TWI773655B - Imaging device for inspecting defect, defect inspecting system, apparatus for manufacturing film, imaging method for inspecting defect, defect inspecting method, and method for manufacturing film - Google Patents

Abstract

Provided is an imaging device for inspecting defect, capable of integrating different inspection series and reducing number of inspection series. An imaging device 20 for inspecting defect according to one embodiment of this invention is an imaging device for inspecting defects of a film 110 having polarizing characteristics, which includes a light irradiating means 21 for irradiating light to an imaging area R of the film 110, an imaging means 22 for imaging the imaging area R of the film 110 as a two-dimensional image, a first polarizing filter 23₁ disposed between the light irradiating means 21 and the imaging area R of the film 110 so as to form a crossed nicols status with the film 110, and a conveying means for conveying the film 110 in a conveying direction Y relatively to the light irradiating means 21, the imaging means 22 and the polarizing filter 23, wherein the imaging area R includes a first imaging area R1 and a second imaging area R2 divided in the conveying direction Y, and the first polarizing filter 23₁ is disposed between the light irradiating means 21 and the first imaging area R1.

Description

Photographic apparatus for defect inspection, defect inspection system, film manufacturing apparatus, photographic method for defect inspection, defect inspection method, and film manufacturing method

The present invention relates to a defect inspection photographing apparatus, a defect inspection system, a film manufacturing apparatus, a defect inspection photographing method, a defect inspection method, and a film manufacturing method for inspecting defects of a film.

A defect inspection system for inspecting defects of optical films such as polarizing films and retardation films, films of separators for batteries, and the like is known. In such a defect inspection system, the film is conveyed by a conveying means, light is irradiated to a photographing area of the film by a light irradiation means, and the photographing area of the film is photographed by the photographing means, and then defect inspection is performed based on the photographed image. The types of defect inspection methods using this defect inspection system can be roughly classified into transmission methods and reflection methods. More specifically, the transmission method includes a normal transmission method, a crossed Nichol transmission method, and a transmission scattering method, and the reflection method includes a regular reflection method, a crossed Nichol reflection method, and a reflection scattering method. Patent Document 1 discloses a defect inspection system using a normal transmission method and a transmission-scattering method in the transmission method, and a defect inspection system using a normal reflection method and a reflection-scattering method in the reflection method, and Patent Document 2 discloses a transmission method. Defect inspection system using crossed polarized light transmission method.

For example, the normal transmission method is suitable for the detection of black foreign matter caused by mixing or adhesion in the film lamination process, and the cross-polarization transmission method is suitable for the detection of black foreign matter caused by mixing or adhesion in the adhesive material coating process. For the detection of the resulting bright spots, the transmission scattering method is suitable for the detection of deformation after transfer of scratches caused by foreign matter adhering to the film transfer process. On the other hand, reflection methods (regular reflection method, positive Cross-polarized light reflection method, reflection scattering method) is suitable for the detection of air bubbles caused by the air enclosed in the bonding process.

[Prior Art Literature] [Patent Literature]

(Patent Document 1) Japanese Patent Laid-Open No. 2012-167975

(Patent Document 2) Japanese Patent Laid-Open No. 2007-212442

In order to detect various types of defects such as black foreign matter, bright spots, deformation, and air bubbles, various inspection methods (inspection series) can be considered. However, as the number of inspection series increases, the introduction cost and management cost increase, so it is desirable to reduce the number of inspection series.

Therefore, an object of the present invention is to provide a A defect inspection photographing device, a defect inspection system, a film manufacturing apparatus, a defect inspection photographing method, a defect inspection method, and a film manufacturing method that reduce the number of inspection series by using the same inspection series.

The photographing device for defect inspection of the present invention is a photographing device for inspecting defects of a film having polarized light characteristics, and includes: light irradiation means for irradiating light to a photographing area of the film; photographing means for photographing the photographing area of the film A two-dimensional image is formed; the first polarizing filter (filter) is arranged on the light irradiation means and the film in the form of forming a crossed Nichol state or a first half crossed Nichol state with the film. Between the photographing areas of the film, or between the photographing area of the film and the photographing means; and the conveying means, the film is relatively conveyed in the conveying direction relative to the light irradiation means, the photographing means and the first polarizing filter; the photographing area is The first polarizing filter is arranged between the light irradiation means and the first photographing area, or between the first photographing area and the photographing means, including the first photographing area and the second photographing area divided along the conveying direction.

The photographing method for defect inspection of the present invention uses a photographing apparatus for defect inspection including light irradiation means, photographing means, first polarizing filter, and conveying means, and performs the required inspection for defects of a film having polarized light characteristics. A photographing method for photographing, comprising: a first polarizing filter arranging procedure for forming a first polarizing filter (filter) with a film to form a crossed Nichol state or a first half crossed Nichol state ) state is arranged between the light irradiation means and the photographing area of the film, or between the photographing area of the film and the photographing means; the conveying procedure is to use conveying means for conveying the film relatively in the conveying direction with respect to the light irradiation means, the photographing means and the first polarizing filter; the light irradiation procedure is to use the light irradiation means to irradiate light to the photographing area of the film; and the photographing procedure is to use The photographing means photographs the photographing area of the film into a two-dimensional image; the photographing area includes a first photographing area and a second photographing area divided along the conveying direction, and the first polarizing filter arrangement program is to arrange the first polarizing filter between the light irradiation means and the first photographing area, or between the first photographing area and the photographing means.

Here, the so-called orthogonal polarization state means a state in which the polarization axis (polarization absorption axis) of the polarizing filter and the polarization axis (polarization absorption axis) of the film are substantially orthogonal to each other, that is, the polarization axis of the polarizing filter A state in which (polarization absorption axis) intersects with the polarization axis (polarization absorption axis) of the film at an angle of substantially 90 degrees. On the other hand, the so-called semi-orthogonal polarization state refers to a state in which the polarization axis (polarization absorption axis) of the polarizing filter and the polarization axis (polarization absorption axis) of the film are not substantially orthogonal but intersect, that is, polarized light A state in which the polarization axis (polarization absorption axis) of the filter and the polarization axis (polarization absorption axis) of the film intersect at an angle other than substantially 90 degrees.

According to the photographing apparatus for defect inspection and the photographing method for defect inspection, for example, the first polarizing filter is disposed between the light irradiation means and the first photographing area, or between the first photographing area and the photographing means so as to be positive for the film formation. In the cross-polarized light state, the photographing means captures the photographing area including the first photographing area and the second photographing area into a two-dimensional image, so the cross-polarized light transmission inspection image (or the cross-polarized light reflection inspection image for the cross-polarized light reflection inspection) of the first photographing area can be photographed at the same time. image), and, for example, an image for a normal transmission inspection (or an image for a normal reflection inspection) of the second shooting area. That is, cross-polarized light transmission inspection can be integrated Use a photographic series (or a photographic series for cross-polarized light reflection inspection) and, for example, a photographic series for normal transmission inspection (or a photographic series for regular reflection inspection). As a result, the cross-polarized light transmission inspection series (or the cross-polarized light reflection inspection series) and, for example, the normal transmission inspection series (or the normal reflection inspection series) can be integrated, and the number of inspection series can be reduced.

The above-mentioned imaging device for defect inspection may be a form in which the first polarizing filter is disposed between the light irradiation means and the first imaging region. In the above-mentioned photographing method for defect inspection, the first polarizing filter may be arranged between the light irradiation means and the first photographing region in the first polarizing filter arranging process.

However, the photographic series for cross-polarized light transmission inspection (or photographic series for cross-polarized reflection inspection) and, for example, the photographic series for normal transmission inspection (or photographic series for specular reflection inspection) have different appropriate light luminance values.

Therefore, the above-mentioned imaging device for defect inspection may be further provided with the following components: brightness adjustment means for adjusting the irradiation to at least one of the first imaging area and the second imaging area, or for transmitting the first imaging area. The luminance value of light reflected in at least one of the photographing area and the second photographing area, or at least one of the first photographing area and the second photographing area.

According to this aspect, the brightness adjustment means can be used to adjust the irradiation to at least one of the first photographing area and the second photographing area, or to transmit through at least one of the first photographing area and the second photographing area, or to the first photographing area. and the reflected light from at least one of the second shooting areas Therefore, it is possible to set an appropriate brightness value of light in the photography of the first shooting area and the second shooting area. It can be used with the photographic series for cross-polarized light transmission inspection (or the photographic series for cross-polarized reflection inspection) and, for example, normal transmission. Check the brightness value of the light corresponding to the photographic series for inspection (or the photographic series for specular reflection inspection).

The above-mentioned brightness adjusting means can adjust the brightness value of the light irradiated to the second photographing area, transmitted through the second photographing area, or reflected in the second photographing area.

There will be a suitable light of the photographic series for cross-polarized light transmission inspection (or photographic series for cross-polarized reflection inspection) with a large brightness value, and the appropriate light of the photographic series for normal transmission inspection (or photographic series for specular reflection inspection) when the brightness value is small. Even in such a case, as long as the brightness adjustment means adjusts the brightness value of the light irradiated to the second imaging area, transmitted through the second imaging area, or reflected in the second imaging area as described above, it can be irradiated from the light by, for example, means to output light with a larger brightness value, so that the brightness value of the light irradiated to the first shooting area for the photographic series for cross-polarized light transmission inspection (or the photographic series for cross-polarized light reflection inspection) becomes larger, In addition, the brightness adjustment means is used to change the brightness value of the light irradiated to the second photographing area or transmitted through the second photographing area or reflected in the second photographing area used for the photographic series for normal transmission inspection (or the photographic series for regular reflection inspection) to change. be smaller.

The above-mentioned brightness adjustment means may be an attenuation filter disposed between the light irradiation means and the second photographing area, or between the second photographing area and the photographing means.

Moreover, the above-mentioned brightness adjustment means may be arranged in the light irradiation means, and the brightness value of the light irradiated to the first imaging area and the brightness value of the light irradiated to the second imaging area may be adjusted individually.

The above-mentioned photographing device for defect inspection may be in the following form: the first polarizing filter and the first photographing area of the film are in a cross-polarized state, and the brightness adjusting means is included between the light irradiation means and the second photographing area, Alternatively, a first polarizing filter for brightness adjustment that forms a first semi-orthogonal polarization state with the second imaging region of the film is disposed between the second imaging region and the imaging means.

Here, the inventors of the present application have come to the conclusion that the normal transmission method is suitable for the detection of black foreign matter, and the cross-polarized light transmission method is suitable for the detection of bright spots, but they found that the cross-polarized light transmission method is suitable for the detection of bright spots. Strong bright spots are checked out but it is more difficult to check out a portion of weak bright spots. In this regard, the inventors of the present application found that black foreign matter that is difficult to detect by the cross-polarized light transmission method or some weak bright spots can be inspected by the semi-cross-polarized light transmission method.

In this regard, according to the imaging device for defect inspection, the first semi-cross polarization state is formed between the first brightness adjustment polarizing filter (brightness adjustment means) and the second imaging region of the film, so that black foreign matter and a part of the above can be improved. detection of weaker bright spots.

In addition, the above-mentioned imaging device for defect inspection may be in a form in which the first polarizing filter and the first imaging region of the film form a first semi-orthogonal polarization state, and the brightness adjustment means is arranged on the light irradiation means and the second The attenuation filter between the shooting areas, or between the second shooting area and the photographic means light device.

According to this imaging device for defect inspection, since the first polarizing filter and the first photographing region of the film form the first semi-cross polarized state, the detection of black foreign objects and the above-mentioned locally weak bright spots can be improved.

In addition, the above-mentioned photographing device for defect inspection may be in the form in which the first polarizing filter and the first photographing region of the film form a first semi-orthogonal polarization state, the brightness adjusting means is arranged on the light irradiation means, and the individual The brightness value of the light irradiated to the first shooting area and the brightness value of the light irradiated to the second shooting area are adjusted independently.

In this defect inspection photographing device, since the first polarizing filter and the first photographing region of the film form the first semi-orthogonal polarization state, the detection of black foreign objects and the above-mentioned locally weak bright spots can be improved.

In addition, the above-mentioned imaging device for defect inspection may have a form in which the imaging area includes a third imaging area divided along the conveying direction, and the brightness adjustment means is included between the light irradiation means and the third imaging area, or the third imaging area is included. A second brightness adjusting polarizing filter is disposed between the three photographing areas and the photographing means to form a second semi-orthogonal polarization state with the third photographing area of the film to adjust the brightness value of the light irradiated to the third photographing area.

According to this imaging device for defect inspection, the first polarization filter for brightness adjustment (brightness adjustment means) forms the first semi-orthogonal polarization state with the second imaging region of the film, and the second polarization filter for brightness adjustment (brightness adjustment means) to form a second semi-orthogonal polarization state with the third photographing region of the film, so that the detection of black foreign objects and the above-mentioned locally weak bright spots can be improved.

In addition, the above-mentioned imaging device for defect inspection may be the following Form: The imaging area includes a third imaging area divided along the conveying direction, and the imaging device for defect inspection is additionally provided between the light irradiation means and the third imaging area, or between the third imaging area and the imaging means. , a second polarizing filter in a second semi-orthogonal polarization state is formed with the third photographing region of the film.

According to this imaging device for defect inspection, the first polarizing filter and the first photographing region of the film form the first semi-orthogonal polarization state, and the second polarizing filter and the third photographing region of the film form the second semi-orthogonal polarization Therefore, it is possible to improve the detection of black foreign objects and weak bright spots in the above-mentioned part.

In addition, the above-mentioned imaging device for defect inspection may be in a form in which the first polarizing filter and the first imaging region of the film form a first semi-orthogonal polarization state, and the brightness adjustment means includes a light irradiation means and a first Between the two photographing areas, or between the second photographing area and the photographing means, a first polarizing filter for adjusting brightness is arranged to form a second semi-orthogonal polarization state with the second photographing area of the film.

According to the photographing device for defect inspection, the first polarizing filter and the first photographing region of the film form the first semi-orthogonal polarization state, and the first polarizing filter for brightness adjustment (brightness adjusting means) and the second photographing of the film The region forms the second semi-orthogonal polarization state, so the detection of black foreign objects and weak bright spots in the above-mentioned part can be improved.

A photographing apparatus for defect inspection according to another aspect of the present invention is a photographing apparatus for inspecting defects of a film that does not have polarizing properties, and includes: a light irradiating means for irradiating light to a photographing area of the film; a photographing hand In the first section, the photographed area of the film is photographed into a two-dimensional image; a pair of first polarizing filters is used to form a crossed Nichol state or a first half crossed Nichol state The form is arranged between the light irradiation means and the photographing area of the film, and between the photographing area of the film and the photographing means, respectively; and the conveying means, the film is relative to the light irradiation means, the photographing means and the pair of first polarizing filters. The optical devices are relatively conveyed in the conveying direction; the photographing area includes a first photographing area and a second photographing area divided in the conveying direction, and a pair of first polarizing filters are respectively arranged between the light irradiation means and the first photographing area. between the first shooting area and the photographing means.

A photographing method for defect inspection according to another aspect of the present invention uses a photographing apparatus for defect inspection including light irradiation means, photographing means, a pair of first polarizing filters, and conveying means, and performs inspection without polarized light for inspection. A photographing method required for photographing defects of a characteristic film, comprising: a first polarizing filter arranging procedure to form a crossed Nichol state or a first half crossed Nichol state , a pair of first polarizing filters (filters) are respectively arranged between the light irradiation means and the photographing area of the film, and between the photographing area of the film and the photographing means; the conveying procedure is to use the conveying means to move the film relative to the film. The light irradiation means, the photographing means and the pair of first polarizing filters are conveyed oppositely in the conveying direction; the light irradiation procedure uses the light irradiation means to irradiate light to the photographing area of the film; and the photographing procedure uses the photographing means to transfer the film The photographing area is photographed into a two-dimensional image; the photographing area includes a first photographing area and a second photographing area divided along the conveying direction, and the first polarizing filter arrangement program is to arrange a pair of first polarizing filters respectively on the light Irradiation means and the first shooting area between, or between the first shooting area and the photographing means.

According to the photographing apparatus for defect inspection and the photographing method for defect inspection according to this other aspect, for example, a pair of first polarizing filters is provided between the light irradiation means and the first photographing area, and between the first photographing area and the photographing means. They are arranged to form a state of crossed polarized light respectively. The photographing means captures the photographing area including the first photographing area and the second photographing area into a two-dimensional image, so that the first photographing area can be photographed at the same time for cross-polarized light transmission inspection. An image (or an image for cross-polarized light reflection inspection), and, for example, an image for a normal transmission inspection (or an image for a normal reflection inspection) of the second imaging area. That is, the photographic series for cross-polarized light transmission inspection (or the photographic series for cross-polarized reflection inspection) and, for example, the photographic series for normal transmission inspection (or the photographic series for regular reflection inspection) can be integrated. As a result, the cross-polarized light transmission inspection series (or the cross-polarized light reflection inspection series) and, for example, the normal transmission inspection series (or the normal reflection inspection series) can be integrated, and the number of inspection series can be reduced.

However, as described above, the photographic series for cross-polarized light transmission inspection (or the photographic series for cross-polarized reflection inspection) and, for example, the photographic series for normal transmission inspection (or the photographic series for specular reflection inspection) do not have appropriate light brightness values. same.

Therefore, the imaging device for defect inspection of the above-mentioned other aspect may be further provided with the following member: brightness adjustment means for adjusting the irradiation to at least one of the first imaging area and the second imaging area , or transmits at least one of the first photographing area and the second photographing area, or transmits the brightness value of the light reflected in at least one of the first photographing area and the second photographing area.

According to this aspect, the brightness adjustment means can be used to adjust the irradiation to at least one of the first photographing area and the second photographing area, or to transmit through at least one of the first photographing area and the second photographing area, or to the first photographing area. and the brightness value of the light reflected by at least one of the second shooting area, so you can set an appropriate light brightness value in the photography of the first shooting area and the second shooting area. Or the photographic series for cross-polarized light reflection inspection) and, for example, the photographic series for normal transmission inspection (or the photographic series for regular reflection inspection) to perform inspection on the brightness value of the corresponding light.

The above-mentioned brightness adjusting means can adjust the brightness value of the light irradiated to the second photographing area, transmitted through the second photographing area, or reflected in the second photographing area.

As described above, there may be a photographic series for cross-polarized light transmission inspection (or photographic series for cross-polarized light reflection inspection) with a relatively large brightness value of light, and a photographic series for normal transmission inspection (or photographic series for specular reflection inspection) The case where the brightness value of the appropriate light is small. Even in such a case, as long as the brightness adjustment means adjusts the brightness value of the light irradiated to the second imaging area, transmitted through the second imaging area, or reflected in the second imaging area as described above, it can be irradiated from the light by, for example, The method outputs light with a large brightness value, so that the brightness value of the light irradiated to the first shooting area for the photographic series for cross-polarized light transmission inspection (or the photographic series for cross-polarized light reflection inspection) is large, and the use of Brightness adjustment means to make the brightness of the light irradiated to the second photographing area or transmitted through the second photographing area or reflected in the second photographing area used in the photographic series for normal transmission inspection (or the photographic series for normal reflection inspection) value is small.

The above-mentioned brightness adjustment means may be an attenuation filter disposed between the light irradiation means and the second photographing area, or between the second photographing area and the photographing means.

Moreover, the above-mentioned brightness adjustment means may be arranged in the light irradiation means, and the brightness value of the light irradiated to the first imaging area and the brightness value of the light irradiated to the second imaging area may be adjusted individually.

The above-mentioned photographing apparatus for defect inspection of another aspect may be in the following form: a pair of first polarizing filters are formed in a crossed polarized state, and the brightness adjustment means may include a first semi-crossed polarized light state. One pair of polarizing filters for adjusting the first brightness is arranged between the light irradiation means and the second photographing area, and between the second photographing area and the photographing means.

According to the imaging device for defect inspection of this other aspect, the pair of first brightness adjustment polarizing filters (brightness adjustment means) form the first semi-cross polarized state, so that it is possible to improve the black foreign matter and the weaker part of the above. Detection of bright spots.

In addition, the imaging device for defect inspection according to the above-mentioned other aspect may be in a form in which a pair of first polarizing filters forms a first semi-cross-polarized state, and the brightness adjusting means is arranged on the light irradiation means and the first half-cross polarization state. 2. Attenuating filter between the photographing area or between the second photographing area and the photographing means.

According to the imaging device for defect inspection of this other aspect, the pair of first polarizing filters are in the first semi-orthogonal polarization state, so that it is possible to Improve the detection of black foreign objects and weak bright spots in some of the above.

In addition, the imaging device for defect inspection of the above-mentioned other aspect may be in a form in which a pair of first polarizing filters forms a first semi-cross-polarized light state, the brightness adjustment means is arranged on the light irradiation means, and The brightness value of the light irradiated to the first shooting area and the brightness value of the light irradiated to the second shooting area are individually adjusted.

In the imaging apparatus for defect inspection of this other aspect, since the pair of first polarizing filters forms the first semi-cross-polarized state, the detection of black foreign objects and some of the above-mentioned weak bright spots can be improved.

In addition, the imaging device for defect inspection of the above-mentioned other aspect may have a mode in which the imaging area includes a third imaging area divided along the conveying direction, and the brightness adjustment means includes a second half-cross-polarized light. In the form of the state, a pair of polarizing filters for adjusting the second brightness are arranged between the light irradiation means and the third photographing area and between the third photographing area and the photographing means to adjust the intensity of the light irradiated to the third photographing area. Brightness value.

According to the imaging device for defect inspection of this other aspect, the pair of first polarizing filters for brightness adjustment (brightness adjustment means) are in the first semi-cross polarized state, and the pair of second polarizing filters for brightness adjustment The (brightness adjustment means) forms the second semi-orthogonal polarization state, so that the detection of black foreign objects and the above-mentioned locally weak bright spots can be improved.

In addition, the imaging device for defect inspection of the above-mentioned other aspect may have a mode in which the imaging area includes a third imaging area divided along the conveying direction, and the imaging device for defect inspection is additionally provided so as to form The forms of the second semi-orthogonal polarization state are respectively arranged between the light irradiation means and the third photographing area and between the third photographing area and the photographing means, as a pair of second polarizing filters.

According to the imaging apparatus for defect inspection of this other aspect, since the pair of first polarizing filters forms the first semi-orthogonal polarization state, and the pair of second polarizing filters forms the second semi-orthogonal polarizing state, it is possible to improve the Detection of black foreign objects and weak bright spots in the above part.

In addition, in the above-described imaging device for defect inspection according to another aspect, the pair of first polarizing filters may form a first semi-orthogonal polarization state, and the brightness adjustment means may include a second semi-orthogonal polarization state. The form of the state is a form of a pair of polarizing filters for adjusting the first brightness, respectively disposed between the light irradiation means and the second photographing area and between the second photographing area and the photographing means.

According to the imaging device for defect inspection of this other aspect, the pair of first polarizing filters forms the first half-cross polarization state, and the pair of first polarizing filters for brightness adjustment (brightness adjusting means) forms the second half Cross-polarized light state, so it can improve the detection of black foreign objects and weak bright spots.

A defect inspection system of the present invention includes: the above-described imaging device for defect inspection or another aspect of the imaging device for defect inspection; and a detection unit based on the use of the aforementioned imaging device for defect inspection or another aspect. The defect inspection uses a two-dimensional image captured by an imaging device to inspect defects existing in the film. The defect inspection method of the present invention includes the above-mentioned photographing method for defect inspection or another aspect of the photographing method for defect inspection The method includes a defect detection procedure for detecting defects existing in the film based on a two-dimensional image captured by the above-described imaging method for defect inspection or another aspect of the imaging device method for defect inspection.

The film manufacturing apparatus of this invention is equipped with the above-mentioned defect inspection system. The manufacturing method of the film of this invention contains the above-mentioned defect inspection method.

According to the present invention, the number of inspection series can be reduced by integrating different inspection series in defect inspection of the film.

10, 10A, 10B, 10C, 10D, 10E‧‧‧Defect inspection system

20, 20A, 20B, 20C, 20D, 20E‧‧‧Photographic device for defect inspection

21‧‧‧Light source (light irradiation means)

21A‧‧‧Light source (brightness irradiation method)

22‧‧‧Surface Sensor (Photography)

22a‧‧‧CCD or CMOS

22b‧‧‧Lens

23 ₁ , 24 ₁ ‧‧‧First polarizing filter

23 ₂ , 24 ₂ ‧‧‧Second polarizing filter

25 ₁ , 25 ₃ ‧‧‧First polarizing filter for brightness adjustment (brightness adjustment means)

25 ₂ , 25 ₄ ‧‧‧Second brightness adjustment polarizing filter (brightness adjustment means)

26‧‧‧Attenuation filter (brightness adjustment means)

30‧‧‧Image Analysis Department

40‧‧‧Marking Device

100‧‧‧Manufacturing equipment (film manufacturing equipment)

101, 102, 103‧‧‧raw material reels

104, 105‧‧‧Fitting roller

106‧‧‧Conveying rollers

110‧‧‧Film

111‧‧‧Polarizing film body

112‧‧‧Adhesive material with separable film

113‧‧‧Surface protection film

R‧‧‧shooting area

R0‧‧‧Intermediate shooting area

R1‧‧‧First shooting area

R2‧‧‧Second shooting area

R3‧‧‧Third shooting area

Fig. 1 is a diagram showing a production apparatus and a production method of a film according to an embodiment of the present invention.

FIG. 2 is a diagram showing a defect inspection system and a defect inspection method according to an embodiment of the present invention.

Fig. 3 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to the first embodiment of the present invention.

Fig. 4 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to the second embodiment of the present invention.

Fig. 5 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a third embodiment of the present invention.

FIG. 6 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a fourth embodiment of the present invention.

Fig. 7 shows the defect inspection related to the fifth embodiment of the present invention A diagram of the photographic device used for inspection and the photographic method used for defect inspection.

Fig. 8 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a sixth embodiment of the present invention.

Fig. 9 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 10 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 11 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 12 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 13 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 14 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

FIG. 15 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

FIG. 16 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 17 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 18 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 19 shows the defect inspection according to the modification of the present invention Photographic equipment and photographic method for defect inspection.

FIG. 20 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

FIG. 21 is a diagram showing the verification results of the imaging device for defect inspection and the imaging method for defect inspection according to the second embodiment.

Fig. 22 is a diagram showing a defect inspection system and a defect inspection method according to the embodiment of the present invention.

Fig. 23 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a seventh embodiment of the present invention.

Fig. 24 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to the eighth embodiment of the present invention.

Fig. 25 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a ninth embodiment of the present invention.

Fig. 26 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to the tenth embodiment of the present invention.

Fig. 27 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to the eleventh embodiment of the present invention.

Fig. 28 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a twelfth embodiment of the present invention.

Fig. 29 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 30 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 31 shows a defect inspection according to a modification of the present invention Photographic equipment and photographic method for defect inspection.

Fig. 32 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 33 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 34 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 35 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 36 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 37 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 38 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 39 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 40 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 41 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 42 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

Fig. 43 shows the defect inspection according to the modification of the present invention Photographic equipment and photographic method for defect inspection.

Fig. 44 is a diagram showing a photographing apparatus for defect inspection and a photographing method for defect inspection according to a modification of the present invention.

FIG. 45 is a diagram showing the verification results of the imaging device for defect inspection and the imaging method for defect inspection according to the seventh embodiment.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. The same or equivalent parts in the various figures are marked with the same symbols.

The production apparatus and production method of the film according to the embodiment of the present invention are used for producing a polarizing film (optical film) having polarizing properties, a retardation film (optical film) having no polarizing properties, and a battery separator ( separator film) and other devices. FIG. 1 shows an example of a manufacturing apparatus and a manufacturing method of a film having polarizing properties (polarizing film), and the following description will only be given, and the manufacturing apparatus and manufacturing method of retardation films and battery separators, etc., which do not have polarizing properties, are omitted. description.

The manufacturing apparatus (film manufacturing apparatus) 100 shown in FIG. 1 produces a polarizing film main body (optical film main body) 111 by pasting protective films on both sides of the principal surface of a polarizer first. Next, the manufacturing apparatus 100 pulls out the adhesive material 112 with a separate film to which the peelable film (release film) is attached from the raw material reel 101 , and uses the laminating roller 104 to separate the adhesive material 112 with a separate film. The adhesive material 112 of the type film is adhered to one main surface side of the polarizing film body portion 111 . Next, the manufacturing apparatus 100 pulls out the surface protection film 113 from the raw material reel 102, and sticks the surface protection film 113 to the other main surface side of the polarizing film main body 111 by the bonding roller 105, and produces a A film 110 with polarizing properties is produced. Then, the production apparatus 100 conveys the produced film 110 by the conveyance roller 106 and winds it up by the raw material roll 103 .

The material of the polarizer in the polarizing film body 111 is, for example, PVA (Polyvinyl Alcohol), and the material of the protective film in the polarizing film body 111 is, for example, TAC (Triacetylcellulose). The materials of the separable film and the surface protection film 113 in the adhesive material 112 with the separable film are, for example, PET (Polyethylene Terephthalate, polyethylene terephthalate). By tearing off the detachable film, the film 110 can be pasted on the liquid crystal panel or other optical films or the like by the adhesive material.

Moreover, the manufacturing apparatus 100 is equipped with the defect inspection system 10 which performs the defect inspection of the film 110, and the defect inspection system 10 which performs the defect inspection of the polarizing film main body part 111. Since these two defect inspection systems 10 are the same, only the defect inspection system 10 that performs defect inspection of the film 110 will be described below.

[First Embodiment]

The defect inspection system and the defect inspection method according to the first embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarizing characteristic described above. FIG. 2 is a diagram showing a defect inspection system and a defect inspection method according to the first embodiment of the present invention, and FIG. 3 is a diagram showing a defect inspection photographing apparatus and a defect inspection photographing apparatus according to the first embodiment of the present invention Diagram of the method.

The defect inspection system 10 shown in FIG. 2 includes a defect inspection imaging device 20, an image analysis unit (detection unit) 30, and a marking device 40, and the defect inspection imaging device 20 shown in FIG. 3 The system includes a light source (light irradiation means) 21 , a plurality of area sensors (photography means) 22 , and a first polarizing filter 23 ₁ . The XYZ orthogonal coordinate system is shown in the 2nd and 3rd figures, the X direction shows the width direction of a polarizing film, and the Y direction shows the conveying direction of the polarizing film.

In this embodiment, the conveyance roller 106 and the raw material reel 103 shown in FIG. 1 mainly function as conveyance means. By these conveyance means, the film 110 can be conveyed in the conveyance direction Y relative to the light source 21 , the area sensor 22 , and the _first polarizing filter 231 .

The light source 21 is provided on the other main surface side of the film 110 , and irradiates light to the imaging region R of the film 110 . For example, the light source 21 is a linear light source extending in the width direction X.

The area sensors 22 are arranged on one main surface side of the film 110 , and are arranged side by side in the width direction X. As shown in FIG. The area sensor 22 includes a Charge Coupled Device (CCD) or a Complementary Metal-Oxide-Semiconductor (CMOS) 22 a and a lens 22 b. By sensing the light transmitted through the film 110 , the area sensor 22 photographs the photographing area R of the film 110 into a two-dimensional image in a time-continuous manner.

The length in the conveyance direction Y of the 2D image captured by each area sensor 22 is preferably the interval from when each area sensor 22 captures the 2D image until the next 2D image is captured. 110 move At least twice the sending distance. In other words, the same area of the film 110 is preferably photographed more than twice. In this way, the length in the conveyance direction Y of the two-dimensional image is made larger than the conveyance distance in the image capturing section, and the number of images of the same portion of the film 110 is increased, so that defects can be inspected with high accuracy.

Here, the imaging region R includes a first imaging region R1 and a second imaging region R2 divided along the conveyance direction Y. Furthermore, the photographing area R includes an intermediate photographing area R0 between the first photographing area R1 and the second photographing area R2.

The first polarizing filter 23 ₁ is disposed between the light source 21 and the film 110 . Specifically, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the imaging region R. In the present embodiment, the _first polarizing filter 231 is arranged so that half of the imaging region R in the conveyance direction Y cannot be seen from the surface sensor 22 (knife edge). Also, the _first polarizing filter 231 and the film 110 form a cross-polarized state. Here, the so-called orthogonal polarization state means a state in which the polarization axis (polarization absorption axis) of the polarizing filter and the polarization axis (polarization absorption axis) of the film are substantially orthogonal to each other, that is, the polarization axis of the polarizing filter A state in which it intersects with the polarization axis of the film at an angle of substantially 90 degrees. The above-mentioned "substantial 90 degrees" means, for example, 85 degrees or more and less than 95 degrees, and more preferably 90 degrees.

In this way, an image for cross-polarized light transmission inspection can be captured in the first imaging region R1, an image for normal transmission inspection can be captured in the second imaging region R2, and an image for transmission and scattering inspection can be captured in the intermediate imaging region R0.

The image analysis unit 30 detects defects existing in the film 110 based on the two-dimensional image from the area sensor 22 . Image analysis unit 30 Defect position information is generated by converting the coordinate position on the 2D image to the coordinate position on the film 110 according to the pixel coordinates of the 2D image and the distance the film is transported during the image capturing interval. The image analysis unit 30 creates a defect map by synthesizing images corresponding to the entire region of the film 110 based on the defect position information.

The marking device 40 marks the film 110 based on the defect map from the image analysis unit 30 .

Next, the defect inspection method and the imaging method for defect inspection according to the first embodiment of the present invention will be described.

First, the first polarizing filter 231 is placed between the light source 21 and the _first photographing region R1 of the film 110 so as to form an orthogonal polarization state with the film 110 (first polarizing filter placement procedure).

Next, the film 110 is conveyed in the conveyance direction Y relative to the light source 21 , the surface sensor 22 and the first polarizing filter 23 ₁ by a conveying means (conveying process), and the light source 21 is used to irradiate the imaging area of the film 110 with light. R (light irradiation process), the area R of the film 110 is captured as a two-dimensional image by the area sensor 22 (photography process).

Next, the image analysis unit 30 detects defects in the film 110 based on the two-dimensional image from the area sensor 22, and creates a defect map based on the defect position information (defect detection process). Next, the marking device 40 is used to mark the film 110 based on the defect map from the image analysis unit 30 (marking process).

According to the imaging device 20 for defect inspection and the imaging method for defect inspection of the first embodiment, the _first polarizing filter 231 is disposed between the light source 21 (light irradiation means) and the first imaging region R1 so as to be formed with the film 110 Orthogonal polarization state, and the area sensor 22 (photographing means) captures the shooting region R including the first shooting region R1, the second shooting region R2 and the intermediate shooting region R0 into a two-dimensional image, so the first shooting region R1 can be simultaneously shot. The cross-polarized light transmission inspection image of the imaging region R1, the normal transmission inspection image of the second imaging region R2, and the transmission-scattering inspection image of the intermediate imaging region R0. That is, the photographing series for cross-polarized light transmission inspection, the photographing series for normal transmission inspection, and the photographing series for transmission-scattering inspection can be integrated.

As a result, according to the defect inspection system 10 and the defect inspection method of the first embodiment, the cross-polarized light transmission inspection series, the normal transmission inspection series, and the transmission-scattering inspection series can be integrated.

Therefore, according to the imaging device 20 for defect inspection, the imaging method for defect inspection, the defect inspection system 10, and the defect inspection method of the first embodiment, the number of inspection series can be reduced.

[Second Embodiment]

The defect inspection system and the defect inspection method according to the second embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarizing characteristic described above.

The defect inspection system 10A according to the second embodiment of the present invention is a configuration and the first embodiment in which the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. 2 is replaced by the defect inspection imaging device 20A The shape is different. Furthermore, the imaging device 20A for defect inspection shown in FIG. 4 is the same as the first embodiment in which the imaging device 20 for defect inspection shown in FIG. 3 is further provided with an attenuation filter (brightness adjustment means) 26 The shape is different.

The attenuation filter 26 is disposed between the light source 21 and the second imaging region R2. Therefore, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second photographing region R2. The attenuation filter 26 can also be disposed between the second photographing area R2 and the area sensor 22 to reduce the brightness of the light transmitted through the second photographing area R2.

Next, the defect inspection method and the imaging method for defect inspection according to the second embodiment of the present invention will be described.

First, the above-mentioned first polarizing filter configuration procedure is performed. Next, the attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the brightness value of the light irradiated to the second photographing region R2 can be reduced (brightness adjustment procedure). The attenuation filter 26 can also be disposed between the second photographing area R2 and the area sensor 22 to reduce the brightness of the light transmitted through the second photographing area R2.

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20A for defect inspection, the photographing method for defect inspection, the defect inspection system 10A, and the method for defect inspection of the second embodiment can be obtained from the photographing device 20 for defect inspection and the photographing method for defect inspection of the first embodiment. , the defect inspection system 10, and the defect inspection method have the same effect.

However, the appropriate light luminance value is different between the photographic series for cross-polarized light transmission inspection and the photographic series for normal transmission inspection. More specifically, the appropriate light brightness of the photographic series for cross-polarized light transmission inspection The larger the value, the smaller the brightness value of the appropriate light in the photographic series for positive transmission inspection.

In this regard, according to the imaging device 20A for defect inspection and the imaging method for defect inspection of the second embodiment, the attenuation filter (brightness adjustment means) 26 can be used to adjust the luminance value of the light irradiated to the second imaging region R2 , so that the luminance value of the light irradiated to the first photographing region R1 for the photographing series for cross-polarized light transmission inspection can be increased by, for example, outputting light with a larger luminance value from the light source (light irradiation means) 21, In addition, an attenuation filter (brightness adjustment means) 26 is used to reduce the brightness value of the light irradiated to the second imaging region R2 for the photographic series for positive transmission inspection. As described above, the same effect can be expected by disposing the attenuation filter 26 between the second photographing area R2 and the area sensor 22 to adjust the luminance value of the light transmitted through the second photographing area R2.

Next, verification of the above-mentioned effect is performed. Fig. 21(a) shows detection images of various defects (black foreign matter, weak bright spot, strong bright spot) when the light quantity of the light source is changed in the cross-polarized light transmission method and the normal transmission method. Fig. 21(b) shows a graph obtained by graphing the defect signal of the detected image obtained by the cross-polarized light transmission method in Fig. 21(a), and Fig. 21(c) shows the Figure 21 (a) is a diagram drawn by graphing the defect signal of the detected image obtained by the forward transmission method. The light intensity of the light source is displayed as 1 to 40 times the light intensity of the light source when the brightness value on the image is 128 (the most appropriate light intensity in the case of positive transmission).

According to Fig. 21(a) and Fig. 21(c), in the positive transmission method, it is better to double the light intensity of the light source, and if the light intensity of the light source reaches more than 2 times, the brightness on the image will be too high, resulting in the overall image. whitened. the other party 21(a) and 21(b), it can be seen that in the cross-polarized light transmission method, when the light intensity of the light source is 1 times, the brightness on the image will be too low to recognize the defect, and the light intensity of the light source is less than 20 times or more is better, and 40 times or more is better.

In the above verification, although the brightness value on the image is adjusted by adjusting the light quantity of the light source irradiating the shooting area, the same effect can be expected in terms of the brightness adjustment method using the attenuation filter as described above.

[Third Embodiment]

The defect inspection system and the defect inspection method according to the third embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarizing characteristic described above.

The defect inspection system 10B according to the third embodiment of the present invention is the first embodiment in which the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. 2 is replaced with the defect inspection imaging device 20B. The shape is different. Furthermore, the photographing apparatus 20B for defect inspection shown in FIG. 5 is different from the first embodiment in that the light source 21A is provided instead of the light source 21 in the photographing apparatus 20 for defect inspection shown in FIG. 3 .

The light source 21A has a brightness adjustment function capable of individually adjusting the brightness value of the light irradiated to the first imaging region R1 and the brightness value of the light irradiated to the second imaging region R2. Therefore, the luminance value of the light irradiated to the first imaging region R1 can be made larger, and the luminance value of the light irradiated to the second imaging region R2 can be made smaller.

Next, the defect inspection method and the imaging method for defect inspection according to the third embodiment of the present invention will be described.

First, the above-mentioned first polarizing filter configuration procedure is performed. Next, the luminance value of the light irradiated to the first imaging region R1 and the luminance value of the light irradiated to the second imaging region R2 are individually adjusted by the light source 21A. Thereby, the luminance value of the light irradiated to the first imaging region R1 can be increased, and the luminance value of the light irradiated to the second imaging region R2 can be decreased (brightness adjustment procedure).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20B for defect inspection, the photographing method for defect inspection, the defect inspection system 10B, and the method for inspecting defect of the third embodiment can be obtained from the photographing device 20 for defect inspection and the photographing method for defect inspection of the first embodiment. , the defect inspection system 10, and the defect inspection method have the same effect.

In addition, according to the imaging device 20B for defect inspection and the imaging method for defect inspection of the third embodiment, the light source 21A can be used to individually adjust the luminance value of the light irradiated to the first imaging region R1 and the light irradiated to the second imaging region R2 Therefore, the brightness value of the light irradiated to the first photographing region R1 for the photographic series for cross-polarized light transmission inspection can be made larger, so that the photographing series used for the photographic series for positive transmission inspection can be irradiated to the first photographing region R1. The luminance value of the light in the second shooting area R2 becomes smaller.

[Fourth Embodiment]

Defect inspection related to the fourth embodiment of the present invention The system and the defect inspection method are a defect inspection system and a defect inspection method for inspecting the above-mentioned retardation film having no polarization characteristic, a separator for a battery, and the like. The defect inspection system and the defect inspection method of the fourth embodiment can be used for a manufacturing apparatus and a manufacturing method of a retardation film, a battery separator, and the like, which do not have polarization characteristics. In the manufacturing apparatus and manufacturing method of retardation film, battery separator, etc., which do not have polarizing characteristics, all points other than the defect inspection system and defect inspection method described in the fourth embodiment are well-known, so they are omitted. As described above. Regarding other embodiments and modifications related to the defect inspection system and defect inspection method for inspecting defects such as retardation films and battery separator films that do not have polarizing properties, the same viewpoints will be applied to those that do not have polarized light. The description of the manufacturing apparatus and manufacturing method of the retardation film, the separator for batteries, etc. of characteristics is abbreviate|omitted. In the fourth embodiment, the film 110 is a film that does not have polarizing properties.

The defect inspection system 10C according to the fourth embodiment of the present invention is similar to the first in the configuration of replacing the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. 2 with the defect inspection imaging device 20C. One embodiment is different. In addition, in the imaging device 20C for defect inspection shown in FIG. 6 , the first polarizing filter 23 ₁ in the imaging device 20 for defect inspection shown in FIG. 3 is replaced with a pair of first polarizing filters 23 . ₁ , 24 ₁ The structure of 1 is different from that of the first embodiment.

The first polarizing filter 231 is disposed between the light source 21 and the film 110 as in the _first embodiment. Specifically, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the imaging region R. In the present embodiment, the first polarizing filter 23 ₁ is arranged so that half of the imaging region R in the conveyance direction Y cannot be seen from the surface sensor 22 (knife edge).

On the other hand, the first polarizing filter 24 ₁ is disposed between the film 110 and the area sensor 22 . Specifically, the first polarizing filter 24 ₁ is disposed between the first photographing area R1 of the photographing area R and the area sensor 22 . In the present embodiment, the _first polarizing filter 241 is arranged so that half of the imaging region R in the conveyance direction Y cannot be seen from the surface sensor 22 (knife edge).

Furthermore, the first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ are in a cross-polarized state. As a result, an image for cross-polarized light transmission inspection is captured in the first imaging region R1, an image for normal transmission inspection is captured in the second imaging region R2, and an image for transmission and scattering inspection is captured in the intermediate imaging region R0.

Next, the defect inspection method and the imaging method for defect inspection according to the fourth embodiment of the present invention will be described.

First, the _first polarizing filter 231 is placed between the light source 21 and the first photographing region R1 of the film 110, and the _first polarizing filter 241 is placed between the first photographing region R1 of the film 110 and the surface feel between the detectors 22. Furthermore, the first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ are arranged so as to form an orthogonal polarization state (first polarizing filter arrangement procedure).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20C for defect inspection and the imaging method for defect inspection according to the fourth embodiment, the pair of first polarizing filters 23 ₁ and 24 ₁ are respectively disposed between the light source (light irradiation means) 21 and the first imaging region R1 between the first photographing area R1 and the area sensor (photographing means) 22, and are configured so that the two form an orthogonal polarization state, the area sensor (photographing means) 22 will include the first photographing area R1, the second photographing area R2 and the photographing area R of the intermediate photographing area R0 are photographed as two-dimensional images, so the cross-polarized light transmission inspection image of the first photographing area R1 and the normal transmission inspection image of the second photographing area R2 can be photographed at the same time. The image, and the image for transmission scatter inspection of the intermediate imaging region R0. That is, the photographing series for cross-polarized light transmission inspection, the photographing series for normal transmission inspection, and the photographing series for transmission-scattering inspection can be integrated.

As a result, according to the defect inspection system 10C and the defect inspection method of the fourth embodiment, the cross-polarized light transmission inspection series, the normal transmission inspection series, and the transmission-scattering inspection series can be integrated.

Therefore, according to the imaging device 20C for defect inspection, the imaging method for defect inspection, the defect inspection system 10C, and the defect inspection method of the fourth embodiment, the number of inspection series can be reduced.

[Fifth Embodiment]

The defect inspection system and defect inspection method according to the fifth embodiment of the present invention are the defect inspection system and defect inspection method for inspecting the above-mentioned retardation film, battery separator, etc. that do not have polarizing characteristics. In the fifth embodiment, the film 110 is a film that does not have polarizing properties.

The defect inspection system 10D according to the fifth embodiment of the present invention is a replacement of the defect inspection system 10C shown in FIG. 2 . The imaging device 20C for defect inspection is different from the fourth embodiment in the configuration including the imaging device 20D for defect inspection. Furthermore, the imaging device 20D for defect inspection shown in FIG. 7 is different from the fourth embodiment in that the imaging device 20C for defect inspection shown in FIG. 6 further includes an attenuation filter (brightness adjusting means) 26 .

The attenuation filter 26 is disposed between the light source 21 and the second imaging region R2. Therefore, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second photographing region R2. The attenuation filter 26 can also be disposed between the second photographing area R2 and the area sensor (photographing means) 22 to reduce the brightness of the light transmitted through the second photographing area R2.

Next, the defect inspection method and the imaging method for defect inspection according to the fifth embodiment of the present invention will be described.

First, the above-mentioned first polarizing filter configuration procedure is performed. Next, the attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the brightness value of the light irradiated to the second photographing region R2 can be reduced (brightness adjustment procedure). The attenuation filter 26 may also be disposed between the second photographing area R2 and the area sensor (photographing means) 22 to reduce the brightness of the light transmitted through the second photographing area R2.

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20D for defect inspection, the photographing method for defect inspection, the defect inspection system 10D, and the method for inspecting defect of the fifth embodiment can be obtained from the photographing device 20C for defect inspection and the photographing method for defect inspection of the fourth embodiment. , defect inspection system 10C, and defect inspection Check the same method.

Further, according to the imaging device 20D for defect inspection and the imaging method for defect inspection of the fifth embodiment, the attenuation filter (brightness adjustment means) 26 can be used to adjust the luminance value of the light irradiated to the second imaging region R2, so that it is possible to For example, by outputting light with a large brightness value from the light source (light irradiation means) 21, the brightness value of the light irradiated to the first imaging region R1 for the photographing series for cross-polarized light transmission inspection is increased, and attenuation is also used. The filter (brightness adjustment means) 26 is used to make the brightness value of the light irradiated to the second photographing region R2 small for the photographic series for positive transmission inspection. In addition, the attenuating filter 26 is arranged between the second photographing area R2 and the area sensor (photographing means) 22 to adjust the luminance value of the light transmitted through the second photographing area R2. The same can be expected. Effect.

[Sixth Embodiment]

The defect inspection system and defect inspection method according to the sixth embodiment of the present invention are the defect inspection system and defect inspection method for inspecting the above-mentioned retardation film and battery separator film without polarization characteristics. In the sixth embodiment, the film 110 is a film that does not have polarizing properties.

The defect inspection system 10E according to the sixth embodiment of the present invention is the same as the fourth in that the defect inspection imaging device 20E is provided in place of the defect inspection imaging device 20C in the defect inspection system 10C shown in FIG. 2 . The implementation form is different. Furthermore, the photographing apparatus 20E for defect inspection shown in FIG. 8 is the same as the fourth in that the light source 21A is provided in place of the light source 21 in the photographing apparatus 20C for defect inspection shown in FIG. 6 The implementation form is different.

The light source 21A has a brightness adjustment function capable of individually adjusting the brightness value of the light irradiated to the first imaging region R1 and the brightness value of the light irradiated to the second imaging region R2. Therefore, the luminance value of the light irradiated to the first imaging region R1 can be made larger, and the luminance value of the light irradiated to the second imaging region R2 can be made smaller.

Next, the defect inspection method and the imaging method for defect inspection according to the sixth embodiment of the present invention will be described.

First, the above-mentioned first polarizing filter configuration procedure is performed. Next, the luminance value of the light irradiated to the first imaging region R1 and the luminance value of the light irradiated to the second imaging region R2 are individually adjusted by the light source 21A. Thereby, the luminance value of the light irradiated to the first imaging region R1 can be increased, and the luminance value of the light irradiated to the second imaging region R2 can be decreased (brightness adjustment procedure).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The imaging device 20E for defect inspection, the imaging method for defect inspection, the defect inspection system 10E, and the method for defect inspection of the sixth embodiment can also be obtained from the imaging device 20C for defect inspection and the imaging method for defect inspection of the fourth embodiment. , the defect inspection system 10C, and the defect inspection method have the same effect.

Furthermore, according to the imaging device 20E for defect inspection and the imaging method for defect inspection of the sixth embodiment, the light source 21A can be used to individually adjust the luminance value and the illumination of the light irradiated to the first imaging region R1 The luminance value of the light reaching the second photographing area R2 can therefore be made larger for the light irradiated to the first photographing area R1 for the photographic series for cross-polarized light transmission inspection, and on the other hand, the The luminance value of the light irradiated to the second imaging region R2 of the photographic series for positive transmission inspection becomes smaller.

The present invention is not limited to the above-described embodiment, and various modifications can be made. For example, the examples shown in the first, second and third embodiments are the imaging devices 20, 20A, 20B for defect inspection using the transmission method and the imaging method for defect inspection, but the features of the present invention are also the same as those of the ninth and tenth And the photographing devices 20, 20A, 20B for defect inspection using the reflection method and the photographing method for defect inspection shown in Fig. 11.

According to the photographing apparatuses 20, 20A, 20B for defect inspection and the photographing method for defect inspection shown in FIGS. 9, 10 and 11, the _first polarizing filter 231 is placed between the light source (light irradiation means) 21 and the first photographing region R1 The surface sensor (photographing means) 22 is arranged to form an orthogonal polarization state with the film 110, and the surface sensor (photographing means) 22 captures the photographing area R including the first photographing area R1, the second photographing area R2 and the intermediate photographing area R0 into a two-dimensional image. Therefore, the cross-polarized light reflection inspection image of the first imaging area R1, the specular reflection inspection image of the second imaging area R2, and the backscatter inspection image of the intermediate imaging area R0 can be simultaneously captured. That is, the photographing series for cross-polarized light reflection inspection, the photographing series for specular reflection inspection, and the photographing series for reflection scattering inspection can be integrated. As a result, in the defect inspection systems 10, 10A, 10B and the defect inspection method, the cross-polarization reflection inspection series, the specular reflection inspection series, and the reflection and scattering inspection series can be integrated, and the number of inspection series can be reduced.

However, the photographic series for cross-polarized reflectance inspection is The appropriate light brightness value is not the same for the photographic series for reflection inspection. More specifically, the luminance value of the appropriate light in the photographing series for cross-polarization reflection inspection is large, and the luminance value of the appropriate light in the photographing series for specular reflection inspection is small.

In this regard, according to the photographing apparatuses 20A and 20B for defect inspection and the photographing method for defect inspection shown in FIGS. 10 and 11, the attenuation filter (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A can be used to adjust Since the luminance value of the light irradiated to the second photographing region R2 can be used for cross-polarized light reflection by, for example, outputting light having a larger luminance value from the light source (light irradiation means) 21 and the light source (brightness adjustment means) 21A The luminance value of the light irradiated to the first photographing region R1 of the photographic series for inspection becomes larger, and the attenuation filter (brightness adjusting means) 26 and the light source (brightness adjusting means) 21A are used for specular reflection inspection. The luminance value of the light irradiated to the second photographing region R2 of the photographing series becomes smaller. In the case of using the attenuation filter (brightness adjustment means) 26 (for example, the form shown in FIG. 10 ), the attenuation filter 26 can be arranged in the second photographing region R2 and the area sensor (photographing means) 22 between, to adjust the brightness value of the light reflected in the second shooting area R2.

Similarly, the examples shown in the fourth, fifth and sixth embodiments are all the imaging devices 20C, 20D and 20E for defect inspection using the transmission method and the imaging method for defect inspection. And as shown in Fig. 14, it is also applicable to the photographing devices 20C, 20D, 20E for defect inspection using the reflection method and the photographing method for defect inspection.

According to the photographing apparatuses 20C, 20D, 20E for defect inspection and the photographing method for defect inspection shown in FIGS. 12 , 13 and 14, a pair of first polarizing filters 23 ₁ , 24 ₁ are connected to the light source (light irradiation means) 21 and the first photographing area R1, and between the first photographing area R1 and the area sensor (photographing means) 22, and are respectively arranged to form an orthogonal polarization state, the area sensor (photographing means) 22 will The photographing area R including the first photographing area R1, the second photographing area R2, and the intermediate photographing area R0 is photographed as a two-dimensional image, so the cross-polarized reflection inspection image of the first photographing area R1 and the second photographing area R2 can be photographed at the same time. The image for specular reflection inspection and the image for backscatter inspection of the intermediate shooting area R0. That is, the photographing series for cross-polarized light reflection inspection, the photographing series for specular reflection inspection, and the photographing series for reflection scattering inspection can be integrated. As a result, in the defect inspection systems 10C, 10D, 10E and the defect inspection method, the orthogonal polarization reflection inspection series, the specular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced.

In addition, according to the imaging apparatuses 20D and 20E for defect inspection and the imaging method for defect inspection shown in FIGS. 13 and 14, the radiation can be adjusted by the attenuation filter (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A The luminance value of the light reaching the second imaging region R2 can be used for cross-polarization reflection inspection by, for example, outputting light having a larger luminance value from the light source (light irradiation means) 21 and the light source (brightness adjustment means) 21A. The luminance value of the light irradiated to the first photographing region R1 in the photographing series becomes larger, and the attenuation filter (brightness adjusting means) 26 and the light source (brightness adjusting means) 21A are used for photographing for specular reflection inspection. The luminance value of the light irradiated to the second photographing region R2 of the series becomes smaller. In the case of using the attenuation filter (brightness adjustment means) 26 (for example, the form shown in FIG. 13 ), the attenuation filter 26 can be arranged in the second imaging area R2 and the area sensor (photographing means) 22 to adjust the brightness value of the light reflected in the second photographing area R2.

In addition, the first, second, and third embodiments and the embodiments shown in Figs. 9, 10, and 11 show examples in which the _first polarizing filter 231 is arranged on the light source (light irradiation means) 21 and the film 110 between the first photographing regions R1, but may also be the first photographing in which the _first polarizing filter 231 is arranged on the film 110 as shown in Figs. 15, 16, 17, 18, 19 and 20 The form between the area R1 and the area sensor (photographing means) 22 .

[Seventh Embodiment]

The defect inspection system and the defect inspection method according to the seventh embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarizing characteristic described above. Fig. 22 is a diagram showing a defect inspection system and a defect inspection method according to a seventh embodiment of the present invention, and Fig. 23 is a diagram showing a defect inspection photographing device and a defect inspection photograph according to the seventh embodiment of the present invention Diagram of the method.

The defect inspection system 10 shown in FIG. 22 includes a defect inspection imaging device 20, an image analysis unit (detection unit) 30, and a marking device 40, and the defect inspection imaging device 20 shown in FIG. 23 includes a defect inspection imaging device 20. A light source (light irradiation means) 21 , a plurality of surface sensors (photography means) 22 , a first polarizing filter 23 ₁ , and a first polarizing filter for brightness adjustment (brightness adjusting means) 25 ₁ . XYZ orthogonal coordinates are shown in the figures 22 and 23, the X direction represents the width direction of the polarizing film, and the Y direction represents the conveying direction of the polarizing film.

In this embodiment, the conveyance roller 106 and the raw material reel 103 shown in FIG. 1 mainly function as conveyance means. By these conveyance means, the film 110 can be conveyed in the conveyance direction Y relatively to the light source 21 , the area sensor 22 , and the _first polarizing filter 231 .

The light source 21 is provided on the other main surface side of the film 110 , and irradiates light to the imaging region R of the film 110 . For example, the light source 21 is a linear light source extending in the width direction X.

The area sensors 22 are arranged on one main surface side of the film 110 , and are arranged side by side in the width direction X. As shown in FIG. The area sensor 22 includes a CCD (Charge Coupled Device) or a CMOS (Complememtary Metal-Oxide-Semiconductor) 22a and a lens 22b. By sensing the light transmitted through the film 110 , the area sensor 22 photographs the photographing area R of the film 110 into a two-dimensional image in a time-continuous manner.

The length in the conveyance direction Y of the 2D image captured by each area sensor 22 is preferably the interval from when each area sensor 22 captures the 2D image until the next 2D image is captured. 110 is at least twice the conveying distance. In other words, the same area of the film 110 is preferably photographed more than twice. In this way, the length in the conveyance direction Y of the two-dimensional image is made larger than the conveyance distance in the image capturing section, and the number of images of the same portion of the film 110 is increased, so that defects can be inspected with high accuracy.

Here, the imaging region R includes the first imaging region R1 and the second imaging region R2 divided in the conveyance direction Y and divided. Furthermore, the photographing area R includes an intermediate photographing area R0 between the first photographing area R1 and the second photographing area R2.

The first polarizing filter 23 ₁ is disposed between the light source 21 and the film 110 . Specifically, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the imaging region R. In the present embodiment, the first polarizing filter 23 ₁ is arranged so that half of the imaging region R in the conveying direction Y cannot be seen from the surface sensor 22 (knife edge). Also, the _first polarizing filter 231 and the film 110 are in a cross-polarized state. Here, the so-called orthogonal polarization state means a state in which the polarization axis (polarization absorption axis) of the polarizing filter and the polarization axis (polarization absorption axis) of the film are substantially orthogonal to each other, that is, the polarization axis of the polarizing filter A state in which it intersects the polarization axis of the film at an angle of substantially 90 degrees. The above-mentioned "substantial 90 degrees" means, for example, 85 degrees or more and less than 95 degrees, and more preferably 90 degrees.

The first polarizing filter 23 ₁ only needs to be in an orthogonal polarization state with the film 110 , and may also be disposed between the first photographing region R1 and the surface sensor 22 .

The first polarizing filter 25 ₁ for brightness adjustment is located between the light source 21 and the first polarizing filter 23 ₁ and between the light source 21 and the second imaging region R2 , and is arranged so as to form a first semi-orthogonal to the film 110 polarization state. Here, the so-called semi-orthogonal polarization state refers to a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are not substantially orthogonal but intersect, that is, the polarization filter A state in which the polarization axis of the optical device and the polarization axis of the film intersect at an angle other than substantially 90 degrees. The angle between the polarization axis (polarization absorption axis) of the polarizing filter forming the semi-orthogonal polarization state and the polarization axis (polarization absorption axis) of the film depends on the transmittance of the film and the light emitted from the light source which is the subject of the photographing means. However, for example, when light transmits through a predetermined area of the photographing area R (the second photographing area R2 in the example of FIG. 23) and is photographed by the area sensor 22, the luminance value on the image will be different. The angle below 200, and the angle where the brightness value on the image will be below 130 is preferred. For example, as described later, the intersection angle between the polarization axis of the _first brightness adjustment polarizing filter 251 and the polarization axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. Thereby, the polarizing filter 251 for the _first brightness adjustment can reduce the brightness value of the light irradiated to the second photographing region R2. In this specification, "luminance value" refers to a value possessed by each pixel on an 8-bit gray scale image.

The _first polarizing filter 251 for brightness adjustment can also be arranged only between the light source 21 and the second photographing area R2 to adjust the brightness of the light irradiated to the second photographing area R2, and can also be arranged on the film 110 and the surface feel The brightness of the light transmitted through the second photographing region R2 is adjusted between the detectors 22 .

In this way, the cross-polarized light transmission inspection image can be captured in the first imaging region R1, the semi-orthogonally polarized light (first semi-cross-polarized light) transmission inspection image can be captured in the second imaging region R2, and the transmission inspection image can be captured in the intermediate imaging region R0 Images for scatter studies.

The image analysis unit 30 detects defects existing in the film 110 based on the two-dimensional image from the area sensor 22 . The image analysis unit 30 converts the coordinate position on the 2D image to the coordinate position on the film 110 according to the pixel coordinates of the 2D image and the distance the film is moved during the image capturing interval to generate defect position information. The image analysis unit 30 creates a defect map by synthesizing images corresponding to the entire region of the film 110 based on the defect position information.

The marking device 40 marks the film based on the defect map from the image analysis unit 30 .

Next, the defect inspection method and the imaging method for defect inspection according to the seventh embodiment of the present invention will be described.

First, the first polarizing filter 231 is placed between the light source 21 and the _first photographing region R1 of the film 110 so as to form an orthogonal polarization state with the film 110 (first polarizing filter placement procedure). The first polarizing filter 231 can also be disposed between the _first photographing region R1 and the area sensor 22 . Next, the first polarizing filter 251 for brightness adjustment is arranged between the light source 21 and the _first polarizing filter 231, and between the light source ₂₁ and the second imaging region R2 so as to form a first positive half with the film 110 cross-polarized state. Thereby, the brightness value of the light irradiated to the second photographing area can be reduced (brightness adjustment procedure). The _first polarizing filter 251 for brightness adjustment may be arranged only between the light source 21 and the second photographing region R2, or may be arranged between the film 110 and the area sensor 22.

Next, the film 110 is conveyed in the conveyance direction Y relative to the light source 21, the surface sensor 22, and the _first polarizing filter 231 by means of conveyance (conveyance process), and the film 110 is photographed by irradiating light with the light source 21. In the area R (light irradiation procedure), the area R of the film 110 is photographed as a two-dimensional image by the area sensor 22 (photograph procedure).

Next, the image analysis unit 30 detects defects in the film 110 based on the two-dimensional image from the area sensor 22, and creates a defect map based on the defect position information (defect detection process). Next, using the marking device 40, based on the defect map from the image analysis unit 30, The film 110 is marked (marking procedure).

According to the imaging device 20 for defect inspection and the imaging method for defect inspection of the seventh embodiment, the _first polarizing filter 231 is disposed between the light source 21 (light irradiation means) and the first imaging region R1 so as to be formed with the film 110 In the orthogonal polarization state, the area sensor 22 (photographing means) captures the capture area R including the first capture area R1, the second capture area R2 and the intermediate capture area R0 into a two-dimensional image, so the first capture can be captured simultaneously The cross-polarized light transmission inspection image of the region R1, the semi-cross-orthogonally polarized light (first semi-cross-polarized light) transmission inspection image of the second imaging region R2, and the transmission-scattering inspection image of the intermediate imaging region R0. That is, the photographic series for cross-polarized light transmission inspection, the photographic series for semi-cross-polarized light transmission inspection, and the photographic series for transmission-scattering inspection can be integrated.

As a result, according to the defect inspection system 10 and the defect inspection method of the seventh embodiment, the cross-polarized light transmission inspection series, the semi-cross-polarized light transmission inspection series, and the transmission-scattering inspection series can be integrated.

Therefore, according to the imaging device 20 for defect inspection, the imaging method for defect inspection, the defect inspection system 10, and the defect inspection method of the seventh embodiment, the number of inspection series can be reduced.

According to the imaging device 20 for defect inspection and the imaging method for defect inspection according to the seventh embodiment, the first brightness adjustment polarizing filter (brightness adjustment means) ₂₅₁ can be used to adjust the amount of light irradiated to the second imaging region R2. Brightness value. Therefore, for example, by outputting light with a larger luminance value from the light source (light irradiation means) 21 , the luminance value of the light irradiated to the first imaging region R1 for the photographing series for cross-polarized light transmission inspection can be made smaller. In addition, the first polarizing filter for brightness adjustment (brightness adjustment means) ₂₅₁ is used to make the irradiation to the second photographing region R2 for the semi-orthogonally polarized light (first semi-orthogonally polarized light) transmission inspection photographing series. The brightness value of the light becomes smaller.

However, the inventors of the present application have come to the conclusion that the normal transmission method is suitable for the detection of black foreign matter and the cross-polarized light transmission method is suitable for the detection of bright spots, but they found that the cross-polarized light transmission method can detect Strong bright spots are found but it is more difficult to detect some weak bright spots. In this regard, the inventors of the present application have found that black foreign matters or locally weak bright spots that are difficult to detect by the cross-polarized light transmission method can be inspected by the semi-cross-polarized light transmission method.

In this regard, according to the imaging device 20 for defect inspection and the imaging method for defect inspection according to the seventh embodiment, the polarizing filter (brightness adjustment means) 251 for the _first brightness adjustment and the second imaging region R2 of the film 110 form the first It is in a half-cross-polarized state, so it can improve the detection of black foreign objects and weak bright spots (including some of the above-mentioned weak bright spots). In this specification, the following so-called weak bright spots include the concept of "a part of weak bright spots" described above.

Next, verification of the above-mentioned effect is performed. Fig. 45(a) shows detection images of various defects (black foreign matter, weak bright spot, strong bright spot) when the cross angle of the polarizing filter with respect to the film is changed at 40 times the light intensity of the light source. Fig. 45(b) shows a graph in which the luminance values of the detected image in Fig. 45(a) are graphed. Similarly, Fig. 45(c) shows the change in the cross angle of the polarizing filter with respect to the film when the light intensity of the light source is 20 times. The brightness value of the detected image of various defects (black foreign matter, weak bright spot, strong bright spot) during lithography is graphed. Figure 45(d) shows the polarized light relative to the film when the light source is 10 times the amount of light. A graph showing the luminance values of detected images of various defects (black foreign matter, weak bright spots, and strong bright spots) when the cross angle of the filters is changed. The so-called 40 times, 20 times, and 10 times the light intensity of the light source are displayed when the light intensity of the light source when the brightness value on the image is 128 (the most suitable light intensity in the case of direct transmission) is 1 time.

According to Fig. 45 (a) and (b), it can be seen that when the light intensity of the light source is 40 times, for the detection of strong bright spot defects, the intersection angle is substantially 90 degrees, that is, the cross-polarized light transmission method is more suitable. For the detection of weak bright spot defects, the intersection angle is 105 degrees, that is, the semi-orthogonal polarized light transmission method is more suitable. In addition, if the intersection angle is less than 70 degrees and more than 110 degrees, the brightness on the image will be too high, resulting in the overall whitening of the image. In addition, although it is known that the positive transmission method is suitable for the detection of black foreign matter defects, in the case of using a polarizing filter to adjust the brightness in the positive transmission method, the intersection angle is 75 degrees or more and less than 85 degrees, or Above 95 degrees and below 105 degrees, that is, the semi-orthogonal polarization transmission method is more suitable.

In addition, according to Fig. 45 (b), (c), (d), it can be seen that depending on the light quantity of the light source, the detection of weak bright spot defects and the detection of defects of black foreign matter are transmitted in semi-orthogonally polarized light. The most appropriate angle of intersection in the law is not the same.

It can be seen from this that in the case of using a polarizing filter to adjust the brightness in the forward transmission method, that is, in the case of using the semi-orthogonal polarized light transmission method, the defect signal will become high when the cross angle is outside the substantial 90 degrees. It is very beneficial to detect sags, such as weak bright spots and black foreign objects.

In addition, the inspection at two intersecting angles can be considered collectively to judge the level of the defect. For example, it can be confirmed by both the cross-polarization transmission method in which the cross angle is substantially 90 degrees, and the semi-cross-polarization transmission method in which the cross angle is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. Defective signal, in other words, when a defective signal is confirmed in a wide angle range, it is judged as a high defect level, and when a defective signal is confirmed only at a cross angle of 90 degrees with a substantial cross-polarization method, it is judged as a defect level. Low.

In the above verification, although a polarizing filter is arranged between the light source and the shooting area to adjust the brightness of the light irradiated to the shooting area, even if the semi-orthogonal polarized light transmission method using a polarizing filter is used for the light transmitted through the shooting area. The same effect can be expected when the brightness of the light is adjusted.

[Variation of the seventh embodiment]

The seventh embodiment has been described as an example of the imaging device 20 for defect inspection and the imaging method for defect inspection in which the crossed polarized light transmission method and the semi-crossed polarized light transmission method are combined. Different semi-orthogonally polarized transmission methods. Hereinafter, the imaging device 20 for defect inspection and the imaging method for defect inspection in which the cross-polarized light transmission method and two different semi-cross-polarized light transmission methods are combined are described as a modification of the seventh embodiment.

The imaging device 20 for defect inspection according to the modification example shown in FIG. 39 is added to the imaging device 20 for defect inspection shown in FIG. 23 by adding a second polarizing filter (brightness adjustment means) 25 ₂ for brightness adjustment. The configuration is different from that of the seventh embodiment.

Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and this third imaging region R3 is an area adjacent to the second imaging region R2.

The second polarizing filter for brightness adjustment (brightness adjustment means) 25 ₂ is arranged between the light source 21 and the third imaging region R3 so as to be adjacent to the first polarizing filter 25 ₁ for brightness adjustment and to form a second polarizing filter with the film 110 Semi-orthogonal polarization state. Here, the so-called second semi-orthogonal polarization state is different from the first semi-orthogonal polarization state. That is, the intersection angle between the polarization axis of the polarizing filter in the second semi-orthogonal polarization state and the polarization axis of the film is the same as the polarization axis of the polarizing filter in the first semi-orthogonal polarization state and the polarization axis of the film. different angles of intersection. Therefore, the _second brightness adjustment polarizing filter 252 can reduce the brightness value of the light irradiated to the third photographing region R3. The _second polarizing filter 252 for brightness adjustment may be in a second semi-orthogonal polarization state with the film 110, and may also be disposed between the third photographing region R3 and the surface sensor 22 to adjust the transmission through The brightness of the light in the third shooting area R3.

Next, the defect inspection method and the imaging method for defect inspection of the modification of 7th Embodiment are demonstrated.

First, the above-described first polarizing filter configuration procedure is performed. Next, as described above, the first polarizing filter 251 for brightness adjustment is arranged between the light source 21 and the _first polarizing filter 231 and between the light source ₂₁ and the second imaging region R2 so as to be formed with the film 110 The first half of the orthogonal polarization state. Next, the _second polarizing filter 252 for brightness adjustment is arranged between the light source 21 and the third imaging region R3 so as to form a second semi-orthogonal polarization state with the film 110 . Thereby, the luminance value of the light irradiated to the second photographing area R2 and the third photographing area R3 can be reduced (brightness adjustment procedure). The _second polarizing filter 252 for brightness adjustment may also be disposed between the third photographing region R3 and the area sensor 22 . Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20 for defect inspection, the photographing method for defect inspection, the defect inspection system 10 , and the method for defect inspection according to the modification of the seventh embodiment can also be obtained from the photographing device 20 for defect inspection and the defect inspection method of the seventh embodiment. Using the photographic method, the defect inspection system 10, and the defect inspection method have the same effect.

[Eighth Embodiment]

The defect inspection system and the defect inspection method according to the eighth embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the film 110 having the polarizing characteristic described above.

The defect inspection system 10A according to the eighth embodiment of the present invention is the same as the seventh in that the defect inspection imaging device 20A is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. 22 . The implementation form is different. Furthermore, the photographing device 20A for defect inspection shown in FIG. 24 is provided with attenuation in place of the _first polarizing filter (brightness adjusting means) 251 for brightness adjustment in the photographing device 20 for defect inspection shown in FIG. 23 . The configuration of the filter (brightness adjusting means) 26 is different from that of the seventh embodiment. In addition, the photographing device 20A for defect inspection is different from the seventh embodiment in that the angle of intersection of the photographing device 20 for defect inspection with respect to the polarization axis (polarization absorption axis) of the _first polarizing filter 231 of the film 110 is different from that of the seventh embodiment. different.

The first polarizing filter 231 and the _first photographing region R1 of the film 110 form a first semi-orthogonal polarization state. For example, as described later, the intersection angle between the polarization axis of the _first polarizing filter 231 and the polarization axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. The _first polarizing filter 231 only needs to form a first semi-orthogonal polarization state with the first photographing area R1 of the film 110, and can also be arranged between the first photographing area R1 and the area sensor 22 (see Section 1.1). 35 Figures).

The attenuation filter 26 is disposed between the light source 21 and the second imaging region R2. Therefore, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second photographing region R2. The attenuation filter 26 can also be disposed between the second photographing area R2 and the area sensor 22 to reduce the brightness of the light transmitted through the second photographing area R2.

Next, the defect inspection method and the imaging method for defect inspection according to the eighth embodiment of the present invention will be described.

First, the first polarizing filter 231 is arranged between the light source 21 and the _first photographing region R1 of the film 110 to form a first semi-orthogonal polarization state with the film 110 (first polarizing filter arrangement procedure). The first polarizing filter 231 can also be disposed between the _first photographing region R1 and the area sensor 22 . Next, the attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the brightness value of the light irradiated to the second photographing region R2 can be reduced (brightness adjustment procedure). The attenuation filter 26 can also be disposed between the second photographing region R2 and the area sensor 22 .

Next, carry out the above-mentioned conveyance process, light irradiation process, Photography procedures, defect detection procedures, marking procedures.

The imaging device 20A for defect inspection, the imaging method for defect inspection, the defect inspection system 10A, and the defect inspection method of the eighth embodiment can also be obtained from the imaging device 20 for defect inspection and the imaging method for defect inspection of the seventh embodiment , the defect inspection system 10, and the defect inspection method have the same effect.

[First modification of the eighth embodiment]

The eighth embodiment has been described as an example of the imaging device 20A for defect inspection and the imaging method for defect inspection in which the semi-orthogonally polarized light transmission method and the normal transmission method are combined, but two or more different semi-orthogonally polarized light transmission methods may be combined. method and the forward transmission method. Hereinafter, a description will be given of a defect inspection imaging device 20A and a defect inspection imaging method in which two different semi-orthogonally polarized light transmission methods and positive transmission methods are combined as a first modification of the eighth embodiment.

The imaging device 20A for defect inspection of the first modification shown in FIG. 40 is the same as the eighth embodiment in that the imaging device 20A for defect inspection shown in FIG. 24 further includes a _second polarizing filter 232 different.

Here, the imaging region R further includes a third imaging region R3 divided along the conveying direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.

The second polarizing filter 23 ₂ is disposed between the light source 21 and the third imaging region R3 so as to be adjacent to the first polarizing filter 23 ₁ and to form a second semi-orthogonal polarization state with the film 110 . Here, the so-called second semi-orthogonal polarization state is different from the first semi-orthogonal polarization state. That is, the intersection angle between the polarization axis of the polarizing filter in the second semi-orthogonal polarization state and the polarization axis of the film is the polarization axis of the polarizing filter in the first semi-orthogonal polarization state and the polarization axis of the film. The angle of intersection of the axes is different. As long as the _second polarizing filter 232 is arranged to form the second semi-orthogonal polarization state with the third photographing region R3, it can also be arranged independently from the _first polarizing filter 231 in the third photographing region R3 and the surface between the type sensors 22 .

Next, the defect inspection method and the imaging method for defect inspection according to the first modification of the eighth embodiment will be described.

First, as described above, the first polarizing filter 231 is arranged between the light source 21 and the _first imaging region R1 of the film 110 so as to form a first semi-orthogonal polarization state with the first imaging region R1 of the film 110 (No. a polarizing filter configuration program). Next, the _second polarizing filter 232 is arranged between the light source 21 and the third imaging region R3 of the film 110 to form a second semi-orthogonal polarization state with the film 110 (second polarizing filter arrangement procedure). The second polarizing filter 23 ₂ and the first polarizing filter 23 ₁ can also be independently disposed between the third photographing region R3 and the surface sensor 22 . Next, the above-mentioned brightness adjustment process, conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20A for defect inspection, the photographing method for defect inspection, the defect inspection system 10A, and the method for inspecting defect according to the first modification of the eighth embodiment can be obtained as the photographing device 20 for defect inspection, The photographic method for defect inspection, the defect inspection system 10, and the defect inspection method have the same effect.

[Second modification of the eighth embodiment]

Although the eighth embodiment illustrates an example of the imaging device 20A for defect inspection and the imaging method for defect inspection in which the semi-orthogonally polarized light transmission method and the normal transmission method are combined, two or more different semi-orthogonally polarized light transmission methods may be combined. Law. Hereinafter, a description will be given of a defect inspection imaging device 20A and a defect inspection imaging method in which two different semi-cross-polarized light transmission methods are combined as a second modification of the eighth embodiment.

The imaging device 20A for defect inspection according to the second modification is provided with a first polarizing filter ( The structure of the brightness adjustment means) 251 is different from that _of the eighth embodiment.

The first polarizing filter for brightness adjustment (brightness adjustment means) 25 ₁ is arranged between the light source 21 and the second imaging region R2 so as to form a second semi-orthogonal polarization state with the film 110 . Here, the so-called second semi-orthogonal polarization state is different from the first semi-orthogonal polarization state. That is, the intersection angle between the polarization axis of the polarizing filter in the second semi-orthogonal polarization state and the polarization axis of the film is the polarization axis of the polarizing filter in the first semi-orthogonal polarization state and the polarization axis of the film. The angle of intersection of the axes is different. Therefore, the _first brightness adjustment polarizing filter 251 can reduce the brightness value of the light irradiated to the second photographing region R2.

The _first polarizing filter 251 for brightness adjustment only needs to form a second semi-orthogonal polarization state with the film 110, and it can also be arranged between the second photographing region R2 and the surface sensor 22 to reduce the transmission through the first polarized light. 2. The brightness value of the light in the shooting area R2.

Next, for the second modification of the eighth embodiment The defect inspection method and the photographic method for defect inspection will be explained.

First, as described above, the first polarizing filter 231 is arranged between the light source 21 and the _first photographing region R1 of the film 110 so as to form a first semi-orthogonal polarization state with the film 110 (the first polarizing filter arrangement program). Next, the first polarizing filter 251 for brightness adjustment is arranged between the light source 21 and the _first polarizing filter 231, and between the light source ₂₁ and the second imaging region R2 so as to form a second half-positive with the film 110 cross-polarized state. Thereby, the brightness value of the light irradiated to the second photographing region R2 can be reduced (brightness adjustment procedure). The _first polarizing filter 251 for brightness adjustment can also be disposed between the second photographing area R2 and the area sensor 22 to reduce the luminance value of the light transmitted through the second photographing area R2. Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The imaging device 20A for defect inspection, the imaging method for defect inspection, the defect inspection system 10A, and the method for defect inspection according to the second modification of the eighth embodiment can also be obtained as the imaging device 20 for defect inspection, The photographic method for defect inspection, the defect inspection system 10, and the defect inspection method have the same effect.

[Ninth Embodiment]

The defect inspection system and the defect inspection method according to the ninth embodiment of the present invention are the defect inspection system 10B and the defect inspection method for performing the defect inspection of the film 110 having the polarizing characteristic described above.

The defect inspection system 10B according to the ninth embodiment of the present invention is the same as the seventh in that the defect inspection imaging device 20B is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. 22 . The implementation form is different. In addition, the photographing apparatus 20B for defect inspection shown in FIG. 25 replaces the light source 21 and the first polarizing filter (brightness adjusting means) 25 ₁ for adjusting the luminance in the photographing apparatus 20 for inspecting defects shown in FIG. 23 . On the other hand, the configuration including the light source 21A is different from that of the seventh embodiment. In addition, the photographing device 20B for defect inspection is different from the seventh embodiment in that the angle of intersection of the photographing device 20 for defect inspection with respect to the polarization axis (polarization absorption axis) of the _first polarizing filter 231 of the film 110 is different from that of the seventh embodiment. different.

The first polarizing filter 231 and the _first photographing region R1 of the film 110 form a first semi-orthogonal polarization state. For example, as described later, the intersection angle between the polarization axis of the _first polarizing filter 231 and the polarization axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. The _first polarizing filter 231 only needs to form a first semi-orthogonal polarization state with the first photographing area R1 of the film 110, and can be arranged between the light source 21A and the first photographing area R1 (refer to FIG. 25), or Between the first imaging region R1 and the area sensor 22 (see FIG. 36 ).

The light source 21A has a brightness adjustment function capable of individually adjusting the brightness value of the light irradiated to the first imaging region R1 and the brightness value of the light irradiated to the second imaging region R2. Therefore, the luminance value of the light irradiated to the first imaging region R1 can be made larger, and the luminance value of the light irradiated to the second imaging region R2 can be made smaller.

Next, the defect inspection method and the imaging method for defect inspection according to the ninth embodiment of the present invention will be described.

First, the first polarizing filter 231 is arranged between the light source 21 and the _first photographing region R1 of the film 110 to form a first semi-orthogonal polarization state with the film 110 (first polarizing filter arrangement procedure). The first polarizing filter 231 can also be disposed between the _first photographing region R1 and the area sensor 22 . Next, the luminance value of the light irradiated to the first imaging region R1 and the luminance value of the light irradiated to the second imaging region R2 are individually adjusted by the light source 21A. Thereby, the luminance value of the light irradiated to the first photographing region R1 can be made larger, and the luminance value of the light irradiated to the second photographing region R2 can be made smaller (brightness adjustment procedure).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20B for defect inspection, the photographing method for defect inspection, the defect inspection system 10B, and the method for defect inspection according to the ninth embodiment can also be obtained from the photographing device 20 for defect inspection and the photographing method for defect inspection of the seventh embodiment. , the defect inspection system 10, and the defect inspection method have the same effect.

[Variation of the ninth embodiment]

The ninth embodiment has been described as an example of the imaging device 20B for defect inspection and the imaging method for defect inspection in which the semi-orthogonally polarized light transmission method and the normal transmission method are combined, but two or more different semi-orthogonally polarized light transmission methods may be combined. method and the forward transmission method. Hereinafter, as a modification of the ninth embodiment, a defect inspection imaging device 20B and a defect inspection imaging method in which two different semi-orthogonally polarized light transmission methods and positive transmission methods are combined will be described.

The imaging device 20B for defect inspection shown in Fig. 41 is different from the ninth embodiment in that the imaging device 20B for defect inspection shown in Fig. 25 is added with a _second polarizing filter 232.

Here, the photographing area R further includes a third photographing area R3 divided along the conveying direction Y, and the third photographing area R3 is an area adjacent to the first photographing area R1.

The second polarizing filter 23 ₂ is disposed between the light source 21 and the third imaging region R3 so as to be adjacent to the first polarizing filter 23 ₁ and to form a second semi-orthogonal polarization state with the film 110 . Here, the so-called second semi-orthogonal polarization state is different from the first semi-orthogonal polarization state. That is, the intersection angle between the polarization axis of the polarizing filter in the second semi-orthogonal polarization state and the polarization axis of the film is the same as the polarization axis of the polarizing filter in the first semi-orthogonal polarization state and the polarization axis of the film. different angles of intersection. The second polarizing filter 23 ₂ only needs to be in a second semi-orthogonal polarization state with the film 110 , and may also be disposed between the third photographing region R3 and the surface sensor 22 .

Next, the defect inspection method and the imaging method for defect inspection according to the modification of the ninth embodiment will be described.

First, as described above, the first polarizing filter 231 is arranged between the light source 21 and the _first imaging region R1 of the film 110 so as to form a first semi-orthogonal polarization state with the first imaging region R1 of the film 110 (No. a polarizing filter configuration program). Next, the _second polarizing filter 232 is arranged between the light source 21 and the third imaging region R3 of the film 110 to form a second semi-orthogonal polarization state with the film 110 (second polarizing filter arrangement procedure). The _second polarizing filter 232 can also be disposed between the third photographing region R3 and the surface sensor 22 . Next, the above-mentioned brightness adjustment process, conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20B for defect inspection, the photographing method for defect inspection, the defect inspection system 10B, and the method for defect inspection according to the modification of the ninth embodiment can also be obtained from the photographing device 20 for defect inspection and the defect inspection method of the seventh embodiment. Using the photographic method, the defect inspection system 10, and the defect inspection method have the same effect.

[Tenth Embodiment]

The defect inspection system and defect inspection method according to the tenth embodiment of the present invention are the defect inspection system and defect inspection method for inspecting the above-mentioned retardation film and battery separator film without polarization characteristics. The defect inspection system and the defect inspection method of the tenth embodiment can be used for a manufacturing apparatus and a manufacturing method of a retardation film, a battery separator, and the like, which do not have polarization characteristics. In the manufacturing apparatus and manufacturing method of retardation films, battery separators, etc., which do not have polarizing characteristics, all points other than the defect inspection system and defect inspection method described in the tenth embodiment are well-known, so they are omitted. As described above. Regarding other embodiments and modifications related to the defect inspection system and defect inspection method for inspecting defects such as retardation films and battery separator films that do not have polarizing properties, the same viewpoints will be applied to those that do not have polarized light. The description of the manufacturing apparatus and manufacturing method of the retardation film, the separator for batteries, etc. of characteristics is abbreviate|omitted. In the description of the tenth embodiment and its modifications, the film 110 is a film that does not have polarizing properties.

The defect inspection system 10C according to the tenth embodiment of the present invention is the same as the seventh in that the defect inspection imaging device 20C is provided in place of the defect inspection imaging device 20 in the defect inspection system 10 shown in FIG. 22 . The implementation form is different. Furthermore, the photographing device 20C for defect inspection shown in FIG. 26 is provided with a pair of first polarizing filters 23 in place of the first polarizing filter 23 ₁ in the photographing device 20 for defect inspection shown in FIG. 23 . ₁ and 24 ₁ , and in addition to the first polarizing filter 25 ₁ for brightness adjustment, a first polarizing filter 25 ₃ for brightness adjustment, which is paired with the first polarizing filter 25 ₁ for brightness adjustment, is added. The configuration is different from that of the seventh embodiment.

The first polarizing filter 23 ₁ is disposed between the light source 21 and the film 110 as in the seventh embodiment. Specifically, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the imaging region R. In the present embodiment, the first polarizing filter 23 ₁ is arranged so that half of the imaging region R in the conveyance direction Y cannot be seen from the surface sensor 22 (knife edge).

On the other hand, the first polarizing filter 24 ₁ is disposed between the film 110 and the area sensor 22 . Specifically, the first polarizing filter 24 ₁ is disposed between the first photographing area R1 of the photographing area R and the area sensor 22 . In the present embodiment, the _first polarizing filter 241 is arranged so that half of the imaging region R in the conveyance direction Y cannot be seen from the surface sensor 22 (knife edge).

In addition, the first polarizing filter 25 ₁ for adjusting brightness among the pair of polarizing filters 25 ₁ and 25 ₃ for adjusting first brightness is disposed between the light source 21 and the film 110 as in the seventh embodiment. On the other hand, the first polarizing filter 25 ₃ for brightness adjustment is disposed between the film 110 and the area sensor 22 . Specifically, the first polarizing filter 25 ₃ for brightness adjustment is disposed between the second imaging region R2 of the imaging region R and the area sensor 22 . In the tenth embodiment, the first brightness adjustment polarizing filter ₂₅₃ is arranged so that half of the imaging area R in the conveyance direction Y (in the example of FIG. 26, the part on the side of the second imaging area R2) The area sensor 22 is not visible.

Furthermore, the first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ are in a cross-polarized state. The first polarizing filter 25 ₁ for brightness adjustment and the first polarizing filter 25 ₃ for brightness adjustment are in a first semi-orthogonal polarization state. For example, the intersection angle _of the polarization axes of the first polarizing filter 251 for brightness adjustment and the _first polarizing filter 253 for brightness adjustment is more than 75 degrees but less than 85 degrees, or more than 95 degrees and 105 degrees the following. As a result, an image for cross-polarized light transmission inspection can be captured in the first imaging region R1, a semi-orthogonally polarized light transmission inspection image is captured in the second imaging region R2, and an image for transmission scattering inspection is captured in the intermediate imaging region R0.

Next, the defect inspection method and the imaging method for defect inspection according to the tenth embodiment of the present invention will be described.

First, the _first polarizing filter 231 is placed between the light source 21 and the first photographing region R1 of the film 110, and the _first polarizing filter 241 is placed between the first photographing region R1 of the film 110 and the surface feel between the detectors 22. Then, the first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ are arranged so that they are in a cross-polarized state (first polarizing filter arrangement procedure).

Next, the _first polarizing filter 251 for brightness adjustment is disposed between the light source 21 and the _first polarizing filter 231 and between the light source 21 and the second imaging region R2, and the first polarizing filter for brightness adjustment is _The sensor 253 is disposed between the second photographing region R2 of the film 110 and the surface sensor 22 . Furthermore, the first polarization filter 251 for brightness adjustment and the _first polarization filter 253 for brightness adjustment are arranged so as to form a first semi _- orthogonal polarization state. As a result, the brightness value of the light transmitted through the second photographing region R2 and observed by the area sensor 22 can be reduced (brightness adjustment procedure). The _first polarizing filter 251 for brightness adjustment may be arranged only between the light source 21 and the second photographing region R2.

_In addition, the first polarizing filter 253 for brightness adjustment may be omitted, and the _first polarizing filter 241 may be extended to the second imaging region R2. In this case, what is necessary is just to make the 1st polarizing filter 251 for brightness adjustment form a _1st semi-orthogonal polarization state with respect to the _1st polarizing filter 241.

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20C for defect inspection and the imaging method for defect inspection according to the tenth embodiment, the pair of first polarizing filters 23 ₁ and 24 ₁ are respectively disposed between the light source (light irradiation means) 21 and the first imaging region R1 and between the first shooting area R1 and the area sensor (photographing means) 22, and are arranged so that the two form an orthogonal polarization state, the area sensor (photographing means) 22 will include the first photographing area R1, The second photographing area R2 and the photographing area R of the intermediate photographing area R0 are photographed as two-dimensional images, so the cross-polarized light transmission inspection image of the first photographing area R1 and the semi-orthogonally polarized light transmittance of the second photographing area R2 can be photographed at the same time ( The first half cross-polarized light transmission) image for inspection, and the image for transmission-scattering inspection of the intermediate imaging region R0. That is, the photographing series for cross-polarized light transmission inspection, the photographing series for semi-cross-polarized light (first half-cross-polarized light) transmission inspection, and the photographing series for transmission-scattering inspection can be integrated.

As a result, according to the defect inspection system 10C and the defect inspection method of the tenth embodiment, the cross-polarized light transmission inspection series, the semi-cross-polarized light transmission inspection series, and the transmission-scattering inspection series can be integrated.

Therefore, according to the imaging device 20C for defect inspection, the imaging method for defect inspection, the defect inspection system 10C, and the defect inspection method of the tenth embodiment, the number of inspection series can be reduced.

Furthermore, according to the photographing device 20C for defect inspection and the photographing method for defect inspection according to the tenth embodiment, the pair of polarizing filters (brightness adjusting means) 25 ₁ and 25 ₃ for first brightness adjustment can adjust the transmission through the second The luminance value of the light observed by the area sensor 22 when the area R2 is captured. Therefore, the luminance value of the light irradiated to the first photographing region R1 for the photographing series for cross-polarized light transmission inspection can be increased by, for example, outputting light with a relatively large luminance value from the light source (light irradiation means) 21, In addition, a pair of first brightness adjustment polarizing filters (brightness adjustment means) 25 ₁ , 25 ₃ are used to allow the transmission through the second photographing region R2 for the semi-cross-polarized light transmission inspection photography series to be sensed by the surface shape The brightness value of the light observed by the detector 22 is small.

Furthermore, according to the imaging device 20C for defect inspection and the imaging method for defect inspection according to the tenth embodiment, the pair of first brightness adjustment polarizing filters (brightness adjustment means) 25 ₁ and 25 ₃ form the first half-cross polarized light Therefore, the detection of black foreign objects and weak bright spots can be improved.

[Variation of the tenth embodiment]

The tenth embodiment describes an example of a defect inspection imaging device 20C and a defect inspection imaging method combining the crossed polarized light transmission method and the semi-crossed polarized light transmission method, but the crossed polarized light transmission method may be combined with the defect inspection imaging method. Two or more different semi-orthogonally polarized light transmission methods. Hereinafter, a defect inspection imaging device 20C and a defect inspection imaging method in which the crossed polarized light transmission method and two different semi-crossed polarized light transmission methods are combined will be described as a modification of the tenth embodiment.

The photographing device 20C for defect inspection shown in Fig. 42 has a pair of second polarizing filters (brightness adjusting means) 25 ₂ , 25 ₄ added to the photographing device 20C for defect inspection shown in Fig. 26 . The structure is different from that of the tenth embodiment.

Here, the imaging region R further includes a third imaging region R3 divided along the conveying direction Y, and the third imaging region R3 is adjacent to the second imaging region R2.

The second polarizing filter for brightness adjustment (brightness adjustment means) 25 ₂ is arranged between the light source 21 and the third imaging region R3 so as to be adjacent to the first polarizing filter 25 ₁ for brightness adjustment, and the second polarizing filter for brightness adjustment _The filter 254 is arranged between the third imaging region _R3 and the surface sensor 22 so as to be adjacent to the first polarizing filter 253 for brightness adjustment. A pair of polarizing filters (brightness adjusting means) 25 ₂ and 25 ₄ for second brightness adjustment are arranged so that both of them form a second semi-orthogonal polarization state. Here, the second semi-orthogonal polarization state formed by the pair of second brightness adjustment polarizing filters (brightness adjustment means) 25 ₂ and 25 ₄ is different from the first semi-orthogonal polarization state. That is, the intersection angle of the polarization axes of the polarizing filter in the second semi-orthogonal polarization state is different from the intersection angle of the polarization axes of the polarizing filter in the first semi-orthogonal polarization state, and the second brightness adjustment The use of the polarizing filters 25 ₂ , 25 ₄ can thus reduce the luminance value of the light transmitted through the third photographing region R3 and observed by the area sensor 22 .

Next, the defect inspection method and the imaging method for defect inspection according to the modification of the tenth embodiment will be described.

First, the above-described first polarizing filter configuration procedure is performed. Next, as described above, the _first polarization filter 251 for brightness adjustment is arranged between the light source 21 and the _first polarization filter 231 and between the light source 21 and the second imaging region R2, and the first brightness is adjusted _The polarizing filter 253 is arranged between the second photographing region R2 of the film 110 and the area sensor 22 . Furthermore, the first polarization filters 25 ₁ and 25 ₃ for brightness adjustment are arranged so that both of them form a first semi-orthogonal polarization state. Next, the _second polarizing filter 252 for brightness adjustment is arranged between the light source ₂₁ and the third imaging region R3, and the second polarizing filter 254 for brightness adjustment is arranged in the third imaging region R3 of the film 110 between the area sensor 22 . At this time, the second polarization filters 25 ₂ and 25 ₄ for brightness adjustment are arranged so that both of them form a second semi-orthogonal polarization state. As a result, the luminance value of the light transmitted through the second photographing region R2 and the third photographing region R3 and observed by the area sensor 22 can be reduced (luminance adjustment procedure). The _first polarizing filter 251 for brightness adjustment may be arranged only between the light source 21 and the second photographing region R2.

_In addition, the first polarizing filter 253 for brightness adjustment may be omitted and the _first polarizing filter 241 may be extended to the second imaging region R2. In this case, the first polarizing filter for brightness adjustment may be 25 ₁ only needs to form a first semi-orthogonal polarization state with respect to the first polarizing filter 24 ₁ . Alternatively, the second polarizing filter 254 for brightness adjustment may be omitted and the first polarizing filter ₂₅₃ for brightness adjustment may be extended to the _third imaging region R3. In this case, only the second polarizing filter for brightness adjustment may be used. The optical device 252 may be in a _second semi _- orthogonal polarization state with respect to the first polarization filter 253 for brightness adjustment.

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The imaging device 20C for defect inspection, the imaging method for defect inspection, the defect inspection system 10C, and the method for defect inspection according to the modification of the tenth embodiment can also be obtained as the imaging device 20C for defect inspection and the defect inspection method of the tenth embodiment. Using the photographic method, the defect inspection system 10C, and the defect inspection method have the same effect.

[Eleventh Embodiment]

The defect inspection system and defect inspection method according to the eleventh embodiment of the present invention are the defect inspection system and defect inspection method for inspecting the above-mentioned retardation film without polarization characteristics, battery separator films, and the like. In the description of the eleventh embodiment and its modifications, the film 110 is a film that does not have polarizing properties.

The defect inspection system 10D according to the eleventh embodiment of the present invention is the same as the first in the configuration of replacing the defect inspection imaging device 20C in the defect inspection system 10C shown in FIG. 22 with the defect inspection imaging device 20D. The ten embodiments are different. Furthermore, in the imaging device 20D for defect inspection shown in FIG. 27, the first polarizing filter (brightness adjustment means) 251 for brightness adjustment in the imaging device 20C for defect inspection shown in FIG. ₂₆ is replaced with attenuation The configuration of the filter (brightness adjustment means) 26 is different from that of the tenth embodiment. In addition, the imaging device 20D for defect inspection is different from the tenth embodiment in that the intersection angle of the polarization axes (polarization absorption axes) of the pair of first polarizing filters 23 ₁ and 24 ₁ in the imaging device 20C for defect inspection is different. The shape is different.

The first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ form a first semi-orthogonal polarization state. For example, the intersection angle between the polarization axis of the _first polarizing filter 231 and the polarization axis of the _first polarizing filter 241 is greater than 75 degrees and less than 85 degrees, or greater than 95 degrees and less than 105 degrees.

The attenuation filter 26 is disposed between the light source 21 and the second imaging region R2. Therefore, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second photographing region R2.

Next, the defect inspection method and the imaging method for defect inspection according to the eleventh embodiment of the present invention will be described.

First, the _first polarizing filter 231 is placed between the light source 21 and the first photographing region R1 of the film 110, and the _first polarizing filter 241 is placed between the first photographing region R1 of the film 110 and the surface feel between the detectors 22. At this time, the first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ are arranged so that both of them form a first semi-orthogonal polarization state (first polarizing filter arrangement procedure). Next, the attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the brightness value of the light irradiated to the second photographing region R2 can be reduced (brightness adjustment procedure). The attenuation filter 26 can also be disposed between the second photographing area R2 of the film 110 and the surface sensor 22 to reduce the luminance value of the light transmitted through the second photographing area R2.

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing apparatus for defect inspection according to the eleventh embodiment 20D, the photographing method for defect inspection, the defect inspection system 10D, and the defect inspection method can be obtained in the same way as the photographing device 20C for defect inspection, the photographing method for defect inspection, the defect inspection system 10C, and the defect inspection method of the tenth embodiment. effect.

[First modification of the eleventh embodiment]

The eleventh embodiment has been described as an example of the imaging device 20D for defect inspection and the imaging method for defect inspection in which the semi-cross-polarized light transmission method and the normal transmission method are combined, but two or more different semi-cross polarized lights may be combined. Transmission method and forward transmission method. Hereinafter, a description will be given of the imaging device 20D for defect inspection and the imaging method for defect inspection in which two different semi-orthogonally polarized light transmission methods and positive transmission methods are combined as a first modification of the eleventh embodiment.

The imaging device 20D for defect inspection of the first modification shown in FIG. 43 is constructed by adding a pair of second polarizing filters 23 ₂ and 24 ₂ to the imaging device 20D for defect inspection shown in FIG. 27 . It is different from the eleventh embodiment.

Here, the imaging region R further includes a third imaging region R3 divided along the conveying direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.

The second polarizing filter 23 ₂ is arranged between the light source 21 and the third imaging region R3 so as to be adjacent to the first polarizing filter 23 ₁ , and the second polarizing filter 24 ₂ is arranged between the third imaging region R3 and the surface The type sensors 22 are arranged adjacent to the _first polarizing filter 241. A pair of second polarizing filters 23 ₂ and 24 ₂ form a second semi-orthogonal polarization state. Here, the so-called second semi-orthogonal polarization state is different from the first semi-orthogonal polarization state. That is, the intersection angle of the polarization axes of the polarization filters in the second semi-orthogonal polarization state is different from the intersection angle of the polarization axes of the polarization filters in the first semi-orthogonal polarization state.

Next, the defect inspection method and the imaging method for defect inspection of the first modification of the eleventh embodiment will be described.

First, as described above, the first polarizing filter 23 ₁ is arranged between the light source 21 and the first imaging region R1 of the film 110 , and the first polarizing filter 24 ₁ is arranged in the first imaging region R1 of the film 110 between the area sensor 22 . Furthermore, the first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ are arranged so that both of them form a first semi-orthogonal polarization state (first polarizing filter arrangement procedure). Next, the _second polarizing filter 232 is arranged between the light source 21 and the third imaging region R3 of the film 110, and the _second polarizing filter 242 is arranged between the third imaging region R3 of the film 110 and the surface feel between the detectors 22. Furthermore, the second polarizing filter 23 ₂ and the second polarizing filter 24 ₂ are arranged so that both of them form a second semi-orthogonal polarization state (second polarizing filter arrangement procedure). Next, the above-mentioned brightness adjustment process, conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20D for defect inspection, the photographing method for defect inspection, the defect inspection system 10D, and the method for defect inspection according to the first modification of the eleventh embodiment can also be obtained as the photographing device 20C for defect inspection of the tenth embodiment. , The photographic method for defect inspection, the defect inspection system 10C, and the defect inspection method have the same effect.

[Second modification of the eleventh embodiment]

The eleventh embodiment has been described as an example of the imaging device 20D for defect inspection and the imaging method for defect inspection in which the semi-cross-polarized light transmission method and the normal transmission method are combined, but two or more different semi-cross polarized lights may be combined. Transmission method. Hereinafter, a description will be given of the imaging device 20D for defect inspection and the imaging method for defect inspection in which two different semi-cross-polarized light transmission methods are combined as a second modification of the eleventh embodiment.

The imaging device 20D for defect inspection according to the second modification is provided with a pair of polarizing filters for first brightness adjustment in place of the attenuation filter (brightness adjustment means) 26 in the imaging device 20D for defect inspection shown in FIG. 27 . The configuration of the devices (brightness adjusting means) 25 ₁ and 25 ₃ is different from that of the eleventh embodiment.

The first polarizing filter for brightness adjustment (brightness adjustment means) 25 ₁ is arranged between the light source 21 and the second imaging region R2 , and the first polarizing filter 25 ₃ for brightness adjustment is arranged in the second imaging of the film 110 between the area R2 and the area sensor 22 . At this time, the pair of first brightness adjustment polarizing filters 25 ₁ and 25 ₃ are arranged so that both of them form a second semi-orthogonal polarization state. Here, the so-called second semi-orthogonal polarization state is different from the first semi-orthogonal polarization state. That is, the intersection angle of the polarization axes of the polarization filters in the second semi-orthogonal polarization state is different from the intersection angle of the polarization axes of the polarization filters in the first semi-orthogonal polarization state. Therefore, the pair of first brightness adjustment polarizing filters 25 ₁ , 25 ₃ can reduce the brightness value of the light transmitted through the second photographing region R2 .

Next, the defect inspection method and the imaging method for defect inspection of the second modification of the eleventh embodiment will be described.

First, as described above, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the film 110, and the _first polarizing filter 241 is arranged between the first imaging region R1 and the film 110. between the area sensors 22 . At this time, the first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ are arranged so that both of them form a first semi-orthogonal polarization state (first polarizing filter arrangement procedure). Next, the _first polarizing filter 251 for brightness adjustment is arranged between the light source 21 and the second imaging region R2, and the first polarizing filter 253 for brightness adjustment is arranged between the second imaging region R2 _of the film 110 and the second imaging region R2. between the area sensors 22 . At this time, the pair of first brightness adjustment polarizing filters 25 ₁ and 25 ₃ are arranged so that both of them form a second semi-orthogonal polarization state. Thereby, the brightness value of the light transmitted through the second photographing region R2 can be reduced (brightness adjustment procedure). Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20D for defect inspection, the photographing method for defect inspection, the defect inspection system 10D, and the method for inspecting defect according to the second modification of the eleventh embodiment can also be obtained as the photographing device 20C for defect inspection of the tenth embodiment. , The photographic method for defect inspection, the defect inspection system 10C, and the defect inspection method have the same effect.

[Twelfth Embodiment]

The defect inspection system and defect inspection method according to the twelfth embodiment of the present invention are the defect inspection system and defect inspection method for inspecting the above-mentioned retardation film without polarization characteristics, battery separator films, and the like. In the description of the twelfth embodiment and its modifications, the film 110 is a film that does not have polarizing properties.

The defect inspection system 10E according to the twelfth embodiment of the present invention is the same as the first in the configuration of replacing the defect inspection imaging device 20C in the defect inspection system 10C shown in FIG. 22 with the defect inspection imaging device 20E. The ten embodiments are different. In addition, the photographing apparatus 20E for defect inspection shown in FIG. 28 replaces the light source 21 and the first polarizing filter (brightness adjusting means) 25 ₁ for adjusting the brightness in the photographing apparatus 20C for inspecting defects shown in FIG. 26 . On the other hand, the configuration including the light source 21A is different from that of the tenth embodiment. In addition, the imaging device 20E for defect inspection is different from the tenth embodiment in that the intersection angle of the polarization axes (polarization absorption axes) of the pair of first polarizing filters 23 ₁ and 24 ₁ in the imaging device 20C for defect inspection is different. The shape is different.

The first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ form a first semi-orthogonal polarization state. For example, the intersection angle between the polarization axis of the _first polarizing filter 231 and the polarization axis of the _first polarizing filter 241 is greater than 75 degrees and less than 85 degrees, or greater than 95 degrees and less than 105 degrees.

The light source 21A has a brightness adjustment function capable of individually adjusting the brightness value of the light irradiated to the first imaging region R1 and the brightness value of the light irradiated to the second imaging region R2. Therefore, the luminance value of the light irradiated to the first imaging region R1 can be made larger, and the luminance value of the light irradiated to the second imaging region R2 can be made smaller.

Next, the defect inspection method and the imaging method for defect inspection according to the twelfth embodiment of the present invention will be described.

First, the _first polarizing filter 231 is placed between the light source 21 and the first photographing region R1 of the film 110, and the _first polarizing filter 241 is placed between the first photographing region R1 of the film 110 and the surface feel between the detectors 22. Furthermore, the first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ are arranged so that both of them form a first semi-orthogonal polarization state (first polarizing filter arrangement procedure). Next, the luminance value of the light irradiated to the first imaging region R1 and the luminance value of the light irradiated to the second imaging region R2 are individually adjusted by the light source 21A. Thereby, the luminance value of the light irradiated to the first photographing region R1 can be made larger, and the luminance value of the light irradiated to the second photographing region R2 can be made smaller (brightness adjustment procedure).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20E for defect inspection, the photographing method for defect inspection, the defect inspection system 10E, and the method for inspecting defect of the twelfth embodiment can also be obtained from the photographing device 20C for defect inspection and the photographing method for defect inspection of the tenth embodiment. The method, the defect inspection system 10C, and the defect inspection method have the same effects.

[Variation of the twelfth embodiment]

The twelfth embodiment has been described as an example of the imaging device 20E for defect inspection and the imaging method for defect inspection in which the semi-cross-polarized light transmission method and the normal transmission method are combined, but two or more different semi-cross polarized lights may be combined. Transmission method and forward transmission method. Hereinafter, a description will be given of the imaging device 20E for defect inspection and the imaging method for defect inspection in which two different semi-orthogonally polarized light transmission methods and positive transmission methods are combined as a modification of the twelfth embodiment.

The photographing device 20E for defect inspection shown in FIG. 44 is constructed by adding a pair of second polarizing filters 23 ₂ and 24 ₂ to the photographing device 20E for defect inspection shown in FIG. 28 . The shape is different.

Here, the imaging region R further includes a third imaging region R3 divided along the conveying direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.

The second polarizing filter 23 ₂ is arranged between the light source 21 and the third imaging region R3 so as to be adjacent to the first polarizing filter 23 ₁ , and the second polarizing filter 24 ₂ is arranged between the third imaging region R3 and the surface The type sensors 22 are arranged adjacent to the _first polarizing filter 241. A pair of second polarizing filters 23 ₂ and 24 ₂ form a second semi-orthogonal polarization state. Here, the second semi-orthogonal polarization state is different from the first semi-orthogonal polarization state. That is, the intersection angle of the polarization axes of the polarization filters in the second semi-orthogonal polarization state is different from the intersection angle of the polarization axes of the polarization filters in the first semi-orthogonal polarization state.

Next, the defect inspection method and the imaging method for defect inspection according to the modification of the twelfth embodiment will be described.

First, as described above, the first polarizing filter 23 ₁ is arranged between the light source 21 and the first imaging region R1 of the film 110 , and the first polarizing filter 24 ₁ is arranged in the first imaging region R1 of the film 110 between the area sensor 22 . At this time, the first polarizing filter 23 ₁ and the first polarizing filter 24 ₁ are arranged so that both of them form a first semi-orthogonal polarization state (first polarizing filter arrangement procedure). Next, the _second polarizing filter 232 is arranged between the light source 21 and the third imaging region R3 of the film 110, and the _second polarizing filter 242 is arranged between the third imaging region R3 of the film 110 and the surface feel between the detectors 22. At this time, the second polarizing filter 23 ₂ and the second polarizing filter 24 ₂ are arranged so that both of them form a second semi-orthogonal polarization state (second polarizing filter arrangement procedure). Next, the above-mentioned brightness adjustment process, conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

The photographing device 20E for defect inspection, the photographing method for defect inspection, the defect inspection system 10E, and the method for defect inspection according to the modification of the twelfth embodiment can also be obtained as the photographing device 20C for defect inspection, the defect inspection method of the tenth embodiment. The photographic method for inspection, the defect inspection system 10C, and the defect inspection method have the same effect.

The present invention is not limited to the above-described embodiment, and various modifications can be made. For example, the examples shown in the seventh, eighth and ninth embodiments are the imaging devices 20, 20A, 20B for defect inspection and the imaging method for defect inspection using the transmission method, but the features of the present invention are also applicable to the 29th , Figures 30 and 31 show photographing devices 20, 20A, 20B for defect inspection using the reflection method and a photographing method for defect inspection.

Although FIG. 29 shows an example of the imaging device 20 for defect inspection and the imaging method for defect inspection in which the cross-polarized reflection method and the semi-cross-polarized reflection method are combined, it is also possible to combine the cross-polarized reflection as in FIG. 39 method and two or more different semi-orthogonally polarized reflection methods. Although Fig. 30 shows an example of the imaging device 20A for defect inspection and the imaging method for defect inspection combining the semi-orthogonal polarized reflection method and the specular reflection method, it is also possible to combine two or more different imaging methods as in Fig. 40. Semi-orthogonal polarized light reflection method and regular reflection method. Although Fig. 31 shows an example of the imaging device 20B for defect inspection and the imaging method for defect inspection that combine the semi-orthogonal polarized reflection method and the specular reflection method, it is also possible to combine two or more as in Fig. 41 Different semi-orthogonal polarized reflection method and regular reflection method.

According to the photographing apparatuses 20, 20A, 20B for defect inspection and the photographing method for defect inspection shown in Figs. 29, 30 and 31, for example, the _first polarizing filter 231 is placed between the light source (light irradiation means) 21 and the first photographing method. The areas R1 are arranged to form an orthogonal polarization state with the film 110, and the area sensor (photographing means) 22 photographs the photographing area R including the first photographing area R1, the second photographing area R2 and the intermediate photographing area R0 into two Because of the 3D image, the cross-polarized reflection inspection image of the first imaging area R1, the specular reflection (or semi-orthogonally polarized reflection) inspection image of the second imaging area R2, and the reflection scattering inspection of the intermediate imaging area R0 can be captured simultaneously. Use images. That is, the photographic series for cross-polarized reflection inspection, the photographic series for semi-cross-polarized reflection inspection (see Fig. 29), the photographic series for specular reflection inspection (see Figs. 30 and 31), and the photographic series for reflection and scattering inspection can be integrated. Photography series. As a result, in the defect inspection systems 10, 10A, 10B and the defect inspection method, the orthogonal polarization reflection inspection series, the semi-orthogonal polarization reflection inspection series, the specular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced. .

However, the photographic series for cross-polarized light reflection inspection and, for example, the photographic series for specular reflection inspection, have different brightness values of appropriate light. More specifically, the luminance value of the appropriate light in the photographing series for cross-polarization reflection inspection is large, and the luminance value of the appropriate light in the photographing series for specular reflection inspection, for example, is small.

In this regard, according to the imaging devices 20, 20A, 20B for defect inspection and the imaging method for defect inspection shown in Figs. 29, 30 and 31, a polarizing filter (brightness adjustment means) 25 ₁ , an attenuation filter can be used The (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A adjust the brightness value of the light irradiated to the second imaging region R2. Therefore, for example, by outputting light having a large luminance value from the light source (light irradiation means) 21 and the light source (brightness adjusting means) 21A, the irradiation of the photographing series for cross-polarized light reflection inspection can be made to the first photographing region R1 The brightness value of the light is relatively large, and the polarizing filter (brightness adjustment means) 25 ₁ , the attenuation filter (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A are used for the semi-orthogonal polarized light reflection inspection. The luminance value of the light irradiated to the second imaging region R2 in the photographing series (see Fig. 29 ) or the photographing series for specular reflection inspection (see Figs. 30 and 31 ) is small.

Similarly, the examples shown in the tenth, eleventh, and twelfth embodiments are the imaging devices 20C, 20D, 20E for defect inspection using the transmission method and the imaging method for defect inspection, but the features of the present invention are also applicable to As shown in Figs. 32, 33 and 34, photographing apparatuses 20C, 20D, and 20E for defect inspection using a reflection method and a photographing method for defect inspection are shown.

The example shown in FIG. 32 is the imaging device 20 for defect inspection and the imaging method for defect inspection which combine the cross-polarized light reflection method and the semi-cross-polarized light reflection method, but the cross-polarized light reflection method and Two or more different semi-orthogonally polarized reflection methods. In this case, with respect to the third imaging region R3 illustrated in FIG. 42 , the second polarizing filter for brightness adjustment (brightness adjustment means) 25 ₂ is arranged between the light source 21 and the third imaging region R3 so as to be aligned with the third imaging region R3. The first polarizing filter for brightness adjustment 25 ₁ is adjacent to the second polarizing filter for brightness adjustment 25 ₄ , which is paired with the second polarizing filter for brightness adjustment (brightness adjustment means) 25 ₂ on the other hand. What is necessary is just to arrange|position between the 3rd imaging area _R3 and the surface sensor 22 so that it may adjoin the 1st polarizing filter 253 for brightness adjustment.

The example shown in FIG. 33 is the imaging device 20D for defect inspection and the imaging method for defect inspection in which the semi-orthogonal polarized reflection method and the specular reflection method are combined. However, as in FIG. 43, two or more different semi-positive Cross-polarized light reflection method and regular reflection method. In this case, as long as the second polarizing filter 23 ₂ is placed between the light source 21 and the second polarizing filter 23 , as described in the first modification of the eleventh embodiment, with respect to the third imaging region R3 shown in FIG. 43 . The three photographing regions R3 are arranged so as to be adjacent to the first polarizing filter 23 ₁ , and the second polarizing filter 24 ₂ paired with the second polarizing filter 23 ₂ is placed in the third photographing region R3 with the surface sense The detectors 22 may be arranged adjacent to the _first polarizing filter 241, or as explained in the second modification of the eleventh embodiment, the attenuation filter (brightness adjusting means) 26 may be replaced with a The pair of first brightness adjustment polarizing filters (brightness adjustment means) 25 ₁ and 25 ₃ are arranged so as to be in a second semi-orthogonal polarization state. When a pair of polarizing filters (brightness adjustment means) 25 ₁ and 25 ₃ for first brightness adjustment are used, the first polarization filter (brightness adjustment means) 25 ₁ for brightness adjustment is arranged between the light source 21 and the second Between the imaging regions R2, the first polarizing filter 253 for brightness adjustment may be arranged between the second imaging region R2 _of the film 110 and the surface sensor 22.

The example shown in FIG. 34 is the imaging device 20E for defect inspection and the imaging method for defect inspection in which the semi-orthogonal polarized reflection method and the specular reflection method are combined. However, as in FIG. 44, two or more different semi-positive Cross-polarized light reflection method and regular reflection method. In this case, as long as the second polarizing filter 23 ₂ is arranged between the light source 21 and the third photographing area R3 with respect to the third photographing area R3 shown in FIG. 44 so as to be aligned with the first polarizing filter 23 ₁ Adjacent, the second polarizing filter 24 ₂ paired with the second polarizing filter 23 ₂ is arranged between the third photographing region R3 and the surface sensor 22 so as to be adjacent to the first polarizing filter 24 ₁ That's it.

According to the photographing apparatuses 20C, 20D, 20E for defect inspection and the photographing method for defect inspection shown in FIGS. 32, 33 and 34, for example, a pair of first polarizing filters 23 ₁ and 24 ₁ are arranged so as to be The orthogonal polarization states are formed between the irradiation means) 21 and the first photographing area R1 and between the first photographing area R1 and the area sensor (photographing means) 22, and the area sensor (photographing means) 22 will include The first photographing area R1, the second photographing area R2, and the photographing area R of the intermediate photographing area R0 are photographed as two-dimensional images, so the cross-polarized reflection inspection image of the first photographing area R1 and the image of the second photographing area R2 can be photographed at the same time. The image for regular reflection (or semi-orthogonally polarized reflection) inspection, and the image for reflection and scattering inspection of the intermediate imaging area R0. That is, the photographic series for cross-polarized reflection inspection, the photographic series for semi-cross-polarized reflection inspection (see Fig. 32), the photographic series for specular reflection inspection (see Figs. 33 and 34), and the photographic series for reflection and scattering inspection can be integrated. Photography series. As a result, in the defect inspection systems 10C, 10D, 10E and the defect inspection method, the orthogonal polarization reflection inspection series, the semi-orthogonal polarization reflection inspection series, the specular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced. .

Furthermore, according to the photographing apparatuses 20C, 20D, 20E for defect inspection and the photographing method for defect inspection shown in Figs. 32, 33 and 34, a pair of polarizing filters (brightness adjusting means) 25 ₁ for first brightness adjustment can be used. , 25 ₃ , the attenuation filter (brightness adjustment means) 26 and the light source (brightness adjustment means) 21A to adjust the brightness value of the light irradiated to the second photographing region R2. Therefore, for example, by outputting light having a large luminance value from the light source (light irradiation means) 21 and the light source (brightness adjusting means) 21A, the irradiation of the photographing series for cross-polarized light reflection inspection can be made to the first photographing region R1 The brightness value of the light becomes larger, and a pair of first brightness adjustment polarizing filters (brightness adjustment means) 25 ₁ , 25 ₃ , attenuation filter (brightness adjustment means) 26 and light source (brightness adjustment means) are also used. ) 21A to change the luminance value of the light irradiated to the second photographing region R2 used in the photographing series for semi-cross-polarized light reflection inspection (see Fig. 32) or the photographing series for specular reflection inspection (see Figs. 33 and 34). be smaller.

In addition, in the eighth and ninth embodiments and the forms shown in FIGS. 30 and 31, the _first polarizing filter 231 is arranged between the light source (light irradiation means) 21 and the first imaging region R1 of the film 110. However, as shown in Figs. 35, 36, 37 and 38, the _first polarizing filter 231 is arranged in the first photographing region R1 of the film 110 and the area sensor (photographing means) The form between 22.

The example shown in FIG. 35 is the imaging device 20A for defect inspection and the imaging method for defect inspection in which the semi-orthogonal polarized light transmission method and the normal transmission method are combined. However, as in FIG. 40, two or more different semi-positive Cross-polarized light transmission method and positive transmission method, or a combination of two or more different semi-orthogonally-polarized light transmission methods. The example shown in FIG. 36 is the imaging device 20B for defect inspection and the imaging method for defect inspection in which the semi-orthogonal polarized light transmission method and the normal transmission method are combined. Cross-polarized light transmission method and positive transmission method.

The example shown in FIG. 37 is a photographing device 20A for defect inspection and a defect inspection using a combination of the semi-orthogonal polarized reflection method and the specular reflection method. However, as shown in Fig. 40, two or more different semi-orthogonally polarized reflection methods and regular reflection methods may be combined, or two or more different semi-orthogonally polarized reflection methods may be combined. The example shown in FIG. 38 is the imaging device 20B for defect inspection and the imaging method for defect inspection in which the semi-orthogonal polarized reflection method and the specular reflection method are combined. However, as in FIG. 41, two or more different semi-positive Cross-polarized light reflection method and regular reflection method.

In the description so far, in the case where the brightness adjustment means is arranged independently of the light irradiation means, the brightness adjustment means is arranged to adjust the light irradiated to the second imaging region R2 or to transmit through the second imaging region R2 or to adjust the brightness in the second imaging region R2. The brightness of the light reflected from the shooting area R2. However, in the case where the brightness adjustment means is arranged independently of the light irradiation means, the brightness adjustment means may also be arranged to adjust the light irradiated to at least one of the first and second imaging regions R1 and R2 or to transmit the first and second imaging regions R1 and R2. Luminance of light reflected on at least one of the photographing areas R1 and R2 or at least one of the first and second photographing areas R1 and R2. In addition, in the form in which the brightness adjustment means is provided in the light irradiation means, other brightness adjustment means may be provided in addition to the brightness adjustment means arranged in the light irradiation means.

20‧‧‧Photographic device for defect inspection

21‧‧‧Light source (light irradiation means)

22‧‧‧Surface Sensor (Photography)

22a‧‧‧CCD or CMOS

22b‧‧‧Lens

23 ₁ ‧‧‧First polarizing filter

110‧‧‧Film

R‧‧‧shooting area

R0‧‧‧Intermediate shooting area

R1‧‧‧First shooting area

R2‧‧‧Second shooting area

Claims (32)

A photographing device for defect inspection, which is used for inspecting defects of a film having polarizing properties, comprising: light irradiation means for irradiating light to a photographing area of the film; photographing means for photographing the photographing area of the film as a a two-dimensional image; and a first polarizing filter, which is disposed between the light irradiating means and the photographing region of the film in the form of forming a cross-polarization state or a first semi-cross-polarization state with the film, or between the photographing region of the film and the photographing means; the film system is transported in the transport direction relative to the light irradiation means, the photographing means and the first polarizing filter by the transport means, and the photographing means The photographing area to be photographed includes a first photographing area and a second photographing area divided along the conveying direction, and the first polarizing filter is disposed between the light irradiation means and the first photographing area, or the first photographing area. between a photographing area and the aforementioned photographing means. The imaging device for defect inspection according to claim 1, further comprising: brightness adjustment means for adjusting irradiation to at least one of the first imaging area and the second imaging area, or transmitting the At least one of the first photographing area and the second photographing area, or at least one of the first photographing area and the second photographing area The brightness value of the light reflected by a party. The imaging device for defect inspection described in claim 1, further comprising: brightness adjustment means for adjusting the irradiation to the second imaging area, or the transmission of the second imaging area, or the reflection in the second imaging area The brightness value of the light. The imaging device for defect inspection according to claim 3, wherein the brightness adjustment means is disposed between the light irradiation means and the second imaging area, or between the second imaging area and the imaging means the attenuation filter. The imaging device for defect inspection according to claim 2 or 3, wherein the brightness adjustment means is disposed in the light irradiation means, and individually adjusts the brightness value and irradiation of the light irradiated to the first imaging area The brightness value of the light to the aforementioned second shooting area. The imaging device for defect inspection according to claim 1, further comprising: brightness adjustment means for adjusting irradiation to at least one of the first imaging area and the second imaging area, or transmitting the The luminance value of light reflected in at least one of the first photographing area and the second photographing area, or at least one of the first photographing area and the second photographing area. According to the photographic device for defect inspection described in item 6 of the scope of the application, the wherein, the first polarizing filter and the first photographing region of the film form an orthogonal polarization state, and the brightness adjusting means includes a first polarizing filter for adjusting brightness, and the first polarizing filter for adjusting brightness The optical device is arranged between the light irradiation means and the second imaging region, or between the second imaging region and the imaging means, so as to form a first semi-orthogonal polarization state with the second imaging region of the film. The photographing device for defect inspection according to claim 6, wherein the first polarizing filter and the first photographing region of the film form a first semi-orthogonal polarization state, and the brightness adjusting means is arranged An attenuation filter between the light irradiation means and the second photographing area, or between the second photographing area and the photographing means. The photographing device for defect inspection according to claim 6, wherein the first polarizing filter and the first photographing region of the film form a first semi-orthogonal polarization state, and the brightness adjusting means is arranged In the light irradiation means, the brightness value of the light irradiated to the first shooting area and the brightness value of the light irradiated to the second shooting area are individually adjusted. The photographing device for defect inspection as described in item 7 of the scope of the application, wherein, The photographing area includes a third photographing area divided along the conveying direction, and the brightness adjustment means includes a second brightness adjustment polarizing filter, and the second brightness adjustment polarizing filter is connected to the light irradiation means. It is arranged between the third photographing area, or between the third photographing area and the photographing means so as to form a second semi-orthogonal polarization state with the third photographing area of the film, and adjust the irradiation to the third photographing area The brightness value of the light. The imaging device for defect inspection according to claim 8 or 9, wherein the imaging area includes a third imaging area divided along the conveying direction, and the imaging device for defect inspection further includes: a second polarized light The filter is arranged between the light irradiation means and the third photographing area, or between the third photographing area and the photographing means, and forms a second semi-orthogonal polarization state with the third photographing area of the film . The photographing device for defect inspection according to claim 6, wherein the first polarizing filter and the first photographing region of the film form a first semi-orthogonal polarization state, and the brightness adjusting means includes: There is a first polarizing filter for brightness adjustment, and the first polarizing filter for brightness adjustment is arranged between the light irradiation means and the second photographing area, or between the second photographing area and the photographing means. The aforementioned second capture area with the aforementioned film The domains form a second semi-orthogonal polarization state. A photographing apparatus for defect inspection is a photographing apparatus for inspecting defects of a film having no polarization property, comprising: light irradiation means for irradiating light to a photographing area of the film; photographing means for photographing the film of the film The area is photographed into a two-dimensional image; and a pair of first polarizing filters, in the form of forming a crossed polarization state or a first semi-crossed polarization state, are respectively disposed between the light irradiation means and the photographing area of the film. and between the photographing region of the film and the photographing means; the film is transported in the transport direction relative to the light irradiation means, the photographing means and the pair of first polarizing filters by the transport means. The photographing area photographed by the photographing means includes a first photographing area and a second photographing area divided along the conveying direction, and the pair of first polarizing filters are respectively arranged on the light irradiating means and the second photographing area. between a photographing area, and between the first photographing area and the photographing means. The imaging device for defect inspection according to claim 13, further comprising: brightness adjustment means for adjusting irradiation to at least one of the first imaging area and the second imaging area, or transmitting the At least one of the first photographing area and the second photographing area, or at least one of the first photographing area and the second photographing area The brightness value of the light reflected by a party. The photographing device for defect inspection according to claim 13, further comprising: brightness adjustment means for adjusting irradiation to the second photographing area, or transmitting through the second photographing area, or reflecting in the second photographing area The brightness value of the light. The imaging device for defect inspection according to claim 15, wherein the brightness adjustment means is disposed between the light irradiation means and the second imaging area, or between the second imaging area and the imaging means the attenuation filter. The photographing device for defect inspection according to claim 14 or 15, wherein the brightness adjustment means is disposed in the light irradiation means, and the brightness value and irradiation of the light irradiated to the first imaging area are individually adjusted. The brightness value of the light to the aforementioned second shooting area. The imaging device for defect inspection according to claim 13, further comprising: brightness adjustment means for adjusting irradiation to at least one of the first imaging area and the second imaging area, or transmitting the The luminance value of light reflected in at least one of the first photographing area and the second photographing area, or at least one of the first photographing area and the second photographing area. According to the photographic device for defect inspection described in Item 18 of the scope of the patent application, Wherein, the pair of first polarizing filters form a cross-polarized state, the brightness adjusting means includes a pair of first polarizing filters for brightness adjusting, and the pair of first polarizing filters for adjusting brightness is The form in which the first semi-orthogonal polarization state is formed is arranged between the light irradiation means and the second photographing area, and between the second photographing area and the photographing means. The photographing device for defect inspection according to claim 18, wherein the pair of first polarizing filters forms a first semi-cross-polarized state, and the brightness adjusting means is disposed between the light irradiation means and the An attenuation filter between the second shooting area, or between the second shooting area and the shooting means. The photographing device for defect inspection according to claim 18, wherein the pair of first polarizing filters forms a first semi-cross-polarized state, the brightness adjusting means is disposed on the light irradiation means, and The brightness value of the light irradiated to the first shooting area and the brightness value of the light irradiated to the second shooting area are individually adjusted. The imaging device for defect inspection according to claim 19, wherein the imaging area includes a first segment divided along the conveying direction. Three photographing areas, the brightness adjustment means includes a pair of second polarization filters for brightness adjustment, and the pair of second polarization filters for brightness adjustment are in the form of forming a second semi-orthogonal polarization state, and are arranged on the aforesaid Between the light irradiation means and the third photographing area, and between the third photographing area and the photographing means, the brightness value of the light irradiated to the third photographing area is adjusted. The imaging device for defect inspection according to claim 20 or 21, wherein the imaging area includes a third imaging area divided along the conveyance direction, and the imaging device for defect inspection further includes: a pair of first imaging areas. Two polarizing filters are respectively disposed between the light irradiation means and the third photographing area and between the third photographing area and the photographing means in the form of forming a second semi-orthogonal polarization state. The photographing device for defect inspection according to claim 18, wherein the pair of first polarizing filters forms a first semi-cross polarized state, and the brightness adjusting means includes a pair of first brightness adjusting A polarizing filter, the pair of first polarizing filters for brightness adjustment are in the form of forming a second semi-orthogonal polarization state, and are arranged between the light irradiating means and the second photographing area, and the second photographing area between the area and the aforementioned photographic means. A defect inspection system comprising: the imaging device for defect inspection described in any one of claims 1 to 24; image to check for defects present in the aforementioned films. A film manufacturing apparatus including: the defect inspection system described in claim 25 of the scope of application. A photographing method for defect inspection, which uses a photographing device for defect inspection including light irradiation means, photographing means and a first polarizing filter to perform photographing required for inspecting defects of a film having polarizing properties, comprising: : A first polarizing filter arrangement procedure, in which the first polarizing filter is arranged in the form of a cross-polarized light state or a first semi-cross-polarized light state with the film in the photographing of the light irradiation means and the film between areas, or between the photographing area of the film and the photographing means; the conveying process is to use the conveying means to face the film with respect to the light irradiation means, the photographing means and the first polarizing filter in the conveying direction a light irradiation process that uses the light irradiation means to irradiate light to the photographing area of the film; and a photographing process that uses the photographing means to photograph the photographing area of the film into a two-dimensional image, which is captured by the photographing means The aforementioned shooting area for shooting includes the The first photographing area and the second photographing area divided by the conveying direction, in the first polarizing filter arrangement procedure, the first polarizing filter is arranged between the light irradiation means and the first photographing area. time, or between the aforementioned first shooting area and the aforementioned shooting means. The photographing method for defect inspection described in claim 27, further comprising: a brightness adjustment program for adjusting at least one of the first photographing area and the second photographing area by using a brightness adjusting means, or The luminance value of light that transmits at least one of the first photographing area and the second photographing area or that is reflected in at least one of the first photographing area and the second photographing area. A photographing method for defect inspection, which uses a photographing device for defect inspection including light irradiation means, photographing means, and a pair of first polarizing filters to perform photographing required for photographing defects of films that do not have polarizing properties The method includes: a first polarizing filter arranging procedure, in which the pair of first polarizing filters are respectively arranged on the light irradiating means and the said light irradiating means in the form of forming an orthogonal polarization state or a first semi-orthogonal polarization state. between the photographing areas of the film, and between the photographing area of the film and the photographing means; the conveying process is to use the conveying means to move the film relative to the light irradiation means, the photographing means and the pair of first polarizing filters The machine is relatively conveyed in the conveying direction; the light irradiation process uses the light irradiation means to irradiate light to the film and a photographing program, wherein the photographing area of the film is photographed into a two-dimensional image by the photographing means, and the photographing area photographed by the photographing means includes the first photographing area divided along the conveying direction and the In the second photographing area, in the first polarizing filter arrangement procedure, the pair of first polarizing filters are respectively arranged between the light irradiating means and the first photographing area, as well as the first photographing area and the aforementioned photographic means. The photographing method for defect inspection described in claim 29, further comprising: a brightness adjustment program for adjusting at least one of the first photographing area and the second photographing area by using a brightness adjusting means, or The luminance value of light that transmits at least one of the first photographing area and the second photographing area or that is reflected in at least one of the first photographing area and the second photographing area. A defect inspection method, comprising the photographic method for defect inspection described in any one of the claims 27 to 30 of the scope of the application, and a defect detection program, the defect detection program is based on the use of the aforementioned photographic method for defect inspection. The obtained two-dimensional images are used to inspect the defects existing in the films. A method for manufacturing a film, comprising: the defect inspection method described in item 31 of the scope of application.

Images