[go: up one dir, main page]

TWI703689B - Leadframe substrate having modulator and crack inhibiting structure and flip chip assembly using the same - Google Patents

Leadframe substrate having modulator and crack inhibiting structure and flip chip assembly using the same Download PDF

Info

Publication number
TWI703689B
TWI703689B TW108114292A TW108114292A TWI703689B TW I703689 B TWI703689 B TW I703689B TW 108114292 A TW108114292 A TW 108114292A TW 108114292 A TW108114292 A TW 108114292A TW I703689 B TWI703689 B TW I703689B
Authority
TW
Taiwan
Prior art keywords
adjusting member
metal
resin layer
lead frame
frame substrate
Prior art date
Application number
TW108114292A
Other languages
Chinese (zh)
Other versions
TW202008535A (en
Inventor
文強 林
王家忠
Original Assignee
鈺橋半導體股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US16/046,243 external-priority patent/US20180359886A1/en
Priority claimed from US16/279,696 external-priority patent/US11291146B2/en
Application filed by 鈺橋半導體股份有限公司 filed Critical 鈺橋半導體股份有限公司
Publication of TW202008535A publication Critical patent/TW202008535A/en
Application granted granted Critical
Publication of TWI703689B publication Critical patent/TWI703689B/en

Links

Images

Classifications

    • H10W70/433
    • H10W70/69
    • H10W40/25
    • H10W70/40
    • H10W70/461
    • H10W72/20
    • H10W72/90
    • H10W74/10
    • H10W70/60
    • H10W74/15
    • H10W90/724
    • H10W90/734

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)

Abstract

The leadframe substrate mainly includes a modulator, a plurality of metal leads, a resin layer and a crack inhibiting structure. The resin layer provides mechanical bonds between the modulator and the metal leads disposed about peripheral sidewalls of the modulator. The crack inhibiting structure includes a continuous interlocking fiber sheet that covers the modulator/resin interfaces, so that the segregation induced along the modulator/resin interfaces or cracks formed within the resin layer can be prevented or restrained from extending to the top surfaces, thereby ensuring the signal integrity of the flip chip assembly.

Description

具有調節件及防裂結構之導線架基板及其覆晶組體 Lead frame substrate with adjusting part and anti-cracking structure and flip chip assembly

本發明是關於一種導線架基板及其覆晶組體,尤指一種具有調節件且調節件/樹脂界面上設有防裂結構之導線架基板及其覆晶組體。 The present invention relates to a lead frame substrate and a flip chip assembly thereof, in particular to a lead frame substrate and a flip chip assembly having an adjusting member and an anti-cracking structure on the adjusting member/resin interface.

高效能微處理器及ASIC需要高效能線路板,以信號互連。然而,隨著功率增加,半導體晶片所產生的大量熱會使元件效能劣化,並對晶片造成熱應力。Wang等人之美國專利案號8,859,908、Sun之美國專利案號8,415,780、Wang等人之美國專利案號9,185,791及Lee之美國專利案號9,706,639揭露各種封裝基板,其將散熱元件設置於樹脂層壓板之貫穿開口中,以使半導體晶片所產生的熱可直接透過下方的散熱元件散出。如圖1所示,該散熱元件12係接合至周圍的樹脂層壓板14,其通常是經由兩者間的黏著劑17相互接合。然而,由於散熱元件12與樹脂層壓板14間有極大的熱膨脹係數(CTE)不匹配現象,故散熱元件12與樹脂層壓板14間的接觸區域容易龜裂。於此情況下,路由電路19必須設 於基板的樹脂層壓板部位,而設於散熱元件之半導體晶片只能經由接合線,連接至樹脂層壓板。該些接合線將半導體晶片I/O墊(圖未示)電性連接至樹脂層壓板上之路由電路,並與界面龜裂區相隔,以避免電斷離。因此,該些基板並不適用於覆晶組體,其中覆晶組體中的路由電路必須設於該散熱元件上,且延伸越過界面界線至樹脂層壓板部位上。 High-performance microprocessors and ASICs require high-performance circuit boards to be interconnected by signals. However, as the power increases, the large amount of heat generated by the semiconductor chip will degrade the performance of the device and cause thermal stress on the chip. U.S. Patent No. 8,859,908 of Wang et al., U.S. Patent No. 8,415,780 of Sun, U.S. Patent No. 9,185,791 of Wang et al., and U.S. Patent No. 9,706,639 of Lee disclose various package substrates, which dispose heat dissipation elements on a resin laminate. Through the opening, so that the heat generated by the semiconductor chip can be directly dissipated through the heat dissipation element below. As shown in FIG. 1, the heat dissipation element 12 is joined to the surrounding resin laminate 14, which is usually joined to each other via an adhesive 17 between the two. However, due to the significant coefficient of thermal expansion (CTE) mismatch between the heat dissipation element 12 and the resin laminate 14, the contact area between the heat dissipation element 12 and the resin laminate 14 is prone to cracks. In this case, the routing circuit 19 must be set In the resin laminate part of the substrate, the semiconductor chip placed on the heat sink can only be connected to the resin laminate through bonding wires. The bonding wires electrically connect the semiconductor chip I/O pads (not shown) to the routing circuit on the resin laminate, and are separated from the interface cracked area to avoid electrical disconnection. Therefore, these substrates are not suitable for flip-chip assemblies, where the routing circuits in the flip-chip assemblies must be provided on the heat dissipation element and extend beyond the interface boundary to the resin laminate.

有鑑於最近基板之各種發展階段及限制,目前亟需根本改善用於覆晶組體之基板熱-機械性質。 In view of the recent development stages and limitations of substrates, there is an urgent need to fundamentally improve the thermal-mechanical properties of substrates used in flip-chip assemblies.

本發明之主要目的係提供一種導線架基板,其設有高導熱性且低熱膨脹係數(CTE)之調節件。該調節件不僅可對組裝於上的晶片提供有效的散熱途徑,且可減少覆晶晶片與基板間CTE不匹配導致焊球裂損的瑕疵,進而確保覆晶的可靠度。 The main purpose of the present invention is to provide a lead frame substrate provided with a high thermal conductivity and low coefficient of thermal expansion (CTE) adjusting member. The adjusting member can not only provide an effective heat dissipation path for the chip assembled on it, but also can reduce the defects of solder ball cracking caused by the CTE mismatch between the flip chip and the substrate, thereby ensuring the reliability of the flip chip.

本發明之另一目的係提供一種導線架基板,其防裂結構覆蓋於調節件/樹脂界面,並側向延伸至調節件及樹脂層上。該防裂結構包含有連續交錯纖維片,故可避免或防止沿著調節件/樹脂界面引起之剝離或形成於樹脂層中之裂痕延伸進入結構頂面。因此,可確保基板之路由線及覆晶組體之信號完整度。 Another object of the present invention is to provide a lead frame substrate whose anti-cracking structure covers the adjustment member/resin interface and extends laterally to the adjustment member and the resin layer. The anti-cracking structure includes continuous interlaced fiber sheets, so it can avoid or prevent the peeling caused by the adjustment member/resin interface or the cracks formed in the resin layer from extending into the top surface of the structure. Therefore, the signal integrity of the routing lines of the substrate and the flip chip assembly can be ensured.

依據上述及其他目的,本發明提供一種導線架基板,其包括:複數金屬引線,其具有頂端及底端;一調節件,其具有平坦且平行之頂側及底側、位於該頂側之頂部接觸墊及位於該底側之底部接觸墊,該調節件設置於該些金屬引線所環繞之一指定位置內,其中該調節件之熱導率大於10W/mk,且熱膨脹係數小於10ppm/℃;一樹脂層,其填充於該些金屬引線間之空間中,並貼合至該調節件之外圍側壁;以及一第一防裂結構,其包括一第一連續交錯纖維片,該第一連續交錯纖維片覆蓋該調節件與該樹脂層間之界面,並進一步側向延伸於該調節件之該頂側、該些金屬引線之該些頂端及該樹脂層之頂面上,並覆蓋該調節件之該頂側、該些金屬引線之該些頂端及該樹脂層之該頂面。 According to the above and other objectives, the present invention provides a lead frame substrate, which includes: a plurality of metal leads having top and bottom ends; and an adjustment member having flat and parallel top and bottom sides, and a top on the top side The contact pad and the bottom contact pad located on the bottom side, the adjusting member is arranged in a designated position surrounded by the metal leads, wherein the thermal conductivity of the adjusting member is greater than 10W/mk, and the thermal expansion coefficient is less than 10ppm/°C; A resin layer filled in the space between the metal leads and attached to the peripheral side wall of the adjusting member; and a first anti-cracking structure including a first continuous interlaced fiber sheet, the first continuous interlacing The fiber sheet covers the interface between the adjustment member and the resin layer, and further extends laterally on the top side of the adjustment member, the top ends of the metal leads, and the top surface of the resin layer, and covers the adjustment member The top side, the top ends of the metal leads, and the top surface of the resin layer.

於另一態樣中,本發明更提供一種覆晶組體,其包括:上述導線架基板;以及一半導體晶片,其透過複數凸塊,電性連接至該導線架基板,該些凸塊設於該半導體晶片與該導線架基板間之空間,其中至少一該些凸塊重疊於該調節件上,並透過該第一防裂結構上之一第一路由線,電性連接至該些金屬引線。 In another aspect, the present invention further provides a flip chip assembly, which includes: the lead frame substrate described above; and a semiconductor chip, which is electrically connected to the lead frame substrate through a plurality of bumps, and the bumps are provided with In the space between the semiconductor chip and the lead frame substrate, at least one of the bumps overlaps the adjustment member and is electrically connected to the metals through a first routing line on the first anti-crack structure lead.

本發明之導線架基板具有許多優點。舉例來說,於樹脂層中提供低CTE調節件是特別具有優勢的,其原因在於,調節件之CTE可與半導體晶片的CTE相匹配。因此,可避免發生與晶片/基板CTE不匹配有關的互連凸塊裂損問題。此外,提供含有連續交錯纖維片之防裂結構可發揮保護作用,以避免沿著調節件/樹脂界面發生剝離(與調節件與樹脂間CTE不匹配有關),且該纖維片可進一步防止形成於樹脂層內之任何裂痕延伸至基板表面而破壞頂部路由線。 The lead frame substrate of the present invention has many advantages. For example, it is particularly advantageous to provide a low-CTE adjuster in the resin layer, because the CTE of the adjuster can match the CTE of the semiconductor wafer. Therefore, it is possible to avoid the problem of interconnect bump cracking related to the mismatch of wafer/substrate CTE. In addition, providing a crack-proof structure containing continuous interlaced fiber sheets can play a protective role to avoid peeling along the adjustment member/resin interface (related to the CTE mismatch between the adjustment member and the resin), and the fiber sheet can further prevent the formation of Any cracks in the resin layer extend to the surface of the substrate and damage the top routing line.

本發明之上述及其他特徵與優點可藉由下述較佳實施例之詳細敘述更加清楚明瞭。 The above and other features and advantages of the present invention can be more clearly understood by the detailed description of the following preferred embodiments.

100、120、130、200、220、230、300、400、410、420、500、600、700‧‧‧互連基板 100, 120, 130, 200, 220, 230, 300, 400, 410, 420, 500, 600, 700‧‧‧Interconnect substrate

110、210、310、510、610‧‧‧半導體組體 110, 210, 310, 510, 610‧‧‧ Semiconductor assembly

10‧‧‧導線架 10‧‧‧Wire frame

11、15‧‧‧金屬架 11、15‧‧‧Metal frame

13‧‧‧金屬引線 13‧‧‧Metal Lead

131‧‧‧外端 131‧‧‧External

133‧‧‧內端 133‧‧‧Inner end

136‧‧‧水平延伸部 136‧‧‧Horizontal extension

137‧‧‧垂直凸出部 137‧‧‧Vertical protrusion

16‧‧‧聯結桿 16‧‧‧Connecting rod

20‧‧‧調節件 20‧‧‧Adjustment piece

21‧‧‧導熱電絕緣塊 21‧‧‧Heat conduction and electrical insulation block

23‧‧‧頂部接觸墊 23‧‧‧Top contact pad

25‧‧‧底部接觸墊 25‧‧‧Bottom contact pad

27‧‧‧金屬貫孔 27‧‧‧Metal through hole

30‧‧‧樹脂層 30‧‧‧Resin layer

41、47‧‧‧第一接合樹脂 41、47‧‧‧First bonding resin

42、52‧‧‧內部路由線 42、52‧‧‧Internal routing line

424、464、484‧‧‧頂部金屬盲孔 424、464、484‧‧‧Blind metal hole on top

43‧‧‧第一線路層 43‧‧‧First circuit layer

45‧‧‧第一防裂結構 45‧‧‧The first anti-cracking structure

451‧‧‧第一連續交錯纖維片 451‧‧‧The first continuous interlaced fiber sheet

453‧‧‧第一接合基層 453‧‧‧First joint base

454‧‧‧盲孔 454‧‧‧Blind hole

46‧‧‧第一路由線 46‧‧‧First Route

48、58‧‧‧外部路由線 48、58‧‧‧External routing line

51‧‧‧第二接合樹脂 51‧‧‧Second bonding resin

53‧‧‧第二線路層 53‧‧‧Second circuit layer

55‧‧‧第二防裂結構 55‧‧‧Second anti-cracking structure

551‧‧‧第二連續交錯纖維片 551‧‧‧Second continuous interlaced fiber sheet

553‧‧‧第二接合基層 553‧‧‧Second Joint Base

56‧‧‧第二路由線 56‧‧‧Second routing line

524、564、584‧‧‧底部金屬盲孔 524、564、584‧‧‧Blind metal holes at the bottom

57‧‧‧第二接合樹脂 57‧‧‧Second bonding resin

61‧‧‧半導體晶片 61‧‧‧Semiconductor chip

71‧‧‧凸塊 71‧‧‧ bump

81‧‧‧底膠 81‧‧‧ Primer

91‧‧‧焊球 91‧‧‧Solder Ball

參考隨附圖式,本發明可藉由下述較佳實施例之詳細敘述更加清楚明瞭,其中:圖1為習知打線組體之剖視圖; 圖2及3分別為本發明第一實施例中,導線架之剖視圖及頂部立體示意圖;圖4及5分別為本發明第一實施例中,圖2及3結構中提供調節件之剖視圖及頂部立體示意圖;圖6及7分別為本發明第一實施例中,圖4及5結構上形成樹脂層之剖視圖及頂部立體示意圖;圖8為本發明第一實施例中,圖6結構上形成第一防裂結構之剖視圖;圖9為本發明第一實施例中,圖8結構上形成盲孔之剖視圖;圖10及11分別為本發明第一實施例中,圖9結構上形成第一路由線以完成導線架基板製作之剖視圖及頂部立體示意圖;圖12為本發明第一實施例中,半導體晶片電性連接至圖10導線架基板之半導體組體剖視圖;圖13為本發明第一實施例中,圖12之半導體組體中形成底膠之剖視圖;圖14為本發明第一實施例中,圖13之半導體組體中形成焊球之剖視圖;圖15為本發明第一實施例中,另一態樣之導線架基板剖視圖;圖16為本發明第一實施例中,又一態樣之導線架基板剖視圖;圖17為本發明第二實施例中,導線架基板之剖視圖;圖18為本發明第二實施例中,半導體晶片電性連接至圖17導線架基板之半導體組體剖視圖;圖19為本發明第二實施例中,另一態樣之導線架基板剖視圖;圖20為本發明第二實施例中,又一態樣之導線架基板剖視圖;圖21為本發明第三實施例中,導線架基板之剖視圖; 圖22為本發明第三實施例中,半導體晶片電性連接至圖21導線架基板之半導體組體剖視圖;圖23為本發明第四實施例中,導線架基板之剖視圖;圖24為本發明第四實施例中,另一態樣之導線架基板剖視圖;圖25為本發明第四實施例中,又一態樣之導線架基板剖視圖;圖26及27分別為本發明第五實施例中,具有導線架、調節件、樹脂層及第一線路層之剖視圖及頂部立體示意圖;圖28為本發明第五實施例中,圖26結構上形成第一防裂結構及第一路由線以完成導線架基板製作之剖視圖;圖29為本發明第五實施例中,半導體晶片電性連接至圖28導線架基板之半導體組體剖視圖;圖30為本發明第五實施例中,圖29結構進行裁切步驟後之剖視圖;圖31為本發明第六實施例中,具有導線架、調節件及樹脂層之剖視圖;圖32為本發明第六實施例中,圖31結構上形成第一線路層及第二線路層之剖視圖;圖33為本發明第六實施例中,圖32結構上形成第一防裂結構、第一路由線、第二防裂結構及第二路由線以完成導線架基板製作之剖視圖;圖34為本發明第六實施例中,半導體晶片電性連接至圖33導線架基板之半導體組體剖視圖;圖35為本發明第七實施例中,導線架之剖視圖;圖36為本發明第七實施例中,沿圖35線A-A之剖視圖;圖37為本發明第七實施例中,圖35結構上提供調節件之頂部平面圖; 圖38為本發明第七實施例中,沿圖37線A-A之剖視圖;圖39及40分別為本發明第七實施例中,圖38結構上形成樹脂層之頂部及底部平面圖;圖41為本發明第七實施例中,沿圖39線A-A之剖視圖;圖42為本發明第七實施例中,圖41結構上形成第一防裂結構及第一路由線之剖視圖;以及圖43為本發明第七實施例中,從圖42結構裁切出之導線架基板的底部平面圖。 With reference to the accompanying drawings, the present invention can be more clearly understood by the detailed description of the following preferred embodiments, in which: Figure 1 is a cross-sectional view of the conventional wire bonding assembly; Figures 2 and 3 are respectively the first embodiment of the present invention , The cross-sectional view and top perspective schematic view of the lead frame; Figures 4 and 5 are respectively the cross-sectional view and top perspective schematic view of the adjusting member provided in the structure of Figures 2 and 3 in the first embodiment of the present invention; Figures 6 and 7 are respectively the first embodiment of the present invention In the embodiment, the cross-sectional view and top perspective view of the resin layer formed on the structure of FIGS. 4 and 5; FIG. 8 is a cross-sectional view of the first anti-cracking structure formed on the structure of FIG. 6 in the first embodiment of the present invention; In one embodiment, FIG. 8 is a cross-sectional view of a blind hole formed on the structure; FIGS. 10 and 11 are respectively a cross-sectional view and a top perspective view of a first routing line formed on the structure of FIG. 9 to complete the production of the lead frame substrate in the first embodiment of the present invention 12 is a cross-sectional view of the semiconductor assembly of the semiconductor chip electrically connected to the lead frame substrate of FIG. 10 in the first embodiment of the present invention; FIG. 13 is the first embodiment of the present invention, the primer is formed in the semiconductor assembly of FIG. 12 14 is a cross-sectional view of the solder balls formed in the semiconductor assembly of FIG. 13 in the first embodiment of the present invention; FIG. 15 is a cross-sectional view of the lead frame substrate in another aspect of the first embodiment of the present invention; FIG. Figure 17 is a cross-sectional view of the lead frame substrate in the second embodiment of the present invention; Figure 18 is a cross-sectional view of the lead frame substrate in the second embodiment of the present invention; 17 is a cross-sectional view of the semiconductor assembly connected to the lead frame substrate in FIG. 17; FIG. 19 is a cross-sectional view of the lead frame substrate in another aspect in the second embodiment of the present invention; FIG. 20 is another aspect in the second embodiment of the present invention Fig. 21 is a cross-sectional view of the lead frame substrate in the third embodiment of the present invention; Fig. 22 is a cross-sectional view of the semiconductor assembly in which the semiconductor chip is electrically connected to the lead frame substrate of Fig. 21 in the third embodiment of the present invention Figure 23 is a cross-sectional view of the lead frame substrate in the fourth embodiment of the present invention; Figure 24 is a cross-sectional view of the lead frame substrate in another aspect of the fourth embodiment of the present invention; Figure 25 is the fourth embodiment of the present invention, A cross-sectional view of a lead frame substrate of another aspect; FIGS. 26 and 27 are respectively a cross-sectional view and a top perspective view of a lead frame, an adjusting member, a resin layer, and a first circuit layer in the fifth embodiment of the present invention; FIG. 28 is the present invention In the fifth embodiment, the first anti-crack structure and the first routing line are formed on the structure of FIG. 26 to complete the production of the lead frame substrate; FIG. 29 is the fifth embodiment of the present invention, the semiconductor chip is electrically connected to the wires of FIG. 28 A cross-sectional view of the semiconductor assembly of the rack substrate; FIG. 30 is a cross-sectional view of the structure of FIG. 29 after the cutting step in the fifth embodiment of the present invention; FIG. 31 is the sixth embodiment of the present invention, with a lead frame, an adjusting member and a resin layer 32 is a cross-sectional view of the first circuit layer and the second circuit layer formed on the structure of FIG. 31 in the sixth embodiment of the present invention; FIG. 33 is the sixth embodiment of the present invention, and the first protective layer is formed on the structure of FIG. 32 Crack structure, first routing line, second anti-cracking structure and second route Fig. 34 is a cross-sectional view of the semiconductor assembly in which the semiconductor chip is electrically connected to the lead frame substrate of Fig. 33 in the sixth embodiment of the present invention; Fig. 35 is the seventh embodiment of the present invention, A cross-sectional view of the lead frame; FIG. 36 is a cross-sectional view taken along line AA of FIG. 35 in the seventh embodiment of the present invention; FIG. 37 is a top plan view of the adjustment member provided in the structure of FIG. 35 in the seventh embodiment of the present invention; In the seventh embodiment of the present invention, a cross-sectional view taken along line AA in FIG. 37; FIGS. 39 and 40 are respectively top and bottom plan views of the resin layer formed on the structure of FIG. 38 in the seventh embodiment of the present invention; FIG. 41 is the seventh embodiment of the present invention In an example, a cross-sectional view taken along line AA of FIG. 39; FIG. 42 is a cross-sectional view of the first anti-cracking structure and the first routing line formed on the structure of FIG. 41 in the seventh embodiment of the present invention; and FIG. 43 is the seventh embodiment of the present invention In the bottom plan view of the lead frame substrate cut out from the structure of FIG. 42.

在下文中,將提供一實施例以詳細說明本發明之實施態樣。本發明之優點以及功效將藉由本發明所揭露之內容而更為顯著。在此說明所附之圖式係簡化過且做為例示用。圖式中所示之元件數量、形狀及尺寸可依據實際情況而進行修改,且元件的配置可能更為複雜。本發明中也可進行其他方面之實踐或應用,且不偏離本發明所定義之精神及範疇之條件下,可進行各種變化以及調整。 Hereinafter, an example will be provided to illustrate the implementation aspects of the present invention in detail. The advantages and effects of the present invention will be more obvious through the content disclosed by the present invention. The drawings attached to this description are simplified and used as examples. The number, shape, and size of the components shown in the drawings can be modified according to actual conditions, and the configuration of the components may be more complicated. The present invention can also be practiced or applied in other aspects, and various changes and adjustments can be made without departing from the spirit and scope defined by the present invention.

[實施例1] [Example 1]

圖2-11為本發明第一實施例中,一種未裁切導線架基板之製作方法圖,該導線架基板包括一金屬架、複數金屬引線、一調節件、一樹脂層、一第一防裂結構及一第一路由線。 Figures 2-11 are diagrams of a manufacturing method of an uncut lead frame substrate in the first embodiment of the present invention. The lead frame substrate includes a metal frame, a plurality of metal leads, an adjusting member, a resin layer, and a first protective film. Split structure and a first routing line.

圖2及3分別為導線架10之剖視圖及頂部立體示意圖。導線架10通常由銅合金、鋼或合金42(alloy 42)製成,其可藉由對軋製金屬條(rolled metal strip)進行濕蝕刻或沖壓(stamping/punching)製程而形成。在此,可由單側或雙側進行蝕刻製程,以蝕穿金屬條,將金屬條製成具有預定整個圖案的導線架10。於此實施例中,該導線架10具有範圍約0.15毫米至約1.0毫米之均一厚度,且包含有一金屬架11及複數金屬引線13。該金屬架11具有平坦的頂面/底面及穿口101,且被金屬引線13所環繞,並與金屬引線13保持距離。 2 and 3 are a cross-sectional view and a top perspective view of the lead frame 10, respectively. The lead frame 10 is usually made of copper alloy, steel, or alloy 42, which can be formed by wet etching or stamping/punching a rolled metal strip. Here, the etching process can be performed on one side or both sides to etch through the metal strips to make the metal strips into the lead frame 10 with a predetermined overall pattern. In this embodiment, the lead frame 10 has a uniform thickness ranging from about 0.15 mm to about 1.0 mm, and includes a metal frame 11 and a plurality of metal leads 13. The metal frame 11 has a flat top surface/bottom surface and a through hole 101, and is surrounded by the metal lead 13 and keeps a distance from the metal lead 13.

圖4及5分別為將調節件20設於金屬架11中心區域指定位置處之剖視圖及頂部立體示意圖,其中調節件20與金屬架11內側壁保持距離。於此階段,該金屬架11可作為調節件20之定位件。於此圖中,該調節件20包括一導熱電絕緣塊21、位於頂側之頂部接觸墊23、及位於底側之底部接觸墊25。該調節件20通常具有高於10W/mk之導熱率、高於200Gpa之彈性模數、及低於10ppm/℃之熱膨脹係數(如2 x 10-6K-1至10 x 10-6K-1)。 4 and 5 are respectively a cross-sectional view and a top perspective schematic view of the adjusting member 20 arranged at a designated position in the central area of the metal frame 11, wherein the adjusting member 20 is kept at a distance from the inner side wall of the metal frame 11. At this stage, the metal frame 11 can be used as a positioning member of the adjusting member 20. In this figure, the adjusting member 20 includes a thermally conductive and electrically insulating block 21, a top contact pad 23 on the top side, and a bottom contact pad 25 on the bottom side. The adjustment member 20 generally has a thermal conductivity greater than 10W / mk, the higher the elastic modulus of 200Gpa, below and / ℃ thermal expansion coefficient of 10 ppm (eg 2 x 10 -6 K -1 to 10 x 10 -6 K - 1 ).

圖6及7分別為形成樹脂層30之剖視圖及頂部立體示意圖。該樹脂層30可沉積於金屬架11內之剩餘空間及金屬引線13間之空間。於此階段中,該金屬架11可避免設置樹脂層時發生調節件20錯位。樹脂層30之彈性模數通常低於調節件20之彈性模數,或者/並且樹脂層30之熱膨脹係數高於調節件20之熱膨脹係數。因此,樹脂層30於側面方向上側向覆蓋、環繞且同形披覆金屬引線13及調節件20,並提供導線架10與調節件20間之穩固機械接合力。經由平坦化製程,樹脂層30之頂面與導線架10之頂側及頂部接觸墊23之外表面呈實質上共平面,且樹脂層30之底面與導線架10之底側及底部接觸墊23之外表面呈實質上共平面。 6 and 7 are respectively a cross-sectional view and a top perspective view of the resin layer 30 formed. The resin layer 30 can be deposited in the remaining space in the metal frame 11 and the space between the metal leads 13. At this stage, the metal frame 11 can prevent the adjustment member 20 from being misaligned when the resin layer is disposed. The elastic modulus of the resin layer 30 is generally lower than the elastic modulus of the adjusting member 20, or/and the thermal expansion coefficient of the resin layer 30 is higher than the thermal expansion coefficient of the adjusting member 20. Therefore, the resin layer 30 laterally covers, surrounds and coats the metal lead 13 and the adjusting member 20 in the lateral direction, and provides a stable mechanical bonding force between the lead frame 10 and the adjusting member 20. Through the planarization process, the top surface of the resin layer 30 is substantially coplanar with the top side of the lead frame 10 and the outer surface of the top contact pad 23, and the bottom surface of the resin layer 30 is substantially coplanar with the bottom side and bottom contact pad 23 of the lead frame 10 The outer surface is substantially coplanar.

圖8為自上方形成第一防裂結構45於調節件20、樹脂層30及導線架10上之剖視圖。該第一防裂結構45覆蓋金屬架11之頂面、金屬引線13之頂端、 調節件20之頂側及樹脂層30之頂面,以由上方提供保護。於此實施例中,該第一防裂結構45包括一第一連續交錯纖維片451,其從上方覆蓋調節件20與樹脂層30間之界面,並進一步側向延伸於金屬架11之頂面、調節件20之頂側、金屬引線13之頂端及樹脂層30之頂面上,且覆蓋金屬架11之頂面、調節件20之頂側、金屬引線13之頂端及樹脂層30之頂面。此連續交錯纖維可為碳纖維、碳化矽纖維、玻璃纖維、尼龍纖維、聚酯纖維或聚醯胺纖維。據此,即使熱循環時於樹脂層30內或調節件20與樹脂層30間界面處產生裂縫,形成於第一防裂結構45中之纖維交錯結構也可防止裂縫延伸進入第一防裂結構45。於此圖中,該第一防裂結構45更包括一第一接合基層453,且第一連續交錯纖維片451摻混於該第一接合基層453中。 8 is a cross-sectional view of the first anti-crack structure 45 formed on the adjusting member 20, the resin layer 30 and the lead frame 10 from above. The first anti-cracking structure 45 covers the top surface of the metal frame 11, the top end of the metal lead 13, the top side of the adjusting member 20 and the top surface of the resin layer 30 to provide protection from above. In this embodiment, the first anti-crack structure 45 includes a first continuous interlaced fiber sheet 451, which covers the interface between the adjusting member 20 and the resin layer 30 from above, and further extends laterally on the top surface of the metal frame 11 , The top side of the adjustment member 20, the top side of the metal lead 13 and the top surface of the resin layer 30, and cover the top surface of the metal frame 11, the top side of the adjustment member 20, the top side of the metal lead 13 and the top surface of the resin layer 30 . The continuous interlaced fiber can be carbon fiber, silicon carbide fiber, glass fiber, nylon fiber, polyester fiber or polyamide fiber. Accordingly, even if cracks are generated in the resin layer 30 or at the interface between the adjusting member 20 and the resin layer 30 during thermal cycling, the fiber interlaced structure formed in the first crack prevention structure 45 can prevent the cracks from extending into the first crack prevention structure 45. In this figure, the first anti-cracking structure 45 further includes a first bonding base 453, and the first continuous interlaced fiber sheet 451 is blended in the first bonding base 453.

圖9為形成有盲孔454之剖視圖,其自上方顯露金屬引線13之頂端及頂部接觸墊23之外表面,並可選擇顯露金屬架11之頂面。盲孔454可藉由各種技術形成,包括雷射鑽孔、電漿蝕刻、及微影技術,其通常具有50微米直徑。可使用脈衝雷射提高雷射鑽孔效能。或者,可使用掃描雷射光束,並搭配金屬光罩。盲孔454延伸穿過第一防裂結構45,並對準金屬架11之選定部位、金屬引線13之選定部位、及頂部接觸墊23之選定部位。 9 is a cross-sectional view of a blind hole 454 formed, which exposes the top of the metal lead 13 and the outer surface of the top contact pad 23 from above, and optionally exposes the top surface of the metal frame 11. The blind hole 454 can be formed by various techniques, including laser drilling, plasma etching, and lithography, and it usually has a diameter of 50 microns. Pulse laser can be used to improve the efficiency of laser drilling. Alternatively, a scanning laser beam can be used with a metal mask. The blind hole 454 extends through the first anti-crack structure 45 and is aligned with the selected location of the metal frame 11, the selected location of the metal lead 13, and the selected location of the top contact pad 23.

圖10及11分別為藉由金屬沉積及金屬圖案化製程形成第一路由線46於第一防裂結構45上之剖視圖及頂部立體示意圖。第一路由線46通常由銅製成,且自金屬架11、金屬引線13及調節件20之頂部接觸墊23朝上延伸,並填滿盲孔454,以形成直接接觸金屬架11、金屬引線13及頂部接觸墊23之頂部金屬盲孔464,同時側向延伸於第一防裂結構45上。因此,第一路由線46貼附於第一 接合基層453上,並經由貫穿第一防裂結構45之頂部金屬盲孔464,熱性導通至金屬架11及調節件20之頂部接觸墊23,且電性連接至金屬引線13。 10 and 11 are respectively a cross-sectional view and a top perspective schematic view of forming the first routing line 46 on the first anti-crack structure 45 by metal deposition and metal patterning processes. The first routing line 46 is usually made of copper, and extends upward from the top contact pad 23 of the metal frame 11, the metal lead 13 and the adjusting member 20, and fills the blind hole 454 to form a direct contact with the metal frame 11 and the metal lead 13. And the top metal blind hole 464 of the top contact pad 23, while extending laterally on the first anti-crack structure 45. Therefore, the first routing line 46 is attached to the first bonding base layer 453, and is thermally conducted to the metal frame 11 and the top contact pad 23 of the adjusting member 20 through the top metal blind hole 464 penetrating through the first anti-crack structure 45, and Electrically connected to the metal lead 13.

於此階段中,已完成之未裁切導線架基板100包括金屬架11、金屬引線13、調節件20、樹脂層30、第一防裂結構45及第一路由線46。該金屬架11側向環繞調節件20,且可作為調節件20之定位件,並提供散熱途徑。該些金屬引線13側向環繞金屬架11,並作為垂直連接通道。該調節件20可作為基板的散熱座,並於處在外部或內部張力/應力下時協助保持基板的平坦度,因而可確保覆晶組體的可靠度。樹脂層30填充於金屬引線13之間以及金屬架11與調節件20間之空間中,並提供導線架10與調節件20間之機械接合力。該第一防裂結構45可用以避免沿著調節件/樹脂界面發生剝離,且亦可作為止裂件,以防止形成於樹脂層30中之不良裂痕延伸至第一路由線46,俾可確保覆晶組體之信號完整性。該第一路由線46提供X及Y方向的水平路由,並藉由第一防裂結構45而與調節件/樹脂界面相隔。 In this stage, the completed uncut lead frame substrate 100 includes the metal frame 11, the metal leads 13, the adjustment member 20, the resin layer 30, the first anti-cracking structure 45 and the first routing wire 46. The metal frame 11 laterally surrounds the adjusting member 20, and can be used as a positioning member of the adjusting member 20, and provides a heat dissipation path. The metal leads 13 laterally surround the metal frame 11 and serve as vertical connection channels. The adjusting member 20 can be used as a heat sink for the substrate and can help maintain the flatness of the substrate when it is under external or internal tension/stress, thereby ensuring the reliability of the flip chip assembly. The resin layer 30 fills the space between the metal leads 13 and the space between the metal frame 11 and the adjusting member 20, and provides a mechanical bonding force between the lead frame 10 and the adjusting member 20. The first anti-crack structure 45 can be used to prevent peeling along the regulating member/resin interface, and can also be used as a crack stopper to prevent undesirable cracks formed in the resin layer 30 from extending to the first routing line 46, so as to ensure The signal integrity of the flip chip assembly. The first routing line 46 provides horizontal routing in the X and Y directions, and is separated from the adjusting member/resin interface by the first anti-cracking structure 45.

圖12為半導體組體110之剖視圖,其係將半導體晶片61電性連接至圖10所示之導線架基板100。半導體晶片61(繪示成裸晶片)係藉由凸塊71,面朝下地接置於第一路由線46上。因此,半導體晶片61所產生的熱可經由第一路由線46、調節件20及金屬架11傳導出。此外,調節件20之低CTE可降低半導體晶片61與凸塊接置區(被調節件20從下方覆蓋)間之CTE不匹配現象,並可抑制凸塊接置區於熱循環時發生彎翹現象,故可避免對準調節件20且被調節件20由下方完全覆蓋之凸塊71發生裂損,進而避免半導體晶片61與導線架基板100間發生連接失效的問題。 12 is a cross-sectional view of the semiconductor assembly 110, which electrically connects the semiconductor chip 61 to the lead frame substrate 100 shown in FIG. The semiconductor chip 61 (shown as a bare chip) is placed face down on the first routing line 46 by bumps 71. Therefore, the heat generated by the semiconductor chip 61 can be conducted out through the first routing wire 46, the adjusting member 20 and the metal frame 11. In addition, the low CTE of the adjustment member 20 can reduce the CTE mismatch between the semiconductor chip 61 and the bump contact area (covered by the adjustment member 20 from below), and can prevent the bump contact area from warping during thermal cycling Therefore, the bump 71 that is aligned with the adjusting member 20 and the adjusted member 20 is completely covered from below can be prevented from cracking, thereby avoiding the problem of connection failure between the semiconductor chip 61 and the lead frame substrate 100.

圖13為圖12所示半導體組體110中更形成底膠81之剖視圖。可選性地進一步提供底膠81,以填充半導體晶片61與導線架基板100間之間隙。 13 is a cross-sectional view of a primer 81 further formed in the semiconductor assembly 110 shown in FIG. 12. Optionally, a primer 81 is further provided to fill the gap between the semiconductor chip 61 and the lead frame substrate 100.

圖14為圖13所示半導體組體110中更形成焊球91之剖視圖。可選性地進一步接置焊球91於金屬架11之底面、金屬引線13之底端及調節件20之底部接觸墊25上,以進行下一級連接。 FIG. 14 is a cross-sectional view of the solder balls 91 formed in the semiconductor assembly 110 shown in FIG. 13. Optionally, a solder ball 91 is further connected to the bottom surface of the metal frame 11, the bottom end of the metal lead 13 and the bottom contact pad 25 of the adjustment member 20 for the next level of connection.

圖15為本發明第一實施例中另一態樣之導線架基板剖視圖。該導線架基板120與圖10所示大致相同,不同處在於,該導線架基板120更包括從上方交替輪流形成之一第一接合樹脂47及一外部路由線48。該第一接合樹脂47從上方覆蓋第一防裂結構45及第一路由線46。該外部路由線48側向延伸於第一接合樹脂47上,並藉由第一接合樹脂47中之頂部金屬盲孔484接觸第一路由線46。因此,該外部路由線48透過第一路由線46,熱性導通至調節件20及金屬架11,並電性連接至金屬引線13。 15 is a cross-sectional view of a lead frame substrate in another aspect in the first embodiment of the present invention. The lead frame substrate 120 is substantially the same as that shown in FIG. 10, except that the lead frame substrate 120 further includes a first bonding resin 47 and an external routing wire 48 alternately formed from above. The first bonding resin 47 covers the first anti-crack structure 45 and the first routing line 46 from above. The outer routing line 48 extends laterally on the first bonding resin 47 and contacts the first routing line 46 through the top metal blind hole 484 in the first bonding resin 47. Therefore, the external routing wire 48 is thermally conducted to the adjusting member 20 and the metal frame 11 through the first routing wire 46, and is electrically connected to the metal lead 13.

圖16為本發明第一實施例中又一態樣之導線架基板剖視圖。該導線架基板130與圖10所示大致相同,不同處在於,該導線架基板130更包括交替輪流形成且位於第一防裂結構45/第一路由線46與調節件20/樹脂層30間之一第一接合樹脂41及一內部路由線42。第一接合樹脂41覆蓋並接觸金屬架11之頂面、調節件20之頂側、金屬引線13之頂端、及樹脂層30之頂面。該內部路由線42側向延伸於第一接合樹脂41上,並包含接觸頂部接觸墊23、金屬引線13及金屬架11之頂部金屬盲孔424。該第一防裂結構45自上方覆蓋第一接合樹脂41及內部路由線42,並藉由第一接合樹脂41及內部路由線42而與調節件20及樹脂層30相隔。該第一路由線46側向延伸於第一防裂結構45上,並透過與內部路由線42 接觸之頂部金屬盲孔464,熱性導通至調節件20之頂部接觸墊23及金屬架11,並電性耦接至金屬引線13。 FIG. 16 is a cross-sectional view of a lead frame substrate in another aspect in the first embodiment of the present invention. The lead frame substrate 130 is substantially the same as that shown in FIG. 10, except that the lead frame substrate 130 further includes alternately formed and located between the first anti-crack structure 45/first routing line 46 and the adjusting member 20/resin layer 30 A first bonding resin 41 and an internal routing wire 42. The first bonding resin 41 covers and contacts the top surface of the metal frame 11, the top side of the adjusting member 20, the top end of the metal lead 13, and the top surface of the resin layer 30. The internal routing line 42 extends laterally on the first bonding resin 41 and includes a top metal blind hole 424 that contacts the top contact pad 23, the metal lead 13 and the metal frame 11. The first anti-cracking structure 45 covers the first bonding resin 41 and the internal routing wire 42 from above, and is separated from the adjusting member 20 and the resin layer 30 by the first bonding resin 41 and the internal routing wire 42. The first routing line 46 extends laterally on the first anti-cracking structure 45, and is thermally connected to the top contact pad 23 of the adjusting member 20 and the metal frame 11 through the top metal blind hole 464 contacting the internal routing line 42, and It is electrically coupled to the metal lead 13.

[實施例2] [Example 2]

圖17為本發明第二實施例之導線架基板剖視圖。 FIG. 17 is a cross-sectional view of the lead frame substrate of the second embodiment of the present invention.

為了簡要說明之目的,上述實施例1中任何可作相同應用之敘述皆併於此,且無須再重複相同敘述。 For the purpose of brief description, any description that can be used for the same application in the above embodiment 1 is incorporated herein, and the same description is not required to be repeated.

該導線架基板200與圖10所示大致相同,不同處在於,其更包括從下方交替輪流形成之一第二防裂結構55及一第二路由線56。該第二防裂結構55覆蓋金屬架11之底面、金屬引線13之底端、調節件20之底側及樹脂層30之底面,以從下方提供保護。該第二路由線56側向延伸於第二防裂結構55上,並透過底部金屬盲孔564,熱性導通至調節件20之底部接觸墊25及金屬架11,且電性連接至金屬引線13。如同第一防裂結構45,該第二防裂結構55可包括一第二連續交錯纖維片551,其從下方覆蓋調節件20與樹脂層30間之界面,並進一步側向延伸於金屬架11之底面、調節件20之底側、金屬引線13之底端及樹脂層30之底面下,且覆蓋金屬架11之底面、調節件20之底側、金屬引線13之底端及樹脂層30之底面。據此,形成於第二防裂結構55中之交錯結構可防止樹脂層30內的裂痕延伸進入第二防裂結構55,以確保第二防裂結構55上之第二路由線56的可靠度。透過第一防裂結構45與第二防裂結構55之雙重保護,俾可避免或防止沿著調節件/樹脂界面或樹脂層30內形成之裂痕所引起的剝離。於此圖中,該第二防裂結構55更包括一第二接合基層553,且第二連續交錯纖維片551摻混於該第二接合基層553中。 The lead frame substrate 200 is substantially the same as that shown in FIG. 10, except that it further includes a second anti-cracking structure 55 and a second routing line 56 alternately formed from below. The second anti-cracking structure 55 covers the bottom surface of the metal frame 11, the bottom end of the metal lead 13, the bottom side of the adjusting member 20, and the bottom surface of the resin layer 30 to provide protection from below. The second routing line 56 extends laterally on the second anti-crack structure 55, and through the bottom metal blind hole 564, is thermally conducted to the bottom contact pad 25 of the adjusting member 20 and the metal frame 11, and is electrically connected to the metal lead 13 . Like the first anti-cracking structure 45, the second anti-cracking structure 55 may include a second continuous interlaced fiber sheet 551, which covers the interface between the adjusting member 20 and the resin layer 30 from below, and further extends laterally on the metal frame 11 The bottom surface, the bottom side of the adjustment member 20, the bottom end of the metal lead 13 and the bottom surface of the resin layer 30, and cover the bottom surface of the metal frame 11, the bottom side of the adjustment member 20, the bottom end of the metal lead 13 and the resin layer 30 Underside. Accordingly, the staggered structure formed in the second anti-cracking structure 55 can prevent cracks in the resin layer 30 from extending into the second anti-cracking structure 55 to ensure the reliability of the second routing line 56 on the second anti-cracking structure 55 . Through the double protection of the first anti-crack structure 45 and the second anti-crack structure 55, it is possible to avoid or prevent peeling caused by the cracks formed along the adjusting member/resin interface or in the resin layer 30. In this figure, the second anti-crack structure 55 further includes a second bonding base layer 553, and the second continuous interlaced fiber sheet 551 is blended in the second bonding base layer 553.

於此階段中,已完成之未裁切導線架基板200包括金屬架11、金屬引線13、調節件20、樹脂層30、第一防裂結構45、第一路由線46、第二防裂結構55及第二路由線56。該第一防裂結構45與該第二防裂結構55可提供保護,以確保第一路由線46與第二路由線56之可靠度。該第一路由線46透過調節件20及金屬架11,熱性導通至第二路由線56,以進行散熱,並透過金屬引線13,電性連接至第二路由線56,以進行訊號傳遞。 At this stage, the completed uncut lead frame substrate 200 includes the metal frame 11, the metal lead 13, the adjustment member 20, the resin layer 30, the first anti-cracking structure 45, the first routing line 46, and the second anti-cracking structure 55 and second routing line 56. The first anti-cracking structure 45 and the second anti-cracking structure 55 can provide protection to ensure the reliability of the first routing line 46 and the second routing line 56. The first routing line 46 is thermally connected to the second routing line 56 through the adjusting member 20 and the metal frame 11 for heat dissipation, and is electrically connected to the second routing line 56 through the metal lead 13 for signal transmission.

圖18為半導體組體210之剖視圖,其係將半導體晶片61電性連接至圖17所示之導線架基板200。半導體晶片61係藉由凸塊71,面朝下地接置於第一路由線46上。於此實施例中,半導體晶片61所產生的熱可經由第一路由線46、調節件20、金屬架11及第二路由線56傳導出。 18 is a cross-sectional view of the semiconductor assembly 210, which electrically connects the semiconductor chip 61 to the lead frame substrate 200 shown in FIG. The semiconductor chip 61 is placed face down on the first routing line 46 by the bumps 71. In this embodiment, the heat generated by the semiconductor chip 61 can be conducted through the first routing wire 46, the adjusting member 20, the metal frame 11, and the second routing wire 56.

圖19為本發明第二實施例中另一態樣之導線架基板剖視圖。該導線架基板220與圖17所示大致相同,不同處在於,其更包括從下方交替輪流形成之一第二接合樹脂57及一外部路由線58。該第二接合樹脂57從下方覆蓋第二防裂結構55及第二路由線56。該外部路由線58側向延伸於第二接合樹脂57上,並包含接觸第二路由線56之底部金屬盲孔584。因此,第一路由線46透過金屬架11、調節件20及第二路由線56,熱性導通至外部路由線58,並透過金屬引線13及第二路由線56,電性連接至外部路由線58。 19 is a cross-sectional view of a lead frame substrate in another aspect in the second embodiment of the present invention. The lead frame substrate 220 is substantially the same as that shown in FIG. 17, except that it further includes a second bonding resin 57 and an external routing wire 58 alternately formed from below. The second bonding resin 57 covers the second anti-crack structure 55 and the second routing line 56 from below. The outer routing line 58 extends laterally on the second bonding resin 57 and includes a bottom metal blind hole 584 contacting the second routing line 56. Therefore, the first routing line 46 is thermally conducted to the external routing line 58 through the metal frame 11, the adjusting member 20 and the second routing line 56, and is electrically connected to the external routing line 58 through the metal lead 13 and the second routing line 56 .

圖20為本發明第二實施例中又一態樣之導線架基板剖視圖。該導線架基板230與圖17所示大致相同,不同處在於,其更包括交替輪流形成且位於第二防裂結構55/第二路由線56與調節件20/樹脂層30間之一第二接合樹脂51及一內部路由線52。第二接合樹脂51覆蓋並接觸金屬架11之底面、調節件20之底側、金屬引線13之底端、及樹脂層30之底面。該內部路由線52側向延伸於第二 接合樹脂51上,並包含接觸金屬架11、金屬引線13及調節件20底部接觸墊23之底部金屬盲孔524。該第二防裂結構55自下方覆蓋第二接合樹脂51及內部路由線52,並藉由第二接合樹脂51及內部路由線52而與調節件20及樹脂層30相隔。該第二路由線56側向延伸於第二防裂結構55上,並透過與內部路由線52接觸之底部金屬盲孔564,熱性導通至調節件20之底部接觸墊25及金屬架11,並電性耦接至金屬引線13。 20 is a cross-sectional view of a lead frame substrate in another aspect in the second embodiment of the present invention. The lead frame substrate 230 is roughly the same as that shown in FIG. 17, except that it further includes a second one formed alternately and located between the second anti-crack structure 55/the second routing line 56 and the adjusting member 20/the resin layer 30 Bond resin 51 and an internal routing wire 52. The second bonding resin 51 covers and contacts the bottom surface of the metal frame 11, the bottom side of the adjusting member 20, the bottom end of the metal lead 13, and the bottom surface of the resin layer 30. The internal routing line 52 extends laterally on the second bonding resin 51 and includes a bottom metal blind hole 524 that contacts the metal frame 11, the metal lead 13 and the bottom contact pad 23 of the adjusting member 20. The second anti-cracking structure 55 covers the second bonding resin 51 and the internal routing wire 52 from below, and is separated from the adjusting member 20 and the resin layer 30 by the second bonding resin 51 and the internal routing wire 52. The second routing wire 56 extends laterally on the second anti-crack structure 55, and is thermally conducted to the bottom contact pad 25 of the adjusting member 20 and the metal frame 11 through the bottom metal blind hole 564 contacting the internal routing wire 52, and It is electrically coupled to the metal lead 13.

[實施例3] [Example 3]

圖21為本發明第三實施例之導線架基板剖視圖。 21 is a cross-sectional view of the lead frame substrate of the third embodiment of the present invention.

為了簡要說明之目的,上述實施例中任何可作相同應用之敘述皆併於此,且無須再重複相同敘述。 For the purpose of brief description, any description that can be used for the same application in the above-mentioned embodiments is incorporated herein, and the same description does not need to be repeated.

該導線架基板300與圖10所示大致相同,不同處在於,該調節件20更具有接觸頂部接觸墊23及底部接觸墊25之金屬貫孔27。該些金屬貫孔27延伸貫穿該導熱電絕緣塊21,以提供頂部接觸墊23與底部接觸墊25間之電性連接,用以接地/電源連接。 The lead frame substrate 300 is substantially the same as that shown in FIG. 10, except that the adjusting member 20 further has a metal through hole 27 for contacting the top contact pad 23 and the bottom contact pad 25. The metal through holes 27 extend through the thermally conductive and electrically insulating block 21 to provide an electrical connection between the top contact pad 23 and the bottom contact pad 25 for grounding/power connection.

圖22為半導體組體310之剖視圖,其係將半導體晶片61電性連接至圖21所示之導線架基板300。半導體晶片61係藉由凸塊71,面朝下地接置於第一路由線46上。因此,該半導體晶片61係透過第一路由線46,電性連接至金屬引線13,以進行訊號傳遞,並電性連接至調節件20,以構成接地/電源連接。 FIG. 22 is a cross-sectional view of the semiconductor assembly 310, which electrically connects the semiconductor chip 61 to the lead frame substrate 300 shown in FIG. 21. The semiconductor chip 61 is placed face down on the first routing line 46 by the bumps 71. Therefore, the semiconductor chip 61 is electrically connected to the metal lead 13 through the first routing line 46 for signal transmission, and is electrically connected to the regulator 20 to form a ground/power connection.

[實施例4] [Example 4]

圖23為本發明第四實施例之導線架基板剖視圖。 FIG. 23 is a cross-sectional view of the lead frame substrate of the fourth embodiment of the present invention.

為了簡要說明之目的,上述實施例中任何可作相同應用之敘述皆併於此,且無須再重複相同敘述。 For the purpose of brief description, any description that can be used for the same application in the above-mentioned embodiments is incorporated herein, and the same description does not need to be repeated.

該導線架基板400與圖21所示大致相同,不同處在於,其更包括從下方交替輪流形成之一第二防裂結構55及一第二路由線56。該第二防裂結構55覆蓋金屬架11之底面、金屬引線13之底端、調節件20之底側及樹脂層30之底面。該第二路由線56側向延伸於第二防裂結構55上,並包含接觸金屬架11、金屬引線13及底部接觸墊25之底部金屬盲孔564。因此,該第二路由線56係熱性導通並電性耦接至調節件20之底部接觸墊25及金屬架11,以進行散熱及接地/電源連接,並電性連接至金屬引線13,以進行訊號傳遞。 The lead frame substrate 400 is substantially the same as that shown in FIG. 21, except that it further includes a second anti-cracking structure 55 and a second routing line 56 alternately formed from below. The second anti-cracking structure 55 covers the bottom surface of the metal frame 11, the bottom end of the metal lead 13, the bottom side of the adjusting member 20 and the bottom surface of the resin layer 30. The second routing line 56 extends laterally on the second anti-crack structure 55 and includes a bottom metal blind hole 564 that contacts the metal frame 11, the metal lead 13 and the bottom contact pad 25. Therefore, the second routing wire 56 is thermally conductive and electrically coupled to the bottom contact pad 25 of the adjusting member 20 and the metal frame 11 for heat dissipation and grounding/power connection, and is electrically connected to the metal lead 13 for Signal transmission.

圖24為本發明第四實施例中另一態樣之導線架基板剖視圖。該導線架基板410與圖23所示大致相同,不同處在於,其更包括位於第一防裂結構45與第一路由線46間之一第一接合樹脂47,以及位於第二防裂結構55與第二路由線56間之一第二接合樹脂57。第一路由線46側向延伸於第一接合樹脂47上,並藉由貫穿第一防裂結構45及第一接合樹脂47之頂部金屬盲孔464,電性耦接至金屬架11、調節件20之頂部接觸墊23及金屬引線13之頂端。第二路由線56側向延伸於第二接合樹脂57上,並藉由貫穿第二防裂結構55及第二接合樹脂57之底部金屬盲孔564,電性耦接至金屬架11、調節件20之底部接觸墊25及金屬引線13之底端。 24 is a cross-sectional view of a lead frame substrate in another aspect in the fourth embodiment of the present invention. The lead frame substrate 410 is substantially the same as that shown in FIG. 23, except that it further includes a first bonding resin 47 located between the first anti-cracking structure 45 and the first routing line 46, and a second anti-cracking structure 55 A second bonding resin 57 with the second routing wire 56. The first routing line 46 extends laterally on the first bonding resin 47, and is electrically coupled to the metal frame 11 and the adjusting member by passing through the first anti-crack structure 45 and the top metal blind hole 464 of the first bonding resin 47 The top of 20 contacts the pad 23 and the top of the metal lead 13. The second routing wire 56 extends laterally on the second bonding resin 57, and is electrically coupled to the metal frame 11 and the adjusting member by penetrating the second anti-crack structure 55 and the bottom metal blind hole 564 of the second bonding resin 57 The bottom of 20 contacts the pad 25 and the bottom of the metal lead 13.

圖25為本發明第四實施例中又一態樣之導線架基板剖視圖。該導線架基板420與圖23所示大致相同,不同處在於,第一防裂結構45及第二防裂結構55係藉由第一接合樹脂41及第二接合樹脂51,而與調節件20及樹脂層30相隔。第一路由線46側向延伸於第一防裂結構45上,並透過貫穿第一接合樹脂41及第一防裂結構45之頂部金屬盲孔464,電性耦接至金屬架11、調節件20之頂部接觸墊23及金屬引線13之頂端。第二路由線56側向延伸於第二防裂結構55上, 並透過貫穿第二接合樹脂51及第二防裂結構55之底部金屬盲孔564,電性耦接至金屬架11、調節件20之底部接觸墊25及金屬引線13之底端。 FIG. 25 is a cross-sectional view of a lead frame substrate in another aspect in the fourth embodiment of the present invention. The lead frame substrate 420 is substantially the same as that shown in FIG. 23, except that the first anti-cracking structure 45 and the second anti-cracking structure 55 are combined with the adjusting member 20 through the first bonding resin 41 and the second bonding resin 51. It is separated from the resin layer 30. The first routing line 46 extends laterally on the first anti-crack structure 45, and is electrically coupled to the metal frame 11 and the adjusting member through the top metal blind hole 464 that penetrates the first bonding resin 41 and the first anti-crack structure 45 The top of 20 contacts the pad 23 and the top of the metal lead 13. The second routing line 56 extends laterally on the second anti-crack structure 55, and is electrically coupled to the metal frame 11 and the adjusting member through the bottom metal blind hole 564 that penetrates the second bonding resin 51 and the second anti-crack structure 55 The bottom of 20 contacts the pad 25 and the bottom of the metal lead 13.

[實施例5] [Example 5]

圖26-28為本發明第五實施例之導線架基板製作方法圖,其具有第一線路層。 26-28 are diagrams of a manufacturing method of a lead frame substrate according to a fifth embodiment of the present invention, which has a first circuit layer.

圖26及27分別為具有金屬架11、複數金屬引線13、調節件20、樹脂層30及第一線路層43之剖視圖及頂部立體示意圖。該調節件20包含有位於其兩側處之頂部接觸墊23及底部接觸墊25。該些金屬引線13位於金屬架11內,並與金屬架11保持距離,且側向環繞調節件20,以作為垂直連接通道。該樹脂層30接合至金屬引線13及調節件20之外圍側壁,以提供金屬引線13與調節件20間之機械接合力。第一線路層43通常由銅製成,其側向延伸於樹脂層30頂面,並電性耦接至金屬引線13,且熱性導通至調節件20之頂部接觸墊23。 26 and 27 are respectively a cross-sectional view and a top perspective schematic view of the metal frame 11, the plurality of metal leads 13, the adjusting member 20, the resin layer 30, and the first circuit layer 43. The adjusting member 20 includes a top contact pad 23 and a bottom contact pad 25 on both sides thereof. The metal leads 13 are located in the metal frame 11, keep a distance from the metal frame 11, and surround the adjusting member 20 laterally to serve as a vertical connection channel. The resin layer 30 is bonded to the peripheral sidewalls of the metal lead 13 and the adjusting member 20 to provide a mechanical bonding force between the metal lead 13 and the adjusting member 20. The first circuit layer 43 is usually made of copper, extends laterally on the top surface of the resin layer 30 and is electrically coupled to the metal lead 13 and thermally connected to the top contact pad 23 of the adjusting member 20.

圖28為從上方交替輪流形成第一防裂結構45及第一路由線46之剖視圖。該第一防裂結構45自上方覆蓋調節件20、樹脂層30及第一線路層43。該第一路由線46側向延伸於第一防裂結構45上,並透過接觸第一線路層43之頂部金屬盲孔464,電性連接至金屬引線13,且熱性導通至調節件20。 28 is a cross-sectional view of alternately forming the first anti-crack structure 45 and the first routing line 46 from above. The first anti-crack structure 45 covers the adjusting member 20, the resin layer 30 and the first circuit layer 43 from above. The first routing line 46 extends laterally on the first anti-crack structure 45 and is electrically connected to the metal lead 13 and thermally connected to the adjusting member 20 through the top metal blind hole 464 of the first circuit layer 43.

據此,已完成之未裁切導線架基板500包括金屬架11、金屬引線13、調節件20、樹脂層30、第一線路層43、第一防裂結構45及第一路由線46。 According to this, the completed uncut lead frame substrate 500 includes the metal frame 11, the metal lead 13, the adjustment member 20, the resin layer 30, the first circuit layer 43, the first anti-cracking structure 45 and the first routing wire 46.

圖29為半導體組體510之剖視圖,其係將半導體晶片61電性連接至圖28所示之導線架基板500。半導體晶片61係藉由凸塊71,覆晶式地接置於第一路由線46上,並透過第一路由線46及第一線路層43,電性連接至金屬引線13。 FIG. 29 is a cross-sectional view of the semiconductor assembly 510, which electrically connects the semiconductor chip 61 to the lead frame substrate 500 shown in FIG. 28. The semiconductor chip 61 is flip-chip connected to the first routing line 46 by the bumps 71, and is electrically connected to the metal lead 13 through the first routing line 46 and the first circuit layer 43.

圖30為圖29之半導體組體510移除金屬架11及第一防裂結構45選定部位之剖視圖。可藉由各種方法進行移除步驟,包括化學蝕刻、機械裁切/切割或鋸切,以將金屬架11從樹脂層30之外圍邊緣分離。 FIG. 30 is a cross-sectional view of the semiconductor assembly 510 of FIG. 29 with the metal frame 11 and selected parts of the first anti-cracking structure 45 removed. The removal step can be performed by various methods, including chemical etching, mechanical cutting/cutting, or sawing to separate the metal frame 11 from the outer edge of the resin layer 30.

[實施例6] [Example 6]

圖31-33為本發明第六實施例之導線架基板製作方法圖,其具有第一線路層及第二線路層。 31-33 are diagrams of a manufacturing method of a lead frame substrate according to a sixth embodiment of the present invention, which has a first circuit layer and a second circuit layer.

圖31為調節件20透過樹脂層30而與導線架10接合之剖視圖。調節件20位於導線架10之金屬架11內,並被導線架10之金屬引線13側向環繞。該樹脂層30填充於金屬引線13之間,並貼合至調節件20之外圍側壁。於此實施例中,該調節件20包括位於其兩側處之頂部接觸墊23及底部接觸墊25,並透過金屬貫孔27相互電性連接。 FIG. 31 is a cross-sectional view of the adjustment member 20 being joined to the lead frame 10 through the resin layer 30. The adjusting member 20 is located in the metal frame 11 of the lead frame 10 and is laterally surrounded by the metal leads 13 of the lead frame 10. The resin layer 30 is filled between the metal leads 13 and attached to the peripheral sidewall of the adjusting member 20. In this embodiment, the adjusting member 20 includes a top contact pad 23 and a bottom contact pad 25 at two sides thereof, and they are electrically connected to each other through the metal through hole 27.

圖32為分別形成第一線路層43及第二線路層53於樹脂層30頂面及底面上之剖視圖。該第一線路層43側向延伸於樹脂層30之頂面上,並電性耦接至金屬引線13及調節件20之頂部接觸墊23。該第二線路層53側向延伸於樹脂層30之底面上,並電性耦接至金屬引線13及調節件20之底部接觸墊25。 32 is a cross-sectional view of forming the first circuit layer 43 and the second circuit layer 53 on the top and bottom surfaces of the resin layer 30, respectively. The first circuit layer 43 extends laterally on the top surface of the resin layer 30 and is electrically coupled to the metal lead 13 and the top contact pad 23 of the adjusting member 20. The second circuit layer 53 extends laterally on the bottom surface of the resin layer 30 and is electrically coupled to the metal lead 13 and the bottom contact pad 25 of the adjusting member 20.

圖33為從上方交替輪流形成第一防裂結構45及第一路由線46並從下方交替輪流形成第二防裂結構55及第二路由線56之剖視圖。該第一防裂結構45自上方覆蓋調節件20、樹脂層30及第一線路層43。該第二防裂結構55自下方覆蓋調節件20、樹脂層30及第二線路層53。該第一路由線46側向延伸於第一防裂結構45上,並透過接觸第一線路層43之頂部金屬盲孔464,電性連接至金屬引線13及調節件20。該第二路由線56側向延伸於第二防裂結構55上,並透過接觸第二線路層53之底部金屬盲孔564,電性連接至金屬引線13及調節件20。 33 is a cross-sectional view of alternately forming the first anti-cracking structure 45 and the first routing line 46 from above, and alternately forming the second anti-cracking structure 55 and the second routing line 56 from below. The first anti-crack structure 45 covers the adjusting member 20, the resin layer 30 and the first circuit layer 43 from above. The second anti-crack structure 55 covers the adjusting member 20, the resin layer 30 and the second circuit layer 53 from below. The first routing line 46 extends laterally on the first anti-crack structure 45 and is electrically connected to the metal lead 13 and the adjusting member 20 through the top metal blind hole 464 of the first circuit layer 43. The second routing line 56 extends laterally on the second anti-crack structure 55 and is electrically connected to the metal lead 13 and the adjustment member 20 through the bottom metal blind hole 564 of the second circuit layer 53.

據此,已完成之未裁切導線架基板600包括金屬架11、金屬引線13、調節件20、樹脂層30、第一線路層43、第一防裂結構45、第一路由線46、第二線路層53、第二防裂結構55及第二路由線56。 Accordingly, the completed uncut lead frame substrate 600 includes the metal frame 11, the metal lead 13, the adjustment member 20, the resin layer 30, the first circuit layer 43, the first anti-cracking structure 45, the first routing line 46, and the The second circuit layer 53, the second anti-cracking structure 55 and the second routing line 56.

圖34為半導體組體610之剖視圖,其係將半導體晶片61電性連接至圖33所示之導線架基板600。半導體晶片61係藉由凸塊71,覆晶式地電性連接至第一路由線46上。因此,該半導體晶片61係透過第一路由線46、第一線路層43、金屬引線13及第二線路層53,電性連接至第二路由線56,且半導體晶片61所產生的熱可透過第一路由線46、第一線路層43、調節件20、第二練路層53及第二路由線56傳導出。 FIG. 34 is a cross-sectional view of the semiconductor assembly 610, which electrically connects the semiconductor chip 61 to the lead frame substrate 600 shown in FIG. 33. The semiconductor chip 61 is electrically connected to the first routing line 46 via the bumps 71 by flip-chip ground. Therefore, the semiconductor chip 61 is electrically connected to the second routing line 56 through the first routing line 46, the first line layer 43, the metal lead 13, and the second line layer 53, and the heat generated by the semiconductor chip 61 can be transmitted through The first routing line 46, the first circuit layer 43, the adjusting member 20, the second training layer 53 and the second routing line 56 are conducted out.

[實施例7] [Example 7]

圖35-43為本發明第七實施例之導線架基板製作方法圖,其具有另一態樣的導線架。 35-43 are diagrams of the manufacturing method of the lead frame substrate according to the seventh embodiment of the present invention, which has another aspect of the lead frame.

圖35及36分別為導線架10之頂部平面圖及剖視圖。該導線架10包括一外金屬架11、複數金屬引線13、內金屬架15及複數聯結桿16。每一金屬引線13具有一外端131及一內端133,該外端131一體成型地連接至外金屬架11,而內端133則朝內背離外金屬架11。該內金屬架15環繞外金屬架11內之中心區域,並透過聯結桿16連接至外金屬架11。於此實施例中,該導線架10更進一步由其頂側進行選擇性半蝕刻製程。據此,外金屬架11、內金屬架15及聯結桿16之厚度減少,而金屬引線13則具有階梯狀的橫截面輪廓,其係由一水平延伸部136及一垂直凸出部137形成。於此圖中,該垂直凸出部137係朝向上方向,由水平延伸部136的上表面凸出。 35 and 36 are a top plan view and a cross-sectional view of the lead frame 10, respectively. The lead frame 10 includes an outer metal frame 11, a plurality of metal leads 13, an inner metal frame 15 and a plurality of connecting rods 16. Each metal lead 13 has an outer end 131 and an inner end 133. The outer end 131 is integrally connected to the outer metal frame 11, and the inner end 133 faces away from the outer metal frame 11 inward. The inner metal frame 15 surrounds the central area of the outer metal frame 11 and is connected to the outer metal frame 11 through a connecting rod 16. In this embodiment, the lead frame 10 is further subjected to a selective half-etching process from its top side. Accordingly, the thicknesses of the outer metal frame 11, the inner metal frame 15 and the connecting rod 16 are reduced, and the metal lead 13 has a stepped cross-sectional profile, which is formed by a horizontal extension 136 and a vertical protrusion 137. In this figure, the vertical protrusion 137 is directed upward and protrudes from the upper surface of the horizontal extension 136.

圖37及38分別為設置調節件20之頂部平面圖及剖視圖,其設置於內金屬架15內的中心區域處。內金屬架15可控制調節件20置放時的準確度,該內金屬架15會靠近調節件20之外圍側壁。調節件20之厚度大於外金屬架11、內金屬架15及聯結桿16的厚度,並實質上相等於水平延伸部136加上垂直凸出部137的厚度。於此實施例中,該調節件20包括位於其兩側處之頂部接觸墊23及底部接觸墊25,並透過金屬貫孔27相互電性連接。 37 and 38 are respectively a top plan view and a cross-sectional view of the adjusting member 20, which is set at the central area of the inner metal frame 15. The inner metal frame 15 can control the accuracy when the adjusting member 20 is placed, and the inner metal frame 15 is close to the peripheral side wall of the adjusting member 20. The thickness of the adjusting member 20 is greater than the thickness of the outer metal frame 11, the inner metal frame 15 and the connecting rod 16, and is substantially equal to the thickness of the horizontal extension portion 136 plus the vertical protrusion portion 137. In this embodiment, the adjusting member 20 includes a top contact pad 23 and a bottom contact pad 25 at two sides thereof, and they are electrically connected to each other through the metal through hole 27.

圖39、圖40及圖41分別為形成樹脂層30之頂部平面圖、底部平面圖及剖視圖。該樹脂層30填充於金屬引線13之間及內金屬架15與調節件20之間的空間,並進一步自上方覆蓋外金屬架11、金屬引線13之水平延伸部136、內金屬架15及聯結桿16。 39, 40, and 41 are a top plan view, a bottom plan view, and a cross-sectional view of forming the resin layer 30, respectively. The resin layer 30 fills the space between the metal leads 13 and between the inner metal frame 15 and the adjusting member 20, and further covers the outer metal frame 11, the horizontal extension 136 of the metal lead 13, the inner metal frame 15 and the connection from above. Rod 16.

圖42為從上方交替輪流形成第一防裂結構45及第一路由線46之剖視圖。該第一防裂結構45自上方覆蓋金屬引線13、調節件20及樹脂層30。該第一路由線46側向延伸於第一防裂結構45上,並透過第一防裂結構45中之頂部金屬盲孔464,電性連接至金屬引線13,以進行訊號傳遞,且電性連接至調節件20之頂部接觸墊23,以構成接地/電源連接。 42 is a cross-sectional view of alternately forming the first anti-crack structure 45 and the first routing line 46 from above. The first anti-crack structure 45 covers the metal lead 13, the adjusting member 20 and the resin layer 30 from above. The first routing line 46 extends laterally on the first anti-crack structure 45, and is electrically connected to the metal lead 13 through the top metal blind hole 464 in the first anti-crack structure 45 for signal transmission. Connect to the top contact pad 23 of the adjustment member 20 to form a ground/power connection.

圖43為從外金屬架11分離出之導線架基板700的底部平面圖。切離外金屬架11後,該些金屬引線13會相互電性隔離,且金屬引線13的外端131位於導線架700的外圍邊緣處。 FIG. 43 is a bottom plan view of the lead frame substrate 700 separated from the outer metal frame 11. After the outer metal frame 11 is cut away, the metal leads 13 are electrically isolated from each other, and the outer ends 131 of the metal leads 13 are located at the outer edge of the lead frame 700.

如上述實施例所示,本發明建構出一種獨特之導線架基板,其具有與導線架合併的調節件及位於調節件/樹脂界面上之防裂結構,以展現較佳可靠度。於本發明一較佳實施例中,該導線架基板包括一調節件、複數金屬引線、一樹脂層、一第一防裂結構及一第一路由線。該導線架基板可由下述步驟製得: 提供一導線架,其包括複數金屬引線,且更包括一內金屬架及/或一外金屬架,其中該些金屬引線位於該外金屬架內,且側向環繞外金屬架內之一預定區域,或者/以及該些金屬引線位於內金屬架外,並側向環繞該內金屬架;設置一調節件於外/內金屬架內之該預定區域處,其中該調節件具有頂部接觸墊於其頂側及底部接觸墊於其底側;提供一樹脂層,其覆蓋調節件之外圍側壁,並填充於金屬引線間之空間中;形成一第一防裂結構於該調節件之頂側、該些金屬引線之頂端及該樹脂層之頂面;以及形成一第一路由線,其側向延伸於第一防裂結構上,並透過頂部金屬盲孔,熱性導通至調節件之頂部接觸墊,且電性耦接至金屬引線之頂端。於沉積樹脂層後,可將外金屬架移除。選擇性地,本發明之導線架基板更可藉由下述步驟而包括有一第二防裂結構及一第二路由線:形成一第二防裂結構於該調節件之底側、該些金屬引線之底端及該樹脂層之底面下;以及形成一第二路由線,其側向延伸於該第二防裂結構下,並透過底部金屬盲孔,熱性導通至調節件之底部接觸墊,且電性耦接至金屬引線之底端。 As shown in the above embodiments, the present invention constructs a unique lead frame substrate, which has a regulating member combined with the lead frame and an anti-cracking structure on the regulating member/resin interface to exhibit better reliability. In a preferred embodiment of the present invention, the lead frame substrate includes an adjusting member, a plurality of metal leads, a resin layer, a first anti-cracking structure and a first routing wire. The lead frame substrate can be manufactured by the following steps: providing a lead frame, which includes a plurality of metal leads, and further includes an inner metal frame and/or an outer metal frame, wherein the metal leads are located in the outer metal frame, and Encircle a predetermined area in the outer metal frame laterally, or/and the metal leads are located outside the inner metal frame and surround the inner metal frame laterally; set an adjusting member at the predetermined area in the outer/inner metal frame , Wherein the adjusting member has a top contact pad on its top side and a bottom contact pad on its bottom side; a resin layer is provided, which covers the peripheral side wall of the adjusting member and fills the space between the metal leads; forms a first barrier The crack structure is on the top side of the adjusting member, the top of the metal leads and the top surface of the resin layer; and a first routing line is formed, which extends laterally on the first anti-crack structure and passes through the top metal blind hole , Thermally conducts to the top contact pad of the regulator, and is electrically coupled to the top of the metal lead. After depositing the resin layer, the outer metal frame can be removed. Optionally, the lead frame substrate of the present invention may further include a second anti-cracking structure and a second routing line by the following steps: forming a second anti-cracking structure on the bottom side of the adjusting member, the metal The bottom end of the lead wire and the bottom surface of the resin layer; and a second routing line is formed, which extends laterally under the second anti-crack structure and is thermally conducted to the bottom contact pad of the adjusting member through the bottom metal blind hole, And electrically coupled to the bottom end of the metal lead.

除非特別描述或必須依序發生之步驟,上述步驟之順序並無限制於以上所列,且可根據所需設計而變化或重新安排。 Unless specifically described or steps that must occur sequentially, the order of the above steps is not limited to the above list, and can be changed or rearranged according to the required design.

該調節件為非電子元件,其可作為散熱座,並於處在外部或內部張力/應力下時協助維持基板的平整性。於一較佳實施例中,該調節件之熱導率大於10W/mK,且包含有導熱電絕緣塊、位於導熱電絕緣塊頂側之頂部接觸墊、以及位於導熱電絕緣塊底側之底部接觸墊。為了提高結構強度,該調節件之機械強度通常大於樹脂層之機械強度。例如,相較於樹脂層大約10GPa之環氧樹脂彈性模數,調節件之彈性模數較佳是大於200GPa。此外,調節件之熱膨脹係數(CTE)較佳是低於10ppm/℃,以降低晶片/基板CTE不匹配問題。具體地說, 由於調節件之低CTE可降低晶片與墊設置區(被調節件覆蓋)間之CTE不匹配現象,並抑制墊設置區於熱循環時發生彎翹現象,故可避免對準調節件且被調節件完全覆蓋之導電接點(如凸塊)發生裂損。選擇性地,調節件之頂部接觸墊與底部接觸墊可相互電性連接。例如,為達接地/電源連接,調節件更可具有金屬貫孔,其延伸貫穿導熱電絕緣塊,以提供頂部接觸墊與底部接觸墊之間的電性連接 The adjusting member is a non-electronic component, which can be used as a heat sink and helps maintain the flatness of the substrate when under external or internal tension/stress. In a preferred embodiment, the thermal conductivity of the adjusting member is greater than 10W/mK, and includes a thermally conductive and electrically insulating block, a top contact pad on the top side of the thermally conductive and electrically insulating block, and a bottom on the bottom side of the thermally conductive and electrically insulating block Contact pad. In order to improve the structural strength, the mechanical strength of the adjusting member is usually greater than the mechanical strength of the resin layer. For example, compared to the epoxy resin elastic modulus of about 10 GPa of the resin layer, the elastic modulus of the adjusting member is preferably greater than 200 GPa. In addition, the coefficient of thermal expansion (CTE) of the adjusting member is preferably lower than 10 ppm/°C to reduce the problem of chip/substrate CTE mismatch. Specifically, because the low CTE of the adjustment member can reduce the CTE mismatch between the wafer and the pad setting area (covered by the adjustment member), and prevent the pad setting area from warping during thermal cycling, the alignment adjustment can be avoided The conductive contacts (such as bumps) that are completely covered by the adjusting member are cracked. Optionally, the top contact pad and the bottom contact pad of the adjusting member can be electrically connected to each other. For example, in order to achieve grounding/power connection, the adjusting member may further have a metal through hole extending through the thermally conductive and electrically insulating block to provide electrical connection between the top contact pad and the bottom contact pad

該些金屬引線可作為訊號垂直傳導路徑,且選擇性地可提供能量傳遞及返回之接地/電源面。於一較佳實施例中,部分金屬引線可透過第一線路層,電性連接至調節件之部分頂部接觸墊,其中第一線路層係沉積於樹脂層之頂面,並接觸頂部接觸墊及金屬引線頂端;或者/並且部分金屬引線可透過第二線路層,電性連接至調節件之部分底部接觸墊,其中第二線路層係沉積於樹脂層之底面,並接觸底部接觸墊及金屬引線底端。該第一線路層及該第二線路層可為圖案化金屬層,其可提高導線架基板的佈線靈活度。 These metal leads can be used as vertical signal conduction paths, and can optionally provide a ground/power plane for energy transfer and return. In a preferred embodiment, part of the metal leads can pass through the first circuit layer to be electrically connected to a part of the top contact pad of the regulator, wherein the first circuit layer is deposited on the top surface of the resin layer and contacts the top contact pad and The top of the metal lead; or/and part of the metal lead can pass through the second circuit layer and be electrically connected to part of the bottom contact pad of the regulator, wherein the second circuit layer is deposited on the bottom surface of the resin layer and contacts the bottom contact pad and the metal lead Bottom end. The first circuit layer and the second circuit layer can be patterned metal layers, which can improve the wiring flexibility of the lead frame substrate.

該樹脂層可接合至調節件及金屬引線。經由平坦化製程,樹脂層之頂面可與調節件之頂部接觸墊外表面及金屬引線頂端呈實質上共平面,而樹脂層之底面可與調節件之底部接觸墊外表面及金屬引線底端呈實質上共平面。 The resin layer can be joined to the adjustment member and the metal lead. Through the planarization process, the top surface of the resin layer can be substantially coplanar with the outer surface of the top contact pad of the regulator and the top of the metal lead, and the bottom surface of the resin layer can contact the outer surface of the pad and the bottom of the metal lead with the bottom of the regulator It is substantially coplanar.

第一防裂結構及第二防裂結構係呈電絕緣性,且可作為止裂件,以防止樹脂層中形成不良裂痕。於一較佳實施例中,該第一防裂結構包含有一第一接合基層及混摻於第一接合基層中之一第一連續交錯纖維片,而該第二防裂結構包含有一第二接合基層及混摻於第二接合基層中之一第二連續交錯纖維片。第一及第二連續交錯纖維片分別覆蓋調節件/樹脂界面之頂端及底端。藉由第一及第二連續交錯纖維片之交錯結構,可避免產生於調節件/樹脂界面或/及形 成於樹脂層中之裂痕延伸進入第一及第二防裂層結構中,進而可確保第一及第二防裂結構上之路由線的可靠度。 The first anti-cracking structure and the second anti-cracking structure are electrically insulating, and can be used as crack stoppers to prevent bad cracks from forming in the resin layer. In a preferred embodiment, the first anti-crack structure includes a first joint base layer and a first continuous interlaced fiber sheet mixed in the first joint base layer, and the second anti-crack structure includes a second joint The base layer and a second continuous interlaced fiber sheet mixed in the second joining base layer. The first and second continuous interlaced fiber sheets respectively cover the top and bottom ends of the regulator/resin interface. With the interlaced structure of the first and second continuous interlaced fiber sheets, the cracks generated at the adjusting member/resin interface or/and formed in the resin layer can be prevented from extending into the first and second anti-cracking layer structures, thereby ensuring The reliability of the routing lines on the first and second anti-cracking structures.

該第一路由線為圖案化金屬層,其側向延伸於調節件頂側及樹脂層頂面上,並透過第一防裂結構而與調節件/樹脂界面相隔。藉由第一路由線與調節件/樹脂界面間之第一防裂結構,可確保第一路由線之可靠度。同樣地,該第二路由線為圖案化金屬層,其側向延伸於調節件底側及樹脂層底面下方,並透過第二防裂結構而與調節件/樹脂界面相隔,以確保第二路由線之可靠度。於一較佳實施例中,該第一路由線透過頂部金屬盲孔,熱性導通至調節件之頂部接觸墊,並電性耦接至金屬引線之頂端,而該第二路由線透過底部金屬盲孔,熱性導通至調節件之底部接觸墊,並電性耦接至金屬引線之底端。 The first routing line is a patterned metal layer, which extends laterally on the top side of the adjusting member and the top surface of the resin layer, and is separated from the adjusting member/resin interface through the first anti-cracking structure. The reliability of the first routing wire can be ensured by the first anti-cracking structure between the first routing wire and the adjusting member/resin interface. Similarly, the second routing line is a patterned metal layer, which extends laterally below the bottom side of the adjusting member and the bottom surface of the resin layer, and is separated from the adjusting member/resin interface through the second anti-cracking structure to ensure the second routing The reliability of the line. In a preferred embodiment, the first routing line passes through the top metal blind via, thermally conducts to the top contact pad of the adjusting element, and is electrically coupled to the top of the metal lead, and the second routing line passes through the bottom metal blind The hole is thermally conducted to the bottom contact pad of the adjusting member, and is electrically coupled to the bottom end of the metal lead.

本發明亦提供一種半導體組體,其中半導體晶片係透過各種連接媒介,包括導電凸塊(如金凸塊或焊料凸塊),電性連接至上述導線架基板。例如,半導體晶片可透過對準且被調節件覆蓋之複數凸塊,電性連接至第一路由線。於一較佳實施例中,用於連接晶片之每一凸塊皆完全位於被調節件完全覆蓋之區域內,且每一凸塊皆未側向延伸超過調節件之外圍邊緣。 The present invention also provides a semiconductor assembly, in which the semiconductor chip is electrically connected to the lead frame substrate through various connection media, including conductive bumps (such as gold bumps or solder bumps). For example, the semiconductor chip can be electrically connected to the first routing line through a plurality of bumps that are aligned and covered by the adjusting member. In a preferred embodiment, each bump for connecting the chip is completely located in the area completely covered by the adjusting member, and each bump does not extend laterally beyond the peripheral edge of the adjusting member.

該組體可為第一級或第二級單晶或多晶裝置。例如,該組體可為包含單一晶片或多枚晶片之第一級封裝體。或者,該組體可為包含單一封裝體或多個封裝體之第二級模組,其中每一封裝體可包含單一或多枚晶片。該半導體晶片可為封裝晶片或未封裝晶片。此外,該半導體晶片可為裸晶片,或是晶圓級封裝晶粒等。 The assembly can be a first-stage or second-stage single crystal or polycrystalline device. For example, the assembly may be a first-level package including a single chip or multiple chips. Alternatively, the assembly may be a second-level module including a single package or multiple packages, wherein each package may include a single or multiple chips. The semiconductor chip can be a packaged chip or an unpackaged chip. In addition, the semiconductor chip can be a bare chip, or a wafer-level package die.

「覆蓋」一詞意指於垂直及/或側面方向上不完全以及完全覆蓋。例如,於一較佳實施例中,該第一防裂結構覆蓋調節件頂側、樹脂層頂面 及調節件/樹脂界面,不論另一元件(如第一接合樹脂)是否位於第一防裂結構與調節件之間以及第一防裂結構與樹脂層之間。 The term "covering" means incomplete and complete coverage in the vertical and/or lateral directions. For example, in a preferred embodiment, the first anti-cracking structure covers the top side of the adjusting member, the top surface of the resin layer, and the adjusting member/resin interface, regardless of whether another element (such as the first bonding resin) is located in the first anti-cracking structure. Between the structure and the adjusting member and between the first anti-cracking structure and the resin layer.

「接置於」、「貼附於」語意包含與單一或多個元件間之接觸與非接觸。例如,於一較佳實施例中,第一路由線可貼附於第一接合基層,不論第一路由線是否接觸第一接合基層或者與第一接合基層以第一接合樹脂相隔。 The semantics of "connected to" and "attached to" include contact and non-contact with a single or multiple components. For example, in a preferred embodiment, the first routing wire can be attached to the first bonding base layer, regardless of whether the first routing wire contacts the first bonding base layer or is separated from the first bonding base layer by the first bonding resin.

「電性連接」、「電性耦接」之詞意指直接或間接電性連接。例如,於一較佳實施例中,半導體晶片係透過第一路由線,電性連接至金屬引線,並且不與金屬引線接觸。 The terms "electrical connection" and "electrical coupling" mean direct or indirect electrical connection. For example, in a preferred embodiment, the semiconductor chip is electrically connected to the metal lead through the first routing line, and is not in contact with the metal lead.

藉由此方法製備成的導線架基板係為可靠度高、價格低廉、且非常適合大量製造生產。本發明之製作方法具有高度適用性,且係以獨特、進步之方式結合運用各種成熟之電性及機械性連接技術。此外,本發明之製作方法不需昂貴工具即可實施。因此,相較於傳統技術,此製作方法可大幅提升產量、良率、效能與成本效益。 The lead frame substrate prepared by this method has high reliability, low price, and is very suitable for mass production. The manufacturing method of the present invention has high applicability, and combines various mature electrical and mechanical connection technologies in a unique and progressive way. In addition, the manufacturing method of the present invention can be implemented without expensive tools. Therefore, compared with traditional technology, this manufacturing method can greatly improve the yield, yield, performance and cost-effectiveness.

在此所述之實施例係為例示之用,其中該些實施例可能會簡化或省略本技術領域已熟知之元件或步驟,以免模糊本發明之特點。同樣地,為使圖式清晰,圖式亦可能省略重覆或非必要之元件及元件符號。 The embodiments described here are for illustrative purposes, and these embodiments may simplify or omit elements or steps that are well known in the art so as not to obscure the characteristics of the present invention. Similarly, in order to make the drawings clear, the drawings may omit repeated or unnecessary components and component symbols.

100:導線架基板 100: Lead frame substrate

10:導線架 10: Lead frame

11:金屬架 11: Metal frame

13:金屬引線 13: Metal lead

20:調節件 20: Adjusting parts

23:頂部接觸墊 23: Top contact pad

25:底部接觸墊 25: bottom contact pad

30:樹脂層 30: resin layer

45:第一防裂結構 45: The first anti-cracking structure

451:第一連續交錯纖維片 451: The first continuous interlaced fiber sheet

453:第一接合基層 453: first joint base layer

454:盲孔 454: Blind Hole

46:第一路由線 46: The first routing line

464:頂部金屬盲孔 464: Top metal blind hole

Claims (10)

一種導線架基板,包括:複數金屬引線,其具有頂端及底端;一調節件,其具有平坦且平行之頂側及底側、位於該頂側之頂部接觸墊及位於該底側之底部接觸墊,該調節件設置於該些金屬引線所環繞之一指定位置內,其中該調節件熱膨脹係數小於10ppm/℃,且熱導率大於10W/mk;一樹脂層,其填充於該些金屬引線間之空間中,並貼合至該調節件之外圍側壁;以及一第一防裂結構,其包括一第一連續交錯纖維片,該第一連續交錯纖維片覆蓋該調節件與該樹脂層間之界面,並進一步側向延伸於該調節件之該頂側、該些金屬引線之該些頂端及該樹脂層之頂面上,並覆蓋該調節件之該頂側、該些金屬引線之該些頂端及該樹脂層之該頂面。 A lead frame substrate comprising: a plurality of metal leads having top and bottom ends; an adjustment member having flat and parallel top and bottom sides, a top contact pad on the top side, and a bottom contact on the bottom side Pad, the adjusting member is arranged in a designated position surrounded by the metal leads, wherein the adjusting member has a thermal expansion coefficient of less than 10ppm/°C and a thermal conductivity greater than 10W/mk; a resin layer filled in the metal leads In the space between the adjusting member and attached to the peripheral side wall of the adjusting member; and a first anti-cracking structure including a first continuous interlaced fiber sheet covering the gap between the adjusting member and the resin layer The interface further extends laterally on the top side of the adjusting member, the top ends of the metal leads, and the top surface of the resin layer, and covers the top side of the adjusting member and the metal leads The top and the top surface of the resin layer. 如申請專利範圍第1項所述之該導線架基板,其中該第一防裂結構更包括一第一接合基層,且該第一連續交錯纖維片係混摻於該第一接合基層中。 In the lead frame substrate described in claim 1, wherein the first anti-cracking structure further includes a first bonding base layer, and the first continuous interlaced fiber sheet is mixed in the first bonding base layer. 如申請專利範圍第2項所述之該導線架基板,更包括:一第一路由線,其貼附於該第一接合基層上,並側向延伸至該調節件及該樹脂層上,其中該第一路由線以該第一連續交錯纖維片及該第一接合基層而與該調節件與該樹脂層間之該界面相隔,並透過貫穿該第一防裂結構之頂部金屬盲孔,熱性導通至該調節件之該些頂部接觸墊,且電性耦接至該些金屬引線。 The lead frame substrate as described in item 2 of the scope of patent application further includes: a first routing wire attached to the first bonding base layer and extending laterally to the adjusting member and the resin layer, wherein The first routing line is separated from the interface between the adjusting member and the resin layer by the first continuous interlaced fiber sheet and the first bonding base layer, and is thermally conducted through the top metal blind hole of the first anti-cracking structure The top contact pads of the adjusting member are electrically coupled to the metal leads. 如申請專利範圍第3項所述之該導線架基板,更包括:一金屬架,其具有平坦之頂面與底面及一穿口,其中該金屬架被該些金屬引線環繞,且該調節件設置於該穿口內,並與該金屬架之內側壁保持距離。 As described in item 3 of the scope of patent application, the lead frame substrate further includes: a metal frame having flat top and bottom surfaces and a through hole, wherein the metal frame is surrounded by the metal leads, and the adjusting member It is arranged in the opening and keeps a distance from the inner side wall of the metal frame. 如申請專利範圍第1項所述之該導線架基板,其中該樹脂層之熱膨脹係數高於該調節件之該熱膨脹係數。 In the lead frame substrate described in item 1 of the scope of patent application, the thermal expansion coefficient of the resin layer is higher than the thermal expansion coefficient of the adjusting member. 如申請專利範圍第1項所述之該導線架基板,其中該調節件之彈性模數大於200GPa。 In the lead frame substrate as described in item 1 of the scope of patent application, the elastic modulus of the adjusting member is greater than 200 GPa. 如申請專利範圍第3項所述之該導線架基板,更包括:一第二防裂結構,其覆蓋該調節件之該底側、該些金屬引線之該些底端及該樹脂層之底面,其中該第二防裂結構包括一第二連續交錯纖維片,其側向延伸於該調節件與該樹脂層間之該界面。 The lead frame substrate described in item 3 of the scope of patent application further includes: a second anti-crack structure covering the bottom side of the adjusting member, the bottom ends of the metal leads, and the bottom surface of the resin layer , Wherein the second anti-cracking structure includes a second continuous interlaced fiber sheet extending laterally at the interface between the adjusting member and the resin layer. 如申請專利範圍第7項所述之該導線架基板,更包括:一第二路由線,其側向延伸至該調節件及該樹脂層上,其中該第二路由線以該第二防裂結構而與該調節件與該樹脂層間之該界面相隔,並透過貫穿該第二防裂結構之底部金屬盲孔,熱性導通至該調節件之該些底部接觸墊,且電性耦接至該些金屬引線。 As described in item 7 of the scope of patent application, the lead frame substrate further includes: a second routing wire extending laterally to the adjusting member and the resin layer, wherein the second routing wire uses the second anti-crack The structure is separated from the interface between the adjusting element and the resin layer, and is thermally conducted to the bottom contact pads of the adjusting element through the bottom metal blind hole of the second anti-cracking structure, and electrically coupled to the Some metal leads. 如申請專利範圍第1項所述之該導線架基板,其中該調節件之該些頂部接觸墊電性耦接至該些底部接觸墊。 In the lead frame substrate described in claim 1, wherein the top contact pads of the adjusting member are electrically coupled to the bottom contact pads. 一種覆晶組體,其包括:如申請專利範圍第3項、第4項、第7項或第8項所述之該導線架基板;以及 一半導體晶片,其透過複數凸塊,電性連接至該導線架基板,該些凸塊設於該半導體晶片與該導線架基板間之空間中,其中至少一該些凸塊重疊於該調節件上,並透過該第一路由線,電性連接至該些金屬引線。 A flip chip assembly comprising: the lead frame substrate as described in item 3, item 4, item 7 or item 8 of the scope of patent application; and a semiconductor chip, which is electrically connected through a plurality of bumps To the lead frame substrate, the bumps are arranged in the space between the semiconductor chip and the lead frame substrate, and at least one of the bumps overlaps the adjustment member and is electrically connected through the first routing line To these metal leads.
TW108114292A 2018-07-26 2019-04-24 Leadframe substrate having modulator and crack inhibiting structure and flip chip assembly using the same TWI703689B (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US16/046,243 US20180359886A1 (en) 2014-03-07 2018-07-26 Methods of making interconnect substrate having stress modulator and crack inhibiting layer and making flip chip assembly thereof
US16/046243 2018-07-26
US16/279696 2019-02-19
US16/279,696 US11291146B2 (en) 2014-03-07 2019-02-19 Leadframe substrate having modulator and crack inhibiting structure and flip chip assembly using the same

Publications (2)

Publication Number Publication Date
TW202008535A TW202008535A (en) 2020-02-16
TWI703689B true TWI703689B (en) 2020-09-01

Family

ID=69383004

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108114292A TWI703689B (en) 2018-07-26 2019-04-24 Leadframe substrate having modulator and crack inhibiting structure and flip chip assembly using the same

Country Status (3)

Country Link
KR (1) KR102228633B1 (en)
CN (1) CN110783300B (en)
TW (1) TWI703689B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI745072B (en) * 2020-09-07 2021-11-01 鈺橋半導體股份有限公司 Wiring board with buffer layer and thermally conductive admixture

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11990353B2 (en) 2017-11-29 2024-05-21 Pep Innovation Pte. Ltd. Semiconductor device with buffer layer
US12506055B2 (en) 2017-11-29 2025-12-23 Pep Innovation Pte. Ltd. Chip packaging method and chip structure
CN115280489B (en) * 2020-07-15 2025-07-01 Pep创新私人有限公司 Semiconductor device with buffer layer
CN114158178B (en) * 2020-09-08 2023-11-07 钰桥半导体股份有限公司 Circuit board with buffer layer and thermal conductive admixture

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110042741A1 (en) * 2009-08-18 2011-02-24 Denso Corporation Semiconductor device having semiconductor chip and metal plate and method for manufacturing the same
US20140251658A1 (en) * 2013-03-07 2014-09-11 Bridge Semiconductor Corporation Thermally enhanced wiring board with built-in heat sink and build-up circuitry
US20170263546A1 (en) * 2014-03-07 2017-09-14 Bridge Semiconductor Corporation Wiring board with electrical isolator and base board incorporated therein and semiconductor assembly and manufacturing method thereof
US20170301617A1 (en) * 2014-03-07 2017-10-19 Bridge Semiconductor Corporation Leadframe substrate with isolator incorporated therein and semiconductor assembly and manufacturing method thereof
US20180040531A1 (en) * 2014-03-07 2018-02-08 Bridge Semiconductor Corporation Method of making interconnect substrate having routing circuitry connected to posts and terminals

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1560911B (en) * 2004-02-23 2010-05-12 威盛电子股份有限公司 Manufacturing method of circuit carrier plate
JP2005294352A (en) * 2004-03-31 2005-10-20 Sanyo Electric Co Ltd Element mounting substrate and semiconductor device using the same
JP2008274046A (en) * 2007-04-26 2008-11-13 Matsushita Electric Ind Co Ltd Prepreg and printed wiring board manufacturing method using the same
JP5715835B2 (en) * 2011-01-25 2015-05-13 新光電気工業株式会社 Semiconductor package and manufacturing method thereof
KR101423401B1 (en) * 2012-12-10 2014-07-24 주식회사 두산 Multi-layered printed circuit board and method of manufacturing the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110042741A1 (en) * 2009-08-18 2011-02-24 Denso Corporation Semiconductor device having semiconductor chip and metal plate and method for manufacturing the same
US20140251658A1 (en) * 2013-03-07 2014-09-11 Bridge Semiconductor Corporation Thermally enhanced wiring board with built-in heat sink and build-up circuitry
US20170263546A1 (en) * 2014-03-07 2017-09-14 Bridge Semiconductor Corporation Wiring board with electrical isolator and base board incorporated therein and semiconductor assembly and manufacturing method thereof
US20170301617A1 (en) * 2014-03-07 2017-10-19 Bridge Semiconductor Corporation Leadframe substrate with isolator incorporated therein and semiconductor assembly and manufacturing method thereof
US20180040531A1 (en) * 2014-03-07 2018-02-08 Bridge Semiconductor Corporation Method of making interconnect substrate having routing circuitry connected to posts and terminals

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI745072B (en) * 2020-09-07 2021-11-01 鈺橋半導體股份有限公司 Wiring board with buffer layer and thermally conductive admixture

Also Published As

Publication number Publication date
KR20200012712A (en) 2020-02-05
CN110783300B (en) 2021-08-13
CN110783300A (en) 2020-02-11
KR102228633B1 (en) 2021-03-16
TW202008535A (en) 2020-02-16

Similar Documents

Publication Publication Date Title
TWI703689B (en) Leadframe substrate having modulator and crack inhibiting structure and flip chip assembly using the same
US11291146B2 (en) Leadframe substrate having modulator and crack inhibiting structure and flip chip assembly using the same
US8248803B2 (en) Semiconductor package and method of manufacturing the same
US20190267307A1 (en) Heat conductive wiring board and semiconductor assembly using the same
US20150115433A1 (en) Semiconducor device and method of manufacturing the same
US10361151B2 (en) Wiring board having isolator and bridging element and method of making wiring board
CN106486459A (en) Face-up semiconductor assembly having semiconductor device in dielectric recess
CN110223971A (en) Dimensional stackable formula semiconductor group body with heat dissipation characteristics
TW201941394A (en) Circuit substrate, stacked semiconductor assembly and manufacturing method thereof
US20180359886A1 (en) Methods of making interconnect substrate having stress modulator and crack inhibiting layer and making flip chip assembly thereof
US20110101531A1 (en) Thermo-mechanical stress in semiconductor wafers
KR100594716B1 (en) Cap wafer having a cavity, a semiconductor chip using the same, and a method of manufacturing the same
TWI720497B (en) Heat conductive wiring board and semiconductor assembly using the same
CN111885810B (en) Heat conducting circuit board and semiconductor assembly thereof
TWI724719B (en) Semiconductor assembly having dual wiring structures and warp balancer
CN112087859B (en) Circuit board with anti-seepage base and embedded components and semiconductor assembly thereof
TWI690253B (en) Interconnect substrate having stress modulator and flip chip assembly thereof and manufacturing methods thereof
JPH07321258A (en) Semiconductor device
TW201933499A (en) Circuit substrate, stacked semiconductor package thereof and manufacturing method thereof
US20190090391A1 (en) Interconnect substrate having stress modulator and flip chip assembly thereof
TWI744649B (en) Wiring board having bridging element straddling over interfaces
TW202008475A (en) Interconnect substrate having stress modulator and flip chip assembly thereof and manufacturing methods thereof
TWI745072B (en) Wiring board with buffer layer and thermally conductive admixture
TW202410362A (en) Semiconductor assembly having dual conduction channels for electricity and heat passage
CN111162053A (en) Interconnection substrate with stress adjusting member, flip chip assembly thereof and manufacturing method thereof