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TWI741151B - 工件的檢查方法、工件的檢查裝置及加工裝置 - Google Patents

工件的檢查方法、工件的檢查裝置及加工裝置 Download PDF

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Publication number
TWI741151B
TWI741151B TW107106243A TW107106243A TWI741151B TW I741151 B TWI741151 B TW I741151B TW 107106243 A TW107106243 A TW 107106243A TW 107106243 A TW107106243 A TW 107106243A TW I741151 B TWI741151 B TW I741151B
Authority
TW
Taiwan
Prior art keywords
workpiece
processed surface
light
processing
image
Prior art date
Application number
TW107106243A
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English (en)
Chinese (zh)
Other versions
TW201834051A (zh
Inventor
高橋邦充
北野元己
前嶋信
Original Assignee
日商迪思科股份有限公司
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Application filed by 日商迪思科股份有限公司 filed Critical 日商迪思科股份有限公司
Publication of TW201834051A publication Critical patent/TW201834051A/zh
Application granted granted Critical
Publication of TWI741151B publication Critical patent/TWI741151B/zh

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • B24B37/0053Control means for lapping machines or devices detecting loss or breakage of a workpiece during lapping
    • H10P72/06
    • H10P74/203
    • H10P74/235
    • H10P74/27

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Computer Hardware Design (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Power Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
TW107106243A 2017-02-28 2018-02-23 工件的檢查方法、工件的檢查裝置及加工裝置 TWI741151B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-036598 2017-02-28
JP2017036598A JP2018140469A (ja) 2017-02-28 2017-02-28 被加工物の検査方法、被加工物の検査装置及び加工装置

Publications (2)

Publication Number Publication Date
TW201834051A TW201834051A (zh) 2018-09-16
TWI741151B true TWI741151B (zh) 2021-10-01

Family

ID=63375560

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107106243A TWI741151B (zh) 2017-02-28 2018-02-23 工件的檢查方法、工件的檢查裝置及加工裝置

Country Status (4)

Country Link
JP (1) JP2018140469A (ja)
KR (1) KR20180099490A (ja)
CN (1) CN108500842A (ja)
TW (1) TWI741151B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110153859A (zh) * 2019-06-28 2019-08-23 深圳方达半导体装备有限公司 一种全自动研磨机
JP7529408B2 (ja) * 2020-02-17 2024-08-06 株式会社ディスコ 加工装置
JP7519804B2 (ja) * 2020-04-27 2024-07-22 株式会社ディスコ 加工装置
JP7455476B2 (ja) * 2020-05-28 2024-03-26 株式会社ディスコ ウエーハ検査装置、及びウエーハ検査方法
CN111843675B (zh) * 2020-07-15 2021-09-07 郑州龙华机电工程有限公司 一种电力设备在线监测系统
CN112025547B (zh) * 2020-09-15 2021-11-02 泉芯集成电路制造(济南)有限公司 激光投影虚拟校正设备和方法
JP7746093B2 (ja) * 2021-09-24 2025-09-30 株式会社Screenホールディングス 基板処理装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200618944A (en) * 2004-12-02 2006-06-16 Taiwan Semiconductor Mfg Co Ltd Methods of predicting CMP removal rate and transferring CMP processes
JP2008155292A (ja) * 2006-12-21 2008-07-10 Disco Abrasive Syst Ltd 基板の加工方法および加工装置
JP2016156822A (ja) * 2015-02-25 2016-09-01 株式会社昭和電気研究所 ウェハ欠陥検査装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06105741B2 (ja) * 1989-11-24 1994-12-21 株式会社東芝 インナーリードボンディング検査方法
JPH05288687A (ja) * 1992-04-09 1993-11-02 Fujitsu Ltd リード検査装置
FI111757B (fi) * 1999-05-10 2003-09-15 Metso Automation Oy Menetelmä ja mittausjärjestely mitata paperin pintaa
NL1018943C2 (nl) * 2001-09-13 2003-03-14 Tno Werkwijze en inrichting voor het polijsten van een werkstukoppervlak.
JP2006208347A (ja) * 2004-02-25 2006-08-10 Jfe Steel Kk 圧延用ロールの表面欠陥検出装置、研削装置、表面欠陥検出方法及び表面欠陥検出用プログラム並びに圧延用ロール研削方法
JP2006226804A (ja) * 2005-02-17 2006-08-31 Matsushita Electric Ind Co Ltd フラットディスプレイパネルの検査方法
JP4635939B2 (ja) * 2006-03-30 2011-02-23 株式会社ニコン 表面検査装置
JP5274919B2 (ja) 2008-07-09 2013-08-28 株式会社ディスコ 研削装置及びスクラッチ検出装置
CN101762250A (zh) * 2010-01-28 2010-06-30 上海交通大学 磨削工件表面质量光学实时检测装置
CN101805903B (zh) * 2010-04-12 2012-07-25 太原理工大学 一种钢基表面激光钎焊熔覆铜合金层的方法
KR20150143151A (ko) * 2014-06-13 2015-12-23 삼성전자주식회사 웨이퍼의 연마 방법
JP6377459B2 (ja) * 2014-08-29 2018-08-22 株式会社ディスコ ウエーハ検査方法、研削研磨装置
WO2016080401A1 (ja) * 2014-11-18 2016-05-26 三菱レイヨン株式会社 金属板の補修方法、及び鋳型の製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200618944A (en) * 2004-12-02 2006-06-16 Taiwan Semiconductor Mfg Co Ltd Methods of predicting CMP removal rate and transferring CMP processes
JP2008155292A (ja) * 2006-12-21 2008-07-10 Disco Abrasive Syst Ltd 基板の加工方法および加工装置
JP2016156822A (ja) * 2015-02-25 2016-09-01 株式会社昭和電気研究所 ウェハ欠陥検査装置

Also Published As

Publication number Publication date
JP2018140469A (ja) 2018-09-13
KR20180099490A (ko) 2018-09-05
TW201834051A (zh) 2018-09-16
CN108500842A (zh) 2018-09-07

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