TWI861323B - Polyimide resin, polyimide varnish and polyimide film - Google Patents
Polyimide resin, polyimide varnish and polyimide film Download PDFInfo
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Abstract
Description
本發明關於聚醯亞胺樹脂、聚醯亞胺清漆、以及聚醯亞胺薄膜。The present invention relates to a polyimide resin, a polyimide varnish, and a polyimide film.
已有人探討聚醯亞胺樹脂在電氣及電子零件等領域中各種的利用。例如為了裝置的輕量化、撓性化而期望將液晶顯示器、或OLED顯示器等圖像顯示裝置所使用的玻璃基板替換成塑膠基板,且適合作為該塑膠基板之聚醯亞胺薄膜的研究正在進行。 圖像顯示裝置用途所使用的薄膜會要求各種光學特性。例如,在從顯示元件發射的光通過塑膠基板而出射的情況,會對於塑膠基板要求無色透明性。 另一方面,在光通過相位差薄膜、偏光板的用途,例如使用於液晶顯示器、觸控面板等的情況,尤其要求光學各向同性高(亦即Rth低)。There are studies on various uses of polyimide resins in the fields of electrical and electronic components. For example, in order to make the device lighter and more flexible, it is expected that the glass substrate used in image display devices such as liquid crystal displays or OLED displays will be replaced with a plastic substrate, and research on polyimide films suitable as the plastic substrate is underway. Films used for image display devices require various optical properties. For example, when light emitted from a display element passes through a plastic substrate, the plastic substrate is required to be colorless and transparent. On the other hand, when light passes through a phase difference film or a polarizing plate, such as when used in liquid crystal displays, touch panels, etc., high optical isotropy (i.e., low Rth) is particularly required.
為了滿足如上述之性能,已進行各種組成的聚醯亞胺樹脂之開發。例如,專利文獻1揭示為了獲得含有對溶劑之溶解性良好、加工性優良的聚醯胺,且為無色透明,韌性優良的聚醯亞胺薄膜,而包含由3,3’-二胺基二苯基碸與其它特定的二胺之組合構成的結構作為二胺成分之聚醯亞胺薄膜。 [先前技術文獻] [專利文獻]In order to satisfy the above-mentioned properties, polyimide resins of various compositions have been developed. For example, Patent Document 1 discloses a polyimide film having a structure composed of a combination of 3,3'-diaminodiphenylsulfone and other specific diamines as a diamine component in order to obtain a polyimide film having good solubility in solvents and excellent processability, and being colorless, transparent, and having excellent toughness. [Prior Art Document] [Patent Document]
[專利文獻1]國際公開第2016/158825號[Patent Document 1] International Publication No. 2016/158825
[發明所欲解決之課題][The problem that the invention wants to solve]
如上所述,尤其在顯示器等之用途,尋求光學各向同性優良的聚醯亞胺薄膜。 此外,也尋求耐藥品性高的聚醯亞胺薄膜。例如,為了在聚醯亞胺薄膜之上形成其它的樹脂層(例如彩色濾光片、阻劑)而將該樹脂層形成用之清漆塗佈於聚醯亞胺薄膜時,聚醯亞胺薄膜需要對該清漆中所含的溶劑有耐受性。聚醯亞胺薄膜之耐溶劑性不足的話,會有因為薄膜的溶解、膨潤而有失去製成基板的意義之疑慮。但是,如前所述,為了確保光學特性,在製作聚醯亞胺薄膜時必須製成溶液,兼顧這些性質並不容易。 又,使用聚醯亞胺薄膜作為基板時,在薄膜上製作電子電路的步驟中,會使薄膜黏合於玻璃板等支持體上。因此,在電路製作後,亦會要求輕易地將聚醯亞胺薄膜從支持體剝離之特性。 如此,尋求可維持得到的聚醯亞胺薄膜之光學特性,尤其光學各向同性,同時可獲得剝離性與耐藥品性優良的聚醯亞胺薄膜之聚醯亞胺樹脂。 於是,本發明之課題係提供能形成光學各向同性優良,此外剝離性與耐藥品性亦優良的薄膜之聚醯亞胺樹脂,以及提供聚醯亞胺清漆、以及聚醯亞胺薄膜。 [解決課題之手段]As mentioned above, especially for the use of displays, polyimide films with excellent optical isotropy are sought. In addition, polyimide films with high chemical resistance are also sought. For example, in order to form other resin layers (such as color filters, resists) on the polyimide film, when the varnish used to form the resin layer is applied to the polyimide film, the polyimide film needs to be resistant to the solvent contained in the varnish. If the solvent resistance of the polyimide film is insufficient, there is a concern that the film will dissolve and swell, and the meaning of making a substrate will be lost. However, as mentioned above, in order to ensure the optical properties, the polyimide film must be made into a solution when making it, and it is not easy to take these properties into consideration. Furthermore, when a polyimide film is used as a substrate, the film will adhere to a support such as a glass plate during the step of making an electronic circuit on the film. Therefore, after the circuit is made, the polyimide film is also required to be easily peeled off from the support. In this way, a polyimide resin is sought that can maintain the optical properties of the obtained polyimide film, especially the optical isotropy, and can obtain a polyimide film with excellent peeling properties and chemical resistance. Therefore, the subject of the present invention is to provide a polyimide resin that can form a film with excellent optical isotropy, and also excellent peeling properties and chemical resistance, as well as to provide a polyimide varnish and a polyimide film. [Means for Solving the Problem]
本發明人們發現,包含特定的2種來自四羧酸二酐之構成單元與特定的2種來自二胺之構成單元之組合的聚醯亞胺樹脂,可解決上述課題,乃至完成本發明。The inventors of the present invention have found that a polyimide resin comprising a combination of two specific constituent units derived from tetracarboxylic dianhydride and two specific constituent units derived from diamine can solve the above-mentioned problems, and thus the present invention has been completed.
亦即,本發明關於下述<1>~<5>。 <1>一種聚醯亞胺樹脂,具有來自四羧酸二酐之構成單元A及來自二胺之構成單元B;構成單元A包含來自下式(a-1)表示之化合物之構成單元(A-1)、及來自下式(a-2)表示之化合物之構成單元(A-2),構成單元B包含來自下式(b-1)表示之化合物之構成單元(B-1)、及來自下式(b-2)表示之化合物之構成單元(B-2)。That is, the present invention relates to the following <1> to <5>. <1> A polyimide resin having a constituent unit A derived from tetracarboxylic dianhydride and a constituent unit B derived from a diamine; the constituent unit A comprises a constituent unit (A-1) derived from a compound represented by the following formula (a-1) and a constituent unit (A-2) derived from a compound represented by the following formula (a-2), and the constituent unit B comprises a constituent unit (B-1) derived from a compound represented by the following formula (b-1) and a constituent unit (B-2) derived from a compound represented by the following formula (b-2).
[化1] [Chemistry 1]
<2>如上述<1>所記載之聚醯亞胺樹脂,其中,構成單元A中之構成單元(A-1)的比率為20~80莫耳%,構成單元A中之構成單元(A-2)的比率為20~80莫耳%。 <3>如上述<1>或<2>所記載之聚醯亞胺樹脂,其中,構成單元B中之構成單元(B-1)的比率為5~80莫耳%,構成單元B中之構成單元(B-2)的比率為20~95莫耳%。 <4>一種聚醯亞胺清漆,係將如上述<1>~<3>中任一項所記載之聚醯亞胺樹脂溶解於有機溶劑而成。 <5>一種聚醯亞胺薄膜,含有如上述<1>~<3>中任一項所記載之聚醯亞胺樹脂。 [發明之效果]<2> The polyimide resin described in <1> above, wherein the ratio of the constituent unit (A-1) in the constituent unit A is 20 to 80 mol%, and the ratio of the constituent unit (A-2) in the constituent unit A is 20 to 80 mol%. <3> The polyimide resin described in <1> or <2> above, wherein the ratio of the constituent unit (B-1) in the constituent unit B is 5 to 80 mol%, and the ratio of the constituent unit (B-2) in the constituent unit B is 20 to 95 mol%. <4> A polyimide varnish obtained by dissolving the polyimide resin described in any one of <1> to <3> above in an organic solvent. <5> A polyimide film comprising a polyimide resin as described in any one of <1> to <3> above. [Effect of the invention]
根據本發明,可提供能形成光學各向同性優良,此外剝離性與耐藥品性亦優良的薄膜之聚醯亞胺樹脂、聚醯亞胺清漆、以及聚醯亞胺薄膜。According to the present invention, a polyimide resin, a polyimide varnish, and a polyimide film can be provided which can form a film having excellent optical isotropy, and also excellent peeling property and chemical resistance.
[聚醯亞胺樹脂] 本發明之聚醯亞胺樹脂,係具有來自四羧酸二酐之構成單元A及來自二胺之構成單元B的聚醯亞胺樹脂,其中,構成單元A包含來自下式(a-1)表示之化合物之構成單元(A-1)、及來自下式(a-2)表示之化合物之構成單元(A-2),構成單元B包含來自下式(b-1)表示之化合物之構成單元(B-1)、及來自下式(b-2)表示之化合物之構成單元(B-2)。[Polyimide resin] The polyimide resin of the present invention is a polyimide resin having a constituent unit A derived from tetracarboxylic dianhydride and a constituent unit B derived from a diamine, wherein the constituent unit A comprises a constituent unit (A-1) derived from a compound represented by the following formula (a-1) and a constituent unit (A-2) derived from a compound represented by the following formula (a-2), and the constituent unit B comprises a constituent unit (B-1) derived from a compound represented by the following formula (b-1) and a constituent unit (B-2) derived from a compound represented by the following formula (b-2).
[化2] [Chemistry 2]
本發明之聚醯亞胺樹脂維持光學各向同性同時剝離性與耐藥品性優良的理由不詳,但據認為本發明之聚醯亞胺樹脂除了具有醚結構之外,還具有磺醯基結構,亦具有脂環族結構,故光學各向同性優良,此外剝離性與耐藥品性亦優良。The reason why the polyimide resin of the present invention maintains optical isotropy and has excellent peeling property and chemical resistance is unknown, but it is believed that the polyimide resin of the present invention has a sulfonyl structure and an alicyclic structure in addition to an ether structure, so it has excellent optical isotropy, and also has excellent peeling property and chemical resistance.
<構成單元A> 構成單元A為聚醯亞胺樹脂中所佔之來自四羧酸二酐之構成單元。 構成單元A包含來自下式(a-1)表示之化合物之構成單元(A-1)、及來自下式(a-2)表示之化合物之構成單元(A-2)。<Constituent unit A> Constituent unit A is a constituent unit derived from tetracarboxylic dianhydride contained in the polyimide resin. Constituent unit A includes a constituent unit (A-1) derived from a compound represented by the following formula (a-1) and a constituent unit (A-2) derived from a compound represented by the following formula (a-2).
[化3] [Chemistry 3]
式(a-1)表示之化合物為4,4’-氧二鄰苯二甲酸酐。 構成單元A藉由包含構成單元(A-1),可使耐藥品性、光學各向同性、透明性改善。 式(a-2)表示之化合物為1,2,4,5-環己烷四甲酸二酐。 構成單元A藉由包含構成單元(A-2),可使得到的聚醯亞胺樹脂溶解到清漆之溶解性提高,同時使耐藥品性、光學各向同性改善。The compound represented by formula (a-1) is 4,4'-oxydiphthalic anhydride. By including the constituent unit (A-1), the chemical resistance, optical isotropy, and transparency of the constituent unit A can be improved. The compound represented by formula (a-2) is 1,2,4,5-cyclohexanetetracarboxylic dianhydride. By including the constituent unit (A-2), the solubility of the obtained polyimide resin in the varnish can be improved, and the chemical resistance and optical isotropy can be improved.
構成單元A中之構成單元(A-1)的比率宜為20~80莫耳%,為30~70莫耳%更佳,為40~60莫耳%再更佳。 構成單元A中之構成單元(A-2)的比率宜為20~80莫耳%,為30~70莫耳%更佳,為40~60莫耳%再更佳。 構成單元A中之構成單元(A-1)及(A-2)之合計的比率宜為50莫耳%以上,為70莫耳%以上更佳,為90莫耳%以上再更佳。構成單元(A-1)及(A-2)之合計的比率之上限值並無特別限制,亦即為100莫耳%。構成單元A也可僅由構成單元(A-1)及構成單元(A-2)構成。 本發明之聚醯亞胺樹脂中,構成單元A藉由包含構成單元(A-1)及(A-2)兩者,則不僅如前述般光學各向同性、剝離性、耐藥品性中任一皆為優良,且在製造聚醯亞胺樹脂時,隨醯亞胺化反應進行而生成的聚合物溶解到溶劑之溶解度亦高,並可獲得透明的清漆及薄膜。 構成單元A中之構成單元(A-1)與構成單元(A-2)的莫耳比[(A-1)/(A-2)],考慮使光學各向同性及耐藥品性改善之觀點,宜為20/80~80/20,為30/70~70/30更佳,為40/60~60/40再更佳。The ratio of the constituent unit (A-1) in the constituent unit A is preferably 20 to 80 mol%, preferably 30 to 70 mol%, and more preferably 40 to 60 mol%. The ratio of the constituent unit (A-2) in the constituent unit A is preferably 20 to 80 mol%, preferably 30 to 70 mol%, and more preferably 40 to 60 mol%. The total ratio of the constituent units (A-1) and (A-2) in the constituent unit A is preferably 50 mol% or more, preferably 70 mol% or more, and more preferably 90 mol% or more. The upper limit of the total ratio of the constituent units (A-1) and (A-2) is not particularly limited, that is, 100 mol%. The constituent unit A may also be composed of only the constituent units (A-1) and (A-2). In the polyimide resin of the present invention, the constituent unit A comprises both constituent units (A-1) and (A-2), so that not only are the optical isotropy, peeling property, and chemical resistance all excellent as described above, but also the polymer generated by the imidization reaction during the manufacture of the polyimide resin has a high solubility in the solvent, and a transparent varnish and film can be obtained. The molar ratio [(A-1)/(A-2)] of the constituent unit (A-1) to the constituent unit (A-2) in the constituent unit A is preferably 20/80 to 80/20, more preferably 30/70 to 70/30, and even more preferably 40/60 to 60/40 from the viewpoint of improving the optical isotropy and chemical resistance.
構成單元A也可包含構成單元(A-1)及構成單元(A-2)以外的構成單元。提供如此的構成單元之四羧酸二酐並無特別限制,可列舉:均苯四甲酸二酐、3,3’,4,4’-聯苯四甲酸二酐、9,9’-雙(3,4-二羧基苯基)茀二酐、及4,4’-(六氟亞異丙基)二苯二甲酸酐等芳香族四羧酸二酐(惟,排除式(a-1)表示之化合物);1,2,3,4-環丁烷四甲酸二酐、降莰烷-2-螺-α-環戊酮-α’-螺-2’’-降莰烷-5,5’’,6,6’’-四甲酸二酐等脂環族四羧酸二酐(惟,排除式(a-2)表示之化合物);以及1,2,3,4-丁烷四甲酸二酐等脂肪族四羧酸二酐。 另外,本說明書中,芳香族四羧酸二酐意指含有1個以上之芳香環的四羧酸二酐,脂環族四羧酸二酐意指含有1個以上之脂環且不含芳香環的四羧酸二酐,脂肪族四羧酸二酐意指不含芳香環也不含脂環的四羧酸二酐。 構成單元A可任意包含之構成單元可為1種,也可為2種以上。The constituent unit A may include constituent units other than the constituent unit (A-1) and the constituent unit (A-2). The tetracarboxylic dianhydride providing such a constituent unit is not particularly limited, and examples thereof include: aromatic tetracarboxylic dianhydrides such as pyromellitic dianhydride, 3,3',4,4'-biphenyltetracarboxylic dianhydride, 9,9'-bis(3,4-dicarboxyphenyl)fluorene dianhydride, and 4,4'-(hexafluoroisopropylidene)diphthalic anhydride (but excluding compounds represented by formula (a-1)); alicyclic tetracarboxylic dianhydrides such as 1,2,3,4-cyclobutanetetracarboxylic dianhydride, norbornane-2-spiro-α-cyclopentanone-α'-spiro-2''-norbornane-5,5'',6,6''-tetracarboxylic dianhydride (but excluding compounds represented by formula (a-2)); and aliphatic tetracarboxylic dianhydrides such as 1,2,3,4-butanetetracarboxylic dianhydride. In addition, in this specification, aromatic tetracarboxylic dianhydride means a tetracarboxylic dianhydride containing one or more aromatic rings, alicyclic tetracarboxylic dianhydride means a tetracarboxylic dianhydride containing one or more alicyclic rings and no aromatic ring, and aliphatic tetracarboxylic dianhydride means a tetracarboxylic dianhydride containing neither an aromatic ring nor an alicyclic ring. The constituent unit A may contain one or more constituent units.
<構成單元B> 構成單元B為聚醯亞胺樹脂中所佔之來自二胺之構成單元,其中,包含來自下式(b-1)表示之化合物之構成單元(B-1)、及來自下式(b-2)表示之化合物之構成單元(B-2)。<Constituent unit B> Constituent unit B is a constituent unit derived from diamine in the polyimide resin, and includes a constituent unit (B-1) derived from a compound represented by the following formula (b-1) and a constituent unit (B-2) derived from a compound represented by the following formula (b-2).
[化4] [Chemistry 4]
式(b-1)表示之化合物為4,4’-二胺基二苯基碸。構成單元B藉由包含構成單元(B-1),可使薄膜的韌性、剝離性改善,也可進一步使耐熱性良好。The compound represented by formula (b-1) is 4,4'-diaminodiphenylsulfonium. By including the constituent unit (B-1), the toughness and peeling properties of the film can be improved, and the heat resistance can be further improved.
式(b-2)表示之化合物為雙(胺基甲基)環己烷,其具體例可列舉:下式(b-2a)表示之1,3-雙(胺基甲基)環己烷、下式(b-2b)表示之1,4-雙(胺基甲基)環己烷。The compound represented by formula (b-2) is bis(aminomethyl)cyclohexane, and specific examples thereof include 1,3-bis(aminomethyl)cyclohexane represented by the following formula (b-2a) and 1,4-bis(aminomethyl)cyclohexane represented by the following formula (b-2b).
[化5] 式(b-2)表示之化合物的順式:反式比,考慮耐有機溶劑性、耐熱性之觀點,宜為0:100~80:20,為0.1:99.9~70:30更佳,為0.5:99.5~60:40再更佳,為1:99~20:80又更佳。 構成單元B藉由包含構成單元(B-2),可使薄膜的無色透明性及光學各向同性改善。[Chemistry 5] The cis:trans ratio of the compound represented by formula (b-2) is preferably 0:100 to 80:20, more preferably 0.1:99.9 to 70:30, more preferably 0.5:99.5 to 60:40, and even more preferably 1:99 to 20:80, from the viewpoint of resistance to organic solvents and heat resistance. By including the constituent unit (B-2), the colorless transparency and optical isotropy of the film can be improved.
構成單元B中之構成單元(B-1)的比率宜為5~80莫耳%,為10~70莫耳%更佳,為30~70莫耳%再更佳,為45~70莫耳%又更佳,為45~60莫耳%再更佳。 構成單元B中之構成單元(B-2)的比率宜為20~95莫耳%,為30~90莫耳%更佳,為30~70莫耳%再更佳,為30~55莫耳%又更佳,為40~55莫耳%再更佳。 構成單元B中之構成單元(B-1)及(B-2)之合計的比率宜為50莫耳%以上,為70莫耳%以上更佳,為90莫耳%以上再更佳。構成單元(B-1)及(B-2)之合計的比率之上限值並無特別限制,亦即為100莫耳%。構成單元B也可僅由構成單元(B-1)及構成單元(B-2)構成。 本發明之聚醯亞胺樹脂中,構成單元B藉由包含構成單元(B-1)及(B-2)兩者,則不僅如前述般光學各向同性、剝離性、耐藥品性中任一皆為優良,且在製造聚醯亞胺樹脂時,醯亞胺化反應進行而生成的聚合物溶解到溶劑之溶解度亦高,並可獲得透明的清漆及薄膜。 構成單元B中之構成單元(B-1)與構成單元(B-2)的莫耳比[(B-1)/(B-2)],考慮使光學各向同性及耐藥品性改善之觀點,宜為5/95~80/20,為10/90~70/30更佳,考慮耐熱性之觀點,為30/70~70/30再更佳,考慮韌性之觀點,為45/55~70/30又更佳,為45/55~60/40再更佳。The ratio of the constituent unit (B-1) in the constituent unit B is preferably 5 to 80 mol%, preferably 10 to 70 mol%, more preferably 30 to 70 mol%, more preferably 45 to 70 mol%, and more preferably 45 to 60 mol%. The ratio of the constituent unit (B-2) in the constituent unit B is preferably 20 to 95 mol%, more preferably 30 to 90 mol%, more preferably 30 to 70 mol%, more preferably 30 to 55 mol%, and more preferably 40 to 55 mol%. The total ratio of the constituent units (B-1) and (B-2) in the constituent unit B is preferably 50 mol% or more, more preferably 70 mol% or more, and more preferably 90 mol% or more. The upper limit of the total ratio of the constituent units (B-1) and (B-2) is not particularly limited, that is, 100 mol%. The constituent unit B may also be composed of only the constituent unit (B-1) and the constituent unit (B-2). In the polyimide resin of the present invention, the constituent unit B contains both the constituent units (B-1) and (B-2), so that not only the optical isotropy, the peeling property, and the chemical resistance are all excellent as mentioned above, but also when the polyimide resin is manufactured, the solubility of the polymer generated by the imidization reaction in the solvent is also high, and a transparent varnish and film can be obtained. The molar ratio [(B-1)/(B-2)] of the constituent unit (B-1) to the constituent unit (B-2) in the constituent unit B is preferably 5/95 to 80/20, more preferably 10/90 to 70/30, from the viewpoint of improving optical isotropy and chemical resistance, more preferably 30/70 to 70/30 from the viewpoint of heat resistance, more preferably 45/55 to 70/30 from the viewpoint of toughness, and more preferably 45/55 to 60/40.
構成單元B也可包含構成單元(B-1)及(B-2)以外的構成單元。 考慮耐熱性與無色透明性之觀點,構成單元B除了包含構成單元(B-1)及(B-2)之外,宜包含來自下式(b-3)表示之化合物之構成單元(B-3)。Constituent unit B may also include constituent units other than constituent units (B-1) and (B-2). Considering the viewpoints of heat resistance and colorless transparency, constituent unit B preferably includes, in addition to constituent units (B-1) and (B-2), a constituent unit (B-3) derived from a compound represented by the following formula (b-3).
[化6] 式(b-3)表示之化合物為4,4’-二胺基-2,2’-雙三氟甲基二苯基醚。[Chemistry 6] The compound represented by formula (b-3) is 4,4'-diamino-2,2'-bis(trifluoromethyl)diphenyl ether.
構成單元B包含構成單元(B-1)、構成單元(B-2)及構成單元(B-3)時,構成單元B中之構成單元(B-1)與構成單元(B-2)之合計的比率宜為50莫耳%以上,為60莫耳%以上更佳,為70莫耳%以上再更佳,構成單元B中之構成單元(B-3)的比率宜為1~50莫耳%,為5~40莫耳%更佳,為10~30莫耳%再更佳。 構成單元B中之構成單元(B-1)、構成單元(B-2)及構成單元(B-3)之合計的比率宜為80莫耳%以上,為90莫耳%以上更佳,為99莫耳%以上特佳。構成單元(B-1)、構成單元(B-2)及構成單元(B-3)之合計的比率之上限值並無特別限制,亦即為100莫耳%。構成單元B也可僅由構成單元(B-1)、構成單元(B-2)及構成單元(B-3)構成。When the constituent unit B includes the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3), the total ratio of the constituent unit (B-1) to the constituent unit (B-2) in the constituent unit B is preferably 50 mol% or more, preferably 60 mol% or more, and more preferably 70 mol% or more, and the ratio of the constituent unit (B-3) in the constituent unit B is preferably 1 to 50 mol%, preferably 5 to 40 mol%, and more preferably 10 to 30 mol%. The total ratio of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3) in the constituent unit B is preferably 80 mol% or more, preferably 90 mol% or more, and particularly preferably 99 mol% or more. The upper limit of the total ratio of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3) is not particularly limited, that is, 100 mol%. The constituent unit B may also be composed only of the constituent unit (B-1), the constituent unit (B-2) and the constituent unit (B-3).
構成單元B也可包含構成單元(B-1)、(B-2)及(B-3)以外的構成單元。提供如此的構成單元之二胺並無特別限制,可列舉:1,4-伸苯基二胺、對苯二甲胺、1,5-二胺基萘、2,2’-二甲基聯苯-4,4’-二胺、4,4’-二胺基二苯基醚、4,4’-二胺基二苯基甲烷、2,2-雙(4-胺基苯基)六氟丙烷、4,4’-二胺基苯甲醯苯胺、1-(4-胺基苯基)-2,3-二氫-1,3,3-三甲基-1H-茚-5-胺、α,α’-雙(4-胺基苯基)-1,4-二異丙苯、N,N’-雙(4-胺基苯基)對苯二甲醯胺、4,4’-雙(4-胺基苯氧基)聯苯、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2-雙(4-(4-胺基苯氧基)苯基)六氟丙烷、及9,9-雙(4-胺基苯基)茀等芳香族二胺(惟,排除式(b-1)表示之化合物及式(b-3)表示之化合物);脂環族二胺(惟,排除式(b-2)表示之化合物);以及乙二胺及六亞甲二胺等脂肪族二胺。 另外,本說明書中,芳香族二胺意指含有1個以上之芳香環的二胺,脂環族二胺意指含有1個以上之脂環且不含芳香環的二胺,脂肪族二胺意指不含芳香環也不含脂環的二胺。 構成單元B可任意包含之構成單元(B-1)及構成單元(B-2)以外的構成單元可為1種,也可為2種以上。Constituent unit B may also include constituent units other than constituent units (B-1), (B-2) and (B-3). The diamines that provide such constituent units are not particularly limited, and examples thereof include: 1,4-phenylenediamine, p-phenylenediamine, 1,5-diaminonaphthalene, 2,2'-dimethylbiphenyl-4,4'-diamine, 4,4'-diaminodiphenyl ether, 4,4'-diaminodiphenylmethane, 2,2-bis(4-aminophenyl)hexafluoropropane, 4,4'-diaminobenzanilide, 1-(4-aminophenyl)-2,3-dihydro-1,3,3-trimethyl-1H-indene-5-amine, α,α'-bis(4-aminophenyl)-1,4-diisopropyl Aromatic diamines such as benzene, N,N'-bis(4-aminophenyl)terephthalamide, 4,4'-bis(4-aminophenoxy)biphenyl, 2,2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis(4-(4-aminophenoxy)phenyl)hexafluoropropane, and 9,9-bis(4-aminophenyl)fluorene (but excluding compounds represented by formula (b-1) and compounds represented by formula (b-3)); alicyclic diamines (but excluding compounds represented by formula (b-2)); and aliphatic diamines such as ethylenediamine and hexamethylenediamine. In addition, in this specification, aromatic diamine means a diamine containing one or more aromatic rings, alicyclic diamine means a diamine containing one or more alicyclic rings and no aromatic ring, and aliphatic diamine means a diamine containing neither an aromatic ring nor an alicyclic ring. Constituent units other than constituent unit (B-1) and constituent unit (B-2) that constituent unit B may arbitrarily contain may be one type or two or more types.
<聚醯亞胺樹脂的特性> 聚醯亞胺樹脂的數目平均分子量,考慮得到的聚醯亞胺薄膜之機械性強度的觀點,宜為5,000~300,000。另外,聚醯亞胺樹脂的數目平均分子量,例如可由利用凝膠過濾層析測定所得之標準聚甲基丙烯酸甲酯(PMMA)換算值來求得。<Characteristics of polyimide resin> The number average molecular weight of the polyimide resin is preferably 5,000 to 300,000 from the viewpoint of the mechanical strength of the obtained polyimide film. In addition, the number average molecular weight of the polyimide resin can be obtained, for example, from the standard polymethyl methacrylate (PMMA) conversion value obtained by gel filtration analysis.
聚醯亞胺樹脂也可包含聚醯亞胺鏈(由構成單元A與構成單元B經醯亞胺鍵結而成的結構)以外的結構。聚醯亞胺樹脂中所能包含之聚醯亞胺鏈以外的結構可列舉例如包含醯胺鍵之結構等。 聚醯亞胺樹脂宜包含聚醯亞胺鏈(由構成單元A與構成單元B經醯亞胺鍵結而成的結構)作為主要結構。因此,聚醯亞胺樹脂中聚醯亞胺鏈所佔之比率宜為50質量%以上,為70質量%以上更佳,為90質量%以上再更佳,為99質量%以上特佳,也可為100質量%。The polyimide resin may also contain structures other than the polyimide chain (a structure formed by imide bonds between constituent units A and B). Examples of structures other than the polyimide chain that may be contained in the polyimide resin include structures containing amide bonds, etc. The polyimide resin preferably contains a polyimide chain (a structure formed by imide bonds between constituent units A and B) as a main structure. Therefore, the proportion of the polyimide chain in the polyimide resin is preferably 50% by mass or more, more preferably 70% by mass or more, even more preferably 90% by mass or more, particularly preferably 99% by mass or more, and may also be 100% by mass.
含有上述聚醯亞胺樹脂的本發明之聚醯亞胺樹脂組成物,可形成光學各向同性、剝離性及耐藥品性優良的薄膜,該薄膜具有的理想物性值如下所述。The polyimide resin composition of the present invention containing the above-mentioned polyimide resin can form a film having excellent optical isotropy, peeling properties and chemical resistance, and the ideal physical property values of the film are as follows.
全光線透射率在製成厚度10μm之薄膜時,宜為88%以上,為88.5%以上更佳,為89%以上再更佳。 黃色指數(YI)在製成厚度10μm之薄膜時,宜為4.5以下,為3.0以下更佳,為2.0以下再更佳,為1.5以下又更佳。 厚度相位差(Rth)的絕對值在製成厚度10μm之薄膜時,宜為70nm以下,為50nm以下更佳,為40nm以下再更佳,為30nm又更佳。When a film with a thickness of 10 μm is made, the total light transmittance is preferably 88% or more, preferably 88.5% or more, and even more preferably 89% or more. When a film with a thickness of 10 μm is made, the yellowness index (YI) is preferably 4.5 or less, preferably 3.0 or less, preferably 2.0 or less, and even more preferably 1.5 or less. When a film with a thickness of 10 μm is made, the absolute value of the thickness retardation (Rth) is preferably 70 nm or less, preferably 50 nm or less, preferably 40 nm or less, and even more preferably 30 nm or less.
又,使用上述聚醯亞胺樹脂可形成的薄膜之機械的特性及耐熱性亦良好,並具有如下之理想物性值。 拉伸強度宜為70MPa以上,為90MPa以上更佳,為100MPa以上再更佳。 拉伸彈性模量宜為1.5GPa以上,為2.0GPa以上更佳,為2.5GPa以上再更佳。 拉伸斷裂伸長度率宜為5%以上,為6%以上更佳,為7%以上再更佳。 玻璃轉移溫度(Tg)宜為200℃以上,為230℃以上更佳,為250℃以上再更佳。 另外,本發明中的上述物性值具體可利用實施例所記載之方法進行測定。In addition, the thin film formed using the above-mentioned polyimide resin also has good mechanical properties and heat resistance, and has the following ideal physical property values. The tensile strength is preferably 70 MPa or more, preferably 90 MPa or more, and even more preferably 100 MPa or more. The tensile elastic modulus is preferably 1.5 GPa or more, preferably 2.0 GPa or more, and even more preferably 2.5 GPa or more. The tensile elongation at break is preferably 5% or more, preferably 6% or more, and even more preferably 7% or more. The glass transition temperature (Tg) is preferably 200°C or more, preferably 230°C or more, and even more preferably 250°C or more. In addition, the above-mentioned physical property values in the present invention can be specifically measured by the method described in the embodiment.
<聚醯亞胺樹脂的製造方法> 本發明中,聚醯亞胺樹脂可藉由使包含提供上述構成單元(A-1)之化合物及提供上述構成單元(A-2)之化合物的四羧酸成分,與包含提供上述構成單元(B-1)之化合物及提供上述構成單元(B-2)之化合物的二胺成分進行反應來製造。<Method for producing polyimide resin> In the present invention, the polyimide resin can be produced by reacting a tetracarboxylic acid component including a compound providing the above-mentioned constituent unit (A-1) and a compound providing the above-mentioned constituent unit (A-2) with a diamine component including a compound providing the above-mentioned constituent unit (B-1) and a compound providing the above-mentioned constituent unit (B-2).
提供構成單元(A-1)之化合物可列舉式(a-1)表示之化合物,但不限於此,在可提供相同的構成單元之範圍內,也可為其衍生物。該衍生物可列舉對應於式(a-1)表示之四羧酸二酐之四羧酸(亦即,4,4’-氧二鄰苯二甲酸)、及該四羧酸之烷基酯。其中,宜為式(a-1)表示之四羧酸二酐。 同樣地,提供構成單元(A-2)之化合物可列舉式(a-2)表示之化合物,但不限於此,在可提供相同的構成單元之範圍內,也可為其衍生物。該衍生物可列舉對應於式(a-2)表示之四羧酸二酐之四羧酸(亦即,1,2,4,5-環己烷四甲酸)、及該四羧酸之烷基酯。其中,宜為式(a-2)表示之四羧酸二酐。The compound providing the constituent unit (A-1) may include compounds represented by formula (a-1), but is not limited thereto, and may also be derivatives thereof within the scope of providing the same constituent unit. The derivative may include tetracarboxylic acids corresponding to the tetracarboxylic dianhydride represented by formula (a-1) (i.e., 4,4'-oxydiphthalic acid) and alkyl esters of the tetracarboxylic acid. Among them, the tetracarboxylic dianhydride represented by formula (a-1) is preferred. Similarly, the compound providing the constituent unit (A-2) may include compounds represented by formula (a-2), but is not limited thereto, and may also be derivatives thereof within the scope of providing the same constituent unit. The derivative may include tetracarboxylic acids corresponding to the tetracarboxylic dianhydride represented by formula (a-2) (i.e., 1,2,4,5-cyclohexanetetracarboxylic acid) and alkyl esters of the tetracarboxylic acid. Among them, tetracarboxylic dianhydride represented by formula (a-2) is preferred.
四羧酸成分中,提供構成單元(A-1)之化合物宜為包含20~80莫耳%,包含30~70莫耳%更佳,包含40~60莫耳%再更佳。 四羧酸成分中,提供構成單元(A-2)之化合物宜為包含20~80莫耳%,包含30~70莫耳%更佳,包含40~60莫耳%再更佳。 四羧酸成分中,提供構成單元(A-1)之化合物及提供構成單元(A-2)之化合物合計宜為包含50莫耳%以上,包含70莫耳%以上更佳,包含90莫耳%以上再更佳。提供構成單元(A-1)之化合物及提供構成單元(A-2)之化合物的合計含量之上限值並無特別限制,亦即為100莫耳%。四羧酸成分也可僅由提供構成單元(A-1)之化合物及提供構成單元(A-2)之化合物構成。 四羧酸成分中之提供構成單元(A-1)之化合物與提供構成單元(A-2)之化合物的莫耳比[(A-1)/(A-2)]宜為20/80~80/20,為30/70~70/30更佳,為40/60~60/40再更佳。Among the tetracarboxylic acid components, the compound providing the constituent unit (A-1) preferably contains 20 to 80 mol%, preferably 30 to 70 mol%, and more preferably 40 to 60 mol%. Among the tetracarboxylic acid components, the compound providing the constituent unit (A-2) preferably contains 20 to 80 mol%, preferably 30 to 70 mol%, and more preferably 40 to 60 mol%. Among the tetracarboxylic acid components, the compound providing the constituent unit (A-1) and the compound providing the constituent unit (A-2) preferably contain 50 mol% or more, preferably 70 mol% or more, and more preferably 90 mol% or more. The upper limit of the total content of the compound providing the constituent unit (A-1) and the compound providing the constituent unit (A-2) is not particularly limited, that is, 100 mol%. The tetracarboxylic acid component may also be composed only of a compound providing a constituent unit (A-1) and a compound providing a constituent unit (A-2). The molar ratio [(A-1)/(A-2)] of the compound providing a constituent unit (A-1) to the compound providing a constituent unit (A-2) in the tetracarboxylic acid component is preferably 20/80 to 80/20, more preferably 30/70 to 70/30, and even more preferably 40/60 to 60/40.
四羧酸成分也可包含提供構成單元(A-1)之化合物及提供構成單元(A-2)之化合物以外的化合物。 如此的任意化合物可列舉:上述芳香族四羧酸二酐、脂環族四羧酸二酐、及脂肪族四羧酸二酐、以及它們的衍生物(四羧酸、四羧酸之烷基酯等)。 四羧酸成分可任意包含之提供構成單元(A-1)之化合物及提供構成單元(A-2)之化合物以外的化合物可為1種,也可為2種以上。The tetracarboxylic acid component may also contain compounds other than the compounds providing the constituent unit (A-1) and the compounds providing the constituent unit (A-2). Such arbitrary compounds include the above-mentioned aromatic tetracarboxylic dianhydride, alicyclic tetracarboxylic dianhydride, and aliphatic tetracarboxylic dianhydride, and their derivatives (tetracarboxylic acids, alkyl esters of tetracarboxylic acids, etc.). The compounds other than the compounds providing the constituent unit (A-1) and the compounds providing the constituent unit (A-2) that the tetracarboxylic acid component may arbitrarily contain may be one or more.
提供構成單元(B-1)之化合物可列舉式(b-1)表示之化合物,但不限於此,在可提供相同的構成單元之範圍內,也可為其衍生物。該衍生物可列舉對應於式(b-1)表示之化合物之二異氰酸酯。提供構成單元(B-1)之化合物宜為式(b-1)表示之化合物(亦即二胺)。 同樣地,提供構成單元(B-2)之化合物可列舉式(b-2)表示之化合物,但不限於此,在可提供相同的構成單元之範圍內,也可為其衍生物。該衍生物可列舉對應於式(b-2)表示之化合物之二異氰酸酯。提供構成單元(B-2)之化合物宜為式(b-2)表示之化合物(亦即二胺)。The compound providing the constituent unit (B-1) may include compounds represented by formula (b-1), but is not limited thereto. It may also be a derivative thereof within the scope of providing the same constituent unit. The derivative may include a diisocyanate corresponding to the compound represented by formula (b-1). The compound providing the constituent unit (B-1) is preferably a compound represented by formula (b-1) (i.e., a diamine). Similarly, the compound providing the constituent unit (B-2) may include compounds represented by formula (b-2), but is not limited thereto. It may also be a derivative thereof within the scope of providing the same constituent unit. The derivative may include a diisocyanate corresponding to the compound represented by formula (b-2). The compound providing the constituent unit (B-2) is preferably a compound represented by formula (b-2) (i.e., a diamine).
二胺成分中,提供構成單元(B-1)之化合物宜為包含5~80莫耳%,包含10~70莫耳%更佳,包含30~70莫耳%再更佳,包含45~70莫耳%又更佳,包含45~60莫耳%再更佳。 二胺成分中,提供構成單元(B-2)之化合物宜為包含20~95莫耳%,包含30~90莫耳%更佳,包含30~70莫耳%再更佳,包含30~55莫耳%又更佳,包含40~55莫耳%再更佳。 二胺成分中,提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物合計宜為包含50莫耳%以上,包含70莫耳%以上更佳,包含90莫耳%以上更佳。提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物的合計含量之上限值並無特別限制,亦即為100莫耳%。二胺成分也可僅由提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物構成。 二胺成分中之提供構成單元(B-1)之化合物與提供構成單元(B-2)之化合物的莫耳比[(B-1)/(B-2)],考慮使光學各向同性及耐藥品性改善之觀點,宜為5/95~80/20,為10/90~70/30更佳,考慮耐熱性之觀點,為30/70~70/30再更佳,考慮韌性之觀點,為45/55~70/30又更佳,為45/55~60/40再更佳。Among the diamine components, the compound providing the constituent unit (B-1) preferably contains 5 to 80 mol%, preferably 10 to 70 mol%, more preferably 30 to 70 mol%, more preferably 45 to 70 mol%, and more preferably 45 to 60 mol%. Among the diamine components, the compound providing the constituent unit (B-2) preferably contains 20 to 95 mol%, preferably 30 to 90 mol%, more preferably 30 to 70 mol%, more preferably 30 to 55 mol%, and more preferably 40 to 55 mol%. Among the diamine components, the compound providing the constituent unit (B-1) and the compound providing the constituent unit (B-2) preferably contain 50 mol% or more, preferably 70 mol% or more, and more preferably 90 mol% or more. The upper limit of the total content of the compound providing the constituent unit (B-1) and the compound providing the constituent unit (B-2) is not particularly limited, that is, 100 mol%. The diamine component may also be composed only of the compound providing the constituent unit (B-1) and the compound providing the constituent unit (B-2). The molar ratio [(B-1)/(B-2)] of the compound providing the constituent unit (B-1) to the compound providing the constituent unit (B-2) in the diamine component is preferably 5/95 to 80/20, more preferably 10/90 to 70/30, from the viewpoint of improving optical isotropy and chemical resistance, more preferably 30/70 to 70/30 from the viewpoint of heat resistance, more preferably 45/55 to 70/30 from the viewpoint of toughness, and more preferably 45/55 to 60/40.
二胺成分也可包含提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物以外的化合物。The diamine component may contain a compound other than the compound providing the constitutional unit (B-1) and the compound providing the constitutional unit (B-2).
二胺成分除了包含提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物之外,也可更包含提供構成單元(B-3)之化合物。 提供構成單元(B-3)之化合物可列舉式(b-3)表示之化合物,但不限於此,在可提供相同的構成單元之範圍內,也可為其衍生物。該衍生物可列舉對應於式(b-3)表示之化合物之二異氰酸酯。提供構成單元(B-3)之化合物宜為式(b-3)表示之化合物(亦即二胺)。In addition to compounds that provide constituent unit (B-1) and compounds that provide constituent unit (B-2), the diamine component may also include compounds that provide constituent unit (B-3). The compound that provides constituent unit (B-3) may be a compound represented by formula (b-3), but is not limited thereto and may be a derivative thereof within the scope of providing the same constituent unit. The derivative may be a diisocyanate corresponding to the compound represented by formula (b-3). The compound that provides constituent unit (B-3) is preferably a compound represented by formula (b-3) (i.e., a diamine).
二胺成分中,提供構成單元(B-3)之化合物宜為包含1~50莫耳%,包含5~40莫耳%更佳,包含10~30莫耳%再更佳。 二胺成分包含提供構成單元(B-3)之化合物時,二胺成分中,提供構成單元(B-1)之化合物、提供構成單元(B-2)之化合物及提供構成單元(B-3)之化合物合計宜為包含80莫耳%以上,包含90莫耳%以上更佳,包含99莫耳%以上再更佳。提供構成單元(B-1)之化合物、提供構成單元(B-2)之化合物及提供構成單元(B-3)之化合物的合計含量之上限值並無特別限制,亦即為100莫耳%。二胺成分也可僅由提供構成單元(B-1)之化合物、提供構成單元(B-2)之化合物及提供構成單元(B-3)之化合物構成。In the diamine component, the compound providing the constituent unit (B-3) preferably contains 1 to 50 mol%, preferably contains 5 to 40 mol%, and even more preferably contains 10 to 30 mol%. When the diamine component contains the compound providing the constituent unit (B-3), in the diamine component, the compound providing the constituent unit (B-1), the compound providing the constituent unit (B-2), and the compound providing the constituent unit (B-3) preferably contain 80 mol% or more in total, preferably contain 90 mol% or more, and even more preferably contain 99 mol% or more. There is no particular upper limit on the total content of the compound providing the constituent unit (B-1), the compound providing the constituent unit (B-2), and the compound providing the constituent unit (B-3), which is 100 mol%. The diamine component may be composed only of a compound providing the constitutional unit (B-1), a compound providing the constitutional unit (B-2), and a compound providing the constitutional unit (B-3).
二胺成分可任意包含之提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物以外的化合物不限於提供構成單元(B-3)之化合物。如此的任意化合物可列舉:上述芳香族二胺、脂環族二胺、及脂肪族二胺、以及它們的衍生物(二異氰酸酯等)。 二胺成分可任意包含之提供構成單元(B-1)之化合物及提供構成單元(B-2)之化合物以外的化合物可為1種,也可為2種以上。The compounds other than the compounds providing the constituent unit (B-1) and the compounds providing the constituent unit (B-2) that the diamine component may optionally contain are not limited to the compounds providing the constituent unit (B-3). Such arbitrary compounds include: the above-mentioned aromatic diamines, alicyclic diamines, and aliphatic diamines, and their derivatives (diisocyanates, etc.). The compounds other than the compounds providing the constituent unit (B-1) and the compounds providing the constituent unit (B-2) that the diamine component may optionally contain may be one or more.
本發明中,就聚醯亞胺樹脂之製造所使用的四羧酸成分與二胺成分之進料量比而言,二胺成分相對於四羧酸成分1莫耳,宜為0.9~1.1莫耳。In the present invention, the feed ratio of the tetracarboxylic acid component to the diamine component used in the production of the polyimide resin is preferably 0.9 to 1.1 mol of the diamine component relative to 1 mol of the tetracarboxylic acid component.
又,本發明中,在聚醯亞胺樹脂之製造時,除了使用前述四羧酸成分及二胺成分之外,也可使用末端封端劑。末端封端劑宜為單胺類或二羧酸類。導入的末端封端劑之進料量相對於四羧酸成分1莫耳,宜為0.0001~0.1莫耳,為0.001~0.06莫耳更佳。單胺類末端封端劑可列舉例如:甲胺、乙胺、丙胺、丁胺、苄胺、4-甲基苄胺、4-乙基苄胺、4-十二烷基苄胺、3-甲基苄胺、3-乙基苄胺、苯胺、3-甲基苯胺、4-甲基苯胺等,宜為苄胺、苯胺。二羧酸類末端封端劑宜為二羧酸類,也可將其一部分予以閉環。可列舉例如:苯二甲酸、苯二甲酸酐、4-氯苯二甲酸、四氟苯二甲酸、2,3-二苯甲酮二甲酸、3,4-二苯甲酮二甲酸、環己烷-1,2-二甲酸、環戊烷-1,2-二甲酸、4-環己烯-1,2-二甲酸等,宜為苯二甲酸、苯二甲酸酐。Furthermore, in the present invention, in addition to the aforementioned tetracarboxylic acid component and diamine component, an end-capping agent may also be used in the production of the polyimide resin. The end-capping agent is preferably a monoamine or a dicarboxylic acid. The amount of the introduced end-capping agent is preferably 0.0001 to 0.1 mol, and more preferably 0.001 to 0.06 mol, relative to 1 mol of the tetracarboxylic acid component. Examples of monoamine end-capping agents include methylamine, ethylamine, propylamine, butylamine, benzylamine, 4-methylbenzylamine, 4-ethylbenzylamine, 4-dodecylbenzylamine, 3-methylbenzylamine, 3-ethylbenzylamine, aniline, 3-methylaniline, 4-methylaniline, etc., preferably benzylamine and aniline. The dicarboxylic acid end-capping agent is preferably a dicarboxylic acid, and a portion of it may be ring-closed. For example, phthalic acid, phthalic anhydride, 4-chlorophthalic acid, tetrafluorophthalic acid, 2,3-benzophenone dicarboxylic acid, 3,4-benzophenone dicarboxylic acid, cyclohexane-1,2-dicarboxylic acid, cyclopentane-1,2-dicarboxylic acid, 4-cyclohexene-1,2-dicarboxylic acid, etc., preferably phthalic acid and phthalic anhydride.
使前述四羧酸成分與二胺成分進行反應之方法並無特別限制,可使用公知的方法。 具體的反應方法可列舉:(1)將四羧酸成分、二胺成分、及反應溶劑進料於反應器中,並於0~80℃攪拌0.5~30小時,其後進行昇溫來實施醯亞胺化反應之方法;(2)將二胺成分及反應溶劑進料於反應器並使其溶解後,再進料四羧酸成分,並因應需要於0~80℃攪拌0.5~30小時,其後進行昇溫來實施醯亞胺化反應之方法;(3)將四羧酸成分、二胺成分、及反應溶劑進料於反應器中,並立刻進行昇溫來實施醯亞胺化反應之方法等。The method for reacting the tetracarboxylic acid component and the diamine component is not particularly limited, and a known method can be used. Specific reaction methods include: (1) a method in which a tetracarboxylic acid component, a diamine component, and a reaction solvent are fed into a reactor, and stirred at 0 to 80°C for 0.5 to 30 hours, and then the temperature is raised to carry out an imidization reaction; (2) a method in which a diamine component and a reaction solvent are fed into a reactor and dissolved, and then a tetracarboxylic acid component is fed, and stirred at 0 to 80°C for 0.5 to 30 hours as needed, and then the temperature is raised to carry out an imidization reaction; (3) a method in which a tetracarboxylic acid component, a diamine component, and a reaction solvent are fed into a reactor, and the temperature is immediately raised to carry out an imidization reaction, etc.
聚醯亞胺樹脂之製造所使用的反應溶劑若為不妨礙醯亞胺化反應而可溶解生成的聚醯亞胺者即可。可列舉例如:非質子性溶劑、酚系溶劑、醚系溶劑、碳酸酯系溶劑等。The reaction solvent used in the production of the polyimide resin may be any solvent that can dissolve the generated polyimide without hindering the imidization reaction. Examples of such solvents include aprotic solvents, phenolic solvents, etheric solvents, and carbonate solvents.
非質子性溶劑之具體例可列舉:N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基-2-吡咯啶酮(NMP)、N-甲基己內醯胺、1,3-二甲基咪唑啶酮、四甲基脲等醯胺系溶劑;γ-丁內酯(GBL)、γ-戊內酯等內酯系溶劑;六甲基磷醯胺、六甲基膦三醯胺等含磷系醯胺系溶劑;二甲基碸、二甲基亞碸、環丁碸等含硫系溶劑;丙酮、環己酮、甲基環己酮等酮系溶劑;甲吡啶、吡啶等胺系溶劑;乙酸(2-甲氧基-1-甲基乙酯)等酯系溶劑等。Specific examples of aprotic solvents include: amide solvents such as N,N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone (NMP), N-methylcaprolactam, 1,3-dimethylimidazolidinone, and tetramethylurea; lactone solvents such as γ-butyrolactone (GBL) and γ-valerolactone; phosphorus-containing amide solvents such as hexamethylphosphatamide and hexamethylphosphotriamide; sulfur-containing solvents such as dimethyl sulfone, dimethyl sulfoxide, and cyclobutane sulfone; ketone solvents such as acetone, cyclohexanone, and methylcyclohexanone; amine solvents such as picolinyl and pyridine; ester solvents such as acetic acid (2-methoxy-1-methylethyl ester), etc.
酚系溶劑之具體例可列舉:苯酚、鄰甲酚、間甲酚、對甲酚、2,3-二甲酚、2,4-二甲酚、2,5-二甲酚、2,6-二甲酚、3,4-二甲酚、3,5-二甲酚等。 醚系溶劑之具體例可列舉:1,2-二甲氧基乙烷、雙(2-甲氧基乙基)醚、1,2-雙(2-甲氧基乙氧基)乙烷、雙[2-(2-甲氧基乙氧基)乙基]醚、四氫呋喃、1,4-二㗁烷等。 又,碳酸酯系溶劑之具體例可列舉:碳酸二乙酯、碳酸甲乙酯、碳酸伸乙酯、碳酸伸丙酯等。 上述反應溶劑之中,宜為非質子系溶劑,為醯胺系溶劑及內酯系溶劑更佳。又,上述反應溶劑可單獨使用或也可混合使用2種以上。Specific examples of phenolic solvents include phenol, o-cresol, m-cresol, p-cresol, 2,3-xylenol, 2,4-xylenol, 2,5-xylenol, 2,6-xylenol, 3,4-xylenol, 3,5-xylenol, etc. Specific examples of etheric solvents include 1,2-dimethoxyethane, bis(2-methoxyethyl)ether, 1,2-bis(2-methoxyethoxy)ethane, bis[2-(2-methoxyethoxy)ethyl]ether, tetrahydrofuran, 1,4-dioxane, etc. Moreover, specific examples of carbonate-based solvents include diethyl carbonate, ethyl methyl carbonate, ethyl carbonate, propyl carbonate, etc. Among the above reaction solvents, aprotic solvents are preferred, and amide solvents and lactone solvents are more preferred. The above reaction solvents may be used alone or in combination of two or more.
醯亞胺化反應宜使用迪安-斯塔克(Dean-Stark)裝置等,邊將製造時所生成的水去除邊實施反應。藉由實施如此的操作,可使聚合度及醯亞胺化率更為上昇。The imidization reaction is preferably carried out using a Dean-Stark apparatus or the like, while removing water generated during the production. By carrying out such an operation, the degree of polymerization and the imidization rate can be further increased.
上述醯亞胺化反應中,可使用公知的醯亞胺化觸媒。醯亞胺化觸媒可列舉鹼觸媒或酸觸媒。 鹼觸媒可列舉:吡啶、喹啉、異喹啉、α-甲吡啶、β-甲吡啶、2,4-二甲吡啶、2,6-二甲吡啶、三甲胺、三乙胺(TEA)、三丙胺、三丁胺、三伸乙二胺、咪唑、N,N-二甲基苯胺、N,N-二乙苯胺等有機鹼觸媒;氫氧化鉀、或氫氧化鈉、碳酸鉀、碳酸鈉、碳酸氫鉀、碳酸氫鈉等無機鹼觸媒。 又,酸觸媒可列舉:巴豆酸、丙烯酸、反式-3-己烯酸、桂皮酸、苯甲酸、甲基苯甲酸、羥基苯甲酸、對苯二甲酸、苯磺酸、對甲苯磺酸、萘磺酸等。上述醯亞胺化觸媒可單獨使用或也可組合使用2種以上。 上述之中,考慮操作性之觀點,宜使用鹼觸媒,使用有機鹼觸媒更佳,使用三乙胺再更佳。In the above-mentioned imidization reaction, a known imidization catalyst can be used. The imidization catalyst can be a base catalyst or an acid catalyst. The base catalyst can be: pyridine, quinoline, isoquinoline, α-picoline, β-picoline, 2,4-dipicoline, 2,6-dipicoline, trimethylamine, triethylamine (TEA), tripropylamine, tributylamine, triethylenediamine, imidazole, N,N-dimethylaniline, N,N-diethylaniline and other organic base catalysts; potassium hydroxide, or sodium hydroxide, potassium carbonate, sodium carbonate, potassium bicarbonate, sodium bicarbonate and other inorganic base catalysts. In addition, the acid catalyst can be exemplified by: crotonic acid, acrylic acid, trans-3-hexenoic acid, cinnamic acid, benzoic acid, methylbenzoic acid, hydroxybenzoic acid, terephthalic acid, benzenesulfonic acid, p-toluenesulfonic acid, naphthalenesulfonic acid, etc. The above imidization catalysts can be used alone or in combination of two or more. Among the above, considering the operability, it is preferable to use an alkaline catalyst, and it is more preferable to use an organic alkaline catalyst, and it is even more preferable to use triethylamine.
醯亞胺化反應的溫度,考慮反應率及抑制凝膠化等之觀點,宜為120~250℃,為160~200℃更佳。又,反應時間在生成水之餾出開始後,宜為0.5~10小時。The temperature of the imidization reaction is preferably 120 to 250° C., more preferably 160 to 200° C., from the viewpoint of reaction rate and inhibition of gelation. The reaction time is preferably 0.5 to 10 hours after the distillation of generated water begins.
本發明之聚醯亞胺樹脂中,或許因為構成單元A包含構成單元(A-1)及(A-2),且構成單元B包含構成單元(B-1)及(B-2),故進行醯亞胺化反應而生成的聚合物溶解到溶劑之溶解度高,且可獲得透明的清漆。In the polyimide resin of the present invention, perhaps because the constituent unit A includes the constituent units (A-1) and (A-2), and the constituent unit B includes the constituent units (B-1) and (B-2), the polymer generated by the imidization reaction has a high solubility in the solvent and a transparent varnish can be obtained.
[聚醯亞胺清漆] 本發明之聚醯亞胺清漆係將本發明之聚醯亞胺樹脂溶解於有機溶劑而成。亦即,本發明之聚醯亞胺清漆含有本發明之聚醯亞胺樹脂及有機溶劑,且該聚醯亞胺樹脂溶解於該有機溶劑中。 有機溶劑若為會溶解聚醯亞胺樹脂者即可,並無特別限制,宜將上述作為聚醯亞胺樹脂之製造所使用的反應溶劑之化合物予以單獨使用或混合使用2種以上。 本發明之聚醯亞胺清漆可為利用聚合法獲得的聚醯亞胺樹脂溶解於反應溶劑而成的聚醯亞胺溶液本身,或也可為對該聚醯亞胺溶液再追加溶劑進行稀釋而成者。[Polyimide varnish] The polyimide varnish of the present invention is prepared by dissolving the polyimide resin of the present invention in an organic solvent. That is, the polyimide varnish of the present invention contains the polyimide resin of the present invention and an organic solvent, and the polyimide resin is dissolved in the organic solvent. The organic solvent is not particularly limited as long as it can dissolve the polyimide resin. It is preferable to use the above-mentioned reaction solvent compounds used for the production of the polyimide resin alone or in combination of two or more. The polyimide varnish of the present invention may be a polyimide solution itself in which a polyimide resin obtained by a polymerization method is dissolved in a reaction solvent, or may be a polyimide solution diluted by adding a solvent.
本發明之聚醯亞胺樹脂具有溶劑溶解性,故可製成在室溫安定的高濃度之清漆。本發明之聚醯亞胺清漆中,宜含有5~40質量%之本發明之聚醯亞胺樹脂,含有10~30質量%更佳。聚醯亞胺清漆的黏度宜為1~200Pa・s,為1~100Pa・s更佳。聚醯亞胺清漆的黏度係使用E型黏度計於25℃所測得的值。 又,本發明之聚醯亞胺清漆在不損及聚醯亞胺薄膜之要求特性的範圍內,也可含有無機填料、黏接促進劑、剝離劑、阻燃劑、紫外線安定劑、界面活性劑、整平劑、消泡劑、螢光增白劑、交聯劑、聚合起始劑、感光劑等各種添加劑。 本發明之聚醯亞胺清漆的製造方法並無特別限制,可使用公知的方法。The polyimide resin of the present invention has solvent solubility, so it can be made into a high-concentration varnish that is stable at room temperature. The polyimide varnish of the present invention preferably contains 5 to 40% by mass of the polyimide resin of the present invention, and more preferably contains 10 to 30% by mass. The viscosity of the polyimide varnish is preferably 1 to 200 Pa·s, and more preferably 1 to 100 Pa·s. The viscosity of the polyimide varnish is a value measured at 25°C using an E-type viscometer. Furthermore, the polyimide varnish of the present invention may also contain various additives such as inorganic fillers, adhesion promoters, stripping agents, flame retardants, ultraviolet stabilizers, surfactants, leveling agents, defoaming agents, fluorescent whitening agents, crosslinking agents, polymerization initiators, and photosensitizers within the range that the required properties of the polyimide film are not impaired. The method for preparing the polyimide varnish of the present invention is not particularly limited, and a known method can be used.
[聚醯亞胺薄膜] 本發明之聚醯亞胺薄膜含有本發明之聚醯亞胺樹脂。因此,本發明之聚醯亞胺薄膜為光學各向同性、剝離性及耐藥品性優良。本發明之聚醯亞胺薄膜具有的理想物性值如上所述。 本發明之聚醯亞胺薄膜之製造方法並無特別限制,可使用公知的方法。例如可列舉將本發明之聚醯亞胺清漆塗佈於玻璃板、金屬板、塑膠等平滑的支持體上,或成形為薄膜狀後,利用加熱去除該清漆中所含的反應溶劑、稀釋溶劑等有機溶劑之方法等。[Polyimide film] The polyimide film of the present invention contains the polyimide resin of the present invention. Therefore, the polyimide film of the present invention is optically isotropic, and has excellent peeling properties and chemical resistance. The ideal physical property values of the polyimide film of the present invention are as described above. The method for manufacturing the polyimide film of the present invention is not particularly limited, and a known method can be used. For example, the polyimide varnish of the present invention is coated on a smooth support such as a glass plate, a metal plate, or a plastic, or after forming it into a film, the organic solvent such as a reaction solvent and a dilution solvent contained in the varnish is removed by heating.
塗佈方法可列舉:旋塗、縫塗、刀塗等公知的塗佈方法。其中,考慮控制分子間配向並改善耐藥品性、及作業性之觀點,縫塗較為理想。 就利用加熱去除清漆中所含的有機溶劑之方法而言,宜為於150℃以下之溫度使有機溶劑蒸發並成為無黏性後,再以所使用的有機溶劑之沸點以上的溫度(宜為200~500℃,但不特別限制)進行乾燥。又,宜在空氣環境下或氮氣環境下進行乾燥。乾燥環境的壓力為減壓、常壓、加壓中任一皆可。 將製膜於支持體上之聚醯亞胺薄膜從支持體剝離之方法並無特別限制,可使用雷射剝離(lift-off)法等。The coating method includes spin coating, slit coating, knife coating and other known coating methods. Among them, slit coating is more ideal from the perspective of controlling the molecular orientation and improving the chemical resistance and workability. As for the method of removing the organic solvent contained in the varnish by heating, it is preferable to evaporate the organic solvent at a temperature below 150°C and make it non-viscous, and then dry it at a temperature above the boiling point of the organic solvent used (preferably 200-500°C, but not particularly limited). In addition, it is preferable to dry it in an air environment or a nitrogen environment. The pressure of the drying environment can be any of reduced pressure, normal pressure, and pressurized pressure. The method for peeling the polyimide film formed on the support from the support is not particularly limited, and a laser lift-off method or the like can be used.
又,本發明之聚醯亞胺薄膜也可使用將聚醯胺酸溶解於有機溶劑而成的聚醯胺酸清漆來製造。 前述聚醯胺酸清漆所含的聚醯胺酸為本發明之聚醯亞胺樹脂的前驅物,其係包含提供上述構成單元(A-1)之化合物及提供上述構成單元(A-2)之化合物的四羧酸成分與包含提供上述構成單元(B-1)之化合物及提供構成單元(B-2)之化合物的二胺成分之加成聚合反應的產物。藉由使該聚醯胺酸進行醯亞胺化(脫水閉環),可獲得最終產物即本發明之聚醯亞胺樹脂。 前述聚醯胺酸清漆所含的有機溶劑可使用本發明之聚醯亞胺清漆所含的有機溶劑。 本發明中,聚醯胺酸清漆可為使四羧酸成分與二胺成分在反應溶劑中進行加成聚合反應而獲得的聚醯胺酸溶液本身,或也可為對該聚醯胺酸溶液再追加溶劑進行稀釋而成者。In addition, the polyimide film of the present invention can also be produced using a polyimide varnish obtained by dissolving polyimide in an organic solvent. The polyimide contained in the aforementioned polyimide varnish is a precursor of the polyimide resin of the present invention, and is a product of an addition polymerization reaction between a tetracarboxylic acid component containing a compound providing the above-mentioned constituent unit (A-1) and a compound providing the above-mentioned constituent unit (A-2) and a diamine component containing a compound providing the above-mentioned constituent unit (B-1) and a compound providing the above-mentioned constituent unit (B-2). By subjecting the polyimide to imidization (dehydration and ring closure), the final product, i.e., the polyimide resin of the present invention, can be obtained. The organic solvent contained in the aforementioned polyamide varnish may be the organic solvent contained in the polyimide varnish of the present invention. In the present invention, the polyamide varnish may be a polyamide solution obtained by subjecting a tetracarboxylic acid component and a diamine component to an addition polymerization reaction in a reaction solvent, or may be a polyamide solution obtained by diluting the polyamide solution by adding a solvent.
使用聚醯胺酸清漆來製造聚醯亞胺薄膜的方法並無特別限制,可使用公知的方法。例如可藉由將聚醯胺酸清漆塗佈於玻璃板、金屬板、塑膠等平滑的支持體上,或成形為薄膜狀,並利用加熱去除該清漆中所含的反應溶劑、稀釋溶劑等有機溶劑來獲得聚醯胺酸薄膜,再利用加熱使該聚醯胺酸薄膜中之聚醯胺酸進行醯亞胺化來製造聚醯亞胺薄膜。 使聚醯胺酸清漆乾燥來獲得聚醯胺酸薄膜時的加熱溫度宜為50~120℃。利用加熱使聚醯胺酸進行醯亞胺化時的加熱溫度宜為200~400℃。 另外,醯亞胺化的方法不限於熱醯亞胺化,也可使用化學醯亞胺化。The method of using polyamide varnish to produce polyimide film is not particularly limited, and a known method can be used. For example, polyamide varnish can be applied on a smooth support such as a glass plate, a metal plate, or a plastic, or formed into a film, and organic solvents such as a reaction solvent and a dilution solvent contained in the varnish can be removed by heating to obtain a polyamide film, and then the polyamide in the polyamide film can be imidized by heating to produce a polyimide film. The heating temperature when drying the polyamide varnish to obtain the polyamide film is preferably 50 to 120°C. The heating temperature when heating the polyamide to imidize is preferably 200 to 400°C. In addition, the imidization method is not limited to thermal imidization, and chemical imidization may also be used.
本發明之聚醯亞胺薄膜的厚度可因應用途等而適當地選擇,宜為1~250μm,為5~100μm更佳,為8~80μm再更佳,為10~80μm之範圍又更佳。藉由厚度為1~250μm,則可具實用性地使用作為自支撐膜。 聚醯亞胺薄膜的厚度可藉由調整聚醯亞胺清漆的固體成分濃度、黏度而輕易地控制。 [實施例]The thickness of the polyimide film of the present invention can be appropriately selected according to the application, etc., preferably 1 to 250 μm, more preferably 5 to 100 μm, more preferably 8 to 80 μm, and even more preferably 10 to 80 μm. With a thickness of 1 to 250 μm, it can be practically used as a self-supporting film. The thickness of the polyimide film can be easily controlled by adjusting the solid content concentration and viscosity of the polyimide varnish. [Example]
以下,利用實施例具體地說明本發明。惟,本發明不受這些實施例任何限制。Hereinafter, the present invention will be specifically described using embodiments, but the present invention is not limited to these embodiments.
<薄膜物性及評價> 實施例及比較例得到的薄膜之各物性係利用如下所示之方法進行測定。<Thin film properties and evaluation> The physical properties of the thin films obtained in the examples and comparative examples were measured using the methods shown below.
(1)薄膜厚度 薄膜厚度係使用Mitutoyo Corporation股份有限公司製之測微計進行測定。(1) Film thickness The film thickness was measured using a micrometer manufactured by Mitutoyo Corporation.
(2)拉伸強度、拉伸彈性模量、及拉伸斷裂伸長度率 拉伸強度、拉伸彈性模量及拉伸斷裂伸長度率係依據JIS K7127:1999,使用東洋精機股份有限公司製之拉伸試驗機「STROGRAPHVG-1E」進行測定。夾具間距離設定為50mm,試驗片尺寸設定為10mm×70mm,試驗速度設定為20mm/min。(2) Tensile strength, tensile modulus, and tensile elongation at break Tensile strength, tensile modulus, and tensile elongation at break were measured in accordance with JIS K7127:1999 using a tensile testing machine "STROGRAPH VG-1E" manufactured by Toyo Seiki Co., Ltd. The distance between the clamps was set to 50 mm, the specimen size was set to 10 mm × 70 mm, and the test speed was set to 20 mm/min.
(3)玻璃轉移溫度(Tg) 使用Hitachi High-Tech Science股份有限公司製之熱機械性分析裝置「TMA/SS6100」,於拉伸模式以樣本尺寸2mm×20mm、荷重0.1N、昇溫速度10℃/min之條件,昇溫至足以去除殘留應力之溫度來去除殘留應力,其後冷卻至室溫。之後,以和用以去除前述殘留應力之處理相同的條件實施試驗片延伸的測定,求出觀察到延伸之反曲點時作為玻璃轉移溫度。(3) Glass transition temperature (Tg) The residual stress was removed by heating the sample to a temperature sufficient to remove the residual stress under the conditions of sample size 2 mm × 20 mm, load 0.1 N, and heating rate 10°C/min in the tensile mode using a thermomechanical analyzer "TMA/SS6100" manufactured by Hitachi High-Tech Science Co., Ltd., and then cooling to room temperature. Thereafter, the elongation of the test piece was measured under the same conditions as the treatment for removing the residual stress, and the inflection point of the elongation was determined as the glass transition temperature.
(4)全光線透射率、及黃色指數(YI) 全光線透射率及YI係依據JIS K7136,使用日本電色工業股份有限公司製之色彩-濁度同時測定器「COH7700」進行測定。(4) Total light transmittance and yellowness index (YI) Total light transmittance and YI were measured in accordance with JIS K7136 using the color-turbidity simultaneous tester "COH7700" manufactured by Nippon Denshoku Industries Co., Ltd.
(5)霧度 測定依據JIS K7361-1,使用日本電色工業股份有限公司製之色彩-濁度同時測定器「COH7700」來實施。(5) Haze The measurement was carried out in accordance with JIS K7361-1 using the color-turbidity simultaneous tester "COH7700" manufactured by Nippon Denshoku Industries Co., Ltd.
(6)厚度相位差(Rth)(光學各向同性的評價) 厚度相位差(Rth)係使用日本分光股份有限公司製之橢圓偏光計「M-220」進行測定。測定在測定波長590nm的厚度相位差之值。另外,Rth係令聚醯亞胺薄膜之面內的折射率中之最大者為nx、最小者為ny、厚度方向之折射率為nz、薄膜的厚度為d時,利用下式所表示者。 Rth={[(nx+ny)/2]-nz}×d(6) Thickness phase difference (Rth) (Evaluation of optical isotropy) The thickness phase difference (Rth) is measured using an elliptical polarimeter "M-220" manufactured by JASCO Corporation. The thickness phase difference value is measured at a measuring wavelength of 590nm. In addition, Rth is expressed by the following formula when the maximum refractive index in the plane of the polyimide film is nx, the minimum is ny, the refractive index in the thickness direction is nz, and the thickness of the film is d. Rth={[(nx+ny)/2]-nz}×d
(7)剝離性 利用美工刀在已製膜於玻璃板上之聚醯亞胺薄膜切出8cm見方的切口,並以鑷子將薄膜從玻璃板剝離,藉此來評價剝離性。 即使未將薄膜及玻璃板浸漬於水中仍可剝離者為剝離性良好,必須將薄膜及玻璃板浸漬於水中才能剝離者為剝離性不良。 表1中,剝離性良好時評為「A」,剝離性不良時評為「C」。 另外,前述(1)~(6)的評價中,使用浸漬過水的薄膜時,在測定及評價之前會將薄膜於90℃乾燥1小時。(7) Peelability The peelability was evaluated by cutting an 8 cm square incision in the polyimide film formed on the glass plate with a utility knife and peeling the film from the glass plate with tweezers. The film that could be peeled off even without being immersed in water was considered to have good peelability, while the film that could only be peeled off after being immersed in water was considered to have poor peelability. In Table 1, good peelability was rated as "A" and poor peelability was rated as "C". In addition, in the evaluations of (1) to (6) above, when a film immersed in water was used, the film was dried at 90°C for 1 hour before measurement and evaluation.
(8)耐溶劑性 於室溫將已製膜於玻璃板上之聚醯亞胺薄膜浸漬於溶劑中,確認薄膜表面有無變化。另外,溶劑使用丙二醇單甲醚乙酸酯(PGMEA)。 耐溶劑性的評價基準如下所述。 A:薄膜表面無變化。 B:薄膜表面有些微裂紋。 C:薄膜表面有裂紋、或薄膜表面溶解。(8) Solvent resistance The polyimide film formed on a glass plate was immersed in a solvent at room temperature to check whether there was any change on the film surface. In addition, propylene glycol monomethyl ether acetate (PGMEA) was used as the solvent. The evaluation criteria for solvent resistance are as follows. A: No change on the film surface. B: Some microcracks on the film surface. C: There were cracks on the film surface, or the film surface was dissolved.
<成分等的縮寫> 實施例及比較例所使用的四羧酸成分及二胺成分、以及其縮寫如下所述。<Abbreviations of components, etc.> The tetracarboxylic acid components and diamine components used in the embodiments and comparative examples, and their abbreviations are as follows.
(四羧酸成分) ODPA:4,4’-氧二鄰苯二甲酸酐(Manac股份有限公司製;式(a-1)表示之化合物) HPMDA:1,2,4,5-環己烷四甲酸二酐(三菱瓦斯化學股份有限公司製;式(a-2)表示之化合物) 6FDA:4,4’-(六氟亞異丙基)二苯二甲酸酐(Tetracarboxylic acid component) ODPA: 4,4'-oxydiphthalic anhydride (manufactured by Manac Co., Ltd.; compound represented by formula (a-1)) HPMDA: 1,2,4,5-cyclohexanetetracarboxylic dianhydride (manufactured by Mitsubishi Gas Chemical Co., Ltd.; compound represented by formula (a-2)) 6FDA: 4,4'-(hexafluoroisopropylidene)diphthalic anhydride
(二胺成分) 4,4’-DDS:4,4’-二胺基二苯基碸(SEIKA股份有限公司製;式(b-1)表示之化合物) 1,3-BAC:1,3-雙(胺基甲基)環己烷(三菱瓦斯化學股份有限公司製;式(b-2a)表示之化合物) 1,4-BACT:1,4-雙(胺基甲基)環己烷(三菱瓦斯化學股份有限公司製;式(b-2b)表示之化合物;反式比率85%) 6FODA:4,4’-二胺基-2,2’-雙三氟甲基二苯基醚(ChinaTech Chemical (Tianjin) Co., Ltd.製;式(b-3)表示之化合物) 3,3’-DDS:3,3’-二胺基二苯基碸(SEIKA股份有限公司製)(Diamine component) 4,4’-DDS: 4,4’-diaminodiphenyl sulfone (manufactured by SEIKA Co., Ltd.; compound represented by formula (b-1)) 1,3-BAC: 1,3-bis(aminomethyl)cyclohexane (manufactured by Mitsubishi Gas Chemical Co., Ltd.; compound represented by formula (b-2a)) 1,4-BACT: 1,4-bis(aminomethyl)cyclohexane (manufactured by Mitsubishi Gas Chemical Co., Ltd.; compound represented by formula (b-2b); trans ratio 85%) 6FODA: 4,4’-diamino-2,2’-bis(trifluoromethyl)diphenyl ether (manufactured by ChinaTech Chemical (Tianjin) Co., Ltd.; compound represented by formula (b-3)) 3,3’-DDS: 3,3’-diaminodiphenyl sulfone (manufactured by SEIKA Co., Ltd.)
<聚醯亞胺樹脂、清漆、以及聚醯亞胺薄膜的製造> 實施例1 於具備不鏽鋼製半月型攪拌葉片、氮氣導入管、安裝有冷卻管之迪安-斯塔克裝置、溫度計、玻璃製端蓋之300mL之5口圓底燒瓶中,投入12.415g(0.050莫耳)之4,4’-DDS、7.113g(0.050莫耳)之1,4-BACT、及55.496g之γ-丁內酯(三菱化學股份有限公司製),於系內溫度70℃、氮氣環境下以轉速200rpm進行攪拌,獲得溶液。 於該溶液中一次性地添加15.511g(0.050莫耳)之ODPA、及11.209g(0.050莫耳)之HPMDA、及13.874g之γ-丁內酯(三菱化學股份有限公司製)後,投入作為醯亞胺化觸媒之0.506g之三乙胺(關東化學股份有限公司製),利用加熱包(mantle heater)進行加熱,歷時約20分鐘使反應系內溫度上昇至190℃。收集餾得的成分,配合黏度上昇調整轉速,同時將反應系內溫度保持在190℃進行回流約5小時。 其後,添加101.200g之γ-丁內酯(三菱化學股份有限公司製)使固體成分濃度成為20質量%,將反應系內溫度冷卻至100℃後,再攪拌約1小時使其均勻化,獲得聚醯亞胺清漆。 然後,利用旋塗將得到的聚醯亞胺清漆塗佈到玻璃板上,利用加熱板於80℃保持20分鐘,其後,在空氣環境下,於熱風乾燥機中以260℃加熱30分鐘使溶劑蒸發,獲得薄膜。<Manufacturing of polyimide resin, varnish, and polyimide film> Example 1 In a 300 mL 5-necked round-bottom flask equipped with a stainless steel half-moon stirring blade, a nitrogen inlet pipe, a Dean-Stark apparatus equipped with a cooling tube, a thermometer, and a glass end cap, 12.415 g (0.050 mol) of 4,4'-DDS, 7.113 g (0.050 mol) of 1,4-BACT, and 55.496 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Co., Ltd.) were added, and stirred at a temperature of 70°C in a nitrogen environment at a rotation speed of 200 rpm to obtain a solution. After adding 15.511g (0.050 mol) of ODPA, 11.209g (0.050 mol) of HPMDA, and 13.874g of γ-butyrolactone (Mitsubishi Chemical Co., Ltd.) to the solution at once, 0.506g of triethylamine (Kanto Chemical Co., Ltd.) as an imidization catalyst was added, and the temperature in the reaction system was raised to 190°C in about 20 minutes using a mantle heater. The distilled components were collected, and the rotation speed was adjusted according to the increase in viscosity. At the same time, the temperature in the reaction system was kept at 190°C for about 5 hours of reflux. Then, 101.200 g of γ-butyrolactone (manufactured by Mitsubishi Chemical Co., Ltd.) was added to make the solid content concentration 20% by mass, and the temperature in the reaction system was cooled to 100°C, and then stirred for about 1 hour to make it uniform, thereby obtaining a polyimide varnish. Then, the obtained polyimide varnish was applied to a glass plate by spin coating, and maintained at 80°C for 20 minutes using a heating plate, and then heated at 260°C for 30 minutes in an air environment in a hot air dryer to evaporate the solvent, thereby obtaining a thin film.
實施例2 將1,4-BACT的量從7.113g(0.050莫耳)變更為11.380g(0.080莫耳),並將4,4’-DDS的量從12.415g(0.050莫耳)變更為4.966g(0.020莫耳),除此之外,和實施例1同樣地進行,獲得固體成分濃度20質量%之聚醯亞胺清漆。 使用得到的聚醯亞胺清漆,並利用和實施例1同樣的方法獲得薄膜。Example 2 The same procedure as in Example 1 was followed except that the amount of 1,4-BACT was changed from 7.113 g (0.050 mol) to 11.380 g (0.080 mol) and the amount of 4,4'-DDS was changed from 12.415 g (0.050 mol) to 4.966 g (0.020 mol) to obtain a polyimide varnish having a solid content concentration of 20% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
實施例3 將1,4-BACT的量從7.113g(0.050莫耳)變更為8.535g(0.060莫耳),並將4,4’-DDS的量從12.415g(0.050莫耳)變更為9.932g(0.040莫耳),除此之外,和實施例1同樣地進行,獲得固體成分濃度20質量%之聚醯亞胺清漆。 使用得到的聚醯亞胺清漆,並利用和實施例1同樣的方法獲得薄膜。Example 3 The same procedure as in Example 1 was followed except that the amount of 1,4-BACT was changed from 7.113 g (0.050 mol) to 8.535 g (0.060 mol) and the amount of 4,4'-DDS was changed from 12.415 g (0.050 mol) to 9.932 g (0.040 mol) to obtain a polyimide varnish having a solid content concentration of 20% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
實施例4 將4,4’-DDS的量從12.415g(0.050莫耳)變更為4.966g(0.020莫耳),並追加10.087g(0.030莫耳)之6FODA,除此之外,和實施例1同樣地進行,獲得固體成分濃度20質量%之聚醯亞胺清漆。 使用得到的聚醯亞胺清漆,並利用和實施例1同樣的方法獲得薄膜。Example 4 The same procedure as in Example 1 was followed except that the amount of 4,4'-DDS was changed from 12.415 g (0.050 mol) to 4.966 g (0.020 mol) and 10.087 g (0.030 mol) of 6FODA was added to obtain a polyimide varnish having a solid content of 20% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
實施例5 將7.113g(0.050莫耳)之1,4-BACT變更為7.113g(0.050莫耳)之1,3-BAC,除此之外,和實施例1同樣地進行,獲得固體成分濃度20質量%之聚醯亞胺清漆。 使用得到的聚醯亞胺清漆,並利用和實施例1同樣的方法獲得薄膜。Example 5 Except that 7.113 g (0.050 mol) of 1,4-BACT was replaced with 7.113 g (0.050 mol) of 1,3-BAC, the same procedure as in Example 1 was followed to obtain a polyimide varnish having a solid content concentration of 20% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
比較例1 將15.511g(0.050莫耳)之ODPA與11.209g(0.050莫耳)之HPMDA變更為44.424(0.100莫耳)之6FDA,除此之外,和實施例1同樣地進行,獲得固體成分濃度20質量%之聚醯亞胺清漆。 使用得到的聚醯亞胺清漆,並利用和實施例1同樣的方法獲得薄膜。Comparative Example 1 Except that 15.511 g (0.050 mol) of ODPA and 11.209 g (0.050 mol) of HPMDA were replaced with 44.424 g (0.100 mol) of 6FDA, the same procedure as in Example 1 was followed to obtain a polyimide varnish having a solid content concentration of 20% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
比較例2 將11.209g(0.050莫耳)之HPMDA變更為22.212g(0.050莫耳)之6FDA,除此之外,和實施例1同樣地進行,獲得固體成分濃度20質量%之聚醯亞胺清漆。 使用得到的聚醯亞胺清漆,並利用和實施例1同樣的方法獲得薄膜。Comparative Example 2 Except that 11.209 g (0.050 mol) of HPMDA was replaced with 22.212 g (0.050 mol) of 6FDA, the same procedure as in Example 1 was followed to obtain a polyimide varnish having a solid content concentration of 20% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
比較例3 將12.415g(0.050莫耳)之4,4’-DDS變更為12.415g(0.050莫耳)之3,3’-DDS,除此之外,和實施例1同樣地進行,獲得固體成分濃度20質量%之聚醯亞胺清漆。 使用得到的聚醯亞胺清漆,並利用和實施例1同樣的方法獲得薄膜。Comparative Example 3 Except that 12.415 g (0.050 mol) of 4,4'-DDS was replaced with 12.415 g (0.050 mol) of 3,3'-DDS, the same procedure as in Example 1 was followed to obtain a polyimide varnish having a solid content concentration of 20% by mass. The obtained polyimide varnish was used to obtain a film in the same manner as in Example 1.
比較例4 不使用HPMDA,並將ODPA的量從15.511g(0.050莫耳)變更為31.021g(0.100莫耳),除此之外,和實施例1同樣地實施醯亞胺化反應。但是,投入三乙胺後,在將反應系內溫度昇溫至190℃之過程,反應溶液變白濁而無法獲得清漆。Comparative Example 4 The imidization reaction was carried out in the same manner as in Example 1 except that HPMDA was not used and the amount of ODPA was changed from 15.511 g (0.050 mol) to 31.021 g (0.100 mol). However, after adding triethylamine, the reaction solution became cloudy during the process of raising the temperature in the reaction system to 190°C, and no varnish was obtained.
比較例5 不使用1,4-BACT,並將4,4’-DDS的量從12.415g(0.050莫耳)變更為24.830g(0.100莫耳),且不使用HPMDA,並將ODPA的量從15.511g(0.050莫耳)變更為31.021g(0.100莫耳),除此之外,和實施例1同樣地實施醯亞胺化反應。但是,投入三乙胺後,在將反應系內溫度昇溫至190℃之過程,反應溶液變白濁而無法獲得清漆。Comparative Example 5 Other than not using 1,4-BACT and changing the amount of 4,4'-DDS from 12.415 g (0.050 mol) to 24.830 g (0.100 mol), and not using HPMDA and changing the amount of ODPA from 15.511 g (0.050 mol) to 31.021 g (0.100 mol), the imidization reaction was carried out in the same manner as in Example 1. However, after adding triethylamine, the reaction solution became cloudy during the process of raising the temperature in the reaction system to 190°C, and no varnish was obtained.
比較例6 不使用1,4-BACT,並將4,4’-DDS的量從12.415g(0.050莫耳)變更為24.830g(0.100莫耳),且不使用ODPA,並將HPMDA的量從11.209g(0.050莫耳)變更為22.417g(0.100莫耳),除此之外,和實施例1同樣地實施醯亞胺化反應。但是,投入三乙胺後,在將反應系內溫度昇溫至190℃之過程,反應溶液變白濁而無法獲得清漆。Comparative Example 6 Other than not using 1,4-BACT and changing the amount of 4,4'-DDS from 12.415 g (0.050 mol) to 24.830 g (0.100 mol), and not using ODPA and changing the amount of HPMDA from 11.209 g (0.050 mol) to 22.417 g (0.100 mol), the imidization reaction was carried out in the same manner as in Example 1. However, after adding triethylamine, the reaction solution became cloudy during the process of raising the temperature in the reaction system to 190°C, and no varnish was obtained.
針對實施例及比較例得到的聚醯亞胺薄膜實施前述物性測定及評價。結果如表1所示。The above-mentioned physical property measurements and evaluations were performed on the polyimide films obtained in the examples and comparative examples. The results are shown in Table 1.
[表1]
如表1所示可知,實施例之聚醯亞胺薄膜,其光學各向同性良好,此外剝離性與耐藥品性亦優良。 [產業上利用性]As shown in Table 1, the polyimide film of the embodiment has good optical isotropy, and also excellent peeling property and chemical resistance. [Industrial Applicability]
含有本發明之聚醯亞胺樹脂的聚醯亞胺薄膜,其光學各向同性良好,此外剝離性與耐藥品性亦優良,可理想地使用作為彩色濾光片、撓性顯示器、半導體零件、光學構件等各種構件用之薄膜。含有本發明之聚醯亞胺樹脂的聚醯亞胺薄膜,可特別理想地使用作為液晶顯示器、OLED顯示器等圖像顯示裝置之基板。The polyimide film containing the polyimide resin of the present invention has good optical isotropy, and also excellent peeling property and chemical resistance, and can be ideally used as a film for various components such as color filters, flexible displays, semiconductor parts, optical components, etc. The polyimide film containing the polyimide resin of the present invention can be particularly ideally used as a substrate for image display devices such as liquid crystal displays and OLED displays.
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| CN105392820A (en) * | 2013-08-06 | 2016-03-09 | 三菱瓦斯化学株式会社 | Polyimide resin |
| JP2016204568A (en) * | 2015-04-27 | 2016-12-08 | 宇部興産株式会社 | Polyamic acid solution composition and polyimide film |
| CN109071813A (en) * | 2016-05-09 | 2018-12-21 | 三菱瓦斯化学株式会社 | Polyimide resin and polyimide resin composition |
| WO2019026806A1 (en) * | 2017-08-02 | 2019-02-07 | 旭化成株式会社 | Polyimide varnish and method for producing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| CN114867767B (en) | 2024-07-02 |
| WO2021132196A1 (en) | 2021-07-01 |
| TW202130706A (en) | 2021-08-16 |
| JPWO2021132196A1 (en) | 2021-07-01 |
| CN114867767A (en) | 2022-08-05 |
| JP7687212B2 (en) | 2025-06-03 |
| KR20220123393A (en) | 2022-09-06 |
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