140: Waste film recovery wheel

150:切膜刀 150: Film cutting knife

20:壓膜模組 20: Laminating module

200:空腔 200: Cavity

210:上腔體 210: Upper cavity

220:下腔體 220: Lower cavity

230:上壓膜件 230: Upper pressure film

231:加壓板 231: Pressure plate

232:取膜部 232: Take the membrane part

240:下壓膜件 240: Lower pressure film

241:加壓板 241: Pressure plate

242:取膜部 242: Take the membrane part

250:基板承載機構 250: Substrate supporting mechanism

251:框體 251:Frame

2511:內側面 2511:Inner side

252:驅動件 252:Driver

253:基板支撐件 253: Baseboard support

30:拾取模組 30: Pickup module

310:機械工作臂 310: Mechanical working arm

320:吸嘴 320: Suction nozzle

100:基板 100: Substrate

101:上表面 101: Upper surface

102:下表面 102: Lower surface

F:膜料 F: Film material

F1:上膜料 F1: Film material

F2:下膜料 F2: Film material

H:水平方向 H: Horizontal direction

R1:供膜區 R1: Film supply area

R2:壓膜區 R2: Film pressing area

R3:投片區 R3: Investment area

S1~S8:步驟 S1~S8: Steps

圖1為根據本發明第一實施例之雙面真空壓膜裝置的示意圖。 Figure 1 is a schematic diagram of a double-sided vacuum lamination device according to the first embodiment of the present invention.

圖2為圖1之雙面真空壓膜裝置的基板承載機構的示意圖。 Figure 2 is a schematic diagram of the substrate supporting mechanism of the double-sided vacuum lamination device in Figure 1.

圖3為根據本發明一實施例之雙面真空壓膜方法的流程圖。 Figure 3 is a flow chart of a double-sided vacuum lamination method according to an embodiment of the present invention.

圖4至圖9為使用圖1之雙面真空壓膜裝置執行圖3之雙面真空壓膜方法的示意圖。 Figures 4 to 9 are schematic diagrams of using the double-sided vacuum lamination device of Figure 1 to perform the double-sided vacuum lamination method of Figure 3.

於以下實施方式中詳細敘述本發明之詳細特徵及優點,其內容足以使任何熟習相關技藝者瞭解本發明之技術內容並據以實施,且根據本說明書所揭露的內容、申請專利範圍及圖式,任何熟習相關技藝者可輕易理解本發明。以下實施例係進一步詳細說明本發明之觀點,但非以任何觀點限制本發明之範疇。 The detailed features and advantages of the present invention are described in detail in the following implementation methods, and the content is sufficient for anyone familiar with the relevant technology to understand the technical content of the present invention and implement it accordingly. Moreover, according to the content disclosed in this specification, the scope of the patent application and the drawings, anyone familiar with the relevant technology can easily understand the present invention. The following embodiments are to further illustrate the viewpoints of the present invention in detail, but they do not limit the scope of the present invention by any viewpoint.

請參照圖1和圖2,其中圖1為根據本發明第一實施例之雙面真空壓膜裝置的示意圖,以及圖2為圖1之雙面真空壓膜裝置的基板承載機構的示意圖。在本實施例中,雙面真空壓膜裝置1可包含切膜模組10、壓膜模組20以及拾取模組30。本實施例將切膜模組10、拾取模組30與壓膜模組20整合成單一裝置(雙面真空壓膜裝置1),但在其他實施例中切膜模組及/或拾取模組可相對壓膜模組獨立地配置於不同裝置中。 Please refer to Figures 1 and 2, wherein Figure 1 is a schematic diagram of a double-sided vacuum lamination device according to the first embodiment of the present invention, and Figure 2 is a schematic diagram of a substrate supporting mechanism of the double-sided vacuum lamination device of Figure 1. In this embodiment, the double-sided vacuum lamination device 1 may include a film cutting module 10, a lamination module 20, and a pickup module 30. In this embodiment, the film cutting module 10, the pickup module 30, and the lamination module 20 are integrated into a single device (double-sided vacuum lamination device 1), but in other embodiments, the film cutting module and/or the pickup module may be independently configured in different devices relative to the lamination module.

切膜模組10可包含膜承載座110、架膜輪120、膜輸送輪130、廢膜回收輪140以及切膜刀150。架膜輪120設置於膜承載座110之一側,其用以承載纏繞成圓筒狀的膜料F。廢膜回收輪140設置於膜承載座110之另一側。膜輸送輪130設置於膜承載座110的至少其中一側,其用以改變膜料的輸送方向,使得膜料F能沿著平行於膜承載座110之表面的方向移動。切膜刀150對應膜承載座110設置,並且切膜刀150可連接於驅動源(例如馬達,未繪示)。膜料F可保持於膜承載座110的相對兩側,並且切膜刀150可相對膜承載座110移動以裁切膜料F。本實施例以複數個輥輪輸送膜料F,但本發明並不以此為限,在其他實施例中可以採用人工操作方式將膜料保持於膜承載座。 The film cutting module 10 may include a film support seat 110, a film mounting wheel 120, a film conveying wheel 130, a waste film recovery wheel 140 and a film cutting knife 150. The film mounting wheel 120 is disposed on one side of the film support seat 110, and is used to support the film material F wound into a cylindrical shape. The waste film recovery wheel 140 is disposed on the other side of the film support seat 110. The film conveying wheel 130 is disposed on at least one side of the film support seat 110, and is used to change the conveying direction of the film material so that the film material F can move in a direction parallel to the surface of the film support seat 110. The film cutting knife 150 is disposed corresponding to the film support seat 110, and the film cutting knife 150 can be connected to a driving source (such as a motor, not shown). The film material F can be held on opposite sides of the film support 110, and the film cutting knife 150 can move relative to the film support 110 to cut the film material F. In this embodiment, a plurality of rollers are used to transport the film material F, but the present invention is not limited thereto. In other embodiments, the film material can be held on the film support by manual operation.

壓膜模組20可包含上腔體210、下腔體220、上壓膜件230、下壓膜件240以及基板承載機構250。下腔體220對應上腔體210設置,且上腔體210與下腔體220各自可藉由驅動源(例如馬達氣缸,未繪示)相對彼此移動。 The laminating module 20 may include an upper cavity 210, a lower cavity 220, an upper laminating component 230, a lower laminating component 240, and a substrate supporting mechanism 250. The lower cavity 220 is disposed corresponding to the upper cavity 210, and the upper cavity 210 and the lower cavity 220 can each move relative to each other by a driving source (such as a motor cylinder, not shown).

上壓膜件230可移動地設置於上腔體210。詳細來說,上壓膜件230可包含可移動地設置於上腔體210的加壓板231以及設置於加壓板231的取膜部232。加壓板231位於上腔體210朝向下腔體220的一側,並且加壓板231可藉由驅動源(例如馬達氣缸,未繪示)相對上腔體210移動靠近下腔體220。取膜部232例如但不限於是負壓吸盤、靜電吸盤(E-chuck)和矽膠墊其中一者。可透過取膜部232拾取保持於膜承載座110之其中一側的膜料, 這將於後續再進一步說明。 The upper pressure film member 230 is movably disposed on the upper chamber 210. Specifically, the upper pressure film member 230 may include a pressure plate 231 movably disposed on the upper chamber 210 and a film removal portion 232 disposed on the pressure plate 231. The pressure plate 231 is located on a side of the upper chamber 210 facing the lower chamber 220, and the pressure plate 231 can be moved relative to the upper chamber 210 to approach the lower chamber 220 by a driving source (such as a motor cylinder, not shown). The film removal portion 232 is, for example but not limited to, one of a negative pressure suction cup, an electrostatic suction cup (E-chuck) and a silicone pad. The film material held on one side of the film support seat 110 can be picked up by the film taking portion 232. This will be further explained later.

下壓膜件240可移動地設置於下腔體220。詳細來說,下壓膜件240可包含可移動地設置於下腔體220的加壓板241以及設置於加壓板241的取膜部242。加壓板241位於下腔體220朝向上腔體210的一側,並且加壓板241可藉由驅動源(例如馬達氣缸,未繪示)相對下腔體220移動靠近上腔體210。取膜部242可包含負壓吸盤、靜電吸盤和矽膠墊至少其中一者。可透過取膜部242拾取保持於膜承載座110之另一側的膜料,這將於後續再進一步說明。 The lower pressure film member 240 is movably disposed in the lower cavity 220. Specifically, the lower pressure film member 240 may include a pressure plate 241 movably disposed in the lower cavity 220 and a film removal portion 242 disposed on the pressure plate 241. The pressure plate 241 is located on a side of the lower cavity 220 facing the upper cavity 210, and the pressure plate 241 can be moved relative to the lower cavity 220 to approach the upper cavity 210 by a driving source (such as a motor cylinder, not shown). The film removal portion 242 may include at least one of a negative pressure suction cup, an electrostatic suction cup, and a silicone pad. The film material held on the other side of the film support seat 110 can be picked up by the film taking portion 242, which will be further explained later.

基板承載機構250可移動地設置於上壓膜件230與下壓膜件240之間,且上腔體210和下腔體220可相對基板承載機構250移動,以與基板承載機構250密合。如圖2所示,基板承載機構250可包含框體251、驅動件252以及基板支撐件253。驅動件252例如但不限於是汽缸或步進馬達,其設置於框體251並與基板支撐件253連接,使得基板支撐件253相對於框體251為可移動的,也就是說驅動件252可帶動基板支撐件253相對框體251移動。透過驅動件252的移動,基板支撐件253可位於框體251內或是自框體251的內側面2511突出而顯露於外。框體251可為環狀,例如但不限於方形環狀或圓環狀。 The substrate supporting mechanism 250 is movably disposed between the upper pressure film 230 and the lower pressure film 240, and the upper cavity 210 and the lower cavity 220 can move relative to the substrate supporting mechanism 250 to fit closely with the substrate supporting mechanism 250. As shown in FIG2 , the substrate supporting mechanism 250 can include a frame 251, a driving member 252, and a substrate supporting member 253. The driving member 252 is, for example but not limited to, a cylinder or a stepping motor, which is disposed in the frame 251 and connected to the substrate supporting member 253, so that the substrate supporting member 253 is movable relative to the frame 251, that is, the driving member 252 can drive the substrate supporting member 253 to move relative to the frame 251. By moving the driving member 252, the substrate support member 253 can be located inside the frame 251 or protrude from the inner side surface 2511 of the frame 251 and be exposed to the outside. The frame 251 can be annular, such as but not limited to a square ring or a circular ring.

在本實施例中,上腔體210和下腔體220可相對基板承載機構250移動以與基板承載機構250密合。詳細來說,基板承載機構250可置於上腔體210與下腔體220之間。此時,上 腔體210可朝向下腔體220移動以與框體251的一側密合,且下腔體220可朝向上腔體210移動以與框體251的另一側密合。如此一來,可透過形成在上腔體210或下腔體220的氣體通道(未繪示)抽氣,而在上腔體210與下腔體220之間提供負壓的真空氣氛,進而上腔體210與下腔體220均與基板承載機構250的框體251氣密接合,這將於後續進一步說明。上腔體210或下腔體220和基板承載機構250之間的密合例如但不限於是使上腔體210或下腔體220持續抵壓基板承載機構250的框體251,或是使上腔體210或下腔體220與框體251卡合固定。 In this embodiment, the upper cavity 210 and the lower cavity 220 can move relative to the substrate supporting mechanism 250 to be closely fitted with the substrate supporting mechanism 250. Specifically, the substrate supporting mechanism 250 can be placed between the upper cavity 210 and the lower cavity 220. At this time, the upper cavity 210 can move toward the lower cavity 220 to be closely fitted with one side of the frame 251, and the lower cavity 220 can move toward the upper cavity 210 to be closely fitted with the other side of the frame 251. In this way, the gas can be exhausted through the gas channel (not shown) formed in the upper cavity 210 or the lower cavity 220, and a negative pressure vacuum atmosphere can be provided between the upper cavity 210 and the lower cavity 220, so that the upper cavity 210 and the lower cavity 220 are both airtightly joined with the frame 251 of the substrate supporting mechanism 250, which will be further described later. The close fit between the upper cavity 210 or the lower cavity 220 and the substrate supporting mechanism 250 is, for example but not limited to, making the upper cavity 210 or the lower cavity 220 continuously press against the frame 251 of the substrate supporting mechanism 250, or making the upper cavity 210 or the lower cavity 220 and the frame 251 snap-fit and fixed.

拾取模組30可包含機械工作臂310以及位於機械工作臂310的吸嘴320。機械工作臂310可移動至存放有基板的物料區(未另繪示)。拾取模組30透過吸嘴320拾取基板,隨後透過機械工作臂310將所拾取之基板輸送至雙面真空壓膜裝置1中。基板承載機構250可承接由拾取模組30拾取之基板,這將於後續進一步說明。拾取模組30的具體態樣並非用以限制本發明。在其他實施例中,拾取模組可包含夾具、托盤或線性滑軌。 The pick-up module 30 may include a mechanical working arm 310 and a suction nozzle 320 located on the mechanical working arm 310. The mechanical working arm 310 may be moved to a material area (not shown) where substrates are stored. The pick-up module 30 picks up the substrate through the suction nozzle 320, and then transports the picked-up substrate to the double-sided vacuum lamination device 1 through the mechanical working arm 310. The substrate carrying mechanism 250 may receive the substrate picked up by the pick-up module 30, which will be further described later. The specific form of the pick-up module 30 is not intended to limit the present invention. In other embodiments, the pick-up module may include a fixture, a tray, or a linear slide rail.

本發明一實施例揭露一種雙面真空壓膜方法,並且可以使用圖1的雙面真空壓膜裝置執行此雙面真空壓膜方法。請參照圖3至圖9,其中圖3為根據本發明一實施例之雙面真空壓膜方法的流程圖,以及圖4至圖9為使用圖1之壓膜系統執行圖3之雙面真空壓膜方法的示意圖。 An embodiment of the present invention discloses a double-sided vacuum lamination method, and the double-sided vacuum lamination method can be performed using the double-sided vacuum lamination device of FIG. 1. Please refer to FIG. 3 to FIG. 9, wherein FIG. 3 is a flow chart of the double-sided vacuum lamination method according to an embodiment of the present invention, and FIG. 4 to FIG. 9 are schematic diagrams of using the lamination system of FIG. 1 to perform the double-sided vacuum lamination method of FIG. 3.

本實施例揭露的雙面真空壓膜方法包含依序執行的 步驟S1至S8,其將膜料壓合至基板(例如矽晶圓)的上下兩表面上。在其他實施例中,膜料和基板可分別是樹脂膜和多層電路板。 The double-sided vacuum lamination method disclosed in this embodiment includes steps S1 to S8 performed in sequence, which press the film material onto the upper and lower surfaces of a substrate (such as a silicon wafer). In other embodiments, the film material and the substrate may be a resin film and a multi-layer circuit board, respectively.

於步驟S1,係提供於相對兩側分別保持有膜料的膜承載座110。具體來說,以切膜模組10的膜輸送輪130將帶狀的膜料F輸送至膜承載座110的相對兩側,並且將膜料F保持在膜承載座110。更詳細來說,一膜輸送輪130將一膜料F輸送至膜承載座110的上方,且另一膜輸送輪130將另一膜料F輸送至膜承載座110的下方。輸送至膜承載座110上方的膜料F例如以負壓吸附方式保持在膜承載座110的上表面111,且輸送至膜承載座110下方的膜料F例如以負壓吸附方式保持在膜承載座110的下表面112。切膜刀150將此二膜料F分別裁切成形狀匹配基板的上膜料F1及下膜料F2。 In step S1, a film support 110 is provided with film materials held on opposite sides. Specifically, the film conveying wheels 130 of the film cutting module 10 convey the strip-shaped film material F to the opposite sides of the film support 110, and the film material F is held on the film support 110. In more detail, one film conveying wheel 130 conveys one film material F to the top of the film support 110, and another film conveying wheel 130 conveys another film material F to the bottom of the film support 110. The film material F conveyed to the top of the film support 110 is held on the upper surface 111 of the film support 110, for example, by negative pressure adsorption, and the film material F conveyed to the bottom of the film support 110 is held on the lower surface 112 of the film support 110, for example, by negative pressure adsorption. The film cutting knife 150 cuts the two film materials F into upper film material F1 and lower film material F2 that match the substrate.

以下,為了方便說明如何以雙面真空壓膜裝置1執行圖3的雙面真空壓膜方法,雙面真空壓膜裝置1可被定義出三個工作區域,其分別為供膜區R1、壓膜區R2以及投片區R3,如圖4所示。切膜模組10的切膜刀150經常性地位於供膜區R1,壓膜模組20的上腔體210、下腔體220、上壓膜件230和下壓膜件240可經常性地位於壓膜區R2,且拾取模組30可經常性地位於投片區R3。 In order to conveniently explain how to perform the double-sided vacuum lamination method of FIG. 3 with the double-sided vacuum lamination device 1, the double-sided vacuum lamination device 1 can be defined into three working areas, namely the film supply area R1, the lamination area R2 and the film injection area R3, as shown in FIG. 4. The film cutting knife 150 of the film cutting module 10 is often located in the film supply area R1, the upper cavity 210, the lower cavity 220, the upper film pressing member 230 and the lower film pressing member 240 of the lamination module 20 can be often located in the lamination area R2, and the pickup module 30 can be often located in the film injection area R3.

於步驟S2,係將膜承載座110提供至上壓膜件230和下壓膜件240之間。如圖4和圖5所示,保持有上膜料F1及下膜料F2的膜承載座110自供膜區R1被移至壓膜區R2,並且 上膜料F1和下膜料F2被置於壓膜模組20的上壓膜件230和下壓膜件240之間。移動膜承載座110的方式例如但不限於是人工搬運或是機械自動化搬運。此外,在本實施例中,架膜輪120、膜輸送輪130及廢膜回收輪140相對於膜承載座110為固定設置,因此將膜承載座110移至壓膜區R2的同時,架膜輪120、膜輸送輪130及廢膜回收輪140也會被帶至壓膜區R2,但本發明並不以此為限。在其他實施例中,膜承載座為可獨立移動之元件,因此移動膜承載座時候不會帶動架膜輪、膜輸送輪及廢膜回收輪一併移動。 In step S2, the film support 110 is provided between the upper film pressing member 230 and the lower film pressing member 240. As shown in Figures 4 and 5, the film support 110 holding the upper film material F1 and the lower film material F2 is moved from the film supply area R1 to the film pressing area R2, and the upper film material F1 and the lower film material F2 are placed between the upper film pressing member 230 and the lower film pressing member 240 of the film pressing module 20. The method of moving the film support 110 is, for example but not limited to, manual transportation or mechanical automatic transportation. In addition, in this embodiment, the film mounting wheel 120, the film conveying wheel 130 and the waste film recovery wheel 140 are fixed relative to the film support seat 110, so when the film support seat 110 is moved to the film pressing area R2, the film mounting wheel 120, the film conveying wheel 130 and the waste film recovery wheel 140 will also be brought to the film pressing area R2, but the present invention is not limited to this. In other embodiments, the film support seat is an independently movable element, so when the film support seat is moved, the film mounting wheel, the film conveying wheel and the waste film recovery wheel will not be driven to move together.

於步驟S3,係以上壓膜件230拾取上膜料F1和以下壓膜件240拾取下膜料F2。如圖5所示,上壓膜件230下降靠近膜承載座110,並且上壓膜件230的取膜部232拾取上膜料F1。下壓膜件240上升靠近膜承載座110,並且下壓膜件240的取膜部242拾取下膜料F2。當取膜部232、242包含負壓吸盤或靜電吸盤時,所述拾取可為取膜部232、242分別吸取上膜料F1和下膜料F2。當取膜部232、242包含矽膠墊時,所述拾取可為取膜部232、242分別黏取上膜料F1和下膜料F2。 In step S3, the upper film material F1 is picked up by the upper film pressing member 230 and the lower film material F2 is picked up by the lower film pressing member 240. As shown in FIG5 , the upper film pressing member 230 descends close to the film support seat 110, and the film taking part 232 of the upper film pressing member 230 picks up the upper film material F1. The lower film pressing member 240 ascends close to the film support seat 110, and the film taking part 242 of the lower film pressing member 240 picks up the lower film material F2. When the film taking parts 232 and 242 include negative pressure suction cups or electrostatic suction cups, the picking up may be that the film taking parts 232 and 242 suck up the upper film material F1 and the lower film material F2, respectively. When the film taking parts 232 and 242 include silicone pads, the picking up can be that the film taking parts 232 and 242 respectively stick the upper film material F1 and the lower film material F2.

於步驟S4,係將膜承載座110自上壓膜件230和下壓膜件240之間移除。如圖5和圖6所示,在上壓膜件230的取膜部232拾取上膜料F1且下壓膜件240的取膜部242拾取下膜料F2之後,上壓膜件230和下壓膜件240回歸至原位,且膜承載座110自壓膜區R2被移回至供膜區R1。可選擇性地藉由執行 步驟S1再次給膜承載座110提供膜料。 In step S4, the film support 110 is removed from between the upper film pressing member 230 and the lower film pressing member 240. As shown in Figures 5 and 6, after the film taking portion 232 of the upper film pressing member 230 picks up the upper film material F1 and the film taking portion 242 of the lower film pressing member 240 picks up the lower film material F2, the upper film pressing member 230 and the lower film pressing member 240 return to their original positions, and the film support 110 is moved back from the film pressing area R2 to the film supply area R1. Optionally, the film support 110 can be provided with film material again by executing step S1.

於步驟S5,係將承載有基板的基板承載機構250提供至上壓膜件230和下壓膜件240之間。如圖5和圖6所示,在投片區R3中,拾取模組30已經預先從物料區(未另繪示)拾取基板100。拾取模組30能將基板100轉移至基板承載機構250的基板支撐件253。進一步來說,基板支撐件253可維持突出框體251的內側面2511,以使基板支撐件253可以承接基板100。基板100可支撐於基板支撐件253上。承載有基板100的基板承載機構250自投片區R3被移至壓膜區R2,並且基板100被置於壓膜模組20的上壓膜件230和下壓膜件240之間。移動基板承載機構250的方式例如但不限於是人工搬運或是機械自動化搬運。 In step S5, the substrate supporting mechanism 250 carrying the substrate is provided between the upper pressure film member 230 and the lower pressure film member 240. As shown in FIG5 and FIG6, in the film-casting area R3, the pick-up module 30 has already picked up the substrate 100 from the material area (not shown separately). The pick-up module 30 can transfer the substrate 100 to the substrate support member 253 of the substrate supporting mechanism 250. In other words, the substrate support member 253 can maintain the inner side surface 2511 of the protruding frame 251 so that the substrate support member 253 can receive the substrate 100. The substrate 100 can be supported on the substrate support member 253. The substrate supporting mechanism 250 carrying the substrate 100 is moved from the film casting area R3 to the laminating area R2, and the substrate 100 is placed between the upper laminating component 230 and the lower laminating component 240 of the laminating module 20. The method of moving the substrate supporting mechanism 250 is, for example but not limited to, manual transportation or mechanical automated transportation.

於步驟S6,係形成容置上壓膜件230、下壓膜件240及基板承載機構250的真空環境。如圖6和圖7所示,上腔體210下降以與基板承載機構250的框體251之一側密合,且下腔體220上升靠近以與框體251的另一側密合。接著,透過形成在上腔體210或下腔體220的氣體通道(未繪示)抽氣,而在上腔體210與下腔體220之間的空腔200中提供負壓的真空氣氛。在圖7中,上壓膜件230的加壓板231和取膜部232位於空腔200內,下壓膜件240的加壓板241和取膜部242位於空腔200內,基板承載機構250的驅動件252和基板支撐件253位於空腔200內,以及上膜料F1、下膜料F2和基板100位於空腔200內。 In step S6, a vacuum environment is formed to accommodate the upper pressure film 230, the lower pressure film 240 and the substrate supporting mechanism 250. As shown in Figures 6 and 7, the upper cavity 210 descends to fit closely with one side of the frame 251 of the substrate supporting mechanism 250, and the lower cavity 220 rises and approaches to fit closely with the other side of the frame 251. Then, the gas is exhausted through the gas channel (not shown) formed in the upper cavity 210 or the lower cavity 220, and a negative pressure vacuum atmosphere is provided in the cavity 200 between the upper cavity 210 and the lower cavity 220. In FIG. 7 , the pressure plate 231 and the film removal part 232 of the upper film pressing member 230 are located in the cavity 200, the pressure plate 241 and the film removal part 242 of the lower film pressing member 240 are located in the cavity 200, the driving member 252 and the substrate support member 253 of the substrate supporting mechanism 250 are located in the cavity 200, and the upper film material F1, the lower film material F2 and the substrate 100 are located in the cavity 200.

於步驟S7,係將上膜料F1和下膜料F2分別壓合於 基板100的相對兩表面。如圖7和圖8所示,驅動下壓膜件240移動靠近基板100的下表面102。此外,基板承載機構250釋放基板100,以使下壓膜件240可承接基板100。進一步來說,基板承載機構250的驅動件252可將基板支撐件253移至框體251內,例如沿著圖8中的水平方向H移至框體251內。在空腔200抽真空後,被移至框體251內的基板支撐件253將不再支撐基板100,從而基板100可被轉移至下壓膜件240而改由下壓膜件240的加壓板241來支撐基板100,並且基板100與下壓膜件240所拾取之下膜料F2接觸。下壓膜件240上移靠近基板100以及基板支撐件253移至框體251內的這兩個作動可以依序進行或同時進行。此外,驅動上壓膜件230移動靠近基板100的上表面101,以使上壓膜件230所拾取之上膜料F1接觸基板100的上表面101。下壓膜件240上移靠近基板100以及上壓膜件230下移靠近基板100的這兩個作動可以依序進行或同時進行。 In step S7, the upper film material F1 and the lower film material F2 are pressed onto the opposite surfaces of the substrate 100. As shown in FIG7 and FIG8, the lower film pressing member 240 is driven to move closer to the lower surface 102 of the substrate 100. In addition, the substrate supporting mechanism 250 releases the substrate 100 so that the lower film pressing member 240 can receive the substrate 100. Further, the driving member 252 of the substrate supporting mechanism 250 can move the substrate supporting member 253 into the frame 251, for example, along the horizontal direction H in FIG8 into the frame 251. After the cavity 200 is evacuated, the substrate support member 253 moved into the frame 251 will no longer support the substrate 100, so that the substrate 100 can be transferred to the lower film member 240 and supported by the pressure plate 241 of the lower film member 240, and the substrate 100 contacts the lower film material F2 picked up by the lower film member 240. The lower film member 240 moves up to approach the substrate 100 and the substrate support member 253 moves into the frame 251. These two actions can be performed sequentially or simultaneously. In addition, the upper film member 230 is driven to move close to the upper surface 101 of the substrate 100 so that the upper film material F1 picked up by the upper film member 230 contacts the upper surface 101 of the substrate 100. The two actions of the lower pressure film 240 moving upward to approach the substrate 100 and the upper pressure film 230 moving downward to approach the substrate 100 can be performed sequentially or simultaneously.

接著,上壓膜件230和下壓膜件240加壓,以將上膜料F1和下膜料F2分別壓合於基板100的上表面101和下表面102。進一步來說,上壓膜件230持續下移且下壓膜件240持續上移,使得上膜料F1和下膜料F2分別被加壓板231和加壓板241推壓,進而讓上膜料F1和下膜料F2分別與基板100的上表面101和下表面102緊密貼合。隨後,上壓膜件230上移且下壓膜件240會在承載機構250承接後下移,以使上膜料F1和下膜料F2分別脫離取膜部232和取膜部242。 Next, the upper pressing film 230 and the lower pressing film 240 are pressurized to press the upper film material F1 and the lower film material F2 onto the upper surface 101 and the lower surface 102 of the substrate 100, respectively. Specifically, the upper pressing film 230 continues to move downward and the lower pressing film 240 continues to move upward, so that the upper film material F1 and the lower film material F2 are pushed by the pressurizing plate 231 and the pressurizing plate 241, respectively, so that the upper film material F1 and the lower film material F2 are closely attached to the upper surface 101 and the lower surface 102 of the substrate 100, respectively. Subsequently, the upper pressure film component 230 moves upward and the lower pressure film component 240 moves downward after being received by the supporting mechanism 250, so that the upper film material F1 and the lower film material F2 are separated from the film removal part 232 and the film removal part 242 respectively.

於步驟S8,係將基板承載機構250自上壓膜件230和下壓膜件240之間移除。如圖9所示,於雙面真空壓膜完成後,基板承載機構250的驅動件252驅動基板支撐件253沿著水平方向H再次突出框體251外。突出框體251外的基板支撐件253可承接有雙面貼膜(上膜料F1、下膜料F2)的基板100。接著,空腔200破真空。上腔體210上移且下腔體220下移而與基板承載機構250的框體251相分離。之後,搭載有基板100的基板承載機構250自壓膜區R2被移回至投片區R3。拾取模組30可拾取有雙面貼膜的基板100。 In step S8, the substrate supporting mechanism 250 is removed from between the upper film pressing member 230 and the lower film pressing member 240. As shown in FIG9, after the double-sided vacuum lamination is completed, the driving member 252 of the substrate supporting mechanism 250 drives the substrate supporting member 253 to protrude out of the frame 251 again along the horizontal direction H. The substrate supporting member 253 protruding out of the frame 251 can support the substrate 100 with double-sided film (upper film material F1, lower film material F2). Then, the vacuum of the cavity 200 is broken. The upper cavity 210 moves up and the lower cavity 220 moves down and is separated from the frame 251 of the substrate supporting mechanism 250. Afterwards, the substrate supporting mechanism 250 carrying the substrate 100 is moved back from the lamination area R2 to the film casting area R3. The pickup module 30 can pick up the substrate 100 with double-sided film.

圖4至圖9示例性地繪示雙面真空壓膜方法涉及壓膜模組20維持於壓膜區R2,保持有膜料的膜承載座110於供膜區R1和壓膜區R2之間移動,以及承載有基板的基板承載機構250於壓膜區R2和投片區R3之間移動,但本發明並不以此為限。在部分實施例中,係可膜承載座110維持於供膜區R1且基板承載機構250維持於投片區R3,改由壓膜模組20依序移動至供膜區R1和投片區R3以進行作業。在部分實施例中,係可膜承載座110維持於供膜區R1,改由壓膜模組20移動至供膜區R1進行取膜作業以及基板承載機構250移動至壓膜區R2進行壓膜作業。在部分實施例中,係可基板承載機構250維持於投片區R3,改由膜承載座110移動至壓膜區R2進行取膜作業以及壓膜模組20移動至投片區R3進行壓膜作業。 FIG. 4 to FIG. 9 exemplarily illustrate a double-sided vacuum lamination method involving the lamination module 20 being maintained in the lamination area R2, the film support 110 holding the film material moving between the film supply area R1 and the lamination area R2, and the substrate support mechanism 250 carrying the substrate moving between the lamination area R2 and the film injection area R3, but the present invention is not limited thereto. In some embodiments, the film support 110 can be maintained in the film supply area R1 and the substrate support mechanism 250 can be maintained in the film injection area R3, and the lamination module 20 can be moved to the film supply area R1 and the film injection area R3 in sequence to perform the operation. In some embodiments, the film support 110 can be maintained in the film supply area R1, and the film pressing module 20 is moved to the film supply area R1 to perform film removal and the substrate support mechanism 250 is moved to the film pressing area R2 to perform film pressing. In some embodiments, the substrate support mechanism 250 can be maintained in the film casting area R3, and the film support 110 is moved to the film pressing area R2 to perform film removal and the film pressing module 20 is moved to the film casting area R3 to perform film pressing.

綜上所述,根據本發明揭露之雙面真空壓膜裝置及 雙面真空壓膜方法,透過基板承載機構的移動將基板運送至兩個壓膜件之間。上腔體和下腔體可相對基板承載機構移動以與基板承載機構密合,並且隨後進行壓膜作業。在進行壓膜作業的過程中,由於基板能被基板承載機構支撐而非是被例如設置在下腔體的載台支撐,因此該等壓膜作業可以實現膜料不接觸基板便可抽真空與同時在基板的相對兩表面壓合膜料,進而有助於提升生產良率。由於膜料於腔體內部會先與要壓合的基板接觸,而會在腔體真空度已達適合條件後,再將膜材放置於基板上進行壓膜,可減少膜材與基板沾黏影響提升良率。 In summary, according to the double-sided vacuum lamination device and double-sided vacuum lamination method disclosed in the present invention, the substrate is transported between two lamination parts by moving the substrate support mechanism. The upper cavity and the lower cavity can move relative to the substrate support mechanism to fit closely with the substrate support mechanism, and then perform lamination operations. During the lamination operation, since the substrate can be supported by the substrate support mechanism instead of being supported by a stage set in the lower cavity, the lamination operations can achieve vacuuming without the film material contacting the substrate and laminating the film material on two opposite surfaces of the substrate at the same time, thereby helping to improve the production yield. Since the film material will first contact the substrate to be pressed inside the chamber, and the film material will be placed on the substrate for pressing after the vacuum degree of the chamber has reached the appropriate conditions, the adhesion between the film material and the substrate can be reduced and the yield rate can be improved.

本發明之實施例揭露雖如上所述,然並非用以限定本發明,任何熟習相關技藝者,在不脫離本發明之精神和範圍內,舉凡依本發明申請範圍所述之形狀、構造、特徵及精神當可做些許之變更,因此本發明之專利保護範圍須視本說明書所附之申請專利範圍所界定者為準。 Although the embodiments of the present invention are disclosed as described above, they are not intended to limit the present invention. Anyone familiar with the relevant technology can make some changes to the shape, structure, features and spirit described in the scope of the application of the present invention without departing from the spirit and scope of the present invention. Therefore, the scope of patent protection of the present invention shall be subject to the scope of the patent application attached to this specification.

10:切膜模組 10: Film cutting module

200:空腔 200: Cavity

210:上腔體 210: Upper cavity

220:下腔體 220: Lower cavity

230:上壓膜件 230: Upper pressure film

231:加壓板 231: Pressure plate

232:取膜部 232: Take the membrane part

240:下壓膜件 240: Lower pressure film

241:加壓板 241: Pressure plate

242:取膜部 242: Take the membrane part

251:框體 251:Frame

253:基板支撐件 253: Baseboard support

30:拾取模組 30: Pickup module

100:基板 100: Substrate

101:上表面 101: Upper surface

102:下表面 102: Lower surface

F1:上膜料 F1: Film material

F2:下膜料 F2: Film material

R1:供膜區 R1: Film supply area

R2:壓膜區 R2: Film pressing area

R3:投片區 R3: Investment area

Claims (9)

一種雙面真空壓膜裝置,包含:一上腔體;一下腔體,對應該上腔體設置;一上壓膜件,可移動地設置於該上腔體;一下壓膜件,可移動地設置於該下腔體;以及一基板承載機構,設置於該上壓膜件與該下壓膜件之間,且該上腔體和該下腔體可相對該基板承載機構移動以與該基板承載機構密合;其中該上壓膜件和該下壓膜件各自具有一取膜部。 A double-sided vacuum lamination device comprises: an upper cavity; a lower cavity, arranged corresponding to the upper cavity; an upper lamination component, movably arranged in the upper cavity; a lower lamination component, movably arranged in the lower cavity; and a substrate supporting mechanism, arranged between the upper lamination component and the lower lamination component, and the upper cavity and the lower cavity can move relative to the substrate supporting mechanism to be closely fitted with the substrate supporting mechanism; wherein the upper lamination component and the lower lamination component each have a film taking portion. 如請求項1所述之雙面真空壓膜裝置,其中該基板承載機構包含:一框體,該上腔體和該下腔體分別與該框體的相對兩側密合;以及一基板支撐件,可移動地設置於該框體。 The double-sided vacuum lamination device as described in claim 1, wherein the substrate supporting mechanism comprises: a frame, the upper cavity and the lower cavity are respectively tightly fitted with opposite sides of the frame; and a substrate support member movably disposed on the frame. 如請求項2所述之雙面真空壓膜裝置,其中該基板承載機構更包含:一驅動件,設置於該框體並與該基板支撐件連接,且該驅動件可帶動該基板支撐件相對該框體移動。 The double-sided vacuum lamination device as described in claim 2, wherein the substrate supporting mechanism further comprises: a driving member, which is disposed in the frame and connected to the substrate supporting member, and the driving member can drive the substrate supporting member to move relative to the frame. 如請求項2所述之雙面真空壓膜裝置,其中該上腔體和該下腔體可相對該框體移動以與該框體密合,且該基板支撐件可相對該框體移動以突出該框體。 A double-sided vacuum lamination device as described in claim 2, wherein the upper cavity and the lower cavity can move relative to the frame to fit closely with the frame, and the substrate support can move relative to the frame to protrude from the frame. 如請求項4所述之雙面真空壓膜裝置,其中該基板支撐件自該框體的內側面突出。 A double-sided vacuum lamination device as described in claim 4, wherein the substrate support protrudes from the inner side of the frame. 一種雙面真空壓膜方法,包含:以一上壓膜件拾取一上膜料和以一下壓膜件拾取一下膜料;將承載有一基板的一基板承載機構提供至該上壓膜件和該下壓膜件之間;形成容置該上壓膜件、該下壓膜件及該基板承載機構的一真空環境;以及將該上膜料和該下膜料分別壓合於該基板的相對兩表面。 A double-sided vacuum lamination method includes: picking up an upper film material with an upper lamination component and picking up a lower film material with a lower lamination component; providing a substrate supporting mechanism carrying a substrate between the upper lamination component and the lower lamination component; forming a vacuum environment for accommodating the upper lamination component, the lower lamination component and the substrate supporting mechanism; and respectively laminating the upper film material and the lower film material on two opposite surfaces of the substrate. 如請求項6所述之雙面真空壓膜方法,其中藉由一上腔體、一下腔體與該基板承載機構密合以形成該真空環境,該上壓膜件可移動地設置於該上腔體,且該下壓膜件可移動地設置於該下腔體。 The double-sided vacuum lamination method as described in claim 6, wherein an upper cavity, a lower cavity and the substrate supporting mechanism are tightly fitted to form the vacuum environment, the upper lamination component can be movably disposed in the upper cavity, and the lower lamination component can be movably disposed in the lower cavity. 如請求項6所述之雙面真空壓膜方法,更包含:提供於相對兩側分別保持有該上膜料以及該下膜料的一膜承載座;將該膜承載座提供至該上壓膜件和該下壓膜件之間;以及於以該上壓膜件拾取該上膜料和以該下壓膜件拾取該下膜料之後,將該膜承載座自該上壓膜件和該下壓膜件之間移除。 The double-sided vacuum lamination method as described in claim 6 further comprises: providing a film support seat on opposite sides respectively holding the upper film material and the lower film material; providing the film support seat between the upper lamination member and the lower lamination member; and after the upper lamination member picks up the upper film material and the lower lamination member picks up the lower film material, removing the film support seat from between the upper lamination member and the lower lamination member. 如請求項6所述之雙面真空壓膜方法,其中將該上膜料和該下膜料分別壓合於該基板的相對兩表面包含:移動該下壓膜件靠近該基板; 以該基板承載機構釋放該基板,使該下壓膜件承接該基板;移動該上壓膜件靠近該基板;以及該上壓膜件和該下壓膜件加壓,以將該上膜料和該下膜料分別壓合於該基板的相對兩表面。 The double-sided vacuum lamination method as described in claim 6, wherein the upper film material and the lower film material are respectively pressed onto two opposite surfaces of the substrate, comprising: moving the lower film pressing member close to the substrate; releasing the substrate with the substrate supporting mechanism so that the lower film pressing member receives the substrate; moving the upper film pressing member close to the substrate; and pressurizing the upper film pressing member and the lower film pressing member to press the upper film material and the lower film material onto two opposite surfaces of the substrate.
TW112125005A 2023-07-05 2023-07-05 Double-side vacuum film lamination apparatus and double-side vacuum film lamination method TWI864863B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW112125005A TWI864863B (en) 2023-07-05 2023-07-05 Double-side vacuum film lamination apparatus and double-side vacuum film lamination method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW112125005A TWI864863B (en) 2023-07-05 2023-07-05 Double-side vacuum film lamination apparatus and double-side vacuum film lamination method

Publications (2)

Publication Number Publication Date
TWI864863B true TWI864863B (en) 2024-12-01
TW202502566A TW202502566A (en) 2025-01-16

Family

ID=94769030

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112125005A TWI864863B (en) 2023-07-05 2023-07-05 Double-side vacuum film lamination apparatus and double-side vacuum film lamination method

Country Status (1)

Country Link
TW (1) TWI864863B (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040261941A1 (en) * 1998-12-02 2004-12-30 Ajinomoto Co., Inc. Method of vacuum-laminating adhesive film
TW200822823A (en) * 2006-11-15 2008-05-16 C Sun Mfg Ltd Film-pressing structure of vacuum film-pressing machine
TW202130489A (en) * 2020-02-07 2021-08-16 志聖工業股份有限公司 Film laminator and film lamination method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040261941A1 (en) * 1998-12-02 2004-12-30 Ajinomoto Co., Inc. Method of vacuum-laminating adhesive film
TW200822823A (en) * 2006-11-15 2008-05-16 C Sun Mfg Ltd Film-pressing structure of vacuum film-pressing machine
TW202130489A (en) * 2020-02-07 2021-08-16 志聖工業股份有限公司 Film laminator and film lamination method

Also Published As

Publication number Publication date
TW202502566A (en) 2025-01-16

Similar Documents

Publication Publication Date Title
KR100506109B1 (en) Separation mechanism for adhesive tape, separation apparatus for adhesive tape, separation method for adhesive tape, pickup apparatus for semiconductor chip, pickup method for semiconductor chip, manufacturing method for semiconductor apparatus, and manufacturing apparatus for semiconductor apparatus
CN101197254B (en) Method for laminating substrate and apparatus using the method
KR101386755B1 (en) Adhesive tape joining method and adhesive tape joining apparatus using the same
CN102201327B (en) Adhesive tape joining method and adhesive tape joining apparatus
KR101970884B1 (en) Apparatus for manufacturing semiconductor and method of manufacturing semiconductor device
KR20140051784A (en) Semiconductor wafer mounting method and semiconductor wafer mounting apparatus
JP2012191051A (en) Method of manufacturing semiconductor, and device of manufacturing semiconductor
TWI864863B (en) Double-side vacuum film lamination apparatus and double-side vacuum film lamination method
JP4600495B2 (en) Wafer take-out apparatus and semiconductor device manufacturing method
KR20210137400A (en) Debonding equipment, automatic debonding system and debonding method for electrostatic chuck
TWI846138B (en) Film lamination appratus and film lamination method
TW202021915A (en) Apparatus for supporting debonding and debonding method using the same
CN119275127A (en) Double-sided vacuum lamination device and double-sided vacuum lamination method
CN211350582U (en) Automatic panel processing device
JP5373008B2 (en) Substrate bonding method
JP7109244B2 (en) Adhesive Tape Conveying Method and Adhesive Tape Conveying Device
TWI823702B (en) Device configured to push electronic substrate
KR102854204B1 (en) Die transfer module and die bonding apparatus including the same
CN111403301B (en) Automatic panel processing device and automatic panel processing method
TWI754344B (en) Film laminator and film lamination method
JP6631785B2 (en) Method and apparatus for manufacturing glass film laminate
TWI685908B (en) Membrane unloading device and its operating equipment
TWI776124B (en) Automation line for processing a molded panel and a method of processing the same
JP7134564B2 (en) Wafer processing method
JP7139039B2 (en) Wafer processing method