TWI864863B - Double-side vacuum film lamination apparatus and double-side vacuum film lamination method - Google Patents
Double-side vacuum film lamination apparatus and double-side vacuum film lamination method Download PDFInfo
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- 238000003475 lamination Methods 0.000 title claims abstract description 102
- 238000000034 method Methods 0.000 title claims description 30
- 239000000758 substrate Substances 0.000 claims abstract description 141
- 230000007246 mechanism Effects 0.000 claims abstract description 60
- 239000000463 material Substances 0.000 claims description 91
- 238000003825 pressing Methods 0.000 claims description 49
- 238000010030 laminating Methods 0.000 claims description 11
- 238000005520 cutting process Methods 0.000 description 15
- 230000008569 process Effects 0.000 description 7
- 238000013459 approach Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000012528 membrane Substances 0.000 description 6
- 238000011084 recovery Methods 0.000 description 6
- 239000002699 waste material Substances 0.000 description 6
- 238000005266 casting Methods 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 230000032258 transport Effects 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 101100012902 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) FIG2 gene Proteins 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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Abstract
Description
本發明係關於壓膜技術,特別是一種雙面真空壓膜裝置及雙面真空壓膜方法。 The present invention relates to lamination technology, in particular to a double-sided vacuum lamination device and a double-sided vacuum lamination method.
按,在半導體或電子零組件的產業中,會需要在基板上貼附膜料(含麥拉膜(Mylar))以當作後續製程的建構層或是接著劑。一般而言,會先拾取膜料後透過傳動機構搬運至對應到基板的貼膜工作區域,接著推壓膜料以完成將膜料壓合至基板表面的作業。 In the semiconductor or electronic component industry, it is necessary to attach film materials (including Mylar) to the substrate as a building layer or adhesive for subsequent processes. Generally speaking, the film material is first picked up and then transported to the film attachment work area corresponding to the substrate through a transmission mechanism, and then the film material is pushed to complete the operation of pressing the film material to the substrate surface.
在基板的相對兩表面貼膜的雙面壓膜製程被廣泛應用於相關的技術領域中。在現有的雙面壓膜製程中,壓膜機先將膜料壓合至基板的其中一表面,隨後此基板移出壓膜機並在另一個工作站以人工操作或機械自動化操作等方式被翻面,接著已翻面的此基板被再次輸送至壓膜機並於另一表面壓合膜料。然而,由於膜料特性與製程良率提升的要求,現有的壓膜機以及雙面壓膜製程已經難以滿足業界需求。 The double-sided lamination process of laminating the opposite surfaces of the substrate is widely used in related technical fields. In the existing double-sided lamination process, the laminator first presses the film material onto one surface of the substrate, then the substrate is removed from the laminator and turned over at another workstation by manual operation or mechanical automation, and then the turned-over substrate is transported to the laminator again and the film material is pressed onto the other surface. However, due to the requirements for improving the film material properties and process yield, the existing laminators and double-sided lamination processes have been unable to meet the needs of the industry.
鑒於上述問題,本發明提供一種雙面真空壓膜裝置及雙面真空壓膜方法,有助於改善現有雙面壓膜製程的生產良率不佳的問題。 In view of the above problems, the present invention provides a double-sided vacuum lamination device and a double-sided vacuum lamination method, which helps to improve the problem of poor production yield of the existing double-sided lamination process.
本發明所揭露之雙面真空壓膜裝置包含一上腔體、一下腔體、一上壓膜件、一下壓膜件以及一基板承載機構。下腔體對應上腔體設置。上壓膜件可移動地設置於上腔體。下壓膜件可移動地設置於下腔體。基板承載機構設置於上壓膜件與下壓膜件之間,且上腔體和下腔體可相對基板承載機構移動,以與基板承載機構密合。 The double-sided vacuum lamination device disclosed in the present invention comprises an upper cavity, a lower cavity, an upper lamination component, a lower lamination component and a substrate supporting mechanism. The lower cavity is arranged corresponding to the upper cavity. The upper lamination component can be movably arranged in the upper cavity. The lower lamination component can be movably arranged in the lower cavity. The substrate supporting mechanism is arranged between the upper lamination component and the lower lamination component, and the upper cavity and the lower cavity can move relative to the substrate supporting mechanism to be tightly fitted with the substrate supporting mechanism.
本發明所揭露之雙面真空壓膜方法包含:以一上壓膜件拾取一上膜料和以一下壓膜件拾取一下膜料;將承載有一基板的一基板承載機構提供至上壓膜件和下壓膜件之間;形成容置上壓膜件、下壓膜件及基板承載機構的一真空環境;以及將上膜料和下膜料分別壓合於基板的相對兩表面。 The double-sided vacuum lamination method disclosed in the present invention includes: picking up an upper film material with an upper lamination component and picking up a lower film material with a lower lamination component; providing a substrate supporting mechanism carrying a substrate between the upper lamination component and the lower lamination component; forming a vacuum environment for accommodating the upper lamination component, the lower lamination component and the substrate supporting mechanism; and respectively pressing the upper film material and the lower film material onto two opposite surfaces of the substrate.
根據本發明揭露之雙面真空壓膜裝置及雙面真空壓膜方法,透過基板承載機構的移動將基板運送至兩個壓膜件之間。上腔體和下腔體可相對基板承載機構移動以與基板承載機構密合,並且隨後進行壓膜作業。在進行壓膜作業的過程中,由於膜料於腔體內部會先與要壓合的基板接觸,而會在腔體真空度已達適合條件後,再將膜材放置於基板上進行壓膜,可減少膜材與基板沾黏影響提升良率。 According to the double-sided vacuum lamination device and double-sided vacuum lamination method disclosed in the present invention, the substrate is transported between two lamination parts by moving the substrate support mechanism. The upper cavity and the lower cavity can move relative to the substrate support mechanism to fit closely with the substrate support mechanism, and then perform lamination. During the lamination process, since the film material will first contact the substrate to be pressed inside the cavity, and the film material will be placed on the substrate for lamination after the vacuum degree of the cavity has reached a suitable condition, the adhesion between the film material and the substrate can be reduced to improve the yield.
以上關於本發明內容之說明及以下實施方式之說明 係用以示範與解釋本發明之原理,並提供本發明之專利申請範圍更進一步之解釋。 The above description of the content of the present invention and the following description of the implementation method are used to demonstrate and explain the principle of the present invention and provide a further explanation of the scope of the patent application of the present invention.
1:雙面真空壓膜裝置 1: Double-sided vacuum lamination device
10:切膜模組 10: Film cutting module
110:膜承載座 110: Membrane carrier
111:上表面 111: Upper surface
112:下表面 112: Lower surface
120:架膜輪 120: Film mounting wheel
130:膜輸送輪 130: Membrane conveyor wheel
140:廢膜回收輪 140: Waste film recovery wheel
150:切膜刀 150: Film cutting knife
20:壓膜模組 20: Laminating module
200:空腔 200: Cavity
210:上腔體 210: Upper cavity
220:下腔體 220: Lower cavity
230:上壓膜件 230: Upper pressure film
231:加壓板 231: Pressure plate
232:取膜部 232: Take the membrane part
240:下壓膜件 240: Lower pressure film
241:加壓板 241: Pressure plate
242:取膜部 242: Take the membrane part
250:基板承載機構 250: Substrate supporting mechanism
251:框體 251:Frame
2511:內側面 2511:Inner side
252:驅動件 252:Driver
253:基板支撐件 253: Baseboard support
30:拾取模組 30: Pickup module
310:機械工作臂 310: Mechanical working arm
320:吸嘴 320: Suction nozzle
100:基板 100: Substrate
101:上表面 101: Upper surface
102:下表面 102: Lower surface
F:膜料 F: Film material
F1:上膜料 F1: Film material
F2:下膜料 F2: Film material
H:水平方向 H: Horizontal direction
R1:供膜區 R1: Film supply area
R2:壓膜區 R2: Film pressing area
R3:投片區 R3: Investment area
S1~S8:步驟 S1~S8: Steps
圖1為根據本發明第一實施例之雙面真空壓膜裝置的示意圖。 Figure 1 is a schematic diagram of a double-sided vacuum lamination device according to the first embodiment of the present invention.
圖2為圖1之雙面真空壓膜裝置的基板承載機構的示意圖。 Figure 2 is a schematic diagram of the substrate supporting mechanism of the double-sided vacuum lamination device in Figure 1.
圖3為根據本發明一實施例之雙面真空壓膜方法的流程圖。 Figure 3 is a flow chart of a double-sided vacuum lamination method according to an embodiment of the present invention.
圖4至圖9為使用圖1之雙面真空壓膜裝置執行圖3之雙面真空壓膜方法的示意圖。 Figures 4 to 9 are schematic diagrams of using the double-sided vacuum lamination device of Figure 1 to perform the double-sided vacuum lamination method of Figure 3.
於以下實施方式中詳細敘述本發明之詳細特徵及優點,其內容足以使任何熟習相關技藝者瞭解本發明之技術內容並據以實施,且根據本說明書所揭露的內容、申請專利範圍及圖式,任何熟習相關技藝者可輕易理解本發明。以下實施例係進一步詳細說明本發明之觀點,但非以任何觀點限制本發明之範疇。 The detailed features and advantages of the present invention are described in detail in the following implementation methods, and the content is sufficient for anyone familiar with the relevant technology to understand the technical content of the present invention and implement it accordingly. Moreover, according to the content disclosed in this specification, the scope of the patent application and the drawings, anyone familiar with the relevant technology can easily understand the present invention. The following embodiments are to further illustrate the viewpoints of the present invention in detail, but they do not limit the scope of the present invention by any viewpoint.
請參照圖1和圖2,其中圖1為根據本發明第一實施例之雙面真空壓膜裝置的示意圖,以及圖2為圖1之雙面真空壓膜裝置的基板承載機構的示意圖。在本實施例中,雙面真空壓膜裝置1可包含切膜模組10、壓膜模組20以及拾取模組30。本實施例將切膜模組10、拾取模組30與壓膜模組20整合成單一裝置(雙面真空壓膜裝置1),但在其他實施例中切膜模組及/或拾取模組可相對壓膜模組獨立地配置於不同裝置中。
Please refer to Figures 1 and 2, wherein Figure 1 is a schematic diagram of a double-sided vacuum lamination device according to the first embodiment of the present invention, and Figure 2 is a schematic diagram of a substrate supporting mechanism of the double-sided vacuum lamination device of Figure 1. In this embodiment, the double-sided
切膜模組10可包含膜承載座110、架膜輪120、膜輸送輪130、廢膜回收輪140以及切膜刀150。架膜輪120設置於膜承載座110之一側,其用以承載纏繞成圓筒狀的膜料F。廢膜回收輪140設置於膜承載座110之另一側。膜輸送輪130設置於膜承載座110的至少其中一側,其用以改變膜料的輸送方向,使得膜料F能沿著平行於膜承載座110之表面的方向移動。切膜刀150對應膜承載座110設置,並且切膜刀150可連接於驅動源(例如馬達,未繪示)。膜料F可保持於膜承載座110的相對兩側,並且切膜刀150可相對膜承載座110移動以裁切膜料F。本實施例以複數個輥輪輸送膜料F,但本發明並不以此為限,在其他實施例中可以採用人工操作方式將膜料保持於膜承載座。
The
壓膜模組20可包含上腔體210、下腔體220、上壓膜件230、下壓膜件240以及基板承載機構250。下腔體220對應上腔體210設置,且上腔體210與下腔體220各自可藉由驅動源(例如馬達氣缸,未繪示)相對彼此移動。
The
上壓膜件230可移動地設置於上腔體210。詳細來說,上壓膜件230可包含可移動地設置於上腔體210的加壓板231以及設置於加壓板231的取膜部232。加壓板231位於上腔體210朝向下腔體220的一側,並且加壓板231可藉由驅動源(例如馬達氣缸,未繪示)相對上腔體210移動靠近下腔體220。取膜部232例如但不限於是負壓吸盤、靜電吸盤(E-chuck)和矽膠墊其中一者。可透過取膜部232拾取保持於膜承載座110之其中一側的膜料,
這將於後續再進一步說明。
The upper
下壓膜件240可移動地設置於下腔體220。詳細來說,下壓膜件240可包含可移動地設置於下腔體220的加壓板241以及設置於加壓板241的取膜部242。加壓板241位於下腔體220朝向上腔體210的一側,並且加壓板241可藉由驅動源(例如馬達氣缸,未繪示)相對下腔體220移動靠近上腔體210。取膜部242可包含負壓吸盤、靜電吸盤和矽膠墊至少其中一者。可透過取膜部242拾取保持於膜承載座110之另一側的膜料,這將於後續再進一步說明。
The lower
基板承載機構250可移動地設置於上壓膜件230與下壓膜件240之間,且上腔體210和下腔體220可相對基板承載機構250移動,以與基板承載機構250密合。如圖2所示,基板承載機構250可包含框體251、驅動件252以及基板支撐件253。驅動件252例如但不限於是汽缸或步進馬達,其設置於框體251並與基板支撐件253連接,使得基板支撐件253相對於框體251為可移動的,也就是說驅動件252可帶動基板支撐件253相對框體251移動。透過驅動件252的移動,基板支撐件253可位於框體251內或是自框體251的內側面2511突出而顯露於外。框體251可為環狀,例如但不限於方形環狀或圓環狀。
The
在本實施例中,上腔體210和下腔體220可相對基板承載機構250移動以與基板承載機構250密合。詳細來說,基板承載機構250可置於上腔體210與下腔體220之間。此時,上
腔體210可朝向下腔體220移動以與框體251的一側密合,且下腔體220可朝向上腔體210移動以與框體251的另一側密合。如此一來,可透過形成在上腔體210或下腔體220的氣體通道(未繪示)抽氣,而在上腔體210與下腔體220之間提供負壓的真空氣氛,進而上腔體210與下腔體220均與基板承載機構250的框體251氣密接合,這將於後續進一步說明。上腔體210或下腔體220和基板承載機構250之間的密合例如但不限於是使上腔體210或下腔體220持續抵壓基板承載機構250的框體251,或是使上腔體210或下腔體220與框體251卡合固定。
In this embodiment, the
拾取模組30可包含機械工作臂310以及位於機械工作臂310的吸嘴320。機械工作臂310可移動至存放有基板的物料區(未另繪示)。拾取模組30透過吸嘴320拾取基板,隨後透過機械工作臂310將所拾取之基板輸送至雙面真空壓膜裝置1中。基板承載機構250可承接由拾取模組30拾取之基板,這將於後續進一步說明。拾取模組30的具體態樣並非用以限制本發明。在其他實施例中,拾取模組可包含夾具、托盤或線性滑軌。
The pick-up
本發明一實施例揭露一種雙面真空壓膜方法,並且可以使用圖1的雙面真空壓膜裝置執行此雙面真空壓膜方法。請參照圖3至圖9,其中圖3為根據本發明一實施例之雙面真空壓膜方法的流程圖,以及圖4至圖9為使用圖1之壓膜系統執行圖3之雙面真空壓膜方法的示意圖。 An embodiment of the present invention discloses a double-sided vacuum lamination method, and the double-sided vacuum lamination method can be performed using the double-sided vacuum lamination device of FIG. 1. Please refer to FIG. 3 to FIG. 9, wherein FIG. 3 is a flow chart of the double-sided vacuum lamination method according to an embodiment of the present invention, and FIG. 4 to FIG. 9 are schematic diagrams of using the lamination system of FIG. 1 to perform the double-sided vacuum lamination method of FIG. 3.
本實施例揭露的雙面真空壓膜方法包含依序執行的 步驟S1至S8,其將膜料壓合至基板(例如矽晶圓)的上下兩表面上。在其他實施例中,膜料和基板可分別是樹脂膜和多層電路板。 The double-sided vacuum lamination method disclosed in this embodiment includes steps S1 to S8 performed in sequence, which press the film material onto the upper and lower surfaces of a substrate (such as a silicon wafer). In other embodiments, the film material and the substrate may be a resin film and a multi-layer circuit board, respectively.
於步驟S1,係提供於相對兩側分別保持有膜料的膜承載座110。具體來說,以切膜模組10的膜輸送輪130將帶狀的膜料F輸送至膜承載座110的相對兩側,並且將膜料F保持在膜承載座110。更詳細來說,一膜輸送輪130將一膜料F輸送至膜承載座110的上方,且另一膜輸送輪130將另一膜料F輸送至膜承載座110的下方。輸送至膜承載座110上方的膜料F例如以負壓吸附方式保持在膜承載座110的上表面111,且輸送至膜承載座110下方的膜料F例如以負壓吸附方式保持在膜承載座110的下表面112。切膜刀150將此二膜料F分別裁切成形狀匹配基板的上膜料F1及下膜料F2。
In step S1, a
以下,為了方便說明如何以雙面真空壓膜裝置1執行圖3的雙面真空壓膜方法,雙面真空壓膜裝置1可被定義出三個工作區域,其分別為供膜區R1、壓膜區R2以及投片區R3,如圖4所示。切膜模組10的切膜刀150經常性地位於供膜區R1,壓膜模組20的上腔體210、下腔體220、上壓膜件230和下壓膜件240可經常性地位於壓膜區R2,且拾取模組30可經常性地位於投片區R3。
In order to conveniently explain how to perform the double-sided vacuum lamination method of FIG. 3 with the double-sided
於步驟S2,係將膜承載座110提供至上壓膜件230和下壓膜件240之間。如圖4和圖5所示,保持有上膜料F1及下膜料F2的膜承載座110自供膜區R1被移至壓膜區R2,並且
上膜料F1和下膜料F2被置於壓膜模組20的上壓膜件230和下壓膜件240之間。移動膜承載座110的方式例如但不限於是人工搬運或是機械自動化搬運。此外,在本實施例中,架膜輪120、膜輸送輪130及廢膜回收輪140相對於膜承載座110為固定設置,因此將膜承載座110移至壓膜區R2的同時,架膜輪120、膜輸送輪130及廢膜回收輪140也會被帶至壓膜區R2,但本發明並不以此為限。在其他實施例中,膜承載座為可獨立移動之元件,因此移動膜承載座時候不會帶動架膜輪、膜輸送輪及廢膜回收輪一併移動。
In step S2, the
於步驟S3,係以上壓膜件230拾取上膜料F1和以下壓膜件240拾取下膜料F2。如圖5所示,上壓膜件230下降靠近膜承載座110,並且上壓膜件230的取膜部232拾取上膜料F1。下壓膜件240上升靠近膜承載座110,並且下壓膜件240的取膜部242拾取下膜料F2。當取膜部232、242包含負壓吸盤或靜電吸盤時,所述拾取可為取膜部232、242分別吸取上膜料F1和下膜料F2。當取膜部232、242包含矽膠墊時,所述拾取可為取膜部232、242分別黏取上膜料F1和下膜料F2。
In step S3, the upper film material F1 is picked up by the upper
於步驟S4,係將膜承載座110自上壓膜件230和下壓膜件240之間移除。如圖5和圖6所示,在上壓膜件230的取膜部232拾取上膜料F1且下壓膜件240的取膜部242拾取下膜料F2之後,上壓膜件230和下壓膜件240回歸至原位,且膜承載座110自壓膜區R2被移回至供膜區R1。可選擇性地藉由執行
步驟S1再次給膜承載座110提供膜料。
In step S4, the
於步驟S5,係將承載有基板的基板承載機構250提供至上壓膜件230和下壓膜件240之間。如圖5和圖6所示,在投片區R3中,拾取模組30已經預先從物料區(未另繪示)拾取基板100。拾取模組30能將基板100轉移至基板承載機構250的基板支撐件253。進一步來說,基板支撐件253可維持突出框體251的內側面2511,以使基板支撐件253可以承接基板100。基板100可支撐於基板支撐件253上。承載有基板100的基板承載機構250自投片區R3被移至壓膜區R2,並且基板100被置於壓膜模組20的上壓膜件230和下壓膜件240之間。移動基板承載機構250的方式例如但不限於是人工搬運或是機械自動化搬運。
In step S5, the
於步驟S6,係形成容置上壓膜件230、下壓膜件240及基板承載機構250的真空環境。如圖6和圖7所示,上腔體210下降以與基板承載機構250的框體251之一側密合,且下腔體220上升靠近以與框體251的另一側密合。接著,透過形成在上腔體210或下腔體220的氣體通道(未繪示)抽氣,而在上腔體210與下腔體220之間的空腔200中提供負壓的真空氣氛。在圖7中,上壓膜件230的加壓板231和取膜部232位於空腔200內,下壓膜件240的加壓板241和取膜部242位於空腔200內,基板承載機構250的驅動件252和基板支撐件253位於空腔200內,以及上膜料F1、下膜料F2和基板100位於空腔200內。
In step S6, a vacuum environment is formed to accommodate the
於步驟S7,係將上膜料F1和下膜料F2分別壓合於
基板100的相對兩表面。如圖7和圖8所示,驅動下壓膜件240移動靠近基板100的下表面102。此外,基板承載機構250釋放基板100,以使下壓膜件240可承接基板100。進一步來說,基板承載機構250的驅動件252可將基板支撐件253移至框體251內,例如沿著圖8中的水平方向H移至框體251內。在空腔200抽真空後,被移至框體251內的基板支撐件253將不再支撐基板100,從而基板100可被轉移至下壓膜件240而改由下壓膜件240的加壓板241來支撐基板100,並且基板100與下壓膜件240所拾取之下膜料F2接觸。下壓膜件240上移靠近基板100以及基板支撐件253移至框體251內的這兩個作動可以依序進行或同時進行。此外,驅動上壓膜件230移動靠近基板100的上表面101,以使上壓膜件230所拾取之上膜料F1接觸基板100的上表面101。下壓膜件240上移靠近基板100以及上壓膜件230下移靠近基板100的這兩個作動可以依序進行或同時進行。
In step S7, the upper film material F1 and the lower film material F2 are pressed onto the opposite surfaces of the
接著,上壓膜件230和下壓膜件240加壓,以將上膜料F1和下膜料F2分別壓合於基板100的上表面101和下表面102。進一步來說,上壓膜件230持續下移且下壓膜件240持續上移,使得上膜料F1和下膜料F2分別被加壓板231和加壓板241推壓,進而讓上膜料F1和下膜料F2分別與基板100的上表面101和下表面102緊密貼合。隨後,上壓膜件230上移且下壓膜件240會在承載機構250承接後下移,以使上膜料F1和下膜料F2分別脫離取膜部232和取膜部242。
Next, the upper
於步驟S8,係將基板承載機構250自上壓膜件230和下壓膜件240之間移除。如圖9所示,於雙面真空壓膜完成後,基板承載機構250的驅動件252驅動基板支撐件253沿著水平方向H再次突出框體251外。突出框體251外的基板支撐件253可承接有雙面貼膜(上膜料F1、下膜料F2)的基板100。接著,空腔200破真空。上腔體210上移且下腔體220下移而與基板承載機構250的框體251相分離。之後,搭載有基板100的基板承載機構250自壓膜區R2被移回至投片區R3。拾取模組30可拾取有雙面貼膜的基板100。
In step S8, the
圖4至圖9示例性地繪示雙面真空壓膜方法涉及壓膜模組20維持於壓膜區R2,保持有膜料的膜承載座110於供膜區R1和壓膜區R2之間移動,以及承載有基板的基板承載機構250於壓膜區R2和投片區R3之間移動,但本發明並不以此為限。在部分實施例中,係可膜承載座110維持於供膜區R1且基板承載機構250維持於投片區R3,改由壓膜模組20依序移動至供膜區R1和投片區R3以進行作業。在部分實施例中,係可膜承載座110維持於供膜區R1,改由壓膜模組20移動至供膜區R1進行取膜作業以及基板承載機構250移動至壓膜區R2進行壓膜作業。在部分實施例中,係可基板承載機構250維持於投片區R3,改由膜承載座110移動至壓膜區R2進行取膜作業以及壓膜模組20移動至投片區R3進行壓膜作業。
FIG. 4 to FIG. 9 exemplarily illustrate a double-sided vacuum lamination method involving the
綜上所述,根據本發明揭露之雙面真空壓膜裝置及 雙面真空壓膜方法,透過基板承載機構的移動將基板運送至兩個壓膜件之間。上腔體和下腔體可相對基板承載機構移動以與基板承載機構密合,並且隨後進行壓膜作業。在進行壓膜作業的過程中,由於基板能被基板承載機構支撐而非是被例如設置在下腔體的載台支撐,因此該等壓膜作業可以實現膜料不接觸基板便可抽真空與同時在基板的相對兩表面壓合膜料,進而有助於提升生產良率。由於膜料於腔體內部會先與要壓合的基板接觸,而會在腔體真空度已達適合條件後,再將膜材放置於基板上進行壓膜,可減少膜材與基板沾黏影響提升良率。 In summary, according to the double-sided vacuum lamination device and double-sided vacuum lamination method disclosed in the present invention, the substrate is transported between two lamination parts by moving the substrate support mechanism. The upper cavity and the lower cavity can move relative to the substrate support mechanism to fit closely with the substrate support mechanism, and then perform lamination operations. During the lamination operation, since the substrate can be supported by the substrate support mechanism instead of being supported by a stage set in the lower cavity, the lamination operations can achieve vacuuming without the film material contacting the substrate and laminating the film material on two opposite surfaces of the substrate at the same time, thereby helping to improve the production yield. Since the film material will first contact the substrate to be pressed inside the chamber, and the film material will be placed on the substrate for pressing after the vacuum degree of the chamber has reached the appropriate conditions, the adhesion between the film material and the substrate can be reduced and the yield rate can be improved.
本發明之實施例揭露雖如上所述,然並非用以限定本發明,任何熟習相關技藝者,在不脫離本發明之精神和範圍內,舉凡依本發明申請範圍所述之形狀、構造、特徵及精神當可做些許之變更,因此本發明之專利保護範圍須視本說明書所附之申請專利範圍所界定者為準。 Although the embodiments of the present invention are disclosed as described above, they are not intended to limit the present invention. Anyone familiar with the relevant technology can make some changes to the shape, structure, features and spirit described in the scope of the application of the present invention without departing from the spirit and scope of the present invention. Therefore, the scope of patent protection of the present invention shall be subject to the scope of the patent application attached to this specification.
10:切膜模組 10: Film cutting module
200:空腔 200: Cavity
210:上腔體 210: Upper cavity
220:下腔體 220: Lower cavity
230:上壓膜件 230: Upper pressure film
231:加壓板 231: Pressure plate
232:取膜部 232: Take the membrane part
240:下壓膜件 240: Lower pressure film
241:加壓板 241: Pressure plate
242:取膜部 242: Take the membrane part
251:框體 251:Frame
253:基板支撐件 253: Baseboard support
30:拾取模組 30: Pickup module
100:基板 100: Substrate
101:上表面 101: Upper surface
102:下表面 102: Lower surface
F1:上膜料 F1: Film material
F2:下膜料 F2: Film material
R1:供膜區 R1: Film supply area
R2:壓膜區 R2: Film pressing area
R3:投片區 R3: Investment area
Claims (9)
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| TW112125005A TWI864863B (en) | 2023-07-05 | 2023-07-05 | Double-side vacuum film lamination apparatus and double-side vacuum film lamination method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW112125005A TWI864863B (en) | 2023-07-05 | 2023-07-05 | Double-side vacuum film lamination apparatus and double-side vacuum film lamination method |
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| Publication Number | Publication Date |
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| TW202502566A TW202502566A (en) | 2025-01-16 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040261941A1 (en) * | 1998-12-02 | 2004-12-30 | Ajinomoto Co., Inc. | Method of vacuum-laminating adhesive film |
| TW200822823A (en) * | 2006-11-15 | 2008-05-16 | C Sun Mfg Ltd | Film-pressing structure of vacuum film-pressing machine |
| TW202130489A (en) * | 2020-02-07 | 2021-08-16 | 志聖工業股份有限公司 | Film laminator and film lamination method |
-
2023
- 2023-07-05 TW TW112125005A patent/TWI864863B/en active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040261941A1 (en) * | 1998-12-02 | 2004-12-30 | Ajinomoto Co., Inc. | Method of vacuum-laminating adhesive film |
| TW200822823A (en) * | 2006-11-15 | 2008-05-16 | C Sun Mfg Ltd | Film-pressing structure of vacuum film-pressing machine |
| TW202130489A (en) * | 2020-02-07 | 2021-08-16 | 志聖工業股份有限公司 | Film laminator and film lamination method |
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