TWI868252B - Polyimide resin, polyimide varnish, and polyimide film - Google Patents
Polyimide resin, polyimide varnish, and polyimide film Download PDFInfo
- Publication number
- TWI868252B TWI868252B TW109140355A TW109140355A TWI868252B TW I868252 B TWI868252 B TW I868252B TW 109140355 A TW109140355 A TW 109140355A TW 109140355 A TW109140355 A TW 109140355A TW I868252 B TWI868252 B TW I868252B
- Authority
- TW
- Taiwan
- Prior art keywords
- constituent unit
- mol
- polyimide
- formula
- film
- Prior art date
Links
- 229920001721 polyimide Polymers 0.000 title claims abstract description 179
- 239000009719 polyimide resin Substances 0.000 title claims abstract description 58
- 239000004642 Polyimide Substances 0.000 title claims description 83
- 239000002966 varnish Substances 0.000 title claims description 82
- 150000001875 compounds Chemical class 0.000 claims abstract description 139
- 150000004985 diamines Chemical class 0.000 claims abstract description 45
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 21
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims abstract description 18
- 239000000470 constituent Substances 0.000 claims description 251
- 125000003118 aryl group Chemical group 0.000 claims description 33
- 125000001931 aliphatic group Chemical group 0.000 claims description 29
- 239000003960 organic solvent Substances 0.000 claims description 15
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 239000010408 film Substances 0.000 description 52
- 238000000034 method Methods 0.000 description 39
- 239000002904 solvent Substances 0.000 description 27
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 27
- 230000003287 optical effect Effects 0.000 description 25
- 239000000126 substance Substances 0.000 description 20
- 239000007787 solid Substances 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 15
- -1 methylene, ethylene, propylene, trimethylene, tetramethylene, hexamethylene, octamethylene, decamethylene, dodecamethylene Chemical group 0.000 description 14
- 239000004952 Polyamide Substances 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 13
- 229920002647 polyamide Polymers 0.000 description 13
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- 125000004432 carbon atom Chemical group C* 0.000 description 12
- 238000011955 best available control technology Methods 0.000 description 11
- 239000007810 chemical reaction solvent Substances 0.000 description 11
- 239000003054 catalyst Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 125000002723 alicyclic group Chemical group 0.000 description 7
- 230000000704 physical effect Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 6
- 239000003513 alkali Substances 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- LJMPOXUWPWEILS-UHFFFAOYSA-N 3a,4,4a,7a,8,8a-hexahydrofuro[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1C2C(=O)OC(=O)C2CC2C(=O)OC(=O)C21 LJMPOXUWPWEILS-UHFFFAOYSA-N 0.000 description 5
- 125000005442 diisocyanate group Chemical group 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- LJGHYPLBDBRCRZ-UHFFFAOYSA-N 3-(3-aminophenyl)sulfonylaniline Chemical compound NC1=CC=CC(S(=O)(=O)C=2C=C(N)C=CC=2)=C1 LJGHYPLBDBRCRZ-UHFFFAOYSA-N 0.000 description 4
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- OVASAEXSPYGGES-UHFFFAOYSA-N C1C2C(C(OC3=O)=O)C3C1CC2(C1=O)CCC21CC1CC2C2C(=O)OC(=O)C12 Chemical compound C1C2C(C(OC3=O)=O)C3C1CC2(C1=O)CCC21CC1CC2C2C(=O)OC(=O)C12 OVASAEXSPYGGES-UHFFFAOYSA-N 0.000 description 4
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 4
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 3
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 3
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- OXIKYYJDTWKERT-UHFFFAOYSA-N [4-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCC(CN)CC1 OXIKYYJDTWKERT-UHFFFAOYSA-N 0.000 description 3
- 125000005907 alkyl ester group Chemical group 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 239000000010 aprotic solvent Substances 0.000 description 3
- 238000007865 diluting Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 2
- JYYNAJVZFGKDEQ-UHFFFAOYSA-N 2,4-Dimethylpyridine Chemical compound CC1=CC=NC(C)=C1 JYYNAJVZFGKDEQ-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- NXXYKOUNUYWIHA-UHFFFAOYSA-N 2,6-Dimethylphenol Chemical compound CC1=CC=CC(C)=C1O NXXYKOUNUYWIHA-UHFFFAOYSA-N 0.000 description 2
- YCOXTKKNXUZSKD-UHFFFAOYSA-N 3,4-xylenol Chemical compound CC1=CC=C(O)C=C1C YCOXTKKNXUZSKD-UHFFFAOYSA-N 0.000 description 2
- TUAMRELNJMMDMT-UHFFFAOYSA-N 3,5-xylenol Chemical compound CC1=CC(C)=CC(O)=C1 TUAMRELNJMMDMT-UHFFFAOYSA-N 0.000 description 2
- JJYPMNFTHPTTDI-UHFFFAOYSA-N 3-methylaniline Chemical compound CC1=CC=CC(N)=C1 JJYPMNFTHPTTDI-UHFFFAOYSA-N 0.000 description 2
- QHHKLPCQTTWFSS-UHFFFAOYSA-N 5-[2-(1,3-dioxo-2-benzofuran-5-yl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)(C(F)(F)F)C(F)(F)F)=C1 QHHKLPCQTTWFSS-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 238000012644 addition polymerization Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 150000004984 aromatic diamines Chemical class 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- GGSUCNLOZRCGPQ-UHFFFAOYSA-N diethylaniline Chemical compound CCN(CC)C1=CC=CC=C1 GGSUCNLOZRCGPQ-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- AWJUIBRHMBBTKR-UHFFFAOYSA-N isoquinoline Chemical compound C1=NC=CC2=CC=CC=C21 AWJUIBRHMBBTKR-UHFFFAOYSA-N 0.000 description 2
- 150000002596 lactones Chemical class 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- RZXMPPFPUUCRFN-UHFFFAOYSA-N p-toluidine Chemical compound CC1=CC=C(N)C=C1 RZXMPPFPUUCRFN-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BEBFJOSPYYGOKL-UHFFFAOYSA-N (3-ethylphenyl)methanamine Chemical compound CCC1=CC=CC(CN)=C1 BEBFJOSPYYGOKL-UHFFFAOYSA-N 0.000 description 1
- RGXUCUWVGKLACF-UHFFFAOYSA-N (3-methylphenyl)methanamine Chemical compound CC1=CC=CC(CN)=C1 RGXUCUWVGKLACF-UHFFFAOYSA-N 0.000 description 1
- OLQWMCSSZKNOLQ-ZXZARUISSA-N (3s)-3-[(3r)-2,5-dioxooxolan-3-yl]oxolane-2,5-dione Chemical compound O=C1OC(=O)C[C@H]1[C@@H]1C(=O)OC(=O)C1 OLQWMCSSZKNOLQ-ZXZARUISSA-N 0.000 description 1
- RCNBXBQGBCGTPB-UHFFFAOYSA-N (4-dodecylphenyl)methanamine Chemical compound CCCCCCCCCCCCC1=CC=C(CN)C=C1 RCNBXBQGBCGTPB-UHFFFAOYSA-N 0.000 description 1
- DGAGEFUEKIORSQ-UHFFFAOYSA-N (4-ethylphenyl)methanamine Chemical compound CCC1=CC=C(CN)C=C1 DGAGEFUEKIORSQ-UHFFFAOYSA-N 0.000 description 1
- HMTSWYPNXFHGEP-UHFFFAOYSA-N (4-methylphenyl)methanamine Chemical compound CC1=CC=C(CN)C=C1 HMTSWYPNXFHGEP-UHFFFAOYSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 1
- CGSKOGYKWHUSLC-UHFFFAOYSA-N 1-(4-aminophenyl)-1,3,3-trimethyl-2h-inden-5-amine Chemical compound C12=CC=C(N)C=C2C(C)(C)CC1(C)C1=CC=C(N)C=C1 CGSKOGYKWHUSLC-UHFFFAOYSA-N 0.000 description 1
- GEWWCWZGHNIUBW-UHFFFAOYSA-N 1-(4-nitrophenyl)propan-2-one Chemical compound CC(=O)CC1=CC=C([N+]([O-])=O)C=C1 GEWWCWZGHNIUBW-UHFFFAOYSA-N 0.000 description 1
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 1
- ZATPCOAFSVGPKS-UHFFFAOYSA-N 2,3-bis(4-aminophenyl)benzene-1,4-dicarboxamide Chemical compound C=1C=C(N)C=CC=1C=1C(C(=O)N)=CC=C(C(N)=O)C=1C1=CC=C(N)C=C1 ZATPCOAFSVGPKS-UHFFFAOYSA-N 0.000 description 1
- KUFFULVDNCHOFZ-UHFFFAOYSA-N 2,4-xylenol Chemical compound CC1=CC=C(O)C(C)=C1 KUFFULVDNCHOFZ-UHFFFAOYSA-N 0.000 description 1
- 125000004959 2,6-naphthylene group Chemical group [H]C1=C([H])C2=C([H])C([*:1])=C([H])C([H])=C2C([H])=C1[*:2] 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- XWKFPIODWVPXLX-UHFFFAOYSA-N 2-methyl-5-methylpyridine Natural products CC1=CC=C(C)N=C1 XWKFPIODWVPXLX-UHFFFAOYSA-N 0.000 description 1
- YJLVXRPNNDKMMO-UHFFFAOYSA-N 3,4,5,6-tetrafluorophthalic acid Chemical compound OC(=O)C1=C(F)C(F)=C(F)C(F)=C1C(O)=O YJLVXRPNNDKMMO-UHFFFAOYSA-N 0.000 description 1
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- AIVVXPSKEVWKMY-UHFFFAOYSA-N 4-(3,4-dicarboxyphenoxy)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 AIVVXPSKEVWKMY-UHFFFAOYSA-N 0.000 description 1
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- BEKFRNOZJSYWKZ-UHFFFAOYSA-N 4-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C=C1 BEKFRNOZJSYWKZ-UHFFFAOYSA-N 0.000 description 1
- HESXPOICBNWMPI-UHFFFAOYSA-N 4-[2-[4-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(N)=CC=2)C=CC=1C(C)(C)C1=CC=C(N)C=C1 HESXPOICBNWMPI-UHFFFAOYSA-N 0.000 description 1
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- KIFDSGGWDIVQGN-UHFFFAOYSA-N 4-[9-(4-aminophenyl)fluoren-9-yl]aniline Chemical compound C1=CC(N)=CC=C1C1(C=2C=CC(N)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 KIFDSGGWDIVQGN-UHFFFAOYSA-N 0.000 description 1
- OSFGNTLIOUHOKN-UHFFFAOYSA-N 4-[benzyl(methyl)sulfamoyl]benzoic acid Chemical compound C=1C=C(C(O)=O)C=CC=1S(=O)(=O)N(C)CC1=CC=CC=C1 OSFGNTLIOUHOKN-UHFFFAOYSA-N 0.000 description 1
- XPAQFJJCWGSXGJ-UHFFFAOYSA-N 4-amino-n-(4-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(N)C=C1 XPAQFJJCWGSXGJ-UHFFFAOYSA-N 0.000 description 1
- DVIPPHSQIBKWSA-UHFFFAOYSA-N 4-chlorophthalic acid Chemical compound OC(=O)C1=CC=C(Cl)C=C1C(O)=O DVIPPHSQIBKWSA-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-M 4-hydroxybenzoate Chemical compound OC1=CC=C(C([O-])=O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-M 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- ZPAKUZKMGJJMAA-UHFFFAOYSA-N Cyclohexane-1,2,4,5-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)CC1C(O)=O ZPAKUZKMGJJMAA-UHFFFAOYSA-N 0.000 description 1
- 239000004805 Cyclohexane-1,2-dicarboxylic acid Substances 0.000 description 1
- 206010059866 Drug resistance Diseases 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 241001272720 Medialuna californiensis Species 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- ZWXPDGCFMMFNRW-UHFFFAOYSA-N N-methylcaprolactam Chemical compound CN1CCCCCC1=O ZWXPDGCFMMFNRW-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- XZAHJRZBUWYCBM-UHFFFAOYSA-N [1-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1(CN)CCCCC1 XZAHJRZBUWYCBM-UHFFFAOYSA-N 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004450 alkenylene group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000003660 carbonate based solvent Substances 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- ILUAAIDVFMVTAU-UHFFFAOYSA-N cyclohex-4-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CC=CCC1C(O)=O ILUAAIDVFMVTAU-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- ASJCSAKCMTWGAH-UHFFFAOYSA-N cyclopentane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCC1C(O)=O ASJCSAKCMTWGAH-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000004427 diamine group Chemical group 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- 125000001142 dicarboxylic acid group Chemical group 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000006081 fluorescent whitening agent Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 238000002523 gelfiltration Methods 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 125000005462 imide group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 239000011736 potassium bicarbonate Substances 0.000 description 1
- 229910000028 potassium bicarbonate Inorganic materials 0.000 description 1
- 235000015497 potassium bicarbonate Nutrition 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 235000011181 potassium carbonates Nutrition 0.000 description 1
- TYJJADVDDVDEDZ-UHFFFAOYSA-M potassium hydrogencarbonate Chemical compound [K+].OC([O-])=O TYJJADVDDVDEDZ-UHFFFAOYSA-M 0.000 description 1
- 235000011118 potassium hydroxide Nutrition 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FOWDZVNRQHPXDO-UHFFFAOYSA-N propyl hydrogen carbonate Chemical compound CCCOC(O)=O FOWDZVNRQHPXDO-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000006798 ring closing metathesis reaction Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 1
- 239000000326 ultraviolet stabilizing agent Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1039—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors comprising halogen-containing substituents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/106—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1057—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain
- C08G73/1064—Polyimides containing other atoms than carbon, hydrogen, nitrogen or oxygen in the main chain containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/14—Polyamide-imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
本發明係關於聚醯亞胺樹脂、聚醯亞胺清漆以及聚醯亞胺薄膜。The present invention relates to a polyimide resin, a polyimide varnish and a polyimide film.
已有人探討聚醯亞胺樹脂在電氣-電子零件等領域中各種的利用。例如,以裝置的輕量化、撓性化作為目的,期望將液晶顯示器、OLED顯示器等圖像顯示裝置所使用的玻璃基板替換成塑膠基板,適合作為該塑膠基板之聚醯亞胺薄膜的研究正在進行。 在圖像顯示裝置中,發自顯示元件發出的光係通過塑膠基板而射出之情況下,對於塑膠基板要求無色透明性,光通過相位差薄膜、偏光板時(例如液晶顯示器、觸控面板等),除了無色透明性,還要求光學等向性高(亦即Rth低)。There are studies on various uses of polyimide resins in the fields of electrical and electronic components. For example, in order to make the device lighter and more flexible, it is hoped that the glass substrate used in image display devices such as liquid crystal displays and OLED displays will be replaced with a plastic substrate, and research on polyimide films suitable as the plastic substrate is underway. In image display devices, when the light emitted from the display element is emitted through the plastic substrate, the plastic substrate is required to be colorless and transparent. When the light passes through a phase difference film or a polarizing plate (such as a liquid crystal display, a touch panel, etc.), in addition to colorless and transparent properties, high optical isotropy (i.e., low Rth) is also required.
為了滿足如此之性能,各種組成之聚醯亞胺樹脂之開發正在進行。例如,專利文獻1揭示一種聚醯亞胺薄膜,係以獲得含有對溶劑之溶解性良好且加工性優異的聚醯胺且無色透明且靭性優異的聚醯亞胺薄膜為目的,包含由3,3’-二胺基二苯基碸與其他特定的二胺之組合構成之結構作為二胺成分。 [先前技術文獻] [專利文獻]In order to satisfy such performance, the development of polyimide resins of various compositions is underway. For example, Patent Document 1 discloses a polyimide film, which is intended to obtain a polyimide film containing a polyimide having good solubility in a solvent and excellent processability, and which is colorless, transparent and has excellent toughness, and includes a structure composed of a combination of 3,3'-diaminodiphenylsulfone and other specific diamines as a diamine component. [Prior Art Document] [Patent Document]
[專利文獻1]國際公開第2016/158825號[Patent Document 1] International Publication No. 2016/158825
[發明所欲解決之課題][The problem that the invention wants to solve]
如上述,對於聚醯亞胺薄膜要求無色透明性及光學等向性等良好的光學特性。尤其對於液晶顯示器等用途而言,光學等向性係重要。 另一方面,由於聚醯亞胺具有剛直且強固的分子結構,製造薄膜時或使用於具有可移動部之製品時之斷裂成為問題。若為了抑制斷裂而將柔軟性高之成分導入至分子中,或於樹脂中添加添加物,則一般而言光學特性會降低。如此般,需求具有良好的光學特性,並具有延性之聚醯亞胺薄膜。 此外,耐藥品性亦為重要。例如,為了在聚醯亞胺薄膜之上形成另外的樹脂層(例如,彩色濾光片、阻劑)而將該樹脂層形成用之清漆塗佈於聚醯亞胺薄膜時,對於聚醯亞胺薄膜要求對該清漆中含有的溶劑之耐受性。若聚醯亞胺薄膜之耐溶劑性不充分,則有因薄膜之溶解、膨潤而喪失作為基板的功能之虞。然而,如前述,為了確保光學特性,製作聚醯亞胺薄膜時必須製成溶液之形式,難以兼顧該等性質。 如此般,需求一種聚醯亞胺樹脂,其可維持獲得之聚醯亞胺薄膜之光學特性,尤其係光學等向性,同時可獲得具有柔軟性且耐藥品性優異的聚醯亞胺薄膜。 本發明係以提供可形成光學等向性優異、此外柔軟性及耐藥品性亦優異的薄膜之聚醯亞胺樹脂、聚醯亞胺清漆及聚醯亞胺薄膜為課題。 [解決課題之手段]As mentioned above, polyimide films are required to have good optical properties such as colorless transparency and optical isotropy. Optical isotropy is particularly important for applications such as liquid crystal displays. On the other hand, since polyimide has a rigid and strong molecular structure, cracking becomes a problem when manufacturing films or using them in products with movable parts. If highly flexible components are introduced into the molecules or additives are added to the resin in order to suppress cracking, the optical properties will generally decrease. As such, polyimide films with good optical properties and ductility are required. In addition, chemical resistance is also important. For example, in order to form another resin layer (e.g., color filter, resist) on the polyimide film, when the varnish used to form the resin layer is applied to the polyimide film, the polyimide film is required to be resistant to the solvent contained in the varnish. If the solvent resistance of the polyimide film is insufficient, there is a risk that the film will dissolve and swell and lose its function as a substrate. However, as mentioned above, in order to ensure the optical properties, the polyimide film must be made in the form of a solution, and it is difficult to take these properties into consideration. Thus, there is a need for a polyimide resin that can maintain the optical properties of the obtained polyimide film, especially the optical isotropy, and can obtain a polyimide film having excellent flexibility and chemical resistance. The present invention is to provide a polyimide resin, polyimide varnish, and polyimide film that can form a film having excellent optical isotropy, and also excellent flexibility and chemical resistance. [Means for solving the problem]
本案發明者們,發現包含來自特定的四羧酸二酐之構成單元與來自特定的2種二胺之構成單元之組合的聚醯亞胺樹脂可解決上述課題,並完成了本發明。The inventors of the present invention have found that a polyimide resin comprising a combination of a constituent unit derived from a specific tetracarboxylic dianhydride and a constituent unit derived from two specific diamines can solve the above-mentioned problems, and have completed the present invention.
亦即,本發明係關於下列<1>~<8>。 <1>一種聚醯亞胺樹脂,具有來自四羧酸二酐之構成單元A及來自二胺之構成單元B,構成單元A包含來自下式(a-1)表示之化合物之構成單元(A-1), 構成單元B包含來自下式(b-1)表示之化合物之構成單元(B-1)、及來自下式(b-2)表示之化合物之構成單元(B-2)。That is, the present invention relates to the following <1> to <8>. <1> A polyimide resin having a constituent unit A derived from tetracarboxylic dianhydride and a constituent unit B derived from a diamine, wherein the constituent unit A includes a constituent unit (A-1) derived from a compound represented by the following formula (a-1), and the constituent unit B includes a constituent unit (B-1) derived from a compound represented by the following formula (b-1), and a constituent unit (B-2) derived from a compound represented by the following formula (b-2).
[化1] [Chemistry 1]
<2>如上述<1>之聚醯亞胺樹脂,其中,構成單元B中之構成單元(B-1)的比率為5~80莫耳%,構成單元B中之構成單元(B-2)的比率為20~95莫耳%。 <3>如<1>或<2>之聚醯亞胺樹脂,其中,構成單元B中之構成單元(B-1)與構成單元(B-2)的莫耳比[(B-1)/(B-2)]為5/95~80/20。 <4>如上述<1>~<3>中任一項之聚醯亞胺樹脂,其中,構成單元A更包含選自於由來自下式(a-2-1)表示之化合物之構成單元(A-2-1)、及來自下式(a-2-2)表示之化合物之構成單元(A-2-2)構成之群組中之至少1者。<2> The polyimide resin as described in <1> above, wherein the ratio of the constituent unit (B-1) in the constituent unit B is 5 to 80 mol%, and the ratio of the constituent unit (B-2) in the constituent unit B is 20 to 95 mol%. <3> The polyimide resin as described in <1> or <2>, wherein the molar ratio [(B-1)/(B-2)] of the constituent unit (B-1) to the constituent unit (B-2) in the constituent unit B is 5/95 to 80/20. <4> A polyimide resin as described in any one of <1> to <3> above, wherein the constituent unit A further comprises at least one selected from the group consisting of a constituent unit (A-2-1) derived from a compound represented by the following formula (a-2-1) and a constituent unit (A-2-2) derived from a compound represented by the following formula (a-2-2).
[化2] [Chemistry 2]
<5>如上述<1>~<4>任一項之聚醯亞胺樹脂,其中,構成單元B更包含選自於由來自下式(b-3-1)表示之化合物之構成單元(B-3-1)、及來自下式(b-3-2)表示之化合物之構成單元(B-3-2)構成之群組中之至少1者。<5> A polyimide resin as described in any one of <1> to <4> above, wherein the constituent unit B further comprises at least one selected from the group consisting of a constituent unit (B-3-1) derived from a compound represented by the following formula (b-3-1) and a constituent unit (B-3-2) derived from a compound represented by the following formula (b-3-2).
[化3] (式(b-3-1)中,Z1 及Z2 各自獨立地表示也可含有氧原子之2價脂肪族基、或2價芳香族基,R1 及R2 各自獨立地表示1價芳香族基或1價脂肪族基,R3 及R4 各自獨立地表示1價脂肪族基,R5 及R6 各自獨立地表示1價脂肪族基或1價芳香族基,m及n各自獨立地表示1以上之整數,m與n的和為2~1000之整數。惟,R1 及R2 之至少一者表示1價芳香族基。)[Chemistry 3] (In formula (b-3-1), Z1 and Z2 each independently represent a divalent aliphatic group which may contain an oxygen atom, or a divalent aromatic group, R1 and R2 each independently represent a monovalent aromatic group or a monovalent aliphatic group, R3 and R4 each independently represent a monovalent aliphatic group, R5 and R6 each independently represent a monovalent aliphatic group or a monovalent aromatic group, m and n each independently represent an integer greater than 1, and the sum of m and n is an integer of 2 to 1000. However, at least one of R1 and R2 represents a monovalent aromatic group.)
<6>如上述<5>之聚醯亞胺樹脂,其中,該式(b-3-1)中之R1 及R2 係苯基。 <7>一種聚醯亞胺清漆,係將如上述<1>~<6>中任一項之聚醯亞胺樹脂溶解於有機溶劑而成。 <8>一種聚醯亞胺薄膜,含有如上述<1>~<6>中任一項之聚醯亞胺樹脂。 [發明之效果]<6> The polyimide resin as described in <5> above, wherein R1 and R2 in the formula (b-3-1) are phenyl groups. <7> A polyimide varnish obtained by dissolving the polyimide resin as described in any one of <1> to <6> above in an organic solvent. <8> A polyimide film comprising the polyimide resin as described in any one of <1> to <6> above. [Effects of the Invention]
依據本發明,可提供可形成光學等向性優異、此外柔軟性及耐藥品性亦優異的薄膜之聚醯亞胺樹脂、聚醯亞胺清漆及聚醯亞胺薄膜。According to the present invention, a polyimide resin, a polyimide varnish and a polyimide film can be provided which can form a film having excellent optical isotropy, and also excellent flexibility and chemical resistance.
[聚醯亞胺樹脂] 本發明之聚醯亞胺樹脂具有來自四羧酸二酐之構成單元A及來自二胺之構成單元B,構成單元A包含來自下式(a-1)表示之化合物之構成單元(A-1)、構成單元B包含來自下式(b-1)表示之化合物之構成單元(B-1)、及來自下式(b-2)表示之化合物之構成單元(B-2)。[Polyimide resin] The polyimide resin of the present invention has a constituent unit A derived from tetracarboxylic dianhydride and a constituent unit B derived from a diamine, wherein the constituent unit A includes a constituent unit (A-1) derived from a compound represented by the following formula (a-1), and the constituent unit B includes a constituent unit (B-1) derived from a compound represented by the following formula (b-1), and a constituent unit (B-2) derived from a compound represented by the following formula (b-2).
[化4] [Chemistry 4]
又,本發明之聚醯亞胺樹脂可維持光學等向性同時柔軟性及耐藥品性優異的原因並不確定,據認為係由於本發明之聚醯亞胺樹脂以適當的比率具有脂環結構、醚骨架及芳香族,因此可維持光學等向性同時柔軟性及耐藥品性優異。其中,由於其結構中包含來自具有脂環族結構之小的二胺之構成單元,因而醯亞胺基濃度變高,可維持光學等向性,同時耐藥品性非常優異。The reason why the polyimide resin of the present invention can maintain optical isotropy and have excellent flexibility and chemical resistance is not certain, but it is considered that the polyimide resin of the present invention has an alicyclic structure, an ether skeleton and an aromatic group at an appropriate ratio, so it can maintain optical isotropy and have excellent flexibility and chemical resistance. Among them, since the structure contains a small diamine-containing diamine unit, the imide group concentration becomes high, and the optical isotropy can be maintained, and the chemical resistance is very excellent.
<構成單元A> 構成單元A係聚醯亞胺樹脂中所佔之來自四羧酸二酐之構成單元。 構成單元A包含來自下式(a-1)表示之化合物之構成單元(A-1)。<Constituent unit A> Constituent unit A is a constituent unit derived from tetracarboxylic dianhydride contained in the polyimide resin. Constituent unit A includes a constituent unit (A-1) derived from a compound represented by the following formula (a-1).
[化5] [Chemistry 5]
式(a-1)表示之化合物係4,4’-氧二鄰苯二甲酸酐。 藉由構成單元A包含構成單元(A-1),可使薄膜之耐藥品性及靭性改善。The compound represented by formula (a-1) is 4,4'-oxydiphthalic anhydride. When constituent unit A includes constituent unit (A-1), the chemical resistance and toughness of the film can be improved.
構成單元A中之構成單元(A-1)的比率,宜為40莫耳%以上,更宜為50莫耳%以上,又更宜為55莫耳%以上,又更宜為60莫耳%以上。考量薄膜之靭性之觀點,又更宜為70莫耳%以上。構成單元(A-1)之比率之上限值無特別限定,亦即為100莫耳%。構成單元A亦可僅由構成單元(A-1)構成。The ratio of the constituent unit (A-1) in the constituent unit A is preferably 40 mol% or more, more preferably 50 mol% or more, more preferably 55 mol% or more, and more preferably 60 mol% or more. In view of the toughness of the film, it is more preferably 70 mol% or more. The upper limit of the ratio of the constituent unit (A-1) is not particularly limited, that is, 100 mol%. The constituent unit A may also be composed of only the constituent unit (A-1).
構成單元A亦可包含構成單元(A-1)以外之構成單元。 考量耐熱性之觀點,構成單元A除了構成單元(A-1)以外,宜更包含係選自於由來自下式(a-2-1)表示之化合物之構成單元(A-2-1)、及來自下式(a-2-2)表示之化合物之構成單元(A-2-2)構成之群組中之至少1者的構成單元(A-2)。亦即,構成單元(A-2-1)及構成單元(A-2-2)統稱為構成單元(A-2)。Constituent unit A may also include constituent units other than constituent unit (A-1). Considering the heat resistance, constituent unit A should preferably include, in addition to constituent unit (A-1), at least one constituent unit (A-2) selected from the group consisting of constituent unit (A-2-1) derived from a compound represented by the following formula (a-2-1) and constituent unit (A-2-2) derived from a compound represented by the following formula (a-2-2). That is, constituent unit (A-2-1) and constituent unit (A-2-2) are collectively referred to as constituent unit (A-2).
[化6] [Chemistry 6]
式(a-2-1)表示之化合物係1,2,4,5-環己烷四甲酸二酐。 式(a-2-2)表示之化合物係降莰烷-2-螺-α-環戊酮-α’-螺-2’’-降莰烷-5,5’’,6,6’’-四甲酸二酐。 考量改善耐熱性及耐藥品性及光學等向性之觀點,構成單元A中之構成單元(A-2)之比率,宜為10~50莫耳%,更宜為15~45莫耳%,又更宜為20~40莫耳%。 構成單元A包含構成單元(A-2)時,考量改善耐熱性及耐藥品性及光學等向性之觀點,構成單元A中之構成單元(A-1)與構成單元(A-2)之莫耳比[(A-1)/(A-2)],宜為50/50~90/10,更宜為55/45~85/15,又更宜為60/40~80/20。The compound represented by formula (a-2-1) is 1,2,4,5-cyclohexanetetracarboxylic acid dianhydride. The compound represented by formula (a-2-2) is norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic acid dianhydride. From the viewpoint of improving heat resistance, chemical resistance and optical isotropy, the ratio of the constituent unit (A-2) in the constituent unit A is preferably 10 to 50 mol%, more preferably 15 to 45 mol%, and more preferably 20 to 40 mol%. When the constituent unit A includes the constituent unit (A-2), the molar ratio [(A-1)/(A-2)] of the constituent unit (A-1) to the constituent unit (A-2) in the constituent unit A is preferably 50/50 to 90/10, more preferably 55/45 to 85/15, and even more preferably 60/40 to 80/20, from the viewpoint of improving heat resistance, chemical resistance and optical isotropy.
構成單元A亦可包含除了構成單元(A-1)及構成單元(A-2)以外之構成單元。就提供如此之構成單元的四羧酸二酐而言,並無特別限定,可列舉:均苯四甲酸二酐、3,3’,4,4’-聯苯四甲酸二酐、9,9’-雙(3,4-二羧基苯基)茀二酐、及4,4’-(六氟異亞丙基)二鄰苯二甲酸酐等芳香族四羧酸二酐(惟,排除式(a-1)表示之化合物);1,2,3,4-環丁烷四甲酸二酐等脂環族四羧酸二酐(惟,排除式(a-2-1)及式(a-2-2)表示之化合物);以及1,2,3,4-丁烷四甲酸二酐等脂肪族四羧酸二酐。 又,本說明書中,芳香族四羧酸二酐係指含有1個以上之芳香環之四羧酸二酐,脂環族四羧酸二酐係指含有1個以上之脂環且不含芳香環之四羧酸二酐,脂肪族四羧酸二酐係指不含芳香環亦不含脂環之四羧酸二酐。 任意地包含於構成單元A中之構成單元可為1種,亦可為2種以上。Constituent unit A may also include constituent units other than constituent units (A-1) and constituent units (A-2). There is no particular limitation on the tetracarboxylic dianhydride that provides such a constituent unit, and examples thereof include aromatic tetracarboxylic dianhydrides such as pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 9,9'-bis(3,4-dicarboxyphenyl)fluorene dianhydride, and 4,4'-(hexafluoroisopropylidene)diphthalic anhydride (but excluding compounds represented by formula (a-1)); alicyclic tetracarboxylic dianhydrides such as 1,2,3,4-cyclobutanetetracarboxylic dianhydride (but excluding compounds represented by formula (a-2-1) and formula (a-2-2)); and aliphatic tetracarboxylic dianhydrides such as 1,2,3,4-butanetetracarboxylic dianhydride. In addition, in this specification, aromatic tetracarboxylic dianhydride refers to a tetracarboxylic dianhydride containing one or more aromatic rings, alicyclic tetracarboxylic dianhydride refers to a tetracarboxylic dianhydride containing one or more alicyclic rings and no aromatic ring, and aliphatic tetracarboxylic dianhydride refers to a tetracarboxylic dianhydride containing neither an aromatic ring nor an alicyclic ring. The constituent unit arbitrarily included in the constituent unit A may be one type or two or more types.
<構成單元B> 構成單元B係聚醯亞胺樹脂中所佔之來自二胺之構成單元,包含來自下式(b-1)表示之化合物之構成單元(B-1)、及來自下式(b-2)表示之化合物之構成單元(B-2)。<Constituent unit B> Constituent unit B is a constituent unit derived from diamine that accounts for a large proportion of the polyimide resin, and includes a constituent unit (B-1) derived from a compound represented by the following formula (b-1) and a constituent unit (B-2) derived from a compound represented by the following formula (b-2).
[化7] 式(b-1)表示之化合物係4,4’-二胺基-2,2’-雙三氟甲基二苯基醚。 藉由構成單元B包含構成單元(B-1),可改善薄膜的光學等向性及無色透明性。[Chemistry 7] The compound represented by formula (b-1) is 4,4'-diamino-2,2'-bis(trifluoromethyl)diphenyl ether. When constituent unit B includes constituent unit (B-1), the optical isotropy and colorless transparency of the film can be improved.
式(b-2)表示之化合物係雙(胺基甲基)環己烷,就其具體例而言,可列舉下式(b-2a)表示之1,3-雙(胺基甲基)環己烷、下式(b-2b)表示之1,4-雙(胺基甲基)環己烷。The compound represented by formula (b-2) is bis(aminomethyl)cyclohexane. Specific examples thereof include 1,3-bis(aminomethyl)cyclohexane represented by formula (b-2a) and 1,4-bis(aminomethyl)cyclohexane represented by formula (b-2b).
[化8] 考量耐有機溶劑性、耐熱性之觀點,式(b-2)表示之化合物之順:反比宜為0:100~80:20,更宜為0.1:99.9~70:30,又更宜為0.5:99.5~60:40,又更宜為1:99~20:80。 藉由構成單元B包含構成單元(B-2),可改善薄膜之光學等向性、柔軟性及耐藥品性。[Chemistry 8] Considering the resistance to organic solvents and heat resistance, the cis:inverse ratio of the compound represented by formula (b-2) is preferably 0:100 to 80:20, more preferably 0.1:99.9 to 70:30, more preferably 0.5:99.5 to 60:40, and more preferably 1:99 to 20:80. By including constituent unit (B-2) in constituent unit B, the optical isotropy, flexibility and chemical resistance of the film can be improved.
構成單元B中之構成單元(B-1)的比率宜為5~80莫耳%,更宜為10~70莫耳%,又更宜為30~60莫耳%。 構成單元B中之構成單元(B-2)的比率宜為20~95莫耳%,更宜為30~90莫耳%,又更宜為40~70莫耳%。 構成單元B中之構成單元(B-1)及(B-2)之合計比率宜為50莫耳%以上,更宜為70莫耳%以上,又更宜為90莫耳%以上。構成單元(B-1)及(B-2)之合計比率的上限值並無特別限定,亦即100莫耳%。構成單元B亦可僅由構成單元(B-1)與構成單元(B-2)構成。 考量改善光學等向性及耐藥品性之觀點,構成單元B中之構成單元(B-1)與構成單元(B-2)之莫耳比[(B-1)/(B-2)]宜為5/95~80/20,更宜為10/90~70/30,又更宜為30/70~60/40The ratio of the constituent unit (B-1) in the constituent unit B is preferably 5 to 80 mol%, more preferably 10 to 70 mol%, and more preferably 30 to 60 mol%. The ratio of the constituent unit (B-2) in the constituent unit B is preferably 20 to 95 mol%, more preferably 30 to 90 mol%, and more preferably 40 to 70 mol%. The total ratio of the constituent units (B-1) and (B-2) in the constituent unit B is preferably 50 mol% or more, more preferably 70 mol% or more, and more preferably 90 mol% or more. The upper limit of the total ratio of the constituent units (B-1) and (B-2) is not particularly limited, that is, 100 mol%. The constituent unit B may also be composed of only the constituent unit (B-1) and the constituent unit (B-2). From the viewpoint of improving optical isotropy and drug resistance, the molar ratio [(B-1)/(B-2)] of the constituent unit (B-1) to the constituent unit (B-2) in the constituent unit B is preferably 5/95 to 80/20, more preferably 10/90 to 70/30, and even more preferably 30/70 to 60/40.
構成單元B亦可包含除構成單元(B-1)及(B-2)以外之構成單元。 構成單元B除了構成單元(B-1)及(B-2)以外,宜更包含係選自於由來自下式(b-3-1)表示之化合物之構成單元(B-3-1)、來自下式(b-3-2)表示之化合物之構成單元(B-3-2)構成之群組中之至少1者的構成單元(B-3)。亦即,構成單元(B-3-1)及構成單元(B-3-2)統稱為構成單元(B-3)。其中,構成單元B宜更包含來自下式(b-3-1)表示之化合物之構成單元(B-3-1)。Constituent unit B may also include constituent units other than constituent units (B-1) and (B-2). In addition to constituent units (B-1) and (B-2), constituent unit B preferably further includes a constituent unit (B-3) selected from at least one of the group consisting of constituent units (B-3-1) derived from a compound represented by the following formula (b-3-1) and constituent units (B-3-2) derived from a compound represented by the following formula (b-3-2). That is, constituent unit (B-3-1) and constituent unit (B-3-2) are collectively referred to as constituent unit (B-3). Among them, constituent unit B preferably further includes a constituent unit (B-3-1) derived from a compound represented by the following formula (b-3-1).
[化9] [Chemistry 9]
式(b-3-1)中,Z1 及Z2 各自獨立地表示也可含有氧原子之2價脂肪族基、或2價芳香族基,R1 及R2 各自獨立地表示1價芳香族基或1價脂肪族基,R3 及R4 各自獨立地表示1價脂肪族基,R5 及R6 各自獨立地表示1價脂肪族基或1價芳香族基,m及n各自獨立地表示1以上之整數,m與n的和為2~1000之整數。惟,R1 及R2 之至少一者表示1價芳香族基。 又,式(b-3-1)中,[ ]內記載之2個以上的相異重複單元,與[ ]之順序無關,亦可分別以無規、交替或嵌段中之任一型態及順序來重複。In formula (b-3-1), Z1 and Z2 each independently represent a divalent aliphatic group which may contain an oxygen atom, or a divalent aromatic group, R1 and R2 each independently represent a monovalent aromatic group or a monovalent aliphatic group, R3 and R4 each independently represent a monovalent aliphatic group, R5 and R6 each independently represent a monovalent aliphatic group or a monovalent aromatic group, m and n each independently represent an integer greater than 1, and the sum of m and n is an integer of 2 to 1000. However, at least one of R1 and R2 represents a monovalent aromatic group. In formula (b-3-1), the two or more different repeating units described in [ ] are irrelevant to the order of [ ], and may be repeated in any form and order of random, alternating or block.
式(b-3-1)中,Z1 及Z2 中之2價脂肪族基或2價芳香族基亦可經氟原子所取代。就2價脂肪族基而言,可列舉碳數1~20之2價的飽和或不飽和脂肪族基、含有氧原子之脂肪族基。2價脂肪族基的碳數宜為3~20。 就2價飽和脂肪族基而言可列舉碳數1~20的伸烷基,例如:亞甲基、伸乙基、伸丙基、三亞甲基、四亞甲基、六亞甲基、八亞甲基、十亞甲基、十二亞甲基等。 就2價不飽和脂肪族基而言,可列舉碳數2~20的伸烯基,例如:伸乙烯基、伸丙烯基、末端具有不飽和雙鍵之伸烷基。 就含有氧原子之脂肪族基而言,可列舉伸烷氧基、具有醚鍵之脂肪族基。 就伸烷氧基而言,可例示伸丙基氧基、三亞甲基氧基。 就2價芳香族基而言可例示碳數6~20之伸芳基、碳數7~20之伸芳烷基等。就Z1 及Z2 中之碳數6~20之伸芳基之具體例而言,可列舉:鄰伸苯基、間伸苯基、對伸苯基、4,4’-伸聯苯基、2,6-伸萘基等。 就Z1 及Z2 而言,尤宜為三亞甲基、對伸苯基,為三亞甲基更佳。In formula (b-3-1), the divalent aliphatic group or divalent aromatic group in Z1 and Z2 may be substituted by a fluorine atom. As the divalent aliphatic group, there can be mentioned a divalent saturated or unsaturated aliphatic group having 1 to 20 carbon atoms, and an aliphatic group containing an oxygen atom. The carbon number of the divalent aliphatic group is preferably 3 to 20. As the divalent saturated aliphatic group, there can be mentioned an alkylene group having 1 to 20 carbon atoms, such as methylene, ethylene, propylene, trimethylene, tetramethylene, hexamethylene, octamethylene, decamethylene, dodecamethylene, etc. As the divalent unsaturated aliphatic group, there can be mentioned an alkenylene group having 2 to 20 carbon atoms, such as vinylene, propenylene, and an alkylene group having an unsaturated double bond at the end. As the aliphatic group containing an oxygen atom, an alkoxy group and an aliphatic group having an ether bond can be listed. As the alkoxy group, a propyloxy group and a trimethyleneoxy group can be listed. As the divalent aromatic group, an aryl group having 6 to 20 carbon atoms and an arylalkyl group having 7 to 20 carbon atoms can be listed. As specific examples of the aryl group having 6 to 20 carbon atoms in Z1 and Z2 , o-phenylene, m-phenylene, p-phenylene, 4,4'-biphenylene, 2,6-naphthylene and the like can be listed. As for Z1 and Z2 , trimethylene and p-phenylene are particularly preferred, and trimethylene is more preferred.
式(b-3-1)中,就R1 ~R6 中之1價脂肪族基而言,可列舉1價的飽和或不飽和脂肪族基。就1價飽和脂肪族基而言可列舉碳數1~22之烷基,例如可例示甲基、乙基、丙基等。就1價不飽和脂肪族基而言可列舉碳數2~22之烯基,例如乙烯基、丙烯基等。這些基亦可經氟原子所取代。 就式(b-3-1)之R1 、R2 、R5 及R6 中之1價芳香族基而言,可例示:碳數6~20之芳基、碳數7~30且經烷基所取代之芳基、碳數7~30之芳烷基等。就1價芳香族基而言,宜為芳基、更宜為苯基。 R1 及R2 之至少一者表示1價芳香族基,宜為R1 及R2 皆為1價芳香族基,更宜為R1 及R2 皆為苯基。 就R3 及R4 而言,宜為碳數1~6之烷基,更宜為甲基。 就R5 及R6 而言,宜為1價脂肪族基,更宜為甲基。In formula (b-3-1), as the monovalent aliphatic group in R 1 to R 6 , a monovalent saturated or unsaturated aliphatic group can be mentioned. As the monovalent saturated aliphatic group, an alkyl group having 1 to 22 carbon atoms can be mentioned, for example, a methyl group, an ethyl group, a propyl group, etc. As the monovalent unsaturated aliphatic group, an alkenyl group having 2 to 22 carbon atoms can be mentioned, for example, a vinyl group, a propenyl group, etc. These groups may also be substituted with a fluorine atom. As the monovalent aromatic group in R 1 , R 2 , R 5 and R 6 in formula (b-3-1), an aryl group having 6 to 20 carbon atoms, an aryl group having 7 to 30 carbon atoms and substituted with an alkyl group, an aralkyl group having 7 to 30 carbon atoms, etc. can be mentioned. As the monovalent aromatic group, an aryl group is preferred, and a phenyl group is more preferred. At least one of R1 and R2 represents a monovalent aromatic group, preferably both R1 and R2 are monovalent aromatic groups, more preferably both R1 and R2 are phenyl groups. R3 and R4 are preferably alkyl groups having 1 to 6 carbon atoms, more preferably methyl groups. R5 and R6 are preferably monovalent aliphatic groups, more preferably methyl groups.
如上,式(b-3-1)表示之化合物之中,宜為下式(b-3-11)表示之化合物。As described above, among the compounds represented by the formula (b-3-1), the compounds represented by the following formula (b-3-11) are preferred.
[化10] (式(b-3-11)中,m及n分別與式(b-3-1)之m及n為同義,理想的範圍亦相同。)[Chemistry 10] (In formula (b-3-11), m and n are synonymous with m and n in formula (b-3-1), and their ideal ranges are also the same.)
式(b-3-1)及式(b-3-11)中之m係表示鍵結有1價之至少1個的芳香族基之矽氧烷單元的重複數,式(b-3-1)及式(b-3-11)中之n係表示鍵結有1價脂肪族基之矽氧烷單元的重複數。 式(b-3-1)及式(b-3-11)中之m及n各自獨立地表示1以上之整數,m及n之和(m+n)係表示2~1000之整數。m及n之和宜為3~500之整數,更宜為3~100,又更宜為3~50之整數。 式(b-3-1)及式(b-3-11)中之m/n的比宜為5/95~50/50,更宜為10/90~40/60,又更宜為20/80~30/70。In formula (b-3-1) and formula (b-3-11), m represents the number of repetitions of siloxane units bonded to at least one monovalent aromatic group, and in formula (b-3-1) and formula (b-3-11), n represents the number of repetitions of siloxane units bonded to a monovalent aliphatic group. In formula (b-3-1) and formula (b-3-11), m and n each independently represent an integer greater than 1, and the sum of m and n (m+n) represents an integer of 2 to 1000. The sum of m and n is preferably an integer of 3 to 500, more preferably 3 to 100, and even more preferably 3 to 50. The ratio of m/n in formula (b-3-1) and formula (b-3-11) is preferably 5/95 to 50/50, more preferably 10/90 to 40/60, and even more preferably 20/80 to 30/70.
式(b-3-1)表示之化合物之官能基當量(胺當量)宜為150~5,000g/mol,更宜為400~4,000g/mol,又更宜為500~3,000g/mol。 又,官能基當量係指每1莫耳官能基(胺基)之式(b-3-1)表示之化合物之質量。The functional group equivalent (amine equivalent) of the compound represented by formula (b-3-1) is preferably 150 to 5,000 g/mol, more preferably 400 to 4,000 g/mol, and even more preferably 500 to 3,000 g/mol. In addition, the functional group equivalent refers to the mass of the compound represented by formula (b-3-1) per 1 mol of functional group (amine group).
式(b-3-1)表示之化合物之中,就可作為市售品而獲得者而言,可列舉信越化學工業股份有限公司製之「X-22-9409」、「X-22-1660B」、「X-22-161A」、「X-22-161B」等。Among the compounds represented by the formula (b-3-1), those available as commercial products include "X-22-9409", "X-22-1660B", "X-22-161A", and "X-22-161B" manufactured by Shin-Etsu Chemical Co., Ltd.
藉由構成單元B包含構成單元(B-3-1),可改善薄膜之無色透明性、光學等向性及柔軟性。When the constituent unit B includes the constituent unit (B-3-1), the colorless transparency, optical isotropy and flexibility of the film can be improved.
式(b-3-2)係4,4’-二胺基二苯基碸。藉由構成單元B包含構成單元(B-3-2),可改善薄膜之無色透明性、靭性及耐藥品性。Formula (b-3-2) is 4,4'-diaminodiphenylsulfone. When the constituent unit B includes the constituent unit (B-3-2), the colorless transparency, toughness and chemical resistance of the film can be improved.
構成單元B包含構成單元(B-1)、構成單元(B-2)及構成單元(B-3)時,構成單元B中之構成單元(B-1)及構成單元(B-2)之合計比率宜為70莫耳%以上,更宜為80莫耳%以上,又更宜為90莫耳%以上,構成單元B中之構成單元(B-3)之比率宜為0.1~30莫耳%,更宜為1~25莫耳%,又更宜為2~20莫耳%,又更宜為3~15莫耳%。 構成單元B中之構成單元(B-1)、構成單元(B-2)及構成單元(B-3)之合計比率宜為80莫耳%以上,更宜為90莫耳%以上,尤宜為99莫耳%以上。構成單元(B-1)、構成單元(B-2)及構成單元(B-3)之合計比率之上限值並無特別限定,亦即為100莫耳%。構成單元B亦可僅由構成單元(B-1)、構成單元(B-2)及構成單元(B-3)構成。When constituent unit B includes constituent unit (B-1), constituent unit (B-2) and constituent unit (B-3), the total ratio of constituent unit (B-1) and constituent unit (B-2) in constituent unit B is preferably 70 mol% or more, more preferably 80 mol% or more, and more preferably 90 mol% or more, and the ratio of constituent unit (B-3) in constituent unit B is preferably 0.1 to 30 mol%, more preferably 1 to 25 mol%, more preferably 2 to 20 mol%, and more preferably 3 to 15 mol%. The total ratio of constituent unit (B-1), constituent unit (B-2) and constituent unit (B-3) in constituent unit B is preferably 80 mol% or more, more preferably 90 mol% or more, and particularly preferably 99 mol% or more. The upper limit of the total ratio of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3) is not particularly limited, that is, 100 mol%. The constituent unit B may also be composed only of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3).
構成單元B包含構成單元(B-1)、構成單元(B-2)及構成單元(B-3-1)時,構成單元B中之構成單元(B-1)及構成單元(B-2)之合計比率宜為70莫耳%以上,更宜為80莫耳%以上,又更宜為90莫耳%以上,構成單元B中之構成單元(B-3-1)之比率宜為0.1~30莫耳%,更宜為1~25莫耳%,又更宜為2~20莫耳%,又更宜為3~15莫耳%,又更宜為3~10莫耳%。 構成單元B中之構成單元(B-1)、構成單元(B-2)及構成單元(B-3-1)之合計比率宜為80莫耳%以上,更宜為90莫耳%以上,尤宜為99莫耳%以上。構成單元(B-1)、構成單元(B-2)及構成單元(B-3-1)之合計比率之上限值並無特別限定,亦即100莫耳%。構成單元B亦可僅由構成單元(B-1)、構成單元(B-2)及構成單元(B-3-1)構成。When constituent unit B includes constituent unit (B-1), constituent unit (B-2) and constituent unit (B-3-1), the total ratio of constituent unit (B-1) and constituent unit (B-2) in constituent unit B is preferably 70 mol% or more, more preferably 80 mol% or more, and more preferably 90 mol% or more, and the ratio of constituent unit (B-3-1) in constituent unit B is preferably 0.1 to 30 mol%, more preferably 1 to 25 mol%, more preferably 2 to 20 mol%, more preferably 3 to 15 mol%, and more preferably 3 to 10 mol%. The total ratio of constituent unit (B-1), constituent unit (B-2) and constituent unit (B-3-1) in constituent unit B is preferably 80 mol% or more, more preferably 90 mol% or more, and particularly preferably 99 mol% or more. The upper limit of the total ratio of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3-1) is not particularly limited, that is, 100 mol%. The constituent unit B may also be composed only of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3-1).
構成單元B包含構成單元(B-1)、構成單元(B-2)及構成單元(B-3-2)時,構成單元B中之構成單元(B-1)及構成單元(B-2)之合計比率宜為70莫耳%以上,更宜為80莫耳%以上,又更宜為90莫耳%以上,考量薄膜之無色透明性、靭性及耐藥品性之觀點,構成單元B中之構成單元(B-3-2)之比率宜為2~30莫耳%,更宜為3~30莫耳%,又更宜為10~30莫耳%,又更宜為15~30莫耳%,又更宜為15~25莫耳%。 構成單元B中之構成單元(B-1)、構成單元(B-2)及構成單元(B-3-2)之合計比率宜為80莫耳%以上,更宜為90莫耳%以上,尤宜為99莫耳%以上。構成單元(B-1)、構成單元(B-2)及構成單元(B-3-2)之合計比率之上限值並無特別限定,亦即100莫耳%。構成單元B亦可僅由構成單元(B-1)、構成單元(B-2)及構成單元(B-3-2)構成。When constituent unit B includes constituent unit (B-1), constituent unit (B-2) and constituent unit (B-3-2), the total ratio of constituent unit (B-1) and constituent unit (B-2) in constituent unit B is preferably 70 mol% or more, more preferably 80 mol% or more, and more preferably 90 mol% or more. Considering the colorless transparency, toughness and chemical resistance of the film, the ratio of constituent unit (B-3-2) in constituent unit B is preferably 2-30 mol%, more preferably 3-30 mol%, more preferably 10-30 mol%, more preferably 15-30 mol%, and more preferably 15-25 mol%. The total ratio of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3-2) in the constituent unit B is preferably 80 mol% or more, more preferably 90 mol% or more, and particularly preferably 99 mol% or more. The upper limit of the total ratio of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3-2) is not particularly limited, that is, 100 mol%. The constituent unit B may also be composed only of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3-2).
構成單元(B-3)可僅為構成單元(B-3-1),亦可僅為構成單元(B-3-2),亦可為構成單元(B-3-1)與構成單元(B-3-2)之組合。The constituent unit (B-3) may be only the constituent unit (B-3-1), only the constituent unit (B-3-2), or a combination of the constituent unit (B-3-1) and the constituent unit (B-3-2).
構成單元B亦可包含除構成單元(B-1)、(B-2)及(B-3)以外之構成單元。就如此之提供構成單元之二胺而言,並無特別限定,可列舉:1,4-伸苯基二胺、對苯二甲胺、1,5-二胺基萘、2,2’-二甲基聯苯-4,4’-二胺、4,4’-二胺基二苯基醚、4,4’-二胺基二苯基甲烷、2,2-雙(4-胺基苯基)六氟丙烷、4,4’-二胺基苯甲醯苯胺、1-(4-胺基苯基)-2,3-二氫-1,3,3-三甲基-1H-茚-5-胺、α,α’-雙(4-胺基苯基)-1,4-二異丙苯、N,N’-雙(4-胺基苯基)對苯二甲醯胺、4,4’-雙(4-胺基苯氧基)聯苯、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙(4-(4-胺基苯氧基)苯基)六氟丙烷、及9,9-雙(4-胺基苯基)茀等芳香族二胺(惟,排除式(b-1)表示之化合物、式(b-3-1)表示之化合物及式(b-3-2)表示之化合物);脂環族二胺(惟,排除式(b-2)表示之化合物);以及乙二胺及六亞甲基二胺等脂肪族二胺。 又,本說明書中,芳香族二胺係指含有1個以上之芳香環之二胺,脂環族二胺係指含有1個以上之脂環且不含芳香環之二胺,脂肪族二胺係指不含芳香環亦不含脂環之二胺。 任意地包含於構成單元B之除構成單元(B-1)、(B-2)及(B-3)以外的構成單元,可為1種亦可為2種以上。Constituent unit B may also include constituent units other than constituent units (B-1), (B-2) and (B-3). The diamines that provide the constituent units are not particularly limited, and examples thereof include: 1,4-phenylenediamine, p-phenylenediamine, 1,5-diaminonaphthalene, 2,2'-dimethylbiphenyl-4,4'-diamine, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 2,2-bis(4-aminophenyl)hexafluoropropane, 4,4'-diaminobenzanilide, 1-(4-aminophenyl)-2,3-dihydro-1,3,3-trimethyl-1H-indene-5-amine, α,α'-bis(4-aminophenyl)-1,4-diisopropylbenzene, N,N'- Aromatic diamines such as bis(4-aminophenyl)terephthalamide, 4,4'-bis(4-aminophenoxy)biphenyl, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis(4-(4-aminophenoxy)phenyl)hexafluoropropane, and 9,9-bis(4-aminophenyl)fluorene (but excluding compounds represented by formula (b-1), compounds represented by formula (b-3-1), and compounds represented by formula (b-3-2)); alicyclic diamines (but excluding compounds represented by formula (b-2)); and aliphatic diamines such as ethylenediamine and hexamethylenediamine. In this specification, aromatic diamine refers to a diamine containing one or more aromatic rings, alicyclic diamine refers to a diamine containing one or more alicyclic rings and no aromatic ring, and aliphatic diamine refers to a diamine containing neither an aromatic ring nor an alicyclic ring. The constituent units arbitrarily included in the constituent unit B other than the constituent units (B-1), (B-2) and (B-3) may be one or more.
<聚醯亞胺樹脂之特性> 考量獲得之聚醯亞胺薄膜之機械強度之觀點,聚醯亞胺樹脂之數量平均分子量宜為5,000~300,000。又,聚醯亞胺樹脂之數量平均分子量例如可利用凝膠過濾層析測定所得之標準聚甲基丙烯酸甲酯(PMMA)換算值來求得。<Characteristics of polyimide resin> From the perspective of the mechanical strength of the obtained polyimide film, the number average molecular weight of the polyimide resin is preferably 5,000 to 300,000. The number average molecular weight of the polyimide resin can be obtained, for example, by using the standard polymethyl methacrylate (PMMA) conversion value obtained by gel filtration analysis.
聚醯亞胺樹脂亦可包含除聚醯亞胺鏈(構成單元A與構成單元B經醯亞胺鍵結而成的結構)以外的結構。就聚醯亞胺樹脂中可包含之除聚醯亞胺鏈以外的結構而言,可舉例如包含醯胺鍵的結構等。 聚醯亞胺樹脂宜包含聚醯亞胺鏈(構成單元A與構成單元B經醯亞胺鍵結而成的結構)作為主要結構。因此,聚醯亞胺樹脂中所佔的聚醯亞胺鏈之比率宜為50質量%以上,更宜為70質量%以上,又更宜為90質量%以上,尤宜為99質量%以上。The polyimide resin may also contain structures other than the polyimide chain (a structure formed by imide bonds between constituent units A and B). As for structures other than the polyimide chain that may be contained in the polyimide resin, for example, structures containing amide bonds may be cited. The polyimide resin preferably contains a polyimide chain (a structure formed by imide bonds between constituent units A and B) as a main structure. Therefore, the ratio of the polyimide chain in the polyimide resin should be 50% by mass or more, more preferably 70% by mass or more, more preferably 90% by mass or more, and particularly preferably 99% by mass or more.
含有上述聚醯亞胺樹脂之本發明之聚醯亞胺樹脂組成物,可形成無色透明性、光學等向性及耐藥品性優異的薄膜,該薄膜所具有的理想的物性值如以下所述。The polyimide resin composition of the present invention containing the above-mentioned polyimide resin can form a film having colorless transparency, optical isotropy and excellent chemical resistance. The ideal physical property values of the film are as follows.
全光線透射率在製成厚度10μm之薄膜時,宜為88%以上,更宜為88.5%以上,又更宜為89%以上。 黃色指數(YI)在製成厚度10μm之薄膜時,宜為4.5以下,更宜為3.0以下,又更宜為2.0以下,又更宜為1.5以下。 厚度相位差(Rth)之絕對值在製成厚度10μm之薄膜時,宜為70nm以下,更宜為60nm以下,又更宜為50nm以下。When a film with a thickness of 10 μm is made, the total light transmittance is preferably 88% or more, more preferably 88.5% or more, and more preferably 89% or more. When a film with a thickness of 10 μm is made, the yellowness index (YI) is preferably 4.5 or less, more preferably 3.0 or less, more preferably 2.0 or less, and more preferably 1.5 or less. When a film with a thickness of 10 μm is made, the absolute value of the thickness retardation (Rth) is preferably 70 nm or less, more preferably 60 nm or less, and more preferably 50 nm or less.
又,使用上述聚醯亞胺樹脂而可形成之薄膜,機械特性及耐熱性皆良好,且具有如以下之理想的物性值。 使用本發明之聚醯亞胺樹脂而可形成之薄膜,機械特性及耐熱性皆良好,且具有如以下之理想的物性值。 拉伸強度宜為70MPa以上,更宜為80MPa以上,又更宜為90MPa以上。 拉伸彈性係數宜為2.0GPa以上,更宜為2.5GPa以上,又更宜為3.0GPa以上。 斷裂伸長率宜為8%以上,更宜為10%以上,又更宜為15%以上。 玻璃轉移溫度(Tg)宜為200℃以上,更宜為230℃以上,又更宜為250℃以上。 又,本發明中之上述物性值,具體而言可利用實施例記載之方法進行測定。In addition, the film formed by using the above-mentioned polyimide resin has good mechanical properties and heat resistance, and has the following ideal physical property values. The film formed by using the polyimide resin of the present invention has good mechanical properties and heat resistance, and has the following ideal physical property values. The tensile strength is preferably 70MPa or more, more preferably 80MPa or more, and more preferably 90MPa or more. The tensile modulus is preferably 2.0GPa or more, more preferably 2.5GPa or more, and more preferably 3.0GPa or more. The elongation at break is preferably 8% or more, more preferably 10% or more, and more preferably 15% or more. The glass transition temperature (Tg) is preferably 200°C or more, more preferably 230°C or more, and more preferably 250°C or more. Furthermore, the above-mentioned physical property values in the present invention can be specifically measured by the methods described in the examples.
<聚醯亞胺樹脂之製造方法> 本發明中,聚醯亞胺樹脂可藉由使含有提供上述構成單元(A-1)之化合物之四羧酸成分、與含有提供上述構成單元(B-1)之化合物及提供上述構成單元(B-2)之化合物之二胺成分進行反應來製造。<Production method of polyimide resin> In the present invention, the polyimide resin can be produced by reacting a tetracarboxylic acid component containing a compound providing the above-mentioned constituent unit (A-1) with a diamine component containing a compound providing the above-mentioned constituent unit (B-1) and a compound providing the above-mentioned constituent unit (B-2).
就提供構成單元(A-1)之化合物而言,可列舉式(a-1)表示之化合物,但不限與該等,在可提供相同構成單元之範圍內亦可為其衍生物。就該衍生物而言,可列舉對應式(a-1)表示之四羧酸二酐之四羧酸(亦即4,4’-氧二鄰苯二甲酸)、及該四羧酸之烷酯。其中,宜為式(a-1)表示之四羧酸二酐。As for the compound providing the constituent unit (A-1), the compound represented by formula (a-1) can be listed, but it is not limited thereto, and its derivatives can also be listed within the scope of providing the same constituent unit. As for the derivative, the tetracarboxylic acid corresponding to the tetracarboxylic dianhydride represented by formula (a-1) (i.e., 4,4'-oxydiphthalic acid) and the alkyl ester of the tetracarboxylic acid can be listed. Among them, the tetracarboxylic dianhydride represented by formula (a-1) is preferred.
四羧酸成分宜含有40莫耳%以上之提供構成單元(A-1)之化合物,更宜為含有50莫耳%以上,又更宜為含有70莫耳%以上。提供構成單元(A-1)之化合物之含量之上限值並無特別限定,亦即為100莫耳%。四羧酸成分亦可僅由提供構成單元(A-1)化合物構成。The tetracarboxylic acid component preferably contains 40 mol% or more of the compound providing the constituent unit (A-1), more preferably 50 mol% or more, and even more preferably 70 mol% or more. The upper limit of the content of the compound providing the constituent unit (A-1) is not particularly limited, that is, 100 mol%. The tetracarboxylic acid component may also consist only of the compound providing the constituent unit (A-1).
四羧酸成分亦可含有除提供構成單元(A-1)之化合物以外之化合物。The tetracarboxylic acid component may contain compounds other than the compounds providing the constitutional unit (A-1).
四羧酸成分除了提供構成單元(A-1)之化合物以外,亦可更含有提供構成單元(A-2)之化合物。 就提供構成單元(A-2)之化合物而言,可列舉式(a-2-1)表示之化合物、式(a-2-2)表示之化合物,但不限於該等,在可提供相同構成單元之範圍亦可為其衍生物。就該衍生物而言,可列舉對應式(a-2-1)及式(a-2-2)表示之化合物之四羧酸及該四羧酸之烷酯。就提供構成單元(A-2)之化合物而言,宜為式(a-2-1)及式(a-2-2)表示之化合物(亦即二酐)。In addition to providing compounds constituting unit (A-1), the tetracarboxylic acid component may also contain compounds providing constituent unit (A-2). As for the compounds providing constituent unit (A-2), compounds represented by formula (a-2-1) and compounds represented by formula (a-2-2) may be listed, but they are not limited thereto and may also be derivatives thereof within the scope of providing the same constituent unit. As for the derivatives, tetracarboxylic acids corresponding to the compounds represented by formula (a-2-1) and formula (a-2-2) and alkyl esters of the tetracarboxylic acids may be listed. As for the compounds providing constituent unit (A-2), compounds represented by formula (a-2-1) and formula (a-2-2) (i.e., dianhydrides) are preferred.
四羧酸成分含有提供構成單元(A-2)之化合物時,四羧酸成分宜含有10~50莫耳%之提供構成單元(A-2)之化合物,更宜為15~45莫耳%,又更宜為20~40莫耳%。When the tetracarboxylic acid component contains a compound providing the structural unit (A-2), the tetracarboxylic acid component preferably contains 10 to 50 mol %, more preferably 15 to 45 mol %, and even more preferably 20 to 40 mol % of the compound providing the structural unit (A-2).
任意地含有於四羧酸成分之除提供構成單元(A-1)之化合物以外之化合物,並不限定於提供構成單元(A-2)之化合物。就如此之任意的化合物而言,可列舉上述芳香族四羧酸二酐、脂環族四羧酸二酐、及脂肪族四羧酸二酐、以及該等之衍生物(四羧酸、四羧酸之烷酯等)。 任意地含有於四羧酸成分之除提供構成單元(A-1)之化合物及提供構成單元(A-2)之化合物以外的化合物,可為1種,亦可為2種以上。The compounds arbitrarily contained in the tetracarboxylic acid component other than the compound providing the constituent unit (A-1) are not limited to the compounds providing the constituent unit (A-2). As such arbitrary compounds, the above-mentioned aromatic tetracarboxylic dianhydride, alicyclic tetracarboxylic dianhydride, and aliphatic tetracarboxylic dianhydride, and their derivatives (tetracarboxylic acids, alkyl esters of tetracarboxylic acids, etc.) can be listed. The compounds arbitrarily contained in the tetracarboxylic acid component other than the compound providing the constituent unit (A-1) and the compound providing the constituent unit (A-2) may be one or more.
就提供構成單元(B-1)之化合物而言,可列舉式(b-1)表示之化合物,但不限於該等,在可提供相同構成單元之範圍內亦可為其衍生物。就該衍生物而言,可列舉對應式(b-1)表示之化合物(二胺)之二異氰酸酯。其中,宜為式(b-1)表示之化合物(亦即二胺)。 同樣地,就提供構成單元(B-2)之化合物而言,可列舉式(b-2)表示之化合物,但不限於該等,在可提供相同構成單元之範圍內亦可為其衍生物。就該衍生物而言,可列舉對應式(b-2)表示之化合物(二胺)之二異氰酸酯。就提供構成單元(B-2)之化合物而言,宜為式(b-2)表示之化合物(亦即二胺)。As for the compound providing the constituent unit (B-1), the compound represented by formula (b-1) can be listed, but it is not limited to them, and its derivatives can also be provided within the scope of providing the same constituent unit. As for the derivative, the diisocyanate corresponding to the compound (diamine) represented by formula (b-1) can be listed. Among them, the compound represented by formula (b-1) (i.e., diamine) is preferred. Similarly, as for the compound providing the constituent unit (B-2), the compound represented by formula (b-2) can be listed, but it is not limited to them, and its derivatives can also be provided within the scope of providing the same constituent unit. As for the derivative, the diisocyanate corresponding to the compound (diamine) represented by formula (b-2) can be listed. As for the compound providing the constituent unit (B-2), the compound represented by formula (b-2) (i.e., diamine) is preferred.
二胺成分宜含有5~80莫耳%之提供構成單元(B-1)之化合物,更宜為含有10~70莫耳%,又更宜為含有30~60莫耳%。 二胺成分宜含有20~95莫耳%之提供構成單元(B-2)之化合物,更宜為含有30~90莫耳%,又更宜為含有40~70莫耳%。 二胺成分按提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物的合計,宜為含有50莫耳%以上,更宜為含有70莫耳%以上,更宜為含有90莫耳%以上。提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物之合計含量之上限值並無特別限定,亦即100莫耳%。二胺成分亦可僅由提供構成單元(B-1)之化合物與提供構成單元(B-2)之化合物構成。The diamine component preferably contains 5 to 80 mol% of the compound providing the constituent unit (B-1), more preferably 10 to 70 mol%, and more preferably 30 to 60 mol%. The diamine component preferably contains 20 to 95 mol% of the compound providing the constituent unit (B-2), more preferably 30 to 90 mol%, and more preferably 40 to 70 mol%. The diamine component preferably contains 50 mol% or more, more preferably 70 mol% or more, and more preferably 90 mol% or more of the total of the compound providing the constituent unit (B-1) and the compound providing the constituent unit (B-2). The upper limit of the total content of the compound providing the constituent unit (B-1) and the compound providing the constituent unit (B-2) is not particularly limited, that is, 100 mol%. The diamine component may be composed only of a compound providing the constitutional unit (B-1) and a compound providing the constitutional unit (B-2).
二胺成分亦可含有除提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物以外的化合物。The diamine component may contain compounds other than the compound providing the constitutional unit (B-1) and the compound providing the constitutional unit (B-2).
二胺成分除了提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物以外,亦可更含有提供構成單元(B-3)之化合物。 就提供構成單元(B-3)之化合物而言,可列舉式(b-3-1)表示之化合物及式(b-3-2)表示之化合物,但不限於該等,在可提供相同構成單元之範圍內亦可為其衍生物。就該衍生物而言,可列舉對應於式(b-3-1)表示之二胺之二異氰酸酯、對應於式(b-3-2)表示之二胺之二異氰酸酯。就提供構成單元(B-3)之化合物而言,宜為式(b-3-1)表示之化合物及式(b-3-2)表示之化合物(亦即二胺)。In addition to the compounds that provide the constituent unit (B-1) and the compounds that provide the constituent unit (B-2), the diamine component may also contain compounds that provide the constituent unit (B-3). As for the compounds that provide the constituent unit (B-3), the compounds represented by formula (b-3-1) and the compounds represented by formula (b-3-2) can be listed, but they are not limited to them. Derivatives thereof can also be listed within the scope of providing the same constituent unit. As for the derivatives, diisocyanates corresponding to the diamine represented by formula (b-3-1) and diisocyanates corresponding to the diamine represented by formula (b-3-2) can be listed. As for the compounds that provide the constituent unit (B-3), the compounds represented by formula (b-3-1) and the compounds represented by formula (b-3-2) (i.e., diamines) are preferably used.
就提供構成單元(B-3)之化合物而言,可僅為式(b-3-1)表示之化合物,亦可僅為式(b-3-2)表示之化合物,亦可為式(b-3-1)表示之化合物與式(b-3-2)表示之化合物之組合。The compound constituting unit (B-3) may be only the compound represented by formula (b-3-1), only the compound represented by formula (b-3-2), or a combination of a compound represented by formula (b-3-1) and a compound represented by formula (b-3-2).
二胺成分中含有提供構成單元(B-3)之化合物時,二胺成分宜含有0.1~30莫耳%之提供構成單元(B-3)之化合物,更宜為含有1~25莫耳%,又更宜為含有5~25莫耳%。 二胺成分中含有提供構成單元(B-3)之化合物時,二胺成分中,提供構成單元(B-1)之化合物、提供構成單元(B-2)之化合物及提供構成單元(B-3)之化合物之合計,宜為含有80莫耳%以上,更宜為含有90莫耳%以上,又更宜為含有99莫耳%以上。提供構成單元(B-1)之化合物、提供構成單元(B-2)之化合物及提供構成單元(B-3)之化合物之合計含量之上限值並無特別限定,亦即為100莫耳%。二胺成分亦可僅由提供構成單元(B-1)之化合物、提供構成單元(B-2)之化合物及提供構成單元(B-3)之化合物構成。When the diamine component contains a compound providing a constituent unit (B-3), the diamine component preferably contains 0.1 to 30 mol% of the compound providing a constituent unit (B-3), more preferably 1 to 25 mol%, and more preferably 5 to 25 mol%. When the diamine component contains a compound providing a constituent unit (B-3), the total of the compound providing a constituent unit (B-1), the compound providing a constituent unit (B-2), and the compound providing a constituent unit (B-3) in the diamine component preferably contains 80 mol% or more, more preferably 90 mol% or more, and more preferably 99 mol% or more. The upper limit of the total content of the compound providing a constituent unit (B-1), the compound providing a constituent unit (B-2), and the compound providing a constituent unit (B-3) is not particularly limited, that is, 100 mol%. The diamine component may be composed only of a compound providing a constitutional unit (B-1), a compound providing a constitutional unit (B-2), and a compound providing a constitutional unit (B-3).
任意地含有於二胺成分之除提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物以外的化合物,並不限定於提供構成單元(B-3)之化合物。就如此之任意的化合物而言,可列舉上述芳香族二胺、脂環族二胺、及脂肪族二胺,以及該等之衍生物(二異氰酸酯等)。 任意地含有於二胺成分之除提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物以外的化合物,可為1種,亦可為2種以上。The compounds arbitrarily contained in the diamine component other than the compounds providing the constituent unit (B-1) and the compounds providing the constituent unit (B-2) are not limited to the compounds providing the constituent unit (B-3). As such arbitrary compounds, the above-mentioned aromatic diamines, alicyclic diamines, and aliphatic diamines, and their derivatives (diisocyanates, etc.) can be listed. The compounds arbitrarily contained in the diamine component other than the compounds providing the constituent unit (B-1) and the compounds providing the constituent unit (B-2) can be one or more.
本發明中,聚醯亞胺樹脂之製造所使用的四羧酸成分與二胺成分之進料量比,相對於四羧酸成分1莫耳,二胺成分宜為0.9~1.1莫耳。In the present invention, the feed ratio of the tetracarboxylic acid component to the diamine component used in the production of the polyimide resin is preferably 0.9 to 1.1 mol of the diamine component relative to 1 mol of the tetracarboxylic acid component.
又,本發明中,聚醯亞胺樹脂之製造中,除了前述四羧酸成分及二胺成分以外,亦可使用封端劑。就封端劑而言宜為單胺類或二羧酸類。就導入之封端劑的進料量而言,相對於四羧酸成分1莫耳,宜為0.0001~0.1莫耳,更宜為0.001~0.06莫耳。就單胺類封端劑而言,可舉例如:甲胺、乙胺、丙胺、丁胺、苄胺、4-甲基苄胺、4-乙基苄胺、4-十二烷基苄胺、3-甲基苄胺、3-乙基苄胺、苯胺、3-甲基苯胺、4-甲基苯胺等,宜為苄胺、苯胺。就二羧酸類封端劑而言,宜為二羧酸類,亦可使其一部分閉環。例如可列舉:鄰苯二甲酸、鄰苯二甲酸酐、4-氯鄰苯二甲酸、四氟鄰苯二甲酸、2,3-二苯甲酮二甲酸、3,4-二苯甲酮二甲酸、環己烷-1,2-二甲酸、環戊烷-1,2-二甲酸、4-環己烯-1,2-二甲酸等,宜為鄰苯二甲酸、鄰苯二甲酸酐。In addition, in the present invention, in the production of the polyimide resin, in addition to the aforementioned tetracarboxylic acid component and diamine component, a capping agent may also be used. The capping agent is preferably a monoamine or a dicarboxylic acid. The amount of the introduced capping agent is preferably 0.0001 to 0.1 mol, more preferably 0.001 to 0.06 mol, relative to 1 mol of the tetracarboxylic acid component. As for the monoamine capping agent, for example: methylamine, ethylamine, propylamine, butylamine, benzylamine, 4-methylbenzylamine, 4-ethylbenzylamine, 4-dodecylbenzylamine, 3-methylbenzylamine, 3-ethylbenzylamine, aniline, 3-methylaniline, 4-methylaniline, etc., preferably benzylamine, aniline. As for the dicarboxylic acid capping agent, it is preferably a dicarboxylic acid, and a part of it may be ring-closed. For example, phthalic acid, phthalic anhydride, 4-chlorophthalic acid, tetrafluorophthalic acid, 2,3-benzophenone dicarboxylic acid, 3,4-benzophenone dicarboxylic acid, cyclohexane-1,2-dicarboxylic acid, cyclopentane-1,2-dicarboxylic acid, 4-cyclohexene-1,2-dicarboxylic acid, etc. are listed, preferably phthalic acid and phthalic anhydride.
使前述四羧酸成分與二胺成分反應的方法並無特別限制,可使用公知的方法。 就具體的反應方法而言,可列舉:(1)將四羧酸成分、二胺成分、及反應溶劑進料至反應器,於0~80℃攪拌0.5~30小時,其後升溫並進行醯亞胺化反應之方法、(2)將二胺成分及反應溶劑進料至反應器並使其溶解後,加入四羧酸成分,因應需要於0~80℃攪拌0.5~30小時,其後升溫並進行醯亞胺化反應之方法、(3)將四羧酸成分、二胺成分、及反應溶劑進料至反應器,立即升溫並進行醯亞胺化反應之方法等。The method for reacting the tetracarboxylic acid component and the diamine component is not particularly limited, and a known method can be used. Specific reaction methods include: (1) a method in which a tetracarboxylic acid component, a diamine component, and a reaction solvent are fed into a reactor, stirred at 0 to 80°C for 0.5 to 30 hours, and then the temperature is raised to carry out an imidization reaction; (2) a method in which a diamine component and a reaction solvent are fed into a reactor and dissolved, and then a tetracarboxylic acid component is added, and if necessary, stirred at 0 to 80°C for 0.5 to 30 hours, and then the temperature is raised to carry out an imidization reaction; (3) a method in which a tetracarboxylic acid component, a diamine component, and a reaction solvent are fed into a reactor, and the temperature is immediately raised to carry out an imidization reaction.
聚醯亞胺樹脂之製造所使用的反應溶劑,只要係不妨礙醯亞胺化反應,並可溶解生成之聚醯亞胺者即可。例如可列舉:非質子性溶劑、酚系溶劑、醚系溶劑、碳酸酯系溶劑等。The reaction solvent used in the production of polyimide resin can be any solvent that does not hinder the imidization reaction and can dissolve the generated polyimide. Examples include: aprotic solvents, phenolic solvents, ether solvents, carbonate solvents, etc.
就非質子性溶劑之具體例而言,可列舉:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮(NMP)、N-甲基己內醯胺、1,3-二甲基咪唑啶酮、四甲基脲等醯胺系溶劑;γ-丁內酯(GBL)、γ-戊內酯等內酯系溶劑;六甲基磷醯胺、六甲基膦三醯胺等含磷系醯胺系溶劑;二甲基碸、二甲基亞碸、環丁碸等含硫系溶劑;丙酮、環己酮、甲基環己酮等酮系溶劑;甲基吡啶、吡啶等胺系溶劑;乙酸(2-甲氧基-1-甲基乙酯)等酯系溶劑等。Specific examples of aprotic solvents include amide solvents such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone (NMP), N-methylcaprolactam, 1,3-dimethylimidazolidinone, and tetramethylurea; lactone solvents such as γ-butyrolactone (GBL) and γ-valerolactone; phosphorus-containing amide solvents such as hexamethylphosphatamide and hexamethylphosphotriamide; sulfur-containing solvents such as dimethyl sulfone, dimethyl sulfoxide, and cyclobutane sulfone; ketone solvents such as acetone, cyclohexanone, and methylcyclohexanone; amine solvents such as methylpyridine and pyridine; ester solvents such as acetic acid (2-methoxy-1-methylethyl ester), and the like.
就酚系溶劑之具體例而言,可列舉:苯酚、鄰甲酚、間甲酚、對甲酚、2,3-二甲酚、2,4-二甲酚、2,5-二甲酚、2,6-二甲酚、3,4-二甲酚、3,5-二甲酚等。 就醚系溶劑之具體例而言,可列舉:1,2-二甲氧基乙烷、雙(2-甲氧基乙基)醚、1,2-雙(2-甲氧基乙氧基)乙烷、雙[2-(2-甲氧基乙氧基)乙基]醚、四氫呋喃、1,4-二㗁烷等。 又,就碳酸酯系溶劑之具體例而言,可列舉:碳酸二乙酯、碳酸甲基乙酯、碳酸伸乙酯、碳酸伸丙酯等。 上述反應溶劑之中,宜為非質子系溶劑,更宜為醯胺系溶劑及内酯系溶劑。又,上述反應溶劑可單獨使用亦可混合2種以上來使用。Specific examples of phenolic solvents include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4-xylenol, 3,5-xylenol, etc. Specific examples of etheric solvents include 1,2-dimethoxyethane, bis(2-methoxyethyl)ether, 1,2-bis(2-methoxyethoxy)ethane, bis[2-(2-methoxyethoxy)ethyl]ether, tetrahydrofuran, 1,4-dioxane, etc. Specific examples of carbonate-based solvents include diethyl carbonate, methyl ethyl carbonate, ethyl carbonate, propyl carbonate, etc. Among the above reaction solvents, aprotic solvents are preferred, and amide solvents and lactone solvents are more preferred. The above reaction solvents may be used alone or in combination of two or more.
醯亞胺化反應中,宜使用迪安-斯塔克(Dean-Stark)裝置等,邊去除製造時生成的水邊進行反應。藉由進行如此之操作,可更提升聚合度及醯亞胺化率。In the imidization reaction, it is preferable to use a Dean-Stark apparatus or the like to carry out the reaction while removing water generated during the production. By carrying out such an operation, the degree of polymerization and the imidization rate can be further increased.
上述醯亞胺化反應中,可使用公知之醯亞胺化觸媒。就醯亞胺化觸媒而言,可列舉鹼觸媒或酸觸媒。 就鹼觸媒而言,可列舉:吡啶、喹啉、異喹啉、α-甲吡啶、β-甲吡啶、2,4-二甲基吡啶、2,6-二甲基吡啶、三甲胺、三乙胺(TEA)、三丙胺、三丁胺、三乙二胺、咪唑、N,N-二甲基苯胺、N,N-二乙基苯胺等有機鹼觸媒;氫氧化鉀或氫氧化鈉、碳酸鉀、碳酸鈉、碳酸氫鉀、碳酸氫鈉等無機鹼觸媒。 又,就酸觸媒而言,可列舉:巴豆酸、丙烯酸、反式-3-己烯酸、肉桂酸、苯甲酸、甲基苯甲酸、羥基苯甲酸、對苯二甲酸、苯磺酸、對甲苯磺酸、萘磺酸等。上述醯亞胺化觸媒可單獨使用亦可組合2種以上來使用。 考量操作性之觀點,上述之中宜使用鹼觸媒,更宜使用有機鹼觸媒,又更宜為使用三乙基胺。In the above-mentioned imidization reaction, a known imidization catalyst can be used. As for the imidization catalyst, alkali catalysts or acid catalysts can be listed. As for the alkali catalyst, organic alkali catalysts such as pyridine, quinoline, isoquinoline, α-picoline, β-picoline, 2,4-lutidine, 2,6-lutidine, trimethylamine, triethylamine (TEA), tripropylamine, tributylamine, triethylenediamine, imidazole, N,N-dimethylaniline, N,N-diethylaniline, etc.; inorganic alkali catalysts such as potassium hydroxide or sodium hydroxide, potassium carbonate, sodium carbonate, potassium bicarbonate, sodium bicarbonate, etc. can be listed. In addition, as for the acid catalyst, there can be listed: crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, hydroxybenzoic acid, terephthalic acid, benzenesulfonic acid, p-toluenesulfonic acid, naphthalenesulfonic acid, etc. The above imidization catalyst can be used alone or in combination of two or more. Considering the operability, it is preferable to use an alkali catalyst among the above, and it is more preferable to use an organic alkali catalyst, and it is more preferable to use triethylamine.
考量抑制反應率及凝膠化等之觀點,醯亞胺化反應之溫度宜為120~250℃,更宜為160~200℃。又,反應時間自生成水之餾出開始後宜為0.5~10小時。From the viewpoint of suppressing the reaction rate and gelation, the temperature of the imidization reaction is preferably 120 to 250° C., more preferably 160 to 200° C. The reaction time is preferably 0.5 to 10 hours from the start of distillation of the generated water.
[聚醯亞胺清漆] 本發明之聚醯亞胺清漆係本發明之聚醯亞胺樹脂溶解於有機溶劑而成。亦即,本發明之聚醯亞胺清漆含有本發明之聚醯亞胺樹脂及有機溶劑,該聚醯亞胺樹脂係溶解於該有機溶劑。 有機溶劑只要係會溶解聚醯亞胺樹脂者即可,並無特別限定,宜將上述化合物作為聚醯亞胺樹脂之製造所使用之反應溶劑,單獨使用或混合2種以上來使用。 本發明之聚醯亞胺清漆可為利用聚合法獲得之聚醯亞胺樹脂溶解於反應溶劑而成之聚醯亞胺溶液本身,或亦可為對該聚醯亞胺溶液進一步追加溶劑並稀釋而成者。[Polyimide varnish] The polyimide varnish of the present invention is obtained by dissolving the polyimide resin of the present invention in an organic solvent. That is, the polyimide varnish of the present invention contains the polyimide resin of the present invention and an organic solvent, and the polyimide resin is dissolved in the organic solvent. The organic solvent is not particularly limited as long as it can dissolve the polyimide resin. The above compounds are preferably used as reaction solvents for the production of the polyimide resin, either alone or in combination of two or more. The polyimide varnish of the present invention may be a polyimide solution obtained by dissolving a polyimide resin obtained by a polymerization method in a reaction solvent, or may be a polyimide solution obtained by further adding a solvent and diluting the polyimide solution.
本發明之聚醯亞胺樹脂具有溶劑溶解性,故可製成於室溫條件下安定的高濃度清漆。本發明之聚醯亞胺清漆,宜含有5~40質量%之本發明之聚醯亞胺樹脂,更宜為含有10~30質量%。聚醯亞胺清漆之黏度宜為1~200Pa・s,更宜為1~100Pa・s。聚醯亞胺清漆之黏度係利用E型黏度計於25℃測定之值。 又,本發明之聚醯亞胺清漆,在不損及聚醯亞胺薄膜之要求特性之範圍內,亦可含有無機填料、黏接促進劑、剝離劑、阻燃劑、紫外線安定劑、界面活性劑、整平劑、消泡劑、螢光增白劑、交聯劑、聚合起始劑、感光劑等各種添加劑。 本發明之聚醯亞胺清漆之製造方法並無特別限定,可使用公知的方法。The polyimide resin of the present invention has solvent solubility, so it can be made into a high-concentration varnish that is stable at room temperature. The polyimide varnish of the present invention preferably contains 5 to 40% by mass of the polyimide resin of the present invention, and more preferably contains 10 to 30% by mass. The viscosity of the polyimide varnish is preferably 1 to 200 Pa·s, and more preferably 1 to 100 Pa·s. The viscosity of the polyimide varnish is a value measured at 25°C using an E-type viscometer. Furthermore, the polyimide varnish of the present invention may also contain various additives such as inorganic fillers, adhesion promoters, stripping agents, flame retardants, ultraviolet stabilizers, surfactants, leveling agents, defoaming agents, fluorescent whitening agents, crosslinking agents, polymerization initiators, and photosensitizers within the range that the required properties of the polyimide film are not impaired. The manufacturing method of the polyimide varnish of the present invention is not particularly limited, and a known method can be used.
[聚醯亞胺薄膜] 本發明之聚醯亞胺薄膜含有本發明之聚醯亞胺樹脂。因此,本發明之聚醯亞胺薄膜之光學等向性、柔軟性及耐藥品性優異。本發明之聚醯亞胺薄膜所具有之理想的物性值如上述所述。 本發明之聚醯亞胺薄膜之製造方法並無特別限制,可使用公知的方法。可舉例如將本發明之聚醯亞胺清漆塗佈於玻璃板、金屬板、塑膠等平滑的支持體上,或成形成薄膜狀後,再利用加熱去除該清漆中含有的反應溶劑、稀釋溶劑等有機溶劑之方法等。[Polyimide film] The polyimide film of the present invention contains the polyimide resin of the present invention. Therefore, the optical isotropy, flexibility and chemical resistance of the polyimide film of the present invention are excellent. The ideal physical properties of the polyimide film of the present invention are as described above. The method for manufacturing the polyimide film of the present invention is not particularly limited, and a known method can be used. For example, the polyimide varnish of the present invention is applied on a smooth support such as a glass plate, a metal plate, or a plastic, or after forming it into a film, the organic solvent such as a reaction solvent and a diluting solvent contained in the varnish is removed by heating.
就塗佈方法而言,可列舉旋塗、狹縫式塗佈、刀塗等公知的塗佈方法。其中,考慮控制分子間配向並改善耐藥品性、作業性之觀點,宜為狹縫式塗佈。 就利用加熱去除清漆中含有的有機溶劑之方法而言,宜為於150℃以下之溫度使有機溶劑蒸發並成為無黏性後,於有機溶劑之沸點以上的溫度(並無特別限定,宜為200~500℃)進行乾燥。又,宜為於空氣環境下或氮氣環境下進行乾燥。乾燥環境之壓力可為減壓、常壓、加壓之任一者。 將製膜於支持體上之聚醯亞胺薄膜從支持體剝離的方法並無特別限定,可列舉雷射剝離法、使用剝離用犧牲層之方法(於支持體之表面預先塗布脫膜劑的方法)、添加剝離劑之方法。As for the coating method, known coating methods such as spin coating, slit coating, and knife coating can be listed. Among them, slit coating is preferred from the viewpoint of controlling the molecular orientation and improving the chemical resistance and workability. As for the method of removing the organic solvent contained in the varnish by heating, it is preferred to evaporate the organic solvent at a temperature below 150°C and make it non-viscous, and then dry it at a temperature above the boiling point of the organic solvent (not particularly limited, preferably 200-500°C). In addition, it is preferred to dry it in an air environment or a nitrogen environment. The pressure of the drying environment can be any of reduced pressure, normal pressure, and pressurized. The method for peeling the polyimide film formed on the support from the support is not particularly limited, and examples thereof include a laser peeling method, a method using a sacrificial layer for peeling (a method in which a peeling agent is pre-coated on the surface of the support), and a method of adding a peeling agent.
又,本發明之聚醯亞胺薄膜亦可使用聚醯胺酸溶解於有機溶劑而成之聚醯胺酸清漆來製造。 前述聚醯胺酸清漆所含有之聚醯胺酸,係本發明之聚醯亞胺樹脂之前軀物,係含有上述提供構成單元(A-1)之化合物之四羧酸成分、與含有上述提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物之二胺成分之加成聚合反應的產物。藉由對此聚醯胺酸進行醯亞胺化(脫水閉環),可獲得為最終產物之本發明之聚醯亞胺樹脂。 就前述聚醯胺酸清漆所含有之有機溶劑而言,可使用本發明之聚醯亞胺清漆所含有之有機溶劑。 本發明中,聚醯胺酸清漆可為使四羧酸成分與二胺成分在反應溶劑中進行加成聚合反應而得之聚醯胺酸溶液本身,亦可為對該聚醯胺酸溶液進一步追加溶劑並稀釋而成者。In addition, the polyimide film of the present invention can also be produced using a polyimide varnish in which polyimide is dissolved in an organic solvent. The polyimide contained in the aforementioned polyimide varnish is a precursor of the polyimide resin of the present invention, and is a product of addition polymerization of the tetracarboxylic acid component of the compound providing the aforementioned constituent unit (A-1) and the diamine component of the compound providing the aforementioned constituent unit (B-1) and the compound providing the constituent unit (B-2). By subjecting this polyimide to imidization (dehydration and ring closure), the polyimide resin of the present invention can be obtained as the final product. As for the organic solvent contained in the aforementioned polyamide varnish, the organic solvent contained in the polyimide varnish of the present invention can be used. In the present invention, the polyamide varnish can be a polyamide solution itself obtained by allowing a tetracarboxylic acid component and a diamine component to undergo an addition polymerization reaction in a reaction solvent, or can be a polyamide solution obtained by further adding a solvent and diluting the polyamide solution.
使用聚醯胺酸清漆來製造聚醯亞胺薄膜之方法並無特別限制,可使用公知之方法。例如可將聚醯胺酸清漆塗佈於玻璃板、金屬板、塑膠等平滑的支持體上或成形成薄膜狀,並利用加熱去除該清漆中含有的反應溶劑、稀釋溶劑等有機溶劑來獲得聚醯胺酸薄膜,再利用加熱對該聚醯胺酸薄膜中之聚醯胺酸進行醯亞胺化,而製造聚醯亞胺薄膜。 就使聚醯胺酸清漆乾燥並獲得聚醯胺酸薄膜時之加熱溫度而言,宜為50~120℃。就利用加熱對聚醯胺酸進行醯亞胺化時之加熱溫度而言,宜為200~400℃。 又,醯亞胺化之方法並不限於熱醯亞胺化,也可使用化學醯亞胺化。The method of using polyamide varnish to produce polyimide film is not particularly limited, and a known method can be used. For example, polyamide varnish can be coated on a smooth support such as a glass plate, a metal plate, or a plastic, or formed into a film, and the organic solvents such as the reaction solvent and the dilution solvent contained in the varnish can be removed by heating to obtain a polyamide film, and then the polyamide in the polyamide film can be imidized by heating to produce a polyimide film. The heating temperature for drying the polyamide varnish and obtaining the polyamide film is preferably 50 to 120°C. The heating temperature for imidizing the polyamide by heating is preferably 200 to 400°C. In addition, the imidization method is not limited to thermal imidization, and chemical imidization can also be used.
本發明之聚醯亞胺薄膜之厚度可因應用途等適當選擇,宜為1~250μm,更宜為5~100μm,又更宜為8~80μm,又更宜為10~80μm之範圍。藉由厚度為1~250μm,可於實用上使用作為自支撐膜。 聚醯亞胺薄膜之厚度可藉由調整聚醯亞胺清漆之固體成分濃度、黏度,而輕易地控制。The thickness of the polyimide film of the present invention can be appropriately selected according to the application, and is preferably in the range of 1 to 250 μm, more preferably 5 to 100 μm, more preferably 8 to 80 μm, and more preferably 10 to 80 μm. With a thickness of 1 to 250 μm, it can be used as a self-supporting film in practical applications. The thickness of the polyimide film can be easily controlled by adjusting the solid component concentration and viscosity of the polyimide varnish.
本發明之聚醯亞胺薄膜可理想地使用作為彩色濾光片、撓性顯示器、半導體零件、光學構件等各種構件用之薄膜。本發明之聚醯亞胺薄膜特別適合使用作為液晶顯示器、OLED顯示器等圖像顯示裝置之基板。 [實施例]The polyimide film of the present invention can be ideally used as a film for various components such as color filters, flexible displays, semiconductor parts, optical components, etc. The polyimide film of the present invention is particularly suitable for use as a substrate for image display devices such as liquid crystal displays and OLED displays. [Example]
以下,利用實施例具體地說明本發明。惟,本發明並不受這些實施例之任何限制。The present invention is described in detail below using embodiments, but the present invention is not limited to these embodiments.
<薄膜物性及評價> 實施例及比較例中獲得之薄膜之各物性係利用以下所示之方法進行測定。<Thin film properties and evaluation> The physical properties of the thin films obtained in the examples and comparative examples were measured using the methods shown below.
(1)薄膜厚度 薄膜厚度係使用Mitutoyo Corporation股份有限公司製之測微計測得。(1) Film thickness The film thickness was measured using a micrometer manufactured by Mitutoyo Corporation.
(2)拉伸強度、拉伸彈性模量、及拉伸斷裂伸長率(拉伸斷裂伸長率係柔軟性的評價) 拉伸強度、拉伸彈性模量及拉伸斷裂伸長率係依循JIS K7127:1999,使用東洋精機股份有限公司製之拉伸試驗機「STROGRAPH VG-1E」測得。將夾具間距離設為50mm、試驗片尺寸設為10mm×70mm、試驗速度設為20mm/min。(2) Tensile strength, tensile modulus, and tensile elongation at break (tensile elongation at break is an evaluation of flexibility) Tensile strength, tensile modulus, and tensile elongation at break were measured in accordance with JIS K7127:1999 using a tensile testing machine "STROGRAPH VG-1E" manufactured by Toyo Seiki Co., Ltd. The distance between the clamps was set to 50 mm, the specimen size was set to 10 mm × 70 mm, and the test speed was set to 20 mm/min.
(3)玻璃轉移溫度(Tg) 使用Hitachi High-Tech Science股份有限公司製之熱機械性分析裝置「TMA/SS6100」,於拉伸模式以樣本尺寸2mm×20mm、荷重0.1N、升溫速度10℃/min之條件,升溫至足以去除殘留應力之充分的溫度來去除殘留應力,其後冷卻至室溫。其後,以與前述用以去除殘留應力之處理相同的條件,實施試驗片伸度之測定,並令觀察到伸度之反曲點時為玻璃轉移溫度而求得。(3) Glass transition temperature (Tg) Thermomechanical analyzer "TMA/SS6100" manufactured by Hitachi High-Tech Science Co., Ltd. was used to remove residual stress in the tensile mode with a sample size of 2mm×20mm, a load of 0.1N, and a heating rate of 10℃/min. The sample was heated to a temperature sufficient to remove residual stress and then cooled to room temperature. Thereafter, the elongation of the test piece was measured under the same conditions as the above-mentioned treatment for removing residual stress, and the glass transition temperature was obtained when the inflection point of the elongation was observed.
(4)全光線透射率、及黃色指數(YI) 全光線透射率及YI係依循JIS K7136,使用日本電色工業股份有限公司製之色彩-濁度同時測定器「COH7700」測得。(4) Total light transmittance and yellowness index (YI) Total light transmittance and YI were measured in accordance with JIS K7136 using the color-turbidity simultaneous tester "COH7700" manufactured by Nippon Denshoku Industries Co., Ltd.
(5)霧度 測定係依循JIS K7361-1,使用日本電色工業股份有限公司製之色彩-濁度同時測定器「COH7700」進行。(5) Haze The measurement was carried out in accordance with JIS K7361-1 using the color-turbidity simultaneous tester "COH7700" manufactured by Nippon Denshoku Industries Co., Ltd.
(6)厚度相位差(Rth)(光學等向性之評價) 厚度相位差(Rth)係使用日本分光股份有限公司製之橢圓偏光計「M-220」進行測定。測定於測定波長590nm的厚度相位差之值。另外Rth係令聚醯亞胺薄膜之面內的折射率中之最大者為nx,最小者為ny,厚度方向之折射率為nz,並令薄膜之厚度為d時,利用下式所表示者。亦算出將薄膜之厚度換算為10μm而得之Rth。 Rth={[(nx+ny)/2]-nz}×d(6) Thickness phase difference (Rth) (Evaluation of optical isotropy) The thickness phase difference (Rth) is measured using an elliptical polarimeter "M-220" manufactured by JASCO Corporation. The thickness phase difference is measured at a wavelength of 590nm. In addition, Rth is expressed by the following formula when the largest refractive index in the plane of the polyimide film is nx, the smallest is ny, the refractive index in the thickness direction is nz, and the thickness of the film is d. Rth is also calculated by converting the film thickness to 10μm. Rth={[(nx+ny)/2]-nz}×d
(7)耐溶劑性(耐藥品性之評價) 將於玻璃板上製膜而成之聚醯亞胺薄膜於室溫浸漬於溶劑中,確認薄膜表面有無變化。又,使用丙二醇單甲基醚乙酸酯(PGMEA)作為溶劑。 耐溶劑性之評價基準係如以下所示。 ○:薄膜表面無變化。 △:薄膜表面有些微裂紋。 ×:薄膜表面產生裂紋,或薄膜表面溶解。(7) Solvent resistance (evaluation of chemical resistance) The polyimide film formed on a glass plate was immersed in a solvent at room temperature to check whether there was any change on the film surface. Propylene glycol monomethyl ether acetate (PGMEA) was used as a solvent. The evaluation criteria for solvent resistance are as follows. ○: No change on the film surface. △: Some microcracks on the film surface. ×: Cracks occurred on the film surface, or the film surface was dissolved.
<成分等之簡稱> 實施例及比較例中使用的四羧酸成分及二胺成分、以及其簡稱如下。<Abbreviations of components, etc.> The tetracarboxylic acid components and diamine components used in the Examples and Comparative Examples, and their abbreviations are as follows.
(四羧酸成分) ODPA:4,4’-氧二鄰苯二甲酸酐(MANAC股份有限公司製;式(a-1)表示之化合物) HPMDA:1,2,4,5-環己烷四羧酸二酐(三菱瓦斯化學股份有限公司製;式(a-2-1)表示之化合物) CpODA:降莰烷-2-螺-α-環戊酮-α’-螺-2”-降莰烷-5,5”,6,6”-四羧酸二酐(JXTG energy股份有限公司製;式(a-2-2)表示之化合物) 6FDA:4,4’-(六氟異亞丙基)二鄰苯二甲酸酐(Tetracarboxylic acid component) ODPA: 4,4'-oxydiphthalic anhydride (manufactured by MANAC Co., Ltd.; compound represented by formula (a-1)) HPMDA: 1,2,4,5-cyclohexanetetracarboxylic dianhydride (manufactured by Mitsubishi Gas Chemical Co., Ltd.; compound represented by formula (a-2-1)) CpODA: norbornane-2-spiro-α-cyclopentanone-α'-spiro-2"-norbornane-5,5",6,6"-tetracarboxylic dianhydride (manufactured by JXTG energy Co., Ltd.; compound represented by formula (a-2-2)) 6FDA: 4,4'-(hexafluoroisopropylidene)diphthalic anhydride
(二胺成分) 6FODA:4,4’-二胺基-2,2’-雙三氟甲基二苯基醚(ChinaTech Chemical (Tianjin) Co., Ltd.製;式(b-1)表示之化合物) 1,3-BAC:1,3-雙(胺基甲基)環己烷(三菱瓦斯化學股份有限公司製;式(b-2a)表示之化合物) 1,4-BAC:1,4-雙(胺基甲基)環己烷(式(b-2b)表示之化合物;順式比率40%) 1,4-BACT:1,4-雙(胺基甲基)環己烷(三菱瓦斯化學股份有限公司製;式(b-2b)表示之化合物;順式率85%) X-22-9409:(信越化學工業股份有限公司製;式(b-3-1)表示之化合物) 4,4’-DDS:4,4’-二胺基二苯基碸(SEIKA股份有限公司製;式(b-3-2)表示之化合物) 3,3’-DDS:3,3’-二胺基二苯基碸(SEIKA股份有限公司製) TFMB:2,2’-雙(三氟甲基)聯苯胺(SEIKA股份有限公司製)(Diamine component) 6FODA: 4,4'-diamino-2,2'-bistrifluoromethyl diphenyl ether (manufactured by ChinaTech Chemical (Tianjin) Co., Ltd.; compound represented by formula (b-1)) 1,3-BAC: 1,3-bis(aminomethyl)cyclohexane (manufactured by Mitsubishi Gas Chemical Co., Ltd.; compound represented by formula (b-2a)) 1,4-BAC: 1,4-bis(aminomethyl)cyclohexane (compound represented by formula (b-2b); cis ratio 40%) 1,4-BACT: 1,4-bis(aminomethyl)cyclohexane (manufactured by Mitsubishi Gas Chemical Co., Ltd.; compound represented by formula (b-2b); Cis ratio 85%) X-22-9409: (Shin-Etsu Chemical Co., Ltd.; compound represented by formula (b-3-1)) 4,4’-DDS: 4,4’-diaminodiphenyl sulfone (SEIKA Co., Ltd.; compound represented by formula (b-3-2)) 3,3’-DDS: 3,3’-diaminodiphenyl sulfone (SEIKA Co., Ltd.) TFMB: 2,2’-bis(trifluoromethyl)benzidine (SEIKA Co., Ltd.)
<聚醯亞胺樹脂、清漆及聚醯亞胺薄膜之製造> 實施例1 將6FODA 16.812g(0.0500莫耳)、1,4-BACT 7.113g(0.0500莫耳)及γ-丁內酯(三菱化學股份有限公司製)65.935g添加至配備有不銹鋼製半月型攪拌翼、氮氣導入管、安裝有冷卻管之迪安-斯塔克裝置、溫度計、玻璃製端蓋的300mL之5口丸底圓底燒瓶中,於系內溫度70℃、氮氣環境下,以轉速200rpm進行攪拌而獲得到溶液。 將ODPA 31.021g(0.100莫耳)、及γ-丁內酯(三菱化學股份有限公司製) 16.484g一次添加於該溶液中後,添加三乙胺(關東化學股份有限公司製)0.506g作為醯亞胺化觸媒,利用加熱套加熱,歷時約20分鐘使反應系內溫度上升至190℃為止。收集餾去之成分,配合黏度上升調整轉速,同時將反應系內溫度保持於190℃並回流約5小時。 其後,以使固體成分濃度成為15質量%之方式,添加γ-丁內酯(三菱化學股份有限公司製)208.517g,使反應系內溫度冷卻至100℃後,近一步攪拌約1小時使其均勻化,獲得聚醯亞胺清漆。 然後,將獲得之聚醯亞胺清漆藉由旋塗塗佈在玻璃板上,利用加熱板於80℃保持20分鐘,其後,於氮氣環境下、熱風乾燥機中300℃加熱30分鐘(升溫速度5℃/min),使溶劑蒸發而獲得薄膜。<Production of polyimide resin, varnish and polyimide film> Example 1 16.812 g (0.0500 mol) of 6FODA, 7.113 g (0.0500 mol) of 1,4-BACT and 65.935 g of γ-butyrolactone (Mitsubishi Chemical Co., Ltd.) were added to a 300 mL 5-necked round-bottom flask equipped with a stainless steel half-moon stirring blade, a nitrogen inlet pipe, a Dean-Stark apparatus equipped with a cooling tube, a thermometer and a glass end cap, and stirred at a temperature of 70°C in a nitrogen environment at a rotation speed of 200 rpm to obtain a solution. After adding 31.021g (0.100 mol) of ODPA and 16.484g of γ-butyrolactone (Mitsubishi Chemical Co., Ltd.) to the solution at once, 0.506g of triethylamine (Kanto Chemical Co., Ltd.) was added as an imidization catalyst, and the temperature in the reaction system was raised to 190°C in about 20 minutes using a heating jacket. The distilled components were collected, and the rotation speed was adjusted according to the increase in viscosity. At the same time, the temperature in the reaction system was maintained at 190°C and refluxed for about 5 hours. Then, 208.517 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Co., Ltd.) was added so that the solid content concentration became 15% by mass, and the temperature in the reaction system was cooled to 100°C, and then stirred for about 1 hour to make it uniform, thereby obtaining a polyimide varnish. Then, the obtained polyimide varnish was applied on a glass plate by spin coating, and maintained at 80°C for 20 minutes using a heating plate, and then heated at 300°C for 30 minutes (heating rate 5°C/min) in a hot air dryer under a nitrogen environment to evaporate the solvent and obtain a film.
實施例2 將ODPA之量從31.021g(0.100莫耳)變更為24.817g(0.080莫耳),並追加CpODA 7.688g(0.020莫耳),除此之外,利用與實施例1相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Example 2 The amount of ODPA was changed from 31.021 g (0.100 mol) to 24.817 g (0.080 mol), and 7.688 g (0.020 mol) of CpODA was added. In addition, a polyimide varnish was prepared by the same method as in Example 1 to obtain a polyimide varnish having a solid content concentration of 15% by mass. The obtained polyimide varnish was used to obtain a film by the same method as in Example 1.
實施例3 將6FODA之量從16.812g(0.0500莫耳)變更為16.429g(0.04886莫耳),將1,4-BACT之量從7.113g(0.0500莫耳)變更為6.950g(0.04886莫耳),並追加2.941g(0.00228莫耳)之X-22-9409,除此之外,利用與實施例2相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Example 3 The amount of 6FODA was changed from 16.812 g (0.0500 mol) to 16.429 g (0.04886 mol), the amount of 1,4-BACT was changed from 7.113 g (0.0500 mol) to 6.950 g (0.04886 mol), and 2.941 g (0.00228 mol) of X-22-9409 was added. In addition, a polyimide varnish was prepared by the same method as in Example 2 to obtain a polyimide varnish having a solid content concentration of 15% by mass. The obtained polyimide varnish was used to obtain a film by the same method as in Example 1.
實施例4 將6FODA之量從16.812g(0.0500莫耳)變更為16.012g(0.04762莫耳),將1,4-BACT之量從7.113g(0.0500莫耳)變更為6.774g(0.04762莫耳),並追加6.140g(0.00476莫耳)之X-22-9409,除此之外,利用與實施例2相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Example 4 The amount of 6FODA was changed from 16.812 g (0.0500 mol) to 16.012 g (0.04762 mol), the amount of 1,4-BACT was changed from 7.113 g (0.0500 mol) to 6.774 g (0.04762 mol), and 6.140 g (0.00476 mol) of X-22-9409 was added. In addition, a polyimide varnish was prepared by the same method as in Example 2 to obtain a polyimide varnish having a solid content concentration of 15% by mass. The obtained polyimide varnish was used to obtain a film by the same method as in Example 1.
實施例5 將ODPA之量從31.021g(0.100莫耳)變更為15.511g(0.050莫耳),並追加CpODA 19.219g(0.050莫耳),將6FODA之量從16.812g(0.0500莫耳)變更為15.980g(0.04753莫耳),將1,4-BACT之量從7.113g(0.0500莫耳)變更為6.760g(0.04753莫耳),並追加6.386g(0.00495莫耳)之X-22-9409,除此之外,利用與實施例1相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Example 5 The amount of ODPA was changed from 31.021g (0.100 mol) to 15.511g (0.050 mol), and 19.219g (0.050 mol) of CpODA was added. The amount of 6FODA was changed from 16.812g (0.0500 mol) to 15.980g (0.04753 mol), and the amount of 1,4-BACT was changed from 7.113g (0.0500 mol) to 6.760g (0.04753 mol), and 6.386g (0.00495 mol) of X-22-9409 was added. In addition, a polyimide varnish was prepared by the same method as in Example 1 to obtain a polyimide varnish having a solid content concentration of 15% by mass. Using the obtained polyimide varnish, a film was obtained by the same method as in Example 1.
實施例6 將ODPA之量從31.021g(0.100莫耳)變更為15.511g(0.050莫耳),並追加HPMDA 11.209g(0.050莫耳),除此之外,利用與實施例1相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Example 6 The amount of ODPA was changed from 31.021 g (0.100 mol) to 15.511 g (0.050 mol), and HPMDA 11.209 g (0.050 mol) was added. In addition, a polyimide varnish was prepared by the same method as in Example 1 to obtain a polyimide varnish having a solid content concentration of 15% by mass. The obtained polyimide varnish was used to obtain a film by the same method as in Example 1.
實施例7 將CpODA 7.688g(0.020莫耳)變更為HPMDA 4.483(0.020莫耳),除此之外,利用與實施例2相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Example 7 CpODA 7.688g (0.020 mol) was replaced with HPMDA 4.483 (0.020 mol). In addition, a polyimide varnish was prepared in the same manner as in Example 2 to obtain a polyimide varnish having a solid content of 15% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
實施例8 將6FODA之量從16.812g(0.0500莫耳)變更為6.725g(0.020莫耳),將1,4-BACT之量從7.113g(0.0500莫耳)變更為11.380g(0.080莫耳),除此之外,利用與實施例6相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 然後,將獲得之聚醯亞胺清漆藉由旋塗塗佈在玻璃板上,利用加熱板於80℃保持20分鐘,其後,於空氣環境下、熱風乾燥機中240℃加熱60分鐘,使溶劑蒸發而獲得薄膜。Example 8 The amount of 6FODA was changed from 16.812 g (0.0500 mol) to 6.725 g (0.020 mol), and the amount of 1,4-BACT was changed from 7.113 g (0.0500 mol) to 11.380 g (0.080 mol). In addition, a polyimide varnish was prepared by the same method as in Example 6 to obtain a polyimide varnish having a solid content concentration of 15% by mass. Then, the obtained polyimide varnish was applied on a glass plate by spin coating, maintained at 80°C for 20 minutes using a heating plate, and then heated at 240°C for 60 minutes in an air environment in a hot air dryer to evaporate the solvent and obtain a film.
實施例9 將1,4-BACT 7.113g(0.0500莫耳)變更為1,3-BAC 7.113g(0.0500莫耳),除此之外,利用與實施例1相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Example 9 In addition to changing 1,4-BACT 7.113 g (0.0500 mol) to 1,3-BAC 7.113 g (0.0500 mol), a polyimide varnish was prepared in the same manner as in Example 1 to obtain a polyimide varnish having a solid content of 15% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
實施例10 將6FODA之量從16.812g(0.0500莫耳)變更為13.450g(0.0400莫耳),將1,4-BACT之量從7.113g(0.0500莫耳)變更為8.535g(0.0600莫耳),除此之外,利用與實施例6相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 然後,將獲得之聚醯亞胺清漆藉由旋塗塗佈在玻璃板上,利用加熱板於80℃保持20分鐘,其後,於空氣環境下、熱風乾燥機中260℃加熱30分鐘,使溶劑蒸發而獲得薄膜。Example 10 The amount of 6FODA was changed from 16.812 g (0.0500 mol) to 13.450 g (0.0400 mol), and the amount of 1,4-BACT was changed from 7.113 g (0.0500 mol) to 8.535 g (0.0600 mol). In addition, a polyimide varnish was prepared by the same method as in Example 6 to obtain a polyimide varnish having a solid content concentration of 15% by mass. Then, the obtained polyimide varnish was applied on a glass plate by spin coating, maintained at 80°C for 20 minutes using a heating plate, and then heated at 260°C for 30 minutes in an air environment in a hot air dryer to evaporate the solvent and obtain a film.
實施例11 將1,4-BACT 7.113g(0.0500莫耳)變更為1,4-BAC 7.113g(0.0500莫耳),除此之外,利用與實施例6相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例10相同之方法獲得薄膜。Example 11 In addition to changing 1,4-BACT 7.113 g (0.0500 mol) to 1,4-BAC 7.113 g (0.0500 mol), a polyimide varnish was prepared in the same manner as in Example 6 to obtain a polyimide varnish having a solid content of 15% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 10.
實施例12 將6FODA之量從16.812g(0.0500莫耳)變更為10.087g(0.0300莫耳),並追加4,4’-DDS 4.966g(0.0200莫耳),除此之外,利用與實施例6相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例10相同之方法獲得薄膜。Example 12 The amount of 6FODA was changed from 16.812 g (0.0500 mol) to 10.087 g (0.0300 mol), and 4,4'-DDS 4.966 g (0.0200 mol) was added. In addition, a polyimide varnish was prepared by the same method as in Example 6 to obtain a polyimide varnish having a solid content concentration of 15% by mass. The obtained polyimide varnish was used to obtain a film by the same method as in Example 10.
比較例1 將6FODA 16.812g(0.0500莫耳)變更為TFMB 16.012g(0.0500莫耳),除此之外,利用與實施例1相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Comparative Example 1 In addition to changing 6FODA 16.812 g (0.0500 mol) to TFMB 16.012 g (0.0500 mol), a polyimide varnish was prepared in the same manner as in Example 1 to obtain a polyimide varnish having a solid content concentration of 15% by mass. A film was obtained using the obtained polyimide varnish in the same manner as in Example 1.
比較例2 將6FODA之量從16.812g(0.0500莫耳)變更為33.624g(0.100莫耳),將1,4-BACT之量從7.113g(0.0500莫耳)變更為0g(0莫耳),除此之外,利用與實施例1相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Comparative Example 2 The amount of 6FODA was changed from 16.812 g (0.0500 mol) to 33.624 g (0.100 mol), and the amount of 1,4-BACT was changed from 7.113 g (0.0500 mol) to 0 g (0 mol). In addition, a polyimide varnish was prepared by the same method as in Example 1 to obtain a polyimide varnish having a solid content concentration of 15% by mass. Using the obtained polyimide varnish, a film was obtained by the same method as in Example 1.
比較例3 將6FODA 16.812g(0.0500莫耳)變更為3,3’-DDS 12.415g(0.0500莫耳),除此之外,利用與實施例9相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Comparative Example 3 In addition to changing 6FODA 16.812 g (0.0500 mol) to 3,3'-DDS 12.415 g (0.0500 mol), a polyimide varnish was prepared in the same manner as in Example 9 to obtain a polyimide varnish having a solid content concentration of 15% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
比較例4 將ODPA 31.021g(0.100莫耳)變更為6FDA 44.424g(0.100莫耳),除此之外,利用與實施例1相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例1相同之方法獲得薄膜。Comparative Example 4 In addition to changing ODPA 31.021 g (0.100 mol) to 6FDA 44.424 g (0.100 mol), a polyimide varnish was prepared in the same manner as in Example 1 to obtain a polyimide varnish having a solid content concentration of 15% by mass. A film was obtained using the obtained polyimide varnish in the same manner as in Example 1.
比較例5 將ODPA 31.021g(0.100莫耳)變更為HPMDA 22.417g(0.100莫耳),將6FODA之量從16.812g(0.0500莫耳)變更為33.624g(0.100莫耳),將1,4-BACT之量從7.113g(0.0500莫耳)變更為0g(0莫耳),除此之外,利用與實施例1相同之方法製作聚醯亞胺清漆,獲得固體成分濃度15質量%之聚醯亞胺清漆。 使用獲得之聚醯亞胺清漆,利用與實施例10相同之方法獲得薄膜。Comparative Example 5 In addition to changing ODPA 31.021g (0.100 mol) to HPMDA 22.417g (0.100 mol), changing the amount of 6FODA from 16.812g (0.0500 mol) to 33.624g (0.100 mol), and changing the amount of 1,4-BACT from 7.113g (0.0500 mol) to 0g (0 mol), a polyimide varnish was prepared by the same method as in Example 1 to obtain a polyimide varnish having a solid content concentration of 15% by mass. The obtained polyimide varnish was used to obtain a film by the same method as in Example 10.
針對實施例及比較例所獲得之聚醯亞胺薄膜,實施前述物性測定及評價。結果示於表1。The above-mentioned physical property measurements and evaluations were performed on the polyimide films obtained in the Examples and Comparative Examples. The results are shown in Table 1.
[表1] [Table 1]
如表1所示,可知實施例之聚醯亞胺薄膜光學等向性良好,此外柔軟性及耐藥品性亦優異。As shown in Table 1, it can be seen that the polyimide film of the embodiment has good optical isotropy, and also has excellent flexibility and chemical resistance.
Claims (7)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-208196 | 2019-11-18 | ||
| JP2019208196 | 2019-11-18 | ||
| JP2019-239645 | 2019-12-27 | ||
| JP2019239645 | 2019-12-27 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202124531A TW202124531A (en) | 2021-07-01 |
| TWI868252B true TWI868252B (en) | 2025-01-01 |
Family
ID=75980817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109140355A TWI868252B (en) | 2019-11-18 | 2020-11-18 | Polyimide resin, polyimide varnish, and polyimide film |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7647567B2 (en) |
| KR (1) | KR20220104696A (en) |
| CN (1) | CN114729122B (en) |
| TW (1) | TWI868252B (en) |
| WO (1) | WO2021100727A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115038737B (en) * | 2020-01-31 | 2024-10-25 | 三菱瓦斯化学株式会社 | Polyimide resin, polyimide varnish and polyimide film |
| KR20240032918A (en) * | 2021-09-22 | 2024-03-12 | 데쿠세리아루즈 가부시키가이샤 | Manufacturing method of connection structure |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103044916A (en) * | 2012-12-24 | 2013-04-17 | 南京依麦德光电材料科技有限公司 | Flexible transparent polyimide thin film and preparation method thereof |
| CN108424540A (en) * | 2018-04-28 | 2018-08-21 | 同济大学 | A kind of transparent polyimide film and preparation method thereof |
| JP2018203906A (en) * | 2017-06-06 | 2018-12-27 | 旭化成株式会社 | Polyimide film, product using polyimide film, and laminate |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103980489B (en) * | 2014-04-30 | 2018-08-31 | 中国科学院化学研究所 | A kind of low melt viscosity thermoplastic polyimide material and its 3D printing forming method |
| WO2016158825A1 (en) | 2015-03-31 | 2016-10-06 | 旭化成株式会社 | Polyimide film, polyimide varnish, product using polyimide film, and laminate |
| WO2019131894A1 (en) * | 2017-12-28 | 2019-07-04 | 宇部興産株式会社 | Polyimide precursor, polyimide, polyimide film, varnish and substrate |
| CN110330644A (en) * | 2019-06-14 | 2019-10-15 | 广州奥松电子有限公司 | A kind of wet sensory material and the preparation method and application thereof |
-
2020
- 2020-11-18 WO PCT/JP2020/042883 patent/WO2021100727A1/en not_active Ceased
- 2020-11-18 CN CN202080078721.8A patent/CN114729122B/en active Active
- 2020-11-18 JP JP2021558404A patent/JP7647567B2/en active Active
- 2020-11-18 TW TW109140355A patent/TWI868252B/en active
- 2020-11-18 KR KR1020227016090A patent/KR20220104696A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103044916A (en) * | 2012-12-24 | 2013-04-17 | 南京依麦德光电材料科技有限公司 | Flexible transparent polyimide thin film and preparation method thereof |
| JP2018203906A (en) * | 2017-06-06 | 2018-12-27 | 旭化成株式会社 | Polyimide film, product using polyimide film, and laminate |
| CN108424540A (en) * | 2018-04-28 | 2018-08-21 | 同济大学 | A kind of transparent polyimide film and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP7647567B2 (en) | 2025-03-18 |
| CN114729122A (en) | 2022-07-08 |
| TW202124531A (en) | 2021-07-01 |
| CN114729122B (en) | 2024-06-18 |
| KR20220104696A (en) | 2022-07-26 |
| WO2021100727A1 (en) | 2021-05-27 |
| JPWO2021100727A1 (en) | 2021-05-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6996609B2 (en) | Polyimide resin, polyimide varnish and polyimide film | |
| JP7180617B2 (en) | Polyimide resin composition and polyimide film | |
| US20210395568A1 (en) | Polyimide resin, varnish, and polyimide film | |
| JP7384170B2 (en) | Polyimide resin, polyimide varnish and polyimide film | |
| TWI777005B (en) | Polyimide resin, polyimide varnish, and polyimide film | |
| JP7367699B2 (en) | Polyimide resin, polyimide varnish and polyimide film | |
| KR102781850B1 (en) | Polyimide resin, polyimide varnish and polyimide film | |
| TWI878418B (en) | Polyimide resin, varnish and polyimide film | |
| TWI868252B (en) | Polyimide resin, polyimide varnish, and polyimide film | |
| TWI861323B (en) | Polyimide resin, polyimide varnish and polyimide film | |
| CN111741996B (en) | Polyimide resin, polyimide varnish, and polyimide film | |
| TWI865714B (en) | Polyimide resin, polyimide varnish, and polyimide film | |
| TWI884293B (en) | Polyimide resin, polyimide varnish, and polyimide film | |
| TWI839543B (en) | Polyimide resin, polyimide varnish, and polyimide film | |
| TWI875901B (en) | Polyimide resin, polyimide resin composition, polyimide varnish and polyimide film | |
| KR102692868B1 (en) | Polyimide resin, polyimide varnish and polyimide film | |
| TWI869557B (en) | Polyimide resin, polyimide varnish, and polyimide film | |
| TW202104364A (en) | Polyimide resin, polyimide varnish, and polyimide film | |
| KR102737050B1 (en) | Polyimide resin, polyimide varnish and polyimide film | |
| TW202136393A (en) | Method for producing polyimide film |