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TWI500791B - CrTi alloy and sputtering target material, vertical magnetic recording medium and their manufacturing method - Google Patents

CrTi alloy and sputtering target material, vertical magnetic recording medium and their manufacturing method Download PDF

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Publication number
TWI500791B
TWI500791B TW100129208A TW100129208A TWI500791B TW I500791 B TWI500791 B TW I500791B TW 100129208 A TW100129208 A TW 100129208A TW 100129208 A TW100129208 A TW 100129208A TW I500791 B TWI500791 B TW I500791B
Authority
TW
Taiwan
Prior art keywords
crti
sputtering
target
sputtering target
recording medium
Prior art date
Application number
TW100129208A
Other languages
English (en)
Chinese (zh)
Other versions
TW201221674A (en
Inventor
長谷川浩之
澤田俊之
Original Assignee
山陽特殊製鋼股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 山陽特殊製鋼股份有限公司 filed Critical 山陽特殊製鋼股份有限公司
Publication of TW201221674A publication Critical patent/TW201221674A/zh
Application granted granted Critical
Publication of TWI500791B publication Critical patent/TWI500791B/zh

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
    • B22F3/12—Both compacting and sintering
    • B22F3/14—Both compacting and sintering simultaneously
    • B22F3/15—Hot isostatic pressing
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C14/00—Alloys based on titanium
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/06—Alloys based on chromium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/73—Base layers, i.e. all non-magnetic layers lying under a lowermost magnetic recording layer, e.g. including any non-magnetic layer in between a first magnetic recording layer and either an underlying substrate or a soft magnetic underlayer
    • G11B5/739—Magnetic recording media substrates
    • G11B5/73911—Inorganic substrates
    • G11B5/73917—Metallic substrates, i.e. elemental metal or metal alloy substrates
    • G11B5/73919—Aluminium or titanium elemental or alloy substrates
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/851—Coating a support with a magnetic layer by sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Magnetic Record Carriers (AREA)
TW100129208A 2010-08-17 2011-08-16 CrTi alloy and sputtering target material, vertical magnetic recording medium and their manufacturing method TWI500791B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010182144A JP5734599B2 (ja) 2010-08-17 2010-08-17 ＣｒＴｉ系合金スパッタリング用ターゲット材およびそれらを使用した垂直磁気記録媒体の製造方法

Publications (2)

Publication Number Publication Date
TW201221674A TW201221674A (en) 2012-06-01
TWI500791B true TWI500791B (zh) 2015-09-21

Family

ID=45605129

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100129208A TWI500791B (zh) 2010-08-17 2011-08-16 CrTi alloy and sputtering target material, vertical magnetic recording medium and their manufacturing method

Country Status (5)

Country Link
JP (1) JP5734599B2 (ja)
CN (1) CN103119186B (ja)
MY (1) MY164775A (ja)
TW (1) TWI500791B (ja)
WO (1) WO2012023475A1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5854308B2 (ja) * 2010-05-06 2016-02-09 日立金属株式会社 Ｃｒ−Ｔｉ合金ターゲット材
JP5964121B2 (ja) * 2012-04-18 2016-08-03 山陽特殊製鋼株式会社 磁気記録媒体に用いる密着膜層用ＣｒＴｉ系合金およびスパッタリング用ターゲット材並びにそれを使用した垂直磁気記録媒体
WO2016129449A1 (ja) * 2015-02-12 2016-08-18 日立金属株式会社 Ｃｒ－Ｔｉ合金スパッタリングターゲット材およびその製造方法
CN112517917B (zh) * 2020-11-25 2023-04-18 河南东微电子材料有限公司 一种用于铬钛靶材的CrTiLa合金粉末的制备方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10134631A (ja) * 1996-10-31 1998-05-22 Tokyo Gas Co Ltd 二重天井対応照明器具取付装置
CN1996466A (zh) * 2006-01-04 2007-07-11 日立环球储存科技荷兰有限公司 垂直磁记录介质和使用该磁记录介质的磁存储器
CN101054658A (zh) * 2006-04-14 2007-10-17 山阳特殊制钢株式会社 软磁性靶材
JP2009059431A (ja) * 2007-08-31 2009-03-19 Showa Denko Kk 磁気記録媒体および磁気記録再生装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH083893B2 (ja) * 1987-02-12 1996-01-17 株式会社日立製作所 面内磁気記録媒体
JPH10298742A (ja) * 1997-04-23 1998-11-10 Hitachi Metals Ltd Ｃｒ−Ｔｉ系ターゲット
JPH11134631A (ja) * 1997-10-27 1999-05-21 Hitachi Metals Ltd 磁気記録媒体
JPH11140506A (ja) * 1997-11-10 1999-05-25 Daido Steel Co Ltd 多元系金属粉末焼結ターゲットの製造方法
CN1195098C (zh) * 2002-10-28 2005-03-30 天津大学 溅射法生产高稳定性金属膜电阻器用的高阻靶材制造方法
JP5854308B2 (ja) * 2010-05-06 2016-02-09 日立金属株式会社 Ｃｒ−Ｔｉ合金ターゲット材

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10134631A (ja) * 1996-10-31 1998-05-22 Tokyo Gas Co Ltd 二重天井対応照明器具取付装置
CN1996466A (zh) * 2006-01-04 2007-07-11 日立环球储存科技荷兰有限公司 垂直磁记录介质和使用该磁记录介质的磁存储器
CN101054658A (zh) * 2006-04-14 2007-10-17 山阳特殊制钢株式会社 软磁性靶材
JP2009059431A (ja) * 2007-08-31 2009-03-19 Showa Denko Kk 磁気記録媒体および磁気記録再生装置

Also Published As

Publication number Publication date
JP2012041585A (ja) 2012-03-01
WO2012023475A1 (ja) 2012-02-23
TW201221674A (en) 2012-06-01
JP5734599B2 (ja) 2015-06-17
CN103119186A (zh) 2013-05-22
CN103119186B (zh) 2015-01-14
MY164775A (en) 2018-01-30

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