TWI791629B - Curable composition, cured film, and method for producing cured product - Google Patents
Curable composition, cured film, and method for producing cured product Download PDFInfo
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- TWI791629B TWI791629B TW107134318A TW107134318A TWI791629B TW I791629 B TWI791629 B TW I791629B TW 107134318 A TW107134318 A TW 107134318A TW 107134318 A TW107134318 A TW 107134318A TW I791629 B TWI791629 B TW I791629B
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- cation
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- curable composition
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- 239000000203 mixture Substances 0.000 title claims abstract description 140
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000002608 ionic liquid Substances 0.000 claims abstract description 30
- 238000002844 melting Methods 0.000 claims abstract description 10
- 230000008018 melting Effects 0.000 claims abstract description 10
- -1 piperidinium cations Chemical class 0.000 claims description 611
- 150000001875 compounds Chemical class 0.000 claims description 131
- 125000000217 alkyl group Chemical group 0.000 claims description 105
- 125000004432 carbon atom Chemical group C* 0.000 claims description 82
- 125000005843 halogen group Chemical group 0.000 claims description 74
- 239000003505 polymerization initiator Substances 0.000 claims description 73
- 150000003839 salts Chemical class 0.000 claims description 69
- 150000002430 hydrocarbons Chemical group 0.000 claims description 65
- 125000003118 aryl group Chemical group 0.000 claims description 61
- 150000001768 cations Chemical class 0.000 claims description 57
- 150000001450 anions Chemical class 0.000 claims description 52
- 125000003545 alkoxy group Chemical group 0.000 claims description 48
- 238000010538 cationic polymerization reaction Methods 0.000 claims description 47
- 125000001424 substituent group Chemical group 0.000 claims description 43
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 41
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 41
- 239000004593 Epoxy Substances 0.000 claims description 39
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 36
- 125000003277 amino group Chemical group 0.000 claims description 35
- 125000000623 heterocyclic group Chemical group 0.000 claims description 33
- 125000002947 alkylene group Chemical group 0.000 claims description 32
- 229910052717 sulfur Inorganic materials 0.000 claims description 32
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 29
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 28
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 27
- 125000003700 epoxy group Chemical group 0.000 claims description 26
- 125000004423 acyloxy group Chemical group 0.000 claims description 25
- 125000002252 acyl group Chemical group 0.000 claims description 24
- 229910052799 carbon Inorganic materials 0.000 claims description 23
- 125000000524 functional group Chemical group 0.000 claims description 23
- 229910052760 oxygen Inorganic materials 0.000 claims description 23
- 125000004414 alkyl thio group Chemical group 0.000 claims description 22
- 125000004104 aryloxy group Chemical group 0.000 claims description 20
- 125000004448 alkyl carbonyl group Chemical group 0.000 claims description 18
- 125000005110 aryl thio group Chemical group 0.000 claims description 18
- 125000001931 aliphatic group Chemical group 0.000 claims description 17
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 16
- 229910052731 fluorine Inorganic materials 0.000 claims description 16
- 125000000962 organic group Chemical group 0.000 claims description 16
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims description 14
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 14
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 14
- 125000004644 alkyl sulfinyl group Chemical group 0.000 claims description 13
- 239000011248 coating agent Substances 0.000 claims description 13
- 229920000642 polymer Polymers 0.000 claims description 13
- 125000004434 sulfur atom Chemical group 0.000 claims description 13
- 125000005135 aryl sulfinyl group Chemical group 0.000 claims description 12
- 125000004391 aryl sulfonyl group Chemical group 0.000 claims description 12
- 125000005129 aryl carbonyl group Chemical group 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 11
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 10
- 150000001721 carbon Chemical group 0.000 claims description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 9
- 125000002091 cationic group Chemical group 0.000 claims description 9
- 125000005842 heteroatom Chemical group 0.000 claims description 9
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 8
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 8
- 125000000129 anionic group Chemical group 0.000 claims description 7
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical group OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000011737 fluorine Substances 0.000 claims description 6
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 claims description 6
- 229920001296 polysiloxane Polymers 0.000 claims description 6
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 6
- 239000004215 Carbon black (E152) Substances 0.000 claims description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 5
- 125000002541 furyl group Chemical group 0.000 claims description 5
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 claims description 5
- 229920002554 vinyl polymer Polymers 0.000 claims description 5
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000005529 alkyleneoxy group Chemical group 0.000 claims description 4
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 claims description 3
- 125000005948 methanesulfonyloxy group Chemical group 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 3
- 150000002892 organic cations Chemical class 0.000 claims description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 3
- MABNMNVCOAICNO-UHFFFAOYSA-N selenophene Chemical compound C=1C=C[se]C=1 MABNMNVCOAICNO-UHFFFAOYSA-N 0.000 claims description 2
- IBBLKSWSCDAPIF-UHFFFAOYSA-N thiopyran Chemical compound S1C=CC=C=C1 IBBLKSWSCDAPIF-UHFFFAOYSA-N 0.000 claims 1
- 238000004383 yellowing Methods 0.000 abstract description 28
- 238000000034 method Methods 0.000 abstract description 18
- 239000010408 film Substances 0.000 description 49
- 239000000047 product Substances 0.000 description 37
- 239000002585 base Substances 0.000 description 30
- 150000002500 ions Chemical class 0.000 description 25
- 125000002723 alicyclic group Chemical group 0.000 description 22
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 22
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 22
- 150000001868 cobalt Chemical class 0.000 description 19
- 239000003822 epoxy resin Substances 0.000 description 19
- 229920000647 polyepoxide Polymers 0.000 description 19
- 239000002253 acid Substances 0.000 description 18
- 239000000758 substrate Substances 0.000 description 18
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 16
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 16
- 125000000753 cycloalkyl group Chemical group 0.000 description 14
- 125000001153 fluoro group Chemical group F* 0.000 description 14
- 125000001624 naphthyl group Chemical group 0.000 description 14
- 239000002904 solvent Substances 0.000 description 12
- 150000004945 aromatic hydrocarbons Chemical group 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 11
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- 239000007983 Tris buffer Substances 0.000 description 9
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 9
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 8
- 238000001723 curing Methods 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical group C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 8
- 150000002989 phenols Chemical class 0.000 description 8
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 8
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 239000003963 antioxidant agent Substances 0.000 description 7
- 235000006708 antioxidants Nutrition 0.000 description 7
- 125000001309 chloro group Chemical group Cl* 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 7
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 7
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 6
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 6
- 125000000304 alkynyl group Chemical group 0.000 description 6
- 230000003078 antioxidant effect Effects 0.000 description 6
- 125000003710 aryl alkyl group Chemical group 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 125000003709 fluoroalkyl group Chemical group 0.000 description 6
- 239000011256 inorganic filler Substances 0.000 description 6
- 229910003475 inorganic filler Inorganic materials 0.000 description 6
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 6
- 125000004433 nitrogen atom Chemical group N* 0.000 description 6
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 6
- 238000005979 thermal decomposition reaction Methods 0.000 description 6
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 5
- 125000004429 atom Chemical group 0.000 description 5
- 125000002619 bicyclic group Chemical group 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 229920003986 novolac Polymers 0.000 description 5
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 125000000538 pentafluorophenyl group Chemical group FC1=C(F)C(F)=C(*)C(F)=C1F 0.000 description 5
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000006467 substitution reaction Methods 0.000 description 5
- 229960000834 vinyl ether Drugs 0.000 description 5
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 4
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical class OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 4
- 125000003282 alkyl amino group Chemical group 0.000 description 4
- 235000001014 amino acid Nutrition 0.000 description 4
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 4
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- 125000004122 cyclic group Chemical group 0.000 description 4
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 4
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- 150000004820 halides Chemical class 0.000 description 4
- 229910052740 iodine Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 4
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
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- 125000001544 thienyl group Chemical group 0.000 description 4
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 4
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 3
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
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- 229930185605 Bisphenol Natural products 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
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- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
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- 229910018286 SbF 6 Inorganic materials 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
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- 150000001408 amides Chemical class 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- LNTHITQWFMADLM-UHFFFAOYSA-N anhydrous gallic acid Natural products OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 3
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Natural products C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 3
- 229940045799 anthracyclines and related substance Drugs 0.000 description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 3
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
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- 238000004132 cross linking Methods 0.000 description 3
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 3
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- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
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- 125000005575 polycyclic aromatic hydrocarbon group Chemical group 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
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- 230000009257 reactivity Effects 0.000 description 3
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- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 description 2
- 125000006713 (C5-C10) cycloalkyl group Chemical group 0.000 description 2
- DXBHBZVCASKNBY-UHFFFAOYSA-N 1,2-Benz(a)anthracene Chemical compound C1=CC=C2C3=CC4=CC=CC=C4C=C3C=CC2=C1 DXBHBZVCASKNBY-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- NQMUGNMMFTYOHK-UHFFFAOYSA-N 1-methoxynaphthalene Chemical compound C1=CC=C2C(OC)=CC=CC2=C1 NQMUGNMMFTYOHK-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- 125000004206 2,2,2-trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 2
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- WVIICGIFSIBFOG-UHFFFAOYSA-N pyrylium Chemical compound C1=CC=[O+]C=C1 WVIICGIFSIBFOG-UHFFFAOYSA-N 0.000 description 1
- 238000000790 scattering method Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
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- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
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- 125000006850 spacer group Chemical group 0.000 description 1
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- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
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- 125000005931 tert-butyloxycarbonyl group Chemical group [H]C([H])([H])C(OC(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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- BJQWBACJIAKDTJ-UHFFFAOYSA-N tetrabutylphosphanium Chemical compound CCCC[P+](CCCC)(CCCC)CCCC BJQWBACJIAKDTJ-UHFFFAOYSA-N 0.000 description 1
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- SZWHXXNVLACKBV-UHFFFAOYSA-N tetraethylphosphanium Chemical compound CC[P+](CC)(CC)CC SZWHXXNVLACKBV-UHFFFAOYSA-N 0.000 description 1
- AGWJLDNNUJKAHP-UHFFFAOYSA-N tetrahexylphosphanium Chemical compound CCCCCC[P+](CCCCCC)(CCCCCC)CCCCCC AGWJLDNNUJKAHP-UHFFFAOYSA-N 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 125000005958 tetrahydrothienyl group Chemical group 0.000 description 1
- 125000004632 tetrahydrothiopyranyl group Chemical group S1C(CCCC1)* 0.000 description 1
- QQFYJXKKHBDLQV-UHFFFAOYSA-N tetrakis(2-methoxyphenyl)phosphanium Chemical compound COC1=CC=CC=C1[P+](C=1C(=CC=CC=1)OC)(C=1C(=CC=CC=1)OC)C1=CC=CC=C1OC QQFYJXKKHBDLQV-UHFFFAOYSA-N 0.000 description 1
- XLZOKVSFMDOMTL-UHFFFAOYSA-N tetrakis(3-methoxyphenyl)phosphanium Chemical compound COC1=CC=CC([P+](C=2C=C(OC)C=CC=2)(C=2C=C(OC)C=CC=2)C=2C=C(OC)C=CC=2)=C1 XLZOKVSFMDOMTL-UHFFFAOYSA-N 0.000 description 1
- BFADQASMYNGYBX-UHFFFAOYSA-N tetrakis(4-methoxyphenyl)phosphanium Chemical compound C1=CC(OC)=CC=C1[P+](C=1C=CC(OC)=CC=1)(C=1C=CC(OC)=CC=1)C1=CC=C(OC)C=C1 BFADQASMYNGYBX-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
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- 150000007970 thio esters Chemical group 0.000 description 1
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- RAOIDOHSFRTOEL-UHFFFAOYSA-O thiolan-1-ium Chemical compound C1CC[SH+]C1 RAOIDOHSFRTOEL-UHFFFAOYSA-O 0.000 description 1
- 125000005033 thiopyranyl group Chemical group 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 125000005147 toluenesulfonyl group Chemical group C=1(C(=CC=CC1)S(=O)(=O)*)C 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
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- DTQVDTLACAAQTR-UHFFFAOYSA-N trifluoroacetic acid Substances OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- 229910052725 zinc Inorganic materials 0.000 description 1
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- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/687—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4014—Nitrogen containing compounds
- C08G59/4028—Isocyanates; Thioisocyanates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/4007—Curing agents not provided for by the groups C08G59/42 - C08G59/66
- C08G59/4085—Curing agents not provided for by the groups C08G59/42 - C08G59/66 silicon containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/5046—Amines heterocyclic
- C08G59/5053—Amines heterocyclic containing only nitrogen as a heteroatom
- C08G59/508—Amines heterocyclic containing only nitrogen as a heteroatom having three nitrogen atoms in the ring
- C08G59/5086—Triazines; Melamines; Guanamines
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Paints Or Removers (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Abstract
[課題] 本發明提供一種具有優良折射率及耐黃化性的硬化性組成物,與由上述硬化性組成物的硬化物所形成的硬化膜,與使用前述硬化性組成物的硬化物之製造方法。 [解決手段] 一種硬化性組成物,其為陽離子硬化型或陰離子硬化型之硬化性組成物,其特徵為, 前述硬化性組成物為含有(C)熔點140℃以下之離子液體,其可提供對波長550nm之光線的折射率為1.60以上、2.20以下之硬化膜。[Problem] The present invention provides a curable composition having an excellent refractive index and yellowing resistance, a cured film formed from a cured product of the above curable composition, and production of a cured product using the above curable composition method. [Solution] A curable composition, which is a cation-curable or anion-curable curable composition, is characterized by, The aforementioned curable composition contains (C) an ionic liquid with a melting point of 140° C. or lower, which can provide a cured film with a refractive index of 1.60 or more and 2.20 or less for light with a wavelength of 550 nm.
Description
本發明為有關一種硬化性組成物,與由上述硬化性組成物的硬化物所形成的硬化膜,與使用前述硬化性組成物的硬化物之製造方法之發明。The present invention relates to a curable composition, a cured film formed from a cured product of the curable composition, and a method for producing a cured product using the curable composition.
以往,含有使用環氧化合物等的陽離子聚合性化合物作為硬化性成份的陽離子聚合型硬化性組成物,多被使用於各種之用途。Conventionally, a cationically polymerizable curable composition containing a cationically polymerizable compound such as an epoxy compound as a curable component has been used in various applications.
該些硬化性組成物,已知例如有,含有含芳香環的脂環式環氧化合物,與含芳香環的脂環式環氧化合物以外的陽離子聚合性化合物,與熱陽離子聚合起始劑的陽離子聚合性熱硬化性組成物(專利文獻1)。使用該硬化性組成物,可形成一種具有高玻璃轉移溫度、透明性(因具耐熱黃化性,故可降低著色),及具有優良基材密著性之硬化物。 [先前技術文獻] [專利文獻]These curable compositions are known, for example, containing an aromatic ring-containing alicyclic epoxy compound, a cationic polymerizable compound other than an aromatic ring-containing alicyclic epoxy compound, and a thermal cationic polymerization initiator. Cationic polymerizable thermosetting composition (Patent Document 1). Using this curable composition can form a cured product with high glass transition temperature, transparency (reduced coloring due to heat yellowing resistance), and excellent substrate adhesion. [Prior Art Literature] [Patent Document]
[專利文獻1] 特開2014-156522號公報 [專利文獻2] 國際公開第2014/157675號[Patent Document 1] JP-A-2014-156522 [Patent Document 2] International Publication No. 2014/157675
[發明所欲解決之問題][Problem to be solved by the invention]
使用專利文獻1記載之硬化性組成物時,可形成一種顯示出高玻璃轉移溫度、由熱變形之觀點為具有良好耐熱性的硬化物。但是,就兼具高折射率化及耐熱黃化性,特別是耐熱黃化性上,仍有改善的空間。When the curable composition described in Patent Document 1 is used, a cured product exhibiting a high glass transition temperature and having good heat resistance from the viewpoint of thermal deformation can be formed. However, there is still room for improvement in terms of both high refractive index and heat yellowing resistance, especially in heat yellowing resistance.
又,以往,為形成高折射率的硬化物時,多會使用具有可提高芳香族烴基、三環等的折射率的結構之材料(例如,專利文獻2)。 另一方面,使用含有含芳香族烴基,或三環等的材料之硬化性組成物所形成的硬化物時,多會發生因存在芳香族烴基、三環等原因,而於接受到光或熱時容易產生黃化等問題。即,於形成高折射率的硬化物所使用的以往的硬化性組成物中,有關硬化物的折射率,與硬化物的耐黃化性之關係中,即會發生提高其中一者時,另一者則會降低之相對關係的極大問題。In addition, in the past, in order to form a cured product with a high refractive index, it is often used to have an aromatic hydrocarbon group, three The material of the structure of the refractive index of a ring etc. (for example, patent document 2). On the other hand, the use of aromatic hydrocarbon groups, or three When the hardened product formed by the hardening composition of materials such as rings, it often occurs due to the presence of aromatic hydrocarbon groups, three For reasons such as rings, it is prone to problems such as yellowing when exposed to light or heat. That is, in the conventional curable composition used to form a cured product with a high refractive index, in the relationship between the refractive index of the cured product and the yellowing resistance of the cured product, one of them will be improved, and the other will be improved. One would reduce the great problem of the relative relationship.
本發明即為鑑於上述問題所提出者,而以提出一種可形成具有優良折射率及耐黃化性的硬化物之硬化性組成物,與由上述硬化性組成物的硬化物所形成的硬化膜,與使用前述硬化性組成物的硬化物之製造方法為目的。 [解決問題之方法]In view of the above problems, the present invention proposes a curable composition capable of forming a cured product with excellent refractive index and yellowing resistance, and a cured film formed from the cured product of the above curable composition. , and a method for producing a cured product using the aforementioned curable composition. [How to solve the problem]
(C)離子液體為具有優良的離子導電性,且為熔點140℃以下之液體,故可均勻地擴散於硬化性組成物中。又,(C)離子液體的熱分解溫度亦較高。 本發明者們,發現含有(C)離子液體的硬化性組成物中,對陽離子聚合或陰離子聚合具有低依賴性,而可均勻地促進硬化反應,其結果,即可解決上述之問題。本發明即為鑑於上述理解而完成者。即,本發明具有以下之內容。(C) The ionic liquid is a liquid with excellent ion conductivity and a melting point below 140°C, so it can be uniformly diffused in the curable composition. In addition, (C) the thermal decomposition temperature of the ionic liquid is also relatively high. The present inventors discovered that a curable composition containing (C) an ionic liquid has a low dependence on cationic polymerization or anionic polymerization and uniformly accelerates the curing reaction. As a result, the above-mentioned problems can be solved. The present invention is accomplished in view of the above understanding. That is, the present invention has the following contents.
本發明之第1態樣為,一種硬化性組成物,其為陽離子硬化型或陰離子硬化型之硬化性組成物,其特徵為, 上述硬化性組成物,含有(C)熔點140℃以下之離子液體,其可提供對波長550nm之光線的折射率為1.60以上、2.20以下之硬化膜。A first aspect of the present invention is a curable composition, which is a cation-curable or anion-curable curable composition, characterized by: The above-mentioned curable composition contains (C) an ionic liquid having a melting point of 140° C. or lower, which can provide a cured film with a refractive index of 1.60 to 2.20 for light with a wavelength of 550 nm.
本發明之第2態樣為,一種硬化性組成物,其為陽離子硬化型或陰離子硬化型之硬化性組成物,其特徵為含有: 具有含有由N、O、S及Si所成群中所選出之至少1種元素之官能基的(A)硬化性化合物,與(C)熔點140℃以下之離子液體的硬化性組成物; 上述(A)硬化性化合物為,含有由芳香族基、三環結構、異三聚氰酸環結構及環狀矽氧烷結構所成群中所選出之至少1種。The second aspect of the present invention is a curable composition, which is a cation-curable or anion-curable curable composition, characterized by containing: A curable composition of (A) a curable compound having a functional group of at least one element selected, and (C) an ionic liquid with a melting point below 140°C; At least one selected from the group consisting of ring structure, isocyanuric acid ring structure and cyclic siloxane structure.
本發明之第3態樣為,一種硬化膜,其特徵為,由第1或第2態樣的硬化性組成物的硬化物所形成者。A third aspect of the present invention is a cured film characterized by being formed of a cured product of the curable composition of the first or second aspect.
本發明之第4態樣為,一種硬化物之製造方法,其特徵為包含: 將第1態樣的該硬化性組成物成型為特定形狀之步驟,與 對成型的硬化性組成物進行加熱、曝光,或進行曝光與加熱之步驟。 [發明之效果]The fourth aspect of the present invention is a method for producing a cured product, which is characterized by comprising: the step of molding the curable composition of the first aspect into a specific shape, and A step of heating, exposing, or exposing and heating the formed curable composition. [Effect of Invention]
本發明之硬化性組成物,可形成具有優良折射率及耐黃化性的硬化物。 又,依本發明內容,可提供一種由上述硬化性組成物的硬化物所形成的硬化膜,與使用前述硬化性組成物的硬化物之製造方法。上述硬化物適合使用於各種之用途。 [實施發明之形態]The curable composition of the present invention can form a cured product with excellent refractive index and yellowing resistance. Also, according to the present invention, a cured film formed from a cured product of the above-mentioned curable composition, and a method for producing a cured product using the above-mentioned curable composition can be provided. The above cured products are suitable for various applications. [Mode of Implementing the Invention]
以下,將對本發明之實施態樣進行詳細之說明,但本發明並不受以下實施態樣的任何限制,於本發明目的之範圍內,可加入適當變更而實施。 又,本說明書中,「~」於無特別限定下,為表示以上至以下。Hereinafter, the embodiments of the present invention will be described in detail, but the present invention is not limited by the following embodiments, and can be implemented with appropriate changes within the scope of the purpose of the present invention. Moreover, in this specification, "~" means the above to the following unless it is specifically limited.
≪硬化性組成物≫ 第1態樣的硬化性組成物為,一種陽離子硬化型或陰離子硬化型之硬化性組成物,其中,上述硬化性組成物為含有(C)熔點140℃以下之離子液體,其可提供對波長550nm之光線的折射率為1.60以上、2.20以下之硬化膜。≪Curing composition≫ The curable composition of the first aspect is a cation-curable or anion-curable curable composition, wherein the curable composition contains (C) an ionic liquid with a melting point of 140° C. Cured film with a refractive index of 1.60 to 2.20 at 550nm.
第2態樣的硬化性組成物為,一種陽離子硬化型或陰離子硬化型之硬化性組成物,其為含有 具有含有由N、O、S及Si所成群中所選出之至少1種元素之官能基的(A)硬化性化合物,與(C)熔點140℃以下之離子液體的硬化性組成物; 又,上述(A)硬化性化合物為含有由芳香族基、三環結構、異三聚氰酸環結構及環狀矽氧烷結構所成群中所選出之至少1種。 第2態樣的硬化性組成物,以可提供對波長550nm之光線的折射率為1.60以上、2.20以下之硬化膜為佳。 以下,有關第1態樣的硬化性組成物及第2態樣的硬化性組成物,亦僅稱為「硬化性組成物」。 硬化性組成物,就具有高折射率之觀點,以可提供對波長550nm之光線的折射率為1.65以上、2.10以下之硬化膜者為佳,以可提供1.70以上、2.00以下之硬化膜者為較佳。 本發明中,折射率,於無特別限定下,係指依後述實施例的測定條件所測得者。The curable composition of the second aspect is a cation-curable or anion-curable curable composition containing at least one element selected from the group consisting of N, O, S, and Si (A) hardening compound of functional group, and (C) hardening composition of ionic liquid whose melting point is below 140°C; At least one selected from the group consisting of ring structure, isocyanuric acid ring structure and cyclic siloxane structure. The curable composition of the second aspect preferably provides a cured film with a refractive index of 1.60 or more and 2.20 or less for light having a wavelength of 550 nm. Hereinafter, the curable composition of the first aspect and the curable composition of the second aspect are also simply referred to as "curable composition". From the viewpoint of high refractive index, the curable composition is preferably one that can provide a cured film with a refractive index of 1.65 or more and 2.10 or less for light with a wavelength of 550nm, and one that can provide a cured film with a refractive index of 1.70 or more and 2.00 or less. better. In the present invention, the refractive index refers to the one measured under the measurement conditions of the examples described later, unless otherwise specified.
硬化性組成物含有(C)離子液體時,於硬化性組成物中,對陽離子聚合或陰離子聚合具有低依賴性,而可均勻地促進硬化反應,其結果,可形成具有優良折射率及耐黃化性(特別是耐黃化性),且具有良好耐熱性及對基板之密著性的硬化物。 以下,將對硬化性組成物所含有的必須,或任意的成份進行說明。When the curable composition contains (C) ionic liquid, in the curable composition, the dependence on cationic polymerization or anionic polymerization is low, and the curing reaction can be promoted uniformly. Chemical resistance (especially yellowing resistance), and has good heat resistance and adhesion to the substrate. Hereinafter, essential or optional components contained in the curable composition will be described.
<(A)硬化性化合物> 第1態樣的硬化性組成物,就折射率及耐黃化性之觀點,又,就耐熱性及對基板的密著性之觀點,以再含有具有含有由N、O、S及Si所成群中所選出之至少1種元素之官能基的(A)硬化性化合物為佳。<(A) Hardening compound> The curable composition of the first aspect further contains a compound composed of N, O, S, and Si from the viewpoint of refractive index and yellowing resistance, and from the viewpoint of heat resistance and adhesion to the substrate. The (A) curable compound is preferably a functional group of at least one element selected from the group.
具有含有由N、O、S及Si所成群中所選出之至少1種元素之官能基的(A)硬化性化合物,其折射率具有較高的傾向。 (A)硬化性化合物,就高折射率之觀點,以具有含有由N、S及O所成群中所選出之至少1種元素之官能基為佳,以具有含有由N及S所成群中所選出之至少1種元素之官能基為較佳。(A) The curable compound having a functional group containing at least one element selected from the group consisting of N, O, S and Si tends to have a high refractive index. (A) Hardening compounds, from the viewpoint of high refractive index, preferably have a functional group containing at least one element selected from the group consisting of N, S, and O, and preferably have a functional group containing at least one element selected from the group consisting of N and S A functional group of at least one element selected from among is preferred.
含有N之官能基,可列舉如,三環結構、異三聚氰酸環結構、咔唑基、醯亞胺基、腈基等。具有含有N之官能基的(A)硬化性化合物,可列舉如,具有三環之聚合物、後述之式(a1-I)所表示的化合物、聚乙烯咔唑(PVK)、聚醯亞胺等。具有三環之聚合物,就其結構得知,其為具有較高的折射率(1.70以上),而為特佳。The functional group containing N, can enumerate such as, three Ring structure, isocyanuric acid ring structure, carbazolyl, imide, nitrile, etc. (A) curable compounds having N-containing functional groups include, for example, three Ring polymers, compounds represented by formula (a1-I) described later, polyvinylcarbazole (PVK), polyimide, and the like. has three The ring polymer is particularly preferred because it has a relatively high refractive index (above 1.70) in view of its structure.
含有O之官能基,可列舉如,環氧基、異三聚氰酸環結構、羧基、酯基、酮基、羥基等。 具有含有O之官能基的(A)硬化性化合物,可列舉如,後述之式(a1)所表示的化合物、後述之式(a1-I)所表示的化合物、後述之環氧化合物等。The functional group containing O includes, for example, epoxy group, isocyanuric acid ring structure, carboxyl group, ester group, ketone group, hydroxyl group and the like. The (A) curable compound having an O-containing functional group includes, for example, compounds represented by formula (a1) described below, compounds represented by formula (a1-I) described below, epoxy compounds described below, and the like.
含有S之官能基,可列舉如,噻喃基、磺醯基(-SO2 -)、硫醇基、硫酯基等。 具有含有S之官能基的(A)硬化性化合物,可列舉如,後述之式(a1)所表示的化合物、聚醚碸(PES)、聚碸、聚苯基碸等。 具有含有Si之官能基的(A)硬化性化合物,可列舉如,具有由矽氧烷鍵結(Si-O-Si)所構成的矽氧烷骨架之矽氧烷化合物等。矽氧烷化合物中之矽氧烷骨架,例如,環狀矽氧烷骨架或籠型或梯形型之聚倍半矽氧烷骨架等。The functional group containing S includes, for example, thiopyranyl group, sulfonyl group (-SO 2 -), thiol group, thioester group and the like. The (A) curable compound having a functional group containing S includes, for example, a compound represented by the formula (a1) described later, polyethersulfone (PES), polysulfone, polyphenylsulfone, and the like. The (A) curable compound having a functional group containing Si includes, for example, a siloxane compound having a siloxane skeleton composed of siloxane bonds (Si—O—Si). The siloxane skeleton in the siloxane compound, for example, a cyclic siloxane skeleton or a cage-type or trapezoid-type polysilsesquioxane skeleton.
(A)硬化性化合物,就折射率及耐黃化性之觀點、又,就耐熱性及對基板的密著性之觀點,以含有由芳香族基、三環結構、異三聚氰酸環結構及環狀矽氧烷結構所成群中所選出之至少1種為佳。 第2態樣的硬化性組成物,為具有含有由N、O、S及Si所成群中所選出之至少1種元素之官能基,其包含含有由芳香族基、三環結構、異三聚氰酸環結構及環狀矽氧烷結構所成群中所選出之至少1種的(A)硬化性化合物。 上述芳香族基,可列舉如,折射率及耐黃化性之觀點、又,耐熱性及對基板的密著性之觀點,以形成軸節型結構的芳香族基為佳。(A) The curable compound contains an aromatic group, three At least one selected from the group consisting of a ring structure, an isocyanuric acid ring structure and a cyclic siloxane structure is preferred. The curable composition of the second aspect is a functional group having at least one element selected from the group consisting of N, O, S, and Si, including aromatic groups, three (A) Hardening compound of at least one kind selected from the group consisting of ring structure, isocyanuric acid ring structure and cyclic siloxane structure. The above-mentioned aromatic groups include, for example, from the viewpoints of refractive index and yellowing resistance, and also from the viewpoints of heat resistance and adhesion to the substrate, aromatic groups forming an axonal structure are preferable.
(A)硬化性化合物,就折射率及耐黃化性之觀點,又,就耐熱性及對基板的密著性之觀點,以含有由下述式(a1)所表示的化合物、具有三環結構之聚合物、後述之式(a1-I)所表示的化合物及後述之式(a1-III)所表示的矽氧環氧化合物所成群中所選出之至少1種為佳。(A) The curable compound contains a compound represented by the following formula (a1) and has three At least one selected from the group consisting of a polymer having a ring structure, a compound represented by the formula (a1-I) described below, and a silicone epoxy compound represented by the formula (a1-III) described below is preferred.
(式(a1)所表示的化合物) (式(a1)中,W1 及W2 各自獨立為,下述式(a2): 所表示之基, 式(a2)中,環Z表示芳香族烴環;X表示單鍵或-S-所示之基;R01 表示單鍵、碳原子數為1以上、4以下之伸烷基,或碳原子數為1以上、4以下之伸烷氧基;R01 為伸烷氧基時,伸烷氧基中之氧原子為與環Z鍵結;R02 表示1價烴基、羥基、-OR4a 所示之基、-SR4b 所示之基、醯基、烷氧羰基、鹵素原子、硝基、氰基、氫硫基、羧基、胺基、胺甲醯基、-NHR4c 所示之基、-N(R4d )2 所示之基、磺酸基;或1價烴基、-OR4a 所示之基、-SR4b 所示之基、醯基、烷氧羰基、-NHR4c 所示之基,或-N(R4d )2 所示之基所含的碳原子所鍵結的氫原子中之至少一部份被1價烴基、羥基、-OR4a 所示之基、-SR4b 所示之基、醯基、烷氧羰基、鹵素原子、硝基、氰基、氫硫基、羧基、胺基、胺甲醯基、-NHR4c 所示之基、-N(R4d )2 所示之基、甲磺醯氧基,或磺酸基所取代之基;R4a ~R4d 獨立表示1價烴基;m表示0以上之整數;R03 為氫原子、乙烯基、噻喃-2-甲基,或縮水甘油基, W1 與W2 等二者中之R03 並不具有氫原子; 環Y1 及環Y2 表示相同或相異的芳香族烴環;R表示單鍵、可具有取代基之伸甲基、可具有取代基,且2個碳原子間可含有雜原子之伸乙基、-O-所示之基、-NH-所示之基,或-S-所示之基;R3a 及R3b 獨立表示氰基、鹵素原子,或1價烴基;n1及n2獨立表示0以上、4以下之整數)。(compound represented by formula (a1)) (In the formula (a1), W 1 and W 2 are each independently, the following formula (a2): The base represented, in the formula (a2), the ring Z represents an aromatic hydrocarbon ring; X represents a single bond or the base represented by -S- ; group, or an alkoxyl group with 1 to 4 carbon atoms; when R 01 is an alkoxyl group, the oxygen atom in the alkoxyl group is bonded to the ring Z; R 02 represents a monovalent hydrocarbon group, a hydroxyl group , a group represented by -OR 4a , a group represented by -SR 4b , an acyl group, an alkoxycarbonyl group, a halogen atom, a nitro group, a cyano group, a mercapto group, a carboxyl group, an amino group, a carbamoyl group, -NHR 4c The group shown, the group represented by -N(R 4d ) 2 , the sulfonic acid group; or the monovalent hydrocarbon group, the group represented by -OR 4a , the group represented by -SR 4b , acyl group, alkoxycarbonyl group, - A group represented by NHR 4c , or a group represented by a monovalent hydrocarbon group, a hydroxyl group, or a group represented by -OR 4a in which at least a part of hydrogen atoms bonded to carbon atoms contained in a group represented by -N(R 4d ) 2 , the base shown in -SR 4b , acyl group, alkoxycarbonyl, halogen atom, nitro, cyano, mercapto, carboxyl, amino, carbamoyl, the base shown in -NHR 4c , -N( R 4d ) The group represented by 2 , methanesulfonyloxy group, or a group substituted by a sulfonic acid group; R 4a ~ R 4d independently represent a monovalent hydrocarbon group; m represents an integer greater than 0; R 03 represents a hydrogen atom, a vinyl group , thiopyran-2-methyl, or glycidyl, R 03 in W 1 and W 2 does not have a hydrogen atom; Ring Y 1 and Ring Y 2 represent the same or different aromatic hydrocarbon rings; R represents a single bond, a methylene group that may have a substituent, an ethylylene group that may have a substituent and may contain a heteroatom between two carbon atoms, a group represented by -O-, a group represented by -NH-, Or a group represented by -S-; R 3a and R 3b independently represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; n1 and n2 independently represent an integer between 0 and 4).
上述式(a2)中,環Z,例如,苯環、縮合多環式芳香族烴環[例如,縮合二環式烴環(例如,萘環等的C8-20 縮合二環式烴環,較佳為C10-16 縮合二環式烴環)、縮合三環式芳香族烴環(例如,蒽環、菲環等)等的縮合2至4環式芳香族烴環]等。環Z,以苯環或萘環為佳,以萘環為較佳。又,因式(a1)中之W1 及W2 各自獨立為下述式(a2)所表示之基,故W1 及W2 各自含有環Z。W1 所含的環Z與W2 所含的環Z,可為相同亦可、相異亦可,例如,可為一者之環為苯環、另一者之環為萘環等,又以任一之環皆為萘環為特佳。In the above formula (a2), the ring Z is, for example, a benzene ring, a condensed polycyclic aromatic hydrocarbon ring [for example, a condensed bicyclic hydrocarbon ring (for example, a C 8-20 condensed bicyclic hydrocarbon ring such as a naphthalene ring, Preferred are C 10-16 condensed bicyclic hydrocarbon rings), condensed tricyclic aromatic hydrocarbon rings (eg, anthracycline, phenanthrene ring, etc.), condensed 2 to 4 cyclic aromatic hydrocarbon rings], and the like. Ring Z is preferably a benzene ring or a naphthalene ring, more preferably a naphthalene ring. Also, since W 1 and W 2 in the formula (a1) are each independently a group represented by the following formula (a2), each of W 1 and W 2 contains a ring Z. The ring Z contained in W1 and the ring Z contained in W2 may be the same or different, for example, the ring of one may be a benzene ring, and the ring of the other may be a naphthalene ring, etc., and It is particularly preferred that any one of the rings is a naphthalene ring.
又,W1 及W2 等二者直接鍵結的碳原子,介由X鍵結之環Z的取代位置,並未有特別之限定。例如,環Z為萘環時,對應於上述碳原子鍵結之環Z之基,亦可為1-萘基、2-萘基等。Also, the substitution position of the carbon atom to which both W1 and W2 are directly bonded, and the ring Z bonded via X is not particularly limited. For example, when the ring Z is a naphthalene ring, the group corresponding to the above-mentioned carbon atom-bonded ring Z may be 1-naphthyl, 2-naphthyl or the like.
上述式(a2)中,X表示獨立的單鍵或-S-所示之基,更典型而言,為單鍵。In the above formula (a2), X represents an independent single bond or a group represented by -S-, more typically, a single bond.
上述式(a2)中,R01 ,例如,單鍵;伸甲基、伸乙基、伸三甲基、伸丙基、丁烷-1,2-二基等的碳原子數為1以上、4以下伸烷基;伸甲氧基、伸乙氧基、伸丙氧基等的碳原子數為1以上、4以下伸烷氧基等;單鍵;C2-4 伸烷基(特別是伸乙基、伸丙基等的C2-3 伸烷基);C2-4 伸烷氧基(特別是伸乙氧基、伸丙氧基等的C2-3 伸烷基)為佳,又以單鍵為較佳。又,R01 為伸烷氧基時,伸烷氧基中之氧原子為與環Z鍵結。又,因式(a1)中之W1 及W2 各自獨立為,下述式(a2)所表示之基,故W1 及W2 分別含有2價之基R01 。W1 所含的R01 與W2 所含的R01 ,可為相同亦可、相異亦可。In the above formula (a2), R 01 is, for example, a single bond; the number of carbon atoms of methylene, ethylylene, trimethylene, propylylene, butane-1,2-diyl, etc. is 1 or more, 4 or more. The following alkylene groups; methoxyl, ethoxyl, propoxyl, etc. have more than 1 and less than 4 carbon atoms; alkoxyl, etc.; single bond; C 2-4 alkylene (especially alkylene C 2-3 alkylene such as ethyl, propylene, etc.); C 2-4 alkylene (especially C 2-3 alkylene such as ethoxy, propyleneoxy, etc.) is preferred, Again, a single bond is preferred. Also, when R 01 is an alkylene group, the oxygen atom in the alkylene group is bonded to the ring Z. Also, since W 1 and W 2 in formula (a1) are each independently a group represented by the following formula (a2), W 1 and W 2 each contain a divalent group R 01 . R 01 included in W 1 and R 01 included in W 2 may be the same or different.
上述式(a2)中,R02 例如,烷基(例如,甲基、乙基、丙基、異丙基、丁基等的C1-12 烷基,較佳為C1-8 烷基,更佳為C1-6 烷基等)、環烷基(環己基等的C5-10 環烷基,較佳為C5-8 環烷基,更佳為C5-6 環烷基等)、芳基(例如,苯基、甲苯基、二甲苯基、萘基等的C6-14 芳基,較佳為C6-10 芳基,更佳為C6-8 芳基等)、芳烷基(苄基、苯乙基等的C6-10 芳基-C1-4 烷基等)等的1價烴基;羥基;烷氧基(甲氧基、乙氧基、丙氧基、丁氧基等的C1-12 烷氧基,較佳為C1-8 烷氧基,更佳為C1-6 烷氧基等)、環烷氧基(環己氧基等的C5-10 環烷氧基等)、芳氧基(苯氧基等的C6-10 芳氧基)、芳烷氧基(例如,苄氧基等的C6-10 芳基-C1-4 烷氧基)等的-OR4a 所示之基[式中,R4a 表示1價之烴基(上述例示之1價烴基等)];烷硫基(甲硫基、乙硫基、丙硫基、丁硫基等的C1-12 烷硫基,較佳為C1-8 烷硫基,更佳為C1-6 烷硫基等)、環烷硫基(環己硫基等的C5-10 環烷硫基等)、芳硫基(苯硫基等的C6-10 芳硫基)、芳烷基硫基(例如,苄硫基等的C6-10 芳基-C1-4 烷硫基)等的-SR4b 所示之基[式中,R4b 表示1價之烴基(上述例示之1價烴基等)];醯基(乙醯基等的C1-6 醯基等);烷氧羰基(甲氧羰基等的C1-4 烷氧基-羰基等);鹵素原子(氟原子、氯原子、溴原子、碘原子等);硝基;氰基;氫硫基;羧基;胺基;胺甲醯基;烷胺基(甲胺基、乙胺基、丙胺基、丁胺基等的C1-12 烷胺基,較佳為C1-8 烷胺基,更佳為C1-6 烷胺基等)、環烷胺基(環己胺基等的C5-10 環烷胺基等)、芳胺基(苯胺基等的C6-10 芳胺基)、芳烷胺基(例如,苄胺基等的C6-10 芳基-C1-4 烷胺基)等的-NHR4c 所示之基[式中,R4c 表示1價之烴基(上述例示之1價烴基等)];二烷胺基(二甲胺基、二乙胺基、二丙胺基、二丁胺基等的二(C1-12 烷基)胺基,較佳為二(C1-8 烷基)胺基,更佳為二(C1-6 烷基)胺基等)、二環烷胺基(二環己胺基等的二(C5-10 環烷基)胺基等)、二芳胺基(二苯胺基等的二(C6-10 芳基)胺基)、二芳烷胺基(例如,二苄胺基等的二(C6-10 芳基-C1-4 烷基)胺基)等的-N(R4d )2 所示之基[式中,R4d 表示獨立的1價烴基(上述例示之1價烴基等)];(甲基)丙烯醯氧基;磺酸基;上述之1價烴基、-OR4a 所示之基、-SR4b 所示之基、醯基、烷氧羰基、-NHR4c 所示之基,或-N(R4d )2 所示之基所含的碳原子鍵結的氫原子中之至少一部份被上述之1價烴基、羥基、-OR4a 所示之基、-SR4b 所示之基、醯基、烷氧羰基、鹵素原子、硝基、氰基、氫硫基、羧基、胺基、胺甲醯基、-NHR4c 所示之基、-N(R4d )2 所示之基、(甲基)丙烯醯氧基、甲磺醯氧基,或磺酸基所取代之基[例如,烷氧基芳基(例如,甲氧苯基等的C1-4 烷氧基C6-10 芳基)、烷氧羰基芳基(例如,甲氧基羰苯基、乙氧基羰苯基等的C1-4 烷氧基-羰基C6-10 芳基等)]等。In the above formula (a2), R 02 is, for example, an alkyl group (for example, a C 1-12 alkyl group such as methyl, ethyl, propyl, isopropyl, butyl, etc., preferably a C 1-8 alkyl group, More preferably C 1-6 alkyl, etc.), cycloalkyl (C 5-10 cycloalkyl such as cyclohexyl, preferably C 5-8 cycloalkyl, more preferably C 5-6 cycloalkyl, etc. ), aryl (for example, C 6-14 aryl of phenyl, tolyl, xylyl, naphthyl, etc., preferably C 6-10 aryl, more preferably C 6-8 aryl, etc.), Monovalent hydrocarbon groups such as aralkyl (benzyl, phenethyl, C 6-10 aryl-C 1-4 alkyl, etc.); hydroxyl; alkoxy (methoxy, ethoxy, propoxy , butoxy and other C 1-12 alkoxy groups, preferably C 1-8 alkoxy groups, more preferably C 1-6 alkoxy groups, etc.), cycloalkoxy groups (C 1-12 alkoxy groups such as cyclohexyl groups) 5-10 cycloalkoxy, etc.), aryloxy (C 6-10 aryloxy such as phenoxy), aralkyloxy (for example, C 6-10 aryl-C 1- 4 alkoxy) etc. -OR 4a [wherein, R 4a represents a monovalent hydrocarbon group (monovalent hydrocarbon group exemplified above, etc.)]; alkylthio (methylthio, ethylthio, propylthio C 1-12 alkylthio groups such as butylthio, preferably C 1-8 alkylthio, more preferably C 1-6 alkylthio, etc.), cycloalkylthio (cyclohexylthio, etc. C 5-10 cycloalkylthio, etc.), arylthio (C 6-10 arylthio such as phenylthio), aralkylthio (for example, C 6-10 aryl-C 1-4 alkylthio) etc. -SR 4b group [wherein, R 4b represents a monovalent hydrocarbon group (monovalent hydrocarbon group exemplified above)]; acyl group (C 1-6 of acetyl group etc. acyl, etc.); alkoxycarbonyl (C 1-4 alkoxy-carbonyl such as methoxycarbonyl, etc.); halogen atom (fluorine atom, chlorine atom, bromine atom, iodine atom, etc.); nitro group; cyano group; hydrogen Sulfuryl; Carboxyl; Amino; Aminoformyl; Alkylamino (C 1-12 alkylamino such as methylamino, ethylamino, propylamine, butylamino, etc., preferably C 1-8 alkylamine group, more preferably C 1-6 alkylamino group, etc.), cycloalkylamino group (C 5-10 cycloalkylamino group such as cyclohexylamino group, etc.), arylamine group (C 6-10 aromatic group such as aniline group, etc.) Amino group), aralkylamino group (for example, C 6-10 aryl-C 1-4 alkylamino group such as benzylamino group) etc. -NHR 4c represented by [wherein, R 4c represents monovalent Hydrocarbon group (monovalent hydrocarbon group exemplified above , etc.)]; Preferably two (C 1-8 alkyl) amino groups, more preferably two (C 1-6 alkyl) amino groups, etc.), bicycloalkylamino groups (bis (C 5-10 cycloalkyl) amino group, etc.), diarylamine group (di(C 6-10 aryl) amino group such as diphenylamino group), diarylalkylamino group (for example, di(C 6-10 aryl) amino group such as dibenzylamino group, etc.) A group represented by -N(R 4d ) 2 such as -10aryl -C 1-4 alkyl)amino group) [wherein, R 4d represents an independent monovalent hydrocarbon group (such as the monovalent hydrocarbon group exemplified above)] ; (meth)acryloyloxy group; sulfonic acid group; the above-mentioned monovalent hydrocarbon group, the group represented by -OR 4a , the group represented by -SR 4b , the acyl group, the alkoxycarbonyl group, the group represented by -NHR 4c , or at least a part of the carbon-bonded hydrogen atoms contained in the group represented by -N(R 4d ) 2 is represented by the above-mentioned monovalent hydrocarbon group, hydroxyl group, group represented by -OR 4a , or -SR 4b The group represented by, acyl group, alkoxycarbonyl group, halogen atom, nitro group, cyano group, mercapto group, carboxyl group, amino group, carbamoyl group, the group represented by -NHR 4c , the group represented by -N(R 4d ) 2 The group shown, (meth)acryloxy group, methanesulfonyloxy group, or a group substituted by a sulfonic acid group [for example, alkoxyaryl group (for example, C 1-4 alkoxy group of methoxyphenyl group, etc. C 6-10 aryl), alkoxycarbonyl aryl (for example, C 1-4 alkoxy-carbonyl C 6-10 aryl such as methoxycarbonylphenyl, ethoxycarbonylphenyl, etc.)] wait.
該些中,代表之例示中,R02 亦可為1價烴基、-OR4a 所示之基、-SR4b 所示之基、醯基、烷氧羰基、鹵素原子、硝基、氰基、-NHR4c 所示之基、-N(R4d )2 所示之基等。Among these, in representative examples, R 02 may also be a monovalent hydrocarbon group, a group represented by -OR 4a , a group represented by -SR 4b , an acyl group, an alkoxycarbonyl group, a halogen atom, a nitro group, a cyano group, A group represented by -NHR 4c , a group represented by -N(R 4d ) 2 and the like.
較佳之R02 ,可列舉如,1價烴基[例如,烷基(例如,C1-6 烷基)、環烷基(例如,C5-8 環烷基)、芳基(例如,C6-10 芳基)、芳烷基(例如,C6-8 芳基-C1-2 烷基)等]、烷氧基(C1-4 烷氧基等)等。特別是,R02 以烷基[C1-4 烷基(特別是甲基)等]、芳基[例如,C6-10 芳基(特別是苯基)等]等的1價烴基(特別是烷基)為佳。Preferable R 02 can include, for example, monovalent hydrocarbon groups [for example, alkyl (for example, C 1-6 alkyl), cycloalkyl (for example, C 5-8 cycloalkyl), aryl (for example, C 6 -10 aryl), aralkyl (for example, C 6-8 aryl-C 1-2 alkyl) etc.], alkoxy (C 1-4 alkoxy etc.) and the like. In particular , R 02 is a monovalent hydrocarbon group ( especially is an alkyl group) is preferred.
又,m為2以上之整數時,複數之R02 可互相為相異亦可、相同亦可。又,W1 所含的R02 與W2 所含的R02 ,可為相同亦可、相異亦可。Also, when m is an integer of 2 or more, the plural R 02 may be different from each other or the same. In addition, R 02 included in W 1 and R 02 included in W 2 may be the same or different.
上述式(a2)中,R02 之數m,可配合環Z之種類予以選擇,例如,0以上、4以下,較佳為0以上、3以下,更佳亦可為0以上、2以下。又,W1 中之m與W2 中之m,可為相同或相異皆可。In the above formula (a2), the number m of R02 can be selected according to the type of ring Z, for example, 0 to 4, preferably 0 to 3, more preferably 0 to 2. Also, m in W 1 and m in W 2 may be the same or different.
上述式(a3)中,R03 為氫原子、乙烯基、噻喃-2-甲基,或縮水甘油基。又,W1 與W2 等二者中之R03 為不具有氫原子者。 乙烯基、噻喃-2-甲基,及縮水甘油基,皆為陽離子聚合性之官能基。因此,式(a1)所表示的化合物,為具有1個或2個陽離子聚合性之官能基的陽離子聚合性之化合物。 W1 所含的R03 與W2 所含的R03 ,於雙方皆不為氫原子之情況下,可為相同亦可、相異亦可。W1 所含的R03 與W2 所含的R03 ,雙方以乙烯基、噻喃-2-甲基,或縮水甘油基為佳,雙方以由乙烯基、噻喃-2-甲基,及縮水甘油基所成之群所選出之相同之基者為較佳。 R03 ,就式(a1)所表示的化合物之合成或取得之容易性等觀點,以乙烯基,或縮水甘油基為佳。In the above formula (a3), R 03 is a hydrogen atom, a vinyl group, a thiopyran-2-methyl group, or a glycidyl group. Also, R 03 in both W 1 and W 2 does not have a hydrogen atom. Vinyl, thiopyran-2-methyl, and glycidyl are all cationic polymerizable functional groups. Therefore, the compound represented by formula (a1) is a cationically polymerizable compound having one or two cationically polymerizable functional groups. R 03 contained in W 1 and R 03 contained in W 2 may be the same or different when neither is a hydrogen atom. R 03 contained in W 1 and R 03 contained in W 2 are preferably vinyl, thiopyran-2-methyl, or glycidyl, and both are composed of vinyl, thiopyran-2-methyl, The same base selected from the group formed by the glycidyl group and the glycidyl group is preferred. R 03 is preferably a vinyl group or a glycidyl group from the viewpoint of the ease of synthesis or acquisition of the compound represented by the formula (a1).
上述式(a1)中,環Y1 及環Y2 ,例如,苯環、縮合多環式芳香族烴環[例如,縮合二環式烴環(例如,萘環等的C8-20 縮合二環式烴環,較佳為C10-16 縮合二環式烴環)、縮合三環式芳香族烴環(例如,蒽環、菲環等)等的縮合2至4環式芳香族烴環]等。環Y1 及環Y2 ,以苯環或萘環為佳,又以苯環為較佳。又,環Y1 及環Y2 ,可為相同或相異皆可,例如,其中之一環為苯環、另一之環為萘環等皆可。In the above formula (a1), the ring Y 1 and the ring Y 2 are, for example, a benzene ring, a condensed polycyclic aromatic hydrocarbon ring [for example, a condensed bicyclic hydrocarbon ring (for example, a C 8-20 condensed dihydrocarbon ring such as a naphthalene ring, etc. Cyclic hydrocarbon ring, preferably C 10-16 condensed bicyclic hydrocarbon ring), condensed tricyclic aromatic hydrocarbon ring (for example, anthracycline, phenanthrene ring, etc.) ]wait. The ring Y 1 and the ring Y 2 are preferably a benzene ring or a naphthalene ring, and more preferably a benzene ring. In addition, the ring Y 1 and the ring Y 2 may be the same or different, for example, one of the rings may be a benzene ring, and the other ring may be a naphthalene ring.
上述式(a1)中,R表示單鍵、可具有取代基之伸甲基、可具有取代基,且2個碳原子間可含有雜原子之伸乙基、-O-所示之基、-NH-所示之基,或-S-所示之基;更典型而言,為單鍵。其中,取代基,例如,氰基、鹵素原子(氟原子、氯原子、溴原子等)、1價烴基[例如,烷基(甲基、乙基、丙基、異丙基、丁基、t-丁基等的C1-6 烷基)、芳基(苯基等的C6-10 芳基)等]等;雜原子,例如,氧原子、氮原子、硫原子、矽原子等。In the above formula (a1), R represents a single bond, a methylene group that may have a substituent, an ethylylene group that may have a substituent and may contain a heteroatom between two carbon atoms, a group represented by -O-, - A group represented by NH-, or a group represented by -S-; more typically, a single bond. Among them, substituents, for example, cyano group, halogen atom (fluorine atom, chlorine atom, bromine atom, etc.), 1-valent hydrocarbon group [for example, alkyl group (methyl, ethyl, propyl, isopropyl, butyl, t -C 1-6 alkyl such as butyl), aryl (C 6-10 aryl such as phenyl), etc.], etc.; heteroatoms, for example, oxygen atom, nitrogen atom, sulfur atom, silicon atom, etc.
上述式(a1)中,R3a 及R3b 通常為非反應性取代基,例如,氰基、鹵素原子(氟原子、氯原子、溴原子等)、1價烴基[例如,烷基、芳基(苯基等的C6-10 芳基)等]等;又以氰基或烷基為佳,以烷基為特佳。烷基,可列舉如,甲基、乙基、丙基、異丙基、丁基、t-丁基等的C1-6 烷基(例如,C1-4 烷基,特別是甲基)等例示。又,n1為2以上之整數時,R3a 可互相為相異亦可、相同亦可。又,n2為2以上之整數時,R3b 可互相為相異亦可、相同亦可。又,R3a 與R3b 可為相同、或相異皆可。又,對環Y1 及環Y2 而言,R3a 及R3b 之鍵結位置(取代位置),並未有特別之限定。較佳之取代數n1及n2為,0或1,特別是以0為佳。又,n1及n2,可互相為相同或相異。In the above-mentioned formula (a1), R 3a and R 3b are usually non-reactive substituents, for example, cyano group, halogen atom (fluorine atom, chlorine atom, bromine atom, etc.), monovalent hydrocarbon group [for example, alkyl, aryl ( C6-10 aryl such as phenyl) etc.] etc.; and cyano or alkyl is preferred, and alkyl is particularly preferred. Alkyl, for example, C 1-6 alkyl (for example, C 1-4 alkyl, especially methyl) such as methyl, ethyl, propyl, isopropyl, butyl, t-butyl and so on. Also, when n1 is an integer of 2 or more, R 3a may be different from or the same as each other. Also, when n2 is an integer of 2 or more, R 3b may be different from each other or the same. Also, R 3a and R 3b may be the same or different. Also, the bonding position (substitution position) of R 3a and R 3b for ring Y 1 and ring Y 2 is not particularly limited. Preferable substitution numbers n1 and n2 are 0 or 1, especially 0. Also, n1 and n2 may be the same or different from each other.
上述式(a1)所表示的化合物,因可保持優良的光學特性及熱特性下,且具有陽離子聚合性之官能基,故具有高反應性。特別是環Y1 及環Y2 為苯環,R為單鍵時,上述式(a1)所表示的化合物,因具有茀骨架,故可使光學特性及熱特性更優良。 此外,上述式(a1)所表示的化合物,可提高具有高硬度的硬化物,故適合作為組成物中之基材成份。The compound represented by the above formula (a1) has high reactivity because it can maintain excellent optical and thermal properties and has a cationic polymerizable functional group. In particular, when ring Y1 and ring Y2 are benzene rings and R is a single bond, the compound represented by the above formula (a1) has a fennel skeleton, so that the optical and thermal properties can be improved. In addition, the compound represented by the above-mentioned formula (a1) can improve a cured product with high hardness, so it is suitable as a base material component in the composition.
上述式(a1)所表示的化合物中,特佳的具體例,例如,9,9-雙[4-[2-(縮水甘油氧基)乙氧基]苯基]-9H-茀、9,9-雙[4-[2-(縮水甘油氧基)乙基]苯基]-9H-茀、9,9-雙[4-(縮水甘油氧基)-3-甲苯基]-9H-茀、9,9-雙[4-(縮水甘油氧基)-3,5-二甲苯基]-9H-茀、9,9-雙(6‐縮水甘油醚基萘-1-基)-9H-茀及9,9-雙(5‐縮水甘油醚基萘-2-基)-9H-茀等的含環氧基之茀化合物;及下述式所表示的化合物等。Among the compounds represented by the above-mentioned formula (a1), particularly preferred specific examples include, for example, 9,9-bis[4-[2-(glycidyloxy)ethoxy]phenyl]-9H-fennel, 9, 9-bis[4-[2-(glycidyloxy)ethyl]phenyl]-9H-fennel, 9,9-bis[4-(glycidyloxy)-3-methylphenyl]-9H-tertilene , 9,9-bis[4-(glycidyloxy)-3,5-xylyl]-9H-fennel, 9,9-bis(6‐glycidyl ether naphthalene-1-yl)-9H- Oxyprofen and 9,9-bis(5-glycidyletherylnaphthalen-2-yl)-9H-fennel and other epoxy group-containing fennel compounds; and compounds represented by the following formulas, etc.
以上說明之式(a1)所表示的化合物中,又以下述化合物為特佳。 Among the compounds represented by the formula (a1) described above, the following compounds are particularly preferred.
(A)硬化性化合物,為含有上述式(a1)所表示的化合物時,(A)硬化性化合物中,上述式(a1)所表示的化合物的量,以50質量%以上為佳,以70質量%以上為較佳,以80質量%以上為更佳,以90質量%以上為特佳,以100質量%為最佳。(A) When the curable compound contains the compound represented by the above formula (a1), the amount of the compound represented by the above formula (a1) in the (A) curable compound is preferably 50% by mass or more, and preferably 70% by mass. The mass % or more is preferable, 80 mass % or more is more preferable, 90 mass % or more is especially preferable, and 100 mass % is most preferable.
(環氧化合物) 上述環氧化合物之例,可列舉如,雙酚A型環氧樹脂、雙酚F型環氧樹脂、雙酚S型環氧樹脂、雙酚AD型環氧樹脂、萘型環氧樹脂,及聯苯型環氧樹脂等的2官能環氧樹脂;酚-酚醛清漆型環氧樹脂、溴化酚-酚醛清漆型環氧樹脂、鄰甲酚-酚醛清漆型環氧樹脂、雙酚A酚醛清漆型環氧樹脂,及雙酚AD酚醛清漆型環氧樹脂等的酚醛清漆環氧樹脂;二環戊二烯型酚樹脂之環氧化物等的環式脂肪族環氧樹脂;萘型酚樹脂之環氧化物等的芳香環氧樹脂;二聚酸縮水甘油酯,及三縮水甘油酯等的縮水甘油酯型環氧樹脂;四縮水甘油胺基二苯基甲烷、三縮水甘油-p-胺酚、四縮水甘油甲基二甲苯二胺,及四縮水甘油雙胺甲基環己烷等的縮水甘油胺型環氧樹脂;三縮水甘油異三聚氰酸酯等的雜環式環氧樹脂;間苯三酚三縮水甘油醚、三羥基聯苯三縮水甘油醚、三羥苯基甲烷三縮水甘油醚、丙三醇三縮水甘油醚、2-[4-(2,3-環氧丙氧基)苯基]-2-[4-[1,1-雙[4-(2,3-環氧丙氧基)苯基]乙基]苯基]丙烷,及1,3-雙[4-[1-[4-(2,3-環氧丙氧基)苯基]-1-[4-[1-[4-(2,3-環氧丙氧基)苯基]-1-甲基乙基]苯基]乙基]苯氧基]-2-丙醇等的3官能型環氧樹脂;四羥苯基乙烷四縮水甘油醚、四縮水甘油二苯甲酮、雙間苯二酚四縮水甘油醚,及四環氧丙氧基聯苯等的4官能型環氧樹脂;2,2-雙(羥甲基)-1-丁醇之1,2-環氧基-4-(2-環氧乙烷基)環己烷加成物等。2,2-雙(羥甲基)-1-丁醇之1,2-環氧基-4-(2-環氧乙烷基)環己烷加成物,為以EHPE-3150(DAICEL公司製)於市面販賣。(epoxy compound) Examples of the above-mentioned epoxy compounds include, for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, bisphenol AD type epoxy resin, naphthalene type epoxy resin, and Bifunctional epoxy resins such as biphenyl-type epoxy resins; phenol-novolak-type epoxy resins, brominated phenol-novolac-type epoxy resins, o-cresol-novolak-type epoxy resins, bisphenol A novolak-type epoxy resins Type epoxy resin, and novolak epoxy resin such as bisphenol AD novolak type epoxy resin; Cycloaliphatic epoxy resin such as epoxy of dicyclopentadiene type phenol resin; Naphthalene type phenol resin Aromatic epoxy resins such as epoxides; glycidyl dimer acid esters, and glycidyl ester epoxy resins such as triglycidyl esters; tetraglycidylaminodiphenylmethane, triglycidyl-p-aminophenol , tetraglycidyl methyl xylene diamine, and glycidyl amine epoxy resins such as tetraglycidyl diamine methyl cyclohexane; heterocyclic epoxy resins such as triglycidyl isocyanurate; Phloroglucinol triglycidyl ether, trihydroxybiphenyl triglycidyl ether, trihydroxyphenylmethane triglycidyl ether, glycerol triglycidyl ether, 2-[4-(2,3-epoxypropoxy base)phenyl]-2-[4-[1,1-bis[4-(2,3-epoxypropoxy)phenyl]ethyl]phenyl]propane, and 1,3-bis[4 -[1-[4-(2,3-Glycidyloxy)phenyl]-1-[4-[1-[4-(2,3-Glycidyloxy)phenyl]-1- Trifunctional epoxy resins such as methyl ethyl] phenyl] ethyl] phenoxy] -2-propanol; Tetrahydroxyphenyl ethane tetraglycidyl ether, tetraglycidyl benzophenone, bis Quaternary functional epoxy resins such as quinone tetraglycidyl ether and tetraglycidoxy biphenyl; 1,2-epoxy group of 2,2-bis(hydroxymethyl)-1-butanol 4-(2-oxiranyl)cyclohexane adduct, etc. 1,2-epoxy-4-(2-oxiranyl) cyclohexane adduct of 2,2-bis(hydroxymethyl)-1-butanol is EHPE-3150 (DAICEL company system) sold in the market.
又,低聚物或聚合物型的多官能環氧化合物,又以作為(A)硬化性化合物為較佳使用者。 典型的例示,可列舉如,酚-酚醛清漆型環氧化合物、溴化酚-酚醛清漆型環氧化合物、鄰甲酚-酚醛清漆型環氧化合物、二甲酚-酚醛清漆型環氧化合物、萘酚-酚醛清漆型環氧化合物、雙酚A酚醛清漆型環氧化合物、雙酚AD酚醛清漆型環氧化合物、二環戊二烯型酚樹脂之環氧化物、萘型酚樹脂之環氧化物等。Also, an oligomer or polymer type polyfunctional epoxy compound is preferably used as (A) curable compound. Typical examples include, for example, phenol-novolak-type epoxy compounds, brominated phenol-novolak-type epoxy compounds, o-cresol-novolak-type epoxy compounds, xylenol-novolak-type epoxy compounds, Naphthol-novolac epoxy compound, bisphenol A novolak epoxy compound, bisphenol AD novolak epoxy compound, dicyclopentadiene phenol resin epoxy, naphthalene phenol resin epoxy compounds etc.
較佳的環氧化合物的其他的例示,可列舉如,具有脂環式環氧基的多官能脂環式環氧化合物等。(A)硬化性化合物,於含有脂環式環氧化合物時,於使用硬化性組成物時,將容易形成具有優良透明性的硬化物。Other examples of preferable epoxy compounds include, for example, polyfunctional alicyclic epoxy compounds having an alicyclic epoxy group. (A) When the curable compound contains an alicyclic epoxy compound, when the curable composition is used, it will easily form a cured product with excellent transparency.
該脂環式環氧化合物之具體例,例如,2-(3,4-環氧環己基-5,5-螺-3,4-環氧)環己烷-甲基-二噁烷、雙(3,4-環氧環己甲基)己二酸酯、雙(3,4-環氧基-6-甲基環己甲基)己二酸酯、3,4-環氧基-6-甲基環己基-3’,4’-環氧基-6’-甲基環己烷羧酸酯、ε-己內酯改質3,4-環氧環己甲基-3’,4’-環氧環己烷羧酸酯、三甲基己內酯改質3,4-環氧環己甲基-3’,4’-環氧環己烷羧酸酯、β-甲基-δ-戊內酯改質3,4-環氧環己甲基-3’,4’-環氧環己烷羧酸酯、伸甲基雙(3,4-環氧環己烷)、乙二醇之二(3,4-環氧環己甲基)醚、伸乙基雙(3,4-環氧環己烷羧酸酯),及具有氧化三環癸烯基之多官能環氧化合物,或下述式(a1-1)~(a1-5)所表示的化合物等。 該些脂環式環氧化合物可單獨使用,或將2種以上混合使用皆可。Specific examples of the alicyclic epoxy compound, for example, 2-(3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy)cyclohexane-methyl-dioxane, bis (3,4-epoxycyclohexylmethyl)adipate, bis(3,4-epoxy-6-methylcyclohexylmethyl)adipate, 3,4-epoxy-6 -Methylcyclohexyl-3',4'-epoxy-6'-methylcyclohexanecarboxylate, ε-caprolactone modified 3,4-epoxycyclohexyl-3',4 '-Epoxycyclohexane carboxylate, trimethylcaprolactone modified 3,4-epoxycyclohexyl-3',4'-epoxycyclohexane carboxylate, β-methyl- δ-valerolactone modified 3,4-epoxycyclohexyl-3',4'-epoxycyclohexane carboxylate, methylene bis(3,4-epoxycyclohexane), ethyl Diol bis(3,4-epoxycyclohexyl) ether, ethylidene bis(3,4-epoxycyclohexanecarboxylate), and polyfunctional epoxy with oxidized tricyclodecenyl Compounds, or compounds represented by the following formulas (a1-1) to (a1-5), etc. These alicyclic epoxy compounds may be used alone or in combination of two or more.
(式(a1-1)中,Z表示單鍵或連結基(具有1個以上原子的二價之基);Ra1 ~Ra18 各自獨立為由氫原子、鹵素原子,及有機基所成之群所選擇之基)。 (In the formula (a1-1), Z represents a single bond or a linking group (a divalent base having more than one atom); R a1 ~ R a18 are each independently formed by a hydrogen atom, a halogen atom, and an organic group basis of group selection).
連結基Z,例如,由2價之烴基、-O-、-O-CO-、-S-、-SO-、-SO2 -、-CBr2 -、-C(CBr3 )2 -、-C(CF3 )2 -,及 -Ra19 -O-CO-所成之群所選擇之2價之基,及由複數個該些基鍵結形成之基等。Linking group Z, for example, consists of divalent hydrocarbon group, -O-, -O-CO-, -S-, -SO-, -SO 2 -, -CBr 2 -, -C(CBr 3 ) 2 -, - A divalent group selected from the group formed by C(CF 3 ) 2 -, and -R a19 -O-CO-, a group formed by bonding a plurality of these groups, and the like.
連結基Z的二價之烴基,例如,碳原子數為1以上、18以下之直鏈狀或支鏈狀的伸烷基、二價之脂環式烴基等。碳原子數為1以上、18以下之直鏈狀或支鏈狀的伸烷基,例如,伸甲基、甲基伸甲基、二甲基伸甲基、伸二甲基、伸三甲基等。上述二價之脂環式烴基,例如,1,2-環伸戊基、1,3-環伸戊基、環亞戊基、1,2-環己基、1,3-環己基、1,4-環己基、環亞己基等的環伸烷基(包含環亞烷基)等。The divalent hydrocarbon group of the linking group Z is, for example, a linear or branched alkylene group having 1 to 18 carbon atoms, a divalent alicyclic hydrocarbon group, and the like. A linear or branched chain alkylene group having 1 to 18 carbon atoms, for example, methylene, methylethylene, dimethylylene, dimethylene, trimethylene, etc. The above divalent alicyclic hydrocarbon groups, for example, 1,2-cyclopentyl, 1,3-cyclopentyl, cyclopentylene, 1,2-cyclohexyl, 1,3-cyclohexyl, 1, 4-cyclohexyl, cycloalkylene such as cyclohexylene (including cycloalkylene), and the like.
Ra19 為碳原子數為1以上、8以下之伸烷基,又以伸甲基或伸乙基為佳。R a19 is an alkylene group having 1 to 8 carbon atoms, preferably a methylene group or an ethylene group.
(式(a1-2)中,Ra1 ~Ra12 為由氫原子、鹵素原子,及有機基所成之群所選擇之基)。(In the formula (a1-2), R a1 to R a12 are selected from the group consisting of a hydrogen atom, a halogen atom, and an organic group).
(式(a1-3)中,Ra1 ~Ra10 為由氫原子、鹵素原子,及有機基所成之群所選擇之基;Ra2 及Ra8 可互相鍵結)。 (In the formula (a1-3), R a1 ~R a10 is a group selected from a hydrogen atom, a halogen atom, and an organic group; R a2 and R a8 can be bonded to each other).
(式(a1-4)中,Ra1 ~Ra12 為由氫原子、鹵素原子,及有機基所成之群所選擇之基;Ra2 及Ra10 可互相鍵結)。 (In the formula (a1-4), R a1 ~R a12 is a group selected from a hydrogen atom, a halogen atom, and an organic group; R a2 and R a10 can be bonded to each other).
(式(a1-5)中,Ra1 ~Ra12 為由氫原子、鹵素原子,及有機基所成之群所選擇之基)。 (In formula (a1-5), R a1 to R a12 are selected from the group consisting of hydrogen atom, halogen atom, and organic group).
式(a1-1)~(a1-5)中,Ra1 ~Ra18 為有機基時,該有機基只要為未阻礙本發明目的之範圍時,並未有特別之限定,其可為烴基、碳原子與鹵素原子所形成之基、碳原子及氫原子所形成並含有鹵素原子、氧原子、硫原子、氮原子、矽原子等雜原子之基皆可。鹵素原子之例示,例如,氯原子、溴原子、碘原子,及氟原子等。In formula (a1-1)~(a1-5), when R a1 ~R a18 is an organic group, as long as the organic group is within the range that does not hinder the purpose of the present invention, there is no special limitation, and it can be hydrocarbon group, A group formed by a carbon atom and a halogen atom, or a group formed by a carbon atom and a hydrogen atom and containing a heteroatom such as a halogen atom, an oxygen atom, a sulfur atom, a nitrogen atom, or a silicon atom may be used. Examples of halogen atoms include chlorine atoms, bromine atoms, iodine atoms, and fluorine atoms.
有機基,可列舉如,由烴基,與碳原子、氫原子,及氧原子所形成的基;與鹵化烴基,與碳原子、氧原子,及鹵素原子所形成的基;與碳原子、氫原子、氧原子,及鹵素原子所形成的基為佳。有機基為烴基時,烴基可為芳香族烴基、脂肪族烴基、含有芳香族骨架與脂肪族骨架之基皆可。有機基的碳原子數以1以上、20以下為佳,以1以上、10以下為較佳,以1以上、5以下為特佳。Organic groups include, for example, groups formed with hydrocarbon groups, carbon atoms, hydrogen atoms, and oxygen atoms; groups formed with halogenated hydrocarbon groups, carbon atoms, oxygen atoms, and halogen atoms; groups formed with carbon atoms, hydrogen atoms , an oxygen atom, and a group formed by a halogen atom are preferred. When the organic group is a hydrocarbon group, the hydrocarbon group may be an aromatic hydrocarbon group, an aliphatic hydrocarbon group, or a group containing an aromatic skeleton or an aliphatic skeleton. The number of carbon atoms in the organic group is preferably from 1 to 20, more preferably from 1 to 10, and particularly preferably from 1 to 5.
烴基之具體例,例如,甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基、n-己基、n-庚基、n-辛基、2-乙基己基、n-壬基、n-癸基、n-十一烷基、n-三癸基、n-四癸基、n-十五烷基、n-十六烷基、n-十七烷基、n-十八烷基、n-十九烷基,及n-二十烷基等的鏈狀烷基;乙烯基、1-丙烯基、2-n-丙烯基(烯丙基)、1-n-丁烯基、2-n-丁烯基,及3-n-丁烯基等的鏈狀烯基;環丙基、環丁基、環戊基、環己基,及環庚基等的環烷基;苯基、o-甲苯基、m-甲苯基、p-甲苯基、α-萘基、β-萘基、聯苯-4-基、聯苯-3-基、聯苯-2-基、蒽基,及菲基等的芳基;苄基、苯乙基、α-萘甲基、β-萘甲基、α-萘乙基,及β-萘乙基等的芳烷基等。Specific examples of hydrocarbon groups, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, 2-ethylhexyl, n-nonyl, n-decyl, n-undecyl, n-tridecyl, n-tetradecyl, n-pentadecanyl Chain alkyl groups such as n-hexadecyl, n-heptadecyl, n-octadecyl, n-nonadecyl, and n-eicosyl; vinyl, 1-propene 2-n-propenyl (allyl), 1-n-butenyl, 2-n-butenyl, and chain alkenyl such as 3-n-butenyl; cyclopropyl, ring Cycloalkyl groups such as butyl, cyclopentyl, cyclohexyl, and cycloheptyl; phenyl, o-tolyl, m-tolyl, p-tolyl, α-naphthyl, β-naphthyl, biphenyl -4-yl, biphenyl-3-yl, biphenyl-2-yl, anthracenyl, and aryl such as phenanthrenyl; benzyl, phenethyl, α-naphthylmethyl, β-naphthylmethyl, α Aralkyl groups such as -naphthylethyl and β-naphthylethyl, etc.
鹵化烴基之具體例,例如,氯甲基、二氯甲基、三氯甲基、溴甲基、二溴甲基、三溴甲基、氟甲基、二氟甲基、三氟甲基、2,2,2-三氟乙基、五氟乙基、七氟丙基、全氟丁基,及全氟戊基、全氟己基、全氟庚基、全氟辛基、全氟壬基,及全氟癸基等的鹵化鏈狀烷基;2-氯環己基、3-氯環己基、4-氯環己基、2,4-二氯環己基、2-溴環己基、3-溴環己基,及4-溴環己基等的鹵化環烷基;2-氯苯基、3-氯苯基、4-氯苯基、2,3-二氯苯基、2,4-二氯苯基、2,5-二氯苯基、2,6-二氯苯基、3,4-二氯苯基、3,5-二氯苯基、2-溴苯基、3-溴苯基、4-溴苯基、2-氟苯基、3-氟苯基、4-氟苯基等的鹵化芳基;2-氯苯甲基、3-氯苯甲基、4-氯苯甲基、2-溴苯甲基、3-溴苯甲基、4-溴苯甲基、2-氟苯甲基、3-氟苯甲基、4-氟苯甲基等的鹵化芳烷基。Specific examples of halogenated hydrocarbon groups, for example, chloromethyl, dichloromethyl, trichloromethyl, bromomethyl, dibromomethyl, tribromomethyl, fluoromethyl, difluoromethyl, trifluoromethyl, 2,2,2-Trifluoroethyl, pentafluoroethyl, heptafluoropropyl, perfluorobutyl, and perfluoropentyl, perfluorohexyl, perfluoroheptyl, perfluorooctyl, perfluorononyl , and halogenated chain alkyl such as perfluorodecyl; 2-chlorocyclohexyl, 3-chlorocyclohexyl, 4-chlorocyclohexyl, 2,4-dichlorocyclohexyl, 2-bromocyclohexyl, 3-bromocyclohexyl Cyclohexyl, and halogenated cycloalkyl such as 4-bromocyclohexyl; 2-chlorophenyl, 3-chlorophenyl, 4-chlorophenyl, 2,3-dichlorophenyl, 2,4-dichlorobenzene Base, 2,5-dichlorophenyl, 2,6-dichlorophenyl, 3,4-dichlorophenyl, 3,5-dichlorophenyl, 2-bromophenyl, 3-bromophenyl, 4-bromophenyl, 2-fluorophenyl, 3-fluorophenyl, 4-fluorophenyl, etc. halogenated aryl; 2-chlorobenzyl, 3-chlorobenzyl, 4-chlorobenzyl, Aralkyl halides such as 2-bromobenzyl, 3-bromobenzyl, 4-bromobenzyl, 2-fluorobenzyl, 3-fluorobenzyl and 4-fluorobenzyl.
由碳原子、氫原子,及氧原子所形成的基之具體例,例如,羥甲基、2-羥乙基、3-羥基-n-丙基,及4-羥基-n-丁基等的羥基鏈狀烷基;2-羥基環己基、3-羥基環己基,及4-羥基環己基等的鹵化環烷基;2-羥苯基、3-羥苯基、4-羥苯基、2,3-二羥苯基、2,4-二羥苯基、2,5-二羥苯基、2,6-二羥苯基、3,4-二羥苯基,及3,5-二羥苯基等的羥基芳基;2-羥基苯甲基、3-羥基苯甲基,及4-羥基苯甲基等的羥基芳烷基;甲氧基、乙氧基、n-丙氧基、異丙氧基、n-丁氧基、異丁氧基、sec-丁氧基、tert-丁氧基、n-戊氧基、n-己氧基、n-庚氧基、n-辛氧基、2-乙基己氧基、n-壬氧基、n-癸氧基、n-十一烷氧基、n-三癸氧基、n-十四烷氧基、n-十五烷氧基、n-十六烷氧基、n-十七烷氧基、n-十八烷氧基、n-十九烷氧基,及n-二十烷氧基等的鏈狀烷氧基;乙烯氧基、1-丙烯氧基、2-n-丙烯氧基(烯丙氧基)、1-n-丁烯氧基、2-n-丁烯氧基,及3-n-丁烯氧基等的鏈狀烯氧基;苯氧基、o-甲苯氧基、m-甲苯氧基、p-甲苯氧基、α-萘氧基、β-萘氧基、聯苯-4-氧基、聯苯-3-氧基、聯苯-2-氧基、蒽氧基,及菲氧基等的芳氧基;苄氧基、苯乙氧基、α-萘甲氧基、β-萘甲氧基、α-萘乙氧基,及β-萘乙氧基等的芳烷氧基;甲氧甲基、乙氧甲基、n-丙氧甲基、2-甲氧乙基、2-乙氧乙基、2-n-丙氧乙基、3-甲氧基-n-丙基、3-乙氧基-n-丙基、3-n-丙氧基-n-丙基、4-甲氧基-n-丁基、4-乙氧基-n-丁基,及4-n-丙氧基-n-丁基等的烷氧烷基;甲氧甲氧基、乙氧甲氧基、n-丙氧甲氧基、2-甲氧基乙氧基、2-乙氧基乙氧基、2-n-丙氧基乙氧基、3-甲氧基-n-丙氧基、3-乙氧基-n-丙氧基、3-n-丙氧基-n-丙氧基、4-甲氧基-n-丁氧基、4-乙氧基-n-丁氧基,及4-n-丙氧基-n-丁氧基等的烷氧基烷氧基;2-甲氧苯基、3-甲氧苯基,及4-甲氧苯基等的烷氧基芳基;2-甲氧基苯氧基、3-甲氧基苯氧基,及4-甲氧基苯氧基等的烷氧基芳氧基;甲醯基、乙醯基、丙醯基、丁醯基、戊醯基、己醯基、庚醯基、辛醯基、壬醯基,及癸醯基等的脂肪族醯基;苯甲醯基、α-萘醯基,及β-萘醯基等的芳香族醯基;甲氧羰基、乙氧羰基、n-丙氧羰基、n-丁氧羰基、n-戊氧羰基、n-己氧羰基、n-庚氧羰基、n-辛氧羰基、n-壬氧羰基,及n-癸氧羰基等的鏈狀烷氧羰基;苯氧羰基、α-萘氧羰基,及β-萘氧羰基等的芳氧羰基;甲醯氧基、乙醯氧基、丙醯氧基、丁醯氧基、戊醯氧基、己醯氧基、庚醯氧基、辛醯氧基、壬醯氧基,及癸醯氧基等的脂肪族醯氧基;苯甲醯氧基、α-萘醯氧基,及β-萘醯氧基等的芳香族醯氧基。Specific examples of groups formed of carbon atoms, hydrogen atoms, and oxygen atoms, for example, hydroxymethyl, 2-hydroxyethyl, 3-hydroxy-n-propyl, and 4-hydroxy-n-butyl, etc. Hydroxy chain alkyl; 2-hydroxycyclohexyl, 3-hydroxycyclohexyl, and halogenated cycloalkyl such as 4-hydroxycyclohexyl; 2-hydroxyphenyl, 3-hydroxyphenyl, 4-hydroxyphenyl, 2 ,3-dihydroxyphenyl, 2,4-dihydroxyphenyl, 2,5-dihydroxyphenyl, 2,6-dihydroxyphenyl, 3,4-dihydroxyphenyl, and 3,5-dihydroxyphenyl Hydroxyaryl such as hydroxyphenyl; hydroxyaralkyl such as 2-hydroxybenzyl, 3-hydroxybenzyl, and 4-hydroxybenzyl; methoxy, ethoxy, n-propoxy , isopropoxy, n-butoxy, isobutoxy, sec-butoxy, tert-butoxy, n-pentyloxy, n-hexyloxy, n-heptyloxy, n-octyl Oxygen, 2-ethylhexyloxy, n-nonyloxy, n-decyloxy, n-undecyloxy, n-tridecyloxy, n-tetradecyloxy, n-pentadecyloxy Chain alkoxy groups such as alkoxy, n-hexadecyloxy, n-heptadecyloxy, n-octadecyloxy, n-nonadecyloxy, and n-eicosyloxy Ethyleneoxy, 1-propyleneoxy, 2-n-propyleneoxy (allyloxy), 1-n-buteneoxy, 2-n-buteneoxy, and 3-n-butene Chain alkenyloxy such as alkenyloxy; phenoxy, o-methylphenoxy, m-methylphenoxy, p-methylphenoxy, α-naphthyloxy, β-naphthyloxy, biphenyl-4- Oxygen, biphenyl-3-oxyl, biphenyl-2-oxyl, anthracenyloxy, and aryloxy such as phenanthrenyloxy; benzyloxy, phenethoxy, α-naphthylmethoxy, β -Naphthalene methoxy, α-naphthylethoxy, and β-naphthylethoxy aralkyloxy; methoxymethyl, ethoxymethyl, n-propoxymethyl, 2-methoxyethyl , 2-ethoxyethyl, 2-n-propoxyethyl, 3-methoxy-n-propyl, 3-ethoxy-n-propyl, 3-n-propoxy-n-propane Alkoxyalkyl groups such as 4-methoxy-n-butyl, 4-ethoxy-n-butyl, and 4-n-propoxy-n-butyl; methoxymethoxy, Ethoxymethoxy, n-propoxymethoxy, 2-methoxyethoxy, 2-ethoxyethoxy, 2-n-propoxyethoxy, 3-methoxy-n -propoxy, 3-ethoxy-n-propoxy, 3-n-propoxy-n-propoxy, 4-methoxy-n-butoxy, 4-ethoxy-n -butoxy, and alkoxyalkoxy such as 4-n-propoxy-n-butoxy; 2-methoxyphenyl, 3-methoxyphenyl, and 4-methoxyphenyl, etc. Alkoxyaryl group; 2-methoxyphenoxy, 3-methoxyphenoxy, and 4-methoxyphenoxy alkoxyaryloxy; formyl, acetyl , propionyl, butyryl, pentyl, hexyl, heptyl, octyl, nonyl, and aliphatic acyl such as decanyl; benzoyl, α-naphthyl, and β- Aromatic acyl groups such as naphthyl; methoxycarbonyl, ethoxycarbonyl, n-propoxycarbonyl, n-butoxycarbonyl, n-pentyloxycarbonyl, n-hexyloxycarbonyl, n-heptyloxycarbonyl, n- Chain alkoxycarbonyl such as octyloxycarbonyl, n-nonyloxycarbonyl, and n-decyloxycarbonyl; aryloxycarbonyl such as phenoxycarbonyl, α-naphthyloxycarbonyl, and β-naphthyloxycarbonyl; formyloxy , Acetyloxy, Propionyloxy, Butyloxy, Pentyloxy, Hexyloxy, Heptyloxy, Octyloxy, Nonyloxy, and Decyloxy, etc. Acyloxy; aromatic acyloxy groups such as benzoyloxy, α-naphthyloxy, and β-naphthyloxy.
Ra1 ~Ra18 各自獨立,以由氫原子、鹵素原子、碳原子數為1以上、5以下烷基,及碳原子數為1以上、5以下烷氧基所成之群所選擇之基為佳,特別是就容易形成具有機械特性的硬化膜之觀點,以Ra1 ~Ra18 全部為氫原子為較佳。R a1 to R a18 are independently selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group with 1 to 5 carbon atoms, and an alkoxy group with 1 to 5 carbon atoms. Preferably, especially from the viewpoint of easily forming a cured film with mechanical properties, it is more preferable that all of R a1 to R a18 are hydrogen atoms.
式(a1-2)~(a1-5)中,Ra1 ~Ra12 與式(a1-1)中之Ra1 ~Ra12 為相同之內容。式(a1-2)及式(a1-4)中,Ra2 及Ra10 於互相鍵結時所形成的2價之基,例如,-CH2 -、-C(CH3 )2 -等。式(a1-3)中,Ra2 及Ra8 於互相鍵結時所形成的2價之基,例如,-CH2 -、-C(CH3 )2 -等。In formulas (a1-2) to (a1-5), R a1 to R a12 are the same as R a1 to R a12 in formula (a1-1). In formula (a1-2) and formula (a1-4), a divalent group formed when R a2 and R a10 are mutually bonded, for example, -CH 2 -, -C(CH 3 ) 2 -, etc. In formula (a1-3), a divalent group formed when R a2 and R a8 are mutually bonded, for example, -CH 2 -, -C(CH 3 ) 2 -, etc.
式(a1-1)所表示的脂環式環氧化合物中,較佳的化合物之具體例,例如,下述式(a1-1a)、下述式(a1-1b),及下述式(a1-1c)所表示的脂環式環氧化合物,或2,2-雙(3,4-環氧環己烷-1-基)丙烷[=2,2-雙(3,4-環氧環己基)丙烷]等。 Among the alicyclic epoxy compounds represented by formula (a1-1), specific examples of preferred compounds include, for example, the following formula (a1-1a), the following formula (a1-1b), and the following formula ( a1-1c) represented cycloaliphatic epoxy compound, or 2,2-bis(3,4-epoxycyclohexane-1-yl) propane [=2,2-bis(3,4-epoxy Cyclohexyl) propane] and so on.
式(a1-2)所表示的脂環式環氧化合物中,較佳的化合物之具體例,例如,下述式(a1-2a)所表示的二環十二烯二環氧化物,或二環十二烯二環氧化物等。 Among the alicyclic epoxy compounds represented by formula (a1-2), specific examples of preferred compounds are, for example, bicyclododecene diepoxides represented by the following formula (a1-2a), or bis- Cyclododecene diepoxide, etc.
式(a1-3)所表示的脂環式環氧化合物中,較佳的化合物之具體例,例如,S螺[3-氧雜三環[3.2.1.02,4 ]辛烷-6,2’-環氧乙烷]等。Among the alicyclic epoxy compounds represented by the formula (a1-3), specific examples of preferred compounds are, for example, S-spiro[3-oxatricyclo[3.2.1.0 2,4 ]octane-6,2 '-Ethylene oxide] and so on.
式(a1-4)所表示的脂環式環氧化合物中,較佳的化合物之具體例,例如,4-乙烯基環己烯二氧化物、二戊烯二氧化物、檸檬烯二氧化物、1-甲基-4-(3-甲基環氧乙烷-2-基)-7-氧雜二環[4.1.0]庚烷等。Among the alicyclic epoxy compounds represented by the formula (a1-4), specific examples of preferred compounds include, for example, 4-vinylcyclohexene dioxide, dipentene dioxide, limonene dioxide, 1-methyl-4-(3-methyloxiran-2-yl)-7-oxabicyclo[4.1.0]heptane, etc.
式(a1-5)所表示的脂環式環氧化合物中,較佳的化合物之具體例,例如,1,2,5,6-二環氧環辛烷等。Among the alicyclic epoxy compounds represented by the formula (a1-5), specific examples of preferable compounds include, for example, 1,2,5,6-diepoxycyclooctane and the like.
(式(a1-I)所表示的化合物) (式(a1-I)中,Xa1 、Xa2 ,及Xa3 各自獨立為,氫原子,或可含有環氧基的有機基,Xa1 、Xa2 ,及Xa3 所具有的環氧基之總數為2以上)。(compound represented by formula (a1-I)) (In formula (a1-I), X a1 , X a2 , and X a3 are each independently a hydrogen atom, or an organic group that may contain an epoxy group, and the epoxy group contained in X a1 , X a2 , and X a3 The total number is 2 or more).
上述式(a1-I)所表示的化合物中,以下述式(a1-II)所表示的化合物為佳。 (式(a1-II)中,Ra20 ~Ra22 為由直鏈狀、支鏈狀或環狀之伸烷基、伸芳基、-O-、-C(=O)-、-NH-及該些的組合所形成的基,其可分別為同亦可、相異亦可。E1 ~E3 為由環氧基、氧環丁烷基、乙烯性不飽合基、烷氧矽烷基、異氰酸酯基、嵌段異氰酸酯基、硫醇基、羧基、羥基及琥珀酸酐基所成之群所選出之至少1種的取代基或氫原子。但,E1 ~E3 中之至少2個,為由環氧基及氧環丁烷基所成之群所選出之至少1種)。Among the compounds represented by the above formula (a1-I), compounds represented by the following formula (a1-II) are preferred. (In the formula (a1-II), R a20 ~ R a22 are linear, branched or cyclic alkylene, aryl, -O-, -C(=O)-, -NH- And the groups formed by the combination of these can be the same or different respectively. E 1 ~ E 3 are epoxy groups, oxetane groups, ethylenically unsaturated groups, alkoxysilanes group, isocyanate group, blocked isocyanate group, thiol group, carboxyl group, hydroxyl group and succinic anhydride group, at least one substituent or hydrogen atom selected from the group. However, at least two of E 1 to E 3 , is at least one selected from the group consisting of epoxy group and oxetanyl group).
式(a1-II)中,Ra20 與E1 、Ra21 與E2 ,及Ra22 與E3 所示之基,例如,至少2個分別為下述式(a1-IIa)所表示之基為佳,又以全部分別為下述式(a1-IIa)所表示之基為較佳。1個化合物所鍵結的複數之式(a1-IIa)所表示之基,又以相同之基為佳。 -L-Ca (a1-IIa) (式(a1-IIa)中,L為直鏈狀、支鏈狀或環狀之伸烷基、伸芳基、-O-、-C(=O)-、-NH-及該些的組合所形成的基,Ca 為環氧基。式(a1-IIa)中,L與Ca 可鍵結形成環狀結構)。In formula (a1-II), the groups represented by R a20 and E 1 , R a21 and E 2 , and R a22 and E 3 are, for example, at least two groups represented by the following formula (a1-IIa) More preferably, all are groups represented by the following formulas (a1-IIa) respectively. The groups represented by the plural formula (a1-IIa) to which one compound is bonded are preferably the same group. -LC a (a1-IIa) (In the formula (a1-IIa), L is a linear, branched or cyclic alkylene group, arylylene group, -O-, -C(=O)-, -NH- and the group formed by the combination thereof, C a is an epoxy group. In the formula (a1-IIa), L and C a may be bonded to form a ring structure).
式(a1-IIa)中,L之直鏈狀、支鏈狀或環狀之伸烷基,例如,以碳原子數1以上、10以下伸烷基為佳,又,L之伸芳基,例如,以碳原子數5以上、10以下伸芳基為佳。式(a1-IIa)中,L以直鏈狀的碳原子數為1以上、3以下伸烷基、伸苯基、-O-、-C(=O)-、-NH-及該些的組合所形成的基為佳,以伸甲基等的直鏈狀的碳原子數為1以上、3以下伸烷基及伸苯基之至少1種,或,該些與-O-、 -C(=O)-及NH-的至少1種之組合所形成的基為更佳。In the formula (a1-IIa), the straight-chain, branched or cyclic alkylene group of L is preferably an alkylene group having 1 to 10 carbon atoms, and the arylylene group of L, For example, an aryl group having 5 to 10 carbon atoms is preferable. In the formula (a1-IIa), L is a linear chain with 1 to 3 carbon atoms, alkylene, phenylene, -O-, -C(=O)-, -NH-, and these The group formed by combination is preferably at least one of straight-chain alkylene and phenylene groups having 1 to 3 carbon atoms such as a methylene group, or these are combined with -O-, The group formed by the combination of at least one of -C(=O)- and NH- is more preferable.
式(a1-IIa)中,L與Ca 鍵結形成環狀結構時,例如,支鏈狀的伸烷基與環氧基鍵結形成環狀結構(具有脂環結構之環氧基結構)時,為下述式(a1-IIb)~(a1-IId)所表示的有機基等。 (式(a1-IIb)中,Ra23 為氫原子或甲基)。In the formula (a1-IIa), when L and C a are bonded to form a ring structure, for example, a branched chain alkylene group is bonded to an epoxy group to form a ring structure (an epoxy group structure with an alicyclic structure) In this case, it is an organic group or the like represented by the following formulas (a1-IIb) to (a1-IId). (In the formula (a1-IIb), R a23 is a hydrogen atom or a methyl group).
以下,為舉例說明式(a1-II)所表示的化合物的環氧乙烷基,或具有脂環式環氧基的環氧化合物,但並非僅限定於該些內容。 Hereinafter, although the oxirane group of the compound represented by formula (a1-II) or the epoxy compound which has an alicyclic epoxy group is illustrated, it is not limited to these content.
(式(a1-III)所表示的矽氧環氧化合物) 上述矽氧烷化合物中,又以下述式(a1-III)所表示的具有環狀矽氧烷骨架的化合物(以下,亦僅稱為「環狀矽氧烷」之時)為佳。 (Silicone epoxy compound represented by formula (a1-III)) Among the above-mentioned siloxane compounds, compounds having a cyclic siloxane skeleton represented by the following formula (a1-III) (hereinafter also referred to as When it is "cyclosiloxane"), it is preferred.
式(a1-III)中,Ra24 ,及Ra25 表示含有環氧基的一價之基或烷基。但,式(a1-III)所表示的化合物中,x1個Ra24 及x1個Ra25 中,至少有2個為含有環氧基的一價之基。又,式(a1-III)中之x1表示3以上之整數。又,式(a1-III)所表示的化合物中,Ra24 、Ra25 可為相同亦可、相異亦可。又,複數之Ra24 可為相同亦可、相異亦可。複數之Ra25 亦可為相同亦可、相異亦可。 上述烷基,例如,甲基、乙基、丙基、異丙基等的碳原子數為1以上、18以下(較佳為碳原子數1以上、6以下,特佳為碳原子數1以上、3以下)直鏈狀或支鏈狀的烷基。In formula (a1-III), R a24 and R a25 represent a monovalent group or an alkyl group containing an epoxy group. However, in the compound represented by the formula (a1-III), at least two of x1 R a24 and x1 R a25 are monovalent groups containing an epoxy group. In addition, x1 in formula (a1-III) represents an integer of 3 or more. In addition, in the compound represented by formula (a1-III), R a24 and R a25 may be the same or different. In addition, plural R a24 may be the same or different. Plural R a25 may be the same or different. The above-mentioned alkyl group, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, etc. have a carbon number of 1 to 18 (preferably a carbon number of 1 to 6, particularly preferably a carbon number of 1 or more) , 3 or less) straight-chain or branched-chain alkyl group.
式(a1-III)中之x1表示3以上之整數,其中,又就形成硬化膜之際,具有優良交聯反應性之觀點,而以3以上、6以下之整數為佳。x1 in the formula (a1-III) represents an integer of 3 or more, and an integer of 3 or more and 6 or less is preferable from the viewpoint of excellent crosslinking reactivity when forming a cured film.
矽氧烷化合物於分子內具有的環氧基之數為2個以上,又就形成硬化膜之際,可使交聯反應性更優良之觀點,而以2個以上、6個以下為佳,特佳為2個以上、4個以下。The number of epoxy groups in the molecule of the siloxane compound is 2 or more, and from the viewpoint of better cross-linking reactivity when forming a cured film, preferably 2 or more and 6 or less, Most preferably, there are 2 or more and 4 or less.
上述含有環氧基的一價之基,可列舉如,脂環式環氧基、縮水甘油醚基等,又以脂環式環氧基為佳,以下述式(a1-IIIa)或下述式(a1-IIIb)所表示的脂環式環氧基為較佳。 (上述式中,D1 及D2 各自獨立表示伸烷基;ms表示0以上、2以下之整數;*表示鍵結鍵)。 上述伸烷基,例如,伸甲基、甲基伸甲基、二甲基伸甲基、伸二甲基、伸三甲基等的碳原子數為1以上、18以下之直鏈狀或支鏈狀的伸烷基等。The above-mentioned monovalent bases containing epoxy groups can include, for example, alicyclic epoxy groups, glycidyl ether groups, etc., and alicyclic epoxy groups are preferred, with the following formula (a1-IIIa) or the following The alicyclic epoxy group represented by the formula (a1-IIIb) is preferable. (In the above formula, D1 and D2 each independently represent an alkylene group; ms represents an integer between 0 and 2; * represents a bond). The above-mentioned alkylene group, for example, a straight chain or branched chain having 1 to 18 carbon atoms such as methylene, methyl methylene, dimethyl methylene, dimethyl methylene, tri methylene, etc. alkylene etc.
硬化性組成物,除式(a1-III)所表示的矽氧烷化合物以外,亦可含有脂環式含環氧基之環狀矽氧烷、特開2008-248169號公報記載之脂環式含環氧基之聚矽氧樹脂,及特開2008-19422號公報記載之1分子中至少具有2個環氧官能性基之有機聚倍半矽氧烷樹脂等,具有矽氧烷骨架的化合物。The curable composition, in addition to the siloxane compound represented by formula (a1-III), may also contain alicyclic epoxy group-containing cyclic siloxane, the alicyclic siloxane described in JP-A-2008-248169 Polysiloxane resins containing epoxy groups, and organic polysilsesquioxane resins having at least two epoxy functional groups in one molecule described in JP-A-2008-19422, etc., compounds having a siloxane skeleton .
矽氧烷化合物,更具體而言,可列舉如,下述式所表示的分子內具有2個以上之環氧基的環狀矽氧烷等,但本發明並非僅限定於該些內容。又,矽氧烷化合物,例如,可使用商品名「X-40-2670」,「X-40-2701」,「X-40-2728」,「X-40-2738」,「X-40-2740」(以上、信越化學工業公司製)等的市售品。More specifically, the siloxane compound includes, for example, cyclic siloxane having two or more epoxy groups in the molecule represented by the following formula, but the present invention is not limited thereto. In addition, silicone compounds, for example, can use trade names "X-40-2670", "X-40-2701", "X-40-2728", "X-40-2738", "X-40- 2740" (above, manufactured by Shin-Etsu Chemical Co., Ltd.).
(環硫醚化合物) 環硫醚化合物之種類,於未阻礙本發明目的之範圍,並未有特別之限定。較佳的環硫醚化合物,例如,於前述之環氧化合物中,環氧基中之氧原子被硫原子所取代之化合物等。(cyclic sulfide compound) The type of cyclic sulfide compound is not particularly limited as long as it does not hinder the object of the present invention. Preferable cyclic thioether compounds are, for example, compounds in which the oxygen atom in the epoxy group is replaced by a sulfur atom among the aforementioned epoxy compounds.
(乙烯醚化合物) (A)硬化性化合物中,可含有或不含有含乙烯氧基的乙烯醚化合物皆可。 乙烯醚化合物,只要為具有乙烯氧基,且可進行陽離子聚合的化合物時,並未有特別之限定。 乙烯醚化合物,可含有芳香族基亦可、不含有芳香族基亦可。 就硬化物具有良好的耐熱分解性之觀點,乙烯醚化合物,以具有鍵結於芳香族基的乙烯氧基之化合物為佳。(vinyl ether compound) (A) The curable compound may or may not contain an ethyleneoxy group-containing vinyl ether compound. The vinyl ether compound is not particularly limited as long as it has a vinyloxy group and is cationically polymerizable. The vinyl ether compound may or may not contain an aromatic group. From the viewpoint of good thermal decomposition resistance of the cured product, the vinyl ether compound is preferably a compound having a vinyloxy group bonded to an aromatic group.
乙烯醚化合物的較佳具體例,可列舉如,乙烯苯醚、4-乙烯氧基甲苯、3-乙烯氧基甲苯、2-乙烯氧基甲苯、1-乙烯氧基-4-氯苯、1-乙烯氧基-3-氯苯、1-乙烯氧基-2-氯苯、1-乙烯氧基-2,3-二甲基苯、1-乙烯氧基-2,4-二甲基苯、1-乙烯氧基-2,5-二甲基苯、1-乙烯氧基-2,6-二甲基苯、1-乙烯氧基-3,4-二甲基苯、1-乙烯氧基-3,5-二甲基苯、1-乙烯氧基萘、2-乙烯氧基萘、2-乙烯氧基茀、3-乙烯氧基茀、4-乙烯氧基-1,1’-聯苯、3-乙烯氧基-1,1’-聯苯、2-乙烯氧基-1,1’-聯苯、6-乙烯氧基四氫萘,及5-乙烯氧基四氫萘等的芳香族單乙烯醚化合物;1,4-二乙烯氧基苯、1,3-二乙烯氧基苯、1,2-二乙烯氧基苯、1,4-二乙烯氧基萘、1,3-二乙烯氧基萘、1,2-二乙烯氧基萘、1,5-二乙烯氧基萘、1,6-二乙烯氧基萘、1,7-二乙烯氧基萘、1,8-二乙烯氧基萘、2,3-二乙烯氧基萘、2,6-二乙烯氧基萘、2,7-二乙烯氧基萘、1,2-二乙烯氧基茀、3,4-二乙烯氧基茀、2,7-二乙烯氧基茀、4,4’-二乙烯氧基聯苯、3,3’-二乙烯氧基聯苯、2,2’-二乙烯氧基聯苯、3,4’-二乙烯氧基聯苯、2,3’-二乙烯氧基聯苯、2,4’-二乙烯氧基聯苯,及雙酚A二乙烯醚等的芳香族二乙烯醚化合物等。 該些乙烯醚化合物,亦可將2種以上組合使用。Preferred specific examples of vinyl ether compounds include, for example, vinylphenyl ether, 4-vinyloxytoluene, 3-vinyloxytoluene, 2-vinyloxytoluene, 1-vinyloxy-4-chlorobenzene, 1 - Vinyloxy-3-chlorobenzene, 1-vinyloxy-2-chlorobenzene, 1-vinyloxy-2,3-dimethylbenzene, 1-vinyloxy-2,4-dimethylbenzene , 1-vinyloxy-2,5-dimethylbenzene, 1-vinyloxy-2,6-dimethylbenzene, 1-vinyloxy-3,4-dimethylbenzene, 1-ethyleneoxy Base-3,5-dimethylbenzene, 1-vinyloxynaphthalene, 2-vinyloxynaphthalene, 2-vinyloxystilbene, 3-vinyloxystilbene, 4-vinyloxy-1,1'- Biphenyl, 3-vinyloxy-1,1'-biphenyl, 2-vinyloxy-1,1'-biphenyl, 6-vinyloxytetralin, and 5-vinyloxytetralin, etc. Aromatic monovinyl ether compounds; 1,4-divinyloxybenzene, 1,3-divinyloxybenzene, 1,2-divinyloxybenzene, 1,4-divinyloxynaphthalene, 1, 3-divinyloxynaphthalene, 1,2-divinyloxynaphthalene, 1,5-divinyloxynaphthalene, 1,6-divinyloxynaphthalene, 1,7-divinyloxynaphthalene, 1, 8-divinyloxynaphthalene, 2,3-divinyloxynaphthalene, 2,6-divinyloxynaphthalene, 2,7-divinyloxynaphthalene, 1,2-divinyloxynaphthalene, 3, 4-divinyloxydiphenyl, 2,7-divinyloxydiphenyl, 4,4'-divinyloxybiphenyl, 3,3'-divinyloxybiphenyl, 2,2'-divinyloxy Aryl biphenyl, 3,4'-divinyloxybiphenyl, 2,3'-divinyloxybiphenyl, 2,4'-divinyloxybiphenyl, and bisphenol A divinyl ether, etc. family of divinyl ether compounds, etc. These vinyl ether compounds may be used in combination of two or more.
(具有三環結構之聚合物) 具有三環結構之聚合物,以與以上說明的其他的(A)硬化性化合物混合使用者為佳。 上述具有三環結構之聚合物(以下亦簡稱為「含三環之聚合物」)之例如,下述式(t1)~(t16)所示者等。(with three polymers with ring structure) have three The ring-structured polymer is preferably used in combination with other (A) hardening compounds described above. The above has three Ring-structured polymers (hereinafter also referred to as "three-containing Ring polymer"), for example, those represented by the following formulas (t1) to (t16).
上述式中,R及R’,各自獨立表示氫原子、烷基、烷氧基、芳基或芳烷基,就使折射率更為提升之觀點,以皆為氫原子為佳;R1 ~R3 及R1’ ~R4’ ,各自獨立表示氫原子、鹵素原子、羧基、磺酸基、碳原子數1以上、10以下的可具有分支結構之烷基,或碳原子數1以上、10以下的可具有分支結構之烷氧基;R102 及R103 表示互相獨立的碳原子數1以上、5以下之烷基)。 In the above formula, R and R' each independently represent a hydrogen atom, an alkyl group, an alkoxy group, an aryl group or an aralkyl group, and it is preferable that they are all hydrogen atoms in order to improve the refractive index; R 1 ~ R 3 and R 1' ~R 4' each independently represent a hydrogen atom, a halogen atom, a carboxyl group, a sulfonic acid group, an alkyl group with 1 to 10 carbon atoms that may have a branched structure, or an alkyl group with 1 or more carbon atoms, An alkoxy group of 10 or less which may have a branched structure; R 102 and R 103 represent mutually independent alkyl groups with 1 to 5 carbon atoms).
(式中,R、R’、R1 ~R3 、R1’ ~R4’ 、R102 及R103 ,表示與上述為相同之意義)。 (In the formula, R, R', R 1 to R 3 , R 1' to R 4' , R 102 and R 103 have the same meaning as above).
(式中,R、R’、R1 ~R3 及R1’ ~R4’ ,表示與上述為相同之意義)。 (In the formula, R, R', R 1 to R 3 and R 1' to R 4' represent the same meaning as above).
(式中,R、R’、R1 ~R3 及R1’ ~R4’ ,表示與上述為相同之意義,R4 表示氫原子、鹵素原子、羧基、磺酸基、碳原子數1以上、10以下的具有分支結構之烷基,或碳原子數1以上、10以下的具有分支結構之烷氧基;R102 及R103 表示互相獨立的碳原子數1以上、5以下之烷基)。 (In the formula, R, R', R 1 ~ R 3 and R 1' ~ R 4' represent the same meaning as above, and R 4 represents a hydrogen atom, a halogen atom, a carboxyl group, a sulfonic acid group, and a carbon atom number of 1 An alkyl group with a branched structure of 1 to 10, or an alkoxy group with a branched structure with 1 to 10 carbon atoms; R 102 and R 103 represent mutually independent alkyl groups with 1 to 5 carbon atoms ).
(式中,R、R’、R1 ~R4 、R1’ ~R4’ 、R102 及R103 ,表示與上述為相同之意義)。 (In the formula, R, R', R 1 to R 4 , R 1' to R 4' , R 102 and R 103 have the same meaning as above).
(式中,R、R’、R1 ~R4 及R1’ ~R4’ ,表示與上述為相同之意義)。 (In the formula, R, R', R 1 to R 4 and R 1' to R 4' represent the same meaning as above).
(式中,R、R’、R1 ~R3 及R1’ ~R4’ ,表示與上述為相同之意義,R102 及R103 表示互相獨立的碳原子數1以上、5以下之烷基)。 (In the formula, R, R', R 1 to R 3 and R 1' to R 4' represent the same meaning as above, R 102 and R 103 represent mutually independent alkanes with 1 to 5 carbon atoms base).
(式中,R、R’、R1 ~R3 、R1’ ~R4’ 、R102 及R103 ,表示與上述為相同之意義)。 (In the formula, R, R', R 1 to R 3 , R 1' to R 4' , R 102 and R 103 have the same meaning as above).
(式中,R、R’、R1 ~R3 及R1’ ~R4’ ,表示與上述為相同之意義)。 (In the formula, R, R', R 1 to R 3 and R 1' to R 4' represent the same meaning as above).
(式中,R、R’、R1 ~R4 及R1’ ~R4’ ,表示與上述為相同之意義,R102 及R103 表示互相獨立的碳原子數1以上、5以下之烷基)。 (In the formula, R, R', R 1 to R 4 and R 1' to R 4' represent the same meaning as above, R 102 and R 103 represent mutually independent alkanes with 1 to 5 carbon atoms base).
(式中,R、R’、R1 ~R4 、R1’ ~R4’ 、R102 及R103 ,表示與上述為相同之意義)。 (In the formula, R, R', R 1 to R 4 , R 1' to R 4' , R 102 and R 103 have the same meaning as above).
(式中,R、R’、R1 ~R4 及R1’ ~R4’ ,表示與上述為相同之意義)。 (In the formula, R, R', R 1 to R 4 and R 1' to R 4' represent the same meaning as above).
含三環之聚合物之重量平均分子量(Mw),並未有特別限定者,一般以500以上、500,000以下為佳,又以500以上、100,000以下為更佳,就達成本發明效果之觀點,以2,000以上為佳,就可使溶解性更為提高、所得之溶液的黏度降低之觀點,以50,000以下為佳,以30,000以下為較佳,又更以10,000以下為佳。 又,本發明中之Mw為使用凝膠滲透色層分析(以下,GPC)分析所得之標準聚苯乙烯換算的平均分子量。Contains three The weight average molecular weight (Mw) of the polymer of the ring is not particularly limited. Generally, it is more than 500 and less than 500,000, and it is more preferably more than 500 and less than 100,000. From the viewpoint of achieving the effect of the present invention, 2,000 The above is preferable, and the solubility can be further improved and the viscosity of the obtained solution can be lowered. It is preferably 50,000 or less, more preferably 30,000 or less, and more preferably 10,000 or less. In addition, Mw in the present invention is an average molecular weight in terms of standard polystyrene as analyzed by gel permeation chromatography (hereinafter, GPC).
含三環之聚合物,例如,可依國際公開第2010/128661號所揭示之方法製得。Contains three Ring polymers, for example, can be prepared according to the method disclosed in International Publication No. 2010/128661.
又,含三環之聚合物,以具有至少1個二胺末端,且該二胺末端中至少一個被醯基、烷氧羰基、芳烷氧羰基或芳氧羰基等的含羰基之基所密封者為佳。如此,經被含羰基之基密封末端時,可抑制含三環之聚合物的著色。Also, including three The ring polymer preferably has at least one diamine terminal, and at least one of the diamine terminals is sealed with a carbonyl-containing group such as an acyl group, an alkoxycarbonyl group, an aralkoxycarbonyl group, or an aryloxycarbonyl group. In this way, when the end is sealed by a carbonyl-containing group, it can inhibit the Coloring of ring polymers.
醯基之具體例,例如,乙醯基、乙羰基、丙烯醯基、甲基丙烯醯基、苯甲醯基等。 烷氧羰基之具體例,例如,甲氧羰基、乙氧羰基、t-丁氧羰基等。 芳烷氧羰基之具體例,例如,苄氧羰基等。 芳氧羰基之具體例,例如,苯氧羰基等。 該些之中,又以末端密封基,例如,醯基為佳,於考慮試劑取得之容易性等時,以丙烯醯基、甲基丙烯醯基、乙醯基為較佳。Specific examples of the acyl group include, for example, an acetyl group, an ethylcarbonyl group, an acryl group, a methacryl group, and a benzoyl group. Specific examples of the alkoxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, t-butoxycarbonyl and the like. Specific examples of aralkoxycarbonyl include benzyloxycarbonyl and the like. Specific examples of aryloxycarbonyl include, for example, phenoxycarbonyl and the like. Among these, terminal sealing groups such as acyl group are preferable, and acryl group, methacryl group, and acetyl group are more preferable in consideration of the ease of obtaining reagents.
末端密封之方法,可使用公知之方法即可,例如,使用酸鹵化物、酸酐等處理即可。 此時,末端密封劑之使用量,相對於由未於聚合反應使用而剩餘的二胺基化合物產生的胺基1當量,以0.05當量以上、10當量以下左右為佳,以0.1當量以上、5當量以下為較佳,以0.5當量以上、2當量以下為更佳。As a method of sealing the ends, a known method may be used, for example, treatment with an acid halide, an acid anhydride, or the like may be used. At this time, the amount of the terminal sealant used is preferably 0.05 equivalent or more and 10 equivalent or less, and preferably 0.1 equivalent or more and 5 It is preferably not more than an equivalent, and more preferably not less than 0.5 equivalents and not more than 2 equivalents.
(A)硬化性化合物可單獨使用亦可、將複數種混合使用亦可。 硬化性組成物中,(A)硬化性化合物之含量,只要為未阻礙本發明目的之範圍,並未有特別之限定。硬化性組成物中的(A)硬化性化合物之含量,於硬化性組成物的固形成份全體設為100質量份時,以60質量份以上、99.9質量份以下為佳,以75質量份以上、99.5質量份以下為較佳,以90質量份以上、99質量份以下為特佳。(A) The hardening compound may be used individually or in mixture of several types. In the curable composition, the content of the (A) curable compound is not particularly limited as long as it is within the range that does not hinder the object of the present invention. The content of (A) the curable compound in the curable composition is preferably not less than 60 parts by mass and not more than 99.9 parts by mass, and preferably not less than 75 parts by mass, It is preferably not more than 99.5 parts by mass, and particularly preferably not less than 90 parts by mass and not more than 99 parts by mass.
<(B)陽離子聚合起始劑> 硬化性組成物,可含有或不含有聚合起始劑,就促進硬化之觀點,以含有聚合起始劑者為佳。 但,本發明中,聚合起始劑為不包含相當於後述(C)離子液體者。 聚合起始劑,可單獨使用亦可、將複數種混合使用亦可。 上述聚合起始劑,就硬化性組成物為陽離子硬化型或陰離子硬化型之觀點,以(B)陽離子聚合起始劑,或陰離子聚合起始劑為佳,以(B)陽離子聚合起始劑為較佳。<(B) Cationic polymerization initiator> The curable composition may or may not contain a polymerization initiator, but it is preferable to contain a polymerization initiator from the viewpoint of accelerating curing. However, in the present invention, the polymerization initiator does not include an ionic liquid corresponding to (C) described later. The polymerization initiator may be used alone or in combination of plural kinds. The above-mentioned polymerization initiators are preferably (B) cationic polymerization initiators or anionic polymerization initiators from the viewpoint of whether the curable composition is cation-curable or anion-hardenable, and (B) cationic polymerization initiators is better.
(鋶鹽(B1)) (B)陽離子聚合起始劑,為由陽離子部與陰離子部所構成,就硬化性之觀點,以含有陰離子部為下述式(b1)所表示的陰離子之鋶鹽(B1)為佳。 (式(b1)中,Rb1 、Rb2 、Rb3 及Rb4 各自獨立為,可具有取代基之烴基或雜環基,Rb1 、Rb2 、Rb3 ,及Rb4 中之至少一個為可具有取代基之芳香族烴基)。(Cerium salt (B1)) (B) The cationic polymerization initiator is composed of a cationic part and an anionic part, and the anion part is an anion represented by the following formula (b1) from the viewpoint of curability. (B1) is preferred. (In formula (b1), R b1 , R b2 , R b3 , and R b4 are each independently a hydrocarbon group or a heterocyclic group that may have a substituent, and at least one of R b1 , R b2 , R b3 , and R b4 is an aromatic hydrocarbon group which may have a substituent).
上述鋶鹽(B1)中,陽離子部為相對於上述式(b1)所表示的陰離子之對陽離子,其只要可使硬化性組成物良好地硬化時,並未有特別之限定。對陽離子,例如,下述式(b2)所示者: (Rb5 )t+1 -Rb6+ ・・・(b2) (式(b2)中,Rb5 為1價之有機基;Rb6 為原子價t的15族~17族(IUPAC標示)之元素。t為1以上、3以下之整數。複數之Rb5 可為相同或相異皆可,複數之Rb5 可鍵結並與Rb6 共同形成環)。In the above-mentioned percolium salt (B1), the cation portion is a counter cation to the anion represented by the above-mentioned formula (b1), and is not particularly limited as long as it can well cure the curable composition. For cations, for example, those shown in the following formula (b2): (R b5 ) t+1 -R b6+ ・・・(b2) (In formula (b2), R b5 is a monovalent organic group; R b6 is Elements of group 15~17 (IUPAC label) with atomic valence t. t is an integer between 1 and 3. Plural R b5 can be the same or different, and plural R b5 can be bonded to R b6 together form a ring).
式(b1)中之Rb1 ~Rb4 的烴基或雜環基的碳原子數,並未有特別之限定,又以1以上、50以下為佳,以1以上、30以下為較佳,以1以上、20以下為特佳。 Rb1 ~Rb4 的烴基之具體例,例如,直鏈狀或支鏈狀的烷基、直鏈狀或支鏈狀之烯基、直鏈狀或支鏈狀的炔基、芳香族烴基、脂環式烴基,及芳烷基等。 如前所述般,Rb1 ~Rb4 中至少一個為可具有取代基之芳香族基,又以Rb1 ~Rb4 中的3個以上為可具有取代基之芳香族基為較佳,以Rb1 ~Rb4 全部為可具有取代基之芳香族基為特佳。The number of carbon atoms of the hydrocarbon group or heterocyclic group of R b1 to R b4 in the formula (b1) is not particularly limited, and it is preferably 1 or more and 50 or less, preferably 1 or more and 30 or less. More than 1 and less than 20 are especially good. Specific examples of the hydrocarbon groups of R b1 to R b4 include, for example, straight-chain or branched alkyl groups, straight-chain or branched alkenyl groups, straight-chain or branched alkynyl groups, aromatic hydrocarbon groups, Alicyclic hydrocarbon group, and aralkyl group, etc. As mentioned above, at least one of R b1 to R b4 is an aromatic group that may have a substituent, and preferably three or more of R b1 to R b4 are aromatic groups that may have a substituent. It is particularly preferable that all of R b1 to R b4 are aromatic groups which may have substituents.
Rb1 ~Rb4 之烴基,或雜環基所可具有的取代基,可列舉如,碳原子數1以上、18以下之鹵化烷基、碳原子數3以上、18以下之鹵化脂肪族環式基、硝基、羥基、氰基、碳原子數1以上、18以下之烷氧基、碳原子數6以上、14以下的芳氧基、碳原子數2以上、19以下的脂肪族醯基、碳原子數7以上、15以下之芳香族醯基、碳原子數2以上、19以下的脂肪族醯氧基、碳原子數7以上、15以下之芳香族醯氧基、碳原子數1以上、18以下之烷硫基、碳原子數6以上、14以下之芳硫基、鍵結於氮原子的1個或2個之氫原子可被碳原子數1以上、18以下之烴基所取代之胺基,及鹵素原子等。 Rb1 ~Rb4 之烴基為芳香族烴基時,該芳香族烴基可被由碳原子數1以上、18以下之烷基、碳原子數2以上、18以下之烯基,及碳原子數2以上、18以下的炔基所成群組中所選出之1個以上的取代基所取代。The substituents that the hydrocarbon groups or heterocyclic groups of R b1 to R b4 may have include, for example, halogenated alkyl groups with 1 to 18 carbon atoms, halogenated aliphatic rings with 3 to 18 carbon atoms group, nitro group, hydroxyl group, cyano group, alkoxy group with 1 to 18 carbon atoms, aryloxy group with 6 to 14 carbon atoms, aliphatic acyl group with 2 to 19 carbon atoms, Aromatic acyloxy group with 7 to 15 carbon atoms, aliphatic acyloxy group with 2 to 19 carbon atoms, aromatic acyloxy group with 7 to 15 carbon atoms, 1 or more carbon atoms, Alkylthio groups of 18 or less, arylthio groups of 6 or more and 14 or less carbon atoms, amines in which one or two hydrogen atoms bonded to nitrogen atoms may be substituted by hydrocarbon groups of 1 or more and 18 or less carbon atoms groups, and halogen atoms, etc. When the hydrocarbon groups of R b1 to R b4 are aromatic hydrocarbon groups, the aromatic hydrocarbon groups can be composed of alkyl groups with 1 to 18 carbon atoms, alkenyl groups with 2 to 18 carbon atoms, and 2 or more carbon atoms , 18 or less alkynyl groups are substituted with one or more substituents selected from the group.
Rb1 ~Rb4 之烴基為具有取代基者時,取代基之數目,並未有特別之限定,其可為1亦可、2以上的複數亦可。取代基之數為複數時,該複數之取代基,可分別為相同或相異皆可。When the hydrocarbon groups of R b1 to R b4 have substituents, the number of substituents is not particularly limited, and it may be 1 or a plurality of 2 or more. When the number of substituents is plural, the plural substituents may be the same or different.
Rb1 ~Rb4 為烷基時的較佳具體例,可列舉如,甲基、乙基、n-丙基、n-丁基、n-戊基、n-己基、n-辛基、n-壬基、n-癸基、n-十一烷基、n-十二烷基、n-三癸基、n-四癸基、n-十五烷基、n-十六烷基、n-十七烷基、n-十八烷基、n-十九烷基,及n-二十烷基等的直鏈烷基;異丙基、異丁基、sec-丁基、tert-丁基、異戊基、新戊基、tert-戊基、異己基、2-乙基己基,及1,1,3,3-四甲基丁基等的支鏈烷基等。Preferred specific examples when R b1 to R b4 are alkyl groups include, for example, methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-octyl, n -Nonyl, n-decyl, n-undecyl, n-dodecyl, n-tridecyl, n-tetradecyl, n-pentadecyl, n-hexadecyl, n - Straight-chain alkyl groups such as heptadecyl, n-octadecyl, n-nonadecyl, and n-eicosyl; isopropyl, isobutyl, sec-butyl, tert-butyl branched alkyl groups such as isopentyl, neopentyl, tert-pentyl, isohexyl, 2-ethylhexyl, and 1,1,3,3-tetramethylbutyl, etc.
Rb1 ~Rb4 為烯基,或炔基時的較佳例示,可列舉如,對應於作為烷基的較佳上述之基的烯基,及炔基等。Desirable examples when R b1 to R b4 are alkenyl or alkynyl include, for example, alkenyl and alkynyl corresponding to the above-mentioned preferred groups as an alkyl group.
Rb1 ~Rb4 為芳香烴基時的較佳例示,可列舉如,苯基、α-萘基、β-萘基、聯苯-4-基、聯苯-3-基、聯苯-2-基、蒽基,及菲基等。Preferred examples of R b1 to R b4 are aromatic hydrocarbon groups, such as phenyl, α-naphthyl, β-naphthyl, biphenyl-4-yl, biphenyl-3-yl, biphenyl-2- Base, anthracenyl, and phenanthrenyl, etc.
Rb1 ~Rb4 為脂環式烴基時的較佳例示,可列舉如,環丙基、環丁基、環戊基、環己基、環戊基、環辛基、環壬基,及環癸基等的環烷基;降莰基、金剛烷基、三環癸基,及蒎基等的交聯式脂肪族環式烴基等。Preferred examples of R b1 to R b4 are alicyclic hydrocarbon groups, such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclopentyl, cyclooctyl, cyclononyl, and cyclodecyl Cycloalkyl groups such as cycloalkyl groups; norbornyl, adamantyl, tricyclodecanyl, and pinenyl and other cross-linked aliphatic cyclic hydrocarbon groups.
Rb1 ~Rb4 為芳烷基時的較佳例示,可列舉如,苄基、苯乙基、α-萘甲基、β-萘甲基、α-萘乙基,及β-萘乙基等。Preferred examples of R b1 to R b4 are aralkyl groups, such as benzyl, phenethyl, α-naphthylmethyl, β-naphthylmethyl, α-naphthylethyl, and β-naphthylethyl wait.
Rb1 ~Rb4 為雜環基時的較佳例示,可列舉如,噻吩基、呋喃基、硒吩基、哌喃基、吡咯基、噁唑基、噻唑基、吡啶基、嘧啶基、吡基、吲哚基、苯併呋喃基、苯併噻吩基、喹啉基、異喹啉基、喹噁啉基、喹唑啉基、咔唑基、吖啶基、酚噻基、吩基、呫噸基、噻嗯基、啡噁基、啡噁噻基、苯并2氫哌喃基、異苯并2氫哌喃基、二苯併噻吩基、氧葱酮基、硫氧葱酮基,及二苯併呋喃基等。Preferred examples of R b1 to R b4 are heterocyclic groups, such as thienyl, furyl, selenophyl, pyryl, pyrrolyl, oxazolyl, thiazolyl, pyridyl, pyrimidyl, pyrimidyl, Base, indolyl, benzofuryl, benzothienyl, quinolinyl, isoquinolyl, quinoxalinyl, quinazolinyl, carbazolyl, acridyl, phenothiazyl base, phen Xanthenyl, Xanthenyl, Thienyl, Phenyloxanthyl phenanthienyl, benzo2hydropyranyl, isobenzo2hydropyranyl, dibenzothienyl, oxanthione, thioxanthione, and dibenzofuryl, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為鹵化烷基時,鹵化烷基的較佳例示,可列舉如,三氟甲基、三氯甲基、五氟乙基、2,2,2-三氯乙基、2,2,2-三氟乙基、1,1-二氟乙基、七氟-n-丙基、1,1-二氟-n-丙基、3,3,3-三氟-n-丙基、九氟-n-丁基、3,3,4,4,4-五氟-n-丁基、全氟-n-戊基,及全氟-n-辛基等的直鏈鹵化烷基;六氟異丙基、六氯異丙基、六氟異丁基,及九氟-tert-丁基等的支鏈鹵化烷基等。When the hydrocarbon group of R b1 to R b4 or the substituent that the heterocyclic group may have is a halogenated alkyl group, preferred examples of the halogenated alkyl group include, for example, trifluoromethyl, trichloromethyl, pentafluoroethyl, 2,2,2-Trichloroethyl, 2,2,2-trifluoroethyl, 1,1-difluoroethyl, heptafluoro-n-propyl, 1,1-difluoro-n-propyl , 3,3,3-trifluoro-n-propyl, nonafluoro-n-butyl, 3,3,4,4,4-pentafluoro-n-butyl, perfluoro-n-pentyl, and Straight-chain halogenated alkyl groups such as perfluoro-n-octyl; branched-chain halogenated alkyl groups such as hexafluoroisopropyl, hexachloroisopropyl, hexafluoroisobutyl, and nonafluoro-tert-butyl, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為鹵化脂肪族環式基時,鹵化脂肪族環式基的較佳例示,可列舉如,五氟環丙基、九氟環丁基、全氟環戊基、全氟環己基,及全氟金剛烷基等。When the hydrocarbon group of R b1 to R b4 or the substituent that the heterocyclic group may have is a halogenated aliphatic ring group, preferred examples of the halogenated aliphatic ring group include, for example, pentafluorocyclopropyl, nonafluorocyclopropyl Butyl, perfluorocyclopentyl, perfluorocyclohexyl, and perfluoroadamantyl, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為烷氧基時,烷氧基的較佳例示,可列舉如,甲氧基、乙氧基、n-丙氧基、n-丁氧基、n-戊氧基、n-己氧基、n-辛氧基、n-壬氧基、n-癸氧基、n-十一烷氧基、n-十二烷氧基、n-三癸氧基、n-十四烷氧基、n-十五烷氧基、n-十六烷氧基、n-十七烷氧基,及n-十八烷氧基等的直鏈烷氧基;異丙氧基、異丁氧基、sec-丁氧基、tert-丁氧基、異戊氧基、新戊氧基、tert-戊氧基、異己氧基、2-乙基己氧基,及1,1,3,3-四甲基丁氧基等的支鏈烷氧基等。When the hydrocarbon group of R b1 to R b4 or the substituent that the heterocyclic group may have is an alkoxy group, preferable examples of the alkoxy group include, for example, methoxy, ethoxy, n-propoxy, n -butoxy, n-pentyloxy, n-hexyloxy, n-octyloxy, n-nonyloxy, n-decyloxy, n-undecyloxy, n-dodecyloxy , n-tridecyloxy, n-tetradecyloxy, n-pentadecyloxy, n-hexadecyloxy, n-heptadecyloxy, and n-octadecyloxy, etc. Linear alkoxy; isopropoxy, isobutoxy, sec-butoxy, tert-butoxy, isopentyloxy, neopentyloxy, tert-pentyloxy, isohexyloxy, 2- Ethylhexyloxy, branched alkoxy such as 1,1,3,3-tetramethylbutoxy, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為芳氧基時,芳氧基的較佳例示,可列舉如,苯氧基、α-萘氧基、β-萘氧基、聯苯-4-氧基、聯苯-3-氧基、聯苯-2-氧基、蒽氧基,及菲氧基等。When the hydrocarbon group of R b1 to R b4 or the substituent that the heterocyclic group may have is an aryloxy group, preferable examples of the aryloxy group include, for example, phenoxy, α-naphthyloxy, and β-naphthyloxy , Biphenyl-4-oxyl, biphenyl-3-oxyl, biphenyl-2-oxyl, anthracenyloxy, and phenanthryloxy, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為脂肪族醯基時,脂肪族醯基的較佳例示,可列舉如,乙醯基、丙醯基、丁醯基、戊醯基、己醯基、庚醯基,及辛醯基等。When the hydrocarbon group of R b1 to R b4 or the substituent that the heterocyclic group may have is an aliphatic acyl group, preferable examples of the aliphatic acyl group include, for example, acetyl, propionyl, butyryl, and pentyl. , hexyl, heptyl, and octyl, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為芳香族醯基時,芳香族醯基的較佳例示,可列舉如,苯甲醯基、α-萘醯基、β-萘醯基、聯苯-4-羰基、聯苯-3-羰基、聯苯-2-羰基、蒽羰基,及菲羰基等。When the hydrocarbon group of R b1 to R b4 or the substituent that the heterocyclic group may have is an aromatic acyl group, preferable examples of the aromatic acyl group include, for example, benzoyl, α-naphthyl, β- Naphthyl, biphenyl-4-carbonyl, biphenyl-3-carbonyl, biphenyl-2-carbonyl, anthracene carbonyl, and phenanthrene carbonyl, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為脂肪族醯氧基時,脂肪族醯氧基的較佳例示,可列舉如,乙醯氧基、丙醯氧基、丁醯氧基、戊醯氧基、己醯氧基、庚醯氧基,及辛醯氧基等。When the hydrocarbon group of R b1 to R b4 or the substituent that the heterocyclic group may have is an aliphatic acyloxy group, preferred examples of the aliphatic acyloxy group include, for example, acetyloxy, acryloxy, butyl Acyloxy, pentyloxy, hexyloxy, heptyloxy, and octyloxy, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為芳香族醯氧基時,芳香族醯氧基的較佳例示,可列舉如,苯甲醯氧基、α-萘醯氧基、β-萘醯氧基、聯苯-4-基羰氧基、聯苯-3-基羰氧基、聯苯-2-基羰氧基、蒽基羰氧基,及菲基羰氧基等。When the hydrocarbon group of R b1 to R b4 or the substituent that the heterocyclic group may have is an aromatic acyloxy group, preferable examples of the aromatic acyloxy group include, for example, benzoyloxy, α-naphthyloxy Base, β-naphthyloxy, biphenyl-4-ylcarbonyloxy, biphenyl-3-ylcarbonyloxy, biphenyl-2-ylcarbonyloxy, anthracenylcarbonyloxy, and phenanthrenylcarbonyloxy Base etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為烷硫基,或芳硫基時,烷硫基,或芳硫基的較佳例示,可列舉如,前述之烷氧基,或作為芳氧基之較佳基中的氧原子被硫原子取代而得之基等。When the substituents that the hydrocarbon groups or heterocyclic groups of R b1 to R b4 may have are alkylthio groups or arylthio groups, preferred examples of alkylthio groups or arylthio groups include, for example, the aforementioned alkoxy groups , or a group obtained by replacing an oxygen atom in a preferable group of an aryloxy group with a sulfur atom, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為可被烴基取代的胺基時,可被烴基取代之胺基的較佳例示,可列舉如,胺基、甲胺基、乙胺基、n-丙胺基、二甲胺基、二乙胺基、甲乙胺基、二-n-丙胺基,及哌啶基等。When the hydrocarbon group of R b1 to R b4 or the substituent that the heterocyclic group may have is an amino group that may be substituted by a hydrocarbon group, preferred examples of the amino group that may be substituted by a hydrocarbon group include, for example, an amino group, a methylamino group, Ethylamino, n-propylamino, dimethylamino, diethylamino, methylethylamino, di-n-propylamino, piperidinyl, etc.
Rb1 ~Rb4 之烴基,或雜環基可具有的取代基為鹵素原子時,鹵素原子的較佳例示,可列舉如,氟原子、氯原子、溴原子,及碘原子等。When the substituent that the hydrocarbon groups or heterocyclic groups of R b1 to R b4 may have is a halogen atom, preferable examples of the halogen atom include, for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
以上說明的Rb1 ~Rb4 之烴基,或雜環基可具有的取代基中,以鋶鹽(B1)作為起始劑時,就具有高活性之觀點,以碳原子數1以上、8以下之鹵化烷基、鹵素原子、硝基,及氰基為佳,以碳原子數1以上、8以下之氟化烷基為較佳。Among the hydrocarbon groups of R b1 to R b4 described above, or the substituents that the heterocyclic group may have, when the initiator is the perjuly salt (B1), it has high activity, and the number of carbon atoms is 1 to 8. The halogenated alkyl group, halogen atom, nitro group, and cyano group are preferable, and the fluorinated alkyl group with 1 to 8 carbon atoms is more preferable.
式(b2)中之Rb5 表示鍵結Rb6 之有機基。其可為相同亦可、相異亦可;Rb5 可列舉如,碳原子數6以上、14以下之芳香族烴基、碳原子數1以上、18以下之烷基、碳原子數2以上、18以下之烯基,及碳原子數2以上、18以下的炔基等。 芳香族烴基,又可被例如碳原子數1以上、18以下之烷基、碳原子數2以上、18以下之烯基、碳原子數2以上、18以下的炔基、碳原子數6以上、14以下之芳基、硝基、羥基、氰基、碳原子數1以上、18以下之烷氧基、碳原子數6以上、14以下的芳氧基、碳原子數2以上、19以下的脂肪族醯基、碳原子數7以上、15以下之芳香族醯基、碳原子數2以上、19以下的脂肪族醯氧基、碳原子數7以上、15以下之芳香族醯氧基、碳原子數1以上、18以下之烷硫基、碳原子數6以上、14以下之芳硫基、鍵結於氮原子的1個或2個氫原子可碳原子數1以上、18以下之烴基取代之胺基,及鹵素原子所取代。 該些取代基的較佳例示,例如與式(b1)中之Rb1 ~Rb4 之烴基,或可具有雜環基的取代基之較佳例示為相同之內容。R b5 in the formula (b2) represents an organic group bonded to R b6 . They may be the same or different; R b5 includes, for example, an aromatic hydrocarbon group having 6 to 14 carbon atoms, an alkyl group having 1 to 18 carbon atoms, and an alkyl group having 2 or more to 18 carbon atoms. The following alkenyl groups, and the alkynyl groups having 2 to 18 carbon atoms, etc. The aromatic hydrocarbon group can also be replaced by, for example, an alkyl group with 1 to 18 carbon atoms, an alkenyl group with 2 to 18 carbon atoms, an alkynyl group with 2 to 18 carbon atoms, a carbon number with 6 or more, Aryl group of 14 or less, nitro, hydroxyl, cyano, alkoxy group of 1 to 18 carbon atoms, aryloxy group of 6 or more but 14 carbon atoms, aliphatic group of 2 or more and 19 or less carbon atoms Aromatic acyl group, aromatic acyl group with 7 to 15 carbon atoms, aliphatic acyloxy group with 2 to 19 carbon atoms, aromatic acyloxy group with 7 to 15 carbon atoms, carbon atom An alkylthio group with a number of 1 to 18, an arylthio group with a carbon number of 6 to 14, and one or two hydrogen atoms bonded to a nitrogen atom may be substituted with a hydrocarbon group with a carbon number of 1 to 18 Amino groups, and halogen atoms are substituted. Desirable examples of these substituents are, for example, the same as those of the hydrocarbon groups of R b1 to R b4 in the formula (b1), or the substituents that may have a heterocyclic group.
式(b2)中,Rb5 存在複數時,複數之Rb5 可與Rb6 共同形成環。複數之Rb5 ,與Rb6 所形成之環,於該中間結構中,可含有由-O-、-S-、-SO-、-SO2 -、-NH-、-CO-、-COO-,及-CONH-所成之群所選出之1個以上的鍵結。In the formula (b2), when there are plural R b5 , the plural R b5 may form a ring together with R b6 . The ring formed by plural R b5 and R b6 may contain -O-, -S-, -SO-, -SO 2 -, -NH-, -CO-, -COO- in the intermediate structure , and one or more bonds selected from the group formed by -CONH-.
鋶鹽(B1)中的陽離子部,以前述式(b2)所表示的陽離子為佳。式(b2)中之Rb6 ,為原子價t的15族~17族(IUPAC標記)之元素。t為1以上、3以下之整數。 Rb6 與有機基Rb5 鍵結而形成鎓離子[Rb6+ ]。15族~17族的元素中,較佳者可列舉如,O(氧)、N(氮)、P(磷)、S(硫),或I(碘)。對應鎓離子,可列舉如,正氧離子(oxonium ion)、銨離子、鏻離子、鋶離子,及錪離子。其中,就可容易安定處理之觀點,以使用銨離子、鏻離子、鋶離子,及錪離子為佳,就具有優良陽離子聚合性能或優良交聯反應性能之觀點,以鋶離子,及錪離子為較佳。The cation part in the permeicium salt (B1) is preferably a cation represented by the aforementioned formula (b2). R b6 in formula (b2) is an element of group 15 to group 17 (IUPAC mark) with atomic valence t. t is an integer of 1 to 3. R b6 bonds with the organic group R b5 to form an onium ion [R b6+ ]. Among the elements of Groups 15 to 17, O (oxygen), N (nitrogen), P (phosphorus), S (sulfur), or I (iodine) are preferable, for example. The corresponding onium ions include, for example, oxonium ions, ammonium ions, phosphonium ions, perium ions, and iodonium ions. Among them, ammonium ions, phosphonium ions, perium ions, and iodonium ions are preferred from the standpoint of easy and stable treatment, and ions such as phosphonium ions and iodonium ions are preferred from the viewpoint of excellent cationic polymerization performance or excellent cross-linking reaction performance. better.
正氧離子之具體例,例如,三甲基正氧離子、二乙甲基正氧離子、三乙基正氧離子、伸四甲甲基正氧離子等的正氧離子;4-甲基吡喃鎓、2,4,6-三甲基吡喃鎓、2,6-二-tert-丁基吡喃鎓、2,6-二苯基吡喃鎓等的吡喃鎓;2,4-二甲基苯併吡喃鎓、1,3-二甲基異苯併吡喃鎓等的苯併吡喃鎓,及異苯併吡喃鎓等。Specific examples of positive oxygen ions, for example, positive oxygen ions such as trimethyl positive oxygen ions, diethylmethyl positive oxygen ions, triethyl positive oxygen ions, tetramethylmethyl positive oxygen ions, etc.; Pyrylium, 2,4,6-trimethylpyrylium, 2,6-di-tert-butylpyrylium, 2,6-diphenylpyrylium, etc.; 2,4- Benzopyrylium such as dimethylbenzopyrylium and 1,3-dimethylisobenzopyrylium, isobenzopyrylium, and the like.
銨離子之具體例,例如,四甲基銨、乙基三甲基銨、二乙基二甲基銨、三乙甲基銨,及四乙基銨等四烷基銨;N,N-二甲基吡咯烷鎓、N-乙基-N-甲基吡咯烷鎓,及N,N-二乙基吡咯烷鎓鹽等的吡咯烷鎓;N,N’-二甲基咪唑啉鎓、N,N’-二乙基咪唑啉鎓、N-乙基-N’-甲基咪唑啉鎓、1,3,4-三甲基咪唑啉鎓,及1,2,3,4-四甲基咪唑啉鎓等的咪唑啉鎓;N,N’-二甲基四氫嘧啶鎓等的四氫嘧啶鎓;N,N’-二甲基嗎啉鎓等的嗎啉鎓;N,N’-二乙基哌啶鎓等的哌啶鎓;N-甲基吡啶鎓、N-苄基吡啶鎓,及N-苯甲基甲醯基吡啶鎓等的吡啶鎓;N,N’-二甲基咪唑鎓等的咪唑鎓;N-甲基喹啉鎓、N-苄基喹啉鎓,及N-苯甲基甲醯基喹啉鎓等的喹啉鎓;N-甲基異喹啉鎓等的異喹啉鎓;苄基苯併噻唑鎓,及苯甲基甲醯基苯併噻唑鎓等的噻唑鎓;苄基吖啶鎓,及苯甲基甲醯基吖啶鎓等的吖啶鎓等。Specific examples of ammonium ions, such as tetramethylammonium, ethyltrimethylammonium, diethyldimethylammonium, triethylmethylammonium, and tetraalkylammonium such as tetraethylammonium; Methylpyrrolidinium, N-ethyl-N-methylpyrrolidinium, and pyrrolidinium such as N,N-diethylpyrrolidinium salt; N,N'-dimethylimidazolinium, N ,N'-diethylimidazolinium, N-ethyl-N'-methylimidazolinium, 1,3,4-trimethylimidazolinium, and 1,2,3,4-tetramethyl Imidazolinium such as imidazolinium; tetrahydropyrimidinium such as N,N'-dimethyltetrahydropyrimidinium; morpholinium such as N,N'-dimethylmorpholinium; N,N'- Piperidinium such as diethylpiperidinium; pyridinium such as N-methylpyridinium, N-benzylpyridinium, and N-benzylformylpyridinium; N,N'-dimethyl Imidazolium such as imidazolium; N-methylquinolinium, N-benzylquinolinium, and quinolinium such as N-benzylformylquinolinium; N-methylisoquinolinium, etc. Isoquinolinium; benzylbenzothiazolium, and thiazolium such as benzylformylbenzothiazolium; benzylacridinium, and acridinium such as benzylformylacridinium wait.
鏻離子之具體例,例如,四苯基鏻、四-p-甲苯基鏻、四(2-甲氧苯基)鏻、四(3-甲氧苯基)鏻,及四(4-甲氧苯基)鏻等的四芳基鏻;三苯基苄基鏻、三苯基苯甲基甲醯基鏻、三苯甲基鏻,及三苯基丁基鏻等的三芳基鏻;三乙基苄基鏻、三丁基苄基鏻、四乙基鏻、四丁基鏻、四己基鏻、三乙基苯甲基甲醯基鏻,及三丁基苯甲基甲醯基鏻等的四烷基鏻等。Specific examples of phosphonium ions, for example, tetraphenylphosphonium, tetra-p-tolylphosphonium, tetrakis(2-methoxyphenyl)phosphonium, tetrakis(3-methoxyphenyl)phosphonium, and tetrakis(4-methoxyphenyl)phosphonium Tetraarylphosphonium such as phenyl)phosphonium; triarylphosphonium such as triphenylbenzylphosphonium, triphenylbenzylformylphosphonium, triphenylmethylphosphonium, and triphenylbutylphosphonium; triethylphosphonium benzylphosphonium, tributylbenzylphosphonium, tetraethylphosphonium, tetrabutylphosphonium, tetrahexylphosphonium, triethylbenzylformylphosphonium, tributylbenzylformylphosphonium, etc. Tetraalkylphosphonium, etc.
鋶離子之具體例,例如,三苯鋶、三-p-甲苯鋶、三-o-甲苯鋶、三(4-甲氧苯基)鋶、1-萘基二苯鋶、2-萘基二苯鋶、三(4-氟苯基)鋶、三-1-萘鋶、三-2-萘鋶、三(4-羥苯基)鋶、4-(苯硫基)苯基二苯鋶、4-(p-甲苯硫基)苯基二-p-甲苯鋶、4-(4-甲氧基苯硫基)苯基雙(4-甲氧苯基)鋶、4-(苯硫基)苯基雙(4-氟苯基)鋶、4-(苯硫基)苯基雙(4-甲氧苯基)鋶、4-(苯硫基)苯基二-p-甲苯鋶、[4-(4-聯苯硫基)苯基]-4-聯苯基苯鋶、[4-(2-硫氧葱酮硫基)苯基]二苯鋶、雙[4-(二苯基二氫硫基)苯基]硫醚、雙[4-{雙[4-(2-羥基乙氧基)苯基]二氫硫基}苯基〕硫醚、雙{4-[雙(4-氟苯基)二氫硫基]苯基}硫醚、雙{4-[雙(4-甲苯基)二氫硫基]苯基}硫醚、雙{4-[雙(4-甲氧苯基)二氫硫基]苯基}硫醚、4-(4-苯甲醯基-2-氯苯硫基)苯基雙(4-氟苯基)鋶、4-(4-苯甲醯基-2-氯苯硫基)苯基二苯鋶、4-(4-苯甲醯基苯硫基)苯基雙(4-氟苯基)鋶、4-(4-苯甲醯基苯硫基)苯基二苯鋶、7-異丙基-9-氧雜-10-硫-9,10-二氫蒽-2-基二-p-甲苯鋶、7-異丙基-9-氧雜-10-硫-9,10-二氫蒽-2-基二苯鋶、2-[(二-p-甲苯基)二氫硫基]噻噸酮、2-[(二苯基)二氫硫基]噻噸酮、4-(9-氧雜-9H-硫雜蒽-2-基)硫苯基-9-氧雜-9H-硫雜蒽-2-苯鋶、4-[4-(4-tert-丁基苯甲醯基)苯硫基]苯基二-p-甲苯鋶、4-[4-(4-tert-丁基苯甲醯基)苯硫基]苯基二苯鋶、4-[4-(苯甲醯基苯硫基)]苯基二-p-甲苯鋶、4-[4-(苯甲醯基苯硫基)]苯基二苯鋶、5-(4-甲氧苯基)噻蒽鎓、5-苯基噻蒽鎓、5-甲苯基噻蒽鎓、5-(4-乙氧苯基)噻蒽鎓,及5-(2,4,6-三甲苯基)噻蒽鎓等的三芳鋶;二苯基苯甲基甲醯鋶、二苯基4-硝基苯甲基甲醯鋶、二苯基苄鋶,及二苯甲鋶等的二芳鋶;苯甲基苄鋶、4-羥基苯甲基苄鋶、4-甲氧基苯甲基苄鋶、4-乙醯羰基氧苯甲基苄鋶、4-羥苯基(2-萘甲基)甲鋶、2-萘甲基苄鋶、2-萘甲基(1-乙氧羰基)乙鋶、苯甲基苯甲基甲醯鋶、4-羥基苯甲基苯甲基甲醯鋶、4-甲氧基苯甲基苯甲基甲醯鋶、4-乙醯羰基氧苯甲基苯甲基甲醯鋶、2-萘甲基苯甲基甲醯鋶、2-萘基十八烷基苯甲基甲醯鋶,及9-蒽甲基苯甲基甲醯鋶等的單芳鋶;二甲基苯甲基甲醯鋶、苯甲基甲醯基四氫噻吩鎓、二甲基苄鋶、苄基四氫噻吩鎓,及十八烷甲基苯甲基甲醯鋶等的三烷鋶等。Specific examples of percited ions, for example, triphenylcolumbite, tri-p-toluenecolumbite, tris-o-toluenecolumbite, tris(4-methoxyphenyl)columbite, 1-naphthyldibenzocolumbite, 2-naphthylbiscolumbium Benzene percolium, Tris(4-fluorophenyl) percolium, Tris-1-naphthalene permeate, Tris-2-naphthalene permeate, Tris(4-hydroxyphenyl) permeate, 4-(phenylthio)phenyl dibenzo permeate, 4-(p-tolylthio)phenyldi-p-toluene, 4-(4-methoxyphenylthio)phenylbis(4-methoxyphenyl)colum, 4-(phenylthio) Phenylbis(4-fluorophenyl)columbite, 4-(phenylthio)phenylbis(4-methoxyphenyl)columbite, 4-(phenylthio)phenylbis-p-toluenecolumbite, [4 -(4-Biphenylsulfanyl)phenyl]-4-biphenylbenzol Sulfuryl)phenyl]sulfide, bis[4-{bis[4-(2-hydroxyethoxy)phenyl]dihydrothio}phenyl]sulfide, bis{4-[bis(4- Fluorophenyl)dihydrothio]phenyl}sulfide, bis{4-[bis(4-methylphenyl)dihydrothio]phenyl}sulfide, bis{4-[bis(4-methoxybenzene Base) dihydrogenthio] phenyl} sulfide, 4-(4-benzoyl-2-chlorophenylthio)phenyl bis(4-fluorophenyl) percolium, 4-(4-benzoyl Base-2-chlorophenylsulfanyl)phenyldibenzoyl, 4-(4-benzoylphenylthio)phenylbis(4-fluorophenyl)pyridium, 4-(4-benzoylphenyl) Thio)phenyldibenzocondium, 7-isopropyl-9-oxa-10-thio-9,10-dihydroanthracene-2-ylbis-p-toluene, 7-isopropyl-9- Oxa-10-thio-9,10-dihydroanthracene-2-yldibenzoperium, 2-[(di-p-tolyl)dihydrothio]thioxanthone, 2-[(diphenyl) Dihydromercapto] thioxanthone, 4-(9-oxa-9H-thioxanth-2-yl)thiophenyl-9-oxa-9H-thioxanthene-2-benzoconium, 4-[ 4-(4-tert-butylbenzoyl)phenylthio]phenyldi-p-toluene, 4-[4-(4-tert-butylbenzoyl)phenylthio]phenyl Dibenzoylium, 4-[4-(benzoylphenylthio)]phenyldi-p-toluene, 4-[4-(benzoylphenylthio)]phenyldibenzoyl, 5 -(4-methoxyphenyl)thianthracenium, 5-phenylthianthracenium, 5-tolylthianthracenium, 5-(4-ethoxyphenyl)thianthracenium, and 5-(2,4 , 6-Trimethylphenyl) thianthracene and other triaryl peroxides; Benzyl benzyl, 4-hydroxybenzyl benzyl, 4-methoxybenzyl benzyl, 4-acetylcarbonyloxybenzyl benzyl, 4-hydroxyphenyl ( 2-naphthylmethyl)formazolium, 2-naphthylmethylbenzylconium, 2-naphthylmethyl(1-ethoxycarbonyl)acetoconium, benzylbenzylformazolium, 4-hydroxybenzylbenzyl Methylformylformyl, 4-methoxybenzylbenzylformyl, 4-acetylcarbonyloxybenzylbenzylformyl, 2-naphthylmethylbenzylformyl, 2- Naphthyloctadecylbenzylformyl, and 9-anthracenemethylbenzylformyl, such as monoaromatic; dimethylbenzylformyl, benzylformyltetrahydrothiophene Onium, dimethylbenzylconium, benzyltetrahydrothiophenium, and octadecylbenzylformylformyl and other trialkylconium.
又,鋶鹽(B1),亦可含有由上述式(b1)所表示的陰離子之陰離子部,與後述式(c1)所表示的鋶離子的陽離子部所形成的鋶鹽亦佳。Also, the permeic salt (B1) may contain an anion part of an anion represented by the above-mentioned formula (b1), and a permeic salt formed by a cation part of a permeic ion represented by the formula (c1) described later is also preferable.
錪離子之具體例,例如,二苯錪、二-p-甲苯錪、雙(4-十二烷苯基)錪、雙(4-甲氧苯基)錪、(4-辛基氧苯基)苯錪、雙(4-癸氧基)苯錪、4-(2-羥基十四烷氧基)苯基苯錪、4-異丙苯基(p-甲苯基)錪,及4-異丁苯基(p-甲苯基)錪等的錪離子等。Specific examples of iodonium ions, for example, diphenyliodonium, di-p-tolueneiodonium, bis(4-dodecylphenyl)iodonium, bis(4-methoxyphenyl)iodonium, (4-octyloxyphenyl)iodonium ) benzodiazepines, bis(4-decyloxy)benzodiazepines, 4-(2-hydroxytetradecyloxy)phenylbenzodiazepines, 4-cumyl (p-tolyl) benzodiazepines, and 4-iso Odonium ions such as butylphenyl (p-tolyl)iodonium, etc.
以上說明之式(b1)所表示的陰離子的較佳具體例,可列舉如, 四(4-九氟聯苯)沒食子酸陰離子、 四(1-七氟萘基)沒食子酸陰離子、 四(五氟苯基)沒食子酸陰離子、 四(3,4,5-三氟苯基)沒食子酸陰離子、 四(2-九苯基聯苯)沒食子酸陰離子、 四(2-七氟萘基)沒食子酸陰離子、 四(7-九氟蒽基)沒食子酸陰離子、 四(4’-(甲氧基)八氟聯苯)沒食子酸陰離子、 四(2,4,6-三(三氟甲基)苯基)沒食子酸陰離子、 四(3,5-雙(三氟甲基)苯基)沒食子酸陰離子、 四(2,3-雙(五氟乙基)萘基)沒食子酸陰離子、 四(2-異丙氧基-六氟萘基)沒食子酸陰離子、 四(9,10-雙(七氟丙基)七氟蒽基)沒食子酸陰離子、 四(9-九氟菲基)沒食子酸陰離子、 四(4-[三(異丙基)矽烷基]-四氟苯基)沒食子酸陰離子、 四(9,10-雙(p-甲苯基)-七氟菲基)沒食子酸陰離子、 四(4-[二甲基(t-丁基)矽烷基]-四氟苯基)沒食子酸陰離子、 單苯基三(五氟苯基)沒食子酸陰離子,及 單全氟丁基三(五氟苯基)沒食子酸陰離子等,更佳為,以下之陰離子等。 Preferable specific examples of the anion represented by the formula (b1) described above include, for example, tetrakis(4-nonafluorobiphenyl)gallate anion, tetrakis(1-heptafluoronaphthyl)gallate anion, , tetra(pentafluorophenyl) gallate anion, tetrakis(3,4,5-trifluorophenyl) gallate anion, tetrakis(2-nonaphenylbiphenyl) gallate anion, four (2-Heptafluoronaphthyl)gallate anion, tetrakis(7-nonafluoroanthracenyl)gallate anion, tetrakis(4'-(methoxy)octafluorobiphenyl)gallate anion, Tetrakis(2,4,6-tris(trifluoromethyl)phenyl)gallate anion, tetrakis(3,5-bis(trifluoromethyl)phenyl)gallate anion, tetrakis(2, 3-bis(pentafluoroethyl)naphthyl)gallate anion, tetrakis(2-isopropoxy-hexafluoronaphthyl)gallate anion, tetrakis(9,10-bis(heptafluoropropyl) ) heptafluoroanthracenyl) gallate anion, tetrakis(9-nonafluorophenanthryl) gallate anion, tetrakis(4-[tri(isopropyl)silyl]-tetrafluorophenyl)gallate Acid anion, tetrakis(9,10-bis(p-tolyl)-heptafluorophenanthrenyl) gallate anion, tetrakis(4-[dimethyl(t-butyl)silyl]-tetrafluorophenyl ) gallic acid anion, monophenyl tris(pentafluorophenyl) gallic acid anion, and monoperfluorobutyl tris(pentafluorophenyl) gallic acid anion, etc., more preferably, the following anions wait.
以上說明之式(b2)所表示的對陽離子的較佳具體例,可列舉如, 4-異丙苯基(p-甲苯基)錪、 4-異丁苯基(p-甲苯基)錪等的錪離子; [4-(2-硫氧葱酮硫基)苯基]二苯鋶、 2-[(二-p-甲苯基)二氫硫基]噻噸酮、 2-[(二苯基)二氫硫基]噻噸酮、 4-(9-氧雜-9H-硫雜蒽-2-基)硫苯基-9-氧雜-9H-硫雜蒽-2-苯鋶等的 含有噻噸酮骨架的鋶離子; 後述之式(c1)所表示之陽離子的具體例中所列舉的鋶離子; 後述之式(c1’)所表示之鋶鹽的陽離子部的具體例中所列舉的鋶離子; 其他,例如以下所示鋶離子;等。Preferred specific examples of the counter cation represented by the formula (b2) described above include, for example, 4-isopropylphenyl (p-tolyl)iodonium, 4-isobutylphenyl (p-tolyl) iodonium ions, etc.; [4-(2-Thioanthronethio)phenyl]dibenzocaldium, 2-[(Di-p-tolyl)dihydromercapto]thioxanthone, 2-[(Diphenyl)dihydromercapto]thioxanthone, 4-(9-Oxa-9H-thioxanth-2-yl)thiophenyl-9-oxa-9H-thioxanthene-2-benzene Containing the thioxanthone skeleton of the calcite ion; The perulium ion listed in the specific example of the cation represented by the formula (c1) described later; The percited ions listed in the specific examples of the cation part of the percited salt represented by the formula (c1') described later; Others, such as the permeic ion shown below; etc.
鋶鹽(B1),以由式(b1)所表示的陰離子中之較佳具體例所例示之上述陰離子,與式(b2)所表示的對陽離子之較佳具體例所例示之上述陽離子所形成的鹽為佳。式(b2)所表示的對陽離子的較佳具體例,亦可使用2種以上之組合。A columium salt (B1) is formed by using the above-mentioned anion exemplified as a preferred example of the anion represented by the formula (b1) and the above-mentioned cation exemplified by a preferred example of the counter cation represented by the formula (b2) Salt is better. As a preferred specific example of the counter cation represented by the formula (b2), a combination of two or more types can also be used.
硬化性組成物中的(B)陽離子聚合起始劑之含量,只要為未阻礙本發明目的之範圍,並未有特別之限定。硬化性組成物中,(B)陽離子聚合起始劑之含量,以鋶鹽(B1),及後述其他的陽離子聚合起始劑(B2)之總量,相對於(A)硬化性化合物100質量份,以0.01質量份以上、5質量份以下為佳,以0.05質量份以上、3質量份以下為較佳,以0.1質量份以上、2質量份以下為特佳。 又,鋶鹽(B1)之含量,相對於鋶鹽(B1),及後述其他的陽離子聚合起始劑(B2)之總量,以10質量%以上為佳,以50質量%以上為較佳,以70質量%以上為更佳,以90質量%以上為特佳,以100質量%為最佳。 使用該範圍內的量之(B)陽離子聚合起始劑時,可形成具有優良折射率及耐黃化性的硬化物,又,亦容易製得具有良好耐熱性(耐熱分解性)及對基板亦具有良好密著性的硬化性組成物。The content of the (B) cationic polymerization initiator in the curable composition is not particularly limited as long as it is within the range that does not hinder the object of the present invention. In the curable composition, the content of the (B) cationic polymerization initiator is the total amount of the columium salt (B1) and other cationic polymerization initiators (B2) described later, relative to 100 mass of the (A) hardening compound Parts, preferably 0.01 to 5 parts by mass, preferably 0.05 to 3 parts by mass, particularly preferably 0.1 to 2 parts by mass. Furthermore, the content of the permeic acid salt (B1) is preferably at least 10% by mass, and more preferably at least 50% by mass, relative to the total amount of the permeic acid salt (B1) and other cationic polymerization initiators (B2) described later. , more than 70% by mass is more preferred, more than 90% by mass is particularly preferred, and 100% by mass is the best. When (B) cationic polymerization initiator is used in the amount within this range, a cured product with excellent refractive index and yellowing resistance can be formed, and it is also easy to obtain It is also a curable composition with good adhesion.
(與鋶鹽(B1)相異的其他陽離子聚合起始劑(B2)) (B)陽離子聚合起始劑中,與鋶鹽(B1)相異的其他陽離子聚合起始劑(B2)(以下,亦僅稱為「其他的陽離子聚合起始劑(B2)」)。其可與鋶鹽(B1)同時,或單獨含有或不含有皆可。 硬化性組成物中,於含有鋶鹽(B1)時,同時含有其他的陽離子聚合起始劑(B2)時,可形成具有優良折射率及耐黃化性的硬化物,又,亦容易形成具有良好耐熱性(耐熱分解性)及對基板亦具有良好密著性的硬化性組成物。(Other cationic polymerization initiators (B2) different from the permeic acid salt (B1)) (B) Among the cationic polymerization initiators, other cationic polymerization initiators (B2) (hereinafter, also simply referred to as "other cationic polymerization initiators (B2)") different from the cobaltium salt (B1) . It may be contained simultaneously with the permeic acid salt (B1), or may be contained alone or not. In the curable composition, when the cobalt salt (B1) is contained together with other cationic polymerization initiators (B2), a cured product with excellent refractive index and yellowing resistance can be formed, and it is also easy to form a cured product with A curable composition with good heat resistance (resistance to thermal decomposition) and good adhesion to the substrate.
其他的陽離子聚合起始劑(B2),可為熱陽離子聚合起始劑(B2-1)亦可、光陽離子聚合起始劑(B2-2)亦可,又以光陽離子聚合起始劑(B2-2)為佳。以下,將對熱陽離子聚合起始劑(B2-1)及光陽離子聚合起始劑(B2-2)進行說明。Other cationic polymerization initiators (B2) can be thermal cationic polymerization initiators (B2-1) also can, photocationic polymerization initiators (B2-2) also can, again with photocationic polymerization initiators ( B2-2) is preferred. Hereinafter, thermal cationic polymerization initiator (B2-1) and photocationic polymerization initiator (B2-2) will be demonstrated.
・熱陽離子聚合起始劑(B2-1) 熱陽離子聚合起始劑(B2-1),例如,二苯錪六氟砷酸鹽、二苯錪六氟磷酸鹽、二苯錪三氟甲烷磺酸酯基、三苯鋶四氟硼酸鹽、三-p-甲苯鋶六氟磷酸鹽、三-p-甲苯鋶三氟甲烷磺酸酯、雙(環己基磺醯基)重氮甲烷、雙(tert-丁基磺醯基)重氮甲烷、雙(p-甲苯磺醯基)重氮甲烷、三苯鋶三氟甲烷磺酸酯、二苯基-4-甲苯鋶三氟甲烷磺酸酯、二苯基-2,4,6-三甲苯鋶-p-甲苯磺酸酯,及二苯基-p-苯硫苯鋶六氟磷酸鹽等。該些可將2種以上組合使用。・Thermal cationic polymerization initiator (B2-1) Thermal cationic polymerization initiators (B2-1), for example, diphenyliodonium hexafluoroarsenate, diphenyliodonium hexafluorophosphate, diphenyliodonium trifluoromethanesulfonate, triphenylinium tetrafluoroborate, Tris-p-tolueneconium hexafluorophosphate, tris-p-tolueneconium trifluoromethanesulfonate, bis(cyclohexylsulfonyl)diazomethane, bis(tert-butylsulfonyl)diazomethane, Bis(p-toluenesulfonyl)diazomethane, triphenylpermetrifluoromethanesulfonate, diphenyl-4-toluenesulfonyl trifluoromethanesulfonate, diphenyl-2,4,6-trimethylbenzene Acerium-p-toluenesulfonate, and diphenyl-p-phenylthiobenzoinium hexafluorophosphate, etc. These can be used in combination of 2 or more types.
市售熱陽離子聚合起始劑,例如,AMERICURE系列(American・Can公司製)、ULTRASET系列(Adeka公司製)、WPAG系列(和光純藥公司製)等的重氮鹽型的起始劑;UVE系列(General Electric公司製)、FC系列(3M公司製)、UV9310C(GE東芝聚矽氧公司製),及WPI系列(和光純藥公司製)等的錪鹽型的起始劑;CYRACURE系列(Union Carbide公司製)、UVI系列(General Electric公司製)、FC系列(3M公司製)、CD系列(Sartomer公司製)、OPTOMER SP系列(Adeka公司製)、OPTOMER CP系列(Adeka公司製)、San-Aid SI系列(三新化學工業公司製)、CI系列(日本曹達公司製)、WPAG系列(和光純藥公司製)、CPI系列(San-Apro公司製)等的鋶鹽型的起始劑等。Commercially available thermal cationic polymerization initiators, for example, AMERICURE series (manufactured by American・Can), ULTRASET series (manufactured by Adeka), WPAG series (manufactured by Wako Pure Chemical Industries, Ltd.), etc.; UVE series (manufactured by General Electric), FC series (manufactured by 3M), UV9310C (manufactured by GE Toshiba Silicone), and WPI series (manufactured by Wako Pure Chemical Industries, Ltd.); CYRACURE series ( Union Carbide), UVI series (General Electric), FC series (3M), CD series (Sartomer), OPTOMER SP series (Adeka), OPTOMER CP series (Adeka), San - Aid SI series (manufactured by Sanshin Chemical Industry Co., Ltd.), CI series (manufactured by Nippon Soda Co., Ltd.), WPAG series (manufactured by Wako Pure Chemical Industries, Ltd.), CPI series (manufactured by San-Apro Co., Ltd.), etc. wait.
熱陽離子聚合起始劑(B2-1),為由陽離子部與陰離子部所形成,上述陽離子部以含有下述式(c-I)所表示的陽離子之化合物為佳。使用該熱陽離子聚合起始劑(B2-1)時,可使前述(A)硬化性化合物良好地硬化,而形成具有優良折射率及耐黃化性的硬化物,又,也容易製得對耐熱性(耐熱分解性)及基板亦具有良好密著性的硬化性組成物。 (式(c-I)中,Rc01 、Rc02 ,及Rc03 各自獨立為碳原子數為1以上、6以下烷基)。The thermal cationic polymerization initiator (B2-1) is composed of a cation part and an anion part, and the above-mentioned cation part is preferably a compound containing a cation represented by the following formula (cI). When this thermal cationic polymerization initiator (B2-1) is used, the curable compound (A) can be well cured to form a cured product having excellent refractive index and yellowing resistance, and it is also easy to produce A curable composition with good heat resistance (resistance to thermal decomposition) and good adhesion to the substrate. (In formula (cI), R c01 , R c02 , and R c03 are each independently an alkyl group having 1 to 6 carbon atoms).
式(c-I)中,Rc01 、Rc02 ,及Rc03 之烷基的較佳例示,可列舉如,甲基、乙基、n-丙基、異丙基、n-丁基、異丁基、sec-丁基、tert-丁基、n-戊基,及n-己基等。烷基,例如,以甲基,或乙基為佳,以甲基為較佳;以Rc01 、Rc02 ,及Rc03 全部為甲基者為特佳。In formula (cI), preferred examples of R c01 , R c02 , and R c03 alkyl groups include, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl , sec-butyl, tert-butyl, n-pentyl, and n-hexyl, etc. The alkyl group, for example, is preferably methyl or ethyl, more preferably methyl; especially preferably all of R c01 , R c02 , and R c03 are methyl.
即,式(c-I)所表示的陽離子,以下述式(c-II)所表示的陽離子為佳。 That is, the cation represented by the formula (cI) is preferably a cation represented by the following formula (c-II).
式(c-I)所表示的陽離子之對陰離子,例如,AsF6 - 、SbF6 - 、PF6 - ,及((C6 F5 )4 B)- 等。該些之中,又以((C6 F5 )4 B)- 為佳。又,「C6 F5 」為表示五氟苯基。The counter anion of the cation represented by the formula (cI), for example, AsF 6 - , SbF 6 - , PF 6 - , and ((C 6 F 5 ) 4 B) - , etc. Among them, ((C 6 F 5 ) 4 B) - is preferable. Also, "C 6 F 5 " means pentafluorophenyl.
由上述式(c-I)所表示的陽離子部與陰離子部所形成的化合物,可使用以市售品方式取得的化合物。市售品,例如,CXC-1821(King Industries公司製)等。As the compound formed of the cation part and the anion part represented by the above-mentioned formula (c-I), commercially available compounds can be used. As a commercial item, for example, CXC-1821 (manufactured by King Industries) and the like.
由式(c-I)所表示的陽離子所形成的陽離子部,與陰離子部所形成的化合物的較佳具體例,可列舉如,由式(c-II)所表示的陽離子,與AsF6 - 所形成的四級銨鹽、由式(c-II)所表示的陽離子,與SbF6 - 所形成的四級銨鹽、由式(c-II)所表示的陽離子,與PF6 - 所形成的四級銨鹽,及由式(c-II)所表示的陽離子,與((C6 F5 )4 B)- 所形成的四級銨鹽等。該些之中,又以由式(c-II)所表示的陽離子,與((C6 F5 )4 B)- 所形成的四級銨鹽為較佳。Preferable specific examples of the compound formed by the cation moiety represented by the formula (cI) and the anion moiety include, for example, the compound formed by the cation moiety represented by the formula (c-II) and AsF 6 - The quaternary ammonium salt of the cation represented by the formula (c-II), the quaternary ammonium salt formed by the cation represented by the formula (c- II ) , and the quaternary ammonium salt formed by the cation represented by the formula (c-II), and the quaternary ammonium salt formed by the PF 6 - A quaternary ammonium salt, a cation represented by formula (c-II), and a quaternary ammonium salt formed with ((C 6 F 5 ) 4 B) - , etc. Among them, the quaternary ammonium salt formed by the cation represented by the formula (c-II) and ((C 6 F 5 ) 4 B) - is more preferable.
由式(c-I)所表示的陽離子所形成的陽離子部,與陰離子部所形成的化合物,可單獨使用1種亦可、將2種以上組合使用亦可。The cation part which consists of a cation represented by formula (c-I), and the compound which consists of an anion part may be used individually by 1 type, or may be used in combination of 2 or more types.
・光陽離子聚合起始劑(B2-2) 光陽離子聚合起始劑(B2-2),只要為不屬於使陽離子聚合性硬化性組成物進行光硬化時所使用的鋶鹽(B1)以外的聚合起始劑時,並未有特別之限制,而皆可使用。光陽離子聚合起始劑(B2-2)的較佳例示,可列舉如,錪鹽,與鋶鹽等。・Photocationic polymerization initiator (B2-2) The photocationic polymerization initiator (B2-2) is not particularly limited as long as it is a polymerization initiator other than the perjuly salt (B1) used for photocuring the cationically polymerizable curable composition. , and both can be used. Desirable examples of the photocationic polymerization initiator (B2-2) include, for example, iodonium salts and permeic acid salts.
錪鹽的具體例,可列舉如,二苯錪四(五氟苯基)硼酸鹽、二苯錪六氟磷酸鹽、二苯錪六氟銻酸鹽、二(4-壬苯基)錪六氟磷酸鹽等。Specific examples of iodonium salts include, for example, diphenyliodonium tetrakis(pentafluorophenyl) borate, diphenyliodonium hexafluorophosphate, diphenyliodonium hexafluoroantimonate, bis(4-nonylphenyl) Fluorophosphate etc.
光陽離子聚合起始劑(B2-2),以鋶鹽為佳。鋶鹽之中,又以由下述式(c1)所表示的陽離子所形成的陽離子部,與陰離子部所形成的鋶鹽(以下,亦稱為「鋶鹽(Q)」。又,鋶鹽(B1)為具有由下述式(c1)所表示的陽離子所形成的陽離子部之鋶鹽時,則將該鋶鹽分類為鋶鹽(B1))為佳。 硬化性組成物中,含有鋶鹽(Q)時,特別是可容易地使硬化性組成物良好地進行硬化。The photocationic polymerization initiator (B2-2) is preferably a permeic acid salt. Among the percited salts, the percited salt (hereinafter, also referred to as "conium salt (Q)") formed by the cation part formed by the cation represented by the following formula (c1) and the anion part When (B1) is a percited salt having a cation part formed of a cation represented by the following formula (c1), it is preferable to classify the percited salt as a percited salt (B1)). In particular, when cobalt (Q) is contained in the curable composition, the curable composition can be easily cured favorably.
(式(c1)中,Rc1 及Rc2 獨立表示可被鹵素原子所取代的烷基或下述式(c2)所表示之基;Rc1 及Rc2 可相互鍵結並與式中之硫原子共同形成環,Rc3 表示下述式(c3)所表示之基或下述式(c4)所表示之基;Ac1 表示S、O,或Se;其中,Rc1 及Rc2 不同時為可被鹵素原子所取代的烷基)。 (In formula (c1), R c1 and R c2 independently represent an alkyl group that can be substituted by a halogen atom or a group represented by the following formula (c2); R c1 and R c2 can be bonded to each other and with the sulfur in the formula Atoms form a ring together, R c3 represents the base represented by the following formula (c3) or the base represented by the following formula (c4); A c1 represents S, O, or Se; wherein, R c1 and R c2 are not at the same time an alkyl group which may be substituted by a halogen atom).
(式(c2)中,環Zc1 表示芳香族烴環;Rc4 表示可被鹵素原子取代之烷基、羥基、烷氧基、烷羰基、烷氧羰基、醯氧基、烷硫基、噻吩基、噻吩羰基、呋喃基、呋喃羰基、硒吩基、硒吩羰基、脂肪族雜環基、烷基亞磺醯基、烷基磺醯基、羥基(聚)伸烷氧基、可被取代的胺基、氰基、硝基,或鹵素原子;m1表示0以上之整數)。 (In the formula (c2), the ring Z c1 represents an aromatic hydrocarbon ring; R c4 represents an alkyl, hydroxyl, alkoxy, alkylcarbonyl, alkoxycarbonyl, acyloxy, alkylthio, thiophene group that can be substituted by a halogen atom group, thiophenecarbonyl, furyl, furancarbonyl, selenophene, selenophene carbonyl, aliphatic heterocyclic group, alkylsulfinyl, alkylsulfonyl, hydroxy (poly) alkyleneoxy, can be substituted Amino group, cyano group, nitro group, or halogen atom; m1 represents an integer of 0 or more).
(式(c3)中,Rc5 表示羥基、烷氧基、烷羰基、芳羰基、烷氧羰基、芳氧羰基、芳基硫羰基、醯氧基、芳硫基、烷硫基、芳基、雜環基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代的胺基、氰基、硝基,或可被鹵素原子取代的伸烷基或下述式(c5)所表示之基;Rc6 表示羥基、烷氧基、烷羰基、芳羰基、烷氧羰基、芳氧羰基、芳基硫羰基、醯氧基、芳硫基、烷硫基、芳基、雜環基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代的胺基、氰基、硝基,或可被鹵素原子取代的烷基或下述式(c6)所表示之基;Ac2 表示單鍵、S、O、亞磺醯基,或羰基;m2表示0或1)。 (In the formula (c3), R C5 represents hydroxyl, alkoxy, alkylcarbonyl, arylcarbonyl, alkoxycarbonyl, aryloxycarbonyl, arylthiocarbonyl, acyloxy, arylthio, alkylthio, aryl, Heterocyclic group, aryloxy group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, hydroxy(poly)alkylene group, amino group which may be substituted, A cyano group, a nitro group, or an alkylene group which may be substituted by a halogen atom or a group represented by the following formula (c5); R c6 represents a hydroxyl group, an alkoxyl group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group , arylthiocarbonyl, acyloxy, arylthio, alkylthio, aryl, heterocyclyl, aryloxy, alkylsulfinyl, arylsulfinyl, alkylsulfonyl, aryl Sulfonyl group, hydroxy (poly) alkoxyl group, amino group, cyano group, nitro group that can be substituted, or alkyl group that can be substituted by halogen atom or the group represented by the following formula (c6); A c2 Represents a single bond, S, O, sulfinyl, or carbonyl; m2 represents 0 or 1).
(式(c4)中,Rc7 及Rc8 獨立表示羥基、烷氧基、烷羰基、芳羰基、烷氧羰基、芳氧羰基、芳基硫羰基、醯氧基、芳硫基、烷硫基、芳基、雜環基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代的胺基、氰基、硝基,或可被鹵素原子取代的伸烷基或下述式(c5)所表示之基;Rc9 及Rc10 獨立表示可被鹵素原子取代的烷基或上述式(c2)所表示之基;Rc9 及Rc10 可相互鍵結並與式中之硫原子共同形成環;Ac3 表示單鍵、S、O、亞磺醯基,或羰基;m3表示0或1;其中,Rc9 及Rc10 不同時為可被鹵素原子所取代的烷基)。 (In formula (c4), R c7 and R c8 independently represent hydroxyl, alkoxyl, alkylcarbonyl, arylcarbonyl, alkoxycarbonyl, aryloxycarbonyl, arylthiocarbonyl, acyloxy, arylthio, alkylthio , aryl, heterocyclyl, aryloxy, alkylsulfinyl, arylsulfinyl, alkylsulfonyl, arylsulfonyl, hydroxy(poly)alkoxyl, can be substituted Amino, cyano, nitro, or alkylene groups that may be substituted by halogen atoms or groups represented by the following formula (c5); R c9 and R c10 independently represent alkyl groups that may be substituted by halogen atoms or the above formula The base represented by (c2); R c9 and R c10 can be bonded to each other and form a ring together with the sulfur atom in the formula; A c3 represents a single bond, S, O, sulfinyl, or carbonyl; m3 represents 0 or 1; wherein, R c9 and R c10 are not both alkyl groups that may be substituted by halogen atoms).
(式(c5)中,環Zc2 表示芳香族烴環;Rc11 表示可被鹵素原子取代的烷基,或羥基、烷氧基、烷羰基、芳羰基、烷氧羰基、芳氧羰基、芳基硫羰基、醯氧基、芳硫基、烷硫基、芳基、雜環基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代的胺基、氰基、硝基,或鹵素原子;m4表示0以上之整數)。 (式(c6)中,環Zc3 表示芳香族烴環;Rc12 表示可被鹵素原子取代的烷基,或羥基、烷氧基、烷羰基、芳羰基、烷氧羰基、芳氧羰基、芳基硫羰基、醯氧基、芳硫基、烷硫基、噻吩羰基、呋喃羰基、硒吩羰基、芳基、雜環基、芳氧基、烷基亞磺醯基、芳基亞磺醯基、烷基磺醯基、芳基磺醯基、羥基(聚)伸烷氧基、可被取代的胺基、氰基、硝基,或鹵素原子;m5表示0以上之整數)。 (In the formula (c5), the ring Z c2 represents an aromatic hydrocarbon ring; R c11 represents an alkyl group that may be substituted by a halogen atom, or a hydroxyl group, an alkoxyl group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an aromatic Alkylthiocarbonyl, acyloxy, arylthio, alkylthio, aryl, heterocyclyl, aryloxy, alkylsulfinyl, arylsulfinyl, alkylsulfonyl, arylsulfonyl Acyl group, hydroxy (poly) alkoxyl group, amino group that may be substituted, cyano group, nitro group, or halogen atom; m4 represents an integer of 0 or more). (In formula (c6), ring Z c3 represents an aromatic hydrocarbon ring; R c12 represents an alkyl group that may be substituted by a halogen atom, or a hydroxyl group, an alkoxyl group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an aromatic Alkylthiocarbonyl, acyloxy, arylthio, alkylthio, thiophenecarbonyl, furancarbonyl, selenophenecarbonyl, aryl, heterocyclyl, aryloxy, alkylsulfinyl, arylsulfinyl , alkylsulfonyl group, arylsulfonyl group, hydroxyl (poly)alkoxyl group, amino group that may be substituted, cyano group, nitro group, or a halogen atom; m5 represents an integer of 0 or more).
(鋶鹽(Q)) 以下,將對鋶鹽(Q)進行說明。鋶鹽(Q)為,於上述式(c1)中之苯環中,以相對於Ac1 鍵結的碳原子為鄰位的碳原子上,鍵結甲基者為特徵。鋶鹽(Q),於上述位置具有甲基時,與以往的鋶鹽相比較時,可容易產生質子、提高對紫外線等的活性能量線的感度。(Cerium Salt (Q)) Hereinafter, the percite salt (Q) will be described. The cobalt salt (Q) is characterized in that a methyl group is bonded to a carbon atom that is ortho to the carbon atom to which A c1 is bonded in the benzene ring in the above formula (c1). When the permeic salt (Q) has a methyl group at the above-mentioned position, it can easily generate protons and improve the sensitivity to active energy rays such as ultraviolet rays, compared with conventional permeic salts.
上述式(c1)中,Rc1 及Rc2 以皆為上述式(c2)所表示之基為佳;又,Rc1 及Rc2 可互相為相同或相異。 上述式(c1)中,Rc1 及Rc2 相互鍵結並與式中之硫原子共同形成環時,所形成的環中,構成環的原子數,包含硫原子以3以上、10以下為佳,以5以上、7以下為較佳。所形成的環,可為多環,又以由5~7員環縮合而得者為佳。 上述式(c1)中,Rc1 及Rc2 以皆為苯基者為佳。 上述式(c1)中,Rc3 以上述式(c3)所表示之基為佳。 上述式(c1)中,Ac1 以S或O為佳,S為較佳。In the above formula (c1), both R c1 and R c2 are preferably groups represented by the above formula (c2); and R c1 and R c2 may be the same or different from each other. In the above formula (c1), when R c1 and R c2 are bonded to each other and form a ring together with the sulfur atom in the formula, in the formed ring, the number of atoms constituting the ring is preferably 3 or more and 10 or less including the sulfur atom , preferably more than 5 and less than 7. The formed ring may be polycyclic, and those obtained by condensation of 5-7 membered rings are preferred. In the above formula (c1), R c1 and R c2 are preferably both phenyl groups. In the above formula (c1), R c3 is preferably a group represented by the above formula (c3). In the above formula (c1), A c1 is preferably S or O, and S is more preferred.
上述式(c2)中,Rc4 以可被鹵素原子取代的烷基,或羥基、烷羰基、噻吩羰基、呋喃羰基、硒吩羰基、可被取代的胺基,或硝基為佳,以可被鹵素原子取代的烷基,或烷羰基,或噻吩羰基為較佳。 上述式(c2)中,m1可配合環Zc1 之種類作適當之選擇,例如,為0以上、4以下之整數;較佳為0以上、3以下之整數,更佳亦可為0以上、2以下之整數。In the above formula (c2), R c4 is preferably an alkyl group that may be substituted by a halogen atom, or a hydroxyl group, an alkyl carbonyl group, a thiophene carbonyl group, a furyl carbonyl group, a selenophene carbonyl group, an amino group that may be substituted, or a nitro group, and it is better to use a nitro group that may be substituted. An alkyl group substituted by a halogen atom, or an alkylcarbonyl group, or a thiophenecarbonyl group is preferred. In the above formula (c2), m1 can be appropriately selected according to the type of ring Z c1 , for example, it is an integer between 0 and 4; it is preferably an integer between 0 and 3, more preferably it can be 0 or more, An integer of 2 or less.
上述式(c3)中,Rc5 以伸烷基;羥基、可被取代的胺基,或被硝基取代的伸烷基;或上述式(c5)所表示之基為佳,以上述式(c5)所表示之基為較佳。 上述式(c3)中,Rc6 以烷基;羥基、可被取代的胺基,或被硝基取代的烷基;或上述式(c6)所表示之基為佳,以上述式(c6)所表示之基為較佳。 上述式(c3)中,Ac2 以S或O為佳,以S為較佳。 上述式(c3)中,m2以0為佳。In above-mentioned formula (c3), R C5 is with alkylene; Hydroxyl, the amino group that can be substituted, or the alkylene group substituted by nitro; Or the group represented by above-mentioned formula (c5) is preferably, with above-mentioned formula ( The group represented by c5) is preferable. In above-mentioned formula (c3), R C6 is with alkyl; Hydroxyl, the amino group that can be substituted, or the alkyl that is substituted by nitro; Or the group represented by above-mentioned formula (c6) is preferably, with above-mentioned formula (c6) The indicated basis is preferred. In the above formula (c3), A c2 is preferably S or O, more preferably S. In the above formula (c3), m2 is preferably 0.
上述式(c4)中,Rc7 及Rc8 獨立以伸烷基;羥基、可被取代的胺基,或被硝基取代的伸烷基;或上述式(a5)所表示之基為佳,以上述式(c5)所表示之基為較佳;又,Rc7 及Rc8 可互相為相同或相異。 上述式(c4)中,以Rc9 及Rc10 皆為上述式(c2)所表示之基為佳;Rc9 及Rc10 可互相為相同或相異。 上述式(c4)中,Rc9 及Rc10 相互鍵結並與式中之硫原子共同形成環時,所形成之環中,構成環的原子數,包含硫原子以3以上、10以下為佳,以5以上、7以下為較佳。所形成之環,可為多環,又以由5~7員環縮合而得者為佳。 上述式(c4)中,Ac3 以S或O為佳,以S為較佳。 上述式(c4)中,m3以0為佳。In the above formula (c4), R C7 and R C8 are independently alkylene groups; hydroxyl groups, amino groups that may be substituted, or alkylene groups substituted by nitro groups; or groups represented by the above formula (a5), The group represented by the above formula (c5) is preferable; R c7 and R c8 may be the same or different from each other. In the above formula (c4), it is preferable that both R c9 and R c10 are groups represented by the above formula (c2); R c9 and R c10 may be the same or different from each other. In the above formula (c4), when R c9 and R c10 are bonded to each other and form a ring together with the sulfur atom in the formula, in the formed ring, the number of atoms constituting the ring is preferably 3 or more and 10 or less including the sulfur atom , preferably more than 5 and less than 7. The formed ring may be polycyclic, and those obtained by condensation of 5-7 membered rings are preferred. In the above formula (c4), A c3 is preferably S or O, more preferably S. In the above formula (c4), m3 is preferably 0.
上述式(c5)中,Rc11 以可被鹵素原子取代的烷基,或羥基、可被取代的胺基,或硝基為佳,又以可被鹵素原子取代的烷基或為較佳。 上述式(c5)中,m4可配合環Zc2 之種類作適當之選擇,例如,為0以上、4以下之整數;較佳為0以上、3以下之整數,更佳亦可為0以上、2以下之整數。In the above formula (c5), R c11 is preferably an alkyl group that may be substituted by a halogen atom, or a hydroxyl group, an amino group that may be substituted, or a nitro group, and is more preferably an alkyl group that may be substituted by a halogen atom. In the above formula (c5), m4 can be appropriately selected according to the type of ring Z c2 , for example, it is an integer between 0 and 4; it is preferably an integer between 0 and 3, more preferably it can be 0 or more, An integer of 2 or less.
上述式(c6)中,Rc12 以可被鹵素原子取代的烷基,或羥基、烷羰基、噻吩羰基、呋喃羰基、硒吩羰基、可被取代的胺基,或硝基為佳,可被鹵素原子取代的烷基,或烷羰基,或噻吩羰基為較佳。 上述式(c6)中,m5可配合環Zc3 之種類作適當之選擇,例如,為0以上、4以下之整數;較佳為0以上、3以下之整數,更佳亦可為0以上、2以下之整數。In the above formula (c6), R c12 is preferably an alkyl group that may be substituted by a halogen atom, or a hydroxyl group, an alkylcarbonyl group, a thiophene carbonyl group, a furan carbonyl group, a selenophene carbonyl group, an amino group that may be substituted, or a nitro group, and may be substituted by An alkyl group substituted with a halogen atom, or an alkylcarbonyl group, or a thiophenecarbonyl group is preferred. In the above formula (c6), m5 can be appropriately selected according to the type of ring Zc3 , for example, it is an integer between 0 and 4; it is preferably an integer between 0 and 3, more preferably it can be 0 or more, An integer of 2 or less.
上述式(c1)所表示的陽離子,通常可與1價之陰離子X- 共同形成鹽。X- 為對應於經活性能量(熱、可見光、紫外線、電子線,及X線等)照射而於鋶鹽(Q)中所產生之酸(HX)的1價之陰離子。X- ,以1價之多原子陰離子為較佳之例示,又以MYa - 、(Rf)b PF6-b - 、Rx1 c BY4-c - 、Rx2 SO3 - 、(Rx2 SO2 )3 C- ,或(Rx2 SO2 )2 N- 所表示的陰離子為較佳。又,X- 亦可為鹵素陰離子,例如,氟化物離子、氯化物離子、溴化物離子、碘化物離子等。The cation represented by the above formula (c1) can usually form a salt together with the monovalent anion X- . X - is a monovalent anion corresponding to the acid (HX) produced in the permeic salt (Q) by irradiation with active energy (heat, visible light, ultraviolet rays, electron rays, and X-rays, etc.). X - is preferably exemplified by monovalent polyatomic anions, and MY a - , (Rf) b PF 6-b - , R x1 c BY 4-c - , R x2 SO 3 - , (R x2 SO 2 ) 3 C - , or an anion represented by (R x2 SO 2 ) 2 N - is preferred. In addition, X - may also be a halogen anion, for example, fluoride ion, chloride ion, bromide ion, iodide ion and the like.
M表示磷原子、硼原子,或銻原子。 Y表示鹵素原子(以氟原子為佳)。M represents a phosphorus atom, a boron atom, or an antimony atom. Y represents a halogen atom (preferably a fluorine atom).
Rf表示氫原子的80莫耳%以上被氟原子所取代的烷基(以碳原子數為1以上、8以下烷基為佳)。被氟取代而形成Rf之烷基,可列舉如,直鏈烷基(甲基、乙基、丙基、丁基、戊基及辛基等)、支鏈烷基(異丙基、異丁基、sec-丁基及tert-丁基等)及環烷基(環丙基、環丁基、環戊基及環己基等)等;Rf中,該些烷基中之氫原子被氟原子取代之比例,以原烷基所具有的氫原子之莫耳數為基準,以80莫耳%以上為佳,更佳為90%以上,特佳為100%。氟原子的取代比例於該些較佳範圍時,可使鋶鹽(Q)之光感應性更為良好。特佳之Rf可列舉如,CF3 -、CF3 CF2 - 、(CF3 )2 CF- 、CF3 CF2 CF2 - 、CF3 CF2 CF2 CF2 - 、(CF3 )2 CFCF2 - 、CF3 CF2 (CF3 )CF- 及(CF3 )3 C- 等。b個Rf,為互相獨立者,故其可互相為相同或相異。Rf represents an alkyl group in which more than 80 mol% of hydrogen atoms are substituted by fluorine atoms (preferably an alkyl group with a carbon number of 1 or more and 8 or less). Alkyl groups that are substituted by fluorine to form Rf include, for example, straight-chain alkyl groups (methyl, ethyl, propyl, butyl, pentyl, and octyl, etc.), branched-chain alkyl groups (isopropyl, isobutyl, etc.) group, sec-butyl group and tert-butyl group, etc.) and cycloalkyl groups (cyclopropyl, cyclobutyl, cyclopentyl and cyclohexyl groups, etc.); in Rf, the hydrogen atoms in these alkyl groups are replaced by fluorine atoms The ratio of substitution is preferably at least 80 mol%, more preferably at least 90%, and most preferably at least 100%, based on the number of moles of hydrogen atoms possessed by the orthoalkyl group. When the substitution ratio of the fluorine atoms is within these preferred ranges, the light sensitivity of the cobalt salt (Q) can be improved. Particularly preferred Rf can be, for example, CF 3 -, CF 3 CF 2 - , (CF 3 ) 2 CF - , CF 3 CF 2 CF 2 - , CF 3 CF 2 CF 2 CF 2 - , (CF 3 ) 2 CFCF 2 - , CF 3 CF 2 (CF 3 )CF - and (CF 3 ) 3 C - etc. The b Rfs are independent of each other, so they may be the same or different from each other.
P表示磷原子、F表示氟原子。P represents a phosphorus atom, and F represents a fluorine atom.
Rx1 表示氫原子中的一部份至少被1個元素或拉電子基(electron-withdrawing group)所取代的苯基。該些1個元素之例,例如,包含鹵素原子、氟原子、氯原子及溴原子等。拉電子基,可列舉如,三氟甲基、硝基及氰基等。該些之中,以至少1個氫原子被氟原子或三氟甲基所取代的苯基為佳。c個Rx1 為相互獨立者,因此其可互相為相同或相異。R x1 represents a phenyl group in which at least a part of hydrogen atoms is substituted by an element or an electron-withdrawing group. Examples of these one element include, for example, a halogen atom, a fluorine atom, a chlorine atom, and a bromine atom. The electron withdrawing group includes, for example, a trifluoromethyl group, a nitro group, a cyano group, and the like. Among these, a phenyl group in which at least one hydrogen atom is substituted by a fluorine atom or a trifluoromethyl group is preferable. Since the c pieces of R x1 are mutually independent, they may be the same or different from each other.
B表示硼原子。B represents a boron atom.
Rx2 表示碳原子數為1以上、20以下烷基、碳原子數為1以上、20以下氟烷基,或碳原子數為6以上、20以下之芳基;烷基及氟烷基可為直鏈狀、支鏈狀或環狀之任一者皆可,該烷基、氟烷基,或芳基可不具有取代基、亦可具有取代基。上述取代基,例如,羥基、可被取代的胺基(例如,有關上述式(c2)~(c6)的後述說明中所例示者等)、硝基等。 又,Rx2 所表示的烷基、氟烷基或芳基中之碳鏈,可具有氧原子、氮原子、硫原子等的雜原子。特別是Rx2 所表示的烷基或氟烷基中之碳鏈,亦可具有2價之官能基(例如,醚鍵結、羰鍵結、酯鍵結、胺基鍵結、醯胺鍵結、醯亞胺鍵結、磺醯鍵結、磺醯基醯胺鍵結、磺醯基醯亞胺鍵結、胺基甲酸酯鍵結等)。 Rx2 所表示的烷基、氟烷基或芳基,具有上述取代基、雜原子,或官能基時,上述取代基、雜原子,或官能基之個數可為1個亦可、2個以上亦可。R x2 represents an alkyl group with 1 to 20 carbon atoms, a fluoroalkyl group with 1 to 20 carbon atoms, or an aryl group with 6 to 20 carbon atoms; the alkyl and fluoroalkyl groups can be Any of linear, branched or cyclic may be used, and the alkyl group, fluoroalkyl group, or aryl group may have no substituent or may have a substituent. The above-mentioned substituents include, for example, a hydroxyl group, an amino group that may be substituted (for example, those exemplified in the description of the above-mentioned formulas (c2) to (c6), etc.), a nitro group, and the like. In addition, the carbon chain in the alkyl group, fluoroalkyl group or aryl group represented by Rx2 may have heteroatoms such as oxygen atom, nitrogen atom, sulfur atom and the like. In particular, the carbon chain in the alkyl group or fluoroalkyl group represented by R x2 may also have a divalent functional group (for example, an ether bond, a carbonyl bond, an ester bond, an amine bond, an amide bond) , imide bond, sulfonyl bond, sulfonyl amide bond, sulfonyl imide bond, urethane bond, etc.). When the alkyl group, fluoroalkyl group or aryl group represented by R x2 has the above-mentioned substituents, heteroatoms, or functional groups, the number of the above-mentioned substituents, heteroatoms, or functional groups may be one or two. The above are also available.
S表示硫原子、O表示氧原子、C表示碳原子、N表示氮原子。 a表示4以上、6以下之整數。 b以1以上、5以下之整數為佳,更佳為2以上、4以下之整數;特佳為2或3。 c以1以上、4以下之整數為佳,更佳為4。S represents a sulfur atom, O represents an oxygen atom, C represents a carbon atom, and N represents a nitrogen atom. a represents an integer between 4 and 6. b is preferably an integer of 1 to 5, more preferably an integer of 2 to 4; particularly preferably 2 or 3. c is preferably an integer of 1 to 4, more preferably 4.
MYa - 所表示的陰離子,可列舉如,SbF6 - 、PF6 - 或BF4 - 所表示的陰離子等。The anion represented by MY a - includes, for example, an anion represented by SbF 6 - , PF 6 -, or BF 4 - .
(Rf)b PF6-b - 所表示的陰離子,可列舉如,(CF3 CF2 )2 PF4 - 、(CF3 CF2 )3 PF3 - 、((CF3 )2 CF)2 PF4 - 、 ((CF3 )2 CF)3 PF3 - 、(CF3 CF2 CF2 )2 PF4 - 、(CF3 CF2 CF2 )3 PF3 - 、 ((CF3 )2 CFCF2 )2 PF4 - 、((CF3 )2 CFCF2 )3 PF3 - 、 (CF3 CF2 CF2 CF2 )2 PF4 - 或(CF3 CF2 CF2 CF2 )3 PF3 - 所表示的陰離子等。該些之中,又以(CF3 CF2 )3 PF3 - 、(CF3 CF2 CF2 )3 PF3 - 、((CF3 )2 CF)3 PF3 - 、((CF3 )2 CF)2 PF4 - 、((CF3 )2 CFCF2 )3 PF3 - 或((CF3 )2 CFCF2 )2 PF4 - 所表示的陰離子為佳。Anions represented by (Rf) b PF 6-b - include, for example, (CF 3 CF 2 ) 2 PF 4 - , (CF 3 CF 2 ) 3 PF 3 - , ((CF 3 ) 2 CF) 2 PF 4 - , ((CF 3 ) 2 CF) 3 PF 3 - , (CF 3 CF 2 CF 2 ) 2 PF 4 - , (CF 3 CF 2 CF 2 ) 3 PF 3 - , ((CF 3 ) 2 CFCF 2 ) 2 PF 4 - , ((CF 3 ) 2 CFCF 2 ) 3 PF 3 - , (CF 3 CF 2 CF 2 CF 2 ) 2 PF 4 - or (CF 3 CF 2 CF 2 CF 2 ) 3 PF 3 - Represented anions, etc. Among them, (CF 3 CF 2 ) 3 PF 3 - , (CF 3 CF 2 CF 2 ) 3 PF 3 - , ((CF 3 ) 2 CF) 3 PF 3 - , ((CF 3 ) 2 The anion represented by CF) 2 PF 4 - , ((CF 3 ) 2 CFCF 2 ) 3 PF 3 - or ((CF 3 ) 2 CFCF 2 ) 2 PF 4 - is preferable.
Rx1 c BY4-c - 所表示的陰離子,較佳為 Rx1 c BY4-c - (式中,Rx1 表示氫原子中的至少一部份被鹵素原子或拉電子基所取代的苯基;Y表示鹵素原子;c表示1以上、4以下之整數)。 ,例如,((C6 F5 )4 B)- 、(((CF3 )2 C6 H3 )4 B)- 、((CF3 C6 H4 )4 B)- 、((C6 F5 )2 BF2 )- 、(C6 F5 BF3 )- 或((C6 H3 F2 )4 B)- 所表示的陰離子等。該些之中,又以((C6 F5 )4 B)- 或(((CF3 )2 C6 H3 )4 B)- 所表示的陰離子為佳。Anion represented by R x1 c BY 4-c - , preferably R x1 c BY 4-c - (wherein, R x1 represents benzene in which at least a part of the hydrogen atoms are replaced by halogen atoms or electron-withdrawing groups group; Y represents a halogen atom; c represents an integer of 1 to 4). , for example, ((C 6 F 5 ) 4 B) - , (((CF 3 ) 2 C 6 H 3 ) 4 B) - , ((CF 3 C 6 H 4 ) 4 B) - , ((C 6 Anion represented by F 5 ) 2 BF 2 ) - , (C 6 F 5 BF 3 ) - or ((C 6 H 3 F 2 ) 4 B) - , etc. Among these, an anion represented by ((C 6 F 5 ) 4 B) - or (((CF 3 ) 2 C 6 H 3 ) 4 B) - is preferable.
Rx2 SO3 - 所表示的陰離子,可列舉如,三氟甲烷磺酸陰離子、五氟乙烷磺酸陰離子、七氟丙烷磺酸陰離子、九氟丁烷磺酸陰離子、五氟苯基磺酸陰離子、p-甲苯磺酸陰離子、苯磺酸陰離子、樟腦磺酸陰離子、甲烷磺酸陰離子、乙烷磺酸陰離子、丙烷磺酸陰離子及丁烷磺酸陰離子等。該些之中,又以三氟甲烷磺酸陰離子、九氟丁烷磺酸陰離子、甲烷磺酸陰離子、丁烷磺酸陰離子、樟腦磺酸陰離子、苯磺酸陰離子或p-甲苯磺酸陰離子為佳。The anion represented by R x2 SO 3 - includes, for example, trifluoromethanesulfonic acid anion, pentafluoroethanesulfonic acid anion, heptafluoropropanesulfonic acid anion, nonafluorobutanesulfonic acid anion, pentafluorophenylsulfonic acid anion, p-Toluenesulfonic acid anion, benzenesulfonic acid anion, camphorsulfonic acid anion, methanesulfonic acid anion, ethanesulfonic acid anion, propanesulfonic acid anion, butanesulfonic acid anion, etc. Among these, trifluoromethanesulfonic acid anion, nonafluorobutanesulfonic acid anion, methanesulfonic acid anion, butanesulfonic acid anion, camphorsulfonic acid anion, benzenesulfonic acid anion or p-toluenesulfonic acid anion are used as good.
(Rx2 SO2 )3 C- 所表示的陰離子,可列舉如,(CF3 SO2 )3 C- 、(C2 F5 SO2 )3 C- 、(C3 F7 SO2 )3 C- 或(C4 F9 SO2 )3 C- 所表示的陰離子等。Anions represented by (R x2 SO 2 ) 3 C - include, for example, (CF 3 SO 2 ) 3 C - , (C 2 F 5 SO 2 ) 3 C - , (C 3 F 7 SO 2 ) 3 C - or an anion represented by (C 4 F 9 SO 2 ) 3 C - , etc.
(Rx2 SO2 )2 N- 所表示的陰離子,可列舉如,(CF3 SO2 )2 N- 、(C2 F5 SO2 )2 N- 、(C3 F7 SO2 )2 N- 或(C4 F9 SO2 )2 N- 所表示的陰離子等。Anion represented by (R x2 SO 2 ) 2 N - , for example, (CF 3 SO 2 ) 2 N - , (C 2 F 5 SO 2 ) 2 N - , (C 3 F 7 SO 2 ) 2 N - or an anion represented by (C 4 F 9 SO 2 ) 2 N - and the like.
一價之多原子陰離子,除MYa - 、(Rf)b PF6-b - 、Rx1 c BY4-c - 、Rx2 SO3 - 、(Rx2 SO2 )3 C- 或(Rx2 SO2 )2 N- 所表示的陰離子以外,亦可使用過鹵酸離子(ClO4 - 、BrO4 - 等)、鹵化磺酸離子(FSO3 - 、ClSO3 - 等)、硫酸離子(CH3 SO4 - 、CF3 SO4 - 、HSO4 - 等)、碳酸離子(HCO3 - 、CH3 CO3 - 等)、鋁酸離子(AlCl4 - 、AlF4 - 等)、六氟鉍酸離子(BiF6 - )、羧酸離子(CH3 COO- 、CF3 COO- 、C6 H5 COO- 、CH3 C6 H4 COO- 、C6 F5 COO- 、CF3 C6 H4 COO- 等)、芳基硼酸離子(B(C6 H5 )4 - 、CH3 CH2 CH2 CH2 B(C6 H5 )3 - 等)、硫氰酸離子(SCN- )及硝酸離子(NO3 - )等。Monovalent polyatomic anions, except MY a - , (Rf) b PF 6-b - , R x1 c BY 4-c - , R x2 SO 3 - , (R x2 SO 2 ) 3 C - or (R x2 In addition to the anions represented by SO 2 ) 2 N - , perhalogenate ions (ClO 4 - , BrO 4 -, etc.), halogenated sulfonate ions (FSO 3 - , ClSO 3 -, etc.), sulfate ions (CH 3 SO 4 - , CF 3 SO 4 - , HSO 4 -, etc.), carbonate ions (HCO 3 - , CH 3 CO 3 -, etc.), aluminate ions (AlCl 4 - , AlF 4 -, etc.), hexafluorobismuth ions (BiF 6 - ), carboxylate ions (CH 3 COO - , CF 3 COO - , C 6 H 5 COO - , CH 3 C 6 H 4 COO - , C 6 F 5 COO - , CF 3 C 6 H 4 COO - etc.), aryl borate ion (B(C 6 H 5 ) 4 - , CH 3 CH 2 CH 2 CH 2 B(C 6 H 5 ) 3 - etc.), thiocyanate ion (SCN - ) and nitrate ion (NO 3 - ) and so on.
該些X- 之中,就陽離子聚合性能之觀點,以MYa - 、(Rf)b PF6-b - 、Rx1 c BY4-c - ,及(Rx2 SO2 )3 C- 所表示的陰離子為佳,以SbF6 - 、PF6 - 、(CF3 CF2 )3 PF3 - 、((C6 F5 )4 B)- 、(((CF3 )2 C6 H3 )4 B)- ,及(CF3 SO2 )3 C- 為較佳。Among these X - , from the viewpoint of cationic polymerization performance, MY a - , (Rf) b PF 6-b - , R x1 c BY 4-c - , and (R x2 SO 2 ) 3 C - are represented The anions of are preferably SbF 6 - , PF 6 - , (CF 3 CF 2 ) 3 PF 3 - , ((C 6 F 5 ) 4 B) - , (((CF 3 ) 2 C 6 H 3 ) 4 B) - , and (CF 3 SO 2 ) 3 C - are preferred.
上述式(c2)、(c5),及(c6)中,芳香族烴環,可列舉如,苯環、縮合多環式芳香族烴環[例如,縮合二環式烴環(例如,萘環等的C8-20 縮合二環式烴環,較佳為C10-16 縮合二環式烴環)、縮合三環式芳香族烴環(例如,蒽環、菲環等)等的縮合2至4環式芳香族烴環]等。芳香族烴環,以苯環或萘環為佳,以苯環為較佳。In the above formulas (c2), (c5), and (c6), the aromatic hydrocarbon rings include, for example, benzene rings, condensed polycyclic aromatic hydrocarbon rings [for example, condensed bicyclic hydrocarbon rings (for example, naphthalene rings] etc. C 8-20 condensed bicyclic hydrocarbon ring, preferably C 10-16 condensed bicyclic hydrocarbon ring), condensed tricyclic aromatic hydrocarbon ring (for example, anthracycline, phenanthrene ring, etc.) etc. to 4-ring aromatic hydrocarbon ring] and the like. The aromatic hydrocarbon ring is preferably a benzene ring or a naphthalene ring, more preferably a benzene ring.
上述式(c1)~(c6)中,鹵素原子,例如,氟原子、氯原子、溴原子,及碘原子等。In the above formulas (c1) to (c6), the halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
上述式(c1)~(c6)中,烷基,可列舉如,碳原子數為1以上、18以下之直鏈烷基(甲基、乙基、n-丙基、n-丁基、n-戊基、n-辛基、n-癸基、n-十二烷基、n-十四烷、n-十六烷基,及n-十八烷基等)、碳原子數為3以上、18以下之支鏈烷基(異丙基、異丁基、sec-丁基、tert-丁基、異戊基、新戊基、tert-戊基、異己基,及異十八烷基等),及碳原子數為3以上、18以下之環烷基(環丙基、環丁基、環戊基、環己基,及4-癸基環己基等)等。特別是上述式(c1)、(c2),及(c4)~(c6)中,可被鹵素原子取代的烷基,係指烷基及被鹵素原子取代的烷基之意。鹵素原子所取代的烷基,可列舉如,上述之直鏈烷基、支鏈烷基,或環烷基中的至少1個氫原子被鹵素原子取代而得之基(單氟甲基、二氟甲基、三氟甲基等)等。可被鹵素原子取代的烷基中,Rc1 、Rc2 、Rc9 ,或Rc10 ,以三氟甲基為特佳,Rc4 、Rc6 、Rc11 ,或Rc12 中,以甲基為特佳。In above-mentioned formula (c1)~(c6), alkyl group, can enumerate, for example, the straight-chain alkyl group (methyl, ethyl, n-propyl group, n-butyl group, n-butyl group, n -pentyl, n-octyl, n-decyl, n-dodecyl, n-tetradecyl, n-hexadecyl, and n-octadecyl, etc.), with 3 or more carbon atoms , Branched chain alkyl groups below 18 (isopropyl, isobutyl, sec-butyl, tert-butyl, isopentyl, neopentyl, tert-pentyl, isohexyl, and isostearyl, etc. ), and cycloalkyl groups with 3 to 18 carbon atoms (cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, and 4-decylcyclohexyl, etc.), etc. In particular, in the above-mentioned formulas (c1), (c2), and (c4)~(c6), the alkyl group that may be substituted by a halogen atom means an alkyl group and an alkyl group substituted by a halogen atom. The alkyl group substituted by a halogen atom includes, for example, a group in which at least one hydrogen atom in the above-mentioned linear alkyl group, branched chain alkyl group, or cycloalkyl group is replaced by a halogen atom (monofluoromethyl, difluoromethyl, Fluoromethyl, trifluoromethyl, etc.) etc. Among the alkyl groups that may be substituted by halogen atoms, trifluoromethyl is particularly preferred for R c1 , R c2 , R c9 , or R c10 , and methyl is preferred for R c4 , R c6 , R c11 , or R c12 Excellent.
上述式(c2)~(c6)中,烷氧基,可列舉如,碳原子數為1以上、18以下之直鏈或支鏈烷氧基(甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、異丁氧基、sec-丁氧基、tert-丁氧基、己氧基、癸氧基、十二烷氧基,及十八烷氧基等)等。In the above formulas (c2) to (c6), the alkoxy group can be, for example, a straight chain or branched chain alkoxy group (methoxy, ethoxy, propoxy, isopropoxy, butoxy, isobutoxy, sec-butoxy, tert-butoxy, hexyloxy, decyloxy, dodecyloxy, and octadecyloxy, etc.) etc.
上述式(c2)~(c6)中,烷羰基中之烷基,可列舉如,上述的碳原子數為1以上、18以下之直鏈烷基、碳原子數為3以上、18以下之支鏈烷基,或碳原子數為3以上、18以下之環烷基等;烷羰基,可列舉如,碳原子數為2以上、18以下之直鏈狀、支鏈狀或環狀之烷羰基(乙醯基、丙醯基、丁醯基、2-甲基丙醯基、庚醯基、2-甲基丁醯基、3-甲基丁醯基、辛醯、癸醯基、十二烷醯基、十八烷醯基、環戊醯基,及環己醯基等)等。In the above formulas (c2)~(c6), the alkyl group in the alkylcarbonyl group can include, for example, the above-mentioned straight-chain alkyl groups with 1 to 18 carbon atoms, branched alkyl groups with 3 or more carbon atoms and 18 or less carbon atoms. Alkaline alkyl group, or cycloalkyl group with 3 to 18 carbon atoms, etc.; alkylcarbonyl group, for example, linear, branched or cyclic alkylcarbonyl group with 2 to 18 carbon atoms (Acetyl, propionyl, butyryl, 2-methylpropionyl, heptyl, 2-methylbutyryl, 3-methylbutyryl, octyl, decyl, dodecyl, octadecyl Alkyl, cyclopentyl, and cyclohexyl, etc.) etc.
上述式(c3)~(c6)中,芳羰基,可列舉如,碳原子數為7以上、11以下之芳羰基(苯甲醯基及萘醯基等)等。In the above formulas (c3) to (c6), the arylcarbonyl group includes, for example, an arylcarbonyl group having 7 to 11 carbon atoms (benzoyl, naphthyl, etc.) and the like.
上述式(a2)~(a6)中,烷氧羰基,可列舉如,碳原子數為2以上、19以下之直鏈或支鏈烷氧羰基(甲氧羰基、乙氧羰基、丙氧羰基、異丙氧羰基、丁氧羰基、異丁氧羰基、sec-丁氧羰基、tert-丁氧羰基、辛氧羰基、十四烷氧羰基,及十八烷氧羰基等)等。In the above formulas (a2) to (a6), the alkoxycarbonyl group can be, for example, a straight-chain or branched alkoxycarbonyl group (methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, isopropoxycarbonyl, butoxycarbonyl, isobutoxycarbonyl, sec-butoxycarbonyl, tert-butoxycarbonyl, octyloxycarbonyl, tetradecyloxycarbonyl, and octadecyloxycarbonyl, etc.) etc.
上述式(c3)~(c6)中,芳氧羰基,可列舉如,碳原子數為7以上、11以下之芳氧羰基(苯氧羰基及萘氧羰基等)等。In the above formulas (c3) to (c6), the aryloxycarbonyl group includes, for example, an aryloxycarbonyl group having 7 to 11 carbon atoms (phenoxycarbonyl, naphthyloxycarbonyl, etc.) and the like.
上述式(c3)~(c6)中,芳基硫羰基,可列舉如,碳原子數為7以上、11以下之芳基硫羰基(苯硫羰基及萘氧基硫羰基等)等。In the above formulas (c3) to (c6), the arylthiocarbonyl group includes, for example, arylthiocarbonyl groups having 7 to 11 carbon atoms (phenylthiocarbonyl, naphthyloxythiocarbonyl, etc.) and the like.
上述式(c2)~(c6)中,醯氧基,可列舉如,碳原子數為2以上、19以下之直鏈或支鏈醯氧基(乙醯氧基、乙基羰氧基、丙基羰氧基、異丙基羰氧基、丁基羰氧基、異丁基羰氧基、sec-丁基羰氧基、tert-丁基羰氧基、辛基羰氧基、十四烷羰氧基,及十八烷羰氧基等)等。In the above formulas (c2)~(c6), the acyloxy group can be, for example, a straight chain or branched acyloxy group (acetyloxy, ethylcarbonyloxy, propaneoxy) with carbon atoms of 2 or more and 19 or less. ylcarbonyloxy, isopropylcarbonyloxy, butylcarbonyloxy, isobutylcarbonyloxy, sec-butylcarbonyloxy, tert-butylcarbonyloxy, octylcarbonyloxy, tetradecane carbonyloxy, and octadecylcarbonyloxy, etc.), etc.
上述式(c3)~(c6)中,芳硫基,可列舉如,碳原子數為6以上、20以下之芳硫基(苯硫基、2-甲基苯硫基、3-甲基苯硫基、4-甲基苯硫基、2-氯苯硫基、3-氯苯硫基、4-氯苯硫基、2-溴苯硫基、3-溴苯硫基、4-溴苯硫基、2-氟苯硫基、3-氟苯硫基、4-氟苯硫基、2-羥基苯硫基、4-羥基苯硫基、2-甲氧基苯硫基、4-甲氧基苯硫基、1-萘基硫、2-萘基硫、4-[4-(苯硫基)苯甲醯基]苯硫基、4-[4-(苯硫基)苯氧基]苯硫基、4-[4-(苯硫基)苯基]苯硫基、4-(苯硫基)苯硫基、4-苯甲醯基苯硫基、4-苯甲醯基-2-氯苯硫基、4-苯甲醯基-3-氯苯硫基、4-苯甲醯基-3-甲硫基苯硫基、4-苯甲醯基-2-甲硫基苯硫基、4-(4-甲硫基苯甲醯基)苯硫基、4-(2-甲硫基苯甲醯基)苯硫基、4-(p-甲基苯甲醯基)苯硫基、4-(p-乙基苯甲醯基)苯硫基4-(p-異丙基苯甲醯基)苯硫基,及4-(p-tert-丁基苯甲醯基)苯硫基等)等。In the above-mentioned formulas (c3)~(c6), the arylthio group can include, for example, an arylthio group (phenylthio, 2-methylphenylthio, 3-methylbenzene) having 6 or more and 20 or less carbon atoms. Thio, 4-methylphenylthio, 2-chlorophenylthio, 3-chlorophenylthio, 4-chlorophenylthio, 2-bromophenylthio, 3-bromophenylthio, 4-bromobenzene Thio, 2-fluorophenylthio, 3-fluorophenylthio, 4-fluorophenylthio, 2-hydroxyphenylthio, 4-hydroxyphenylthio, 2-methoxyphenylthio, 4-methyl Oxyphenylthio, 1-naphthylthio, 2-naphthylthio, 4-[4-(phenylthio)benzoyl]phenylthio, 4-[4-(phenylthio)phenoxy ]phenylthio, 4-[4-(phenylthio)phenyl]phenylthio, 4-(phenylthio)phenylthio, 4-benzoylphenylthio, 4-benzoyl- 2-Chlorophenylthio, 4-benzoyl-3-chlorophenylthio, 4-benzoyl-3-methylthiophenylthio, 4-benzoyl-2-methylthiophenyl Thio, 4-(4-methylthiobenzoyl)phenylthio, 4-(2-methylthiobenzoyl)phenylthio, 4-(p-methylthiobenzoyl)phenyl Thio, 4-(p-ethylbenzoyl)phenylthio, 4-(p-isopropylbenzoyl)phenylthio, and 4-(p-tert-butylbenzoyl) phenylthio, etc.), etc.
上述式(c2)~(c6)中,烷硫基,可列舉如,碳原子數為1以上、18以下之直鏈或支鏈烷硫基(甲硫基、乙硫基、丙硫基、異丙硫基、丁硫基、異丁硫基、sec-丁硫基、tert-丁硫基、戊硫基、異戊硫基、新戊硫基、tert-戊硫基、辛硫基、癸硫基、十二烷硫基,及異十八烷硫基等)等。In the above formulas (c2) to (c6), the alkylthio group can be, for example, a straight chain or branched chain alkylthio group (methylthio, ethylthio, propylthio, Isopropylthio, butylthio, isobutylthio, sec-butylthio, tert-butylthio, pentylthio, isopentylthio, neopentylthio, tert-pentylthio, octylthio, Decylthio, Dodecylthio, Isoctadecylthio, etc.) etc.
上述式(c3)~(c6)中,芳基,可列舉如,碳原子數為6以上、10以下之芳基(苯基、甲苯基、二甲苯基,及萘基等)等。In the above formulas (c3) to (c6), the aryl group includes, for example, an aryl group having 6 to 10 carbon atoms (phenyl, tolyl, xylyl, and naphthyl, etc.) and the like.
上述式(c2)中,脂肪族雜環基,可列舉如,碳原子數為2以上、20以下(較佳為4以上、20以下)脂肪族雜環基(吡咯啶、四氫呋喃基、四氫噻吩基、哌啶基、四氫吡喃基、四氫硫哌喃基、嗎啉基等)等。In the above formula (c2), the aliphatic heterocyclic group includes, for example, an aliphatic heterocyclic group (pyrrolidine, tetrahydrofuranyl, tetrahydro Thienyl, piperidinyl, tetrahydropyranyl, tetrahydrothiopyranyl, morpholinyl, etc.) and the like.
上述式(c3)~(c6)中,雜環基,可列舉如,碳原子數為4以上、20以下雜環基(噻吩基、呋喃基、硒吩基、哌喃基、吡咯基、噁唑基、噻唑基、吡啶基、嘧啶基、 吡基、吲哚基、苯併呋喃基、苯併噻吩基、喹啉基、異喹啉基、喹噁啉基、喹唑啉基、咔唑基、吖啶基、酚噻基、吩基、呫噸基、噻嗯基、啡噁基、啡噁噻、苯并2氫哌喃基、異苯并2氫哌喃基、二苯併噻吩基、氧葱酮、硫氧葱酮,及二苯併呋喃基等)等。In the above formulas (c3) to (c6), the heterocyclic group can be, for example, a heterocyclic group with a carbon number of 4 or more and 20 or less (thienyl, furyl, selenyl, pyranyl, pyrrolyl, oxa Azolyl, Thiazolyl, Pyridyl, Pyrimidinyl, Pyridine Base, indolyl, benzofuryl, benzothienyl, quinolinyl, isoquinolyl, quinoxalinyl, quinazolinyl, carbazolyl, acridyl, phenothiazyl base, phen Xanthenyl, Xanthenyl, Thienyl, Phenyloxanthyl base, phenanthione, benzo2hydropyranyl, isobenzo2hydropyranyl, dibenzothienyl, anthrone, thioxanthone, and dibenzofuryl, etc.) and the like.
上述式(c3)~(c6)中,芳氧基,可列舉如,碳原子數為6以上、10以下之芳氧基(苯氧基及萘氧基等)等。In the above formulas (c3) to (c6), the aryloxy group includes, for example, an aryloxy group having 6 to 10 carbon atoms (phenoxy, naphthyloxy, etc.).
上述式(c2)~(c6)中,烷基亞磺醯基,可列舉如,碳原子數為1以上、18以下之直鏈或支鏈亞磺醯基(甲基亞磺醯基、乙基亞磺醯基、丙基亞磺醯基、異丙基亞磺醯基、丁基亞磺醯基、異丁基亞磺醯基、sec-丁基亞磺醯基、tert-丁基亞磺醯基、戊基亞磺醯基、異戊基亞磺醯基、新戊基亞磺醯基、tert-戊基亞磺醯基、辛基亞磺醯基,及異十八烷基亞磺醯基等)等。In the above-mentioned formulas (c2) to (c6), the alkylsulfinyl group can be, for example, a straight chain or branched chain sulfinyl group (methylsulfinyl, ethyl sulfinyl, propylsulfinyl, isopropylsulfinyl, butylsulfinyl, isobutylsulfinyl, sec-butylsulfinyl, tert-butylsulfinyl Sulfonyl, pentylsulfinyl, isopentylsulfinyl, neopentylsulfinyl, tert-pentylsulfinyl, octylsulfinyl, and isostearylsulfinyl sulfonyl, etc.) etc.
上述式(c3)~(c6)中,芳基亞磺醯基,可列舉如,碳原子數為6以上、10以下之芳基亞磺醯基(苯基亞磺醯基、甲苯基亞磺醯基,及萘基亞磺醯基等)等。Among the above-mentioned formulas (c3) to (c6), the arylsulfinyl group includes, for example, an arylsulfinyl group (phenylsulfinyl, tolylsulfinyl) having 6 to 10 carbon atoms. Acyl, and naphthylsulfinyl, etc.) etc.
上述式(c2)~(c6)中,烷基磺醯基,可列舉如,碳原子數為1以上、18以下之直鏈或支鏈烷基磺醯基(甲基磺醯基、乙基磺醯基、丙基磺醯基、異丙基磺醯基、丁基磺醯基、異丁基磺醯基、sec-丁基磺醯基、tert-丁基磺醯基、戊基磺醯基、異戊基磺醯基、新戊基磺醯基、tert-戊基磺醯基、辛基磺醯基,及十八烷基磺醯基等)等。In the above-mentioned formulas (c2) to (c6), the alkylsulfonyl group can be, for example, a straight chain or branched chain alkylsulfonyl group (methylsulfonyl, ethyl, etc.) with a carbon number of 1 to 18. Sulfonyl, propylsulfonyl, isopropylsulfonyl, butylsulfonyl, isobutylsulfonyl, sec-butylsulfonyl, tert-butylsulfonyl, pentylsulfonyl group, isopentylsulfonyl, neopentylsulfonyl, tert-pentylsulfonyl, octylsulfonyl, and octadecylsulfonyl, etc.) etc.
上述式(c3)~(c6)中,芳基磺醯基,可列舉如,碳原子數為6以上、10以下之芳基磺醯基(苯基磺醯基、甲苯基磺醯基(甲苯磺醯基),及萘基磺醯基等)等。Among the above-mentioned formulas (c3) to (c6), the arylsulfonyl group can be enumerated, for example, an arylsulfonyl group (phenylsulfonyl, tolylsulfonyl (toluenesulfonyl) having a carbon number of 6 or more and 10 or less. sulfonyl), and naphthylsulfonyl, etc.) etc.
上述式(c2)~(c6)中,羥基(聚)伸烷氧基,可列舉如,HO(AO)q -(式中,AO獨立表示伸乙氧基及/或伸丙氧基;q表示1以上、5以下之整數)所表示的羥基(聚)伸烷氧基等。In the above formulas (c2)~(c6), the hydroxyl (poly) alkoxyl group can be exemplified, for example, HO(AO) q- (wherein, AO independently represents ethoxyl and/or propoxyl; q represents a hydroxy (poly)alkyleneoxy group represented by an integer of 1 to 5).
上述式(c2)~(c6)中,可被取代的胺基,可列舉如,胺基(-NH2 )及碳原子數為1以上、15以下之取代胺基(甲胺基、二甲胺基、乙胺基、甲乙胺基、二乙胺基、n-丙胺基、甲基-n-丙胺基、乙基-n-丙胺基、n-丙胺基、異丙胺基、異丙甲胺基、異丙乙胺基、二異丙胺基、苯胺基、二苯胺基、甲基苯胺基、乙基苯胺基、n-丙基苯胺基,及異丙基苯胺基等)等。In the above formulas (c2)~(c6), the amino group that can be substituted includes, for example, an amino group (-NH 2 ) and a substituted amino group with a carbon number of 1 to 15 (methylamino, dimethyl Amine, ethylamino, methylethylamino, diethylamino, n-propylamino, methyl-n-propylamino, ethyl-n-propylamino, n-propylamino, isopropylamino, isopropylmethylamine group, isopropylethylamino group, diisopropylamino group, anilino group, diphenylamino group, methylanilino group, ethylanilino group, n-propylanilino group, and isopropylanilino group, etc.) etc.).
上述式(c3)及(c4)中,伸烷基,可列舉如,碳原子數為1以上、18以下之直鏈或支鏈伸烷基(伸甲基、1,2-伸乙基、1,1-伸乙基、丙烷-1,3-二基、丙烷-1,2-二基、丙烷-1,1-二基、丙烷-2,2-二基、丁烷-1,4-二基、丁烷-1,3-二基、丁烷-1,2-二基、丁烷-1,1-二基、丁烷-2,2-二基、丁烷-2,3-二基、戊烷-1,5-二基、戊烷-1,4-二基、己烷-1,6-二基、庚烷-1,7-二基、辛烷-1,8-二基、2-乙基己烷-1,6-二基、壬烷-1,9-二基、癸烷-1,10-二基、十一烷-1,11-二基、十二烷-1,12-二基、十三烷-1,13-二基、十四烷-1,14-二基、十五烷-1,15-二基,及十六烷-1,16-二基等)等。In the above formulas (c3) and (c4), the alkylene group includes, for example, straight or branched chain alkylene groups (methylene, 1,2-ethylene, 1,1-ethylene, propane-1,3-diyl, propane-1,2-diyl, propane-1,1-diyl, propane-2,2-diyl, butane-1,4 -diyl, butane-1,3-diyl, butane-1,2-diyl, butane-1,1-diyl, butane-2,2-diyl, butane-2,3 -diyl, pentane-1,5-diyl, pentane-1,4-diyl, hexane-1,6-diyl, heptane-1,7-diyl, octane-1,8 -diyl, 2-ethylhexane-1,6-diyl, nonane-1,9-diyl, decane-1,10-diyl, undecane-1,11-diyl, deca Diadecane-1,12-diyl, tridecane-1,13-diyl, tetradecane-1,14-diyl, pentadecane-1,15-diyl, and hexadecane-1, 16-dibase, etc.) etc.
鋶鹽(Q),例如,可依下述方法合成。具體而言,例如,於下述式(c1-1)所表示的1-氟-2-甲基-4-硝基苯中,在氫氧化鉀等的鹼之存在下,與下述式(c1-2)所表示的化合物進行反應,而製得下述式(c1-3)所表示的硝基化合物,其次,於還原鐵之存在下進行還原,而製得下述式(c1-4)所表示的胺化合物。該胺化合物與MaNO2 (式中,Ma為金屬原子,例如,表示鈉原子等的鹼金屬原子)所表示的亞硝酸鹽(例如,亞硝酸鈉)進行反應,而製得重氮化合物,其次,將此重氮化合物與CuX’(式中,X’表示溴原子等的鹵素原子。以下相同)所表示的鹵化亞銅與HX’所表示的鹵化氫混合,進行反應而製得下述式(c1-5)所表示的鹵化物。由該鹵化物及鎂製造格任亞試劑,其次,於氯化三甲基矽烷之存在下,使該格任亞試劑與下述式(c1-6)所表示的亞磺醯化合物進行反應,而可製得下述式(c1-7)所表示的鋶鹽。又,該鋶鹽再與Mb+ X”- (式中,Mb+ 為金屬陽離子,例如,表示鉀離子等的鹼金屬陽離子,X”- 為X- 所表示的1價之陰離子(其中,鹵素陰離子除外))所表示的鹽進行反應,進行鹼交換結果,而可製得下述式(c1-8)所表示的鋶鹽。又,下述式(c1-2)~(c-8)中,Rc1 ~Rc3 及Ac1 ,與上述式(c1)為相同之內容。Calcite salt (Q), for example, can be synthesized by the following method. Specifically, for example, in 1-fluoro-2-methyl-4-nitrobenzene represented by the following formula (c1-1), in the presence of a base such as potassium hydroxide, the following formula ( The compound represented by c1-2) is reacted to obtain the nitro compound represented by the following formula (c1-3), and then reduced in the presence of reduced iron to obtain the following formula (c1-4 ) The amine compound represented by ). The amine compound is reacted with a nitrite (for example, sodium nitrite) represented by MaNO 2 (wherein, Ma is a metal atom, for example, an alkali metal atom such as a sodium atom) to obtain a diazo compound, and then , mix the cuprous halide represented by the diazo compound with CuX' (in the formula, X' represents a halogen atom such as a bromine atom, the same below) and the hydrogen halide represented by HX', and react to obtain the following formula: (c1-5) halides. The Grignard reagent is produced from the halide and magnesium, and then, in the presence of trimethylsilyl chloride, the Grignard reagent is reacted with a sulfinyl compound represented by the following formula (c1-6), On the other hand, a permeic salt represented by the following formula (c1-7) can be obtained. In addition, the permeium salt is combined with Mb + X" - (wherein, Mb + is a metal cation, for example, represents an alkali metal cation such as potassium ion, and X" -is a monovalent anion represented by X- (wherein, halogen The salt represented by the anion except)) is reacted, and as a result of base exchange, the permeic salt represented by the following formula (c1-8) can be obtained. In addition, in the following formulas (c1-2) to (c-8), R c1 to R c3 and A c1 have the same content as the above formula (c1).
<方法> <Method>
鋶鹽(Q)之陽離子部為式(c1)所表示的陽離子之具體例,例如以下之內容等。鋶鹽(Q)之陰離子部的具體例,例如上述X- 之說明所列舉之內容等、以往公知之內容等。含有上述式(c1)所表示的陽離子部之鋶鹽(Q),可依上述方法合成,配合必要時,可再經由鹼交換反應,使陽離子部與所期待的陰離子部組合,特別是與Rx1 c BY4-c - (式中,Rx1 表示氫原子中至少一部份被鹵素原子或拉電子基所取代的苯基,Y表示鹵素原子,c表示1以上、4以下之整數)所表示的陰離子之組合為佳。Specific examples of the cation portion of the cobaltium salt (Q) are the cations represented by the formula (c1), such as the following. Specific examples of the anion moiety of the cobaltium salt (Q) include those listed in the description of X- above, and conventionally known ones. The cation moiety (Q) containing the cation moiety represented by the above formula (c1) can be synthesized according to the above method, and if necessary, the cation moiety can be combined with the desired anion moiety through base exchange reaction, especially with R x1 c BY 4-c - (In the formula, R x1 represents a phenyl group in which at least a part of the hydrogen atom is replaced by a halogen atom or an electron-withdrawing group, Y represents a halogen atom, and c represents an integer between 1 and 4) A combination of the anions indicated is preferred.
上述較佳陽離子部之群中,又以下述式所表示的陽離子部為較佳。 Among the above-mentioned group of preferable cation moieties, the cation moieties represented by the following formula are more preferable.
其他的陽離子聚合起始劑(B2),可與上述之鋶鹽(Q),同時含有鋶鹽(Q)以外的其他的光陽離子聚合起始劑。 其他的陽離子聚合起始劑(B2)中,的鋶鹽(Q)之含量,並未有特別之限定,更典型而言,以70質量%以上為佳,以80質量%以上為較佳,以90質量%以上為特佳,以100質量%為最佳。Other cationic polymerization initiators (B2) may contain other photocationic polymerization initiators other than the above-mentioned columium salt (Q) at the same time. In other cationic polymerization initiators (B2), the content of the cobalt salt (Q) is not particularly limited, and more typically, it is preferably more than 70% by mass, preferably more than 80% by mass, More than 90% by mass is particularly preferred, and 100% by mass is most preferred.
光陽離子聚合起始劑(B2-2),與上述鋶鹽(Q)同時,可再含有前述鋶鹽(B1)及鋶鹽(Q)以外的光陽離子聚合起始劑。 前述鋶鹽(B1)及鋶鹽(Q)以外的光陽離子聚合起始劑,只要為以往作為陽離子聚合使用的各種陽離子聚合起始劑時,則未有特別之限制,皆可使用。 前述鋶鹽(B1)及鋶鹽(Q)以外的光陽離子聚合起始劑,如前所述般,以錪鹽或鋶鹽等的鎓鹽為佳,以鋶鹽(Q)以外的其他鋶鹽為較佳。The photocationic polymerization initiator (B2-2) may further contain photocationic polymerization initiators other than the above-mentioned perzium salt (B1) and percite salt (Q) together with the above-mentioned perzium salt (Q). The photocationic polymerization initiators other than the above-mentioned percited salt (B1) and percited salt (Q) are not particularly limited and can be used as long as they are various cationic polymerization initiators conventionally used for cationic polymerization. The photocationic polymerization initiators other than the above-mentioned permeic salt (B1) and permeic salt (Q), as mentioned above, are preferably onium salts such as permeic salt or permeic salt, and other permeic acid salts other than permeic salt (Q) are preferred. Salt is preferred.
以下,前述鋶鹽(B1)及鋶鹽(Q)以外的光陽離子聚合起始劑之鋶鹽,亦稱為「鋶鹽(Q’)」。 鋶鹽(Q’),可與鋶鹽(Q)為相同之內容,又,1價陰離子X- 以含有上述之Rx1 c BY4-c - 者為佳。Hereinafter, the percited salts of photocationic polymerization initiators other than the above-mentioned percited salts (B1) and percited salts (Q) are also referred to as "concited salts (Q')". The content of the permeic salt (Q') can be the same as that of the permeic salt (Q), and the monovalent anion X - preferably contains the above-mentioned R x1 c BY 4-c - .
具有Rx1 c BY4-c - 所表示的1價陰離子的鋶鹽(Q’),例如,下述式(c1’)所表示的鋶鹽等。A percited salt (Q') having a monovalent anion represented by R x1 c BY 4-c - , for example, a percited salt represented by the following formula (c1').
(式中,Rc1 、Rc2 、Rc3 、Ac1 、Rx1 、Y及c,係如上所述)。 (In the formula, R c1 , R c2 , R c3 , A c1 , R x1 , Y and c are as described above).
上述式(c1’)所表示的鋶鹽(Q’)之陽離子部之具體例,例如以下之內容等。Specific examples of the cation portion of the permeic acid salt (Q') represented by the above formula (c1') are as follows.
鋶鹽(Q’)之陽離子部的典型例示,又例如以下之內容等。 Typical examples of the cation part of the permeic acid salt (Q') are as follows.
硬化性組成物中,其他的陽離子聚合起始劑(B2)之含量,只要可使硬化性組成物良好地進行硬化時,並未有特別之限定。就容易使硬化性組成物良好地硬化之觀點,更典型而言為,其他的陽離子聚合起始劑(B2)之含量,相對於(B)陽離子聚合起始劑總量之(A)硬化性化合物100質量份,以0質量份以上、5質量份以下為佳,以0.01質量份以上、3質量份以下為較佳,以0.03質量份以上、2質量份以下為特佳。 又,其他的陽離子聚合起始劑(B2)之含量,相對於(B)陽離子聚合起始劑總量,以90質量%以下為佳,以70質量%以下為較佳,以50質量%以下為更佳,以30質量%以下為特佳。硬化性組成物中,不含有其他的陽離子聚合起始劑(B2)者亦佳。The content of other cationic polymerization initiators (B2) in the curable composition is not particularly limited as long as the curable composition can be cured favorably. From the viewpoint of making the hardening composition easy to harden well, more typically, the content of other cationic polymerization initiators (B2) is the amount of (A) hardening properties relative to the total amount of (B) cationic polymerization initiators. 100 parts by mass of the compound, preferably 0 to 5 parts by mass, more preferably 0.01 to 3 parts by mass, particularly preferably 0.03 to 2 parts by mass. Also, the content of other cationic polymerization initiators (B2) is preferably not more than 90% by mass, more preferably not more than 70% by mass, and not more than 50% by mass relative to the total amount of the cationic polymerization initiator (B). More preferably, it is especially preferably 30% by mass or less. It is also preferable that the curable composition does not contain other cationic polymerization initiators (B2).
<陰離子聚合起始劑> 陰離子聚合起始劑,可使用因光而引起的陰離子聚合起始劑,或因熱而引起的陰離子聚合起始劑皆可。 例如,前述之環氧化合物,與陰離子聚合起始劑同時添加於硬化性組成物時,可製得陰離子硬化型之硬化性組成物。 因光而引起的陰離子聚合起始劑,並未有特別限定者,例如,三苯基甲醇、苄胺甲酸酯及苯醯胺甲酸酯等的光活性之胺甲酸酯;O-胺甲醯基羥基醯胺、O-胺甲醯基肟、芳香族碸醯胺、α-內醯胺及N-(2-烯丙基亞乙基)醯胺等的醯胺與其他的醯胺;肟酯化合物、α-胺基苯乙酮、鈷錯合物等。該些之中,又以2-硝基苄基環己胺甲酸酯、三苯基甲醇、o-胺甲醯基羥基醯胺、o-胺甲醯基肟、[[(2,6-二硝基苄基)氧基]羰基]環己胺、雙[[(2-硝基苄基)氧基]羰基]己烷1,6-二胺、4-(甲硫基苯甲醯基)-1-甲基-1-嗎啉基乙烷、(4-嗎啉基苯甲醯基)-1-苄基-1-二甲胺基丙烷、N-(2-硝基苄氧羰基)吡咯啶、六胺鈷(III)三(三苯甲基硼酸鹽)、2-苄基-2-二甲胺基-1-(4-嗎啉基苯基)-丁酮等為較佳之例示。 上述以外的較佳例示,可列舉如,因光(及/或熱)之作用而分解,而形成咪唑化合物之化合物等。 因熱而引起的陰離子聚合起始劑,只要為以往使用的化合物時,則未有特別的限定皆可使用,例如,2-苄基-2-二甲胺基-1-(4-嗎啉苯基)-丁烷-1-酮以外,又如,胺-環氧加成物系熱陰離子聚合起始劑、胺-異氰酸酯系化合物所形成的熱鹼產生劑,或二氰二醯胺類、肼類,或芳香族二胺類等的陰離子聚合型硬化劑,或由不同種類的硬化劑所形成的複合系之陰離子聚合型硬化劑等。胺-環氧加成物系熱陰離子聚合起始劑,例如,「Ajicure-PN-23」,「Ajicure-PN-40」,Ajicure-PN-50」,「Ajicure-PN-H」(皆為Ajinomoto Fine-techno公司的商品名)、「Hardener-X-3661S」(A・C・R公司的商品名)、「Hardener-X-3670S」(A・C・R公司的商品名)、「Novacure-HX-3742」(旭化成公司的商品名)、「Novacure-HX-3721」(旭化成公司的商品名)等。又,胺-異氰酸酯系化合物所形成的熱鹼產生劑,例如,「Fujicure-FXE-1000」(富士化成公司的商品名)、「Fujicure-FXR-1030」(富士化成公司的商品名)等。又,2-苄基-2-二甲胺基-1-(4-嗎啉苯基)-丁烷-1-酮為具有可因光之作用而引起的陰離子聚合起始劑之機能。<Anionic polymerization initiator> As the anionic polymerization initiator, an anionic polymerization initiator induced by light or an anionic polymerization initiator induced by heat may be used. For example, when the aforementioned epoxy compound is added to the curable composition together with the anionic polymerization initiator, an anion-curable curable composition can be obtained. Anionic polymerization initiators caused by light are not particularly limited, for example, photoactive carbamates such as triphenyl carbinol, benzyl carbamate and benzamide carbamate; O-amine Amides such as formyl hydroxyamide, O-aminoformyl oxime, aromatic amide, α-lactam and N-(2-allylethylidene)amide and other amides ; Oxime ester compounds, α-aminoacetophenone, cobalt complexes, etc. Among these, 2-nitrobenzylcyclohexylcarbamate, triphenylmethanol, o-aminoformyl hydroxyamide, o-carbamoyl oxime, [[(2,6- Dinitrobenzyl)oxy]carbonyl]cyclohexylamine, bis[[(2-nitrobenzyl)oxy]carbonyl]hexane 1,6-diamine, 4-(methylthiobenzoyl )-1-methyl-1-morpholinoethane, (4-morpholinobenzoyl)-1-benzyl-1-dimethylaminopropane, N-(2-nitrobenzyloxycarbonyl ) pyrrolidine, hexaamine cobalt (III) tris(trityl borate), 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone, etc. are preferred instantiate. Desirable examples other than the above include, for example, compounds decomposed by the action of light (and/or heat) to form imidazole compounds. The anionic polymerization initiator caused by heat is not particularly limited as long as it is a conventionally used compound, for example, 2-benzyl-2-dimethylamino-1-(4-morpholine Other than phenyl)-butan-1-one, another example is amine-epoxy adduct-based thermal anionic polymerization initiator, amine-isocyanate-based compound formed thermal base generator, or dicyanodiamides , hydrazines, or anionic polymeric hardeners such as aromatic diamines, or composite anionic polymeric hardeners formed by different types of hardeners. Amine-epoxy adduct-based thermal anionic polymerization initiators, for example, "Ajicure-PN-23", "Ajicure-PN-40", Ajicure-PN-50", "Ajicure-PN-H" (all Ajinomoto Fine-techno company's product name), "Hardener-X-3661S" (A・C・R company's product name), "Hardener-X-3670S" (A・C・R company's product name), "Novacure -HX-3742" (trade name of Asahi Kasei Co., Ltd.), "Novacure-HX-3721" (trade name of Asahi Kasei Co., Ltd.) and the like. Moreover, the thermal base generator which consists of an amine-isocyanate type compound, for example, "Fujicure-FXE-1000" (trade name of Fuji Chemical Co., Ltd.), "Fujicure-FXR-1030" (trade name of Fuji Chemical Co., Ltd.) and the like. Also, 2-benzyl-2-dimethylamino-1-(4-morpholinephenyl)-butan-1-one functions as an anionic polymerization initiator that can be initiated by the action of light.
硬化性組成物中,陰離子聚合起始劑之含量,只要為未阻礙本發明目的之範圍,並未有特別之限定。硬化性組成物中,陰離子聚合起始劑之含量,相對於(A)硬化性化合物100質量份,以0.01質量份以上、5質量份以下為佳,以0.05質量份以上、3質量份以下為較佳,以0.1質量份以上、2質量份以下為特佳。The content of the anionic polymerization initiator in the curable composition is not particularly limited as long as it is within the range that does not hinder the object of the present invention. The content of the anionic polymerization initiator in the curable composition is preferably not less than 0.01 parts by mass and not more than 5 parts by mass, and preferably not less than 0.05 parts by mass and not more than 3 parts by mass relative to 100 parts by mass of the (A) curable compound. Preferably, 0.1 mass part or more and 2 mass parts or less are especially preferable.
<(C)熔點140℃以下之離子液體(以下,亦僅稱為「(C)離子液體」)> (C)離子液體,以可於140℃以下的溫度區域熔解之鹽,且於140℃以下為液體的安定之鹽為佳。 (C)離子液體之熔點,就更能確實達成本發明效果之觀點及塗佈性之觀點等,以120℃以下者為佳,以100℃以下為較佳,以80℃以下為更佳。 硬化性組成物含有(S)溶劑時,就更能確實達成本發明效果之觀點,及抑制塗佈性及異物之觀點等,相對於室溫(25℃)的該硬化性組成物中所含之(S)溶劑,(C)離子液體的溶解性以70質量%以上為佳,更佳為80質量%以上、特佳為90質量%以上。<(C) Ionic liquids with a melting point of 140°C or less (hereinafter, also referred to simply as "(C) ionic liquids")> (C) The ionic liquid is preferably a salt that melts in a temperature range below 140°C and is a stable salt that is liquid at a temperature below 140°C. (C) The melting point of the ionic liquid is preferably 120°C or lower, more preferably 100°C or lower, and more preferably 80°C or lower from the viewpoint of achieving the effects of the present invention more reliably and from the viewpoint of coatability. When the curable composition contains (S) solvent, the viewpoint of achieving the effect of the present invention more reliably, and the viewpoint of suppressing coatability and foreign matter, etc. The solubility of the (S) solvent and (C) ionic liquid is preferably at least 70% by mass, more preferably at least 80% by mass, and most preferably at least 90% by mass.
又,上述溶解性係指,相對於該硬化性組成物中所含的(S)溶劑100質量份,(C)離子液體以70質量份、80質量份或90質量份等混合,經振動機處理5分鐘時,以目視觀察確認是否產生沈澱之方式,未觀察出沈澱出現時的質量之意。 (C)離子液體為鹽類時,可具有優良的離子導電性,因於熔點140℃以下時為液體,故可均勻地於硬化性組成物中擴散。又,熱分解溫度亦較高。因此,於硬化性組成物中,對對陽離子聚合或陰離子聚合具有低依賴性、可促進均勻的硬化反應,其結果,可形成一具有優良的折射率及耐黃化性(特別是耐黃化性)、具有優良耐熱性,及對基板亦具有良好密著性的硬化物。In addition, the above-mentioned solubility means that 70 parts by mass, 80 parts by mass, or 90 parts by mass of the (C) ionic liquid is mixed with 100 parts by mass of the (S) solvent contained in the curable composition, and the mixture is mixed by a vibrating machine. When the treatment was performed for 5 minutes, the presence or absence of precipitation was confirmed by visual observation, but the quality at the time of precipitation was not observed. (C) When the ionic liquid is a salt, it can have excellent ion conductivity, and since it is a liquid at a melting point below 140° C., it can be uniformly diffused in the curable composition. In addition, the thermal decomposition temperature is also high. Therefore, in the curable composition, it has low dependence on cationic polymerization or anionic polymerization, and can promote uniform hardening reaction. properties), excellent heat resistance, and a hardened product that also has good adhesion to the substrate.
上述(C)離子液體,以由有機陽離子與陰離子所構成者為佳。 上述構成(C)離子液體的有機陽離子,就可更確實地達成本發明效果之觀點,以由烷鏈四級銨陽離子、哌啶鎓陽離子、嘧啶鎓陽離子、吡咯烷鎓鹽陽離子、咪唑鎓陽離子、吡啶鎓陽離子、吡唑鎓陽離子、胍鎓陽離子、鏻陽離子及鋶陽離子所成之群所選出之至少1種為佳,以烷鏈四級銨陽離子、哌啶鎓陽離子、咪唑鎓陽離子或鏻陽離子為較佳,就耐黃化性之觀點,以咪唑鎓陽離子或鏻陽離子為更佳。The above (C) ionic liquid is preferably composed of organic cations and anions. The above-mentioned organic cations constituting the (C) ionic liquid can more reliably achieve the effect of the present invention. From the viewpoint of alkyl chain quaternary ammonium cations, piperidinium cations, pyrimidinium cations, pyrrolidinium salt cations, imidazolium cations , pyridinium cations, pyrazolium cations, guanidinium cations, phosphonium cations, and perium cations are preferably at least one selected from the group consisting of alkyl chain quaternary ammonium cations, piperidinium cations, imidazolium cations or phosphonium A cation is preferred, and an imidazolium cation or a phosphonium cation is more preferred from the viewpoint of yellowing resistance.
上述烷鏈四級銨陽離子的具體例,可列舉如,下述式(L1)所表示的四級銨陽離子等,具體而言,可列舉如,四甲基銨、乙基三甲基銨、二乙基二甲基銨、三乙甲基銨、四乙基銨、辛基三甲基銨、己基三甲基銨、甲基三辛基銨等。 上述哌啶鎓陽離子的具體例,可列舉如,下述式(L2)所表示的哌啶鎓陽離子等,更具體而言,可列舉如,1-丙基哌啶鎓陽離子、1-戊基哌啶鎓陽離子、1,1-二甲基哌啶鎓陽離子、1-甲基-1-乙基哌啶鎓陽離子、1-甲基-1-丙基哌啶鎓陽離子、1-甲基-1-丁基哌啶鎓陽離子、1-甲基-1-戊基哌啶鎓陽離子、1-甲基-1-己基哌啶鎓陽離子、1-甲基-1-庚基哌啶鎓陽離子、1-乙基-1-丙基哌啶鎓陽離子、1-乙基-1-丁基哌啶鎓陽離子、1-乙基-1-戊基哌啶鎓陽離子、1-乙基-1-己基哌啶鎓陽離子、1-乙基-1-庚基哌啶鎓陽離子、1,1-二丙基哌啶鎓陽離子、1-丙基-1-丁基哌啶鎓陽離子、1,1-二丁基哌啶鎓陽離子等。 上述嘧啶鎓陽離子的具體例,可列舉如,1,3-二甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,2,3-三甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,2,3,4-四甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,2,3,5-四甲基-1,4,5,6-四氫嘧啶鎓陽離子、1,3-二甲基-1,4-二氫嘧啶鎓陽離子、1,3-二甲基-1,6-二氫嘧啶鎓陽離子、1,2,3-三甲基-1,4-二氫嘧啶鎓陽離子、1,2,3-三甲基-1,6-二氫嘧啶鎓陽離子、1,2,3,4-四甲基-1,4-二氫嘧啶鎓陽離子、1,2,3,4-四甲基-1,6-二氫嘧啶鎓陽離子等。Specific examples of the above-mentioned alkyl chain quaternary ammonium cations include, for example, quaternary ammonium cations represented by the following formula (L1), and specifically, tetramethylammonium, ethyltrimethylammonium, Diethyldimethylammonium, triethylmethylammonium, tetraethylammonium, octyltrimethylammonium, hexyltrimethylammonium, methyltrioctylammonium, etc. Specific examples of the above-mentioned piperidinium cations include, for example, piperidinium cations represented by the following formula (L2), and more specifically, 1-propylpiperidinium cations, 1-pentyl Piperidinium cation, 1,1-dimethylpiperidinium cation, 1-methyl-1-ethylpiperidinium cation, 1-methyl-1-propylpiperidinium cation, 1-methyl- 1-butylpiperidinium cation, 1-methyl-1-pentylpiperidinium cation, 1-methyl-1-hexylpiperidinium cation, 1-methyl-1-heptylpiperidinium cation, 1-Ethyl-1-propylpiperidinium cation, 1-ethyl-1-butylpiperidinium cation, 1-ethyl-1-pentylpiperidinium cation, 1-ethyl-1-hexyl Piperidinium cation, 1-ethyl-1-heptylpiperidinium cation, 1,1-dipropylpiperidinium cation, 1-propyl-1-butylpiperidinium cation, 1,1-di Butylpiperidinium cation, etc. Specific examples of the above-mentioned pyrimidinium cations include, for example, 1,3-dimethyl-1,4,5,6-tetrahydropyrimidinium cations, 1,2,3-trimethyl-1,4,5, 6-tetrahydropyrimidinium cation, 1,2,3,4-tetramethyl-1,4,5,6-tetrahydropyrimidinium cation, 1,2,3,5-tetramethyl-1,4, 5,6-tetrahydropyrimidinium cation, 1,3-dimethyl-1,4-dihydropyrimidinium cation, 1,3-dimethyl-1,6-dihydropyrimidinium cation, 1,2, 3-Trimethyl-1,4-dihydropyrimidinium cation, 1,2,3-trimethyl-1,6-dihydropyrimidinium cation, 1,2,3,4-tetramethyl-1, 4-dihydropyrimidinium cation, 1,2,3,4-tetramethyl-1,6-dihydropyrimidinium cation, and the like.
上述吡咯烷鎓鹽陽離子的具體例,可列舉如,下述式(L3)所表示的吡咯烷鎓鹽陽離子等,更具體而言,可列舉如,1,1-二甲基吡咯烷鎓鹽陽離子、1-乙基-1-甲基吡咯烷鎓鹽陽離子、1-甲基-1-丙基吡咯烷鎓鹽陽離子、1-甲基-1-丁基吡咯烷鎓鹽陽離子、1-甲基-1-戊基吡咯烷鎓鹽陽離子、1-甲基-1-己基吡咯烷鎓鹽陽離子、1-甲基-1-庚基吡咯烷鎓鹽陽離子、1-乙基-1-丙基吡咯烷鎓鹽陽離子、1-乙基-1-丁基吡咯烷鎓鹽陽離子、1-乙基-1-戊基吡咯烷鎓鹽陽離子、1-乙基-1-己基吡咯烷鎓鹽陽離子、1-乙基-1-庚基吡咯烷鎓鹽陽離子、1,1-二丙基吡咯烷鎓鹽陽離子、1-丙基-1-丁基吡咯烷鎓鹽陽離子、1,1-二丁基吡咯烷鎓鹽陽離子等。 上述咪唑鎓陽離子的具體例,可列舉如,下述式(L5)所表示的咪唑鎓陽離子等,更具體而言,可列舉如,1,3-二甲基咪唑鎓陽離子、1,3-二乙基咪唑鎓陽離子、1-乙基-3-甲基咪唑鎓陽離子、1-丙基-3-甲基咪唑鹽離子、1-丁基-3-甲基咪唑鎓陽離子、1-己基-3-甲基咪唑鎓陽離子、1-辛基-3-甲基咪唑鎓陽離子、1-癸基-3-甲基咪唑鎓陽離子、1-十二烷基-3-甲基咪唑鎓陽離子、1-十四烷-3-甲基咪唑鎓陽離子、1,2-二甲基-3-丙基咪唑鎓陽離子、1-乙基-2,3-二甲基咪唑鎓陽離子、1-丁基-2,3-二甲基咪唑鎓陽離子、1-己基-2,3-二甲基咪唑鎓陽離子等。 上述吡啶鎓陽離子的具體例,可列舉如,下述式(L6)所表示的吡啶鎓陽離子等,更具體而言,可列舉如,1-乙基吡啶鎓陽離子、1-丁基吡啶鎓陽離子、1-己基吡啶鎓陽離子、1-丁基-3-甲基吡啶鎓陽離子、1-丁基-4-甲基吡啶鎓陽離子、1-己基-3-甲基吡啶鎓陽離子、1-丁基-3,4-二甲基吡啶鎓陽離子等。Specific examples of the above-mentioned pyrrolidinium salt cation include, for example, pyrrolidinium salt cations represented by the following formula (L3), and more specifically, 1,1-dimethylpyrrolidinium salt Cation, 1-ethyl-1-methylpyrrolidinium salt cation, 1-methyl-1-propylpyrrolidinium salt cation, 1-methyl-1-butylpyrrolidinium salt cation, 1-methyl Base-1-pentylpyrrolidinium salt cation, 1-methyl-1-hexylpyrrolidinium salt cation, 1-methyl-1-heptylpyrrolidinium salt cation, 1-ethyl-1-propyl Pyrrolidinium salt cation, 1-ethyl-1-butylpyrrolidinium salt cation, 1-ethyl-1-pentylpyrrolidinium salt cation, 1-ethyl-1-hexylpyrrolidinium salt cation, 1-Ethyl-1-heptylpyrrolidinium salt cation, 1,1-dipropylpyrrolidinium salt cation, 1-propyl-1-butylpyrrolidinium salt cation, 1,1-dibutyl Pyrrolidinium salt cation, etc. Specific examples of the above-mentioned imidazolium cations include, for example, imidazolium cations represented by the following formula (L5), and more specifically, 1,3-dimethylimidazolium cations, 1,3- Diethylimidazolium cation, 1-ethyl-3-methylimidazolium cation, 1-propyl-3-methylimidazolium salt ion, 1-butyl-3-methylimidazolium cation, 1-hexyl- 3-methylimidazolium cation, 1-octyl-3-methylimidazolium cation, 1-decyl-3-methylimidazolium cation, 1-dodecyl-3-methylimidazolium cation, 1 -tetradecane-3-methylimidazolium cation, 1,2-dimethyl-3-propylimidazolium cation, 1-ethyl-2,3-dimethylimidazolium cation, 1-butyl- 2,3-dimethylimidazolium cation, 1-hexyl-2,3-dimethylimidazolium cation, and the like. Specific examples of the above-mentioned pyridinium cations include, for example, pyridinium cations represented by the following formula (L6), and more specifically, 1-ethylpyridinium cations, 1-butylpyridinium cations, etc. , 1-hexylpyridinium cation, 1-butyl-3-methylpyridinium cation, 1-butyl-4-methylpyridinium cation, 1-hexyl-3-methylpyridinium cation, 1-butyl -3,4-Dimethylpyridinium cation, etc.
上述吡唑鎓陽離子的具體例,可列舉如,1,3-二甲基-1,4,5,6-四氫吡唑鎓陽離子、1,2,3-三甲基-1,4,5,6-四氫吡唑鎓陽離子、1,2,3,4-四甲基-1,4,5,6-四氫吡唑鎓陽離子、1,2,3,5-四甲基-1,4,5,6-四氫吡唑鎓陽離子、1,3-二甲基-1,4-二氫吡唑鎓陽離子、1,3-二甲基-1,6-二氫吡唑鎓陽離子、1,2,3-三甲基-1,4-二氫吡唑鎓陽離子、1,2,3-三甲基-1,6-二氫吡唑鎓陽離子、1,2,3,4-四甲基-1,4-二氫吡唑鎓陽離子、1,2,3,4-四甲基-1,6-二氫吡唑鎓陽離子等。Specific examples of the aforementioned pyrazolium cation include, for example, 1,3-dimethyl-1,4,5,6-tetrahydropyrazolium cation, 1,2,3-trimethyl-1,4, 5,6-tetrahydropyrazolium cation, 1,2,3,4-tetramethyl-1,4,5,6-tetrahydropyrazolium cation, 1,2,3,5-tetramethyl- 1,4,5,6-tetrahydropyrazolium cation, 1,3-dimethyl-1,4-dihydropyrazolium cation, 1,3-dimethyl-1,6-dihydropyrazolium Onium cation, 1,2,3-trimethyl-1,4-dihydropyrazolium cation, 1,2,3-trimethyl-1,6-dihydropyrazolium cation, 1,2,3 , 4-tetramethyl-1,4-dihydropyrazolium cation, 1,2,3,4-tetramethyl-1,6-dihydropyrazolium cation, etc.
上述鏻陽離子的具體例,可列舉如,下述式(L4)所表示的鏻陽離子、四烷基鏻陽離子(例如,四丁基鏻離子、三丁基己基鏻離子等)等,上述鋶陽離子之具體例,例如,三乙鋶離子、二甲基乙鋶離子、三乙鋶離子、乙甲丙鋶離子、丁基二甲鋶離子、1‐甲基四氫噻吩鎓離子、1‐乙基四氫噻吩鎓離子、1-丙基四氫噻吩鎓離子、1-丁基四氫噻吩鎓離子,或1-甲基-[1,4]‐硫正氧離子等。其中,上述鋶陽離子,又以四氫噻吩鎓系或六氫硫吡喃鎓系等具有5員環或6員環等的環狀結構之鋶陽離子為佳,其環狀結構中,亦可具有氧原子等的雜原子。Specific examples of the above-mentioned phosphonium cations include, for example, phosphonium cations represented by the following formula (L4), tetraalkylphosphonium cations (for example, tetrabutylphosphonium ions, tributylhexylphosphonium ions, etc.), and the above-mentioned phosphonium cations Specific examples, for example, triacetoium ion, dimethylacetoium ion, triacetoium ion, ethylmethylcerium ion, butyldimethylacetoium ion, 1-methyltetrahydrothiophenium ion, 1-ethyl Tetrahydrothiophenium ion, 1-propyltetrahydrothiophenium ion, 1-butyltetrahydrothiophenium ion, or 1-methyl-[1,4]-sulfurium ion, etc. Among them, the above-mentioned percited cations are preferably tetrahydrothiophenium-based or hexahydrothiopyrylium-based percited cations having a ring structure such as a 5-membered ring or a 6-membered ring. In the ring structure, there may also be Heteroatoms such as oxygen atoms.
上述式(L1)~(L4)中,RL1 ~RL4 各自獨立為,碳原子數為1以上、20以下之烷基或RL7 -O-(CH2 )Ln -所表示的烷氧烷基(RL7 表示甲基或乙基;Ln表示1以上、4以下之整數)。上述式(L5)中,RL1 ~RL4 各自獨立為碳原子數為1以上、20以下之烷基或RL7 -O-(CH2 )Ln -所表示的烷氧烷基(RL7 表示甲基或乙基;Ln表示1以上、4以下之整數)或氫原子。通式(L6)中,RL1 ~RL6 各自獨立為碳原子數為1~20之烷基或 RL7 -O-(CH2 )Ln -所表示的烷氧烷基(RL7 表示甲基或乙基;Ln表示1~4之整數)或氫原子。 In the above formulas (L1) to (L4), R L1 to R L4 are each independently an alkyl group having 1 to 20 carbon atoms or an alkoxane represented by R L7 -O-(CH 2 ) Ln - group (R L7 represents a methyl group or an ethyl group; Ln represents an integer of 1 to 4). In the above formula (L5), R L1 to R L4 are each independently an alkyl group with 1 to 20 carbon atoms or an alkoxyalkyl group represented by R L7 -O-(CH 2 ) Ln - (R L7 represents Methyl or ethyl; Ln represents an integer of 1 to 4) or a hydrogen atom. In the general formula (L6), R L1 ~ R L6 are each independently an alkyl group with 1 to 20 carbon atoms or an alkoxyalkyl group represented by R L7 -O-(CH 2 ) Ln - (R L7 represents methyl or ethyl; Ln represents an integer of 1 to 4) or a hydrogen atom.
上述構成(C)離子液體的陰離子,可列舉如,有機陰離子、無機陰離子等,就可確實達成本發明效果之觀點,以有機陰離子為佳。 上述有機陰離子中,就可確實達成本發明效果之觀點,以由羧酸系陰離子、N-醯胺酸離子、酸性胺酸陰離子、中性胺酸陰離子、烷基硫酸系陰離子、含氟化合物系陰離子及酚系陰離子所成之群所選出之至少1種為佳,以羧酸系陰離子或N-醯胺酸離子為較佳。The above-mentioned anions constituting the (C) ionic liquid include, for example, organic anions, inorganic anions, etc., and organic anions are preferable in terms of achieving the effect of the present invention. Among the above-mentioned organic anions, from the viewpoint of achieving the effect of the present invention, the anions of carboxylic acid series, N-amido acid ion, acidic amino acid anion, neutral amino acid anion, alkylsulfuric acid series anion, fluorine-containing compound series At least one selected from the group consisting of anion and phenolic anion is preferred, and carboxylic acid anion or N-amido acid ion is more preferred.
上述羧酸系陰離子之具體例,例如,乙酸離子、癸酸離子、2-吡咯啶酮-5-羧酸離子、甲酸離子、α-硫辛酸離子、乳酸離子、酒石酸離子、馬尿酸離子、N-甲基馬尿酸離子等,其中,又以乙酸離子、2-吡咯啶酮-5-羧酸離子、甲酸離子、乳酸離子、酒石酸離子、馬尿酸離子、N-甲基馬尿酸離子為佳,以乙酸離子、N-甲基馬尿酸離子、甲酸離子為較佳。 上述N-醯胺酸離子之具體例,例如,N-苯甲醯基丙胺酸離子、N-乙醯苯基丙胺酸離子、天門冬酸離子、甘胺酸離子、N-乙醯基甘胺酸離子等,其中,又以N-苯甲醯基丙胺酸離子、N-乙醯苯基丙胺酸離子、N-乙醯基甘胺酸離子為佳,以N-乙醯基甘胺酸離子為較佳。Specific examples of the above-mentioned carboxylic acid-based anions include, for example, acetate ion, capric acid ion, 2-pyrrolidone-5-carboxylic acid ion, formic acid ion, α-lipoic acid ion, lactate ion, tartrate ion, hippurate ion, N -Methylhippuric acid ion, etc. Among them, acetate ion, 2-pyrrolidone-5-carboxylic acid ion, formic acid ion, lactate ion, tartrate ion, hippuric acid ion, N-methyl hippuric acid ion are preferred, Acetate ion, N-methylhippurate ion and formate ion are preferred. Specific examples of the above-mentioned N-amide ion, for example, N-benzoylalanine ion, N-acetylphenylalanine ion, aspartic acid ion, glycine ion, N-acetylglycine ion Acid ions, etc. Among them, N-benzoylalanine ion, N-acetylphenylalanine ion, N-acetylglycine ion are preferred, and N-acetylglycine ion is better.
上述酸性胺酸陰離子之具體例,例如,天門冬酸離子、麩醯胺酸離子等,上述中性胺酸陰離子之具體例,例如,甘胺酸離子、丙胺酸離子、苯基丙胺酸離子等。 上述烷基硫酸系陰離子之具體例,例如,甲烷磺酸離子等,上述含氟化合物系陰離子之具體例,例如,三氟甲烷磺酸離子、六氟膦酸離子、三氟三(五氟乙基)膦酸離子、雙(三氟甲烷磺醯基)醯亞胺離子、三氟乙酸離子、四氟硼酸離子等,上述酚系陰離子之具體例,例如,酚離子、2-甲氧酚離子、2,6-二-tert-丁酚離子等。Specific examples of the above-mentioned acidic amino acid anions include, for example, aspartic acid ion, glutamic acid ion, etc. Specific examples of the above-mentioned neutral amino acid anions include, for example, glycine ion, alanine ion, phenylalanine ion, etc. . Specific examples of the above-mentioned alkylsulfate-based anions include, for example, methanesulfonate ions, etc. Specific examples of the above-mentioned fluorine-containing compound-based anions include, for example, trifluoromethanesulfonate ions, hexafluorophosphonate ions, trifluorotris(pentafluoroethyl base) phosphonic acid ion, bis(trifluoromethanesulfonyl)imide ion, trifluoroacetic acid ion, tetrafluoroborate ion, etc., specific examples of the above-mentioned phenolic anions, for example, phenolic ion, 2-methoxyphenolic ion , 2,6-di-tert-butylphenol ion, etc.
上述無機陰離子中,就可確實達成本發明效果之觀點,以由F- 、Cl- 、Br- 、I- 、BF4 - 、PF6 - 及N(SO2 F)2 - 所成之群所選出之至少1種為佳,以BF4 - 、PF6 - 或N(SO2 F)2 - 為較佳,以BF4 - 或PF6 - 為更佳。Among the above-mentioned inorganic anions, the viewpoint that the effect of the present invention can be reliably achieved is formed by the group consisting of F - , Cl - , Br - , I - , BF 4 - , PF 6 - and N(SO 2 F) 2 - At least one selected is preferred, BF 4 - , PF 6 - or N(SO 2 F) 2 - is preferred, BF 4 - or PF 6 - is preferred.
上述(C)離子液體,例如,可依國際公開第2014/178254號的段落0045中所揭示之方法等而可製得。 上述(C)離子液體可單獨使用,或將2種以上混合使用皆可。 上述(C)離子液體之含量,只要可達成本發明效果時,並未有特別之限制,一般相對於硬化性化合物100質量份,以0.0001質量份以上、1質量份以下為佳,以0.001質量份以上、1質量份以下為較佳,以0.002質量份以上、0.1質量份以下為更佳,以0.003質量份以上、0.07質量份以下為特佳。The above-mentioned (C) ionic liquid can be prepared, for example, according to the method disclosed in paragraph 0045 of International Publication No. 2014/178254. The above (C) ionic liquids may be used alone or in combination of two or more. The content of the above-mentioned (C) ionic liquid is not particularly limited as long as the effect of the present invention can be achieved. Generally, relative to 100 parts by mass of the hardening compound, it is preferably 0.0001 mass part or more and 1 mass part or less, and 0.001 mass part It is preferably not less than 1 part by mass, more preferably not less than 0.002 part by mass and not more than 0.1 part by mass, and particularly preferably not less than 0.003 part by mass and not more than 0.07 part by mass.
<(D)硬化促進劑> 硬化性組成物中,可含有(D)硬化促進劑。硬化性組成物含有(D)硬化促進劑時,除可兼具折射率及耐黃化性兩者的同時,亦可提高硬化性組成物之硬化性,而形成具有特別良好的耐熱性(耐熱分解性),與對基板的密著性的硬化物。<(D) Hardening Accelerator> The curable composition may contain (D) a curing accelerator. When the curable composition contains (D) a hardening accelerator, in addition to having both refractive index and yellowing resistance, it can also improve the curability of the curable composition, and form a particularly good heat resistance (heat resistance Decomposability), hardened product with adhesion to the substrate.
(D)硬化促進劑,例如,脲化合物、三級胺及其鹽、咪唑類及其鹽、次膦(phosphine)系化合物與其衍生物、羧酸金屬鹽或路易士酸、布忍斯特(Brønsted)酸類及其鹽類、四苯基硼鹽等。(D) Hardening accelerators, for example, urea compounds, tertiary amines and their salts, imidazoles and their salts, phosphine compounds and their derivatives, carboxylic acid metal salts or Lewis acids, Brønsted ) acids and their salts, tetraphenyl boron salts, etc.
(D)硬化促進劑的較佳具體例,可列舉如,1,8-二氮雜二環(5,4,0)十一烯-7、三乙烯二胺、苄基二甲胺、三乙醇胺、二甲胺基乙醇,及三(二甲胺甲基)酚等的三級胺類;2-甲基咪唑、2-苯基咪唑、2-苯基-4-甲基咪唑,及2-十七烷基咪唑等的咪唑類;三丁基次膦、甲基二苯基次膦、三苯基次膦、二苯基次膦,及苯基次膦等的次膦系化合物;四苯基鏻四苯基硼酸鹽、三苯基次膦四苯基硼酸鹽、2-乙基-4-甲基咪唑四苯基硼酸鹽,及N-甲基嗎啉四苯基硼酸鹽之四苯基硼鹽等。(D) Preferred specific examples of hardening accelerators include, for example, 1,8-diazabicyclo(5,4,0)undecene-7, triethylenediamine, benzyldimethylamine, triethylenediamine, Ethanolamine, dimethylaminoethanol, and tertiary amines such as tris(dimethylaminomethyl)phenol; 2-methylimidazole, 2-phenylimidazole, 2-phenyl-4-methylimidazole, and 2 - imidazoles such as heptadecyl imidazole; tributylphosphine, methyldiphenylphosphine, triphenylphosphine, diphenylphosphine, and phenylphosphinate and other phosphine compounds; four Phenylphosphonium tetraphenyl borate, triphenylphosphine tetraphenyl borate, 2-ethyl-4-methylimidazolium tetraphenyl borate, and N-methylmorpholine tetraphenyl borate Phenyl boron salt, etc.
以上說明的(D)硬化促進劑中,又以次膦系化合物及其衍生物,及四苯基硼鹽為佳。上述之具體例中,又以三苯基次膦,與三苯基次膦三苯基硼烷為佳。Among the (D) hardening accelerators described above, phosphine compounds and their derivatives, and tetraphenyl boron salts are also preferable. Among the above specific examples, triphenylphosphine and triphenylphosphine triphenylborane are preferred.
(D)硬化促進劑的使用量,只要為未阻礙本發明目的之範圍,並未有特別之限定。一般(D)硬化促進劑之使用量,相對於(A)硬化性化合物100質量份,以0.01質量份以上、5質量份以下為佳,以0.05質量份以上、3質量份以下為較佳,以0.1質量份以上、2質量份以下為特佳。(D) The usage-amount of a hardening accelerator is not specifically limited as long as it is the range which does not hinder the object of this invention. Generally, the usage amount of (D) hardening accelerator is preferably 0.01 mass parts to 5 mass parts, more preferably 0.05 mass parts to 3 mass parts with respect to 100 mass parts of (A) hardening compound, It is particularly preferably at least 0.1 parts by mass and at most 2 parts by mass.
<(E)無機填料> 硬化性組成物中,可含有或不含有(E)無機填料皆可,就調整折射率之觀點,亦可含有(E)無機填料。硬化性組成物中的(A)硬化性化合物之含量較少時,或不含有(A)硬化性化合物時,硬化性組成物含有(E)無機填料時,可達到折射率1.60以上、2.20以下之範圍。 (E)無機填料,以金屬氧化物粒子為佳。 金屬氧化物粒子,可列舉如,由鋁、鋯、鈦酸酯、鋅、銦、錫、銻、鑭、鈰、釹、釓、鈥、鎦、鉿,及鉭所選出之至少一種的金屬氧化物粒子等。又以鋯、鈦酸酯或鈰的氧化物為較佳使用者,就可達高折射率化之觀點,特佳為鈦酸酯氧化物或鈰氧化物。該些金屬氧化物粒子之形狀,並未有特別之限定,其平均粒徑依動態散射法測定時,例如為200nm以下,又以50nm以下為佳,以20nm以下為較佳。下限值並未有特別之限定,例如為0.1nm以上,亦可為2nm以上。 (E)無機填料之含量,於去除硬化性組成物的溶劑後之成份中,例如為1質量%以上、120質量%以下,又以3質量%以上、110質量%以下為佳,以5質量%以上、100質量%以下為較佳。<(E) Inorganic filler> The curable composition may or may not contain the (E) inorganic filler, and may contain the (E) inorganic filler from the viewpoint of adjusting the refractive index. When the content of (A) curable compound in the curable composition is small, or when the curable composition does not contain (A) curable compound, when the curable composition contains (E) inorganic filler, the refractive index can reach 1.60 or more and 2.20 or less range. (E) Inorganic fillers are preferably metal oxide particles. The metal oxide particles include, for example, metal oxides of at least one selected from aluminum, zirconium, titanate, zinc, indium, tin, antimony, lanthanum, cerium, neodymium, gadolinium, lutetium, hafnium, and tantalum. particles etc. Zirconium, titanate, or cerium oxides are preferred, and titanate oxides or cerium oxides are particularly preferred from the viewpoint of achieving a high refractive index. The shape of these metal oxide particles is not particularly limited, and the average particle diameter is, for example, 200 nm or less, preferably 50 nm or less, more preferably 20 nm or less when measured by dynamic scattering method. The lower limit is not particularly limited, and may be, for example, 0.1 nm or more, or 2 nm or more. (E) The content of the inorganic filler is, for example, not less than 1% by mass and not more than 120% by mass, preferably not less than 3% by mass and not more than 110% by mass, and preferably not more than 5% by mass, in the component after removing the solvent of the curable composition. % or more and 100% by mass or less is preferable.
<(F)增感劑> 硬化性組成物中,亦可含有(F)增感劑。硬化性組成物中,(B)陽離子聚合起始劑含有鋶陽離子及/或錪陽離子時,硬化性組成物以含有(F)增感劑為佳。增感劑,只要為以往即與各種陽離子聚合起始劑併用的公知增感劑時,則未有特別之限制皆可使用。 增感劑之具體例,例如,蒽、9,10-二丁氧基蒽、9,10-二甲氧基蒽、9,10-二乙氧基蒽、2-乙基-9,10-二甲氧基蒽,及9,10-二丙氧基蒽等的蒽化合物;芘;1,2-苯併蒽;苝;並四苯;蔻(coronene);噻噸酮、2-甲基噻噸酮、2-乙基噻噸酮、2-氯噻噸酮、2-異丙基噻噸酮及2,4-二乙基噻噸酮等的噻噸酮化合物;啡噻(phenothiazine)、N-甲基啡噻、N-乙基啡噻,及N-苯基啡噻等的啡噻化合物;噻噸酮;1-萘酚、2-萘酚、1-甲氧基萘、2-甲氧基萘、1,4-二羥基萘,及4-甲氧基-1-萘酚等的萘化合物;二甲氧基苯乙酮、二乙氧基苯乙酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、4’-異丙基-2-羥基-2-甲基丙醯苯,及4-苯甲醯基-4’-甲基二苯基硫醚等的酮;N-苯基咔唑、N-乙基咔唑、聚-N-乙烯咔唑,及N-縮水甘油咔唑等的咔唑化合物;1,4-二甲氧基1,2-苯併菲及1,4-二-α-甲基苄氧基1,2-苯併菲等的1,2-苯併菲化合物;9-羥基菲、9-甲氧基菲、9-羥基-10-甲氧基菲,及9-羥基-10-乙氧基菲等的菲化合物等。 該些的增感劑,亦可將2種以上組合使用。<(F) sensitizer> The curable composition may contain (F) sensitizer. In the curable composition, when the (B) cationic polymerization initiator contains perium cation and/or odonium cation, the curable composition preferably contains (F) sensitizer. The sensitizer can be used without particular limitation as long as it is a conventionally known sensitizer used in combination with various cationic polymerization initiators. Specific examples of sensitizers, for example, anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxyanthracene, 9,10-diethoxyanthracene, 2-ethyl-9,10- Anthracene compounds such as dimethoxyanthracene and 9,10-dipropoxyanthracene; pyrene; 1,2-benzanthracene; perylene; naphthacene; coronene; thioxanthone, 2-methyl Thioxanthone compounds such as thioxanthone, 2-ethylthioxanthone, 2-chlorothioxanthone, 2-isopropylthioxanthone and 2,4-diethylthioxanthone; (phenothiazine), N-methylphenothiazine , N-Ethyl phenanthrene , and N-phenylphenanthidine phenanthrene Compounds; thioxanthone; 1-naphthol, 2-naphthol, 1-methoxynaphthalene, 2-methoxynaphthalene, 1,4-dihydroxynaphthalene, and 4-methoxy-1-naphthol, etc. Naphthalene compounds; dimethoxyacetophenone, diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 4'-isopropyl-2-hydroxy- 2-methylacrylbenzene, and ketones such as 4-benzoyl-4'-methyldiphenylsulfide; N-phenylcarbazole, N-ethylcarbazole, poly-N-vinylcarbazole azoles, and carbazole compounds such as N-glycidyl carbazole; 1,4-dimethoxy 1,2-triphenylene and 1,4-di-α-methylbenzyloxy 1,2-benzo 1,2-triphenylene compounds such as phenanthrene; wait. These sensitizers may be used in combination of two or more.
(F)增感劑之使用量,並未有特別之限定,一般相對於(B)陽離子聚合起始劑之質量,以1質量%以上、300質量%以下為佳,以5質量%以上、200質量%以下為較佳。使用該範圍內之量的(F)增感劑時,可容易達到所期待的增感作用。(F) The usage amount of the sensitizer is not particularly limited. Generally, relative to the mass of (B) cationic polymerization initiator, it is preferably at least 1% by mass and not more than 300% by mass, and it is preferably at least 5% by mass and at least 300% by mass. It is preferably 200% by mass or less. When the (F) sensitizer is used in an amount within this range, desired sensitization can be easily achieved.
<(G)抗氧化劑> 硬化性組成物,可含有或不含有(G)抗氧化劑皆可,就耐黃化性之觀點,以含有(G)抗氧化劑為佳。 (G)抗氧化劑,可列舉如,酚化合物、亞磷酸酯化合物、硫醚化合物等,以分子量500以上的酚化合物、分子量500以上的亞磷酸酯化合物或分子量500以上的硫醚化合物為較佳。又,(G)抗氧化劑,以酚化合物為佳,以分子量500以上的酚化合物為較佳。<(G)Antioxidant> The curable composition may or may not contain (G) antioxidant, but it is preferable to contain (G) antioxidant from the viewpoint of anti-yellowing property. (G) Antioxidants, such as phenolic compounds, phosphite compounds, thioether compounds, etc., preferably phenolic compounds with a molecular weight of 500 or more, phosphite compounds with a molecular weight of 500 or more, or sulfide compounds with a molecular weight of 500 or more . Also, (G) antioxidant is preferably a phenolic compound, preferably a phenolic compound with a molecular weight of 500 or more.
酚化合物,可使用已知被使用作為酚系抗著色劑的任意酚化合物。較佳的酚化合物,可列舉如,受阻酚(hindered phenol)化合物等。特別是以酚性羥基鄰接的部位(鄰位)尚具有取代基之化合物為佳。前述取代基,例如,以碳原子數1~22之經取代或無取代之烷基為佳,以甲基、乙基、丙基、異丙基、丁基、異丁基、t-丁基、戊基、異戊基、t-戊基、己基、辛基、異辛基、2-乙基己基為較佳。又,同一分子內具有酚基與亞磷酸酯基之化合物亦佳。As the phenolic compound, any phenolic compound known to be used as a phenolic anti-staining agent can be used. Preferable phenol compounds include, for example, hindered phenol compounds and the like. In particular, a compound having a substituent at the position adjacent to the phenolic hydroxyl group (ortho position) is preferable. The aforementioned substituents, for example, are preferably substituted or unsubstituted alkyl groups with 1 to 22 carbon atoms, such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, t-butyl , pentyl, isopentyl, t-pentyl, hexyl, octyl, isooctyl, and 2-ethylhexyl are preferred. Also, a compound having a phenol group and a phosphite group in the same molecule is also preferable.
亞磷酸酯化合物,例如,由三[2-[[2,4,8,10-四(1,1-二甲基乙基)二苯併[d,f][1,3,2]二氧雜磷環庚烷(Dioxaphosphepin)-6-基]氧基]乙基]胺、三[2-[(4,6,9,11-四-tert-丁基二苯併[d,f][1,3,2]二氧雜磷環庚烷-2-基)氧基]乙基]胺,及亞磷酸乙基雙(2,4-二tert-丁基-6-甲苯基)所成群組中所選出之至少1種化合物等。Phosphite compounds, for example, from tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]di Dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f] [1,3,2]dioxaphosphoheptan-2-yl)oxy]ethyl]amine, and ethyl phosphite bis(2,4-ditert-butyl-6-methylphenyl) At least one compound selected from the group, etc.
(G)抗氧化劑,可由市售品中容易取得,例如,AdekaSTUB AO-20、AdekaSTUB AO-30、AdekaSTUB AO-40、AdekaSTUB AO-50、AdekaSTUB AO-50F、AdekaSTUB AO-60、AdekaSTUB AO-60G、AdekaSTUB AO-80、AdekaSTUB AO-330、AdekaSTUB PEP-36A、AdekaSTUB AO-412S((股)Adeka)等。(G) Antioxidant, which can be easily obtained from commercially available products, for example, AdekaSTUB AO-20, AdekaSTUB AO-30, AdekaSTUB AO-40, AdekaSTUB AO-50, AdekaSTUB AO-50F, AdekaSTUB AO-60, AdekaSTUB AO-60G , AdekaSTUB AO-80, AdekaSTUB AO-330, AdekaSTUB PEP-36A, AdekaSTUB AO-412S ((stock) Adeka), etc.
(G)抗氧化劑之含量,於去除硬化性組成物的溶劑後之成份中,以0.01質量%以上、20質量%以下為佳,以0.3質量%以上、15質量%以下為較佳。抗著色劑,可僅使用1種亦可、2種類以上亦可。為2種類以上時,其合計量以於上述範圍內者為佳。(G) The content of the antioxidant is preferably at least 0.01% by mass and not more than 20% by mass, more preferably at least 0.3% by mass and not more than 15% by mass, in the curable composition after removing the solvent. As the anti-staining agent, only one type may be used, or two or more types may be used. When there are two or more types, the total amount is preferably within the above-mentioned range.
<其他成份> 硬化性組成物中,必要時,可含有界面活性劑、熱聚合阻礙劑、消泡劑、矽烷耦合劑、著色劑(顏料、染料)、樹脂(熱塑性樹脂、鹼可溶性樹脂等)、有機填料等的添加劑。任一添加劑皆可使用以往公知之成份。界面活性劑,可列舉如,陰離子系、陽離子系、非離子系等的化合物等,熱聚合阻礙劑,可列舉如,氫醌、氫醌單乙醚等,消泡劑,可列舉如,聚矽氧系、氟系化合物等。<Other ingredients> The curable composition may contain surfactants, thermal polymerization inhibitors, defoamers, silane coupling agents, colorants (pigments, dyes), resins (thermoplastic resins, alkali-soluble resins, etc.), organic fillers, etc., if necessary additives. Any of the additives can use conventionally known components. Surfactant, for example, anionic, cationic, nonionic compounds, etc., thermal polymerization inhibitor, for example, hydroquinone, hydroquinone monoethyl ether, etc., antifoaming agent, for example, polysiloxane Oxygen-based, fluorine-based compounds, etc.
以上說明的含有必須或任意成份之硬化性組成物,可形成具有優良折射率及耐黃化性的硬化物,又,具有良好的耐熱性(耐熱分解性)及對基板的密著性,而可適用於各種用途。 硬化性組成物,特別適合使用於形成觸控面板等的顯示元件中的被覆金屬配線等的透明被膜。又,使用前述硬化性組成物時,容易形成不易被水蒸氣等的氣體穿透,也不易引起因長時間曝光所引起的黃化之硬化膜。因此,前述硬化性組成物,於具備有OLED之裝置,特別是OLED照明中,亦適合使用作為形成以保護、絕緣等目的所設置的被膜。The curable composition containing essential or optional components described above can form a cured product with excellent refractive index and yellowing resistance, and also has good heat resistance (resistance to thermal decomposition) and adhesion to the substrate, and Suitable for various purposes. The curable composition is particularly suitably used to form a transparent film covering metal wiring or the like in a display element such as a touch panel. Also, when the aforementioned curable composition is used, it is easy to form a cured film that is less likely to be penetrated by gases such as water vapor and less likely to cause yellowing due to long-term exposure. Therefore, the above-mentioned curable composition is also suitable for use as a film formed for the purpose of protection, insulation, etc. in devices equipped with OLEDs, especially in OLED lighting.
<(S)溶劑> 硬化性組成物,就調整塗佈性或黏度等之目的,以含有(S)溶劑為佳。(S)溶劑,更典型而言,為使用有機溶劑。有機溶劑之種類,只要可均勻溶解或分散硬化性組成物所含的成份者時,則未有特別之限定。<(S)Solvent> The curable composition preferably contains (S) solvent for the purpose of adjusting coatability or viscosity. (S) As a solvent, more typically, an organic solvent is used. The type of organic solvent is not particularly limited as long as it can uniformly dissolve or disperse the components contained in the curable composition.
作為(S)溶劑使用的有機溶劑之較佳例示,可列舉如,乙二醇單甲醚、乙二醇單乙醚、乙二醇-n-丙醚、乙二醇單-n-丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單-n-丙醚、二乙二醇單-n-丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單-n-丙醚、丙二醇單-n-丁醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單-n-丙醚、二丙二醇單-n-丁醚、三丙二醇單甲醚、三丙二醇單乙醚等的(聚)二醇單烷醚類;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、丙二醇單甲醚乙酸酯、丙二醇單乙醚乙酸酯等的(聚)二醇單烷醚乙酸酯類;二乙二醇二甲醚、二乙二醇甲基乙醚、二乙二醇二乙醚、四氫呋喃等的其他的醚類;甲乙酮、環己酮、2-庚酮、3-庚酮等的酮類;2-羥基丙酸甲基、2-羥基丙酸乙基等的乳酸烷酯類;2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸乙酯、2-羥基-3-甲基部碳酸甲酯、3-甲基-3-甲氧基丁基乙酸酯、3-甲基-3-甲氧基丁基丙酸酯、乙酸乙酯、乙酸n-丙酯、乙酸異丙酯、乙酸n-丁酯、乙酸異丁酯、甲酸n-戊酯、乙酸異戊酯、丙酸n-丁酯、丁酸乙酯、丁酸n-丙酯、丁酸異丙酯、丁酸n-丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸n-丙酯、乙醯乙酸甲酯、乙醯乙酸乙酯、2-氧雜丁酸乙基等的其他的酯類;甲苯、二甲苯等的芳香族烴類;N-甲基吡咯啶酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等的醯胺類等。該些有機溶劑,可單獨或將2種以上組合使用皆可。Preferred examples of organic solvents used as the (S) solvent include, for example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol-n-propyl ether, ethylene glycol mono-n-butyl ether, Diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol mono Ethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether, dipropylene glycol mono -(poly)glycol monoalkyl ethers such as n-butyl ether, tripropylene glycol monomethyl ether, tripropylene glycol monoethyl ether; ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol (poly)glycol monoalkyl ether acetates such as alcohol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate; diethylene glycol Other ethers such as dimethyl ether, diethylene glycol methyl ether, diethylene glycol diethyl ether, tetrahydrofuran, etc.; ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc.; 2-hydroxy Lactate alkyl esters such as methyl propionate and ethyl 2-hydroxypropionate; ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate Ester, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl glycolate, methyl 2-hydroxy-3-methyl carbonate, 3-methyl Base-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, Isobutyl acetate, n-pentyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, pyruvic acid Other esters such as methyl ester, ethyl pyruvate, n-propyl pyruvate, methyl acetoacetate, ethyl acetoacetate, and ethyl 2-oxabutyrate; aromatics such as toluene and xylene Hydrocarbons; Amides such as N-methylpyrrolidone, N,N-dimethylformamide, N,N-dimethylacetamide, etc. These organic solvents may be used alone or in combination of two or more.
硬化性組成物中,(S)溶劑之使用量,並未有特別之限定。就硬化性組成物之塗佈性等觀點,(S)溶劑之使用量,相對於硬化性組成物全體,例如為30質量%以上、99.9質量%以下,較佳為50質量%以上、98質量%以下。In the curable composition, the amount of (S) solvent used is not particularly limited. From the viewpoint of the coatability of the curable composition, etc., the amount of the (S) solvent used is, for example, 30 mass % or more and 99.9 mass % or less, preferably 50 mass % or more and 98 mass % with respect to the entire curable composition. %the following.
<硬化膜> 以上說明之由硬化性組成物經硬化後的硬化物所形成的硬化膜,具有優良的折射率及耐黃化性,又,亦具有優良的耐熱性及對基板的密著性。 硬化膜的厚度,並未有特別之限制,一般以10nm以上、50μm以下為佳,以50nm以上、30μm以下為較佳,以100nm以上、10μm以下為更佳,以300nm以上、5μm以下為特佳。 該硬化膜,例如,極適合使用於OLED顯示元件用密封材料、OLED照明、硬塗覆、絕緣膜、抗反射膜、層間絕緣膜、碳硬遮罩、顯示器面板材料(平坦化膜、濾色器之畫素、有機EL用隔壁、間隔器)、光學構件(透鏡、顯微鏡、晶圓等級透鏡、光纖維、光導波路、稜鏡薄片、全相圖、高折射薄膜、復歸反射薄膜)等的各種用途。又,硬化膜具有優良柔軟性而不易龜裂,故適合使用於可撓式顯示面板或可撓式照明中。 又,硬化膜,於觸控面板等的顯示元件中,特別適合使用作為被覆金屬配線等的透明被膜。<Cured film> The cured film formed from the cured product of the curable composition described above has excellent refractive index and yellowing resistance, and also has excellent heat resistance and adhesion to the substrate. The thickness of the cured film is not particularly limited. Generally, it is better to be above 10nm and below 50μm; good. The cured film is, for example, very suitable for use in sealing materials for OLED display elements, OLED lighting, hard coating, insulating films, antireflection films, interlayer insulating films, carbon hard masks, display panel materials (planarizing films, color filters, etc.) Pixels of devices, partitions for organic EL, spacers), optical components (lenses, microscopes, wafer-level lenses, optical fibers, optical waveguides, thin films, full-phase diagrams, high-refractive films, retro-reflective films), etc. Various uses. Moreover, the cured film has excellent flexibility and is not easy to crack, so it is suitable for use in flexible display panels or flexible lighting. Moreover, a cured film is used especially suitably as a transparent coating film which covers metal wiring etc. in display elements, such as a touch panel.
≪硬化性組成物之製造方法≫ 將以上說明的各成份,依特定比例均勻混合後,即可製得硬化性組成物。製造硬化性組成物所使用的混合裝置,可列舉如,二本輥或三本輥等。硬化性組成物的黏度極低時,必要時,為去除不溶性異物等目的,亦可使用具有所期待之尺寸開口的過濾器過濾硬化性組成物。≪Manufacturing method of curable composition≫ The curable composition can be prepared by uniformly mixing the ingredients described above in a specific ratio. As a mixing device used for producing the curable composition, for example, a Nihon roll or a Sanhon roll, etc. are mentioned. When the viscosity of the hardening composition is extremely low, if necessary, for the purpose of removing insoluble foreign matter, etc., the hardening composition can also be filtered using a filter having openings of a desired size.
≪硬化物之製造方法≫ 硬化物之製造方法,只要可將硬化性組成物硬化成型為所期待形狀的方法時,並未有特別之限定。 硬化方法,只要為可使硬化性組成物硬化之方法時,並未有特別之限定,例如包含曝光及/或加熱,又以包含曝光者為佳。≪Manufacturing method of hardened product≫ The method for producing the cured product is not particularly limited as long as it can cure and mold the curable composition into a desired shape. The curing method is not particularly limited as long as it is a method capable of curing the curable composition, and includes, for example, exposure and/or heating, preferably including exposure.
成型體的形狀,並未有特別之限定,一般就可使熱能均勻地施加於成型體,或使曝光光線均勻地照射成型體等觀點,而以膜(薄膜)為佳。The shape of the molded body is not particularly limited, and it is generally possible to uniformly apply heat to the molded body, or to uniformly irradiate the molded body with exposure light, and a film (thin film) is preferred.
由硬化物製造硬化膜之方法的典型例,將於以下說明。 首先,於玻璃基板等的基板上,塗佈硬化性組成物而形成塗佈膜。塗佈方法,例如可使用輥式塗佈、反向塗佈器(reverse coater)、棒狀塗佈機等的接觸轉印型塗佈裝置,或旋轉塗佈器(迴轉式塗佈裝置)、縫狀塗佈器、簾流式塗佈機等的非接觸型塗佈裝置等方法等。 又,亦可將硬化性組成物的黏度調整至適當範圍後,再使用噴墨法、網版印刷法等的印刷法,塗佈硬化性組成物,而依所期待的形狀經圖型形成(Patterning)而得之塗佈膜。A typical example of the method of producing a cured film from a cured product will be described below. First, a curable composition is applied on a substrate such as a glass substrate to form a coating film. Coating method, for example, a contact transfer type coating device such as a roll coating, a reverse coater (reverse coater), a rod coater, or a spin coater (rotary coating device), Methods such as non-contact coating devices such as slot coaters and curtain coaters. Also, after adjusting the viscosity of the curable composition to an appropriate range, the curable composition can be applied by printing methods such as inkjet method and screen printing method, and then patterned according to the desired shape ( Patterning) obtained coating film.
其次,必要時,可將(S)溶劑等的揮發成份去除,使塗佈膜乾燥。乾燥方法,並未有特別之限定,例如,可使用真空乾燥裝置(VCD)於室溫下進行減壓乾燥,隨後,使用加熱板,於80℃以上、120℃以下,較佳為90℃以上、100℃以下之溫度,進行60秒以上、120秒以下時間範圍內的乾燥之方法等。 依此方式形成塗佈膜之後,對塗佈膜施以曝光及加熱中之至少一者。 曝光,為進行照射準分子雷射光等的活性能量線。所照射的能量線量,依硬化性組成物之組成等而有不同,一般例如,以30mJ/cm2 以上、2000mJ/cm2 以下為佳,以50mJ/cm2 以上、500mJ/cm2 以下為較佳。 進行加熱之際的溫度,並未有特別之限定,又以180℃以上、280℃以下為佳,以200℃以上、260℃以下為較佳,以220℃以上、250℃以下為特佳。加熱時間,更典型而言,以1分以上、60分鐘以下為佳,以10分鐘以上、50分鐘以下為較佳,以20分鐘以上、40分鐘以下為特佳。Next, if necessary, volatile components such as the (S) solvent may be removed, and the coating film may be dried. The drying method is not particularly limited. For example, a vacuum drying device (VCD) can be used to dry under reduced pressure at room temperature, and then, using a heating plate, the temperature is above 80°C and below 120°C, preferably above 90°C. , The method of drying at a temperature of 100°C or less within a time range of 60 seconds or more and 120 seconds or less, etc. After the coating film is formed in this way, at least one of exposure and heating is applied to the coating film. Exposure is to irradiate active energy rays such as excimer laser light. The amount of energy ray to be irradiated varies depending on the composition of the curable composition. Generally, for example, it is better to be above 30mJ/cm 2 and below 2000mJ/cm 2 , and to be above 50mJ/cm 2 and below 500mJ/cm 2 . good. The heating temperature is not particularly limited, but it is preferably 180°C to 280°C, more preferably 200°C to 260°C, and particularly preferably 220°C to 250°C. More typically, the heating time is preferably from 1 minute to 60 minutes, preferably from 10 minutes to 50 minutes, and particularly preferably from 20 minutes to 40 minutes.
依以上方式所形成的硬化物,特別是硬化膜,皆適用於上述各種之用途。The cured product formed in the above manner, especially the cured film, is suitable for the various purposes mentioned above.
[實施例][Example]
以下,將使用實施例對本發明施以具體的說明,但本發明之範圍並不受該些實施例所限定。Hereinafter, the present invention will be specifically described using examples, but the scope of the present invention is not limited by these examples.
[實施例1~17及比較例1~3] 實施例及比較例中,(A)硬化性化合物((A)成份),為使用下述式所表示的化合物A1~A3。 EXAMPLES 1-17 AND COMPARATIVE EXAMPLES 1-3 In an Example and a comparative example, (A) curable compound ((A) component) used the compound A1-A3 represented by the following formula.
實施例及比較例中,(B)陽離子聚合起始劑((B)成份),為使用下述式所表示的化合物B1及B2。 In Examples and Comparative Examples, compounds B1 and B2 represented by the following formulas were used as (B) cationic polymerization initiator ((B) component).
實施例中,(C)離子液體((C)成份)為使用下述C1~C5。 C1:N-丁基-N-甲基哌啶鎓四氟硼酸鹽 C2:N-甲基-N-丙基哌啶鎓四氟硼酸鹽 C3:1-乙基-3-甲基咪唑鹽四氟硼酸鹽 C4:N-乙醯基甘胺酸四丁基鏻鹽 C5:1-乙基-3-甲基咪唑鹽雙(三氟甲烷磺醯基)醯亞胺In the examples, (C) ionic liquid ((C) component) used the following C1-C5. C1: N-butyl-N-methylpiperidinium tetrafluoroborate C2: N-methyl-N-propylpiperidinium tetrafluoroborate C3: 1-ethyl-3-methylimidazolium tetrafluoroborate C4: N-acetylglycine tetrabutylphosphonium salt C5: 1-ethyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide
實施例中,(D)硬化促進劑((D)成份)為使用三苯基次膦三苯基硼烷。In the examples, (D) the curing accelerator ((D) component) used triphenylphosphinetriphenylborane.
分別將表1記載之種類及量的(A)成份及(B)成份、表1記載的量的(C)成份及(D)成份,以固形成份濃度為22質量%之方式,溶解於丙二醇單甲醚乙酸酯,分別製得各實施例,及比較例之硬化性組成物。Dissolve (A) and (B) components of the type and amount described in Table 1, and (C) and (D) components of the amount described in Table 1 in propylene glycol so that the solid content concentration is 22% by mass. Monomethyl ether acetate was used to prepare the curable compositions of the Examples and Comparative Examples.
使用所得硬化性組成物,依以下之方法,評估硬化膜之折射率、耐黃化性、密著性及耐熱性。該些的評估結果記載如表1所示。Using the obtained curable composition, evaluate the refractive index, yellowing resistance, adhesion and heat resistance of the cured film according to the following methods. These evaluation results are described in Table 1.
<折射率評估> 將各硬化性組成物使用旋轉塗佈器塗佈於玻璃基板上,進行100℃、120秒鐘之預燒焙,使用紫外線硬化機以曝光量100mJ/cm2 進行曝光(寬頻)之後,於230℃下進行20分鐘之曝後燒焙,製得膜厚約1μm的硬化膜。對各硬化膜,測定波長550nm下之折射率,並依下述基準進行評估。 ◎:折射率為1.65以上 〇:折射率為未達1.65、且為1.60以上 ×:折射率為未達1.60<Evaluation of Refractive Index> Each curable composition was coated on a glass substrate using a spin coater, prebaked at 100°C for 120 seconds, and exposed with an exposure dose of 100mJ/ cm2 using a UV curing machine (broadband ) and post-exposure baking at 230° C. for 20 minutes to obtain a cured film with a film thickness of about 1 μm. For each cured film, the refractive index at a wavelength of 550 nm was measured, and evaluated according to the following criteria. ◎: Refractive index is 1.65 or more ○: Refractive index is less than 1.65 and is 1.60 or more ×: Refractive index is less than 1.60
<耐黃化性評估> 依與折射率評估為相同之方法,對基板上所形成的硬化膜進行250℃、3小時燒結後,使用紫外可視分光光度計測定波長380nm下之穿透率,並依下述基準進行評估。 ◎:穿透率為90%以上 〇:穿透率為未達90%、且為85%以上 ×:穿透率為未達85%<Evaluation of yellowing resistance> According to the same method as the evaluation of the refractive index, after sintering the cured film formed on the substrate at 250°C for 3 hours, measure the transmittance at a wavelength of 380nm with a UV-visible spectrophotometer, and evaluate according to the following criteria. ◎: Penetration rate above 90% 〇: Penetration rate is less than 90% and more than 85% ×: The penetration rate is less than 85%
<密著性評估> 依與折射率評估為相同之方法,於基板上所形成的硬化膜上,實施交叉切割(切入為寬度1mm的格子狀),依JIS Z 1522所規定的膠布試驗,確認硬化膜是否發生剝離現象。完全未發生剝離現象時評定為「◎」,剝離的孔目的數目為5%以下時評定為「○」,剝離的孔目的數目超過5%時評定為「×」。<Adhesion evaluation> According to the same method as the evaluation of the refractive index, the cured film formed on the substrate is cross-cut (cut into a grid shape with a width of 1 mm), and the adhesive tape test specified in JIS Z 1522 is used to confirm whether the cured film is peeled off. . When no peeling phenomenon occurred at all, it was rated as "◎", when the number of peeled holes was less than 5%, it was rated as "○", and when the number of peeled holes exceeded 5%, it was rated as "×".
<耐熱性評估> 依與折射率評估為相同之方法,於基板上形成硬化膜。將所形成的硬化膜之一部份由基板剝離,作為樣品。使用所得的樣品進行大氣中的熱重量分析(TGDTA),評估其耐熱性。 熱重量分析,為由室溫(20℃)起,以10℃/分鐘之升溫速度進行加熱。 依分析開始時的重量為基準,測定重量減少5%時的溫度(Td5%:減少5%重量之溫度)。 Td5%為430℃以上時評定為「◎」,Td5%為400℃以上、未達430℃時評定為「○」,Td5%未達400℃時評定為「×」。<Heat Resistance Evaluation> A cured film was formed on the substrate in the same manner as for the evaluation of the refractive index. A part of the formed cured film was peeled off from the board|substrate, and it was set as a sample. Thermogravimetric analysis (TGDTA) in air was performed using the obtained sample, and the heat resistance was evaluated. For thermogravimetric analysis, heating was performed at a rate of 10°C/min from room temperature (20°C). Based on the weight at the beginning of the analysis, the temperature at which the weight decreases by 5% is measured (Td5%: temperature at which the weight decreases by 5%). When Td5% is 430°C or higher, it is rated as "◎", when Td5% is 400°C or higher but less than 430°C, it is rated as "○", and when Td5% is less than 400°C, it is rated as "×".
由表1所示結果得知,確認含有離子液體的實施例1~17之硬化性組成物,可形成兼具有折射率及耐黃化性的硬化膜。又,上述耐黃化性評估後的硬化膜中,由實施例1~17之硬化性組成物所得之硬化膜,於外觀上為無色透明,較比較例1~3之硬化膜則具有較弱的黃色調。又,對基板的密著性及耐熱性(耐熱分解性)皆為良好。 特別是,離子液體使用咪唑鹽或N-乙醯基甘胺酸鏻鹽的實施例4、5及7~17,其耐黃化性則具有特別優良的傾向。From the results shown in Table 1, it was confirmed that the curable compositions of Examples 1 to 17 containing ionic liquids can form cured films having both refractive index and yellowing resistance. In addition, among the cured films after the above yellowing resistance evaluation, the cured films obtained from the curable compositions of Examples 1-17 were colorless and transparent in appearance, which were weaker than the cured films of Comparative Examples 1-3. yellow tint. Moreover, both the adhesiveness to a board|substrate and heat resistance (pyrolysis resistance) were favorable. In particular, Examples 4, 5, and 7 to 17 in which imidazolium salt or N-acetylglycinate phosphonium salt was used as the ionic liquid tended to have particularly excellent yellowing resistance.
另一方面,比較例1~3之硬化性組成物,確認無法達成兼具折射率及耐黃化性(特別是耐黃化性)之效果。 又,由實施例2與比較例1之比較,得知含有離子液體確可改善耐黃化性。On the other hand, in the curable compositions of Comparative Examples 1 to 3, it was confirmed that the effects of both refractive index and yellowing resistance (especially yellowing resistance) could not be achieved. Also, from the comparison of Example 2 and Comparative Example 1, it can be known that the inclusion of ionic liquid can indeed improve the yellowing resistance.
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| CN114008163A (en) * | 2019-07-05 | 2022-02-01 | 三井化学株式会社 | Sealing agent for organic EL display element and organic EL display device |
| US11512171B2 (en) * | 2019-08-09 | 2022-11-29 | Merck Patent Gmbh | Low dielectric constant siliceous film manufacturing composition and methods for producing cured film and electronic device using the same |
| CN112882341B (en) * | 2019-11-29 | 2025-11-07 | 东京应化工业株式会社 | Resist composition and resist pattern forming method |
| JP2021167396A (en) * | 2020-04-10 | 2021-10-21 | 東京応化工業株式会社 | Method for producing laminate, method for producing micro-lens, method for producing cmos image sensor, and curable composition |
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| CN115785729B (en) * | 2022-10-27 | 2025-02-11 | 苏州市贝特利高分子材料股份有限公司 | A multi-purpose UV-LED light-curing high-hiding screen printing ink and preparation method thereof |
| WO2024090531A1 (en) * | 2022-10-28 | 2024-05-02 | 日産化学株式会社 | Cation-curable composition |
| KR20250038344A (en) * | 2023-09-12 | 2025-03-19 | 에스케이이노베이션 주식회사 | Carbon dioxide absorbing composition containing ionic compound containing cyclic ammonium cation and carbon dioxide separation method using the same |
| TW202513639A (en) * | 2023-09-26 | 2025-04-01 | 日商納美仕股份有限公司 | Resin composition, hardened material and optical fiber array |
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