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TWI844321B - Substrate processing equipment - Google Patents

Substrate processing equipment Download PDF

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Publication number
TWI844321B
TWI844321B TW112111854A TW112111854A TWI844321B TW I844321 B TWI844321 B TW I844321B TW 112111854 A TW112111854 A TW 112111854A TW 112111854 A TW112111854 A TW 112111854A TW I844321 B TWI844321 B TW I844321B
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unit
substrate
shielding plate
cleaning
reel
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TW112111854A
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Chinese (zh)
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TW202339328A (en
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菊池一哉
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日商芝浦機械電子裝置股份有限公司
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Priority claimed from JP2023048583A external-priority patent/JP2023152878A/en
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Publication of TW202339328A publication Critical patent/TW202339328A/en
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Publication of TWI844321B publication Critical patent/TWI844321B/en

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Abstract

本發明提供一種基板處理裝置,其可在維護時確保操作員的安全,並且抑制裝置整體的大型化,進而提高生產性。本發明的裝置包括:多個載台(10A、10B),相鄰地設置,且分別保持基板(W);單元(20B、20C),分別與載台(10A、10B)相向地設置,相對於基板(W)移動,且對基板(W)的端子(P)進行處理;以及第一遮蔽板(30),追隨於與載台(10A(10B))相向地設置的單元(20B(20C))而移動,對與相鄰的載台(10B(10A))相向地設置的單元(20C(20B))進行遮蔽。The present invention provides a substrate processing device, which can ensure the safety of operators during maintenance and suppress the overall size of the device, thereby improving productivity. The device of the present invention includes: a plurality of carriers (10A, 10B), which are arranged adjacent to each other and respectively hold substrates (W); units (20B, 20C), which are arranged opposite to the carriers (10A, 10B), move relative to the substrates (W), and process the terminals (P) of the substrates (W); and a first shielding plate (30), which moves following the unit (20B (20C)) arranged opposite to the carrier (10A (10B)) and shields the unit (20C (20B)) arranged opposite to the adjacent carrier (10B (10A)).

Description

基板處理裝置Substrate processing equipment

本發明是有關於一種基板處理裝置。The present invention relates to a substrate processing device.

在液晶面板或有機電致發光(electroluminescence,EL)面板等顯示面板的製造步驟中,存在如下步驟:在顯示面板的基板裝配用於對基板進行驅動的驅動器積體電路(Integrated Circuit,IC)等晶片狀電子零件、或裝配有驅動器IC的被稱為膜上晶片(Chip On Film,COF)的膜狀電子零件。在所述步驟之前,為了將基板的端子與電子零件的端子加以接合,而在基板的端子貼附被稱為各向異性導電膜(Anisotropic Conductive Film,ACF)的各向異性導電構件。即,經由ACF而在基板裝配驅動器IC或COF。In the manufacturing process of display panels such as liquid crystal panels or organic electroluminescence (EL) panels, there is a step of assembling chip-shaped electronic components such as driver integrated circuits (ICs) for driving the substrate, or film-shaped electronic components called chip on film (COF) equipped with driver ICs on the substrate of the display panel. Prior to the above step, an anisotropic conductive member called anisotropic conductive film (ACF) is attached to the terminals of the substrate in order to bond the terminals of the substrate with the terminals of the electronic components. That is, the driver IC or COF is assembled on the substrate via the ACF.

ACF是在成為基材的熱硬化性樹脂中加入了很多小的導電粒子的膜狀的構件,且以貼附於脫模帶的帶狀構件(以下也稱為ACF帶)的形式供給,並貼附於基板的端子。此種ACF與驅動器IC或COF的尺寸相應地預先形成切縫,在貼附於基板的端子後從基板拉開脫模帶時,利用所述切縫使貼附於基板的端子的ACF與ACF帶分離。ACF is a film-like component with many small conductive particles added to the thermosetting resin as the base material, and is supplied in the form of a tape-shaped component (hereinafter also referred to as ACF tape) attached to a release tape and attached to the terminals of the substrate. This ACF is pre-cut according to the size of the driver IC or COF, and when the release tape is pulled away from the substrate after being attached to the terminals of the substrate, the ACF attached to the terminals of the substrate is separated from the ACF tape by the slits.

作為將ACF貼附於基板的端子的基板處理裝置,例如已知有專利文獻1所公開的裝置。專利文獻1中公開的基板處理裝置通過將對一塊基板貼附ACF的單元相鄰配置,並對一塊基板的不同端子同時並行地進行ACF的貼附,從而實現了生產性的提高。另外,在專利文獻1中也公開了,通過將此種基板處理裝置相鄰配置而成的大型的基板處理裝置,對多塊基板同時並行地進行ACF的貼附。 [現有技術文獻] [專利文獻] As a substrate processing device for attaching ACF to the terminals of a substrate, for example, the device disclosed in Patent Document 1 is known. The substrate processing device disclosed in Patent Document 1 realizes improved productivity by arranging units for attaching ACF to a substrate adjacent to each other and attaching ACF to different terminals of a substrate simultaneously and in parallel. In addition, Patent Document 1 also discloses a large-scale substrate processing device in which such substrate processing devices are arranged adjacent to each other, and ACF is attached to a plurality of substrates simultaneously and in parallel. [Prior Art Document] [Patent Document]

[專利文獻1]國際公開第2011/001692號[Patent Document 1] International Publication No. 2011/001692

[發明所要解決的問題] 與個別地配置有兩台基板處理裝置時相比,此種大型的基板處理裝置通過省略裝置的共通部分等,可製成緊湊且縮小了占地面積的裝置。然而,由於成為在裝置內各個單元接近的結構,因此在進行ACF帶的更換作業或維護作業時,為了使操作員安全地進行作業而不得不使裝置整體停止,相應地,存在生產性下降的問題。另外,此種問題不僅存在於包括在基板的端子貼附ACF的單元的基板處理裝置中,例如也存在於包括對基板的端子進行清掃的單元的基板處理裝置中。 [Problem to be solved by the invention] Compared with two substrate processing devices configured separately, this large substrate processing device can be made compact and reduce the footprint by omitting the common parts of the device. However, since the units in the device are close to each other, when replacing the ACF tape or performing maintenance work, the entire device has to be stopped in order for the operator to perform the work safely, and there is a problem of reduced productivity. In addition, this problem exists not only in substrate processing devices including a unit for attaching ACF to the terminals of the substrate, but also in substrate processing devices including a unit for cleaning the terminals of the substrate.

本發明的目的在於提供一種可在維護時確保操作員的安全,並且抑制裝置整體的大型化,進而提高生產性的基板處理裝置。 [解決問題的技術手段] The purpose of the present invention is to provide a substrate processing device that can ensure the safety of operators during maintenance and suppress the overall size of the device, thereby improving productivity. [Technical means for solving the problem]

本發明的基板處理裝置包括:多個載台,相鄰地設置,且分別保持基板;多個單元,與所述載台的各個對應地設置,相對於保持於所述載台的所述基板移動,且對所述基板的端子進行處理;以及第一遮蔽板,追隨於所述單元而移動,對與相鄰的載台對應地設置的單元進行遮蔽。 [發明的效果] The substrate processing device of the present invention comprises: a plurality of carriers, which are arranged adjacent to each other and hold substrates respectively; a plurality of units, which are arranged corresponding to each of the carriers, move relative to the substrates held on the carriers, and process the terminals of the substrates; and a first shielding plate, which moves following the units and shields the units arranged corresponding to the adjacent carriers. [Effects of the invention]

本發明可在維護時確保操作員的安全,並且抑制裝置整體的大型化,進而提高生產性。The present invention can ensure the safety of operators during maintenance and suppress the enlargement of the entire device, thereby improving productivity.

參照附圖對本發明的實施方式(以下稱為本實施方式)進行具體說明。此外,附圖是示意性地表示各構件、各結構部,並非準確地表示其尺寸或間隔等。The embodiment of the present invention (hereinafter referred to as the present embodiment) will be described in detail with reference to the accompanying drawings. In addition, the accompanying drawings schematically show each component and each structural part, and do not accurately show their size or interval, etc.

[結構] 參照圖1至圖11對本實施方式的基板處理裝置1的結構進行說明。如圖1所示,基板處理裝置1包括:多個載台10,相鄰地設置,且分別保持多個基板W;多個單元20,分別與載台10相向地設置,對基板W的端子P進行處理;第一遮蔽板30,設置於一部分單元20;以及第二遮蔽板40,設置於載台10與單元20之間。另外,如圖11所示,基板處理裝置1包括對這些結構進行控制的控制部80。 [Structure] The structure of the substrate processing device 1 of the present embodiment is described with reference to FIGS. 1 to 11. As shown in FIG. 1, the substrate processing device 1 includes: a plurality of carriers 10, which are arranged adjacent to each other and respectively hold a plurality of substrates W; a plurality of units 20, which are respectively arranged opposite to the carriers 10 and process the terminals P of the substrates W; a first shielding plate 30, which is arranged in a part of the unit 20; and a second shielding plate 40, which is arranged between the carrier 10 and the unit 20. In addition, as shown in FIG. 11, the substrate processing device 1 includes a control unit 80 for controlling these structures.

基板W例如為液晶面板或有機EL面板等顯示面板的基板,且為大致長方形形狀。在基板W的一邊排列設置有多個包含多個端子的端子群即端子P。本實施方式中,端子P等間隔地排列設置有四個,如圖2所示,通過後述的單元20將ACF 100貼附於所述端子P。ACF 100為在成為基材的樹脂中加入了很多小的導電粒子的帶狀的構件,且貼附於端子P。即,在各基板W的一邊排列設置有四個端子P,且通過單元20將ACF 100貼附於各端子P。The substrate W is a substrate of a display panel such as a liquid crystal panel or an organic EL panel, and is roughly rectangular in shape. A plurality of terminal groups including a plurality of terminals, namely terminals P, are arranged on one side of the substrate W. In the present embodiment, four terminals P are arranged at intervals, as shown in FIG. 2 , and the ACF 100 is attached to the terminals P through the unit 20 described later. The ACF 100 is a strip-shaped component in which many small conductive particles are added to a resin serving as a base material, and is attached to the terminals P. That is, four terminals P are arranged on one side of each substrate W, and the ACF 100 is attached to each terminal P through the unit 20.

載台10為保持基板W的大致長方體形狀的台。本實施方式的載台10以相鄰的方式排列設置有兩台,各載台10排列保持兩塊基板W。兩台載台10排列的方向與兩塊基板W排列的方向相同,以下將此方向稱為X方向。因此,基板W以基板W的端子P沿X方向排列的方式保持於載台10。另外,於在載台10載置基板W的平面中,將與X方向垂直的方向稱為Y方向,將與X方向及Y方向垂直的方向稱為Z方向。這表示在圖1中,在圖視方向,左右方向為X方向,上下方向為Y方向,紙面前後方向為Z方向。此外,在圖1中,也將圖視下側(載台10的一側)稱為“前”,將圖視上側(單元20的一側)稱為“後”。另外,在圖1中,將左側的載台10稱為載台10A,將右側的載台10稱為載台10B。進而,載台10具有未圖示的移動機構,能夠沿XY方向移動,在後述的貼附作業時,在單元20的下方進出。The carrier 10 is a roughly rectangular platform for holding the substrate W. In the present embodiment, two carriers 10 are arranged adjacent to each other, and each carrier 10 arranges and holds two substrates W. The direction in which the two carriers 10 are arranged is the same as the direction in which the two substrates W are arranged, and this direction is referred to as the X direction below. Therefore, the substrate W is held on the carrier 10 in a manner in which the terminals P of the substrate W are arranged along the X direction. In addition, in the plane on which the substrate W is placed on the carrier 10, the direction perpendicular to the X direction is referred to as the Y direction, and the direction perpendicular to the X direction and the Y direction is referred to as the Z direction. This is represented in FIG. 1, in the viewing direction of the figure, the left-right direction is the X direction, the up-down direction is the Y direction, and the front-to-back direction of the paper is the Z direction. In addition, in FIG. 1, the lower side viewed in the figure (one side of the carrier 10) is referred to as the "front", and the upper side viewed in the figure (one side of the unit 20) is referred to as the "back". 1, the left stage 10 is referred to as stage 10A, and the right stage 10 is referred to as stage 10B. Furthermore, the stage 10 has a moving mechanism (not shown) and can move in the XY direction, and can move in and out from under the unit 20 during the bonding operation described later.

單元20為相對於載台10在Y方向上相向地設置,對基板W的端子P進行處理的裝置。本實施方式的單元20為作為處理而在基板W的端子P貼附ACF 100的貼附單元。本實施方式的單元20針對各載台10各設置兩台,且與各載台10所保持的基板W在Y方向上相向地沿X方向排列設置。具體而言,各單元20與基板W的排列設置端子P的一邊相向地設置。The unit 20 is a device that is disposed opposite to the stage 10 in the Y direction and processes the terminal P of the substrate W. The unit 20 of this embodiment is a pasting unit that pastes the ACF 100 on the terminal P of the substrate W as a process. Two units 20 of this embodiment are provided for each stage 10, and are arranged along the X direction opposite to the substrate W held by each stage 10 in the Y direction. Specifically, each unit 20 is disposed opposite to one side of the substrate W where the terminal P is arranged.

將與載台10A相向地設置的單元20從圖1中的左側起依次稱為單元20A、單元20B。另外,將與載台10B相向地設置的單元20從圖1中的左側起依次稱為單元20C、單元20D。即,在本實施方式中,單元20B和單元20C與載台10A和載台10B相鄰的位置對應並相鄰設置。The unit 20 disposed opposite to the stage 10A is referred to as the unit 20A and the unit 20B in order from the left side in Fig. 1. In addition, the unit 20 disposed opposite to the stage 10B is referred to as the unit 20C and the unit 20D in order from the left side in Fig. 1. That is, in the present embodiment, the unit 20B and the unit 20C correspond to the positions where the stage 10A and the stage 10B are adjacent to each other and are disposed adjacent to each other.

如此,在本實施方式中,針對一個載台10配置兩個單元20,利用所述兩個單元20對保持於所述載台10的基板W進行處理。對所述相同的基板W進行處理的載台10與單元20相互對應。即,在所述內容中,單元20A、單元20B與載台10A對應。另外,單元20C、單元20D與載台10B對應。Thus, in this embodiment, two units 20 are arranged for one stage 10, and the two units 20 are used to process the substrate W held on the stage 10. The stage 10 and the units 20 that process the same substrate W correspond to each other. That is, in the above content, the unit 20A and the unit 20B correspond to the stage 10A. In addition, the unit 20C and the unit 20D correspond to the stage 10B.

如圖3至圖5所示,本實施方式的單元20包括供給部21、切斷部22、貼附部23、剝離部24、搬送部25、及回收部26,且設置成能夠通過未圖示的例如以馬達為驅動源而使物件物能夠移動的導引機構等移動機構,各自獨立地沿X方向移動。並且,隔著貼附部23配置供給部21、切斷部22、剝離部24、搬送部25、回收部26。此種單元20利用切斷部22將作為後述的帶狀構件T而從供給部21供給的ACF 100切斷,並通過貼附部23將所述ACF 100貼附於基板W的端子P。此時,通過剝離部24將後述的脫模帶R從ACF 100剝離,並將貼附ACF 100後的脫模帶R回收至回收部26。此外,帶狀構件T是由搬送部25予以搬送。另外,如圖3、圖8至圖10所示,單元20根據設定於基板W的端子P的位置而會超過基板W的X方向上的寬度。在端子P在基板W的左端的情況下,圖8的(A)所示的單元20的區域A的部分會從基板W的左端伸出。即,如圖9的單元20C那樣,單元20的區域A會伸出至相鄰的載台10A的區域。在圖8的(B)中,以B表示在端子P在基板W的右端的情況下伸出的單元20的區域。即,如圖10的單元20B那樣,單元20的區域B會伸出至相鄰的載台10B的區域。As shown in FIGS. 3 to 5 , the unit 20 of the present embodiment includes a supply unit 21, a cutting unit 22, a pasting unit 23, a peeling unit 24, a conveying unit 25, and a collecting unit 26, and is configured to be able to independently move in the X direction through a moving mechanism such as a guide mechanism that uses a motor as a driving source (not shown) to move the object. In addition, the supply unit 21, the cutting unit 22, the peeling unit 24, the conveying unit 25, and the collecting unit 26 are arranged across the pasting unit 23. This unit 20 cuts the ACF 100 supplied from the supply unit 21 as a strip-shaped member T described later by the cutting unit 22, and adheres the ACF 100 to the terminal P of the substrate W by the pasting unit 23. At this time, the release tape R described later is peeled off from the ACF 100 by the peeling section 24, and the release tape R after being attached to the ACF 100 is recovered to the recovery section 26. In addition, the belt-shaped member T is transported by the conveying section 25. In addition, as shown in Figures 3 and 8 to 10, the unit 20 exceeds the width of the substrate W in the X direction according to the position of the terminal P set on the substrate W. When the terminal P is at the left end of the substrate W, the portion of the area A of the unit 20 shown in (A) of Figure 8 will extend from the left end of the substrate W. That is, as in the unit 20C of Figure 9, the area A of the unit 20 will extend to the area of the adjacent stage 10A. In (B) of Figure 8, B represents the area of the unit 20 that extends when the terminal P is at the right end of the substrate W. That is, as in the unit 20B of FIG. 10 , the region B of the unit 20 extends into the region of the adjacent stage 10B.

貼附部23在單元20的前側部分設置於載台10的一側。在單元20的後側部分,在與無貼附部23的載台側相反的一側(圖4及圖5的區域M側),能夠進行在貼附部23中使用的帶狀構件T的供給、作為使用完畢的帶狀構件T的脫模帶R的回收、或各種維護(以下,也將單元20的後側且圖4及圖5的區域M側稱為進行裝卸的一側)。The attachment section 23 is provided on one side of the carrier 10 at the front side of the unit 20. At the rear side of the unit 20, on the side opposite to the carrier side without the attachment section 23 (the area M side in FIGS. 4 and 5 ), the supply of the strip member T used in the attachment section 23, the collection of the release tape R as the used strip member T, and various maintenance can be performed (hereinafter, the rear side of the unit 20 and the area M side in FIGS. 4 and 5 are also referred to as the side for loading and unloading).

帶狀構件T為包含ACF 100的黏接帶S貼附於脫模帶R而成的構件。脫模帶R為能夠從黏接帶S剝離的帶,例如由聚醯亞胺等的樹脂膜形成。此外,本實施方式的帶狀構件T的寬度為0.5 mm~3.5 mm左右。The tape-shaped member T is a member in which an adhesive tape S including the ACF 100 is attached to a release tape R. The release tape R is a tape that can be peeled from the adhesive tape S and is formed of a resin film such as polyimide. The width of the tape-shaped member T of the present embodiment is about 0.5 mm to 3.5 mm.

供給部21對貼附部23供給帶狀構件T。供給部21具有供給卷軸211、張緊機構212、路徑輥213。The supply unit 21 supplies the tape-shaped member T to the attaching unit 23. The supply unit 21 includes a supply reel 211, a tension mechanism 212, and a path roller 213.

供給卷軸211為捲繞帶狀構件T並通過轉動將帶狀構件T送出的卷軸。如圖4所示,供給卷軸211設置於單元20的內部後側,且從載台側朝向進行裝卸的一側在Y方向上按照貼附部23、供給卷軸211的順序設置。單元20所具有的未圖示的支撐構件的軸嵌合於供給卷軸211的中心,且能夠轉動。並且,所述軸以軸朝向單元20的X方向側的方式設置。因此,供給卷軸211以供給卷軸211的旋轉面朝向X方向側的方式安裝。即,供給卷軸211可在以其旋轉面沿著上下方向(Z方向)的方式立起的狀態下,能夠轉動且能夠裝卸地安裝於單元20。然後,在帶狀構件T的更換等維護時,供給卷軸211被從進行裝卸的一側(圖4的區域M側)卸下。The supply reel 211 is a reel that winds up the strip-shaped member T and delivers the strip-shaped member T by rotating. As shown in FIG4 , the supply reel 211 is disposed at the inner rear side of the unit 20, and is disposed in the order of the attachment portion 23 and the supply reel 211 in the Y direction from the stage side toward the loading and unloading side. The shaft of the unillustrated supporting member of the unit 20 is engaged with the center of the supply reel 211 and is rotatable. Furthermore, the shaft is disposed in a manner that the shaft faces the X direction side of the unit 20. Therefore, the supply reel 211 is installed in a manner that the rotating surface of the supply reel 211 faces the X direction side. That is, the supply reel 211 is rotatably and detachably mounted on the unit 20 with its rotation surface standing in the vertical direction (Z direction). Then, when the belt member T is replaced or maintained, the supply reel 211 is removed from the side for attachment and detachment (the area M side in FIG. 4 ).

關於供給卷軸211,在圖4所示的單元20B中,為了從對供給卷軸211進行裝卸的一側(圖4的區域M側)容易識別供給卷軸211的支撐構件,另外,為了容易對供給卷軸211進行裝卸,而使供給卷軸211的安裝面(供給卷軸211的圓形的面、旋轉面)向對供給卷軸211進行裝卸的一側傾斜,例如使相對於Y方向旋轉15°的面向單元20B的後側傾斜而安裝。為了使基板處理裝置1緊湊,最優選為使供給卷軸211的安裝面相對於Y方向成0°,但若如此,則難以從對供給卷軸211進行裝卸的一側識別供給卷軸211的安裝位置,供給卷軸211變得難以裝卸。進而,如圖5所示的單元20C那樣,通過將後述的第一遮蔽板30設置於供給卷軸211側,X方向上的空間變少,因此更難以識別供給卷軸211的安裝位置,變得難以裝卸。因此,通過使供給卷軸211的安裝面向對供給卷軸211進行裝卸的一側傾斜,即便設置後述的第一遮蔽板30,也成為容易對供給卷軸211進行裝卸的結構。Regarding the supply reel 211, in the unit 20B shown in Figure 4, in order to easily identify the supporting structure of the supply reel 211 from the side where the supply reel 211 is loaded and unloaded (the area M side in Figure 4), and also, in order to easily load and unload the supply reel 211, the mounting surface of the supply reel 211 (the circular surface, the rotation surface of the supply reel 211) is tilted toward the side where the supply reel 211 is loaded and unloaded, for example, it is installed so that the surface is rotated 15° relative to the Y direction and is tilted toward the rear side of the unit 20B. In order to make the substrate processing apparatus 1 compact, it is most preferable to make the mounting surface of the supply reel 211 form 0° with respect to the Y direction. However, if this is done, it is difficult to identify the mounting position of the supply reel 211 from the side where the supply reel 211 is loaded and unloaded, and the supply reel 211 becomes difficult to load and unload. Furthermore, as in the unit 20C shown in FIG. 5 , by arranging the first shielding plate 30 described later on the side of the supply reel 211, the space in the X direction becomes smaller, and therefore it is more difficult to identify the mounting position of the supply reel 211, and it becomes difficult to load and unload. Therefore, by tilting the mounting surface of the supply reel 211 toward the side on which the supply reel 211 is attached and detached, even if the first shielding plate 30 described later is provided, the supply reel 211 can be easily attached and detached.

張緊機構212對帶狀構件T施加張力。如圖3所示,張緊機構212為以如下方式、即對從供給卷軸211拉出的帶狀構件T的移動進行引導的方式上下隔開距離配置的一對輥。其中一個輥為不會上下移動的固定輥212a,另一個輥為能夠上下移動的可動輥212b。可動輥212b通過未圖示的升降機構上下移動。即,在圖中向塗黑的箭頭方向移動。路徑輥213為改變帶狀構件T從張緊機構212的移動方向並將所述帶狀構件T朝向貼附部23送出的輥。The tensioning mechanism 212 applies tension to the strip-like member T. As shown in FIG3 , the tensioning mechanism 212 is a pair of rollers arranged at a distance up and down in such a manner as to guide the movement of the strip-like member T pulled out from the supply reel 211. One of the rollers is a fixed roller 212a that does not move up and down, and the other roller is a movable roller 212b that can move up and down. The movable roller 212b moves up and down by a lifting mechanism not shown in the figure. That is, it moves in the direction of the black arrow in the figure. The path roller 213 is a roller that changes the moving direction of the strip-like member T from the tensioning mechanism 212 and sends the strip-like member T toward the attachment portion 23.

切斷部22將帶狀構件T中的黏接帶S切斷。以下,將如此僅將黏接帶S切斷的操作稱為半切割,將通過切斷部22的切斷而形成於黏接帶S的切縫稱為半切割線HC。所述半切割線HC以與端子P的尺寸對應的間隔形成。因此,黏接帶S(ACF 100)被切斷成與端子P的尺寸對應的長度。The cutting section 22 cuts the adhesive tape S in the tape-shaped member T. Hereinafter, the operation of cutting only the adhesive tape S is referred to as half-cutting, and the cut formed in the adhesive tape S by the cutting section 22 is referred to as a half-cut line HC. The half-cut line HC is formed at intervals corresponding to the size of the terminal P. Therefore, the adhesive tape S (ACF 100) is cut into a length corresponding to the size of the terminal P.

切斷部22設置於張緊機構212與路徑輥213之間,具有切刀221、支承構件222。切刀221為沿寬度方向切斷黏接帶S的構件。即,切刀221的前端的刃沿帶狀構件T的寬度方向延伸。另外,通過未圖示的移動機構,切刀221的前端的刃與黏接帶S接觸/分離。如上所述,切刀221在由供給部21供給的帶狀構件T的黏接帶S上,根據端子P的尺寸形成半切割線HC。支承構件222為大致長方體形狀的區塊。所述支承構件222具有在與切刀221之間夾著帶狀構件T,且與脫模帶R相接的平坦面222a。The cutting section 22 is disposed between the tensioning mechanism 212 and the path roller 213, and includes a cutter 221 and a supporting member 222. The cutter 221 is a member that cuts the adhesive tape S in the width direction. That is, the blade at the front end of the cutter 221 extends in the width direction of the strip-shaped member T. In addition, the blade at the front end of the cutter 221 contacts/separates from the adhesive tape S through a moving mechanism not shown. As described above, the cutter 221 forms a half-cut line HC on the adhesive tape S of the strip-shaped member T supplied by the supply section 21 according to the size of the terminal P. The supporting member 222 is a block in a roughly rectangular shape. The supporting member 222 has a flat surface 222a that sandwiches the strip-shaped member T between the cutter 221 and the cutter 221 and is in contact with the demolding tape R.

貼附部23設置於路徑輥213的下游側,將帶狀構件T中的黏接帶S貼附於保持在載台10的基板W上所設置的端子P。基板W通過在貼附部23的下方進出的載台10,定位於貼附部23的下方。貼附部23具有加壓頭231。加壓頭231通過未圖示的升降裝置上下移動,由此按下帶狀構件T,對設置於基板W的端子P貼附黏接帶S。在加壓頭231設置有未圖示的加熱器,將與帶狀構件T的接觸面加熱至規定的溫度。進而,將緩衝構件231a通過未圖示的供給機構供給至加壓頭231中的與帶狀構件T的接觸面。所述緩衝構件231a例如為由彈性體形成的片材,防止因加熱而軟化的黏接帶S附著於加壓頭231。The attaching section 23 is disposed on the downstream side of the path roller 213, and attaches the adhesive tape S in the strip-shaped member T to the terminal P provided on the substrate W held on the stage 10. The substrate W is positioned below the attaching section 23 through the stage 10 that enters and exits below the attaching section 23. The attaching section 23 has a press head 231. The press head 231 is moved up and down by an unillustrated lifting device, thereby pressing the strip-shaped member T and attaching the adhesive tape S to the terminal P provided on the substrate W. The press head 231 is provided with an unillustrated heater, and the contact surface with the strip-shaped member T is heated to a predetermined temperature. Furthermore, the buffer member 231a is supplied to the contact surface with the strip-shaped member T in the press head 231 by an unillustrated supply mechanism. The buffer member 231a is, for example, a sheet formed of an elastic body, and prevents the adhesive tape S softened by heat from adhering to the pressure head 231.

剝離部24設置於貼附部23的下游側,將脫模帶R從貼附於基板W的端子P的黏接帶S剝離。剝離部24具有剝離棒241、剝離棒242。剝離棒241、剝離棒242例如為以沿Y方向延伸的方式設置的圓棒,且為與脫模帶R相接的構件。剝離棒241與脫模帶R的表面、即黏接帶S側的面相接,剝離棒242與脫模帶R的背面相接。剝離棒241、剝離棒242通過未圖示的移動機構在夾著脫模帶R的狀態下向帶狀構件T的上游側(虛線的箭頭方向)水準移動,由此將脫模帶R從貼附於基板W的端子P的黏接帶S剝離。The peeling section 24 is provided on the downstream side of the attachment section 23, and peels the release tape R from the adhesive tape S attached to the terminal P of the substrate W. The peeling section 24 has a peeling rod 241 and a peeling rod 242. The peeling rod 241 and the peeling rod 242 are, for example, round rods provided in a manner extending in the Y direction, and are members in contact with the release tape R. The peeling rod 241 is in contact with the surface of the release tape R, that is, the surface on the adhesive tape S side, and the peeling rod 242 is in contact with the back side of the release tape R. The stripping rods 241 and 242 are horizontally moved toward the upstream side (in the direction of the dotted arrow) of the tape-shaped member T while sandwiching the release tape R by a moving mechanism (not shown), thereby stripping the release tape R from the adhesive tape S attached to the terminal P of the substrate W.

搬送部25從供給部21經由貼附部23向回收部26的回收卷軸261送出帶狀構件T。搬送部25具有輸送輥251、未圖示的輸送用馬達。輸送輥251利用一對輥夾著脫模帶R,並通過輥的轉動使帶狀構件T從供給部21側向回收部26側移動。輸送用馬達為使輸送輥251轉動的驅動源。輸送用馬達的旋轉軸與輸送輥251連結,旋轉軸通過所述馬達的驅動而繞所述軸旋轉,由此使輸送輥251繞旋轉軸轉動。The conveying section 25 delivers the strip-shaped member T from the supply section 21 to the recovery reel 261 of the recovery section 26 via the attachment section 23. The conveying section 25 has a conveying roller 251 and a conveying motor (not shown). The conveying roller 251 clamps the release tape R with a pair of rollers, and moves the strip-shaped member T from the supply section 21 side to the recovery section 26 side by the rotation of the rollers. The conveying motor is a driving source for rotating the conveying roller 251. The rotating shaft of the conveying motor is connected to the conveying roller 251, and the rotating shaft rotates around the shaft by the drive of the motor, thereby rotating the conveying roller 251 around the rotating shaft.

回收部26設置於剝離部24的下游側,對從貼附於基板W的端子P的黏接帶S剝離的脫模帶R進行回收。回收部26具有回收卷軸261、路徑輥262。The recovery unit 26 is provided on the downstream side of the peeling unit 24 , and recovers the release tape R peeled off from the adhesive tape S attached to the terminal P of the substrate W. The recovery unit 26 includes a recovery reel 261 and a path roller 262 .

回收卷軸261為對脫模帶R進行卷取並予以回收的卷軸。如圖4所示,設置於單元20的內部後側,從載台側朝向進行裝卸的一側,在Y方向上按照貼附部23、回收卷軸261的順序設置。單元20所具有的未圖示的支撐構件的軸嵌合於回收卷軸261的中心,且能夠轉動。並且,所述軸以軸朝向單元20的X方向側的方式設置。因此,回收卷軸261以回收卷軸261的旋轉面朝向X方向側的方式安裝。即,回收卷軸261可在以其旋轉面沿著上下方向(Z方向)的方式立起的狀態下,能夠轉動且能夠裝卸地安裝於單元20。然後,在帶狀構件T的更換等維護時,回收卷軸261被從進行裝卸的一側(圖4的區域M側)卸下。The recovery reel 261 is a reel for winding and recovering the demoulding tape R. As shown in FIG4 , it is arranged at the inner rear side of the unit 20, from the stage side toward the loading and unloading side, in the order of the attachment portion 23 and the recovery reel 261 in the Y direction. The shaft of the unillustrated supporting member of the unit 20 is engaged with the center of the recovery reel 261 and is rotatable. Furthermore, the shaft is arranged in a manner that the shaft faces the X direction side of the unit 20. Therefore, the recovery reel 261 is installed in a manner that the rotating surface of the recovery reel 261 faces the X direction side. That is, the recovery reel 261 can be rotatably and detachably mounted on the unit 20 with its rotation surface standing in the up-down direction (Z direction). Then, when the belt member T is replaced or other maintenance is performed, the recovery reel 261 is removed from the side for attachment and detachment (the area M side in FIG. 4 ).

關於回收卷軸261,在圖4所示的單元20B中,與供給卷軸211同樣地,為了從對回收卷軸261進行裝卸的一側(圖4的區域M側)容易識別回收卷軸261的支撐構件,另外,為了容易對回收卷軸261進行裝卸,而使回收卷軸261的安裝面(回收卷軸261的圓形的面、旋轉面)向對回收卷軸261進行裝卸的一側傾斜,例如使相對於Y方向旋轉15°的面向單元20B的後側傾斜而安裝。為了使基板處理裝置1緊湊,最優選為使回收卷軸261的安裝面相對於Y方向成0°,但若如此,則難以從對回收卷軸261進行裝卸的一側識別回收卷軸261的安裝位置,回收卷軸261變得難以裝卸。進而,如圖4那樣,通過將後述的第一遮蔽板30設置於回收卷軸261側,X方向上的空間變少,因此更難以識別回收卷軸261的安裝位置,變得難以裝卸。因此,通過使回收卷軸261的安裝面向對回收卷軸261進行裝卸的一側傾斜,即便設置後述的第一遮蔽板30,也成為容易對回收卷軸261進行裝卸的結構。Regarding the recovery reel 261, in the unit 20B shown in Figure 4, similarly to the supply reel 211, in order to easily identify the supporting structure of the recovery reel 261 from the side where the recovery reel 261 is loaded and unloaded (the area M side in Figure 4), and further, in order to easily load and unload the recovery reel 261, the mounting surface of the recovery reel 261 (the circular surface, the rotation surface of the recovery reel 261) is tilted toward the side where the recovery reel 261 is loaded and unloaded, for example, it is installed so that the surface is rotated 15° relative to the Y direction and is tilted toward the rear side of the unit 20B. In order to make the substrate processing device 1 compact, it is most preferred that the mounting surface of the recovery reel 261 is 0° with respect to the Y direction. However, if this is done, it is difficult to identify the mounting position of the recovery reel 261 from the side where the recovery reel 261 is loaded and unloaded, and the recovery reel 261 becomes difficult to load and unload. Furthermore, as shown in FIG4 , by arranging the first shielding plate 30 described later on the side of the recovery reel 261, the space in the X direction becomes less, so it is more difficult to identify the mounting position of the recovery reel 261, and it becomes difficult to load and unload. Therefore, by tilting the mounting surface of the recovery reel 261 toward the side where the recovery reel 261 is loaded and unloaded, even if the first shielding plate 30 described later is provided, it becomes a structure that makes it easy to load and unload the recovery reel 261.

路徑輥262為改變脫模帶R從貼附部23側的移動方向並將所述脫模帶R朝向回收卷軸261送出的輥。此外,路徑輥262設置於剝離部24與搬送部25之間。The path roller 262 is a roller that changes the moving direction of the release tape R from the attachment portion 23 side and sends the release tape R toward the recovery reel 261. In addition, the path roller 262 is provided between the stripping portion 24 and the conveying portion 25.

另外,如圖4、圖5所示,在對單元20的供給卷軸211及回收卷軸261進行裝卸的一側設置有維護用的區域M。即,區域M為設置於單元20的後方,用於由操作員對單元20進行供給卷軸211及回收卷軸261的裝卸等對單元20進行維護作業的區域。4 and 5, a maintenance area M is provided on the side where the supply reel 211 and the recovery reel 261 of the unit 20 are loaded and unloaded. That is, the area M is provided at the rear of the unit 20 and is used by the operator to perform maintenance work on the unit 20, such as loading and unloading the supply reel 211 and the recovery reel 261.

第一遮蔽板30是沿與和單元20的移動方向(X方向)正交的YZ平面平行的方向延伸而成的板狀構件。本實施方式的第一遮蔽板30例如包含亞克力板或聚碳酸酯板等透明的構件。第一遮蔽板30在維護作業時對相鄰的單元20進行遮蔽,以確保維護作業中的操作員的安全。因此,第一遮蔽板30具有足以防止運轉中的單元20與操作員接觸等干涉的大小與強度。具體而言,設為至少覆蓋單元20的側面的大小(參照圖7)。The first shielding plate 30 is a plate-shaped member extending in a direction parallel to the YZ plane orthogonal to the moving direction (X direction) of the unit 20. The first shielding plate 30 of the present embodiment includes a transparent member such as an acrylic plate or a polycarbonate plate. The first shielding plate 30 shields the adjacent units 20 during maintenance operations to ensure the safety of the operators in the maintenance operations. Therefore, the first shielding plate 30 has a size and strength sufficient to prevent interference such as contact between the operating unit 20 and the operator. Specifically, it is set to a size that covers at least the side of the unit 20 (refer to Figure 7).

如圖4、圖5所示,第一遮蔽板30安裝於設置在單元20的側方的遮蔽板保持部27。例如,如圖6所示,由遮蔽板保持部27保持第一遮蔽板30的下方。因此,第一遮蔽板30追隨於單元20而移動。As shown in Fig. 4 and Fig. 5, the first shielding plate 30 is attached to the shielding plate holding portion 27 provided on the side of the unit 20. For example, as shown in Fig. 6, the lower side of the first shielding plate 30 is held by the shielding plate holding portion 27. Therefore, the first shielding plate 30 moves following the unit 20.

所謂安裝第一遮蔽板30的單元20的側方,是與各載台10對應的多個單元20中的、設置於各載台10的相鄰側的單元20的各單元20的相鄰側。例如是單元20B及單元20C各自相鄰的一側。具體而言,第一遮蔽板30的其中一者設置於與載台10A對應的單元20A和單元20B中的單元20B的X方向右側(單元20B的載台10B側),第一遮蔽板30的另一者設置於與載台10B對應的單元20C和單元20D中的單元20C的X方向左側(單元20C的載台10A側)。即,分別設置於單元20A與單元20B的相對的部位。The so-called side of the unit 20 on which the first shielding plate 30 is installed is the adjacent side of each unit 20 of the multiple units 20 corresponding to each stage 10, which is arranged on the adjacent side of each stage 10. For example, it is the adjacent side of each unit 20B and the unit 20C. Specifically, one of the first shielding plates 30 is arranged on the right side of the unit 20B in the X direction (the stage 10B side of the unit 20B) among the unit 20A and the unit 20B corresponding to the stage 10A, and the other first shielding plate 30 is arranged on the left side of the unit 20C in the X direction (the stage 10A side of the unit 20C) among the unit 20C and the unit 20D corresponding to the stage 10B. That is, they are respectively provided at the opposing positions of the unit 20A and the unit 20B.

如圖1所示,第二遮蔽板40為沿與和單元20的移動方向(X方向)平行的XZ平面平行的方向延伸而成的板狀構件。本實施方式的第二遮蔽板40例如包含亞克力板或聚碳酸酯板等透明的構件。第二遮蔽板40設置於載台10與單元20之間。此處所述的載台10與單元20之間在本實施方式的情況下,表示在保持於載台10的基板W為了進行處理而進入單元20的貼附部的正下方之前的狀態下,在載台10與單元20相互分離的狀態(初期狀態)下,俯視時的載台10與單元20之間。因此,即便在為了進行處理而在俯視時載台10與單元20重疊的情況下,也在初期狀態的載台10與單元20之間設置第二遮蔽板40。As shown in FIG. 1 , the second shielding plate 40 is a plate-shaped member extending in a direction parallel to an XZ plane parallel to the moving direction (X direction) of the unit 20. The second shielding plate 40 of the present embodiment includes, for example, a transparent member such as an acrylic plate or a polycarbonate plate. The second shielding plate 40 is disposed between the carrier 10 and the unit 20. In the present embodiment, the space between the carrier 10 and the unit 20 mentioned here refers to the space between the carrier 10 and the unit 20 when viewed from above in a state where the carrier 10 and the unit 20 are separated from each other (initial state) before the substrate W held on the carrier 10 enters directly below the attachment portion of the unit 20 for processing. Therefore, even when the stage 10 and the unit 20 overlap in a plan view for processing, the second shielding plate 40 is provided between the stage 10 and the unit 20 in the initial state.

第二遮蔽板40例如為在Z方向上開閉的遮蔽板。在單元20對保持於載台10的基板W進行ACF的貼附時,第二遮蔽板40被打開,基板W可進入至單元20的貼附部。在操作員對單元20進行維護作業時,第二遮蔽板40被關閉以確保操作員的安全。因此,在此情況下,載台10與單元20位於初期狀態。為了確保操作員的安全,第二遮蔽板40具有足以防止載台10與操作員接觸等干涉的大小及強度。若還考慮後述的防塵效果,則優選為設為覆蓋載台10的X方向長度的大小(參照圖1)。另外,為了防止載台或保持於載台的基板進入至貼附區域,將第二遮蔽板40設為在關閉時對載台10的可動部分進行遮蔽的大小。The second shielding plate 40 is, for example, a shielding plate that opens and closes in the Z direction. When the unit 20 performs ACF bonding on the substrate W held on the stage 10, the second shielding plate 40 is opened, and the substrate W can enter the bonding part of the unit 20. When the operator performs maintenance work on the unit 20, the second shielding plate 40 is closed to ensure the safety of the operator. Therefore, in this case, the stage 10 and the unit 20 are in an initial state. In order to ensure the safety of the operator, the second shielding plate 40 has a size and strength sufficient to prevent interference such as contact between the stage 10 and the operator. If the dustproof effect described later is also considered, it is preferably set to a size that covers the length of the stage 10 in the X direction (refer to Figure 1). Furthermore, in order to prevent the stage or the substrate held on the stage from entering the attachment area, the second shielding plate 40 is set to a size that shields the movable portion of the stage 10 when closed.

第二遮蔽板40如上所述沿著基板處理裝置1的X方向設置。因此,為與第一遮蔽板30正交的蓋,且以不妨礙單元20及第一遮蔽板30的X方向上的移動的方式在Y方向上具有規定的間隔地設置。第二遮蔽板40包含固定蓋410與擋板420此兩個組件。As described above, the second shielding plate 40 is disposed along the X direction of the substrate processing apparatus 1. Therefore, it is a cover orthogonal to the first shielding plate 30 and is disposed at a predetermined interval in the Y direction so as not to hinder the movement of the unit 20 and the first shielding plate 30 in the X direction. The second shielding plate 40 includes two components, namely, a fixed cover 410 and a baffle 420.

固定蓋410設置於載台10與單元20之間,為與載台10正交且從裝置的頂面向XZ方向延伸的(載台的長度量)板狀組件。固定蓋410在Y方向上與單元20具有間隙地設置,以不妨礙單元20的運轉。另外,固定蓋410與載台10的Z方向上的間隙設置為,在載台10移動時,即便在貼附ACF時也不會與位於載台10上的基板W發生干涉。即,只要設為基板W進入加壓頭的正下方時不會發生干涉的高度即可。另外,固定蓋410的下端具有朝向單元20側延伸規定長度的彎折部。The fixed cover 410 is disposed between the stage 10 and the unit 20, and is a plate-like component (the length of the stage) that is orthogonal to the stage 10 and extends from the top surface of the device in the XZ direction. The fixed cover 410 is disposed with a gap with the unit 20 in the Y direction so as not to hinder the operation of the unit 20. In addition, the gap between the fixed cover 410 and the stage 10 in the Z direction is set so that when the stage 10 moves, it will not interfere with the substrate W located on the stage 10 even when the ACF is attached. That is, it is sufficient as long as it is set to a height that does not interfere when the substrate W enters directly under the pressure head. In addition, the lower end of the fixed cover 410 has a bent portion that extends toward the side of the unit 20 by a specified length.

擋板420與固定蓋410同樣地,位於載台10與單元20之間且比固定蓋410更靠單元20側,以與固定蓋410對應的方式沿XZ方向延伸且為板狀。擋板420由設置於對載台10及單元20進行載置的台架側的升降驅動部(未圖示)予以支撐,能夠在Z方向上升降。此外,也可將擋板420的升降設為手動,但理想的是可與維護模式進行聯動。擋板420的X方向上的長度為與載台對應的長度。另外,如圖6的(A)及圖6的(B)所示,擋板420通過下降,可使載台10及基板W進入加壓頭231之下。相反,如圖7所示,通過使擋板420上升,阻止載台10侵入至加壓頭231之下。此外,擋板420的上下升降範圍例如可以擋板420的最上端與固定蓋410的下端接觸的高度為上限,以不與載台10發生干涉的高度為下限,也可設為除此以外的升降範圍。此外,在本實施方式中,擋板420與固定蓋410在Y方向上偏移設置。在此情況下,擋板420的最上端無需以與固定蓋410的下端接觸的高度為上限,從正面觀察時也可重疊。另外,為了消除因所述Y方向上的偏移而產生的間隙,可在固定蓋410設置固定蓋410的下端(彎折部),關於擋板420的上端,也可使彎折部朝向載台側延長至規定的長度,也可在固定蓋與擋板此兩者設置彎折部而非僅在其中某一者。The baffle 420 is located between the stage 10 and the unit 20 and closer to the unit 20 than the fixed cover 410, similarly to the fixed cover 410, and is plate-shaped and extends in the XZ direction in a manner corresponding to the fixed cover 410. The baffle 420 is supported by a lifting drive (not shown) provided on the side of the stage on which the stage 10 and the unit 20 are placed, and can be lifted and lowered in the Z direction. In addition, the lifting and lowering of the baffle 420 can also be set manually, but it is ideal to be linked to the maintenance mode. The length of the baffle 420 in the X direction is the length corresponding to the stage. In addition, as shown in (A) and (B) of Figure 6, the baffle 420 can be lowered to allow the stage 10 and the substrate W to enter under the pressure head 231. On the contrary, as shown in FIG. 7 , by raising the baffle plate 420, the stage 10 is prevented from intruding under the pressure head 231. In addition, the vertical lifting range of the baffle plate 420 may be, for example, the height at which the uppermost end of the baffle plate 420 contacts the lower end of the fixed cover 410 as the upper limit and the height at which no interference occurs with the stage 10 as the lower limit, or may be set to a lifting range other than this. In addition, in the present embodiment, the baffle plate 420 and the fixed cover 410 are offset in the Y direction. In this case, the uppermost end of the baffle plate 420 does not need to be the height at which the uppermost end contacts the lower end of the fixed cover 410 as the upper limit, and may overlap when viewed from the front. In addition, in order to eliminate the gap caused by the offset in the Y direction, the lower end (bend portion) of the fixed cover 410 can be provided on the fixed cover 410, and the bend portion can be extended to a specified length toward the side of the carrier with respect to the upper end of the baffle 420. The bend portion can also be provided on both the fixed cover and the baffle instead of on only one of them.

控制部80為對單元20進行控制的裝置。所述控制部80例如包含專用的電子電路或以規定的程式運行的電腦等。控制部80將各部的控制內容程式設計,且由可程式設計邏輯控制器(Programmable Logic Controller,PLC)或中央處理器(Central Processing Unit,CPU)等處理裝置執行所述程式。The control unit 80 is a device for controlling the unit 20. The control unit 80 includes, for example, a dedicated electronic circuit or a computer running a predetermined program. The control unit 80 programs the control contents of each unit, and a processing device such as a programmable logic controller (PLC) or a central processing unit (CPU) executes the program.

如圖11所示,控制部80具有機構控制部81、儲存部82、輸入輸出控制部83。機構控制部81對載台10、單元20的動作進行控制。特別是,在本實施方式中,以單元20A、單元20B、單元20C、單元20D不接觸的方式進行控制。儲存部82儲存用於實現載台10、單元20的動作的程式、資料等本實施方式的控制所需的資訊。輸入輸出控制部83為對與成為控制物件的各部之間的信號的轉換或輸入輸出進行控制的介面。As shown in FIG. 11 , the control unit 80 includes a mechanism control unit 81, a storage unit 82, and an input/output control unit 83. The mechanism control unit 81 controls the movement of the stage 10 and the unit 20. In particular, in the present embodiment, the control is performed in a non-contact manner with the unit 20A, the unit 20B, the unit 20C, and the unit 20D. The storage unit 82 stores information required for the control of the present embodiment, such as programs and data for realizing the movement of the stage 10 and the unit 20. The input/output control unit 83 is an interface for controlling the conversion of signals or input/output between the various parts that become the controlled objects.

進而,在控制部80連接有輸入裝置91、輸出裝置92。輸入裝置91為用於供操作員經由控制部80操作電子零件裝配裝置的開關、觸摸面板、鍵盤、滑鼠等輸入部件。輸出裝置92為將用於確認電子零件裝配裝置的狀態的資訊設為操作員能夠視認的狀態的顯示裝置等輸出部件。Furthermore, the control unit 80 is connected to an input device 91 and an output device 92. The input device 91 is an input component such as a switch, a touch panel, a keyboard, a mouse, etc., which allows an operator to operate the electronic component assembly device via the control unit 80. The output device 92 is an output component such as a display device that sets information for confirming the state of the electronic component assembly device in a state that the operator can visually recognize.

[作用] 參照圖12的流程圖對如上所述的基板處理裝置1的作用進行說明。作為前提,如圖1所示,在載台10A、載台10B分別各保持兩塊基板W,與載台10A對應,在與保持於載台10A的各基板W相向的位置設置有單元20A、單元20B,與載台10B對應,在與保持於載台10B的各基板W相向的位置設置有單元20C、單元20D。 [Function] The function of the substrate processing device 1 described above is explained with reference to the flowchart of FIG12. As a premise, as shown in FIG1, two substrates W are held on the stage 10A and the stage 10B respectively, and units 20A and 20B are provided at positions facing the substrates W held on the stage 10A corresponding to the stage 10A, and units 20C and 20D are provided at positions facing the substrates W held on the stage 10B corresponding to the stage 10B.

首先,各單元20定位於對應的基板W上所設置的端子P中的最端部的端子P,例如圖2中的最左端的端子P(步驟S01)。具體而言,各單元20的貼附部23定位於最左端的端子P的上方。即,單元20A、單元20B、單元20C、單元20D各自的貼附部23定位於對應的基板W的最左端的端子P的上方。此外,所述定位例如通過保持基板W的載台10在單元20的貼附部23的下方進出、或單元20沿X方向移動來實現。First, each unit 20 is positioned at the terminal P at the end of the terminals P provided on the corresponding substrate W, for example, the terminal P at the leftmost end in FIG. 2 (step S01). Specifically, the attachment portion 23 of each unit 20 is positioned above the terminal P at the leftmost end. That is, the attachment portion 23 of each unit 20A, unit 20B, unit 20C, and unit 20D is positioned above the terminal P at the leftmost end of the corresponding substrate W. In addition, the positioning is achieved, for example, by moving the stage 10 holding the substrate W in and out from under the attachment portion 23 of the unit 20, or by moving the unit 20 along the X direction.

此時,在貼附部23中,如圖3所示,帶狀構件T以使設置於黏接帶S的半切割線HC與端子P的兩端對準的方式定位。在所述狀態下,通過貼附部23的加壓頭231下降,從脫模帶R側按下帶狀構件T,使經半切割的黏接帶S貼附於設置在基板W的端子P(步驟S02)。At this time, in the attaching section 23, as shown in FIG3, the tape member T is positioned so that the half-cut line HC provided on the adhesive tape S is aligned with both ends of the terminal P. In this state, the pressing head 231 of the attaching section 23 is lowered to press the tape member T from the side of the release tape R, so that the half-cut adhesive tape S is attached to the terminal P provided on the substrate W (step S02).

在貼附黏接帶S之後,使加壓頭231上升,使剝離棒241、剝離棒242向帶狀構件T的上游側水準移動,由此將脫模帶R從貼附於端子P的黏接帶S剝離(步驟S03)。如此,在設置於基板W的端子P貼附黏接帶S,即ACF 100。After the adhesive tape S is attached, the pressure head 231 is raised, and the stripping rods 241 and 242 are moved horizontally toward the upstream side of the strip-shaped member T, thereby stripping the release tape R from the adhesive tape S attached to the terminal P (step S03). In this way, the adhesive tape S, that is, the ACF 100, is attached to the terminal P provided on the substrate W.

當在基板W的最左端的端子P貼附ACF 100之後,各單元20沿X方向移動,且定位於相鄰的端子P(步驟S04)。此後,反復進行所述步驟S02至步驟S04,直至在設置於基板W的所有端子P貼附ACF 100為止(步驟S05的否(NO))。然後,當在基板W的最右端的端子P貼附ACF 100之後,即,當在設置於基板W的所有端子P貼附ACF 100之後(步驟S05的是(YES)),各載台10沿Y方向移動,從貼附部23的下方後退至基板W的回收位置,並且各單元20沿X方向移動,並定位於設置在基板W的最左端的端子P。從各載台10回收貼附有ACF 100的基板W,在各載台10重新保持各兩塊未貼附ACF 100的基板W。即,在各載台10中進行基板W的替換(步驟S06)。以下,在各單元20的任一個中,反復進行所述步驟S01至步驟S06,直至捲繞於供給卷軸211的帶狀構件T消失為止(步驟S07的否)。After the ACF 100 is attached to the terminal P at the leftmost end of the substrate W, each unit 20 moves along the X direction and is positioned at the adjacent terminal P (step S04). Thereafter, the steps S02 to S04 are repeated until the ACF 100 is attached to all the terminals P provided on the substrate W (step S05 of NO). Then, after the ACF 100 is attached to the terminal P at the rightmost end of the substrate W, that is, after the ACF 100 is attached to all the terminals P provided on the substrate W (step S05 of YES), each stage 10 moves along the Y direction, retreats from the bottom of the attachment portion 23 to the recovery position of the substrate W, and each unit 20 moves along the X direction and is positioned at the terminal P provided on the leftmost end of the substrate W. The substrate W with the ACF 100 attached is collected from each stage 10, and two substrates W without the ACF 100 attached are newly held on each stage 10. That is, the substrate W is replaced in each stage 10 (step S06). Hereinafter, in any of the units 20, the steps S01 to S06 are repeatedly performed until the strip-shaped member T wound around the supply reel 211 disappears (No in step S07).

當在各單元20的任一者中需要進行捲繞於供給卷軸211的帶狀構件T消失等維護作業時(步驟S07的是),使所述單元20和與相同的載台10對應的單元20的貼附動作停止(步驟S08)。此處,設為在單元20B中帶狀構件T消失,使單元20B的貼附動作、及與單元20B相同地和載台10A對應的單元20A的貼附動作停止。此時,單元20C、單元20D繼續進行貼附動作。When a maintenance operation such as the disappearance of the belt-shaped member T wound around the supply reel 211 is required in any of the units 20 (Yes in step S07), the attaching operation of the unit 20 and the unit 20 corresponding to the same stage 10 is stopped (step S08). Here, it is assumed that the belt-shaped member T disappears in the unit 20B, and the attaching operation of the unit 20B and the attaching operation of the unit 20A corresponding to the stage 10A in the same manner as the unit 20B are stopped. At this time, the units 20C and 20D continue to perform the attaching operation.

接著,停止了貼附動作的單元20A、單元20B以離開載台10B的方式向X方向退避(步驟S09),並且載台10A向Y方向移動,而使基板W從貼附部23的下方後退。例如,如圖13所示,單元20A、單元20B向能夠移動的X方向上的最左側移動而退避。Next, the unit 20A and the unit 20B that have stopped the attaching operation retreat in the X direction by leaving the stage 10B (step S09), and the stage 10A moves in the Y direction to move the substrate W back from under the attaching portion 23. For example, as shown in FIG. 13 , the unit 20A and the unit 20B retreat by moving to the leftmost side in the X direction where they can move.

如此,單元20A、單元20B以不妨礙單元20C、單元20D的貼附動作的方式靠近基板處理裝置1的最左側而退避。此外,在進行單元20C、單元20D的維護作業的情況下,單元20C、單元20D以不妨礙單元20A、單元20B的貼附動作的方式靠近基板處理裝置1的最右側而退避。所述進行退避的位置為維護位置,維護位置為裝置的最右或最左。例如,單元20A及單元20B成為基板處理裝置1的最左側面側,單元20C及單元20D成為基板處理裝置1的最右側面側。In this way, the unit 20A and the unit 20B retreat close to the leftmost side of the substrate processing device 1 in a manner that does not hinder the attachment operation of the unit 20C and the unit 20D. In addition, when the maintenance work of the unit 20C and the unit 20D is performed, the unit 20C and the unit 20D retreat close to the rightmost side of the substrate processing device 1 in a manner that does not hinder the attachment operation of the unit 20A and the unit 20B. The position where the retreat is performed is the maintenance position, and the maintenance position is the rightmost or leftmost side of the device. For example, the unit 20A and the unit 20B become the leftmost side of the substrate processing device 1, and the unit 20C and the unit 20D become the rightmost side of the substrate processing device 1.

由操作員對靠近基板處理裝置1的最左側的單元20A、單元20B進行維護作業(步驟S10)。擋板420與切換為維護模式聯動地自動升降,通過固定蓋410與擋板420使單元20與載台10分隔。通過如此使單元20來到維護位置,作業者可在裝置的側面在由第一遮蔽板30、第二遮蔽板40包圍單元的狀態下進行作業。The operator performs maintenance work on the unit 20A and the unit 20B on the leftmost side of the substrate processing device 1 (step S10). The baffle 420 automatically rises and falls in conjunction with the switch to the maintenance mode, and the unit 20 is separated from the stage 10 by the fixed cover 410 and the baffle 420. By bringing the unit 20 to the maintenance position in this way, the operator can work on the side of the device while the unit is surrounded by the first shielding plate 30 and the second shielding plate 40.

以下,作為維護作業的具體例,在新的供給卷軸的更換作業中進行說明。操作員將帶狀構件T消失的供給卷軸211及回收了脫模帶R的回收卷軸261從單元20B卸下。進而,操作員將捲繞有帶狀構件T的供給卷軸211及空的回收卷軸261安裝於單元20B。然後,操作員將從供給卷軸211拉出的帶狀構件T架設於張緊機構212、路徑輥213、切斷部22、貼附部23、剝離部24、搬送部25、路徑輥262,並安裝於回收卷軸261。由此,單元20B的維護作業結束。此外,也可與單元20B的維護作業並行地進行單元20A的維護作業。在維護作業結束後,例如通過返回至所述步驟S01,可重新開始單元20A、單元20B的貼附作業。The following is an explanation of the replacement operation of a new supply reel as a specific example of the maintenance operation. The operator removes the supply reel 211 from which the strip-like component T has disappeared and the recovery reel 261 from which the release tape R has been recovered from the unit 20B. Furthermore, the operator installs the supply reel 211 on which the strip-like component T is wound and the empty recovery reel 261 in the unit 20B. Then, the operator sets the strip-like component T pulled out from the supply reel 211 on the tensioning mechanism 212, the path roller 213, the cutting section 22, the attaching section 23, the stripping section 24, the conveying section 25, the path roller 262, and installs it on the recovery reel 261. Thus, the maintenance operation of the unit 20B is completed. In addition, the maintenance operation of the unit 20A may be performed in parallel with the maintenance operation of the unit 20B. After the maintenance operation is completed, for example, by returning to the step S01, the attachment operation of the unit 20A and the unit 20B may be restarted.

[效果] (1)本實施方式的基板處理裝置1包括:多個載台10A、10B,相鄰地設置,且分別保持基板W;多個單元20,分別與載台10A、載台10B對應地設置,相對於所保持的基板W移動,且對基板W的端子P進行處理;以及第一遮蔽板30,追隨於與載台10A(10B)對應地設置的單元20B(20C)而移動,對與相鄰的載台10B(10A)對應地設置的單元20C(20B)進行遮蔽。另外,單元20B、單元20C為在基板W的端子P貼附ACF 100的貼附單元。 [Effects] (1) The substrate processing device 1 of the present embodiment includes: a plurality of carriers 10A and 10B, which are arranged adjacent to each other and hold substrates W respectively; a plurality of units 20, which are arranged corresponding to the carriers 10A and 10B, respectively, move relative to the held substrates W, and process the terminals P of the substrates W; and a first shielding plate 30, which moves following the unit 20B (20C) arranged corresponding to the carrier 10A (10B), and shields the unit 20C (20B) arranged corresponding to the adjacent carrier 10B (10A). In addition, the units 20B and 20C are attachment units for attaching the ACF 100 to the terminals P of the substrate W.

在現有的基板處理裝置中,在進行ACF帶的更換作業或維護作業時,為了確保操作員的安全,需要使裝置整體停止。另一方面,由於裝置整體的停止,存在生產性下降的問題。因此,為了不降低生產性,考慮僅使相鄰配置的基板處理裝置的其中一者停止,使另一者繼續運轉。在此情況下,為了操作員的安全,考慮在基板處理裝置中設置對兩者的區域進行遮蔽的遮蔽板。In existing substrate processing devices, when performing ACF tape replacement or maintenance work, the entire device needs to be stopped to ensure the safety of operators. On the other hand, there is a problem of reduced productivity due to the stop of the entire device. Therefore, in order not to reduce productivity, it is considered to stop only one of the adjacent substrate processing devices and continue to operate the other. In this case, for the safety of operators, it is considered to set a shielding plate in the substrate processing device to shield the areas of both.

因此,當欲在相鄰配置的基板處理裝置之間設置遮蔽板時,在遮蔽板的周邊需要用於供各個單元無障礙地移動的空間,所述空間會導致裝置整體的大型化。如此,若為了提高生產性並且確保操作員的安全而設置遮蔽板,則會產生裝置整體大型化的問題。Therefore, when a shielding plate is to be installed between adjacent substrate processing devices, a space is required around the shielding plate for each unit to move without hindrance, which results in an increase in the size of the entire device. Thus, if a shielding plate is installed to improve productivity and ensure operator safety, the problem of an increase in the size of the entire device occurs.

因此,在本實施方式的基板處理裝置1中,由於設置於單元20的第一遮蔽板30對接近的相鄰的單元20進行遮蔽,因此可不受相鄰的單元20的移動的影響而安全地進行作為維護物件的單元20的維護作業。進而,由於第一遮蔽板30追隨於單元20而移動,因此與在相鄰的載台10之間將遮蔽板固定地設置於單元20B和單元20C之間的情況相比,可節省用於設置遮蔽板的空間。Therefore, in the substrate processing apparatus 1 of the present embodiment, since the first shielding plate 30 provided in the unit 20 shields the adjacent unit 20, the maintenance work of the unit 20 as the maintenance object can be safely performed without being affected by the movement of the adjacent unit 20. Furthermore, since the first shielding plate 30 moves following the unit 20, the space for installing the shielding plate can be saved compared to the case where the shielding plate is fixedly provided between the unit 20B and the unit 20C between the adjacent stages 10.

(2)貼附單元包括:供給卷軸211,對基板W供給貼附於脫模帶的所述ACF;以及回收卷軸261,回收脫模帶R,供給卷軸211以使所述供給卷軸211的安裝面朝向從貼附單元裝卸供給卷軸211的一側的方式相對於第一遮蔽板30傾斜地設置。由此,在對供給卷軸211進行裝卸的一側,供給卷軸211的安裝位置露出,另外,可在供給卷軸211與第一遮蔽板30之間確保X方向上的空間,因此,操作員可容易地卸下供給卷軸211,而且可容易地安裝供給卷軸211。(2) The attaching unit includes: a supply reel 211 for supplying the ACF attached to the release tape to the substrate W; and a recovery reel 261 for recovering the release tape R, wherein the supply reel 211 is arranged to be inclined relative to the first shielding plate 30 so that the mounting surface of the supply reel 211 faces the side on which the supply reel 211 is loaded and unloaded from the attaching unit. Thus, the mounting position of the supply reel 211 is exposed on the side on which the supply reel 211 is loaded and unloaded, and a space in the X direction can be ensured between the supply reel 211 and the first shielding plate 30, so that the operator can easily remove the supply reel 211 and can easily install the supply reel 211.

(3)貼附單元包括:供給卷軸211,對基板W供給貼附於脫模帶的所述ACF;以及回收卷軸261,回收脫模帶R,回收卷軸261以使所述回收卷軸261的安裝面朝向從貼附單元裝卸回收卷軸261的一側的方式相對於第一遮蔽板30傾斜地設置。由此,在對回收卷軸261進行裝卸的一側,回收卷軸261的安裝位置露出,另外,可在回收卷軸261與第一遮蔽板30之間確保X方向上的空間,因此操作人員可容易地卸下回收卷軸261,而且可容易地安裝回收卷軸261。(3) The attaching unit includes: a supply reel 211 for supplying the ACF attached to the release tape to the substrate W; and a recovery reel 261 for recovering the release tape R, wherein the recovery reel 261 is provided at an angle relative to the first shielding plate 30 so that the mounting surface of the recovery reel 261 faces the side where the recovery reel 261 is loaded and unloaded from the attaching unit. Thus, the mounting position of the recovery reel 261 is exposed on the side where the recovery reel 261 is loaded and unloaded, and a space in the X direction can be ensured between the recovery reel 261 and the first shielding plate 30, so that the operator can easily remove the recovery reel 261 and can easily install the recovery reel 261.

(4)本實施方式的第一遮蔽板30設置於單元20B、單元20C。由此,無需另行設置用於追隨單元20B、單元20C而使第一遮蔽板30移動的移動機構,因此可簡化基板處理裝置1的結構。(4) The first shielding plate 30 of the present embodiment is provided in the unit 20B and the unit 20C. Therefore, there is no need to separately provide a moving mechanism for moving the first shielding plate 30 in accordance with the unit 20B and the unit 20C, thereby simplifying the structure of the substrate processing apparatus 1.

(5)本實施方式的第一遮蔽板30、第二遮蔽板40包含透明的構件。由此,不會遮擋來自基板處理裝置1周邊的照明等,因此也可不設置維護作業用的新的照明。另外,由於容易掌握單元20或載台10的狀態,因此可更安全地進行作業。(5) The first shielding plate 30 and the second shielding plate 40 of the present embodiment include transparent components. Thus, the lighting from the periphery of the substrate processing apparatus 1 is not blocked, and thus it is not necessary to provide new lighting for maintenance work. In addition, since the status of the unit 20 or the stage 10 is easy to grasp, the work can be performed more safely.

(6)通過由固定蓋410與擋板420構成第二遮蔽板40,從而在裝置運行中,將容易產生塵埃、帶屑、微細的塵霧(以下稱為垃圾)的單元側與載台側分隔,由此能夠防止垃圾附著於基板W,並且即便在維護中,也能夠防止及減輕垃圾從單元20側進入載台10側。另外,也能夠通過利用單元20與載台10側的氣壓差製造空氣的流動,從而進一步實現垃圾的防止及減輕。進而,具有用於阻止在維護中因誤動作等而載台向單元20側移動的防護擋板的作用,從而能夠確保作業者的安全性。(6) By forming the second shielding plate 40 by the fixed cover 410 and the baffle plate 420, the unit side where dust, debris, and fine dust mist (hereinafter referred to as garbage) are easily generated during the operation of the device is separated from the stage side, thereby preventing the garbage from being attached to the substrate W, and preventing and reducing the garbage from entering the stage 10 side from the unit 20 side even during maintenance. In addition, it is also possible to create air flow by utilizing the air pressure difference between the unit 20 and the stage 10 side, thereby further achieving the prevention and reduction of garbage. Furthermore, it has the function of a protective baffle for preventing the stage from moving to the unit 20 side due to erroneous operation during maintenance, thereby ensuring the safety of the operator.

[變形例] 所述實施方式的載台10A、載台10B分別保持兩塊基板W,但也可分別保持一塊基板W。在此情況下,可針對各基板W各設置一台共計兩台單元20,也可針對各基板W各設置兩台共計四台單元20。在針對一塊基板W設置兩台單元20的情況下,例如也可為其中一個單元20在設置於基板W的左半部分的端子P貼附ACF 100,另一個單元20在設置於基板W的右半部分的端子P貼附ACF 100。 [Variation] The stage 10A and the stage 10B of the embodiment respectively hold two substrates W, but they may respectively hold one substrate W. In this case, two units 20 may be provided for each substrate W, or two units 20 may be provided for each substrate W, for a total of four units 20. In the case where two units 20 are provided for one substrate W, for example, one of the units 20 may attach the ACF 100 to the terminal P provided on the left half of the substrate W, and the other unit 20 may attach the ACF 100 to the terminal P provided on the right half of the substrate W.

所述實施方式的載台10設置有兩台載台10A、10B,但並不限於此。例如,如圖14所示,也可設置三台載台10A、10B、10C。在圖14中,在包括與基板處理裝置1相同的結構的基板處理裝置2中,在所述實施方式的結構的兩台載台10之間設置載台10C,在與載台10C對應地設置的單元20E、單元20F設置有第一遮蔽板30。在此情況下,在進行與載台10A對應的單元20A、單元20B的維護作業的情況下,由於載台10B、載台10C正在運轉,因此與所述實施方式同樣,單元20A、單元20B移動至基板處理裝置2的能夠移動的X方向上的最左側而退避。另外,在進行與載台10B對應的單元20C、單元20D的維護作業的情況下,由於載台10A、載台10C正在運轉,因此與所述實施方式同樣,單元20C、單元20D移動至基板處理裝置2的能夠移動的X方向上的最右側而退避。在進行與載台10C對應的單元20E、單元20F的維護作業的情況下,由於載台10A、載台10B正在運轉,因此單元20E、單元20F移動至載台10C的中央。此時,由於設置於單元20E的第一遮蔽板30設置於正在運轉的載台10A側,設置於單元20F的第一遮蔽板30設置於正在運轉的載台10B側,因此可安全地進行單元20E、單元20F的維護作業。此外,在圖14中,關於基板W,為了便於說明,省略了圖示。如此,也可在載台10A、載台10B之間設置多個相當於載台10C的載台。The stage 10 of the embodiment is provided with two stages 10A and 10B, but the present invention is not limited thereto. For example, as shown in FIG14 , three stages 10A, 10B, and 10C may be provided. In FIG14 , in a substrate processing apparatus 2 having the same structure as the substrate processing apparatus 1, a stage 10C is provided between the two stages 10 of the structure of the embodiment, and a first shielding plate 30 is provided in the unit 20E and the unit 20F provided corresponding to the stage 10C. In this case, when the maintenance work of the unit 20A and the unit 20B corresponding to the stage 10A is performed, since the stage 10B and the stage 10C are in operation, the unit 20A and the unit 20B are moved to the leftmost side in the X direction in which the substrate processing apparatus 2 can move and retreat, as in the above-mentioned embodiment. In addition, when the maintenance work of the unit 20C and the unit 20D corresponding to the stage 10B is performed, since the stage 10A and the stage 10C are in operation, the unit 20C and the unit 20D are moved to the rightmost side in the X direction in which the substrate processing apparatus 2 can move and retreat, as in the above-mentioned embodiment. When the maintenance work of the unit 20E and the unit 20F corresponding to the stage 10C is performed, since the stage 10A and the stage 10B are in operation, the unit 20E and the unit 20F move to the center of the stage 10C. At this time, since the first shielding plate 30 provided in the unit 20E is provided on the side of the stage 10A in operation, and the first shielding plate 30 provided in the unit 20F is provided on the side of the stage 10B in operation, the maintenance work of the unit 20E and the unit 20F can be performed safely. In addition, in FIG. 14, for the convenience of explanation, the substrate W is omitted from the illustration. In this way, a plurality of stages equivalent to the stage 10C can also be provided between the stages 10A and the stages 10B.

進而,例如,如圖15所示,在包括與基板處理裝置1相同的結構的基板處理裝置3中,也可僅設置一台載台10。在此情況下,通過將一台載台分成兩個區域AA、BB,可使一台載台10虛擬地作為兩台載台10A、10B發揮功能。15, in a substrate processing apparatus 3 having the same structure as the substrate processing apparatus 1, only one stage 10 may be provided. In this case, by dividing one stage into two areas AA and BB, one stage 10 can virtually function as two stages 10A and 10B.

除了基板處理裝置1~基板處理裝置3所示的內容以外,多個載台10與多個單元20、保持於載台10的基板數可進行各種組合。無論在何種情況下,只要在進行維護的單元20設置第一遮蔽板30即可,以便可從與停止運轉並進行維護的單元20相鄰地持續運轉的單元20進行遮蔽。In addition to the contents shown in the substrate processing apparatus 1 to the substrate processing apparatus 3, various combinations of the plurality of stages 10 and the plurality of units 20 and the number of substrates held on the stages 10 can be performed. In any case, it is sufficient to provide the first shielding plate 30 in the unit 20 for maintenance so that the unit 20 that continues to operate adjacent to the unit 20 that stops operating and performs maintenance can be shielded.

所述實施方式的第一遮蔽板30或第二遮蔽板40包含透明的構件,但也可包含不透明的構件。由此,可動的單元不會進入操作員的視野,因此可在不會對載台10或單元20的正常動作感到意外的情況下安心地進行作業。The first shielding plate 30 or the second shielding plate 40 of the embodiment includes a transparent component, but may also include an opaque component. Thus, the movable unit will not enter the operator's field of vision, so the operator can work safely without being surprised by the normal movement of the stage 10 or the unit 20.

另外,第一遮蔽板30或第二遮蔽板40並不限於亞克力或聚碳酸酯等樹脂構件,也可為鋁或不銹鋼等金屬構件。只要具有可對操作員進行防護的強度即可。另外,也可為網或穿孔板等具有開口的構件。此種具有開口的構件可輕量地製成,適於追隨於單元20而移動。進而,由於具有通氣性,因此可抑制伴隨遮蔽板的移動而揚起的風,從而可抑制粒子的發散。另外,也可減少成為移動的負荷的空氣阻力。In addition, the first shielding plate 30 or the second shielding plate 40 is not limited to a resin member such as acrylic or polycarbonate, and may be a metal member such as aluminum or stainless steel. As long as it has a strength that can protect the operator. In addition, it may be a member with an opening such as a net or a perforated plate. Such a member with an opening can be made lightweight and is suitable for following the movement of the unit 20. Furthermore, since it is breathable, the wind that is raised when the shielding plate moves can be suppressed, thereby suppressing the dispersion of particles. In addition, the air resistance that becomes a load of movement can also be reduced.

未必需要設置所述實施方式的第二遮蔽板40。在進行卷軸更換等維護的情況下,與所述單元20成組的單元20也停止。另外,所述單元20所對應的載台10也停止。進而,操作員所處的區域M相對於所述載台10隔著單元20,因此所述載台不會與操作員直接接觸。因此,也可沒有第二遮蔽板40。The second shielding plate 40 of the embodiment is not necessarily required. When performing maintenance such as reel replacement, the unit 20 grouped with the unit 20 is also stopped. In addition, the stage 10 corresponding to the unit 20 is also stopped. Furthermore, the area M where the operator is located is separated from the stage 10 by the unit 20, so the stage does not come into direct contact with the operator. Therefore, the second shielding plate 40 may not be provided.

但是,通過設置所述實施方式的第二遮蔽板40,可防止因維護而產生的粒子向基板W飛散。However, by providing the second shielding plate 40 of the above-described embodiment, particles generated by maintenance can be prevented from scattering toward the substrate W.

另外,第二遮蔽板40也可為不開閉的固定的一塊板。可簡化結構。另外,在此情況下,第二遮蔽板40也可不固定配置於基板處理裝置1,而是搭載於單元20的前表面。由此,也可防止因維護而產生的粒子向基板W飛散。此外,若將第二遮蔽板40固定於基板處理裝置1,則可減輕單元20的應移動驅動的品質,因此容易確保處理時的移動的精度或速度。In addition, the second shielding plate 40 may also be a fixed plate that does not open or close. The structure can be simplified. In addition, in this case, the second shielding plate 40 may not be fixedly arranged on the substrate processing device 1, but may be mounted on the front surface of the unit 20. In this way, particles generated by maintenance can be prevented from scattering to the substrate W. In addition, if the second shielding plate 40 is fixed to the substrate processing device 1, the quality of the moving drive of the unit 20 can be reduced, so it is easy to ensure the accuracy or speed of movement during processing.

所述實施方式的第二遮蔽板40包含固定蓋410與擋板420此兩個組件,擋板420設置於台架側,也可在固定蓋側設置擋板420。在任一情況下,均可同樣地獲得確保安全性、防振的效果。通過將擋板420搭載於配置在上部的固定蓋,成為擋板420自身的維護形態,特別是可容易地手動開閉。The second shielding plate 40 of the embodiment includes two components, namely, a fixed cover 410 and a baffle 420. The baffle 420 is arranged on the side of the platform, or on the side of the fixed cover. In either case, the effect of ensuring safety and vibration prevention can be obtained in the same manner. By placing the baffle 420 on the fixed cover arranged on the upper part, the baffle 420 itself can be maintained, and in particular, it can be easily opened and closed manually.

所述實施方式的第二遮蔽板40包含固定蓋410與擋板420此兩個組件,但並不限於此。只要可妨礙載台10進入進行作業的區域即可,例如,也可僅為擋板420。因此,擋板420也可設置於頂面側而非台架側。此外,通過設置於台架側,伴隨著擋板的開閉動作的粒子不易到達基板W的表面。通過將擋板420設置於頂面側,例如可由相鄰的多個載台10所共有。由此,可減少擋板420的台數,因此可降低裝置的成本。此處,所謂共有,是指擋板420可在頂面通過滑塊在載台10間移動,可移動至進行維護的載台10側而進行伴隨維護的危險的規避或防塵。The second shielding plate 40 of the embodiment includes two components, namely a fixed cover 410 and a baffle 420, but is not limited thereto. As long as it can prevent the stage 10 from entering the area where the operation is performed, for example, it can be only the baffle 420. Therefore, the baffle 420 can also be set on the top side instead of the stage side. In addition, by being set on the stage side, particles accompanying the opening and closing action of the baffle are less likely to reach the surface of the substrate W. By setting the baffle 420 on the top side, for example, it can be shared by multiple adjacent stages 10. As a result, the number of baffles 420 can be reduced, thereby reducing the cost of the device. Here, the so-called shared means that the baffle 420 can be moved between the platforms 10 on the top surface through a slider, and can be moved to the side of the platform 10 where maintenance is performed to avoid dangers or prevent dust accompanying the maintenance.

所述實施方式的第二遮蔽板40可手動開閉,也可通過未圖示的控制機構來開閉。另外,第二遮蔽板40也可將用於供單元20對保持於載台10的基板W的端子P進行ACF 100的貼附的區域開口,從而不僅確保操作員的安全,而且也防止從單元20產生的灰塵等附著於基板W。The second shielding plate 40 of the embodiment can be opened and closed manually or by a control mechanism not shown. In addition, the second shielding plate 40 can also open the area for the unit 20 to attach the ACF 100 to the terminal P of the substrate W held on the stage 10, thereby not only ensuring the safety of the operator but also preventing dust generated by the unit 20 from being attached to the substrate W.

第二遮蔽板40的控制機構例如在操作員將裝置設定為維護模式的情況下,自動地關閉第二遮蔽板40的擋板420,在解除了維護模式時,打開第二遮蔽板40的擋板420。關於向維護模式的設定變更,可在裝置設置向維護模式的切換按鈕或開關,也可從連接於裝置的輸入裝置進行設定變更。另外,也可由操作員對裝置的維護門(區域M側的門)的開閉進行檢測,並與其聯動地進行第二遮蔽板40的擋板420的開閉動作。The control mechanism of the second shielding plate 40, for example, automatically closes the baffle 420 of the second shielding plate 40 when the operator sets the device to the maintenance mode, and opens the baffle 420 of the second shielding plate 40 when the maintenance mode is canceled. Regarding the setting change to the maintenance mode, a switch button or switch to the maintenance mode can be set in the device, and the setting change can also be made from an input device connected to the device. In addition, the operator can detect the opening and closing of the maintenance door (door on the side of the area M) of the device, and the opening and closing action of the baffle 420 of the second shielding plate 40 can be performed in conjunction with it.

所述實施方式的第一遮蔽板30設置於單元20,但並不限於此。例如,如圖16所示,也可將追隨於單元20而移動的移動機構N設置於第一遮蔽板30,並通過所述移動機構使第一遮蔽板30移動。在此情況下,可將移動機構N設置於基板處理裝置1的頂面側。由此,能夠不受多個單元20的移動機構的配置的限制地設置移動機構N。The first shielding plate 30 of the embodiment is provided at the unit 20, but the present invention is not limited thereto. For example, as shown in FIG. 16 , a moving mechanism N that moves following the unit 20 may be provided at the first shielding plate 30, and the first shielding plate 30 may be moved by the moving mechanism. In this case, the moving mechanism N may be provided at the top side of the substrate processing apparatus 1. Thus, the moving mechanism N can be provided without being restricted by the arrangement of the moving mechanisms of the plurality of units 20.

另外,也可由操作員手動設置第一遮蔽板30。在此情況下,在所述實施方式中,操作員可將第一遮蔽板30選擇性地設置於單元20A、單元20B靠近基板處理裝置1的最左側而退避時與單元20C、單元20D靠近基板處理裝置1的最右側而退避時的兩處位置。由此,與所述實施方式同樣,操作員可安全地進行維護作業。此外,第一遮蔽板30的設置與所述實施方式同樣地,既可在單元20的遮蔽板保持部27進行,也可設置於基板處理裝置自身。Alternatively, the first shielding plate 30 may be manually set by the operator. In this case, in the embodiment, the operator may selectively set the first shielding plate 30 at two locations: when the units 20A and 20B are close to the leftmost side of the substrate processing apparatus 1 and retreat, and when the units 20C and 20D are close to the rightmost side of the substrate processing apparatus 1 and retreat. Thus, the operator can safely perform maintenance work, as in the embodiment. In addition, the first shielding plate 30 may be set at the shielding plate holding portion 27 of the unit 20, or may be set at the substrate processing apparatus itself, as in the embodiment.

所述實施方式的單元20包括供給部21、切斷部22、貼附部23、剝離部24、搬送部25及回收部26,但並不限於此。單元20只要至少包括貼附部23即可,關於其他結構、即供給部21、切斷部22、剝離部24、搬送部25及回收部26,可設為與單元20不同的結構。The unit 20 of the embodiment includes a supply unit 21, a cutting unit 22, a bonding unit 23, a peeling unit 24, a conveying unit 25, and a collecting unit 26, but is not limited thereto. The unit 20 only needs to include at least the bonding unit 23, and the other structures, namely the supply unit 21, the cutting unit 22, the peeling unit 24, the conveying unit 25, and the collecting unit 26, can be different from the unit 20.

在所述實施方式的黏接帶S通過切斷部22形成有成為切縫的半切割線HC,但並不限於此。黏接帶S也可使用預先根據端子P的尺寸形成有切縫的黏接帶。另外,未必需要在黏接帶S形成有切縫,例如也可遍及黏接帶S的整個面開設無數微細的孔,並通過剝離部24以基板W的端部為邊界線加以撕裂。In the above-described embodiment, the adhesive tape S is provided with a half-cut line HC as a slit by the cutting portion 22, but the present invention is not limited thereto. The adhesive tape S may be provided with a slit in advance according to the size of the terminal P. In addition, the adhesive tape S does not necessarily need to be provided with a slit, and for example, the adhesive tape S may be provided with numerous fine holes over the entire surface, and the adhesive tape may be torn by the peeling portion 24 with the end of the substrate W as the boundary line.

關於所述實施方式的基板處理裝置1,以在基板W的端子P貼附ACF 100的裝置進行了說明,但也可以相同的結構例如設為對基板W的端子P進行清掃的裝置。當在基板W的端子P貼附ACF 100之前,有時也對基板W的端子P進行清掃。在此情況下,對基板W的端子P進行處理的單元20為對基板W的端子P進行清掃的清掃單元。在清掃單元捲繞未圖示的清掃帶作為帶狀構件T來代替作為帶狀構件T的ACF 100。另外,也可對清掃帶供給清洗液以提高清掃力。由此,清掃單元可對基板W的端子P進行清掃。當然,也可與圖4、圖5所示同樣地,向對清掃帶的清掃用供給卷軸或清掃用回收卷軸進行裝卸的一側傾斜,例如相對於Y方向傾斜15°地安裝。因此,基板處理裝置1除了設置進行貼附的載台以外,還可設置用於進行清掃的載台。另外,也可為用於進行清掃的基板處理裝置1。The substrate processing device 1 of the embodiment has been described as a device for attaching the ACF 100 to the terminal P of the substrate W, but the same structure may also be used as a device for cleaning the terminal P of the substrate W, for example. Before attaching the ACF 100 to the terminal P of the substrate W, the terminal P of the substrate W is sometimes cleaned. In this case, the unit 20 for processing the terminal P of the substrate W is a cleaning unit for cleaning the terminal P of the substrate W. A cleaning tape not shown is wound around the cleaning unit as a tape-shaped member T instead of the ACF 100 as the tape-shaped member T. In addition, a cleaning liquid may be supplied to the cleaning tape to enhance the cleaning force. Thus, the cleaning unit can clean the terminal P of the substrate W. Of course, as shown in FIG. 4 and FIG. 5 , the cleaning supply reel or the cleaning recovery reel of the cleaning tape may be tilted toward the side where the cleaning supply reel or the cleaning recovery reel is loaded and unloaded, for example, 15° relative to the Y direction. Therefore, in addition to the mounting platform for attachment, the substrate processing device 1 may also be provided with a mounting platform for cleaning. In addition, the substrate processing device 1 may also be used for cleaning.

使設置於所述實施方式的單元20的卷軸(供給卷軸、回收卷軸)向單元20的後側傾斜。關於所述傾斜,示出了15°的示例。其中,所述傾斜的角度例如可根據單元20與遮蔽板的間隔、卷軸的直徑、寬度等尺寸、至操作員所處的區域M為止的距離等適宜決定為最佳的角度。The reels (supply reel, recovery reel) of the unit 20 of the embodiment are tilted toward the rear side of the unit 20. An example of the tilt is 15°. The tilt angle can be appropriately determined to be the best angle based on, for example, the interval between the unit 20 and the shielding plate, the diameter and width of the reels, the distance to the area M where the operator is located, and the like.

另外,未必需要使所有的卷軸傾斜。優選為使與遮蔽板相向的卷軸傾斜。但是,不與遮蔽板相向的卷軸也可沿著Y方向(0°)。在此情況下,如上所述,在具有用於更換卷軸的充分的空間,且對卷軸的更換無障礙的狀態下,可使基板處理裝置1緊湊。In addition, it is not necessary to tilt all the reels. It is preferred to tilt the reels facing the shielding plate. However, the reels not facing the shielding plate may be along the Y direction (0°). In this case, as described above, the substrate processing device 1 can be made compact with sufficient space for replacing the reels and no obstruction to the replacement of the reels.

[其他實施方式] 以上,已對本發明的實施方式及各部的變形例進行了說明,但所述實施方式或各部的變形例是作為一例而提示,並不意圖對發明的範圍進行限定。所述這些新穎的實施方式能夠以其他各種方式來實施,可在不脫離發明的要旨的範圍內進行各種省略、置換、變更。這些實施方式或其變形包含於發明的範圍或要旨中,並且包含於申請專利範圍所記載的發明中。 [Other embodiments] The embodiments and variations of the present invention have been described above, but the embodiments or variations of the embodiments are provided as examples and are not intended to limit the scope of the invention. These novel embodiments can be implemented in various other ways and can be omitted, replaced, or modified without departing from the gist of the invention. These embodiments or variations thereof are included in the scope or gist of the invention and are included in the invention described in the scope of the patent application.

1、2、3:基板處理裝置 10、10A、10B、10C:載台 20、20A、20B、20C、20D、20E、20F:單元 21:供給部 211:供給卷軸 212:張緊機構 212a:固定輥 212b:可動輥 213:路徑輥 22:切斷部 221:切刀 222:支承構件 222a:平坦面 23:貼附部 231:加壓頭 231a:緩衝構件 24:剝離部 241、242:剝離棒 25:搬送部 251:輸送輥 26:回收部 261:回收卷軸 262:路徑輥 27:遮蔽板保持部 30:第一遮蔽板 40:第二遮蔽板 410:固定蓋 420:擋板 80:控制部 81:機構控制部 82:儲存部 83:輸入輸出控制部 91:輸入裝置 92:輸出裝置 100:ACF A、B、AA、BB:區域 HC:半切割線 M:區域 N:移動機構 P:端子 R:脫模帶 S:黏接帶 S01~S10:步驟 T:帶狀構件 W:基板 X、Y、Z:方向 1, 2, 3: substrate processing device 10, 10A, 10B, 10C: stage 20, 20A, 20B, 20C, 20D, 20E, 20F: unit 21: supply section 211: supply reel 212: tensioning mechanism 212a: fixed roller 212b: movable roller 213: path roller 22: cutting section 221: cutter 222: support member 222a: flat surface 23: attachment section 231: pressure head 231a: buffer member 24: stripping section 241, 242: stripping rods 25: conveying section 251: conveyor roller 26: recovery unit 261: recovery reel 262: path roller 27: shield plate holding unit 30: first shield plate 40: second shield plate 410: fixed cover 420: baffle 80: control unit 81: mechanism control unit 82: storage unit 83: input and output control unit 91: input device 92: output device 100: ACF A, B, AA, BB: area HC: half-cut line M: area N: moving mechanism P: terminal R: demoulding tape S: adhesive tape S01~S10: step T: belt member W: substrate X, Y, Z: direction

圖1是表示實施方式的基板處理裝置的平面圖。 圖2是表示實施方式的基板及其端子的平面圖。 圖3是表示實施方式的單元的正面圖。 圖4是表示實施方式的單元的平面圖。 圖5是表示實施方式的單元的平面圖。 圖6是表示實施方式的單元的左側面圖(A)、表示實施方式的單元的右側面圖(B)。 圖7是表示實施方式的單元整體與作業者的側面圖。 圖8是表示實施方式的單元的伸出的左端的正面圖(A)、表示實施方式的單元的伸出的右端的正面圖(B)。 圖9是表示實施方式的單元的移動的平面圖。 圖10是表示實施方式的單元的移動的平面圖。 圖11是表示實施方式的控制部的功能框圖。 圖12是表示實施方式的基板處理裝置的動作的流程圖。 圖13是表示實施方式的單元的退避的平面圖。 圖14是表示變形例的基板處理裝置的平面圖。 圖15是表示變形例的基板處理裝置的平面圖。 圖16是表示變形例的基板處理裝置的正面圖。 FIG. 1 is a plan view of a substrate processing device according to an embodiment. FIG. 2 is a plan view of a substrate and its terminals according to an embodiment. FIG. 3 is a front view of a unit according to an embodiment. FIG. 4 is a plan view of a unit according to an embodiment. FIG. 5 is a plan view of a unit according to an embodiment. FIG. 6 is a left side view (A) of a unit according to an embodiment, and a right side view (B) of a unit according to an embodiment. FIG. 7 is a side view of the entire unit according to an embodiment and an operator. FIG. 8 is a front view (A) of the extended left end of a unit according to an embodiment, and a front view (B) of the extended right end of a unit according to an embodiment. FIG. 9 is a plan view showing the movement of a unit according to an embodiment. FIG. 10 is a plan view showing the movement of a unit according to an embodiment. FIG. 11 is a functional block diagram of a control unit according to an embodiment. FIG. 12 is a flowchart showing the operation of the substrate processing apparatus of the embodiment. FIG. 13 is a plan view showing the retreat of the unit of the embodiment. FIG. 14 is a plan view showing a substrate processing apparatus of a modification. FIG. 15 is a plan view showing a substrate processing apparatus of a modification. FIG. 16 is a front view showing a substrate processing apparatus of a modification.

1:基板處理裝置 1: Substrate processing equipment

10、10A、10B:載台 10, 10A, 10B: Carrier

20、20A、20B、20C、20D:單元 20, 20A, 20B, 20C, 20D: Unit

30:第一遮蔽板 30: First shielding plate

40:第二遮蔽板 40: Second shielding plate

W:基板 W: Substrate

X、Y、Z:方向 X, Y, Z: direction

Claims (9)

一種基板處理裝置,包括:多個載台,相鄰地設置,且分別保持基板;多個單元,與所述載台的各個對應地設置,相對於保持於所述載台的所述基板移動,且對所述基板的端子進行處理;以及第一遮蔽板,追隨於所述單元而移動,對與相鄰的載台對應地設置的單元進行遮蔽。 A substrate processing device includes: a plurality of carriers, which are arranged adjacent to each other and hold substrates respectively; a plurality of units, which are arranged corresponding to each of the carriers, move relative to the substrates held on the carriers, and process the terminals of the substrates; and a first shielding plate, which moves following the units and shields the units arranged corresponding to the adjacent carriers. 如請求項1所述的基板處理裝置,其中所述單元為將黏接帶貼附於所述基板的端子的貼附單元。 A substrate processing device as described in claim 1, wherein the unit is a sticking unit that sticks the adhesive tape to the terminal of the substrate. 如請求項1所述的基板處理裝置,其中所述第一遮蔽板分別設置於與相鄰的所述載台對應地設置的所述單元彼此所相向的部位。 The substrate processing device as described in claim 1, wherein the first shielding plates are respectively arranged at the positions where the units arranged corresponding to the adjacent carriers face each other. 如請求項2所述的基板處理裝置,其中所述貼附單元包括:供給卷軸,對所述基板供給貼附於脫模帶的所述黏接帶;以及回收卷軸,回收所述脫模帶,所述供給卷軸以使所述供給卷軸的安裝面朝向從所述貼附單元裝卸所述供給卷軸的一側的方式相對於所述第一遮蔽板傾斜地設置,所述回收卷軸相對於所述第一遮蔽板與所述供給卷軸反向地傾斜設置。 The substrate processing device as described in claim 2, wherein the attachment unit includes: a supply reel for supplying the adhesive tape attached to the release tape to the substrate; and a recovery reel for recovering the release tape, the supply reel being arranged obliquely relative to the first shielding plate in such a manner that the mounting surface of the supply reel faces the side for loading and unloading the supply reel from the attachment unit, and the recovery reel being arranged obliquely relative to the first shielding plate in the opposite direction to the supply reel. 如請求項2所述的基板處理裝置,其中所述貼附單元包括:供給卷軸,對所述基板供給貼附於脫模帶的所述黏接帶;以及回收卷軸,回收所述脫模帶,所述回收卷軸以使所述回收卷軸的安裝面朝向從所述貼附單元裝卸所述回收卷軸的一側的方式相對於所述第一遮蔽板傾斜地設置。 The substrate processing device as described in claim 2, wherein the attachment unit includes: a supply reel for supplying the adhesive tape attached to the release tape to the substrate; and a recovery reel for recovering the release tape, wherein the recovery reel is arranged obliquely relative to the first shielding plate in such a manner that the mounting surface of the recovery reel faces a side for loading and unloading the recovery reel from the attachment unit. 如請求項3所述的基板處理裝置,其中所述單元包括:清掃單元,對所述基板清掃所述端子;清掃用供給卷軸,供給對所述端子進行清掃的清掃帶;以及清掃用回收卷軸,回收所述清掃帶,所述清掃用供給卷軸以使所述清掃用供給卷軸的安裝面朝向從所述單元裝卸所述清掃用供給卷軸的一側的方式相對於所述第一遮蔽板傾斜地設置。 A substrate processing device as described in claim 3, wherein the unit includes: a cleaning unit for cleaning the terminals of the substrate; a cleaning supply reel for supplying a cleaning tape for cleaning the terminals; and a cleaning recovery reel for recovering the cleaning tape, wherein the cleaning supply reel is arranged obliquely relative to the first shielding plate in such a manner that the mounting surface of the cleaning supply reel faces a side for loading and unloading the cleaning supply reel from the unit. 如請求項3所述的基板處理裝置,其中所述單元包括:清掃單元,對所述基板清掃所述端子;清掃用供給卷軸,供給對所述端子進行清掃的清掃帶;以及清掃用回收卷軸,回收所述清掃帶,所述清掃用回收卷軸以使所述清掃用回收卷軸的安裝面朝向 從所述單元裝卸所述清掃用回收卷軸的一側的方式相對於所述第一遮蔽板傾斜地設置。 A substrate processing device as described in claim 3, wherein the unit includes: a cleaning unit for cleaning the terminals of the substrate; a cleaning supply reel for supplying a cleaning tape for cleaning the terminals; and a cleaning recovery reel for recovering the cleaning tape, wherein the cleaning recovery reel is arranged obliquely relative to the first shielding plate in such a manner that the mounting surface of the cleaning recovery reel faces a side for loading and unloading the cleaning recovery reel from the unit. 如請求項4至請求項7中任一項所述的基板處理裝置,其中在所述載台與所述單元間包括第二遮蔽板,所述第二遮蔽板沿著與所述第一遮蔽板正交的方向,且設置於所述第二遮蔽板的下端不與所述基板發生干涉的位置。 A substrate processing device as described in any one of claim 4 to claim 7, wherein a second shielding plate is included between the carrier and the unit, the second shielding plate is along a direction orthogonal to the first shielding plate, and is arranged at a position where the lower end of the second shielding plate does not interfere with the substrate. 如請求項8所述的基板處理裝置,其中所述第二遮蔽板包括:固定蓋,設置於不與所述基板發生干涉的高度;以及擋板,設置於比所述固定蓋更靠下方,所述擋板具有對所述固定蓋的下端與所述擋板的上端之間進行調整的上下升降機構,保持有所述基板的所述載台在所述固定蓋與所述擋板之間前後移動。 The substrate processing device as described in claim 8, wherein the second shielding plate includes: a fixed cover, which is set at a height that does not interfere with the substrate; and a baffle, which is set below the fixed cover, and the baffle has an up-and-down lifting mechanism for adjusting between the lower end of the fixed cover and the upper end of the baffle, and the carrier holding the substrate moves back and forth between the fixed cover and the baffle.
TW112111854A 2022-03-30 2023-03-29 Substrate processing equipment TWI844321B (en)

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JP2023048583A JP2023152878A (en) 2022-03-30 2023-03-24 Substrate processing device
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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007060855A1 (en) * 2005-11-22 2007-05-31 Matsushita Electric Industrial Co., Ltd. Bonding sheet sticking equipment and method
TW200823139A (en) * 2006-05-17 2008-06-01 Shibaura Mechatronics Corp Tape sticking device
JP2008182041A (en) * 2007-01-24 2008-08-07 Shibaura Mechatronics Corp Mounting device
WO2015068607A1 (en) * 2013-11-07 2015-05-14 東レエンジニアリング株式会社 Bonding apparatus
TW201942992A (en) * 2018-03-29 2019-11-01 日商芝浦機械電子裝置股份有限公司 Adhesive tape sticking device including a supplying part, a sticking part, a conveying part, a lighting part, an imaging part and a determination part

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007060855A1 (en) * 2005-11-22 2007-05-31 Matsushita Electric Industrial Co., Ltd. Bonding sheet sticking equipment and method
TW200823139A (en) * 2006-05-17 2008-06-01 Shibaura Mechatronics Corp Tape sticking device
JP2008182041A (en) * 2007-01-24 2008-08-07 Shibaura Mechatronics Corp Mounting device
WO2015068607A1 (en) * 2013-11-07 2015-05-14 東レエンジニアリング株式会社 Bonding apparatus
TW201942992A (en) * 2018-03-29 2019-11-01 日商芝浦機械電子裝置股份有限公司 Adhesive tape sticking device including a supplying part, a sticking part, a conveying part, a lighting part, an imaging part and a determination part

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