TWI699415B - Thermosetting adhesive composition - Google Patents
Thermosetting adhesive composition Download PDFInfo
- Publication number
- TWI699415B TWI699415B TW104137142A TW104137142A TWI699415B TW I699415 B TWI699415 B TW I699415B TW 104137142 A TW104137142 A TW 104137142A TW 104137142 A TW104137142 A TW 104137142A TW I699415 B TWI699415 B TW I699415B
- Authority
- TW
- Taiwan
- Prior art keywords
- thermosetting adhesive
- conductive filler
- mass
- epoxy resin
- parts
- Prior art date
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- 229920001187 thermosetting polymer Polymers 0.000 title claims abstract description 193
- 239000000853 adhesive Substances 0.000 title claims abstract description 151
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 151
- 239000000203 mixture Substances 0.000 title claims abstract description 65
- 239000011231 conductive filler Substances 0.000 claims abstract description 108
- 239000002245 particle Substances 0.000 claims abstract description 90
- 239000003822 epoxy resin Substances 0.000 claims abstract description 72
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 72
- 229920005989 resin Polymers 0.000 claims abstract description 66
- 239000011347 resin Substances 0.000 claims abstract description 66
- 229920006243 acrylic copolymer Polymers 0.000 claims abstract description 34
- 239000000178 monomer Substances 0.000 claims description 22
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 15
- 239000004848 polyfunctional curative Substances 0.000 claims description 15
- 239000007787 solid Substances 0.000 claims description 15
- 239000007788 liquid Substances 0.000 claims description 13
- 239000012766 organic filler Substances 0.000 claims description 13
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 claims description 8
- 150000007524 organic acids Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 238000007334 copolymerization reaction Methods 0.000 claims description 5
- 125000003700 epoxy group Chemical group 0.000 claims description 5
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 claims description 5
- 229920005749 polyurethane resin Polymers 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 239000002994 raw material Substances 0.000 claims description 2
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 36
- 239000002184 metal Substances 0.000 abstract description 36
- 239000003795 chemical substances by application Substances 0.000 abstract description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 21
- 230000007423 decrease Effects 0.000 description 21
- 229920002635 polyurethane Polymers 0.000 description 17
- 239000004814 polyurethane Substances 0.000 description 17
- 239000010410 layer Substances 0.000 description 16
- -1 isooctyl Chemical group 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 12
- 239000000843 powder Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 10
- 230000000740 bleeding effect Effects 0.000 description 9
- 238000002156 mixing Methods 0.000 description 8
- 229920001721 polyimide Polymers 0.000 description 8
- 239000011241 protective layer Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 229920000459 Nitrile rubber Polymers 0.000 description 5
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- WNLRTRBMVRJNCN-UHFFFAOYSA-L adipate(2-) Chemical compound [O-]C(=O)CCCCC([O-])=O WNLRTRBMVRJNCN-UHFFFAOYSA-L 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000003825 pressing Methods 0.000 description 5
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 4
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 4
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 239000011256 inorganic filler Substances 0.000 description 4
- 229910003475 inorganic filler Inorganic materials 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 238000010079 rubber tapping Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000001186 cumulative effect Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- 238000000790 scattering method Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 239000002313 adhesive film Substances 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 210000001787 dendrite Anatomy 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000012948 isocyanate Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- PQTBTIFWAXVEPB-UHFFFAOYSA-N sulcotrione Chemical compound ClC1=CC(S(=O)(=O)C)=CC=C1C(=O)C1C(=O)CCCC1=O PQTBTIFWAXVEPB-UHFFFAOYSA-N 0.000 description 2
- 238000010557 suspension polymerization reaction Methods 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- QEVGZEDELICMKH-UHFFFAOYSA-N Diglycolic acid Chemical compound OC(=O)COCC(O)=O QEVGZEDELICMKH-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-L Malonate Chemical compound [O-]C(=O)CC([O-])=O OFOBLEOULBTSOW-UHFFFAOYSA-L 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229940067597 azelate Drugs 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000004643 cyanate ester Substances 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- TVIDDXQYHWJXFK-UHFFFAOYSA-L dodecanedioate(2-) Chemical compound [O-]C(=O)CCCCCCCCCCC([O-])=O TVIDDXQYHWJXFK-UHFFFAOYSA-L 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- QQHJDPROMQRDLA-UHFFFAOYSA-N hexadecanedioic acid Chemical compound OC(=O)CCCCCCCCCCCCCCC(O)=O QQHJDPROMQRDLA-UHFFFAOYSA-N 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- QQVIHTHCMHWDBS-UHFFFAOYSA-L isophthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC(C([O-])=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-L 0.000 description 1
- 239000004849 latent hardener Substances 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 229940049920 malate Drugs 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N malic acid Chemical compound OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- WLJVNTCWHIRURA-UHFFFAOYSA-M pimelate(1-) Chemical compound OC(=O)CCCCCC([O-])=O WLJVNTCWHIRURA-UHFFFAOYSA-M 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920006295 polythiol Polymers 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229940116351 sebacate Drugs 0.000 description 1
- CXMXRPHRNRROMY-UHFFFAOYSA-L sebacate(2-) Chemical compound [O-]C(=O)CCCCCCCCC([O-])=O CXMXRPHRNRROMY-UHFFFAOYSA-L 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- TYFQFVWCELRYAO-UHFFFAOYSA-L suberate(2-) Chemical compound [O-]C(=O)CCCCCCC([O-])=O TYFQFVWCELRYAO-UHFFFAOYSA-L 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 238000009823 thermal lamination Methods 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/08—Macromolecular additives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/10—Homopolymers or copolymers of methacrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J9/00—Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
- C09J9/02—Electrically-conducting adhesives
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Adhesive Tapes (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
提供一種可抑制樹脂滲出之熱硬化性接著組成物、及熱硬化性接著片。 Provided is a thermosetting adhesive composition and a thermosetting adhesive sheet that can inhibit resin exudation.
構成熱硬化性接著片20之本發明之熱硬化性接著組成物含有丙烯酸系共聚物、熱硬化性環氧樹脂、環氧樹脂硬化劑、樹枝狀之導電性填料21、及平均粒徑為3μm以上且15μm以下之範圍之非導電性填料22。藉此,由於非導電性填料22纏繞於樹枝狀之導電性填料21,故而會抑制樹脂成分之流動從而抑制樹脂滲出,並且將金屬板30與端子11電連接。 The thermosetting adhesive composition of the present invention constituting the thermosetting adhesive sheet 20 contains an acrylic copolymer, a thermosetting epoxy resin, an epoxy resin curing agent, a dendritic conductive filler 21, and an average particle diameter of 3 μm The non-conductive filler 22 is within the range of 15 μm or more. Thereby, since the non-conductive filler 22 is wound around the dendritic conductive filler 21, the flow of the resin component is suppressed to suppress resin exudation, and the metal plate 30 and the terminal 11 are electrically connected.
Description
本發明係關於一種用以將撓性印刷配線板之接地端子連接於金屬板而對撓性印刷配線板進行補強之導電性熱硬化性接著組成物。 The present invention relates to a conductive thermosetting adhesive composition for connecting a ground terminal of a flexible printed wiring board to a metal plate to reinforce the flexible printed wiring board.
先前會使撓性印刷配線板接著於金屬板進行補強,並且藉由將撓性印刷配線板之接地端子電連接於金屬板而接地,從而進行遮蔽(shield)。撓性印刷配線板與金屬板之接著中,使用導電性之熱硬化性接著組成物。 Previously, the flexible printed wiring board was reinforced with the metal plate, and the grounding terminal of the flexible printed wiring board was electrically connected to the metal plate to be grounded, thereby performing shielding. In the bonding between the flexible printed wiring board and the metal plate, a conductive thermosetting bonding composition is used.
作為習知技術,例如有日本特開2011-79959號公報、日本特開2013-41869號公報。 As conventional technologies, there are, for example, Japanese Patent Application Publication No. 2011-79959 and Japanese Patent Application Publication No. 2013-41869.
為了進行撓性印刷配線板之電路圖案之鍍敷或流動焊接(flow soldering),存在於金屬板設置開孔部之情況。然而,習知之熱硬化性接著組成物存在如下情況:於加熱加壓時,樹脂成分會大量地滲出,導致堵塞設置於金屬板之開孔部。 In order to perform plating or flow soldering of the circuit pattern of the flexible printed wiring board, there are cases where openings are provided in the metal plate. However, in the conventional thermosetting adhesive composition, there is a situation in which the resin component oozes out in a large amount when heated and pressurized, causing the opening of the metal plate to be blocked.
本發明係鑒於此種習知之實際情況而提出者,提供一種具有導電性且可抑制樹脂滲出之熱硬化性接著組成物。 The present invention is proposed in view of the actual situation of such conventional knowledge, and provides a thermosetting adhesive composition that has conductivity and can inhibit resin bleeding.
本發明人進行了深入研究,結果發現:藉由使用樹枝狀之導電性填料及特定之平均粒徑之非導電性填料,能夠抑制樹脂滲出。 The inventors conducted intensive studies and found that by using dendritic conductive fillers and specific average particle diameter non-conductive fillers, resin exudation can be suppressed.
即,本發明之熱硬化性接著組成物係如下熱硬化性接著組成物,其具有:樹脂成分,其含有丙烯酸系共聚物、分子中殘存有環氧基之熱硬化性環氧樹脂、及使上述熱硬化性環氧樹脂進行硬化反應之環氧樹脂硬化劑;樹枝狀之導電性填料,其分散於上述樹脂成分;及非導電性填料,其分散於上述樹脂成分;上述非導電性填料之平均粒徑為3μm以上且15μm以下之範圍。 That is, the thermosetting adhesive composition of the present invention is the following thermosetting adhesive composition, which has a resin component containing an acrylic copolymer, a thermosetting epoxy resin with epoxy groups remaining in the molecule, and The epoxy resin hardener for curing the thermosetting epoxy resin; dendritic conductive filler dispersed in the resin component; and non-conductive filler dispersed in the resin component; the non-conductive filler The average particle size is in the range of 3 μm or more and 15 μm or less.
本發明係一種熱硬化性接著組成物,其中,相對於上述丙烯酸系共聚物100質量份,於4質量份以上且120質量份以下之範圍含有上述非導電性填料。 The present invention is a thermosetting adhesive composition in which the non-conductive filler is contained in a range of 4 parts by mass or more and 120 parts by mass or less with respect to 100 parts by mass of the acrylic copolymer.
本發明係一種熱硬化性接著組成物,其中,上述非導電性填料為有機填料。 The present invention is a thermosetting adhesive composition, wherein the non-conductive filler is an organic filler.
本發明係一種熱硬化性接著組成物,其中,上述非導電性填料為有機填料,該有機填料為聚胺酯(polyurethane)樹脂粒子。 The present invention is a thermosetting adhesive composition, wherein the non-conductive filler is an organic filler, and the organic filler is a polyurethane resin particle.
本發明係一種熱硬化性接著組成物,其中,於將藉由共聚反應生成上述丙烯酸系共聚物之單體設為100wt%時,上述丙烯酸系共聚物係55wt%以上且80wt%以下之範圍之(甲基)丙烯酸烷基酯之單體、15wt%以上且 30wt%以下之範圍之丙烯腈之單體、及5wt%以上且15wt%以下之範圍之甲基丙烯酸環氧丙酯之單體藉由共聚反應而生成。 The present invention is a thermosetting adhesive composition, wherein, when the monomer that produces the acrylic copolymer by copolymerization is set to 100wt%, the acrylic copolymer is in the range of 55wt% to 80wt% (Meth) acrylate monomer, 15wt% or more and The monomer of acrylonitrile in the range of 30wt% or less and the monomer of glycidyl methacrylate in the range of 5wt% or more and 15wt% or less are produced by copolymerization.
本發明係一種熱硬化性接著組成物,其中,上述環氧樹脂硬化劑為有機酸二醯肼。 The present invention is a thermosetting adhesive composition, wherein the epoxy resin curing agent is an organic acid dihydrazide.
本發明係一種熱硬化性接著組成物,其中,相對於100質量份之上述丙烯酸系共聚物,在上述熱硬化性環氧樹脂,於5質量份以上且30質量份以下之範圍含有液體狀之上述環氧樹脂即液體狀熱硬化性環氧樹脂,於10質量份以上且50質量份以下之範圍含有固體狀之上述環氧樹脂即固體狀熱硬化性環氧樹脂,相對於由上述丙烯酸系共聚物及上述環氧樹脂構成之原料成分100質量份,於1質量份以上且50質量份以下之範圍含有上述環氧樹脂硬化劑。 The present invention is a thermosetting adhesive composition in which, relative to 100 parts by mass of the acrylic copolymer, the thermosetting epoxy resin contains a liquid in a range of 5 parts by mass to 30 parts by mass The epoxy resin is a liquid thermosetting epoxy resin, and the solid epoxy resin, which is a solid thermosetting epoxy resin, is contained in the range of 10 parts by mass or more and 50 parts by mass or less. 100 parts by mass of the raw material components composed of the copolymer and the above-mentioned epoxy resin contain the above-mentioned epoxy resin hardener in the range of 1 part by mass or more and 50 parts by mass or less.
本發明係一種熱硬化性接著組成物,其中,樹枝狀之上述導電性填料之平均粒徑設為3μm以上且20μm以下之範圍。 The present invention is a thermosetting adhesive composition in which the average particle diameter of the dendritic conductive filler is set in the range of 3 μm or more and 20 μm or less.
本發明係一種熱硬化性接著組成物,其成形為膜狀。 The present invention is a thermosetting adhesive composition formed into a film shape.
本發明係一種熱硬化性接著組成物,其中,上述非導電性填料之平均粒徑設為小於樹枝狀之上述導電性填料之平均粒徑。 The present invention is a thermosetting adhesive composition, wherein the average particle size of the non-conductive filler is smaller than the average particle size of the dendritic conductive filler.
根據本發明,由於特定之平均粒徑之非導電性填料纏繞於樹枝狀之導電性填料,故而可抑制樹脂成分之流動,從而抑制樹脂滲出。 According to the present invention, since the non-conductive filler of a specific average particle size is wound around the dendritic conductive filler, the flow of the resin component can be suppressed, thereby suppressing resin exudation.
10‧‧‧撓性印刷配線板 10‧‧‧Flexible printed wiring board
11‧‧‧端子 11‧‧‧Terminal
12‧‧‧基材 12‧‧‧Substrate
13‧‧‧配線 13‧‧‧Wiring
14‧‧‧接著層 14‧‧‧Next layer
15‧‧‧保護層 15‧‧‧Protection layer
20‧‧‧熱硬化性接著片 20‧‧‧Thermosetting adhesive film
21‧‧‧樹枝狀之導電性填料 21‧‧‧Dendrite conductive filler
22‧‧‧非導電性填料 22‧‧‧Non-conductive filler
30‧‧‧金屬板 30‧‧‧Metal plate
圖1係用以對使用有熱硬化性接著片之連接方法進行說明 之斜視圖。 Figure 1 is used to illustrate the connection method using a thermosetting adhesive sheet The oblique view.
圖2係使用有熱硬化性接著片之連接構造體之剖面圖。 Figure 2 is a cross-sectional view of a connection structure using a thermosetting adhesive sheet.
圖3係用以對使用有熱硬化性接著片之連接方法進行說明之熱硬化性接著片之剖面圖。 Fig. 3 is a cross-sectional view of the thermosetting adhesive sheet for explaining the connection method using the thermosetting adhesive sheet.
圖4係用以對樹枝狀填料之形狀進行說明之圖。 Figure 4 is a diagram for explaining the shape of the dendritic filler.
以下,針對本發明之實施形態,一面參照圖式一面按照下述順序詳細地進行說明。 Hereinafter, embodiments of the present invention will be described in detail in the following order while referring to the drawings.
1.熱硬化性接著組成物 1. Thermosetting adhesive composition
2.熱硬化性接著片 2. Thermosetting adhesive sheet
3.實施例 3. Example
若將藉由聚合反應生成丙烯酸系樹脂之單體稱為丙烯酸單體,則本發明之熱硬化性接著組成物含有使兩種以上丙烯酸單體進行共聚所獲得之丙烯酸聚合物即丙烯酸系共聚物(A)。 If the monomer that produces the acrylic resin by polymerization is called the acrylic monomer, the thermosetting adhesive composition of the present invention contains an acrylic polymer obtained by copolymerizing two or more acrylic monomers, that is, an acrylic copolymer (A).
又,本發明之熱硬化性接著組成物含有分子中殘存有環氧基且被分類為預聚物之熱硬化性環氧樹脂(B)。熱硬化性環氧樹脂(B)為具有反應性之高分子,若藉由反應起始劑使聚合反應開始,則會進行交聯,形成網狀之高分子。 In addition, the thermosetting adhesive composition of the present invention contains a thermosetting epoxy resin (B) in which an epoxy group remains in the molecule and is classified as a prepolymer. The thermosetting epoxy resin (B) is a reactive polymer, and when the polymerization reaction is started by a reaction initiator, it will be cross-linked to form a network-like polymer.
若將丙烯酸系共聚物(A)、及熱硬化性環氧樹脂(B)作為樹脂成分,則本發明之熱硬化性接著組成物含有樹脂成分、環氧樹脂硬化劑(C)、樹 枝狀之導電性填料(D)、及非導電性填料(E)。 If acrylic copolymer (A) and thermosetting epoxy resin (B) are used as resin components, the thermosetting adhesive composition of the present invention contains resin components, epoxy resin hardener (C), and resin Dendritic conductive filler (D) and non-conductive filler (E).
以下,針對熱硬化性接著組成物之各成分(A)~(E)詳細地進行說明。 Hereinafter, each component (A) to (E) of the thermosetting adhesive composition will be described in detail.
本發明之丙烯酸系共聚物係於膜成形時賦予成膜性且對硬化物賦予可撓性、強韌性者,且係使(甲基)丙烯酸烷基酯單體、丙烯腈(AN)單體及甲基丙烯酸環氧丙酯(GMA)單體共聚而成者。此處,所謂(甲基)丙烯酸酯,意指丙烯酸酯(acrylic acid ester)或甲基丙烯酸酯(methacrylic acid ester)。 The acrylic copolymer of the present invention is one that imparts film forming properties and imparts flexibility and toughness to the cured product during film formation, and is made of alkyl (meth)acrylate monomers and acrylonitrile (AN) monomers And glycidyl methacrylate (GMA) monomer copolymerized. Here, the so-called (meth)acrylate means acrylic acid ester or methacrylic acid ester.
作為(甲基)丙烯酸烷基酯,可自應用於電子零件領域之習知之丙烯酸系熱硬化性接著劑中所使用者適當選擇並以單體之形式使用,例如可使用具有碳原子數為4以上且12以下之個數之烷基之(甲基)丙烯酸烷基酯。作為具體例,可列舉(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸月桂酯等,可自該等之中單獨使用1種,或將2種以上組合使用。該等之中,較佳為使用丙烯酸乙酯(EA)、丙烯酸丁酯(BA)、丙烯酸2-乙基己酯(2EHA)。 As the (meth)acrylic acid alkyl ester, it can be appropriately selected from the conventional acrylic thermosetting adhesive used in the field of electronic parts and used as a monomer. For example, it can be used as a monomer with 4 carbon atoms. Alkyl (meth)acrylate of an alkyl group of more than and 12 or less. Specific examples include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, butyl (meth)acrylate, isobutyl (meth)acrylate, (meth) ) 2-ethylhexyl acrylate, octyl (meth)acrylate, isooctyl (meth)acrylate, isononyl (meth)acrylate, lauryl (meth)acrylate, etc., among them One type is used alone, or two or more types are used in combination. Among these, ethyl acrylate (EA), butyl acrylate (BA), and 2-ethylhexyl acrylate (2EHA) are preferably used.
關於構成丙烯酸系共聚物之所有單體中之(甲基)丙烯酸烷基酯之量,若過少則存在基本特性降低之傾向,若過多則存在耐熱性降低之傾向,因此較佳為55wt%以上且80wt%以下。 Regarding the amount of (meth)acrylic acid alkyl ester in all the monomers constituting the acrylic copolymer, if it is too small, the basic properties tend to decrease, and if it is too large, the heat resistance tends to decrease, so it is preferably 55wt% or more And below 80wt%.
又,關於生成丙烯酸系共聚物之所有單體中之丙烯腈(AN) 之量,若過少則存在耐熱性降低之傾向,若過多則存在難以溶解於溶劑之傾向,因此較佳為15wt%以上且30wt%以下。 Also, regarding the acrylonitrile (AN) in all monomers that produce acrylic copolymers If the amount is too small, the heat resistance tends to decrease, and if it is too large, it tends to be difficult to dissolve in the solvent. Therefore, it is preferably 15 wt% or more and 30 wt% or less.
又,關於生成丙烯酸系共聚物之所有單體中之甲基丙烯酸環氧丙酯(GMA)之量,若過少則存在耐熱性降低之傾向,若過多則存在剝離強度降低之傾向,因此較佳為5wt%以上且15wt%以下。 Regarding the amount of glycidyl methacrylate (GMA) in all monomers that form the acrylic copolymer, if it is too small, the heat resistance tends to decrease, and if it is too large, the peel strength tends to decrease, so it is preferable It is 5wt% or more and 15wt% or less.
作為丙烯酸系共聚物之聚合方法,並無特別限定,就獲得高分子量之觀點而言,較佳為使用珠狀聚合。關於丙烯酸系共聚物之重量平均分子量,若過小則存在耐熱性降低之傾向,若過大則存在溶液黏度上升,塗布性變差之傾向,因此較佳為500000以上且700000以下,更佳為550000以上且650000以下 The polymerization method of the acrylic copolymer is not particularly limited, but from the viewpoint of obtaining a high molecular weight, bead polymerization is preferred. Regarding the weight average molecular weight of the acrylic copolymer, if it is too small, the heat resistance tends to decrease, and if it is too large, the solution viscosity increases and the coatability tends to deteriorate. Therefore, it is preferably 500,000 or more and 700,000 or less, more preferably 550,000 or more And below 650,000
熱硬化性環氧樹脂係形成三維網目結構,賦予良好之耐熱性、接著性者,於熱硬化性環氧樹脂中有於常溫下為固體之固體狀熱硬化性環氧樹脂、及於常溫下為液體之液體狀熱硬化性環氧樹脂,於本發明所含有之熱硬化性環氧樹脂中,較佳為將固體狀熱硬化性環氧樹脂與液體狀熱硬化性環氧樹脂混合使用。 The thermosetting epoxy resin forms a three-dimensional network structure, which gives good heat resistance and adhesion. Among the thermosetting epoxy resins, there are solid thermosetting epoxy resins that are solid at room temperature, and at room temperature Liquid thermosetting epoxy resin which is liquid, among thermosetting epoxy resins contained in the present invention, it is preferable to use a mixture of solid thermosetting epoxy resin and liquid thermosetting epoxy resin.
此處,所謂常溫,意指JIS Z 8703所規定之5℃-35℃(5℃以上且35℃以下)之溫度範圍。 Here, the "normal temperature" means the temperature range of 5°C to 35°C (5°C or more and 35°C or less) specified in JIS Z 8703.
作為液體狀熱硬化性環氧樹脂,只要於常溫下為液體狀,則並無特別限定,可列舉雙酚A型環氧樹脂,雙酚F型環氧樹脂、酚醛清漆酚型環氧樹脂、萘型環氧樹脂等,可自該等之中單獨使用1種,或將2種以上組合使用。尤其就膜之黏性、柔軟性等觀點而言,較佳使用雙酚A型 環氧樹脂、雙酚F型環氧樹脂。 The liquid thermosetting epoxy resin is not particularly limited as long as it is liquid at room temperature. Examples include bisphenol A epoxy resin, bisphenol F epoxy resin, novolac epoxy resin, A naphthalene type epoxy resin etc. can be used individually by 1 type among these, or in combination of 2 or more types. Especially from the viewpoint of film viscosity and flexibility, it is better to use bisphenol A type Epoxy resin, bisphenol F type epoxy resin.
關於液體狀熱硬化性環氧樹脂之含量,若過少則存在樹脂溢流(resin flow)降低之傾向,若過多則存在常溫保管性降低之傾向,因此相對於丙烯酸系共聚物100質量份,較佳為5質量份以上且30質量份以下之範圍,更佳為15質量份以上且25質量份以下之範圍。 Regarding the content of the liquid thermosetting epoxy resin, if it is too small, the resin flow tends to decrease, and if it is too large, the room temperature storage property tends to decrease. Therefore, relative to 100 parts by mass of the acrylic copolymer, it is more It is preferably a range of 5 parts by mass or more and 30 parts by mass or less, and more preferably a range of 15 parts by mass or more and 25 parts by mass or less.
作為固體狀熱硬化性環氧樹脂,只要與液體狀熱硬化性環氧樹脂相溶且於常溫下為固體狀,則並無特別限定,可列舉多官能型環氧樹脂、二環戊二烯(DCPD)型環氧樹脂、酚醛清漆酚型環氧樹脂、聯苯型環氧樹脂、萘型環氧樹脂等,可自該等之中單獨使用1種,或將2種以上組合使用。該等之中,較佳使用DCPD型環氧樹脂。 The solid thermosetting epoxy resin is not particularly limited as long as it is compatible with the liquid thermosetting epoxy resin and is solid at room temperature. Examples include multifunctional epoxy resins and dicyclopentadiene (DCPD) type epoxy resin, novolac type epoxy resin, biphenyl type epoxy resin, naphthalene type epoxy resin, etc., can be used alone or in combination of two or more. Among them, DCPD type epoxy resin is preferably used.
關於固體狀熱硬化性環氧樹脂之含量,若過少則存在耐熱性降低之傾向,若過多則存在接著性降低之傾向,因此相對於丙烯酸系共聚物100質量份,較佳為10質量份以上且50質量份以下之範圍,更佳為30質量份以上且50質量份以下之範圍。 Regarding the content of the solid thermosetting epoxy resin, if it is too small, the heat resistance tends to decrease, and if it is too large, the adhesiveness tends to decrease. Therefore, it is preferably 10 parts by mass or more relative to 100 parts by mass of the acrylic copolymer And the range of 50 parts by mass or less is more preferably the range of 30 parts by mass or more and 50 parts by mass or less.
作為環氧樹脂硬化劑,可使用通常使用之公知之硬化劑。例如,可列舉有機酸二醯肼、二氰二胺(dicyandiamide)、胺化合物、聚醯胺胺化合物、氰酸酯化合物、酚樹脂、酸酐、羧酸、三級胺化合物、咪唑、路易斯酸、布忍斯特酸鹽、聚硫醇系硬化劑、尿素樹脂、三聚氰胺樹脂、異氰酸酯化合物、封端異氰酸酯(blocked isocyanate)化合物、潛伏性硬化劑等,可自該等之中單獨使用1種,或將2種以上組合使用。該等之中,就常溫保管性之觀點而言,較佳為使用有機酸二醯肼。 As the epoxy resin hardener, a well-known hardener generally used can be used. For example, the organic acid dihydrazine, dicyandiamide, amine compound, polyamide amine compound, cyanate ester compound, phenol resin, acid anhydride, carboxylic acid, tertiary amine compound, imidazole, Lewis acid, Brunste salts, polythiol-based hardeners, urea resins, melamine resins, isocyanate compounds, blocked isocyanate compounds, latent hardeners, etc., can be used alone or combined Use 2 or more in combination. Among these, it is preferable to use organic acid dihydrazide from the viewpoint of room temperature storage properties.
有機酸二醯肼由於常溫下為固體,因此可提昇熱硬化性接著組成物之常溫保管性。作為有機酸二醯肼,例如可列舉己二酸二醯肼、乙二酸二醯肼、丙二酸二醯肼、琥珀酸二醯肼、亞胺基二乙酸二醯肼、庚二酸二醯肼、辛二酸二醯肼、壬二酸二醯肼、癸二酸二醯肼、十二烷二酸二醯肼、十六烷二酸二醯肼、順丁烯二酸二醯肼、反丁烯二酸二醯肼、二甘醇酸二醯肼、酒石酸二醯肼、蘋果酸二醯肼、間苯二甲酸二醯肼、對苯二甲酸二醯肼、2,6-萘甲酸二醯肼、4,4'-聯苯二醯肼、1,4-萘甲酸二醯肼、Amicure VDH、Amicure UDH(商品名,味之素(股)製造)、檸檬酸三醯肼等,可自該等之中單獨使用1種,或將2種以上組合使用。該等之中,就熔點相對較低、硬化性之平衡優異、容易獲取之方面而言,較佳使用己二酸二醯肼。 Since the organic acid dihydrazide is solid at room temperature, it can improve the room temperature storage properties of the thermosetting adhesive composition. As the organic acid dihydrazine, for example, dihydrazine adipate, dihydrazine oxalate, dihydrazine malonate, dihydrazine succinate, dihydrazine iminodiacetate, and dihydrazine pimelate can be cited. Dihydrazine, dihydrazine suberate, dihydrazine azelate, dihydrazine sebacate, dihydrazine dodecanedioate, dihydrazine hexadecanedioate, dihydrazide maleate , Dihydrazine fumarate, diglycolic acid dihydrazine, dihydrazine tartrate, dihydrazine malate, dihydrazine isophthalate, dihydrazine terephthalate, 2,6-naphthalene Dihydrazine formate, 4,4'-biphenyldihydrazine, 1,4-naphthoate dihydrazine, Amicure VDH, Amicure UDH (trade name, manufactured by Ajinomoto), trihydrazine citrate, etc. , Can be used alone or in combination of two or more of them. Among them, it is preferable to use dihydrazine adipate in terms of relatively low melting point, excellent curing property balance, and easy availability.
又,有機酸二醯肼之平均粒徑較佳為0.5μm以上且15μm以下之範圍,更佳為1μm以上且5μm以下之範圍。若平均粒徑過小,則存在如下傾向:於為了塗布熱硬化性接著組成物而使用有機溶劑之情形時,有機酸二醯肼粒子溶解,導致常溫保管性降低;若平均粒徑過大,則熱硬化性接著組成物之塗布性降低,又,由於粒度大,故而難以與丙烯酸系共聚物或熱硬化性環氧樹脂充分地混合。 In addition, the average particle diameter of the organic acid dihydrazine is preferably in the range of 0.5 μm or more and 15 μm or less, and more preferably in the range of 1 μm or more and 5 μm or less. If the average particle size is too small, there is a tendency that when an organic solvent is used for coating the thermosetting adhesive composition, the organic acid dihydrazine particles will dissolve, resulting in reduced storage at room temperature; if the average particle size is too large, heat The coating properties of the curable adhesive composition are reduced, and because of the large particle size, it is difficult to sufficiently mix with the acrylic copolymer or the thermosetting epoxy resin.
關於環氧樹脂硬化劑之含量,若過少則會殘留未反應之環氧基,且交聯亦不充分,故而存在耐熱性、接著性降低之傾向,若過多則過剩之硬化劑會於未反應之狀態下殘留,故而存在耐熱性、接著性降低之傾向,因此較佳相對於丙烯酸系共聚物及熱硬化性環氧樹脂之合計量100質量份,於1質量份以上且50質量份以下之範圍使用,更佳於5質量份以上 且30質量份以下之範圍使用。 Regarding the content of the epoxy resin hardener, if the content of the epoxy resin hardener is too small, unreacted epoxy groups will remain, and the crosslinking will not be sufficient, so there is a tendency for heat resistance and adhesiveness to decrease. If too much, the excess hardener will not react. It remains in the same state, so there is a tendency for heat resistance and adhesiveness to decrease. Therefore, it is preferable that the total amount of acrylic copolymer and thermosetting epoxy resin is 100 parts by mass, and it is more than 1 part by mass and less than 50 parts by mass. Range of use, more preferably more than 5 parts by mass And use in the range of 30 parts by mass or less.
樹枝狀之導電性填料之敲緊密度較佳為1.0g/cm3以上且1.8g/cm3以下之範圍,更佳為1.1g/cm3以上且1.6g/cm3之範圍。若敲緊密度過小,則存在由加熱壓製引起之熱硬化性接著組成物之樹脂溢流(溢出)增加之傾向,若敲緊密度過大,則存在導電性填料之填充變得過密,導致高溫環境下或高溫高濕環境下之導通穩定性降低之傾向。 The knock tightness of the dendritic conductive filler is preferably in the range of 1.0 g/cm 3 or more and 1.8 g/cm 3 or less, more preferably 1.1 g/cm 3 or more and 1.6 g/cm 3 . If the tapping tightness is too small, the resin overflow (overflow) of the thermosetting adhesive composition caused by heating and pressing will increase. If the tapping tightness is too large, the filling of the conductive filler will become too dense, resulting in a high temperature environment The tendency of the conduction stability to decrease under high temperature and high humidity environment.
此處,所謂樹枝狀,亦稱為樹枝狀結晶,如圖4所示般,「樹枝狀」意指如樹木之枝之形狀,樹枝狀之導電性填料21具有主枝31及側枝32、33。樹枝狀之導電性填料21由於主枝31及側枝32、33容易相互纏繞,故而可防止因彎曲或變形而引起導電層內之樹枝狀之導電性填料21彼此分離,從而即便彎曲或變形亦維持電連接。又,敲緊密度係藉由JIS Z 2512所規定之方法進行測定。具體而言,於容器內放入規定量之粉末,使用敲緊(tapping)裝置進行敲緊直至粉末之體積不再減少,用粉末之質量除以敲緊後之粉末體積而獲得密度,將該密度設為敲緊密度。
Here, the so-called dendritic crystal is also called dendritic crystal. As shown in FIG. 4, "dendritic" means the shape of the branches of a tree. The dendritic
樹枝狀之導電性填料21例如可藉由利用電解法、液相還原法等,於金屬粉形成主枝31及側枝32、33而獲得。
The dendritic
作為金屬粉,可列舉銅粉、銀粉、鎳粉等,作為主枝31及側枝32、33,可列舉銅、銀、金等。即,作為樹枝狀之導電性填料21,可列舉覆銅銅粉、覆銀銅粉、覆金銅粉、覆銀鎳粉、覆金鎳粉等,該等之中,較佳使用覆銀銅粉。
Examples of the metal powder include copper powder, silver powder, nickel powder, and the like, and examples of the
樹枝狀之導電性填料21之平均粒徑較佳為3μm以上且
20μm以下之範圍,更佳為5μm以上且15μm以下之範圍。若平均粒徑過小,則主枝31及側枝32、33之形成變得困難,若平均粒徑過大,則膜之薄膜化變得困難。此處,樹枝狀之導電性填料21之平均粒徑為根據例如藉由雷射繞射散射法而得之粒徑分布測定結果所算出之篩下累計分率之50%之粒徑D50。
The average particle size of the dendritic
關於樹枝狀之導電性填料21之添加量,較佳相對於丙烯酸系共聚物100質量份,於100質量份以上且300質量份以下之範圍使用,更佳於150質量份以上且250質量份以下之範圍使用。
Regarding the addition amount of the dendritic
若添加量過少,則存在導通性及樹脂溢流變差之傾向,若添加量過多,則存在高溫環境下或高溫高濕環境下之導通穩定性降低之傾向。 If the addition amount is too small, the conductivity and resin overflow tend to be deteriorated, and if the addition amount is too large, the conduction stability in a high temperature environment or a high temperature and high humidity environment tends to decrease.
又,作為導電性填料,亦可添加球狀、薄片狀、絲(filament)狀等非樹枝狀之導電性填料。於含有非樹枝狀之導電性填料之情形時,關於導電性填料中之樹枝狀之導電性填料之比率,較佳於較佳為40wt%以上且100wt%以下之範圍使用,更佳於60wt%以上且100wt%以下之範圍使用。若樹枝狀之導電性填料21之比率過少,則存在高溫環境下或高溫高濕環境下之導通穩定性降低之傾向。
In addition, as the conductive filler, non-dendritic conductive fillers such as spherical, flake-shaped, and filament-shaped may be added. In the case of non-dendritic conductive filler, the ratio of dendritic conductive filler in the conductive filler is preferably used in the range of 40wt% or more and 100wt% or less, and more preferably 60wt% Use in the range above and below 100wt%. If the ratio of the dendritic
非導電性填料之平均粒徑較佳為3μm以上且15μm以下之範圍,更佳為5μm以上且15μm以下之範圍。若平均粒徑過小,則存在抑制樹脂滲出量之效果變小之傾向,若平均粒徑過大,則存在電阻值上升之傾向。此處,導電性填料之平均粒徑設為根據藉由雷射繞射散射法而得之粒徑分布測定結果所算出之篩下累計分率之50%之粒徑D50。 The average particle diameter of the non-conductive filler is preferably in the range of 3 μm or more and 15 μm or less, more preferably in the range of 5 μm or more and 15 μm or less. If the average particle size is too small, the effect of suppressing the amount of resin bleeding tends to decrease, and if the average particle size is too large, the resistance value tends to increase. Here, the average particle diameter of the conductive filler is defined as the particle diameter D50 of 50% of the cumulative fraction under the sieve calculated from the particle size distribution measurement result by the laser diffraction scattering method.
又,關於非導電性填料之添加量,較佳相對於丙烯酸系共聚物100質量份,於4質量份以上且120質量份以下之範圍使用,更佳於10質量份以上且100質量份以下之範圍使用。若添加量過少,則存在抑制樹脂滲出量之效果變小之傾向,若添加量過多,則存在接著強度降低之傾向。 In addition, the amount of the non-conductive filler added is preferably in the range of 4 parts by mass or more and 120 parts by mass relative to 100 parts by mass of the acrylic copolymer, more preferably 10 parts by mass or more and 100 parts by mass or less Range of use. If the amount added is too small, the effect of suppressing the amount of resin bleeding tends to decrease, and if the amount added is too large, the adhesive strength tends to decrease.
作為非導電性填料,可使用有機填料或無機填料之至少1種。作為有機填料,例如可列舉聚胺酯樹脂粒子、聚醯亞胺樹脂粒子、苯胍(benzoguanamine)樹脂粒子、環氧樹脂粒子等。又,作為無機填料,例如可列舉二氧化矽(SiO2)、氧化鋁(Al2O3)、二氧化鈦(TiO2)、氧化鉭(Ta2O5)、氧化鋯(ZrO2)等。該等之中,就接著強度(剝離強度)之觀點而言,較佳為有機填料,作為一例,有機填料之中較佳使用聚胺酯樹脂粒子。聚胺酯樹脂粒子可藉由懸浮聚合而製造,特別是根據玻璃轉移溫度低之性質可提高熱硬化性接著組成物之接著強度。 As the non-conductive filler, at least one of organic fillers and inorganic fillers can be used. Examples of organic fillers include polyurethane resin particles, polyimide resin particles, and benzoguanidine. (benzoguanamine) resin particles, epoxy resin particles, etc. In addition, as the inorganic filler, for example, silicon dioxide (SiO 2 ), aluminum oxide (Al 2 O 3 ), titanium dioxide (TiO 2 ), tantalum oxide (Ta 2 O 5 ), zirconium oxide (ZrO 2 ), and the like can be cited. Among them, from the viewpoint of adhesive strength (peel strength), organic fillers are preferred. As an example, polyurethane resin particles are preferably used among organic fillers. Polyurethane resin particles can be manufactured by suspension polymerization, and in particular, the adhesive strength of the thermosetting adhesive composition can be improved due to the low glass transition temperature.
又,於將熱硬化性接著組成物成型為片狀而製作熱硬化性接著片之情形時,非導電性填料之平均粒徑亦會受到樹枝狀之導電性填料之平均粒徑、或熱硬化性接著片之厚度影響,於有機填料之情形時,較佳為3μm以上且15μm以下之範圍,另一方面,於無機填料之情形時,較佳為3μm以上且10μm以下之範圍。 In addition, when the thermosetting adhesive composition is formed into a sheet shape to produce a thermosetting adhesive sheet, the average particle size of the non-conductive filler will also be affected by the average particle size of the dendritic conductive filler, or thermal curing In the case of organic fillers, the thickness of the adhesive sheet is preferably in the range of 3 μm or more and 15 μm or less. On the other hand, in the case of inorganic fillers, it is preferably in the range of 3 μm or more and 10 μm or less.
又,作為摻合於熱硬化性接著組成物之其他添加物,較佳添加腈橡膠。腈橡膠由於機械性能及彈性優異,故而可提昇暫時貼附性。關於腈橡膠之添加量,較佳相對於丙烯酸系共聚物100質量份,於較佳為1質量份以上且20質量份以下之範圍使用,更佳於5質量份以上且15質量份以下之範圍使 用。 In addition, as other additives blended into the thermosetting adhesive composition, it is preferable to add nitrile rubber. Nitrile rubber can improve temporary adhesion due to its excellent mechanical properties and elasticity. Regarding the addition amount of the nitrile rubber, it is preferably used in the range of 1 part by mass or more and 20 parts by mass, more preferably in the range of 5 parts by mass or more and 15 parts by mass relative to 100 parts by mass of the acrylic copolymer Make use.
若添加量過少,則存在暫時貼附性降低之傾向,若添加量過多,則存在高溫環境下或高溫高濕環境下之導通電阻上升之傾向。 If the amount added is too small, the temporary adhesion tends to decrease, and if the amount added is too large, the on-resistance in a high temperature environment or a high temperature and high humidity environment tends to increase.
又,亦可視需要摻合導熱性粒子、膜形成樹脂、各種丙烯酸單體等稀釋用單體、填充劑、軟化劑、著色劑、難燃劑、觸變劑、矽烷偶合劑等。 In addition, diluting monomers such as thermally conductive particles, film forming resins, various acrylic monomers, fillers, softeners, colorants, flame retardants, thixotropic agents, silane coupling agents, etc. may be blended as necessary.
於由此種成分所構成之熱硬化性接著組成物中,若使非導電性填料之平均粒徑小於熱硬化性接著組成物中所含有之樹枝狀之導電性填料之平均粒徑,則特定之平均粒徑之非導電性填料會纏繞於樹枝狀之導電性填料,抑制樹脂成分之流動,且亦抑制樹脂滲出。 In the thermosetting adhesive composition composed of such components, if the average particle size of the non-conductive filler is made smaller than the average particle diameter of the dendritic conductive filler contained in the thermosetting adhesive composition, it is specified The non-conductive filler with the average particle size will be entangled with the dendritic conductive filler to inhibit the flow of resin components and also inhibit resin exudation.
又,藉由使用有機填料作為非導電性填料,可提昇接著強度。 In addition, by using organic fillers as non-conductive fillers, the bonding strength can be improved.
由成形為片狀之熱硬化性接著組成物所構成之熱硬化性接著片,於含有丙烯酸系共聚物(A)、熱硬化性環氧樹脂(B)、及環氧樹脂硬化劑(C)之樹脂成分,分散有樹枝狀之導電性填料(D)及非導電性填料(E)。各成分(A)~(E)由於與上述熱硬化性接著組成物相同,故而此處將說明省略。 A thermosetting adhesive sheet composed of a thermosetting adhesive composition formed into a sheet, containing acrylic copolymer (A), thermosetting epoxy resin (B), and epoxy resin hardener (C) The resin component is dispersed with dendritic conductive filler (D) and non-conductive filler (E). Since each component (A)-(E) is the same as the said thermosetting adhesive composition, description here is abbreviate|omitted.
上述成分(A)~(E)可藉由利用常法均勻地混合而製備所需組成之熱硬化性接著組成物。 The above-mentioned components (A) to (E) can be uniformly mixed by a conventional method to prepare a thermosetting adhesive composition of the desired composition.
繼而,將所製備之熱硬化性接著組成物利用棒式塗布機、輥式塗布機以乾燥厚度成為10μm以上且60μm以下之範圍之方式塗布於基材膜上,並利用常法進行乾燥,藉此製造具有熱硬化性接著組成物之層之熱硬化性 接著片。 Next, the prepared thermosetting adhesive composition is coated on the base film using a bar coater or a roll coater so that the dry thickness is in the range of 10 μm or more and 60 μm or less, and dried by a conventional method. This manufacture has the thermosetting property of the layer of thermosetting adhesive composition Then the film.
作為基材膜,可使用視需要以聚矽氧等對聚對酞酸乙二酯膜、聚醯亞胺膜等基材進行剝離處理而成之剝離基材。 As the base film, a peeling base obtained by peeling a base material such as a polyethylene terephthalate film and a polyimide film with polysiloxane or the like can be used as needed.
此種熱硬化性接著片例如可較佳地應用於將撓性印刷配線板之端子部與用以作為其襯底之補強用片進行接著固定,該補強用片為聚對酞酸乙二酯、聚醯亞胺、環氧玻璃、不鏽鋼、鋁等材料,厚度為50μm以上且2mm以下。又,由於藉由熱層壓可容易地與補強用片密接,故而可提昇作業性。 This kind of thermosetting adhesive sheet can be preferably used for bonding and fixing the terminal part of a flexible printed wiring board and a reinforcing sheet used as its substrate. The reinforcing sheet is polyethylene terephthalate. , Polyimide, epoxy glass, stainless steel, aluminum and other materials, with a thickness of 50μm or more and 2mm or less. In addition, since it can be easily adhered to the reinforcing sheet by thermal lamination, the workability can be improved.
圖1~圖3係表示使用有熱硬化性接著片之連接例之圖。 Figures 1 to 3 are diagrams showing connection examples using thermosetting adhesive sheets.
圖2之符號8係表示使用熱硬化性接著片使撓性印刷配線板10與金屬板30藉由熱硬化性接著片20接著而成之連接構造體。
The
首先,若對連接構造體8進行說明,則撓性印刷配線板10係依序積層基材12、配線13、接著層14及保護層15而成,且於端部設置有端子11。該撓性印刷配線板10例如由作為基材12之聚醯亞胺、作為配線13之銅、作為接著層14之環氧樹脂、及作為保護層15之聚醯亞胺等構成,且端子11之表面被鍍金。
First, if the
繼而,若對連接構造體8之製造順序進行說明,則圖3為如圖1般使未硬化之熱硬化性接著片20自基材膜剝離並配置於撓性印刷配線板10與金屬板30之間之狀態,且熱硬化性組成物之層之表面及背面露出。
Next, if the manufacturing procedure of the
於撓性印刷配線板10之表面,露出保護層15,於保護層15之端子11上之位置形成有於底面露出端子11之開口18。
On the surface of the flexible printed
使熱硬化性接著片20之單面接觸於撓性印刷配線板10表面
之保護層15及露出於開口18底面之端子11之表面,並使相反側之面接觸於金屬板30,一面對撓性印刷配線板10及金屬板30進行加熱,一面將金屬板30及撓性印刷配線板10之任一者或兩者向熱硬化性接著片20按壓。
Make one side of the
例如,藉由將撓性印刷配線板10置於台上,一面對金屬板30進行加熱,一面按壓金屬板30,而按壓夾於撓性印刷配線板10與金屬板30間之熱硬化性接著片20。
For example, by placing the flexible printed
熱硬化性接著片20之表面及背面於常溫下具有接著力,撓性印刷配線板10與金屬板30接著於熱硬化性接著片20。
The front and back surfaces of the
熱硬化性接著片20藉由來自經加熱之金屬板30或經加熱之撓性印刷配線板10之熱傳導而受到加熱,並升溫、軟化。此時,樹脂成分之流動因分散於樹脂成分中之非導電性填料22及樹枝狀之導電性填料21受到抑制。
The
經軟化之熱硬化性接著片20於接觸於金屬板30、撓性印刷配線板10之保護層15、及端子11之狀態下升溫。若熱硬化性接著片20之溫度上升至特定溫度,則環氧樹脂硬化劑與熱硬化性環氧樹脂中之環氧基進行反應,開始熱硬化性環氧樹脂之聚合反應,形成網目結構之高分子環氧樹脂,並熱硬化。
The softened thermosetting
若撓性印刷配線板10、金屬板30、及經熱硬化之熱硬化性接著片20冷卻,則可獲得金屬板30與撓性印刷配線板10藉由經熱硬化之熱硬化性接著片20相互連接而成之連接構造體8(圖2)。
If the flexible printed
經熱硬化之熱硬化性接著片20亦接觸於金屬板30、撓性印刷配線板10之保護層15、及端子11,且分散於經熱硬化之熱硬化性接著片
20中之樹枝狀之導電性填料21與鄰接之樹枝狀之導電性填料21接觸,經熱硬化之熱硬化性接著片20藉由相互接觸之複數樹枝狀之導電性填料21至少於厚度方向具有電氣導電性。此例中,於熱硬化性接著片20之擴展方向亦具有電氣導電性。
The thermally hardened thermosetting
位於經熱硬化之熱硬化性接著片20之表面之樹枝狀之導電性填料21於經熱硬化之熱硬化性接著片20之單面接觸於端子11,於相反側之面接觸於金屬板30,因此金屬板30及端子11接觸於「位於經熱硬化之熱硬化性接著片20中之相互接觸之複數樹枝狀之導電性填料21」而電連接,因此金屬板30與端子11藉由經熱硬化之熱硬化性接著片20而電連接。
The dendritic
於金屬板30設為覆蓋撓性印刷配線板10之配線圖案之大小且端子11連接於接地電位之情形時,由於金屬板30連接於接地電位,故而撓性印刷配線板10之配線圖案受到遮蔽,不會對配線圖案入射有害之電磁波。
When the
如此,藉由使熱硬化性接著片20硬化而使撓性印刷配線板10接著於金屬板30,可對撓性印刷配線板10進行補強,並且可使撓性印刷配線板10之端子11電連接於金屬板30。如此,於端子11接地之情形時,可將撓性印刷配線板10遮蔽。
In this way, by curing the
藉由經硬化之熱硬化性接著片20連接於金屬板30之端子11亦可連接於撓性印刷配線板10之電子電路之接地電位以外之電位。
The terminal 11 connected to the
本發明之熱硬化性接著片20之中,特定之平均粒徑之非導電性填料22纏繞於樹枝狀之導電性填料21,抑制樹脂成分之流動,從而抑制樹脂滲出。因此,可使於金屬板30設置開孔部而進行撓性印刷配線板10
之電路圖案之鍍敷或焊接之情形之良率提昇。
In the
於第1實施例中,製作熱硬化性接著片,並針對非導電性填料之大小進行驗證。熱硬化性接著片係使用下述成分製備熱硬化性接著組成物。將熱硬化性接著組成物塗布於實施過剝離處理之聚對酞酸乙二酯膜(PET),並於50~130℃之乾燥爐中進行乾燥,製作具有35μm厚之熱硬化性接著組成物之層之熱硬化性接著片。 In the first embodiment, a thermosetting adhesive sheet was produced, and the size of the non-conductive filler was verified. The thermosetting adhesive sheet uses the following components to prepare a thermosetting adhesive composition. The thermosetting adhesive composition is applied to a polyethylene terephthalate film (PET) that has been peeled off, and dried in a drying oven at 50 to 130°C to produce a thermosetting adhesive composition with a thickness of 35μm The layer of thermosetting adhesive sheet.
繼而,針對(1)接著強度、及(2)樹脂滲出量進行評價。此處,樹枝狀之導電性填料之敲緊密度係藉由JIS Z 2512所規定之方法進行測定。具體而言,於容器內放入規定量之粉末,使用敲緊裝置進行敲緊直至粉末之體積不再減少,用粉末之質量除以敲緊後之粉末體積而獲得密度,將該密度設為敲緊密度。又,導電性填料之平均粒徑設為根據藉由雷射繞射散射法而得之粒徑分布測定結果所算出之篩下累計分率之50%之粒徑D50。 Then, (1) adhesive strength and (2) resin exudation amount were evaluated. Here, the knock tightness of the dendritic conductive filler is measured by the method specified in JIS Z 2512. Specifically, put a prescribed amount of powder in the container, use the tapping device to tap until the volume of the powder no longer decreases, divide the mass of the powder by the volume of the tapped powder to obtain the density, and set the density as Knock tightness. In addition, the average particle size of the conductive filler is set to a particle size D50 of 50% of the cumulative fraction under the sieve calculated based on the particle size distribution measurement result by the laser diffraction scattering method.
使用以如下方式獲得之丙烯酸系共聚物:於將藉由共聚反應獲得丙烯酸系共聚物之丙烯酸單體整體設為100wt%時,使丙烯酸單體含有66wt%之包含丙烯酸丁酯(BA)及丙烯酸乙酯(EA)之(甲基)丙烯酸烷基酯、24wt%之丙烯腈(AN)、及10wt%之甲基丙烯酸環氧丙酯(GMA),使其進行共聚反應而獲得丙烯酸系共聚物。 The acrylic copolymer obtained by the following method is used: when the total acrylic monomer of the acrylic copolymer obtained by the copolymerization reaction is set to 100wt%, the acrylic monomer contains 66wt% including butyl acrylate (BA) and acrylic acid Ethyl (EA) alkyl (meth)acrylate, 24wt% acrylonitrile (AN), and 10wt% glycidyl methacrylate (GMA) are copolymerized to obtain acrylic copolymer .
又,熱硬化性環氧樹脂使用液體狀熱硬化性環氧樹脂(製品名「jER828」,三菱化學股份有限公司製造)及作為固體狀熱硬化性環氧樹脂 之DCPD型之固形環氧樹脂(製品名「HP7200L」,DIC股份有限公司製造),且使用環氧樹脂硬化劑(己二酸二醯肼)。 In addition, as the thermosetting epoxy resin, a liquid thermosetting epoxy resin (product name "jER828", manufactured by Mitsubishi Chemical Co., Ltd.) and a solid thermosetting epoxy resin are used The DCPD type solid epoxy resin (product name "HP7200L", manufactured by DIC Co., Ltd.), and the epoxy resin hardener (dihydrazine adipate) is used.
樹枝狀之導電性填料使用敲緊密度1.4g/cm3且平均粒徑10μm之樹枝狀之銅粉。 The dendritic conductive filler uses dendritic copper powder with a knock compactness of 1.4 g/cm 3 and an average particle size of 10 μm.
作為其他形狀之導電性填料,使用絲狀鎳粉(製品名「F-255」,淡水河谷(VALE)股份有限公司製造)。 As the conductive filler of other shapes, filamentous nickel powder (product name "F-255", manufactured by Vale Co., Ltd.) is used.
非導電性填料使用平均粒徑為0.7μm、2.0μm、3.8μm、6.0μm、或15.0μm之聚胺酯粒子(製品名「Art Pearl」,根上工業股份有限公司製造)或平均粒徑為0.7μm、3.0μm、7.0μm、10.0μm之二氧化矽粒子(製品名「FB」,電氣化學工業股份有限公司製造)。 The non-conductive filler uses polyurethane particles with an average particle size of 0.7μm, 2.0μm, 3.8μm, 6.0μm, or 15.0μm (product name "Art Pearl", manufactured by Negami Industrial Co., Ltd.) or an average particle size of 0.7μm, 3.0μm, 7.0μm, 10.0μm silicon dioxide particles (product name "FB", manufactured by Denki Kagaku Co., Ltd.).
將熱硬化性接著片切割成短條(2cm×5cm),並將其一面之熱硬化性接著組成物之層利用設定為140℃之貼合機暫時貼附於1.5cm×40cm之鍍金基板,其後,去掉剝離基材使另一面之熱硬化性接著組成物之層露出。 Cut the thermosetting adhesive sheet into short strips (2cm×5cm), and temporarily attach the layer of thermosetting adhesive composition on one side to a 1.5cm×40cm gold-plated substrate using a laminator set at 140°C. After that, the peeling substrate is removed to expose the layer of the thermosetting adhesive composition on the other side.
對露出之熱硬化性接著組成物之層自上方重疊相同大小之50μm厚之聚醯亞胺膜,使用真空壓製機(製品名「Vacuum Star」,MIKADO TECHNOS股份有限公司製造),於溫度185℃、壓力4.0MPa、真空保持時間10秒+壓製時間90秒之條件下進行熱壓,其後,於140℃之烘箱中保持60分鐘。其後,對聚醯亞胺膜以剝離速度50mm/min進行90度剝離試驗,測定剝離所需要之力作為剝離強度。剝離強度較理想為12N/cm以上。 A 50μm thick polyimide film of the same size was superimposed on the exposed thermosetting adhesive composition layer from above, using a vacuum press machine (product name "Vacuum Star", manufactured by MIKADO TECHNOS Co., Ltd.) at a temperature of 185°C , The pressure is 4.0MPa, the vacuum holding time is 10 seconds + the pressing time is 90 seconds, and the hot pressing is carried out. After that, it is kept in an oven at 140°C for 60 minutes. Thereafter, a 90-degree peel test was performed on the polyimide film at a peel speed of 50 mm/min, and the force required for peeling was measured as the peel strength. The peel strength is preferably 12 N/cm or more.
將熱硬化性接著片之一面之熱硬化性接著組成物之層利用設定為140 ℃之貼合機暫時貼附於100μm厚之SUS板(2cm×3cm),其後,去掉剝離基材,使另一面之熱硬化性接著組成物之層露出,將熱硬化性接著組成物之層切成與SUS板相同之尺寸。將SUS板上之露出之熱硬化性接著組成物之層利用設定為140℃之貼合機暫時貼附於175μm厚之聚醯亞胺膜(5cm×5cm),其後,使用真空壓製機(製品名「Vacuum Star」,MIKADO TECHNOS股份有限公司製造),於溫度185℃、壓力4.0MPa、真空保持時間10秒+壓製時間90秒之條件下進行熱壓,其後,於140℃之烘箱中保持60分鐘。繼而,利用金屬顯微鏡測定熱硬化性接著組成物之層自試片之SUS端部滲出之長度作為樹脂滲出量。樹脂滲出量較理想為200μm以下。 Set the layer utilization of the thermosetting adhesive composition on one side of the thermosetting adhesive sheet to 140 Temporarily attach to a 100μm thick SUS board (2cm×3cm) with a laminating machine at ℃, then remove the peeling substrate to expose the thermosetting adhesive composition layer on the other side, and expose the thermosetting adhesive composition The layer is cut into the same size as the SUS board. The exposed thermosetting adhesive composition layer on the SUS board was temporarily attached to a 175μm thick polyimide film (5cm×5cm) using a laminator set at 140°C, and then a vacuum press machine ( The product name is "Vacuum Star", manufactured by MIKADO TECHNOS Co., Ltd.). It is hot-pressed at a temperature of 185°C, a pressure of 4.0 MPa, a vacuum holding time of 10 seconds + a pressing time of 90 seconds, and then placed in an oven at 140°C Keep it for 60 minutes. Then, the length of the layer of the thermosetting adhesive composition exuded from the SUS end of the test piece was measured with a metal microscope as the amount of resin exudation. The amount of resin bleeding is preferably 200 μm or less.
如表1所示,使用含有丙烯酸系共聚物25質量份、液體狀熱硬化性環氧樹脂5質量份、固體狀熱硬化性環氧樹脂10質量份、己二酸二醯肼10質量份、樹枝狀之銅粉50質量份、及平均粒徑3.8μm之聚胺酯粒子6質量份之熱硬化性接著組成物,製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為15.1N/cm,(2)樹脂滲出量為188μm。 As shown in Table 1, 25 parts by mass of acrylic copolymer, 5 parts by mass of liquid thermosetting epoxy resin, 10 parts by mass of solid thermosetting epoxy resin, and 10 parts by mass of dihydrazine adipate were used. A thermosetting adhesive composition of 50 parts by mass of dendritic copper powder and 6 parts by mass of polyurethane particles with an average particle size of 3.8 μm was used to produce a thermosetting adhesive sheet. (1) The peel strength of this thermosetting adhesive sheet was 15.1 N/cm, and (2) the amount of resin exudation was 188 μm.
如表1所示,摻合平均粒徑6.0μm之聚胺酯粒子6質量份作為非導電性填料,除此以外,以與實施例1相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為15.2N/cm,(2)樹脂滲出量為106μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 1, except that 6 parts by mass of polyurethane particles having an average particle diameter of 6.0 μm were blended as a non-conductive filler. (1) The peel strength of this thermosetting adhesive sheet was 15.2 N/cm, and (2) the amount of resin exudation was 106 μm.
如表1所示,摻合平均粒徑15.0μm之聚胺酯粒子6質量份作為非導電性填料,除此以外,以與實施例1相同之方式製作熱硬化性接著片。該熱 硬化性接著片之(1)剝離強度為15.3N/cm,(2)樹脂滲出量為95μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 1, except that 6 parts by mass of polyurethane particles having an average particle diameter of 15.0 μm were blended as a non-conductive filler. The heat (1) The peel strength of the curable adhesive sheet was 15.3 N/cm, and (2) the resin exudation amount was 95 μm.
如表1所示,摻合平均粒徑3.0μm之二氧化矽粒子12質量份作為非導電性填料,除此以外,以與實施例1相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為12.4N/cm,(2)樹脂滲出量為195μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 1, except that 12 parts by mass of silica particles having an average particle diameter of 3.0 μm were blended as a non-conductive filler. (1) The peel strength of this thermosetting adhesive sheet was 12.4 N/cm, and (2) the resin exudation amount was 195 μm.
如表1所示,摻合平均粒徑7.0μm之二氧化矽粒子12質量份作為非導電性填料,除此以外,以與實施例1相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為12.0N/cm,(2)樹脂滲出量為98μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 1, except that 12 parts by mass of silica particles having an average particle diameter of 7.0 μm were blended as a non-conductive filler. (1) The peeling strength of the thermosetting adhesive sheet was 12.0 N/cm, and (2) the resin exudation amount was 98 μm.
如表1所示,摻合平均粒徑10.0μm之二氧化矽粒子12質量份作為非導電性填料,除此以外,以與實施例1相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為12.5N/cm,(2)樹脂滲出量為98μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 1, except that 12 parts by mass of silica particles with an average particle diameter of 10.0 μm were blended as a non-conductive filler. (1) The peel strength of the thermosetting adhesive sheet was 12.5 N/cm, and (2) the amount of resin exudation was 98 μm.
如表1所示,不摻合非導電性填料,除此以外,以與實施例1相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為12.1N/cm,(2)樹脂滲出量為254μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 1 except that no non-conductive filler was blended. (1) The peel strength of this thermosetting adhesive sheet was 12.1 N/cm, and (2) the resin exudation amount was 254 μm.
如表1所示,摻合平均粒徑0.7μm之聚胺酯粒子6質量份作為非導電性填料,除此以外,以與實施例1相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為15.6N/cm,(2)樹脂滲出量為240μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 1, except that 6 parts by mass of polyurethane particles having an average particle diameter of 0.7 μm were blended as a non-conductive filler. (1) The peel strength of this thermosetting adhesive sheet was 15.6 N/cm, and (2) the amount of resin exudation was 240 μm.
如表1所示,摻合平均粒徑2.0μm之聚胺酯粒子6質量份作為非導電性填料,除此以外,以與實施例1相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為14.8N/cm,(2)樹脂滲出量為210μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 1, except that 6 parts by mass of polyurethane particles having an average particle diameter of 2.0 μm were blended as a non-conductive filler. (1) The peel strength of this thermosetting adhesive sheet was 14.8 N/cm, and (2) the amount of resin exudation was 210 μm.
如表1所示,摻合平均粒徑0.7μm之二氧化矽粒子12質量份作為非導電性填料,除此以外,以與實施例1相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為12.2N/cm,(2)樹脂滲出量為212μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 1, except that 12 parts by mass of silicon dioxide particles with an average particle diameter of 0.7 μm were blended as a non-conductive filler. (1) The peel strength of the thermosetting adhesive sheet was 12.2 N/cm, and (2) the resin exudation amount was 212 μm.
如表1所示,摻合絲狀鎳粉50質量份代替樹枝狀銅粉作為導電性填料,除此以外,以與實施例2相同之方式製作熱硬化性接著片。該熱硬化性接著片之(2)樹脂滲出量為249μm。 As shown in Table 1, a thermosetting adhesive sheet was produced in the same manner as in Example 2 except that 50 parts by mass of the filamentous nickel powder was blended instead of the dendritic copper powder as the conductive filler. The (2) resin exudation amount of this thermosetting adhesive sheet was 249 μm.
於如比較例1般不含有導電性填料之情形時,樹脂滲出量較多。又,於如比較例2~4般非導電性填料之平均粒徑較小之情形時,亦樹脂滲出量較多。又,於如比較例5般含有絲狀Ni粉代替樹枝狀銅粉之情形時,亦樹脂滲出量較多。 When the conductive filler is not contained as in Comparative Example 1, the amount of resin bleeding is large. In addition, when the average particle size of the non-conductive filler is small as in Comparative Examples 2 to 4, the amount of resin bleeding is also large. In addition, when the filamentous Ni powder was contained in place of the dendritic copper powder as in Comparative Example 5, the amount of resin bleeding was also large.
另一方面,於如實施例1~6般非導電性填料之平均粒徑為3~15μm之情形時,樹脂滲出量減少,又,剝離強度亦良好。尤其是關於剝離強度,較之使用作為無機填料之二氧化矽粒子,使用作為有機填料之聚胺酯粒子時更為良好。 On the other hand, when the average particle size of the non-conductive filler is 3 to 15 μm as in Examples 1 to 6, the amount of resin bleeding is reduced, and the peel strength is also good. Especially with regard to peel strength, it is better when using polyurethane particles as organic fillers than when using silica particles as inorganic fillers.
第2實施例中,摻合與實施例2相同之非導電性填料製作熱硬化性接著組成物,並針對非導電性填料之摻合量,對剝離強度及樹脂滲出量進行評價。再者,各摻合成分及評價項目由於與第1實施例相同,故而此處將說明省略。 In the second example, the same non-conductive filler as in Example 2 was blended to produce a thermosetting adhesive composition, and the peeling strength and the amount of resin bleeding were evaluated with respect to the blending amount of the non-conductive filler. In addition, since each blending component and evaluation item are the same as in the first embodiment, the description will be omitted here.
如表2所示,摻合平均粒徑6.0μm之聚胺酯粒子0.5質量份作為非導電性填料,除此以外,以與實施例2相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為15.0N/cm,(2)樹脂滲出量為225μm。 As shown in Table 2, a thermosetting adhesive sheet was produced in the same manner as in Example 2 except that 0.5 parts by mass of polyurethane particles having an average particle diameter of 6.0 μm were blended as a non-conductive filler. (1) The peel strength of this thermosetting adhesive sheet was 15.0 N/cm, and (2) the resin exudation amount was 225 μm.
如表2所示,摻合平均粒徑6.0μm之聚胺酯粒子1質量份作為非導電性填料,除此以外,以與實施例2相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為15.1N/cm,(2)樹脂滲出量為198μm。 As shown in Table 2, a thermosetting adhesive sheet was produced in the same manner as in Example 2 except that 1 part by mass of polyurethane particles having an average particle diameter of 6.0 μm was blended as a non-conductive filler. (1) The peel strength of this thermosetting adhesive sheet was 15.1 N/cm, and (2) the amount of resin exudation was 198 μm.
如表2所示,摻合平均粒徑6.0μm之聚胺酯粒子3質量份作為非導電性填料,除此以外,以與實施例2相同之方式製作熱硬化性接著片,該熱 硬化性接著片之(1)剝離強度為14.9N/cm,(2)樹脂滲出量為161μm。 As shown in Table 2, 3 parts by mass of polyurethane particles with an average particle diameter of 6.0 μm were blended as a non-conductive filler. A thermosetting adhesive sheet was produced in the same manner as in Example 2. The heat The (1) peel strength of the curable adhesive sheet was 14.9 N/cm, and (2) the resin exudation amount was 161 μm.
如表2所示,摻合平均粒徑6.0μm之聚胺酯粒子10質量份作為非導電性填料,除此以外,以與實施例2相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為15.5N/cm,(2)樹脂滲出量為86μm。 As shown in Table 2, a thermosetting adhesive sheet was produced in the same manner as in Example 2 except that 10 parts by mass of polyurethane particles having an average particle diameter of 6.0 μm were blended as a non-conductive filler. (1) The peeling strength of the thermosetting adhesive sheet was 15.5 N/cm, and (2) the resin exudation amount was 86 μm.
如表2所示,摻合平均粒徑6.0μm之聚胺酯粒子30質量份作為非導電性填料,除此以外,以與實施例2相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為13.0N/cm,(2)樹脂滲出量為66μm。 As shown in Table 2, a thermosetting adhesive sheet was produced in the same manner as in Example 2 except that 30 parts by mass of polyurethane particles having an average particle diameter of 6.0 μm were blended as a non-conductive filler. (1) The peeling strength of this thermosetting adhesive sheet was 13.0 N/cm, and (2) the resin exudation amount was 66 μm.
如表2所示,摻合平均粒徑6.0μm之聚胺酯粒子50質量份作為非導電性填料,除此以外,以與實施例2相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為9.5N/cm,(2)樹脂滲出量為47μm。 As shown in Table 2, except that 50 parts by mass of polyurethane particles with an average particle diameter of 6.0 μm were blended as a non-conductive filler, a thermosetting adhesive sheet was produced in the same manner as in Example 2. (1) The peel strength of this thermosetting adhesive sheet was 9.5 N/cm, and (2) the amount of resin exudation was 47 μm.
於如比較例6般聚胺酯粒子之摻合量較少之情形時,樹脂滲出量較多,於如比較例7般聚胺酯粒子之摻合量較多之情形時,雖樹脂滲出量較少但剝離強度較小。另一方面,於如實施例2、7~10般聚胺酯粒子之摻合量為1~30質量份之情形時,樹脂滲出量減少,又,剝離強度亦良好。 In the case where the blending amount of polyurethane particles is small as in Comparative Example 6, the amount of resin exudation is large. In the case where the blending amount of polyurethane particles is large as in Comparative Example 7, the resin exudation amount is small but peeling off Less intensity. On the other hand, when the blending amount of polyurethane particles is 1 to 30 parts by mass as in Examples 2, 7 to 10, the amount of resin exudation is reduced, and the peel strength is also good.
第3實施例中,摻合具有特定之敲緊密度之導電性填料製作熱硬化性接著組成物,並針對導電性填料之敲緊密度,對樹脂滲出量進行評價。 In the third embodiment, a thermosetting adhesive composition was prepared by blending a conductive filler with a specific knock tightness, and the amount of resin exudation was evaluated for the knock tightness of the conductive filler.
樹枝狀銅粉A:敲緊密度0.89g/cm3,平均粒徑6μm Dendritic copper powder A: knock tightness 0.89g/cm 3 , average particle size 6μm
樹枝狀銅粉B:敲緊密度1.18g/cm3,平均粒徑10μm Dendritic copper powder B: knock compactness 1.18g/cm 3 , average particle size 10μm
樹枝狀銅粉C:敲緊密度1.60g/cm3,平均粒徑12μm Dendritic copper powder C: Knock tightness 1.60g/cm 3 , average particle size 12μm
樹枝狀銅粉D:敲緊密度3.28g/cm3,平均粒徑23μm Dendritic copper powder D: knock tightness 3.28g/cm 3 , average particle size 23μm
再者,各摻合成分及評價項目由於與第1實施例相同,故而此處將說明省略。 In addition, since each blending component and evaluation item are the same as in the first embodiment, the description will be omitted here.
如表3所示,使用含有丙烯酸系共聚物100質量份、液體狀熱硬化性環氧樹脂10質量份、固體狀熱硬化性環氧樹脂30質量份、己二酸二醯肼10質量份、腈橡膠(製品名「Nipol 1001」,日本瑞翁股份有限公司製造)8質量份、敲緊密度為0.89g/cm3之樹枝狀銅粉A 250質量份、及平均粒徑6μm之聚胺酯粒子10質量份之熱硬化性接著組成物,製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為15.1N/cm,(2)樹脂滲出量為194μm。
As shown in Table 3, 100 parts by mass of acrylic copolymer, 10 parts by mass of liquid thermosetting epoxy resin, 30 parts by mass of solid thermosetting epoxy resin, and 10 parts by mass of dihydrazine adipate were used. Nitrile rubber (product name "Nipol 1001", manufactured by Zeon Co., Ltd.) 8 parts by mass, 250 parts by mass of dendritic copper powder A with a tap density of 0.89 g/cm 3 and polyurethane particles with an average particle size of 6
如表3所示,摻合敲緊密度為1.18g/cm3之樹枝狀銅粉B 250質量份作為導電性填料,除此以外,以與實施例11相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為15.1N/cm,(2)樹脂滲出量為115μm。 As shown in Table 3, 250 parts by mass of dendritic copper powder B having a tap tightness of 1.18 g/cm 3 was blended as a conductive filler, and a thermosetting adhesive sheet was produced in the same manner as in Example 11 except that it was blended. (1) The peel strength of this thermosetting adhesive sheet was 15.1 N/cm, and (2) the resin exudation amount was 115 μm.
如表3所示,摻合敲緊密度為1.60g/cm3之樹枝狀銅粉C 250質量份作為導電性填料,除此以外,以與實施例11相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為15.0N/cm,(2)樹脂滲出量為112μm。 As shown in Table 3, 250 parts by mass of dendritic copper powder C having a tap tightness of 1.60 g/cm 3 was blended as a conductive filler, and a thermosetting adhesive sheet was produced in the same manner as in Example 11 except that it was blended. (1) The peel strength of this thermosetting adhesive sheet was 15.0 N/cm, and (2) the resin exudation amount was 112 μm.
如表3所示,摻合敲緊密度為3.28g/cm3之樹枝狀銅粉D 250質量份作為導電性填料,除此以外,以與實施例11相同之方式製作熱硬化性接著片。該熱硬化性接著片之(1)剝離強度為12.1N/cm,(2)樹脂滲出量為94μm。 As shown in Table 3, 250 parts by mass of dendritic copper powder D with a knock tightness of 3.28 g/cm 3 was blended as a conductive filler, and a thermosetting adhesive sheet was produced in the same manner as in Example 11, except that it was blended. (1) The peel strength of this thermosetting adhesive sheet was 12.1 N/cm, and (2) the amount of resin exudation was 94 μm.
可知:藉由如實施例11~14般使用敲緊密度為0.8g/cm3以上之樹枝狀銅粉,可減少樹脂滲出量。又,於樹枝狀之導電性填料之敲緊密度為0.89g/cm3以上且1.6g/cm3以下之範圍之情形時,就剝離強度而言,亦可獲得較高之值。 It can be seen that by using dendritic copper powder with a knock compactness of 0.8 g/cm 3 or more as in Examples 11-14, the amount of resin exudation can be reduced. In addition, when the tap tightness of the dendritic conductive filler is in the range of 0.89 g/cm 3 or more and 1.6 g/cm 3 or less, a higher value can be obtained in terms of peel strength.
再者,上述熱硬化性接著片於常溫下會於表面表現出接著性(「接著性」包含黏著性),但本發明之熱硬化性接著片亦可於常溫下不會於表面表現出接著性,為了將金屬板與撓性印刷配線板加熱進行接著,於受到加熱而升溫時才表現出接著性。 Furthermore, the aforementioned thermosetting adhesive sheet exhibits adhesion on the surface at room temperature ("adhesion" includes adhesiveness), but the thermosetting adhesive sheet of the present invention may not exhibit adhesion on the surface at room temperature. In order to heat the metal plate and the flexible printed wiring board for bonding, the bonding performance is only expressed when the temperature is raised by heating.
8‧‧‧連接構造體 8‧‧‧Connecting structure
10‧‧‧撓性印刷配線板 10‧‧‧Flexible printed wiring board
11‧‧‧端子 11‧‧‧Terminal
12‧‧‧基材 12‧‧‧Substrate
13‧‧‧配線 13‧‧‧Wiring
14‧‧‧接著層 14‧‧‧Next layer
15‧‧‧保護層 15‧‧‧Protection layer
20‧‧‧熱硬化性接著片 20‧‧‧Thermosetting adhesive film
21‧‧‧樹枝狀之導電性填料 21‧‧‧Dendrite conductive filler
22‧‧‧非導電性填料 22‧‧‧Non-conductive filler
30‧‧‧金屬板 30‧‧‧Metal plate
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| US10577524B2 (en) | 2016-05-23 | 2020-03-03 | Tatsuta Electric Wire & Cable Co., Ltd. | Conductive adhesive composition |
| WO2017221885A1 (en) * | 2016-06-23 | 2017-12-28 | 株式会社寺岡製作所 | Adhesive composition and adhesive sheet |
| JP2018039959A (en) * | 2016-09-09 | 2018-03-15 | タツタ電線株式会社 | Conductive adhesive composition |
| CN109085726B (en) * | 2017-06-13 | 2021-10-22 | 元太科技工业股份有限公司 | Flexible laminated structure and display |
| JP7009838B2 (en) * | 2017-08-28 | 2022-01-26 | 味の素株式会社 | Resin composition |
| US12134720B2 (en) | 2017-12-28 | 2024-11-05 | Resonac Corporation | Adhesive film |
| JP7400184B2 (en) * | 2018-10-11 | 2023-12-19 | 東亞合成株式会社 | thermally conductive adhesive |
| CN111378252A (en) * | 2018-12-29 | 2020-07-07 | 太阳油墨(苏州)有限公司 | Resin filler |
| WO2020241818A1 (en) * | 2019-05-31 | 2020-12-03 | タツタ電線株式会社 | Isotropically electroconductive pressure-sensitive adhesive sheet |
| KR102699620B1 (en) * | 2022-11-03 | 2024-08-28 | 율촌화학 주식회사 | Thermally curable conductive bonding film with excellent bending property and step followability, and manufacturing method thereof |
| KR102699619B1 (en) * | 2022-11-03 | 2024-08-28 | 율촌화학 주식회사 | Thermally curable conductive bonding film with excellent step followability and resin flow, and manufacturing method thereof |
| JP7672000B2 (en) * | 2023-02-07 | 2025-05-07 | ニッカン工業株式会社 | Thermal expansion adhesive sheet |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011079959A (en) * | 2009-10-07 | 2011-04-21 | Sony Chemical & Information Device Corp | Thermosetting adhesive composition, thermosetting adhesive sheet, method for producing the same and reinforced flexible printed wiring board |
| TW201130909A (en) * | 2009-12-02 | 2011-09-16 | Mitsui Mining & Smelting Co | Resin composition for use in formation of bonding layer in multilayer flexible printed circuit board, resin varnish, resin-coated copper foil, manufacturing method for resin-coated copper foil for use in manufacturing of multilayer flexible printed c |
| WO2012164925A1 (en) * | 2011-05-31 | 2012-12-06 | 東洋インキScホールディングス株式会社 | Electrically conductive sheet and process for producing same, and electronic component |
| TW201333089A (en) * | 2011-11-02 | 2013-08-16 | Hitachi Chemical Co Ltd | Resin composition, resin sheet, prepreg, laminate, metal substrate, printed wiring board and power semiconductor device |
| WO2013150907A1 (en) * | 2012-04-02 | 2013-10-10 | 株式会社スリーボンド | Electroconductive composition |
| TW201406920A (en) * | 2012-06-29 | 2014-02-16 | Tatsuta Densen Kk | Conductive adhesive composition, conductive adhesive film, bonding method, and circuit board |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1112552A (en) * | 1997-06-25 | 1999-01-19 | Matsushita Electric Ind Co Ltd | Conductive particles |
| JP5222490B2 (en) * | 2007-04-25 | 2013-06-26 | デクセリアルズ株式会社 | Anisotropic conductive film and connection structure |
| JP5359125B2 (en) * | 2007-08-29 | 2013-12-04 | 東レ株式会社 | Prepreg and carbon fiber reinforced composites |
| JP5422921B2 (en) * | 2008-05-28 | 2014-02-19 | デクセリアルズ株式会社 | Adhesive film |
| TW201028454A (en) * | 2008-10-22 | 2010-08-01 | Hitachi Chemical Co Ltd | Adhesive film |
| JP5842736B2 (en) * | 2012-06-06 | 2016-01-13 | デクセリアルズ株式会社 | Thermosetting resin composition, thermosetting adhesive sheet, and method for producing thermosetting adhesive sheet |
| JP6180159B2 (en) * | 2013-04-04 | 2017-08-16 | デクセリアルズ株式会社 | Anisotropic conductive film, connection method, and joined body |
| WO2015068611A1 (en) * | 2013-11-07 | 2015-05-14 | 東洋インキScホールディングス株式会社 | Electroconductive adhesive, electroconductive adhesive sheet, wiring device, and method for manufacturing wiring device |
| JP6287430B2 (en) * | 2014-03-25 | 2018-03-07 | 東洋インキScホールディングス株式会社 | Conductive adhesive sheet, electromagnetic shielding sheet, and printed wiring board |
-
2015
- 2015-10-22 CN CN201580059044.4A patent/CN107109161B/en active Active
- 2015-10-22 WO PCT/JP2015/079867 patent/WO2016076096A1/en not_active Ceased
- 2015-10-22 KR KR1020177011235A patent/KR101941386B1/en active Active
- 2015-11-11 TW TW104137142A patent/TWI699415B/en active
- 2015-11-12 JP JP2015221954A patent/JP6594745B2/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011079959A (en) * | 2009-10-07 | 2011-04-21 | Sony Chemical & Information Device Corp | Thermosetting adhesive composition, thermosetting adhesive sheet, method for producing the same and reinforced flexible printed wiring board |
| TW201130909A (en) * | 2009-12-02 | 2011-09-16 | Mitsui Mining & Smelting Co | Resin composition for use in formation of bonding layer in multilayer flexible printed circuit board, resin varnish, resin-coated copper foil, manufacturing method for resin-coated copper foil for use in manufacturing of multilayer flexible printed c |
| WO2012164925A1 (en) * | 2011-05-31 | 2012-12-06 | 東洋インキScホールディングス株式会社 | Electrically conductive sheet and process for producing same, and electronic component |
| TW201333089A (en) * | 2011-11-02 | 2013-08-16 | Hitachi Chemical Co Ltd | Resin composition, resin sheet, prepreg, laminate, metal substrate, printed wiring board and power semiconductor device |
| WO2013150907A1 (en) * | 2012-04-02 | 2013-10-10 | 株式会社スリーボンド | Electroconductive composition |
| TW201406920A (en) * | 2012-06-29 | 2014-02-16 | Tatsuta Densen Kk | Conductive adhesive composition, conductive adhesive film, bonding method, and circuit board |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107109161A (en) | 2017-08-29 |
| JP2016102204A (en) | 2016-06-02 |
| TW201634645A (en) | 2016-10-01 |
| KR101941386B1 (en) | 2019-01-22 |
| CN107109161B (en) | 2019-07-02 |
| KR20170063820A (en) | 2017-06-08 |
| JP6594745B2 (en) | 2019-10-23 |
| WO2016076096A1 (en) | 2016-05-19 |
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