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TWI683374B - Die bonding device and manufacturing method of semiconductor device - Google Patents

Die bonding device and manufacturing method of semiconductor device Download PDF

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TWI683374B
TWI683374B TW107106942A TW107106942A TWI683374B TW I683374 B TWI683374 B TW I683374B TW 107106942 A TW107106942 A TW 107106942A TW 107106942 A TW107106942 A TW 107106942A TW I683374 B TWI683374 B TW I683374B
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substrate
die
bonding
identified
amount
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TW201903910A (en
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牧浩
伊藤博明
橫森剛
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日商捷進科技有限公司
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    • H10P72/0446
    • H10P72/0428
    • H10P72/0604
    • H10P72/0606
    • H10P72/3206
    • H10P95/00
    • H10W95/00

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Abstract

[課題]提供一種不使晶粒接合裝置之裝置構成複雜化,就可判斷預保養時期的晶粒接合裝置。   [解決手段]晶粒接合裝置,係具備有:接合部,將從晶粒供給部所供給之晶粒接合於從基板供給部所供給的基板;及控制部,控制前述接合部。前述控制部,係(a)以攝像裝置對前述基板進行拍攝,辨識前述基板的位置,(b)以前述攝像裝置,對前述基板及被接合於前述基板的晶粒進行拍攝,辨識前述基板與被接合於前述基板之晶粒的位置,檢查前述基板與前述晶粒之相對位置,(c)根據前述(a)中所辨識之基板的位置與前述(b)中所辨識之基板的位置,診斷基板之固定狀態。[Problem] To provide a die bonding device that can determine the pre-maintenance time without complicating the device configuration of the die bonding device.   [Solution Means] The die bonding apparatus is provided with: a bonding portion that bonds the crystal grains supplied from the crystal grain supply portion to the substrate supplied from the substrate supply portion; and a control portion that controls the bonding portion. The control unit (a) photographs the substrate with an imaging device to identify the position of the substrate, and (b) photographs the substrate and the die bonded to the substrate with the imaging device to identify the substrate and The position of the die bonded to the substrate, inspecting the relative position of the substrate and the die, (c) according to the position of the substrate identified in (a) and the position of the substrate identified in (b), Diagnose the fixed state of the board.

Description

晶粒接合裝置及半導體裝置之製造方法Die bonding device and manufacturing method of semiconductor device

本揭示,係關於晶粒接合裝置,例如可應用於具備有自我診斷機能的晶粒接合裝置。The present disclosure relates to a die bonding device, which can be applied to a die bonding device having a self-diagnostic function, for example.

在半導體裝置之製造工程的一部分,有將半導體晶片(以下,僅稱為晶粒。)搭載於配線基板或導線架等(以下,僅稱為基板。)而組合封裝的工程,在組合封裝之工程的一部分,有從半導體晶圓(以下,僅稱為晶圓。)分割晶粒的工程(切割工程)與將分割後之晶粒搭載於基板上的接合工程。被使用於接合工程之半導體製造裝置為晶粒接合器等的晶粒接合裝置。 [先前技術文獻] [專利文獻]As part of the manufacturing process of semiconductor devices, there is a process of mounting a semiconductor wafer (hereinafter, simply referred to as a die.) on a wiring board or lead frame (hereinafter, simply referred to as a substrate.) As part of the process, there is a process of dividing a die from a semiconductor wafer (hereinafter, simply referred to as a wafer.) (a dicing process) and a bonding process of mounting the divided die on a substrate. The semiconductor manufacturing device used in the bonding process is a die bonding device such as a die bonder. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特開平7-141021號公報[Patent Document 1] Japanese Patent Laid-Open No. 7-141021

[本發明所欲解決之課題][Problems to be solved by the present invention]

在以往的晶粒接合器中,係在不良品產生之前無法獲知裝置動作不良。因此,為了防止裝置動作不良所致之接合不良,而定期性或因應生產數實施晶粒接合器的預保養。然而,在該方法中,係由於為了完全防止不良而必需增大安全裕度,因此,保養次數變多會造成生產率降低。In the conventional die bonder, it is impossible to know that the device is malfunctioning until a defective product occurs. Therefore, in order to prevent defective joints caused by poor operation of the device, pre-maintenance of the die bonder is carried out periodically or according to the production number. However, in this method, it is necessary to increase the safety margin in order to completely prevent defects, and therefore, the increase in the number of maintenance will cause a decrease in productivity.

本發明之目的,係在於提供一種不使晶粒接合裝置之裝置構成複雜化,就可判斷預保養時期的晶粒接合裝置。   其他的課題及新穎的特徵,係可由本說明書之記述及附加圖面明確得知。 [用以解決課題之手段]An object of the present invention is to provide a die bonding device that can determine the pre-maintenance time without complicating the device configuration of the die bonding device.   Other topics and novel features can be clearly seen from the description in this manual and the attached drawings. [Means to solve the problem]

如下述,簡單說明本發明中代表性者之概要。   亦即,晶粒接合裝置,係具備有:晶粒供給部;基板供給部;接合部,將從前述晶粒供給部所供給之晶粒接合於從前述基板供給部所供給的基板或已被接合於前述基板的晶粒上;及控制部,控制前述晶粒供給部與前述基板供給部與前述接合部。前述接合部,係具備有:接合頭,具備了吸附前述晶粒的夾頭;及第1攝像裝置,可對前述基板及被接合於前述基板的晶粒進行拍攝。前述控制部,係(a)以前述第1攝像裝置對前述基板進行拍攝,辨識前述基板的位置,(b)以前述第1攝像裝置,對前述基板及被接合於前述基板的晶粒進行拍攝,辨識前述基板與被接合於前述基板之晶粒的位置,檢查前述基板與前述晶粒之相對位置,(c)根據前述(a)中所辨識之基板的位置與前述(b)中所辨識之基板的位置,診斷基板之固定狀態。 [發明之效果]The following is a brief description of the representative of the present invention. That is, the die bonding apparatus includes: a die supply portion; a substrate supply portion; and a bonding portion, which bonds the die supplied from the die supply portion to the substrate supplied from the substrate supply portion Bonded to the crystal grains of the substrate; and a control section to control the crystal grain supply section and the substrate supply section and the bonding section. The bonding portion includes a bonding head including a chuck that attracts the crystal grains; and a first imaging device that can image the substrate and the crystal grains bonded to the substrate. The control unit (a) photographs the substrate with the first imaging device to identify the position of the substrate, and (b) photographs the substrate and the die bonded to the substrate with the first imaging device , Identify the position of the substrate and the die bonded to the substrate, check the relative position of the substrate and the die, (c) according to the position of the substrate identified in (a) and the identification in (b) The position of the substrate to diagnose the fixed state of the substrate. [Effect of invention]

根據上述晶粒接合裝置,可不使晶粒接合裝置之裝置構成複雜化,就判斷預保養時期。According to the above-mentioned die bonding device, the pre-maintenance time can be determined without complicating the device configuration of the die bonding device.

作為針對精度良好地判斷預保養之時期的方法而進行檢討之結果,發明者等,係獲知如下述之見解:使用連續動作中(生產中)之辨識結果,診斷對接合精度造成影響的機構等,藉此,判斷該時期。本發明,係根據該新的見解而完成者。As a result of the review of the method for accurately determining the timing of the pre-maintenance, the inventors and others have obtained the following insights: using the identification results during continuous operation (during production) and diagnosing the mechanism that affects the accuracy of joining, etc. To judge the period. The present invention was completed based on this new insight.

例如,在無法正常固定基板的情況下,係接合精度不穩定。基板固定是否正常,係可由2次以上的辨識來進行判斷。又,藉由接合前之晶粒位置及穩定性與接合後之晶粒外觀結果的比較,限定狀態差之製程。For example, when the substrate cannot be fixed normally, the joining accuracy is unstable. Whether the substrate is fixed normally can be judged by more than two identifications. In addition, by comparing the position and stability of the crystal grains before bonding and the appearance results of the crystal grains after bonding, the process of poor state is limited.

具體而言,雖係例如通常在接合前與接合後(外觀檢查)進行基板之辨識,但可進行前後的比較而診斷基板固定狀態,或在接合前,監視晶粒背面之晶粒位置並診斷晶粒的拾取狀態、接合狀態。Specifically, although the identification of the substrate is usually performed before and after bonding (visual inspection), for example, it is possible to perform a comparison before and after to diagnose the substrate fixing state, or to monitor the position of the crystal grain on the back of the crystal grain and diagnose before bonding The pickup state and bonding state of the crystal grains.

藉此,不追加新的機構等,就可發現對接合精度造成影響之機構的不良。又,可正確判斷預保養之時期,並可實現生產率的提升而不降低品質。Thereby, without adding a new mechanism or the like, defects of the mechanism that affects the joining accuracy can be found. In addition, the timing of pre-maintenance can be correctly judged, and productivity can be improved without degrading quality.

以下,使用圖面,說明關於實施例及變形例。但是,在以下的說明中,對同一構成要素附上同一符號,省略重複之說明。另外,圖面,雖係為了更明確說明,而有相較於實際形態,示意地表示各部之寬度、厚度、形狀等的情形,但終究只是一例,並非限定本發明之解釋。 [實施例]Hereinafter, the embodiment and the modification will be described using the drawings. However, in the following description, the same symbols are given to the same constituent elements, and repeated explanations are omitted. In addition, although the drawings are for illustrative purposes, the widths, thicknesses, shapes, etc. of the parts may be schematically shown in comparison with the actual form, but after all, they are only examples and do not limit the interpretation of the present invention. [Example]

圖1,係實施例之晶粒接合器的概略上面圖。圖2,係用以說明從圖1所示的箭頭A所見之接合頭及其周邊部之概略構成與其動作的概略側面圖。FIG. 1 is a schematic top view of the die bonder of the embodiment. FIG. 2 is a schematic side view for explaining the schematic configuration and operation of the bonding head and its peripheral portion seen from the arrow A shown in FIG. 1.

晶粒接合器10,係具有單一之搬送道與單一之接合頭的晶粒接合器。晶粒接合器10,係大略具有:晶粒供給部1,將安裝之晶粒D供給至「印刷了成為包含配線的一個或複數個最終1封裝之製品區域(以下,稱為封裝區域P。)(在圖1中,係15個部位)」的基板9;接合部4,從晶粒供給部1拾取晶粒D,並將其接合於基板9或已被接合的晶粒D上;搬送部5,將基板9搬送至安裝位置;基板供給部6,將基板9供給至搬送部5;基板搬出部7,接收所安裝的基板9;及控制部8,對各部之動作進行監視、控制。The die bonder 10 is a die bonder having a single conveying path and a single bonding head. The die bonder 10 roughly includes a die supply unit 1 that supplies the mounted die D to a product area where one or a plurality of final one packages including wiring are printed (hereinafter, referred to as a package area P). ) (In FIG. 1, 15 parts)" substrate 9; the bonding portion 4, picking up the crystal grain D from the crystal grain supplying portion 1, and bonding it to the substrate 9 or the bonded crystal grain D; transport Section 5, which transports the substrate 9 to the mounting position; substrate supply section 6, which supplies the substrate 9 to the transport section 5; substrate transfer section 7, which receives the mounted substrate 9; and control section 8, which monitors and controls the operation of each section .

首先,晶粒供給部1,係具有:晶圓保持台12,保持具有複數個等級之晶粒D的晶圓11;及上推單元13,使將晶粒D從晶圓11往上推而如虛線所示。在晶粒供給部1中,晶圓保持台12,係藉由被配置於其下部之未圖示的驅動手段,沿XY方向移動,在從晶圓11拾取晶粒D之際,使預定之晶粒被移動成為位於與上推單元13平面上重疊的位置。First, the die supply unit 1 includes: a wafer holding table 12 that holds a wafer 11 having a plurality of grades of crystal grains D; and a push-up unit 13 that pushes the crystal grains D up from the wafer 11 As shown by the dotted line. In the die supply unit 1, the wafer holding table 12 is moved in the XY direction by a driving means (not shown) disposed at the lower part thereof, and when picking up the die D from the wafer 11, a predetermined The die is moved so as to overlap with the push-up unit 13 on the plane.

接合部4,係具有將被上推單元13上堆之晶粒D吸附保持於前端的夾頭42,並具有:接合頭41,拾取晶粒D,並將其接合於搬送來之基板9的封裝區域P;Y驅動部43,使接合頭41往Y方向移動;基板辨識攝影機(第1攝像裝置)44,對搬送來之基板9的封裝區域P之位置辨識標記(未圖示)進行拍攝,辨識待接合之晶粒D的接合位置;及晶粒辨識攝影機(第2攝像裝置)45,對所拾取之晶粒D的背面進行拍攝,辨識晶粒的位置。拾取,係根據分類圖來進行,該分類圖,係表示晶圓11所具有之晶粒的等級。分類圖,係被預先記憶於控制部8。另外,接合頭41,係具有使夾頭42升降及往X方向移動之未圖示的各驅動部,如圖2中箭頭所示,可往上下左右移動。The bonding part 4 has a chuck 42 that attracts and holds the crystal grains D stacked on the push-up unit 13 at the front end, and has: a bonding head 41 that picks up the crystal grains D and joins it to the substrate 9 that has been transported Package area P; Y drive unit 43 moves the bonding head 41 in the Y direction; a substrate recognition camera (first imaging device) 44 captures the position recognition mark (not shown) of the package area P of the substrate 9 being transported To identify the joining position of the die D to be joined; and a die recognition camera (second camera device) 45 to photograph the back of the picked die D to identify the position of the die. The picking is performed according to the classification map, which indicates the level of the crystal grains possessed by the wafer 11. The classification map is stored in the control unit 8 in advance. In addition, the bonding head 41 has drive units (not shown) that move the chuck 42 up and down and move in the X direction, and can move up, down, left, and right as indicated by arrows in FIG. 2.

藉由像這樣的構成,接合頭41,係根據晶粒辨識攝影機45之攝像資料,修正拾取位置・姿勢,並拾取晶粒D,根據基板辨識攝影機44之攝像資料,將晶粒D接合於基板9的封裝區域P。With such a configuration, the bonding head 41 corrects the pickup position and posture based on the imaging data of the die recognition camera 45, picks up the die D, and joins the die D to the substrate based on the imaging data of the substrate recognition camera 44 Package area 9 of 9.

搬送部5,係具有搬送基板9的2條搬送單元。例如,基板9,係以被設置於2條搬送單元之未圖示的搬送皮帶進行移動。The transport unit 5 includes two transport units that transport the substrate 9. For example, the substrate 9 is moved by a conveying belt (not shown) provided in two conveying units.

藉由像這樣的構成,基板9,係被基板供給部6載置於搬送道51,並沿著搬送單元移動至接合位置,接合後,移動至基板搬出部7。另外,其後,從基板搬出部7朝向基板供給部6移動,藉此,亦可將晶粒接合於基板9的其他封裝區域,或進一步將晶粒接合於晶粒上。在基板供給部6與基板搬出部7之間進行複數次往復,亦可對晶粒進行多層接合。With such a configuration, the substrate 9 is placed on the transfer path 51 by the substrate supply section 6 and moves to the bonding position along the transfer unit. After bonding, it moves to the substrate transfer section 7. In addition, after that, moving from the substrate carrying-out portion 7 toward the substrate supply portion 6 allows the die to be bonded to another package area of the substrate 9 or to be further bonded to the die. A plurality of times of reciprocation between the substrate supply unit 6 and the substrate carrying-out unit 7 may be performed to join the crystal grains in multiple layers.

其次,參閱圖3及圖4,說明關於晶粒供給部1的構成。圖3,係表示晶粒供給部之外觀立體圖的圖。圖4,係表示晶粒供給部之主要部的概略剖面圖。Next, referring to FIGS. 3 and 4, the configuration of the crystal grain supplying section 1 will be described. Fig. 3 is a diagram showing an external perspective view of a crystal grain supplying portion. FIG. 4 is a schematic cross-sectional view showing the main part of the crystal grain supplying part.

晶粒供給部1,係具備有:晶圓保持台12,往水平方向(XY方向)移動;及上推單元13,往上下方向移動。晶圓保持台12,係具有:擴展環15,保持晶圓環14;及支撐環17,被保持於晶圓環14,水平地定位接著有複數個晶粒D的切割帶16。上推單元13,係被配置於支撐環17之內側。The die supply unit 1 includes a wafer holding table 12 that moves in the horizontal direction (XY direction), and a push-up unit 13 that moves in the vertical direction. The wafer holding table 12 includes an expansion ring 15 that holds the wafer ring 14 and a support ring 17 that is held by the wafer ring 14 and is horizontally positioned, followed by a dicing tape 16 with a plurality of dies D. The push-up unit 13 is arranged inside the support ring 17.

晶粒供給部1,係在晶粒D之上堆時,使保持晶圓環14的擴展環15下降。其結果,保持於晶圓環14之切割帶16被拉長,晶粒D的間隔擴大,藉由上推單元13,從晶粒D下方上推晶粒D,使晶粒D的拾取性提升。將被稱為晶粒貼覆膜(DAF)18之膜狀的接著材料貼附於晶圓11與切割帶16之間。在具有晶粒貼覆膜18的晶圓11中,切割,係對晶圓11與晶粒貼覆膜18進行。因此,在剝離工程中,係從切割帶16剝離晶圓11與晶粒貼覆膜18。When the crystal grain supply part 1 is stacked on the crystal grain D, the expansion ring 15 holding the wafer ring 14 is lowered. As a result, the dicing tape 16 held on the wafer ring 14 is elongated, and the interval between the dies D is enlarged. By the push-up unit 13, the dies D are pushed up from below the dies D, so that the pick-up of the dies D is improved . A film-like bonding material called a die attach film (DAF) 18 is attached between the wafer 11 and the dicing tape 16. In the wafer 11 having the die attach film 18, the dicing is performed on the wafer 11 and the die attach film 18. Therefore, in the peeling process, the wafer 11 and the die attach film 18 are peeled from the dicing tape 16.

控制部8,係具備有:記憶體,儲存程式(軟體),該程式,係監視並控制晶粒接合器10之各部的動作;及中央處理裝置(CPU),執行被儲存於記憶體的程式。例如,控制部8,係擷取來自基板辨識攝影機44及基板辨識攝影機44之圖像資訊,接合頭41之位置等的各種資訊,控制接合頭41之接合動作等的各構成要素之各動作。The control unit 8 is provided with: a memory, a stored program (software), which monitors and controls the operations of each part of the die bonder 10; and a central processing unit (CPU), which executes the program stored in the memory . For example, the control unit 8 captures various information such as image information from the substrate recognition camera 44 and the substrate recognition camera 44, the position of the bonding head 41, and controls the movement of each constituent element such as the bonding operation of the bonding head 41.

如上述般,晶粒接合器10,係具有:晶圓辨識攝影機24,辨識晶圓11上之晶粒D的姿勢;晶粒辨識攝影機45,對所拾取之晶粒D的背面進行拍攝,辨識晶粒之位置;及基板辨識攝影機44,辨識接合平台BS上的安裝位置。必須修正辨識攝影機間之姿勢偏移,係有關接合頭41所致之拾取的晶圓辨識攝影機24及晶粒辨識攝影機45,與有關接合頭41所致之朝安裝位置之接合的基板辨識攝影機44。在本實施例中,係使用晶圓辨識攝影機24進行晶粒D的定位,並使用基板辨識攝影機44進行封裝區域P的定位及「封裝區域P與被接合於封裝區域P的晶粒之相對位置」的檢查。As described above, the die bonder 10 has: a wafer recognition camera 24 to recognize the posture of the die D on the wafer 11; a die recognition camera 45 to photograph the back of the picked die D to identify The position of the die; and the substrate identification camera 44 to identify the installation position on the bonding platform BS. It is necessary to correct the posture deviation between the identification cameras, which is related to the wafer identification camera 24 and the die identification camera 45 picked up by the bonding head 41, and the substrate identification camera 44 bonded to the mounting position by the related bonding head 41 . In this embodiment, the wafer recognition camera 24 is used to locate the die D, and the substrate recognition camera 44 is used to locate the package area P and the relative position of the package area P and the die bonded to the package area P "Check.

圖5,係說明實施例之晶粒接合裝置中之晶粒接合工程的流程圖。   在實施例之晶粒接合工程中,首先,控制部8,係從晶圓匣盒取出保持晶圓11的晶圓環14且載置於晶圓保持台12,並將晶圓保持台12搬送至進行晶粒D之拾取的基準位置(晶圓裝載)。其次,控制部8,係從藉由晶圓辨識攝影機24取得的圖像,以使晶圓11之配置位置正確地與其基準位置一致的方式,進行微調整。FIG. 5 is a flowchart illustrating the die bonding process in the die bonding device of the embodiment. In the die bonding process of the embodiment, first, the control unit 8 takes out the wafer ring 14 holding the wafer 11 from the wafer cassette and places it on the wafer holding table 12, and transports the wafer holding table 12 To the reference position (wafer loading) for picking up the die D. Next, the control unit 8 performs fine adjustment so that the arrangement position of the wafer 11 accurately matches the reference position from the image acquired by the wafer recognition camera 24.

其次,控制部8,係以預定間距來使載置了晶圓11之晶圓保持台12間距移動並水平地保持,藉此,將最初所拾取的晶粒D配置於拾取位置(晶粒搬送)。晶圓11,係預先藉由探測器等的檢查裝置,按每個晶粒檢查而生成按每個晶圓表示良、不良之圖資料,並記憶於控制部8的記憶裝置。拾取對象之晶粒D為良品或不良品的判定,係藉由圖資料來進行。控制部8,係在晶粒D為不良品的情況下,以預定間距來使載置了晶圓11之晶圓保持台12間距移動,其次,將所拾取之晶粒D配置於拾取位置,並跳過不良品的晶粒D。Next, the control unit 8 moves the wafer holding table 12 on which the wafer 11 is placed at a predetermined pitch and horizontally holds it, thereby arranging the initially picked die D at the pickup position (die transfer ). The wafer 11 is an inspection device, such as a detector, which generates image data indicating good and bad for each wafer by inspection for each die, and stores it in the memory device of the control unit 8. The determination that the grain D of the pickup object is a good product or a bad product is performed by drawing data. The control unit 8 moves the wafer holding table 12 on which the wafer 11 is placed at a predetermined pitch when the die D is a defective product, and then arranges the picked die D at the pickup position, And skip the grain D of defective products.

控制部8,係藉由晶圓辨識攝影機24,對拾取對象之晶粒D的主面(上面)進行拍攝,從所取得的圖像算出來自拾取對象之晶粒D的上述拾取位置之位置偏移量。控制部8,係根據該位置偏移量,使載置了晶圓11的晶圓保持台12移動,將拾取對象之晶粒D正確地配置於拾取位置(晶粒確認(步驟S1))。The control unit 8 uses the wafer recognition camera 24 to photograph the main surface (upper surface) of the pick-up die D, and calculates the positional deviation of the pick-up position of the pick-up die D from the acquired image Displacement. The control unit 8 moves the wafer holding table 12 on which the wafer 11 is mounted based on the positional deviation amount, and correctly arranges the pick-up die D at the pick-up position (die confirmation (step S1)).

控制部8,係在基板供給部6,將基板9載置於搬送道51(基板裝載)。控制部8,係使基板9移動至接合位置(基板搬送)。The control unit 8 is attached to the substrate supply unit 6 and places the substrate 9 on the transfer path 51 (substrate loading). The control unit 8 moves the substrate 9 to the bonding position (substrate transfer).

控制部8,係為了進行接合,而在進行接合之前,藉由基板辨識攝影機44對基板進行拍攝,辨識基板9之封裝區域P的位置,進行定位(基板辨識(步驟S4))。In order to perform the bonding, the control unit 8 photographs the substrate by the substrate recognition camera 44 before the bonding, recognizes the position of the package area P of the substrate 9 and performs positioning (substrate recognition (step S4)).

控制部8,係在將拾取對象之晶粒D正確地配置於拾取位置後,藉由包含夾頭42的接合頭41,從切割帶16拾取晶粒D(步驟S2),根據步驟S4之基板辨識結果,接合於基板9之封裝區域P或已被接合於基板9之封裝區域P的晶粒(步驟S5)。亦可藉由晶粒辨識攝影機45對所拾取之晶粒D的背面進行拍攝,檢查晶粒D的位置(步驟S3)。該步驟,係可選的(OPTION)。The control unit 8 picks up the die D from the dicing tape 16 by the bonding head 41 including the chuck 42 after the die D to be picked up is correctly placed at the pickup position (step S2), and the substrate according to step S4 As a result of the identification, the die bonded to the package area P of the substrate 9 or the die that has been bonded to the package area P of the substrate 9 (step S5). The position of the die D can also be checked by the die recognition camera 45 photographing the back of the picked die D (step S3). This step is optional.

控制部8,係在接合晶粒D後,檢查其接合位置是否正確。控制部8,係為了檢查接合安裝結果,而再次藉由基板辨識攝影機44對基板9之封裝區域P進行拍攝,且進行基板9之封裝區域P的位置辨識(步驟S6)。控制部8,係藉由基板辨識攝影機44對晶粒D進行拍攝,且進行晶粒D的位置辨識(步驟S7),並從基板辨識及晶粒辨識結果進行接合後之晶粒D之位置的檢查。控制部8,係與事前登錄之接合位置作比較,進行數值輸出與檢查・判定。The control unit 8 checks whether the bonding position is correct after joining the crystal grains D. In order to check the bonding and mounting results, the control unit 8 again photographs the package area P of the substrate 9 by the substrate recognition camera 44 and recognizes the position of the package area P of the substrate 9 (step S6). The control unit 8 captures the die D by the substrate recognition camera 44 and performs the position recognition of the die D (step S7), and the position of the die D after bonding from the substrate recognition and die recognition results an examination. The control unit 8 compares with the previously registered joint position, and performs numerical output and inspection/judgment.

控制部8,係進行後述之自我診斷(步驟S9),若無異常,則進行下一個接合(步驟S8)。The control unit 8 performs a self-diagnosis described later (step S9), and if there is no abnormality, the next engagement is performed (step S8).

以後,按照相同的程序,晶粒D將逐一接合於基板9的封裝區域P。當1個基板之接合完成時,則將基板9移動至基板搬出部7(基板搬送),且將基板9移交至基板搬出部7(基板卸載)。Thereafter, according to the same procedure, the dies D will be bonded to the package area P of the substrate 9 one by one. When the bonding of one substrate is completed, the substrate 9 is moved to the substrate carrying-out portion 7 (substrate transfer), and the substrate 9 is transferred to the substrate carrying-out portion 7 (substrate unloading).

又,按照同樣的程序,晶粒D將逐一從切割帶16剝離。當去除不良品之所有晶粒D的拾取完成時,則將以晶圓11之外形來保持該些晶粒D的切割帶16及晶圓環14等卸載至晶圓匣盒。In addition, according to the same procedure, the crystal grains D will be peeled from the dicing tape 16 one by one. When the picking up of all the dies D with defective products removed is completed, the dicing tape 16 and the wafer ring 14 holding the dies D in the shape of the wafer 11 are unloaded to the wafer cassette.

其次,使用圖6,說明關於自我診斷(步驟S9)。圖6,係表示基板辨識結果與外觀檢查結果的圖,圖6(A),係基板固定不充分的情況,圖6(B),係基板固定正常的情況。圖6之橫軸,係表示接合次數(動工次數),縱軸,係表示基板相對於基準的位置(μm)。圖6(B)之接合次數,係1~304,圖6(A)之接合次數,係870~1000。Next, the self-diagnosis will be described using FIG. 6 (step S9). FIG. 6 is a diagram showing the results of substrate identification and appearance inspection. FIG. 6(A) shows the case where the substrate is not fixed sufficiently, and FIG. 6(B) shows the case where the substrate is fixed normally. The horizontal axis in FIG. 6 represents the number of joinings (the number of starts), and the vertical axis represents the position of the substrate relative to the reference (μm). The number of joints in Fig. 6(B) is from 1 to 304, and the number of joints in Fig. 6(A) is from 870 to 1000.

控制部8,係比較接合前後之基板辨識結果,算出基板的位置移動量,在基板之位置移動量為預定量以上的情況下,係判斷為基板固定不充分並進行警告。The controller 8 compares the substrate recognition results before and after bonding to calculate the amount of positional movement of the substrate. If the amount of positional movement of the substrate is more than a predetermined amount, it determines that the substrate is insufficiently fixed and issues a warning.

具體而言,控制部8,係比較步驟S4的基板辨識中之封裝區域P的位置(PS4 )與步驟S6的基板辨識中之封裝區域P的位置(PS6 ),算出其差(基板之位置移動量)。在動工次數大的圖6(A)中,係PS4 及PS6 之變動大,且基板之位置移動量亦大。在動工次數小的圖6(B)中,係PS4 及PS6 之變動小於圖6(A),且基板之位置移動量亦小。另外,在圖6(A)(B)中,雖係未表示基板之位置移動量,但基板之位置移動量,係接合前後之基板的位置之差,可從圖中輕易地掌握。控制部8,係如圖6(A)所示,在基板之位置移動量大的情況下,判定為基板固定不充分,如圖6(B)所示,在基板之位置移動量小的情況下,判定為基板固定正常。Specifically, the control unit 8 compares the position of the package area P (P S4 ) in the substrate identification in step S4 and the position (P S6 ) of the package area P in the substrate identification in step S6, and calculates the difference (substrate The amount of position movement). In FIG. 6(A) where the number of starts is large, the variations of P S4 and P S6 are large, and the amount of positional movement of the substrate is also large. In FIG. 6(B) where the number of starts is small, the variation of P S4 and P S6 is smaller than that of FIG. 6(A), and the amount of positional movement of the substrate is also small. In addition, in FIG. 6(A) and (B), although the positional movement amount of the substrate is not shown, the positional movement amount of the substrate is the difference between the positions of the substrates before and after bonding, and can be easily grasped from the figure. As shown in FIG. 6(A), the control unit 8 determines that the substrate is insufficiently fixed when the positional movement amount of the substrate is large, and as shown in FIG. 6(B), when the positional movement amount is small Next, it is determined that the substrate is fixed properly.

例如,控制部8,係在基板之位置移動量為1~5μm的情況下,判定為基板固定充分(正常),在5~10μm的情況下,判定為一般偏差範圍,在10μm以上的情況下,判定為基板固定不充分。在被判定為基板固定不充分的情況下,例如想到機械夾持不充分、吸附所致之固定不充分、攝影機・透鏡固定不充分,若機械夾持不充分,則重新檢討高度,若吸附所致之固定不充分,則重新檢討洩漏或配管彎折,若攝影機・透鏡固定不充分,則重新檢討鬆動、剝離。For example, the control unit 8 determines that the substrate is sufficiently fixed (normal) when the positional movement amount of the substrate is 1 to 5 μm, and determines the general deviation range when it is 5 to 10 μm, and is more than 10 μm , It is determined that the substrate is insufficiently fixed. When it is determined that the substrate is insufficiently fixed, for example, it is thought that the mechanical clamping is insufficient, the fixing due to suction is insufficient, and the camera/lens is insufficiently fixed. If the mechanical clamping is insufficient, re-examine the height. If the fixation is insufficient, the leak or piping bend will be reviewed again. If the camera and lens are not fixed sufficiently, the looseness or peeling will be reviewed.

根據以上實施例,可提供一種不使晶粒接合器之裝置構成複雜化,就可判斷預保養時期的晶粒接合器及接合方法。藉此,可提供高精度之晶粒接合器,並可維持高精度。According to the above embodiments, it is possible to provide a die bonder and a bonding method that can determine the pre-maintenance time without complicating the device configuration of the die bonder. Thereby, a high-precision die bonder can be provided, and high precision can be maintained.

<變形例>   以下,例示若干個代表性的變形例。在以下之變形例的說明中,對於具有與上述之實施例中所說明者相同之構成及功能的部分,係使用與上述之實施例相同的符號。而,關於部分之說明,係在技術上不矛盾的範圍內,適當地引用上述的實施例中之說明。又,在技術上不矛盾的範圍內,上述之實施例的一部分及複數個變形例的全部或一部分可適當地組合使用。<Modifications>   The following are some representative modifications. In the description of the following modified examples, the same symbols as those in the above-mentioned embodiment are used for the parts having the same configuration and function as those described in the above-mentioned embodiment. However, the descriptions of the parts are within the scope of no technical contradiction, and the descriptions in the above embodiments are appropriately cited. In addition, to the extent that there is no technical contradiction, a part of the above-mentioned embodiments and all or a part of the plurality of modifications can be used in appropriate combination.

(變形例1)   在實施例中,步驟S3雖為可選的(OPTION),但在變形例1中,係進行步驟S3。變形例1,係除了自我診斷外,其餘與實施例相同。使用圖7,說明關於變形例1之自我診斷(步驟SA)。圖7,係表示變形例1之接合動作的流程圖。(Modification 1) In the embodiment, step S3 is optional (OPTION), but in modification 1, step S3 is performed. Modification 1 is the same as the embodiment except for self-diagnosis. With reference to Fig. 7, self-diagnosis (Step SA) concerning Modification 1 will be described. FIG. 7 is a flowchart showing the joining operation of Modification 1. FIG.

控制部8,係在接合之前,進行晶粒背面的位置檢查(根據位置檢查結果,亦可進行或不進行位置修正)。比較步驟S3的晶粒背面位置檢查中之晶粒D的位置與所登錄之晶粒的位置,算出其差(晶粒之位置移動量)。The control unit 8 performs position inspection of the back surface of the die before bonding (depending on the result of the position inspection, position correction may or may not be performed). The position of the crystal grain D in the position inspection of the back surface of the crystal grain in step S3 is compared with the position of the registered crystal grain, and the difference (the amount of movement of the crystal grain position) is calculated.

例如,控制部8,係在晶粒之位置移動量為1~5μm的情況下,判定為晶粒辨識・拾取正常,在5~10μm的情況下,判定為一般偏差範圍,在10μm以上的情況下,判定為拾取位置異常。在被判定為拾取位置異常的情況下,例如想到晶粒辨識不良或拾取時偏移,若晶粒辨識不良,則重新檢討解析度、登錄圖案等,若拾取時偏移,則重新檢討吸附壓力、時序、高度。For example, the control unit 8 determines that the crystal grain identification and pickup are normal when the positional movement amount of the crystal grains is 1 to 5 μm, and the general deviation range is determined to be 10 μm or more when it is 5 to 10 μm. Next, it is determined that the pickup position is abnormal. When it is determined that the pickup position is abnormal, for example, it is considered that the grain recognition is poor or the pickup is shifted. If the grain recognition is poor, the resolution and registration pattern are reviewed. If the pickup is shifted, the suction pressure is reviewed. , Timing, height.

(變形例2)   在實施例中,步驟S3雖為可選的(OPTION),但在變形例2中,係與變形例1相同地進行步驟S3。變形例2,係除了自我診斷外,其餘與實施例相同。使用圖8、9,說明關於變形例2之自我診斷(步驟S9、SB)。(Modification 2) In the embodiment, step S3 is optional (OPTION), but in modification 2, step S3 is performed in the same manner as modification 1. Modification 2 is the same as the embodiment except for self-diagnosis. The self-diagnosis concerning modification 2 (steps S9, SB) will be described using FIGS. 8 and 9.

圖8,係表示變形例2之接合動作的流程圖。圖9,係表示拾取異常而接合正常的情況下之晶粒背面位置檢查結果與外觀檢查結果的圖。圖9之橫軸,係表示接合次數(動工次數),縱軸,係表示晶粒相對於基準的位置(μm)。圖9之接合次數,係1~320。FIG. 8 is a flowchart showing the joining operation of Modification 2. FIG. FIG. 9 is a diagram showing the inspection result of the back surface of the die and the appearance inspection result when the pickup is abnormal and the bonding is normal. 9, the horizontal axis represents the number of joinings (the number of starts), and the vertical axis represents the position of the crystal grains relative to the reference (μm). The number of joints in Fig. 9 is 1 to 320.

控制部8,係比較接合前後之晶粒辨識結果,算出晶粒的位置移動量,在接合前之晶粒背面位置與外觀檢查結果大有差異的情況下,判斷為基板固定狀態或接合製程有不良並進行警告。The control unit 8 compares the results of the identification of the crystal grains before and after bonding, and calculates the amount of movement of the position of the crystal grains. If the position of the back surface of the crystal grains before bonding differs greatly from the appearance inspection results, it is determined that the substrate is fixed or the bonding process is Defective and warn.

具體而言,控制部8,係比較步驟S3的晶粒背面位置檢查中之晶粒D的位置(PS3 )與步驟S7的晶粒位置辨識中之晶粒的位置(PS7 ),算出其差(晶粒之位置移動量)。在圖9中,PS3 及PS7 之變動方向,係有相同傾向,位置移動量比較小。Specifically, the control unit 8 compares the position of the crystal grain D (P S3 ) in the inspection of the back surface of the crystal grain in step S3 with the position of the crystal grain (P S7 ) in the identification of the crystal grain position in step S7, and calculates the Poor (amount of movement of the grain). In FIG. 9, the direction of change of PS3 and PS7 has the same tendency, and the amount of position shift is relatively small.

例如,控制部8,係在晶粒之位置移動量為1~5μm的情況下(在接合前後,晶粒相對於基準之位置偏移為相同傾向的情況),判定為基板固定充分(正常)及接合正常,在5~10μm的情況下(在接合前後,晶粒相對於基準之位置偏移為相同傾向的情況),判定為一般偏差範圍,在10μm以上的情況下,判定為基板固定不充分或接合異常。控制部8,係在判定為基板固定不充分或接合異常的情況下,比較接合前後之基板辨識結果,算出基板的位置移動量,在基板之位置移動量為預定量以上的情況下,係判定為基板固定不充分。控制部8,係在被判定為基板固定正常的情況下,判定為接合異常。在被判定為接合異常的情況下,係想到接合頭或夾頭異常,抑或接合壓接不良。若接合頭或夾頭異常,則確認機械齒隙,若接合壓接不良,則重新檢討高度或溫度。For example, the control unit 8 determines that the substrate is sufficiently fixed (normal) when the positional displacement of the crystal grains is 1 to 5 μm (when the positional deviation of the crystal grains from the reference before and after bonding is the same tendency) And the bonding is normal. In the case of 5 to 10 μm (before and after bonding, the positional deviation of the crystal grains from the reference has the same tendency), it is judged as a general deviation range, and when it is 10 μm or more, it is judged that the substrate is not fixed Fully or abnormally engaged. The control unit 8 compares the results of substrate recognition before and after bonding to calculate the positional displacement of the substrate when it is determined that the substrate is insufficiently fixed or abnormally bonded, and determines if the positional displacement of the substrate is more than a predetermined amount Insufficient fixation for the substrate. The control unit 8 determines that the bonding is abnormal when it is determined that the substrate fixing is normal. When it is determined that the joint is abnormal, it is considered that the joint head or the chuck is abnormal, or the joint crimping is poor. If the joint head or chuck is abnormal, check the mechanical backlash, and if the joint crimp is not good, re-check the height or temperature.

(變形例3)   實施例,雖係設成為以接合頭41從晶圓拾取晶粒D的構成,但變形例3,係為了縮短接合頭41之移動距離而縮短處理時間,而在晶粒供給部1與接合部4之間設置中間平台31。(Modification 3) Although the embodiment is configured to pick up the die D from the wafer with the bonding head 41, the modification 3 is to shorten the processing distance of the bonding head 41 and shorten the processing time. An intermediate platform 31 is provided between the part 1 and the joint part 4.

使用圖10、11,說明關於變形例3之晶粒接合器。圖10,係變形例3之晶粒接合器的概略上面圖。圖11,係用以說明從圖10所示的箭頭A所見之拾取頭或接合頭及其周邊部之概略構成與其動作的概略側面圖。10 and 11, a die bonder according to Modification 3 will be described. FIG. 10 is a schematic top view of a die bonder of Modification 3. FIG. FIG. 11 is a schematic side view for explaining the schematic configuration and operation of the pickup head or the bonding head and its peripheral portion seen from the arrow A shown in FIG. 10.

變形例之晶粒接合器10A,係具有單一之搬送道與單一之接合頭的晶粒接合器。晶粒接合器10A,係大略具有:晶粒供給部1,將安裝之晶粒D供給至基板9的封裝區域P;拾取部2,從晶粒供給部1拾取晶粒;定位部3,中間性地暫時載置所拾取的晶粒D;接合部4,拾取定位部之晶粒D,並將其接合於基板9的封裝區域P或已被接合的晶粒D上;搬送部5,將基板9搬送至安裝位置;基板供給部6,將基板9供給至搬送部5;基板搬出部7,接收所安裝的基板9;及控制部8,對各部之動作進行監視、控制。The die bonder 10A of the modification is a die bonder having a single conveying path and a single bonding head. The die bonder 10A roughly includes: a die supply portion 1 that supplies the mounted die D to the package area P of the substrate 9; a pickup portion 2 that picks up the die from the die supply portion 1; a positioning portion 3, the middle Temporarily place the picked die D; the bonding part 4 picks up the die D of the positioning part and joins it to the package area P of the substrate 9 or the die D that has been joined; the transfer part 5 will The substrate 9 is transferred to the mounting position; the substrate supply section 6 supplies the substrate 9 to the transfer section 5; the substrate transfer section 7 receives the mounted substrate 9; and the control section 8 monitors and controls the operation of each section.

拾取部2,係具有將被上推單元13上堆之晶粒D吸附保持於前端的夾頭42,並具有:拾取頭21,拾取晶粒D,並將其載置於定位部3;及拾取頭之Y驅動部23,使拾取頭21往Y方向移動。拾取,係根據分類圖來進行,該分類圖,係表示晶圓11所具有之晶粒的等級。分類圖,係被預先記憶於控制部8。另外,拾取頭21,係具有使夾頭22升降及往X方向移動之未圖示的各驅動部,如圖2中箭頭所示,可往上下左右移動。The pickup section 2 has a chuck 42 that attracts and holds the crystal grains D stacked on the push-up unit 13 to the front end, and has: a pickup head 21 that picks up the crystal grains D and places it on the positioning section 3; and The Y drive section 23 of the pickup head moves the pickup head 21 in the Y direction. The picking is performed according to the classification map, which indicates the level of the crystal grains possessed by the wafer 11. The classification map is stored in the control unit 8 in advance. In addition, the pick-up head 21 includes drive units (not shown) that move the chuck 22 up and down and move in the X direction, and can move up, down, left, and right as shown by arrows in FIG. 2.

定位部3,係具有:中間平台31,暫時性地載置晶粒D;及平台辨識攝影機32,用以辨識中間平台31上之晶粒D。The positioning part 3 includes: an intermediate platform 31 to temporarily place the die D; and a platform identification camera 32 for identifying the die D on the intermediate platform 31.

接合部4,係具有與拾取頭21相同的構成,並具有:接合頭41,從中間平台31拾取晶粒D,並將其接合於搬送來之基板9的封裝區域P;夾頭42,吸附保持被裝設於接合頭41之前端的晶粒D;Y驅動部43,使接合頭41往Y方向移動;及基板辨識攝影機44,對搬送來之基板9的封裝區域P之位置辨識標記(未圖示)進行拍攝,辨識待接合之晶粒D的接合位置。BS,係表示接合區域。另外,接合頭41,係具有使夾頭42升降及往X方向移動之未圖示的各驅動部,如圖11中箭頭所示,可往上下左右移動。The bonding part 4 has the same structure as the pickup head 21 and has: a bonding head 41 that picks up the die D from the intermediate stage 31 and bonds it to the package area P of the substrate 9 that is being transported; a chuck 42 that sucks The die D mounted on the front end of the bonding head 41 is held; the Y driving part 43 moves the bonding head 41 in the Y direction; and the substrate recognition camera 44 recognizes the position of the package area P of the substrate 9 that has been transferred (not recognized (Illustration) Take a picture and identify the bonding position of the die D to be bonded. BS is the joint area. In addition, the bonding head 41 includes drive units (not shown) that move the chuck 42 up and down and move in the X direction, and can move up, down, left, and right as indicated by arrows in FIG. 11.

藉由像這樣的構成,接合頭41,係根據平台辨識攝影機32之攝像資料,修正拾取位置・姿勢,並從中間平台31拾取晶粒D,根據基板辨識攝影機44之攝像資料,將晶粒D接合於基板9的封裝區域P。With such a configuration, the bonding head 41 corrects the pickup position and posture based on the imaging data of the platform recognition camera 32, and picks up the die D from the intermediate platform 31, and the die D according to the imaging data of the substrate recognition camera 44 It is bonded to the package region P of the substrate 9.

其次,使用圖5,說明關於變形例3之晶粒接合器的晶粒接合工程。變形例3之晶粒接合工程,係除了步驟S2的拾取外,其餘與實施例相同。Next, the die bonding process concerning the die bonder of Modification 3 will be described using FIG. 5. The die bonding process of Modification 3 is the same as the embodiment except for the pickup in step S2.

控制部8,係在正確地將拾取對象之晶粒D配置於拾取位置後,藉由包含夾頭22的拾取頭21,從切割帶16拾取晶粒D並載置於中間平台31(晶粒處理)。控制部8,係藉由平台辨識攝影機32進行拍攝,且進行載置於中間平台31之晶粒的姿勢偏移(旋轉偏移)之檢測。控制部8,係當存在有姿勢偏移的情況下,藉由被設置於中間平台31的旋轉驅動裝置(未圖示),在具有安裝位置之安裝面,以平行的面使中間平台31旋轉,修正姿勢偏移。The control unit 8 arranges the pick-up die D at the pick-up position correctly, and then picks up the die D from the dicing tape 16 by the pick-up head 21 including the chuck 22 and places it on the intermediate platform 31 (die deal with). The control unit 8 takes pictures by the platform recognition camera 32 and detects the posture deviation (rotational deviation) of the die mounted on the intermediate platform 31. The control unit 8 rotates the intermediate platform 31 with a parallel surface on a mounting surface having an installation position by a rotation driving device (not shown) provided on the intermediate platform 31 when there is a deviation in posture To correct posture deviation.

控制部8,係藉由包含夾頭42的接合頭41,從中間平台31拾取晶粒D(步驟S2),接合於基板9之封裝區域P或已被接合於基板9之封裝區域P的晶粒(步驟S5)。亦可藉由晶粒辨識攝影機45對所拾取之晶粒D的背面進行拍攝,檢查晶粒背面位置(步驟S3)。The control unit 8 picks up the die D from the intermediate stage 31 by the bonding head 41 including the chuck 42 (step S2), and is bonded to the package area P of the substrate 9 or the crystal that has been bonded to the package area P of the substrate 9 Grains (step S5). The back surface of the picked-up die D may also be photographed by the die recognition camera 45 to check the position of the back surface of the die (step S3).

變形例3之晶粒接合器,係可進行與實施例、變形例1,2相同的自我診斷。又,由於晶粒接合器10A,係具備有平台辨識攝影機32,因此,亦可使用平台辨識攝影機32代替晶粒辨識攝影機45,進行變形例1,2的自我診斷。亦可使用辨識攝影機25代替晶粒辨識攝影機45或將其與晶粒辨識攝影機45一起使用,該辨識攝影機25,係對被拾取頭所拾取之晶粒的背面進行拍攝。The die bonder of Modification 3 can perform the same self-diagnosis as the embodiment and Modifications 1,2. In addition, since the die adapter 10A is provided with the platform recognition camera 32, the platform recognition camera 32 may be used in place of the die recognition camera 45 to perform self-diagnosis of Modifications 1 and 2. It is also possible to use the identification camera 25 instead of the die identification camera 45 or to use it together with the die identification camera 45, which takes pictures of the back of the die picked up by the pickup head.

以上,雖根據實施形態、實施例及變形例具體地說明了本發明者所研發的發明,但本發明,係不限定於上述實施形態、實施例及變形例,當然可實施各種變更。Although the invention developed by the inventors has been specifically described above based on the embodiments, examples, and modified examples, the present invention is not limited to the above-described embodiments, examples, and modified examples, and of course various changes can be made.

在變形例1、2中,雖係使用了對晶粒背面進行拍攝的晶粒辨識攝影機來辨識接合前之晶粒的位置,但亦可使用晶圓辨識攝影機。In Modifications 1 and 2, although a die recognition camera that photographs the back of the die is used to identify the position of the die before bonding, a wafer recognition camera may be used.

又,亦可為倒裝晶片接合器,其係設置使夾頭旋轉的驅動部,並設成為可反轉所拾取之晶粒的上下之翻轉頭(Flip head)。又,亦可為具備了複數組包含拾取部與定位部與接合部之安裝部及搬送道的晶粒接合器,或亦可為具備了複數組包含拾取部與定位部與接合部之安裝部及單一搬送道的晶粒接合器。Alternatively, it may be a flip chip bonder, which is provided with a driving part for rotating the chuck, and is provided as a flip head that can reverse the picked up and down crystal grains. Also, it may be a die bonder equipped with a mounting unit and a transport path that includes a picking unit and a positioning unit and a joining unit, or may be a mounting unit including a picking unit and a positioning unit and a joining unit And a single-channel die bonder.

1‧‧‧晶粒供給部11‧‧‧晶圓12‧‧‧晶圓保持台13‧‧‧上推單元2‧‧‧拾取部21‧‧‧拾取頭22‧‧‧夾頭23‧‧‧拾取之Y驅動部3‧‧‧定位部31‧‧‧中間平台32‧‧‧平台辨識攝影機4‧‧‧接合部41‧‧‧接合頭42‧‧‧夾頭43‧‧‧接合頭之Y驅動部44‧‧‧基板辨識攝影機5‧‧‧搬送部51‧‧‧搬送道6‧‧‧基板供給部7‧‧‧基板搬出部8‧‧‧控制部9‧‧‧基板10‧‧‧晶粒接合器BS‧‧‧接合平台D‧‧‧晶粒P‧‧‧封裝區域1‧‧‧ Die supply part 11‧‧‧ Wafer 12‧‧‧ Wafer holding table 13‧‧‧Push up unit 2‧‧‧ Pick up part 21‧‧‧ Pick up head 22‧‧‧Chuck 23‧‧ ‧Pickup Y drive part 3‧‧‧Positioning part 31‧‧‧Intermediate platform 32‧‧‧Platform recognition camera 4‧‧‧Joint part 41‧‧‧Joint head 42‧‧‧Chuck 43‧‧‧Joint head Y drive unit 44‧‧‧ substrate recognition camera 5‧‧‧ transport unit 51‧‧‧ transport lane 6‧‧‧ substrate supply unit 7‧‧‧ substrate transport unit 8‧‧‧ control unit 9‧‧‧ substrate 10‧‧ ‧ Die Bonder BS‧‧‧ Bonding platform D‧‧‧ Die P‧‧‧ Package area

[圖1]表示實施例之晶粒接合器的概略上面圖   [圖2]用以說明從圖1所示的箭頭A方向所見之接合頭等的移動之概略側面圖   [圖3]表示晶粒供給部之外觀立體圖的圖   [圖4]表示晶粒供給部之主要部的概略剖面圖   [圖5]表示圖1之接合動作的流程圖   [圖6]表示接合前後之基板辨識之結果的圖   [圖7]表示變形例1之接合動作的流程圖   [圖8]表示變形例2之接合動作的流程圖   [圖9]表示接合前後之晶粒辨識之結果的圖   [圖10]表示變形例3之晶粒接合器的概略整體上面圖   [圖11]用以說明從圖10所示的箭頭A方向所見之拾取頭、接合頭等的移動之概略側面圖[FIG. 1] A schematic side view showing the die bonder of the embodiment. [FIG. 2] A schematic side view for explaining the movement of the bonding head and the like seen from the direction of arrow A shown in FIG. 1. [FIG. 3] FIG. 4 is a schematic cross-sectional view of the main part of the die supply part. [FIG. 5] A flowchart showing the bonding operation of FIG. 1. [FIG. 6] A figure showing the results of substrate recognition before and after bonding. [FIG. 7] A flowchart showing the bonding operation of the modification 1 [FIG. 8] A flowchart showing the bonding operation of the modification 2 [FIG. 9] A diagram showing the results of the grain identification before and after bonding [FIG. 10] showing a modification 3 Overall outline of the die bonder [FIG. 11] A schematic side view for explaining the movement of the pickup head, bonding head, etc. seen from the direction of arrow A shown in FIG.

Claims (14)

一種晶粒接合裝置,係具備有:晶粒供給部;基板供給部;接合部,將從前述晶粒供給部所供給之晶粒接合於從前述基板供給部所供給的基板或已被接合於前述基板的晶粒上;及控制部,控制前述晶粒供給部與前述基板供給部與前述接合部,前述接合部,係具備有:接合頭,具備了吸附前述晶粒的夾頭;及第1攝像裝置,可對前述基板及被接合於前述基板的晶粒進行拍攝,前述控制部,係(a)以前述第1攝像裝置對前述基板進行拍攝,辨識前述基板的位置,(b)以前述第1攝像裝置,對前述基板及被接合於前述基板的晶粒進行拍攝,辨識前述基板與被接合於前述基板之晶粒的位置,檢查前述基板與前述晶粒之相對位置,(c)根據前述(a)中所辨識之基板的位置與前述(b)中所辨識之基板的位置,診斷前述基板之固定狀態。 A die bonding apparatus is provided with: a die supply portion; a substrate supply portion; a bonding portion that bonds the die supplied from the die supply portion to the substrate supplied from the substrate supply portion or has been bonded to On the crystal grains of the substrate; and a control section that controls the crystal grain supplying section and the substrate supplying section and the bonding section, the bonding section is provided with: a bonding head having a chuck that attracts the crystal grains; and 1. An imaging device that can photograph the substrate and the die bonded to the substrate. The control unit (a) photographs the substrate with the first imaging device to recognize the position of the substrate, (b) The first imaging device photographs the substrate and the crystal grains bonded to the substrate, recognizes the positions of the substrate and the crystal grains bonded to the substrate, and checks the relative positions of the substrate and the crystal grains, (c) Based on the position of the substrate identified in (a) and the position of the substrate identified in (b), the fixed state of the substrate is diagnosed. 如申請專利範圍第1項之晶粒接合裝置,其中,前述控制部,係算出前述(a)中所辨識之基板的位置與 前述(b)中所辨識之基板的位置之差即基板位置移動量,在前述基板位置移動量為預定量以上的情況下,判定為前述基板固定不充分。 For example, in the die bonding device of claim 1, the control unit calculates the position of the substrate identified in (a) and The difference in the positions of the substrates identified in (b) above is the amount of movement of the substrate position. When the amount of movement of the substrate position is a predetermined amount or more, it is determined that the fixing of the substrate is insufficient. 一種晶粒接合裝置,係具備有:晶粒供給部;基板供給部;接合部,將從前述晶粒供給部所供給之晶粒接合於從前述基板供給部所供給的基板或已被接合於前述基板的晶粒上;及控制部,控制前述晶粒供給部與前述基板供給部與前述接合部,前述接合部,係具備有:接合頭,具備了吸附前述晶粒的夾頭;及第2攝像裝置,可對被前述接合頭所拾取之晶粒的背面進行拍攝,前述控制部,係(a)以前述第2攝像裝置對前述晶粒進行拍攝,辨識前述晶粒的位置,(b)根據前述(a)中所辨識之晶粒的位置與所預先登錄之晶粒的位置,診斷晶粒的拾取偏移或晶粒辨識狀態,並算出前述(a)中所辨識之晶粒的位置與所預先登錄之晶粒的位置之差即晶粒位置移動量,在前述晶粒位置移動量為預定量以上的情況下,判定為前述晶粒之拾取偏移或晶粒辨識不良。 A die bonding apparatus is provided with: a die supply portion; a substrate supply portion; a bonding portion that bonds the die supplied from the die supply portion to the substrate supplied from the substrate supply portion or has been bonded to On the crystal grains of the substrate; and a control section that controls the crystal grain supplying section and the substrate supplying section and the bonding section, the bonding section is provided with: a bonding head having a chuck that attracts the crystal grains; and 2 An imaging device capable of photographing the back surface of the die picked up by the bonding head, the control unit is (a) photographing the die with the second imaging device to identify the position of the die, (b ) According to the position of the die identified in (a) above and the position of the pre-registered die, diagnose the pickup deviation of the die or the state of die identification, and calculate the die identified in (a) above The difference between the position and the position of the pre-registered crystal grain is the amount of movement of the crystal grain position. When the amount of movement of the crystal grain position is greater than or equal to a predetermined amount, it is determined that the pickup of the crystal grain is shifted or the crystal grain recognition is poor. 一種晶粒接合裝置,係具備有:晶粒供給部;基板供給部;接合部,將從前述晶粒供給部所供給之晶粒接合於從前述基板供給部所供給的基板或已被接合於前述基板的晶粒上;及控制部,控制前述晶粒供給部與前述基板供給部與前述接合部,前述接合部,係具備有:接合頭,具備了吸附前述晶粒的夾頭;第1攝像裝置,可對前述基板及被接合於前述基板的晶粒進行拍攝;及第2攝像裝置,可對被前述接合頭所拾取之晶粒的背面進行拍攝,前述控制部,係(a)以前述第1攝像裝置對前述基板進行拍攝,辨識前述基板的位置,(b)以前述第2攝像裝置對前述晶粒進行拍攝,辨識前述晶粒的位置,(c)以前述第1攝像裝置,對前述基板及被接合於前述基板的晶粒進行拍攝,辨識前述基板與被接合於前述基板之晶粒的位置,檢查前述基板與前述晶粒之相對位置,(d)根據前述(b)中所辨識之晶粒的位置與前述(c)中所辨識之晶粒的位置,診斷基板固定狀態及接合狀態。 A die bonding apparatus is provided with: a die supply portion; a substrate supply portion; a bonding portion that bonds the die supplied from the die supply portion to the substrate supplied from the substrate supply portion or has been bonded to On the crystal grains of the substrate; and a control part that controls the crystal grain supply part and the substrate supply part and the bonding part, the bonding part is provided with: a bonding head provided with a chuck that attracts the crystal grain; first The imaging device can image the substrate and the die bonded to the substrate; and the second imaging device can image the back surface of the die picked up by the bonding head. The control unit is (a) to The first imaging device photographs the substrate to identify the position of the substrate, (b) photographs the die with the second imaging device, identifies the position of the die, and (c) uses the first imaging device, Photographing the substrate and the crystal grains bonded to the substrate, identifying the positions of the substrate and the crystal grains bonded to the substrate, and checking the relative positions of the substrate and the crystal grains, (d) according to (b) The position of the identified die and the position of the identified die in (c) above are used to diagnose the substrate fixing state and the bonding state. 如申請專利範圍第4項之晶粒接合裝置,其中,前述控制部,係算出前述(b)中所辨識之晶粒的位置與前述(c)中所辨識之晶粒的位置之差即晶粒位置移動量,在前述晶粒位置移動量為預定量以上的情況下,判定為前述基板固定不充分或接合異常。 For example, in the die bonding apparatus of claim 4, the control unit calculates the difference between the position of the grain identified in (b) and the position of the grain identified in (c). The amount of grain position movement is determined to be insufficient fixing of the substrate or abnormal bonding when the amount of grain position movement is equal to or greater than a predetermined amount. 如申請專利範圍第5項之晶粒接合裝置,其中,前述控制部,係在判定為前述基板固定不充分或接合異常的情況下,算出前述(a)中所辨識之基板的位置與前述(c)中所辨識之基板的位置之差即基板位置移動量,在前述基板位置移動量為預定量以上的情況下,判定為前述基板固定不充分,在前述基板位置移動量未滿預定量的情況下,判定為接合異常。 According to the die bonding apparatus of claim 5 of the patent application range, the control unit calculates the position of the substrate identified in (a) and the aforementioned (a) when it is determined that the substrate is insufficiently fixed or the bonding is abnormal. c) The difference between the positions of the substrates identified in c) is the amount of movement of the substrate position. When the amount of movement of the substrate position is greater than or equal to a predetermined amount, it is determined that the substrate is insufficiently fixed, and the amount of movement at the position of the substrate is less than the predetermined amount In this case, it is determined that the joint is abnormal. 如申請專利範圍第1~6項中任一項之晶粒接合裝置,其中,前述晶粒供給部,係保持晶圓環,該晶圓環,係保持貼附有前述晶粒之切割帶,前述接合頭,係從前述切割帶拾取前述晶粒。 The die bonding apparatus according to any one of claims 1 to 6, wherein the die supply portion holds a wafer ring, and the wafer ring holds a dicing tape to which the die is attached, The bonding head picks up the crystal grains from the dicing tape. 如申請專利範圍第1~6項中任一項之晶粒接合裝置, 其中,在前述晶粒供給部與前述接合部之間更具有拾取部與定位部,前述拾取部,係具有具備了吸附前述晶粒之夾頭的拾取頭,前述定位部,係具有中間平台,該中間平台,係載置前述拾取頭拾取之晶粒,前述接合頭,係從前述中間平台拾取前述晶粒。 For example, the die bonding device of any one of the items 1 to 6 of the patent scope, Among them, a pick-up portion and a positioning portion are further provided between the die supply portion and the joint portion, the pick-up portion has a pick-up head provided with a chuck that attracts the die, and the positioning portion has an intermediate platform, The intermediate stage is configured to mount the die picked up by the pickup head, and the bonding head is configured to pick up the die from the intermediate stage. 一種半導體裝置之製造方法,係具備有:(a)對基板進行拍攝,辨識前述基板的位置之工程;(b)將晶粒接合於前述基板或已被接合於前述基板的晶粒上之工程;(c)對前述基板及被接合於前述基板的晶粒進行拍攝,辨識前述基板與被接合於前述基板之晶粒的位置,檢查前述基板與前述晶粒的相對位置之工程;及(d)根據前述(a)工程中所辨識之基板的位置與前述(c)工程中所辨識之基板的位置,診斷基板的固定狀態之工程。 A method of manufacturing a semiconductor device includes: (a) a process of photographing a substrate and identifying the position of the substrate; (b) a process of bonding a die to the substrate or a die that has been bonded to the substrate (C) photographing the substrate and the crystal grains bonded to the substrate, identifying the positions of the substrate and the crystal grains bonded to the substrate, and checking the relative position of the substrate and the crystal grains; and (d ) A project to diagnose the fixed state of the board based on the position of the board identified in the aforementioned (a) project and the position of the board identified in the aforementioned (c) project. 如申請專利範圍第9項之半導體裝置之製造方法,其中,前述(d)工程中,係算出前述(a)工程中所辨識之基板的位置與前述(c)工程中所辨識之基板的位置之差即基板位 置移動量,在前述基板位置移動量為預定量以上的情況下,判定為前述基板固定不充分。 For example, in the method of manufacturing a semiconductor device according to item 9 of the patent application scope, in the (d) project, the position of the substrate identified in the (a) project and the position of the substrate identified in the (c) project are calculated Substrate position The amount of displacement is determined to be insufficient fixing of the substrate when the amount of displacement of the substrate position is a predetermined amount or more. 一種半導體裝置之製造方法,係具備有:(a)對被接合頭所拾取之晶粒的背面進行拍攝,辨識前述晶粒的位置之工程;(b)將前述晶粒接合於前述基板或已被接合於前述基板的晶粒上之工程;及(c)根據前述(a)中所辨識之晶粒的位置與所預先登錄之晶粒的位置,診斷晶粒的拾取偏移或晶粒辨識狀態,並算出前述(a)中所辨識之晶粒的位置與所預先登錄之晶粒的位置之差即晶粒位置移動量,在前述晶粒位置移動量為預定量以上的情況下,判定為前述晶粒之拾取偏移或晶粒辨識不良之工程。 A method of manufacturing a semiconductor device includes: (a) a process of photographing the back surface of a die picked by a bonding head to identify the position of the die; (b) bonding the die to the substrate or The process of being bonded on the die of the aforementioned substrate; and (c) Diagnosing the pick-up deviation of the die or die identification based on the position of the die identified in (a) and the position of the pre-registered die State, and calculate the difference between the position of the grain identified in (a) and the position of the previously registered grain, that is, the amount of movement of the grain position. If the amount of movement of the grain position is more than a predetermined amount, determine It is the process of the aforementioned pick-up shift of the die or poor die recognition. 一種半導體裝置之製造方法,係具備有:(a)對基板進行拍攝,辨識前述基板的位置之工程;(b)對被接合頭所拾取之晶粒的背面進行拍攝,辨識前述晶粒的位置之工程;(c)將前述晶粒接合於前述基板或已被接合於前述基板的晶粒上之工程;(d)對前述基板及被接合於前述基板的晶粒進行拍攝,辨識前述基板與被接合於前述基板之晶粒的位置,檢查前述基板與前述晶粒的相對位置之工程;及 (e)根據前述(b)工程中所辨識之晶粒的位置與前述(d)工程中所辨識之晶粒的位置,診斷基板辨識及接合狀態。 A method of manufacturing a semiconductor device includes: (a) photographing a substrate and identifying the position of the substrate; (b) photographing the back surface of the die picked by the bonding head to identify the position of the die Engineering; (c) the process of bonding the die to the substrate or the die that has been bonded to the substrate; (d) photographing the substrate and the die bonded to the substrate to identify the substrate and The process of inspecting the position of the die bonded to the substrate, and checking the relative position of the substrate and the die; and (e) Based on the position of the die identified in the aforementioned (b) process and the position of the die identified in the aforementioned (d) process, diagnose the substrate identification and bonding state. 如申請專利範圍第12項之半導體裝置之製造方法,其中,前述(e)工程,係算出前述(b)中所辨識之晶粒的位置與前述(d)中所辨識之晶粒的位置之差即晶粒位置移動量,在前述晶粒位置移動量為預定量以上的情況下,判定為前述基板固定不充分或接合異常。 For example, in the method of manufacturing a semiconductor device according to item 12 of the patent application scope, in the above (e) process, the position of the crystal grain identified in the above (b) and the position of the crystal grain identified in the (d) above are calculated The difference is the amount of movement of the crystal grain position. When the amount of movement of the crystal grain position is a predetermined amount or more, it is determined that the substrate is insufficiently fixed or the bonding is abnormal. 如申請專利範圍第13項之半導體裝置之製造方法,其中,前述(e)工程,係在判定為前述基板固定不充分或接合異常的情況下,算出前述(a)工程中所辨識之基板的位置與前述(d)工程中所辨識之基板的位置之差即基板位置移動量,在前述基板位置移動量為預定量以上的情況下,判定為前述基板固定不充分,在前述基板位置移動量未滿預定量的情況下,判定為接合異常。 For example, in the method of manufacturing a semiconductor device according to item 13 of the patent application, the aforementioned (e) process is to calculate the substrate identified in the aforementioned (a) process when it is determined that the aforementioned substrate is insufficiently fixed or the bonding is abnormal. The difference between the position and the position of the substrate identified in the aforementioned (d) project is the amount of substrate position movement. When the amount of substrate position movement is more than a predetermined amount, it is determined that the substrate is insufficiently fixed and the amount of movement at the substrate position If the predetermined amount is not reached, it is determined that the engagement is abnormal.
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