TWI761174B - Touch display device - Google Patents

Abstract

A touch display device, having a display area and a periphery area, includes a substrate, a signal line, a bonding pad and a protection layer. The signal line is disposed on the substrate and extends from the display area to the periphery area. The bonding pad is disposed at the periphery area and electrically connected to the signal line. The protection layer is disposed on the signal line and the bonding pad, has a through hole overlapped with the bonding pad, and includes a planarization portion and a portion surrounding the through hole. The planarization portion surrounds the portion surrounding the through hole and has a first height. The portion surrounding the through hole serves as a sidewall of the through hole and has a second height. The first height is greater than the second height.

Description

touch display device

The present invention relates to a touch display device, and more particularly, to a touch display device with improved scratch resistance.

According to the relative positions of the touch electrodes and the display panel, touch display devices can be roughly classified into out-cell, on-cell and in-cell, wherein the out-cell Compared with the externally mounted touch display device, the type touch display device has the advantages of being lighter and thinner, and has lower technical difficulty compared with the in-cell type touch display device, and has been widely used in various electronic products.

In the out-cell touch display device, the touch-related components are arranged on the back of the color filter substrate. Therefore, a single-board double-sided process needs to be performed during the manufacturing process to form the touch-related components and the color filter components on the The two opposite surfaces of the substrate are then subjected to chip-on-film bonding (COF) by, for example, an Outer Lead Bonding technique. However, after the touch-related elements are formed, when the substrate is turned over and transferred for the color filter element manufacturing process, the touch-related elements are often scratched due to contact with the conveying mechanism (such as a conveying roller) during the transfer process.

The present invention provides a touch display device with improved scratch resistance.

An embodiment of the present invention provides a touch display device, which has a display area and a peripheral area, and includes: a substrate; a signal line located on the substrate and extending from the display area to the peripheral area; pads located in the peripheral area and connected to the peripheral area The signal line is electrically connected; and the protective layer is located on the signal line and the pad, has a through hole overlapping the pad, and includes a flat part and a ring hole part, wherein the flat part surrounds the ring hole part and has a first height, and the ring hole The portion forms the sidewall of the through hole and has a second height, and the first height is greater than the second height.

In an embodiment of the present invention, the difference between the above-mentioned second height and the height of the pad is less than or equal to 0.8 μm.

In an embodiment of the present invention, the above-mentioned pad includes a single-layer or multi-layer structure.

In an embodiment of the present invention, the above-mentioned pad includes a first conductive layer and a second conductive layer, the second conductive layer completely covers the first conductive layer, and the sidewall of the through hole completely covers the periphery of the second conductive layer.

In an embodiment of the present invention, the above-mentioned signal line includes a first signal line and a second signal line, and the first conductive layer and the first signal line belong to the same film layer, and the second conductive layer and the second signal line belong to the same layer film layer.

In an embodiment of the present invention, the above-mentioned touch display device further includes a transfer wire, wherein the transfer wire is electrically connected to the second signal line and the first conductive layer, and the transfer wire and the first signal line belong to the same film layer.

In an embodiment of the present invention, the above-mentioned second signal line is electrically connected to the transfer wire through the through hole.

In an embodiment of the present invention, the above-mentioned protective layer is formed by a phase-transfer mask, a half-tone mask, or a gray-scale mask.

In an embodiment of the present invention, the above-mentioned signal lines are separated from the pads.

In an embodiment of the present invention, the above-mentioned signal lines bridge the pads through transparent wires.

In an embodiment of the present invention, the above-mentioned protective layer includes an organic material.

In an embodiment of the present invention, the above-mentioned signal line includes an end width portion overlapping the transparent wire, and the line width of the end width portion is smaller than that of the transparent wire.

In an embodiment of the present invention, the difference between the line width of the transparent wire and the line width of the end width portion is greater than or equal to 6 μm.

In an embodiment of the present invention, the line width of the end width portion is larger than the line width of the signal line in the display area.

In an embodiment of the present invention, the above-mentioned touch display device further includes a polarizer, which covers the signal line and part of the transparent wires, and the distance between the wide end portion and the edge of the polarizer is greater than or equal to 500 μm.

In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, the following embodiments are given and described in detail with the accompanying drawings as follows.

FIG. 1A is a schematic top view of a touch display device 10 according to an embodiment of the present invention. Fig. 1B is a schematic cross-sectional view taken along the section line A-A' of Fig. 1A. Fig. 1C is a schematic cross-sectional view taken along the section line B-B' of Fig. 1A. In order to make the expression of the drawings more concise, FIG. 1A omits the pins LD and the conductive adhesive AD in FIG. 1B .

1A to 1C at the same time, the touch display device 10 has a display area AA and a peripheral area BA, and includes a substrate 110 , a signal line 120 , a pad 130 and a protective layer 140 . The signal line 120 is located on the substrate 110 and extends from the display area AA to the peripheral area BA. The pads 130 are located in the peripheral area BA and are electrically connected to the signal lines 120 . The protective layer 140 is located on the signal lines 120 and the pads 130 , has through holes TH overlapping the pads 130 , and includes a flat portion 141 and a ring hole portion 142 , wherein the flat portion 141 surrounds the ring hole portion 142 and has a first height H1 The annular hole portion 142 constitutes the sidewall of the through hole TH and has a second height H2, and the first height H1 is greater than the second height H2.

Based on the above, in the touch display device 10 according to an embodiment of the present invention, using the ring hole portion 142 with a smaller height in the protective layer 140 to control the depth of the through hole TH can facilitate the bonding of the pads 130 . At the same time, by covering the signal line 120 and surrounding the ring hole 142 with the flat portion 141 of the protective layer 140 with a larger height, the signal line 120 and the pad 130 can be prevented from being scratched during the manufacturing process, so that the touch display device can be prevented from being scratched. 10 has improved scratch resistance.

Hereinafter, the embodiments of each element and film layer of the touch display device 10 will continue to be described with reference to the drawings, but the present invention is not limited thereto.

1A to 1C simultaneously, the substrate 110 of the touch display device 10 may be a transparent substrate, and its material includes a quartz substrate, a glass substrate, a polymer substrate, etc., but the present invention is not limited thereto. Various film layers such as touch electrodes, signal lines, pads, color filter elements, black matrices, switching elements and the like can be disposed on the substrate 110 . In some embodiments, the touch display device 10 may include another substrate (eg, a pixel array substrate) and a display medium disposed between the other substrate and the substrate 110 , but FIGS. 1A to 1C are for the clarity of the drawings. Another substrate and display medium are omitted.

The signal line 120 of the touch display device 10 is a wire for transmitting signals, and the signal line 120 may include a first signal line 121 and a second signal line 122, and the first signal line 121 and the second signal line 122 may be used to transmit different attribute signal. For example, in the present embodiment, the touch display device 10 may include a plurality of touch driving electrodes Tx and a plurality of touch sensing electrodes Rx arranged alternately in the display area AA, and the first signal line 121 may be connected to the touch The driving electrodes Tx are controlled, and the second signal lines 122 can be connected to the touch sensing electrodes Rx. When an object (eg, a stylus) touches the touch display device 10, the capacitance between the touch driving electrodes Tx and the touch sensing electrodes Rx will be changed. At this time, the touch driving electrodes Tx and the touch sensing electrodes will be changed. Rx can export the sensed signal of the capacitance change to the peripheral area BA through the first signal line 121 and the second signal line 122 respectively.

In some embodiments, the touch display device 10 further includes a chip on film (Chip on Film) COF. A plurality of pins LD are arranged on the chip-on-film COF. One end of the pins LD is electrically connected to the chip on the chip-on-film COF, for example, and the other end of the pins LD can be connected to the chip on the chip-on-film COF with conductive adhesive AD or other conductive materials. The pads 130 of the peripheral area BA are engaged. Therefore, the first signal line 121 and the second signal line 122 can transmit the aforementioned capacitance change signal to the chip on the chip-on-film COF through the pad 130 to calculate the coordinates of the contact occurrence point.

In other embodiments, the touch display device 10 may include a plurality of switch elements located in the display area AA. The switching element is, for example, a thin film transistor composed of a gate, a semiconductor channel, a source and a drain, and the first signal line 121 can be connected to the gate of the switching element as a scan line, while the second signal line 122 can be connected to the switch The source of the element is used as a data line. Similarly, when the touch display device 10 performs a display operation, the chip on the chip on film COF can transmit signals through the pads 130 and the first signal line 121 to turn on or off the switch element, and when the switch element is turned on, the switch element can be turned on or off. The signal transmitted to the source of the switching element through the pad 130 and the second signal line 122 is transmitted to the drain of the switching element.

The pads 130 of the touch display device 10 may have a single-layer or multi-layer structure. 1C, in this embodiment, the pad 130 has a double-layer structure, and includes a first conductive layer 131 and a second conductive layer 132, wherein the second conductive layer 132 covers the first conductive layer 131, but the present invention does not This is the limit. For example, the first conductive layer 131 may belong to the same film layer as the first signal line 121 or the second signal line 122, and include the same material as the first signal line 121 or the second signal line 122, such as aluminum, molybdenum , titanium and other metals with good electrical conductivity.

In this embodiment, the first signal line 121 and the second signal line 122 respectively extend from the display area AA to the peripheral area BA, and the first signal line 121 and the second signal line 122 are electrically connected to the pads 130 respectively. In some embodiments, the first signal line 121 and the second signal line 122 can be respectively electrically connected to the first conductive layer 131 of the pad 130 . In some embodiments, the first conductive layer 131 and the first signal line 121 may belong to the same film layer, and the first signal line 121 is physically connected to the first conductive layer 131 of the pad 130 , while the second signal line 122 is transmitted through Other conductive structures or conductive elements are electrically connected to the pads 130 . In some embodiments, the first conductive layer 131 and the second signal line 122 may belong to the same film layer, and the second signal line 122 is physically connected to the first conductive layer 131 of the pad 130 , and the first signal line 121 is transmitted through Other conductive structures or conductive elements are electrically connected to the pads 130 . In some embodiments, the first conductive layer 131 may belong to a part of the first signal line 121 or the second signal line 122 , for example, the ends of the first signal line 121 and the second signal line 122 in the peripheral area BA may serve as the first signal line Conductive layer 131 .

In some embodiments, the material of the second conductive layer 132 may be a metal oxide, so as to protect the first conductive layer 131 from being corroded by an etchant in the subsequent etching process. For example, the material of the second conductive layer 132 may be indium tin oxide, indium zinc oxide, indium gallium zinc oxide or other transparent conductive materials, but the invention is not limited thereto.

The flat portion 141 of the protective layer 140 may be located in the display area AA and the peripheral area BA. In the display area AA, the flat portion 141 may cover the signal lines 120 , touch driving electrodes Tx and touch sensing electrodes Rx and other components, and in the peripheral area BA, the flat portion 141 may surround the ring hole portion 142 . The flat portion 141 has sufficient thickness and hardness to protect the above-mentioned components located in the display area AA and the pads 130 located in the peripheral area BA from being scratched or damaged during the manufacturing process. For example, when the touch display device 10 is transported by a conveying roller (Roller), the protective layer 140 may be in contact with the roller. At this time, the flat portion 141 can support the roller so that the roller cannot touch the ring hole portion 142 . , the roller naturally cannot touch the contact pad 130 , so as to protect the contact pad 130 from being scratched by the roller.

The through holes TH of the protection layer 140 expose the pads 130 so that the pads 130 can be bonded with other components. However, the depth D1 of the through hole TH cannot be too large, so that the conductive particles in the conductive adhesive AD can electrically connect the pad 130 and the lead LD. Therefore, the ring hole portion 142 with a lower height is used as the side wall of the through hole TH, that is, the through hole TH is formed in the ring hole portion 142 . In some embodiments, the depth D1 of the through hole TH is approximately equal to the difference between the second height H2 of the annular hole portion 142 and the height H3 of the pad 130 , and the depth D1 is preferably less than or equal to 0.8 μm, for example, the depth D1 may be 0.8 μm, 0.6 μm or 0.4 μm, but the present invention is not limited thereto.

On the other hand, the ring hole portion 142 can cover the periphery of the pad 130 to protect the periphery of the pad 130 from being corroded by the process or test environment. For example, in this embodiment, the second conductive layer 132 completely covers the first conductive layer 131 , and the ring hole portion 142 completely covers the periphery of the second conductive layer 132 . In some embodiments, the ring hole portion 142 can also completely overlap the periphery of the first conductive layer 131 and the periphery of the second conductive layer 132 .

In some embodiments, the protective layer 140 may include an organic insulating layer suitable for Ultra High Aperture (UHA). For example, the material of the protective layer 140 may include transparent insulating materials, such as organic materials, acrylic materials, siloxane materials, polyimide materials, epoxy resins ) materials, etc., but the present invention is not limited thereto. The flat portion 141 , the annular portion 142 and the through hole TH of the protective layer 140 may be exposed by a phase shift mask, a half tone mask or a gray tone mask. The development process and the subsequent curing process are formed. That is to say, after one exposure process, the insulating material can be formed into different exposure levels of the highly exposed part, the half-exposed part and the unexposed part, and after the developing process, the insulating material can be patterned into flat parts 141, rings 141 with different heights The hole portion 142 and the protective layer 140 of the through hole TH. After developing, a curing procedure may be performed to make the structure of the protective layer 140 dense and solid.

2A to 2D continue to describe other embodiments of the present invention; and, the element numbers and related content of the embodiment of FIG. 1A to FIG. 1C are followed, wherein the same or similar reference numerals are used to represent the same or similar elements. , and the description of the same technical content is omitted. For the description of the omitted part, reference may be made to the embodiments of FIGS. 1A to 1C , which will not be repeated in the following description.

FIG. 2A is a schematic top view of a touch display device 20 according to an embodiment of the present invention. Fig. 2B is a schematic cross-sectional view taken along the section line C-C' of Fig. 2A. Fig. 2C is a schematic cross-sectional view taken along the section line D-D' of Fig. 2A. Fig. 2D is a schematic cross-sectional view taken along section line E-E' of Fig. 2A.

Compared with the touch display device 10 shown in FIGS. 1A to 1C , the difference between the touch display device 20 shown in FIGS. 2A to 2D is that an insulating layer is further included between the protective layer 140 and the signal line 120 . I1 , and the pad 230 includes a first conductive layer 231 , an insulating layer I1 , a second conductive layer 232 and a third conductive layer 233 .

Referring to FIGS. 2A to 2D at the same time, in this embodiment, the protection layer 140 has a through hole TH overlapping the pad 230 , and includes a flat portion 141 and a ring hole portion 142 . The protective layer 140 is located on the insulating layer I1 , and the insulating layer I1 is located between the first conductive layer 231 and the second conductive layer 232 . The insulating layer I1 has an opening O1, and the second conductive layer 232 can be connected to the first conductive layer 231 through the opening O1. The insulating layer I1 can be formed by a high temperature process, for example, the insulating layer I1 can be formed by a chemical vapor deposition (CVD) process above 200°C. The material of the insulating layer I1 may include transparent insulating materials, such as silicon oxide, silicon nitride, silicon oxynitride, and the like. Therefore, the structure of the touch display device 20 is similar to the structure formed by the touch element manufacturing process performed before the color filter substrate and the pixel array substrate are laminated.

In this embodiment, the first conductive layer 231 and the first signal line 121 may belong to the same film layer, and the second conductive layer 232 and the second signal line 122 may belong to the same film layer, but the invention is not limited thereto. In some embodiments, the second signal line 122 can be connected to the transfer wire 122T through the through hole V1 in the insulating layer I1, the transfer wire 122T is electrically connected to the first conductive layer 231 of the pad 230, and the transfer wire Both the 122T and the first conductive layer 231 and the first signal line 121 belong to the same film layer, while the second signal line 122 and the first signal line 121 belong to different film layers. In this way, the transfer wire 122T can electrically connect the second signal wire 122 and the first conductive layer 231 of the pad 230 . In some embodiments, the first conductive layer 231 and the second conductive layer 232 may include metals with good conductivity, such as aluminum, molybdenum, titanium, and the like.

The material of the third conductive layer 233 can be metal oxide, so as to protect the second conductive layer 232 and the first conductive layer 231 from being corroded by the etchant in the subsequent etching process. For example, the material of the third conductive layer 233 can be indium tin oxide, indium zinc oxide, indium gallium zinc oxide or other transparent conductive materials, but the invention is not limited to this.

FIG. 3 is a flowchart of the manufacturing method of the touch display device 20 shown in FIG. 2A . 2A to 2D and FIG. 3 at the same time, in step S11 , the first signal line 121 , the first conductive layer 231 and the transfer wire 122T are formed on the substrate 110 , wherein the first signal line 121 is electrically connected to the first conductive line layer 231 , and the transfer wire 122T is electrically connected to the first conductive layer 231 . In this step, a plurality of touch driving electrodes Tx can also be formed at the same time. Next, in step S12 , an insulating layer I1 having an opening O1 and a through hole V1 is formed on the substrate 110 , the opening O1 overlaps the first conductive layer 231 , and the through hole V1 overlaps the transfer wire 122T. Next, in step S13, the second signal line 122 and the second conductive layer 232 are formed on the substrate 110, wherein the second signal line 122 overlaps the through hole V1, and the second signal line 122 can be electrically connected and transferred through the through hole V1 The wire 122T; the second conductive layer 232 overlaps the opening O1, and the second conductive layer 232 can be electrically connected to the first conductive layer 231 through the opening O1. In this step, a plurality of touch sensing electrodes Rx can also be formed at the same time, and the signal line 120 includes a first signal line 121 and a second signal line 122 . Next, in step S14 , a third conductive layer 233 is formed on the second conductive layer 232 , and the pad 230 includes the first conductive layer 231 , the insulating layer I1 , the second conductive layer 232 and the third conductive layer 233 . Next, in step S15 , a protective layer 140 is formed on the signal lines 120 and the pads 230 using, for example, a half tone mask, and the protective layer 140 may include a flat portion 141 and a ring hole portion 142 . The first height H1 is greater than the second height H2 of the annular hole portion 142 , and the annular hole portion 142 has the through hole TH overlapping the pad 230 . In this way, through the structural design of the flat portion 141 , the annular portion 142 and the through hole TH with different heights, it is possible to prevent the signal line 120 and the pad 230 and other components from being fabricated when the pad 230 has a structure suitable for bonding. It is scratched during the process, so that the touch display device 20 has improved scratch resistance.

FIG. 4A is a schematic top view of a touch display device 30 according to an embodiment of the present invention. Fig. 4B is a schematic cross-sectional view taken along the section line F-F' of Fig. 4A. Fig. 4C is a schematic cross-sectional view taken along the section line G-G' of Fig. 4A. Fig. 4D is a schematic cross-sectional view taken along the section line H-H' of Fig. 4A. FIG. 4E is an enlarged schematic view of the area I of the touch display device 30 of FIG. 4A .

Compared with the touch display device 10 shown in FIGS. 1A to 1C , the touch display device 30 shown in FIGS. 4A to 4E is different in that the first signal line 321 and the second signal line of the signal line 320 are different. The wires 322 are respectively bridged to the pads 330 through the transparent wires 351 and 352; the flat portion 341 of the protective layer 340 includes the organic insulating layer I2 and the organic protective layer I3, and the ring hole portion 342 of the protective layer 340 includes the organic protective layer I3; and the organic insulating layer I2 is sandwiched between the film layer forming the first signal line 321 and the film layer forming the second signal line 322 .

Referring to FIGS. 4A to 4E at the same time, in this embodiment, the pad 330 may include a double-layer structure in which the first conductive layer 331 and the second conductive layer 332 are stacked, and the first conductive layer 331 and the first signal line 321 They may belong to the same film layer, and the second conductive layer 332 and the second signal line 322 may belong to the same film layer. In some embodiments, the pads 330 may also have a single-layer structure similar to the aforementioned first conductive layer 131 . In other embodiments, the pad 330 may also have a structure in which three or more conductive layers are stacked.

In this embodiment, the first signal line 321 is structurally separated from the pad 330 , and the second signal line 322 is structurally separated from the pad 330 . In addition, the transparent wire 351 covers the wide end portion E1 of the first signal wire 321 and the pad 330 , and the transparent wire 351 bridges the wide end portion E1 and the pad 330 , that is, the first signal wire 321 is bridged by the transparent wire 351 Pad 330. At the same time, the transparent wire 352 covers the wide end portion E2 of the second signal wire 322 and the pad 330 , and the transparent wire 352 bridges the wide end portion E2 and the pad 330 , that is, the second signal wire 322 is bridged by the transparent wire 352 Pad 330. In some embodiments, the end wide portions E1 and E2 may respectively include a single-layer or multi-layer structure, such as a multi-layer conductive layer stacked structure. Furthermore, the through hole TH only overlaps the central portion of the pad 330 , and the ring hole portion 342 of the protective layer 340 overlaps the peripheral edge of the pad 330 . By covering the peripheral edge of the pad 330 and the transparent wires 351 and 352 by the ring hole portion 342 of the protective layer 340 , the pad 330 can be protected from being corroded by the process or test environment.

Referring to FIG. 4E , in some embodiments, the line width X1 of the end width portion E2 of the second signal line 322 is greater than the line width X0 of the second signal line 322 in the display area AA, so that the second signal line can be increased The contact area between the second signal line 322 and the transparent wire 352 reduces the contact resistance between the second signal wire 322 and the transparent wire 352 , thereby improving the current stress resistance of the second signal wire 322 . Similarly, the line width of the end width portion E1 of the first signal line 321 is also larger than the line width of the first signal line 321 in the display area AA.

In some embodiments, the line width X1 of the end width portion E2 of the second signal line 322 may be smaller than the line width X2 of the transparent wire 352 , so that the transparent wire 352 can completely cover the end width portion E2 of the second signal wire 322 . In some embodiments, the difference between the line width X2 of the transparent wire 352 and the line width X1 of the end width portion E2 may be greater than or equal to 6 μm, that is, X2−X1≧6 μm, for example, X2−X1=6 μm, X2 -X1=8 μm or X2-X1=10 μm, to ensure that the transparent wire 352 can completely cover the end width portion E2 of the second signal wire 322 . Similarly, the line width of the end width portion E1 of the first signal line 321 may also be smaller than the line width of the transparent wire 351 , and the difference between the line width of the transparent wire 351 and the line width of the end width portion E1 may also be greater than or equal to 6 μm .

4A and 4E at the same time, in some embodiments, the touch display device 30 further includes a polarizer 360, and the polarizer 360 covers, for example, the touch driving electrodes Tx, the touch sensing electrodes Rx, the first signal lines 321, The second signal line 322 and part of the transparent wires 351 and 352 . Based on the attachment accuracy of the polarizer 360 and the film shrinkage after the reliability test, the distance Y between the end width E2 of the second signal line 322 and the edge of the polarizer 360 may be greater than or equal to 500 μm, for example, the distance Y may be 500 μm. μm, 800 μm or 1,200 μm, to ensure that the polarizer 360 can completely cover the wide end portion E2 and avoid visual disturbance caused by light reflection of the second signal line 322 , especially the wide end portion E2 . Similarly, the distance between the end width portion E1 of the first signal line 321 and the edge of the polarizer 360 can also be greater than or equal to 500 μm.

The protective layer 340 includes an organic material. For example, in this embodiment, the flat portion 341 of the protective layer 340 includes an organic insulating layer I2 and an organic protective layer I3, and the ring hole portion 342 of the protective layer 340 includes an organic protective layer I3. The organic insulating layer I2 and the organic protective layer I3 can be formed by a low temperature process. For example, the organic insulating layer I2 and the organic protective layer I3 can be formed by a spin coating process below 200°C. Therefore, the structure of the touch display device 30 is similar to the structure formed by the touch element manufacturing process after the color filter substrate and the pixel array substrate are laminated.

The material of the organic insulating layer I2 can include various dielectric polymers, such as vinyl polymers obtained by polymerizing one or more acyclic vinyl monomers, polymers derived from one or more vinyl phenol monomers (such as , poly-4-vinylphenol (PVP)), or a copolymer of vinylphenol or vinylphenol derivatives with at least one other vinyl monomer. Examples of the aforementioned non-cyclic vinyl monomers include ethylene, propylene, butadiene, styrene, vinylphenol, vinyl chloride, vinyl acetate, acrylates (eg, methacrylate, methyl methacrylate, acrylic acid, methacrylic acid, acrylamide), acrylonitrile and its derivatives. The above vinyl monomers may be acrylic monomers, such as methyl methacrylate, methacrylate, acrylic acid, methacrylic acid, acrylamide or derivatives thereof.

The material of the organic protective layer I3 may include a polymer with a hydroxyl side chain to react with a carboxylic acid or a derivative thereof containing (vinylidene or)diene. For example, the organic protective layer I3 may include poly(2-hydroxyethyl methacrylate), poly(vinyl phenol), poly(vinyl alcohol), and copolymers thereof, such as poly(vinyl alcohol-co-ethylene) or poly(vinyl alcohol-co-ethylene) (vinyl phenol/methyl methacrylate) etc.

FIG. 5 is a flowchart of a manufacturing method of the touch display device 30 of FIG. 4A . In step S21 , the first signal line 321 and the first conductive layer 331 are formed on the substrate 110 . In this step, a plurality of touch driving electrodes Tx can also be formed at the same time. Next, in step S22 , an organic insulating layer I2 is formed on the substrate 110 . Next, in step S23 , the second signal line 322 and the second conductive layer 332 are formed on the substrate 110 . In this step, a plurality of touch sensing electrodes Rx can also be formed at the same time. Next, in step S24 , the transparent wires 351 and 352 are formed, wherein the transparent wires 351 cover the end width portion E1 of the first signal wire 321 and the second conductive layer 332 , and the transparent wire 352 covers the end width portion E2 of the second signal wire 322 and The second conductive layer 332 . Next, in step S25 , an organic protective layer I3 is formed on the substrate 110 , and the organic protective layer I3 has through holes TH overlapping the second conductive layer 332 . In this way, through the structural design of the flat portion 341 , the annular portion 342 and the through hole TH with different heights, it is possible to avoid the signal line 320 and the pad 330 and other components from being fabricated when the pad 330 has a structure suitable for bonding. It is scratched during the process, so that the touch display device 30 has improved scratch resistance.

To sum up, in the touch display device according to the embodiment of the present invention, the depth of the through hole is controlled by using the ring hole portion with the smaller height in the protective layer, which can facilitate the bonding of the pads. At the same time, by covering the signal line and surrounding the ring hole with the larger flat portion in the protective layer, the signal line and the pad can be prevented from being scratched during the manufacturing process, so that the touch display device has improved scratch resistance. In addition, by covering the peripheral edge of the pad with the ring hole portion, the peripheral edge of the pad can be protected from being corroded by the manufacturing process or the test environment. In addition, using the signal line with the widened end width to connect the transparent wire for bridging the pad can improve the current stress resistance of the signal line.

Although the present invention has been disclosed above by the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.

10, 20, 30: touch display device 110: Substrate 120, 320: signal line 121, 321: The first signal line 122, 322: The second signal line 122T: transfer wire 130, 230, 330: pads 131, 231, 331: the first conductive layer 132, 232, 332: the second conductive layer 140, 340: protective layer 141, 341: Flat part 142, 342: Ring hole 233: the third conductive layer 351, 352: Transparent wire 360: polarizer AA: display area A-A', B-B', C-C', D-D', E-E', F-F', G-G', H-H': hatching AD: Conductive Adhesive BA: Surrounding area COF: Chip On Film D1: depth E1: end wide part E2: end wide part H1: first height H2: second height H3: height I: area I1: insulating layer I2: organic insulating layer I3: organic protective layer LD: pin O1: Opening Rx: touch sensing electrode S11, S12, S13, S14, S15: Steps S21, S22, S23, S24, S25: Steps TH: through hole Tx: touch drive electrode V1: Through hole X0, X1, X2: Line width Y: distance

FIG. 1A is a schematic top view of a touch display device 10 according to an embodiment of the present invention. Fig. 1B is a schematic cross-sectional view taken along the section line A-A' of Fig. 1A. Fig. 1C is a schematic cross-sectional view taken along the section line B-B' of Fig. 1A. FIG. 2A is a schematic top view of a touch display device 20 according to an embodiment of the present invention. Fig. 2B is a schematic cross-sectional view taken along the section line C-C' of Fig. 2A. Fig. 2C is a schematic cross-sectional view taken along the section line D-D' of Fig. 2A. Fig. 2D is a schematic cross-sectional view taken along section line E-E' of Fig. 2A. FIG. 3 is a flowchart of the manufacturing method of the touch display device 20 shown in FIG. 2A . FIG. 4A is a schematic top view of a touch display device 30 according to an embodiment of the present invention. Fig. 4B is a schematic cross-sectional view taken along the section line F-F' of Fig. 4A. Fig. 4C is a schematic cross-sectional view taken along the section line G-G' of Fig. 4A. Fig. 4D is a schematic cross-sectional view taken along the section line H-H' of Fig. 4A. FIG. 4E is an enlarged schematic view of the area I of the touch display device 30 of FIG. 4A . FIG. 5 is a flowchart of a manufacturing method of the touch display device 30 of FIG. 4A .

110: Substrate

130: Pad

131: the first conductive layer

132: the second conductive layer

140: protective layer

141: Flat part

142: Ring hole part

AD: Conductive Adhesive

LD: pin

COF: Chip On Film

D1: depth

H1: first height

H2: second height

H3: height

TH: through hole

Claims (15)

A touch display device has a display area and a peripheral area, and includes: a substrate; a signal line located on the substrate and extending from the display area to the peripheral area; a pad located in the peripheral area, and electrically connected to the signal line; and a protective layer, located on the signal line and the pad, having a through hole overlapping the pad, and including a flat portion and a ring hole portion, wherein the flat portion surrounds The annular hole portion has a first height, the annular hole portion constitutes a sidewall of the through hole and has a second height, and the first height is greater than the second height. The touch display device according to claim 1, wherein a difference between the second height and the height of the pad is less than or equal to 0.8 μm. The touch display device according to claim 1, wherein the pads comprise a single-layer or multi-layer structure. The touch display device according to claim 3, wherein the pads include a first conductive layer and a second conductive layer, the second conductive layer completely covers the first conductive layer, and all of the through holes The sidewalls completely cover the periphery of the second conductive layer. The touch display device of claim 4, wherein the signal line includes a first signal line and a second signal line, and the first conductive layer and the first signal line The signal line belongs to the same film layer, and the second conductive layer and the second signal line belong to the same film layer. The touch display device of claim 5, further comprising a transfer wire, wherein the transfer wire electrically connects the second signal line and the first conductive layer, and the transfer wire and the The first signal lines belong to the same film layer. The touch display device of claim 6, wherein the second signal line is electrically connected to the transfer wire through a through hole. The touch display device of claim 1, wherein the protective layer is formed by a phase-transfer mask, a half-tone mask, or a grayscale mask. The touch display device according to claim 1, wherein the signal line is structurally separated from the pad. The touch display device according to claim 9, wherein the signal lines bridge the pads through transparent wires. The touch display device of claim 10, wherein the protective layer comprises an organic material. The touch display device of claim 10, wherein the signal line includes an end width portion overlapping the transparent wire, and the line width of the end width portion is smaller than that of the transparent wire. The touch display device according to claim 12, wherein the difference between the line width of the transparent wire and the line width of the end width portion is greater than or equal to 6 μm. The touch display device of claim 12, wherein a line width of the end width portion is larger than a line width of the signal line in the display area. The touch display device according to claim 12, further comprising a polarizer covering the signal line and part of the transparent wire, and the distance between the wide end portion and the edge of the polarizer is greater than or equal to 500 μm.

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