JP2019025814A - Antistatic device, and substrate processing apparatus provided with the antistatic device - Google Patents

Abstract

An antistatic device capable of preventing dust from scattering and adhering to a substrate and obtaining a high-quality product, and a substrate processing apparatus including the antistatic device are provided. SOLUTION: Covers 14 and 16 that cover the surface of a non-processed substrate W with a space and an ionizer 20 installed in the covers 14 and 16 are provided, and the non-processed substrate W is provided by the ionizer 20. In order to prevent static charge and dust charged in the covers 14 and 16 from adhering to the substrate surface, the ionizer 20 is installed in the sealed covers 14 and 16 to improve the efficiency of static elimination. Can be planned. [Selection] Figure 1

Description

The present invention relates to an antistatic device applied to a substrate processing apparatus for processing a scribe line (cut groove) on a brittle material substrate such as glass or dividing the substrate along the scribe line, and the charging device. The present invention relates to a substrate processing apparatus including a prevention device.
In particular, in the manufacturing process of a flexible OLED (Organic Light Emitting Diode) display, the present invention scribes a mother substrate in which a resin film (polyimide film (also referred to as PI film)) serving as a flexible base material is laminated on the upper surface of a glass substrate. The present invention relates to an antistatic device used in a substrate processing apparatus that processes or divides a line.

  Conventionally, when cutting a brittle material substrate such as a glass substrate, a scribe line is formed by pressing the cutter wheel against the substrate surface, and then external force is applied along the scribe line from the surface opposite to the scribe line formation surface. Then, the substrate is divided for each unit substrate (see Patent Document 1).

  In recent years, since higher definition of the display is demanded, further improvement in the surface quality and end face strength of the substrate is required. In addition, there is a need for a flexible display from the viewpoint of expanding the application of the display, and OLEDs using a flexible substrate are manufactured. In such an OLED display, a resin film (PI film) is formed on a glass substrate in the manufacturing process, and an organic film having an electrode layer and an organic EL layer is formed thereon. The film thickness of the electrode layer, organic EL layer, etc. is thin and the composition is very delicate, so even if very small foreign matter is attached to the resin film surface, it can cause defects and reduce yield. Affect.

In order to obtain high-quality and highly productive OLED display manufacturing technology, it is necessary to avoid the generation of scratches and adhesion of fine foreign substances such as dust to the glass plate on which the resin film (PI film) is formed before the organic film is formed. I must. That is, the scratches on the glass plate cause deterioration in strength, and the adhered foreign matter is carried to the organic film forming process and causes deterioration in the working environment.
In addition, if scratches or minute foreign substances are attached to the back surface of the glass plate, it may cause a peeling failure in the Lift-Off process for separating the glass substrate and the resin film of the product after the organic film is formed. It is necessary to avoid the generation of scratches and dust as much as possible not only on the front side (organic film forming side) of the substrate but also on the back side.

Japanese Patent No. 5210356

  In general substrate processing equipment, fine chips and other dust generated during scribe line processing and parting are carried to the next process while adhering to both sides of the substrate, which is a major cause of product quality degradation. Yes. Such adhesion of dust to the substrate is largely due to the dust and the substrate being charged, and the substrate to be processed is transported to the scribe position, or when the substrate is scribed, the back surface of the substrate is on the upper surface of the conveyor or table. The contact is a factor. In addition, the longer the contact time with the conveyor and the table and the longer the moving distance in the contact state, the smaller the probability of occurrence of small scratches on the back surface of the substrate, and the minute foreign matter such as dust on the conveyor or table. This increases the probability of adhesion, affects the yield reduction, and hinders the production of products with high accuracy and excellent quality.

  Accordingly, an object of the present invention is to provide an antistatic device capable of preventing dust from scattering and adhering to a substrate and obtaining a high-quality product, and a substrate processing apparatus equipped with the antistatic device. And

In order to solve the above problems, the present invention takes the following technical means. That is, the present invention is an antistatic device for preventing the charging of a non-processed substrate and dust in a substrate processing apparatus, a cover that covers the surface of the non-processed substrate with a space, and an ionizer installed in the cover; It was set as the structure which consists of.
Here, the ionizer may be a soft X-ray ionizer, and the cover may be made of a material that blocks soft X-rays.

  As described above, according to the present invention, the ionizer provided in the cover can prevent the non-processed substrate from being charged and the dust that has entered the cover from being charged, thereby preventing adhesion to the substrate surface. In addition to being able to process products that are superior to the above, it is possible to improve the efficiency of static elimination by installing the ionizer in a sealed cover.

Further, the present invention is a substrate processing apparatus for processing a scribe line on a substrate, comprising a scribe mechanism for processing a scribe line on a substrate, and the antistatic device according to claim 1 or 2. The antistatic device is also characterized in that the substrate processing apparatus is arranged in an upstream transport unit that transports the substrate to the scribe mechanism, a downstream transport unit that transports the substrate out of the scribe mechanism, or both.
At this time, instead of the scribe mechanism, a break mechanism that divides the substrate may be used, or a substrate processing apparatus including both mechanisms may be provided.

  In this substrate processing apparatus, since the surface of the non-processed substrate is covered with a cover and an antistatic device is provided in the internal space, charging of the non-processed substrate in the transfer process and dust that has entered the cover It is possible to prevent electrification and adhesion to the substrate surface, and it is possible to process a product with high accuracy and excellent quality.

  As a substrate to be processed in the present invention, a mother substrate for an OLED display in which a resin film for generating an organic film is laminated on the upper surface of a glass plate is suitable.

1 is a schematic side view of a substrate processing apparatus including an antistatic device according to the present invention. FIG. 2 is a schematic plan view of the substrate processing apparatus in FIG. 1. The enlarged front view of the scribe / break mechanism part of the board | substrate processing apparatus in FIG. The enlarged side view similar to FIG. The perspective view which shows the process target board | substrate of this invention. Sectional drawing and bottom view which show the cleaner in this invention. The perspective view which shows the state which hold | gripped the board | substrate with the upstream clamp and the downstream clamp. Sectional drawing which shows the time of the scribe line process of a scribe / break mechanism part. Sectional drawing which shows the time of a break operation | movement of a scribe / break mechanism part. Sectional drawing which shows the time of operation | movement of a cleaner. The top view which shows the 1st step of operation | movement of a board | substrate processing apparatus. The top view which shows the 2nd step of operation | movement of a board | substrate processing apparatus. The top view which shows the 3rd step of operation | movement of a board | substrate processing apparatus. The top view which shows the 4th step of operation | movement of a board | substrate processing apparatus. The top view which shows the 5th step of operation | movement of a substrate processing apparatus. The top view which shows the 6th step of operation | movement of a board | substrate processing apparatus. The top view which shows the 7th step of operation | movement of a board | substrate processing apparatus.

Hereinafter, an antistatic device according to an embodiment of the present invention and a substrate processing apparatus incorporating the same will be described in detail with reference to the drawings.
FIG. 1 is a side view schematically showing an entire substrate processing apparatus A including an antistatic device according to the present invention, and FIG. 2 is a plan view thereof.

  The substrate processing apparatus A scribes a substrate W to be processed in a horizontal posture and linearly conveys the substrate W from upstream to downstream, and scribes the substrate W that has been conveyed in a direction perpendicular to the conveyance direction. A scribe / break mechanism unit C as a substrate processing unit that processes the line and divides the substrate W along the scribe line, and a downstream transfer unit D that transfers the divided substrate W toward the downstream. Yes. Further, a substrate supply unit E for supplying the substrate W to be processed to the upstream transfer unit B of the substrate processing apparatus A is arranged on the upstream side of the upstream transfer unit B. In the following, the transport direction of the substrate W is defined as the X direction, and the direction orthogonal thereto is defined as the Y direction.

  The substrate W processed by the substrate processing apparatus A is used as a mother substrate in the manufacturing process of the OLED display, and as shown in FIG. 5, for generating an organic film serving as a flexible base material on the upper surface of the glass plate W2. A thin resin film W1 is formed. A region where the resin film W1 is not provided along the planned scribe line L is formed in a band shape. A polyimide film (PI film) is used for the resin film W1.

  The upstream transport unit B of the substrate processing apparatus A includes a float table 1 that floats the substrate W in a horizontal posture by the jet air pressure, and a clamp that grips the upstream edge of the floated substrate W and transports it downstream. 2 are provided. The clamp 2 is supported by a cross beam member 2a extending in the Y direction, and the cross beam member 2a is assembled so as to be movable with respect to the left and right rails 2b and 2b arranged in parallel along the feed direction (X direction) of the substrate W. Yes. In the present embodiment, a large number of small holes 1a that are opened on the upper surface of the float table 1 are formed as a floating mechanism (air float means) that jets air from the float table 1 to float the substrate W. However, an air ejection nozzle may be provided along the float table 1 separately. The float table 1 is installed on the gantry 10.

  The scribe / break mechanism C includes a portal bridge 3 arranged so as to straddle the substrate W that is sent. As shown in FIGS. 3 and 4, the bridge 3 has a pair of upper and lower guide rails 4a and 4b arranged in the Y direction so as to sandwich the substrate W sent from above and below, and the upper guide rail 4a. The upper scribe head 5a is attached to the lower guide rail 4b, and the lower scribe head 5b is attached to the lower guide rail 4b so that the lower scribe head 5b can be moved up and down by an elevating mechanism (not shown).

Further, a receiving roller 6 having a flat outer peripheral surface is attached to the upper scribe head 5a so as to be movable up and down by an elevating mechanism (not shown). A roller 8 is attached to an up / down mechanism (not shown) so that the vertical movement can be adjusted. The dividing roller 8 has a V-shaped groove 8a (see FIG. 9) on the outer peripheral surface.
Furthermore, the upper guide rail 4a is provided with a cleaner 9 for sucking and removing minute foreign matters after the scribe line is formed so as to be movable in the Y direction via the head 9a. As shown in FIG. 6, the cleaner 9 includes an elongated air suction port 9b whose longitudinal direction is the X direction, and a plurality of air outlets 9c that blow out air around the air suction port 9b. Is moved above the scribe line of the substrate W along the scribe line so that fine foreign matters such as dust are sucked by the air suction port 9b, and the substrate W is brought into contact with the lower surface of the cleaner 9 by blown air from the air blower port 9c. Prevents close contact. This prevents dust from flowing into the cover, thereby reducing internal scattering of fine foreign matter such as dust and preventing dust from adhering to the substrate, and is a product with high accuracy and excellent quality. Can be obtained.

  Similarly to the upstream transport unit B described above, the downstream transport unit D of the substrate processing apparatus A includes the float table 11 that floats the substrate W in a horizontal posture by the air pressure ejected from the small holes 11a, and the floated substrate W. And a clamp 12 that grips the downstream side end and conveys it to the downstream side. The clamp 12 is supported by a cross beam member 12a extending in the Y direction, and the cross beam member 12a is assembled so as to be movable with respect to the left and right rails 12b and 12b arranged in parallel along the X direction. Further, a discharge conveyor 13 for sending the divided substrates Wa and Wb to the outside of the substrate processing apparatus A is provided on the downstream side of the float table 11.

  Further, in the substrate processing apparatus A, the upstream transport unit B, the scribe / break mechanism unit C, and the downstream transport unit D include a dust transport prevention device 14A for the upstream transport unit that prevents scattering of fine foreign matters such as dust, and a processing unit. 15A for dust scattering prevention, and 16A of dust conveyance prevention apparatuses for downstream conveyance parts are provided. These dust scattering prevention devices 14A, 15A, and 16A include covers 14, 15, and 16 that individually cover the upstream conveyance unit B, the scribe / break mechanism unit C, and the downstream conveyance unit D. Are provided with entrances 14a, 15a, 16a through which the substrate W is taken in and out. In addition, shutters 14b, 15b, and 16b that can be opened and closed are attached to the respective entrances.

The dust scattering prevention devices 14A and 16A of the upstream transport unit B and the downstream transport unit D are provided with a pressurizing unit that constantly pressurizes the internal space of the covers 14 and 16. In this embodiment, as the pressurizing means, pressure air inlets 17 and 18 for injecting pressure air are provided on the ceilings of the covers 14 and 16, and pressure air pressurized from the pressure air inlets 17 and 18 is provided. Is injected into the covers 14 and 16. In order to continue supplying air, a small slit-like opening (not shown) is formed in the side walls of the covers 14 and 16 so that a part of the air is discharged. This prevents the dust from entering from the scribe / break mechanism C or the outside to reduce the internal scattering of fine foreign matters such as dust, and prevents the dust from adhering to the substrate W.
Further, in the dust scattering prevention device 15A for the processing portion of the scribe / break mechanism portion C, the internal space of the cover 15 is constantly decompressed by the decompression means. In the present embodiment, an air vacuum mechanism 19 is arranged in the internal space as the pressure reducing means, and the inside of the cover 15 is decompressed by air suction by the air vacuum mechanism 19. As a result, minute foreign matters such as dust generated during the processing of the scribe line and in the cutting process are removed by suction to prevent the inside of the cover 15 from being contaminated. In particular, dust is often generated during processing of the scribe line by the cutter wheel 7, and therefore, as shown in FIGS. 2 and 4, the air suction port of the air vacuum mechanism 19 is provided in the vicinity of the cutter wheel 7 along the traveling line. It is good to arrange. By carrying out like this, dusts, such as a chip generated at the time of scribe line processing, can be sucked efficiently, and contamination in cover 15 can be reduced.

  Further, an antistatic device including an ionizer 20 for preventing charging of the substrate W and scattered dust is provided inside the covers 14 and 16 of the upstream transport unit B and the downstream transport unit D. The ionizer 20 may be of a fan type (fan type), but in this embodiment, a photo-ionizer using soft X-rays that does not generate ozone is used. A plurality of ionizers 20 are installed along the transport direction of the substrate W on the lower surfaces of the ceilings of the covers 14 and 16 so that soft X-rays are diffused throughout the cover. By installing the ionizer 20 in the sealed covers 14 and 16, it is possible to improve the efficiency of static elimination and to prevent external leakage of soft X-rays. Of course, in this case, the materials of the covers 14 and 16 are made of a material that shields soft X-rays.

In addition, a plurality of sensors 21 for detecting a distance between the floated substrate W and the float tables 1 and 11, that is, a floating amount, are provided in the substrate transport areas of the upstream transport unit B and the downstream transport unit D with a certain spacing. is set up. When an abnormality in the flying height is detected, the air blowing pressure is adjusted so that the flying posture can always be maintained.
If the float tables 1 and 11 are divided into a plurality of blocks, the sensor 21 and a large number of small holes 1a are formed in each block, and the amount of air ejected for each block can be adjusted, the floating posture can be adjusted. Further fine adjustment is possible.

  In this embodiment, the substrate supply unit E that supplies the substrate W to the float table 1 of the upstream transport unit B can be moved up and down and back and forth by a drive mechanism (not shown) and has a small contact surface with the substrate W. Use a lift with Instead of this, the substrate W may be fed by, for example, a conveyor or a crank claw.

  Small holes 1a and 11a for air ejection in the float tables 1 and 11 in the substrate processing apparatus A described above, an air suction port 9b and an air outlet 9c of the cleaner 9, an upstream transport unit B, and a cover 14 of the downstream transport unit D, The 16 pressure air inlets 17 and 18 and the air vacuum mechanism 19 of the cover 15 are each connected to an air source (not shown) via a pipe.

Next, operation | movement of the board | substrate processing apparatus A is demonstrated later on the order based on FIG. 2, FIG.
FIG. 2 shows a state immediately before the substrate W is fed into the substrate processing apparatus A, with the scribe planned line L oriented in the Y direction and the glass plate W2 (see FIG. 5) of the substrate W facing down. Are mounted on the fork claws 22 of the substrate supply unit E. Then, the shutter 14b of the upstream side entrance 14a of the upstream transport unit B is opened, the fork claws 22 are inserted, and the substrate W is fed onto the float table 1 of the upstream transport unit B. Thereafter, the fork pawl 22 is returned to the original position, the shutter 14b is closed, the substrate W is floated, and the upstream end thereof is held by the clamp 2 (see FIG. 11).

  Next, the downstream entrance 14a of the upstream transport section B, the entrances 15a, 15a on both sides of the scribe / break mechanism section C, and the shutters of the upstream entrance 16a of the downstream transport section D are opened to move the clamp 2 in the downstream direction. Thus, the substrate W is transported while being lifted to a position where the scheduled scribe line L of the substrate W comes directly above the cutter wheel 7 of the scribe / break mechanism portion C. At this position, the downstream end 12 of the substrate W is gripped by the clamp 12 on the downstream side, and the substrate W is stably held on the upstream side and the downstream side in a posture in which the substrate W is floated horizontally (FIGS. 12 and 7). reference).

  Next, as shown in FIG. 8, the cutter wheel 7 and the receiving roller 6 of the scribe / break mechanism C are brought into contact with the surface of the floating substrate W, and the upper and lower scribe heads 5a and 5b are guided while pressing the cutter wheel 7. By moving along the rails 4a and 4b, the scribe line L1 along the Y direction is processed (see FIG. 13).

Next, as shown in FIG. 9, the cutter wheel 7 is moved backward, and the scribing heads 5a and 5b are moved to the original position together with the upper receiving roller 6 while pressing the dividing roller 8 against the scribe line L1. As a result, the substrate W is bent and divided along the scribe line L1 (see FIG. 14).
In this way, the scribe line L1 can be processed and divided along the scribe line L1 by one reciprocating movement of the scribe heads 5a and 5b.

  Thereafter, as shown in FIG. 10 and FIG. 15, the dust generated at the time of scribe line processing or separation is caused by running the cleaner 9 along the scribe line L <b> 1 of the substrate W in the Y direction without contact with the substrate W. And the like are sucked and removed by the air suction port 9b. At this time, the substrate W is prevented from coming into close contact with the lower surface of the cleaner 9 by the air blown from the air outlet 9c.

  The divided downstream substrate Wa is conveyed in the downstream direction by the clamp 12 while maintaining the floated posture, and discharged from the downstream inlet / outlet 16b by the discharge conveyor 13 (see FIG. 16). The divided upstream substrate Wb is also taken over by the returned downstream clamp 12 and discharged by the discharge conveyor 13 in the same manner as the preceding downstream substrate Wa (see FIG. 17).

  As described above, in the upstream transport unit B and the downstream transport unit D, the substrate to be transported is levitated by the floating mechanism (air float means), that is, the pressure air ejected from a large number of small holes 1a. It is possible to minimize the occurrence of scratches and adhesion of minute foreign substances due to contact on the back surface of the glass plate before film formation.

  Further, in the upstream transport unit B and the downstream transport unit D, the dust scattering prevention devices 14A and 16A for the transport unit are provided, and the inside of the covers 14 and 16 is constantly pressurized by the pressure air, so the scribe / break mechanism unit Inflow of floating dust from C and the outside can be prevented, and minute foreign matter can be prevented from adhering to the substrate surface in the conveyance process.

  In particular, since the ionizer 20 of the antistatic device is provided in the covers 14 and 16 of the upstream transport unit B and the downstream transport unit D, charging of the substrate W and charging of dust that has entered the covers 14 and 16 are performed. Can be prevented and adhering to the substrate W can be prevented. Further, by installing the ionizer 20 in the sealed covers 14 and 16, it is possible to improve the efficiency of static elimination and to prevent external leakage of soft X-rays.

  Further, in the scribing / breaking mechanism part C, the dust scattering prevention device 15A for the processing part is provided and the inside of the cover 15 is constantly depressurized by the air vacuum mechanism 19, so that fine foreign matters such as dust floating inside are air The inside of the cover 15 can be kept clean by being sucked and removed by the vacuum mechanism 19. Further, in the present embodiment, the air suction port of the air vacuum mechanism 19 is disposed in the vicinity of the traveling line of the cutter wheel 7 where a large amount of dust such as chips is generated, and thus occurs during scribe line processing. The dust in the cover 15 can be suppressed by efficiently sucking the dust. Thereby, it becomes possible to prevent the adhesion of minute foreign matters to the substrate surface in combination with the operation of suctioning and removing dusts directly on the scribe line L1 by the cleaner 9.

  As mentioned above, although the typical Example of this invention was described, this invention is not necessarily specified to said embodiment. For example, in the above embodiment, the ionizer 20 of the antistatic device is provided in the covers 14 and 16 in the upstream conveyance unit B and the downstream conveyance unit D. Instead, it is provided in the cover 15 of the scribe / break mechanism unit C. You can also. Further, although the cleaner 9 is disposed on the upper side of the substrate W, it may be on the lower side. Further, also for the scribe / break mechanism C, the cutter wheel 7 and the dividing roller 8 are arranged on the upper side of the substrate W, and the receiving roller 6 is arranged on the lower side, and the scribing and dividing are performed. Is also possible.

In the above embodiment, the scribe / break mechanism C performs the processing of the scribe line L1 and the division along the scribe line L1, but after performing the processing of the scribe line only and sending out the substrate, You may make it cut | disconnect a board | substrate along a scribe line with another break apparatus. Conversely, only the break mechanism may be installed and the scribe mechanism may be omitted. In this case, the scribe line is processed by another scribe device.
Moreover, in the said Example, although the processing example of the mother board | substrate for OLED in which the resin film (PI film) W1 used as a flexible base material was formed on the upper surface of the glass substrate W2 was demonstrated, the glass substrate used for another use Can be used for processing.
Others The present invention can be appropriately modified and changed within the scope of achieving the object and without departing from the scope of the claims.

  The dust scattering prevention device of the present invention is mainly used in a substrate processing apparatus that processes a scribe line on a brittle material substrate such as glass or divides it along the scribe line.

A Substrate Processing Device B Upstream Conveying Unit C Scribing / Breaking Mechanism D D Downstream Conveying Unit W Substrate 1 Float Table 2 Clamp 5a Upper Scribe Head 5b Lower Scribe Head 6 Receiving Roller 7 Cutter Wheel 8 Dividing Roller 9 Cleaner 9b Air Suction Port 9c Air outlet 11 Float table 12 Clamp 14 Upstream conveying section cover 14A Upstream conveying section dust scattering prevention device 15 Scribe / break mechanism section cover 15A Processing section dust scattering prevention device 16 Downstream conveying section cover 16A For downstream conveying section Dust scattering prevention device 17 Pressure air inlet 19 Air vacuum mechanism 20 Ionizer

Claims (6)

An antistatic device for preventing non-processed substrate and dust from being charged in a substrate processing apparatus,
A cover that covers the surface of the non-processed substrate with a space,
An ionizer installed in the cover;
An antistatic device comprising:   The antistatic device according to claim 1, wherein the ionizer is a soft X-ray ionizer, and the cover is made of a material that blocks soft X-rays. A substrate processing apparatus for processing a scribe line on a substrate,
A scribe mechanism for processing a scribe line on the substrate;
An antistatic device according to claim 1 or 2,
A substrate processing apparatus in which the antistatic device is disposed in an upstream transport unit that transports a substrate to the scribe mechanism, a downstream transport unit that transports the substrate out of the scribe mechanism, or both. A substrate processing apparatus for dividing a substrate,
A break mechanism for dividing the substrate along a scribe line formed on the substrate;
An antistatic device according to claim 1 or 2,
A substrate processing apparatus in which the antistatic device is disposed in an upstream transport unit that transports a substrate to the break mechanism, a downstream transport unit that transports the substrate out of the break mechanism, or both. A substrate processing apparatus for dividing a substrate,
A scribe mechanism for processing a scribe line on the substrate;
A break mechanism for dividing the substrate along a scribe line processed by the scribe mechanism;
An antistatic device according to claim 1 or 2,
A substrate processing apparatus, wherein the antistatic device is disposed in an upstream transport unit that transports a substrate to the scribe mechanism and the break mechanism, or a downstream transport unit that transports the substrate out of the scribe mechanism and the break mechanism, or both.   The substrate processing apparatus according to claim 3, wherein the substrate is a mother substrate for an OLED display in which a resin film for generating an organic film is laminated on an upper surface of a glass plate.

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