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TWI759381B - 稀釋液製造裝置及稀釋液製造方法 - Google Patents

稀釋液製造裝置及稀釋液製造方法 Download PDF

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Publication number
TWI759381B
TWI759381B TW106143852A TW106143852A TWI759381B TW I759381 B TWI759381 B TW I759381B TW 106143852 A TW106143852 A TW 106143852A TW 106143852 A TW106143852 A TW 106143852A TW I759381 B TWI759381 B TW I759381B
Authority
TW
Taiwan
Prior art keywords
liquid
tank
pressure
diluent
piping
Prior art date
Application number
TW106143852A
Other languages
English (en)
Chinese (zh)
Other versions
TW201838710A (zh
Inventor
山下幸福
森野翔太
山中弘次
Original Assignee
日商奧璐佳瑙股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2016254939A external-priority patent/JP6777534B2/ja
Priority claimed from JP2016254938A external-priority patent/JP6777533B2/ja
Priority claimed from JP2016254940A external-priority patent/JP6738726B2/ja
Application filed by 日商奧璐佳瑙股份有限公司 filed Critical 日商奧璐佳瑙股份有限公司
Publication of TW201838710A publication Critical patent/TW201838710A/zh
Application granted granted Critical
Publication of TWI759381B publication Critical patent/TWI759381B/zh

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00—Dissolving
    • B01F21/20—Dissolving using flow mixing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00—Dissolving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B01F23/405—Methods of mixing liquids with liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/22—Control or regulation
    • B01F35/221—Control or regulation of operational parameters, e.g. level of material in the mixer, temperature or pressure
    • B01F35/2213—Pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00—Feed or outlet devices; Feed or outlet control devices
    • H10P52/00—

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Accessories For Mixers (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
TW106143852A 2016-12-28 2017-12-14 稀釋液製造裝置及稀釋液製造方法 TWI759381B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2016-254940 2016-12-28
JP2016254939A JP6777534B2 (ja) 2016-12-28 2016-12-28 希釈液製造装置および希釈液製造方法
JP2016254938A JP6777533B2 (ja) 2016-12-28 2016-12-28 希釈液製造装置および希釈液製造方法
JP2016254940A JP6738726B2 (ja) 2016-12-28 2016-12-28 希釈液製造装置および希釈液製造方法
JP2016-254938 2016-12-28
JP2016-254939 2016-12-28

Publications (2)

Publication Number Publication Date
TW201838710A TW201838710A (zh) 2018-11-01
TWI759381B true TWI759381B (zh) 2022-04-01

Family

ID=62707982

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106143852A TWI759381B (zh) 2016-12-28 2017-12-14 稀釋液製造裝置及稀釋液製造方法

Country Status (4)

Country Link
KR (1) KR102275626B1 (ja)
CN (1) CN109890494B (ja)
TW (1) TWI759381B (ja)
WO (1) WO2018123193A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109761334A (zh) * 2019-01-30 2019-05-17 郭修斌 按需调控溶液浓度的装置、方法以及矿物质水机、苏打水机和加药罐
CN111550673B (zh) * 2020-04-15 2022-04-19 北京航天试验技术研究所 一种多贮罐并联加注装置
WO2025239042A1 (ja) * 2024-05-17 2025-11-20 栗田工業株式会社 洗浄水製造装置及び洗浄水製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW352451B (en) * 1996-12-23 1999-02-11 Samsung Electron Co Ltd Automatic thinner supplying apparatus and method for semiconductor manufacturing process
JPH1170328A (ja) * 1997-08-29 1999-03-16 Urutora Clean Technol Kaihatsu Kenkyusho:Kk 薬液定量注入装置および方法
TW392238B (en) * 1997-08-21 2000-06-01 Fujitsu Ltd Apparatus and method for supplying chemicals
JP2005175183A (ja) * 2003-12-11 2005-06-30 Kitz Sct:Kk 液体加圧機構及びこれを用いた液体制御装置と液体制御方法
JP2015158399A (ja) * 2014-02-24 2015-09-03 スガ試験機株式会社 耐候性試験機および希釈溶液供給装置
WO2016042933A1 (ja) * 2014-09-16 2016-03-24 オルガノ株式会社 希釈液製造方法および希釈液製造装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3723658B2 (ja) * 1997-03-21 2005-12-07 日機装株式会社 自動希釈装置
JP5001757B2 (ja) * 2007-08-31 2012-08-15 シーケーディ株式会社 流体混合システム及び流体混合装置
CN204346804U (zh) * 2014-12-10 2015-05-20 武汉市天虹仪表有限责任公司 用于气体样品的可控压力的动态稀释装置
CN204986420U (zh) * 2015-07-07 2016-01-20 深圳市华尔信环保科技有限公司 一种化学品供应系统

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW352451B (en) * 1996-12-23 1999-02-11 Samsung Electron Co Ltd Automatic thinner supplying apparatus and method for semiconductor manufacturing process
TW392238B (en) * 1997-08-21 2000-06-01 Fujitsu Ltd Apparatus and method for supplying chemicals
JPH1170328A (ja) * 1997-08-29 1999-03-16 Urutora Clean Technol Kaihatsu Kenkyusho:Kk 薬液定量注入装置および方法
JP2005175183A (ja) * 2003-12-11 2005-06-30 Kitz Sct:Kk 液体加圧機構及びこれを用いた液体制御装置と液体制御方法
JP2015158399A (ja) * 2014-02-24 2015-09-03 スガ試験機株式会社 耐候性試験機および希釈溶液供給装置
WO2016042933A1 (ja) * 2014-09-16 2016-03-24 オルガノ株式会社 希釈液製造方法および希釈液製造装置

Also Published As

Publication number Publication date
CN109890494A (zh) 2019-06-14
TW201838710A (zh) 2018-11-01
WO2018123193A1 (ja) 2018-07-05
KR102275626B1 (ko) 2021-07-09
KR20190077501A (ko) 2019-07-03
CN109890494B (zh) 2021-10-19

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