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TWI858148B - Curable composition, cured product, and method for forming cured product - Google Patents

Curable composition, cured product, and method for forming cured product Download PDF

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TWI858148B
TWI858148B TW109134140A TW109134140A TWI858148B TW I858148 B TWI858148 B TW I858148B TW 109134140 A TW109134140 A TW 109134140A TW 109134140 A TW109134140 A TW 109134140A TW I858148 B TWI858148 B TW I858148B
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TW202124500A (en
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張媛婧
塩田大
染谷和也
引田二郎
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日商東京應化工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/687Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins

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Abstract

本發明係提供可兼具硬化時之硬化物之著色之抑制與良好硬化性之陽離子硬化性的硬化性組成物,該硬化性組成物之硬化物及使用該硬化性組成物之硬化物之形成方法。 包含陽離子硬化劑(A)與陽離子硬化性化合物(B)之硬化性組成物中,使用組合包含由具有特定結構之陽離子部之鎓鹽所構成的光酸產生劑(A1)與具有特定結構之含鎵陰離子作為陰離子部之熱酸產生劑(A2)的陽離子硬化劑。The present invention provides a cationic curable curable composition that can suppress the coloring of the cured product during curing and has good curability, a cured product of the curable composition, and a method for forming a cured product using the curable composition. In the curable composition comprising a cationic curing agent (A) and a cationic curing compound (B), a cationic curing agent is used that is a combination of a photoacid generator (A1) composed of an onium salt having a cationic part with a specific structure and a thermal acid generator (A2) having a gallium anion with a specific structure as an anionic part.

Description

硬化性組成物、硬化物,及硬化物之形成方法Curable composition, cured product, and method for forming cured product

本發明係有關包含陽離子硬化劑(A)與陽離子硬化性化合物(B)的硬化性組成物,該硬化性組成物之硬化物,及使用該硬化性組成物之硬化物之形成方法。The present invention relates to a curable composition comprising a cationic curing agent (A) and a cationic curable compound (B), a cured product of the curable composition, and a method for forming a cured product using the curable composition.

以往,包含環氧化合物等之陽離子聚合性化合物作為硬化性成分之陽離子聚合型的硬化性組成物在各種用途使用。Conventionally, cationically polymerizable curable compositions containing cationically polymerizable compounds such as epoxy compounds as curable components have been used in various applications.

這種硬化性組成物,例如包含含有芳香環之脂環式環氧化合物與含有芳香環之脂環式環氧化合物以外之陽離子聚合性化合物與熱陽離子聚合起始劑之陽離子聚合性的熱硬化性組成物為人所知(參照專利文獻1)。藉由使用這種硬化性組成物,可形成玻璃轉移溫度高,即使加熱至高溫,也不易變黃,基材密著性優異的硬化物。 [先前技術文獻] [專利文獻]Such curable compositions, for example, cationic polymerizable thermosetting compositions comprising an alicyclic epoxy compound containing an aromatic ring, a cationic polymerizable compound other than the alicyclic epoxy compound containing an aromatic ring, and a thermal cationic polymerization initiator are known (see Patent Document 1). By using such a curable composition, a cured product having a high glass transition temperature, not easily yellowing even when heated to a high temperature, and excellent substrate adhesion can be formed. [Prior Art Document] [Patent Document]

[專利文獻1]日本特開2014-156522號公報[Patent Document 1] Japanese Patent Application Publication No. 2014-156522

[發明所欲解決之課題][The problem that the invention wants to solve]

但是如專利文獻1所記載之包含熱陽離子聚合起始劑的硬化性組成物,有時硬化需要高溫,有時需要長時間。這種不理想的情形,使用鎓鹽系之光酸產生劑可消除。但是將包含鎓鹽系之光酸產生劑與陽離子硬化性化合物的硬化性組成物藉由曝光使硬化時,有時硬化時之硬化物有產生著色的問題。However, the curable composition containing a thermal cationic polymerization initiator as described in Patent Document 1 sometimes requires high temperature and sometimes requires a long time to cure. This undesirable situation can be eliminated by using an onium salt-based photoacid generator. However, when the curable composition containing an onium salt-based photoacid generator and a cationic curable compound is cured by exposure, the cured product sometimes has a problem of coloring during curing.

本發明有鑑於上述的課題而完成者,本發明之目的係提供可兼具組成物硬化時之硬化物之著色之抑制與良好硬化性之陽離子硬化性的硬化性組成物,該硬化性組成物之硬化物及使用該硬化性組成物之硬化物之形成方法。 [用以解決課題之手段]The present invention was completed in view of the above-mentioned problem. The purpose of the present invention is to provide a curable composition that can suppress the coloring of the cured product when the composition is cured and has good curability, a cured product of the curable composition, and a method for forming a cured product using the curable composition. [Means for solving the problem]

本發明人等發現在包含陽離子硬化劑(A)與陽離子硬化性化合物(B)之硬化性組成物中,藉由使用組合包含具有特定結構之陽離子部之鎓鹽所構成的光酸產生劑(A1)與具有特定結構之含鎵陰離子作為陰離子部之熱酸產生劑(A2)的陽離子硬化劑,可解決上述課題,而完成本發明。具體而言,本發明係提供以下者。The inventors of the present invention have found that in a curable composition comprising a cationic curing agent (A) and a cationic curing compound (B), the above-mentioned problems can be solved by using a cationic curing agent that combines a photoacid generator (A1) comprising an onium salt having a cationic part with a specific structure and a thermal acid generator (A2) having a gallium-containing anion having a specific structure as an anionic part, thereby completing the present invention. Specifically, the present invention provides the following.

本發明之第1態樣係一種硬化性組成物,其係包含陽離子硬化劑(A)與陽離子硬化性化合物(B), 陽離子硬化劑(A)包含光酸產生劑(A1)與熱酸產生劑(A2), 光酸產生劑(A1)為具有下述式(ai)表示之陽離子部的鎓鹽, 熱酸產生劑(A2)為具有下述式(Ai)表示之陰離子部的鎓鹽, (式(ai)中,Ra1 各自獨立為1價之有機基,Ra2 為藉由IUPAC表示法之元素週期表之第15族~17族之原子價t的元素,Ra1 之至少1個為可具有取代基之芳基) (式(Ai)中,RA1 各自獨立為可具有1個以上取代基之苯基、或全氟烷基)。The first aspect of the present invention is a curable composition comprising a cationic curing agent (A) and a cationic curing compound (B), wherein the cationic curing agent (A) comprises a photoacid generator (A1) and a thermal acid generator (A2), wherein the photoacid generator (A1) is an onium salt having a cationic part represented by the following formula (ai), and the thermal acid generator (A2) is an onium salt having an anionic part represented by the following formula (Ai). (In formula (ai), each Ra1 is independently a monovalent organic group, Ra2 is an element of Group 15 to Group 17 of the Periodic Table of the Elements according to the IUPAC notation with an atomic valence of t, and at least one of Ra1 is an aromatic group which may have a substituent) (In formula (Ai), each RA1 is independently a phenyl group which may have one or more substituents, or a perfluoroalkyl group).

本發明之第2態樣為第1態樣之硬化性組成物之硬化物。The second aspect of the present invention is a cured product of the curable composition of the first aspect.

本發明之第3態樣為對第1態樣之硬化性組成物施予曝光及加熱之硬化物之形成方法。 [發明效果]The third aspect of the present invention is a method for forming a hardened product by exposing and heating the hardening composition of the first aspect. [Effect of the invention]

依據本發明時,可提供可兼具硬化時之硬化物之著色之抑制與良好硬化性之陽離子硬化性之硬化性組成物,該硬化性組成物之硬化物及使用該硬化性組成物之硬化物之形成方法。 [實施發明之形態]According to the present invention, a cationic curable curable composition that can suppress the coloring of the cured product during curing and has good curability, a cured product of the curable composition, and a method for forming a cured product using the curable composition can be provided. [Embodiments of the invention]

≪硬化性組成物≫ 硬化性組成物係包含陽離子硬化劑(A)與陽離子硬化性化合物(B)。 陽離子硬化劑(A)包含光酸產生劑(A1)與熱酸產生劑(A2)。 光酸產生劑(A1)為具有下述式(ai)表示之陽離子部的鎓鹽。 (式(ai)中,Ra1 各自獨立為1價之有機基,Ra2 為藉由IUPAC表示法之元素週期表之第15族~17族之原子價t的元素,Ra1 之至少1個為可具有取代基之芳基。) 熱酸產生劑(A2)為具有下述式(Ai)表示之陰離子部的鎓鹽。 (式(Ai)中,RA1 各自獨立為可具有1個以上取代基之苯基、或全氟烷基)。≪Curing composition≫ The curing composition includes a cationic curing agent (A) and a cationic curing compound (B). The cationic curing agent (A) includes a photoacid generator (A1) and a thermal acid generator (A2). The photoacid generator (A1) is an onium salt having a cationic part represented by the following formula (ai). (In formula (ai), each Ra1 is independently a monovalent organic group, Ra2 is an element of Group 15 to Group 17 of the periodic table of the elements according to IUPAC notation with an atomic valence of t, and at least one of Ra1 is an aromatic group which may have a substituent.) The thermal acid generator (A2) is an onium salt having an anion portion represented by the following formula (Ai). (In formula (Ai), each RA1 is independently a phenyl group which may have one or more substituents, or a perfluoroalkyl group).

藉由組合使用具有特定結構之陽離子部之上述光酸產生劑(A1)與具有特定結構之陰離子部之上述熱酸產生劑(A2),可提高硬化性組成物之硬化性,且可抑制硬化時之硬化物之著色。 對於使用鎓鹽系之光酸產生劑(A1),使陽離子硬化性化合物(B)硬化時之硬化物之著色,其原因係光酸產生劑(A1)因曝光產生分解時,產生著色原因物質。對此,熱酸產生劑(A2)因加熱分解時,未發生引發因光酸產生劑(A1)之分解所產生之著色原因物質所造成之著色的物質,或熱酸產生劑(A2)之分解物對於著色原因物質產生某種的作用,而抑制硬化時之硬化物的著色。 特別是後述陽離子硬化性化合物(B)為提供無色透明之硬化物的化合物時,藉由組合上述陽離子硬化劑(A)與陽離子硬化性化合物(B),可形成適合光學用途之高度無色透明的硬化物。By using the above-mentioned photoacid generator (A1) having a cationic part with a specific structure and the above-mentioned thermal acid generator (A2) having a cationic part with a specific structure in combination, the curability of the curable composition can be improved, and the coloring of the cured product during curing can be suppressed. The reason why the cured product is colored when the cationic curable compound (B) is cured using the onium salt-based photoacid generator (A1) is that the photoacid generator (A1) is decomposed by exposure to light to generate a coloring cause substance. In contrast, when the thermal acid generator (A2) is decomposed by heating, no substance that causes coloring caused by the coloring cause substance generated by the decomposition of the photoacid generator (A1) occurs, or the decomposition product of the thermal acid generator (A2) has some effect on the coloring cause substance, thereby suppressing the coloring of the cured product during curing. In particular, when the cationic curing compound (B) described later is a compound that provides a colorless and transparent cured product, by combining the above-mentioned cationic curing agent (A) and the cationic curing compound (B), a highly colorless and transparent cured product suitable for optical use can be formed.

以下,說明硬化性組成物所含有之必須或任意的成分。The following describes the essential or optional components contained in the curable composition.

[光酸產生劑(A1)] 光酸產生劑(A1)為具有下述式(ai)表示之陽離子部的鎓鹽。作為光酸產生劑(A1)之構成鎓鹽的陰離子部,在不阻礙本發明之目的之範圍內無特別限定。 (式(ai)中,Ra1 各自獨立為1價有機基,Ra2 為藉由IUPAC表示法之元素週期表之第15族~17族之原子價t的元素,Ra1 之至少1個可具有取代基之芳基。)[Photoacid Generator (A1)] The photoacid generator (A1) is an onium salt having a cationic part represented by the following formula (ai). The anionic part constituting the onium salt of the photoacid generator (A1) is not particularly limited within the range not hindering the purpose of the present invention. (In formula (ai), each Ra1 is independently a monovalent organic group, Ra2 is an element of Group 15 to Group 17 of the Periodic Table of the Elements according to the IUPAC notation with an atomic valence of t, and at least one of Ra1 is an aromatic group which may have a substituent.)

陽離子部之式(ai)中之Ra1 表示與Ra2 鍵結的有機基。有機基較佳為含有碳原子之基,更佳為1個以上之碳原子及選自由H、O、S、Se、N、B、P、Si及鹵素原子所構成群組之1個以上之原子所構成之基。含有碳原子之基之碳原子數,無特別限定,較佳為1以上50以下,更佳為1以上20以下。Ra1 為複數存在時之複數的Ra1 ,可相同或相異。作為Ra1 ,可列舉可具有取代基之碳原子數6以上14以下之芳基(芳香族烴基)、可具有取代基之碳原子數1以上18以下之烷基、可具有取代基之碳原子數7以上12以下之芳烷基、可具有取代基之碳原子數2以上18以下之烯基、及可具有取代基環基之碳原子數2以上18以下之炔基。具有式(ai)表示之陽離子作為陽離子部之光酸產生劑(A1)中,作為Ra1 ,較佳為碳原子數6以上14以下之芳基、碳原子數1以上18以下之烷基、碳原子數2以上18以下之烯基、及碳原子數2以上18以下之炔基。 Ra1 in the formula (ai) of the cation part represents an organic group bonded to Ra2 . The organic group is preferably a group containing carbon atoms, and more preferably a group consisting of one or more carbon atoms and one or more atoms selected from the group consisting of H, O, S, Se, N, B, P, Si and halogen atoms. The number of carbon atoms in the group containing carbon atoms is not particularly limited, but is preferably 1 to 50, and more preferably 1 to 20. When Ra1 exists in plural, the plural Ra1 may be the same or different. As Ra1 , there can be mentioned an aryl group (aromatic alkyl group) having 6 to 14 carbon atoms which may have a substituent, an alkyl group having 1 to 18 carbon atoms which may have a substituent, an aralkyl group having 7 to 12 carbon atoms which may have a substituent, an alkenyl group having 2 to 18 carbon atoms which may have a substituent, and an alkynyl group having 2 to 18 carbon atoms which may have a substituent. In the photoacid generator (A1) having a cation represented by the formula (ai) as a cation part, Ra1 is preferably an aryl group having 6 to 14 carbon atoms, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, and an alkynyl group having 2 to 18 carbon atoms.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基,可列舉碳原子數1以上18以下之烷基、碳原子數1以上18以下之鹵化烷基、碳原子數3以上18以下之脂肪族環式基、碳原子數3以上18以下之鹵化脂肪族環式基、碳原子數2以上18以下之烯基、碳原子數2以上18以下之炔基、碳原子數6以上14以下之芳基、硝基、羥基、氰基、碳原子數1以上18以下之烷氧基、碳原子數6以上14以下之芳氧基、碳原子數2以上19以下之脂肪族醯基、碳原子數7以上15以下之芳香族醯基、碳原子數2以上19以下之脂肪族醯氧基、碳原子數7以上15以下之芳香族醯氧基、碳原子數1以上18以下之烷硫基、碳原子數6以上14以下之芳硫基、鍵結於氮原子之1或2個氫原子可被碳原子數1以上18以下之烴基取代之胺基、及鹵素原子。As the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl of R a1 may have, there can be listed an alkyl group having 1 to 18 carbon atoms, a halogenated alkyl group having 1 to 18 carbon atoms, an aliphatic cyclic group having 3 to 18 carbon atoms, a halogenated aliphatic cyclic group having 3 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, an alkynyl group having 2 to 18 carbon atoms, an aryl group having 6 to 14 carbon atoms, a nitro group, a hydroxyl group, a cyano group, a Alkoxy groups, aryloxy groups having 6 to 14 carbon atoms, aliphatic acyl groups having 2 to 19 carbon atoms, aromatic acyl groups having 7 to 15 carbon atoms, aliphatic acyloxy groups having 2 to 19 carbon atoms, aromatic acyloxy groups having 7 to 15 carbon atoms, alkylthio groups having 1 to 18 carbon atoms, arylthio groups having 6 to 14 carbon atoms, amino groups in which 1 or 2 hydrogen atoms bonded to a nitrogen atom may be substituted by a alkyl group having 1 to 18 carbon atoms, and halogen atoms.

此等之取代基之中,較佳為烷基、鹵化烷基、脂肪族環式基、鹵化脂肪族環式基、烷氧基、芳氧基、脂肪族醯基、芳香族醯基、脂肪族醯氧基、芳香族醯氧基、烷硫基、芳硫基、及可被烴基取代之胺基。Among these substituents, preferred are alkyl groups, halogenated alkyl groups, aliphatic cyclic groups, halogenated aliphatic cyclic groups, alkoxy groups, aryloxy groups, aliphatic acyl groups, aromatic acyl groups, aliphatic acyloxy groups, aromatic acyloxy groups, alkylthio groups, arylthio groups, and amino groups which may be substituted with a alkyl group.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為烷基時,烷基之較佳例,可列舉甲基、乙基、n-丙基、n-丁基、n-戊基、n-己基、n-辛基、n-壬基、n-癸基、n-十一烷基、n-十二烷基、n-十三烷基、n-十四烷基、n-十五烷基、n-十六烷基、n-十七烷基、及n-十八烷基等之直鏈烷氧基;異丙基、異丁基、sec-丁基、tert-丁基、異戊基、新戊基、tert-戊基、異己基、2-乙基己基及1,1,3,3-四甲基丁基等之支鏈烷氧基。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl group of R a1 may have is an alkyl group, preferred examples of the alkyl group include straight-chain alkoxy groups such as methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, n-heptadecyl and n-octadecyl; and branched-chain alkoxy groups such as isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl, isohexyl, 2-ethylhexyl and 1,1,3,3-tetramethylbutyl.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為鹵化烷基時,鹵化烷基之較佳例,可列舉三氟甲基、三氯甲基、五氟乙基、2,2,2-三氯乙基、2,2,2-三氟乙基、1,1-二氟乙基、七氟-n-丙基、1,1-二氟-n-丙基、3,3,3-三氟-n-丙基、九氟-n-丁基、3,3,4,4,4-五氟-n-丁基、全氟-n-戊基、及全氟-n-辛基等之直鏈鹵化烷基;六氟異丙基、六氯異丙基、六氟異丁基、及九氟-tert-丁基等之支鏈鹵化烷基。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl of R a1 may have is a halogenated alkyl group, preferred examples of the halogenated alkyl group include straight-chain halogenated alkyl groups such as trifluoromethyl, trichloromethyl, pentafluoroethyl, 2,2,2-trichloroethyl, 2,2,2-trifluoroethyl, 1,1-difluoroethyl, heptafluoro-n-propyl, 1,1-difluoro-n-propyl, 3,3,3-trifluoro-n-propyl, nonafluoro-n-butyl, 3,3,4,4,4-pentafluoro-n-butyl, perfluoro-n-pentyl and perfluoro-n-octyl; and branched-chain halogenated alkyl groups such as hexafluoroisopropyl, hexachloroisopropyl, hexafluoroisobutyl and nonafluoro-tert-butyl.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為脂肪族環式基時,脂肪族環式基之較佳例,可列舉環丙基、環丁基、環戊基、環己基及金剛烷基等。When the substituent which the aryl, aralkyl, alkyl, alkenyl and alkynyl group represented by R a1 may have is an aliphatic cyclic group, preferred examples of the aliphatic cyclic group include cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl and adamantyl.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為鹵化脂肪族環式基時,鹵化脂肪族環式基之較佳例,可列舉五氟環丙基、九氟環丁基、全氟環戊基、全氟環己基及全氟金剛烷基等。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl group as R a1 may have is a halogenated aliphatic cyclogroup, preferred examples of the halogenated aliphatic cyclogroup include pentafluorocyclopropyl, nonafluorocyclobutyl, perfluorocyclopentyl, perfluorocyclohexyl and perfluoroadamantyl.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為烷氧基時,烷氧基之較佳例,可列舉甲氧基、乙氧基、n-丙氧基、n-丁氧基、n-戊氧基、n-己氧基、n-辛氧基、n-壬氧基、n-癸氧基、n-十一烷氧基、n-十二烷氧基、n-十三烷氧基、n-十四烷氧基、n-十五烷氧基、n-十六烷氧基、n-十七烷氧基、及n-十八烷氧基等之直鏈烷氧基;異丙氧基、異丁氧基、sec-丁氧基、tert-丁氧基、異戊氧基、新戊氧基、tert-戊氧基、異己氧基、2-乙基己氧基、及1,1,3,3-四甲基丁氧基等之支鏈烷氧基。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl of R a1 may have is an alkoxy group, preferred examples of the alkoxy group include straight-chain alkoxy groups such as methoxy, ethoxy, n-propoxy, n-butoxy, n-pentyloxy, n-hexyloxy, n-octyloxy, n-nonyloxy, n-decyloxy, n-undecyloxy, n-dodecyloxy, n-tridecyloxy, n-tetradecyloxy, n-pentadecyloxy, n-hexadecyloxy, n-heptadecyloxy and n-octadecyloxy; and branched-chain alkoxy groups such as isopropoxy, isobutoxy, sec-butoxy, tert-butoxy, isopentyloxy, neopentyloxy, tert-pentyloxy, isohexyloxy, 2-ethylhexyloxy and 1,1,3,3-tetramethylbutoxy.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為芳氧基時,芳氧基之較佳例,可列舉苯氧基、α-萘氧基、β-萘氧基、聯苯基-4-基氧基、聯苯基-3-基氧基、聯苯基-2-基氧基、蒽氧基及菲氧基等。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl represented by R a1 may have is an aryloxy group, preferred examples of the aryloxy group include phenoxy, α-naphthyloxy, β-naphthyloxy, biphenyl-4-yloxy, biphenyl-3-yloxy, biphenyl-2-yloxy, anthracenyloxy and phenanthrenyloxy.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為脂肪族醯基時,脂肪族醯基之較佳例,可列舉乙醯基、丙醯基、丁醯基、戊醯基、己醯基、庚醯基及辛醯基等。When the substituent which the aryl, aralkyl, alkyl, alkenyl and alkynyl group as R a1 may have is an aliphatic acyl group, preferred examples of the aliphatic acyl group include acetyl, propionyl, butyryl, pentyl, hexyl, heptyl and octyl.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為芳香族醯基時,芳香族醯基之較佳例,可列舉苯甲醯基、α-萘甲醯基、β-萘甲醯基、聯苯基-4-基羰基、聯苯基-3-基羰基、聯苯基-2-基羰基、蒽基羰基及菲基羰基等。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl group as R a1 may have is an aromatic acyl group, preferred examples of the aromatic acyl group include benzoyl, α-naphthoyl, β-naphthoyl, biphenyl-4-ylcarbonyl, biphenyl-3-ylcarbonyl, biphenyl-2-ylcarbonyl, anthracenylcarbonyl and phenanthrenylcarbonyl.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為脂肪族醯氧基時,脂肪族醯氧基之較佳例,可列舉乙醯氧基、丙醯氧基、丁醯氧基、戊醯氧基、己醯氧基、庚醯氧基及辛醯氧基等。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl group represented by R a1 may have is an aliphatic acyloxy group, preferred examples of the aliphatic acyloxy group include acetyloxy, propionyloxy, butyryloxy, pentyloxy, hexyloxy, heptyloxy and octyloxy groups.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為芳香族醯氧基時,芳香族醯氧基之較佳例,可列舉苯甲醯氧基、α-萘甲醯氧基、β-萘甲醯氧基、聯苯基-4-基羰氧基、聯苯基-3-基羰氧基、聯苯基-2-基羰氧基、蒽基羰氧基及菲基羰氧基等。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl group represented by R a1 may have is an aromatic acyloxy group, preferred examples of the aromatic acyloxy group include a benzoyloxy group, an α-naphthyloxy group, a β-naphthyloxy group, a biphenyl-4-ylcarbonyloxy group, a biphenyl-3-ylcarbonyloxy group, a biphenyl-2-ylcarbonyloxy group, anthracenylcarbonyloxy group and phenanthrenylcarbonyloxy group.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為烷硫基、或芳硫基時,烷硫基、或芳硫基之較佳例,可列舉作為前述烷氧基或芳氧基之較佳之基中之氧原子取代成硫原子之基。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl group as R a1 may have is an alkylthio group or an arylthio group, preferred examples of the alkylthio group or the arylthio group include groups in which the oxygen atom in the preferred groups of the aforementioned alkoxy group or aryloxy group is substituted with a sulfur atom.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為可被烴基取代之胺基時,可被烴基取代之胺基之較佳的例,可列舉胺基、甲基胺基、乙基胺基、n-丙基胺基、二甲基胺基、二乙基胺基、甲基乙基胺基、二-n-丙基胺基及哌啶基等。When the substituent that the aryl, aralkyl, alkyl, alkenyl and alkynyl group as R a1 may have is an amino group that may be substituted by an alkyl group, preferred examples of the amino group that may be substituted by an alkyl group include amino, methylamino, ethylamino, n-propylamino, dimethylamino, diethylamino, methylethylamino, di-n-propylamino and piperidinyl.

作為Ra1 之芳基、芳烷基、烷基、烯基及炔基可具有之取代基為鹵素原子時,鹵素原子之較佳的例,可列舉氟原子、氯原子、溴原子及碘原子等。When the substituent which the aryl group, aralkyl group, alkyl group, alkenyl group and alkynyl group represented by R a1 may have is a halogen atom, preferred examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

以上說明之取代基之中,就光酸產生劑(A1)之活性高的觀點,較佳為碳原子數1以上8以下之鹵化烷基、鹵素原子、硝基、及氰基,更佳為碳原子數1以上8以下之氟化烷基。Among the substituents described above, from the viewpoint of high activity of the photoacid generator (A1), preferred are halogenated alkyl groups having 1 to 8 carbon atoms, halogen atoms, nitro groups, and cyano groups, and more preferred are fluorinated alkyl groups having 1 to 8 carbon atoms.

式(ai)中,Ra1 複數存在時,複數之Ra1 可與Ra2 一同形成環。複數之Ra1 與Ra2 形成之環係其環結構中可含有選自由-O-、-S-、-SO-、-SO2 -、-NH-、-CO-、-COO-、及-CONH-所構成群組之1個以上之鍵結。In formula (ai), when multiple Ra1 exists, the multiple Ra1 may form a ring together with Ra2 . The ring formed by multiple Ra1 and Ra2 may contain one or more bonds selected from the group consisting of -O-, -S-, -SO-, -SO2- , -NH-, -CO-, -COO-, and -CONH- in its ring structure.

式(ai)中之Ra2 係元素週期表(IUPAC表示法)之第15族~17族,原子價t的元素。又,作為Ra2 之元素週期表(IUPAC表示法)之第15族~17族的元素,在硬化性組成物之製造條件下及保管條件下、硬化物之形成條件下,可安定存在的元素。 Ra2 係與有機基Ra1 鍵結形成鎓離子。元素週期表(IUPAC表示法)之第15族~17族之元素之中,作為Ra2 較佳的元素為S(硫)、N(氮)、I(碘)、及P(磷)。對應之鎓離子為鋶離子、銨離子、錪離子及鏻離子。此等可安定操作容易,故較佳。就陽離子聚合性能或交聯反應性能優異的觀點,較佳為鋶離子及錪離子,特佳為鋶離子。 換言之,前述式(ai)中,Ra2 為硫,t為2者較佳。 Ra2 in formula (ai) is an element of Group 15 to Group 17 of the Periodic Table of the Elements (IUPAC notation) with an atomic valence of t. Furthermore, the element of Group 15 to Group 17 of the Periodic Table of the Elements (IUPAC notation) as Ra2 is an element that can stably exist under the manufacturing conditions and storage conditions of the curable composition and the formation conditions of the cured product. Ra2 forms an onium ion by bonding with the organic group Ra1 . Among the elements of Group 15 to Group 17 of the Periodic Table of the Elements (IUPAC notation), the preferred elements as Ra2 are S (sulfur), N (nitrogen), I (iodine), and P (phosphorus). The corresponding onium ions are cobalt ions, ammonium ions, iodine ions, and phosphonium ions. These are preferred because they are stable and easy to handle. From the viewpoint of excellent cationic polymerization performance or crosslinking reaction performance, cobalt ions and iodine ions are preferred, and cobalt ions are particularly preferred. In other words, in the above formula (ai), it is preferred that Ra2 is sulfur and t is 2.

鋶離子之具體例,可列舉三苯基鋶、三-p-甲苯基鋶、三-o-甲苯基鋶、三(4-甲氧基苯基)鋶、1-萘基二苯基鋶、2-萘基二苯基鋶、三(4-氟苯基)鋶、三-1-萘基鋶、三-2-萘基鋶、三(4-羥基苯基)鋶、4-(苯硫基)苯基二苯基鋶、4-(p-甲苯基硫)苯基二-p-甲苯基鋶、4-(4-甲氧基苯硫基)苯基雙(4-甲氧基苯基)鋶、4-(苯硫基)苯基雙(4-氟苯基)鋶、4-(苯硫基)苯基雙(4-甲氧基苯基)鋶、4-(苯硫基)苯基二-p-甲苯基鋶、[4-(4-聯苯基硫)苯基]-4-聯苯基苯基鋶、[4-(2-噻噸酮硫)苯基]二苯基鋶、雙[4-(二苯基鋶基)苯基]硫醚、雙[4-{雙[4-(2-羥基乙氧基)苯基]鋶基}苯基]硫醚、雙{4-[雙(4-氟苯基)鋶基]苯基}硫醚、雙{4-[雙(4-甲基苯基)鋶基]苯基}硫醚、雙{4-[雙(4-甲氧基苯基)鋶基]苯基}硫醚、4-(4-苯甲醯基-2-氯苯硫基)苯基雙(4-氟苯基)鋶、4-(4-苯甲醯基-2-氯苯硫基)苯基二苯基鋶、4-(4-苯甲醯基苯硫基)苯基雙(4-氟苯基)鋶、4-(4-苯甲醯基苯硫基)苯基二苯基鋶、7-異丙基-9-側氧-10-硫雜-9,10-二氫蒽-2-基二-p-甲苯基鋶、7-異丙基-9-側氧-10-硫雜-9,10-二氫蒽-2-基二苯基鋶、2-[(二-p-甲苯基)鋶基]噻噸酮、2-[(二苯基)鋶基]噻噸酮、4-(9-側氧-9H-噻噸-2-基)硫苯基-9-側氧-9H-噻噸-2-基苯基鋶、4-[4-(4-tert-丁基苯甲醯基)苯硫基]苯基二-p-甲苯基鋶、4-[4-(4-tert-丁基苯甲醯基)苯硫基]苯基二苯基鋶、4-[4-(苯甲醯基苯硫基)]苯基二-p-甲苯基鋶、4-[4-(苯甲醯基苯硫基)]苯基二苯基鋶、5-(4-甲氧基苯基)硒(selenium)、5-苯基硒、5-甲苯基硒、5-(4-乙氧基苯基) 硒、及5-(2,4,6-三甲基苯基) 硒等之三芳基鋶;二苯基苯甲醯甲基鋶、二苯基4-硝基苯甲醯甲基鋶、二苯基苄基鋶、及二苯基甲基鋶等之二芳基鋶;苯基甲基苄基鋶、4-羥基苯基甲基苄基鋶、4-甲氧基苯基甲基苄基鋶、4-乙醯羰氧基苯基甲基苄基鋶、4-羥基苯基(2-萘基甲基)甲基鋶、2-萘基甲基苄基鋶、2-萘基甲基(1-乙氧基羰基)乙基鋶、苯基甲基苯甲醯甲基鋶、4-羥基苯基甲基苯甲醯甲基鋶、4-甲氧基苯基甲基苯甲醯甲基鋶、4-乙醯羰氧基苯基甲基苯甲醯甲基鋶、2-萘基甲基苯甲醯甲基鋶、2-萘基十八烷基苯甲醯甲基鋶、及9-蒽基甲基苯甲醯甲基鋶等之單芳基鋶;二甲基苯甲醯甲基鋶、苯甲醯甲基四氫噻吩鎓、二甲基苄基鋶、苄基四氫噻吩鎓、及十八烷基甲基苯甲醯甲基鋶等之三烷基鋶等。Specific examples of the coronium ion include triphenylcoronium, tri-p-tolylcoronium, tri-o-tolylcoronium, tri(4-methoxyphenyl)coronium, 1-naphthyldiphenylcoronium, 2-naphthyldiphenylcoronium, tri(4-fluorophenyl)coronium, tri-1-naphthylcoronium, tri-2-naphthylcoronium, tri(4-hydroxyphenyl)coronium, 4-(phenylthio)phenyldiphenylcoronium, 4-(p-tolylthio)phenyldi-p-tolylcoronium, 4-(4-methoxyphenylthio)phenylbis(4-methoxyphenyl)coronium, 4-(phenylthio)phenylbis(4-fluorophenyl)coronium, 4-(phenylthio)phenylbis(4-methoxyphenyl)coronium, bis[4-(bis(4-fluorophenyl)copperyl]phenyl} sulfide, bis{4-[bis(4-methylphenyl)copperyl]phenyl} sulfide, bis{4-[bis(4-methoxyphenyl)copperyl]phenyl} sulfide, 4-(4-phenylthio)phenyl di-p-tolylcopperyl, [4-(4-biphenylthio)phenyl]-4-biphenylphenylcopperyl, [4-(2-thiathionylthio)phenyl]diphenylcopperyl, bis[4-(diphenylcopperyl)phenyl]sulfide, bis[4-{bis[4-(2-hydroxyethoxy)phenyl]copperyl}phenyl]sulfide, bis{4-[bis(4-fluorophenyl)copperyl]phenyl} sulfide, bis{4-[bis(4-methylphenyl)copperyl]phenyl} sulfide, bis{4-[bis(4-methoxyphenyl)copperyl]phenyl} sulfide, 4-(4-benzoyl-2-chloro 4-(4-phenylthio)phenylbis(4-fluorophenyl)coppermidol, 4-(4-phenylthio)phenylbis(4-fluorophenyl)coppermidol, 4-(4-phenylthio)phenylbis(4-fluorophenyl)coppermidol, 7-isopropyl-9-oxo-10-thia-9,10-dihydroanthracen-2-yldi-p-tolylcoppermidol, 7-isopropyl-9-oxo-10-thia-9,10-dihydroanthracen-2-yldiphenylcoppermidol, 2-[(di-p-tolyl)coppermidol]thiazonone, 2-[(diphenyl)coppermidol]thiazonone, 4-(9- 4-[4-(4-tert-butylbenzyl)phenylthio]phenyldi-p-tolylcoppermidium, 4-[4-(4-tert-butylbenzyl)phenylthio]phenyldiphenylcoppermidium, 4-[4-(benzoylphenylthio)]phenyldi-p-tolylcoppermidium, 4-[4-(benzoylphenylthio)]phenyldi-p-tolylcoppermidium, 4-[4-(benzoylphenylthio)]phenyldiphenylcoppermidium, 5-(4-methoxyphenyl)selenium, 5-phenylselenium, 5-tolylselenium, 5-(4-ethoxyphenyl)selenium, and 5-(2,4,6-trimethylphenyl) Selenium and other triaryl coroniums; diphenylbenzyl methyl coronium, diphenyl 4-nitrobenzyl methyl coronium, diphenylbenzyl coronium, and diphenylmethyl coronium and other diaryl coroniums; phenylmethylbenzyl coronium, 4-hydroxyphenylmethylbenzyl coronium, 4-methoxyphenylmethylbenzyl coronium, 4-acetylcarbonyloxyphenylmethylbenzyl coronium, 4-hydroxyphenyl (2-naphthylmethyl) methyl coronium, 2-naphthylmethylbenzyl coronium, 2-naphthylmethyl (1-ethoxycarbonyl) ethyl coronium, phenylmethylbenzyl coronium, 4-hydroxyphenyl (2-naphthylmethyl) methyl coronium, 2-naphthylmethylbenzyl coronium, 2-naphthylmethyl (1-ethoxycarbonyl) ethyl coronium, phenylmethylbenzyl coronium, 4-hydroxyphenyl (2-naphthylmethyl) methyl coronium, 2-naphthylmethyl (1-ethoxycarbonyl) ethyl coronium, 4-methylbenzyl coronium, 4-methylbenzyl coronium, 4-hydroxyphenyl (2-naphthylmethyl) methyl coronium, 2-methylbenzyl ... The invention also includes monoaryl coroniums such as 4-hydroxyphenylmethylbenzylmethylcoronium, 4-methoxyphenylmethylbenzylmethylcoronium, 4-acetylcarbonyloxyphenylmethylbenzylmethylcoronium, 2-naphthylmethylbenzylmethylcoronium, 2-naphthyloctadecylbenzylmethylcoronium, and 9-anthrylmethylbenzylmethylcoronium; and trialkyl coroniums such as dimethylbenzylmethylcoronium, benzylmethyltetrahydrothiophenium, dimethylbenzylcoronium, benzyltetrahydrothiophenium, and octadecylmethylbenzylmethylcoronium.

銨離子之具體例,可列舉四甲銨、乙基三甲基銨、二乙基二甲基銨、三乙基甲基銨、及四乙銨等之四烷基銨;N,N-二甲基吡咯烷鎓、N-乙基-N-甲基吡咯烷鎓、及N,N-二乙基吡咯烷鎓等之吡咯烷鎓;N,N’-二甲基咪唑鎓、N,N’-二乙基咪唑鎓、N-乙基-N’-甲基咪唑鎓、1,3,4-三甲基咪唑鎓、及1,2,3,4-四甲基咪唑鎓等之咪唑鎓;N,N’-二甲基四氫嘧啶鎓等之四氫嘧啶鎓;N,N’-二甲基嗎啉等之嗎啉;N,N’-二乙基哌啶鎓等之哌啶鎓;N-甲基吡啶鎓、N-苄基吡啶鎓、及N-苯甲醯甲基吡啶鎓等之吡啶鎓;N,N’-二甲基咪唑鎓等之咪唑鎓;N-甲基喹啉鎓、N-苄基喹啉鎓、及N-苯甲醯甲基喹啉鎓等之喹啉鎓;N-甲基異喹啉鎓等之異喹啉鎓;苄基苯並噻唑鎓、及苯甲醯甲基苯並噻唑鎓等之噻唑鎓;苄基吖啶鎓、及苯甲醯甲基吖啶鎓等之吖啶鎓。Specific examples of ammonium ions include tetraalkylammonium such as tetramethylammonium, ethyltrimethylammonium, diethyldimethylammonium, triethylmethylammonium, and tetraethylammonium; pyrrolidinium such as N,N-dimethylpyrrolidinium, N-ethyl-N-methylpyrrolidinium, and N,N-diethylpyrrolidinium; imidazolium such as N,N'-dimethylimidazolium, N,N'-diethylimidazolium, N-ethyl-N'-methylimidazolium, 1,3,4-trimethylimidazolium, and 1,2,3,4-tetramethylimidazolium; tetrahydropyrimidinium such as N,N'-dimethyltetrahydropyrimidinium; Hydropyrimidinium; phenoline such as N,N'-dimethylphenoline; piperidinium such as N,N'-diethylpiperidinium; pyridinium such as N-methylpyridinium, N-benzylpyridinium, and N-benzoylmethylpyridinium; imidazolium such as N,N'-dimethylimidazolium; quinolium such as N-methylquinolinium, N-benzylquinolinium, and N-benzoylmethylquinolinium; isoquinolinium such as N-methylisoquinolinium; thiazolium such as benzylbenzothiazolium and benzoylmethylbenzothiazolium; acridinium such as benzylacridinium and benzoylmethylacridinium.

鏻離子之具體例,可列舉四苯基鏻、四-p-甲苯基鏻、四(2-甲氧基苯基)鏻、四(3-甲氧基苯基)鏻、及四(4-甲氧基苯基)鏻等之四芳基鏻;三苯基苄基鏻、三苯基苯甲醯甲基鏻、三苯基甲基鏻、及三苯基丁基鏻等之三芳基鏻;三乙基苄基鏻、三丁基苄基鏻、四乙基鏻、四丁基鏻、四己基鏻、三乙基苯甲醯甲基鏻、及三丁基苯甲醯甲基鏻等之四烷基鏻等。Specific examples of the phosphonium ion include tetraarylphosphonium such as tetraphenylphosphonium, tetra-p-tolylphosphonium, tetrakis(2-methoxyphenyl)phosphonium, tetrakis(3-methoxyphenyl)phosphonium, and tetrakis(4-methoxyphenyl)phosphonium; triarylphosphonium such as triphenylbenzylphosphonium, triphenylbenzylmethylphosphonium, triphenylmethylphosphonium, and triphenylbutylphosphonium; and tetraalkylphosphonium such as triethylbenzylphosphonium, tributylbenzylphosphonium, tetraethylphosphonium, tetrabutylphosphonium, tetrahexylphosphonium, triethylbenzylmethylphosphonium, and tributylbenzylmethylphosphonium.

錪離子之具體例,可列舉二苯基錪、二-p-甲苯基錪、雙(4-十二烷基苯基)錪、雙(4-甲氧基苯基)錪、(4-辛氧基苯基)苯基錪、雙(4-癸氧基)苯基錪、4-(2-羥基十四烷氧基)苯基苯基錪、4-異丙基苯基(p-甲苯基)錪、及4-異丁基苯基(p-甲苯基)錪等之錪離子。Specific examples of the iodine ion include diphenyliodine, di-p-tolyliodine, bis(4-dodecylphenyl)iodine, bis(4-methoxyphenyl)iodine, (4-octyloxyphenyl)phenyliodine, bis(4-decyloxy)phenyliodine, 4-(2-hydroxytetradecyloxy)phenylphenyliodine, 4-isopropylphenyl(p-tolyl)iodine, and 4-isobutylphenyl(p-tolyl)iodine.

光酸產生劑(A1),可列舉例如具有下述式(aii)表示之陰離子部的含鎵鎓鹽或具有下述式(aiii)表示之陰離子部的含硼鎓鹽。 (式(aii)中,Ra3 、Ra4 、Ra5 、及Ra6 各自獨立為可具有取代基之烴基、或可具有取代基之雜環基,Ra3 、Ra4 、Ra5 、及Ra6 之中之至少1個為可具有取代基之芳香族烴基。) (式(aiii)中,Ra7 、Ra8 、Ra9 、及Ra10 各自獨立為可具有取代基之烴基、或可具有取代基之雜環基,Ra7 、Ra8 、Ra9 、及Ra10 之中之至少1個為可具有取代基之芳香族烴基。)Examples of the photoacid generator (A1) include gallium-containing onium salts having an anion portion represented by the following formula (aii) or boron-containing onium salts having an anion portion represented by the following formula (aiii). (In formula (aii), Ra3 , Ra4 , Ra5 , and Ra6 are each independently a alkyl group which may have a substituent, or a heterocyclic group which may have a substituent, and at least one of Ra3 , Ra4 , Ra5 , and Ra6 is an aromatic alkyl group which may have a substituent.) (In formula (aiii), Ra7 , Ra8 , Ra9 , and Ra10 are each independently a alkyl group which may have a substituent, or a heterocyclic group which may have a substituent, and at least one of Ra7 , Ra8 , Ra9 , and Ra10 is an aromatic alkyl group which may have a substituent.)

式(aii)中之Ra3 ~Ra6 之烴基或雜環基之碳原子數無特別限定,較佳為1以上50以下,更佳為1以上30以下,特佳為1以上20以下。 Ra3 ~Ra6 之烴基之具體例,可列舉直鏈狀或分枝鏈狀之烷基、直鏈狀或分枝鏈狀之烯基、直鏈狀或支鏈狀之炔基、芳香族烴基、脂環式烴基及芳烷基等。 如前述,Ra3 ~Ra6 之中之至少1個為可具有取代基之芳香族基,更佳為Ra3 ~Ra6 之3個以上為可具有取代基之芳香族基,特佳為Ra3 ~Ra6 之全部為可具有取代基之芳香族基。The number of carbon atoms of the alkyl or heterocyclic group of R a3 to R a6 in formula (aii) is not particularly limited, and is preferably 1 to 50, more preferably 1 to 30, and particularly preferably 1 to 20. Specific examples of the alkyl group of R a3 to R a6 include linear or branched alkyl groups, linear or branched alkenyl groups, linear or branched alkynyl groups, aromatic alkyl groups, alicyclic alkyl groups, and aralkyl groups. As mentioned above, at least one of R a3 to R a6 is an aromatic group that may have a substituent, more preferably three or more of R a3 to R a6 are aromatic groups that may have a substituent, and particularly preferably all of R a3 to R a6 are aromatic groups that may have a substituent.

作為Ra3 ~Ra6 之烴基或雜環基可具有之取代基,可列舉碳原子數1以上18以下之鹵化烷基、碳原子數3以上18以下之鹵化脂肪族環式基、硝基、羥基、氰基、碳原子數1以上18以下之烷氧基、碳原子數6以上14以下之芳氧基、碳原子數2以上19以下之脂肪族醯基、碳原子數7以上15以下之芳香族醯基、碳原子數2以上19以下之脂肪族醯氧基、碳原子數7以上15以下之芳香族醯氧基、碳原子數1以上18以下之烷硫基、碳原子數6以上14以下之芳硫基、鍵結於氮原子之1或2個氫原子可被碳原子數1以上18以下之烴基取代之胺基、及鹵素原子。 作為Ra3 ~Ra6 之烴基為芳香族烴基時,該芳香族烴基可被選自由碳原子數1以上18以下之烷基、碳原子數2以上18以下之烯基、及碳原子數2以上18以下之炔基所構成群組之1以上之取代基取代。Examples of the substituent that the alkyl group or heterocyclic group of R a3 to R a6 may have include a halogenated alkyl group having 1 to 18 carbon atoms, a halogenated aliphatic cyclic group having 3 to 18 carbon atoms, a nitro group, a hydroxyl group, a cyano group, an alkoxy group having 1 to 18 carbon atoms, an aryloxy group having 6 to 14 carbon atoms, an aliphatic acyl group having 2 to 19 carbon atoms, an aromatic acyl group having 7 to 15 carbon atoms, an aliphatic acyloxy group having 2 to 19 carbon atoms, an aromatic acyloxy group having 7 to 15 carbon atoms, an alkylthio group having 1 to 18 carbon atoms, an arylthio group having 6 to 14 carbon atoms, an amino group in which one or two hydrogen atoms bonded to a nitrogen atom may be substituted by a alkyl group having 1 to 18 carbon atoms, and a halogen atom. When the alkyl group of R a3 to R a6 is an aromatic alkyl group, the aromatic alkyl group may be substituted with one or more substituents selected from the group consisting of an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, and an alkynyl group having 2 to 18 carbon atoms.

作為Ra3 ~Ra6 之烴基為具有取代基時,取代基之數,無特別限定,可為1或2以上之複數。取代基之數為複數時,該複數之取代基,各自可相同或相異。When the alkyl group of R a3 to R a6 has a substituent, the number of the substituent is not particularly limited and may be 1 or 2 or more. When the number of the substituent is plural, the plural substituents may be the same or different.

Ra3 ~Ra6 為烷基時之較佳的具體例,可列舉甲基、乙基、n-丙基、n-丁基、n-戊基、n-己基、n-辛基、n-壬基、n-癸基、n-十一烷基、n-十二烷基、n-十三烷基、n-十四烷基、n-十五烷基、n-十六烷基、n-十七烷基、n-十八烷基、n-十九烷基、及n-二十烷基等之直鏈烷基;異丙基、異丁基、sec-丁基、tert-丁基、異戊基、新戊基、tert-戊基、異己基、2-乙基己基、及1,1,3,3-四甲基丁基等之支鏈烷基。Preferred specific examples of when R a3 to R a6 are alkyl groups include straight-chain alkyl groups such as methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-octyl, n-nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, n-heptadecyl, n-octadecyl, n-nonadecyl, and n-eicosyl; and branched-chain alkyl groups such as isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl, isohexyl, 2-ethylhexyl, and 1,1,3,3-tetramethylbutyl.

Ra3 ~Ra6 為烯基、或炔基時之較佳的例,可列舉對應於烷基之較佳的上述基的烯基、及炔基。When R a3 to R a6 are alkenyl or alkynyl, preferred examples include the alkenyl and alkynyl groups described above corresponding to the preferred alkyl groups.

Ra3 ~Ra6 為芳香烴基時之較佳的例,可列舉苯基、α-萘基、β-萘基、聯苯基-4-基、聯苯基-3-基、聯苯基-2-基、蒽基及菲基等。When R a3 to R a6 are aromatic hydrocarbon groups, preferred examples include phenyl, α-naphthyl, β-naphthyl, biphenyl-4-yl, biphenyl-3-yl, biphenyl-2-yl, anthracenyl and phenanthryl.

Ra3 ~Ra6 為脂環式烴基時之較佳的例,可列舉環丙基、環丁基、環戊基、環己基、環戊基、環辛基、環壬基、及環癸基等之環烷基;降莰基、金剛烷基、三環癸基、及蒎基(pinanyl)等之交聯式脂肪族環式烴基。When R a3 to R a6 are alicyclic alkyl groups, preferred examples include cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclopentyl, cyclooctyl, cyclononyl, and cyclodecyl; and cross-linked aliphatic cyclic alkyl groups such as norbornyl, adamantyl, tricyclodecyl, and pinanyl.

Ra3 ~Ra6 為芳烷基時之較佳的例,可列舉苄基、苯乙基、α-萘基甲基、β-萘基甲基、α-萘基乙基、及β-萘基乙基等。When R a3 to R a6 are aralkyl groups, preferred examples include benzyl, phenethyl, α-naphthylmethyl, β-naphthylmethyl, α-naphthylethyl, and β-naphthylethyl.

Ra3 ~Ra6 為雜環基時之較佳的例,可列舉噻吩基、呋喃基、苯硒基、吡喃基、吡咯基、噁唑基、噻唑基、吡啶基、嘧啶基、吡嗪基、吲哚基、苯並呋喃基、苯並噻吩基、喹啉基、異喹啉基、喹喔啉基(Quinoxalinyl)、喹唑啉基(Quinazolinyl)、咔唑基、吖啶基、吩噁嗪基、吩嗪基、呫噸基(Xanthenyl)、噻嗯基、吩噁噻基、啡噁噻基(Phenoxathiinyl)、苯並二氫吡喃基(Chromanyl)、異苯並二氫吡喃基、二苯並噻吩基、呫噸酮基、噸酮基及二苯並呋喃基等。When R a3 to R a6 are heterocyclic groups, preferred examples thereof include thienyl, furanyl, phenylselenoyl, pyranyl, pyrrolyl, oxazolyl, thiazolyl, pyridyl, pyrimidinyl, pyrazinyl, indolyl, benzofuranyl, benzothienyl, quinolyl, isoquinolyl, quinoxalinyl, quinazolinyl, carbazolyl, acridinyl, phenoxazinyl, phenazinyl, xanthenyl, thienyl, phenoxathiinyl, phenoxathiinyl, chromanyl, isochromanyl, dibenzothienyl, xanthonyl, tononyl and dibenzofuranyl.

式(aiii)中之Ra7 ~Ra10 ,可列舉與式(aii)中之Ra3 ~Ra6 之前述基同樣之基。 Ra7 to Ra10 in the formula (aiii) can be the same groups as those mentioned above for Ra3 to Ra6 in the formula (aii).

以上說明之式(aii)表示之陰離子部之較佳的具體例,可列舉 四(4-九氟聯苯基)鎵陰離子、 四(1-七氟萘基)鎵陰離子、 四(五氟苯基)鎵陰離子、 四(3,4,5-三氟苯基)没食子酸(gallate )陰離子、 四(2-九苯基聯苯基)鎵陰離子、 四(2-七氟萘基)鎵陰離子、 四(7-九氟蒽基)鎵陰離子、 四(4’-(甲氧基)八氟聯苯基)鎵陰離子、 四(2,4,6-三(三氟甲基)苯基)鎵陰離子、 四(3,5-雙(三氟甲基)苯基)鎵陰離子、 四(2,3-雙(五氟乙基)萘基)鎵陰離子、 四(2-異丙氧基-六氟萘基)鎵陰離子、 四(9,10-雙(七氟丙基)七氟蒽基)鎵陰離子、 四(9-九氟菲基)没食子酸陰離子、 四(4-[三(異丙基)矽基]-四氟苯基)鎵陰離子、 四(9,10-雙(p-甲苯基)-七氟菲基)鎵陰離子、 四(4-[二甲基(t-丁基)矽基]-四氟苯基)鎵陰離子、 單苯基三(五氟苯基)鎵陰離子、及 單全氟丁基三(五氟苯基)鎵陰離子等,更佳為以下的陰離子。 Preferred specific examples of the anion part represented by the above-described formula (aii) include tetrakis(4-nonafluorobiphenyl)gallium anion, tetrakis(1-heptafluoronaphthyl)gallium anion, tetrakis(pentafluorophenyl)gallium anion, tetrakis(3,4,5-trifluorophenyl)gallate anion, tetrakis(2-nonaphenylbiphenyl)gallium anion, tetrakis(2-heptafluoronaphthyl)gallium anion, tetrakis(7-nonafluoroanthracenyl)gallium anion, tetrakis(4'-(methoxy)octafluorobiphenyl)gallium anion, tetrakis(2,4,6-tris(trifluoromethyl)phenyl)gallium anion, tetrakis(3,5-bis(trifluoromethyl)phenyl)gallium anion, Tetrakis(2,3-bis(pentafluoroethyl)naphthyl)gallium anion, tetrakis(2-isopropoxy-hexafluoronaphthyl)gallium anion, tetrakis(9,10-bis(heptafluoropropyl)heptafluoroanthracenyl)gallium anion, tetrakis(9-nonafluorophenanthryl)gallate anion, tetrakis(4-[tri(isopropyl)silyl]-tetrafluorophenyl)gallium anion, tetrakis(9,10-bis(p-tolyl)-heptafluorophenanthryl)gallium anion, tetrakis(4-[dimethyl(t-butyl)silyl]-tetrafluorophenyl)gallium anion, monophenyltris(pentafluorophenyl)gallium anion, and monoperfluorobutyltris(pentafluorophenyl)gallium anion, etc., and the following anions are more preferred.

又,式(aiii)表示之陰離子部之較佳的具體例,可列舉 四(4-九氟聯苯基)硼陰離子、 四(1-七氟萘基)硼陰離子、 四(五氟苯基)硼陰離子、 四(3,4,5-三氟苯基)硼陰離子、 四(2-九苯基聯苯基)硼陰離子、 四(2-七氟萘基)硼陰離子、 四(7-九氟蒽基)硼陰離子、 四(4’-(甲氧基)八氟聯苯基)硼陰離子、 四(2,4,6-三(三氟甲基)苯基)硼陰離子、 四(3,5-雙(三氟甲基)苯基)硼陰離子、 四(2,3-雙(五氟乙基)萘基)硼陰離子、 四(2-異丙氧基-六氟萘基)硼陰離子、 四(9,10-雙(七氟丙基)七氟蒽基)硼陰離子、 四(9-九氟菲基)硼陰離子、 四(4-[三(異丙基)矽基]-四氟苯基)硼陰離子、 四(9,10-雙(p-甲苯基)-七氟菲基)硼陰離子、 四(4-[二甲基(t-丁基)矽基]-四氟苯基)硼陰離子、 單苯基三(五氟苯基)硼陰離子、及 單全氟丁基三(五氟苯基)硼陰離子等,更佳為可列舉以下陰離子。 Furthermore, preferred specific examples of the anion part represented by formula (aiii) include tetrakis(4-nonafluorobiphenyl)boron anion, tetrakis(1-heptafluoronaphthyl)boron anion, tetrakis(pentafluorophenyl)boron anion, tetrakis(3,4,5-trifluorophenyl)boron anion, tetrakis(2-nonaphenylbiphenyl)boron anion, tetrakis(2-heptafluoronaphthyl)boron anion, tetrakis(7-nonafluoroanthracenyl)boron anion, tetrakis(4'-(methoxy)octafluorobiphenyl)boron anion, tetrakis(2,4,6-tris(trifluoromethyl)phenyl)boron anion, tetrakis(3,5-bis(trifluoromethyl)phenyl)boron anion, tetrakis(2,3-bis(pentafluoroethyl)naphthyl)boron anion, Tetrakis(2-isopropoxy-hexafluoronaphthyl)boron anion, tetrakis(9,10-bis(heptafluoropropyl)heptafluoroanthracenyl)boron anion, tetrakis(9-nonafluorophenanthryl)boron anion, tetrakis(4-[tri(isopropyl)silyl]-tetrafluorophenyl)boron anion, tetrakis(9,10-bis(p-tolyl)-heptafluorophenanthryl)boron anion, tetrakis(4-[dimethyl(t-butyl)silyl]-tetrafluorophenyl)boron anion, monophenyltris(pentafluorophenyl)boron anion, and monoperfluorobutyltris(pentafluorophenyl)boron anion, etc., and more preferably, the following anions can be listed.

又,以上說明式(ai)表示之陽離子部之較佳的具體例,可列舉 4-異丙基苯基(p-甲苯基)錪、 4-異丁基苯基(p-甲苯基)錪等之錪離子; [4-(2-噻噸酮硫)苯基]二苯基鋶、 2-[(二-p-甲苯基)鋶基]噻噸酮、 2-[(二苯基)鋶基]噻噸酮、 4-(9-側氧-9H-噻噸-2-基)硫苯基-9-側氧-9H-噻噸-2-基苯基鋶等之含有噻噸酮骨架之鋶離子; 詳細如後述式(a1)表示之陽離子部; 其他有以下所示之鋶離子;。In addition, the preferred specific examples of the cationic part represented by the above-described formula (ai) include iodine ions such as 4-isopropylphenyl (p-tolyl) iodine, 4-isobutylphenyl (p-tolyl) iodine, [4-(2-thioxanthinethio)phenyl] diphenylthiodine, 2-[(di-p-tolyl)thiodine] Copper ions containing a thiothione skeleton such as thiothione, 2-[(diphenyl)copper]thiothione, 4-(9-hydroxy-9H-thiothione-2-yl)thiophenyl-9-hydroxy-9H-thiothione-2-ylphenylcopper; the details are as shown in the cation part of formula (a1) described later; other copper ions are shown below;.

如上述,光酸產生劑(A1)較佳為具有下述式(a1)表示之陽離子部的態樣。作為光酸產生劑(A1)之鎓鹽具有式(a1)表示之陽離子部的話,光酸產生劑(A1)之感度優異。作為光酸產生劑(A1)之鎓鹽因包含下述式(a1)表示之陽離子部,可使後述陽離子硬化性化合物(B)之硬化容易良好進行。As described above, the photoacid generator (A1) preferably has a cationic part represented by the following formula (a1). When the onium salt of the photoacid generator (A1) has a cationic part represented by the following formula (a1), the sensitivity of the photoacid generator (A1) is excellent. Since the onium salt of the photoacid generator (A1) contains a cationic part represented by the following formula (a1), the curing of the cationic curable compound (B) described later can be easily and well performed.

(式(a1)中,R1 及R2 獨立表示可被鹵素原子取代之烷基或下述式(a2)表示之基,R1 及R2 互相鍵結可與式中硫原子一同形成環、R3 表示下述式(a3)表示之基或下述式(a4)表示之基,A1 表示S、O、或Se,但是R1 及R2 不同時為被鹵素原子取代之烷基。) (In formula (a1), R1 and R2 independently represent an alkyl group which may be substituted with a halogen atom or a group represented by the following formula (a2); R1 and R2 are bonded to each other and may form a ring together with the sulfur atom in the formula; R3 represents a group represented by the following formula (a3) or a group represented by the following formula (a4); A1 represents S, O, or Se, but R1 and R2 are not both alkyl groups which may be substituted with a halogen atom.)

(式(a2)中,環Z1 表示芳香族烴環,R4 可被鹵素原子取代之烷基、羥基、烷氧基、烷基羰基、烷氧基羰基、醯氧基、烷硫基、噻吩基、噻吩基羰基、呋喃基、呋喃基羰基、苯硒基、苯硒基羰基、雜環式脂肪族烴基、烷基亞磺醯基、烷基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或鹵素原子,m1表示0以上之整數。) (In formula (a2), ring Z1 represents an aromatic hydrocarbon ring, R4 represents an alkyl group which may be substituted with a halogen atom, a hydroxyl group, an alkoxy group, an alkylcarbonyl group, an alkoxycarbonyl group, an acyloxy group, an alkylthio group, a thienyl group, a thienylcarbonyl group, a furyl group, a furylcarbonyl group, a phenylselenyl group, a phenylselenylcarbonyl group, a heterocyclic aliphatic hydrocarbon group, an alkylsulfinyl group, an alkylsulfonyl group, a hydroxyl (poly) alkoxyl group, an amino group which may be substituted, a cyano group, a nitro group, or a halogen atom, and m1 represents an integer greater than or equal to 0.)

(式(a3)中,R5 表示羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或可被鹵素原子取代之伸烷基或下述式(a5)表示之基,R6 表示羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或可被鹵素原子取代之烷基或下述式(a6)表示之基,A2 為單鍵、S、O、亞磺醯基、或羰基,n1表示0或1。) (In the formula (a3), R 5 represents a hydroxyl group, an alkoxyl group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxylene group, an amino group which may be substituted, a cyano group, a nitro group, or an alkylene group which may be substituted with a halogen atom, or a group represented by the following formula (a5), R 6 represents a hydroxyl group, an alkoxyl group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxyl group, an amino group which may be substituted, a cyano group, a nitro group, or an alkyl group which may be substituted with a halogen atom, or a group represented by the following formula (a6), A2 represents a single bond, S, O, a sulfinyl group, or a carbonyl group, and n1 represents 0 or 1.)

(式(a4)中,R7 及R8 獨立表示羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或可被鹵素原子取代之伸烷基或下述式(a5)表示之基,R9 及R10 獨立表示可被鹵素原子取代之烷基或上述式(a2)表示之基,R9 及R10 互相鍵結可與式中硫原子一同形成環、A3 表示單鍵、S、O、亞磺醯基、或羰基,X- 表示1價陰離子,n2表示0或1,但是R9 及R10 不同時為可被鹵素原子取代之烷基。) (In formula (a4), R7 and R8 independently represent a hydroxyl group, an alkoxyl group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic alkyl group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxylene group, an amino group which may be substituted, a cyano group, a nitro group, or an alkylene group which may be substituted with a halogen atom, or a group represented by the following formula (a5); R9 and R10 independently represent an alkyl group which may be substituted with a halogen atom, or a group represented by the above formula (a2); R9 and R10 may be bonded to each other to form a ring together with the sulfur atom in the formula; A3 represents a single bond, S, O, a sulfinyl group, or a carbonyl group; X - represents a monovalent anion, n2 represents 0 or 1, but R9 and R10 are not both alkyl groups which may be substituted by a halogen atom.)

(式(a5)中,環Z2 表示芳香族烴環,R11 表示可被鹵素原子取代之烷基、羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或鹵素原子,m2表示0以上之整數。) (式(a6)中,環Z3 表示芳香族烴環,R12 可被鹵素原子取代之烷基、羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、噻吩基羰基、呋喃基羰基、苯硒基羰基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或鹵素原子,m3表示0以上之整數。) (In formula (a5), ring Z2 represents an aromatic hydrocarbon ring, R11 represents an alkyl group which may be substituted with a halogen atom, a hydroxyl group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxyl group, an amino group which may be substituted, a cyano group, a nitro group, or a halogen atom, and m2 represents an integer greater than 0.) (In formula (a6), ring Z 3 represents an aromatic hydrocarbon ring, R 12 represents an alkyl group which may be substituted with a halogen atom, a hydroxyl group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, a thienylcarbonyl group, a furylcarbonyl group, a phenylselenylcarbonyl group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxyl group, an amino group which may be substituted, a cyano group, a nitro group, or a halogen atom, and m3 represents an integer greater than or equal to 0.)

具有上述式(a1)表示之陽離子部的鋶鹽係在上述式(a1)中之苯環中,對於A1 所鍵結之碳原子,甲基鍵結於鄰位之碳原子為特徵。因上述位置具有甲基,故相較於以往鋶鹽,較容易產生質子,對紫外線等之活性能量線之感度較高。The cationic part of the cobalt salt represented by the above formula (a1) is characterized in that a methyl group is bonded to a carbon atom adjacent to the carbon atom to which A1 is bonded in the benzene ring of the above formula (a1). Since the above position has a methyl group, it is easier to generate protons than conventional cobalt salts, and has a higher sensitivity to active energy rays such as ultraviolet rays.

上述式(a1)中,R1 及R2 之任一,較佳為上述式(a2)表示之基團。R1 及R2 彼此可相同或相異。 上述式(a1)中,R1 及R2 互相鍵結,與式中之硫原子一同形成環時,形成之環包含硫原子,較佳為3~10員環,更佳為5~7員環。所形成之環可為多環,或5~7員環進行縮合的多環為佳。 上述式(a1)中,R1 及R2 皆為苯基較佳。 上述式(a1)中,R3 為上述式(a3)表示之基較佳。 上述式(a1)中,A1 較佳為S或O,更佳為S。In the above formula (a1), either R 1 and R 2 is preferably a group represented by the above formula (a2). R 1 and R 2 may be the same or different from each other. In the above formula (a1), when R 1 and R 2 are bonded to each other and form a ring together with the sulfur atom in the formula, the formed ring contains the sulfur atom, preferably a 3-10-membered ring, and more preferably a 5-7-membered ring. The formed ring may be a polycyclic ring, or a polycyclic ring with 5-7 members condensed is preferred. In the above formula (a1), R 1 and R 2 are preferably both phenyl groups. In the above formula (a1), R 3 is preferably a group represented by the above formula (a3). In the above formula (a1), A 1 is preferably S or O, and more preferably S.

上述式(a2)中,R4 較佳為可被鹵素原子取代之烷基、羥基、烷基羰基、噻吩基羰基、呋喃基羰基、苯硒基羰基、可被取代之胺基、或硝基,更佳為可被鹵素原子取代之烷基、烷基羰基、或噻吩基羰基。 上述式(a2)中,m1可依據環Z1 之種類選擇,例如為0以上4以下之整數,較佳為0以上3以下之整數,更佳為0以上2以下之整數。In the above formula (a2), R4 is preferably an alkyl group, hydroxyl group, alkylcarbonyl group, thienylcarbonyl group, furylcarbonyl group, phenylselenylcarbonyl group, substituted amino group, or nitro group which may be substituted by a halogen atom, and more preferably an alkyl group, alkylcarbonyl group, or thienylcarbonyl group which may be substituted by a halogen atom. In the above formula (a2), m1 can be selected according to the type of ring Z1 , for example, an integer of 0 to 4, preferably an integer of 0 to 3, and more preferably an integer of 0 to 2.

上述式(a3)中,R5 較佳為伸烷基;羥基、可被取代之胺基、或被硝基取代之伸烷基;或上述式(a5)表示之基,更佳為上述式(a5)表示之基。 上述式(a3)中,R6 較佳為烷基;羥基、可被取代之胺基、或被硝基取代之烷基;或上述式(a6)表示之基,更佳為上述式(a6)表示之基。 上述式(a3)中,A2 較佳為S或O,更佳為S。 上述式(a3)中,n1較佳為0。In the above formula (a3), R5 is preferably an alkylene group; a hydroxyl group, an amino group which may be substituted, or an alkylene group substituted by a nitro group; or a group represented by the above formula (a5), and more preferably a group represented by the above formula (a5). In the above formula (a3), R6 is preferably an alkyl group; a hydroxyl group, an amino group which may be substituted, or an alkylene group substituted by a nitro group; or a group represented by the above formula (a6), and more preferably a group represented by the above formula (a6). In the above formula (a3), A2 is preferably S or O, and more preferably S. In the above formula (a3), n1 is preferably 0.

上述式(a4)中,R7 及R8 獨立較佳為伸烷基;羥基、可被取代之胺基、或被硝基取代之伸烷基;或上述式(a5)表示之基,更佳為上述式(a5)表示之基。R7 及R8 彼此可相同或相異。 上述式(a4)中,R9 及R10 之任一,較佳為上述式(a2)表示之基。R9 及R10 彼此可相同或相異。 上述式(a4)中,R9 及R10 互相鍵結,與式中之硫原子一同形成環時,所形成之環包含硫原子,較佳為3~10員環,更佳為5~7員環。所形成之環可為多環,或5~7員環進行縮合的多環為佳。 上述式(a4)中,A3 較佳為S或O,更佳為S。 上述式(a4)中,n2較佳為0。In the above formula (a4), R7 and R8 are independently preferably an alkylene group; a hydroxyl group, an amino group which may be substituted, or an alkylene group substituted with a nitro group; or a group represented by the above formula (a5), more preferably a group represented by the above formula (a5). R7 and R8 may be the same or different from each other. In the above formula (a4), either R9 and R10 are preferably a group represented by the above formula (a2). R9 and R10 may be the same or different from each other. In the above formula (a4), when R9 and R10 are bonded to each other and form a ring together with the sulfur atom in the formula, the formed ring contains the sulfur atom, and is preferably a 3-10-membered ring, and more preferably a 5-7-membered ring. The formed ring may be a polycyclic ring, or a polycyclic ring in which 5-7-membered rings are condensed is preferred. In the above formula (a4), A3 is preferably S or O, more preferably S. In the above formula (a4), n2 is preferably 0.

上述式(a5)中,R11 較佳為可被鹵素原子取代之烷基、羥基、可被取代之胺基、或硝基,更佳為可被鹵素原子取代之烷基。 上述式(a5)中,m2可依據環Z2 之種類選擇,例如為0以上4以下之整數,較佳為0以上3以下之整數,更佳為0以上2以下之整數。In the above formula (a5), R 11 is preferably an alkyl group which may be substituted by a halogen atom, a hydroxyl group, an amine group which may be substituted, or a nitro group, and more preferably an alkyl group which may be substituted by a halogen atom. In the above formula (a5), m2 can be selected according to the type of ring Z 2 , for example, an integer of 0 to 4, preferably an integer of 0 to 3, and more preferably an integer of 0 to 2.

上述式(a6)中,R12 較佳為可被鹵素原子取代之烷基、羥基、烷基羰基、噻吩基羰基、呋喃基羰基、苯硒基羰基、可被取代之胺基、或硝基,更佳為可被鹵素原子取代之烷基、烷基羰基、或噻吩基羰基。 上述式(a6)中,m3可依據環Z3 之種類選擇,例如為0以上4以下之整數,較佳為0以上3以下之整數,更佳為0以上2以下之整數。In the above formula (a6), R 12 is preferably an alkyl group, hydroxyl group, alkylcarbonyl group, thienylcarbonyl group, furylcarbonyl group, phenylselenylcarbonyl group, substituted amino group, or nitro group which may be substituted by a halogen atom, and more preferably an alkyl group, alkylcarbonyl group, or thienylcarbonyl group which may be substituted by a halogen atom. In the above formula (a6), m3 can be selected according to the type of ring Z 3 , for example, an integer of 0 to 4, preferably an integer of 0 to 3, and more preferably an integer of 0 to 2.

上述式(a1)表示之陽離子部之對陰離子係與對於具有式(a1)表示之陽離子部之鋶鹽藉由照射活性能量線(可見光、紫外線、電子束及X線等)產生之酸對應的1價陰離子。式(a1)表示之陽離子部之對陰離子,較佳為可列舉上述式(aii)表示之陰離子部、式(aiii)表示之陰離子部。又,式(a1)表示之陽離子部之對陰離子,較佳為可列舉其他1價的多原子陰離子,更佳為MYa - 、(Rf)b PF6-b - 、Rx1 c BY4-c - 、Rx1 c GaY4-c - 、Rx2 SO3 - 、(Rx2 SO2 )3 C- 、或(Rx2 SO2 )2 N- 表示之陰離子。又,式(a1)表示之陽離子部之對陰離子,可為鹵素陰離子,可列舉例如氟離子(fluoride ion)、氯離子(chloride ion)、溴離子、碘離子等。The counter anion of the cationic part represented by the above formula (a1) is a monovalent anion corresponding to the acid generated by irradiating the zirconium salt having the cationic part represented by the formula (a1) with active energy rays (visible light, ultraviolet rays, electron beams, X-rays, etc.). The counter anion of the cationic part represented by the formula (a1) is preferably the anionic part represented by the above formula (aii) and the anionic part represented by the formula (aiii). Furthermore, the counter anion of the cation part represented by formula (a1) is preferably a monovalent polyatomic anion , and more preferably an anion represented by MYa- , ( Rf ) bPF6 -b- , Rx1cBY4 - c- , Rx1cGaY4 - c-, Rx2SO3- , ( Rx2SO2 ) 3C- , or ( Rx2SO2 ) 2N- . Furthermore, the counter anion of the cation part represented by formula ( a1 ) may be a halogen anion, and for example, fluoride ion, chloride ion, bromine ion, iodine ion , etc. may be mentioned.

M表示磷原子、硼原子、或銻原子。 Y表示鹵素原子(較佳為氟原子)。M represents a phosphorus atom, a boron atom, or an antimony atom. Y represents a halogen atom (preferably a fluorine atom).

Rf表示氫原子之80莫耳%以上為經氟原子取代之烷基(較佳為碳原子數1以上8以下之烷基)。藉由氟取代,作為Rf的烷基,可列舉直鏈烷基(甲基、乙基、丙基、丁基、戊基及辛基等)、支鏈烷基(異丙基、異丁基、sec-丁基及tert-丁基等)及環烷基(環丙基、環丁基、環戊基及環己基等)等。Rf中,此等烷基之氫原子被氟原子取代之比例係依據原有烷基所具有之氫原子之莫耳數,較佳為80莫耳%以上,又更佳為90%以上,特佳為100%。被氟原子之取代比例在此等範圍時,鋶鹽(Q)之光感應性更佳。特佳之Rf,可列舉CF3 -、CF3 CF2 - 、(CF3 )2 CF- 、CF3 CF2 CF2 - 、CF3 CF2 CF2 CF2 - 、(CF3 )2 CFCF2 - 、CF3 CF2 (CF3 )CF- 及(CF3 )3 C- 。b個之Rf彼此獨立,因此彼此可相同或相異。Rf represents an alkyl group (preferably an alkyl group having 1 to 8 carbon atoms) in which 80 mol% or more of the hydrogen atoms are substituted by fluorine atoms. As the alkyl group of Rf, there can be listed linear alkyl groups (methyl, ethyl, propyl, butyl, pentyl and octyl groups), branched alkyl groups (isopropyl, isobutyl, sec-butyl and tert-butyl groups) and cycloalkyl groups (cyclopropyl, cyclobutyl, cyclopentyl and cyclohexyl groups). In Rf, the ratio of hydrogen atoms of these alkyl groups to be substituted by fluorine atoms is preferably 80 mol% or more, more preferably 90% or more, and particularly preferably 100% according to the molar number of hydrogen atoms in the original alkyl group. When the ratio of substitution by fluorine atoms is within this range, the photosensitivity of the cobalt salt (Q) is better. Particularly preferred Rf include CF3- , CF3CF2- , ( CF3 ) 2CF- , CF3CF2CF2- , CF3CF2CF2CF2- , ( CF3 ) 2CFCF2- , CF3CF2 ( CF3 ) CF- and ( CF3 ) 3C- . The Rf's are independent of each other and may be the same or different.

P表示磷原子,F表示氟原子。P represents a phosphorus atom, and F represents a fluorine atom.

Rx1 表示氫原子之一部分被至少1個元素或拉電子基取代的苯基。這種1個元素例,包含鹵素原子,可列舉氟原子、氯原子及溴原子等。拉電子基,可列舉三氟甲基、硝基及氰基等。此等之中,至少1個氫原子被氟原子或三氟甲基取代之苯基較佳。c個Rx1 彼此相互,因此彼此可相同或相異。R x1 represents a phenyl group in which a portion of hydrogen atoms is substituted by at least one element or electron withdrawing group. Examples of such one element include halogen atoms, such as fluorine atoms, chlorine atoms, and bromine atoms. Examples of electron withdrawing groups include trifluoromethyl, nitro, and cyano groups. Among these, a phenyl group in which at least one hydrogen atom is substituted by a fluorine atom or a trifluoromethyl group is preferred. The c R x1 groups are mutually independent and may be the same or different from each other.

B表示硼原子,Ga表示鎵原子。B represents a boron atom, and Ga represents a gallium atom.

Rx2 表示碳原子數1以上20以下之烷基、碳原子數1以上20以下之氟烷基或碳原子數6以上20以下之芳基,烷基及氟烷基可為直鏈狀、支鏈狀或環狀之任一,烷基、氟烷基、或芳基可為無取代,也可具有取代基。上述取代基,可列舉例如羥基、可被取代之胺基(可列舉例如,關於上述式(a2)~(a6)之後述說明中例示之基。)、硝基等。 又,Rx2 表示之烷基、氟烷基或芳基中之碳鏈,可具有氧原子、氮原子、硫原子等之雜原子。特別是Rx2 表示之烷基或氟烷基中之碳鏈,也可具有2價之官能基(例如,醚鍵、羰基鍵、酯鍵、胺基鍵、醯胺鍵、醯亞胺鍵、磺醯基鍵、磺醯基醯胺鍵、磺醯基醯亞胺鍵、胺基甲酸酯鍵等)。 Rx2 表示之烷基、氟烷基或芳基具有上述取代基、雜原子、或官能基時,上述取代基、雜原子、或官能基之個數,可為1個也可為2個以上。 Rx2 represents an alkyl group having 1 to 20 carbon atoms, a fluoroalkyl group having 1 to 20 carbon atoms, or an aryl group having 6 to 20 carbon atoms. The alkyl group and the fluoroalkyl group may be linear, branched, or cyclic. The alkyl group, the fluoroalkyl group, or the aryl group may be unsubstituted or may have a substituent. Examples of the substituent include a hydroxyl group, an amino group which may be substituted (for example, the groups exemplified in the following description of the above formulae (a2) to (a6)), a nitro group, and the like. In addition, the carbon chain in the alkyl group, the fluoroalkyl group, or the aryl group represented by Rx2 may have a heteroatom such as an oxygen atom, a nitrogen atom, or a sulfur atom. In particular, the carbon chain in the alkyl or fluoroalkyl group represented by Rx2 may also have a divalent functional group (e.g., an ether bond, a carbonyl bond, an ester bond, an amine bond, an amide bond, an imide bond, a sulfonyl bond, a sulfonylamide bond, a sulfonylimide bond, a carbamate bond, etc.). When the alkyl, fluoroalkyl or aryl group represented by Rx2 has the above-mentioned substituents, heteroatoms, or functional groups, the number of the above-mentioned substituents, heteroatoms, or functional groups may be one or more.

S表示硫原子,O表示氧原子,C表示碳原子,N表示氮原子。 a表示4以上6以下之整數。 b較佳為1以上5以下之整數,又更佳為2以上4以下之整數,特佳為2或3。 c較佳為1以上4以下之整數,又更佳為4。S represents a sulfur atom, O represents an oxygen atom, C represents a carbon atom, and N represents a nitrogen atom. a represents an integer from 4 to 6. b is preferably an integer from 1 to 5, more preferably an integer from 2 to 4, and particularly preferably 2 or 3. c is preferably an integer from 1 to 4, and more preferably 4.

MYa - 表示之陰離子,可列舉SbF6 - 、PF6 - 或BF4 - 表示之陰離子等。Examples of the anion represented by MY a - include anions represented by SbF 6 - , PF 6 - or BF 4 - .

(Rf)b PF6-b - 表示之陰離子,可列舉(CF3 CF2 )2 PF4 - 、(CF3 CF2 )3 PF3 - 、((CF3 )2 CF)2 PF4 - 、((CF3 )2 CF)3 PF3 - 、 (CF3 CF2 CF2 )2 PF4 - 、(CF3 CF2 CF2 )3 PF3 - 、((CF3 )2 CFCF2 )2 PF4 - 、((CF3 )2 CFCF2 )3 PF3 - 、(CF3 CF2 CF2 CF2 )2 PF4 - 或 (CF3 CF2 CF2 CF2 )3 PF3 - 表示之陰離子等。此等之中,較佳為(CF3 CF2 )3 PF3 - 、(CF3 CF2 CF2 )3 PF3 - 、((CF3 )2 CF)3 PF3 - 、 ((CF3 )2 CF)2 PF4 - 、((CF3 )2 CFCF2 )3 PF3 - 或((CF3 )2 CFCF2 )2 PF4 - 表示之陰離子。The anion represented by (Rf) b PF 6-b - includes (CF 3 CF 2 ) 2 PF 4 - , (CF 3 CF 2 ) 3 PF 3 - , ((CF 3 ) 2 CF) 2 PF 4 - , ((CF 3 ) 2 CF) 3 PF 3 - , (CF 3 CF 2 CF 2 ) 2 PF 4 - , (CF 3 CF 2 CF 2 ) 3 PF 3 - , ((CF 3 ) 2 CFCF 2 ) 2 PF 4 - , ((CF 3 ) 2 CFCF 2 ) 3 PF 3 - , (CF 3 CF 2 CF 2 CF 2 ) 2 PF 4 - or (CF 3 CF 2 CF 2 CF 2 ) 3 PF 3 -, etc. Among them, (CF 3 CF 2 ) 3 PF 3 - , (CF 3 CF 2 CF 2 ) 3 PF 3 - , ((CF 3 ) 2 CF) 3 An anion represented by PF 3 - , ((CF 3 ) 2 CF) 2 PF 4 - , ((CF 3 ) 2 CFCF 2 ) 3 PF 3 - , or ((CF 3 ) 2 CFCF 2 ) 2 PF 4 - .

Rx1 c BY4-c - 表示之陰離子,較佳為 Rx1 c BY4-c - (式中,Rx1 表示氫原子之至少一部被鹵素原子或拉電子基取代之苯基,Y表示鹵素原子,c表示1以上4以下之整數。) ,可列舉例如(C6 F5 )4 B- 、((CF3 )2 C6 H3 )4 B- 、(CF3 C6 H4 )4 B- 、(C6 F5 )2 BF2 - 、C6 F5 BF3 - 或(C6 H3 F2 )4 B- 表示之陰離子等。此等之中,較佳為(C6 F5 )4 B- 或((CF3 )2 C6 H3 )4 B- 表示之陰離子。The anion represented by Rx1cBY4 -c- is preferably Rx1cBY4 -c- ( wherein Rx1 represents a phenyl group in which at least one part of the hydrogen atoms is substituted by a halogen atom or an electron-withdrawing group, Y represents a halogen atom, and c represents an integer of 1 to 4 ). Examples of the anion include ( C6F5 ) 4B- , ( ( CF3 ) 2C6H3 ) 4B- , ( CF3C6H4 ) 4B- , ( C6F5 ) 2BF2- , C6F5BF3- or ( C6H3F2 ) 4B- . Among them, an anion represented by (C 6 F 5 ) 4 B - or ((CF 3 ) 2 C 6 H 3 ) 4 B - is preferred.

Rx1 c GaY4-c - 表示之陰離子,可列舉(C6 F5 )4 Ga- 、((CF3 )2 C6 H3 )4 Ga- 、(CF3 C6 H4 )4 Ga- 、(C6 F5 )2 GaF2 - 、 C6 F5 GaF3 - 或(C6 H3 F2 )4 Ga- 表示之陰離子等。此等之中,較佳為(C6 F5 )4 Ga- 或((CF3 )2 C6 H3 )4 Ga- 表示之陰離子。Examples of the anion represented by Rx1cGaY4 - c- include ( C6F5 ) 4Ga- , (( CF3 ) 2C6H3 ) 4Ga- , ( CF3C6H4 ) 4Ga- , ( C6F5 ) 2GaF2- , C6F5GaF3- , or ( C6H3F2 ) 4Ga- . Among these , anions represented by ( C6F5 ) 4Ga- or ( ( CF3 ) 2C6H3 ) 4Ga- are preferred .

Rx2 SO3 - 表示之陰離子,可列舉三氟甲磺酸陰離子、五氟乙磺酸陰離子、七氟丙烷磺酸陰離子、九氟丁磺酸陰離子、五氟苯基碸酸陰離子、p-甲苯磺酸陰離子、苯磺酸陰離子、樟腦磺酸陰離子、甲磺酸陰離子、乙磺酸陰離子、丙磺酸陰離子及丁磺酸陰離子等。此等之中,較佳為三氟甲磺酸陰離子、九氟丁磺酸陰離子、甲磺酸陰離子、丁磺酸陰離子、樟腦磺酸陰離子、苯磺酸陰離子或p-甲苯磺酸陰離子。Examples of the anion represented by R x2 SO 3 - include trifluoromethanesulfonic acid anion, pentafluoroethanesulfonic acid anion, heptafluoropropanesulfonic acid anion, nonafluorobutanesulfonic acid anion, pentafluorophenylsulfonic acid anion, p-toluenesulfonic acid anion, benzenesulfonic acid anion, camphorsulfonic acid anion, methanesulfonic acid anion, ethanesulfonic acid anion, propanesulfonic acid anion and butanesulfonic acid anion. Among these, trifluoromethanesulfonic acid anion, nonafluorobutanesulfonic acid anion, methanesulfonic acid anion, butanesulfonic acid anion, camphorsulfonic acid anion, benzenesulfonic acid anion or p-toluenesulfonic acid anion is preferred.

(Rx2 SO2 )3 C- 表示之陰離子,可列舉(CF3 SO2 )3 C- 、(C2 F5 SO2 )3 C- 、(C3 F7 SO2 )3 C- 或(C4 F9 SO2 )3 C- 表示之陰離子等。Examples of the anion represented by (R x2 SO 2 ) 3 C - include (CF 3 SO 2 ) 3 C - , (C 2 F 5 SO 2 ) 3 C - , (C 3 F 7 SO 2 ) 3 C - , and (C 4 F 9 SO 2 ) 3 C - .

(Rx2 SO2 )2 N- 表示之陰離子,可列舉 (CF3 SO2 )2 N- 、(C2 F5 SO2 )2 N- 、(C3 F7 SO2 )2 N- 或(C4 F9 SO2 )2 N- 表示之陰離子等。Examples of the anion represented by (R x2 SO 2 ) 2 N - include (CF 3 SO 2 ) 2 N - , (C 2 F 5 SO 2 ) 2 N - , (C 3 F 7 SO 2 ) 2 N - or (C 4 F 9 SO 2 ) 2 N - .

一價多原子陰離子,除MYa - 、(Rf)b PF6-b - 、Rx1 c BY4-c - 、Rx1 c GaY4-c - 、Rx2 SO3 - 、(Rx2 SO2 )3 C- 或 (Rx2 SO2 )2 N- 表示之陰離子外,可使用過鹵酸根離子(ClO4 - 、BrO4 - 等)、鹵化磺酸根離子(FSO3 - 、ClSO3 - 等)、硫酸根離子(CH3 SO4 - 、CF3 SO4 - 、HSO4 - 等)、碳酸離子(HCO3 - 、CH3 CO3 - 等)、鋁酸根離子(AlCl4 - 、AlF4 - 等)、六氟鉍酸根離子(BiF6 - )、羧酸根離子(CH3 COO- 、CF3 COO- 、C6 H5 COO- 、CH3 C6 H4 COO- 、C6 F5 COO- 、CF3 C6 H4 COO- 等)、芳基硼酸根離子(B(C6 H5 )4 - 、CH3 CH2 CH2 CH2 B(C6 H5 )3 - 等)、硫氰酸根離子(SCN- )及硝酸根離子(NO3 - )等。As monovalent polyatomic anions, in addition to anions represented by MYa- , (Rf) bPF6 -b- , Rx1cBY4 - c- , Rx1cGaY4-c-, Rx2SO3-, ( Rx2SO2 ) 3C- , or ( Rx2SO2 ) 2N- , perhalide ions ( ClO4- , BrO4- , etc. ) , halogenated sulfonate ions ( FSO3- , ClSO3- , etc. ) , sulfate ions ( CH3SO4- , CF3SO4- , HSO4- , etc. ), carbonate ions ( HCO3- , CH3CO3- , etc.), aluminate ions ( AlCl4- , AlF4- , etc. ), hexafluorobismuth ion (BiF4-, etc. ) can be used . 6 - ), carboxylate ions (CH 3 COO - , CF 3 COO - , C 6 H 5 COO - , CH 3 C 6 H 4 COO - , C 6 F 5 COO - , CF 3 C 6 H 4 COO -, etc.), aryl borate ions (B(C 6 H 5 ) 4 - , CH 3 CH 2 CH 2 CH 2 B(C 6 H 5 ) 3 -, etc.), thiocyanate ions (SCN - ) and nitrate ions (NO 3 - ), etc.

此等陰離子之中,陽離子聚合性能的觀點,較佳為MYa - 、(Rf)b PF6-b - 、Rx1 c BY4-c - 、Rx1 c GaY4-c - 及(Rx2 SO2 )3 C- 表示之陰離子,更佳為SbF6 - 、PF6 - 、 (CF3 CF2 )3 PF3 - 、(C6 F5 )4 B- 、((CF3 )2 C6 H3 )4 B- 、(C6 F5 )4 Ga- 、((CF3 )2 C6 H3 )4 Ga- 及(CF3 SO2 )3 C- ,又更佳為Rx1 c BY4-c -Among these anions, from the viewpoint of cationic polymerization performance, anions represented by MYa- , (Rf ) bPF6 -b- , Rx1cBY4 -c- , Rx1cGaY4 -c- and ( Rx2SO2 ) 3C- are preferred; SbF6- , PF6- , ( CF3CF2 )3PF3- , ( C6F5 ) 4B- , ( ( CF3 ) 2C6H3 )4B-, (C6F5 ) 4Ga- , ( ( CF3 ) 2C6H3 ) 4Ga- and (CF3SO2 ) 3C- are more preferred ; and Rx1cBY4 -c- is even more preferred.

上述式(a2)、(a5)、及(a6)中,芳香族烴環,可列舉苯環、縮合多環式芳香族烴環[例如、縮合二環式烴環(例如、萘環等之C8-20 縮合二環式烴環,較佳為C10-16 縮合二環式烴環)、縮合三環式芳香族烴環(例如、蒽環、菲環等)等之縮合2至4環式芳香族烴環]等。芳香族烴環,較佳為苯環或萘環,更佳為苯環。In the above formulae (a2), (a5), and (a6), the aromatic hydrocarbon ring may be a benzene ring, a condensed polycyclic aromatic hydrocarbon ring [e.g., a condensed bicyclic hydrocarbon ring (e.g., a C 8-20 condensed bicyclic hydrocarbon ring such as a naphthalene ring, preferably a C 10-16 condensed bicyclic hydrocarbon ring), a condensed tricyclic aromatic hydrocarbon ring (e.g., anthracene ring, phenanthrene ring, etc.), or a condensed bicyclic to tetracyclic aromatic hydrocarbon ring]. The aromatic hydrocarbon ring is preferably a benzene ring or a naphthalene ring, and more preferably a benzene ring.

上述式(a1)~(a6)中,鹵素原子,可列舉氟原子、氯原子、溴原子、及碘原子等。In the above formulae (a1) to (a6), the halogen atom includes a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

上述式(a1)~(a6)中,作為烷基,可列舉碳原子數1以上18以下之直鏈烷基(甲基、乙基、n-丙基、n-丁基、n-戊基、n-辛基、n-癸基、n-十二烷基、n-十四烷基、n-十六烷基、及n-十八烷基等)、碳原子數3以上18以下之支鏈烷基(異丙基、異丁基、sec-丁基、tert-丁基、異戊基、新戊基、tert-戊基、異己基、及異十八烷基等)、及碳原子數3以上18以下之環烷基(環丙基、環丁基、環戊基、環己基、及4-癸基環己基等)等。特別是上述式(a1)、(a2)、及(a4)~(a6)中,可被鹵素原子取代之烷基係指烷基及被鹵素原子取代之烷基。被鹵素原子取代之烷基,可列舉上述直鏈烷基、支鏈烷基、或環烷基中之至少1個氫原子被鹵素原子取代之基(單氟甲基、二氟甲基、三氟甲基等)等。可被鹵素原子取代之烷基之中,R1 、R2 、R9 、或R10 ,特佳為三氟甲基,R4 、R6 、R11 、或R12 ,特佳為甲基。In the above formulae (a1) to (a6), examples of the alkyl group include a straight-chain alkyl group having 1 to 18 carbon atoms (methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-octyl, n-decyl, n-dodecyl, n-tetradecyl, n-hexadecyl, and n-octadecyl), a branched-chain alkyl group having 3 to 18 carbon atoms (isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl, isohexyl, and isooctadecyl), and a cycloalkyl group having 3 to 18 carbon atoms (cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and 4-decylcyclohexyl). In particular, in the above formulae (a1), (a2), and (a4) to (a6), the alkyl group which may be substituted by a halogen atom refers to an alkyl group and an alkyl group substituted by a halogen atom. Examples of the alkyl group substituted by a halogen atom include the above-mentioned straight-chain alkyl group, branched-chain alkyl group, or cycloalkyl group in which at least one hydrogen atom is substituted by a halogen atom (monofluoromethyl group, difluoromethyl group, trifluoromethyl group, etc.). Among the alkyl groups which may be substituted by a halogen atom, R 1 , R 2 , R 9 , or R 10 is particularly preferably a trifluoromethyl group, and R 4 , R 6 , R 11 , or R 12 is particularly preferably a methyl group.

上述式(a2)~(a6)中,作為烷氧基,可列舉碳原子數1以上18以下之直鏈或支鏈烷氧基(甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、sec-丁氧基、tert-丁氧基、己氧基、癸氧基、十二烷氧基、及十八烷氧基等)等。In the above formulae (a2) to (a6), examples of the alkoxy group include straight-chain or branched alkoxy groups having 1 to 18 carbon atoms (methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, sec-butoxy, tert-butoxy, hexyloxy, decyloxy, dodecyloxy, and octadecyloxy, etc.).

上述式(a2)~(a6)中,烷基羰基中之烷基,可列舉上述碳原子數1以上18以下之直鏈烷基、碳原子數3以上18以下之支鏈烷基或碳原子數3以上18以下之環烷基,作為烷基羰基,可列舉碳原子數2以上18以下之直鏈狀、支鏈狀或環狀之烷基羰基(乙醯基、丙醯基、丁醯基、2-甲基丙醯基、庚醯基、2-甲基丁醯基、3-甲基丁醯基、辛醯基、癸醯基、十二醯基(dodecanoyl)、十八醯基(octadecanoyl)、環戊醯基、及環己醯基等)等。In the above formulae (a2) to (a6), the alkyl group in the alkylcarbonyl group may be the above-mentioned straight-chain alkyl group having 1 to 18 carbon atoms, branched-chain alkyl group having 3 to 18 carbon atoms, or cycloalkyl group having 3 to 18 carbon atoms. As the alkylcarbonyl group, there may be mentioned straight-chain, branched-chain or cyclic alkylcarbonyl groups having 2 to 18 carbon atoms (acetyl, propionyl, butyryl, 2-methylpropionyl, heptyl, 2-methylbutyryl, 3-methylbutyryl, octyl, decyl, dodecanoyl, octadecanoyl, cyclopentyl, cyclohexyl, etc.).

上述式(a3)~(a6)中,作為芳基羰基,可列舉碳原子數7以上11以下之芳基羰基(苯甲醯基及萘甲醯基等)等。In the above formulae (a3) to (a6), examples of the arylcarbonyl group include arylcarbonyl groups having 7 to 11 carbon atoms (such as benzoyl and naphthoxyl).

上述式(a2)~(a6)中,作為烷氧基羰基,可列舉碳原子數2以上19以下之直鏈或支鏈烷氧基羰基(甲氧基羰基、乙氧基羰基、丙氧基羰基、異丙氧基羰基、丁氧基羰基、異丁氧基羰基、sec-丁氧基羰基、tert-丁氧基羰基、辛氧基羰基、十四烷氧基羰基、及十八烷氧基(Octadecyloxy)羰基等)等。In the above formulae (a2) to (a6), examples of the alkoxycarbonyl group include linear or branched alkoxycarbonyl groups having 2 to 19 carbon atoms (methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, sec-butoxycarbonyl, tert-butoxycarbonyl, octyloxycarbonyl, tetradecyloxycarbonyl, and octadecyloxycarbonyl).

上述式(a3)~(a6)中,作為芳氧基羰基,可列舉碳原子數7以上11以下之芳氧基羰基(苯氧基羰基及萘氧基羰基等)等。In the above formulae (a3) to (a6), examples of the aryloxycarbonyl group include aryloxycarbonyl groups having 7 to 11 carbon atoms (such as phenoxycarbonyl and naphthoxycarbonyl).

上述式(a3)~(a6)中,作為芳硫基羰基,可列舉碳原子數7以上11以下之芳硫基羰基(苯硫基羰基及萘氧硫基羰基等)等。In the above formulae (a3) to (a6), examples of the arylthiocarbonyl group include arylthiocarbonyl groups having 7 to 11 carbon atoms (such as phenylthiocarbonyl and naphthylthiocarbonyl).

上述式(a2)~(a6)中,作為醯氧基,可列舉碳原子數2以上19以下之直鏈或支鏈醯氧基(乙醯氧基、乙基羰氧基、丙基羰氧基、異丙基羰氧基、丁基羰氧基、異丁基羰氧基、sec-丁基羰氧基、tert-丁基羰氧基、辛基羰氧基、十四烷基羰氧基、及十八烷基羰氧基等)等。In the above formulae (a2) to (a6), examples of the acyloxy group include linear or branched acyloxy groups having 2 to 19 carbon atoms (acetyloxy, ethylcarbonyloxy, propylcarbonyloxy, isopropylcarbonyloxy, butylcarbonyloxy, isobutylcarbonyloxy, sec-butylcarbonyloxy, tert-butylcarbonyloxy, octylcarbonyloxy, tetradecylcarbonyloxy, and octadecylcarbonyloxy).

上述式(a3)~(a6)中,作為芳硫基,可列舉 碳原子數6以上20以下之芳硫基(苯硫基、2-甲基苯硫基、3-甲基苯硫基、4-甲基苯硫基、2-氯苯硫基、3-氯苯硫基、4-氯苯硫基、2-溴苯硫基、3-溴苯硫基、4-溴苯硫基、2-氟苯硫基、3-氟苯硫基、4-氟苯硫基、2-羥基苯硫基、4-羥基苯硫基、2-甲氧基苯硫基、4-甲氧基苯硫基、1-萘硫基、2-萘硫基、4-[4-(苯硫基)苯甲醯基]苯硫基、4-[4-(苯硫基)苯氧基]苯硫基、4-[4-(苯硫基)苯基]苯硫基、4-(苯硫基)苯硫基、4-苯甲醯基苯硫基、4-苯甲醯基-2-氯苯硫基、4-苯甲醯基-3-氯苯硫基、4-苯甲醯基-3-甲硫基苯硫基、4-苯甲醯基-2-甲硫基苯硫基、4-(4-甲硫基苯甲醯基)苯硫基、4-(2-甲硫基苯甲醯基)苯硫基、4-(p-甲基苯甲醯基)苯硫基、4-(p-乙基苯甲醯基)苯硫基4-(p-異丙基苯甲醯基)苯硫基、及4-(p-tert-丁基苯甲醯基)苯硫基等)等。In the above formulae (a3) to (a6), the arylthio group includes an arylthio group having 6 to 20 carbon atoms (phenylthio, 2-methylphenylthio, 3-methylphenylthio, 4-methylphenylthio, 2-chlorophenylthio, 3-chlorophenylthio, 4-chlorophenylthio, 2-bromophenylthio, 3-bromophenylthio, 4-bromophenylthio, 2-fluorophenylthio, 3-fluorophenylthio, 4-fluorophenylthio, 2-hydroxyphenylthio, 4-hydroxyphenylthio, 2-methoxyphenylthio, 4-methoxyphenylthio, 1-naphthylthio, 2-naphthylthio, 4-[4-(phenylthio)benzoyl]phenylthio, 4-[4-(phenylthio)phenoxy]phenylthio, 4-[4-(phenylthio)phenoxy]phenylthio, [0063] The following are examples of the group consisting of 4-(4-(2-methylthiobenzyl)phenylthio, 4-(p-methylbenzyl)phenylthio, 4-(p-ethylbenzyl)phenylthio, 4-(p-isopropylbenzyl)phenylthio, and 4-(p-tert-butylbenzyl)phenylthio) and the like.

上述式(a2)~(a6)中,作為烷硫基,可列舉碳原子數1以上18以下之直鏈或支鏈烷硫基(甲硫基、乙硫基、丙硫基、異丙硫基、丁硫基、異丁硫基、sec-丁硫基、tert-丁硫基、戊硫基、異戊硫基、新戊硫基、tert-戊硫基、辛硫基、癸硫基、十二烷硫基、及異十八烷硫基等)等。In the above formulae (a2) to (a6), examples of the alkylthio group include linear or branched alkylthio groups having 1 to 18 carbon atoms (methylthio, ethylthio, propylthio, isopropylthio, butylthio, isobutylthio, sec-butylthio, tert-butylthio, pentylthio, isopentylthio, neopentylthio, tert-pentylthio, octylthio, decylthio, dodecylthio, and isooctadecylthio).

上述式(a3)~(a6)中,作為芳基,可列舉碳原子數6以上10以下之芳基(苯基、甲苯基、二甲基苯基、及萘基等)等。In the above formulae (a3) to (a6), examples of the aryl group include aryl groups having 6 to 10 carbon atoms (phenyl, tolyl, dimethylphenyl, naphthyl, etc.).

上述式(a2)中,雜環式脂肪族烴基,可列舉碳原子數2以上20以下(較佳為4以上20以下)之雜環式烴基(吡咯烷基、四氫呋喃基、四氫噻吩基、哌啶基、四氫吡喃基、四氫噻吡喃基、嗎啉基、等)等。In the above formula (a2), the heterocyclic aliphatic alkyl group includes heterocyclic alkyl groups having 2 to 20 (preferably 4 to 20) carbon atoms (pyrrolidinyl, tetrahydrofuranyl, tetrahydrothienyl, piperidinyl, tetrahydropyranyl, tetrahydrothiapyranyl, morpholinyl, etc.).

上述式(a3)~(a6)中,作為雜環式烴基,可列舉碳原子數4以上20以下之雜環式烴基(噻吩基、呋喃基、苯硒基、哌喃基、吡咯基、噁唑基、噻唑基、吡啶基、嘧啶基、吡嗪基、吲哚基、苯並呋喃基、苯並噻吩基、喹啉基、異喹啉基、喹喔啉基(quinoxalinyl)、喹唑啉基(quinazolinyl)、咔唑、吖啶基、吩噻嗪基(Phenothiadinil)、吩嗪基(phenazinyl)、(呫噸基xanthenyl)、噻嗯基(Thianthrenyl)、吩惡嗪基(Phenoxazinyl)、啡噻基(Phenoxathiinyl、苯并二氫哌喃基(chromanyl)、異苯并二氫哌喃基、二苯並噻吩基、噸酮基(xanthonyl)、噻噸酮基(thioxanthonyl)及二苯並呋喃基等)等。In the above formulae (a3) to (a6), the heterocyclic alkyl group includes a heterocyclic alkyl group having 4 to 20 carbon atoms (thienyl, furanyl, phenylselenoyl, pyranyl, pyrrolyl, oxazolyl, thiazolyl, pyridyl, pyrimidinyl, pyrazinyl, indolyl, benzofuranyl, benzothiophenyl, quinolyl, isoquinolyl, quinoxalinyl, quinazolinyl, carbazole, acridinyl, phenothiazinyl, il), phenazinyl, (xanthenyl), thianthrenyl, phenoxazinyl, phenoxathiinyl (phenoxathiinyl, chromanyl, isobenzodihydropyranyl, dibenzothienyl, xanthonyl, thioxanthonyl and dibenzofuranyl, etc.), etc.

上述式(a3)~(a6)中,作為芳氧基,可列舉碳原子數6以上10以下之芳氧基(苯氧基及萘氧基等)等。In the above formulae (a3) to (a6), examples of the aryloxy group include aryloxy groups having 6 to 10 carbon atoms (such as phenoxy and naphthoxy).

上述式(a2)~(a6)中,作為烷基亞磺醯基,可列舉碳原子數1以上18以下之直鏈或支鏈亞磺醯基(甲基亞磺醯基、乙基亞磺醯基、丙基亞磺醯基、異丙基亞磺醯基、丁基亞磺醯基、異丁基亞磺醯基、sec-丁基亞磺醯基、tert-丁基亞磺醯基、戊基亞磺醯基、異戊基亞磺醯基、新戊基亞磺醯基、tert-戊基亞磺醯基、辛基亞磺醯基、及異十八烷基亞磺醯基等)等。In the above formulae (a2) to (a6), examples of the alkylsulfinyl group include linear or branched sulfinyl groups having 1 to 18 carbon atoms (methylsulfinyl, ethylsulfinyl, propylsulfinyl, isopropylsulfinyl, butylsulfinyl, isobutylsulfinyl, sec-butylsulfinyl, tert-butylsulfinyl, pentylsulfinyl, isopentylsulfinyl, neopentylsulfinyl, tert-pentylsulfinyl, octylsulfinyl, and isooctadecylsulfinyl).

上述式(a3)~(a6)中,作為芳基亞磺醯基,可列舉碳原子數6以上10以下之芳基亞磺醯基(苯基亞磺醯基、甲苯基亞磺醯基、及萘基亞磺醯基等)等。In the above formulae (a3) to (a6), examples of the arylsulfinyl group include arylsulfinyl groups having 6 to 10 carbon atoms (phenylsulfinyl, tolylsulfinyl, naphthylsulfinyl, etc.).

上述式(a2)~(a6)中,作為烷基磺醯基,可列舉碳原子數1以上18以下之直鏈或支鏈烷基磺醯基(甲基磺醯基、乙基磺醯基、丙基磺醯基、異丙基磺醯基、丁基磺醯基、異丁基磺醯基、sec-丁基磺醯基、tert-丁基磺醯基、戊基磺醯基、異戊基磺醯基、新戊基磺醯基、tert-戊基磺醯基、辛基磺醯基、及十八烷基磺醯基等)等。In the above formulae (a2) to (a6), examples of the alkylsulfonyl group include linear or branched alkylsulfonyl groups having 1 to 18 carbon atoms (methylsulfonyl, ethylsulfonyl, propylsulfonyl, isopropylsulfonyl, butylsulfonyl, isobutylsulfonyl, sec-butylsulfonyl, tert-butylsulfonyl, pentylsulfonyl, isopentylsulfonyl, neopentylsulfonyl, tert-pentylsulfonyl, octylsulfonyl, octadecylsulfonyl, etc.).

上述式(a3)~(a6)中,作為芳基磺醯基,可列舉碳原子數6以上10以下之芳基磺醯基(苯基磺醯基、甲苯基磺醯基(對甲苯磺醯基)、及萘基磺醯基等)等。In the above formulae (a3) to (a6), examples of the arylsulfonyl group include arylsulfonyl groups having 6 to 10 carbon atoms (phenylsulfonyl, tolylsulfonyl (p-toluenesulfonyl), and naphthylsulfonyl).

上述式(a2)~(a6)中,作為羥基(聚)伸烷氧基,可列舉HO(AO)q -(式中,AO獨立表示伸乙氧基及/或伸丙氧基,q表示1以上5以下之整數)表示之羥基(聚)伸烷氧基等。In the above formulae (a2) to (a6), examples of the hydroxyl (poly) alkoxyl group include a hydroxyl (poly) alkoxyl group represented by HO(AO) q - (wherein AO independently represents an ethoxyl group and/or a propoxyl group, and q represents an integer of 1 to 5).

上述式(a2)~(a6)中,可被取代之胺基,可列舉胺基(-NH2 )及碳原子數1以上15以下之取代胺基(甲基胺基、二甲基胺基、乙基胺基、甲基乙基胺基、二乙基胺基、n-丙基胺基、甲基-n-丙基胺基、乙基-n-丙基胺基、n-丙基胺基、異丙基胺基、異丙基甲基胺基、異丙基乙基胺基、二異丙基胺基、苯基胺基、二苯基胺基、甲基苯基胺基、乙基苯基胺基、n-丙基苯基胺基、及異丙基苯基胺基等)等。In the above formulae (a2) to (a6), the amino group which may be substituted may include amino group ( -NH2 ) and substituted amino groups having 1 to 15 carbon atoms (methylamino, dimethylamino, ethylamino, methylethylamino, diethylamino, n-propylamino, methyl-n-propylamino, ethyl-n-propylamino, n-propylamino, isopropylamino, isopropylmethylamino, isopropylethylamino, diisopropylamino, phenylamino, diphenylamino, methylphenylamino, ethylphenylamino, n-propylphenylamino, and isopropylphenylamino).

上述式(a3)及(a4)中,作為伸烷基,可列舉碳原子數1以上18以下之直鏈或支鏈伸烷基(伸甲基、1,2-伸乙基、1,1-伸乙基、丙-1,3-二基、丙-1,2-二基、丙-1,1-二基、丙-2,2-二基、丁-1,4-二基、丁-1,3-二基、丁-1,2-二基、丁-1,1-二基、丁-2,2-二基、丁-2,3-二基、戊-1,5-二基、戊-1,4-二基、己-1,6-二基、庚-1,7-二基、辛-1,8-二基、2-乙基己-1,6-二基、壬-1,9-二基、癸-1,10-二基、十一烷-1,11-二基、十二烷-1,12-二基、十三烷-1,13-二基、十四烷-1,14-二基、十五烷-1,15-二基、及十六烷-1,16-二基等)等。In the above formulae (a3) and (a4), the alkylene group includes a linear or branched alkylene group having 1 to 18 carbon atoms (methylene group, 1,2-ethylene group, 1,1-ethylene group, propane-1,3-diyl group, propane-1,2-diyl group, propane-1,1-diyl group, propane-2,2-diyl group, butane-1,4-diyl group, butane-1,3-diyl group, butane-1,2-diyl group, butane-1,1-diyl group, butane-2,2-diyl group, butane-2,3-diyl group , pentane-1,5-diyl, pentane-1,4-diyl, hexane-1,6-diyl, heptane-1,7-diyl, octane-1,8-diyl, 2-ethylhexane-1,6-diyl, nonane-1,9-diyl, decane-1,10-diyl, undecane-1,11-diyl, dodecane-1,12-diyl, tridecane-1,13-diyl, tetradecane-1,14-diyl, pentadecane-1,15-diyl, and hexadecane-1,16-diyl, etc.).

具有式(a1)表示之陽離子部的鋶鹽,可列舉例如可依據下述圖示(Scheme)合成。具體而言,使下述式(b1)表示之1-氟-2-甲基-4-硝基苯,在氫氧化鉀等之鹼之存在下,與下述式(b2)表示之化合物反應,得到下述式(b3)表示之硝基化合物,接著,在還原鐵之存在下進行還原,得到下述式(b4)表示之胺化合物。此胺化合物與MaNO2 (式中,Ma表示金屬原子,例如,鈉原子等之鹼金屬原子)表示之亞硝酸鹽(例如,亞硝酸鈉)反應,得到重氮化合物,接著,混合此重氮化合物與CuX’(式中,X’表示溴原子等之鹵素原子。以下相同)表示之鹵化銅(cuprous halide)與HX’表示之鹵化氫,進行反應,得到下述式(b5)表示之鹵化物。由此鹵化物及鎂調製格林納試劑(Grignard reagent),接著,氯化三甲基矽烷之存在下,使此格林納試劑與下述式(b6)表示之亞碸化合物反應,可得到下述式(b7)表示之鋶鹽。此外,使此鋶鹽與Mb+ X”- (式中,Mb+ 表示金屬陽離子,例如,鉀離子等之鹼金屬陽離子,X”- 係以X- 表示之1價陰離子(但是不包含鹵素陰離子))表示之鹽反應,進行鹽交換,可得到下述式(b8)表示之鋶鹽。又,下述式(b2)~(b8)中,R1 ~R3 及A1 係與上述式(a1)同樣。The cobalt salt having a cationic part represented by formula (a1) can be synthesized, for example, according to the following scheme. Specifically, 1-fluoro-2-methyl-4-nitrobenzene represented by formula (b1) is reacted with a compound represented by formula (b2) in the presence of a base such as potassium hydroxide to obtain a nitro compound represented by formula (b3), and then reduced in the presence of reducing iron to obtain an amine compound represented by formula (b4). This amine compound is reacted with a nitrite (e.g., sodium nitrite) represented by MaNO 2 (wherein Ma represents a metal atom, such as an alkali metal atom such as a sodium atom) to obtain a diazo compound. Next, this diazo compound is mixed with a cuprous halide represented by CuX' (wherein X' represents a halogen atom such as a bromine atom. The same shall apply hereinafter) and a hydrogen halide represented by HX' to react to obtain a halide represented by the following formula (b5). A Grignard reagent is prepared from this halide and magnesium. Next, this Grignard reagent is reacted with a sulfoxide compound represented by the following formula (b6) in the presence of trimethylsilyl chloride to obtain a cobalt salt represented by the following formula (b7). Furthermore, by reacting this zirconia salt with a salt represented by Mb + X" - (wherein Mb + represents a metal cation, for example, an alkali metal cation such as a potassium ion, and X" - is a monovalent anion represented by X - (but excluding halogen anions)) to perform salt exchange, a zirconia salt represented by the following formula (b8) can be obtained. In the following formulas (b2) to (b8), R 1 to R 3 and A 1 are the same as those in the above formula (a1).

<圖示> <Illustration>

上述式(a1)表示之陽離子部之具體例,可列舉以下的陽離子部。相對於上述式(a1)表示之陽離子部,陰離子部的具體例,可列舉上述列舉之陰離子部等,以往公知的陰離子部。具有上述式(a1)表示之陽離子部的鋶鹽,可依據上述圖示(圖示中,X- 表示對陰離子)進行合成,必要時,藉由鹽交換,可將陽離子部與所期望之陰離子部組合,特別是與前述式(aii)表示之陰離子部或前述式(aiii)表示之陰離子部表示之陰離子之組合為佳。Specific examples of the cationic part represented by the above formula (a1) include the following cationic parts. Specific examples of the anionic part relative to the cationic part represented by the above formula (a1) include the anionic parts listed above and the anionic parts known in the past. The cobalt salt having the cationic part represented by the above formula (a1) can be synthesized according to the above diagram (in the diagram, X- represents an anion), and if necessary, the cationic part can be combined with the desired anionic part by salt exchange, especially preferably with the anionic part represented by the above formula (aii) or the anionic part represented by the above formula (aiii).

上述較佳之陽離子部之群中,更佳為下述式表示之陽離子部。 Among the above-mentioned preferred cationic moieties, a cationic moiety represented by the following formula is more preferred.

[熱酸產生劑(A2)] 熱酸產生劑(A2)係具有下述式(Ai)表示之陰離子部的鎓鹽。 (式(Ai)中,RA1 各自獨立為可具有1個以上之取代基之苯基、或全氟烷基。)[Thermal Acid Generator (A2)] The thermal acid generator (A2) is an onium salt having an anion part represented by the following formula (Ai). (In formula (Ai), each R A1 is independently a phenyl group which may have one or more substituents, or a perfluoroalkyl group.)

式(Ai)中之4個的RA1 為可具有1以上之取代基之苯基、或全氟烷基。RA1 為苯基時,該苯基可具有之取代基,在不阻礙本發明之目的之範圍內無特別限定。苯基可具有之取代基之較佳的例,可列舉全氟烷基、全氟烷氧基、硝基、氰基、醯基及鹵素原子。 作為RA1 之苯基具有複數取代基時,複數之取代基可相同或相異。The four R A1s in formula (Ai) are phenyl groups which may have one or more substituents, or perfluoroalkyl groups. When R A1 is a phenyl group, the substituents which the phenyl group may have are not particularly limited within the scope not hindering the purpose of the present invention. Preferred examples of the substituents which the phenyl group may have include a perfluoroalkyl group, a perfluoroalkoxy group, a nitro group, a cyano group, an acyl group, and a halogen atom. When the phenyl group as R A1 has multiple substituents, the multiple substituents may be the same or different.

作為苯基上之取代基之全氟烷基之碳原子數,較佳為1以上8以下,更佳為1以上4以下。 作為苯基上之取代基之全氟烷基之具體例,可列舉三氟甲基、五氟乙基、七氟丙基、九氟丁基、全氟戊基、及全氟辛基等之直鏈全氟烷基或、七氟異丙基、九氟異丁基、九氟-sec-丁基、及九氟-tert-丁基等之支鏈全氟烷基或、全氟環丙基、全氟環丁基、全氟環戊基、及全氟環己基等之全氟環烷基。The number of carbon atoms of the perfluoroalkyl group as a substituent on the phenyl group is preferably 1 to 8, and more preferably 1 to 4. Specific examples of the perfluoroalkyl group as a substituent on the phenyl group include straight-chain perfluoroalkyl groups such as trifluoromethyl, pentafluoroethyl, heptafluoropropyl, nonafluorobutyl, perfluoropentyl, and perfluorooctyl, branched perfluoroalkyl groups such as heptafluoroisopropyl, nonafluoroisobutyl, nonafluoro-sec-butyl, and nonafluoro-tert-butyl, and perfluorocycloalkyl groups such as perfluorocyclopropyl, perfluorocyclobutyl, perfluorocyclopentyl, and perfluorocyclohexyl.

作為苯基上之取代基之全氟烷氧基之碳原子數,較佳為1以上8以下,更佳為1以上4以下。 作為苯基上之取代基之全氟烷氧基之具體例,可列舉三氟甲氧基、五氟乙氧基、七氟丙氧基、九氟丁氧基、全氟戊氧基、及全氟辛氧基等之直鏈全氟烷氧基或、七氟異丙氧基、九氟異丁氧基、九氟-sec-丁氧基、及九氟-tert-丁氧基等之支鏈全氟烷氧基。The number of carbon atoms of the perfluoroalkoxy group as a substituent on the phenyl group is preferably 1 to 8, and more preferably 1 to 4. Specific examples of the perfluoroalkoxy group as a substituent on the phenyl group include straight-chain perfluoroalkoxy groups such as trifluoromethoxy, pentafluoroethoxy, heptafluoropropoxy, nonafluorobutoxy, perfluoropentyloxy, and perfluorooctyloxy, or branched perfluoroalkoxy groups such as heptafluoroisopropoxy, nonafluoroisobutoxy, nonafluoro-sec-butoxy, and nonafluoro-tert-butoxy.

作為苯基上之取代基之鹵素原子,可列舉氟原子、氯原子、溴原子及碘原子。Examples of the halogen atom as a substituent on the phenyl group include a fluorine atom, a chlorine atom, a bromine atom and an iodine atom.

RA1 為全氟烷基時,全氟烷基之較佳的例係與作為苯基上之取代基之全氟烷基之具體例相同。When RA1 is a perfluoroalkyl group, preferred examples of the perfluoroalkyl group are the same as the specific examples of the perfluoroalkyl group as a substituent on the phenyl group.

就熱酸產生劑(A2)之陽離子聚合性能的觀點,RA1 之中之至少1個為選自由全氟烷基、及氟原子所構成群組中之1以上之基所取代之苯基為佳,RA1 之全部為選自由全氟烷基、及氟原子所構成群組中之1以上之基所取代之苯基更佳。From the viewpoint of the cationic polymerization performance of the thermal acid generator (A2), it is preferred that at least one of RA1 is a phenyl group substituted with one or more groups selected from the group consisting of a perfluoroalkyl group and a fluorine atom, and it is more preferred that all of RA1 are phenyl groups substituted with one or more groups selected from the group consisting of a perfluoroalkyl group and a fluorine atom.

RA1 之較佳的例,可列舉五氟苯基、三氟苯基、四氟苯基、(三氟甲基)苯基、雙(三氟甲基)苯基、(五氟乙基)苯基、雙(五氟乙基)苯基、氟(三氟甲基)苯基、氟雙(三氟甲基)苯基、氟(五氟乙基)苯基、氟雙(五氟乙基)苯基、五氯苯基、三氯苯基、四氯苯基、(三氯甲基)苯基、雙(三氯甲基)苯基、(五氯乙基)苯基、雙(五氯乙基)苯基、氯(三氯甲基)苯基、氯雙(三氯甲基)苯基、氯(五氯乙基)苯基、氯雙(五氯乙基)苯基、硝基苯基、氰基苯基、及乙醯基苯基。 此等之中,較佳為五氟苯基、及雙(三氟甲基)苯基,更佳為五氟苯基。Preferred examples of RA1 include pentafluorophenyl, trifluorophenyl, tetrafluorophenyl, (trifluoromethyl)phenyl, bis(trifluoromethyl)phenyl, (pentafluoroethyl)phenyl, bis(pentafluoroethyl)phenyl, fluoro(trifluoromethyl)phenyl, fluorobis(trifluoromethyl)phenyl, fluoro(pentafluoroethyl)phenyl, fluorobis(pentafluoroethyl)phenyl, pentachlorophenyl, trichlorophenyl, tetrachlorophenyl, (trichloromethyl)phenyl, bis(trichloromethyl)phenyl, (pentachloroethyl)phenyl, bis(pentachloroethyl)phenyl, chloro(trichloromethyl)phenyl, chlorobis(trichloromethyl)phenyl, chloro(pentachloroethyl)phenyl, chlorobis(pentachloroethyl)phenyl, nitrophenyl, cyanophenyl, and acetylphenyl. Among these, pentafluorophenyl and bis(trifluoromethyl)phenyl are preferred, and pentafluorophenyl is more preferred.

式(Ai)表示之陰離子部之較佳的具體例,可列舉以下的陰離子。 Preferred specific examples of the anion part represented by formula (Ai) include the following anions.

與前述式(Ai)表示之陰離子部一同構成作為熱酸產生劑(A2)之鎓鹽的陽離子部,較佳為下述式(Aii)表示之陽離子部。The cationic part which constitutes the onium salt as the thermal acid generator (A2) together with the anionic part represented by the above formula (Ai) is preferably a cationic part represented by the following formula (Aii).

(式(Aii)中,RA01 為1價有機基,D為元素週期表(IUPAC表示法)之第15族~17族,原子價為u的元素,RA02 為可具有取代基之烷基或可具有取代基之芳烷基。但是RA02 為可具有取代基之烷基時,RA01 之至少1個為可具有取代基之烷基。u為1以上3以下之整數,複數之RA01 可相同或相異,複數之RA01 鍵結可與D一同形成環。) (In formula (Aii), R A01 is a monovalent organic group, D is an element of Group 15 to Group 17 of the Periodic Table of the Elements (IUPAC notation) with an atomic valence of u, and R A02 is an alkyl group which may have a substituent or an aralkyl group which may have a substituent. However, when R A02 is an alkyl group which may have a substituent, at least one of R A01 is an alkyl group which may have a substituent. u is an integer of 1 to 3, and multiple R A01s may be the same or different, and multiple R A01s may form a ring together with D by bonding.)

式(Aii)中之D為元素週期表(IUPAC表示法)之第15族~17族,原子價u的元素。又,D係與前述式(ai)中之Ra2 相同。 D為與有機基RA01 、及可被RA02 取代之苄基鍵結形成鎓離子。元素週期表(IUPAC表示法)之第15族~17族之元素之中較佳者為S(硫)、N(氮)、I(碘)、P(磷)。對應之鎓離子為鋶離子、銨離子、錪離子、及鏻離子,此等安定且使用容易,故較佳。就陽離子聚合性能或交聯反應性能優異的觀點,更佳為鋶離子及錪離子,又更佳為鋶離子。D in formula (Aii) is an element of Group 15 to Group 17 of the Periodic Table of Elements (IUPAC notation) with an atomic valence of u. In addition, D is the same as Ra2 in the aforementioned formula (ai). D forms an onium ion by bonding with an organic group R A01 and a benzyl group which may be substituted by R A02 . Preferred elements of Group 15 to Group 17 of the Periodic Table of Elements (IUPAC notation) are S (sulfur), N (nitrogen), I (iodine), and P (phosphorus). The corresponding onium ions are cobalt ions, ammonium ions, iodine ions, and phosphonium ions, which are stable and easy to use, and therefore preferred. From the viewpoint of excellent cationic polymerization performance or crosslinking reaction performance, cobalt ions and iodine ions are more preferred, and cobalt ions are even more preferred.

式(Aii)中,RA01 表示與D鍵結之有機基,RA01 為複數存在時之複數之RA01 ,可相同或相異。有機基,較佳為含有碳原子之基,更佳為1以上之碳原子、及選自由H、O、S、Se、N、B、P、Si、及鹵素原子所構成群組之1以上之原子所構成之基。含有碳原子之基之碳原子數無特別限定,較佳為1以上50以下,更佳為1以上20以下。作為RA01 ,可列舉碳原子數6以上14以下之芳香族烴基、碳原子數1以上18以下之烷基、碳原子數2以上18以下之烯基、及碳原子數2以上18以下之炔基。 作為RA01 之芳香族烴基、烷基、烯基、及炔基,可列舉與關於式(ai)中之Ra1 前述基相同之基。RA01 為芳香族烴基時,可具有取代基,該取代基可列舉羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之矽基、可被取代之胺基、鹵素原子等。 又,式(Aii)中,RA01 複數存在時,複數之RA01 可與D一同形成環。複數之RA01 與D所形成的環係其間結構中,可含有選自由-O-、-S-、-SO-、-SO2 -、-NH-、-CO-、-COO-、及-CONH-所構成群組中之1個以上的鍵結。 式(Aii)中,作為RA02 之烷基之具體例,可列舉甲基、乙基、n-丙基、n-丁基、n-戊基、n-辛基、n-癸基、n-十二烷基、n-十四烷基、n-十六烷基及n-十八烷基等之碳原子數1以上18以下之直鏈烷基、異丙基、異丁基、sec-丁基、tert-丁基、異戊基、新戊基、tert-戊基、異己基及異十八烷基等之碳原子數3以上18以下之支鏈烷基、及、環丙基、環丁基、環戊基、環己基及4-癸基環己基等之碳原子數3以上18以下之環烷基等。式(Aii)中,RA02 為可具有取代基之烷基時,RA01 之至少1個可具有取代基之烷基。 式(Aii)中,作為RA02 之芳烷基之具體例,可列舉苄基、1-萘基甲基、2-萘基甲基等之被碳原子數6以上10以下之芳基取代的低級烷基等。 式(Aii)中,具有作為RA02 之取代基之芳烷基之具體例,可列舉2-甲基苄基等之被可具有取代基之碳原子數6以上10以下之芳基取代的低級烷基等。 式(Aii)中,RA02 較佳為可具有取代基之芳烷基,更佳為下述式(Aiii)表示之陽離子部。In formula (Aii), RA01 represents an organic group bonded to D. When RA01 exists in plural, the plural RA01 may be the same or different. The organic group is preferably a group containing carbon atoms, more preferably a group consisting of 1 or more carbon atoms and 1 or more atoms selected from the group consisting of H, O, S, Se, N, B, P, Si, and halogen atoms. The number of carbon atoms in the group containing carbon atoms is not particularly limited, but is preferably 1 or more and 50 or less, more preferably 1 or more and 20 or less. Examples of RA01 include aromatic alkyl groups having 6 or more and 14 or less carbon atoms, alkyl groups having 1 or more and 18 or less carbon atoms, alkenyl groups having 2 or more and 18 or less carbon atoms, and alkynyl groups having 2 or more and 18 or less carbon atoms. As the aromatic hydrocarbon group, alkyl group, alkenyl group, and alkynyl group for R A01 , the same groups as those mentioned above for R a1 in formula (ai) can be listed. When R A01 is an aromatic hydrocarbon group, it may have a substituent, and the substituent may include a hydroxyl group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxyl group, an optionally substituted silyl group, an optionally substituted amine group, and a halogen atom. In formula (Aii), when RA01 exists in plural numbers, the plural RA01s may form a ring together with D. The ring system formed by the plurality of RA01 and D may contain one or more bonds selected from the group consisting of -O-, -S-, -SO-, -SO 2 -, -NH-, -CO-, -COO-, and -CONH- in its structure. In the formula (Aii), specific examples of the alkyl group of RA02 include a linear alkyl group having 1 to 18 carbon atoms, such as methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-octyl, n-decyl, n-dodecyl, n-tetradecyl, n-hexadecyl, and n-octadecyl; a branched alkyl group having 3 to 18 carbon atoms, such as isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl, isohexyl, and isooctadecyl; and a cycloalkyl group having 3 to 18 carbon atoms, such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and 4-decylcyclohexyl. In the formula (Aii), when RA02 is an alkyl group which may have a substituent, at least one of RA01 is an alkyl group which may have a substituent. In the formula (Aii), specific examples of the aralkyl group of RA02 include lower alkyl groups substituted with an aryl group having 6 to 10 carbon atoms, such as benzyl, 1-naphthylmethyl, and 2-naphthylmethyl. In the formula (Aii), specific examples of the aralkyl group having a substituent of RA02 include lower alkyl groups substituted with an aryl group having 6 to 10 carbon atoms, such as 2-methylbenzyl. In the formula (Aii), RA02 is preferably an aralkyl group which may have a substituent, and more preferably a cationic moiety represented by the following formula (Aiii).

(式(Aiii)中,RA01 為1價有機基,D為IUPAC表示法之元素週期表之第15族~17族之原子價u的元素,RA03 為1價有機基,u為1以上3以下之整數,v為0以上5以下之整數。) (In formula (Aiii), R A01 is a monovalent organic group, D is an element with an atomic valence of u in Groups 15 to 17 of the Periodic Table of the Elements of IUPAC notation, R A03 is a monovalent organic group, u is an integer of 1 to 3, and v is an integer of 0 to 5.)

式(Aiii)中,RA03 之1價有機基,較佳為含有碳原子之基,更佳為1以上之碳原子及選自由H、O、S、Se、N、B、P、Si、及鹵素原子所構成群組之1以上之原子所構成之基。含有碳原子之基之碳原子數無特別限定,較佳為1以上50以下,更佳為1以上20以下。RA03 之1價有機基,特佳為烷基。作為RA03 之烷基,可列舉與式(Aii)之RA02 所列舉之烷基相同的基。v較佳為0或1。如針對式(Aii)說明,D為硫,式(Aiii)表示之陽離子為鋶離子較佳。換言之,D為硫,u為2較佳。 列舉式(Aii)或式(Aiii)表示之陽離子部之具體例。下述具體例中之D’為S原子或Se原子,較佳為S原子。 In formula (Aiii), the monovalent organic group of RA03 is preferably a group containing carbon atoms, more preferably a group consisting of 1 or more carbon atoms and 1 or more atoms selected from the group consisting of H, O, S, Se, N, B, P, Si, and halogen atoms. The number of carbon atoms in the group containing carbon atoms is not particularly limited, but is preferably 1 or more and 50 or less, and more preferably 1 or more and 20 or less. The monovalent organic group of RA03 is particularly preferably an alkyl group. As the alkyl group of RA03 , the same groups as those listed for RA02 in formula (Aii) can be listed. v is preferably 0 or 1. As described with respect to formula (Aii), D is sulfur, and the cation represented by formula (Aiii) is preferably a galvanic ion. In other words, D is sulfur, and u is preferably 2. Specific examples of the cation part represented by formula (Aii) or formula (Aiii) are listed below. In the following specific examples, D' is a S atom or a Se atom, preferably a S atom.

硬化性組成物中之陽離子硬化劑(A)之含量,就硬化性與硬化物之物性之平衡的觀點,相對於陽離子硬化性化合物(B)100質量份,較佳為0.01質量份以上5質量份以下,更佳為0.05質量份以上3質量份以下,特佳為0.1質量份以上2質量份以下。The content of the cationic curing agent (A) in the curable composition is preferably from 0.01 to 5 parts by mass, more preferably from 0.05 to 3 parts by mass, and particularly preferably from 0.1 to 2 parts by mass, based on 100 parts by mass of the cationic curing compound (B), from the viewpoint of the balance between curability and physical properties of the cured product.

又,陽離子硬化劑(A)在不阻礙本發明之目的之範圍內,也可含有光酸產生劑(A1)及熱酸產生劑(A2)以外的陽離子硬化劑。相對於陽離子硬化劑(A)之質量,光酸產生劑(A1)之質量與熱酸產生劑(A2)之質量之合計的比例,較佳為70質量%以上,更佳為80質量%以上,又更佳為90質量%以上,特佳為100質量%。Furthermore, the cationic hardener (A) may contain a cationic hardener other than the photoacid generator (A1) and the thermal acid generator (A2) within the range not hindering the purpose of the present invention. The total ratio of the mass of the photoacid generator (A1) and the mass of the thermal acid generator (A2) relative to the mass of the cationic hardener (A) is preferably 70% by mass or more, more preferably 80% by mass or more, even more preferably 90% by mass or more, and particularly preferably 100% by mass.

又,就更容易抑制硬化時之硬化物之著色的觀點,相對於光酸產生劑(A1)之質量與熱酸產生劑(A2)之質量之合計,光酸產生劑(A1)之質量之比率,較佳為50質量%以下,更佳為30質量%以下。下限值為無特別限定,但是就耐藥品性或步驟餘裕的觀點,較佳為10質量%以上,更佳為15質量%以上,又更佳為20質量%以上。Furthermore, from the viewpoint of more easily suppressing the coloring of the cured product during curing, the ratio of the mass of the photoacid generator (A1) to the total mass of the photoacid generator (A1) and the mass of the thermal acid generator (A2) is preferably 50 mass% or less, more preferably 30 mass% or less. The lower limit is not particularly limited, but from the viewpoint of chemical resistance or step margin, it is preferably 10 mass% or more, more preferably 15 mass% or more, and even more preferably 20 mass% or more.

<陽離子硬化性化合物(B)> 陽離子硬化性化合物(B),可使用以往作為陽離子硬化性化合物所知之各種化合物。將陽離子硬化性化合物(B)藉由前述(B)陽離子硬化劑(A)使硬化,可形成良好硬化之耐溶劑性優異的硬化物,可抑制硬化物之著色。<Cationic curing compound (B)> The cationic curing compound (B) may be any of various compounds known in the art. The cationic curing compound (B) is cured by the cationic curing agent (A) (B) to form a cured product with good solvent resistance, and coloring of the cured product can be suppressed.

較佳之陽離子硬化性化合物之一例,可列舉下述式(b1)表示之化合物。 (式(b1)中,W1 及W2 各自獨立為下述式(b2): 表示之基, 式(b2)中,環Z表示芳香族烴環,XB 表示單鍵或-S-表示之基,RB1 表示單鍵、碳原子數為1以上4以下的伸烷基、或碳原子數為1以上4以下的伸烷氧基,RB1 為伸烷氧基時,伸烷氧基中之氧原子與環Z鍵結,RB2 表示1價烴基、羥基、-OR4a 表示之基、-SR4b 表示之基、醯基、烷氧基羰基、鹵素原子、硝基、氰基、巰基、羧基、胺基、胺基甲醯基、-NHR4c 表示之基、-N(R4d )2 表示之基、磺酸基、或1價烴基、-OR4a 表示之基、-SR4b 表示之基、醯基、烷氧基羰基、-NHR4c 表示之基、或-N(R4d )2 表示之基所含有之碳原子所鍵結之氫原子之至少一部分被1價烴基、羥基、-OR4a 表示之基、-SR4b 表示之基、醯基、烷氧基羰基、鹵素原子、硝基、氰基、巰基、羧基、胺基、胺基甲醯基、-NHR4c 表示之基、-N(R4d )2 表示之基、甲磺醯氧基、或磺酸基取代之基,R4a ~R4d 獨立表示1價烴基,m表示0以上之整數,R3 為氫原子、乙烯基、環硫乙烷-2-基甲基、或縮水甘油基, W1 與W2 之兩者不具有作為R3 之氫原子, 環Y1 及環Y2 表示相同或不同之芳香族烴環,R為單鍵、可具有取代基之伸甲基、可具有取代基,2個碳原子間可包含雜原子之伸乙基、-O-表示之基、-NH-表示之基、或-S-表示之基,R3a 及R3b 獨立表示氰基、鹵素原子、或1價烴基,n1及n2獨立表示0以上4以下之整數。)An example of a preferred cationic curable compound is a compound represented by the following formula (b1). (In formula (b1), W1 and W2 are each independently a group represented by the following formula (b2): In formula (b2), ring Z represents an aromatic hydrocarbon ring, XB represents a single bond or a group represented by -S-, RB1 represents a single bond, an alkylene group having 1 to 4 carbon atoms, or an alkoxyene group having 1 to 4 carbon atoms. When RB1 is an alkoxyene group, the oxygen atom in the alkoxyene group is bonded to ring Z, and RB2 represents a monovalent alkyl group, a hydroxyl group, a group represented by -OR 4a , a group represented by -SR 4b , an acyl group, an alkoxycarbonyl group, a halogen atom, a nitro group, a cyano group, a hydroxyl group, a carboxyl group, an amino group, a carbamoyl group, a group represented by -NHR 4c , a group represented by -N(R 4d ) 2 , a sulfonic acid group, or a monovalent alkyl group, a group represented by -OR 4a , a group represented by -SR 4b , an acyl group, an alkoxycarbonyl group, -NHR wherein at least a part of the hydrogen atoms bonded to the carbon atoms contained in the group represented by -OR4a , -SR4b, an acyl group, an alkoxycarbonyl group, a halogen atom, a nitro group, a cyano group, an alkyl group, a carboxyl group, an amino group, an aminoformyl group, a group represented by -NHR4c, -N( R4d ) 2 , a methanesulfonyloxy group, or a sulfonic acid group is substituted, R4a to R4d independently represent a monovalent hydrocarbon group, m represents an integer greater than 0, R3 is a hydrogen atom, a vinyl group, a thioethane- 2 -ylmethyl group, or a glycidyl group, neither W1 nor W2 has a hydrogen atom as R3 , and Ring Y1 and Ring Y2 are 2 represents the same or different aromatic hydrocarbon rings, R is a single bond, a methyl group which may have a substituent, an ethyl group which may have a substituent and may contain a heteroatom between two carbon atoms, a group represented by -O-, a group represented by -NH-, or a group represented by -S-, R 3a and R 3b independently represent a cyano group, a halogen atom, or a monovalent hydrocarbon group, and n1 and n2 independently represent an integer greater than or equal to 0 and less than or equal to 4.)

上述式(b2)中,作為環Z,可列舉例如苯環、縮合多環式芳香族烴環[例如,縮合二環式烴環(例如,萘環等之C8-20 縮合二環式烴環,較佳為C10-16 縮合二環式烴環)、縮合三環式芳香族烴環(例如,蒽環、菲環等)等之縮合2至4環式芳香族烴環]等。環Z較佳為苯環或萘環,更佳為萘環。又,式(b1)中之W1 及W2 各自獨立為下述式(b2)表示之基,故W1 及W2 各自包含環Z。W1 所含有之環Z與W2 所含有之環Z可相同或相異,例如,其一之環可為苯環,另一的環可為萘環等,特佳為其中任一環為萘環。In the above formula (b2), examples of ring Z include benzene ring, condensed polycyclic aromatic hydrocarbon rings [e.g., condensed bicyclic hydrocarbon rings (e.g., C 8-20 condensed bicyclic hydrocarbon rings such as naphthyl ring, preferably C 10-16 condensed bicyclic hydrocarbon rings), condensed tricyclic aromatic hydrocarbon rings (e.g., anthracene ring, phenanthrene ring, etc.), and condensed 2 to 4-ring aromatic hydrocarbon rings], etc. Ring Z is preferably a benzene ring or a naphthyl ring, and more preferably a naphthyl ring. In formula (b1), W1 and W2 are each independently a group represented by the following formula (b2), and thus W1 and W2 each contain a ring Z. The ring Z contained in W1 and the ring Z contained in W2 may be the same or different, for example, one of the rings may be a benzene ring and the other may be a naphthyl ring, and it is particularly preferred that either of the rings is a naphthyl ring.

又,W1 及W2 之兩者直接鍵結之碳原子,經由XB 鍵結之環Z的取代位置,無特別限定。例如,環Z為萘環時,與上述碳原子鍵結之環Z對應之基可為1-萘基、2-萘基等。Furthermore, the substitution position of the ring Z bonded to the carbon atom to which both W1 and W2 are directly bonded via XB is not particularly limited. For example, when the ring Z is a naphthyl ring, the group corresponding to the ring Z bonded to the carbon atom may be 1-naphthyl, 2-naphthyl, etc.

上述式(b2)中,XB 獨立表示單鍵或-S-表示之基,典型上為單鍵。In the above formula (b2), X and B independently represent a single bond or a group represented by -S-, and are typically a single bond.

上述式(b2)中,作為RB1 ,可列舉例如單鍵;伸甲基、伸乙基、伸丙基(-CH2 CH2 CH2 -)、伸丙基( -CH2 CH(CH3 )-)、丁-1,2-二基等之碳原子數為1以上4以下的伸烷基;伸甲氧基、伸乙氧基、伸丙氧基( -CH2 CH(CH3 )-O-)等之碳原子數為1以上4以下的伸烷氧基,較佳為單鍵;C2-4 伸烷基(特別是伸乙基、伸丙基等之C2-3 伸烷基);C2-4 伸烷氧基(特別是伸乙氧基、伸丙氧基等之C2-3 伸烷基),更佳為單鍵。又,RB1 為伸烷氧基時,伸烷氧基中之氧原子與環Z鍵結。又,式(b1)中之W1 及W2 各自獨立為式(b2)表示之基,故W1 及W2 各自包含2價基的RB1 。W1 所含有之RB1 與W2 所含有之RB1 可相同或不同。In the above formula (b2), R B1 may be, for example, a single bond; an alkylene group having 1 to 4 carbon atoms such as a methylene group, an ethylene group, a propylene group (-CH 2 CH 2 CH 2 -), a propylene group (-CH 2 CH(CH 3 )-), a butane-1,2-diyl group, etc.; an alkoxyene group having 1 to 4 carbon atoms such as a methoxyene group, an ethoxyene group, a propoxyene group (-CH 2 CH(CH 3 )-O-), preferably a single bond; a C 2-4 alkylene group (particularly a C 2-3 alkylene group such as an ethylene group and a propylene group); and a C 2-4 alkoxyene group (particularly a C 2-3 alkylene group such as an ethoxyene group and a propoxyene group), more preferably a single bond. When R B1 is an alkoxyene group, the oxygen atom in the alkoxyene group is bonded to ring Z. In formula (b1), W1 and W2 are each independently a group represented by formula (b2), and therefore W1 and W2 each include a divalent group RB1 . RB1 contained in W1 and RB1 contained in W2 may be the same or different.

上述式(b2)中,作為RB2 ,可列舉例如烷基(例如,甲基、乙基、丙基、異丙基、丁基等之C1-12 烷基,較佳為C1-8 烷基,更佳為C1-6 烷基等)、環烷基(環己基等之C5-10 環烷基,較佳為C5-8 環烷基,更佳為C5-6 環烷基等)、芳基(例如,苯基、甲苯基、二甲苯基、萘基等之C6-14 芳基,較佳為C6-10 芳基,更佳為C6-8 芳基等)、芳烷基(苄基、苯乙基等之C6-10 芳基-C1-4 烷基等)等之1價烴基;羥基;烷氧基(甲氧基、乙氧基、丙氧基、丁氧基等之C1-12 烷氧基,較佳為C1-8 烷氧基,更佳為C1-6 烷氧基等)、環烷氧基(環己氧基等之C5-10 環烷氧基等)、芳氧基(苯氧基等之C6-10 芳氧基)、芳烷基氧基(例如、苄氧基等之C6-10 芳基-C1-4 烷氧基)等之-OR4a 表示之基[式中,R4a 表示1價烴基(上述例示之1價烴基等)];烷硫基(甲硫基、乙硫基、丙硫基、丁硫基等之C1-12 烷硫基,較佳為C1-8 烷硫基,更佳為C1-6 烷硫基等)、環烷硫基(環己硫基等之C5-10 環烷硫基等)、芳硫基(苯硫基等之C6-10 芳硫基)、芳烷基硫基(例如、苄硫基等之C6-10 芳基-C1-4 烷硫基)等之-SR4b 表示之基[式中,R4b 表示1價烴基(上述例示之1價烴基等)];醯基(乙醯基等之C1-6 醯基等);烷氧基羰基(甲氧基羰基等之C1-4 烷氧基-羰基等);鹵素原子(氟原子、氯原子、溴原子、碘原子等);硝基;氰基;巰基;羧基;胺基;胺基甲醯基;烷基胺基(甲基胺基、乙基胺基、丙基胺基、丁基胺基等之C1-12 烷基胺基,較佳為C1-8 烷基胺基,更佳為C1-6 烷基胺基等)、環烷基胺基(環己基胺基等之C5-10 環烷基胺基等)、芳基胺基(苯基胺基等之C6-10 芳基胺基)、芳烷基胺基(例如、苄基胺基等之C6-10 芳基-C1-4 烷基胺基)等之-NHR4c 表示之基[式中,R4c 表示1價烴基(上述例示之1價烴基等)];二烷基胺基(二甲基胺基、二乙基胺基、二丙基胺基、二丁基胺基等之二(C1-12 烷基)胺基,較佳為二(C1-8 烷基)胺基,更佳為二(C1-6 烷基)胺基等)、二環烷基胺基(二環己基胺基等之二(C5-10 環烷基)胺基等)、二芳基胺基(二苯基胺基等之二(C6-10 芳基)胺基)、二芳烷基胺基(例如,聯苄胺基等之二(C6-10 芳基-C1-4 烷基)胺基)等之-N(R4d )2 表示之基[式中,R4d 獨立表示1價烴基(上述例示之1價烴基等)];(甲基)丙烯醯氧基;磺酸基;上述之1價烴基、-OR4a 表示之基、-SR4b 表示之基、醯基、烷氧基羰基、-NHR4c 表示之基、或-N(R4d )2 表示之基所含有之碳原子所鍵結之氫原子之至少一部分被上述1價烴基、羥基、-OR4a 表示之基、-SR4b 表示之基、醯基、烷氧基羰基、鹵素原子、硝基、氰基、巰基、羧基、胺基、胺基甲醯基、-NHR4c 表示之基、-N(R4d )2 表示之基、(甲基)丙烯醯氧基、甲磺醯氧基、或磺酸基取代之基[例如,烷氧基芳基(例如,甲氧基苯基等之C1-4 烷氧基C6-10 芳基)、烷氧基羰基芳基(例如,甲氧基羰基苯基、乙氧基羰基苯基等之C1-4 烷氧基-羰基C6-10 芳基等)]等。In the above formula (b2), R B2 includes, for example, a monovalent hydrocarbon group such as an alkyl group (for example, a C 1-12 alkyl group such as methyl, ethyl, propyl, isopropyl, butyl, etc., preferably a C 1-8 alkyl group, more preferably a C 1-6 alkyl group, etc.), a cycloalkyl group (a C 5-10 cycloalkyl group such as cyclohexyl, preferably a C 5-8 cycloalkyl group, more preferably a C 5-6 cycloalkyl group, etc.), an aryl group (for example, a C 6-14 aryl group such as phenyl, tolyl, xylyl, naphthyl, etc., preferably a C 6-10 aryl group, more preferably a C 6-8 aryl group, etc.), an aralkyl group (a C 6-10 aryl-C 1-4 alkyl group such as benzyl, phenethyl, etc.); a hydroxyl group; an alkoxy group (a C 5-10 cycloalkyl group such as methoxy, ethoxy, propoxy, butoxy, etc.); [0047] The present invention further comprises a group represented by -OR 4a such as a C 1-12 alkoxy group, preferably a C 1-8 alkoxy group, more preferably a C 1-6 alkoxy group, etc.), a cycloalkyloxy group (a C 5-10 cycloalkyloxy group such as cyclohexyloxy group, etc.), an aryloxy group ( a C 6-10 aryloxy group such as phenoxy group, an aralkyloxy group (for example, a C 6-10 aryl-C 1-4 alkoxy group such as benzyloxy group), etc. [wherein R 4a represents a monovalent alkyl group (the monovalent alkyl group exemplified above, etc.)]; an alkylthio group (a C 1-12 alkylthio group such as methylthio, ethylthio, propylthio, butylthio, preferably a C 1-8 alkylthio group, more preferably a C 1-6 alkylthio group, etc.), a cycloalkylthio group (a C 5-10 cycloalkylthio group such as cyclohexylthio group, etc.), an arylthio group (a C 6-10 [ 0061 ] The present invention also includes a group represented by -SR 4b such as a C 6-10 arylthio group), an aralkylthio group (for example, a C 6-10 aryl-C 1-4 alkylthio group such as a benzylthio group) [wherein R 4b represents a monovalent alkyl group (the monovalent alkyl group exemplified above, etc.)]; an acyl group (a C 1-6 acyl group such as an acetyl group, etc.); an alkoxycarbonyl group (a C 1-4 alkoxy-carbonyl group such as a methoxycarbonyl group, etc.); a halogen atom (a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc.); a nitro group; a cyano group; a hydroxyl group; a carboxyl group; an amino group; a carbamoyl group; an alkylamino group (a C 1-12 alkylamino group such as a methylamino group, an ethylamino group, a propylamino group, a butylamino group, etc., preferably a C 1-8 alkylamino group, more preferably a C [wherein R 4c represents a monovalent alkyl group (the monovalent alkyl groups exemplified above)]; a dialkylamino group (di(C 1-12 alkyl )amino group such as dimethylamino, diethylamino, dipropylamino , dibutylamino, preferably di(C 1-8 alkyl)amino group, more preferably di (C 1-6 alkyl)amino group, etc.); a dicycloalkylamino group (di(C 1-8 alkyl) amino group such as dicyclohexylamino group, etc.); a dicyclohexylamino group (di(C 1-10 alkyl)amino group such as dicyclohexylamino group, etc.); a dicycloalkylamino group (di(C 1-10 alkyl)amino group such as dicyclohexylamino group, etc.); a group represented by -N(R 4d ) 2 such as a di(C 6-10 aryl)amino group (such as a diphenylamino group), a diaralkylamino group (such as a di(C 6-10 aryl- C 1-4 alkyl)amino group) [wherein R 4d independently represents a monovalent alkyl group (such as the monovalent alkyl group exemplified above) ] ; a (meth)acryloyloxy group; a sulfonic acid group; at least a part of the hydrogen atoms bonded to the carbon atoms contained in the above-mentioned monovalent alkyl group, the group represented by -OR 4a , the group represented by -SR 4b , the acyl group, the alkoxycarbonyl group, the group represented by -NHR 4c , or the group represented by -N(R 4d ) 2 is substituted by the above-mentioned monovalent alkyl group, the hydroxyl group, the group represented by -OR 4a , the group represented by -SR A group represented by -NHR 4c , a group represented by -N(R 4d ) 2 , a (meth)acryloyloxy group, a methanesulfonyloxy group, or a group substituted by a sulfonic acid group [for example, an alkoxyaryl group (for example, a C 1-4 alkoxy C 6-10 aryl group such as methoxyphenyl), an alkoxycarbonylaryl group (for example, a C 1-4 alkoxy-carbonyl C 6-10 aryl group such as methoxycarbonylphenyl and ethoxycarbonylphenyl, etc.)] and the like.

此等之中,代表性而言,RB2 可為1價烴基、-OR4a 表示之基、-SR4b 表示之基、醯基、烷氧基羰基、鹵素原子、硝基、氰基、-NHR4c 表示之基、-N(R4d )2 表示之基等。Among them, RB2 can be typically a monovalent hydrocarbon group, a group represented by -OR4a , a group represented by -SR4b , an acyl group, an alkoxycarbonyl group, a halogen atom, a nitro group, a cyano group, a group represented by -NHR4c , a group represented by -N( R4d ) 2 , or the like.

較佳之RB2 ,可列舉1價烴基[例如,烷基(例如,C1-6 烷基)、環烷基(例如,C5-8 環烷基)、芳基(例如,C6-10 芳基)、芳烷基(例如,C6-8 芳基-C1-2 烷基)等]、烷氧基(C1-4 烷氧基等)等。特別是R2a 及R2b ,較佳為烷基[C1-4 烷基(特別是甲基)等]、芳基[例如,C6-10 芳基(特別是苯基)等]等之1價烴基(特別是烷基)。Preferred R B2 includes monovalent alkyl groups [e.g., alkyl (e.g., C 1-6 alkyl), cycloalkyl (e.g., C 5-8 cycloalkyl), aryl (e.g., C 6-10 aryl), aralkyl (e.g., C 6-8 aryl-C 1-2 alkyl)], alkoxy (C 1-4 alkoxy), etc. In particular, R 2a and R 2b are preferably monovalent alkyl groups (especially alkyl) such as alkyl [C 1-4 alkyl (especially methyl)], aryl [e.g., C 6-10 aryl (especially phenyl)], etc.

又,m為2以上之整數時,複數之RB2 彼此可不同可相同。又,W1 所含有之RB2 與W2 所含有之RB2 ,可相同可不同。When m is an integer greater than or equal to 2, the RB2 in the plurality of R B2 may be the same or different from each other. Also, the RB2 in W1 and the RB2 in W2 may be the same or different.

上述式(b2)中,RB2 之數m可依據環Z的種類選擇,例如為0以上4以下,較佳為0以上3以下,更佳為0以上2以下。又,W1 中之m與W2 中之m,可相同或相異。In the above formula (b2), the number m of RB2 can be selected according to the type of ring Z, for example, from 0 to 4, preferably from 0 to 3, and more preferably from 0 to 2. In addition, m in W1 and m in W2 may be the same or different.

上述式(a3)中,R3 為氫原子、乙烯基、環硫乙烷(thiirane)-2-基甲基、或縮水甘油基。又,W1 與W2 之兩者不具有作為R3 之氫原子。 乙烯氧基、環硫乙烷-2-基甲基、及縮水甘油基,皆為陽離子聚合性之官能基。因此,式(b1)表示之化合物為具有1或2之陽離子聚合性之官能基之陽離子聚合性的化合物。 W1 所含有之R3 與W2 所含有之R3 、兩者非為氫原子時,可相同或不同。W1 所含有之R3 與W2 所含有之R3 ,兩者為乙烯基、環硫乙烷-2-基甲基、或縮水甘油基為佳,兩者為選自由乙烯基、環硫乙烷-2-基甲基、及縮水甘油基所構成群組之相同之基更佳。 作為R3 ,因式(b1)表示之化合物之合成或取得容易,較佳為乙烯基、或縮水甘油基。In the above formula (a3), R3 is a hydrogen atom, a vinyl group, a thiirane-2-ylmethyl group, or a glycidyl group. In addition, neither W1 nor W2 has a hydrogen atom as R3 . Vinyloxy, thiirane-2-ylmethyl group, and glycidyl group are all cationically polymerizable functional groups. Therefore, the compound represented by formula (b1) is a cationically polymerizable compound having 1 or 2 cationically polymerizable functional groups. When R3 contained in W1 and R3 contained in W2 are not hydrogen atoms, they may be the same or different. R3 contained in W1 and R3 contained in W2 are preferably both vinyl, thioethane-2-ylmethyl, or glycidyl, and more preferably both are the same group selected from the group consisting of vinyl, thioethane-2-ylmethyl, and glycidyl. R3 is preferably vinyl or glycidyl because the compound represented by formula (b1) can be easily synthesized or obtained.

上述式(b1)中,作為環Y1 及環Y2 ,可列舉例如苯環、縮合多環式芳香族烴環[例如,縮合二環式烴環(例如,萘環等之C8-20 縮合二環式烴環,較佳為C10-16 縮合二環式烴環)、縮合三環式芳香族烴環(例如,蒽環、菲環等)等之縮合2至4環式芳香族烴環]等。環Y1 及環Y2 ,較佳為苯環或萘環,更佳為苯環。又,環Y1 及環Y2 可相同或相異,例如,其一之環可為苯環,另一環可為萘環等。In the above formula (b1), examples of ring Y1 and ring Y2 include benzene ring, condensed polycyclic aromatic hydrocarbon ring [e.g., condensed bicyclic hydrocarbon ring (e.g., C8-20 condensed bicyclic hydrocarbon ring such as naphthyl ring, preferably C10-16 condensed bicyclic hydrocarbon ring), condensed tricyclic aromatic hydrocarbon ring (e.g., anthracene ring, phenanthrene ring, etc.), etc. condensed bicyclic to tetracyclic aromatic hydrocarbon ring], etc. Ring Y1 and ring Y2 are preferably benzene ring or naphthyl ring, more preferably benzene ring. In addition, ring Y 1 and ring Y 2 may be the same or different. For example, one of the rings may be a benzene ring and the other may be a naphthyl ring.

上述式(b1)中,R表示單鍵,可具有取代基之伸甲基、可具有取代基,2個碳原子間可包含雜原子之伸乙基、-O-表示之基、-NH-表示之基、或-S-表示之基,典型而言為單鍵。在此,作為取代基,可列舉例如氰基、鹵素原子(氟原子、氯原子、溴原子等)、1價烴基[例如,烷基(甲基、乙基、丙基、異丙基、丁基、t-丁基等之C1-6 烷基)、芳基(苯基等之C6-10 芳基)等]等,作為雜原子,可列舉例如氧原子、氮原子、硫原子、矽原子等。In the above formula (b1), R represents a single bond, a methyl group which may have a substituent, an ethyl group which may have a substituent and may contain a heteroatom between two carbon atoms, a group represented by -O-, a group represented by -NH-, or a group represented by -S-, and is typically a single bond. Here, as the substituent, for example, a cyano group, a halogen atom (fluorine atom, chlorine atom, bromine atom, etc.), a monovalent alkyl group [for example, an alkyl group (methyl, ethyl, propyl, isopropyl, butyl, t-butyl, etc. C 1-6 alkyl), an aryl group (phenyl, etc. C 6-10 aryl)], etc., and as the heteroatom, for example, an oxygen atom, a nitrogen atom, a sulfur atom, a silicon atom, etc., etc., can be listed.

上述式(b1)中,作為R3a 及R3b ,通常為非反應性取代基,可列舉例如氰基、鹵素原子(氟原子、氯原子、溴原子等)、1價烴基[例如,烷基、芳基(苯基等之C6-10 芳基)等]等,較佳為氰基或烷基,特佳為烷基。烷基可列舉甲基、乙基、丙基、異丙基、丁基、t-丁基等之C1-6 烷基(例如,C1-4 烷基,特別是甲基)等。又,n1為2以上之整數時,R3a 彼此可不同可相同。又,n2為2以上之整數時,R3b 彼此可不同可相同。此外,R3a 與R3b 可相同或不同。又,對於環Y1 及環Y2 之R3a 及R3b 之鍵結位置(取代位置),無特別限定。較佳之取代數n1及n2為0或1,特別是0。又,n1及n2彼此可相同或相異。In the above formula (b1), R 3a and R 3b are usually non-reactive substituents, for example, cyano, halogen atoms (fluorine atoms, chlorine atoms, bromine atoms, etc.), monovalent alkyl groups [for example, alkyl groups, aryl groups (C 6-10 aryl groups such as phenyl groups), etc.], preferably cyano or alkyl groups, particularly preferably alkyl groups. Examples of alkyl groups include methyl, ethyl, propyl, isopropyl, butyl, t-butyl and other C 1-6 alkyl groups (for example, C 1-4 alkyl groups, especially methyl groups), etc. When n1 is an integer greater than 2, R 3a may be different from or the same to each other. When n2 is an integer greater than 2, R 3b may be different from or the same to each other. In addition, R 3a and R 3b may be the same or different. The bonding positions (substitution positions) of R 3a and R 3b of ring Y 1 and ring Y 2 are not particularly limited. Preferred substitution numbers n1 and n2 are 0 or 1, particularly 0. n1 and n2 may be the same or different from each other.

上述式(b1)表示之化合物係保持優異之光學特性及熱特性,具有陽離子聚合性之官能基,故具有高的反應性。特別是環Y1 及環Y2 為苯環,R為單鍵時,上述式(b1)表示之化合物具有茀骨架,光學特性及熱特性更優異。 此外,上述式(b1)表示之化合物係提供具有高硬度之硬化物,作為組成物中之基材成分較佳。The compound represented by the above formula (b1) has excellent optical and thermal properties and has a cationic polymerizable functional group, so it has high reactivity. In particular, when ring Y1 and ring Y2 are benzene rings and R is a single bond, the compound represented by the above formula (b1) has a fluorene skeleton and has more excellent optical and thermal properties. In addition, the compound represented by the above formula (b1) provides a hardened material with high hardness and is preferably used as a base component in a composition.

上述式(b1)表示之化合物之中,特佳之具體例,可列舉9,9-雙[4-[2-(縮水甘油氧基)乙氧基]苯基]-9H-茀、9,9-雙[4-[2-(縮水甘油氧基)乙基]苯基]-9H-茀、9,9-雙[4-(縮水甘油氧基)-3-甲基苯基]-9H-茀、9,9-雙[4-(縮水甘油氧基)-3,5-二甲基苯基]-9H-茀、9,9-雙(6‐縮水甘油氧基萘-1-基)-9H-茀及9,9-雙(5‐縮水甘油氧基萘-2-基)-9H-茀等之含有環氧基之茀化合物;及下述式表示之化合物。Among the compounds represented by the above formula (b1), particularly preferred specific examples include fluorene compounds containing an epoxide group such as 9,9-bis[4-[2-(glycidyloxy)ethoxy]phenyl]-9H-fluorene, 9,9-bis[4-[2-(glycidyloxy)ethyl]phenyl]-9H-fluorene, 9,9-bis[4-(glycidyloxy)-3-methylphenyl]-9H-fluorene, 9,9-bis[4-(glycidyloxy)-3,5-dimethylphenyl]-9H-fluorene, 9,9-bis(6-glycidyloxynaphthalen-1-yl)-9H-fluorene and 9,9-bis(5-glycidyloxynaphthalen-2-yl)-9H-fluorene; and compounds represented by the following formulae.

以上說明之式(b1)表示之化合物之中,特佳為以下的化合物。 Among the compounds represented by the formula (b1) described above, the following compounds are particularly preferred.

式(b1)表示之化合物以外之陽離子聚合性之化合物的較佳例,可列舉含有乙烯氧基之乙烯醚化合物、含有環氧基之環氧化合物、及含有環硫化物基之環硫化物化合物。以下說明乙烯醚化合物、環氧化合物、及環硫化物化合物。Preferred examples of cationically polymerizable compounds other than the compound represented by formula (b1) include vinyl ether compounds containing vinyloxy groups, epoxy compounds containing epoxy groups, and cyclosulfide compounds containing cyclosulfide groups. The vinyl ether compounds, epoxy compounds, and cyclosulfide compounds are described below.

(乙烯醚化合物) 作為式(b1)表示之化合物以外之陽離子硬化性化合物(B)之乙烯醚化合物,具有乙烯氧基,可陽離子聚合之化合物時,即無特別限定。 與式(b1)表示之化合物併用的乙烯醚化合物,也可含有芳香族基,也可含有芳香族基。 就硬化物之耐熱分解性良好的觀點,與式(b1)表示之化合物併用的乙烯醚化合物為具有鍵結於芳香族基之乙烯氧基的化合物為佳。(Vinyl ether compound) The vinyl ether compound used as the cationic curable compound (B) other than the compound represented by formula (b1) is not particularly limited as long as it is a compound having a vinyloxy group and being cationically polymerizable. The vinyl ether compound used in combination with the compound represented by formula (b1) may contain an aromatic group or may contain an aromatic group. From the viewpoint of good heat decomposition resistance of the cured product, the vinyl ether compound used in combination with the compound represented by formula (b1) is preferably a compound having a vinyloxy group bonded to an aromatic group.

可與式(b1)表示之化合物一同使用之乙烯醚化合物之較佳的具體例,可列舉乙烯基苯醚、4-乙烯氧基(vinyloxy)甲苯、3-乙烯氧基甲苯、2-乙烯氧基甲苯、1-乙烯氧基-4-氯苯、1-乙烯氧基-3-氯苯、1-乙烯氧基-2-氯苯、1-乙烯氧基-2,3-二甲基苯、1-乙烯氧基-2,4-二甲基苯、1-乙烯氧基-2,5-二甲基苯、1-乙烯氧基-2,6-二甲基苯、1-乙烯氧基-3,4-二甲基苯、1-乙烯氧基-3,5-二甲基苯、1-乙烯氧基萘、2-乙烯氧基萘、2-乙烯氧基茀、3-乙烯氧基茀、4-乙烯氧基-1,1’-聯苯、3-乙烯氧基-1,1’-聯苯、2-乙烯氧基-1,1’-聯苯、6-乙烯氧基四氫萘、及5-乙烯氧基四氫萘等之芳香族單乙烯醚化合物;1,4-二乙烯氧基苯、1,3-二乙烯氧基苯、1,2-二乙烯氧基苯、1,4-二乙烯氧基萘、1,3-二乙烯氧基萘、1,2-二乙烯氧基萘、1,5-二乙烯氧基萘、1,6-二乙烯氧基萘、1,7-二乙烯氧基萘、1,8-二乙烯氧基萘、2,3-二乙烯氧基萘、2,6-二乙烯氧基萘、2,7-二乙烯氧基萘、1,2-二乙烯氧基茀、3,4-二乙烯氧基茀、2,7-二乙烯氧基茀、4,4’-二乙烯氧基聯苯、3,3’-二乙烯氧基聯苯、2,2’-二乙烯氧基聯苯、3,4’-二乙烯氧基聯苯、2,3’-二乙烯氧基聯苯、2,4’-二乙烯氧基聯苯、及雙酚A二乙烯醚等之芳香族二乙烯醚化合物。 此等之乙烯醚化合物可組合2種以上使用。Preferred specific examples of the vinyl ether compound that can be used together with the compound represented by formula (b1) include vinylphenyl ether, 4-vinyloxytoluene, 3-vinyloxytoluene, 2-vinyloxytoluene, 1-vinyloxy-4-chlorobenzene, 1-vinyloxy-3-chlorobenzene, 1-vinyloxy-2-chlorobenzene, 1-vinyloxy-2,3-dimethylbenzene, 1-vinyloxy-2,4-dimethylbenzene, 1-vinyloxy-2,5-dimethylbenzene, 1-vinyloxy-2,6-dimethylbenzene, 1-vinyloxy-3,4-dimethylbenzene, 1-vinyloxy-3,5-dimethylbenzene, 1-vinyloxynaphthalene, 2-vinyloxynaphthalene, 2-vinyloxyfluorene, 3-vinyloxyfluorene, 4-vinyloxy-1,1'-biphenyl, 3-vinyloxy-1,1'-biphenyl, 2-vinyloxy-1,1'-biphenyl, 6-vinyloxytetrahydronaphthalene, and Aromatic monovinyl ether compounds such as 5-vinyloxytetrahydronaphthalene; 1,4-divinyloxybenzene, 1,3-divinyloxybenzene, 1,2-divinyloxybenzene, 1,4-divinyloxynaphthalene, 1,3-divinyloxynaphthalene, 1,2-divinyloxynaphthalene, 1,5-divinyloxynaphthalene, 1,6-divinyloxynaphthalene, 1,7-divinyloxynaphthalene, 1,8-divinyloxynaphthalene, 2,3-divinyloxynaphthalene, 2,6-divinyloxynaphthalene Aromatic divinyl ether compounds such as ethyleneoxynaphthalene, 2,7-dievinyloxynaphthalene, 1,2-dievinyloxyfluorene, 3,4-dievinyloxyfluorene, 2,7-dievinyloxyfluorene, 4,4'-dievinyloxybiphenyl, 3,3'-dievinyloxybiphenyl, 2,2'-dievinyloxybiphenyl, 3,4'-dievinyloxybiphenyl, 2,3'-dievinyloxybiphenyl, 2,4'-dievinyloxybiphenyl, and bisphenol A divinyl ether. These vinyl ether compounds may be used in combination of two or more.

(環氧化合物) 作為式(b1)表示之化合物以外之陽離子硬化性化合物(B)之環氧化合物之例,可列舉雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、雙酚AD型環氧樹脂、萘型環氧樹脂、及聯苯型環氧樹脂等之2官能環氧樹脂;苯酚酚醛清漆型環氧樹脂、溴化苯酚酚醛清漆型環氧樹脂、鄰甲酚酚醛清漆環氧樹脂、雙酚A酚醛清漆型環氧樹脂、及雙酚AD酚醛清漆型環氧樹脂等之酚醛清漆環氧樹脂;二環戊二烯型酚樹脂之環氧化物等之環式脂肪族環氧樹脂;萘型酚樹脂之環氧化物等之芳香族環氧樹脂;二聚酸縮水甘油基酯、及三縮水甘油基酯等之縮水甘油基酯型環氧樹脂;四縮水甘油基胺基二苯基甲烷、三縮水甘油基-p-胺基苯酚、四縮水甘油基間苯二甲胺、及四縮水甘油基雙胺基甲基環己烷等之縮水甘油基胺型環氧樹脂;三縮水甘油基異氰脲酸酯等之雜環式環氧樹脂;間苯三酚三縮水甘油醚、三羥基聯苯基三縮水甘油醚、三羥基苯基甲烷三縮水甘油醚、丙三醇三縮水甘油醚、2-[4-(2,3-環氧基丙氧基)苯基]-2-[4-[1,1-雙[4-(2,3-環氧基丙氧基)苯基]乙基]苯基]丙烷、及1,3-雙[4-[1-[4-(2,3-環氧基丙氧基)苯基]-1-[4-[1-[4-(2,3-環氧基丙氧基)苯基]-1-甲基乙基]苯基]乙基]苯氧基]-2-丙醇等之3官能型環氧樹脂;四羥基苯基乙烷四縮水甘油醚、四縮水甘油基二苯甲酮、雙間苯二酚四縮水甘油醚、及四環氧丙氧基聯苯基等之4官能型環氧樹脂;2,2-雙(羥基甲基)-1-丁醇之1,2-環氧-4-(2-環氧乙基)環己烷加成物。2,2-雙(羥基甲基)-1-丁醇之1,2-環氧-4-(2-環氧乙基)環己烷加成物係以EHPE-3150(DAICEL公司製)市售。(Epoxy compounds) Examples of epoxy compounds of the cationic curable compound (B) other than the compound represented by formula (b1) include bifunctional epoxy resins such as bisphenol A type epoxy resins, bisphenol F type epoxy resins, bisphenol S type epoxy resins, bisphenol AD type epoxy resins, naphthalene type epoxy resins, and biphenyl type epoxy resins; phenol novolac type epoxy resins, brominated phenol novolac type epoxy resins, o-cresol novolac epoxy resins, bisphenol A novolac type epoxy resins, and Novolac epoxy resins such as bisphenol AD novolac epoxy resins; epoxides of dicyclopentadiene phenol resins and other epoxides; aromatic epoxy resins such as epoxides of naphthyl phenol resins; glycidyl ester-type epoxy resins such as dimer acid glycidyl ester and triglycidyl ester; glycidyls such as tetraglycidylaminodiphenylmethane, triglycidyl-p-aminophenol, tetraglycidyl-m-xylenediamine, and tetraglycidylbisaminomethylcyclohexane amine type epoxy resin; heterocyclic epoxy resin such as triglycidyl isocyanurate; phloroglucinol triglycidyl ether, trihydroxybiphenyl triglycidyl ether, trihydroxyphenylmethane triglycidyl ether, glycerol triglycidyl ether, 2-[4-(2,3-epoxypropoxy)phenyl]-2-[4-[1,1-bis[4-(2,3-epoxypropoxy)phenyl]ethyl]phenyl]propane, and 1,3-bis[4-[1-[4-(2,3-epoxypropoxy) trifunctional epoxy resins such as [1-[4-[1-[4-(2,3-epoxypropoxy)phenyl]-1-methylethyl]phenyl]ethyl]phenoxy]-2-propanol; tetrafunctional epoxy resins such as tetrahydroxyphenylethane tetraglycidyl ether, tetraglycidyl benzophenone, bisresorcinol tetraglycidyl ether, and tetraglycidyl propoxybiphenyl; 1,2-epoxy-4-(2-epoxyethyl)cyclohexane adduct of 2,2-bis(hydroxymethyl)-1-butanol. 2,2-Bis(hydroxymethyl)-1-butanol-1,2-epoxy-4-(2-epoxyethyl)cyclohexane adduct is commercially available as EHPE-3150 (manufactured by DAICEL Corporation).

又,寡聚物或聚合物型之多官能環氧化合物也可適合作為陽離子硬化性化合物(B)使用。 典型的例,可列舉苯酚酚醛清漆型環氧化合物、溴化苯酚酚醛清漆型環氧化合物、鄰-甲酚醛型環氧化合物、二甲苯酚酚醛清漆型環氧化合物、萘酚酚醛清漆型環氧化合物、雙酚A酚醛清漆型環氧化合物、雙酚AD酚醛清漆型環氧化合物、二環戊二烯型酚樹脂之環氧化物、萘型酚樹脂之環氧化物等。Furthermore, oligomer or polymer type multifunctional epoxy compounds can also be used as the cationic curable compound (B). Typical examples include phenol novolac type epoxy compounds, brominated phenol novolac type epoxy compounds, o-cresol type epoxy compounds, xylenol novolac type epoxy compounds, naphthol novolac type epoxy compounds, bisphenol A novolac type epoxy compounds, bisphenol AD novolac type epoxy compounds, epoxides of dicyclopentadiene type phenol resins, epoxides of naphthol type phenol resins, etc.

適合的環氧化合物之其他的例,可列舉具有脂環式環氧基之多官能之脂環式環氧化合物。陽離子硬化性化合物(B)包含脂環式環氧化合物時,使用硬化性組成物,容易形成透明性優異的硬化物。Other examples of suitable epoxy compounds include polyfunctional alicyclic epoxy compounds having an alicyclic epoxy group. When the cationic curable compound (B) contains an alicyclic epoxy compound, a cured product having excellent transparency can be easily formed using the curable composition.

脂環式環氧化合物之具體例,可列舉2-(3,4-環氧基環己基-5,5-螺-3,4-環氧基)環己烷-間-二噁烷、雙(3,4-環氧基環己基甲基)己二酸酯、雙(3,4-環氧-6-甲基環己基甲基)己二酸酯、3,4-環氧-6-甲基環己基-3’,4’-環氧-6’-甲基環己烷羧酸鹽、ε-己內酯改性3,4-環氧基環己基甲基-3’,4’-環氧基環己烷羧酸鹽、三甲基己內酯改性3,4-環氧基環己基甲基-3’,4’-環氧基環己烷羧酸鹽、β-甲基-δ-戊內酯改性3,4-環氧基環己基甲基-3’,4’-環氧基環己烷羧酸鹽、亞甲基雙(3,4-環氧基環己烷)、乙二醇之二(3,4-環氧基環己基甲基)醚、乙烯雙(3,4-環氧基環己烷羧酸鹽)、環氧基環六氫鄰苯二甲酸二辛酯、及環氧基環六氫鄰苯二甲酸二-2-乙基己酯、具有三環氧化癸烯基的環氧樹脂或、下述式(b01-1)~(b01-5)表示之化合物。Specific examples of the alicyclic epoxy compounds include 2-(3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy)cyclohexane-m-dioxane, bis(3,4-epoxycyclohexylmethyl)adipate, bis(3,4-epoxy-6-methylcyclohexylmethyl)adipate, 3,4-epoxy-6-methylcyclohexyl-3',4'-epoxy-6'-methylcyclohexanecarboxylate, ε-caprolactone-modified 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, trimethylcaprolactone-modified 3,4-epoxycyclohexylmethyl- 3',4'-Epoxycyclohexanecarboxylate, β-methyl-δ-valerolactone-modified 3,4-epoxycyclohexylmethyl-3',4'-epoxycyclohexanecarboxylate, methylenebis(3,4-epoxycyclohexane), ethylene glycol bis(3,4-epoxycyclohexylmethyl)ether, ethylenebis(3,4-epoxycyclohexanecarboxylate), epoxycyclohexahydrophthalate dioctyl, epoxycyclohexahydrophthalate di-2-ethylhexyl, an epoxy resin having a triethylene oxide decenyl group, or a compound represented by the following formula (b01-1) to (b01-5).

此等之脂環式環氧化合物之具體例之中係提供高硬度的硬化物,故較佳為下述式(b01-1)~(b01-5)表示之脂環式環氧化合物。Specific examples of these alicyclic epoxy compounds provide a hardened material with high hardness, and preferably are alicyclic epoxy compounds represented by the following formulas (b01-1) to (b01-5).

(式(b01-1)中,Z01 表示單鍵或連結基(具有1以上之原子的2價基)。Rb01 ~Rb018 各自獨立為選自由氫原子、鹵素原子、及有機基所構成群組之基。) (In formula (b01-1), Z01 represents a single bond or a linking group (a divalent group having one or more atoms). Rb01 to Rb018 are each independently a group selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group.)

作為連結基Z01 ,可列舉例如選自由2價烴基、-O-、-O-CO-、-S-、-SO-、-SO2 -、-CBr2 -、-C(CBr3 )2 -、-C(CF3 )2 -、及-Rb019 -O-CO-所構成群組之2價基及此等複數個鍵結之基等。Examples of the linking group Z 01 include a divalent hydrocarbon group, -O-, -O-CO-, -S-, -SO-, -SO 2 -, -CBr 2 -, -C(CBr 3 ) 2 -, -C(CF 3 ) 2 -, and a divalent group selected from the group consisting of -R b019 -O-CO-, and a group having plural bonds thereof.

連結基Z01 之2價烴基,可列舉例如碳原子數為1以上18以下之直鏈狀或支鏈狀之伸烷基、2價之脂環式烴基等。碳原子數為1以上18以下之直鏈狀或支鏈狀之伸烷基,可列舉例如伸甲基、甲基伸甲基、二甲基伸甲基、二亞甲基、伸丙基等。上述2價之脂環式烴基,可列舉例如1,2-伸環戊基、1,3-伸環戊基、亞環戊基、1,2-伸環己基、1,3-伸環己基、1,4-伸環己基、伸環己基等之伸環烷基(包含伸環烷基)等。Examples of the divalent alkyl group of the linking group Z01 include linear or branched alkylene groups having 1 to 18 carbon atoms and divalent alicyclic alkyl groups. Examples of the linear or branched alkylene groups having 1 to 18 carbon atoms include methylene groups, methylmethylene groups, dimethylmethylene groups, dimethylene groups, and propylene groups. Examples of the divalent alicyclic alkyl groups include cycloalkylene groups (including cycloalkylene groups) such as 1,2-cyclopentylene, 1,3-cyclopentylene, cyclopentylene, 1,2-cyclohexylene, 1,3-cyclohexylene, 1,4-cyclohexylene, and cyclohexylene.

Rb019 為碳原子數1以上8以下之伸烷基,較佳為伸甲基或伸乙基。R b019 is an alkylene group having 1 to 8 carbon atoms, preferably a methylene group or an ethylene group.

(式(b01-2)中,Rb01 ~Rb018 為選自由氫原子、鹵素原子、及有機基所構成群組之基。Rb02 及Rb010 可彼此鍵結。Rb013 及Rb016 可彼此鍵結形成環。mb1 為0或1。) (In formula (b01-2), R b01 to R b018 are groups selected from the group consisting of hydrogen atoms, halogen atoms, and organic groups. R b02 and R b010 may bond to each other. R b013 and R b016 may bond to each other to form a ring. m b1 is 0 or 1.)

上述式(b01-2)表示之脂環式環氧化合物,較佳為相當於上述式(b01-2)中之mb1 為0的化合物之下述式(b01-2-1)表示的化合物。 (式(b01-2-1)中,Rb01 ~Rb012 為選自由氫原子、鹵素原子、及有機基所構成群組之基。Rb02 及Rb010 可彼此鍵結形成環。)The alicyclic epoxy compound represented by the above formula (b01-2) is preferably a compound represented by the following formula (b01-2-1), which is equivalent to the compound in which m b1 in the above formula (b01-2) is 0. (In formula (b01-2-1), R b01 to R b012 are groups selected from the group consisting of hydrogen atoms, halogen atoms, and organic groups. R b02 and R b010 may bond to each other to form a ring.)

(式(b01-3)中,Rb01 ~Rb010 為選自由氫原子、鹵素原子、及有機基所構成群組之基。Rb02 及Rb08 可彼此鍵結。) (In formula (b01-3), R b01 to R b010 are groups selected from the group consisting of hydrogen atoms, halogen atoms, and organic groups. R b02 and R b08 may be bonded to each other.)

(式(b01-4)中,Rb01 ~Rb012 為選自由氫原子、鹵素原子、及有機基所構成群組之基。Rb02 及Rb010 可彼此鍵結。) (In formula (b01-4), R b01 to R b012 are groups selected from the group consisting of hydrogen atoms, halogen atoms, and organic groups. R b02 and R b010 may be bonded to each other.)

(式(b01-5)中,Rb01 ~Rb012 為選自由氫原子、鹵素原子、及有機基所構成群組之基。) (In formula (b01-5), R b01 to R b012 are groups selected from the group consisting of hydrogen atoms, halogen atoms, and organic groups.)

式(b01-1)~(b01-5)中,Rb01 ~Rb018 為有機基時,有機基在不阻礙本發明之目的之範圍,無特別限定,可為烴基,也可為由碳原子與鹵素原子所構成之基,也可為碳原子及氫原子一同包含如鹵素原子、氧原子、硫原子、氮原子、矽原子之雜原子之基。鹵素原子之例,可列舉氯原子、溴原子、碘原子、及氟原子等。In formula (b01-1) to (b01-5), when R b01 to R b018 are organic groups, the organic groups are not particularly limited within the scope not hindering the purpose of the present invention, and may be alkyl groups, groups composed of carbon atoms and halogen atoms, or groups containing carbon atoms and hydrogen atoms together with impurity atoms such as halogen atoms, oxygen atoms, sulfur atoms, nitrogen atoms, and silicon atoms. Examples of halogen atoms include chlorine atoms, bromine atoms, iodine atoms, and fluorine atoms.

作為有機基,較佳為烴基、由碳原子、氫原子、及氧原子所構成之基,鹵化烴基、由碳原子、氧原子、及鹵素原子所構成之基,由碳原子、氫原子、氧原子、及鹵素原子所構成之基。有機基為烴基時,烴基可為芳香族烴基,可為脂肪族烴基,也可為包含芳香族骨架與脂肪族骨架之基。有機基之碳原子數,較佳為1以上20以下,更佳為1以上10以下,特佳為1以上5以下。As the organic group, preferably, a alkyl group, a group consisting of carbon atoms, hydrogen atoms, and oxygen atoms, a halogenated alkyl group, a group consisting of carbon atoms, oxygen atoms, and halogen atoms, and a group consisting of carbon atoms, hydrogen atoms, oxygen atoms, and halogen atoms are preferred. When the organic group is a alkyl group, the alkyl group may be an aromatic alkyl group, an aliphatic alkyl group, or a group containing an aromatic skeleton and an aliphatic skeleton. The number of carbon atoms in the organic group is preferably 1 to 20, more preferably 1 to 10, and particularly preferably 1 to 5.

烴基之具體例,可列舉甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、n-己基、n-庚基、n-辛基、2-乙基己基、n-壬基、n-癸基、n-十一烷基、n-十三烷基、n-十四烷基、n-十五烷基、n-十六烷基、n-十七烷基、n-十八烷基、n-十九烷基、及n-二十烷基等之鏈狀烷基;乙烯基、1-丙烯基、2-n-丙烯基(烯丙基)、1-n-丁烯基、2-n-丁烯基、及3-n-丁烯基等之鏈狀烯基;環丙基、環丁基、環戊基、環己基、及環庚基等之環烷基;苯基、o-甲苯基、m-甲苯基、p-甲苯基、α-萘基、β-萘基、聯苯基-4-基、聯苯基-3-基、聯苯基-2-基、蒽基、及菲基等之芳基;苄基、苯乙基、α-萘基甲基、β-萘基甲基、α-萘基乙基、及β-萘基乙基等之芳烷基。Specific examples of the alkyl group include chain alkyl groups such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, 2-ethylhexyl, n-nonyl, n-decyl, n-undecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, n-heptadecyl, n-octadecyl, n-nonadecyl, and n-eicosyl; vinyl, 1-propenyl, 2-n-propenyl, 1-butylene, 2-propenyl, 2-butylene, 2-propenyl, 2-pentylene ... chain alkenyl such as alkenyl (allyl), 1-n-butenyl, 2-n-butenyl, and 3-n-butenyl; cycloalkyl such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and cycloheptyl; aryl such as phenyl, o-tolyl, m-tolyl, p-tolyl, α-naphthyl, β-naphthyl, biphenyl-4-yl, biphenyl-3-yl, biphenyl-2-yl, anthracenyl, and phenanthryl; aralkyl such as benzyl, phenethyl, α-naphthylmethyl, β-naphthylmethyl, α-naphthylethyl, and β-naphthylethyl.

鹵化烴基之具體例,可列舉氯甲基、二氯甲基、三氯甲基、溴甲基、二溴甲基、三溴甲基、氟甲基、二氟甲基、三氟甲基、2,2,2-三氟乙基、五氟乙基、七氟丙基、全氟丁基、及全氟戊基、全氟己基、全氟庚基、全氟辛基、全氟壬基、及全氟癸基等之鹵化鏈狀烷基;2-氯環己基、3-氯環己基、4-氯環己基、2,4-二氯環己基、2-溴環己基、3-溴環己基、及4-溴環己基等之鹵化環烷基;2-氯苯基、3-氯苯基、4-氯苯基、2,3-二氯苯基、2,4-二氯苯基、2,5-二氯苯基、2,6-二氯苯基、3,4-二氯苯基、3,5-二氯苯基、2-溴苯基、3-溴苯基、4-溴苯基、2-氟苯基、3-氟苯基、4-氟苯基等之鹵化芳基;2-氯苯基甲基、3-氯苯基甲基、4-氯苯基甲基、2-溴苯基甲基、3-溴苯基甲基、4-溴苯基甲基、2-氟苯基甲基、3-氟苯基甲基、4-氟苯基甲基等之鹵化芳烷基。Specific examples of the halogenated alkyl group include halogenated chain alkyl groups such as chloromethyl, dichloromethyl, trichloromethyl, bromomethyl, dibromomethyl, tribromomethyl, fluoromethyl, difluoromethyl, trifluoromethyl, 2,2,2-trifluoroethyl, pentafluoroethyl, heptafluoropropyl, perfluorobutyl, and perfluoropentyl, perfluorohexyl, perfluoroheptyl, perfluorooctyl, perfluorononyl, and perfluorodecyl; halogenated cycloalkyl groups such as 2-chlorocyclohexyl, 3-chlorocyclohexyl, 4-chlorocyclohexyl, 2,4-dichlorocyclohexyl, 2-bromocyclohexyl, 3-bromocyclohexyl, and 4-bromocyclohexyl; 2-chlorophenyl, Halogenated aryl groups such as 3-chlorophenyl, 4-chlorophenyl, 2,3-dichlorophenyl, 2,4-dichlorophenyl, 2,5-dichlorophenyl, 2,6-dichlorophenyl, 3,4-dichlorophenyl, 3,5-dichlorophenyl, 2-bromophenyl, 3-bromophenyl, 4-bromophenyl, 2-fluorophenyl, 3-fluorophenyl, 4-fluorophenyl, etc.; halogenated aralkyl groups such as 2-chlorophenylmethyl, 3-chlorophenylmethyl, 4-chlorophenylmethyl, 2-bromophenylmethyl, 3-bromophenylmethyl, 4-bromophenylmethyl, 2-fluorophenylmethyl, 3-fluorophenylmethyl, 4-fluorophenylmethyl, etc.

由碳原子、氫原子、及氧原子所構成之基之具體例,可列舉羥基甲基、2-羥基乙基、3-羥基-n-丙基、及4-羥基-n-丁基等之羥基鏈狀烷基;2-羥基環己基、3-羥基環己基、及4-羥基環己基等之鹵化環烷基;2-羥基苯基、3-羥基苯基、4-羥基苯基、2,3-二羥基苯基、2,4-二羥基苯基、2,5-二羥基苯基、2,6-二羥基苯基、3,4-二羥基苯基、及3,5-二羥基苯基等之羥基芳基;2-羥基苯基甲基、3-羥基苯基甲基、及4-羥基苯基甲基等之羥基芳烷基;甲氧基、乙氧基、n-丙氧基、異丙氧基、n-丁氧基、異丁氧基、sec-丁氧基、tert-丁氧基、n-戊氧基、n-己氧基、n-庚氧基、n-辛氧基、2-乙基己氧基、n-壬氧基、n-癸氧基、n-十一烷氧基、n-十三烷氧基、n-十四烷氧基、n-十五烷氧基、n-十六烷氧基、n-十七烷氧基、n-十八烷氧基、n-十九烷氧基、及n-二十烷氧(icosyloxy)基等之鏈狀烷氧基;乙烯氧基、1-丙烯氧基、2-n-丙烯氧基(烯丙氧基)、1-n-丁烯氧基、2-n-丁烯氧基、及3-n-丁烯氧基等之鏈狀烯氧基;苯氧基、o-甲苯氧基、m-甲苯氧基、p-甲苯氧基、α-萘氧基、β-萘氧基、聯苯基-4-基氧基(yloxy)、聯苯基-3-基氧基、聯苯基-2-基氧基、蒽氧基、及菲氧基等之芳氧基;苄氧基、苯乙基氧基、α-萘基甲氧基、β-萘基甲氧基、α-萘基乙氧基、及β-萘基乙氧基等之芳烷基氧基;甲氧基甲基、乙氧基甲基、n-丙氧基甲基、2-甲氧基乙基、2-乙氧基乙基、2-n-丙氧基乙基、3-甲氧基-n-丙基、3-乙氧基-n-丙基、3-n-丙氧基-n-丙基、4-甲氧基-n-丁基、4-乙氧基-n-丁基、及4-n-丙氧基-n-丁基等之烷氧基烷基;甲氧基甲氧基、乙氧基甲氧基、n-丙氧基甲氧基、2-甲氧基乙氧基、2-乙氧基乙氧基、2-n-丙氧基乙氧基、3-甲氧基-n-丙氧基、3-乙氧基-n-丙氧基、3-n-丙氧基-n-丙氧基、4-甲氧基-n-丁氧基、4-乙氧基-n-丁氧基、及4-n-丙氧基-n-丁氧基等之烷氧基烷氧基;2-甲氧基苯基、3-甲氧基苯基、及4-甲氧基苯基等之烷氧基芳基;2-甲氧基苯氧基、3-甲氧基苯氧基、及4-甲氧基苯氧基等之烷氧基芳氧基;甲醯基、乙醯基、丙醯基、丁醯基、戊醯基、己醯基、庚醯基、辛醯基、壬醯基、及癸醯基等之脂肪族醯基;苯甲醯基、α-萘甲醯基、及β-萘甲醯基等之芳香族醯基;甲氧基羰基、乙氧基羰基、n-丙氧基羰基、n-丁氧基羰基、n-戊氧基羰基、n-己基羰基、n-庚氧基羰基、n-辛氧基羰基、n-壬氧基羰基、及n-癸氧基羰基等之鏈狀烷氧基羰基;苯氧基羰基、α-萘氧基羰基、及β-萘氧基羰基等之芳氧基羰基;甲醯氧基、乙醯氧基、丙醯氧基、丁醯氧基、戊醯氧基、己醯氧基、庚醯氧基、辛醯氧基、壬醯氧基、及癸醯氧基等之脂肪族醯氧基;苯甲醯氧基、α-萘甲醯氧基、及β-萘甲醯氧基等之芳香族醯氧基。Specific examples of the group composed of carbon atoms, hydrogen atoms, and oxygen atoms include hydroxy chain alkyl groups such as hydroxymethyl, 2-hydroxyethyl, 3-hydroxy-n-propyl, and 4-hydroxy-n-butyl; halogenated cycloalkyl groups such as 2-hydroxycyclohexyl, 3-hydroxycyclohexyl, and 4-hydroxycyclohexyl; 2-hydroxyphenyl, 3-hydroxyphenyl, 4-hydroxyphenyl, 2,3-dihydroxyphenyl, 2,4-dihydroxyphenyl, 2,5-dihydroxyphenyl, 2 , 6-dihydroxyphenyl, 3,4-dihydroxyphenyl, and 3,5-dihydroxyphenyl; hydroxyaralkyl such as 2-hydroxyphenylmethyl, 3-hydroxyphenylmethyl, and 4-hydroxyphenylmethyl; methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, sec-butoxy, tert-butoxy, n-pentyloxy, n-hexyloxy, n-heptyloxy, n-octyloxy, 2-ethylhexyloxy, n- chain alkoxy groups such as nonyloxy, n-decyloxy, n-undecyloxy, n-tridecyloxy, n-tetradecyloxy, n-pentadecyloxy, n-hexadecyloxy, n-heptadecyloxy, n-octadecyloxy, n-nonadecyloxy, and n-icosyloxy; chain alkenyloxy groups such as vinyloxy, 1-propenyloxy, 2-n-propenyloxy (allyloxy), 1-n-butenyloxy, 2-n-butenyloxy, and 3-n-butenyloxy; aryloxy groups such as phenoxy, o-tolyloxy, m-tolyloxy, p-tolyloxy, α-naphthyloxy, β-naphthyloxy, biphenyl-4-yloxy (yloxy), biphenyl-3-yloxy, biphenyl-2-yloxy, anthracenyloxy, and phenanthrenyloxy; aralkyloxy groups such as benzyloxy, phenethyloxy, α-naphthylmethoxy, β-naphthylmethoxy, α-naphthylethoxy, and β-naphthylethoxy; methoxy alkyloxy, methoxymethoxy, ethoxymethoxy, n-propoxymethoxy, 2-methoxyethyl, 2-ethoxyethyl, 2-n-propoxyethyl, 3-methoxy-n-propyl, 3-ethoxy-n-propyl, 3-n-propoxy-n-propyl, 4-methoxy-n-butyl, 4-ethoxy-n-butyl, and 4-n-propoxy-n-butyl; alkoxyalkyl such as ... alkoxyalkoxy such as 2-methoxyphenyl, 3-methoxyphenyl and 4-methoxyphenyl; 2-methoxyphenoxy, 3-methoxyphenoxy, 3-methoxyphenoxy, 3-methoxyphenoxy, 4-methoxyphenoxy, 4-ethoxyphenoxy, 4-n-propoxyphenoxy, 4-n-propoxyphenoxy, 4-n-propoxyphenoxy, 4-n-propoxyphenoxy, 4-n-propoxyphenoxy, 4-n-butoxy, 4-methoxyphenoxy-n-butoxy, 4-n-propoxyphenoxy-n-butoxy, 4-methoxyphenoxy-n-butoxy, 4-methoxyphenoxy-n-butoxy, 4-n-propoxy-n-butoxy, 4-methoxyphen ... 4-Methoxyphenoxy and other alkoxyaryloxy groups; aliphatic acyl groups such as formyl, acetyl, propionyl, butyryl, pentyl, hexyl, heptyl, octyl, nonyl, and decyl; aromatic acyl groups such as benzyl, α-naphthoyl, and β-naphthoyl; methoxycarbonyl, ethoxycarbonyl, n-propoxycarbonyl, n-butoxycarbonyl, n-pentyloxycarbonyl, n-hexylcarbonyl, n-heptyloxycarbonyl, n- Chain alkoxycarbonyl groups such as octyloxycarbonyl, n-nonyloxycarbonyl and n-decyloxycarbonyl; aryloxycarbonyl groups such as phenoxycarbonyl, α-naphthyloxycarbonyl and β-naphthyloxycarbonyl; aliphatic acyloxy groups such as formyloxy, acetyloxy, propionyloxy, butyryloxy, pentanoyloxy, hexanoyloxy, heptanoyloxy, octanoyloxy, nonanoyloxy and decanoyloxy; aromatic acyloxy groups such as benzyloxy, α-naphthyloxy and β-naphthyloxy.

Rb01 ~Rb018 各自獨立為選自由氫原子、鹵素原子、碳原子數1以上5以下之烷基、及碳原子數1以上5以下之烷氧基所構成群組之基較佳,就可形成特別是機械特性優異的硬化膜,更佳為Rb01 ~Rb018 全部為氫原子。It is preferred that R b01 to R b018 are each independently selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, and an alkoxy group having 1 to 5 carbon atoms, so that a cured film having particularly excellent mechanical properties can be formed. It is more preferred that all of R b01 to R b018 are hydrogen atoms.

式(b01-2)~(b01-5)中,Rb01 ~Rb018 係與式(b01-1)中之Rb01 ~Rb018 相同。式(b01-2)及式(b01-4)中,Rb02 及Rb010 彼此鍵結時,式(b01-2)中,Rb013 及Rb016 彼此鍵結時,及式(b01-3)中,Rb02 及Rb08 彼此鍵結時,所形成之2價基,可列舉例如-CH2 -、-C(CH3 )2 -。In formula (b01-2) to (b01-5), R b01 to R b018 are the same as R b01 to R b018 in formula (b01-1). When R b02 and R b010 in formula (b01-2) and formula (b01-4) are bonded to each other, when R b013 and R b016 in formula (b01-2) are bonded to each other, and when R b02 and R b08 in formula (b01-3) are bonded to each other, the divalent groups formed include, for example, -CH 2 - and -C(CH 3 ) 2 -.

式(b01-1)表示之脂環式環氧化合物之中,較佳之化合物之具體例,可列舉下述式(b01-1a)、式(b01-1b)、及式(b01-1c)表示之脂環式環氧化合物或、2,2-雙(3,4-環氧基環己烷-1-基)丙烷[=2,2-雙(3,4-環氧基環己基)丙烷]等。 Among the alicyclic epoxy compounds represented by formula (b01-1), specific examples of preferred compounds include alicyclic epoxy compounds represented by the following formulas (b01-1a), (b01-1b), and (b01-1c), or 2,2-bis(3,4-epoxycyclohexane-1-yl)propane [=2,2-bis(3,4-epoxycyclohexyl)propane], etc.

式(b01-2)表示之脂環式環氧化合物之中,較佳之化合物之具體例,可列舉下述式(b01-2a)及下述式(b01-2b)表示之脂環式環氧化合物。 Specific examples of preferred compounds among the alicyclic epoxy compounds represented by the formula (b01-2) include alicyclic epoxy compounds represented by the following formula (b01-2a) and the following formula (b01-2b).

式(b01-3)表示之脂環式環氧化合物之中,較佳之化合物之具體例,可列舉S螺[3-氧雜三環[3.2.1.02,4 ]辛烷-6,2’-環氧乙烷]等。Specific examples of preferred alicyclic epoxy compounds represented by formula (b01-3) include S-spiro[3-oxatricyclo[3.2.1.0 2,4 ]octane-6,2'-ethylene oxide] and the like.

式(b01-4)表示之脂環式環氧化合物之中,較佳之化合物之具體例,可列舉4-乙烯基二氧化環己烯、二氧化二戊烯(Dipentene dioxide)、二氧化檸檬烯、1-甲基-4-(3-甲基環氧乙烷-2-基)-7-氧雜二環[4.1.0]庚烷等。Specific examples of preferred alicyclic epoxy compounds represented by formula (b01-4) include 4-vinylcyclohexene dioxide, dipentene dioxide, limonene dioxide, 1-methyl-4-(3-methyloxiran-2-yl)-7-oxabicyclo[4.1.0]heptane, and the like.

式(b01-5)表示之脂環式環氧化合物之中,較佳之化合物之具體例,可列舉1,2,5,6-二環氧基環辛烷等。Specific examples of preferred alicyclic epoxy compounds represented by formula (b01-5) include 1,2,5,6-diepoxycyclooctane and the like.

此外,可將下述式(b1-I)表示之化合物作為陽離子硬化性化合物(B)使用。 (式(b1-I)中,Xb1 、Xb2 、及Xb3 各自獨立為氫原子、或可包含環氧基之有機基,Xb1 、Xb2 、及Xb3 所具有之環氧基之總數為2以上。)In addition, a compound represented by the following formula (b1-1) can be used as the cation-curable compound (B). (In formula (b1-I), X b1 , X b2 , and X b3 are each independently a hydrogen atom or an organic group that may contain an epoxide group, and the total number of epoxide groups contained in X b1 , X b2 , and X b3 is 2 or more.)

上述式(b1-I)表示之化合物,較佳為下述式(b1-II)表示之化合物。 (式(b1-II)中,Rb20 ~Rb22 為直鏈狀、支鏈狀或環狀之伸烷基、伸芳基、-O-、-C(=O)-、-NH-及此等之組合所構成之基,各自可相同或相異。E1 ~E3 為選自由環氧基、氧環丁基、乙烯性不飽和基、烷氧基矽基、異氰酸酯基、封閉異氰酸酯基、硫醇基、羧基、羥基及琥珀酸酐基所構成群組之至少1種的取代基或氫原子。但是E1 ~E3 之中至少2個為選自由環氧基及氧環丁基所構成群組之至少1種。)The compound represented by the above formula (b1-I) is preferably a compound represented by the following formula (b1-II). (In formula (b1-II), Rb20 to Rb22 are linear, branched or cyclic alkylene groups, arylene groups, -O-, -C(=O)-, -NH- and combinations thereof, and may be the same or different. E1 to E3 are at least one substituent selected from the group consisting of an epoxide group, an oxobutyl group, an ethylenically unsaturated group, an alkoxysilyl group, an isocyanate group, a blocked isocyanate group, a thiol group, a carboxyl group, a hydroxyl group and a succinic anhydride group, or a hydrogen atom. However, at least two of E1 to E3 are at least one substituent selected from the group consisting of an epoxide group and an oxobutyl group.)

式(b1-II)中,Rb20 與E1 、Rb21 與E2 、及Rb22 與E3 表示之基,例如至少2個各自為下述式(b1-IIa)表示之基較佳,其中之一各自為下述式(b1-IIa)表示之基更佳。與1個化合物鍵結之複數之式(b1-IIa)表示之基,較佳為相同之基。 (式(b1-IIa)中,L為直鏈狀、支鏈狀或環狀之伸烷基、伸芳基、-O-、-C(=O)-、-NH-及此等之組合所構成之基,Cb 為環氧基。式(b1-IIa)中,L與Cb 鍵結,可形成環狀結構。)In formula (b1-II), the groups represented by R b20 and E 1 , R b21 and E 2 , and R b22 and E 3 are preferably at least two groups each represented by the following formula (b1-IIa), and more preferably at least one group each represented by the following formula (b1-IIa). The groups represented by the formula (b1-IIa) bonded to one compound are preferably the same group. (In formula (b1-IIa), L is a linear, branched or cyclic alkylene group, arylene group, -O-, -C(=O)-, -NH- or a combination thereof, and Cb is an epoxide group. In formula (b1-IIa), L and Cb are bonded to form a ring structure.)

式(b1-IIa)中,作為L之直鏈狀、支鏈狀或環狀之伸烷基,較佳為碳原子數1以上10以下的伸烷基,又,作為L之伸芳基,較佳為碳原子數5以上10以下的伸芳基。式(b1-IIa)中,L較佳為直鏈狀之碳原子數為1以上3以下的伸烷基、伸苯基、-O-、-C(=O)-、-NH-及此等之組合所構成之基,伸甲基等之直鏈狀之碳原子數為1以上3以下的伸烷基及伸苯基之至少1種、或此等與-O-、-C(=O)-及NH-之至少1種之組合所構成之基。In the formula (b1-IIa), the linear, branched or cyclic alkylene group as L is preferably an alkylene group having 1 to 10 carbon atoms, and the arylene group as L is preferably an arylene group having 5 to 10 carbon atoms. In the formula (b1-IIa), L is preferably a linear alkylene group having 1 to 3 carbon atoms, a phenylene group, -O-, -C(=O)-, -NH-, and a combination thereof, at least one of a linear alkylene group having 1 to 3 carbon atoms such as a methylene group and a phenylene group, or a combination thereof with at least one of -O-, -C(=O)-, and NH-.

式(b1-IIa)中,L與Cb 鍵結,形成環狀結構時,例如,支鏈狀之伸烷基與環氧基鍵結,形成環狀結構(具有脂環結構之環氧基之結構)時,可列舉下述式(b1-IIb)~(b1-IId)表示之有機基。 (式(b1-IIb)中,Rb23 為氫原子或甲基。)In formula (b1-IIa), when L and C b are bonded to form a cyclic structure, for example, when a branched alkylene group and an epoxy group are bonded to form a cyclic structure (a structure of an epoxy group having an alicyclic structure), the following organic groups represented by formulas (b1-IIb) to (b1-IId) can be listed. (In formula (b1-IIb), R b23 is a hydrogen atom or a methyl group.)

以下,式(b1-II)表示之化合物之例,可列舉具有環氧乙基、或脂環式環氧基之環氧化合物之例,但是不限定於此等。 Hereinafter, examples of the compound represented by formula (b1-II) include epoxy compounds having an ethylene oxide group or an alicyclic epoxy group, but are not limited thereto.

又,分子內具有2以上之縮水甘油基的矽氧烷化合物(以下有時僅稱為「矽氧烷化合物」)可適合作為陽離子硬化性化合物(B)使用。Furthermore, a siloxane compound having two or more glycidyl groups in the molecule (hereinafter sometimes simply referred to as a "silicone compound") can be suitably used as the cationic curable compound (B).

矽氧烷化合物係在分子內具有由矽氧烷鍵(Si-O-Si)所構成之矽氧烷骨架與2以上之縮水甘油基的化合物。 矽氧烷化合物中之矽氧烷骨架,可列舉例如環狀矽氧烷骨架或籠型或梯型之聚倍半矽氧烷骨架。Siloxane compounds are compounds that have a siloxane skeleton composed of siloxane bonds (Si-O-Si) and two or more glycidyl groups in the molecule. The siloxane skeleton in the siloxane compound can be, for example, a cyclic siloxane skeleton or a cage-type or ladder-type polysilsesquioxane skeleton.

作為矽氧烷化合物,其中較佳為具有下述式(b1-III)表示之環狀矽氧烷骨架的化合物(以下有時稱為「環狀矽氧烷」)。 As the siloxane compound, a compound having a cyclosiloxane skeleton represented by the following formula (b1-III) (hereinafter sometimes referred to as "cyclosiloxane") is preferred.

式(b1-III)中,Rb24 、及Rb25 表示含有環氧基之1價基或烷基。但是式(b1-III)表示之化合物中之x1個Rb24 及x1個Rb25 之中,至少2個為含有環氧基之1價基。又,式(b1-III)中之x1表示3以上之整數。又,式(b1-III)表示之化合物中之Rb24 、Rb25 可相同或相異。又,複數之Rb24 可相同或相異。複數之Rb25 可相同或相異。 作為上述烷基,可列舉例如甲基、乙基、丙基、異丙基等之碳原子數為1以上18以下的(較佳為碳原子數1以上6以下,特佳為碳原子數1以上3以下)直鏈狀或分枝鏈狀之烷基。In formula (b1-III), R b24 and R b25 represent a monovalent group or an alkyl group containing an epoxy group. However, among x1 R b24 and x1 R b25 in the compound represented by formula (b1-III), at least 2 are monovalent groups containing an epoxy group. In addition, x1 in formula (b1-III) represents an integer greater than 3. In addition, R b24 and R b25 in the compound represented by formula (b1-III) may be the same or different. In addition, a plurality of R b24 may be the same or different. A plurality of R b25 may be the same or different. As the above-mentioned alkyl group, there can be listed a linear or branched chain alkyl group having 1 to 18 carbon atoms (preferably 1 to 6 carbon atoms, particularly preferably 1 to 3 carbon atoms), such as methyl, ethyl, propyl, isopropyl, etc.

式(b1-III)中之x1表示3以上之整數,其中就形成硬化膜時之交聯反應性優異的觀點,較佳為3以上6以下之整數。In formula (b1-III), x1 represents an integer greater than or equal to 3, and is preferably an integer greater than or equal to 3 and less than or equal to 6 from the viewpoint of excellent crosslinking reactivity when a cured film is formed.

矽氧烷化合物在分子內所具有之環氧基之數為2個以上,就形成硬化膜時之交聯反應性優異的觀點,較佳為2個以上6個以下,特佳為2個以上4個以下。The number of epoxy groups in the siloxane compound in the molecule is 2 or more, preferably 2 or more and 6 or less, and particularly preferably 2 or more and 4 or less, from the viewpoint of excellent cross-linking reactivity when forming a cured film.

含有上述環氧基之1價基,較佳為脂環式環氧基、及-DB -O-Rb26 表示之縮水甘油醚基[DB 表示伸烷基,Rb26 表示縮水甘油基],更佳為脂環式環氧基,又更佳為下述式(b1-IIIa)或下述式(b1-IIIb)表示之脂環式環氧基。作為上述DB (伸烷基),可列舉例如伸甲基、甲基伸甲基、二甲基伸甲基、二伸甲基、伸丙基等之碳原子數為1以上18以下之直鏈狀或支鏈狀之伸烷基等。 (上述式(b1-IIIa)及式(b1-IIIb)中,D1 及D2 各自獨立表示伸烷基,ms表示0以上2以下之整數。)The monovalent group containing the above-mentioned epoxide group is preferably an alicyclic epoxide group and a glycidyl ether group represented by -DB - ORb26 [ DB represents an alkylene group, and Rb26 represents a glycidyl group], more preferably an alicyclic epoxide group, and still more preferably an alicyclic epoxide group represented by the following formula (b1-IIIa) or the following formula (b1-IIIb). Examples of the above-mentioned DB (alkylene group) include linear or branched alkylene groups having 1 to 18 carbon atoms, such as methylene, methylmethylene, dimethylmethylene, dimethylene, and propylene. (In the above formula (b1-IIIa) and formula (b1-IIIb), D1 and D2 each independently represent an alkylene group, and ms represents an integer of 0 or more and 2 or less.)

硬化性組成物,作為陽離子硬化性化合物(B)除了式(b1-III)表示之矽氧烷化合物外,也可含有含脂環式環氧基之環狀矽氧烷、日本特開2008-248169號公報所記載之含脂環式環氧基之聚矽氧樹脂、及日本特開2008-19422號公報所記載之1分子中具有至少2個環氧基官能性基之有機聚倍半矽氧烷樹脂等之具有矽氧烷骨架的化合物。The curable composition may contain, as the cationic curable compound (B), in addition to the siloxane compound represented by the formula (b1-III), a compound having a siloxane skeleton such as an alicyclic epoxy group-containing cyclosiloxane, an alicyclic epoxy group-containing polysiloxane resin described in Japanese Patent Application Publication No. 2008-248169, and an organic polysilsesquioxane resin having at least two epoxy functional groups in one molecule described in Japanese Patent Application Publication No. 2008-19422.

矽氧烷化合物,更具體而言,可列舉下述式表示之分子內具有2個以上之縮水甘油基之環狀矽氧烷等。又,作為矽氧烷化合物,例如可使用商品名「X-40-2670」、「X-40-2701」、「X-40-2728」、「X-40-2738」、「X-40-2740」(以上、信越化學工業公司製)等之市售品。More specifically, the siloxane compound includes cyclosiloxanes having two or more glycidyl groups in the molecule represented by the following formula. As the siloxane compound, for example, commercial products such as "X-40-2670", "X-40-2701", "X-40-2728", "X-40-2738", and "X-40-2740" (all manufactured by Shin-Etsu Chemical Co., Ltd.) can be used.

<其他的成分> 硬化性組成物,必要時可含有交聯劑(例如,也包含後述之P1或P2等)、增感劑、界面活性劑、熱聚合抑制劑、消泡劑、矽烷偶合劑、著色劑(顏料、染料)、無機填料、有機填料等之添加劑。所有的添加劑可使用以往公知的添加劑。 又,硬化性組成物實質上由非聚合物成分所構成,在不損及本發明效果之範圍,可包含聚合物(環氧樹脂等之公知的熱硬化性樹脂、熱塑性樹脂、鹼可溶性樹脂等)。聚合物之含量係相對於硬化性組成物之固體成分全體,例如為0質量%以上5質量%以下。<Other ingredients> The curable composition may contain additives such as crosslinking agents (for example, including P1 or P2 described below), sensitizers, surfactants, thermal polymerization inhibitors, defoaming agents, silane coupling agents, coloring agents (pigments, dyes), inorganic fillers, organic fillers, etc., if necessary. All additives can use conventionally known additives. In addition, the curable composition is substantially composed of non-polymer components, and may contain polymers (known thermosetting resins such as epoxy resins, thermoplastic resins, alkali-soluble resins, etc.) within the scope that does not impair the effect of the present invention. The content of the polymer is relative to the total solid components of the curable composition, for example, 0 mass% or more and 5 mass% or less.

作為增感劑,無特別限制使用以往與各種陽離子聚合起始劑併用之公知的增感劑。 增感劑之具體例,可列舉蒽、9,10-二丁氧基蒽、9,10-二甲氧基蒽、9,10-二乙氧基蒽、2-乙基-9,10-二甲氧基蒽、及9,10-二丙氧基蒽等之蒽化合物;芘;1,2-苯并蒽;苝;稠四苯; 暈苯(coronene);噻噸酮、2-甲硫基呫噸酮、2-乙硫基呫噸酮、2-氯噻噸酮、2-異丙基噻噸酮及2,4-二乙硫基呫噸酮等之噻噸酮化合物;吩噻嗪、N-甲基吩噻嗪、N-乙基吩噻嗪、及N-苯基吩噻嗪等之吩噻嗪化合物;呫噸酮;1-萘酚、2-萘酚、1-甲氧基萘、2-甲氧基萘、1,4-二羥基萘、及4-甲氧基-1-萘酚等之萘化合物;二甲氧基苯乙酮、二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、4’-異丙基-2-羥基-2-甲基苯丙酮、及4-苯甲醯基-4’-甲基二苯硫醚等之酮;N-苯基咔唑、N-乙基咔唑、聚-N-乙烯基咔唑、及N-縮水甘油基咔唑等之咔唑化合物;1,4-二甲氧基稠二萘及1,4-二-α-甲基苄氧基稠二萘等之稠二萘化合物;9-羥基菲、9-甲氧基菲、9-羥基-10-甲氧基菲、及9-羥基-10-乙氧基菲等之菲化合物。 此等增感劑可組合2種以上使用。 增感劑之使用量無特別限定,相對於能量敏感性硬化劑(A)100質量份,較佳為1質量份以上300質量份以下,更佳為5質量份以上200質量份以下。藉由使用此範圍之增感劑,可容易得到所期望之增感作用。As the sensitizer, there is no particular limitation on the use of known sensitizers that have been used in combination with various cationic polymerization initiators. Specific examples of sensitizers include anthracene compounds such as anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, and 9,10-dipropoxyanthracene; pyrene; 1,2-benzanthracene; perylene; tetraphenylene; coronene; thiothione compounds such as thiothione, 2-methylthiothione, 2-ethylthiothione, 2-chlorothiothione, 2-isopropylthiothione and 2,4-diethylthiothione; phenothiazine compounds such as phenothiazine, N-methylphenothiazine, N-ethylphenothiazine and N-phenylphenothiazine; xanthenes; naphthalene compounds such as 1-naphthol, 2-naphthol, 1-methoxynaphthalene, 2-methoxynaphthalene, 1,4-dihydroxynaphthalene and 4-methoxy-1-naphthol; dimethoxyacetophenone, diethoxyacetophenone, 2-hydroxy -2-methyl-1-phenylpropane-1-one, 4'-isopropyl-2-hydroxy-2-methylpropiophenone, and 4-benzoyl-4'-methyldiphenyl sulfide; carbazole compounds such as N-phenylcarbazole, N-ethylcarbazole, poly-N-vinylcarbazole, and N-glycidylcarbazole; fused dinaphthalene compounds such as 1,4-dimethoxyfused dinaphthalene and 1,4-di-α-methylbenzyloxyfused dinaphthalene; phenanthrene compounds such as 9-hydroxyphenanthrene, 9-methoxyphenanthrene, 9-hydroxy-10-methoxyphenanthrene, and 9-hydroxy-10-ethoxyphenanthrene. These sensitizers can be used in combination of two or more. The amount of the sensitizer used is not particularly limited, but is preferably 1 to 300 parts by mass, more preferably 5 to 200 parts by mass, relative to 100 parts by mass of the energy-sensitive hardener (A). By using a sensitizer within this range, the desired sensitization effect can be easily obtained.

作為界面活性劑,可列舉陰離子系、陽離子系、非離子系等之化合物,作為熱聚合抑制劑,可列舉對苯二酚、對苯二酚單乙醚等,作為消泡劑,可列舉聚矽氧系、氟系化合物等。 又,硬化性組成物在不阻礙本發明之目的之範圍,也可含有在芳香族基上不具有乙烯氧基之乙烯醚化合物或環氧化合物等之芳香族乙烯醚化合物(B)以外的聚合性化合物。As surfactants, anionic, cationic, and nonionic compounds can be cited, as thermal polymerization inhibitors, hydroquinone, hydroquinone monoethyl ether, etc. can be cited, and as defoamers, silicone and fluorine compounds can be cited. In addition, the curable composition may contain a polymerizable compound other than an aromatic vinyl ether compound (B) such as a vinyl ether compound or an epoxy compound that does not have a vinyloxy group on the aromatic group, within the scope that does not hinder the purpose of the present invention.

本實施形態中,對於硬化物使高折射率化的觀點,可列舉使硬化性組成物含有含環氧基之茀化合物之較佳態樣之一。典型而言,更佳為包含9,9-雙(縮水甘油氧基萘基)茀類之下述式(P1)表示之化合物。In this embodiment, from the viewpoint of increasing the refractive index of the cured product, one of the preferred aspects is that the curable composition contains a fluorene compound containing an epoxy group. Typically, a compound represented by the following formula (P1) containing 9,9-bis(glycidyloxynaphthyl)fluorene is more preferred.

(式(P1)中,環ZP1 表示縮合多環式芳香族烴環,RP1 及RP2 表示取代基,RP3 表示氫原子或甲基,k1為0以上4以下之整數,k2為0以上之整數,k3為1以上之整數。) (In formula (P1), ring Z P1 represents a condensed polycyclic aromatic hydrocarbon ring, R P1 and R P2 represent substituents, R P3 represents a hydrogen atom or a methyl group, k1 is an integer of 0 to 4, k2 is an integer of 0 to 0, and k3 is an integer of 1 to 1.)

上述式(P1)中,環ZP1 表示之縮合多環式芳香族烴環,可列舉縮合二環式烴環(例如,茚環、萘環等之C8~C20縮合二環式烴環,較佳為C10~C16縮合二環式烴環)、縮合三環式烴環(例如,蒽環、菲環等)等之縮合二~四環式烴環等。較佳的縮合多環式芳香族烴環,可列舉萘環、蒽環等,特佳為萘環。又,在茀之9位進行取代之2個環ZP1 可相同或相異的環,通常可為相同的環。In the above formula (P1), the condensed polycyclic aromatic hydrocarbon ring represented by ring Z P1 includes condensed bicyclic hydrocarbon rings (for example, C8-C20 condensed bicyclic hydrocarbon rings such as indene ring and naphthyl ring, preferably C10-C16 condensed bicyclic hydrocarbon rings), condensed tricyclic hydrocarbon rings (for example, anthracene ring and phenanthrene ring), and condensed bi- to tetracyclic hydrocarbon rings. Preferred condensed polycyclic aromatic hydrocarbon rings include naphthyl ring and anthracene ring, and naphthyl ring is particularly preferred. Furthermore, the two rings Z P1 substituted at the 9-position of fluorene may be the same or different rings, and may usually be the same ring.

又,在茀之9位進行取代之環ZP1 之取代位置,無特別限定,例如,在茀之9位進行取代之萘基,可為1-萘基、2-萘基等,特佳為2-萘基。The substitution position of the ring Z P1 substituted at the 9-position of fluorene is not particularly limited. For example, the naphthyl substituted at the 9-position of fluorene may be 1-naphthyl, 2-naphthyl, etc., and is particularly preferably 2-naphthyl.

又,上述式(P1)中,RP1 表示之取代基,可列舉例如氰基、鹵素原子(氟原子、氯原子、溴原子等)、烴基[例如,烷基、芳基(苯基等之C6~C10芳基)等]等之非反應性取代基,特別是鹵素原子、氰基或烷基(特別是烷基)的情形較多。作為烷基,可列舉甲基、乙基、丙基、異丙基、丁基、t-丁基等之C1~C6烷基(例如,C1~C4烷基,特別是甲基)等。又,k1為複數(2以上)時,RP1 彼此可不同或相同。又,在構成茀(或茀骨架)之2個苯環上取代之RP1 ,可相同或不同。又,相對於構成茀之苯環之RP1 之鍵結位置(取代位置),無特別限定。較佳的k1為0或1,特別是0。又,構成茀之2個苯環中,k1彼此可相同或相異。In the above formula (P1), the substituent represented by R P1 includes, for example, a non-reactive substituent such as a cyano group, a halogen atom (fluorine atom, chlorine atom, bromine atom, etc.), a alkyl group [e.g., an alkyl group, an aryl group (C6-C10 aryl group such as phenyl), etc.], and in particular, a halogen atom, a cyano group or an alkyl group (especially an alkyl group) is more common. As the alkyl group, a C1-C6 alkyl group (e.g., a C1-C4 alkyl group, especially a methyl group) such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a t-butyl group, etc. can be listed. In addition, when k1 is a plural number (2 or more), R P1 may be different or the same. In addition, R P1 substituted on two benzene rings constituting fluorene (or a fluorene skeleton) may be the same or different. The bonding position (substitution position) of R P1 with respect to the benzene ring constituting fluorene is not particularly limited. Preferred k1 is 0 or 1, particularly 0. In the two benzene rings constituting fluorene, k1 may be the same or different.

環ZP1 所取代之RP2 ,可列舉例如烷基(例如,甲基、乙基、丙基、異丙基、丁基等之C1~C12烷基,較佳為C1~C8烷基,又更佳為C1~C6烷基等)、環烷基(例如,環己基等之C5~C8環烷基,較佳為C5~C6環烷基等)、芳基(例如,苯基、甲苯基、二甲苯基等之C6~C14芳基,較佳為C6~C10芳基,又更佳為C6~C8芳基等)、芳烷基(例如,苄基、苯乙基等之C6~C10芳基與C1~C4烷基鍵結所成之芳烷基等)等之烴基;烷氧基(例如,甲氧基等之C1~C8烷氧基,較佳為C1~C6烷氧基等)、環烷氧基(C5~C10環烷氧基等)、芳氧基(C6~C10芳氧基等)等之基-ORP4 [式中,RP4 表示烴基(上述例示之烴基等)];烷硫基(例如,甲硫基等之C1~C8烷硫基,較佳為C1~C6烷硫基等)等之基-SRP4 (式中,RP4 係與上述相同);醯基(例如,乙醯基等之C1~C6醯基等);烷氧基羰基(例如,甲氧基羰基等之C1~C4烷氧基與羰基鍵結而成的烷氧基羰基等);鹵素原子(氟原子、氯原子、溴原子、碘原子等);羥基;硝基;氰基;取代胺基(例如,二甲基胺基等之二烷基胺基等)等。R P2 substituted by ring Z P1 may be, for example, an alkyl group (e.g., a C1-C12 alkyl group such as methyl, ethyl, propyl, isopropyl, butyl, etc., preferably a C1-C8 alkyl group, and more preferably a C1-C6 alkyl group), a cycloalkyl group (e.g., a C5-C8 cycloalkyl group such as cyclohexyl, preferably a C5-C6 cycloalkyl group), an aryl group (e.g., a C6-C14 aryl group such as phenyl, tolyl, xylyl, etc., preferably a C6-C10 aryl group), or a cycloalkyl group (e.g., a C5-C8 cycloalkyl group such as cyclohexyl, preferably a C5-C6 cycloalkyl group). -OR -SR P4 (wherein R P4 is the same as above); an alkylthio group (e.g., a C1-C8 alkylthio group such as a methylthio group , preferably a C1-C6 alkylthio group, etc.); an acyl group (e.g., a C1-C6 acyl group such as an acetyl group ); an alkoxycarbonyl group (e.g., an alkoxycarbonyl group formed by bonding a C1-C4 alkoxy group such as a methoxycarbonyl group to a carbonyl group); a halogen atom (a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc.); a hydroxyl group; a nitro group; a cyano group; a substituted amino group (e.g., a dialkylamino group such as a dimethylamino group, etc.); and the like.

此等之中,RP2 較佳為烴基、烷氧基、環烷氧基、芳氧基、芳烷基氧基、醯基、鹵素原子、硝基、氰基、取代胺基等,特佳之RP2 為烴基[例如、烷基(例如,C1~C6烷基)]、烷氧基(C1~C4烷氧基等)、鹵素原子(氟原子、氯原子、溴原子、碘原子等)等。Among these, R P2 is preferably a alkyl group, an alkoxy group, a cycloalkoxy group, an aryloxy group, an aralkyloxy group, an acyl group, a halogen atom, a nitro group, a cyano group, a substituted amino group, etc., and particularly preferably R P2 is a alkyl group [e.g., an alkyl group (e.g., a C1~C6 alkyl group)], an alkoxy group (C1~C4 alkoxy group, etc.), a halogen atom (fluorine atom, chlorine atom, bromine atom, iodine atom, etc.), etc.

又,相同之環ZP1 中,k2為複數(2以上)時,RP2 彼此可相異或相同。又,2個環ZP1 中,RP2 可相同或相異。又,較佳的k2為0以上8以下,較佳為0以上6以下(例如,1以上5以下),又更佳為0以上4以下,特別是0以上2以下(例如,0或1)。又,2個環ZP1 中,k2彼此可相同或相異。Furthermore, in the same ring Z P1 , when k2 is plural (2 or more), R P2 may be different or the same. Furthermore, in two rings Z P1 , R P2 may be the same or different. Furthermore, k2 is preferably 0 to 8, preferably 0 to 6 (for example, 1 to 5), more preferably 0 to 4, particularly 0 to 2 (for example, 0 or 1). Furthermore, in two rings Z P1 , k2 may be the same or different.

又,上述式(P1)中,RP3 為氫原子或甲基,較佳的RP3 為氫原子。In the above formula (P1), RP3 is a hydrogen atom or a methyl group, preferably RP3 is a hydrogen atom.

上述式(P1)中,k3為1以上即可,例如,1以上4以下,較佳為1以上3以下,又更佳為1或2,特別是1。又,k3在各自之環ZP1 中,可相同或相異,通常相同的情形較多。又,含環氧基之基之取代位置,無特別限定,環ZP1 之適當的取代位置進行取代即可。特別是含環氧基之基在縮合多環式烴環中,至少取代為與在茀之9位所鍵結之烴環不同之另外的烴環(例如,萘環之5位、6位等)的情形較多。In the above formula (P1), k3 may be 1 or more, for example, 1 or more and 4 or less, preferably 1 or more and 3 or less, further preferably 1 or 2, and particularly 1. Moreover, k3 may be the same or different in each ring Z P1 , and is usually the same in many cases. Moreover, the substitution position of the epoxy-containing group is not particularly limited, and the group may be substituted at an appropriate substitution position of the ring Z P1 . In particular, the epoxy-containing group is often substituted with at least another hydrocarbon ring different from the hydrocarbon ring bonded to the 9-position of fluorene (for example, the 5-position, 6-position of the naphthyl ring, etc.) in the condensed polycyclic hydrocarbon ring.

上述式(P1)表示之具體的化合物,可列舉例如9,9-雙(縮水甘油氧基萘基)茀[例如,9,9-雙(6-縮水甘油氧基-2-萘基)茀、9,9-雙(5-縮水甘油氧基-1-萘基)茀等]等之上述式(P1)中,k3為1的化合物等。Specific compounds represented by the above formula (P1) include, for example, 9,9-bis(glycidyloxynaphthyl)fluorene [e.g., 9,9-bis(6-glycidyloxy-2-naphthyl)fluorene, 9,9-bis(5-glycidyloxy-1-naphthyl)fluorene, etc.], and compounds wherein k3 is 1 in the above formula (P1).

又,本實施形態,對於硬化物使高折射率化的觀點,可列舉使硬化性組成物含有含羥基之茀化合物之較佳之態樣之一。典型而言,包含下述式(P2)表示之化合物為佳。 式(P2)中,RP1 、RP2 、ZP1 、k1、k2、及k3係與式(P1)相同。 In this embodiment, from the viewpoint of increasing the refractive index of the cured product, one of the preferred aspects is that the curable composition contains a hydroxyl-containing fluorene compound. Typically, it is preferred to contain a compound represented by the following formula (P2). In formula (P2), R P1 , R P2 , Z P1 , k1, k2, and k3 are the same as those in formula (P1).

<溶劑(S)> 硬化性組成物為了塗佈性或黏度調整之目的,較佳為包含溶劑(S)。溶劑(S)典型上可使用有機溶劑。有機溶劑之種類,只要是可將感能量性組成物所含有的成分均勻地溶解或分散時,即無特別限定。硬化性組成物包含溶劑(S)時,硬化性組成物之固體成分濃度,例如為0.1質量%以上50質量%以下,較佳為0.5質量%以上30質量%以下。藉由設為上述範圍,塗佈性或操作性變得良好。<Solvent (S)> For the purpose of coating or viscosity adjustment, the curable composition preferably contains a solvent (S). Typically, an organic solvent can be used as the solvent (S). The type of organic solvent is not particularly limited as long as it can uniformly dissolve or disperse the components contained in the energy-sensitive composition. When the curable composition contains a solvent (S), the solid component concentration of the curable composition is, for example, 0.1 mass % to 50 mass %, preferably 0.5 mass % to 30 mass %. By setting it within the above range, coating or handling becomes good.

可作為溶劑(S)使用之有機溶劑之較佳之例,可列舉乙二醇單甲醚、乙二醇單乙醚、乙二醇-n-丙醚、乙二醇單-n-丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單-n-丙醚、二乙二醇單-n-丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單-n-丙醚、丙二醇單-n-丁醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單-n-丙醚、二丙二醇單-n-丁醚、三丙二醇單甲醚、三丙二醇單乙醚等之(聚)伸烷二醇單烷醚類;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯等之(聚)伸烷二醇單烷醚乙酸酯類;二乙二醇二甲醚、二乙二醇甲基乙醚、二乙二醇二乙醚、四氫呋喃等之其他的醚類;甲基乙基酮、環己酮、2-庚酮、3-庚酮等之酮類;2-羥基丙酸甲酯、2-羥基丙酸乙酯等之乳酸烷基酯類;2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基丁酸甲酯、3-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基丙酸酯、乙酸乙酯、乙酸n-丙酯、乙酸異丙基、乙酸n-丁酯、乙酸異丁酯、甲酸n-戊酯、乙酸異戊酯、丙酸n-丁酯、丁酸乙酯、丁酸n-丙酯、丁酸異丙酯、丁酸n-丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸n-丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧代丁酸乙酯等之其他的酯類;甲苯、二甲苯等之芳香族烴類;N-甲基吡咯烷酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等之醯胺類等。此等有機溶劑,可單獨使用或組合2種以上使用。Preferred examples of organic solvents that can be used as the solvent (S) include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol-n-propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono- (Poly) alkylene glycol monoalkyl ethers such as n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether, etc.; (Poly) alkylene glycol monoalkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, etc.; other ethers such as diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran, etc.; methyl ethyl ketone, cyclopentane Ketones such as hexanone, 2-heptanone, 3-heptanone; alkyl lactates such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-acetic acid Propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, methyl pyruvate, ethyl pyruvate, n-propyl pyruvate, methyl acetylacetate, ethyl acetylacetate, ethyl 2-oxobutyrate and other esters; aromatic hydrocarbons such as toluene and xylene; amides such as N-methylpyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, etc. These organic solvents may be used alone or in combination of two or more.

硬化性組成物在不損及本發明效果的範圍內,也可含有高沸點溶劑。高沸點溶劑係指大氣壓下之沸點為180℃以上的溶劑。The curable composition may contain a high boiling point solvent within the range that does not impair the effect of the present invention. A high boiling point solvent refers to a solvent having a boiling point of 180°C or higher under atmospheric pressure.

作為高沸點溶劑,適宜選自烴類、醇類、酮類、酯類、醚類、氯系溶劑等之中即可,可列舉例如1-辛醇、2-乙基己醇、1-壬醇、1-癸醇、1-十一烷醇、乙二醇、1,2-丙二醇、1,3-丁二醇、2,4-戊二醇、2-甲基-2,4-戊二醇、2,5-己二醇、2,4-庚二醇、2-乙基-1,3-己二醇、二乙二醇、二丙二醇、三乙二醇、三丙二醇、丙三醇、乙酸n-壬酯、單己醚、乙二醇單-2-乙基己醚、乙二醇單苯醚、乙二醇單苄醚、二乙二醇單乙醚、二乙二醇單異丙醚、二乙二醇單-n-丁醚、二乙二醇單異丁醚、二乙二醇單己醚、二乙二醇單苯醚、二乙二醇單苄醚、二乙二醇二乙醚、二乙二醇二丁醚、二乙二醇丁基甲醚、三乙二醇二甲醚、三乙二醇單甲醚、三乙二醇-n-丁醚、三乙二醇丁基甲醚、四乙二醇二甲醚、二丙二醇單甲醚、二丙二醇單-n-丙醚、二丙二醇單-n-丁醚、三丙二醇二甲醚、三丙二醇單甲醚、三丙二醇單-n-丙醚、三丙二醇單-n-丁醚、乙二醇單乙醚乙酸酯、乙二醇單丁醚乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、二乙二醇單丁醚乙酸酯、三乙酸甘油酯(triacetin)、丙二醇二乙酸酯、二丙二醇甲基-n-丙醚、二丙二醇甲醚乙酸酯、1,4-丁二醇二乙酸酯、1,3-丁二醇二乙酸酯、1,6-己二醇二乙酸酯、γ-丁內酯等,此等可單獨使用或混合使用。高沸點溶劑之含量係相對於溶劑成分全體,例如在0質量%以上25質量%以下之範圍調製即可,較佳為0質量%以上10質量%以下。The high boiling point solvent may be appropriately selected from hydrocarbons, alcohols, ketones, esters, ethers, chlorine-based solvents, and the like, and examples thereof include 1-octanol, 2-ethylhexanol, 1-nonanol, 1-decanol, 1-undecanol, ethylene glycol, 1,2-propylene glycol, 1,3-butanediol, 2,4-pentanediol, 2-methyl-2,4-pentanediol, 2,5-hexanediol, 2,4-heptanediol, 2-ethyl-1,3-hexanediol, 1,2-diol, 1,3-butanediol, 2,4-pentanediol, 2-methyl-2,4-pentanediol, 2,5-hexanediol, 2,4-heptanediol, 2-ethyl-1,3-hexanediol, 1,2-diol, 1,3-butanediol, 1,2-diol, 1,3-hexane ... Alcohol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol, glycerol, n-nonyl acetate, monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, ethylene glycol monophenyl ether, ethylene glycol monobenzyl ether, diethylene glycol monoethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol mono-n-butyl ether, diethylene glycol monoisobutyl ether, diethylene glycol monohexyl ether, diethylene glycol monophenyl ether, diethylene glycol monobenzyl ether, diethylene glycol diethyl ether, diethylene glycol dibutyl ether , diethylene glycol butyl methyl ether, triethylene glycol dimethyl ether, triethylene glycol monomethyl ether, triethylene glycol-n-butyl ether, triethylene glycol butyl methyl ether, tetraethylene glycol dimethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol dimethyl ether, tripropylene glycol monomethyl ether, tripropylene glycol mono-n-propyl ether, tripropylene glycol mono-n-butyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate Ester, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, triacetin, propylene glycol diacetate, dipropylene glycol methyl-n-propyl ether, dipropylene glycol methyl ether acetate, 1,4-butanediol diacetate, 1,3-butanediol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, etc., which can be used alone or in combination. The content of the high boiling point solvent is relative to the total solvent component, for example, it can be prepared in the range of 0 mass% to 25 mass%, preferably 0 mass% to 10 mass%.

≪硬化性組成物之製造方法≫ 藉由將以上說明之各成分以特定比率均勻地混合,可製造硬化性組成物。必要時,為了去除不溶性的異物,可使用具有所期望大小之開口的過濾器,過濾硬化性組成物。≪Method for producing a hardening composition≫ The hardening composition can be produced by uniformly mixing the above-described components at a specific ratio. If necessary, the hardening composition can be filtered using a filter having an opening of a desired size to remove insoluble foreign matter.

≪硬化物之形成方法≫ 硬化物的形成方法,只要是可使成形為所期望之形狀之前述硬化性組成物硬化的方法時,即無特別限定。硬化性組成物包含光酸產生劑(A1)及熱酸產生劑(A2)。因此,通常,形成硬化物時,對硬化性組成物,施加曝光及加熱。≪Method for forming a hardened product≫ The method for forming a hardened product is not particularly limited as long as it is a method for hardening the hardening composition described above to form a desired shape. The hardening composition includes a photoacid generator (A1) and a thermal acid generator (A2). Therefore, usually, when forming a hardened product, exposure and heating are applied to the hardening composition.

硬化組成物之成形體的形狀無特別限定,將熱對成形體容易均勻地施加,或使曝光光源對成形體容易均勻地照射,故膜(薄膜)為佳。The shape of the molded body of the cured composition is not particularly limited, but a film (thin film) is preferred because it is easy to uniformly apply heat to the molded body or to uniformly irradiate the molded body with an exposure light source.

以下說明,將硬化物作為硬化膜製造方法的典型例。 首先,在玻璃基板等之基板上,塗佈硬化性組成物,形成塗佈膜。作為塗佈方法,可列舉輥塗佈機、逆輥塗佈機、塗佈棒等之接觸轉印型塗佈裝置或、旋轉器(旋轉式塗佈裝置)、狹縫式塗佈機、淋幕式平面塗佈機等之使用非接觸型塗佈裝置的方法。 又,將硬化性組成物之黏度調整為適當的範圍,藉由噴墨法、網版印刷法等之印刷法塗佈硬化性組成物,形成圖型化成所期望之形狀的塗佈膜。The following description uses a typical example of a method for producing a cured film using a cured product. First, a curable composition is applied to a substrate such as a glass substrate to form a coating film. As coating methods, there are methods using contact transfer coating devices such as a roll coater, a reverse roll coater, and a coating rod, or methods using non-contact coating devices such as a rotator (rotary coating device), a slit coater, and a curtain-type flat coater. The viscosity of the curable composition is adjusted to an appropriate range, and the curable composition is applied by a printing method such as an inkjet method or a screen printing method to form a coating film patterned into a desired shape.

接著,必要時,去除溶劑(S)等之揮發成分,使塗佈膜乾燥。乾燥方法無特別限定,可列舉例如使用真空乾燥裝置(VCD),在室溫下減壓乾燥,然後,在加熱板上,以80℃以上120℃以下,較佳為90℃以上100℃以下的溫度,在60秒以上120秒以下之範圍內的時間進行乾燥的方法。 如此,形成塗佈膜後,對於塗佈膜施予曝光及加熱。 照射準分子雷射光等之活性能量線,進行曝光。照射之能量線量係因硬化性組成物之組成而異,例如較佳為10mJ/cm2 以上2000mJ/cm2 以下,更佳為30mJ/cm2 以上1500mJ/cm2 以下,又更佳為50mJ/cm2 以上1200mJ/cm2 以下。 進行加熱時之溫度無特別限定,較佳為120℃以上280℃以下,更佳為150℃以上260℃以下,特佳為200℃以上250℃以下。加熱時間,典型上較佳為1分鐘以上60分鐘以下,更佳為10分鐘以上50分鐘以下,特佳為20分鐘以上40分鐘以下。Next, if necessary, the volatile components of the solvent (S) and the like are removed, and the coating film is dried. The drying method is not particularly limited, and examples thereof include a method of using a vacuum drying device (VCD) to reduce pressure and dry at room temperature, and then drying on a heating plate at a temperature of 80°C to 120°C, preferably 90°C to 100°C, for a time in the range of 60 seconds to 120 seconds. After the coating film is formed in this way, the coating film is exposed and heated. Exposure is performed by irradiating active energy rays such as excimer laser light. The energy dose of the irradiation varies depending on the composition of the curable composition, and is preferably 10 mJ/cm 2 to 2000 mJ/cm 2 , more preferably 30 mJ/cm 2 to 1500 mJ/cm 2 , and even more preferably 50 mJ/cm 2 to 1200 mJ/cm 2. The temperature during heating is not particularly limited, and is preferably 120°C to 280°C, more preferably 150°C to 260°C, and particularly preferably 200°C to 250°C. The heating time is typically preferably 1 minute to 60 minutes, more preferably 10 minutes to 50 minutes, and particularly preferably 20 minutes to 40 minutes.

前述硬化性組成物,例如藉由上述條件良好地進行硬化。 具體而言,前述硬化性組成物之硬化物中,藉由以下方法所測定之環氧基含量,較佳為1.8以下,更佳為0.8以上1.3以下。環氧基含量越小時,硬化越良好地進行。 上述環氧基含量係將硬化物藉由傅立葉轉換型紅外分光(FT-IR)裝置測定求得之表示環氧基之波峰的面積除以藉由相同FT-IR裝置測定求得之表示苯的波峰面積而得之值。The aforementioned curable composition, for example, cures well under the aforementioned conditions. Specifically, in the cured product of the aforementioned curable composition, the epoxy group content measured by the following method is preferably 1.8 or less, and more preferably 0.8 or more and 1.3 or less. The smaller the epoxy group content, the better the curing proceeds. The aforementioned epoxy group content is a value obtained by dividing the area of the peak representing the epoxy group measured by the Fourier transform infrared spectrometer (FT-IR) device of the cured product by the area of the peak representing benzene measured by the same FT-IR device.

如以上所形成之硬化物,特別是硬化膜,適合使用於圖像顯示裝置用的顯示面板或OLED照明。The cured product formed as described above, especially the cured film, is suitable for use in a display panel or OLED lighting for an image display device.

[實施例][Example]

以下舉實施例,更具體地說明本發明,但是本發明之範圍不限定於此等的實施例。The present invention is described in more detail below with reference to the following embodiments, but the scope of the present invention is not limited to these embodiments.

[實施例1~6、及比較例1~11] 實施例、及比較例中,作為前述光酸產生劑(A1),使用A1-1、A1-2、A1-3、及A1-4。A1-1、及A1-2之結構如下述。 A1-3係由與A1-1及A1-2所具備之陽離子部不同之三芳基鋶陽離子所構成的陽離子部與、A1-1及A1-2所具備之陰離子部同種的陰離子所構成之陰離子部所構成的鋶鹽。 A1-4為由與A1-3所具備之陽離子部同種的陽離子部與、(C6 F5 )4 Ga- 表示之陰離子部所構成的鋶鹽。(C6 F5 )4 Ga- 中,C6 F5 為五氟苯基。 實施例、及比較例中,作為前述熱酸產生劑(A2),使用A2-1、A2-2、及A2-3。A2-2、及A2-3之結構如下述。 A2-1為由A2-2及A2-3所具備之陽離子部與、A1-4所具備之陰離子部所構成的鋶鹽。 [Examples 1 to 6 and Comparative Examples 1 to 11] In the Examples and Comparative Examples, A1-1, A1-2, A1-3, and A1-4 were used as the photoacid generator (A1). The structures of A1-1 and A1-2 are as follows. A1-3 is a cobalt salt composed of a cationic portion composed of a triaryl cobalt cation different from the cationic portion possessed by A1-1 and A1-2 and an anionic portion composed of an anionic portion of the same type as the anionic portion possessed by A1-1 and A1-2. A1-4 is a cobalt salt composed of a cation part of the same type as the cation part possessed by A1-3 and an anion part represented by (C 6 F 5 ) 4 Ga - . In (C 6 F 5 ) 4 Ga - , C 6 F 5 is a pentafluorophenyl group. In the Examples and Comparative Examples, A2-1, A2-2, and A2-3 are used as the thermal acid generator (A2). The structures of A2-2 and A2-3 are as follows. A2-1 is a cobalt salt composed of a cation part possessed by A2-2 and A2-3 and an anion part possessed by A1-4.

實施例、及比較例中,陽離子硬化性化合物(B),使用下述化合物。 In the Examples and Comparative Examples, the following compounds were used as the cation-curable compound (B).

分別將表1所記載之種類及量的陽離子硬化劑(A)與、陽離子硬化性化合物(B)99質量份均勻地溶解於丙二醇單甲醚乙酸酯,使用固體成分濃度成為20質量%,得到各實施例及比較例的硬化性組成物。使用所得之硬化性組成物,依據下述方法,針對硬化性組成物之硬化物,評價外觀、著色、耐溶劑性、及環氧基含量。此等評價結果記載於表1。但是對於著色、及環氧基含量,有一部分未測定的實施例。The cationic curing agent (A) and the cationic curing compound (B) of the type and amount listed in Table 1 were uniformly dissolved in propylene glycol monomethyl ether acetate at a solid content of 20% by mass to obtain the curable composition of each example and comparative example. The obtained curable composition was used to evaluate the appearance, coloring, solvent resistance, and epoxy content of the cured product of the curable composition according to the following method. The evaluation results are listed in Table 1. However, there are some examples where coloring and epoxy content were not measured.

<硬化物之外觀> 將各實施例及比較例之硬化性組成物,藉由旋轉塗佈機塗佈於玻璃基板上後,100℃加熱120秒鐘形成塗佈膜。對於形成後之塗佈膜全面,以1000mJ/cm2 的曝光量進行曝光。接著,經曝光後之塗佈膜以230℃加熱20分鐘,作為硬化物,形成硬化膜(膜厚約1μm)。 以目視觀察所形成的硬化膜,確認透明,或因著色帶有黃色調。<Appearance of Cured Product> The curable composition of each embodiment and comparative example was coated on a glass substrate by a rotary coater, and then heated at 100°C for 120 seconds to form a coating film. The entire coating film was exposed at an exposure amount of 1000mJ/ cm2 . Then, the exposed coating film was heated at 230°C for 20 minutes to form a cured product (film thickness of about 1μm). The formed cured film was visually observed to confirm that it was transparent or had a yellow tint due to color banding.

<硬化物之著色> 對於用於硬化物之外觀評價的硬化膜,使用日本電色工業股份公司製之商品名「霧度計NDH-5000」,測定L* a* b* 顏色系統中之b* 值。<Coloring of Cured Product> For the cured film used for the appearance evaluation of the cured product, the b * value in the L * a * b * color system was measured using a "Haze Meter NDH-5000" manufactured by Nippon Denshoku Industries, Ltd.

<耐溶劑性> 將藉由與硬化物之外觀評價同樣方法形成的硬化膜浸漬於丙酮中2分鐘,評價對丙酮的耐性。浸漬前後之膜厚的變化量為3%以內時,判定為○,10%以上時,判定為×。又,耐溶劑性之展現係意味著陽離子硬化性化合物(B)之硬化良好地進行。<Solvent resistance> The cured film formed by the same method as the appearance evaluation of the cured product was immersed in acetone for 2 minutes to evaluate the resistance to acetone. When the change in film thickness before and after immersion was within 3%, it was judged as ○, and when it was more than 10%, it was judged as ×. In addition, the development of solvent resistance means that the curing of the cationic curing compound (B) is well carried out.

<環氧基含量> 將藉由與硬化物之外觀評價同樣方法形成的硬化膜,藉由傅立葉轉換型紅外分光(FT-IR)裝置測定。依據測定結果,表示環氧基之波峰的面積除以藉由相同FT-IR裝置測定之表示苯之波峰的面積而得之值顯示的值作為環氧基含量算出。環氧基含量之值越小,意味著陽離子硬化性化合物(B)之硬化進行。<Epoxy group content> The cured film formed by the same method as the appearance evaluation of the cured product was measured by a Fourier transform infrared spectrometer (FT-IR). Based on the measurement results, the value obtained by dividing the area of the peak representing epoxy groups by the area of the peak representing benzene measured by the same FT-IR device was calculated as the epoxy group content. The smaller the value of the epoxy group content, the more the curing of the cationic curing compound (B) is progressing.

依據表1時,得知含有:組合含有各自滿足前述特定要件的光酸產生劑(A1)與熱酸產生劑(A2)的陽離子硬化劑(A)、作為陽離子硬化性化合物(B)之環氧化合物之實施例的硬化性組成物係提供著色少,且透明,耐溶劑性優異的硬化膜,藉由曝光及加熱,使良好地進行硬化。 另外,依據表1時,得知光酸產生劑、及熱酸產生劑之至少一者未滿足特定要件,或僅含有作為陽離子硬化劑(A)之光酸產生劑之比較例的硬化性組成物,無法兼具硬化時之著色之抑制與進行良好的硬化。According to Table 1, it is known that the curable composition of the embodiment containing: a cationic curing agent (A) containing a photoacid generator (A1) and a thermal acid generator (A2) each satisfying the above-mentioned specific requirements, and an epoxy compound as a cationic curing compound (B) provides a cured film with little coloration, transparency, and excellent solvent resistance, and is cured well by exposure and heating. In addition, according to Table 1, it is known that the curable composition of the comparative example in which at least one of the photoacid generator and the thermal acid generator does not satisfy the specific requirements, or only the photoacid generator as the cationic curing agent (A) cannot suppress coloration during curing and perform good curing.

Claims (8)

一種硬化性組成物,其係包含陽離子硬化劑(A)與陽離子硬化性化合物(B), 前述陽離子硬化劑(A)包含光酸產生劑(A1)與熱酸產生劑(A2), 前述光酸產生劑(A1)為具有下述式(ai)表示之陽離子部的鎓鹽, 前述熱酸產生劑(A2)為具有下述式(Ai)表示之陰離子部的鎓鹽, (式(ai)中,Ra1 各自獨立為1價之有機基,Ra2 為藉由IUPAC表示法之元素週期表之第15族~17族之原子價t的元素,Ra1 之至少1個為可具有取代基之芳基) (式(Ai)中,RA1 各自獨立為1以上之可具有取代基之苯基、或全氟烷基)。A curable composition comprises a cationic curing agent (A) and a cationic curing compound (B), wherein the cationic curing agent (A) comprises a photoacid generator (A1) and a thermal acid generator (A2), wherein the photoacid generator (A1) is an onium salt having a cationic part represented by the following formula (ai), and wherein the thermal acid generator (A2) is an onium salt having a cationic part represented by the following formula (Ai). (In formula (ai), each Ra1 is independently a monovalent organic group, Ra2 is an element of Group 15 to Group 17 of the Periodic Table of the Elements according to the IUPAC notation with an atomic valence of t, and at least one of Ra1 is an aromatic group which may have a substituent) (In formula (Ai), each of RA1 is independently 1 or more phenyl groups which may have a substituent, or a perfluoroalkyl group). 如請求項1之硬化性組成物,其中前述熱酸產生劑(A2)為具有下述式(Aiii)表示之陽離子部的鎓鹽, (式(Aiii)中,RA01 為1價之有機基,D為藉由IUPAC表示法之元素週期表之第15族~17族之原子價u之元素,RA03 為1價之有機基,u為1以上3以下之整數,v為0以上5以下之整數)。The curable composition of claim 1, wherein the thermal acid generator (A2) is an onium salt having a cationic portion represented by the following formula (Aiii): (In formula (Aiii), RA01 is a monovalent organic group, D is an element with an atomic valence of u in Groups 15 to 17 of the periodic table of the elements according to the IUPAC notation, RA03 is a monovalent organic group, u is an integer from 1 to 3, and v is an integer from 0 to 5). 如請求項2之硬化性組成物,其中前述D為硫,u為2。The hardenable composition of claim 2, wherein D is sulfur and u is 2. 如請求項1或2之硬化性組成物,其中前述Ra2 為硫,t為2。The hardenable composition of claim 1 or 2, wherein the aforementioned Ra2 is sulfur and t is 2. 如請求項4之硬化性組成物,其中前述式(ai)表示之鎓鹽為具有下述式(a1)表示之陽離子部, (式(a1)中,R1 及R2 獨立表示可被鹵素原子取代之烷基或下述式(a2)表示之基,R1 及R2 互相鍵結可與式中硫原子一同形成環、R3 表示下述式(a3)表示之基或下述式(a4)表示之基,A1 表示S、O、或Se,但是R1 及R2 不同時為可被鹵素原子取代之烷基) (式(a2)中,環Z1 表示芳香族烴環,R4 表示可被鹵素原子取代之烷基、羥基、烷氧基、烷基羰基、烷氧基羰基、醯氧基、烷硫基、噻吩基、噻吩基羰基、呋喃基、呋喃基羰基、苯硒基、苯硒基羰基、雜環式脂肪族烴基、烷基亞磺醯基、烷基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或鹵素原子,m1表示0以上之整數) (式(a3)中,R5 表示羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或可被鹵素原子取代之伸烷基或下述式(a5)表示之基,R6 表示羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或可被鹵素原子取代之烷基或下述式(a6)表示之基,A2 表示單鍵、S、O、亞磺醯基、或羰基,n1表示0或1) (式(a4)中,R7 及R8 獨立表示羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或可被鹵素原子取代之伸烷基或下述式(a5)表示之基,R9 及R10 獨立表示可被鹵素原子取代之烷基或上述式(a2)表示之基,R9 及R10 互相鍵結可與式中硫原子一同形成環、A3 表示單鍵、S、O、亞磺醯基、或羰基,X- 表示1價陰離子,n2表示0或1,但是R9 及R10 不同時為可被鹵素原子取代之烷基) (式(a5)中,環Z2 表示芳香族烴環,R11 表示可被鹵素原子取代之烷基、羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或鹵素原子,m2表示0以上之整數) (式(a6)中,環Z3 表示芳香族烴環,R12 表示可被鹵素原子取代之烷基、羥基、烷氧基、烷基羰基、芳基羰基、烷氧基羰基、芳氧基羰基、芳硫基羰基、醯氧基、芳硫基、烷硫基、噻吩基羰基、呋喃基羰基、苯硒基羰基、芳基、雜環式烴基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代之胺基、氰基、硝基、或鹵素原子,m3表示0以上之整數)。The curable composition of claim 4, wherein the onium salt represented by the aforementioned formula (ai) has a cationic portion represented by the following formula (a1), (In formula (a1), R1 and R2 independently represent an alkyl group which may be substituted by a halogen atom or a group represented by the following formula (a2), R1 and R2 are bonded to each other and may form a ring together with the sulfur atom in the formula, R3 represents a group represented by the following formula (a3) or a group represented by the following formula (a4), A1 represents S, O, or Se, but R1 and R2 are not both alkyl groups which may be substituted by a halogen atom) (In formula (a2), ring Z1 represents an aromatic hydrocarbon ring, R4 represents an alkyl group which may be substituted with a halogen atom, a hydroxyl group, an alkoxy group, an alkylcarbonyl group, an alkoxycarbonyl group, an acyloxy group, an alkylthio group, a thienyl group, a thienylcarbonyl group, a furyl group, a furylcarbonyl group, a phenylselenyl group, a phenylselenylcarbonyl group, a heterocyclic aliphatic hydrocarbon group, an alkylsulfinyl group, an alkylsulfonyl group, a hydroxyl (poly) alkoxyl group, an amino group which may be substituted, a cyano group, a nitro group, or a halogen atom, and m1 represents an integer greater than or equal to 0) (In the formula (a3), R 5 represents a hydroxyl group, an alkoxyl group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxylene group, an amino group which may be substituted, a cyano group, a nitro group, or an alkylene group which may be substituted with a halogen atom, or a group represented by the following formula (a5), R (a6) represents a hydroxyl group, an alkoxyl group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxyl group, an amino group which may be substituted, a cyano group, a nitro group, or an alkyl group which may be substituted with a halogen atom, or a group represented by the following formula (a6), A2 represents a single bond, S, O, a sulfinyl group, or a carbonyl group, and n1 represents 0 or 1) (In formula (a4), R7 and R8 independently represent a hydroxyl group, an alkoxyl group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic alkyl group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxylene group, an amino group which may be substituted, a cyano group, a nitro group, or an alkylene group which may be substituted with a halogen atom, or a group represented by the following formula (a5); R9 and R10 independently represent an alkyl group which may be substituted with a halogen atom, or a group represented by the above formula (a2); R9 and R10 may be bonded to each other to form a ring together with the sulfur atom in the formula; A3 represents a single bond, S, O, a sulfinyl group, or a carbonyl group; X - represents a monovalent anion, n2 represents 0 or 1, but R9 and R10 are not both alkyl groups which may be substituted by a halogen atom) (In formula (a5), ring Z2 represents an aromatic hydrocarbon ring, R11 represents an alkyl group which may be substituted with a halogen atom, a hydroxyl group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxyl group, an amino group which may be substituted, a cyano group, a nitro group, or a halogen atom, and m2 represents an integer greater than 0) (In formula (a6), ring Z 3 represents an aromatic hydrocarbon ring, R 12 represents an alkyl group which may be substituted with a halogen atom, a hydroxyl group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, a thienylcarbonyl group, a furylcarbonyl group, a phenylselenylcarbonyl group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxyl (poly) alkoxyl group, an amino group which may be substituted, a cyano group, a nitro group, or a halogen atom, and m3 represents an integer greater than 0). 如請求項1或2之硬化性組成物,其中相對於前述光酸產生劑(A1)之質量與前述熱酸產生劑(A2)之質量之合計,前述光酸產生劑(A1)之質量的比率為50質量%以下。The curable composition of claim 1 or 2, wherein the ratio of the mass of the photoacid generator (A1) to the total mass of the photoacid generator (A1) and the thermal acid generator (A2) is 50 mass % or less. 一種如請求項1~6中任一項之硬化性組成物之硬化物。A cured product of the curable composition according to any one of claims 1 to 6. 一種硬化物之形成方法,其係對如請求項1~6中任一項之硬化性組成物施予曝光及加熱。A method for forming a cured product comprises exposing and heating the curable composition of any one of claims 1 to 6.
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