[go: up one dir, main page]

TWI786739B - Die bonding device and method for manufacturing semiconductor device - Google Patents

Die bonding device and method for manufacturing semiconductor device Download PDF

Info

Publication number
TWI786739B
TWI786739B TW110126827A TW110126827A TWI786739B TW I786739 B TWI786739 B TW I786739B TW 110126827 A TW110126827 A TW 110126827A TW 110126827 A TW110126827 A TW 110126827A TW I786739 B TWI786739 B TW I786739B
Authority
TW
Taiwan
Prior art keywords
imaging
substrate
image
mentioned
lighting
Prior art date
Application number
TW110126827A
Other languages
Chinese (zh)
Other versions
TW202219826A (en
Inventor
小橋英晴
高野晴之
中島宜久
內藤大輔
糸井勇太
Original Assignee
日商捷進科技有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商捷進科技有限公司 filed Critical 日商捷進科技有限公司
Publication of TW202219826A publication Critical patent/TW202219826A/en
Application granted granted Critical
Publication of TWI786739B publication Critical patent/TWI786739B/en

Links

Images

Classifications

    • H10P72/53
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/70Circuitry for compensating brightness variation in the scene
    • H04N23/76Circuitry for compensating brightness variation in the scene by influencing the image signals
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/90Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/95Computational photography systems, e.g. light-field imaging systems
    • H04N23/951Computational photography systems, e.g. light-field imaging systems by using two or more images to influence resolution, frame rate or aspect ratio
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N5/00Details of television systems
    • H04N5/222Studio circuitry; Studio devices; Studio equipment
    • H04N5/262Studio circuits, e.g. for mixing, switching-over, change of character of image, other special effects ; Cameras specially adapted for the electronic generation of special effects
    • H04N5/265Mixing
    • H10P72/0448
    • H10P72/3302

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Signal Processing (AREA)
  • Computing Systems (AREA)
  • Theoretical Computer Science (AREA)
  • Die Bonding (AREA)
  • Supply And Installment Of Electrical Components (AREA)
  • Image Processing (AREA)

Abstract

[課題]在於提供能進行複數種類的照明裝置之照明度補正的技術。 [解決手段]晶粒接合裝置具備複數攝像裝置、第一照明裝置、第二照明裝置,和控制複數攝像裝置、第一照明裝置及第二照明裝置的控制部。控制部係被構成從第一照明裝置照射光而藉由複數攝像裝置對攝像對象物進行攝像,將攝像到的複數畫像之亮度分別予以補正,取得結合補正後的複數畫像之第一結合畫像,從第二照明裝置照射光而藉由複數攝像裝置對攝像對象物進行攝像,將攝像到的複數畫像之亮度分別予以補正,取得結合補正後的複數畫像之第二結合畫像,將第一結合畫像和第二結合畫像相加合成。 [Problem] To provide a technology capable of correcting the illuminance of a plurality of types of lighting devices. [Solution] A die bonding apparatus includes a plurality of imaging devices, a first lighting device, and a second lighting device, and a control unit that controls the plurality of imaging devices, the first lighting device, and the second lighting device. The control unit is configured to irradiate light from the first illuminating device to take an image of the object to be imaged by the plurality of imaging devices, correct the brightness of the captured plurality of images, and obtain a first combined image combining the corrected plurality of images, Light is irradiated from the second illuminating device, and the object to be photographed is imaged by a plurality of imaging devices, the brightness of the captured plurality of images is respectively corrected, and a second combined image combining the corrected multiple images is obtained, and the first combined image is obtained. It is added and synthesized with the second combined portrait.

Description

晶粒接合裝置及半導體裝置之製造方法Die bonding device and method for manufacturing semiconductor device

本揭示係關於晶粒接合裝置,例如能夠適用於從複數種類之照明裝置同時照射照明光的晶粒接合器。The present disclosure relates to a die bonding device, and is applicable to, for example, a die bonder that can simultaneously irradiate illumination light from a plurality of types of illumination devices.

作為晶粒接合裝置之晶粒接合器係將樹脂糊、焊料、鍍金等作為接合材料,將半導體晶片(以下,僅稱為晶粒)接合(載置且接合)於配線基板或引線框架等(以下,僅稱為基板)或已被接合的晶粒上的裝置。例如,在將晶粒接合於基板之表面的晶粒接合器中,重覆進行使用被安裝於接合頭之前端之被稱為夾頭的吸附噴嘴,從晶圓吸附晶粒而進行拾取,且載置於基板上之特定位置,賦予推壓力,同時藉由加熱接合材,進行接合的動作(作業)。A die bonder as a die bonding device uses resin paste, solder, gold plating, etc. as a bonding material to bond (place and bond) a semiconductor chip (hereinafter, simply referred to as a die) on a wiring board or a lead frame ( Hereinafter, it is simply referred to as a substrate) or a device on a bonded die. For example, in a die bonder that bonds a die to the surface of a substrate, it is repeatedly picked up by suctioning a die from a wafer using a suction nozzle called a chuck attached to the front end of the bonding head, and The action (operation) of bonding by placing on a specific position on the substrate, applying a pressing force, and heating the bonding material at the same time.

例如,在將樹脂作為接合材料而予以使用之情況,樹脂糊作為接著劑(以下,稱為糊狀接著劑)而被使用。糊狀接著劑被封入至注射器內,該注射器相對於基板上下動作,射出糊狀接著劑而予以塗佈。在注射器之附近,安裝辨識攝影機,藉由該辨識攝影機,確認塗佈糊狀接著劑之位置而進行定位,再者,確認被塗佈之糊狀接著劑是否以特定形狀且僅特定量被塗佈在特定位置。For example, when a resin is used as a bonding material, a resin paste is used as an adhesive (hereinafter, referred to as a paste adhesive). The adhesive paste is enclosed in a syringe, and the syringe moves up and down relative to the substrate to eject and apply the adhesive paste. Install a recognition camera near the syringe, and use the recognition camera to confirm the position where the adhesive paste is applied for positioning. Furthermore, it is confirmed whether the applied adhesive paste is applied in a specific shape and only a specific amount placed in a specific location.

再者,在接合頭之附近安裝辨識攝影機,以該辨識攝影機,確認晶粒被接合的基板之位置而進行定位,再者,確認被接合的晶粒是否被接合於特定位置。Furthermore, an identification camera is installed near the bonding head, and the identification camera is used to confirm the position of the substrate on which the die is bonded for positioning, and furthermore, it is confirmed whether the bonded die is bonded at a specific position.

再者,在晶粒接合器中,因裝置照明系統網羅品種的多樣性、製程的對應、定位或檢查等的演算法之不同,故對一個辨識攝影機搭載複數種類之照明裝置之情形。例如,搭載同軸照明和斜光照明,同時照射照明光。 [先前技術文獻] [專利文獻] Furthermore, in the die bonder, since the lighting system of the device covers the variety of types, the correspondence of the process, the algorithm of positioning or inspection, etc., it is necessary to mount multiple types of lighting devices to one identification camera. For example, it is equipped with coaxial lighting and oblique lighting, and irradiates illumination light at the same time. [Prior Art Literature] [Patent Document]

[專利文獻1]日本特開2017-147258號公報[Patent Document 1] Japanese Patent Laid-Open No. 2017-147258

[發明所欲解決之課題][Problem to be Solved by the Invention]

如上述般,雖然有從複數種類之照明裝置同時照射照射光之情況,但是由於各照明裝置之特性不同引起難以補正攝像畫像之明度。As mentioned above, although there are cases where illumination light is irradiated simultaneously from a plurality of types of lighting devices, it is difficult to correct the brightness of a captured image due to the difference in characteristics of each lighting device.

本揭示之課題係提供能進行複數種類的照明裝置之照明度補正的技術。 [用以解決課題之手段] The subject of this disclosure is to provide a technology capable of correcting the illuminance of a plurality of types of lighting devices. [Means to solve the problem]

若簡單說明本揭示中代表性之內容的概要則如同下述般。 即是,晶粒接合裝置具備複數攝像裝置、第一照明裝置、第二照明裝置,和控制複數攝像裝置、第一照明裝置及第二照明裝置的控制部。控制部係被構成從第一照明裝置照射光而藉由複數攝像裝置對攝像對象物進行攝像,將攝像到的複數畫像之亮度分別予以補正,取得結合補正後的複數畫像之第一結合畫像,從第二照明裝置照射光而藉由複數攝像裝置對攝像對象物進行攝像,將攝像到的複數畫像之亮度分別予以補正,取得結合補正後的複數畫像之第二結合畫像,將第一結合畫像和第二結合畫像相加合成。 [發明之效果] The summary of the representative content in this disclosure is briefly described as follows. That is, the die bonding apparatus includes a plurality of imaging devices, a first lighting device, and a second lighting device, and a control unit that controls the plurality of imaging devices, the first lighting device, and the second lighting device. The control unit is configured to irradiate light from the first illuminating device to take an image of the object to be imaged by the plurality of imaging devices, correct the brightness of the captured plurality of images, and obtain a first combined image combining the corrected plurality of images, Light is irradiated from the second illuminating device, and the object to be photographed is imaged by a plurality of imaging devices, the brightness of the captured plurality of images is respectively corrected, and a second combined image combining the corrected multiple images is obtained, and the first combined image is obtained. It is added and synthesized with the second combined portrait. [Effect of Invention]

若藉由上述晶粒接合裝置時,能進行複數種類之照明裝置之照明度補正。If the above-mentioned die bonding device is used, it is possible to correct the illuminance of multiple types of lighting devices.

以下,針對實施型態及實施例使用圖面予以說明。但是,在以下之說明中,有對相同構成要素賦予相同符號,省略重覆說明之情形。另外,為了使說明更明確,雖然有圖面比起實際態樣,針對各部之寬度、厚度、形狀等,以示意性表示之情形,但是此僅為一例,並非用以限定本發明之解釋。Hereinafter, implementation forms and examples will be described using drawings. However, in the following description, the same reference numerals are given to the same components, and overlapping descriptions may be omitted. In addition, in order to clarify the description, although the width, thickness, shape, etc. of each part may be schematically shown in the drawing compared with the actual state, this is only an example and is not intended to limit the interpretation of the present invention.

首先,使用圖1~圖3,針對本發明者們探討的技術予以說明。圖1為針對攝像裝置之多重化予以說明的俯視圖。圖2為在圖1中從箭號A方向觀看之時的側視圖。圖3為表示用於被多重化的攝像裝置之照明裝置的圖,圖3(a)為剖面圖,圖3(b)為與圖3(a)所示之剖面不同之面的剖面圖。First, the technique that the inventors of the present invention examined will be described using FIGS. 1 to 3 . FIG. 1 is a plan view illustrating multiplexing of an imaging device. Fig. 2 is a side view when viewed from the direction of arrow A in Fig. 1 . FIG. 3 is a diagram showing an illumination device used in a multiplexed imaging device, FIG. 3( a ) is a cross-sectional view, and FIG. 3( b ) is a cross-sectional view of a plane different from that shown in FIG. 3( a ).

例如,如圖1所示般,在基板S之上方,將複數攝像裝置101~103在基板S之寬度方向(Y軸方向)排成一列並予以固定地配設。如圖2所示般,該些攝像裝置101~103係以相同高度在水平方向隔著特定間隔,各攝像裝置101~103之光軸彼此平行並且相對於基板S呈垂直。For example, as shown in FIG. 1 , above the substrate S, a plurality of imaging devices 101 to 103 are arranged in a row in the width direction of the substrate S (Y-axis direction) and fixedly arranged. As shown in FIG. 2 , the imaging devices 101 - 103 are at the same height at a certain interval in the horizontal direction, and the optical axes of the imaging devices 101 - 103 are parallel to each other and perpendicular to the substrate S. As shown in FIG.

在圖1及圖2中,作為一例,表示設置三台攝像裝置,在基板S之一列設置六個接合區域的例,攝像裝置之間距大於接合區域之間距。在此,基板S係例如圖1所示般,為矩形狀並且平板狀,且於縱橫具有多數接合區域AA11~AA16、AA21~AA26、AAn1~AAn6。基板S係被構成例如搬運方向(X軸方向)之長度較寬度方向(Y軸方向)之長度長。1 and 2 show an example in which three imaging devices are provided and six bonding regions are provided in one row of the substrate S, and the distance between the imaging devices is greater than the distance between the bonding regions. Here, the substrate S is rectangular and flat as shown in FIG. 1 , and has many bonding regions AA11 to AA16 , AA21 to AA26 , and AAn1 to AAn6 vertically and horizontally. For example, the board|substrate S is comprised so that the length of a conveyance direction (X-axis direction) may be longer than the length of a width direction (Y-axis direction).

攝像裝置101~103係攝像接合區域AA11~AA16之攝像對象物。在此,攝像裝置101~103之各者之攝像視野IA1~IA3重複。再者,藉由將基板S在搬運方向(X軸方向)移動,依序攝像剩下之列的攝像對象物。藉由使攝像裝置多重化,可以在攝像對象物之略正上方進行攝像,可以提升攝像視野內之照明之均勻性而進行檢查。再者,藉由使攝像裝置多重化,無須移動攝像裝置,可以取得與寬視野光學系統相同的處理效率。The imaging devices 101 to 103 image the imaging objects in the joint areas AA11 to AA16. Here, the imaging fields of view IA1 to IA3 of the imaging devices 101 to 103 overlap each other. Furthermore, by moving the board|substrate S in a conveyance direction (X-axis direction), the imaging target object of the remaining row is imaged sequentially. By multiplying the imaging device, imaging can be performed slightly directly above the imaging object, and the uniformity of illumination in the imaging field of view can be improved for inspection. Furthermore, by multiplying the camera device, the same processing efficiency as that of the wide-field optical system can be obtained without moving the camera device.

多重化之攝像裝置以各者持有相同的照明系統為佳。例如,如圖3(a)所示般,在攝像裝置101~103和基板S之間,配置在內部具面發光面(光源)121a、半鏡(半透鏡)121b的同軸照明121及作為斜光照明的二方向之斜光條照明122。It is better for multiple camera devices to have the same lighting system. For example, as shown in FIG. 3( a ), between the imaging devices 101 to 103 and the substrate S, a coaxial illuminator 121 with a surface light emitting surface (light source) 121 a, a half mirror (half mirror) 121 b and an oblique light as an oblique light are arranged inside. The oblique light strip lighting 122 in two directions of lighting.

來自同軸照明121之面發光面121a之照射光係藉由半鏡121b以與攝像裝置101~103相同的光軸反射,被照射至基板S之接合區域AA11~AA16之攝像對象物。以與攝像裝置101~103相同的光軸被照射至接合區域AA11~AA16之攝像對象物的其散射光,係以接合區域AA11~AA16之攝像對象物反射,其中的正反射光穿透半鏡121b而到達至攝像裝置101~103,形成接合區域AA11~AA16之攝像對象物之畫像。如圖3(b)所示般,被構成面發光面121a及半鏡121b之Y軸方向之長度比在基板S之寬度方向中之攝像裝置101~103之攝像視野全體稍寬。Illuminating light from the surface light-emitting surface 121a of the coaxial illuminator 121 is reflected by the half mirror 121b on the same optical axis as the imaging devices 101-103, and is irradiated to the imaging objects in the bonding regions AA11-AA16 of the substrate S. The scattered light irradiated to the imaging objects in the joint areas AA11-AA16 with the same optical axis as the imaging devices 101-103 is reflected by the imaging objects in the joint areas AA11-AA16, and the regular reflection light penetrates the half mirror 121b and reaches the imaging devices 101-103 to form images of the imaging objects in the bonding areas AA11-AA16. As shown in FIG. 3( b ), the length in the Y-axis direction of the surface light-emitting surface 121 a and the half mirror 121 b is slightly wider than the overall imaging field of view of the imaging devices 101 to 103 in the width direction of the substrate S.

斜光條照明122具有發光面122a,為從斜上方照射攝像對象物的照明,被配置在同軸照明121之兩側。斜光條照明122被構成Y軸方向之長度比在基板S之寬度方向中之攝像裝置101~103之攝像視野全體稍寬。The oblique light bar lighting 122 has a light emitting surface 122 a, is lighting for illuminating the object to be photographed from obliquely above, and is arranged on both sides of the coaxial lighting 121 . The oblique light bar illumination 122 is configured so that the length in the Y-axis direction is slightly wider than the overall imaging field of view of the imaging devices 101 to 103 in the width direction of the substrate S.

接著,針對使用複數攝像裝置及複數照明而取得一個的畫像,使用圖4予以說明。圖4為說明畫像合成的流程圖。Next, a description will be given using FIG. 4 of one image acquired using multiple imaging devices and multiple lighting. FIG. 4 is a flowchart illustrating image synthesis.

控制部200係藉由同軸照明121及斜光條照明122之雙方,照射複數接合區域AA11~AA16之攝像對象物(步驟S1)。控制部200係藉由複數攝像裝置101~103,攝像複數接合區域AA11~AA15之攝像對象物(步驟S2)。控制部200係對以複數攝像裝置101~103攝像到的畫像,進行根據投影轉換或仿射轉換等的座標轉換,而取得將各攝像裝置間之畫像滑順地拼接在一起的一張結合畫像(步驟S3)。The control unit 200 irradiates the imaged objects in the plurality of bonding areas AA11 to AA16 by using both the coaxial illumination 121 and the oblique light strip illumination 122 (step S1 ). The control part 200 images the object to be imaged in the plurality of bonding regions AA11 to AA15 by the plurality of imaging devices 101 to 103 (step S2). The control unit 200 performs coordinate transformation based on projective transformation or affine transformation on the images captured by the plurality of imaging devices 101 to 103, and obtains a combined image in which the images of the imaging devices are smoothly stitched together. (step S3).

接著,在多重化的攝像裝置中,針對同時照射複數種類之照明之情況的問題點,使用圖5及圖6予以說明。圖5為在多重化之攝像裝置中,同時照射複數種類之照明之情況的問題點之攝像畫像的圖,圖5(a)為表示僅以圖3所示之同軸照明的照射時的攝像畫像,圖5(b)為表示僅以圖3所示之斜光條照明的照射時之攝像畫像的圖。圖6為表示在圖5所示之透鏡及照明中使用的照明之組合所致的視野內平均明度之衰減率或放大率之例的圖。Next, in a multiplexed imaging device, problems in the case where plural types of illumination are simultaneously irradiated will be described with reference to FIGS. 5 and 6 . Fig. 5 is a diagram of a photographed image of a problem in the case of simultaneously irradiating plural types of illumination in a multiplexed imaging device, and Fig. 5(a) shows a photographed image when only the coaxial illumination shown in Fig. 3 is irradiated , FIG. 5(b) is a diagram showing a captured image when only the oblique light bar illumination shown in FIG. 3 is irradiated. FIG. 6 is a graph showing an example of attenuation rate or magnification of the average brightness in the field of view due to the combination of the lens shown in FIG. 5 and the illumination used for the illumination.

即使配合各攝像裝置間之特性及各透鏡間之特性,並且使發光面內之照明度均勻,照明之位置相對於多重化的攝像裝置之各攝像裝置之位置也不會相同(攝像裝置和照明之相對位置關係不同),故在各攝像裝置之視野內之亮度產生差異。即是,因在多重化的攝像裝置中,因各攝像裝置之視野內的亮度不同,故需要進行攝像到的畫像之補正。但是,在相同的視野內,混合容易反射同軸照明的區域和容易反射斜光照明的區域。因此,僅在圖5(a)所示的同軸照明121的照射時和僅在圖5(b)所示之斜光條照明122的照射時之亮度不同,其補正值不同。其結果,難以求出同時使用同軸照明121和斜光條照明122之情況的補正值。在此,在圖5中,表示各攝像裝置之視野之邊界線。Even if the characteristics of each imaging device and the characteristics of each lens are matched, and the illuminance in the light-emitting surface is made uniform, the position of the illumination relative to the position of each imaging device of the multiple imaging device will not be the same (the imaging device and the lighting The relative positional relationship is different), so the brightness in the field of view of each camera device is different. That is, in multiple imaging devices, since the brightness in the field of view of each imaging device is different, it is necessary to correct the captured image. However, within the same field of view, there is a mixture of areas that tend to reflect on-axis lighting and areas that tend to reflect oblique lighting. Therefore, only when the on-axis illumination 121 shown in FIG. 5( a ) is irradiated and only when the oblique light bar illumination 122 is irradiated as shown in FIG. 5( b ) is the brightness different, the correction value is different. As a result, it is difficult to obtain a correction value when the coaxial illumination 121 and the oblique light strip illumination 122 are used together. Here, in FIG. 5, the boundary line of the field of view of each imaging device is shown.

而且,除了上述照明引起的亮度不同之外,也產生透鏡111~113之偏差所致的亮度之不同。作為透鏡之個體差,由於開口數、F值(F number)、作動距離(Working Distance:WD)、焦點距離等之加工上之偏差的原因,透鏡之亮度可能會有數%程度的差異。開口數之不同會影響擴散光的聚光量。該透鏡之偏差的起因,和照明系統之原因所產生的畫像間之亮度偏差,係如圖6所示般,其視野內衰減率或放大率分別不同。Furthermore, in addition to the above-mentioned difference in brightness due to illumination, there is also a difference in brightness due to variations in the lenses 111 to 113 . As the individual difference of the lens, the brightness of the lens may have a difference of several percent due to the deviation in processing such as aperture number, F number (F number), working distance (Working Distance: WD), focal length, etc. The difference in the number of openings will affect the concentration of diffused light. The cause of the deviation of the lens and the brightness deviation between the images caused by the illumination system are as shown in Fig. 6, and the attenuation rate or the magnification rate in the field of view is different respectively.

當同時照射同軸照明121及斜光條照明122而予以攝像時,因畫像之亮度以隨著圖6所示之視野內衰減率或放大率的變化率而增減,攝像混合各變化率的畫像,故難以在畫像取得後補正亮度。When the coaxial illumination 121 and the oblique light strip illumination 122 are irradiated at the same time for imaging, since the brightness of the image increases and decreases with the rate of change of the attenuation rate or magnification rate in the field of view shown in FIG. Therefore, it is difficult to correct the brightness after the image is acquired.

接著,針對使用圖3所示之複數攝像裝置及複數種類之照明而取得一個畫像的實施型態中之方法,使用圖3及圖7予以說明。圖7為說明實施型態中之畫像合成的流程圖。Next, a method in an embodiment of obtaining a single image using the multiple imaging devices and multiple types of illumination shown in FIG. 3 will be described using FIG. 3 and FIG. 7 . Fig. 7 is a flowchart illustrating image synthesis in the embodiment.

以被照體(攝像對象物)及攝像系統(攝像裝置、透鏡及照明裝置)為靜止狀態為前提,在藉由各透鏡(攝像裝置)和照明之組合攝像各個畫像,對各照明之每攝像畫像,數位補正透鏡間之亮度,以投影轉換等合成每照明之畫像之後,相加合成在各照明的結合畫像。依此,可以取得投影轉換等所致的均勻的結合畫像(合成畫像)。以下,更詳細地予以說明。On the premise that the object to be irradiated (imaged object) and the imaging system (imaging device, lens and lighting device) are in a static state, each image is captured through the combination of each lens (imaging device) and lighting. For the image, the brightness between the lenses is digitally corrected, the image of each lighting is synthesized by projection conversion, etc., and then the combined image of each lighting is added and synthesized. In this way, a uniform combined image (synthesized image) due to projection transformation or the like can be obtained. Hereinafter, it demonstrates in more detail.

控制部200係僅藉由同軸照明121,對複數接合區域AA11~AA16之複數攝像對象物照射(步驟S11)。在步驟S11之狀態下,控制部200係藉由複數攝像裝置101~103,攝像複數接合區域AA11~AA16之攝像對象物(步驟S12)。控制部200係以在步驟S12中藉由複數攝像裝置101~103攝像到的複數攝像畫像之亮度成為一樣之方式,將各攝像畫像乘以因應亮度的特定係數等而進行數位補正(步驟S13)。控制部200係與步驟S3相同,對在步驟S13補正後的複數畫像,進行根據投影轉換或仿真轉換等的座標轉換,而取得將各攝像裝置間之補正後的畫像滑順地拼接在一起的一張畫像(第一結合畫像)(步驟S14)。The control unit 200 irradiates the plurality of imaging objects in the plurality of bonding areas AA11 to AA16 only by the coaxial illumination 121 (step S11 ). In the state of step S11, the control unit 200 images the imaging objects of the plurality of joining regions AA11 to AA16 by the plurality of imaging devices 101 to 103 (step S12). The control unit 200 performs digital correction by multiplying each captured image by a specific coefficient corresponding to the brightness so that the brightness of the plurality of captured images captured by the plurality of imaging devices 101 to 103 becomes the same in step S12 (step S13) . Similar to step S3, the control unit 200 performs coordinate conversion based on projective conversion or simulation conversion on the complex images corrected in step S13, and obtains a smooth splicing of the corrected images between the imaging devices. One portrait (first combined portrait) (step S14).

控制部200係僅藉由斜光條照明122,對複數接合區域AA11~AA16之複數攝像對象物照射(步驟S15)。在步驟S15之狀態下,控制部200係藉由複數攝像裝置101~103,攝像複數接合區域AA11~AA16之攝像對象物(步驟S16)。控制部200係以在步驟S16中藉由複數攝像裝置101~103攝像到的複數攝像畫像之亮度成為一樣之方式,將各攝像畫像乘以因應亮度的特定係數等而進行數位補正(步驟S17)。控制部200係與步驟S3相同,對在步驟S17補正後的複數畫像,進行根據投影轉換或仿真轉換等的座標轉換,而取得將各攝像裝置間之補正後的畫像滑順地拼接在一起的一張畫像(第二結合畫像)(步驟S18)。The control unit 200 irradiates the plurality of imaging objects in the plurality of joining regions AA11 to AA16 only by the oblique light bar illumination 122 (step S15 ). In the state of step S15, the control part 200 images the object to be imaged in the plurality of joining regions AA11 to AA16 by the plurality of imaging devices 101 to 103 (step S16). The control unit 200 performs digital correction by multiplying each captured image by a specific coefficient corresponding to the brightness so that the brightness of the plurality of captured images captured by the plurality of imaging devices 101 to 103 becomes the same in step S16 (step S17) . Similar to step S3, the control unit 200 performs coordinate conversion based on projective conversion or simulation conversion on the complex images corrected in step S17, and obtains a smooth stitching of the corrected images between the imaging devices. One portrait (second combined portrait) (step S18).

控制部200係進行將在步驟S14中取得的第一結合畫像和在步驟S18中取得的第二結合畫像之對應的位置中的畫素值分別相加的相加合成而取得畫像(合成畫像)(步驟S19)。The control unit 200 obtains an image (synthesized image) by performing additive synthesis in which pixel values at corresponding positions of the first combined image acquired in step S14 and the second combined image acquired in step S18 are respectively added. (step S19).

另外,即使先進行步驟S11~S14和步驟S15~S18中之哪一個亦可。再者,若不同時進行步驟S11、S12和步驟S15、S16即可,即使步驟S13、S14和步驟S17、S18時而同時時而前後進行亦可。In addition, it does not matter which one of steps S11 to S14 and steps S15 to S18 is performed first. Furthermore, steps S11, S12 and steps S15, S16 are not performed at the same time, even if steps S13, S14 and steps S17, S18 are performed at the same time or before and after.

依此,可以取得均勻的結合畫像。因即使進行攝像裝置間之畫像之結合,亦可以使明度一樣,故可以改善攝像裝置間之明度的補正精度。可以提升檢查靈敏度、定位精度。可以補正由於攝像裝置之機差、透鏡之機差及相對於照明之位置的差異所引起的明度。Accordingly, a uniform combined image can be obtained. Since the brightness can be made the same even if the images between the imaging devices are combined, the accuracy of brightness correction between the imaging devices can be improved. It can improve inspection sensitivity and positioning accuracy. It is possible to correct the brightness caused by the machine error of the camera device, the machine error of the lens, and the difference in position relative to the illumination.

再者,在實施型態中,雖然說明複數攝像裝置之例,但是不限定於複數攝像裝置,能夠適用於在一個攝像裝置中同時照射兩個以上的複數照明者。針對其一例,使用圖8予以說明。圖8為表示其他的實施型態中之攝像裝置及照明裝置的圖,圖8(a)為剖面圖,圖8(b)為與圖8(a)所示之剖面不同之面的剖面圖。In addition, although the example of a multiple imaging device was demonstrated in embodiment, it is not limited to a multiple imaging device, It can apply to the person who irradiates two or more plural illuminators simultaneously with one imaging device. An example thereof will be described using FIG. 8 . Fig. 8 is a diagram showing an imaging device and an illumination device in another embodiment, Fig. 8(a) is a cross-sectional view, and Fig. 8(b) is a cross-sectional view of a plane different from the cross-section shown in Fig. 8(a) .

例如,如圖8(b)所示般,在基板S之上方配設能夠在基板S之寬度方向(Y軸方向)移動的攝像裝置101。基板S係與圖1所示的基板S相同,在一列設置6個接合區域。For example, as shown in FIG. 8( b ), above the substrate S, an imaging device 101 capable of moving in the width direction of the substrate S (Y-axis direction) is disposed. The substrate S is the same as the substrate S shown in FIG. 1 , and six bonding regions are provided in a row.

攝像裝置101係藉由在Y軸方向移動,依序攝像接合區域AA11~AA16之攝像對象物。再者,藉由使基板S在搬運方向(Y軸方向)移動,依序攝像剩下之列的攝像對象物。The imaging device 101 sequentially images the imaging objects in the joining regions AA11 to AA16 by moving in the Y-axis direction. Furthermore, by moving the board|substrate S in a conveyance direction (Y-axis direction), the imaging target object of the remaining row is imaged sequentially.

如圖8(a)及圖8(b)所示般,在攝像裝置101和基板S之間,配置與圖3(a)及圖3(b)所示之同軸照明121及二方向之斜光條照明122相同的照明裝置。As shown in Figure 8(a) and Figure 8(b), between the imaging device 101 and the substrate S, the coaxial illumination 121 shown in Figure 3(a) and Figure 3(b) and oblique light in two directions are arranged. Strip lighting 122 is the same lighting device.

接著,針對使用圖8所示之攝像裝置及複數種類之照明的其他實施型態中之方法,使用圖8及圖9予以說明。圖9為說明其他實施型態中之畫像合成的流程圖。Next, a method in another embodiment using the imaging device shown in FIG. 8 and plural types of lighting will be described using FIGS. 8 and 9 . FIG. 9 is a flowchart illustrating image synthesis in another embodiment.

控制部200係僅藉由同軸照明121,對複數接合區域AA11~AA16之複數攝像對象物照射(步驟S21)。在步驟S21之狀態下,控制部200係藉由攝像裝置101,依序攝像複數接合區域AA11~AA16之攝像對象物(步驟S22)。控制部200係以在步驟S22中藉由攝像裝置101攝像到的複數攝像畫像之亮度成為一樣之方式,將各攝像畫像乘以因應亮度的特定係數等而進行數位補正,取得複數被修正後的畫像(第一補正畫像)(步驟S23)。The control unit 200 irradiates the plurality of imaging objects in the plurality of bonding regions AA11 to AA16 only by the coaxial illumination 121 (step S21 ). In the state of step S21, the control unit 200 uses the imaging device 101 to sequentially image the objects to be imaged in the plurality of joining regions AA11 to AA16 (step S22). The control unit 200 performs digital correction by multiplying each captured image by a specific coefficient corresponding to the brightness so that the brightness of the plurality of captured images captured by the imaging device 101 becomes the same in step S22, and obtains a plurality of corrected images. image (first corrected image) (step S23).

控制部200係僅藉由斜光條照明122,對複數接合區域AA11~AA16之複數攝像對象物照射(步驟S25)。在步驟S25之狀態下,控制部200係藉由攝像裝置101,依序攝像複數接合區域AA11~AA15之攝像對象物(步驟S26)。控制部200係以在步驟S12中藉由攝像裝置101攝像到的複數攝像畫像之亮度成為一樣之方式,將各攝像畫像乘以因應亮度的特定係數等而進行數位補正,取得複數被補正後的畫像(第二補正畫像)(步驟S27)。The control unit 200 irradiates the plurality of imaging objects in the plurality of bonding areas AA11 to AA16 only by the oblique light bar illumination 122 (step S25 ). In the state of step S25, the control unit 200 uses the imaging device 101 to sequentially image the objects to be imaged in the plurality of joining regions AA11 to AA15 (step S26). The control unit 200 performs digital correction by multiplying each captured image by a specific coefficient corresponding to the brightness so that the brightness of the plurality of captured images captured by the imaging device 101 becomes the same in step S12, and obtains the multiple corrected images. image (second corrected image) (step S27).

控制部200係將在步驟S23中取得的複數第一補正畫像和在步驟S27中取得的複數第二補正畫像分別相加合成而取得複數畫像(合成畫像)(步驟S29)。The control unit 200 obtains a plurality of images (synthesized images) by adding and synthesizing the plurality of first corrected images acquired in step S23 and the plurality of second corrected images acquired in step S27 (step S29 ).

另外,即使先進行步驟S21~S23和步驟S25~S27中之哪一個亦可。再者,若不同時進行步驟S21、S22和步驟S25、S26即可,即使使步驟S23和步驟S27時而同時時而前後進行亦可。 [實施例] In addition, it does not matter which one of steps S21 to S23 and steps S25 to S27 is performed first. Furthermore, steps S21 and S22 and steps S25 and S26 may not be performed at the same time, and even step S23 and step S27 may be performed at the same time or in front of each other. [Example]

針對適用上述實施型態的實施例以下予以說明。圖10為表示在實施例中之接合器之概略的俯視圖。圖11為從圖10中之箭號A方向觀看時,說明拾取頭及接合頭之動作的圖。Embodiments applicable to the above-mentioned implementation forms will be described below. Fig. 10 is a schematic plan view showing the adapter in the embodiment. Fig. 11 is a diagram illustrating the operation of the pick-up head and the bonding head when viewed from the direction of arrow A in Fig. 10 .

晶粒接合器10大致具有供給安裝於基板S之晶粒D的晶粒供給部1、拾取部2、中間平台部3、預成部9、接合部4、搬運部5、基板供給部6、基板搬出部7、監視且控制各部之動作的控制部8。Y軸方向係晶粒接合器10之前後方向,X軸方向為左右方向。晶粒供給部1被配置在晶粒接合器10之前方側,接合部4被配置在深側。在此,在基板S形成成為最終一封裝體的複數製品區域(以下,稱為封裝區域P)。例如,基板S為引線框架之情況,封裝區域P具有晶粒D被載置的突片。The die bonder 10 roughly includes a die supply unit 1 for supplying a die D mounted on a substrate S, a pickup unit 2, an intermediate platform unit 3, a preforming unit 9, a bonding unit 4, a transport unit 5, a substrate supply unit 6, The substrate unloading unit 7 and the control unit 8 monitor and control the operation of each unit. The Y-axis direction is the front-back direction of the die bonder 10 , and the X-axis direction is the left-right direction. The die supply unit 1 is arranged on the front side of the die bonder 10 , and the bonding unit 4 is arranged on the deep side. Here, on the substrate S, a plurality of product regions (hereinafter referred to as package regions P) to be the final package are formed. For example, when the substrate S is a lead frame, the package region P has a tab on which the die D is placed.

首先,晶粒供給部1係供給安裝於基板S之封裝區域P的晶粒D。晶粒供給部1具有保持晶圓11之晶圓保持台12和以從晶圓11上推晶粒D之虛線所示的剝離單元13。晶粒供給部1係藉由無圖示之驅動手段在XY軸方向移動,使拾取之晶粒D移動至剝離單元13之位置。First, the die supply unit 1 supplies the die D mounted on the package area P of the substrate S. As shown in FIG. The die supply unit 1 has a wafer holding table 12 holding a wafer 11 and a peeling unit 13 shown by a dotted line pushing a die D from the wafer 11 . The die supply part 1 moves in the XY axis direction by a driving means not shown, and moves the picked up die D to the position of the peeling unit 13 .

拾取部2具有拾取晶粒D之拾取頭21、使拾取頭21移動至Y軸方向之拾取頭之Y驅動部23,和使夾頭22升降、旋轉及X軸方向移動的無圖示的各驅動部,和掌握從晶圓11拾取的晶粒D之拾取位置的晶圓辨識攝影機24。拾取頭21具有將被上推的晶粒D吸附保持在前端的夾頭22(也參照圖11),從晶粒供給部1拾取晶粒D,載置於中間平台31。拾取頭21具有使夾頭22升降、旋轉及X軸方向移動的無圖示之各驅動部。The pick-up unit 2 has a pick-up head 21 for picking up the die D, a Y drive unit 23 for the pick-up head that moves the pick-up head 21 to the Y-axis direction, and various components (not shown) that move the chuck 22 up and down, rotate, and move in the X-axis direction. A drive unit, and a wafer recognition camera 24 for grasping the pick-up position of the die D picked up from the wafer 11 . The pick-up head 21 has a chuck 22 (also refer to FIG. 11 ) that sucks and holds the pushed-up die D at the tip, picks up the die D from the die supply unit 1 , and mounts it on the intermediate table 31 . The pick-up head 21 has drive units (not shown) for moving the chuck 22 up and down, rotating, and moving in the X-axis direction.

中間平台部3具有暫時性地載置晶粒D之中間平台31,和用以辨識中間平台31上之晶粒D的平台辨識攝影機32。The intermediate stage part 3 has an intermediate stage 31 on which the die D is temporarily placed, and a stage identification camera 32 for identifying the die D on the intermediate stage 31 .

預成部9具有注射器91和使注射器91在Y方向及Z方向移動的驅動部93,和作為掌握注射器91之塗佈位置等之攝像裝置的接著劑辨識攝影機94。在此,接著劑辨識攝影機94係與例如實施型態之多重化的攝像裝置101~103相同,接著劑辨識攝影機94被構成使用在實施型態中之同軸照明121及二方向之斜光條照明122而進行攝像。預成部9係以注射器91對藉由搬運部5被搬運來的基板S塗佈環氧樹脂等之糊狀接著劑。注射器91係內部被封入糊狀接著劑,被構成藉由空氣壓,糊狀接著劑從噴嘴前端被推出至基板S而被塗佈。基板S例如以橫向一列排列複數個單位引線框架而一連串地被連貫設置的多重引線框架之情況,在單位引線框架之每突片塗佈糊狀接著劑。The preforming unit 9 has a syringe 91 , a drive unit 93 for moving the syringe 91 in the Y direction and Z direction, and an adhesive recognition camera 94 as an imaging device for grasping the application position of the syringe 91 and the like. Here, the adhesive agent recognition camera 94 is the same as the multiple imaging devices 101 to 103 of the embodiment, and the adhesive agent recognition camera 94 is composed of the coaxial lighting 121 and the two-directional oblique light strip lighting 122 used in the embodiment. And take pictures. The preforming unit 9 applies a paste-like adhesive such as epoxy resin to the substrate S transported by the transport unit 5 with a syringe 91 . The syringe 91 is configured such that the adhesive paste is sealed inside, and the adhesive paste is pushed out from the tip of the nozzle to the substrate S by air pressure to be applied. In the case of the substrate S, for example, a plurality of unit lead frames are arranged in a row horizontally to form a series of multiple lead frames, and a paste-like adhesive is applied to each tab of the unit lead frame.

接合部4係從中間平台31拾取晶粒D,接合於被搬運而來的基板S之塗佈有糊狀接著劑之封裝區域P上。接合部4具有:具備與拾取頭21相同將晶粒D吸附保持於前端的夾頭42(也參照圖11)的接合頭41、使接合頭41在Y軸方向移動之Y驅動部43,和攝像基板S之封裝區域P之位置辨識標記(無圖示),辨識接合位置之基板辨識攝影機44。在此,基板辨識攝像機44係由三台的攝影機44a、44b、44c構成,例如與實施型態之多重化的攝像裝置101~103相同,基板辨識攝影機44被構成使用在實施型態中之同軸照明121及二方向之斜光條照明122而進行攝像。藉由如此之構成,接合頭41根據平台辨識攝影機32之攝影資料而補正拾取位置、姿勢,從中間平台31拾取晶粒D,且根據基板辨識攝影機44之攝影資料將晶粒D接合於基板。The bonding part 4 picks up the die D from the intermediate platform 31 and bonds it to the package area P coated with the paste adhesive of the transported substrate S. The bonding unit 4 has a bonding head 41 including a chuck 42 (also refer to FIG. 11 ) that adsorbs and holds the die D at the tip similar to the pick-up head 21, a Y drive unit 43 that moves the bonding head 41 in the Y-axis direction, and The position identification mark (not shown) of the packaging area P of the camera substrate S is photographed, and the substrate identification camera 44 is used to identify the bonding position. Here, the substrate recognition camera 44 is composed of three cameras 44a, 44b, and 44c. For example, it is the same as the multiplexed imaging devices 101-103 of the embodiment. The substrate recognition camera 44 is configured as a coaxial camera used in the embodiment. The illumination 121 and the oblique light strip illumination 122 in two directions are used for imaging. With such a configuration, the bonding head 41 corrects the pick-up position and posture based on the imaging data of the platform recognition camera 32 , picks up the die D from the intermediate stage 31 , and bonds the die D to the substrate based on the imaging data of the substrate recognition camera 44 .

搬運部5具有抓取搬運基板S之基板搬運爪51和基板S移動之搬運通道52。基板S係藉由利用沿著搬運通道52而設置之無圖示滾珠螺桿驅動被設置在搬運通道52之基板搬運爪51之無圖示的螺帽而移動。藉由如此之構成,基板S係從基板供給部6沿著搬運通道52而移動至接合位置,於接合後,移動至基板搬出部7,將基板S交給至基板搬出部7。The conveyance unit 5 has a substrate conveyance claw 51 for grasping and conveying the substrate S, and a conveyance path 52 for moving the substrate S. As shown in FIG. The substrate S is moved by driving an unillustrated nut provided on the substrate conveyance claw 51 provided on the conveyance passage 52 by a ball screw (not shown) provided along the conveyance passage 52 . With such a configuration, the substrate S is moved from the substrate supply unit 6 to the bonding position along the conveyance path 52 , and after bonding, is moved to the substrate carry-out portion 7 , and the substrate S is delivered to the substrate carry-out portion 7 .

接著,針對晶粒供給部1之構成,使用圖12進行說明。圖12為表示圖10所示之晶粒供給部之主要部位的概略剖面圖。Next, the structure of the crystal grain supply part 1 is demonstrated using FIG. 12. FIG. Fig. 12 is a schematic cross-sectional view showing main parts of the crystal grain supply unit shown in Fig. 10 .

晶粒供給部1具備在水平方向(XY軸方向)移動的晶圓保持台12,在上下方向移動的剝離單元13。晶圓保持台12具備保持晶圓環14之擴張環15,和將被固定在晶圓環14的切割膠帶16定位成水平的支持環17。在晶圓11中,被切割成網眼狀的晶粒D被接著固定於切割膠帶16。剝離單元13被配置在支持環17之內側。The die supply unit 1 includes a wafer holding table 12 that moves in the horizontal direction (XY axis direction), and a peeling unit 13 that moves in the vertical direction. The wafer holding table 12 includes an expansion ring 15 for holding the wafer ring 14 and a support ring 17 for horizontally positioning the dicing tape 16 fixed to the wafer ring 14 . In the wafer 11 , the die D diced into a mesh shape is then fixed to the dicing tape 16 . The peeling unit 13 is disposed inside the support ring 17 .

晶粒供給部1係於晶粒D之上推時,使保持晶圓環14之擴張環15下降。其結果,被保持在晶圓環14之切割膠帶16被拉長,晶粒D之間隔變寬,藉由剝離單元13時而從晶粒D下方上推切割膠帶16時而進行水平移動,而提升晶粒D之拾取性。When the die supply unit 1 pushes up the die D, the expansion ring 15 holding the wafer ring 14 descends. As a result, the dicing tape 16 held on the wafer ring 14 is elongated, the interval between the dies D is widened, and when the peeling unit 13 pushes up the dicing tape 16 from below the die D, it moves horizontally, and Improve pick-up of Die D.

針對晶粒接合器10之控制系統,使用圖13予以說明。圖13為表示圖10所示之晶粒接合器之控制系統之概略構成的方塊圖。The control system of the die bonder 10 will be described using FIG. 13 . FIG. 13 is a block diagram showing a schematic configuration of a control system of the die bonder shown in FIG. 10 .

如圖11所示般,控制系統80具備控制部8和驅動部86和訊號部87和光學系統88。控制部8大致具有主要以CPU(Central Processor Unit)所構成之控制運算裝置81、記憶裝置82、輸入輸出裝置83、匯流排線84、電源部85。記憶裝置82具有以記憶有處理程式等之RAM所構成之主記憶裝置82a,和以記憶有控制所需之控制資料或畫像資料等之HDD所構成的輔助記憶裝置82b。輸入輸出裝置83具有顯示裝置狀態或資訊等之螢幕83a,和輸入操作員之指示的觸控面板83b,和操作螢幕的滑鼠83c,和擷取來自光學系統88之畫像資料的畫像擷取裝置83d。再者,輸入輸出裝置83具有控制晶粒供給部1之XY平台(無圖示)或接合頭台之ZY驅動軸等之驅動部86之馬達控制裝置83e,和從各種感測器訊號或照明裝置等之開關等之訊號部87擷取或控制訊號的I/O訊號控制裝置83f。光學系統88包含圖11所示的晶圓辨識攝影機24、圖10所示的接著劑辨識攝影機94、平台辨識攝影機32及基板辨識攝影機44。控制運算裝置81經由匯流排線84擷取所需的資料,進行運算,且進行拾取頭41等之控制,或將資訊送至螢幕83a等。As shown in FIG. 11 , the control system 80 includes a control unit 8 , a drive unit 86 , a signal unit 87 , and an optical system 88 . The control unit 8 generally has a control operation device 81 mainly composed of a CPU (Central Processor Unit), a memory device 82 , an input/output device 83 , a bus line 84 , and a power supply unit 85 . The memory device 82 has a main memory device 82a composed of RAM storing processing programs and the like, and an auxiliary memory device 82b composed of HDD storing control data and image data required for control. The input and output device 83 has a screen 83a for displaying device status or information, etc., a touch panel 83b for inputting instructions from the operator, a mouse 83c for operating the screen, and an image capture device for capturing image data from the optical system 88 83d. Moreover, the input/output device 83 has a motor control device 83e for controlling the drive unit 86 of the XY stage (not shown) of the crystal grain supply unit 1 or the ZY drive shaft of the bonding head stage, etc., and signals from various sensors or lighting The I/O signal control device 83f of the signal part 87 of the switch etc. of the device etc. fetches or controls a signal. The optical system 88 includes the wafer recognition camera 24 shown in FIG. 11 , the adhesive recognition camera 94 shown in FIG. 10 , the platform recognition camera 32 and the substrate recognition camera 44 . The control computing device 81 captures the required data through the bus line 84, performs calculations, and controls the pick-up head 41, etc., or sends information to the screen 83a, etc.

控制部8係經由畫像擷取裝置83d而將以光學系統88攝像到的畫像資料保存於記憶裝置82。依據根據保存的畫像資料而編程的軟體,使用控制運算裝置81而進行晶粒D及基板S之定位,糊狀接著劑之塗佈圖案之檢查以及晶粒D及基板S之表面檢查。根據控制運算裝置81所算出之晶粒D及基板S之位置,藉由軟體經由馬達控制裝置83e使驅動部86移動。藉由該製程,進行晶圓11上之晶粒D之定位,以晶粒供給部1及晶粒接合部4之驅動部進行動作,將晶粒D接合於基板S上。在光學系統88使用的辨識攝影機係灰階、彩色攝影機等,使光強度予以數值化。The control unit 8 saves the image data captured by the optical system 88 in the memory device 82 via the image capture device 83d. According to the software programmed based on the stored image data, the control calculation device 81 is used to perform positioning of the die D and the substrate S, inspection of the coating pattern of the paste adhesive, and surface inspection of the die D and the substrate S. Based on the positions of the die D and the substrate S calculated by the control computing device 81, the drive unit 86 is moved by software through the motor control device 83e. Through this process, the positioning of the die D on the wafer 11 is performed, and the driving unit of the die supply unit 1 and the die bonding unit 4 operates to bond the die D on the substrate S. The recognition camera used in the optical system 88 is a gray scale, color camera, etc., and digitizes the light intensity.

接著,針對使用與實施例有關之晶粒接合器的半導體裝置之製造方法,使用圖14進行說明。圖14為表示使用圖10之晶粒接合器的半導體裝置之製造方法之流程圖。Next, the manufacturing method of the semiconductor device using the die bonder concerning an Example is demonstrated using FIG. 14. FIG. FIG. 14 is a flowchart showing a method of manufacturing a semiconductor device using the die bonder shown in FIG. 10 .

(步驟S51:晶圓、基板搬入工程) 將保持貼附從晶圓11被分割之晶粒D的切割膠帶16的晶圓環14儲存於晶圓卡匣(無圖示),搬入至晶粒接合器10。控制部8係從填充有晶圓環14之晶圓卡匣對晶粒供給部1供給晶圓環14。再者,準備基板S,搬入至晶粒接合器10。控制部8係以基板供給部6將基板S安裝於基板搬運爪51。 (Step S51: Wafer and substrate loading process) The wafer ring 14 holding the dicing tape 16 attached to the die D divided from the wafer 11 is stored in a wafer cassette (not shown), and loaded into the die bonder 10 . The control unit 8 supplies the wafer ring 14 to the die supply unit 1 from a wafer cassette filled with the wafer ring 14 . Furthermore, the board|substrate S is prepared, and it carries in to the die bonder 10. The control part 8 mounts the board|substrate S to the board|substrate conveyance claw 51 by the board|substrate supply part 6.

(步驟S52:拾取工程) 控制部8係藉由晶圓保持台12以可以從晶圓環14拾取所期望的晶粒D之方式,移動晶圓環14,根據藉由晶圓辨識攝影機24攝像到的資料進行定位及表面檢查。控制部8係藉由剝離單元13從切割膠帶16剝離被定位的晶粒D。 (Step S52: pick up project) The control unit 8 moves the wafer ring 14 in such a way that the desired die D can be picked up from the wafer ring 14 by the wafer holding table 12, and performs positioning and surface inspection based on the data captured by the wafer recognition camera 24. examine. The control unit 8 peels the positioned die D from the dicing tape 16 by the peeling unit 13 .

控制部8係藉由拾取頭21從晶圓11拾取被剝離的晶粒D。如此一來,從切割膠帶16被剝離的晶粒D被吸附、保持在拾取頭21之夾頭22而被搬運至下一個工程(步驟S53)。而且,當將晶粒D從搬運至下一個工程的夾頭22返回至晶粒供給部1時,依照上述順序,接著的晶粒D從切割膠帶16被剝離,之後依照相同的順序,晶粒D從切割膠帶16一個一個地被剝離。The control unit 8 picks up the peeled die D from the wafer 11 by the pick-up head 21 . In this way, the die D peeled off from the dicing tape 16 is sucked and held by the chuck 22 of the pick-up head 21 to be transported to the next process (step S53 ). And when the die D is returned to the die supply unit 1 from the chuck 22 transported to the next process, the following die D is peeled off from the dicing tape 16 according to the above procedure, and then the die D is peeled off according to the same procedure. D is peeled off one by one from the dicing tape 16 .

(步驟S53:接合工程) 控制部8係藉由接著劑辨識攝影機94而取得塗佈前之基板S之表面的畫像而確認應塗佈糊狀接著劑的表面。若在應塗佈的表面無產生問題時,控制部8係從注射器91對藉由搬運部5被搬運的基板S塗佈糊狀接著劑。基板S為多重引線框架之情況,對所有的突片塗佈糊狀接著劑。控制部8係以接著劑辨識攝影機94再次確認塗佈後糊狀接著劑是否正確地被塗佈,檢查被塗佈的糊狀接著劑。若塗佈無產生問題時,控制部8係藉由搬運部將基板S搬運至接合台BS,根據藉由基板辨識攝影機44攝像到的畫像資料而進行定位。 (Step S53: Joining process) The control part 8 acquires the image of the surface of the board|substrate S before application|coating by the adhesive agent recognition camera 94, and confirms the surface to which a paste adhesive agent should be applied. If there is no problem on the surface to be coated, the control unit 8 applies the paste adhesive from the syringe 91 to the substrate S transported by the transport unit 5 . When the substrate S is a multi-lead frame, paste adhesive is applied to all the tabs. The control unit 8 uses the adhesive recognition camera 94 to reconfirm whether the adhesive paste is applied correctly after application, and inspects the applied adhesive paste. If there is no problem in coating, the control unit 8 transports the substrate S to the bonding station BS by the transport unit, and performs positioning based on the image data captured by the substrate recognition camera 44 .

控制部8係將從晶圓11藉由拾取頭21拾取到的晶粒D載置於中間平台31,以接合頭41從中間平台31再次拾取晶粒D,接合於被定位的基板S。控制部8係根據藉由基板辨識攝影機44攝像到的畫像資料,進行晶粒D是否被接合於期望的位置等的檢查。The control unit 8 places the die D picked up from the wafer 11 by the pick-up head 21 on the intermediate platform 31 , picks up the die D from the intermediate platform 31 again by the bonding head 41 , and bonds it to the positioned substrate S. The control unit 8 checks whether or not the die D is bonded at a desired position based on the image data captured by the substrate recognition camera 44 .

(步驟S54:基板搬出工程) 控制部8係以基板搬出部7從基板搬運爪51取出被接合晶粒D的基板S。從晶粒接合器10搬出基板S。 (Step S54: Substrate unloading process) The control unit 8 takes out the substrate S of the dies D to be bonded from the substrate conveying claw 51 by the substrate carrying out unit 7 . The substrate S is unloaded from the die bonder 10 .

以上,雖然根據實施型態及實施例對本發明者們所創作岀之發明進行具體性說明,但是本揭示並不限定於上述實施型態及實施例,當然可以做各種變更。As mentioned above, although the invention created by the present inventors was concretely described based on the embodiment and the Example, this indication is not limited to the said embodiment and Example, Of course, various changes are possible.

例如,在實施型態中,雖然說明照射同軸照明和斜光條照明的例,但是非限定於此者,能夠適用於不同之種類的照明。例如,即使為斜光環照明、四方向斜光條照明、圓頂照明、穿透照明等亦可。For example, in the embodiment, an example of irradiating coaxial lighting and oblique light bar lighting was described, but it is not limited thereto and can be applied to different types of lighting. For example, oblique ring lighting, four-way oblique light bar lighting, dome lighting, penetrating lighting, etc. are also possible.

再者,在實施型態中,雖然說明兩個照明裝置之例,但是不限定於兩個照明裝置,能適用於同時照射三個以上的複數照明者。In addition, in the embodiment, although the example of two lighting devices was described, it is not limited to two lighting devices, and it can be applied to those who irradiate three or more plural lighting devices at the same time.

再者,在實施例中,雖然說明接著劑辨識攝影機94及基板辨識攝影機44與實施型態之多重化的攝像裝置101~103相同的例,但是即使與其他實施型態之不多重化的攝像裝置101相同亦可。Furthermore, in the embodiment, although the example in which the adhesive agent recognition camera 94 and the substrate recognition camera 44 are the same as the multiplexed imaging devices 101 to 103 of the embodiment is described, even with the non-multiplexed imaging of other embodiments, The device 101 can also be the same.

再者,在實施例中,雖然說明以預成部在基板塗佈糊狀接著劑之例,但是將晶粒黏接於基板之接著劑,即使使用被黏貼於晶圓11和切割膠帶16之間的被稱為晶粒黏接膜(DAF)的薄膜狀之接著材料,以取代藉由注射器91被塗佈的糊狀接著劑亦可。DAF適用於在基板S上之晶粒上載置許多片晶粒而構成的疊層封裝體。Furthermore, in the embodiment, although the example of applying a paste-like adhesive on the substrate in the prefabricated part is described, the adhesive for bonding the die to the substrate even if the adhesive bonded to the wafer 11 and the dicing tape 16 is used A film-like adhesive material called Die Adhesive Film (DAF) may be used instead of the paste-like adhesive applied by the syringe 91 . DAF is suitable for a stacked package formed by mounting many chips on a chip on a substrate S.

再者,在實施例中,雖然說明在晶粒供給部1和接合部4之間,設置中間平台部3,將以拾取頭21從晶粒供給部1拾取到的晶粒D載置於中間平台31,以接合頭41從中間平台31再次拾取晶粒D,接合於被搬運來的基板S之例,但是即使以接合頭41將從晶粒供給部1拾取到的晶粒D接合於基板S亦可。Furthermore, in the embodiment, although it is described that an intermediate platform portion 3 is provided between the die supply unit 1 and the bonding unit 4, the die D picked up from the die supply unit 1 by the pick-up head 21 is placed in the middle. The platform 31 is an example where the bonding head 41 picks up the die D again from the intermediate stage 31 and bonds it to the substrate S being transported. S is also available.

10:晶粒接合器(晶粒接合裝置) 101~103:攝像裝置 111~113:透鏡 121:同軸照明(第一照明裝置) 122:斜光條照明(第二照明裝置) 200:控制部 10: Die bonder (die bonder) 101~103: camera device 111~113: lens 121: Coaxial lighting (the first lighting device) 122: Oblique light strip lighting (second lighting device) 200: control department

[圖1]為針對攝像裝置之多重化予以說明的俯視圖。 [圖2]為在圖1中從箭號A方向觀看之時的側視圖。 [圖3]為表示用於被多重化之攝像裝置的照明裝置的圖。 [圖4]為說明被多重化之攝像裝置之攝像畫像之合成的流程圖。 [圖5]為表示說明在多重化的攝像裝置中同時照射複數種類的照明之情況的問題點之攝像畫像的圖。 [圖6]為表示藉由使用的照明之組合所致的視野內平均明度之衰減率或放大率之例的圖。 [圖7]為說明實施型態中之畫像合成的流程圖。 [圖8]為表示在其他實施型態中之攝像裝置及照明裝置的圖。 [圖9]為說明其他實施型態中之畫像合成的流程圖。 [圖10]為表示在實施例中之接合器之概略的俯視圖。 [圖11]為從圖10中之箭號A方向觀看時,說明拾取頭及接合頭之動作的圖。 [圖12]為表示圖10所示之晶粒供給部之主要部位的概略剖面圖。 [圖13]為表示圖10所示之晶粒接合器之控制系統之概略構成的方塊圖。 [圖14]為表示圖10所示之晶粒接合器的半導體裝置之製造方法之流程圖。 [FIG. 1] It is a plan view explaining the multiplexing of an imaging device. [ Fig. 2 ] It is a side view when viewed from the direction of arrow A in Fig. 1 . [ Fig. 3 ] is a diagram showing an illumination device used in a multiplexed imaging device. [FIG. 4] It is a flow chart explaining the composition of the captured image of the multiplexed imaging device. [FIG. 5] It is a figure which shows the captured image explaining the problem of the case where plural types of illuminations are irradiated simultaneously in the multiplexed imaging device. [ Fig. 6 ] is a graph showing an example of attenuation rate or magnification rate of the average brightness in the field of view due to the combination of illuminations used. [ Fig. 7 ] is a flow chart illustrating image synthesis in the embodiment. [ Fig. 8 ] is a diagram showing an imaging device and a lighting device in another embodiment. [ Fig. 9 ] is a flow chart illustrating image synthesis in another embodiment. [ Fig. 10 ] is a schematic plan view showing the adapter in the embodiment. [FIG. 11] It is a figure explaining the operation|movement of a pick-up head and a bonding head seen from the direction of the arrow A in FIG. 10. [ Fig. 12] Fig. 12 is a schematic cross-sectional view showing main parts of the crystal grain supply unit shown in Fig. 10 . [ Fig. 13 ] is a block diagram showing a schematic configuration of a control system of the die bonder shown in Fig. 10 . [FIG. 14] It is a flowchart which shows the manufacturing method of the semiconductor device of the die bonder shown in FIG. 10.

Claims (18)

一種晶粒接合裝置,被構成具備: 複數攝像裝置; 複數透鏡,其係被設置在上述複數攝像裝置之各者; 第一照明裝置; 第二照明裝置,其種類與上述第一照明裝置不同;和 控制部,其係控制上述複數攝像裝置、上述第一照明裝置及上述第二照明裝置, 上述控制部係 從上述第一照明裝置照射光而藉由上述複數攝像裝置對攝像對象物進行攝像,將攝像到的複數畫像之亮度分別予以補正,取得結合補正後的複數畫像之第一結合畫像, 從上述第二照明裝置照射光而藉由上述複數攝像裝置對攝像對象物進行攝像,將攝像到的複數畫像之亮度分別予以補正,取得結合補正後的複數畫像之第二結合畫像, 將上述第一結合畫像和上述第二結合畫像相加合成。 A die bonding apparatus is configured to have: multiple cameras; A plurality of lenses installed on each of the above-mentioned plurality of imaging devices; the first lighting device; a second lighting device of a different kind from the above-mentioned first lighting device; and a control unit that controls the plurality of imaging devices, the first lighting device, and the second lighting device, The above control department irradiating light from the first illuminating device to image the object to be imaged by the plurality of imaging devices, correcting the luminances of the captured images respectively, and obtaining a first combined image combining the corrected images, irradiating light from the second illuminating device, imaging the object to be photographed by the plurality of imaging devices, correcting the luminance of the captured plurality of images, and obtaining a second combined image combining the corrected plurality of images, Adding and synthesizing the above-mentioned first combined portrait and the above-mentioned second combined portrait. 如請求項1之晶粒接合裝置,其中 上述第一照明裝置為同軸照明,上述第二照明裝置為二方向斜光條照明。 The die bonding device as claimed in claim 1, wherein The above-mentioned first lighting device is coaxial lighting, and the above-mentioned second lighting device is two-directional oblique light strip lighting. 如請求項1之晶粒接合裝置,其中 上述控制部係被構成藉由投影轉換生成上述第一結合畫像及上述第二結合畫像。 The die bonding device as claimed in item 1, wherein The control unit is configured to generate the first combined image and the second combined image by projection conversion. 如請求項1之晶粒接合裝置,其中 上述複數攝像裝置係在被搬運的基板之上方沿著上述基板之寬度方向而被固定配設在一列, 上述控制部係被構成以上述複數攝像裝置攝像位於上述基板上之沿著上述寬度方向之一列的複數接合區域之攝像對象物。 The die bonding device as claimed in claim 1, wherein The plurality of imaging devices are fixedly arranged in a row along the width direction of the substrate above the conveyed substrate, The control unit is configured to use the plurality of imaging devices to image imaging objects of a plurality of bonding regions located in a row along the width direction on the substrate. 如請求項4之晶粒接合裝置,其中 上述控制部係被構成將上述基板在該基板之長度方向予以搬運而以上述複數攝像裝置攝像下一列之複數接合區域之上述攝像對象物。 Such as the die bonding device of claim 4, wherein The control unit is configured to transport the substrate in the longitudinal direction of the substrate and image the imaging target object in the plurality of bonding regions in the next row with the plurality of imaging devices. 如請求項5之晶粒接合裝置,其中 上述攝像對象物係被塗佈於上述基板之糊狀接著劑。 Such as the die bonding device of claim 5, wherein The object to be photographed is a paste adhesive coated on the substrate. 如請求項5之晶粒接合裝置,其中 上述攝像對象物係上述基板或被接合於已經被接合之晶粒上的晶粒。 Such as the die bonding device of claim 5, wherein The object to be imaged is the substrate or a die bonded to an already bonded die. 一種半導體裝置之製造方法,包含: 搬入工程,其係對具備在基板之上方沿著上述基板之寬度方向而被固定配設成一列的複數攝像裝置,和被設置在上述複數攝像裝設之各者的複數透鏡,和第一照明裝置,和種類與上述第一照明裝置不同的第二照明裝置的晶粒接合裝置,搬入上述基板;和 攝像工程,其係攝像位於上述基板上之複數接合區域之攝像對象, 上述攝像工程包含: 從上述第一照明裝置照射光而藉由上述複數攝像裝置攝像沿著上述寬度方向之一列的複數接合區域之攝像對象物,將攝像到的複數畫像之亮度分別予以補正,取得結合補正後的複數畫像之第一結合畫像的工程;及 從上述第二照明裝置照射光而藉由上述複數攝像裝置攝像沿著上述寬度方向之一列的複數接合區域之上述攝像對象物,將攝像到的複數畫像之亮度分別予以補正,取得結合補正後的複數畫像之第二結合畫像的工程;及 將上述第一結合畫像和上述第二結合畫像相加合成的工程。 A method of manufacturing a semiconductor device, comprising: The importing process includes a plurality of imaging devices fixedly arranged in a row along the width direction of the substrate above the substrate, a plurality of lenses installed on each of the plurality of imaging devices, and the first lighting device, and a die bonding device of a second lighting device of a type different from the first lighting device described above, loaded into the substrate; and Imaging engineering, which is to image the imaging object of the plurality of bonding areas located on the above-mentioned substrate, The above camera project includes: Light is irradiated from the above-mentioned first illuminating device, and the image-capturing objects of the plurality of joining regions along the one row in the width direction are imaged by the plurality of imaging devices, and the luminances of the captured plurality of images are respectively corrected to obtain a combined and corrected image. The works of the first combined portrait of the portrait; and Light is irradiated from the second illuminating device, and the above-mentioned object to be imaged is imaged by the plurality of image-capturing devices in the plurality of bonded regions along one row in the width direction, and the luminances of the imaged plural images are respectively corrected to obtain combined and corrected images. The engineering of the second joint image of the plurality of images; and A process of adding and synthesizing the above-mentioned first combined image and the above-mentioned second combined image. 如請求項8之半導體裝置之製造方法,其中 上述第一照明裝置為同軸照明,上述第二照明裝置為二方向斜光條照明。 The method of manufacturing a semiconductor device according to Claim 8, wherein The above-mentioned first lighting device is coaxial lighting, and the above-mentioned second lighting device is two-directional oblique light strip lighting. 如請求項8之半導體裝置之製造方法,其中 藉由投影轉換生成上述第一結合畫像及上述第二結合畫像。 The method of manufacturing a semiconductor device according to Claim 8, wherein The above-mentioned first combined image and the above-mentioned second combined image are generated by projection transformation. 如請求項8之半導體裝置之製造方法,其中 上述攝像工程係將上述基板在該基板之長度方向予以搬運而以上述複數攝像裝置攝像下一列之複數接合區域之攝像對象物。 The method of manufacturing a semiconductor device according to Claim 8, wherein In the imaging process, the substrate is transported in the longitudinal direction of the substrate, and the imaging target of the plurality of bonding regions in the next row is imaged by the plurality of imaging devices. 如請求項8至11中之任一項之半導體裝置之製造方法,其中 進一步具備在上述基板塗佈糊狀接著劑的工程, 上述攝像對象物係被塗佈的上述糊狀接著劑。 The method of manufacturing a semiconductor device according to any one of claims 8 to 11, wherein It is further equipped with the process of coating the paste adhesive on the above-mentioned substrate, The object to be imaged is the applied paste adhesive. 如請求項8至11中之任一項之半導體裝置之製造方法,其中 進一步具備將晶粒接合於上述基板或已被接合之晶粒上之工程, 上述攝像對象物係被接合的上述晶粒。 The method of manufacturing a semiconductor device according to any one of claims 8 to 11, wherein further possesses the process of bonding dies to the above-mentioned substrates or dies that have been bonded, The object to be imaged is the bonded crystal grain. 一種晶粒接合裝置,被構成具備: 攝像裝置; 透鏡,其係被設置在上述攝像裝置; 第一照明裝置; 第二照明裝置,其種類與上述第一照明裝置不同;和 控制部,其係控制上述攝像裝置、上述第一照明裝置及上述第二照明裝置, 上述控制部係 從上述第一照明裝置照射光而藉由上述攝像裝置對攝像對象物進行攝像,取得補正攝像到之畫像之亮度的第一補正畫像, 從上述第二照明裝置照射光而藉由上述攝像裝置對上述攝像對象物進行攝像,取得補正攝像到之畫像之亮度的第二補正畫像, 將上述第一補正畫像和上述第二補正畫像相加合成而生成合成畫像。 A die bonding apparatus is configured to have: camera device; a lens, which is arranged on the above-mentioned imaging device; the first lighting device; a second lighting device of a different kind from the above-mentioned first lighting device; and a control unit that controls the imaging device, the first lighting device, and the second lighting device, The above control department irradiating light from the first illuminating device to capture an image of an object to be imaged by the imaging device to obtain a first corrected image in which the brightness of the captured image is corrected, irradiating light from the second illuminating device, imaging the object to be imaged by the imaging device, and obtaining a second corrected image in which the brightness of the captured image is corrected, A synthetic image is generated by adding and synthesizing the first corrected image and the second corrected image. 如請求項14之晶粒接合裝置,其中 上述攝像裝置係被配設成能夠在被搬運的基板之上方沿著上述基板之寬度方向移動, 上述控制部係被構成使上述攝像裝置移動,而依序攝像位於上述基板上之沿著上述寬度方向之一列的複數接合區域之攝像對象物。 The die bonding device as claimed in claim 14, wherein The imaging device is arranged so as to be able to move above the conveyed substrate along the width direction of the substrate, The control unit is configured to move the imaging device to sequentially image imaging objects in a plurality of bonding regions located in a row along the width direction on the substrate. 如請求項15之晶粒接合裝置,其中 上述控制部係 從上述第一照明裝置照射光而藉由上述攝像裝置對上述攝像對象物依序進行攝像,取得將攝像到之複數畫像之亮度分別予以補正後的第一補正畫像, 從上述第二照明裝置照射光而藉由上述攝像裝置對上述攝像對象物依序進行攝像,取得將攝像到之複數畫像之亮度分別予以補正後的第二補正畫像。 The die bonding device according to claim 15, wherein The above control department irradiating light from the first illuminating device and sequentially imaging the object to be imaged by the imaging device to obtain a first corrected image in which the brightness of the plurality of captured images is respectively corrected, The imaging device sequentially captures images of the imaging objects by irradiating light from the second illuminating device, and obtains second corrected images obtained by correcting the luminances of the captured images. 如請求項15之晶粒接合裝置,其中 上述控制部係被構成將上述基板在該基板之長度方向予以搬運而以上述複數攝像裝置攝像下一列之複數接合區域。 The die bonding device according to claim 15, wherein The control unit is configured to transport the substrate in the longitudinal direction of the substrate and image the plurality of joining regions in the next row with the plurality of imaging devices. 如請求項14之晶粒接合裝置,其中 上述第一照明裝置為同軸照明,上述第二照明裝置為二方向斜光條照明。 The die bonding device as claimed in claim 14, wherein The above-mentioned first lighting device is coaxial lighting, and the above-mentioned second lighting device is two-directional oblique light strip lighting.
TW110126827A 2020-09-23 2021-07-21 Die bonding device and method for manufacturing semiconductor device TWI786739B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-158133 2020-09-23
JP2020158133A JP7517922B2 (en) 2020-09-23 2020-09-23 Die bonding apparatus and method for manufacturing semiconductor device

Publications (2)

Publication Number Publication Date
TW202219826A TW202219826A (en) 2022-05-16
TWI786739B true TWI786739B (en) 2022-12-11

Family

ID=80790149

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110126827A TWI786739B (en) 2020-09-23 2021-07-21 Die bonding device and method for manufacturing semiconductor device

Country Status (3)

Country Link
JP (1) JP7517922B2 (en)
CN (1) CN114256100A (en)
TW (1) TWI786739B (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5054949B2 (en) * 2006-09-06 2012-10-24 ルネサスエレクトロニクス株式会社 Manufacturing method of semiconductor device
CN106663636A (en) * 2014-05-07 2017-05-10 株式会社新川 Bonding apparatus and bonding method
TW201941316A (en) * 2017-03-09 2019-10-16 日商捷進科技有限公司 Sticky crystal device and manufacturing method of semiconductor device
TWI702661B (en) * 2018-06-27 2020-08-21 日商捷進科技有限公司 Die bonder and manufacturing method of semiconductor device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6338169B2 (en) * 2013-12-06 2018-06-06 三星電子株式会社Samsung Electronics Co.,Ltd. Recognition apparatus, recognition method, mounting apparatus, and mounting method
CN105313773A (en) * 2014-07-24 2016-02-10 深圳市驰晶科技有限公司 High-definition panoramic parking and driving assisting system
WO2016140060A1 (en) * 2015-03-05 2016-09-09 ソニー株式会社 Image processing device and image processing method
CN204836352U (en) * 2015-09-07 2015-12-02 深圳六滴科技有限公司 Adjust system and device of many cameras captured images's luminance
JP6669523B2 (en) * 2016-02-15 2020-03-18 ファスフォードテクノロジ株式会社 Die bonder and method of manufacturing semiconductor device
JP7187782B2 (en) * 2018-03-08 2022-12-13 オムロン株式会社 Image inspection equipment
JP7102271B2 (en) * 2018-07-17 2022-07-19 ファスフォードテクノロジ株式会社 Semiconductor manufacturing equipment and manufacturing method of semiconductor equipment

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5054949B2 (en) * 2006-09-06 2012-10-24 ルネサスエレクトロニクス株式会社 Manufacturing method of semiconductor device
CN106663636A (en) * 2014-05-07 2017-05-10 株式会社新川 Bonding apparatus and bonding method
TW201941316A (en) * 2017-03-09 2019-10-16 日商捷進科技有限公司 Sticky crystal device and manufacturing method of semiconductor device
TWI702661B (en) * 2018-06-27 2020-08-21 日商捷進科技有限公司 Die bonder and manufacturing method of semiconductor device

Also Published As

Publication number Publication date
TW202219826A (en) 2022-05-16
CN114256100A (en) 2022-03-29
JP7517922B2 (en) 2024-07-17
JP2022052009A (en) 2022-04-04

Similar Documents

Publication Publication Date Title
TWI798619B (en) Die bonding device and method for manufacturing semiconductor device
CN106920762B (en) Semiconductor manufacturing apparatus, manufacturing method of semiconductor device, and die mounter
JP6846958B2 (en) Manufacturing method of die bonding equipment and semiconductor equipment
JP7029900B2 (en) Manufacturing method of die bonding equipment and semiconductor equipment
JP7102271B2 (en) Semiconductor manufacturing equipment and manufacturing method of semiconductor equipment
CN108364880B (en) Semiconductor manufacturing apparatus and method for manufacturing semiconductor device
TWI678746B (en) Semiconductor manufacturing device and method for manufacturing semiconductor device
JP7225337B2 (en) Semiconductor manufacturing equipment and semiconductor device manufacturing method
JP7161870B2 (en) Die bonder and semiconductor device manufacturing method
TWI858453B (en) Semiconductor manufacturing device, inspection device, and semiconductor device manufacturing method
JP6836938B2 (en) Manufacturing method of die bonding equipment and semiconductor equipment
KR20200112639A (en) Semiconductor manufacturing apparatus and method for manufacturing semiconductor device
TWI786739B (en) Die bonding device and method for manufacturing semiconductor device
TWI818620B (en) Die bonding device and method for manufacturing semiconductor device
JP7561070B2 (en) Die bonding apparatus and method for manufacturing semiconductor device
TWI906766B (en) Semiconductor manufacturing apparatus, inspection apparatus, and manufacturing method of semiconductor device
CN116759329A (en) Mounting device, inspection device and manufacturing method of semiconductor device
TW202601838A (en) Semiconductor manufacturing apparatus and method for manufacturing semiconductor device
CN118553641A (en) Semiconductor manufacturing apparatus, edge detection method, and semiconductor device manufacturing method