CN206583816U - Defect inspection filming apparatus, defect inspecting system and film manufacturing device - Google Patents

Abstract

The utility model provides a defect inspection imaging device, a defect inspection system and a film manufacturing device, which can integrate different inspection series and reduce the number of inspection series. An imaging device for defect inspection according to an embodiment of the present invention is used for inspecting defects of a film having polarization characteristics, and includes: a light irradiation mechanism that irradiates light to an imaging region of the film; The area is photographed as a two-dimensional image; the first polarizing filter is arranged between the light irradiation mechanism and the imaging area of the film so as to form an orthogonal polarization state with the film; the transport mechanism is relatively opposite to the light irradiation mechanism and the imaging mechanism and the polarizing filter relatively conveys the film along the conveying direction Y, the photographing area includes a first photographing region and a second photographing region divided in the conveying direction, and the first polarizing filter is disposed between the light irradiation mechanism and the first photographing region .

Description

Imaging device for defect inspection, defect inspection system, and film manufacturing device

technical field

The utility model relates to a defect inspection imaging device, a defect inspection system, and a film manufacturing device for inspecting defects of a film.

Background technique

A defect inspection system is known that detects defects in optical films such as polarizing films and retardation films, films used in battery separators, and the like. Such a defect inspection system uses a transport mechanism to transport the film, uses a light irradiation mechanism to irradiate light to an imaging area of the film, and uses an imaging mechanism to image the imaging area of the film, and performs defect inspection based on the captured image. The types of defect inspection methods performed by such a defect inspection system are roughly classified into transmission methods and reflection methods. More specifically, the transmission method includes a normal transmission method, a crossed-nicol transmission method, and a transmission-scattering method, and the reflection method includes a regular reflection method, a crossed-nicol reflection method, and a reflection-scattering method. Patent Document 1 discloses a defect inspection system using a normal transmission method and a transmission scattering method as a transmission method, and discloses a defect inspection system using a regular reflection method and a reflection scattering method as a reflection method. Document 2 discloses a defect inspection system using an orthogonally polarized transmission method as a transmission method.

For example, the normal transmission method is suitable for detecting black foreign matter caused by mixing and adhesion in the film bonding process, the orthogonal polarized transmission method is suitable for detecting bright spots caused by mixing and adhesion in the adhesive coating process, and the transmission scattering method Suitable for detection of deformation due to scratch transfer due to attached foreign matter in the film transfer process. On the other hand, reflection methods (regular reflection method, cross-polarization reflection method, reflection scattering method) are suitable for detecting air bubbles caused by biting in the bonding process.

prior art literature

patent documents

Patent Document 1: Japanese Patent Laid-Open No. 2012-167975

Patent Document 2: Japanese Patent Laid-Open No. 2007-212442

In order to detect different multiple defects such as black foreign matter, bright spots, deformation, and bubbles, it is considered to use different multiple inspection methods (inspection series). However, if the number of inspection series increases, input costs and management costs will increase, so it is desirable to reduce the number of inspection series.

Utility model content

Problems to be solved by utility models

Therefore, an object of the present invention is to provide an imaging device for defect inspection, a defect inspection system, and a film manufacturing device that can integrate different inspection series and reduce the number of inspection series.

means to solve the problem

The imaging device for defect inspection of the present invention is used for inspecting defects of films with polarization characteristics, wherein the imaging device for defect inspection includes: a light irradiation mechanism that irradiates light to the imaging area of the film; The shooting area of the film is captured as a two-dimensional image; the first polarizing filter is disposed between the light irradiation mechanism and the shooting area of the film in such a manner as to form an orthogonal polarization state or a first non-orthogonal polarization state with the film, or Between the photographing region of the film and the photographing mechanism; and the conveying mechanism, which relatively conveys the film along the conveying direction with respect to the light irradiation mechanism, the photographing mechanism and the first polarizing filter, the photographing region includes the first segment divided in the conveying direction In the shooting area and the second shooting area, the first polarizing filter is arranged between the light irradiation mechanism and the first shooting area, or between the first shooting area and the shooting mechanism.

In addition, the imaging method for defect inspection of the present invention uses an imaging device for defect inspection equipped with a light irradiation mechanism, an imaging mechanism, a first polarizing filter, and a conveying mechanism to perform imaging for inspecting a defect of a film having a polarization characteristic, wherein , the imaging method for defect inspection includes the following steps: a first polarizing filter disposing step, disposing the first polarizing filter on the light irradiation mechanism in such a way as to form an orthogonal polarization state or a first non-orthogonal polarization state with the film Between the photographing area of the film, or between the photographing area of the film and the photographing mechanism; the conveying process, using the conveying mechanism to relatively convey the film along the conveying direction relative to the light irradiation mechanism, the photographing mechanism and the first polarizing filter; the light irradiation process , using the light irradiation mechanism to irradiate light to the photographing area of the film; In the first polarizing filter arranging step, the first polarizing filter is arranged between the light irradiation unit and the first imaging area, or between the first imaging area and the imaging unit.

Here, the orthogonal polarization state refers to a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are substantially orthogonal, that is, the polarization axis (polarization absorption axis) of the polarization filter axis) crosses the polarization axis (polarization absorption axis) of the film at an angle of substantially 90 degrees. On the other hand, the non-orthogonal polarization (Japanese: ハフクロスニコル) state means that the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are not substantially orthogonal but cross. The state, that is, the state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film intersect at an angle substantially other than 90 degrees.

According to the imaging device for defect inspection and the imaging method for defect inspection, for example, since the first polarizing filter is disposed between the light irradiation mechanism and the first imaging area in such a manner as to form a polarization state orthogonal to the film, or the first imaging Between the area and the imaging mechanism, the imaging mechanism captures the imaging area including the first imaging area and the second imaging area as a two-dimensional image, so the orthogonally polarized transmission inspection image (or orthogonally polarized image for reflection inspection), for example, an image for normal transmission inspection (or image for regular reflection inspection) of the second imaging region. That is, it is possible to integrate the imaging series for cross-polarized transmission inspection (or the imaging series for orthogonal polarization reflection inspection) and, for example, the imaging series for normal transmission inspection (or the imaging series for regular reflection inspection). As a result, the cross-polarized transmission inspection series (or the cross-polarized reflection inspection series) can be integrated with, for example, the normal transmission inspection series (or the regular reflection inspection series), thereby reducing the number of inspection series.

In addition to the imaging device for defect inspection described above, the first polarizing filter may be disposed between the light irradiation means and the first imaging area. In addition, in addition to the imaging method for defect inspection described above, in the first polarization filter arranging step, the first polarization filter may be arranged between the light irradiation means and the first imaging area.

However, appropriate light brightness values differ between the imaging series for cross-polarization transmission inspection (or imaging series for orthogonal polarization reflection inspection) and, for example, the imaging series for normal transmission inspection (or imaging series for regular reflection inspection).

Therefore, the imaging device for defect inspection described above may further include a brightness adjustment mechanism that adjusts the light irradiated to at least one of the first imaging area and the second imaging area, or the light transmitted through the first imaging area. At least one of the area and the second shooting area or the brightness value of light reflected by at least one of the first shooting area and the second shooting area.

In this way, the brightness adjustment mechanism can be used to adjust the light irradiated to at least one of the first imaging area and the second imaging area, or the light that passes through at least one of the first imaging area and the second imaging area or is received by the first imaging area and the second imaging area. The luminance value of at least one incident light in the second photographing area, therefore, can set the appropriate light luminance value in the photographing of the first photographing area and the second photographing area, and can be used with the photographing series for orthogonal polarization transmission inspection (or Orthogonal polarized reflection inspection imaging series) and, for example, the normal transmission inspection imaging series (or regular reflection inspection imaging series) corresponding light brightness values are inspected.

It may also be that the above-mentioned brightness adjustment mechanism adjusts the brightness value of the light irradiated to the second shooting area, or the light passing through the second shooting area or reflected by the second shooting area.

Sometimes the brightness value of the appropriate light of the imaging series for cross-polarized transmission inspection (or the imaging series for orthogonal polarization reflection inspection) is relatively large, and the brightness value of the appropriate light for the imaging series of normal transmission inspection (or the imaging series for regular reflection inspection) Brightness values are smaller. In this case, as described above, the brightness adjustment mechanism is used to adjust the brightness value of the light irradiated to the second shooting area, or the light passing through the second shooting area or reflected by the second shooting area, for example, from The light irradiation mechanism outputs light with a large luminance value, so that the luminance value of the light irradiated toward the first imaging region for the orthogonally polarized transmission inspection imaging series (or the orthogonal polarization reflection inspection imaging series) can be increased. On the other hand, the brightness adjustment mechanism can be used to make the light irradiated to the second imaging area for performing the imaging series for regular transmission inspection (or the imaging series for regular reflection inspection) either pass through the second imaging area or be captured by the second imaging area. The brightness value of light reflected from the shooting area is small.

In addition, the above-mentioned brightness adjustment mechanism may be an attenuation filter arranged between the light irradiation mechanism and the second imaging area, or between the second imaging area and the imaging means.

In addition, the above-mentioned brightness adjustment mechanism may be arranged in the light irradiation mechanism to separately adjust the brightness value of the light irradiated to the first imaging area and the brightness value of the light irradiated to the second imaging area.

On the basis of the above-mentioned imaging device for defect inspection, it is also possible that the first polarizing filter and the first imaging area of the film form an orthogonal polarization state, and the brightness adjustment mechanism includes a first polarization filter for brightness adjustment. The polarization filter for brightness adjustment is arranged between the light irradiation means and the second imaging area, or between the second imaging area and the imaging means so as to form a first non-orthogonal polarization state with the second imaging area of the film.

Here, the inventors of the present application found that the normal transmission method is suitable for the detection of black foreign matter, and the orthogonal polarization transmission method is suitable for the detection of bright spots, but the orthogonal polarization transmission method is difficult to detect weak bright spots compared with stronger bright spots . In this regard, the inventors of the present application discovered that the non-orthogonal transmission method is used to detect black foreign matter and weak bright spots that are difficult to detect by the orthogonal polarization transmission method.

In this regard, according to this imaging device for defect inspection, since the first polarizing filter for brightness adjustment (brightness adjustment mechanism) and the second imaging region of the film form the first non-orthogonal polarization state, it is possible to improve black foreign matter and the above-mentioned slight damage. Detection of weak bright spots.

In addition, on the basis of the imaging device for defect inspection described above, it is also possible that the first polarizing filter and the first imaging region of the film form a first non-orthogonal polarization state, and the brightness adjustment mechanism is arranged between the light irradiation mechanism and the first imaging region. An attenuation filter between two shooting areas, or between the second shooting area and a shooting mechanism.

According to this imaging device for defect inspection, since the first polarizing filter and the first imaging region of the film form the first non-orthogonal polarization state, it is possible to improve the detection of black foreign matter and the aforementioned slightly weak bright spots.

In addition, on the basis of the above-mentioned imaging device for defect inspection, it is also possible that the first polarizing filter and the first imaging area of the film form a first non-orthogonal polarization state, and the brightness adjustment mechanism is arranged in the light irradiation mechanism to adjust the brightness separately. The luminance value of the light irradiated on the first shooting area and the luminance value of the light irradiating on the second shooting area.

In this imaging device for defect inspection, since the first polarizing filter and the first imaging region of the film form a first non-orthogonal polarization state, it is also possible to improve the detection of black foreign matter and the aforementioned slightly weak bright spots.

In addition, on the basis of the imaging device for defect inspection described above, the imaging area may include a third imaging area divided in the conveying direction, the brightness adjustment mechanism may include a second polarization filter for brightness adjustment, and adjust the irradiation to The luminance value of the light in the third shot area, the second brightness adjustment polarizing filter is arranged between the light irradiation mechanism and the third shot area in such a manner as to form a second non-orthogonal polarization state with the third shot area of the film , or between the third shooting area and the shooting agency.

According to this imaging device for defect inspection, since the first non-orthogonal polarization state is formed between the first polarization filter for brightness adjustment (brightness adjustment mechanism) and the second imaging region of the film, the second polarization filter for brightness adjustment (brightness adjustment mechanism) ) forms a second non-orthogonal polarization state with the third shot region of the film, thus enabling improved detection of black foreign matter and the aforementioned slightly weaker bright spots.

In addition, in the imaging device for defect inspection described above, the imaging area may include a third imaging area divided in the conveying direction, and the imaging device for defect inspection may further include a second polarizing filter. The polarizing filter is disposed between the light irradiation unit and the third photographing area, or between the third photographing area and the photographing unit, and forms a second non-orthogonal polarization state with the third photographing area of the film.

According to this imaging device for defect inspection, since the first polarizing filter forms a first non-orthogonal polarization state with the first imaging area of the film, the second polarization filter forms a second non-orthogonal polarization state with the third imaging area of the film. , thus enabling improved detection of black foreign matter as well as the aforementioned slightly weaker bright spots.

In addition, on the basis of the imaging device for defect inspection described above, it is also possible that the first polarizing filter and the first imaging area of the film form a first non-orthogonal polarization state, and the brightness adjustment mechanism includes a first polarization filter for brightness adjustment. The first polarizing filter for brightness adjustment is disposed between the light irradiation mechanism and the second shooting area, or between the second shooting area and the shooting area in such a manner that it forms a second non-orthogonal polarization state with the second shooting area of the film. between agencies.

According to this imaging device for defect inspection, since the first polarizing filter and the first imaging area of the film form the first non-orthogonal polarization state, the first polarization filter for brightness adjustment (brightness adjustment mechanism) and the second imaging area of the film A second non-orthogonal polarization state is formed, thus enabling improved detection of black foreign matter as well as the aforementioned slightly weaker bright spots.

Another imaging device for defect inspection of the present invention is used for inspecting defects of films that do not have polarization characteristics, wherein the imaging device for defect inspection includes: a light irradiation mechanism that irradiates light to an imaging area of the film; an imaging mechanism that It captures the shooting area of the film as a two-dimensional image; a pair of first polarizing filters are respectively arranged between the light irradiation mechanism and the shooting area of the film in a manner of forming an orthogonal polarization state or a first non-orthogonal polarization state Between, and between the photographing area of film and photographing mechanism; For the divided first shooting area and the second shooting area, a pair of first polarizing filters are arranged between the light irradiation mechanism and the first shooting area, and between the first shooting area and the shooting mechanism.

Another imaging method for defect inspection of the present invention uses an imaging device for defect inspection equipped with a light irradiation mechanism, an imaging mechanism, a pair of first polarizing filters, and a transport mechanism for inspecting defects of films that do not have polarization characteristics. photographing, wherein the photographing method for defect inspection includes the following steps: a first polarizing filter disposing step, a pair of first polarizing filters are respectively arranged in an orthogonal polarization state or a first non-orthogonal polarization state Between the light irradiation mechanism and the photographing region of the film, and between the photographing region of the film and the photographing mechanism; the conveying process uses the conveying mechanism to relatively transport the light irradiation mechanism, the photographing mechanism and a pair of first polarizing filters along the conveying direction film; a light irradiation process of irradiating light to an imaging area of the film by a light irradiation mechanism; and an imaging process of imaging the imaging area of the film as a two-dimensional image by an imaging mechanism, the imaging area including the first imaging area divided in the conveying direction For the region and the second photographing region, in the first polarizing filter arranging step, a pair of first polarizing filters are respectively disposed between the light irradiation unit and the first photographing region, and between the first photographing region and the photographing unit.

According to this other imaging device for defect inspection and imaging method for defect inspection, for example, since a pair of first polarization filters are arranged between the light irradiation mechanism and the first imaging area in such a manner as to form orthogonal polarization states, and Between the first photographing area and the photographing mechanism, the photographing mechanism photographs the photographing area including the first photographing area and the second photographing area as a two-dimensional image, so the orthogonally polarized transmission inspection image of the first photographing area (or Orthogonal polarized reflection inspection image), for example, a normal transmission inspection image (or regular reflection inspection image) of the second imaging area. That is, it is possible to integrate an imaging series for cross-polarization transmission inspection (or an imaging series for orthogonal polarization reflection inspection) and, for example, an imaging series for normal transmission inspection (or an imaging series for regular reflection inspection). As a result, the cross-polarization transmission inspection series (or the cross-polarization reflection inspection series) and, for example, the normal transmission inspection series (or the regular reflection inspection series) can be integrated, thereby reducing the number of inspection series.

However, as described above, in the imaging series for cross-polarized transmission inspection (or the imaging series for orthogonal polarization reflection inspection) and, for example, the imaging series for normal transmission inspection (or the imaging series for regular reflection inspection), the brightness of appropriate light The values are different.

Therefore, it is also possible to adopt an aspect in which the above-mentioned another imaging device for defect inspection further includes a brightness adjustment mechanism that adjusts the light irradiated to at least one of the first imaging area and the second imaging area, or the light transmitted through the first imaging area. At least one of the first shooting area and the second shooting area or a brightness value of light reflected by at least one of the first shooting area and the second shooting area.

In this way, the brightness adjustment mechanism can be used to adjust the light irradiated to at least one of the first imaging area and the second imaging area, or the light that passes through at least one of the first imaging area and the second imaging area or is received by the first imaging area and the second imaging area. The luminance value of at least one incident light in the second photographing area, therefore, can set the appropriate light luminance value in the photographing of the first photographing area and the second photographing area, and can be used with the photographing series for orthogonal polarization transmission inspection (or Orthogonal polarized reflection inspection imaging series) and, for example, the normal transmission inspection imaging series (or regular reflection inspection imaging series) corresponding light brightness values are inspected.

It may also be that the above-mentioned brightness adjustment mechanism adjusts the brightness value of the light irradiated to the second shooting area, or the light passing through the second shooting area or reflected by the second shooting area.

As mentioned above, sometimes the luminance value of appropriate light in the imaging series for orthogonally polarized transmission inspection (or the imaging series for orthogonally polarized reflection inspection) is large, and the imaging series for normal transmission inspection (or imaging series for regular reflection inspection) Proper light has a smaller brightness value. In this case, as described above, the brightness adjustment mechanism is used to adjust the brightness value of the light irradiated to the second shooting area, or the light passing through the second shooting area or reflected by the second shooting area, for example, from The light irradiation mechanism outputs light with a large luminance value, so that the luminance value of the light irradiated toward the first imaging region for the orthogonally polarized transmission inspection imaging series (or the orthogonal polarization reflection inspection imaging series) can be increased. On the other hand, the brightness adjustment mechanism can be used to make the light irradiated to the second imaging area for performing the imaging series for regular transmission inspection (or the imaging series for regular reflection inspection) either pass through the second imaging area or be captured by the second imaging area. The brightness value of light reflected from the shooting area is small.

In addition, the above-mentioned brightness adjustment mechanism may be an attenuation filter arranged between the light irradiation mechanism and the second imaging area, or between the second imaging area and the imaging means.

In addition, the above-mentioned brightness adjustment mechanism may be arranged in the light irradiation mechanism to separately adjust the brightness value of the light irradiated to the first imaging area and the brightness value of the light irradiated to the second imaging area.

On the basis of another imaging device for defect inspection described above, the following method can also be adopted, a pair of first polarization filters form an orthogonal polarization state, and the brightness adjustment mechanism includes a pair of polarization filters for first brightness adjustment. The polarization filter for first brightness adjustment is disposed between the light irradiation means and the second imaging area, and between the second imaging area and the imaging means so as to form a first non-orthogonal polarization state.

According to this other imaging device for defect inspection, since the pair of first polarization filters for brightness adjustment (brightness adjustment mechanism) form the first non-orthogonal polarization state, detection of black foreign matter and the aforementioned slightly weak bright spots can be improved.

In addition, on the basis of another imaging device for defect inspection described above, the following method can also be adopted, a pair of first polarization filters form a first non-orthogonal polarization state, and the brightness adjustment mechanism is arranged between the light irradiation mechanism and the second An attenuation filter between capture areas, or between a second capture area and a capture mechanism.

According to this other imaging device for defect inspection, since the pair of first polarizing filters and the first imaging area of the film form the first non-orthogonal polarization state, it is possible to improve the detection of black foreign matter and the above-mentioned slightly weak bright spots.

In addition, on the basis of another photographing device for defect inspection described above, the following method can also be adopted: a pair of first polarizing filters form a first non-orthogonal polarization state, the brightness adjustment mechanism is arranged in the light irradiation mechanism, and the orientation can be adjusted separately. The luminance value of the light irradiated on the first shooting area and the luminance value of the light irradiating on the second shooting area.

In this other imaging device for defect inspection, since the pair of first polarization filters form the first non-orthogonal polarization state, it is possible to improve the detection of black foreign matter and the above-mentioned slightly weak bright spots.

In addition, on the basis of another photographing device for defect inspection described above, the following method can also be adopted, the photographing area includes a third photographing area divided in the conveying direction, and the brightness adjustment mechanism includes a pair of second polarizers for brightness adjustment. a filter for adjusting the brightness value of the light irradiated to the third shooting area, and the pair of polarizing filters for second brightness adjustment are disposed between the light irradiation mechanism and the third shooting area in such a manner as to form a second non-orthogonal polarization state between, and between the third shooting area and the shooting agency.

According to this other imaging device for defect inspection, since a pair of first polarization filters for brightness adjustment (brightness adjustment mechanism) and the second imaging region of the film form a first non-orthogonal polarization state, a pair of polarization filters for second brightness adjustment The filter (brightness adjustment mechanism) forms a second non-orthogonal polarization state with the third shot area of the film, thus enabling improved detection of black foreign matter as well as the aforementioned slightly weaker bright spots.

In addition, on the basis of the above-mentioned another photographing device for defect inspection, the following method may also be adopted. The photographing area includes a third photographing area divided in the conveying direction, and the photographing device for defect inspection is further equipped with a pair of second polarizers. Filters, the pair of second polarizing filters are configured to form a second non-orthogonal polarization state, respectively arranged between the light irradiation unit and the third photographing area, and between the third photographing area and the photographing unit.

According to this other imaging device for defect inspection, since a pair of first polarizing filters forms a first non-orthogonal polarization state and a pair of second polarization filters forms a second non-orthogonal polarization state, it is possible to improve black foreign matter and the above-mentioned defects. Detection of slightly weaker bright spots.

In addition, on the basis of another photographing device for defect inspection described above, the following method may also be adopted, a pair of first polarization filters form a first non-orthogonal polarization state, and the brightness adjustment mechanism includes a pair of polarizers for first brightness adjustment. The filter, the pair of first polarization filters for brightness adjustment, is disposed between the light irradiation means and the second imaging area, and between the second imaging area and the imaging means so as to form a second non-orthogonal polarization state.

According to this other imaging device for defect inspection, since the pair of first polarization filters form the first non-orthogonal polarization state, and the pair of first brightness adjustment filters (brightness adjustment mechanism) form the second non-orthogonal polarization state, It is thus possible to improve the detection of black foreign matter as well as the aforementioned slightly weaker bright spots.

The defect inspection system of the present invention includes: the above-mentioned imaging device for defect inspection or another imaging device for defect inspection; The image is used to detect the defects existing in the film. In addition, the defect inspection method of the present invention includes the above-mentioned photographing method for defect inspection or another photographing method for defect inspection. The defect inspection method includes a defect detection process. Another defect inspection uses a two-dimensional image captured by an imaging method to detect defects existing in the film.

The film manufacturing apparatus of this invention is equipped with the said defect inspection system. In addition, the film manufacturing method of the present invention includes the above-mentioned defect inspection method.

Utility Model Effect

According to the present invention, different inspection series can be integrated in film defect inspection, thereby reducing the number of inspection series.

Description of drawings

Fig. 1 is a diagram showing a film manufacturing apparatus and a manufacturing method according to an embodiment of the present invention.

Fig. 2 is a diagram illustrating a defect inspection system and a defect inspection method according to an embodiment of the present invention.

Fig. 3 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to the first embodiment of the present invention.

Fig. 4 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to a second embodiment of the present invention.

Fig. 5 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to a third embodiment of the present invention.

Fig. 6 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to a fourth embodiment of the present invention.

Fig. 7 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to a fifth embodiment of the present invention.

And a picture of the shooting method for defect inspection.

Fig. 8 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to a sixth embodiment of the present invention.

Fig. 9 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 10 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 11 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 12 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 13 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 14 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 15 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 16 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 17 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 18 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 19 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 20 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

(a) to (c) of Fig. 21 are diagrams showing verification results of the imaging device for defect inspection and the imaging method for defect inspection according to the second embodiment.

Fig. 22 is a diagram showing a defect inspection system and a defect inspection method according to the embodiment of the present invention.

Fig. 23 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to a seventh embodiment of the present invention.

Fig. 24 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to an eighth embodiment of the present invention.

Fig. 25 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to a ninth embodiment of the present invention.

Fig. 26 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to a tenth embodiment of the present invention.

Fig. 27 is a diagram illustrating an imaging device for defect inspection and an imaging method for defect inspection according to an eleventh embodiment of the present invention.

Fig. 28 is a diagram showing a defect inspection imaging device and a defect inspection imaging method according to a twelfth embodiment of the present invention.

Fig. 29 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 30 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 31 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 32 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 33 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 34 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 35 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 36 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 37 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 38 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 39 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 40 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 41 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 42 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 43 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

Fig. 44 is a diagram of an imaging device for defect inspection and an imaging method for defect inspection according to a modified example of the present invention.

(a) to (d) of Fig. 45 are diagrams showing verification results of the imaging device for defect inspection and the imaging method for defect inspection according to the seventh embodiment.

Explanation of reference signs

10, 10A, 10B, 10C, 10D, 10E... defect inspection system; 20, 20A, 20B, 20C, 20D, 20E... imaging device for defect inspection; 21... light source (light irradiation mechanism); 21A ... light source (brightness adjustment mechanism); 22...area sensor (shooting mechanism); 22a...CCD or CMOS; 22b...lens; 23 ₁ , 241...first polarization filter; 23 ₂ , 24 ₂ ... the second polarization filter; 25 ₁ , 25 ₃ ... the first polarization filter for brightness adjustment (brightness adjustment mechanism); 25 ₂ , 25 ₄ ... the second polarization filter for brightness adjustment (brightness adjustment mechanism); 26...attenuation filter (brightness adjustment mechanism); 30...image analysis section; 40...marking device; 100...manufacturing device (film manufacturing device); 101, 102, 103...Material Roller; 104, 105...Laminating Roller; 106...Conveying Roller; 110...Film; 111...Polarizing Film Main Part; 113...Surface protective film; R... Shooting area; R0... Middle shooting area; R1... First shooting area; R2... Second shooting area; R3... Third shooting area area.

detailed description

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In addition, in each drawing, the same code|symbol is attached|subjected to the same or equivalent part.

The film manufacturing apparatus and manufacturing method according to the embodiment of the present invention are used to manufacture polarizing films (optical films) having polarizing properties, retardation films (optical films) not having polarizing properties, separator films for batteries, and the like. An example of a manufacturing apparatus and manufacturing method of a film having polarizing properties (polarizing film) is shown in FIG. 1 , and descriptions of manufacturing apparatus and manufacturing methods of retardation films and battery separators without polarizing properties are omitted.

In the manufacturing apparatus (film manufacturing apparatus) 100 shown in Fig. 1 , protective films are first attached to both sides of the main surface of the polarizing plate to produce a polarizing film main body portion (optical film main body portion) 111. Next, the manufacturing device 100 takes out the adhesive piece 112 with a release film on which the release film (release film) is pasted on the adhesive piece from the raw material roll 101, and uses the bonding roller 104 to place the adhesive piece with a release film 112 is bonded to one main surface side of the polarizing film main body portion 111 . Next, the manufacturing apparatus 100 takes out the surface protection film 113 from the raw material roll 102, and bonds the surface protection film 113 to the other main surface side of the polarizing film main body 111 with the laminating roll 105, thereby producing the film 110 having polarizing properties. . Next, the manufacturing apparatus 100 conveys the produced film 110 by the conveyance roller 106 and winds the film 110 by the raw material roller 103 .

PVA (Polyvinyl Alcohol) etc. are mentioned as a material of the polarizing plate in the polarizing film main body part 111, TAC (Triacetylcellulose) etc. are mentioned as a material of the protective film in the polarizing film main body part 111. In addition, as the material of the separator and the surface protection film 113 in the adhesive material 112 with a separator, PET (Polyethylene Terephthalate) or the like can be cited. By peeling off the separator, the film 110 can be bonded to a liquid crystal panel, other optical films, etc. using an adhesive.

Moreover, the manufacturing apparatus 100 is provided with the defect inspection system 10 which performs the defect inspection of the film 110, and the defect inspection system 10 which performs the defect inspection of the polarizing film main-body part 111. FIG. In addition, since these defect inspection systems 10 are the same, the defect inspection system 10 which performs defect inspection of the film 110 is demonstrated below.

[first embodiment]

The defect inspection system and defect inspection method according to the first embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the above-mentioned film 110 having polarization characteristics. FIG. 2 is a diagram showing a defect inspection system and a defect inspection method according to the first embodiment of the present invention, and FIG. 3 is a diagram showing a defect inspection imaging device and a defect inspection according to the first embodiment of the present invention. Figure with shooting method.

The defect inspection system 10 shown in FIG. 2 includes an imaging device 20 for defect inspection, an image analysis unit (detection unit) 30, and a marking device 40. The imaging device 20 for defect inspection shown in FIG. 3 includes a light source (light irradiation mechanism) 21, A plurality of area sensors (camera) 22, and a first polarization filter 23 ₁ . 2 and 3 show XYZ orthogonal coordinates, the X direction shows the width direction of the polarizing film, and the Y direction shows the conveyance direction of the polarizing film.

In this embodiment, the conveyance roller 106 and the raw material roller 103 shown in FIG. 1 mainly function as a conveyance mechanism. By these conveyance mechanisms, the film 110 is conveyed relatively to the light source 21, the area sensor 22, and the _1st polarization filter 231 along the conveyance direction Y.

The light source 21 is provided on the other main surface side of the film 110, and irradiates the imaging region R of the film 110 with light. For example, the light source 21 is a linear light source extending in the width direction X. As shown in FIG.

The area sensors 22 are arranged on one main surface side of the film 110 and are arranged in the width direction X. As shown in FIG. The area sensor 22 includes a CCD (Charge Coupled Device) or a CMOS (Complementary Metal-Oxide Semiconductor) 22a and a lens 22b. The area sensor 22 temporally continuously captures the imaging area R of the film 110 as a two-dimensional image by receiving the light transmitted through the film 110.

It is preferable that the length of the conveyance direction Y of the two-dimensional image captured by each area sensor 22 is at least twice or more than the conveyance distance that the film 110 is conveyed during the period from acquiring the two-dimensional image to acquiring the next two-dimensional image from each area sensor 22. . In other words, it is preferable to photograph the same area of the film 110 twice or more. In this way, by making the length of the two-dimensional image in the conveyance direction Y longer than the conveyance distance during image acquisition, the number of times of imaging the same part of the film 110 is increased, thereby enabling highly accurate defect inspection.

Here, the imaging area R includes the first imaging area R1 and the second imaging area R2 divided in the conveyance direction Y. In addition, the shooting region R includes an intermediate shooting region R0 between the first shooting region R1 and the second shooting region R2.

The first polarizing filter 23 ₁ is arranged between the light source 21 and the film 110 . Specifically, the _first polarizing filter 231 is disposed between the light source 21 and the first imaging region R1 of the imaging region R. In the present embodiment, the _first polarization filter 231 is arranged so that half of the imaging region R in the conveyance direction Y is blocked (Japanese: night frame) when viewed from the area sensor 22 . In addition, the first polarization filter 231 forms _an orthogonal polarization state with the film 110 . Here, the orthogonal polarization state refers to a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are substantially orthogonal, that is, the polarization axis of the polarization filter and the polarization axis of the film A state where the polarization axes cross at an angle of substantially 90 degrees. The above-mentioned "substantially 90 degrees" means, for example, 85 degrees or more and less than 95 degrees, and more preferably 90 degrees.

Accordingly, it is possible to capture an image for orthogonal polarization transmission inspection in the first imaging region R1, an image for normal transmission inspection in the second imaging region R2, and an image for transmission scattering inspection in the intermediate imaging region R0.

The image analysis unit 30 detects defects existing in the film 110 based on the two-dimensional image from the area sensor 22 . In addition, the image analysis unit 30 converts the coordinate position on the two-dimensional image into the coordinate position on the film 110 based on the pixel coordinates of the two-dimensional image and the distance the film is conveyed during image capture, and generates defect position information. The image analysis part 30 synthesizes the image corresponding to the whole area|region of the film 110 from defect position information, and creates a defect map.

The marking device 40 marks the film based on the defect map from the image analysis unit 30.

Next, the defect inspection method and the imaging method for defect inspection according to the first embodiment of the present invention will be described.

First, the first polarizing filter 231 is arranged between the light source 21 and the _first imaging region R1 of the film 110 so as to form a polarization state orthogonal to the film 110 (first polarizing filter arranging step).

Next, the film 110 is conveyed along the conveyance direction Y relative to the light source 21, the area sensor 22, and the _first polarizing filter 231 by the conveyance mechanism (conveyance process), and light is irradiated to the imaging region R of the film 110 by the light source 21 ( light irradiation process), the imaging region R of the film 110 is imaged as a two-dimensional image by the area sensor 22 (imaging process).

Next, the defect existing in the film 110 is detected from the two-dimensional image from the area sensor 22 by the image analysis unit 30, and a defect map is created based on the defect position information (defect detection step). Next, the marking device 40 is used to mark the film 110 based on the defect map from the image analysis unit 30 (marking step).

According to the imaging device 20 for defect inspection and the imaging method for defect inspection according to the first embodiment, since the first polarizing filter 231 is disposed on the light source (light irradiation mechanism) 21 so as to form _a polarization state perpendicular to the film 110 Between the first shooting area R1 and the area sensor (shooting mechanism) 22, the shooting area R including the first shooting area R1, the second shooting area R2 and the middle shooting area R0 is captured as a two-dimensional image, so the first shooting area can be captured at the same time. An image for orthogonally polarized transmission inspection of the region R1 is captured, an image for normal transmission inspection of the second region R2 is captured, and an image for transmission scattering inspection of the middle region R0 is captured. That is, it is possible to integrate the imaging series for orthogonal polarization transmission inspection, the imaging series for normal transmission inspection, and the imaging series for transmission scattering inspection.

As a result, according to the defect inspection system 10 and defect inspection method of the first embodiment, it is possible to integrate the orthogonally polarized transmission inspection series, the normal transmission inspection series, and the transmission scattering inspection series.

Therefore, according to the imaging device 20 for defect inspection, the imaging method for defect inspection, the defect inspection system 10, and the defect inspection method of the first embodiment, the number of inspection series can be reduced.

[Second Embodiment]

The defect inspection system and defect inspection method according to the second embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the above-mentioned defect inspection of the film 110 having polarization characteristics.

The defect inspection system 10A according to the second embodiment of the present invention is different from the first embodiment in that the defect inspection system 10 shown in FIG. Camera 20A. In addition, the defect inspection imaging device 20A shown in Fig. 4 is different from the first embodiment in that an attenuation filter (brightness adjustment mechanism) 26 is further provided in the defect inspection imaging device 20 shown in Fig. 3 .

The attenuation filter 26 is disposed between the light source 21 and the second imaging region R2. Thus, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second imaging region R2. The attenuation filter 26 may also be disposed between the second imaging region R2 and the area sensor 22 to reduce the brightness of light passing through the second imaging region R2.

Next, the defect inspection method and the imaging method for defect inspection according to the second embodiment of the present invention will be described.

First, the above-mentioned first polarization filter arrangement step is performed. Next, the attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the brightness value of the light irradiated to the second imaging region R2 can be reduced (brightness adjustment step). The attenuation filter 26 may also be disposed between the second imaging region R2 and the area sensor 22 to reduce the brightness of light passing through the second imaging region R2.

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20A for defect inspection, the imaging method for defect inspection, the defect inspection system 10A, and the defect inspection method of the second embodiment, it is also possible to obtain method, defect inspection system 10, and defect inspection method have the same advantages.

However, the luminance value of appropriate light differs between the imaging series for cross-polarization transmission inspection and the imaging series for normal transmission inspection. More specifically, the luminance value of the appropriate light in the imaging series for the cross-polarization transmission inspection is large, and the luminance value of the appropriate light in the imaging series for the normal transmission inspection is small.

In this regard, according to the defect inspection imaging device 20A and the defect inspection imaging method of the second embodiment, since the brightness value of the light irradiated to the second imaging region R2 can be adjusted by the attenuation filter (brightness adjustment mechanism) 26, Therefore, for example, by outputting light with a large luminance value from the light source (light irradiation mechanism) 21, the luminance value of the light irradiated toward the first imaging region R1 of the imaging series for orthogonally polarized transmission inspection can be increased, On the other hand, the attenuation filter (brightness adjustment mechanism) 26 can reduce the brightness value of the light irradiated toward the second imaging region R2 for performing the imaging series for positive transmission inspection. As described above, even if the attenuation filter 26 is arranged between the second imaging region R2 and the area sensor 22 to adjust the luminance value of the light transmitted through the second imaging region R2, the same effect can be expected.

Hereinafter, verification of the above-mentioned effects will be performed. (a) of FIG. 21 shows detection images of various defects (black foreign matter, weak bright spots, and strong bright spots) when the light intensity of the light source is changed in the cross-polarization transmission method and the normal transmission method. In addition, FIG. 21(b) shows a graph showing defect signals of the detection image obtained by the cross-polarization transmission method in FIG. 21(a), and FIG. (a) of FIG. 21 is a graph showing the defect signal of the detection image obtained by the normal transmission method. Note that the light intensity of the light source is shown as 1 to 40 times the light intensity of the light source when the luminance value on the image is 128 (optimum light intensity in normal transmission).

According to Fig. 21(a) and Fig. 21(c), in the normal transmission method, the light intensity of the light source is preferably about 1 times. If the light intensity of the light source is set to be more than 2 times, the brightness on the image will be too high, and the overall image will be distorted. White. On the other hand, according to Fig. 21(a) and Fig. 21(b), it can be seen that in the cross-polarization transmission method, when the light intensity of the light source is about 1 times, the brightness on the screen is too low, and the defect cannot be recognized. The light intensity of the light source is preferably 20 times or more, and more preferably 40 times or more.

In the above-mentioned verification, the brightness value on the image was adjusted by adjusting the light quantity of the light source irradiating the imaging area, but the same effect can be achieved by using an attenuation filter as described above as a brightness adjustment method.

[Third Embodiment]

The defect inspection system and defect inspection method according to the third embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the above-mentioned film 110 having polarization characteristics.

The defect inspection system 10B according to the third embodiment of the present invention is different from the first embodiment in that the defect inspection system 10 shown in FIG. Camera 20B. In addition, the imaging device 20B for defect inspection shown in FIG. 5 is different from the first embodiment in that the imaging device 20 for defect inspection shown in FIG.

The light source 21A has a brightness adjustment function of independently adjusting the luminance value of the light irradiated on the first imaging region R1 and the luminance value of the light irradiated on the second imaging region R2. Thereby, the luminance value of the light irradiated on the first imaging region R1 can be made larger, and the luminance value of the light irradiated on the second imaging region R2 can be made smaller.

Next, the defect inspection method and the imaging method for defect inspection according to the third embodiment of the present invention will be described.

First, the above-mentioned first polarization filter arrangement step is performed. Next, the luminance value of the light irradiated to the first shot area R1 and the luminance value of the light irradiated to the second shot area R2 are individually adjusted by the light source 21A. Thereby, the luminance value of the light irradiated to the 1st imaging region R1 can be made large, and the luminance value of the light irradiated to the 2nd imaging region R2 can be made small (brightness adjustment process).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20B for defect inspection, the imaging method for defect inspection, the defect inspection system 10B, and the defect inspection method of the third embodiment, it is also possible to obtain method, defect inspection system 10, and defect inspection method have the same advantages.

In addition, according to the imaging device 20B for defect inspection and the imaging method for defect inspection of the third embodiment, since the brightness value of the light irradiated to the first imaging region R1 and the brightness value of the light irradiated to the second imaging region R2 can be individually adjusted by using the light source 21A, Therefore, the brightness value of the light irradiated towards the first imaging region R1 of the imaging series for orthogonally polarized transmission inspection can be made larger, and on the other hand, the orientation can be made larger for imaging for positive transmission inspection. The luminance value of the light irradiated by the second photographing region R2 of the series is relatively small.

[Fourth embodiment]

The defect inspection system and defect inspection method according to the fourth embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the above-mentioned retardation film having no polarization characteristics, a battery separator, and the like. The defect inspection system and defect inspection method according to the fourth embodiment can be applied to a manufacturing device and manufacturing method of a retardation film having no polarization characteristics, a battery separator, and the like. In the manufacturing apparatus and manufacturing method of retardation films without polarization characteristics, battery separators, etc., the contents other than the defect inspection system and defect inspection method described in the fourth embodiment are known, so as described above Description omitted. Regarding other embodiments and modification examples related to the defect inspection system and defect inspection method for inspecting defects of retardation films without polarization characteristics, battery separators, etc., based on the same viewpoint, the description of phases without polarization characteristics is omitted. Explanation of the production equipment and production method of differential film, battery separator, etc. In the fourth embodiment, the film 110 is a film not having polarization characteristics.

The defect inspection system 10C according to the fourth embodiment of the present invention is different from the first embodiment in that the defect inspection system 10 shown in FIG. Camera 20C. _In addition, the imaging device 20C for defect inspection shown in FIG. First polarization filters 23 ₁ , 24 ₁ .

The first polarizing filter 23 ₁ is disposed between the light source 21 and the film 110 similarly to the first embodiment. Specifically, the _first polarizing filter 231 is disposed between the light source 21 and the first imaging region R1 of the imaging region R. In the present embodiment, the _first polarizing filter 231 is arranged so that half of the imaging area R in the conveyance direction Y is blocked when viewed from the area sensor 22 .

On the other hand, the _first polarization filter 241 is arranged between the film 110 and the area sensor 22 . Specifically, the _first polarizing filter 241 is disposed between the first imaging region R1 of the imaging region R and the area sensor 22 . In the present embodiment, the _first polarizing filter 241 is arranged so that half of the imaging area R in the conveyance direction Y is blocked when viewed from the area sensor 22 .

In addition, the first polarization filter 23 ₁ and the first polarization filter 24 ₁ form an orthogonal polarization state. Accordingly, it is possible to capture an image for orthogonal polarization transmission inspection in the first imaging region R1 , an image for normal transmission inspection in the second imaging region R2 , and an image for transmission scattering inspection in the intermediate imaging region R0 .

Next, the defect inspection method and the imaging method for defect inspection according to the fourth embodiment of the present invention will be described.

First, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the film 110, and the _first polarizing filter 241 is arranged between the first imaging region R1 of the film 110 and the area sensor 22. . At this time, the first polarization filter 23 ₁ and the first polarization filter 24 ₁ are arranged so as to form orthogonal polarization states (first polarization filter arrangement step).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20C for defect inspection and the imaging method for defect inspection according to the fourth embodiment, since the pair of first polarizing filters 23 ₁ and 24 ₁ are respectively disposed on the light source (light irradiation) so as to form orthogonal polarization states, mechanism) 21 and the first shooting area R1, and between the first shooting area R1 and the area sensor (shooting mechanism) 22, the area sensor (shooting mechanism) 22 will include the first shooting area R1, the second shooting area R2 and The imaging region R of the middle imaging region R0 is captured as a two-dimensional image, so the orthogonally polarized transmission inspection image of the first imaging region R1, the positive transmission inspection image of the second imaging region R2, and the transmission image of the middle imaging region R0 can be captured at the same time. Image for scatter inspection. That is, it is possible to integrate the imaging series for orthogonal polarization transmission inspection, the imaging series for normal transmission inspection, and the imaging series for transmission scattering inspection.

As a result, according to the defect inspection system 10C and the defect inspection method of the fourth embodiment, it is possible to integrate the orthogonally polarized transmission inspection series, the normal transmission inspection series, and the transmission scattering inspection series.

Therefore, according to the defect inspection imaging device 20C, defect inspection imaging method, defect inspection system 10C, and defect inspection method of the fourth embodiment, the number of inspection series can be reduced.

[Fifth Embodiment]

The defect inspection system and defect inspection method according to the fifth embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the above-mentioned retardation film without polarization characteristics, a battery separator, and the like. In the fifth embodiment, the film 110 is a film not having polarization characteristics.

The defect inspection system 10D according to the fifth embodiment of the present invention is different from the fourth embodiment in that, in the defect inspection system 10C shown in FIG. Camera 20D. In addition, the defect inspection imaging device 20D shown in Fig. 7 is different from the fourth embodiment in that an attenuation filter (brightness adjustment mechanism) 26 is further provided in the defect inspection imaging device 20C shown in Fig. 6 .

The attenuation filter 26 is disposed between the light source 21 and the second imaging region R2. Thus, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second imaging region R2. The attenuation filter 26 may also be disposed between the second imaging region R2 and the area sensor (photographic mechanism) 22 to reduce the brightness of light transmitted through the second imaging region R2.

Next, the defect inspection method and the imaging method for defect inspection according to the fifth embodiment of the present invention will be described.

First, the above-mentioned first polarization filter arrangement step is performed. Next, the attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the brightness value of the light irradiated to the second imaging region R2 can be reduced (brightness adjustment step). The attenuation filter 26 may be disposed between the second imaging region R2 and the area sensor (imaging mechanism) 22 to reduce the brightness of light transmitted through the second imaging region R2.

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20D for defect inspection, the imaging method for defect inspection, the defect inspection system 10D, and the defect inspection method of the fifth embodiment, it is also possible to obtain method, the defect inspection system 10C, and the defect inspection method have the same advantages.

In addition, according to the imaging device 20D for defect inspection and the imaging method for defect inspection according to the fifth embodiment, since the brightness value of the light irradiated to the second imaging region R2 can be adjusted by the attenuation filter (brightness adjustment mechanism) 26, For example, by outputting light with a large luminance value from the light source (light irradiation mechanism) 21, the luminance value of the light irradiated toward the first imaging region R1 of the imaging series for orthogonally polarized transmission inspection can be increased. On the other hand, the attenuation filter (brightness adjustment mechanism) 26 can reduce the brightness value of the light irradiated toward the second imaging region R2 of the imaging series for positive transmission inspection. In addition, even if the attenuation filter 26 is arranged between the second imaging area R2 and the area sensor (imaging mechanism) 22 to adjust the luminance value of the light transmitted through the second imaging area R2, the same effect can be achieved.

[Sixth Embodiment]

The defect inspection system and defect inspection method according to the sixth embodiment of the present invention are defect inspection systems and defect inspection methods for performing defect inspection of the above-mentioned retardation film without polarization characteristics, battery separator, etc. In the sixth embodiment, the film 110 is a film not having polarization characteristics.

A defect inspection system 10E according to the sixth embodiment of the present invention differs from the fourth embodiment in that a defect inspection system 10C shown in FIG. Camera 20E. In addition, the defect inspection imaging device 20E shown in Fig. 8 is different from the fourth embodiment in that a defect inspection imaging device 20C shown in Fig. 6 is provided with a light source 21A instead of the light source 21.

The light source 21A has a brightness adjustment function of independently adjusting the luminance value of the light irradiated on the first imaging region R1 and the luminance value of the light irradiated on the second imaging region R2. Thereby, the luminance value of the light irradiated on the first imaging region R1 can be made larger, and the luminance value of the light irradiated on the second imaging region R2 can be made smaller.

Next, the defect inspection method and the imaging method for defect inspection according to the sixth embodiment of the present invention will be described.

First, the above-mentioned first polarization filter arrangement step is performed. Next, the luminance value of the light irradiated to the first shot area R1 and the luminance value of the light irradiated to the second shot area R2 are individually adjusted by the light source 21A. Thereby, the luminance value of the light irradiated to the 1st imaging region R1 can be made large, and the luminance value of the light irradiated to the 2nd imaging region R2 can be made small (brightness adjustment process).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20E for defect inspection, the imaging method for defect inspection, the defect inspection system 10E, and the defect inspection method of the sixth embodiment, it is also possible to obtain method, the defect inspection system 10C, and the defect inspection method have the same advantages.

In addition, according to the imaging device 20E for defect inspection and the imaging method for defect inspection according to the sixth embodiment, since the brightness value of the light irradiated to the first imaging region R1 and the brightness value of the light irradiated to the second imaging region R2 can be individually adjusted by using the light source 21A, Therefore, the brightness value of the light irradiated towards the first imaging region R1 of the imaging series for orthogonally polarized transmission inspection can be made larger, and on the other hand, the orientation can be made larger for imaging for positive transmission inspection. The luminance value of the light irradiated by the second photographing region R2 of the series is relatively small.

It should be noted that the present invention is not limited to the above-mentioned present embodiment, and various modifications are possible. For example, in the first, second, and third embodiments, the imaging devices 20, 20A, 20B for defect inspection and the imaging method for defect inspection using the transmission method were exemplified, but the features of the present invention can also be applied to The imaging devices 20, 20A, 20B for defect inspection and the imaging method for defect inspection using the reflection method are shown in FIG.9, FIG.10, and FIG.11.

According to the imaging devices ₂₀ , 20A, 20B for defect inspection and the imaging method for defect inspection shown in FIGS. Between the light source (light irradiation mechanism) 21 and the first photographing region R1, the area sensor (photographing mechanism) 22 captures the photographing region R including the first photographing region R1, the second photographing region R2 and the middle photographing region R0 as a two-dimensional image Therefore, the image for orthogonal polarization reflection inspection of the first imaging region R1, the image for specular reflection inspection of the second imaging region R2, and the image for reflection scattering inspection of the intermediate imaging region R0 can be captured simultaneously. That is, it is possible to integrate the imaging series for cross-polarization reflection inspection, the imaging series for specular reflection inspection, and the imaging series for reflection scattering inspection. As a result, in the defect inspection systems 10 , 10A, 10B, and the defect inspection method, the cross-polarization reflection inspection series, the specular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced.

However, the luminance value of appropriate light differs between the imaging series for cross-polarized reflection inspection and the imaging series for regular reflection inspection. More specifically, the appropriate light in the imaging series for cross-polarized reflection inspection has a large brightness value, and the appropriate light in the imaging series for regular reflection inspection has a small brightness value.

In this regard, according to the defect inspection imaging devices 20A, 20B and the defect inspection imaging method shown in FIG. 10 and FIG. The luminance value of the light to the second imaging region R2, therefore, for example, by outputting light with a larger luminance value from the light source (light irradiation mechanism) 21 and the light source (light irradiation mechanism) 21A, the orientation can be used for orthogonally polarized The brightness value of the light irradiated by the first imaging region R1 of the imaging series for reflection inspection is relatively large. On the other hand, the attenuation filter (brightness adjustment mechanism) 26 and the light source (brightness adjustment mechanism) 21A can be used to make the direction for regular reflection The brightness value of the light irradiated by the second acquisition region R2 of the inspection acquisition series is low. In the case of using the attenuation filter (brightness adjustment mechanism) 26 (such as the method illustrated in FIG. The brightness value of the reflected light is adjusted in the second shooting region R2.

Similarly, in the fourth, fifth, and sixth embodiments, the imaging devices 20C, 20D, and 20E for defect inspection and the imaging method for defect inspection using the transmission method were exemplified, but the features of the present invention can also be applied to Imaging devices 20C, 20D, and 20E for defect inspection and an imaging method for defect inspection using the reflection method as shown in FIG. 12 , FIG. 13 , and FIG. 14 .

According to the imaging devices 20C, 20D, and 20E for defect inspection and the imaging method for defect inspection shown in FIG. ₁₂ , FIG. ₁₃ , and FIG. They are respectively arranged between the light source (light irradiation mechanism) 21 and the first photographing region R1, and between the first photographing region R1 and the area sensor (photographing mechanism) 22. The area sensor (photographing mechanism) 22 will include the first photographing region R1 , the imaging area R of the second imaging area R2 and the middle imaging area R0 are captured as two-dimensional images, so the image for orthogonal polarization reflection inspection of the first imaging area R1 and the image for regular reflection inspection of the second imaging area R2 can be captured at the same time , the image for reflection scattering inspection of the middle imaging region R0. That is, it is possible to integrate the imaging series for cross-polarization reflection inspection, the imaging series for specular reflection inspection, and the imaging series for reflection scattering inspection. As a result, in the defect inspection systems 10C, 10D, and 10E, and the defect inspection method, the cross-polarization reflection inspection series, the specular reflection inspection series, and the reflection scattering inspection series can be integrated, and the number of inspection series can be reduced.

In addition, according to the imaging devices 20D and 20E for defect inspection and the imaging method for defect inspection shown in FIGS. The luminance value of the light in the imaging region R2, therefore, for example, by outputting light with a larger luminance value from the light source (light irradiation mechanism) 21 and the light source (light irradiation mechanism) 21A, the orientation can be used for the orthogonal polarization reflection inspection. The luminance value of the light irradiated by the first imaging region R1 of the imaging series is large. On the other hand, the attenuation filter (brightness adjustment mechanism) 26 and the light source (brightness adjustment mechanism) 21A can be used to make the orientation suitable for imaging for specular reflection inspection. The luminance value of the light irradiated by the second photographing region R2 of the series is relatively small. In the case of using the attenuation filter (brightness adjustment mechanism) 26 (such as the method illustrated in FIG. The brightness value of the reflected light is adjusted in the second shooting region R2.

In addition, in the _first , second, and third embodiments, and in the forms shown in FIGS. between the first shooting regions R1, but it is also possible to use the first polarizing filter 23 ₁ arranged on the first side of the film 110 as shown in Figure 15, Figure 16, Figure 17, Figure 18, Figure 19 and Figure 20. The way between the imaging area R1 and the area sensor (imaging mechanism) 22 .

[Seventh Embodiment]

The defect inspection system and defect inspection method according to the seventh embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the above-mentioned film 110 having polarization characteristics. 22 is a diagram showing a defect inspection system and a defect inspection method according to a seventh embodiment of the present invention, and FIG. 23 is a diagram showing a defect inspection imaging device and a defect inspection according to a seventh embodiment of the present invention. Figure with shooting method.

The defect inspection system 10 shown in FIG. 22 includes a defect inspection imaging device 20, an image analysis unit (detection unit) 30, and a marking device 40. The defect inspection imaging device 20 shown in FIG. 23 includes a light source (light irradiation mechanism) 21, A plurality of area sensors (imaging means) 22 , a first polarization filter 23 ₁ , and a first polarization filter for brightness adjustment (brightness adjustment means) 25 ₁ . XYZ rectangular coordinates are shown in FIG. 22 and FIG. 23, X direction shows the width direction of a polarizing film, and Y direction shows the conveyance direction of a polarizing film.

In this embodiment, the conveyance roller 106 and the raw material roller 103 shown in FIG. 1 mainly function as a conveyance mechanism. By these conveyance mechanisms, the film 110 is conveyed relatively to the light source 21, the area sensor 22, and the _1st polarization filter 231 along the conveyance direction Y.

The light source 21 is provided on the other main surface side of the film 110, and irradiates the imaging region R of the film 110 with light. For example, the light source 21 is a linear light source extending in the width direction X. As shown in FIG.

The area sensors 22 are arranged on one main surface side of the film 110 and are arranged along the width direction X. As shown in FIG. The area sensor 22 includes a CCD (Charge Coupled Device) or a CMOS (Complementary Metal-Oxide Semiconductor) 22a and a lens 22b. The area sensor 22 temporally continuously captures the imaging area R of the film 110 as a two-dimensional image by receiving the light transmitted through the film 110.

It is preferable that the length of the conveyance direction Y of the two-dimensional image captured by each area sensor 22 is at least twice or more than the conveyance distance that the film 110 is conveyed during the period from acquiring the two-dimensional image to acquiring the next two-dimensional image from each area sensor 22. . In other words, it is preferable to photograph the same area of the film 110 twice or more. In this way, by making the length of the two-dimensional image in the conveyance direction Y longer than the conveyance distance during image acquisition, the number of times of imaging the same part of the film 110 is increased, thereby enabling highly accurate defect inspection.

Here, the imaging area R includes the first imaging area R1 and the second imaging area R2 divided in the conveyance direction Y. In addition, the shooting region R includes an intermediate shooting region R0 between the first shooting region R1 and the second shooting region R2.

The first polarizing filter 23 ₁ is arranged between the light source 21 and the film 110 . Specifically, the _first polarizing filter 231 is disposed between the light source 21 and the first imaging region R1 of the imaging region R. In the present embodiment, the _first polarizing filter 231 is arranged so that half of the imaging area R in the conveyance direction Y is blocked when viewed from the area sensor 22 . In addition, the first polarization filter 231 forms _an orthogonal polarization state with the film 110 . Here, the orthogonal polarization state refers to a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are substantially orthogonal, that is, the polarization axis of the polarization filter and the polarization axis of the film A state where the polarization axes cross at an angle of substantially 90 degrees. The above-mentioned "substantially 90 degrees" means, for example, 85 degrees or more and less than 95 degrees, and more preferably 90 degrees.

It is sufficient that the first polarizing filter 23 ₁ and the film 110 form an orthogonal polarization state, and the first polarizing filter 23 ₁ may also be arranged between the first imaging region R1 and the area sensor 22 .

The first polarizing filter 251 for brightness adjustment is disposed between the light source 21 and the _first polarizing filter 231, and between the light source 21 and the second photographic filter so as to form a _first non-orthogonal polarization (half crossednicol) state with the film 110. between the regions R2. Here, the non-orthogonal polarization state refers to a state in which the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film are not substantially orthogonal but intersect, that is, the polarization axis of the polarization filter A state in which the polarization axis crosses the polarization axis of the film at an angle substantially other than 90 degrees. The angle between the polarization axis (polarization absorption axis) of the polarization filter and the polarization axis (polarization absorption axis) of the film in the non-orthogonal polarization state depends on the transmittance of the film and the brightness value of the light emitted from the light source For example, it is an angle at which the luminance value on the image when the area sensor 22 is used to pass through a predetermined area of the imaging area R (the second imaging area R2 in the example of FIG. 23 ) is 200 or less. is the angle at which the brightness value on the image is 130 or less. For example, as described later, the intersection angle between the polarization axis of the _first brightness adjustment polarization filter 251 and the polarization axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. Thereby, the _first polarization filter 251 for brightness adjustment can reduce the brightness value of the light irradiated to the second imaging region R2. In this specification, a "brightness value" is a value that each pixel on an 8-bit grayscale image has.

In addition, the _first polarizing filter 251 for brightness adjustment may be arranged only between the light source 21 and the second imaging region R2 to adjust the brightness of the irradiated light, or may be arranged between the film 110 and the area sensor 22 to adjust the transmittance. The brightness of the light passing through the second photographing region R2.

Thus, it is possible to capture an image for transmission inspection with orthogonal polarization in the first imaging region R1, to capture an image for transmission inspection with non-orthogonal polarization (first non-orthogonal polarization) in the second imaging region R2, and to capture a transmission inspection image in the intermediate imaging region R0. Image for scatter inspection.

The image analysis unit 30 detects defects existing in the film 110 based on the two-dimensional image from the area sensor 22 . In addition, the image analysis unit 30 converts the coordinate position on the two-dimensional image into the coordinate position on the film 110 based on the pixel coordinates of the two-dimensional image and the distance the film is conveyed during image capture, and generates defect position information. The image analysis part 30 synthesizes the image corresponding to the whole area|region of the film 110 from defect position information, and creates a defect map.

The marking device 40 marks the film based on the defect map from the image analysis unit 30 .

Next, the defect inspection method and the imaging method for defect inspection according to the seventh embodiment of the present invention will be described.

First, the first polarizing filter 231 is arranged between the light source 21 and the _first imaging region R1 of the film 110 so as to form a polarization state orthogonal to the film 110 (first polarizing filter arranging step). The _first polarization filter 231 may also be arranged between the first imaging region R1 and the area sensor 22 . Next, the first polarizing filter 251 for brightness adjustment is arranged between the light source 21 and the _first polarizing filter 231 in _a manner to form a first non-orthogonal polarization state with the film 110, and between the light source 21 and the second photographing filter. between the regions R2. Thereby, the brightness value of the light irradiated to the 2nd imaging|photography area R2 can be reduced (brightness adjustment process). The first polarization filter 25 ₁ for brightness adjustment may be arranged only between the light source 21 and the second imaging region R2 , or may be arranged between the film 110 and the area sensor 22 .

Next, the film 110 is conveyed along the conveyance direction Y relative to the light source 21, the area sensor 22, and the _first polarizing filter 231 by the conveyance mechanism (conveyance process), and light is irradiated to the imaging region R of the film 110 by the light source 21 ( light irradiation process), the imaging region R of the film 110 is imaged as a two-dimensional image by the area sensor 22 (imaging process).

Next, the defect existing in the film 110 is detected from the two-dimensional image from the area sensor 22 by the image analysis unit 30, and a defect map is created based on the defect position information (defect detection step). Next, the marking device 40 is used to mark the film 110 based on the defect map from the image analysis unit 30 (marking step).

According to the imaging device 20 for defect inspection and the imaging method for defect inspection according to the first embodiment, since the first polarizing filter 231 is disposed on the light source (light irradiation mechanism) 21 so as to form _a polarization state perpendicular to the film 110 Between the first shooting area R1 and the area sensor (shooting mechanism) 22, the shooting area R including the first shooting area R1, the second shooting area R2 and the middle shooting area R0 is captured as a two-dimensional image, so the first shooting area can be captured at the same time. An image for orthogonal polarization transmission inspection of the region R1 is captured, an image for non-orthogonal polarization (first non-orthogonal polarization) transmission inspection of the second region R2 is captured, and an image for transmission scatter inspection of the intermediate region R0 is captured. That is, it is possible to integrate the imaging series for orthogonal polarization transmission inspection, the imaging series for non-orthogonal polarization transmission inspection, and the imaging series for transmission scattering inspection.

As a result, according to the defect inspection system 10 and defect inspection method of the seventh embodiment, it is possible to integrate the orthogonal polarization transmission inspection series, the non-orthogonal polarization transmission inspection series, and the transmission scattering inspection series.

Therefore, according to the imaging device 20 for defect inspection, the imaging method for defect inspection, the defect inspection system 10, and the defect inspection method of the seventh embodiment, the number of inspection series can be reduced.

According to the defect inspection imaging device 20 and the defect inspection imaging method of the seventh embodiment, the brightness value of light irradiated to the second imaging region R2 can be adjusted by the first brightness adjustment polarization filter (brightness adjustment mechanism) 25 ₁ . Therefore, for example, by outputting light with a large luminance value from the light source (light irradiation mechanism) 21, the luminance value of the light irradiated toward the first imaging region R1 of the imaging series for orthogonally polarized transmission inspection can be increased, On the other hand, it is possible to use the _first brightness adjustment polarization filter (brightness adjustment mechanism) 251 to direct the irradiation toward the second imaging region R2 for non-orthogonal polarization (first non-orthogonal polarization) transmission inspection imaging series. The brightness value of the light is smaller.

However, the inventors of the present application found that the normal transmission method is suitable for the detection of black foreign matter, and the orthogonal polarization transmission method is suitable for the detection of bright spots, but it is difficult for the orthogonal polarization transmission method to detect weaker bright spots than stronger bright spots. In this regard, the inventors of the present application discovered that the non-orthogonal transmission method is used to detect black foreign matter and weak bright spots that are difficult to detect by the orthogonal polarization transmission method.

In this regard, according to the defect inspection imaging device 20 and the defect inspection imaging method of the seventh embodiment, since the first brightness adjustment polarizing filter (brightness adjustment mechanism) 251 and the second imaging region R2 _of the film 110 form the second A non-orthogonal polarization state, thus enabling improved detection of black foreign matter and weaker bright spots (including the slightly weaker bright spots described above). In this specification, below, weaker bright spots include the above-mentioned concept of "slightly weaker bright spots".

Hereinafter, verification of the above-mentioned effects will be performed. (a) of FIG. 45 shows detection images of various defects (black foreign matter, weak bright spots, and strong bright spots) when the light intensity of the light source is 40 times that of changing the crossing angle of the polarizing filter with respect to the film, FIG. 45( b ) shows a graph of the luminance value of the detected image in FIG. 45( a ) in a graph. Similarly, various defects (black foreign matter, weak bright spots, strong bright spots) when changing the intersection angle of the polarizing filter with respect to the film when the light intensity of the light source is 20 times are shown in (c) of FIG. 45 45 (d) shows various defects (black foreign matter, weak bright spot, strong bright spot) of the brightness value of the detected image graph graph. Note that for 40 times, 20 times, and 10 times the light source light quantity, the light source light quantity (best light quantity in normal transmission) when the brightness value on the image is 128 is shown as 1 time.

According to (a) and (b) of Fig. 45, it can be seen that when the light intensity of the light source is 40 times, for the detection of defects of strong bright spots, the crossing angle is substantially 90 degrees, that is, the orthogonal polarization transmission method is suitable for For the detection of weak bright spot defects, the cross angle is 105 degrees, that is, the non-orthogonal polarization transmission method is suitable. It should be noted that when the intersection angle is 70 degrees or less and 110 degrees or more, the brightness on the image is too high, and the entire image becomes white. In addition, for the detection of black foreign matter defects, it can be seen that the positive transmission method is suitable, but in the case of using a polarization filter for brightness adjustment in the positive transmission method, it can be seen that the cross angle is 75 degrees or more and less than 85 degrees, or 95 degrees or more and Below 105 degrees, that is, the non-orthogonal polarization transmission method is suitable.

In addition, according to (b), (c) and (d) of FIG. 45 , depending on the light intensity of the light source, the non-orthogonal polarization transmission method has a higher performance for the detection of defects of weak bright spots and black foreign matter. Optimal crossing angles vary.

Therefore, in the case of using a polarizing filter for brightness adjustment in the normal transmission method, that is, in the case of using the non-orthogonal polarization transmission method, it is advantageous for defects whose defect signal becomes higher when the crossing angle is substantially other than 90 degrees, for example, Detection of weak bright spots and black foreign objects.

In addition, it is possible to comprehensively consider the inspection under the two intersection angles to judge the strength of the defect level. For example, it can also be confirmed by both the orthogonal polarization transmission method with a cross angle of substantially 90 degrees and the non-orthogonal polarization transmission method with a cross angle of 75 degrees or more and less than 85 degrees, or a cross angle of 95 degrees or more and 105 degrees or less. When a defect signal is detected, in other words, when a defect signal is confirmed in a relatively large angle range, it is judged that the defect level is strong, and the defect signal is confirmed only by the orthogonal polarization transmission method whose cross angle is substantially 90 degrees. In the case of , it is judged that the defect level is weak.

In the above verification, the polarizing filter was arranged between the light source and the shooting area to adjust the brightness of the light irradiated to the shooting area, but the brightness of the light passing through the shooting area was adjusted by the non-orthogonal transmission method using the polarizing filter. Adjustment can also achieve the same effect.

[Modification of Seventh Embodiment]

In the seventh embodiment, the defect inspection imaging device 20 and the defect inspection imaging method combining the orthogonal polarization transmission method and the non-orthogonal polarization transmission method are illustrated, but the orthogonal polarization transmission method may be combined with two or more Different combinations of non-orthogonal polarization transmission methods. Hereinafter, as a modified example of the seventh embodiment, an imaging device 20 for defect inspection and an imaging method for defect inspection in which an orthogonal polarization transmission method and two different non-orthogonal polarization transmission methods are combined will be exemplified.

The defect inspection imaging device 20 of the modified example shown in FIG. 39 differs from the seventh embodiment in that the defect inspection imaging device 20 shown in FIG. Adjustment mechanism) 25 ₂ .

Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the second imaging region R2.

The second polarizing filter for brightness adjustment (brightness adjustment mechanism) 252 is arranged between the light source ₂₁ and the third polarizing filter 251 adjacent to the _first brightness adjusting polarizing filter 251 and forms a second non-orthogonal polarization state with the film 110. Shooting area between R3. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the intersection angle of the polarization axis of the polarization filter in the second non-orthogonal polarization state and the polarization axis of the film is different from the intersection angle of the polarization axis of the polarization filter in the first non-orthogonal polarization state and the polarization axis of the film . Thereby, the _second polarization filter 252 for brightness adjustment can reduce the brightness value of the light irradiated to the third imaging region R3. The second non-orthogonal polarization state needs to be formed between the _second brightness adjustment polarizing filter 252 and the film 110, or between the third shooting region R3 and the area sensor 22 to adjust the intensity of the light passing through the third shooting region R3. Brightness value.

Next, a defect inspection method and an imaging method for defect inspection according to a modified example of the seventh embodiment will be described.

First, the above-mentioned first polarization filter arrangement step is performed. Next, as described above, the first polarizing filter 251 for brightness adjustment is disposed between the light source 21 and the _first polarizing filter 231 and the light source 21 so as to form a _first non-orthogonal polarization state with the film 110. and the second shooting area R2. Next, the second polarization filter 252 for brightness adjustment is arranged between the light source 21 and the third imaging region R3 so as to form a _second non-orthogonal polarization state with the film 110 . Thereby, the luminance value of the light irradiated to the 2nd imaging region R2 and the 3rd imaging region R3 can be reduced (brightness adjustment process). The _second polarization filter 252 for brightness adjustment may also be arranged between the third imaging region R3 and the area sensor 22 . Next, the above-described conveyance process, light irradiation process, imaging process, defect detection process, and marking process are performed.

According to the imaging device 20 for defect inspection, the imaging method for defect inspection, the defect inspection system 10, and the defect inspection method of the modified example of the seventh embodiment, it is also possible to obtain The advantages of the imaging method for inspection, the defect inspection system 10, and the defect inspection method are the same.

[Eighth Embodiment]

The defect inspection system and defect inspection method according to the eighth embodiment of the present invention are the defect inspection system 10A and the defect inspection method for performing the defect inspection of the above-mentioned film 110 having polarization characteristics.

A defect inspection system 10A according to the eighth embodiment of the present invention is different from the seventh embodiment in that the defect inspection system 10 shown in FIG. Camera 20A. In addition, the defect inspection imaging device 20A shown in FIG. 24 is different from the seventh embodiment in that, in the defect inspection imaging device 20 shown in FIG. Mechanism) 25 ₁ and an attenuation filter (brightness adjustment mechanism) 26 is provided. In addition, the imaging device 20A for defect inspection is different from the seventh embodiment in that in the imaging device 20 for defect inspection, the polarization axis of the _first polarizing filter 231 is relatively different crossing angles.

The first polarizing filter 23 ₁ forms a first non-orthogonal polarization state with the first shot region R1 of the film 110 . For example, as described later, the crossing angle between the polarization axis of the _first polarization filter 231 and the polarization axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. In addition, the first polarizing filter 231 and the _first imaging region R1 of the film 110 only need to form a first non-orthogonal polarization state, and the _first polarizing filter 231 can also be arranged between the first imaging region R1 and the area sensor 22. room (refer to Figure 35).

The attenuation filter 26 is disposed between the light source 21 and the second imaging region R2. Thus, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second imaging region R2. In addition, the attenuation filter 26 can also be arranged between the second shooting area R2 and the area sensor 22 to reduce the luminance value of the light passing through the second shooting area R2.

Next, the defect inspection method and the imaging method for defect inspection according to the eighth embodiment of the present invention will be described.

First, the first polarizing filter 231 is arranged between the light source 21 and the _first imaging region R1 of the film 110 so as to form a first non-orthogonal polarization state with the film 110 (first polarizing filter arrangement step). The _first polarization filter 231 may also be arranged between the first imaging region R1 and the area sensor 22 . Next, the attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the brightness value of the light irradiated to the 2nd imaging|photography area R2 can be reduced (brightness adjustment process). The attenuation filter 26 may also be arranged between the second imaging region R2 and the area sensor 22 .

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20A for defect inspection, the imaging method for defect inspection, the defect inspection system 10A, and the defect inspection method of the eighth embodiment, it is possible to obtain the same imaging device 20 for defect inspection and imaging method for defect inspection as the seventh embodiment. method, defect inspection system 10, and defect inspection method have the same advantages.

[First Modification of Eighth Embodiment]

In the eighth embodiment, the defect inspection imaging device 20A and the defect inspection imaging method combining the non-orthogonal polarization transmission method and the normal transmission method are exemplified, but two or more different non-orthogonal polarization transmission methods may be combined. Combined with normal transmission method. Hereinafter, as a first modified example of the eighth embodiment, a defect inspection imaging device 20A and a defect inspection imaging method combining two different non-orthogonal polarization transmission methods and a normal transmission method will be exemplified.

The imaging device 20A for defect inspections shown in FIG. 40 differs from 7th Embodiment in that the imaging device 20A for defect inspections shown in FIG. 24 is further equipped with the _2nd polarization filter 232.

Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.

The second polarization filter 23 ₂ is disposed between the light source 21 and the third imaging region R3 so as to be adjacent to the first polarization filter 23 ₁ and form a second non-orthogonal polarization state with the film 110 . Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the intersection angle of the polarization axis of the polarization filter in the second non-orthogonal polarization state and the polarization axis of the film is different from the intersection angle of the polarization axis of the polarization filter in the first non-orthogonal polarization state and the polarization axis of the film . The _second polarization filter 232 can be configured to form a second non-orthogonal polarization state with the third imaging region R3, and can also be independently arranged between the third imaging region R3 and the area sensor 22 relative to the _first polarization filter 231. between.

Next, a defect inspection method and a defect inspection imaging method according to a first modified example of the eighth embodiment will be described.

First, as described above, the first polarizing filter 231 is arranged between the light source 21 and the _first imaging region R1 of the film 110 so as to form a first non-orthogonal polarization state with the film 110 (the first polarizing filter arrangement process). Next, the second polarization filter 232 is arranged between the light source ₂₁ and the third imaging region R3 of the film 110 so as to form a second non-orthogonal polarization state with the film 110 (second polarization filter arrangement step). The second polarization filter 23 ₂ may be arranged between the third imaging region R3 and the area sensor 22 independently of the first polarization filter 23 ₁ . Next, the brightness adjustment process, the conveyance process, the light irradiation process, the imaging process, the defect detection process, and the marking process mentioned above are performed.

According to the defect inspection imaging device 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the first modified example of the eighth embodiment, the defect inspection imaging device 20 of the seventh embodiment can also be obtained. , the imaging method for defect inspection, the defect inspection system 10, and the defect inspection method have the same advantages.

[Second Modification of Eighth Embodiment]

In the eighth embodiment, the defect inspection imaging device 20A and the defect inspection imaging method combining the non-orthogonal polarization transmission method and the normal transmission method are exemplified, but two or more different non-orthogonal polarization transmission methods may be combined. combination. Hereinafter, as a second modified example of the eighth embodiment, a defect inspection imaging device 20A and a defect inspection imaging method combining two different non-orthogonal polarization transmission methods will be exemplified.

The defect inspection imaging device 20A of the second modification differs from the eighth embodiment in that the defect inspection imaging device 20A shown in FIG. A polarization filter for brightness adjustment (brightness adjustment mechanism) 25 ₁ .

The first polarization filter for brightness adjustment (brightness adjustment mechanism) 251 is arranged between the light source 21 and the second imaging region R2 so as to form _a second non-orthogonal polarization state with the film 110 . Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the intersection angle of the polarization axis of the polarization filter in the second non-orthogonal polarization state and the polarization axis of the film is different from the intersection angle of the polarization axis of the polarization filter in the first non-orthogonal polarization state and the polarization axis of the film . Thereby, the _first polarization filter 251 for brightness adjustment can reduce the brightness value of the light irradiated to the second imaging region R2.

The _first polarizing filter 251 for brightness adjustment and the film 110 only need to form a second non-orthogonal polarization state, and the _first polarizing filter 251 for brightness adjustment can also be arranged between the second imaging region R2 and the area sensor 22, The brightness value of the light passing through the second photographing region R2 is adjusted.

Next, a defect inspection method and a defect inspection imaging method according to a second modified example of the eighth embodiment will be described.

First, as described above, the first polarizing filter 231 is arranged between the light source 21 and the _first imaging region R1 of the film 110 so as to form a first non-orthogonal polarization state with the film 110 (the first polarizing filter arrangement process). Next, the _first polarization filter 251 for brightness adjustment is disposed between the light source 21 and the _first polarization filter 231, and between the light source 21 and the second Shooting area between R2. Thereby, the brightness value of the light irradiated to the 2nd imaging|photography area R2 can be reduced (brightness adjustment process). The _first polarizing filter 251 for brightness adjustment may also be arranged between the second imaging region R2 and the area sensor 22 to adjust the brightness value of the light passing through the second imaging region R2. Next, the above-described conveyance process, light irradiation process, imaging process, defect detection process, and marking process are performed.

According to the defect inspection imaging device 20A, the defect inspection imaging method, the defect inspection system 10A, and the defect inspection method of the second modified example of the eighth embodiment, the defect inspection imaging device 20 of the seventh embodiment can also be obtained. , the imaging method for defect inspection, the defect inspection system 10, and the defect inspection method have the same advantages.

[Ninth Embodiment]

The defect inspection system and defect inspection method according to the ninth embodiment of the present invention are the defect inspection system 10 and the defect inspection method for performing the defect inspection of the above-mentioned film 110 having polarization characteristics.

A defect inspection system 10B according to the ninth embodiment of the present invention is different from the seventh embodiment in that the defect inspection system 10 shown in FIG. Camera 20B. In addition, the defect inspection imaging device 20B shown in FIG. 25 differs from the seventh embodiment in that, in the defect inspection imaging device 20 shown in FIG. (Brightness adjustment mechanism) 251 includes _a light source 21A. In addition, the imaging device 20B for defect inspection is different from the seventh embodiment in that in the imaging device 20 for defect inspection, the polarization axis of the _first polarizing filter 231 is different from the polarization axis of the film 110 (polarized absorption axis). different crossing angles.

The first polarizing filter 23 ₁ forms a first non-orthogonal polarization state with the first shot region R1 of the film 110 . For example, as described later, the crossing angle between the polarization axis of the _first polarization filter 231 and the polarization axis of the film 110 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. The first polarizing filter 231 and the _first shooting region R1 of the film 110 can form a first non-orthogonal polarization state, and the _first polarizing filter 231 can also be arranged between the light source 21A and the first shooting region R1 (refer to FIG. 25 ), or disposed between the first imaging region R1 and the area sensor 22 (see FIG. 36 ).

The light source 21A has a brightness adjustment function of independently adjusting the luminance value of the light irradiated on the first imaging region R1 and the luminance value of the light irradiated on the second imaging region R2. Thereby, the luminance value of the light irradiated on the first imaging region R1 can be made larger, and the luminance value of the light irradiated on the second imaging region R2 can be made smaller.

Next, the defect inspection method and the imaging method for defect inspection according to the ninth embodiment of the present invention will be described.

First, the first polarizing filter 231 is arranged between the light source 21 and the _first imaging region R1 of the film 110 so as to form a first non-orthogonal polarization state with the film 110 (first polarizing filter arrangement step). The _first polarization filter 231 may also be arranged between the first imaging region R1 and the area sensor 22 . Next, the luminance value of the light irradiated to the first shot region R1 and the luminance value of the light irradiated to the second shot region R2 are individually adjusted by the light source 21A. Thereby, the luminance value of the light irradiated to the first imaging region R1 can be made large, and the luminance value of the light irradiated on the second imaging region R2 can be made small (brightness adjustment process).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20B for defect inspection, the imaging method for defect inspection, the defect inspection system 10B, and the defect inspection method of the ninth embodiment, it is also possible to obtain the imaging device 20 for defect inspection and the imaging device for defect inspection of the seventh embodiment. method, defect inspection system 10, and defect inspection method have the same advantages.

[Modification of Ninth Embodiment]

In the ninth embodiment, the defect inspection imaging device 20B and the defect inspection imaging method combining the non-orthogonal polarization transmission method and the normal transmission method are exemplified, but two or more different non-orthogonal polarization transmission methods may be combined. Combined with normal transmission method. Hereinafter, as a modified example of the ninth embodiment, a defect inspection imaging device 20B and a defect inspection imaging method combining two different non-orthogonal polarization transmission methods and a normal transmission method will be exemplified.

The imaging device 20B for defect inspections shown in FIG. 41 differs from 7th Embodiment in that the imaging device 20B for defect inspections shown in FIG. 25 is further equipped with the _2nd polarization filter 232.

Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.

The second polarization filter 23 ₂ is disposed between the light source 21 and the third imaging region R3 so as to be adjacent to the first polarization filter 23 ₁ and form a second non-orthogonal polarization state with the film 110 . Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the intersection angle of the polarization axis of the polarization filter in the second non-orthogonal polarization state and the polarization axis of the film is different from the intersection angle of the polarization axis of the polarization filter in the first non-orthogonal polarization state and the polarization axis of the film . The second polarization filter 23 ₂ and the film 110 only need to form a second non-orthogonal polarization state, and the second polarization filter 23 ₂ can also be arranged between the third imaging region R3 and the area sensor 22 .

Next, a defect inspection method and an imaging method for defect inspection according to a modified example of the ninth embodiment will be described.

First, as described above, the first polarizing filter 231 is disposed between the light source 21 and the _first imaging region R1 of the film 110 so as to form a first non-orthogonal polarization state with the film 110 (the first polarizing filter configuration process). Next, the second polarizing filter 232 is arranged between the light source ₂₁ and the third imaging region R3 of the film 110 so as to form a second non-orthogonal polarization state with the film 110 (second polarizing filter arrangement step) . The _second polarization filter 232 may also be disposed between the third imaging region R3 and the area sensor 22 . Next, the brightness adjustment process, the conveyance process, the light irradiation process, the imaging process, the defect detection process, and the marking process mentioned above are performed.

According to the imaging device 20B for defect inspection, the imaging method for defect inspection, the defect inspection system 10B, and the defect inspection method according to the modified example of the ninth embodiment, it is also possible to obtain the imaging device 20 for defect inspection and the defect inspection method of the seventh embodiment. The advantages of the imaging method for inspection, the defect inspection system 10, and the defect inspection method are the same.

[Tenth Embodiment]

The defect inspection system and defect inspection method according to the tenth embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the above-mentioned retardation film having no polarization characteristics, a battery separator, and the like. The defect inspection system and defect inspection method according to the tenth embodiment can be applied to a manufacturing device and manufacturing method of a retardation film having no polarization characteristics, a battery separator, and the like. In the production apparatus and production method of a retardation film having no polarization characteristics, a battery separator, etc., the contents other than the defect inspection system and defect inspection method described in the tenth embodiment are known, so as described above Description omitted. Regarding other embodiments and modifications related to the defect inspection system and defect inspection method for inspecting defects of retardation films without polarization characteristics, battery separators, etc., based on the same viewpoint, the description of phases without polarization characteristics is omitted. Explanation of the production equipment and production method of differential film, battery separator, etc. In the description of the tenth embodiment and its modifications, the film 110 is a film that does not have polarization characteristics.

The defect inspection system 10C according to the tenth embodiment of the present invention differs from the seventh embodiment in that the defect inspection system 10 shown in FIG. Camera 20C. In addition, the defect inspection imaging device 20C shown in FIG. ₂₆ is different from the seventh embodiment in that the defect inspection imaging device 20 shown in FIG. For the first polarizing filters 23 ₁ and 24 ₁ , in addition to the first polarizing filter 25 ₁ for brightness adjustment, a first polarizing filter for brightness adjustment paired with the first polarizing filter for brightness adjustment 25 ₁ is provided. 25 ₃ .

The first polarizing filter 23 ₁ is arranged between the light source 21 and the film 110 as in the seventh embodiment. Specifically, the _first polarizing filter 231 is disposed between the light source 21 and the first imaging region R1 of the imaging region R. In the present embodiment, the _first polarizing filter 231 is arranged so that half of the imaging area R in the conveyance direction Y is blocked when viewed from the area sensor 22 .

On the other hand, the _first polarization filter 241 is arranged between the film 110 and the area sensor 22 . Specifically, the _first polarizing filter 241 is disposed between the first imaging region R1 of the imaging region R and the area sensor 22 . In the present embodiment, the _first polarizing filter 241 is arranged so that half of the imaging area R in the conveyance direction Y is blocked when viewed from the area sensor 22 .

In addition, the first polarization filter 25 ₁ for brightness adjustment among the pair of first polarization filters 25 ₁ and 25 ₃ for brightness adjustment is disposed between the light source 21 and the film 110 in the same manner as in the seventh embodiment. On the other hand, the first polarization filter 25 ₃ for brightness adjustment is disposed between the film 110 and the area sensor 22 . Specifically, the first polarization filter 253 for brightness adjustment is disposed between the second imaging region R2 of the imaging region _R and the area sensor 22 . In the tenth embodiment, the first polarization filter ₂₅₃ for brightness adjustment is arranged so that, when viewed from the area sensor 22, half of the imaging area R in the conveyance direction Y (in the example of FIG. 26 is the second imaging area R2 side part) is blocked.

In addition, the first polarization filter 23 ₁ and the first polarization filter 24 ₁ form an orthogonal polarization state. On the other hand, the first polarization filter 251 for brightness adjustment and the _first polarization filter 253 for brightness adjustment form a first non _- orthogonal polarization state. For example, the intersection angle between the polarization axis _of the _first brightness adjustment polarization filter 251 and the polarization axis of the first brightness adjustment polarization filter 253 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less. Thereby, it is possible to capture an image for orthogonal polarization transmission inspection in the first imaging region R1 , capture an image for non-orthogonal polarization transmission inspection in the second imaging region R2 , and capture an image for transmission scattering inspection in the intermediate imaging region R0 .

Next, the defect inspection method and the imaging method for defect inspection according to the tenth embodiment of the present invention will be described.

First, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the film 110, and the _first polarizing filter 241 is arranged between the first imaging region R1 of the film 110 and the area sensor 22. . At this time, the first polarization filter 23 ₁ and the first polarization filter 24 ₁ are arranged so as to form orthogonal polarization states (first polarization filter arrangement step).

Next, the _first polarizing filter 251 for brightness adjustment is arranged between the light source 21 and the _first polarizing filter 231, and between the light source 21 and the second imaging region R2, and the first polarizing filter for brightness adjustment 25 ₃ is arranged between the second imaging region R2 of the film 110 and the area sensor 22 . At this time, the first polarization filter 251 for brightness adjustment and the _first polarization filter ₂₅₃ for brightness adjustment are arranged so as to form a first non-orthogonal polarization state. Thereby, the luminance value of the light observed by the area sensor 22 transmitted through the second imaging area R2 can be reduced (brightness adjustment process). The _first polarization filter 251 for brightness adjustment may be arranged only between the light source 21 and the second imaging region R2.

In addition, instead _of the first polarization filter 253 for brightness adjustment, the _first polarization filter 241 may be extended to the second imaging region R2. In this case, the _first polarization filter 251 for brightness adjustment is arranged as It only needs to form the first non-orthogonal polarization state with the first polarization filter 24 ₁ .

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20C for defect inspection and the imaging method for defect inspection according to the tenth embodiment, since the pair of first polarizing filters 23 ₁ and 24 ₁ are respectively disposed on the light source (light irradiation) so as to form orthogonal polarization states, mechanism) 21 and the first shooting area R1, and between the first shooting area R1 and the area sensor (shooting mechanism) 22, the area sensor (shooting mechanism) 22 will include the first shooting area R1, the second shooting area R2 and The imaging area R of the middle imaging area R0 is captured as a two-dimensional image, so the orthogonally polarized transmission inspection image of the first imaging area R1 and the non-orthogonal polarization (first non-orthogonal polarization) of the second imaging area R2 can be captured at the same time. An image for transmission inspection, and an image for transmission scattering inspection of the intermediate imaging region R0. That is, the imaging series for orthogonal polarization transmission inspection, the imaging series for non-orthogonal polarization (first non-orthogonal polarization) transmission inspection, and the imaging series for transmission scattering inspection can be integrated.

As a result, according to the defect inspection system 10C and the defect inspection method of the tenth embodiment, it is possible to integrate the orthogonal polarization transmission inspection series, the non-orthogonal polarization transmission inspection series, and the transmission scattering inspection series.

Therefore, according to the defect inspection imaging device 20C, defect inspection imaging method, defect inspection system 10C, and defect inspection method of the tenth embodiment, the number of inspection series can be reduced.

In addition, according to the imaging device 20C for defect inspection and the imaging method for defect inspection according to the tenth embodiment, it is possible to adjust the transmission of the second polarization filter (brightness adjustment mechanism) 25 ₁ , 25 ₃ using the pair of first brightness adjustment polarization filters. The imaging region R2 is a brightness value of light observed by the region sensor 22 . Therefore, for example, by outputting light with a large luminance value from the light source (light irradiation mechanism) 21, the luminance value of the light irradiated toward the first imaging region R1 of the imaging series for orthogonally polarized transmission inspection can be increased, On the other hand, a pair of first brightness adjustment polarization filters (brightness adjustment mechanism) 25 ₁ , 25 ₃ can make the second imaging region R2 transmitted through the imaging series for non-orthogonal polarization transmission inspection be detected by the area sensor. The brightness value of the observed light is small.

In addition, according to the imaging device 20C for defect inspection and the imaging method for defect inspection according to the tenth embodiment, the first non-orthogonal polarization state is formed by the pair of first polarization filters (brightness adjustment mechanism) 25 ₁ and 25 ₃ for brightness adjustment. , thus enabling improved detection of dark foreign objects as well as weaker bright spots.

[Modification of Tenth Embodiment]

In the tenth embodiment, the defect inspection imaging device 20 and the defect inspection imaging method combining the orthogonal polarization transmission method and the non-orthogonal polarization transmission method are exemplified, but the orthogonal polarization transmission method may be combined with two or more Different combinations of non-orthogonal polarization transmission methods. Hereinafter, as a modified example of the tenth embodiment, a defect inspection imaging device 20C and an imaging method for defect inspection that combine the orthogonal polarization transmission method and two different non-orthogonal polarization transmission methods will be exemplified.

The defect inspection imaging device 20C of the modified example shown in FIG. 42 is different from the seventh embodiment in that the defect inspection imaging device 20C shown in FIG. device (brightness adjustment mechanism) 25 ₂ , 25 ₄ .

Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the second imaging region R2.

The second polarization filter for brightness adjustment (brightness adjustment mechanism) 252 is disposed between the light source 21 and the third imaging region R3 in a manner adjacent to the _first polarization filter for brightness adjustment 251. _On the other hand, the second brightness adjustment The adjustment polarizing filter 25 ₄ is disposed between the third imaging region R3 and the area sensor 22 so as to be adjacent to the first luminance adjusting polarizing filter 25 ₃ . A pair of second brightness adjustment polarization filters (brightness adjustment mechanism) 25 ₂ , 25 ₄ are arranged to form a second non-orthogonal polarization state. Here, the second non-orthogonal polarization state formed by the pair of second brightness adjustment polarization filters (brightness adjustment mechanism) 25 ₂ and 25 ₄ is different from the first non-orthogonal polarization state. That is, the crossing angle of the polarization axes of the polarization filters in the second non-orthogonal polarization state is different from the crossing angle of the polarization axes of the polarization filters in the first non-orthogonal polarization state, whereby the second brightness adjustment polarization The filters 25 ₂ and 25 ₄ can reduce the brightness value of the light observed by the area sensor 22 passing through the third shooting area R3.

Next, a defect inspection method and an imaging method for defect inspection according to a modified example of the tenth embodiment will be described.

First, the above-mentioned first polarization filter arrangement step is performed. Next, the _first brightness adjustment polarizing filter 251 is arranged between the light source 21 and the _first polarizing filter 231, and between the light source 21 and the second imaging region R2 as described above, and the first brightness adjustment The polarization filter ₂₅₃ is disposed between the second imaging region R2 of the film 110 and the area sensor 22 . At this time, the first brightness-adjusting polarization filters 25 ₁ and 25 ₃ are arranged to form a first non-orthogonal polarization state. Next, the _second brightness adjustment polarizing filter 252 is arranged between the light source 21 and the third shot region R3, and the second brightness adjustment polarizing filter ₂₅₄ is arranged between the third shot region R3 and the third shot region R3 of the film 110. between area sensors 22. At this time, the second brightness-adjusting polarization filters 25 ₂ and 25 ₄ are arranged to form a second non-orthogonal polarization state. Thereby, the brightness value of the light observed by the area sensor 22 through the 2nd imaging area R2 and the 3rd imaging area R3 can be reduced (brightness adjustment process). The first polarization filter 25 ₁ for brightness adjustment may be arranged only between the light source 21 and the second imaging region R2.

In addition, instead of the first polarization filter 25 ₃ for brightness adjustment, the first polarization filter 24 ₁ may be extended to the second imaging region R2. In this case, the first polarization filter 25 ₁ for brightness adjustment is arranged as It only needs to form the first non-orthogonal polarization state with the first polarization filter 24 ₁ . Alternatively, instead of the second polarization filter 25 ₄ for brightness adjustment, the first polarization filter 25 ₃ for brightness adjustment may be extended to the third imaging region R3. In this case, the second polarization filter 25 for brightness adjustment ₂ may be arranged so as to form a second non _- orthogonal polarization state with respect to the first brightness adjustment polarization filter 253.

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the imaging device 20C for defect inspection, the imaging method for defect inspection, the defect inspection system 10C, and the defect inspection method of the modified example of the tenth embodiment, it is also possible to obtain Advantages are the same as the imaging method for inspection, the defect inspection system 10C, and the defect inspection method.

[Eleventh Embodiment]

The defect inspection system and defect inspection method according to the eleventh embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the above-mentioned retardation film having no polarization characteristics, a battery separator, and the like. In the description of the eleventh embodiment and its modifications, the film 110 is a film that does not have polarization characteristics.

A defect inspection system 10D according to an eleventh embodiment of the present invention differs from the tenth embodiment in that a defect inspection system 10C shown in FIG. Use the camera 20D. In addition, the imaging device 20D for defect inspection shown in FIG. 27 is different from the tenth embodiment in that, in the imaging device 20C for defect inspection shown in FIG. Mechanism) 25 ₁ and an attenuation filter (brightness adjustment mechanism) 26 is provided. In addition, the defect inspection imaging device 20D differs from the tenth embodiment in that in the defect inspection imaging device 20C, the intersection of the polarization axes (polarization absorption axes) of the pair of first polarization filters 23 ₁ and 24 ₁ The angles are different.

The first polarization filter 23 ₁ and the first polarization filter 24 ₁ form a first non-orthogonal polarization state. For example, the intersection angle between the polarization axis of the _first polarization filter 231 and the polarization axis of the _first polarization filter 241 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less.

The attenuation filter 26 is disposed between the light source 21 and the second imaging region R2. Thus, the attenuation filter 26 can reduce the luminance value of the light irradiated to the second imaging region R2.

Next, the defect inspection method and the imaging method for defect inspection according to the eleventh embodiment of the present invention will be described.

First, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the film 110, and the _first polarizing filter 241 is arranged between the first imaging region R1 of the film 110 and the area sensor 22. . At this time, the first polarization filter 23 ₁ and the first polarization filter 24 ₁ are arranged so as to form the first non-orthogonal polarization state (first polarization filter arrangement step). Next, the attenuation filter 26 is arranged between the light source 21 and the second imaging region R2. Thereby, the brightness value of the light irradiated to the 2nd imaging|photography area R2 can be reduced (brightness adjustment process). The attenuation filter 26 may also be disposed between the second imaging region R2 of the film 110 and the area sensor 22 to reduce the luminance value of the light passing through the second imaging region R2.

Next, the above-mentioned conveying process, light irradiation process, imaging process, defect detection process, and marking process are performed.

According to the imaging device 20D for defect inspection, the imaging method for defect inspection, the defect inspection system 10D, and the defect inspection method of the eleventh embodiment, it is also possible to obtain The imaging method, the defect inspection system 10C, and the defect inspection method have the same advantages.

[First modification of the eleventh embodiment]

In the eleventh embodiment, the defect inspection imaging device 20D and the defect inspection imaging method combining the non-orthogonal polarization transmission method and the normal transmission method are exemplified, but two or more different non-orthogonal polarizations may be used Combination of transmission method and positive transmission method. Hereinafter, as a first modified example of the eleventh embodiment, a defect inspection imaging device 20D and a defect inspection imaging method combining two different non-orthogonal polarization transmission methods and a normal transmission method will be exemplified.

A defect inspection imaging device 20D shown in FIG. 43 differs from the eleventh embodiment in that a defect inspection imaging device 20D shown in FIG. 27 further includes a pair of second polarizing filters. 23 ₂ , 24 ₂ .

Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.

The _second polarizing filter 232 is disposed between the light source 21 and the third imaging region R3 so as to be adjacent to the _first polarizing filter 231, and the _second polarizing filter 242 is disposed adjacent to the _first polarizing filter 241. The mode is arranged between the third imaging region R3 and the area sensor 22 . A pair of second polarization filters 23 ₂ , 24 ₂ form a second non-orthogonal polarization state. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the crossing angle of the polarization axes of the polarization filters in the second non-orthogonal polarization state is different from the crossing angle of the polarization axes of the polarization filters in the first non-orthogonal polarization state.

Next, a defect inspection method and a defect inspection imaging method according to a first modified example of the eleventh embodiment will be described.

First, as described above, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the film 110, and the _first polarizing filter 241 is arranged between the first imaging region R1 and the area of the film 110. Between the sensors 22. At this time, the first polarization filter 23 ₁ and the first polarization filter 24 ₁ are arranged so as to form the first non-orthogonal polarization state (first polarization filter arrangement step). Next, the _second polarizing filter 232 is arranged between the light source 21 and the third shooting region R3 of the film 110, and the _second polarizing filter 242 is arranged between the third shooting region R3 of the film 110 and the area sensor 22. between. At this time, the second polarization filter 23 ₂ and the second polarization filter 24 ₂ are arranged to form the second non-orthogonal polarization state (second polarization filter arrangement step). Next, the brightness adjustment process, the conveyance process, the light irradiation process, the imaging process, the defect detection process, and the marking process mentioned above are performed.

According to the defect inspection imaging device 20D, the defect inspection imaging method, the defect inspection system 10D, and the defect inspection method of the first modified example of the eleventh embodiment, the defect inspection imaging device of the tenth embodiment can also be obtained. 20C, the imaging method for defect inspection, the defect inspection system 10C, and the defect inspection method have the same advantages.

[Second modification of the eleventh embodiment]

In the eleventh embodiment, the defect inspection imaging device 20D and the defect inspection imaging method combining the non-orthogonal polarization transmission method and the normal transmission method are exemplified, but two or more different non-orthogonal polarization transmission methods may be used. legal combination. Hereinafter, as a second modified example of the eleventh embodiment, a defect inspection imaging device 20D and a defect inspection imaging method combining two different non-orthogonal polarization transmission methods will be exemplified.

The defect inspection imaging device 20D of the second modification differs from the eleventh embodiment in that the defect inspection imaging device 20D shown in FIG. Polarization filters (brightness adjustment mechanism) 25 ₁ , 25 ₃ are used for the first brightness adjustment.

The first brightness adjustment polarizing filter (brightness adjustment mechanism) ₂₅₁ is disposed between the light source 21 and the second imaging region R2, and the first brightness adjustment polarizing filter ₂₅₃ is disposed between the second imaging region R2 and the area of the film 110. Between the sensors 22. At this time, the pair of first brightness adjustment polarization filters 25 ₁ and 25 ₃ are arranged to form the second non-orthogonal polarization state. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the crossing angle of the polarization axes of the polarization filters in the second non-orthogonal polarization state and the crossing angle of the polarization axes of the polarization filters in the first non-orthogonal polarization state. Accordingly, the pair of first brightness adjustment polarization filters 25 ₁ and 25 ₃ can reduce the brightness value of the light transmitted through the second imaging region R2.

Next, a defect inspection method and a defect inspection imaging method according to a second modified example of the eleventh embodiment will be described.

First, as described above, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the film 110, and the _first polarizing filter 241 is arranged between the first imaging region R1 and the area of the film 110. Between the sensors 22. At this time, the first polarization filter 23 ₁ and the first polarization filter 24 ₁ are arranged so as to form the first non-orthogonal polarization state (first polarization filter arrangement step). Next, the _first polarizing filter 251 for brightness adjustment is arranged between the light source 21 and the second shooting region R2, and the first polarizing filter ₂₅₃ for brightness adjustment is arranged between the second shooting region R2 and the area of the film 110. Between the sensors 22. At this time, a pair of first brightness adjustment polarization filters 25 ₁ , 25 ₃ is arranged so as to form a second non-orthogonal polarization state. Thereby, the luminance value of the light transmitted through the second imaging region R2 can be reduced (brightness adjustment step). Next, the above-described conveyance process, light irradiation process, imaging process, defect detection process, and marking process are performed.

According to the defect inspection imaging device 20D, the defect inspection imaging method, the defect inspection system 10D, and the defect inspection method of the second modified example of the eleventh embodiment, the defect inspection imaging device of the tenth embodiment can also be obtained. 20C, the imaging method for defect inspection, the defect inspection system 10C, and the defect inspection method have the same advantages.

[Twelfth Embodiment]

The defect inspection system and defect inspection method according to the twelfth embodiment of the present invention are a defect inspection system and a defect inspection method for performing defect inspection of the above-mentioned retardation film having no polarization characteristics, a battery separator, and the like. In the description of the twelfth embodiment and its modifications, the film 110 is a film that does not have polarization characteristics.

A defect inspection system 10E according to a twelfth embodiment of the present invention is different from the tenth embodiment in that a defect inspection system 10C shown in FIG. Use the camera 20E. In addition, the imaging device 20E for defect inspection shown in FIG. 28 is different from the tenth embodiment in that, in the imaging device 20C for defect inspection shown in FIG. (Brightness adjustment mechanism) 251 includes _a light source 21A. In addition, the defect inspection imaging device 20E differs from the tenth embodiment in that in the defect inspection imaging device 20C, the intersection of the polarization axes (polarization absorption axes) of the pair of first polarization filters 23 ₁ and 24 ₁ The angles are different.

The first polarization filter 23 ₁ and the first polarization filter 24 ₁ form a first non-orthogonal polarization state. For example, the intersection angle between the polarization axis of the _first polarization filter 231 and the polarization axis of the _first polarization filter 241 is 75 degrees or more and less than 85 degrees, or 95 degrees or more and 105 degrees or less.

The light source 21A has a brightness adjustment function of independently adjusting the luminance value of the light irradiated on the first imaging region R1 and the luminance value of the light irradiated on the second imaging region R2. Thereby, the luminance value of the light irradiated on the first imaging region R1 can be made larger, and the luminance value of the light irradiated on the second imaging region R2 can be made smaller.

Next, the defect inspection method and the imaging method for defect inspection according to the twelfth embodiment of the present invention will be described.

First, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the film 110, and the _first polarizing filter 241 is arranged between the first imaging region R1 of the film 110 and the area sensor 22. . At this time, the first polarization filter 23 ₁ and the first polarization filter 24 ₁ are arranged so as to form the first non-orthogonal polarization state (first polarization filter arrangement step). Next, the luminance value of the light irradiated to the first shot area R1 and the luminance value of the light irradiated to the second shot area R2 are individually adjusted by the light source 21A. Thereby, the luminance value of the light irradiated to the first imaging region R1 can be made large, and the luminance value of the light irradiated on the second imaging region R2 can be made small (brightness adjustment process).

Next, the above-mentioned conveying process, light irradiation process, photographing process, defect detection process, and marking process are performed.

According to the defect inspection imaging device 20E, the defect inspection imaging method, the defect inspection system 10E, and the defect inspection method of the twelfth embodiment, it is also possible to obtain the defect inspection imaging device 20C and the defect inspection imaging device 20C of the tenth embodiment. The imaging method, the defect inspection system 10C, and the defect inspection method have the same advantages.

[Modification of the Twelfth Embodiment]

In the twelfth embodiment, the defect inspection imaging device 20E and the defect inspection imaging method combining the non-orthogonal polarization transmission method and the normal transmission method were exemplified, but two or more different non-orthogonal polarization transmission methods may be used. Combination of method and positive transmission method. Hereinafter, as a modified example of the twelfth embodiment, a defect inspection imaging device 20E and a defect inspection imaging method combining two different non-orthogonal polarization transmission methods and a normal transmission method will be exemplified.

The imaging device 20E for defect inspections shown in FIG. 44 differs from 10th Embodiment in that the imaging device 20E for defect inspections shown in FIG. 28 is further equipped with a pair of _2nd polarization filter _232,242 .

Here, the imaging region R further includes a third imaging region R3 divided in the conveyance direction Y, and the third imaging region R3 is adjacent to the first imaging region R1.

The _second polarizing filter 232 is disposed between the light source 21 and the third imaging region R3 so as to be adjacent to the _first polarizing filter 231, and the _second polarizing filter 242 is disposed adjacent to the _first polarizing filter 241. The mode is arranged between the third imaging region R3 and the area sensor 22 . A pair of second polarization filters 23 ₂ , 24 ₂ form a second non-orthogonal polarization state. Here, the second non-orthogonal polarization state is different from the first non-orthogonal polarization state. That is, the crossing angle of the polarization axes of the polarization filters in the second non-orthogonal polarization state and the crossing angle of the polarization axes of the polarization filters in the first non-orthogonal polarization state.

Next, a defect inspection method and a defect inspection imaging method according to a modified example of the twelfth embodiment will be described.

First, as described above, the _first polarizing filter 231 is arranged between the light source 21 and the first imaging region R1 of the film 110, and the _first polarizing filter 241 is arranged between the first imaging region R1 and the area of the film 110. Between the sensors 22. At this time, the first polarization filter 23 ₁ and the first polarization filter 24 ₁ are arranged so as to form the first non-orthogonal polarization state (first polarization filter arrangement step). Next, the _second polarizing filter 232 is arranged between the light source 21 and the third shooting region R3 of the film 110, and the _second polarizing filter 242 is arranged between the third shooting region R3 of the film 110 and the area sensor 22. between. At this time, the second polarization filter 23 ₂ and the second polarization filter 24 ₂ are arranged to form the second non-orthogonal polarization state (second polarization filter arrangement step). Next, the brightness adjustment process, the conveyance process, the light irradiation process, the imaging process, the defect detection process, and the marking process mentioned above are performed.

According to the defect inspection imaging device 20E, the defect inspection imaging method, the defect inspection system 10E, and the defect inspection method according to the modified example of the twelfth embodiment, the defect inspection imaging device 20C of the tenth embodiment, The imaging method for defect inspection, the defect inspection system 10C, and the defect inspection method have the same advantages.

It should be noted that the present invention is not limited to the above-mentioned present embodiment, and various modifications are possible. For example, in the seventh, eighth and ninth embodiments, the defect inspection imaging devices 20, 20A, 20B and the defect inspection imaging method using the transmission method are illustrated, but the features of the present invention can also be applied to 29. Imaging devices 20, 20A, and 20B for defect inspection and an imaging method for defect inspection using the reflection method as shown in FIGS. 30 and 31.

In addition, in FIG. 29 , the imaging device 20 for defect inspection and the imaging method for defect inspection that combine the orthogonal polarization reflection method and the non-orthogonal polarization reflection method are illustrated, but it is also possible to use the orthogonal polarization reflection method in the same manner as in FIG. 39 . method combined with two or more different non-orthogonal polarized reflection methods. In addition, in FIG. 30 , an imaging device 20A for defect inspection and an imaging method for defect inspection that combine the non-orthogonal polarization reflection method and the regular reflection method are exemplified, but similarly to FIG. 40 , two or more different The non-orthogonal polarization reflection method is combined with the regular reflection method, and two or more different non-orthogonal polarization reflection methods can also be combined. In addition, in FIG. 31 , the imaging device 20B for defect inspection and the imaging method for defect inspection that combine the non-orthogonal polarization reflection method and the regular reflection method are illustrated, but similarly to FIG. 41 , two or more different Combination of non-orthogonal polarized reflection method and regular reflection method.

According to the imaging devices ₂₀ , 20A, 20B for defect inspection and the imaging method for defect inspection shown in FIGS. Arranged between the light source (light irradiation mechanism) 21 and the first photographing region R1, the area sensor (photographing mechanism) 22 photographs the photographing region R including the first photographing region R1, the second photographing region R2 and the intermediate photographing region R0 into two Therefore, the image for orthogonal polarization reflection inspection of the first imaging region R1, the image for regular reflection (or non-orthogonal polarization emission) inspection of the second imaging region R2, and the reflection scattering inspection image of the middle imaging region R0 can be captured at the same time. with images. That is, it is possible to integrate an imaging series for orthogonal polarization reflection inspection, an imaging series for non-orthogonal polarization reflection inspection (see FIG. 29 ), an imaging series for regular reflection inspection (see FIGS. 30 and 31 ), and an imaging series for reflection and scattering inspection. As a result, in the defect inspection system 10, 10A, 10B and the defect inspection method, it is possible to integrate the orthogonally polarized reflective inspection series, the non-orthogonal polarized reflective inspection series or the regular reflective inspection series, and the reflective scatter inspection series, thereby reducing Check the number of series.

However, appropriate light brightness values differ between the imaging series for cross-polarized reflection inspection and, for example, the imaging series for regular reflection inspection. More specifically, the luminance value of the appropriate light in the imaging series for cross-polarized reflection inspection is large, and for example, the luminance value of the appropriate light in the imaging series for regular reflection inspection is small.

In this regard, according to the imaging devices ₂₀ , 20A, 20B for defect inspection and the imaging method for defect inspection shown in FIGS. The brightness adjustment mechanism) 26 and the light source (brightness adjustment mechanism) 21A adjust the brightness value of the light irradiated to the second imaging region R2. Therefore, for example, by outputting light with a large luminance value from the light source (light irradiation mechanism) 21 and the light source (brightness adjustment mechanism) 21A, it is possible to irradiate light toward the first imaging region R1 of the imaging series for orthogonally polarized reflection inspection. On the other hand, it is possible to use the polarization filter (brightness adjustment mechanism) 25 ₁ , the attenuation filter (brightness adjustment mechanism) 26 and the light source (brightness adjustment mechanism) 21A to make the direction for non-positive The luminance value of light irradiated by the second imaging region R2 in the imaging series for cross-polarized reflection inspection (see FIG. 29 ) or the imaging series for specular reflection inspection (see FIGS. 30 and 31 ) is small.

Similarly, in the tenth, eleventh, and twelfth embodiments, the imaging devices 20C, 20D, and 20E for defect inspection and the imaging method for defect inspection using the transmission method were illustrated, but the features of the present invention can also be applied to As shown in FIG. 32 , FIG. 33 and FIG. 34 , there are imaging devices 20C, 20D, and 20E for defect inspection and an imaging method for defect inspection using the reflection method.

In addition, in FIG. 32 , a defect inspection imaging device 20C and a defect inspection imaging method combining the orthogonal polarization reflection method and the non-orthogonal polarization reflection method are illustrated, but the orthogonal polarization reflection method may also be used in the same manner as in FIG. 42 . method combined with two or more different non-orthogonal polarized reflection methods. In this case, with respect to the third imaging region R3 illustrated in FIG. 42 , the _second polarization filter for brightness adjustment (brightness adjustment mechanism) 252 is arranged so as to be adjacent to the _first polarization filter for brightness adjustment 251. Between the light source 21 and the third photographing region R3, _on the other hand, the second polarization filter 254 for brightness adjustment (brightness adjustment mechanism) ₂₅₂ paired with the first The brightness adjustment polarization filter 253 may be disposed between the third imaging region _R3 and the area sensor 22 so as to be adjacent to each other.

In addition, in FIG. 33 , an imaging device 20D for defect inspection and an imaging method for defect inspection that combine the non-orthogonal polarization reflection method and the regular reflection method are illustrated, but similarly to FIG. 43 , two or more different The non-orthogonal polarization reflection method is combined with the regular reflection method, and two or more different non-cross polarization reflection methods can also be combined. _In this case, with respect to the third imaging region _R3 illustrated in FIG. The _second polarizing filter 242 paired with the _second polarizing filter 232 is arranged adjacent to the _first polarizing filter 241 in the second polarizing filter 241. Between the three-shot area R3 and the area sensor 22, as described in the second modified example of the eleventh embodiment, instead of the attenuation filter (brightness adjustment mechanism) 26, a pair of polarization filters for first brightness adjustment may be provided. (Brightness adjustment mechanism) 25 ₁ , 25 ₃ are configured to form a second non-orthogonal polarization state. In the case where a pair of first brightness adjustment polarization filters (brightness adjustment mechanism) 25 ₁ and 25 ₃ are used, the first brightness adjustment polarization filter (brightness adjustment mechanism) 25 ₁ is placed between the light source 21 and the second imaging unit. Between the regions R2, the first polarization filter ₂₅₃ for brightness adjustment may be arranged between the second imaging region R2 of the film 110 and the region sensor 22 .

In addition, in FIG. 34 , an imaging device 20E for defect inspection and an imaging method for defect inspection that combine the non-orthogonal polarization reflection method and the regular reflection method are illustrated, but similarly to FIG. 44 , two or more different Combination of non-orthogonal polarized reflection method and regular reflection method. _In this case, with respect to the third imaging region _R3 illustrated in FIG. The second polarization filter 24 ₂ paired with the second polarization filter 23 ₂ may be disposed between the third imaging region R3 and the area sensor 22 so as to be adjacent to the first polarization filter 24 ₁ .

According to the imaging devices 20C, _20D , and _20E for defect inspection and the imaging method for defect inspection shown in FIGS. are respectively arranged between the light source (light irradiation mechanism) 21 and the first photographing region R1, and between the first photographing region R1 and the area sensor (photographing mechanism) 22, and the area sensor (photographing mechanism) 22 will include the first photographing region R1 The imaging area R of the region R1, the second imaging area R2, and the middle imaging area R0 is captured as a two-dimensional image, so the orthogonally polarized reflection inspection image of the first imaging area R1 and the regular reflection ( or non-orthogonal polarization emission) inspection image, reflection scattering inspection image of the middle shooting region R0. That is, it is possible to integrate an imaging series for orthogonal polarization reflection inspection, an imaging series for non-orthogonal polarization reflection inspection (see FIG. 32 ), an imaging series for regular reflection inspection (see FIGS. 33 and 34 ), and an imaging series for reflection and scattering inspection. As a result, in the defect inspection systems 10C, 10D, 10E and the defect inspection method, it is possible to integrate the orthogonally polarized reflective inspection series, the non-orthogonal polarized reflective inspection series or the regular reflective inspection series, and the reflective scatter inspection series, thereby reducing Check the number of series.

_In addition, according to the imaging devices 20C, 20D, and 20E for defect inspection and the imaging method for defect inspection shown in FIGS. , 25 ₃ . The attenuation filter (brightness adjustment mechanism) 26 and the light source (brightness adjustment mechanism) 21A adjust the brightness value of the light irradiated to the second shooting region R2. Therefore, for example, by outputting light with a large luminance value from the light source (light irradiation mechanism) 21 and the light source (brightness adjustment mechanism) 21A, it is possible to irradiate light toward the first imaging region R1 of the imaging series for orthogonally polarized reflection inspection. The luminance value of the light is relatively large. On the other hand, it is possible to use a pair of first luminance adjustment polarizing filters (brightness adjustment mechanism) 25 ₁ , 25 ₃ , an attenuation filter (brightness adjustment mechanism) 26 and a light source (brightness adjustment mechanism) ) 21A, making the luminance value of light irradiated toward the second imaging region R2 for non-orthogonal polarized reflection imaging series (see FIG. 32 ) or specular reflection inspection imaging series (see FIGS. 33 and 34 ) smaller.

In addition, in the eighth and ninth embodiments, and the modes shown in FIGS. 30 and 31 , it is illustrated that the _first polarizing filter 231 is provided in the first imaging region R1 of the light source (light irradiation mechanism) 21 and the film 110. However, as shown in Figure 35, Figure 36, Figure 37 and Figure 38, the _first polarizing filter 231 is arranged between the first shooting area R1 of the film 110 and the area sensor (shooting mechanism) 22 way between.

In FIG. 35 , an imaging device 20A for defect inspection and an imaging method for defect inspection that combine the non-orthogonal polarization transmission method and the normal transmission method are illustrated, but similarly to FIG. 40 , two or more different non-normal The cross-polarized transmission method and the normal transmission method can be combined, and two or more different non-orthogonal polarization transmission methods can also be combined. In addition, in FIG. 36 , an imaging device 20B for defect inspection and an imaging method for defect inspection that combine the non-orthogonal polarization transmission method and the normal transmission method are exemplified, and similarly to FIG. 41 , two or more different The orthogonally polarized transmission method is combined with the normal transmission method.

In addition, in FIG. 37 , the imaging device 20A for defect inspection and the imaging method for defect inspection that combine the non-orthogonal polarization reflection method and the regular reflection method are illustrated, but similarly to FIG. 40 , two or more different The non-orthogonal polarization reflection method and the regular reflection method may be combined, and two or more different non-orthogonal polarization reflection methods may be combined. In addition, in FIG. 38 , the imaging device 20B for defect inspection and the imaging method for defect inspection combining the non-orthogonal polarization reflection method and the reflection method are illustrated, but similarly to FIG. 41 , two or more different Combination of non-orthogonal polarized reflection method and regular reflection method.

In the previous description, in the case where the brightness adjustment mechanism is additionally arranged relative to the light irradiation mechanism, the brightness adjustment mechanism is configured to adjust the light irradiated to the second shooting region R2, or to pass through the second shooting region or be received by the second shooting region. 2. Brightness of light reflected by shooting area R2. However, in an aspect in which the brightness adjustment mechanism is separately arranged relative to the light irradiation mechanism, the brightness adjustment mechanism is configured to adjust the light irradiated to at least one of the first and second imaging regions R1 and R2 or the light transmitted through the first and second imaging regions R1 and R2. The brightness of light reflected by at least one of the two imaging regions R1 and R2 or at least one of the first and second imaging regions R1 and R2 is sufficient. In addition, in the form in which the brightness adjustment mechanism is provided in the light irradiation mechanism, a brightness adjustment mechanism may be provided separately from the brightness adjustment mechanism arranged in the light irradiation mechanism.

Claims (29)

1. a kind of defect inspection filming apparatus, the defect inspection for carrying out the film with polarization characteristic, it is characterised in that

The defect inspection possesses with filming apparatus：

Light irradiating means, its to the film shooting area irradiation light；

Photographic unit, the shooting area of the film is shot for two dimensional image by it；

First Polarization filter, its by with the film formation orthogonal polarization state or the first nonopiate polarization state in the way of, Configure between the light irradiating means and the shooting area of the film or the film the shooting area with it is described Between photographic unit；And

Carrying mechanism, it is carried relative to the light irradiating means, the photographic unit and first Polarization filter edge The film is relatively carried in direction,

The shooting area is included in the first shooting area and the second shooting area being divided out on the carrying direction,

First Polarization filter configuration is between the light irradiating means and first shooting area or described first Between shooting area and the photographic unit.

2. defect inspection filming apparatus according to claim 1, it is characterised in that

First Polarization filter and film formation orthogonal polarization state.

3. defect inspection filming apparatus according to claim 2, it is characterised in that

The defect inspection is also equipped with brightness regulation mechanism with filming apparatus, and brightness regulation mechanism regulation exposes to described first The light of shooting area and at least one party in second shooting area or through first shooting area and described At least one party in second shooting area or by least one party in first shooting area and second shooting area The brightness value of the light of reflection.

4. defect inspection filming apparatus according to claim 3, it is characterised in that

Brightness regulation mechanism regulation expose to the light of second shooting area or through second shooting area or The brightness value of the light reflected by second shooting area.

5. defect inspection filming apparatus according to claim 4, it is characterised in that

The brightness regulation mechanism is disposed between the light irradiating means and second shooting area or described second Attentuating filter between shooting area and the photographic unit.

6. the defect inspection filming apparatus according to claim 3 or 4, it is characterised in that

The brightness regulation mechanism is configured at the light irradiating means, individually adjusts to the described first light for shooting area illumination Brightness value and the brightness value to the described second light for shooting area illumination.

7. defect inspection filming apparatus according to claim 1, it is characterised in that

The first Polarization filter configuration is between the light irradiating means and first shooting area.

8. defect inspection filming apparatus according to claim 1, it is characterised in that

The defect inspection is also equipped with brightness regulation mechanism with filming apparatus, and brightness regulation mechanism regulation exposes to described first The light of shooting area and at least one party in second shooting area or through first shooting area and described At least one party in second shooting area or by least one party in first shooting area and second shooting area The brightness value of the light of reflection.

9. defect inspection filming apparatus according to claim 8, it is characterised in that

First shooting area formation orthogonal polarization state of first Polarization filter and the film,

The brightness regulation mechanism include the first brightness regulation Polarization filter, the first brightness regulation Polarization filter with With the mode of second shooting area of the film the first nonopiate polarization state of formation, configuration the light irradiating means with Between second shooting area or between second shooting area and the photographic unit.

10. defect inspection filming apparatus according to claim 8, it is characterised in that

First shooting area the first nonopiate polarization state of formation of first Polarization filter and the film,

The brightness regulation mechanism is disposed between the light irradiating means and second shooting area or described second Attentuating filter between shooting area and the photographic unit.

11. defect inspection filming apparatus according to claim 8, it is characterised in that

First shooting area the first nonopiate polarization state of formation of first Polarization filter and the film,

The brightness regulation mechanism is configured at the light irradiating means, individually adjusts to the described first light for shooting area illumination Brightness value and the brightness value to the described second light for shooting area illumination.

12. defect inspection filming apparatus according to claim 9, it is characterised in that

The shooting area is included in the third shot being divided out on the carrying direction and takes the photograph region,

The brightness regulation mechanism includes the second brightness regulation Polarization filter and regulation exposes to the third shot and takes the photograph region Light brightness value, second brightness regulation takes the photograph region with the third shot with the film with Polarization filter and forms second non- The mode of orthogonal polarization state, is configured between the light irradiating means and the third shot take the photograph region or the third shot Take the photograph between region and the photographic unit.

13. the defect inspection filming apparatus according to claim 10 or 11, it is characterised in that

The shooting area is included in the third shot being divided out on the carrying direction and takes the photograph region,

The defect inspection is also equipped with the second Polarization filter with filming apparatus, and second Polarization filter is configured in the illumination Penetrate mechanism and the third shot takes the photograph between region or the third shot is taken the photograph between region and the photographic unit, and this second The third shot of Polarization filter and the film takes the photograph region and forms the second nonopiate polarization state.

14. defect inspection filming apparatus according to claim 8, it is characterised in that

First shooting area the first nonopiate polarization state of formation of first Polarization filter and the film,

The brightness regulation mechanism include the first brightness regulation Polarization filter, the first brightness regulation Polarization filter with With the mode of second shooting area of the film the second nonopiate polarization state of formation, configuration the light irradiating means with Between second shooting area or between second shooting area and the photographic unit.

15. a kind of defect inspection filming apparatus, the defect inspection for carrying out the film without polarization characteristic, its feature exists In,

The defect inspection possesses with filming apparatus：

Light irradiating means, its to the film shooting area irradiation light；

Photographic unit, the shooting area of the film is shot for two dimensional image by it；

A pair of first Polarization filters, it is in the way of forming orthogonal polarization state or the first nonopiate polarization state, respectively Configure between the light irradiating means and the shooting area of the film and the film the shooting area with it is described Between photographic unit；And

Carrying mechanism, it is relative to the first Polarization filter edge described in the light irradiating means, the photographic unit and a pair Carry direction and relatively carry the film,

The shooting area is included in the first shooting area and the second shooting area being divided out on the carrying direction,

First Polarization filter described in a pair be arranged respectively between the light irradiating means and first shooting area and Between first shooting area and the photographic unit.

16. defect inspection filming apparatus according to claim 15, it is characterised in that

First Polarization filter formation orthogonal polarization state described in a pair.

17. defect inspection filming apparatus according to claim 16, it is characterised in that

The defect inspection is also equipped with brightness regulation mechanism with filming apparatus, and brightness regulation mechanism regulation exposes to described first The light of shooting area and at least one party in second shooting area or through first shooting area and described At least one party in second shooting area or by least one party in first shooting area and second shooting area The brightness value of the light of reflection.

18. defect inspection filming apparatus according to claim 17, it is characterised in that

Brightness regulation mechanism regulation expose to the light of second shooting area or through second shooting area or The brightness value of the light reflected by second shooting area.

19. defect inspection filming apparatus according to claim 18, it is characterised in that

The brightness regulation mechanism is disposed between the light irradiating means and second shooting area or described second Attentuating filter between shooting area and the photographic unit.

20. the defect inspection filming apparatus according to claim 17 or 18, it is characterised in that

The brightness regulation mechanism is configured at the light irradiating means, individually adjusts to the described first light for shooting area illumination Brightness value and the brightness value to the described second light for shooting area illumination.

21. defect inspection filming apparatus according to claim 15, it is characterised in that

The defect inspection is also equipped with brightness regulation mechanism with filming apparatus, and brightness regulation mechanism regulation exposes to described first The light of shooting area and at least one party in second shooting area or through first shooting area and described At least one party in second shooting area or by least one party in first shooting area and second shooting area The brightness value of the light of reflection.

22. defect inspection filming apparatus according to claim 21, it is characterised in that

First Polarization filter formation orthogonal polarization state described in a pair,

The brightness regulation mechanism includes a pair of first brightness regulation Polarization filters, a pair of first brightness regulation polarizations Wave filter in the way of forming the first nonopiate polarization state, configuration the light irradiating means and second shooting area it Between and second shooting area and the photographic unit between.

23. defect inspection filming apparatus according to claim 21, it is characterised in that

The first nonopiate polarization state of first Polarization filter formation described in a pair,

The brightness regulation mechanism is disposed between the light irradiating means and second shooting area or described second Attentuating filter between shooting area and the photographic unit.

24. defect inspection filming apparatus according to claim 21, it is characterised in that

The first nonopiate polarization state of first Polarization filter formation described in a pair,

The brightness regulation mechanism is configured at the light irradiating means, individually adjusts to the described first light for shooting area illumination Brightness value and the brightness value to the described second light for shooting area illumination.

25. defect inspection filming apparatus according to claim 22, it is characterised in that

The shooting area is included in the third shot being divided out on the carrying direction and takes the photograph region,

The brightness regulation mechanism includes a pair of second brightness regulation Polarization filters and regulation exposes to the third shot and taken the photograph The brightness value of the light in region, a pair of second brightness regulation Polarization filters are to form the side of the second nonopiate polarization state Formula, configuration is between the light irradiating means and the third shot take the photograph region and the third shot is taken the photograph region and shot with described Between mechanism.

26. the defect inspection filming apparatus according to claim 23 or 24, it is characterised in that

The shooting area is included in the third shot being divided out on the carrying direction and takes the photograph region,

The defect inspection is also equipped with a pair of second Polarization filters with filming apparatus, and a pair of second Polarization filters are to form The mode of second nonopiate polarization state, be arranged respectively at the light irradiating means and the third shot take the photograph between region and The third shot is taken the photograph between region and the photographic unit.

27. defect inspection filming apparatus according to claim 21, it is characterised in that

The first nonopiate polarization state of first Polarization filter formation described in a pair,

The brightness regulation mechanism includes a pair of first brightness regulation Polarization filters, a pair of first brightness regulation polarizations Wave filter in the way of forming the second nonopiate polarization state, configuration the light irradiating means and second shooting area it Between and second shooting area and the photographic unit between.

28. a kind of defect inspecting system, it is characterised in that possess：

Defect inspection filming apparatus any one of claim 1 to 27；And

Test section, its basis is detected and deposited in the film by the two dimensional image that the defect inspection is photographed with filming apparatus Defect.

29. a kind of film manufacturing device, it is characterised in that possess the defect inspecting system described in claim 28.