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TWI759381B - Diluted solution producing device and diluted solution producing method - Google Patents

Diluted solution producing device and diluted solution producing method Download PDF

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TWI759381B
TWI759381B TW106143852A TW106143852A TWI759381B TW I759381 B TWI759381 B TW I759381B TW 106143852 A TW106143852 A TW 106143852A TW 106143852 A TW106143852 A TW 106143852A TW I759381 B TWI759381 B TW I759381B
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liquid
tank
pressure
diluent
piping
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TW106143852A
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TW201838710A (en
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山下幸福
森野翔太
山中弘次
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日商奧璐佳瑙股份有限公司
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Priority claimed from JP2016254939A external-priority patent/JP6777534B2/en
Priority claimed from JP2016254938A external-priority patent/JP6777533B2/en
Priority claimed from JP2016254940A external-priority patent/JP6738726B2/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00Dissolving
    • B01F21/20Dissolving using flow mixing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00Dissolving
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40Mixing liquids with liquids; Emulsifying
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40Mixing liquids with liquids; Emulsifying
    • B01F23/405Methods of mixing liquids with liquids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20Measuring; Control or regulation
    • B01F35/22Control or regulation
    • B01F35/221Control or regulation of operational parameters, e.g. level of material in the mixer, temperature or pressure
    • B01F35/2213Pressure
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80Forming a predetermined ratio of the substances to be mixed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J4/00Feed or outlet devices; Feed or outlet control devices
    • H10P52/00

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Accessories For Mixers (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)

Abstract

A diluted solution producing device 10 according to this invention comprises a first pipe 11 for supplying first liquid, a first tank 12a for storing second liquid, a second pipe 13 for connecting the first tank 12a and the first pipe 11, a pressure adjustment section 18 for adjusting the pressure within the first tank 12a, the pressure adjustment section 18 pumping the second liquid within the first tank 12a through the second pipe 13 so as to supply the second liquid to the first pipe 11, a control section 20 that adjusts the added amount of the second liquid to the first liquid performed by the pressure adjustment section 18 based on measured values of the flow rate and concentration of the first liquid or the diluted solution flowing in the first pipe 11 so as to change the concentration of the diluted solution into a prescribed concentration, and a second tank 12b serially connected to the first tank 12a for temporarily storing the second liquid to be supplemented to the first tank 12a.

Description

稀釋液製造裝置及稀釋液製造方法Diluent production device and diluent production method

本發明關於稀釋液製造裝置及稀釋液製造方法。The present invention relates to a dilution liquid manufacturing apparatus and a dilution liquid manufacturing method.

自以往,在半導體器件、液晶器件之製造程序中,就將半導體晶圓、玻璃基板等電子部件予以洗淨的洗淨液而言,係使用已高度除去雜質之超純水。已知使用如此之超純水的洗淨中,由於使用高電阻率值之超純水,洗淨時容易產生靜電,會有導致絕緣膜靜電破壞、微粒再附著之虞。因此,近年來為了將電阻率值(導電率)調整成預定之範圍,並抑制靜電的產生,係使用藉由在超純水中高精度地添加氨水、碳酸水等藥液而調整成預定之濃度的稀釋液。Conventionally, in the manufacturing process of semiconductor devices and liquid crystal devices, ultrapure water from which impurities have been highly removed has been used as a cleaning solution for cleaning electronic components such as semiconductor wafers and glass substrates. It is known that in cleaning using such ultrapure water, since ultrapure water having a high resistivity value is used, static electricity is easily generated during cleaning, which may lead to electrostatic breakdown of the insulating film and reattachment of particles. Therefore, in recent years, in order to adjust the resistivity value (conductivity) to a predetermined range and suppress the generation of static electricity, a chemical solution such as ammonia water and carbonated water is added to ultrapure water with high precision and adjusted to a predetermined concentration. diluent.

作為如此之稀釋液之製造裝置,專利文獻1中記載了一種製造裝置,具有:供給超純水的第1配管、儲存藥液的槽、將槽與第1配管予以連接的第2配管、調整槽內之壓力的壓力調整器;該製造裝置藉由壓力調整器將槽內之藥液壓送通過第2配管,並添加至第1配管內之超純水,而製造稀釋液。根據該製造裝置,藉由依據超純水或稀釋液之流量與稀釋液之濃度的測定值適當控制槽內之壓力,可高精度地調整藥液的添加量,其結果能製造已調整成預定濃度之稀釋液。 [先前技術文獻] [專利文獻]As an apparatus for producing such a diluent, Patent Document 1 describes a production apparatus including a first pipe for supplying ultrapure water, a tank for storing the chemical solution, a second pipe for connecting the tank and the first pipe, adjustment A pressure regulator for the pressure in the tank; this manufacturing device produces a diluent by sending the chemical in the tank through the second pipe and adding it to the ultrapure water in the first pipe using the pressure regulator. According to this manufacturing apparatus, by appropriately controlling the pressure in the tank according to the measured value of the flow rate of the ultrapure water or the diluent and the concentration of the diluent, the addition amount of the chemical solution can be adjusted with high precision, and as a result, the production can be adjusted to a predetermined level. concentration of diluent. [Prior Art Literature] [Patent Literature]

[專利文獻1]國際公開第2016/042933號[Patent Document 1] International Publication No. 2016/042933

[發明所欲解決之課題] 就稀釋液之製造裝置而言,將所製造之稀釋液使用於半導體晶圓、玻璃基板等電子部件之洗淨時,要求持續且穩定地製造已調整成預定濃度之稀釋液並供給至使用端。但,專利文獻1記載之製造裝置中,當槽內之藥液用罄時,需停止裝置的運轉,將槽內的壓力釋放並補充藥液,或更換成填充有藥液的另一個槽。如此情形下,裝置的運轉再開後需要時間使所製造之稀釋液的濃度穩定。又,考量裝置持續地運轉的觀點,也有人考慮在槽內之藥液用罄前,邊繼續從槽供給藥液邊對相同的槽中補充藥液。但,就如此之補充方法而言,從槽供給藥液係利用加壓用氣體將槽內控制成加壓狀態而進行,故隨著槽內的壓力控制之紊亂,導致所製造之稀釋液的濃度變得不穩定。[Problem to be Solved by the Invention] In the case of a production apparatus for a dilution liquid, when the produced dilution liquid is used for cleaning electronic components such as semiconductor wafers and glass substrates, it is required to continuously and stably produce a predetermined concentration adjusted The diluent is supplied to the end of use. However, in the manufacturing apparatus described in Patent Document 1, when the chemical solution in the tank is used up, the operation of the apparatus needs to be stopped, the pressure in the tank is released, and the chemical liquid needs to be replenished, or it needs to be replaced with another tank filled with the chemical liquid. In such a case, it takes time to stabilize the concentration of the produced diluent after restarting the operation of the apparatus. In addition, considering the viewpoint of the continuous operation of the apparatus, it is also considered to replenish the chemical liquid in the same tank while the chemical liquid is continuously supplied from the tank until the chemical liquid in the tank is used up. However, in such a replenishing method, the supply of the chemical solution from the tank is performed by controlling the inside of the tank to be in a pressurized state with a pressurizing gas. Therefore, the produced diluent will be disturbed due to the disturbance of the pressure control in the tank. The concentration becomes unstable.

因此,本發明之目的在於提供能持續且穩定地製造已調整成預定濃度之稀釋液的稀釋液製造裝置及稀釋液製造方法。 [解決課題之手段]Therefore, the objective of this invention is to provide the dilution liquid manufacturing apparatus and the dilution liquid manufacturing method which can continuously and stably manufacture the dilution liquid adjusted to predetermined density|concentration. [Means of Solving Problems]

為了達成上述目的,本發明之稀釋液製造裝置,係藉由對於第1液體添加第2液體,以製造第2液體之稀釋液,並將稀釋液供給至使用端;並具有:第1配管,供給第1液體;第1槽,儲存第2液體;第2配管,將第1槽與第1配管予以連接;壓力調整部,係調整第1槽內之壓力,將第1槽內之第2液體壓送通過第2配管並供給至第1配管;控制部,根據流經第1配管內之第1液體或稀釋液之流量與稀釋液之濃度的測定值,調整利用壓力調整部所為之第2液體對於第1液體的添加量,以使稀釋液之濃度成為預定之濃度。進一步,本發明之稀釋液製造裝置,於其中一態樣中具有與第1槽串聯連接,並暫時儲存待補充到第1槽之第2液體的第2槽,於另一態樣中具有與第1槽並聯連接,並儲存待供給至第1配管而不是第1槽之第2液體的第2槽。In order to achieve the above-mentioned object, the dilution liquid manufacturing apparatus of the present invention produces a dilution liquid of the second liquid by adding the second liquid to the first liquid, and supplies the dilution liquid to the end of use; and has: a first piping, Supply the first liquid; the first tank stores the second liquid; the second piping connects the first tank with the first piping; the pressure adjustment part adjusts the pressure in the first tank, and adjusts the pressure in the first tank to the second liquid in the first tank. The liquid is pressure-fed through the second pipe and supplied to the first pipe; the control unit adjusts the first liquid or the diluent flow through the first pipe according to the measured value of the flow rate of the first liquid or the diluent and the concentration of the diluent. 2. The amount of liquid added to the first liquid so that the concentration of the diluent becomes a predetermined concentration. Further, the dilution liquid manufacturing apparatus of the present invention has, in one aspect, a second tank that is connected in series with the first tank and temporarily stores the second liquid to be replenished to the first tank, and has a second tank that is connected to the first tank in another aspect. The 1st tank is connected in parallel, and the 2nd tank which stores the 2nd liquid to be supplied to the 1st piping instead of the 1st tank.

又,本發明之稀釋液製造方法,係藉由對於第1液體添加第2液體,以製造第2液體之稀釋液,並將稀釋液供給至使用端;並包括下列步驟:將第1液體供給至第1配管;將第2液體供給至第1配管,係調整儲存第2液體之第1槽內的壓力,將第1槽內之第2液體壓送通過將第1槽與第1配管予以連接的第2配管,並供給至第1配管,包括測定流經第1配管內之第1液體或稀釋液之流量與稀釋液之濃度,並根據該測定值調整第2液體對於第1液體的添加量,以使稀釋液之濃度成為預定之濃度。進一步,本發明之稀釋液製造方法,於其中一態樣中包括如下步驟:將第2液體暫時儲存在與第1槽串聯連接之第2槽;根據第1槽內之液位,將儲存於第2槽之第2液體補充到第1槽。於另一態樣中包括如下步驟:將第2液體儲存在與第1槽並聯連接之第2槽;根據第1槽內之液位,從第2槽而不是從第1槽供給第2液體到第1配管。In addition, the method for producing a diluent of the present invention is to produce a diluent of the second liquid by adding the second liquid to the first liquid, and supply the diluent to the end of use; and includes the steps of: supplying the first liquid To the first piping; supply the second liquid to the first piping, adjust the pressure in the first tank where the second liquid is stored, and pressurize the second liquid in the first tank by connecting the first tank and the first piping. Connect the second pipe and supply it to the first pipe, including measuring the flow rate and diluent concentration of the first liquid or diluent flowing through the first pipe, and adjusting the amount of the second liquid to the first liquid according to the measured value. Add the amount so that the concentration of the diluent becomes a predetermined concentration. Further, the method for producing a diluent of the present invention, in one aspect, includes the following steps: temporarily storing the second liquid in a second tank connected in series with the first tank; The second liquid of the second tank is replenished to the first tank. In another aspect comprising the steps of: storing the second liquid in a second tank connected in parallel with the first tank; supplying the second liquid from the second tank instead of the first tank according to the liquid level in the first tank to the first piping.

如此之稀釋液製造裝置及稀釋液製造方法中,藉由使用2個槽,可在其中一個槽用罄之前,從另一個槽補充第2液體到該槽,或切換成另一個槽供給第2液體。藉此,不需要槽的更換作業等、裝置的運轉停止,而可持續穩定地進行稀釋液的製造。 [發明之效果]In such a dilution liquid manufacturing apparatus and dilution liquid manufacturing method, by using two tanks, before one tank is used up, the second liquid can be supplied from the other tank to the tank, or the second liquid can be switched to the other tank to supply the second liquid. liquid. Thereby, the operation of replacing the tank, etc., and the stoppage of the operation of the apparatus are not required, and the production of the diluted solution can be continued stably. [Effect of invention]

以上,根據本發明,可持續且穩定地製造已調整成預定濃度的稀釋液。As described above, according to the present invention, a dilution liquid adjusted to a predetermined concentration can be produced continuously and stably.

以下,參照圖式針對本發明之實施形態進行說明。Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(第1實施形態) 圖1係本發明之第1實施形態之稀釋液製造裝置的概略構成圖。此外,圖示之構成僅係一例,當然可因應裝置之使用目的、用途、要求性能進行適當變更,例如追加閥、過濾器等係不言自明。(1st Embodiment) FIG. 1 is a schematic block diagram of the dilution liquid manufacturing apparatus which concerns on the 1st Embodiment of this invention. In addition, the configuration shown in the figure is only an example, and of course, it can be appropriately changed according to the purpose of use, application, and required performance of the device. For example, it is self-evident that a valve and a filter are added.

稀釋液製造裝置10具有:供給第1液體之第1配管11;儲存第2液體之2個槽12a、12b;將2個槽12a、12b與第1配管11予以連接,並彼此並聯連接的多支第2配管13。第2液體為待稀釋的藥液,第1液體為將第2液體予以稀釋的稀釋介質。故,稀釋液製造裝置10係藉由對於流經第1配管11之第1液體,通過第2配管13添加第2液體,以製造第2液體之稀釋液,並將製得之稀釋液通過第1配管11供給至使用端1。The dilution liquid manufacturing apparatus 10 includes: a first piping 11 for supplying the first liquid; two tanks 12a and 12b for storing the second liquid; The second piping 13 is provided. The second liquid is the medicinal liquid to be diluted, and the first liquid is a dilution medium for diluting the second liquid. Therefore, the dilution liquid manufacturing apparatus 10 produces the dilution liquid of the second liquid by adding the second liquid through the second piping 13 to the first liquid flowing through the first piping 11, and passes the obtained dilution liquid through the second piping 13. 1. The piping 11 is supplied to the use end 1.

就第1液體而言,其種類並無特別限制,可配合利用用途使用超純水、純水、使電解質、氣體溶解而得的水、異丙醇等醇類。又,就第2液體而言,只要是用於待稀釋的目的,其種類並無特別限制,可配合利用用途使用碳酸水、富氫水等使電解質、氣體溶解而得的水;異丙醇等醇類。製造之稀釋液使用於半導體晶圓的洗淨時,使用超純水作為第1液體,並使用氨水溶液作為第2液體較理想。或也可適當使用四甲基氫氧化銨(TMAH)水溶液作為第2液體。此外,此處所稱超純水,係指使用超純水製造裝置將離子及非離子性物質從被處理水(原水)除去而獲得的處理水,具體而言,係指電阻率值為18MΩ・cm以上之處理水。The type of the first liquid is not particularly limited, and alcohols such as ultrapure water, pure water, water obtained by dissolving electrolytes and gases, and isopropyl alcohol can be used according to the application. In addition, as for the second liquid, as long as it is used for the purpose of dilution, its type is not particularly limited, and water obtained by dissolving electrolytes and gases, such as carbonated water, hydrogen-rich water, etc., can be used according to the application; isopropyl alcohol and other alcohols. When the produced diluent is used for cleaning of semiconductor wafers, it is preferable to use ultrapure water as the first liquid and an aqueous ammonia solution as the second liquid. Alternatively, a tetramethylammonium hydroxide (TMAH) aqueous solution may be appropriately used as the second liquid. In addition, the ultrapure water referred to here refers to treated water obtained by removing ions and non-ionic substances from the water to be treated (raw water) using an ultrapure water production apparatus, and specifically refers to a resistivity value of 18MΩ・ Treated water above cm.

2個槽12a、12b彼此並聯連接。亦即,2個槽12a、12b在其出口側分別藉由閥14a、14b與多支第2配管13串聯連接。於多支第2配管13之入口側分別設置閥13a。在2個閥14a、14b與多個閥13a之間設置過濾器F1。此外,也可於2個槽12a、12b之出口側設置三向閥以替代2個閥14a、14b。又,2個槽12a、12b分別藉由閥15a、15b與將第2液體供給至各個槽12a、12b的藥液供給管線(液體供給手段)16連接。在閥15a與槽12a之間、及閥15b與槽12b之間分別設置過濾器F2、F3,於藥液供給管線16設置閥16a。進一步,於2個槽12a、12b分別設置大氣閥(atmospheric valve)17a、17b。此外,也可在2個槽12a、12b之入口側設置三向閥以替代2個閥15a、15b。The two grooves 12a and 12b are connected in parallel with each other. That is, the two grooves 12a, 12b are connected in series with the plurality of second pipes 13 via the valves 14a, 14b, respectively, on the outlet side thereof. Valves 13a are provided on the inlet sides of the plurality of second pipes 13, respectively. A filter F1 is provided between the two valves 14a, 14b and the plurality of valves 13a. In addition, instead of the two valves 14a and 14b, a three-way valve may be provided on the outlet side of the two grooves 12a and 12b. In addition, the two tanks 12a and 12b are connected to a chemical solution supply line (liquid supply means) 16 for supplying the second liquid to each of the tanks 12a and 12b via valves 15a and 15b, respectively. Filters F2 and F3 are provided between the valve 15a and the tank 12a and between the valve 15b and the tank 12b, respectively, and a valve 16a is provided in the chemical solution supply line 16 . Furthermore, atmospheric valves 17a and 17b are provided in the two grooves 12a and 12b, respectively. In addition, instead of the two valves 15a and 15b, a three-way valve may be provided on the inlet side of the two grooves 12a and 12b.

進一步,稀釋液製造裝置10具有調整槽12a、12b內之壓力的壓力調整部18,作為用於將槽12a、12b內之第2液體壓送通過第2配管13並供給至第1配管11的手段。壓力調整部18係由將槽加壓用氣體供給至槽12a、12b內的槽加壓用氣體供給管線18a、及設置於槽加壓用氣體供給管線18a的進排氣機構18b構成。進排氣機構18b由進氣閥18c與排氣閥18d構成,藉由使該等閥打開關閉,可對槽12a、12b內進行加壓或減壓。此外,進排氣機構18b並不限定於圖示之構成,亦即,不限定於進氣加壓機構(進氣閥18c)與排氣減壓機構(排氣閥18d)個別構成者,例如也可為電動氣動調節器(electric pneumatic regulator)等進氣加壓機構與排氣減壓機構構成為一體者。槽加壓用氣體供給管線18a藉由閥19a與其中一個槽(第1槽)12a連接,並藉由閥19b與另一個槽(第2槽)12b連接。又,於槽加壓用氣體供給管線18a設置測定槽加壓用氣體之供給壓力的壓力計19c。槽加壓用氣體的種類並無特別限制,宜使用可相對較輕易地利用之係鈍性氣體的氮氣。惟,製造之稀釋液使用於包括容易被氧化之材料之被處理體的洗淨、清洗時,就槽加壓用氣體而言應避免使用氧氣、空氣。因此,即使使用氮氣等鈍性氣體時,也有可能會受到以雜質的形式含有之氧的影響,故也需要充分考慮其純度。Further, the dilution liquid manufacturing apparatus 10 has a pressure adjusting unit 18 for adjusting the pressure in the tanks 12a and 12b as a means for feeding the second liquid in the tanks 12a and 12b through the second piping 13 and supplying it to the first piping 11 under pressure. means. The pressure adjustment unit 18 includes a tank pressurizing gas supply line 18a for supplying the tank pressurizing gas to the tanks 12a and 12b, and an intake and exhaust mechanism 18b provided in the tank pressurization gas supply line 18a. The intake and exhaust mechanism 18b is constituted by an intake valve 18c and an exhaust valve 18d, and by opening and closing these valves, the inside of the grooves 12a and 12b can be pressurized or depressurized. In addition, the intake and exhaust mechanism 18b is not limited to the configuration shown in the figure, that is, it is not limited to the configuration of the intake air pressurizing mechanism (intake valve 18c) and the exhaust gas decompression mechanism (exhaust valve 18d) individually, for example The intake air pressurizing mechanism such as an electric pneumatic regulator and the exhaust gas decompression mechanism may be integrated. The tank pressurizing gas supply line 18a is connected to one tank (first tank) 12a via a valve 19a, and is connected to the other tank (second tank) 12b via a valve 19b. Moreover, the pressure gauge 19c which measures the supply pressure of the gas for tank pressurization is installed in the gas supply line 18a for tank pressurization. The type of gas used for tank pressurization is not particularly limited, and nitrogen gas, which is a passive gas that can be used relatively easily, is preferably used. However, when the produced diluent is used for cleaning and cleaning of the object to be treated including materials that are easily oxidized, oxygen and air should be avoided as the gas used for tank pressurization. Therefore, even when a passive gas such as nitrogen is used, it may be affected by oxygen contained as an impurity, and its purity needs to be fully considered.

本實施形態中,製造稀釋液之正常運轉時,第2液體從2個槽12a、12b交替地供給至第1配管11。亦即,從第1槽12a供給第2液體至第1配管11的第1供給模式、和從第2槽12b供給第2液體至第1配管11的第2供給模式,係根據各個槽12a、12b內之液位進行適當切換。例如,在第1供給模式中,第1槽12a內之液位低於預定的下限液位的話,則停止從第1槽12a供給第2液體,而變成從第2槽12b供給第2液體。該切換動作如後述。In the present embodiment, at the time of the normal operation of producing the dilution liquid, the second liquid is alternately supplied to the first piping 11 from the two tanks 12a and 12b. That is, the first supply mode of supplying the second liquid from the first tank 12a to the first piping 11 and the second supply mode of supplying the second liquid from the second tank 12b to the first piping 11 are based on the respective tanks 12a, The liquid level in 12b is properly switched. For example, in the first supply mode, when the liquid level in the first tank 12a falls below a predetermined lower limit liquid level, the supply of the second liquid from the first tank 12a is stopped and the second liquid is supplied from the second tank 12b. This switching operation will be described later.

又,本實施形態中,向第1配管11供給第2液體係通過多支第2配管13中之1支進行,但為了實現第2液體的廣範圍供給量,多支第2配管13以內徑及長度中之至少一者彼此不同的方式構成。亦即,多支第2配管13以內徑及長度中之至少一者彼此不同的方式構成,使得即使例如各個槽12a、12b內之壓力為固定仍能以彼此不同的流量使第2液體通過。該等第2配管13的構成亦如後述。In this embodiment, the supply of the second liquid system to the first piping 11 is performed through one of the plurality of second piping 13, but in order to achieve a wide range of supply of the second liquid, the inner diameter of the plurality of second piping 13 is and at least one of the lengths are different from each other. That is, the plurality of second pipes 13 are configured such that at least one of their inner diameter and length is different from each other so that the second liquid can be passed through at different flow rates even if the pressure in each of the grooves 12a and 12b is constant, for example. The structure of these 2nd piping 13 is also mentioned later.

進一步,稀釋液製造裝置10具有控制稀釋液製造裝置10之各種運轉動作的控制部20。尤其控制部20至少可以根據測定流經第1配管11內之第1液體之流量的流量測定手段21與測定稀釋液之濃度的濃度測定手段22的測定結果,調整利用壓力調整部18所為之第2液體對於第1液體的添加量,以使稀釋液之濃度成為預定之濃度。以下,針對利用控制部20所為的第2液體之添加量之調整方法進行說明,但在此之前,針對係該添加量調整之基礎的哈根佰意索意(Hagen-Poiseuille)法則進行簡單說明。Furthermore, the dilution liquid manufacturing apparatus 10 has the control part 20 which controls various operation|movements of the dilution liquid manufacturing apparatus 10. In particular, the control unit 20 can adjust the flow rate measurement means 21 for measuring the flow rate of the first liquid flowing through the first piping 11 and the concentration measurement means 22 for measuring the concentration of the diluent, based on at least the measurement results. 2. The amount of liquid added to the first liquid so that the concentration of the diluent becomes a predetermined concentration. Hereinafter, the method of adjusting the addition amount of the second liquid by the control unit 20 will be described, but before that, the Hagen-Poiseuille rule which is the basis for the adjustment of the addition amount will be briefly described .

哈根佰意索意法則係關於圓形管路內之層流之水頭損失的法則,若定義管的內徑為D[m],管的長度為L[m],管兩端的壓力梯度為ΔP[Pa],液體的黏性係數為μ[Pa・s],流經管內之液體的流量為Q[m3 /s],則以下列關係式表示: Q=(π×D4 ×ΔP)/(128×μ×L)。 亦即,根據哈根佰意索意法則,流經圓管之液體的流量Q和圓管之內徑D的4次冪及兩端之壓力梯度ΔP成正比,和圓管的長度L及液體的黏性係數μ成反比。Hagen-Bailey's Law is a law about the head loss of laminar flow in a circular pipe. If the inner diameter of the pipe is defined as D[m], the length of the pipe is L[m], and the pressure gradient at both ends of the pipe is ΔP[Pa], the viscosity coefficient of the liquid is μ[Pa・s], and the flow rate of the liquid flowing through the pipe is Q[m 3 /s], then it is expressed by the following relationship: Q=(π×D 4 ×ΔP )/(128×μ×L). That is to say, according to Hagen-Bailey's Law, the flow rate Q of the liquid flowing through the circular tube is proportional to the 4th power of the inner diameter D of the circular tube and the pressure gradient ΔP at both ends, and is proportional to the length L of the circular tube and the liquid The viscosity coefficient μ is inversely proportional.

本實施形態之稀釋液製造裝置中,通過各第2配管的第2液體之供給適用哈根佰意索意法則。各第2配管的長度L及內徑D為固定的值,若第2液體的種類決定的話,則其黏性係數μ亦為固定的值。因此,只需控制對應於各第2配管兩端間之壓力梯度ΔP的槽內之壓力,即可比例地控制各第2配管內之流量Q。In the diluent manufacturing apparatus of the present embodiment, the Hagen-Bailey-Soil's law is applied to the supply of the second liquid through each of the second pipes. The length L and the inner diameter D of each second pipe are fixed values, and if the type of the second liquid is determined, the viscosity coefficient μ is also a fixed value. Therefore, only by controlling the pressure in the tank corresponding to the pressure gradient ΔP between the two ends of each second pipe, the flow rate Q in each second pipe can be proportionally controlled.

然後,針對從第1槽12a添加第2液體至第1液體時,利用控制部20所為的第2液體之添加量之調整方法進行說明。Next, when adding the second liquid to the first liquid from the first tank 12a, a method of adjusting the amount of the second liquid added by the control unit 20 will be described.

首先,設定製造之稀釋液之濃度的目標值,針對所設定的目標濃度,計算出第2液體的添加量。具體而言,藉由流量測定手段21測定第1液體之流量,並計算出為了達成目標濃度的第2液體之目標添加量。然後,針對計算出之目標添加量,在多支第2配管13中決定欲使用的1支第2配管13,針對所決定的第2配管13,算出為了實現目標添加量(流量)的第1槽12a內之壓力的目標值。然後,將使用之第2配管13的閥13a打開後,利用壓力調整部18將第1槽12a內之壓力調整成算出之目標壓力,藉此,以預定的添加量將第2液體從第1槽12a通過第2配管13添加至第1配管11內之第1液體。First, a target value of the concentration of the dilution liquid to be produced is set, and the addition amount of the second liquid is calculated with respect to the set target concentration. Specifically, the flow rate of the first liquid is measured by the flow rate measuring means 21, and the target addition amount of the second liquid to achieve the target concentration is calculated. Then, with respect to the calculated target addition amount, one of the second pipes 13 to be used is determined among the plurality of second pipes 13, and the first second pipe 13 to achieve the target addition amount (flow rate) is calculated for the determined second pipe 13. The target value of the pressure in the tank 12a. Then, after opening the valve 13a of the second piping 13 to be used, the pressure in the first tank 12a is adjusted to the calculated target pressure by the pressure adjusting unit 18, thereby removing the second liquid from the first The tank 12a is added to the first liquid in the first piping 11 through the second piping 13 .

此時,根據上述哈根佰意索意法則,流經第2配管13之第2液體的流量Q和第2配管13兩端的壓力梯度ΔP成正比。因此,例如當第1液體之流量變化時,以使壓力梯度ΔP相對於該變化以某一比例常數成正比的方式,使第1槽12a內之壓力發生變化。例如,第1液體之流量變為2倍時,使壓力梯度ΔP成為2倍,而第2液體之流量也成為2倍,第1液體之流量變為1/2時,使壓力梯度ΔP成為1/2,而第2液體之流量也成為1/2。藉由如此之調整方法,結果可保持第1液體之流量與第2液體之流量的比例關係,即使第1液體之流量發生變動時,仍能獲得穩定濃度之稀釋液。At this time, the flow rate Q of the second liquid flowing through the second pipe 13 is proportional to the pressure gradient ΔP at both ends of the second pipe 13 according to the above-mentioned Hagen-Bailey's Law. Therefore, for example, when the flow rate of the first liquid changes, the pressure in the first groove 12a is changed so that the pressure gradient ΔP is proportional to the change by a constant proportionality. For example, when the flow rate of the first liquid is doubled, the pressure gradient ΔP is doubled, and the flow rate of the second liquid is also doubled, and when the flow rate of the first liquid is 1/2, the pressure gradient ΔP is made 1 /2, and the flow rate of the second liquid also becomes 1/2. By such an adjustment method, as a result, the proportional relationship between the flow rate of the first liquid and the flow rate of the second liquid can be maintained, and even when the flow rate of the first liquid fluctuates, a diluent with a stable concentration can be obtained.

惟,由於第1槽12a中之第2液體的揮發、分解等,也會有第2液體本身的濃度不是固定的情況。此時,即使當初已調整在包含目標濃度之預定濃度範圍內,製造之稀釋液之濃度也有可能會逐漸從該濃度範圍偏離。因此,本實施形態中,藉由濃度測定手段22測定稀釋液之濃度,若測得之稀釋液之濃度偏離預定之濃度範圍的話,則修正上述比例常數以使該稀釋液之濃度落回到預定之濃度範圍內。藉由該反饋控制,即使裝置之運轉剛啟動時、或稀釋液之濃度的目標值發生變更時,仍能自動地變更比例常數成為最適合的值。其結果,可穩定地製造已調整成預定濃度的稀釋液。However, due to volatilization, decomposition, etc. of the second liquid in the first tank 12a, the concentration of the second liquid itself may not be constant. At this time, even if it is initially adjusted within a predetermined concentration range including the target concentration, the concentration of the produced diluent may gradually deviate from the concentration range. Therefore, in the present embodiment, the concentration of the diluent is measured by the concentration measuring means 22. If the measured concentration of the diluent deviates from the predetermined concentration range, the proportional constant is corrected to make the concentration of the diluent fall back to the predetermined range. within the concentration range. By this feedback control, even when the operation of the device is just started or when the target value of the concentration of the diluent is changed, the proportional constant can be automatically changed to the optimum value. As a result, a dilution liquid adjusted to a predetermined concentration can be stably produced.

就流量測定手段21而言,其構成並無特別限制,例如可使用卡曼渦漩流量計(Karman vortex flow meter)、超音波流量計。又,流量測定手段21只要是設置在能監測流經第1配管11內之第1液體之流量變動的位置即可,其設置位置並無特別限制。又,圖示之實施形態中,流量測定手段21係設置在第1配管11之比起與多支第2配管13之連接部更上游側的位置,也可設置在比起該連接部更下流側的位置,以測定流經第1配管11內之稀釋液的流量。其原因為:第2液體之供給量(流量)遠小於第1液體之流量,可將稀釋液之流量等同視為第1液體之流量處理。The configuration of the flow measurement means 21 is not particularly limited, and for example, a Karman vortex flow meter or an ultrasonic flow meter can be used. In addition, the flow measuring means 21 may be installed at a position where the flow rate fluctuation of the first liquid flowing in the first piping 11 can be monitored, and the installation position is not particularly limited. In addition, in the embodiment shown in the figure, the flow rate measuring means 21 is provided on the upstream side of the first pipe 11 from the connecting portion with the plurality of second pipes 13, but may be provided on the downstream side of the connecting portion. position to measure the flow rate of the diluent flowing through the first piping 11 . The reason is that the supply volume (flow rate) of the second liquid is much smaller than the flow rate of the first liquid, and the flow rate of the diluent can be treated as the flow rate of the first liquid.

就濃度測定手段22而言,只要是可將稀釋液之濃度以電化學常數形式進行測定者即可,其構成並無特別限制,例如可使用導電率計、pH計、電阻率計、ORP計(氧化還原電位計)、或離子電極計等。製造之稀釋液以抗靜電、消除靜電為目的而使用於被處理體的洗淨、清洗時,宜使用導電率計、電阻率計作為濃度測定手段22。濃度測定手段22,如圖示般係設置在第1配管11之比起與多支第2配管13之連接部更下流側的位置,於該設置位置可直接安裝在第1配管11,也可安裝在與第1配管11並列設置之旁通配管。The concentration measuring means 22 is not particularly limited as long as it can measure the concentration of the diluent as an electrochemical constant. For example, a conductivity meter, a pH meter, a resistivity meter, and an ORP meter can be used. (redox potentiometer), or ion electrode meter, etc. When the produced diluent is used for cleaning and cleaning the object to be treated for the purpose of antistatic and elimination of static electricity, it is preferable to use a conductivity meter and a resistivity meter as the concentration measuring means 22 . As shown in the figure, the concentration measuring means 22 is installed at a position on the downstream side of the first piping 11 from the connection portion with the plurality of second piping 13, and may be directly attached to the first piping 11 at this installation position, or may be It is attached to the bypass piping installed in parallel with the first piping 11 .

由哈根佰意索意法則也可理解,第2液體之供給量(流量Q)的精度會受到第2配管13兩端之壓力梯度ΔP較大的影響。因此,於第1配管11與第2配管13之連接部的壓力發生大的變動時,變得難以穩定地製造已調整成預定濃度的稀釋液。為了監測於該連接部之壓力變動,如圖示般設置測定第1配管11內之壓力的壓力測定手段23。故,控制部20可根據流量測定手段21、濃度測定手段22、及壓力測定手段23的測定結果,算出為了使稀釋液之濃度成為目標濃度的第1槽12a內之壓力的目標值,並進行第2液體之添加量的調整。壓力測定手段23的構成並無特別限制,關於其設置位置,在圖示之實施形態中,也在比起與多支第2配管13之連接部更上游側的位置,但只要是可測定於連接部之管內壓力,也可在比起連接部更下流側的位置。It can also be understood from Hagen-Bailey's Law that the accuracy of the supply amount (flow rate Q) of the second liquid is greatly affected by the pressure gradient ΔP at both ends of the second pipe 13 . Therefore, when the pressure of the connection part of the 1st piping 11 and the 2nd piping 13 fluctuates greatly, it becomes difficult to manufacture the dilution liquid adjusted to predetermined density|concentration stably. In order to monitor the pressure fluctuation|variation in this connection part, the pressure measurement means 23 which measures the pressure in the 1st piping 11 is provided as shown in figure. Therefore, the control unit 20 can calculate the target value of the pressure in the first tank 12a so that the concentration of the diluent becomes the target concentration based on the measurement results of the flow rate measuring means 21, the concentration measuring means 22, and the pressure measuring means 23, and perform the operation. Adjustment of the addition amount of the second liquid. The configuration of the pressure measuring means 23 is not particularly limited, and the installation position thereof is also at the position on the upstream side of the connecting portion with the plurality of second pipes 13 in the embodiment shown in the figure, but it can be measured at The pressure in the pipe of the connecting portion may be located on the downstream side of the connecting portion.

如到目前為止所重複記述般,流經第2配管13內之第2液體的流量Q和第2配管13兩端之壓力梯度ΔP成正比。因此,若能使該壓力梯度ΔP發生大的變化,即能實現第2液體的廣範圍供給量(流量),而可對應於較寬廣的濃度範圍。但,在實用上由於施加於各個槽12a、12b的壓力有上限,故難以使壓力梯度ΔP發生大的變化,第2液體之添加量的調整範圍也有界限。As described repeatedly so far, the flow rate Q of the second liquid flowing through the second pipe 13 is proportional to the pressure gradient ΔP across the second pipe 13 . Therefore, if the pressure gradient ΔP can be greatly changed, a wide range of supply amount (flow rate) of the second liquid can be realized, and it can be applied to a wide concentration range. However, practically, since the pressure applied to each of the grooves 12a and 12b has an upper limit, it is difficult to greatly change the pressure gradient ΔP, and the adjustment range of the addition amount of the second liquid is also limited.

另一方面,根據哈根佰意索意法則,第2液體的流量Q和第2配管13之內徑D(的4次冪)也成正比,和其長度L成反比。著眼於此點,本實施形態中為了實現第2液體的廣範圍供給量(流量),多支第2配管13以內徑及長度中之至少一者彼此不同的方式構成。亦即,多支第2配管13藉由內徑及長度中之至少一者彼此不同,構成為即使例如各個槽12a、12b內之壓力為固定時仍能以彼此不同的流量使第2液體通過。藉此,就裝置整體而言,可使第2液體之添加量的調整範圍變寬廣,能製造寬廣濃度範圍的稀釋液。On the other hand, according to Hagen-Bailey's Law, the flow rate Q of the second liquid is also proportional to the inner diameter D (4th power) of the second pipe 13, and inversely proportional to the length L thereof. In view of this point, in this embodiment, in order to realize a wide range of supply amount (flow rate) of the second liquid, the plurality of second pipes 13 are configured so that at least one of the inner diameter and the length is different from each other. That is, the plurality of second pipes 13 are configured to pass the second liquid at different flow rates from each other even when the pressure in each of the grooves 12a and 12b is constant because at least one of the inner diameter and the length is different from each other. . Thereby, the adjustment range of the addition amount of a 2nd liquid can be widened in the whole apparatus, and the dilution liquid of a wide concentration range can be manufactured.

各第2配管13之內徑不限於特定的尺寸,但為了更加精密地控制所製造之稀釋液的濃度,各第2配管13之內徑宜為超過0.1mm且在4mm以下,為超過0.2mm且在0.5mm以下更佳。其原因為:第2配管13內之第2液體的流動容易變成層流(規則有序的流動)。亦即,係由於管內之流動為亂流(不規則的流動)的話,上述哈根佰意索意法則不成立,難以藉由第2配管兩端間之壓力梯度ΔP比例地控制流經第2配管內之第2液體的流量Q。換言之,為了維持流量Q與壓力梯度ΔP之良好比例關係,就各第2配管13而言,流經管內之第2液體的流動宜成為層流。此外,關於該內徑之理想範圍的詳細參照專利文獻1。The inner diameter of each second pipe 13 is not limited to a specific size, but in order to more precisely control the concentration of the diluent to be produced, the inner diameter of each second pipe 13 is preferably more than 0.1 mm and 4 mm or less, and more than 0.2 mm. And it is better to be below 0.5mm. The reason for this is that the flow of the second liquid in the second piping 13 tends to be a laminar flow (regular flow). That is, since the flow in the pipe is a turbulent flow (irregular flow), the above-mentioned Hagen-Bailey-Soy's law does not hold, and it is difficult to proportionally control the flow through the second pipe by the pressure gradient ΔP between the two ends of the second pipe. The flow rate Q of the second liquid in the piping. In other words, in order to maintain a good proportional relationship between the flow rate Q and the pressure gradient ΔP, the flow of the second liquid flowing through the inside of each second pipe 13 should preferably be a laminar flow. Note that, for details of the ideal range of the inner diameter, refer to Patent Document 1.

又,各第2配管13的長度也不限於特定的尺寸,但若長度過短的話,會容易影響管內的流量,變得難以藉由配管兩端之壓力梯度依比例控制液體的流量。又,長度過長的話,配管的設置變得困難,而且配管與液體之接觸面積變大,有可能會增加配管內之液體的污染。因此,各第2配管13的長度宜為0.01m以上100m以下之範圍,為0.1m以上10m以下之範圍更佳。Also, the length of each second pipe 13 is not limited to a specific size, but if the length is too short, the flow rate in the pipe is easily affected, and it becomes difficult to proportionally control the flow rate of the liquid by the pressure gradient at both ends of the pipe. Moreover, if the length is too long, the installation of the piping becomes difficult, and the contact area between the piping and the liquid increases, which may increase the contamination of the liquid in the piping. Therefore, the length of each second piping 13 is preferably within a range of 0.01 m or more and 100 m or less, and more preferably within a range of 0.1 m or more and 10 m or less.

進一步,第2配管13為內徑為0.1mm以下者、長度超過100m者的話,雖然仍取決於其組合,但第2液體流經第2配管13時的阻力容易變大,亦即,槽內之壓力容易變成高壓。故,就如此之內徑及長度而言,考量耐壓的觀點,構成裝置之部件類(配管、閥等)的選擇變得困難,故不佳。又,第2配管13為內徑超過4mm者、長度未達0.01m者的話,雖然也取決於其組合,但第2液體流經第2配管13時的阻力容易變小,亦即,第2液體之流量容易因槽內壓力的細微變化而發生變化。故,如此之內徑及長度會使得槽內之壓力控制變得困難而不佳。Furthermore, if the second piping 13 has an inner diameter of 0.1 mm or less and a length of more than 100 m, the resistance when the second liquid flows through the second piping 13 is likely to increase, although it depends on the combination. The pressure can easily become high pressure. Therefore, in terms of such an inner diameter and length, the selection of components (pipes, valves, etc.) constituting the device becomes difficult in consideration of the pressure resistance, which is not preferable. In addition, if the inner diameter of the second piping 13 exceeds 4 mm and the length is less than 0.01 m, the resistance when the second liquid flows through the second piping 13 is likely to be small, although it depends on the combination. The flow rate of the liquid is easily changed by slight changes in the pressure in the tank. Therefore, such an inner diameter and length will make the pressure control in the groove difficult and unsatisfactory.

第2配管13的材質、形狀並無特別限制,可適當使用樹脂製的柔軟的管。如此之樹脂,可列舉PFA、ETFE等氟樹脂、聚乙烯系樹脂、聚丙烯系樹脂等,製造之稀釋液使用於半導體晶圓的洗淨、清洗時,不易溶出的氟樹脂為特佳。又,第2液體為有揮發性的液體時,為了抑制因管內之液體揮發而擴散到外部所致之液體的濃度變動,宜使用透氣性低者作為第2配管13。在此情形,由於如上述般取決於製造之稀釋液的用途,也會有稀釋液所含之氧產生不良影響的情況,故就可抑制空氣中的氧從第2配管13之外側向內側擴散,並抑制第2液體中之溶存氧濃度上升的觀點亦佳。The material and shape of the second pipe 13 are not particularly limited, and a flexible pipe made of resin can be appropriately used. Such resins include fluororesins such as PFA and ETFE, polyethylene-based resins, polypropylene-based resins, and the like, and fluororesins that are not easily eluted when the diluent produced is used for cleaning and cleaning of semiconductor wafers is particularly preferred. In addition, when the second liquid is a volatile liquid, it is preferable to use the second pipe 13 with low air permeability in order to suppress the fluctuation of the liquid concentration due to the volatilization of the liquid in the pipe and the diffusion to the outside. In this case, depending on the use of the produced diluent as described above, the oxygen contained in the diluent may have an adverse effect, so that the diffusion of oxygen in the air from the outside to the inside of the second piping 13 can be suppressed. , and the viewpoint of suppressing the rise of the dissolved oxygen concentration in the second liquid is also good.

作為將第2配管13連接至第1配管11的方法,只要是將第1液體與第2液體適當地混合者即可,並無特別限制。例如宜以使第2配管13之前端位於第1配管11之中心部的方式使其與第1配管11連接,藉此,可有效率地混合第1液體與第2液體。又,關於多支第2配管13,考量結構簡單,為積液處少之結構的觀點,宜個別連接至第1配管11。The method of connecting the second piping 13 to the first piping 11 is not particularly limited as long as the first liquid and the second liquid are appropriately mixed. For example, it is preferable to connect the second pipe 13 to the first pipe 11 so that the front end of the second pipe 13 is located in the center of the first pipe 11, whereby the first liquid and the second liquid can be efficiently mixed. In addition, the plurality of second pipes 13 are preferably connected to the first pipes 11 individually from the viewpoint of a simple structure and a structure with few places where fluid accumulates.

圖示之例中設置有4支第2配管13,但第2配管13的數目不限於4支,可因應要求之稀釋液的濃度範圍適當變更為例如2支、3支、或5支以上。與此相應,內徑與長度之組合亦不限於特定的組合,可進行適當變更。就內徑與長度之組合而言,也可考慮僅其中任一者不同的組合。此時,由於如上述般施加於各個槽12a、12b的壓力有上限,考量使第2液體之添加量的調整範圍進一步變寬廣的觀點,宜組合內徑彼此不同者。由下列情事亦可知宜組合內徑彼此不同者:根據上述哈根佰意索意法則,對於流經第2配管13之第2液體之流量Q,長度L以1次冪影響,反觀內徑D係以4次冪影響。此外,本實施形態中,向第1配管11供給第2液體係通過多支第2配管13中之1支進行,但根據所要求之稀釋液的濃度範圍,也可通過多支第2配管13中之2支以上的第2配管13進行。In the illustrated example, four second pipes 13 are provided, but the number of the second pipes 13 is not limited to four, and can be appropriately changed to, for example, two, three, or five or more according to the concentration range of the diluent required. Accordingly, the combination of the inner diameter and the length is not limited to a specific combination, and can be appropriately changed. With regard to the combination of the inner diameter and the length, a combination in which only one of them is different is also conceivable. At this time, since the pressure applied to each of the grooves 12a and 12b has an upper limit as described above, from the viewpoint of further widening the adjustment range of the addition amount of the second liquid, it is preferable to combine those with different inner diameters. It can also be known from the following conditions that combinations of different inner diameters are suitable: According to the above-mentioned Hagen-Bailey-Sawyer's Law, for the flow rate Q of the second liquid flowing through the second pipe 13, the length L is affected by the power of 1, and the inner diameter D is reversed. The system is influenced by the power of 4. In addition, in the present embodiment, the supply of the second liquid system to the first piping 11 is carried out through one of the plurality of second piping 13 , but it may be possible to pass through a plurality of second piping 13 depending on the concentration range of the required diluent. Two or more of the second pipes 13 are performed.

如上述般在本實施形態中,製造稀釋液之正常運轉時,會實施從第1槽12a供給第2液體至第1配管11的第1供給模式、與從第2槽12b供給第2液體至第1配管11的第2供給模式的切換。藉此,不需要槽的更換作業等,且無需停止裝置的運轉,故可持續穩定地進行稀釋液之製造。以下,舉從第1供給模式切換成第2供給模式的情形為例,針對該切換動作進行說明。As described above, in the present embodiment, during the normal operation of producing the diluent, the first supply mode of supplying the second liquid from the first tank 12a to the first piping 11, and the second liquid supplying the second liquid from the second tank 12b to the first pipe 11 are implemented. Switching of the second supply mode of the first piping 11 . Thereby, there is no need to replace the tank, etc., and there is no need to stop the operation of the apparatus, so that the production of the diluted solution can be performed stably. Hereinafter, the switching operation will be described by taking, as an example, the case of switching from the first supply mode to the second supply mode.

第1供給模式中,藉由將連接槽加壓用氣體供給管線18a與第1槽12a的閥19a打開,將槽加壓用氣體(例如氮氣)通過槽加壓用氣體供給管線18a導入到第1槽12a。然後,藉由進排氣機構18b將利用壓力計19c測得之測定值(第1槽12a內之壓力)調整成目標壓力。如此,第1槽12a內之第2液體會通過指定之第2配管13,並以預定的添加量添加至第1配管11內之第1液體。此外,此時下列閥均處於關閉狀態,亦即,連接槽加壓用氣體供給管線18a與第2槽12b的閥19b、藥液供給管線16的閥16a、藥液供給管線16與第1槽12a之間的閥15a、藥液供給管線16與第2槽12b之間的閥15b、第1槽12a之大氣閥17a、及第2槽12b之大氣閥17b均處於關閉狀態。又,第2槽12b處於儲存有少量第2液體的待機狀態。In the first supply mode, by opening the valve 19a connecting the tank pressurizing gas supply line 18a and the first tank 12a, the tank pressurizing gas (for example, nitrogen) is introduced into the second tank pressurizing gas supply line 18a through the tank pressurizing gas supply line 18a. 1 slot 12a. Then, the measured value (pressure in the first tank 12a) measured by the pressure gauge 19c is adjusted to the target pressure by the intake and exhaust mechanism 18b. In this way, the second liquid in the first tank 12a passes through the designated second piping 13, and is added to the first liquid in the first piping 11 by a predetermined addition amount. In addition, at this time, the following valves are all closed, that is, the valve 19b connecting the tank pressurizing gas supply line 18a and the second tank 12b, the valve 16a of the chemical solution supply line 16, and the chemical solution supply line 16 and the first tank. The valve 15a between 12a, the valve 15b between the chemical solution supply line 16 and the second tank 12b, the air valve 17a of the first tank 12a, and the air valve 17b of the second tank 12b are all closed. In addition, the second tank 12b is in a standby state in which a small amount of the second liquid is stored.

藉由從第1槽12a供給第2液體到第1配管11,當第1槽12a內之液位低於預定的下限液位時,打開藥液供給管線16的閥16a,並打開第2槽12b的大氣閥17b。然後,打開藥液供給管線16與第2槽12b之間的閥15b,第2液體通過藥液供給管線16而供給至第2槽12b並儲存。然後,第2槽12b內之液位達到預定的上限液位時,關閉藥液供給管線16的閥16a、第2槽12b的大氣閥17b、及藥液供給管線16與第2槽12b之間的閥15b。之後,打開連接槽加壓用氣體供給管線18a與第2槽12b的閥19b,槽加壓用氣體通過槽加壓用氣體供給管線18a而導入到第2槽12b。此時,藉由進排氣機構18b將利用壓力計19c測得之測定值調整成目標壓力。亦即,於將第1槽12a內之壓力維持在已調整成之目標壓力的狀態,將第2槽12b內之壓力也調整成該目標壓力。第2槽12b內之壓力達到該目標壓力時,打開連接第2槽12b與第2配管13的閥14b,然後,關閉連接第1槽12a與第2配管13的閥14a。如此完成了由從第1槽12a供給第2液體之第1供給模式切換到從第2槽12b供給第2液體之第2供給模式的供給模式之切換。之後,關閉連接槽加壓用氣體供給管線18a與第1槽12a的閥19a,第1槽12a成為待機狀態,直到下一次為了第1供給模式而補充第2液體。By supplying the second liquid from the first tank 12a to the first piping 11, when the liquid level in the first tank 12a is lower than the predetermined lower limit liquid level, the valve 16a of the chemical liquid supply line 16 is opened, and the second tank is opened. Atmospheric valve 17b of 12b. Then, the valve 15b between the chemical solution supply line 16 and the second tank 12b is opened, and the second liquid is supplied to the second tank 12b through the chemical solution supply line 16 and stored. Then, when the liquid level in the second tank 12b reaches a predetermined upper limit liquid level, the valve 16a of the chemical solution supply line 16, the air valve 17b of the second tank 12b, and the space between the chemical solution supply line 16 and the second tank 12b are closed. valve 15b. After that, the valve 19b connecting the tank pressurizing gas supply line 18a and the second tank 12b is opened, and the tank pressurizing gas is introduced into the second tank 12b through the tank pressurizing gas supply line 18a. At this time, the measured value measured by the pressure gauge 19c is adjusted to the target pressure by the intake and exhaust mechanism 18b. That is, while the pressure in the first groove 12a is maintained at the adjusted target pressure, the pressure in the second groove 12b is also adjusted to the target pressure. When the pressure in the second tank 12b reaches the target pressure, the valve 14b connecting the second tank 12b and the second piping 13 is opened, and then the valve 14a connecting the first tank 12a and the second piping 13 is closed. This completes the switching of the supply mode from the first supply mode in which the second liquid is supplied from the first tank 12a to the second supply mode in which the second liquid is supplied from the second tank 12b. After that, the valve 19a connecting the tank pressurizing gas supply line 18a and the first tank 12a is closed, and the first tank 12a is in a standby state until the next time the second liquid is replenished for the first supply mode.

該切換動作中,如上述般,從第2槽12b供給第2液體係在將第2槽12b內之壓力調整成與第1槽12a內之壓力一致之後進行。藉此,即使是剛從第1供給模式切換到第2供給模式時,也能以預定的添加量將第2槽12b內之第2液體添加到第1配管11內之第1液體。其結果,模式切換時可盡可能地抑制第2液體之添加量的變動,故,可盡可能地抑制製造之稀釋液的濃度變動。In this switching operation, as described above, the supply of the second liquid system from the second tank 12b is performed after the pressure in the second tank 12b is adjusted to match the pressure in the first tank 12a. Thereby, even immediately after switching from the first supply mode to the second supply mode, the second liquid in the second tank 12b can be added to the first liquid in the first piping 11 by a predetermined addition amount. As a result, the variation of the addition amount of the second liquid can be suppressed as much as possible when the mode is switched, so that the variation of the concentration of the produced diluent can be suppressed as much as possible.

上述示例中,第2槽12b處於待機狀態時,大氣閥17b係處於關閉狀態。此係為了抑制氧進入到第2槽12b,並於之後補充第2液體到第2槽12b時抑制氧溶入到第2液體中。惟,當氧溶入第2槽12b中的第2液體並不會成為問題時,大氣閥17b可以不處於關閉狀態。又,在向第2槽12b補充第2液體時,並補充到槽內之氣體成分消失之程度的情況下,藉由將槽內之大氣從大氣閥17b排出,可減少氧溶入到第2液體中,故大氣閥17b可處於打開及關閉中之任意狀態。In the above example, when the second tank 12b is in the standby state, the atmospheric valve 17b is in the closed state. This is to suppress the entry of oxygen into the second tank 12b, and to suppress the dissolution of oxygen into the second liquid when the second liquid is subsequently replenished to the second tank 12b. However, the atmospheric valve 17b does not need to be in the closed state when oxygen dissolved in the second liquid in the second tank 12b is not a problem. In addition, when the second liquid is replenished to the second tank 12b and replenished to the extent that the gas component in the tank disappears, the atmosphere in the tank is exhausted from the atmospheric valve 17b, so that the infiltration of oxygen into the second tank can be reduced. In the liquid, the atmospheric valve 17b can be in any state of opening and closing.

又,上述示例中,向第2槽12b補充第2液體係在第1供給模式即將結束前進行,但補充的時機不限於此。例如,可於剛切換成第1供給模式時等第1供給模式中之任意時機進行第2液體的補充。此時,第2液體為有揮發性的液體時,為了抑制第2液體的揮發,第2液體之補充後宜保持大氣閥17b關閉。In addition, in the above-mentioned example, the replenishment of the second liquid system to the second tank 12b is performed just before the end of the first supply mode, but the timing of replenishment is not limited to this. For example, the replenishment of the second liquid may be performed at any timing in the first supply mode, such as immediately after switching to the first supply mode. At this time, when the second liquid is a volatile liquid, in order to suppress volatilization of the second liquid, it is preferable to keep the atmospheric valve 17b closed after the replenishment of the second liquid.

此外,於第1供給模式中,進行第2液體之供給直到第1槽12a用罄的話,第2配管中會有槽加壓用氣體積存,切換成下一次的第1供給模式時,該氣體會供給至第1配管,製造之稀釋液可能會發生濃度變動。因此,從第1供給模式切換成第2供給模式,宜如上述般於第1槽12a用罄前開始。In addition, in the first supply mode, if the supply of the second liquid is performed until the first tank 12a is used up, the tank pressurization gas will be stored in the second piping, and when the next supply mode is switched to the first supply mode, the gas It will be supplied to the first piping, and the concentration of the produced diluent may fluctuate. Therefore, switching from the first supply mode to the second supply mode is preferably started before the first tank 12a is used up as described above.

本實施形態之稀釋液製造裝置10,在使用端1不需要稀釋液時等正常運轉之間隙,有時會轉換成暫時停止向第1配管11供給第1液體,並暫時停止稀釋液之製造的待機模式。此時,例如從第1供給模式轉換成待機模式時,據認為考慮安全面的話,已調整成目標壓力之第1槽12a內之壓力宜恢復成大氣壓。但,如此之減壓至大氣壓實際上就以下觀點而言為不佳。In the diluent production apparatus 10 of the present embodiment, the supply of the first liquid to the first piping 11 may be temporarily stopped and the production of the diluent may be temporarily stopped during the interval of normal operation, such as when the diluent is not needed at the use end 1. Standby mode. At this time, for example, when switching from the first supply mode to the standby mode, it is considered that the pressure in the first tank 12a adjusted to the target pressure should be returned to the atmospheric pressure in consideration of safety. However, the pressure reduction to atmospheric pressure in this way is actually unfavorable from the following viewpoints.

亦即,若將第1槽12a內之壓力進行減壓而使其恢復到大氣壓的話,於高壓下溶解於第2液體之氣體成分會生成氣泡,而該氣泡會滯留在第2配管13內。因此,在正常運轉再開後,即使將第1槽12a再次加壓亦不會添加第2液體,且第1槽12a會成為過度加壓的狀態。之後,氣泡從第2配管13逸出,第2液體可再次添加至第1液體,但由於此時第2液體急劇地添加,會有無法良好地進行添加量調整,直到製造之稀釋液的濃度變得穩定需花費時間的情況。如此之氣泡所致之影響係本案發明人等首次發現的情事。That is, when the pressure in the first tank 12 a is reduced to atmospheric pressure, the gas component dissolved in the second liquid under high pressure generates bubbles, and the bubbles remain in the second piping 13 . Therefore, even if the 1st tank 12a is pressurized again after the normal operation is restarted, the second liquid will not be added, and the first tank 12a will be in an over-pressurized state. After that, air bubbles escape from the second piping 13, and the second liquid can be added to the first liquid again. However, since the second liquid is added rapidly at this time, it may not be possible to adjust the amount of addition well until the concentration of the dilution liquid to be produced. It takes time to become stable. The influence caused by such bubbles is the first discovery by the inventors of the present application.

故,本實施形態之稀釋液製造裝置10中,即使例如從第1供給模式轉換成待機模式,第1槽12a內之壓力仍宜調整並保持在高於大氣壓的壓力。藉此,可抑制溶解於第2液體之氣體成分生成氣泡。其結果,第1供給模式再開後即可良好地進行第2液體的添加量調整。又,特別是第2液體為有揮發性的液體時,為了抑制第2液體的揮發並抑制濃度變動,處於待機模式之第1槽12a內的壓力宜比起大氣壓更高,並比起第2液體之飽和蒸氣壓更高較佳。惟,取決於第2液體與槽加壓用氣體之組合,正常運轉時槽加壓用氣體有時也會溶入到第2液體中。因此,如此之情形下,宜除了考慮第2液體之飽和蒸氣壓之外,也考慮槽加壓用氣體對於第2液體的溶解度,而決定處於待機模式之第1槽12a內的壓力。另一方面,考量正常運轉再開後可更迅速地再開良好的添加量調整,故即使處於待機模式,第1槽12a內之壓力亦可維持在與第1供給模式同樣已調整成目標壓力的狀態。如此之調整尤其適於第2液體為碳酸水、富氫水等使電解質、氣體溶解而得的水的情形。Therefore, in the diluent manufacturing apparatus 10 of the present embodiment, even if, for example, the first supply mode is switched to the standby mode, the pressure in the first tank 12a is preferably adjusted and maintained at a pressure higher than atmospheric pressure. Thereby, generation of bubbles in the gas component dissolved in the second liquid can be suppressed. As a result, the addition amount of the second liquid can be satisfactorily adjusted after the first supply mode is restarted. In addition, especially when the second liquid is a volatile liquid, in order to suppress volatilization of the second liquid and suppress concentration fluctuations, the pressure in the first tank 12a in the standby mode is preferably higher than atmospheric pressure and higher than that of the second liquid. The saturated vapor pressure of the liquid is preferably higher. However, depending on the combination of the second liquid and the tank pressurizing gas, the tank pressurizing gas may dissolve into the second liquid during normal operation. Therefore, in such a case, the pressure in the first tank 12a in the standby mode should be determined in consideration of the solubility of the tank pressurizing gas in the second liquid in addition to the saturated vapor pressure of the second liquid. On the other hand, in consideration of the good addition amount adjustment that can be restarted more quickly after restarting in normal operation, even in the standby mode, the pressure in the first tank 12a can be maintained at the same state as in the first supply mode that has been adjusted to the target pressure . Such adjustment is particularly suitable when the second liquid is water obtained by dissolving electrolytes and gases, such as carbonated water and hydrogen-rich water.

(第2實施形態) 圖2係本發明之第2實施形態之稀釋液製造裝置的概略構成圖。以下,關於與第1實施形態同樣的構成,圖式中附以相同的符號並省略其說明,僅對與第1實施形態不同的構成進行說明。(Second Embodiment) Fig. 2 is a schematic configuration diagram of a dilution liquid manufacturing apparatus according to a second embodiment of the present invention. Hereinafter, about the same structure as 1st Embodiment, the same code|symbol is attached|subjected to the drawing and the description is abbreviate|omitted, and only the structure different from 1st Embodiment is demonstrated.

本實施形態在變更第2槽12b之功能的方面與第1實施形態不同。具體而言,第2槽12b並非與第1槽12a並聯,而是藉由連接管線31與第1槽12a串聯連接。更具體而言,第2槽12b係以使第2槽12b內之第2液體藉由水頭壓供給至第1槽12a的方式和第1槽12a連接。因應上述而省略第1實施形態之閥14a、14b、15a、15b,多支第2配管13僅設置在第1槽12a與第1配管11之間,藥液供給管線16僅與第2槽12b連接。又,壓力計19c設置於第1槽12a,並在連接管線31設置閥31a、止回閥(圖中未顯示)。The present embodiment differs from the first embodiment in that the function of the second groove 12b is changed. Specifically, the second tank 12b is not connected in parallel with the first tank 12a, but is connected in series with the first tank 12a via the connection line 31 . More specifically, the second tank 12b is connected to the first tank 12a so that the second liquid in the second tank 12b is supplied to the first tank 12a by the head pressure. In view of the above, the valves 14a, 14b, 15a, and 15b of the first embodiment are omitted, the plurality of second pipes 13 are provided only between the first tank 12a and the first pipe 11, and the chemical solution supply line 16 is only connected to the second tank 12b. connect. Moreover, the pressure gauge 19c is installed in the 1st tank 12a, and the valve 31a and the check valve (not shown) are installed in the connection line 31.

故,本實施形態中,第2槽12b係作為暫時儲存待補充到第1槽12a之第2液體的暫時儲存槽而發揮功能。亦即,製造稀釋液之正常運轉時,根據第1槽12a之液位,從第2槽12b適當補充第2液體到第1槽12a,其結果,可從第1槽12a持續地供給第2液體到第1配管11。藉此,可持續且穩定地進行稀釋液之製造,而不需要槽的更換作業,且無需停止裝置的運轉。以下,針對該補充動作進行說明。Therefore, in the present embodiment, the second tank 12b functions as a temporary storage tank for temporarily storing the second liquid to be replenished to the first tank 12a. That is, during the normal operation of producing the dilution liquid, according to the liquid level of the first tank 12a, the second liquid is appropriately replenished from the second tank 12b to the first tank 12a, and as a result, the second liquid can be continuously supplied from the first tank 12a. liquid to the first piping 11. Thereby, the production of the diluent can be carried out continuously and stably, without the need to replace the tank and to stop the operation of the apparatus. Hereinafter, this supplementary operation will be described.

正常運轉時,槽加壓用氣體(例如氮氣)通過槽加壓用氣體供給管線18a導入到第1槽12a,藉由進排氣機構18b將利用壓力計19c測得之測定值(第1槽12a內之壓力)調整成目標壓力。如此,第1槽12a內之第2液體會以預定的添加量通過指定之第2配管13並添加至第1配管11內之第1液體。此外,此時下列閥均處於關閉狀態,亦即,連接槽加壓用氣體供給管線18a與第2槽12b的閥19b、藥液供給管線16的閥16a、第2槽12b的大氣閥17b、及連接管線31的閥31a均處於關閉狀態。惟,此時的第2槽12b之大氣閥17b的狀態,與第1實施形態同樣不限於關閉狀態,也可視需要為打開的狀態。During normal operation, the tank pressurizing gas (for example, nitrogen gas) is introduced into the first tank 12a through the tank pressurizing gas supply line 18a, and the measured value (the first tank) measured by the pressure gauge 19c is measured by the intake and exhaust mechanism 18b. 12a) is adjusted to the target pressure. In this way, the second liquid in the first tank 12a is added to the first liquid in the first pipe 11 through the designated second pipe 13 in a predetermined amount to be added. In addition, at this time, the following valves are all closed, that is, the valve 19b connecting the tank pressurizing gas supply line 18a and the second tank 12b, the valve 16a of the chemical solution supply line 16, the atmosphere valve 17b of the second tank 12b, And the valve 31a connecting the pipeline 31 is in the closed state. However, the state of the air valve 17b of the second tank 12b at this time is not limited to the closed state as in the first embodiment, and may be an open state as necessary.

藉由從第1槽12a供給第2液體到第1配管11,當第1槽12a內之液位低於預定的下限液位時,打開第2槽12b的大氣閥17b。然後,打開藥液供給管線16的閥16a,第2液體通過藥液供給管線16供給至第2槽12b並儲存。然後,當第2槽12b內之液位達到預定的上限液位時,關閉藥液供給管線16的閥16a,並關閉第2槽12b的大氣閥17b。之後,打開連接槽加壓用氣體供給管線18a與第2槽12b的閥19b,槽加壓用氣體通過槽加壓用氣體供給管線18a導入到第2槽12b。此時,藉由進排氣機構18b將利用壓力計19c測得之測定值調整成目標壓力。亦即,於將第1槽12a內之壓力維持在已調整成之目標壓力的狀態,將第2槽12b內之壓力也調整成該目標壓力。第2槽12b內之壓力達到該目標壓力時,打開連接管線31的閥31a,藉由水頭壓將第2液體從第2槽12b輸送至第1槽12a。第2液體的輸送結束時,關閉連接管線31的閥31a,第2槽12b成為待機狀態直到下一次的補充動作。By supplying the second liquid from the first tank 12a to the first piping 11, when the liquid level in the first tank 12a falls below a predetermined lower limit liquid level, the atmospheric valve 17b of the second tank 12b is opened. Then, the valve 16a of the chemical solution supply line 16 is opened, and the second liquid is supplied to the second tank 12b through the chemical solution supply line 16 and stored. Then, when the liquid level in the second tank 12b reaches a predetermined upper limit liquid level, the valve 16a of the chemical solution supply line 16 is closed, and the atmospheric valve 17b of the second tank 12b is closed. After that, the valve 19b connecting the tank pressurizing gas supply line 18a and the second tank 12b is opened, and the tank pressurizing gas is introduced into the second tank 12b through the tank pressurizing gas supply line 18a. At this time, the measured value measured by the pressure gauge 19c is adjusted to the target pressure by the intake and exhaust mechanism 18b. That is, while the pressure in the first groove 12a is maintained at the adjusted target pressure, the pressure in the second groove 12b is also adjusted to the target pressure. When the pressure in the second tank 12b reaches the target pressure, the valve 31a of the connecting line 31 is opened, and the second liquid is transferred from the second tank 12b to the first tank 12a by the head pressure. When the transfer of the second liquid is completed, the valve 31a of the connection line 31 is closed, and the second tank 12b is in a standby state until the next replenishment operation.

該補充動作中,如上述般,從第2槽12b輸送第2液體到第1槽12a,係在將第2槽12b內之壓力調整成與第1槽12a內之壓力一致之後進行。藉此,藉由水頭壓將第2液體從第2槽12b輸送到第1槽12a時,可盡可能地抑制第1槽12a的壓力變動,並能盡可能地抑制製造之稀釋液的濃度變動。此外,為了使第2液體藉由水頭壓確實地輸送到第1槽12a,第2槽12b的底面宜在比起第1槽12a之頂面更高的位置。In this replenishment operation, as described above, the transfer of the second liquid from the second tank 12b to the first tank 12a is performed after the pressure in the second tank 12b is adjusted to match the pressure in the first tank 12a. Thereby, when the second liquid is transported from the second tank 12b to the first tank 12a by the head pressure, the pressure fluctuation of the first tank 12a can be suppressed as much as possible, and the concentration fluctuation of the produced diluent can be suppressed as much as possible . In addition, in order to ensure that the second liquid is transported to the first tank 12a by the hydraulic head pressure, the bottom surface of the second tank 12b is preferably located at a higher position than the top surface of the first tank 12a.

上述示例中,第2液體儲存到第2槽12b係在第1槽12a內之液位低於預定下限液位之時點開始,但不限於該時機,可在任意時機進行。此時,第2液體為有揮發性的液體時,為了抑制第2液體的揮發,特佳為於第2液體之補充後大氣閥17b保持關閉。同樣,從第2槽12b輸送第2液體到第1槽12a也可在第2液體儲存於第2槽12b之後的任意時機進行。惟,進行第2液體之供給直到第1槽12a用罄的話,第2配管中會有槽加壓用氣體積存,該氣體會供給至第1配管,而製造之稀釋液可能會發生濃度變動。因此,為了從第1槽12a持續地供給第2液體,至少宜於上述時機開始從第2槽12b輸送第2液體到第1槽12a,亦即在第1槽12a用罄前開始。 [實施例]In the above example, the second liquid is stored until the liquid level in the first tank 12b in the second tank 12b falls below the predetermined lower limit liquid level, but it is not limited to this timing, and can be performed at any timing. At this time, when the second liquid is a volatile liquid, in order to suppress volatilization of the second liquid, it is particularly preferable that the atmospheric valve 17b is kept closed after the second liquid is replenished. Similarly, the transfer of the second liquid from the second tank 12b to the first tank 12a may be performed at any timing after the second liquid is stored in the second tank 12b. However, if the supply of the second liquid is performed until the first tank 12a is used up, the tank pressurization gas will accumulate in the second piping, and the gas will be supplied to the first piping, and the concentration of the produced diluent may fluctuate. Therefore, in order to continuously supply the second liquid from the first tank 12a, it is preferable to start the transfer of the second liquid from the second tank 12b to the first tank 12a at least at the above-mentioned timing, that is, before the first tank 12a is used up. [Example]

然後,參照圖3所示之流程圖,針對對應於上述第2實施形態的實施例進行說明。圖3的流程圖中,與圖2所示之符號相同的符號,係表示與第2實施形態同樣的構成。Next, an example corresponding to the second embodiment described above will be described with reference to the flowchart shown in FIG. 3 . In the flowchart of FIG. 3, the same reference numerals as those shown in FIG. 2 denote the same configuration as that of the second embodiment.

(實施例1) 本實施例中,使用圖3所示之構成的稀釋液製造裝置10製造稀氨水作為稀釋液,並測定該稀氨水的導電率。(Example 1) In this example, dilute ammonia water was produced as a diluent using the diluent production apparatus 10 having the configuration shown in FIG. 3, and the electrical conductivity of the dilute ammonia water was measured.

第2配管13係使用內徑及長度中之至少一者不同的5支ETFE製管A~E(管A、B:品號「7009」,管C~E:品號「7010」,均為Flom公司製)。各管A~E的內徑及長度如下。 管A 內徑:0.2mm、長度:3m 管B 內徑:0.2mm、長度:1m 管C 內徑:0.3mm、長度:1m 管D 內徑:0.3mm、長度:0.5m 管E 內徑:0.3mm、長度:0.3mThe second piping 13 uses five ETFE-made pipes A to E (pipes A and B: article number "7009", pipes C to E: article number "7010", all of which are different in at least one of inner diameter and length. Flom Corporation). The inner diameter and length of each of the tubes A to E are as follows. Tube A Inner Diameter: 0.2mm, Length: 3m Tube B Inner Diameter: 0.2mm, Length: 1m Tube C Inner Diameter: 0.3mm, Length: 1m Tube D Inner Diameter: 0.3mm, Length: 0.5m Tube E Inner Diameter: 0.3mm, length: 0.3m

又,第1配管11、第1槽12a、及第2槽12b係分別使用PFA製者。In addition, the 1st piping 11, the 1st groove|channel 12a, and the 2nd groove|channel 12b are made of PFA, respectively.

使用電阻率值為18MΩ・cm以上,總有機碳(TOC)為1.0ppb以下之超純水作為第1液體,對於第1配管11以流量40L/min、水壓0.35MPa進行通水。使用29wt%的氨水(電子工業用,關東化學(股)製)作為第2液體,使用氮氣作為導入到第1槽12a的槽加壓用氣體。Ultrapure water with a resistivity value of 18 MΩ・cm or more and a total organic carbon (TOC) of 1.0 ppb or less was used as the first liquid, and water was passed through the first piping 11 at a flow rate of 40 L/min and a water pressure of 0.35 MPa. 29 wt % of ammonia water (electronic industry, manufactured by Kanto Chemical Co., Ltd.) was used as the second liquid, and nitrogen gas was used as the tank pressurizing gas introduced into the first tank 12a.

對於各個管A~E,使用導電率計(品號「M300」,METTLER TOLEDO公司製)測定使第1槽12a內之壓力變化,並使添加至超純水中之氨水的添加量改變時的稀氨水之導電率。圖4係顯示此時之測定結果的圖表,橫軸表示添加至超純水中的氨水量,縱軸表示獲得之稀釋液(稀氨水)的導電率。For each of the tubes A to E, a conductivity meter (product number "M300", manufactured by METTLER TOLEDO Co., Ltd.) was used to measure the pressure when the pressure in the first tank 12a was changed and the amount of ammonia added to the ultrapure water was changed. The conductivity of dilute ammonia water. 4 is a graph showing the measurement results at this time. The horizontal axis represents the amount of ammonia water added to the ultrapure water, and the vertical axis represents the conductivity of the obtained diluted solution (diluted ammonia water).

氨水為弱鹼,在低濃度區域,導電率相對於添加量的變化大,但在高濃度區域導,電率相對於添加量的變化變得遲緩。因此,管A中之氨水的最小添加量及此時的稀釋液之導電率分別為0.015mL/min及1.2μS/cm,反觀管E中之氨水的最大添加量及此時的稀釋液之導電率分別為8.18mL/min及62.1μS/cm。亦即,為了將稀釋液之導電率從1.2μS/cm(管A)到62.1μS/cm(管E)提高約50倍,需使氨水的添加量從0.015mL/min(管A)到8.18mL/min(管E)變化約545倍。由圖4之圖表亦可知,藉由使用內徑及長度中之至少一者不同的5支管,可對應於如此之氨水之添加量的調整範圍,且確認到可連續地製造寬廣濃度範圍的稀氨水。Ammonia water is a weak base, and in a low concentration region, the change in conductivity with respect to the addition amount is large, but in a high concentration region, the change in conductivity with respect to the addition amount becomes slow. Therefore, the minimum addition amount of ammonia water in tube A and the conductivity of the diluent at this time are 0.015 mL/min and 1.2 μS/cm, respectively. In contrast, the maximum addition amount of ammonia water in tube E and the conductivity of the diluent at this time are The rates were 8.18 mL/min and 62.1 μS/cm, respectively. That is, in order to increase the conductivity of the diluent from 1.2 μS/cm (tube A) to 62.1 μS/cm (tube E) by about 50 times, the amount of ammonia added needs to be changed from 0.015 mL/min (tube A) to 8.18 The mL/min (tube E) changed approximately 545-fold. As can be seen from the graph of FIG. 4 , by using five pipes different in at least one of the inner diameter and the length, it is possible to correspond to the adjustment range of the addition amount of ammonia water as described above, and it has been confirmed that dilute products with a wide concentration range can be produced continuously. ammonia.

(實施例2) 本實施例中使用圖3所示之構成的稀釋液製造裝置10,並將作為第1液體之超純水以水壓0.16MPa通入到第1配管11,除此之外,以和實施例1同樣之條件製造稀氨水。然後,暫時停止第1液體之供給,亦即,暫時停止稀釋液之製造,測定其前後的稀氨水之導電率。此外,將超純水及氨水的溫度調整成23℃,稀釋液之導電率的目標值設定為40μS/cm。此時的測定結果(第1液體之流量、第1槽內之壓力、及稀氨水之導電率之時間變化)顯示於圖5A。此外,圖5B中亦顯示暫時停止第1液體之供給時第1槽12a內之壓力恢復到大氣壓之情形的測定結果作為比較例。(Example 2) In this example, the diluent production apparatus 10 having the configuration shown in FIG. 3 was used, and the ultrapure water as the first liquid was introduced into the first piping 11 at a hydraulic pressure of 0.16 MPa, except that , to produce dilute ammonia water under the same conditions as Example 1. Then, the supply of the first liquid was temporarily stopped, that is, the production of the diluted solution was temporarily stopped, and the electrical conductivity of the diluted ammonia water before and after it was measured. In addition, the temperature of the ultrapure water and the ammonia water was adjusted to 23° C., and the target value of the conductivity of the diluent was set to 40 μS/cm. The measurement results at this time (the flow rate of the first liquid, the pressure in the first tank, and the time change of the conductivity of the dilute ammonia water) are shown in FIG. 5A . In addition, FIG. 5B also shows the measurement result of the case where the pressure in the 1st tank 12a returns to atmospheric pressure when the supply of the 1st liquid is temporarily stopped as a comparative example.

本實施例中,如圖5A所示般可確認到:即使在第1液體之供給再開後(正常運轉再開後),仍可良好地調整稀釋液之導電率。另一方面,在比較例中,如圖5B所示般,暫時停止第1液體之供給時,由於第1槽12a內之壓力恢復到大氣壓,儘管正常運轉再開後使第1槽12a內之壓力比以前更高,仍無法良好地進行稀釋液之導電率的調整。據認為其原因為:本實施例中暫時停止第1液體之供給時,由於第1槽12a內之壓力保持在高於大氣壓的壓力,可抑制氣泡的生成。In this example, as shown in FIG. 5A , it was confirmed that even after the supply of the first liquid was restarted (after the normal operation was restarted), the conductivity of the diluent could be well adjusted. On the other hand, in the comparative example, as shown in FIG. 5B, when the supply of the first liquid is temporarily stopped, the pressure in the first tank 12a returns to atmospheric pressure, although the pressure in the first tank 12a is restored after the normal operation is restarted. Even higher than before, the conductivity of the diluent cannot be adjusted well. The reason for this is considered to be that when the supply of the first liquid is temporarily stopped in the present embodiment, the pressure in the first tank 12a is maintained at a pressure higher than atmospheric pressure, thereby suppressing the generation of air bubbles.

1‧‧‧使用端10‧‧‧稀釋液製造裝置11‧‧‧第1配管12a‧‧‧第1槽12b‧‧‧第2槽13‧‧‧第2配管13a‧‧‧閥14a、14b‧‧‧閥15a、15b‧‧‧閥16‧‧‧藥液供給管線(液體供給手段)16a‧‧‧閥17a、17b‧‧‧大氣閥18‧‧‧壓力調整部18a‧‧‧槽加壓用氣體供給管線18b‧‧‧進排氣機構18c‧‧‧進氣閥18d‧‧‧排氣閥19a、19b‧‧‧閥19c‧‧‧壓力計20‧‧‧控制部21‧‧‧流量測定手段22‧‧‧濃度測定手段23‧‧‧壓力測定手段31‧‧‧連接管線31a‧‧‧閥F2、F3‧‧‧過濾器1‧‧‧Use end 10‧‧‧Diluent production device 11‧‧‧First piping 12a‧‧‧First tank 12b‧‧‧Second tank 13‧‧‧Second piping 13a‧‧‧Valves 14a, 14b ‧‧‧Valves 15a, 15b‧‧‧Valve 16‧‧‧Medical solution supply line (liquid supply means) 16a‧‧‧Valves 17a, 17b‧‧‧Air valve 18‧‧‧Pressure regulator 18a‧‧‧Slot Pressure gas supply line 18b‧‧‧Intake and exhaust mechanism 18c‧‧‧Inlet valve 18d‧‧‧Exhaust valve 19a, 19b‧‧‧valve 19c‧‧‧Pressure gauge 20‧‧‧Control part 21‧‧‧ Flow measuring means 22‧‧‧Concentration measuring means 23‧‧‧Pressure measuring means 31‧‧‧Connecting pipeline 31a‧‧‧Valve F2, F3‧‧‧Filter

[圖1]係本發明之第1實施形態之稀釋液製造裝置的概略構成圖。 [圖2]係本發明之第2實施形態之稀釋液製造裝置的概略構成圖。 [圖3]係本發明之一實施例之稀釋液製造裝置的流程圖。 [圖4]係將實施例1中之稀氨水之導電率相對於氨水之添加量作圖而得的圖表。 [圖5A]係顯示實施例2中之第1液體之流量、第1槽內之壓力、及稀氨水之導電率之時間變化的圖表。 [圖5B]係顯示比較例中之第1液體之流量、第1槽內之壓力、及稀氨水之導電率之時間變化的圖表。Fig. 1 is a schematic configuration diagram of a dilution liquid manufacturing apparatus according to a first embodiment of the present invention. [ Fig. 2] Fig. 2 is a schematic configuration diagram of an apparatus for producing a diluent according to a second embodiment of the present invention. Fig. 3 is a flow chart of an apparatus for producing a diluent according to an embodiment of the present invention. Fig. 4 is a graph obtained by plotting the conductivity of the diluted ammonia water in Example 1 with respect to the addition amount of the ammonia water. 5A is a graph showing time changes of the flow rate of the first liquid, the pressure in the first tank, and the conductivity of dilute ammonia water in Example 2. FIG. [ Fig. 5B ] is a graph showing temporal changes in the flow rate of the first liquid, the pressure in the first tank, and the conductivity of the dilute ammonia water in the comparative example.

Claims (12)

一種稀釋液製造裝置,係藉由對於第1液體添加第2液體,以製造該第2液體之稀釋液,並將該稀釋液供給至使用端;具有:第1配管,供給該第1液體;第1槽,儲存該第2液體;第2配管,將該第1槽與該第1配管予以連接;壓力調整部,係調整該第1槽內之壓力,將該第1槽內之該第2液體壓送通過該第2配管並供給至該第1配管;控制部,根據流經該第1配管內之該第1液體或該稀釋液之流量與該稀釋液之濃度的測定值,調整利用該壓力調整部所為之該第2液體對於該第1液體的添加量,以使該稀釋液之濃度成為預定之濃度;及第2槽,與該第1槽串聯連接,並暫時儲存待補充到該第1槽之該第2液體。 A device for producing a diluent for producing a diluent of the second liquid by adding a second liquid to the first liquid, and supplying the diluent to a use end; comprising: a first piping for supplying the first liquid; The first tank stores the second liquid; the second pipe connects the first tank with the first pipe; the pressure adjustment part adjusts the pressure in the first tank, and the pressure in the first tank 2 The liquid is pumped through the second pipe and supplied to the first pipe; the control unit adjusts the flow rate of the first liquid or the diluent and the concentration of the diluent flowing through the first pipe according to the measured value Using the addition amount of the second liquid to the first liquid by the pressure adjustment part, the concentration of the diluent becomes a predetermined concentration; and a second tank, connected in series with the first tank, and temporarily stored for replenishment to the second liquid in the first tank. 一種稀釋液製造裝置,係藉由對於第1液體添加第2液體,以製造該第2液體之稀釋液,並將該稀釋液供給至使用端;具有:第1配管,供給該第1液體;第1槽,儲存該第2液體;第2配管,將該第1槽與該第1配管予以連接;壓力調整部,係調整該第1槽內之壓力,將該第1槽內之該第2液體通過該第2配管進行壓送並供給至該第1配管; 控制部,根據流經該第1配管內之該第1液體或該稀釋液之流量與該稀釋液之濃度的測定值,調整利用該壓力調整部所為之該第2液體對於該第1液體的添加量,以使該稀釋液之濃度成為預定之濃度;及第2槽,與該第1槽並聯連接,並儲存待供給至該第1配管而不是該第1槽之該第2液體;該壓力調整部可調整該第2槽內之壓力,在該第1槽內之液位低於預定的下限液位時,該控制部藉由該壓力調整部進行調整以使該第2槽內之壓力與該第1槽內之壓力一致,然後將從該第1槽供給該第2液體到該第1配管切換成從該第2槽供給該第2液體到該第1配管。 A device for producing a diluent for producing a diluent of the second liquid by adding a second liquid to the first liquid, and supplying the diluent to a use end; comprising: a first piping for supplying the first liquid; The first tank stores the second liquid; the second pipe connects the first tank with the first pipe; the pressure adjustment part adjusts the pressure in the first tank, and the pressure in the first tank 2. The liquid is pressure-fed through the second piping and supplied to the first piping; The control part adjusts the pressure of the second liquid with respect to the first liquid by the pressure adjustment part according to the measured value of the flow rate of the first liquid or the diluent and the concentration of the diluent flowing through the first pipe The amount added so that the concentration of the diluent becomes a predetermined concentration; and a second tank connected in parallel with the first tank and storing the second liquid to be supplied to the first piping instead of the first tank; the The pressure adjustment part can adjust the pressure in the second tank, and when the liquid level in the first tank is lower than a predetermined lower limit liquid level, the control part adjusts the pressure adjustment part to make the liquid level in the second tank lower than the predetermined lower limit liquid level. The pressure is the same as the pressure in the first tank, and then the supply of the second liquid from the first tank to the first piping is switched to the supply of the second liquid from the second tank to the first piping. 如申請專利範圍第1項之稀釋液製造裝置,其中,該壓力調整部可調整該第2槽內之壓力;在該第1槽內之液位低於預定的下限液位時,該控制部藉由該壓力調整部進行調整以使該第2槽內之壓力與該第1槽內之壓力一致,然後從該第2槽補充該第2液體到該第1槽。 According to the diluent manufacturing device of claim 1, wherein the pressure adjustment part can adjust the pressure in the second tank; when the liquid level in the first tank is lower than a predetermined lower limit liquid level, the control part The pressure in the second tank is adjusted so that the pressure in the second tank is consistent with the pressure in the first tank, and then the second liquid is replenished from the second tank to the first tank. 如申請專利範圍第1或3項之稀釋液製造裝置,其中,將該第1槽與該第2槽予以連接,以使該第2槽內之該第2液體藉由水頭壓供給至該第1槽。 The diluent manufacturing apparatus according to claim 1 or 3, wherein the first tank and the second tank are connected so that the second liquid in the second tank is supplied to the second tank by head pressure 1 slot. 如申請專利範圍第1至3項中任一項之稀釋液製造裝置,具有多支該第2配管,該多支第2配管之內徑及長度中之至少一者彼此不同。 The diluent manufacturing apparatus of any one of claims 1 to 3 of the claimed scope includes a plurality of the second pipes, and at least one of the inner diameter and the length of the plurality of second pipes is different from each other. 如申請專利範圍第5項之稀釋液製造裝置,其中,該多支第2配管各自與該第1配管連接。 The dilution liquid manufacturing apparatus of claim 5, wherein each of the plurality of second pipes is connected to the first pipe. 如申請專利範圍第1至3項中任一項之稀釋液製造裝置,其中,該第1液體為超純水,第2液體為氨水溶液或四甲基氫氧化銨水溶液。 The diluent manufacturing apparatus according to any one of claims 1 to 3 of the scope of the application, wherein the first liquid is ultrapure water, and the second liquid is an aqueous ammonia solution or an aqueous tetramethylammonium hydroxide solution. 如申請專利範圍第1至3項中任一項之稀釋液製造裝置,其中,當停止供給該第1液體到該第1配管而使該稀釋液之製造停止時,該控制部調整該第1槽內之壓力,以使該第1槽內之壓力保持在高於大氣壓的壓力。 The diluent manufacturing apparatus according to any one of claims 1 to 3, wherein, when the supply of the first liquid to the first piping is stopped to stop the production of the diluent, the control unit adjusts the first pressure in the tank so that the pressure in the first tank is maintained at a pressure higher than atmospheric pressure. 如申請專利範圍第8項之稀釋液製造裝置,其中,該控制部調整該第1槽內之壓力,以使該第1槽內之壓力保持在高於該第2液體之飽和蒸氣壓的壓力。 The diluent manufacturing apparatus of claim 8, wherein the control unit adjusts the pressure in the first tank so that the pressure in the first tank is maintained at a pressure higher than the saturated vapor pressure of the second liquid . 如申請專利範圍第8項之稀釋液製造裝置,其中,該控制部調整該第1槽內之壓力,以使該第1槽內之壓力維持在該稀釋液之製造停止前所調整成的壓力。 The diluent production apparatus of claim 8, wherein the control unit adjusts the pressure in the first tank so that the pressure in the first tank is maintained at the pressure adjusted before the production of the diluent is stopped . 一種稀釋液製造方法,係藉由對於第1液體添加第2液體,以製造該第2液體之稀釋液,並將該稀釋液供給至使用端;包括下列步驟:將該第1液體供給至第1配管;將該第2液體供給至該第1配管,係調整儲存該第2液體之第1槽內的壓力,將該第1槽內之該第2液體壓送通過將該第1槽與該第1配管予以連接的第2配管,並供給至該第1配管;包括測定流經該第1配管內之該第1液體或該稀釋液之流量與該稀釋液之濃度,並根據該測定值調整該第2液體對於該第1液體的添加量,以使該稀釋液之濃度成為預定之濃度;將該第2液體暫時儲存在與該第1槽串聯連接之第2槽;及 根據該第1槽內之液位,將儲存於該第2槽之該第2液體補充到該第1槽。 A method for producing a diluent, by adding a second liquid to the first liquid, to produce a diluent of the second liquid, and supplying the diluent to a use end; comprising the steps of: supplying the first liquid to the first liquid 1 piping; supplying the second liquid to the first piping adjusts the pressure in the first tank where the second liquid is stored, and sends the second liquid in the first tank through the first tank and the The second pipe to which the first pipe is connected and supplied to the first pipe; including measuring the flow rate of the first liquid or the diluent and the concentration of the diluent flowing through the first pipe, and determining the concentration of the diluent according to the measurement Adjust the amount of the second liquid added to the first liquid to make the concentration of the diluted liquid a predetermined concentration; temporarily store the second liquid in a second tank connected in series with the first tank; and The second liquid stored in the second tank is replenished to the first tank according to the liquid level in the first tank. 一種稀釋液製造方法,係藉由對於第1液體添加第2液體,以製造該第2液體之稀釋液,並將該稀釋液供給至使用端;包括下列步驟:將該第1液體供給至第1配管;將該第2液體供給至該第1配管,係調整儲存該第2液體之第1槽內的壓力,通過將該第1槽與該第1配管予以連接的第2配管,將該第1槽內之該第2液體進行壓送並供給至該第1配管;包括測定流經該第1配管內之該第1液體或該稀釋液之流量與該稀釋液之濃度,並根據該測定值調整該第2液體對於該第1液體的添加量,以使該稀釋液之濃度成為預定之濃度;將該第2液體儲存在與該第1槽並聯連接之第2槽;及根據該第1槽內之液位,進行調整以使該第2槽內之壓力與該第1槽內之壓力一致,然後從該第2槽而不是從該第1槽供給該第2液體到該第1配管。 A method for producing a diluent, by adding a second liquid to the first liquid, to produce a diluent of the second liquid, and supplying the diluent to a use end; comprising the steps of: supplying the first liquid to the first liquid 1 piping; supply the second liquid to the first piping, adjust the pressure in the first tank in which the second liquid is stored, and pass the second piping connecting the first tank and the first piping, the The second liquid in the first tank is pumped and supplied to the first piping; including measuring the flow rate of the first liquid or the dilution liquid and the concentration of the dilution liquid flowing through the first piping, and determining the concentration of the dilution liquid according to the The measured value adjusts the addition amount of the second liquid to the first liquid so that the concentration of the diluent becomes a predetermined concentration; stores the second liquid in a second tank connected in parallel with the first tank; and according to the The liquid level in the first tank is adjusted so that the pressure in the second tank is consistent with the pressure in the first tank, and the second liquid is supplied to the second tank from the second tank instead of the first tank 1 piping.
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