TWI561665B - - Google Patents
Info
- Publication number
- TWI561665B TWI561665B TW103104703A TW103104703A TWI561665B TW I561665 B TWI561665 B TW I561665B TW 103104703 A TW103104703 A TW 103104703A TW 103104703 A TW103104703 A TW 103104703A TW I561665 B TWI561665 B TW I561665B
- Authority
- TW
- Taiwan
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013068577A JP5951542B2 (ja) | 2013-03-28 | 2013-03-28 | 成膜装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201437408A TW201437408A (zh) | 2014-10-01 |
| TWI561665B true TWI561665B (zh) | 2016-12-11 |
Family
ID=51595361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103104703A TW201437408A (zh) | 2013-03-28 | 2014-02-13 | 成膜裝置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5951542B2 (zh) |
| KR (1) | KR101858155B1 (zh) |
| CN (1) | CN104073766B (zh) |
| TW (1) | TW201437408A (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6584982B2 (ja) * | 2015-07-21 | 2019-10-02 | 住友重機械工業株式会社 | 成膜装置 |
| JP7448909B2 (ja) * | 2019-06-27 | 2024-03-13 | 住友重機械工業株式会社 | 成膜方法、及び成膜装置 |
| JP2022156767A (ja) * | 2021-03-31 | 2022-10-14 | 住友重機械工業株式会社 | 成膜装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0397853A (ja) * | 1989-09-09 | 1991-04-23 | Nkk Corp | レーザーを利用したｐｖｄ装置 |
| JPH1112725A (ja) * | 1997-06-20 | 1999-01-19 | Sumitomo Heavy Ind Ltd | 金属酸化物の被覆方法 |
| US20080064227A1 (en) * | 2006-09-07 | 2008-03-13 | Jin-Sung Kim | Apparatus For Chemical Vapor Deposition and Method For Cleaning Injector Included in the Apparatus |
| TW200952109A (en) * | 2008-02-20 | 2009-12-16 | Tokyo Electron Ltd | Gas supply device |
| TW201037098A (en) * | 2008-12-01 | 2010-10-16 | Tokyo Electron Ltd | Film deposition apparatus |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02208207A (ja) * | 1989-02-08 | 1990-08-17 | Matsushita Electric Ind Co Ltd | 超電導薄膜の製造方法および製造装置 |
| US5508368A (en) * | 1994-03-03 | 1996-04-16 | Diamonex, Incorporated | Ion beam process for deposition of highly abrasion-resistant coatings |
| JPH11130587A (ja) * | 1997-10-27 | 1999-05-18 | Gifu Prefecture Kenkyu Kaihatsu Zaidan | 窒化物半導体の製造方法 |
| JP3664033B2 (ja) * | 2000-03-29 | 2005-06-22 | セイコーエプソン株式会社 | セラミックスの製造方法およびその製造装置 |
| JP2002030426A (ja) * | 2000-07-07 | 2002-01-31 | Sumitomo Heavy Ind Ltd | 成膜方法及び装置 |
| JP4637556B2 (ja) * | 2004-12-01 | 2011-02-23 | 株式会社アルバック | 成膜装置とこの成膜装置を含む複合型配線膜形成装置および薄膜製造方法 |
| JP4901696B2 (ja) * | 2007-11-06 | 2012-03-21 | キヤノンアネルバ株式会社 | 成膜装置 |
| JP2010037620A (ja) * | 2008-08-07 | 2010-02-18 | Seiko Epson Corp | 成膜方法、膜材料、および成膜装置 |
| JP4823293B2 (ja) * | 2008-10-31 | 2011-11-24 | 株式会社シンクロン | 成膜方法及び成膜装置 |
| JP2010121144A (ja) * | 2008-11-17 | 2010-06-03 | Seiko Epson Corp | 成膜装置 |
| JP5543251B2 (ja) | 2010-03-23 | 2014-07-09 | スタンレー電気株式会社 | イオンプレーティング法を用いた成膜方法およびそれに用いられる装置 |
-
2013
- 2013-03-28 JP JP2013068577A patent/JP5951542B2/ja not_active Expired - Fee Related
-
2014
- 2014-02-12 KR KR1020140015876A patent/KR101858155B1/ko not_active Expired - Fee Related
- 2014-02-13 TW TW103104703A patent/TW201437408A/zh unknown
- 2014-03-05 CN CN201410079015.1A patent/CN104073766B/zh not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0397853A (ja) * | 1989-09-09 | 1991-04-23 | Nkk Corp | レーザーを利用したｐｖｄ装置 |
| JPH1112725A (ja) * | 1997-06-20 | 1999-01-19 | Sumitomo Heavy Ind Ltd | 金属酸化物の被覆方法 |
| US20080064227A1 (en) * | 2006-09-07 | 2008-03-13 | Jin-Sung Kim | Apparatus For Chemical Vapor Deposition and Method For Cleaning Injector Included in the Apparatus |
| TW200952109A (en) * | 2008-02-20 | 2009-12-16 | Tokyo Electron Ltd | Gas supply device |
| TW201037098A (en) * | 2008-12-01 | 2010-10-16 | Tokyo Electron Ltd | Film deposition apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014189874A (ja) | 2014-10-06 |
| KR101858155B1 (ko) | 2018-05-15 |
| JP5951542B2 (ja) | 2016-07-13 |
| CN104073766A (zh) | 2014-10-01 |
| KR20140118721A (ko) | 2014-10-08 |
| CN104073766B (zh) | 2018-05-29 |
| TW201437408A (zh) | 2014-10-01 |