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TWI668061B - Foreign body removal device - Google Patents

Foreign body removal device Download PDF

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Publication number
TWI668061B
TWI668061B TW106117601A TW106117601A TWI668061B TW I668061 B TWI668061 B TW I668061B TW 106117601 A TW106117601 A TW 106117601A TW 106117601 A TW106117601 A TW 106117601A TW I668061 B TWI668061 B TW I668061B
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TW
Taiwan
Prior art keywords
foreign matter
substrate
cleaning head
suction port
removing device
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Application number
TW106117601A
Other languages
Chinese (zh)
Other versions
TW201808477A (en
Inventor
Tomonori Nakamura
中村智宣
Hiroshi Omata
尾又洋
Toru Maeda
前田徹
Kensuke NISHIO
西尾謙介
Taito Kobayashi
小林泰人
Original Assignee
Shinkawa Ltd.
日商新川股份有限公司
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Application filed by Shinkawa Ltd., 日商新川股份有限公司 filed Critical Shinkawa Ltd.
Publication of TW201808477A publication Critical patent/TW201808477A/en
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Publication of TWI668061B publication Critical patent/TWI668061B/en

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    • H10P72/0406
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00Cleaning by methods involving the use of air flow or gas flow
    • H10P52/00
    • H10P72/30

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  • Engineering & Computer Science (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

本發明係使所搬送之平板狀構件表面之清潔度提高。 The present invention improves the cleanliness of the surface of the plate-shaped member being conveyed.

本發明係一種異物除去裝置100,其具備:長方體狀之清潔頭20,其包含對在X方向搬送之基板13之表面帶狀地噴射空氣之狹縫23、及與狹縫23鄰接配置之長方形狀之抽吸口24;以及驅動部30,其使清潔頭20沿著基板13之表面向Y方向移動;且將基板13之表面之異物除去,使清潔頭20之前表面21a從Y方向朝向與搬送方向相反之方向傾斜角度θ 1。 The present invention is a foreign matter removing device 100 including a rectangular parallelepiped cleaning head 20 including a slit 23 that sprays air on the surface of a substrate 13 conveyed in the X direction, and a rectangle that is disposed adjacent to the slit 23. Shaped suction port 24; and a driving portion 30 that moves the cleaning head 20 along the surface of the substrate 13 in the Y direction; and removes foreign matter on the surface of the substrate 13 so that the front surface 21a of the cleaning head 20 faces from the Y direction toward The inclination angle θ 1 is opposite to the conveying direction.

Description

異物除去裝置 Foreign body removal device

本發明係關於一種異物除去裝置,尤其是關於將所搬送之基板等平板狀構件表面之異物除去的異物除去裝置之構造。 The present invention relates to a foreign material removing device, and more particularly to a structure of a foreign material removing device for removing foreign materials on the surface of a flat plate-shaped member such as a substrate to be transported.

於IC等電子零件之製造步驟中,使用將從晶圓切出之半導體晶片接著於基板之晶片接合裝置,將接著於基板之半導體晶片之電極與基板之電極利用導線接合的打線接合裝置,於半導體晶片之電極之上預先形成凸塊,使半導體晶片反轉而固定於基板並且將半導體晶片之電極與基板之電極連接的倒裝晶片安裝裝置等多個裝置。又,最近,亦使用將半導體晶片積層接合於晶圓之半導體晶片之上之接合裝置。 In the manufacturing steps of electronic components such as ICs, a wire bonding device is used for bonding a semiconductor wafer cut out from a wafer to a substrate, and a wire bonding device for bonding the electrodes of the semiconductor wafer and the electrodes of the substrate by wires to the substrate. A plurality of devices, such as a flip chip mounting device, are formed in advance on the electrodes of the semiconductor wafer, the semiconductor wafer is inverted and fixed to the substrate, and the electrodes of the semiconductor wafer and the electrodes of the substrate are connected. Recently, a bonding apparatus for laminating and bonding a semiconductor wafer to a semiconductor wafer of a wafer has also been used.

於此種接合裝置中,一面將基板等利用搬送裝置向一個方向搬送,一面將半導體晶片接合於基本之特定位置,或者搬送於表面固定有半導體晶片之基板並於特定位置將半導體晶片之電極與基板之電極利用導線連接。 In such a bonding device, a substrate or the like is transferred in one direction by a transfer device, while a semiconductor wafer is bonded to a basic specific position, or a substrate on which a semiconductor wafer is fixed on a surface is mounted, and electrodes of the semiconductor wafer and The electrodes of the substrate are connected by wires.

於此種裝置中,若灰塵等異物附著於基板等之表面,則存在接著劑之接著力降低之情形。又,若灰塵附著於基板之電極或半導體晶片之電極之表面,則有於半導體晶片產生裂痕等之情況。 In such a device, if foreign matter such as dust adheres to the surface of a substrate or the like, the adhesive force of the adhesive may decrease. Moreover, if dust adheres to the surface of the electrode of a board | substrate or the electrode of a semiconductor wafer, a crack etc. may arise in a semiconductor wafer.

因此,提出有對基板吹送空氣而將附著於基板之異物吹飛,並將經吹飛之異物抽吸回收而進行異物之除去之裝置(例如,參照專利文獻1)。 Therefore, a device has been proposed in which air is blown onto a substrate, and foreign matter adhering to the substrate is blown away, and the foreign matter that is blown away is sucked and recovered to remove the foreign matter (for example, refer to Patent Document 1).

[先前技術文獻] [Prior technical literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本特開2012-199458號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2012-199458

專利文獻1中記載之異物除去裝置係使清潔噴嘴於在搬送方向移動之基板之上在與基板之搬送方向正交的方向移動而將基板之表面之異物除去者。即,於附著有異物之基板通過清潔噴嘴之移動區域時將基板之表面之異物除去,於清潔噴嘴之搬送方向下游側基板之表面為潔淨之狀態。 The foreign material removing device described in Patent Document 1 is a person who moves a cleaning nozzle on a substrate moving in a conveying direction in a direction orthogonal to the substrate conveying direction to remove the foreign material on the surface of the substrate. In other words, when the substrate with the foreign matter passes through the moving area of the cleaning nozzle, the foreign matter on the surface of the substrate is removed, and the surface of the substrate on the downstream side in the conveying direction of the cleaning nozzle is clean.

然而,於專利文獻1中記載之習知技術之清潔噴嘴中,存在如下情形:於搬送方向配置為一行之空氣吹出口中、從最靠搬送方向下游側之空氣吹出口噴出之空氣將附著於基板之異物向搬送方向下游側吹飛。於該情形時,存在如下情形:異物再附著於曾經成為清潔之狀態之搬送方向下游側之基板之上,無法使基板表面為充分清潔之狀態。 However, in the cleaning nozzle of the conventional technology described in Patent Document 1, the air blown out from the air blowout port located on the downstream side of the conveyance direction may adhere to the air blowout ports arranged in a row in the conveyance direction. Foreign matter on the substrate is blown to the downstream side in the conveying direction. In this case, there is a case where foreign matter adheres to the substrate on the downstream side in the conveying direction that was once in a clean state, and the surface of the substrate cannot be sufficiently cleaned.

因此,本發明之目的在於提高所搬送之平板狀構件表面之清潔度。 Therefore, an object of the present invention is to improve the cleanliness of the surface of a flat plate member to be conveyed.

本發明之異物除去裝置具備:長方體狀之清潔頭,其包含對在水平方向搬送之平板狀構件之表面帶狀地噴射空氣之噴射口、及與噴射口鄰接配置之長方形狀之抽吸口;以及驅動部,其使清潔頭沿著平板狀構件之表面於與搬送方向正交之方向移動;且將平板狀構件之表面之異物除去,該異物除去裝置之特徵在於:清潔頭之長邊方向之抽吸口側端面從與搬送方向正交之方向朝向與搬送方向相反之方向傾斜。 The foreign matter removing device of the present invention includes a rectangular parallelepiped-shaped cleaning head including an ejection port for ejecting air in a band shape on a surface of a flat plate member conveyed in a horizontal direction, and a rectangular-shaped suction port arranged adjacent to the ejection port; And a driving unit that moves the cleaning head along the surface of the flat plate-shaped member in a direction orthogonal to the conveying direction; and removes foreign matter on the surface of the flat plate-shaped member, and the foreign matter removing device is characterized by the long side direction of the cleaning head The suction port side end surface is inclined from a direction orthogonal to the conveyance direction toward a direction opposite to the conveyance direction.

於本發明之異物除去裝置中,較佳為噴射口係相對平板狀構件之表面傾斜且使空氣向朝向抽吸口之方向噴出。 In the foreign matter removing device of the present invention, it is preferable that the ejection port is inclined with respect to the surface of the flat plate member and ejects air in a direction toward the suction port.

於本發明之異物除去裝置中,較佳為噴射口為直線狀之狹縫。 In the foreign matter removing device of the present invention, it is preferable that the ejection port is a linear slit.

於本發明之異物除去裝置中,較佳為噴射口為直線狀配置之孔行。 In the foreign matter removing device of the present invention, it is preferable that the ejection ports are linearly arranged in a row of holes.

於本發明之異物除去裝置中,較佳為抽吸口之長邊方向長度較噴射口之長邊方向長度長。 In the foreign matter removing device of the present invention, it is preferable that the length in the longitudinal direction of the suction port is longer than the length in the longitudinal direction of the ejection port.

於本發明之異物除去裝置中,較佳為驅動部係使清潔頭移動根據與平板狀構件之搬送方向正交之方向之寬度而設定的長度。 In the foreign matter removing device of the present invention, it is preferable that the driving unit moves the cleaning head to a length set in accordance with a width in a direction orthogonal to the conveying direction of the flat plate-shaped member.

本發明可提高所搬送之平板狀構件表面之清潔度。 The present invention can improve the cleanliness of the surface of the plate-shaped member being conveyed.

11、12‧‧‧導軌 11, 12‧‧‧ rail

13‧‧‧基板 13‧‧‧ substrate

20、120‧‧‧清潔頭 20, 120‧‧‧Cleaning head

21、121‧‧‧本體 21, 121‧‧‧ Ontology

21a、121a‧‧‧前表面 21a, 121a‧‧‧ front surface

21b、121b‧‧‧後表面 21b, 121b‧‧‧ rear surface

22‧‧‧蓋 22‧‧‧ cover

22a‧‧‧凸緣 22a‧‧‧ flange

22b‧‧‧傾斜部 22b‧‧‧inclined

23‧‧‧狹縫 23‧‧‧Slit

24‧‧‧抽吸口 24‧‧‧ Suction port

25‧‧‧空氣入口 25‧‧‧Air inlet

26‧‧‧抽吸連接管 26‧‧‧ Suction connection tube

27‧‧‧連接構件 27‧‧‧ connecting member

28‧‧‧臂 28‧‧‧ arm

29、41‧‧‧噴射頭座 29, 41‧‧‧jet head

29a‧‧‧凹部 29a‧‧‧concave

29b‧‧‧傾斜面 29b‧‧‧inclined

30‧‧‧驅動部 30‧‧‧Driver

42、43‧‧‧噴射孔 42, 43‧‧‧ jet holes

91、92‧‧‧箭頭 91, 92‧‧‧ arrows

100、200、300‧‧‧異物除去裝置 100, 200, 300‧‧‧‧ foreign matter removing device

A~C‧‧‧區域 A ~ C‧‧‧Area

圖1係表示本發明之實施形態中之異物除去裝置之立體圖。 FIG. 1 is a perspective view showing a foreign material removing device in an embodiment of the present invention.

圖2係圖1所示之異物除去裝置之清潔頭之剖面圖。 FIG. 2 is a sectional view of a cleaning head of the foreign matter removing device shown in FIG. 1. FIG.

圖3係表示圖1所示之異物除去裝置之清潔頭之本體與蓋之構造、與蓋向本體組裝之說明立體圖。 FIG. 3 is an explanatory perspective view showing the structure of the body and the cover of the cleaning head of the foreign matter removing device shown in FIG. 1 and the assembly with the cover to the body.

圖4係從上方向觀察配置有圖1所示之清潔頭之抽吸口與狹縫之下表面之圖,且係表示本發明之實施形態之異物除去裝置之動作的說明圖。 FIG. 4 is a diagram showing the suction port and the lower surface of the slit provided with the cleaning head shown in FIG. 1 as viewed from above, and is an explanatory view showing the operation of the foreign matter removing device according to the embodiment of the present invention.

圖5係本發明之其他實施形態之異物除去裝置之清潔頭之剖面圖。 Fig. 5 is a cross-sectional view of a cleaning head of a foreign material removing device according to another embodiment of the present invention.

圖6係從上方向觀察配置有圖5所示之清潔頭之抽吸口與噴射孔之下表面之圖,且係表示本發明之其他實施形態之異物除去裝置之動作的說明圖。 FIG. 6 is a diagram illustrating the lower surface of the suction port and the ejection hole provided with the cleaning head shown in FIG. 5 as viewed from above, and is an explanatory view showing the operation of the foreign matter removing device according to another embodiment of the present invention.

圖7係本發明之其他實施形態之異物除去裝置之清潔頭之剖面圖。 Fig. 7 is a cross-sectional view of a cleaning head of a foreign matter removing device according to another embodiment of the present invention.

以下,一面參照圖式,一面對本發明之實施形態之異物除去裝置100進行說明。如圖1所示,異物除去裝置100具備清潔頭20及使清潔頭20於與搬送方向正交之方向移動之驅動部30。於圖1中,藉由導軌11、12而導引且於水平方向搬送之平板狀構件即基板13之搬送方向為X方向,將與X方向為同一面且與X方向正交之方向設為Y方向,將與XY面鉛垂之方向設為Z方向進行說明。 Hereinafter, the foreign matter removing apparatus 100 according to the embodiment of the present invention will be described with reference to the drawings. As shown in FIG. 1, the foreign material removing device 100 includes a cleaning head 20 and a driving unit 30 that moves the cleaning head 20 in a direction orthogonal to the conveying direction. In FIG. 1, the conveying direction of the flat plate-like member that is guided by the guide rails 11 and 12 and is conveyed in the horizontal direction is the X direction, and the direction that is the same as the X direction and orthogonal to the X direction is set as In the Y direction, the direction perpendicular to the XY plane will be described as the Z direction.

如圖1所示,清潔頭20係於本體21之後表面21b安裝有蓋22之長方體形狀,且於上部安裝有供給異物除去用之壓縮空氣之空氣入口25及連接於未圖示之真空裝置的抽吸連接管26。於清潔頭20之下表面,設置有對基板13之表面帶狀地噴射空氣之噴射口即狹縫23及與狹縫23鄰接配置之長方形狀之抽吸口24。再者,於以下之說明中,本體21之長邊方向 之面且存在抽吸口24之側係本體21之前表面21a,將與本體21之前表面21a垂直之方向設為P方向,將與P方向垂直之水平方向設為Q方向,將與PQ面鉛垂之方向設為Z方向進行說明。Q方向係俯視下與本體21之表面平行之方向。又,將前表面21a之對向面設為後表面21b,將短邊方向之面設為側面進行說明。 As shown in FIG. 1, the cleaning head 20 is in the shape of a rectangular parallelepiped with a cover 22 mounted on the rear surface 21 b of the body 21, and an air inlet 25 for compressed air for removing foreign matter is mounted on the upper part, and a vacuum pump connected to a vacuum device (not shown) is installed. Suction connection tube 26. On the lower surface of the cleaning head 20, a slit 23, which is an ejection port for ejecting air in a band shape on the surface of the substrate 13, and a rectangular suction port 24 arranged adjacent to the slit 23 are provided. Moreover, in the following description, the longitudinal direction of the body 21 The front surface 21a of the main body 21 is the side where the suction port 24 exists and the direction perpendicular to the front surface 21a of the main body 21 is set to the P direction, the horizontal direction perpendicular to the P direction is set to the Q direction, and the PQ surface is leaded. The vertical direction will be described as the Z direction. The Q direction is a direction parallel to the surface of the main body 21 in a plan view. In addition, the description will be made assuming that the facing surface of the front surface 21a is the rear surface 21b and the surface in the short side direction is the side surface.

如圖1所示,清潔頭20之一側面經由楔形之連接構件27而連接於臂28。臂28係藉由驅動部30而於Y方向往返移動。如圖2所示,於基板13之表面與清潔頭20之下表面之間空開有間隙d,清潔頭20之下表面係於基板13之上側沿著基板13之表面而移動。如圖1所示,連接構件27具有角度θ 1之傾斜,且於一面固定有長方體之清潔頭20之側面,於相反側之面固定有於Y方向延伸之臂28之面。因此,如圖1所示,清潔頭20之前表面21a係從Y方向朝向與搬送方向相反之方向傾斜角度θ 1。此處,角度θ 1可為例如10~15度左右,亦可為15~45度左右。角度θ 1具體而言為10、11、12、13、14、15度,亦可為該等數值之任意2個之間之範圍。進而,角度θ 1具體而言為15至45之正整數之範圍,亦可為該等數值之任意2個之間之範圍內。 As shown in FIG. 1, one side of the cleaning head 20 is connected to the arm 28 via a wedge-shaped connecting member 27. The arm 28 is reciprocated in the Y direction by the driving unit 30. As shown in FIG. 2, there is a gap d between the surface of the substrate 13 and the lower surface of the cleaning head 20. The lower surface of the cleaning head 20 is moved on the upper side of the substrate 13 along the surface of the substrate 13. As shown in FIG. 1, the connecting member 27 has an inclination of an angle θ 1, and a side surface of the cleaning head 20 having a rectangular parallelepiped is fixed on one side, and a surface of an arm 28 extending in the Y direction is fixed on the opposite side. Therefore, as shown in FIG. 1, the front surface 21 a of the cleaning head 20 is inclined by an angle θ 1 from the Y direction toward a direction opposite to the conveying direction. Here, the angle θ 1 may be, for example, about 10 to 15 degrees, or may be about 15 to 45 degrees. The angle θ 1 is specifically 10, 11, 12, 13, 14, and 15 degrees, and may be a range between any two of these values. Further, the angle θ 1 is specifically a range of a positive integer of 15 to 45, and may also be a range between any two of these values.

其次,一面參照圖2、圖3(a)、圖3(b),一面對本實施形態之異物除去裝置100之清潔頭20之構造進行說明。如圖2、圖3(a)、圖3(b)所示,清潔頭20由本體21及固定於本體21之後表面21b之蓋22而構成。 Next, the structure of the cleaning head 20 of the foreign matter removing device 100 according to this embodiment will be described with reference to FIGS. 2, 3 (a), and 3 (b). As shown in FIGS. 2, 3 (a), and 3 (b), the cleaning head 20 includes a main body 21 and a cover 22 fixed to a rear surface 21 b of the main body 21.

如圖3(a)所示,於本體21之下表面挖入有長方形之抽吸口24。又,於本體21之後表面21b,形成有構成其後將說明之噴射頭座29 之凹部29a。凹部29a之下側成為朝向抽吸口24傾斜之傾斜面29b。 As shown in FIG. 3 (a), a rectangular suction port 24 is dug into the lower surface of the body 21. Further, on the rear surface 21b of the main body 21, there is formed an ejection head holder 29 which will be described later. The recess 29a. The lower side of the recessed portion 29 a is an inclined surface 29 b that is inclined toward the suction port 24.

如圖3(b)所示,蓋22具備:凸緣22a,其密接於本體21之後表面21b之凹部29a以外之平面部;及楔狀之傾斜部22b,其與本體21之傾斜面29b平行。如圖3(b)所示,若將蓋22之傾斜部22b與本體之傾斜面29b結合並將凸緣22a螺固於後表面21b,則如圖2所示,於本體21之凹部29a與蓋22之凸緣22a之間形成於Q方向直線狀延伸之噴射頭座29。而且,於本體21之傾斜面29b與蓋22之傾斜部22b之間,形成朝向基板13之表面帶狀噴射空氣之噴射口即狹縫23。如圖2所示,狹縫23相對基板13之表面傾斜角度θ 2。又,如圖4所示,抽吸口24之Q方向之長度較狹縫23之Q方向之長度長,且延伸至較狹縫23靠清潔頭20之兩側面之附近為止。再者,圖4係從上方向觀察配置有清潔頭20之抽吸口24與狹縫23之下表面之圖。 As shown in FIG. 3 (b), the cover 22 includes: a flange 22a, which is in close contact with the flat portion other than the recessed portion 29a of the rear surface 21b of the body 21; and a wedge-shaped inclined portion 22b, which is parallel to the inclined surface 29b of the body 21 . As shown in FIG. 3 (b), if the inclined portion 22b of the cover 22 is combined with the inclined surface 29b of the body and the flange 22a is screwed to the rear surface 21b, as shown in FIG. 2, the concave portion 29a of the body 21 and Between the flanges 22a of the cover 22, an ejection head base 29 extending linearly in the Q direction is formed. A slit 23 is formed between the inclined surface 29 b of the main body 21 and the inclined portion 22 b of the cover 22 to spray the air toward the surface of the substrate 13. As shown in FIG. 2, the slit 23 is inclined at an angle θ 2 with respect to the surface of the substrate 13. As shown in FIG. 4, the length in the Q direction of the suction port 24 is longer than the length in the Q direction of the slit 23, and extends until the slit 23 is closer to both sides of the cleaning head 20. 4 is a view of the lower surface of the suction port 24 and the slit 23 provided with the cleaning head 20 as viewed from above.

一面參照圖2、圖4一面對以如上之方式構成之異物除去裝置100之動作進行說明。從圖2所示之空氣入口25流入之壓縮空氣進入至噴射頭座29之中,從噴射頭座29通過狹縫23朝向抽吸口24之方向朝向斜下方朝向基板13之表面帶狀地噴出。 The operation of the foreign matter removing device 100 configured as described above will be described with reference to FIGS. 2 and 4. Compressed air flowing from the air inlet 25 shown in FIG. 2 enters the head holder 29, and is ejected in a strip shape from the head holder 29 through the slit 23 toward the suction port 24 toward the obliquely downward direction toward the surface of the substrate 13. .

從狹縫23朝向基板13之表面朝向斜下方噴射之空氣如圖4之箭頭91所示,朝向從狹縫23向與搬送方向相反之方向傾斜之P方向前進而與基板13之表面碰撞。而且,將附著於基板13之表面之異物朝向P方向吹飛。被吹飛之異物被與狹縫23之P方向側鄰接之長方形之抽吸口24吸入而排出至未圖示之真空裝置。若驅動部30使清潔頭20於Y方向往返移動基板13之寬度量,則清潔頭20通過之圖4所示之基板13之區域B之 異物被除去。再者,圖4所示之區域B之搬送方向下游側之區域A係基板13之表面之異物除去結束的區域,區域B之搬送方向上游側之區域C係未進行基板13之表面之異物除去的區域。 The air sprayed obliquely downward from the surface of the slit 23 toward the substrate 13 moves toward the P direction inclined from the slit 23 in a direction opposite to the conveying direction as shown by arrow 91 in FIG. 4 and collides with the surface of the substrate 13. Then, the foreign matter adhering to the surface of the substrate 13 is blown away toward the P direction. The blown foreign matter is sucked into a rectangular suction port 24 adjacent to the P-direction side of the slit 23 and discharged to a vacuum device (not shown). If the driving unit 30 causes the cleaning head 20 to move back and forth in the Y direction by the width of the substrate 13, the area B of the substrate 13 shown in FIG. 4 that the cleaning head 20 passes through Foreign matter is removed. In addition, the area A on the downstream side in the conveying direction of the area B shown in FIG. 4 is the area where the foreign matter removal on the surface of the substrate 13 has been completed, and the area C on the upstream side in the conveying direction of the area B is the foreign material removal on the surface of the substrate 13 has not been performed. Area.

於進行基板13之區域B之異物除去時,從狹縫23噴出之空氣自Y方向朝向向與搬送方向相反之方向傾斜之P方向吹送。即,從區域B朝向未進行基板13之異物除去之區域C之方向吹送空氣。因此,異物不會被噴射之空氣向異物除去結束之區域A之方向吹飛,可抑制異物附著於異物除去結束之區域A之基板13之表面,從而可提高基板13之清潔度。 When removing the foreign matter in the area B of the substrate 13, the air ejected from the slit 23 is blown from the Y direction toward the P direction which is inclined in the direction opposite to the conveying direction. That is, air is blown from the area B toward the area C where the foreign matter on the substrate 13 is not removed. Therefore, foreign matter is not blown away by the sprayed air in the direction of the area A where the removal of the foreign matter is completed, and foreign matter can be prevented from adhering to the surface of the substrate 13 in the area A where the removal of the foreign matter is completed, thereby improving the cleanliness of the substrate 13.

又,如圖4所示,抽吸口24之Q方向之長度較狹縫23之Q方向之長度長,延伸至較狹縫23靠清潔頭20之兩側面之附近為止。因此,即便於藉由從狹縫23噴出之空氣而將異物從Y方向朝向向X方向傾斜之方向吹飛之情形時,亦可藉由抽吸口24而確實地抽吸被吹飛之異物。因此,可抑制異物再附著於異物除去結束之區域A之基板13之表面,從而可提高基板13之清潔度。 As shown in FIG. 4, the length in the Q direction of the suction port 24 is longer than the length in the Q direction of the slit 23, and extends until the slit 23 is closer to both sides of the cleaning head 20. Therefore, even when the foreign object is blown away from the Y direction toward the X direction by the air ejected from the slit 23, the blown foreign object can be reliably sucked through the suction port 24. . Therefore, re-adhesion of foreign matter to the surface of the substrate 13 in the region A where the removal of the foreign matter is suppressed can be suppressed, and the cleanliness of the substrate 13 can be improved.

進而,於從狹縫23吹送空氣時,空氣將清潔頭20之蓋22之側之空氣捲入而朝向抽吸口24之方向流動。因此,可抑制處於與區域B鄰接之範圍之異物除去結束之區域A之表面的空氣朝向抽吸口24吸入而異物從區域B向區域A飛散。藉此,進而,可抑制異物再附著於異物除去結束之區域A之基板13之表面,從而可提高基板13之清潔度。 Furthermore, when blowing air from the slit 23, the air draws in the air on the side of the cover 22 of the cleaning head 20 and flows toward the suction port 24. Therefore, it is possible to suppress the air on the surface of the region A where the removal of the foreign matter in the region adjacent to the region B is sucked toward the suction port 24 and the foreign matter is scattered from the region B to the region A. Thereby, the foreign matter can be prevented from re-adhering to the surface of the substrate 13 in the region A where the removal of the foreign matter is completed, and the cleanliness of the substrate 13 can be improved.

再者,清潔頭20之Y方向之往返移動既可與基板13之搬送同時進行,亦可將基板13之搬送暫時性地停止而進行清潔頭20之往返移動。又,於基板13之Y方向之寬度變化之情形時,亦可使清潔頭20之Y 方向之往返移動之長度設為根據基板13之Y方向之寬度設定的長度。藉此,本實施形態之異物除去裝置100係使清潔頭20之Y方向之往返移動之長度變化,即可進行多個Y方向之寬度之基板13之異物除去。 In addition, the reciprocating movement of the cleaning head 20 in the Y direction may be performed simultaneously with the conveyance of the substrate 13, or the reciprocating movement of the cleaning head 20 may be temporarily stopped by the conveyance of the substrate 13. When the width in the Y direction of the substrate 13 is changed, the Y of the cleaning head 20 may be changed. The length of the reciprocating movement in the direction is set to a length set in accordance with the width in the Y direction of the substrate 13. With this, the foreign object removing device 100 of this embodiment can change the length of the Y-direction reciprocating movement of the cleaning head 20 to remove foreign objects of the substrate 13 having a plurality of Y-direction widths.

其次,一面參照圖5、6,一面對本發明之其他實施形態進行說明。對與於上文參照圖1~圖4所說明之內容相同之部分標註相同之符號而省略說明。如圖5、圖6所示,本實施形態之異物除去裝置200係將上文所說明之異物除去裝置100之清潔頭20之狹縫23設為直線狀配置的噴射孔42之行而構成者。 Next, referring to Figs. 5 and 6, another embodiment of the present invention will be described. The same parts as those described above with reference to FIGS. 1 to 4 are denoted by the same reference numerals, and description thereof will be omitted. As shown in FIG. 5 and FIG. 6, the foreign material removing device 200 of the present embodiment is configured by forming the slits 23 of the cleaning head 20 of the foreign material removing device 100 described above as rows of linearly arranged spray holes 42. .

如圖5所示,本實施形態之異物除去裝置200之清潔頭120之本體121具有從下側挖入之抽吸口24及從上側挖入之噴射頭座41。於抽吸口24之上部安裝有抽吸連接管26且於噴射頭座41之上部安裝有空氣入口25。於與本體121之下表面之抽吸口24鄰接之部分,開有貫通至噴射頭座41之噴射孔42。噴射孔42係以相對基板13之表面之角度成為θ 2之方式傾斜而開。如圖4所示,噴射孔42構成與抽吸口24鄰接而於Q方向排列為一行之孔行。 As shown in FIG. 5, the body 121 of the cleaning head 120 of the foreign matter removing device 200 according to this embodiment includes a suction port 24 that is dug in from the lower side and a jet head holder 41 that is dug in from the upper side. A suction connection pipe 26 is installed above the suction port 24 and an air inlet 25 is installed above the ejection head seat 41. A spray hole 42 is formed in a portion adjacent to the suction port 24 on the lower surface of the main body 121 and penetrates to the spray head holder 41. The injection hole 42 is opened obliquely so that the angle with respect to the surface of the substrate 13 becomes θ 2. As shown in FIG. 4, the ejection holes 42 constitute a row of holes adjacent to the suction port 24 and aligned in a row in the Q direction.

從圖5所示之空氣入口25流入之壓縮空氣進入至噴射頭座41之中,從噴射頭座41通過多個噴射孔42朝向抽吸口24之方向朝向斜下方朝向基板13之表面而帶狀地噴出。 Compressed air flowing from the air inlet 25 shown in FIG. 5 enters the head holder 41, and the head holder 41 passes through a plurality of injection holes 42 toward the suction port 24, and is slanted downward toward the surface of the substrate 13 and Squirting like a spit.

從噴射孔42朝向基板13之表面向斜下方噴射之空氣如圖6之箭頭92所示,朝向從噴射孔42向與搬送方向相反之方向傾斜之P方向前進而與基板13之表面碰撞。而且,將附著於基板13之表面之異物朝向P方向吹飛。被吹飛之異物被與噴射孔42之P方向側鄰接之長方形之抽吸口 24吸入而排出至未圖示之真空裝置。若驅動部30使清潔頭20於Y方向往返移動基板13之寬度量,則清潔頭20通過之圖6所示之基板13之區域B之異物被除去。再者,圖6所示之區域B之搬送方向下游側之區域A係基板13之表面之異物除去結束的區域,區域B之搬送方向上游側之區域C係未進行基板13之表面之異物除去的區域。 The air sprayed obliquely downward from the surface of the ejection hole 42 toward the substrate 13 advances toward the P direction inclined from the ejection hole 42 in a direction opposite to the conveying direction as shown by arrow 92 in FIG. 6 and collides with the surface of the substrate 13. Then, the foreign matter adhering to the surface of the substrate 13 is blown away toward the P direction. The blown-off foreign object is a rectangular suction port adjacent to the P-direction side of the injection hole 42 24 Suction and discharge to a vacuum device (not shown). When the driving unit 30 causes the cleaning head 20 to reciprocate the width of the substrate 13 in the Y direction, the foreign matter in the region B of the substrate 13 shown in FIG. 6 passing through the cleaning head 20 is removed. In addition, the area A on the downstream side in the conveyance direction of the area B shown in FIG. 6 is the area where the foreign matter removal on the surface of the substrate 13 has been completed, and the area C on the upstream side in the conveyance direction of the area B is the foreign material removal on the substrate 13 Area.

於進行區域B之基板13之表面之異物除去時,從噴射孔42噴出之空氣朝向從Y方向向與搬送方向相反之方向傾斜之P方向吹送。即,從區域B朝向未進行基板13之異物除去之區域C之方向吹送空氣。因此,異物不會被噴射之空氣向異物除去結束之區域A之方向吹飛,可抑制異物再附著於異物除去結束之區域A之基板13之表面,從而可提高基板13之清潔度。 When foreign matter is removed from the surface of the substrate 13 in the area B, the air ejected from the ejection holes 42 is blown toward the P direction which is inclined from the Y direction to the direction opposite to the conveyance direction. That is, air is blown from the area B toward the area C where the foreign matter on the substrate 13 is not removed. Therefore, the foreign matter is not blown away by the sprayed air in the direction of the area A where the removal of the foreign matter is completed, and it is possible to suppress the foreign matter from adhering to the surface of the substrate 13 in the area A where the removal of the foreign matter is completed, thereby improving the cleanness of the substrate 13.

又,如圖6所示,抽吸口24之Q方向之長度較噴射孔42之孔行之Q方向之長度長,延伸至較噴射孔42靠清潔頭120之兩側面之附近為止。因此,即便於藉由從噴射孔42噴出之空氣而將異物從Y方向朝向向X方向傾斜之方向吹飛之情形時,亦可藉由抽吸口24而確實地抽吸被吹飛之異物。藉此,可抑制異物再附著於異物除去結束之區域A之基板13之表面,從而可提高基板13之清潔度。 As shown in FIG. 6, the length in the Q direction of the suction port 24 is longer than the length in the Q direction of the row of the ejection holes 42 and extends to the vicinity of both sides of the cleaning head 120 with respect to the ejection holes 42. Therefore, even when the foreign object is blown away from the Y direction toward the X direction by the air ejected from the injection hole 42, the blown foreign object can be reliably sucked through the suction port 24. . Thereby, it is possible to suppress foreign matter from re-adhering to the surface of the substrate 13 in the region A where the removal of the foreign matter is completed, and to improve the cleanliness of the substrate 13.

進而,於從噴射孔42吹送空氣時,空氣將清潔頭120之後表面121b側之空氣捲入而朝向抽吸口24之方向流動。因此,可抑制處於與區域B鄰接之範圍之異物除去結束之區域A之表面的空氣朝向抽吸口24吸入而異物從區域B向區域A飛散。藉此,進而,可抑制異物再附著於異物除去結束之區域A之基板13之表面,從而可提高基板13之清潔度。 Further, when blowing air from the spray holes 42, the air entrains the air on the rear surface 121 b side of the cleaning head 120 and flows toward the suction port 24. Therefore, it is possible to suppress the air on the surface of the region A where the removal of the foreign matter in the region adjacent to the region B is sucked toward the suction port 24 and the foreign matter is scattered from the region B to the region A. Thereby, the foreign matter can be prevented from re-adhering to the surface of the substrate 13 in the region A where the removal of the foreign matter is completed, and the cleanliness of the substrate 13 can be improved.

其次,一面參照圖7,一面對本發明之其他實施形態進行說明。對與於上文參照圖1~圖6所說明之內容相同之部分標註相同之符號而省略說明。如圖7所示,本實施形態之異物除去裝置300係將上文所說明之異物除去裝置200之清潔頭120之噴射孔42設為鉛垂之噴射孔43之行而構成者。 Next, referring to Fig. 7, another embodiment of the present invention will be described. The same components as those described above with reference to FIGS. 1 to 6 are denoted by the same reference numerals, and description thereof will be omitted. As shown in FIG. 7, the foreign material removing device 300 of this embodiment is constituted by setting the ejection holes 42 of the cleaning head 120 of the foreign object removing device 200 described above as vertical ejection holes 43.

本實施形態之異物除去裝置300亦與上文所說明之異物除去裝置200相同,從噴射孔43噴出之空氣朝向向與搬送方向相反之方向傾斜之P方向吹送。即,從區域B朝向未進行基板13之異物除去之區域C之方向吹送空氣。因此,異物不會被噴射之空氣向異物除去結束之區域A之方向吹飛,可抑制異物再附著於異物除去結束之區域A之基板13之表面,從而可提高基板13之清潔度。又,抽吸口24之Q方向之長度較噴射孔43之孔行之Q方向之長度長,延伸至較噴射孔43靠清潔頭120之兩側面之附近為止。因此,即便於藉由從噴射孔43噴出之空氣而將異物從Y方向朝向向X方向傾斜之方向吹飛之情形時,亦可藉由抽吸口24而確實地抽吸被吹飛之異物。藉此,可抑制異物再附著於異物除去結束之區域A之基板13之表面,從而可提高基板13之清潔度。 The foreign material removing device 300 of this embodiment is also the same as the foreign material removing device 200 described above, and the air ejected from the injection hole 43 is blown in the P direction which is inclined in the direction opposite to the conveying direction. That is, air is blown from the area B toward the area C where the foreign matter on the substrate 13 is not removed. Therefore, the foreign matter is not blown away by the sprayed air in the direction of the area A where the removal of the foreign matter is completed, and it is possible to suppress the foreign matter from adhering to the surface of the substrate 13 in the area A where the removal of the foreign matter is completed, thereby improving the cleanness of the substrate 13. In addition, the length in the Q direction of the suction port 24 is longer than the length in the Q direction of the holes of the ejection holes 43 and extends to the vicinity of both sides of the cleaning head 120 with respect to the ejection holes 43. Therefore, even when the foreign object is blown away from the Y direction toward the X direction by the air ejected from the ejection hole 43, the blown foreign object can be reliably sucked through the suction port 24. . Thereby, it is possible to suppress foreign matter from re-adhering to the surface of the substrate 13 in the region A where the removal of the foreign matter is completed, and to improve the cleanliness of the substrate 13.

於以上說明之各實施形態中,設為搬送基板13之平板狀構件之例進行了說明,但本實施形態之異物除去裝置100、200、300例如亦可應用於搬送半導體晶圓或於基板上接合有半導體晶片之引線框架等時。又,各實施形態之異物除去裝置100、200、300例如亦可組裝至晶片接合裝置、打線接合裝置、倒裝晶片安裝裝置等電子零件安裝裝置之內部。進而,本實施形態之異物除去裝置100、200、300例如亦可應用於在搬送玻璃、膜 等平板狀構件時將其表面之異物除去。 In each of the embodiments described above, an example has been described in which the plate-like member of the substrate 13 is transported. However, the foreign material removing devices 100, 200, and 300 of this embodiment can also be applied to, for example, semiconductor wafers or substrates. When a lead frame or the like of a semiconductor wafer is bonded. In addition, the foreign material removing apparatuses 100, 200, and 300 of each embodiment may be incorporated into, for example, an electronic component mounting apparatus such as a wafer bonding apparatus, a wire bonding apparatus, or a flip chip mounting apparatus. Furthermore, the foreign material removing apparatuses 100, 200, and 300 of this embodiment can also be applied to, for example, conveying glass and film. Remove foreign matter on the surface of the plate-like member when waiting.

Claims (5)

一種異物除去裝置,其具備:長方體狀之清潔頭,其包含對在水平方向搬送之平板狀構件之表面帶狀地噴射空氣之噴射口、及與上述噴射口鄰接配置之長方形狀之抽吸口;以及驅動部,其使上述清潔頭沿著上述平板狀構件之表面於與搬送方向正交之方向移動;且將上述平板狀構件之表面之異物除去;上述清潔頭之長邊方向之抽吸口側端面從與搬送方向正交之方向朝向與搬送方向相反之方向稍微傾斜;上述抽吸口往朝向上述平板狀構件之上述表面之方向開口;上述噴射口僅鄰接於位於搬送方向側之長邊方向之抽吸口側端面而配置,且係相對上述平板狀構件之上述表面,往朝向上述抽吸口之方向稍微傾斜。A foreign matter removing device includes a rectangular parallelepiped cleaning head including a spraying port that sprays air on a surface of a flat plate-shaped member conveyed in a horizontal direction, and a rectangular suction port disposed adjacent to the spraying port. And a driving unit that moves the cleaning head along the surface of the flat plate-shaped member in a direction orthogonal to the conveying direction; removes foreign matter on the surface of the flat plate-shaped member; and suctions the long side direction of the cleaning head. The mouth-side end surface is slightly inclined from a direction orthogonal to the conveying direction to a direction opposite to the conveying direction; the suction port is opened toward the surface of the flat plate-shaped member; the ejection port is only adjacent to the length on the conveying direction side The suction port side end surface in the lateral direction is arranged, and is slightly inclined toward the suction port with respect to the surface of the flat plate-shaped member. 如申請專利範圍第1項之異物除去裝置,其中上述噴射口為直線狀之狹縫。For example, the foreign matter removing device according to item 1 of the scope of patent application, wherein the above-mentioned ejection port is a linear slit. 如申請專利範圍第1項之異物除去裝置,其中上述噴射口為直線狀配置之孔行。For example, the foreign matter removing device according to item 1 of the scope of the patent application, wherein the above-mentioned ejection port is a row of linearly arranged holes. 如申請專利範圍第1至3項中任一項之異物除去裝置,其中上述抽吸口之長邊方向長度較上述噴射口之長邊方向長度長。For example, the foreign object removing device according to any one of claims 1 to 3, wherein the length in the long-side direction of the suction port is longer than the length in the long-side direction of the ejection port. 如申請專利範圍第1項之異物除去裝置,其中上述驅動部係使上述清潔頭移動根據與上述平板狀構件之搬送方向正交之方向之寬度所設定的長度。For example, the foreign object removing device according to the first patent application range, wherein the driving unit moves the cleaning head to a length set in accordance with a width in a direction orthogonal to the conveying direction of the flat plate-shaped member.
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