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TWI544221B - Latch-up test device and method - Google Patents

Latch-up test device and method Download PDF

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TWI544221B
TWI544221B TW104121945A TW104121945A TWI544221B TW I544221 B TWI544221 B TW I544221B TW 104121945 A TW104121945 A TW 104121945A TW 104121945 A TW104121945 A TW 104121945A TW I544221 B TWI544221 B TW I544221B
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test
wafer
latch
interval
current
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TW104121945A
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TW201702621A (en
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王世鈺
張耀文
盧道政
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旺宏電子股份有限公司
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Description

閂鎖測試裝置與方法 Latch test device and method

本發明是有關於一種閂鎖測試裝置與方法,且特別是有關於一種可用以測試待測晶圓的閂鎖測試裝置與方法。 The present invention relates to a latch test apparatus and method, and more particularly to a latch test apparatus and method that can be used to test a wafer to be tested.

閂鎖效應(Latch-up effect)是影響積體電路之可靠度的一重要因素,因此積體電路在出廠前大多都會進行抗閂鎖能力的測試。一般而言,積體電路的製造流程包括電路設計、晶片製造與晶片封裝。此外,現有的閂鎖測試方法是利用線性遞增的觸發脈衝,對在晶片封裝階段的積體電路進行閂鎖測試。然而,由於觸發脈衝是以線性方式逐漸遞增,因此現有的閂鎖測試方法往往必須耗費龐大的測試時間才能完成積體電路抗閂鎖能力的測試。此外,由於現有的閂鎖測試方法僅能針對在晶片封裝階段的積體電路進行測試,因此製造商往往必須等到積體電路在製造過程中的最後階段,才能決定是否要重新製作積體電路,進而導致積體電路之生產成本與生產時間的增加。 The Latch-up effect is an important factor affecting the reliability of the integrated circuit. Therefore, the integrated circuit is mostly tested for latch-up resistance before leaving the factory. In general, the manufacturing process of an integrated circuit includes circuit design, wafer fabrication, and wafer packaging. In addition, the existing latch test method utilizes a linearly increasing trigger pulse to perform a latch test on the integrated circuit during the chip packaging stage. However, since the trigger pulse is gradually increased in a linear manner, the existing latch test method often requires a large test time to complete the test of the anti-latch capability of the integrated circuit. In addition, since the existing latch test method can only test the integrated circuit in the chip packaging stage, the manufacturer often has to wait until the final stage of the manufacturing process to determine whether to re-create the integrated circuit. This in turn leads to an increase in the production cost and production time of the integrated circuit.

本發明提供一種閂鎖測試裝置與方法,可降低測試時間,並由助於縮減生產成本與生產時間。 The present invention provides a latch test apparatus and method that can reduce test time and help reduce production cost and production time.

本發明的閂鎖測試方法,包括下列步驟。執行設定操作,以從測試區間所涵蓋的多個測試值中擇一作為基準測試值,並利用基準測試值設定觸發脈衝與預設誤差值。其中,基準測試值將測試區間劃分成第一子區間與第二子區間。利用觸發脈衝測試待測晶圓中的測試晶片,以取得至少一偵測訊號。依據至少一偵測訊號判別測試晶片是否處於閂鎖狀態。當測試晶片未處於閂鎖狀態時,依據第一子區間更新測試區間,並回到執行設定操作的步驟。當測試晶片處於閂鎖狀態,且閂鎖臨界值與基準測試值的差值大於預設誤差值時,依據基準測試值與第二子區間分別更新閂鎖臨界值與該測試區間,並回到執行設定操作的步驟。當測試晶片處於閂鎖狀態,且閂鎖臨界值與基準測試值的差值不大於預設誤差值時,停止測試晶片的測試。 The latch test method of the present invention comprises the following steps. The setting operation is performed to select one of the plurality of test values covered by the test interval as the reference test value, and the trigger pulse and the preset error value are set by using the reference test value. Wherein, the benchmark test value divides the test interval into a first sub-interval and a second sub-interval. The test chip in the wafer to be tested is tested by using a trigger pulse to obtain at least one detection signal. Determining whether the test wafer is in a latched state according to at least one detection signal. When the test wafer is not in the latched state, the test interval is updated according to the first subinterval and returns to the step of performing the setting operation. When the test wafer is in a latched state, and the difference between the latch threshold and the reference test value is greater than the preset error value, the latch threshold and the test interval are respectively updated according to the reference test value and the second subinterval, and are returned The steps to perform the setting operation. The test of the test wafer is stopped when the test wafer is in the latched state and the difference between the latch threshold and the reference test value is not greater than the preset error value.

本發明的閂鎖測試裝置,包括控制器、訊號產生器與訊號偵測器。控制器從測試區間所涵蓋的多個測試值中擇一作為基準測試值,並利用基準測試值設定觸發脈衝與預設誤差值,且基準測試值將測試區間劃分成第一子區間與第二子區間。訊號產生器依據基準測試值產生觸發脈衝,並將觸發脈衝傳送至待測晶圓中的測試晶片,以致使閂鎖測試裝置進行測試晶片的測試。訊號偵測器偵測來自測試晶片的訊號,以取得至少一偵測訊號,且控 制器依據至少一偵測訊號判別測試晶片是否處於閂鎖狀態。當測試晶片未處於閂鎖狀態時,控制器依據第一子區間更新測試區間,並依據更新後的測試區間重新設定觸發脈衝,以致使閂鎖測試裝置再次進行測試晶片的測試。當測試晶片處於閂鎖狀態,且閂鎖臨界值與基準測試值的差值大於預設誤差值時,控制器依據基準測試值與第二子區間分別更新閂鎖臨界值與測試區間,以致使閂鎖測試裝置再次進行測試晶片的測試。當測試晶片處於閂鎖狀態,且閂鎖臨界值與基準測試值的差值不大於預設誤差值時,閂鎖測試裝置停止測試晶片的測試。 The latch test device of the present invention comprises a controller, a signal generator and a signal detector. The controller selects one of the plurality of test values covered by the test interval as the reference test value, and uses the benchmark test value to set the trigger pulse and the preset error value, and the benchmark test value divides the test interval into the first subinterval and the second Subinterval. The signal generator generates a trigger pulse according to the reference test value and transmits the trigger pulse to the test wafer in the wafer to be tested, so that the latch test device performs the test of the test wafer. The signal detector detects the signal from the test chip to obtain at least one detection signal and controls The controller determines whether the test wafer is in a latched state according to at least one detection signal. When the test wafer is not in the latched state, the controller updates the test interval according to the first sub-interval and resets the trigger pulse according to the updated test interval, so that the latch test device performs the test of the test wafer again. When the test wafer is in a latched state, and the difference between the latch threshold and the reference test value is greater than a preset error value, the controller updates the latch threshold and the test interval respectively according to the reference test value and the second subinterval, so as to cause The latch test device again tests the test wafer. The latch test device stops testing the test wafer when the test wafer is in a latched state and the difference between the latch threshold and the reference test value is not greater than the preset error value.

基於上述,本發明可調整測試區間,並可因應測試區間選取出對應的基準測試值,以藉此設定用以測試待測晶圓的觸發脈衝。藉此,將可降低測試時間,並由助於縮減生產成本與生產時間。 Based on the above, the present invention can adjust the test interval, and can select a corresponding reference test value according to the test interval, thereby setting a trigger pulse for testing the wafer to be tested. This will reduce test time and help reduce production costs and production time.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施例,並配合所附圖式作詳細說明如下。 The above described features and advantages of the invention will be apparent from the following description.

100‧‧‧閂鎖測試裝置 100‧‧‧Latch test device

110‧‧‧訊號產生器 110‧‧‧Signal Generator

120‧‧‧訊號偵測器 120‧‧‧Signal Detector

200‧‧‧待測晶圓 200‧‧‧ wafer under test

210‧‧‧測試晶片 210‧‧‧Test wafer

S210~S280‧‧‧圖2實施例中的步驟 S210~S280‧‧‧Steps in the embodiment of Figure 2

VH3、VL3、VA31~VA33‧‧‧測試值 VH3, VL3, VA31~VA33‧‧‧ test values

310~330‧‧‧數值區間 310~330‧‧‧Value range

311、321、331‧‧‧第一子區間 311, 321, 331‧‧‧ first subinterval

312、322、332‧‧‧第二子區間 312, 322, 332‧‧‧ second subinterval

VA41~VA46‧‧‧基準測試值 VA41~VA46‧‧‧ benchmark value

S510~S560‧‧‧圖5實施例中的步驟 S510~S560‧‧‧Steps in the embodiment of Figure 5

T61~T63、T81~T83‧‧‧期間 During the period of T61~T63, T81~T83‧‧

610‧‧‧電源電壓 610‧‧‧Power supply voltage

620、810‧‧‧觸發脈衝 620, 810‧‧‧ trigger pulse

S710~S750‧‧‧圖7實施例中的步驟 S710~S750‧‧‧Steps in the Figure 7 embodiment

圖1為依據本發明一實施例之閂鎖測試裝置的示意圖。 1 is a schematic diagram of a latch test apparatus in accordance with an embodiment of the present invention.

圖2為依據本發明一實施例之閂鎖測試方法的流程圖。 2 is a flow chart of a latch test method in accordance with an embodiment of the present invention.

圖3為依據本發明一實施例之用以說明測試區間在調整上的示意圖。 FIG. 3 is a schematic diagram illustrating the adjustment of a test interval according to an embodiment of the invention.

圖4為依據本發明一實施例之用以說明基準測試值隨著測試區間之改變的變動示意圖。 4 is a diagram showing the variation of a benchmark test value as a function of a test interval, in accordance with an embodiment of the present invention.

圖5為依據本發明一實施例之用以說明步驟S220與步驟S230的細部流程圖。 FIG. 5 is a detailed flow chart for explaining steps S220 and S230 according to an embodiment of the invention.

圖6為依據本發明一實施例之用以說明閂鎖測試的波形示意圖。 6 is a waveform diagram for explaining a latch test according to an embodiment of the present invention.

圖7為依據本發明又一實施例之用以說明步驟S220與步驟S230的細部流程圖。 FIG. 7 is a detailed flow chart for explaining steps S220 and S230 according to still another embodiment of the present invention.

圖8為依據本發明一實施例之用以說明閂鎖測試的波形示意圖。 FIG. 8 is a waveform diagram for explaining a latch test according to an embodiment of the present invention.

圖1為依據本發明一實施例之閂鎖測試裝置的示意圖。如圖1所示,閂鎖測試裝置100可如是用以測試待測晶圓200的測試機台。其中,待測晶圓200包括測試晶片210,且測試晶片210內包括積體電路。閂鎖測試裝置100可透過探針卡(未繪示出)上的探針電性連接至待測晶圓200,以對待測晶圓200上的測試晶片210中的積體電路進行各種測試,例如閂鎖測試。 1 is a schematic diagram of a latch test apparatus in accordance with an embodiment of the present invention. As shown in FIG. 1, the latch test apparatus 100 can be a test machine for testing the wafer 200 to be tested. The wafer to be tested 200 includes a test wafer 210, and the test wafer 210 includes an integrated circuit. The latch test device 100 can be electrically connected to the wafer to be tested 200 through a probe on a probe card (not shown) to perform various tests on the integrated circuit in the test wafer 210 on the wafer 200 to be tested. For example, a latch test.

閂鎖測試裝置100包括訊號產生器110、訊號偵測器120與控制器130。訊號產生器110可產生觸發脈衝,並可透過探針傳送觸發脈衝至測試晶片210。此外,控制器130可依據基準測試值調整觸發脈衝的大小(例如,振福),以藉此模擬可引起測試晶片 210產生閂鎖效應的各種觸發源。訊號偵測器120可透過探針偵測在測試晶片210上的訊號,以供控制器130分析測試晶片210的特性或是狀態等,從而驗證測試晶片210中之積體電路的抗閂鎖能力。 The latch test apparatus 100 includes a signal generator 110, a signal detector 120, and a controller 130. The signal generator 110 can generate a trigger pulse and can transmit a trigger pulse to the test wafer 210 through the probe. In addition, the controller 130 can adjust the size of the trigger pulse (for example, vibration) according to the reference test value, so that the simulation can cause the test wafer 210 generates various trigger sources for the latch-up effect. The signal detector 120 can detect the signal on the test wafer 210 through the probe for the controller 130 to analyze the characteristics or state of the test wafer 210, thereby verifying the latch-up resistance of the integrated circuit in the test wafer 210. .

圖2為依據本發明一實施例之閂鎖測試方法的流程圖,且以下將同時參照圖1與圖2來進一步地說明閂鎖測試裝置100對待測晶圓200所進行的閂鎖測試。如步驟S210所示,閂鎖測試裝置100可執行設定操作,以藉此設定基準測試值、觸發脈衝與預設誤差值。具體而言,閂鎖測試裝置100中的控制器130可從一測試區間所涵蓋的多個測試值中擇一作為基準測試值,並利用基準測試值設定觸發脈衝與預設誤差值。其中,基準測試值將測試區間劃分成第一子區間與第二子區間。 2 is a flow chart of a latch test method in accordance with an embodiment of the present invention, and the latch test performed by the latch test apparatus 100 on the wafer 200 to be tested will be further described below with reference to FIGS. 1 and 2. As shown in step S210, the latch test apparatus 100 may perform a setting operation to thereby set a reference test value, a trigger pulse, and a preset error value. Specifically, the controller 130 in the latch test apparatus 100 may select one of a plurality of test values covered by a test interval as a reference test value, and set a trigger pulse and a preset error value by using the reference test value. Wherein, the benchmark test value divides the test interval into a first sub-interval and a second sub-interval.

舉例來說,圖3為依據本發明一實施例之用以說明測試區間在調整上的示意圖。如圖3所示,測試區間可例如是從測試值VL3至測試值VH3的數值區間310。控制器130可將位在數值區間310中的測試值VA31設定為基準測試值,進而可依據基準測試值來設定觸發脈衝。此外,控制器130可將基準測試值VA31帶入一運算式以計算出預設誤差值。例如,倘若VA31=a×10 b ,所計算出的預設誤差值可表示為10(b-2),其中1≦a<10且b為整數。亦即,當VA31=300mA時,預設誤差值相等於1mA。當VA31=20mA時,預設誤差值相等於0.1mA。再者,基準測試值VA31可將數值區間310劃分成第一子區間311與第二子區間312,且第一子區間 311中的測試值大於基準測試值VA31,第二子區間312中的測試值小於基準測試值VA31。 For example, FIG. 3 is a schematic diagram illustrating the adjustment of a test interval according to an embodiment of the invention. As shown in FIG. 3, the test interval can be, for example, a value interval 310 from the test value VL3 to the test value VH3. The controller 130 can set the test value VA31 in the value interval 310 as the reference test value, and can further set the trigger pulse according to the reference test value. In addition, the controller 130 can bring the reference test value VA31 into an arithmetic expression to calculate a preset error value. For example, if VA31 = a × 10 b , the calculated preset error value can be expressed as 10 ( b -2) , where 1 ≦ a < 10 and b is an integer. That is, when VA31=300 mA, the preset error value is equal to 1 mA. When VA31 = 20 mA, the preset error value is equal to 0.1 mA. Furthermore, the benchmark value VA31 can divide the value interval 310 into the first sub-interval 311 and the second sub-interval 312, and the test value in the first sub-interval 311 is greater than the reference test value VA31, and the test in the second sub-interval 312 The value is less than the reference test value VA31.

如步驟S220所示,訊號產生器110可依據基準測試值產生觸發脈衝。此外,訊號產生器110可將觸發脈衝傳送至測試晶片210,以便閂鎖測試裝置100進行測試晶片210的測試。訊號偵測器120可偵測來自測試晶片210的訊號並據以產生至少一偵測訊號。再者,如步驟S230與步驟S240所示,控制器130可依據所述至少一偵測訊號判別測試晶片210是否處於閂鎖狀態,並可判別閂鎖臨界值與基準測試值的差值是否大於預設誤差值。 As shown in step S220, the signal generator 110 can generate a trigger pulse according to the reference test value. Additionally, the signal generator 110 can transmit a trigger pulse to the test wafer 210 to latch the test device 100 to test the test wafer 210. The signal detector 120 can detect the signal from the test chip 210 and generate at least one detection signal accordingly. Furthermore, as shown in step S230 and step S240, the controller 130 can determine whether the test wafer 210 is in a latched state according to the at least one detection signal, and can determine whether the difference between the latch threshold value and the reference test value is greater than Preset error value.

當控制器130判定測試晶片210未處於閂鎖狀態時,亦即測試晶片210中的積體電路未產生閂鎖效應時,如步驟S250所示,控制器130可依據第一子區間更新測試區間,並回到步驟S210。舉例來說,如圖3所示,當利用測試值VA31所取得的測試結果為測試晶片210未產生閂鎖效應時,控制器130可依據第一子區間311來更新測試區間,進而致使測試區間被更新成從測試值VA31至測試值VH3的數值區間320。此外,閂鎖測試裝置100可重複步驟S210,以從更新後的測試區間(亦即,數值區間320)中選出測試值VA32來作為新的基準測試值,並利用新的基準測試值(亦即,測試值VA32)來重新設定觸發脈衝與預設誤差值。其中,新的基準測試值(亦即,測試值VA32)可將更新後的測試區間(亦即,數值區間320)劃分成第一子區間321與第二子區間322。 When the controller 130 determines that the test wafer 210 is not in the latched state, that is, when the integrated circuit in the test wafer 210 does not generate a latch-up effect, as shown in step S250, the controller 130 may update the test interval according to the first sub-interval. And returns to step S210. For example, as shown in FIG. 3, when the test result obtained by using the test value VA31 is that the test wafer 210 does not generate a latch-up effect, the controller 130 may update the test interval according to the first sub-interval 311, thereby causing the test interval. It is updated to a value interval 320 from the test value VA31 to the test value VH3. In addition, the latch test apparatus 100 may repeat step S210 to select the test value VA32 from the updated test interval (ie, the value interval 320) as a new benchmark test value and utilize the new benchmark test value (ie, , test value VA32) to reset the trigger pulse and the preset error value. The new benchmark value (ie, the test value VA32) may divide the updated test interval (ie, the value interval 320) into the first sub-interval 321 and the second sub-interval 322.

再者,閂鎖測試裝置100可重複步驟S210~S230,以利 用重新設定後的觸發脈衝再次進行測試晶片210的測試,並再次分析測試晶片210的測試結果。另一方面,當控制器130判定測試晶片210處於閂鎖狀態(亦即,測試晶片210中的積體電路產生閂鎖效應),且閂鎖臨界值與基準測試值的差值大於預設誤差值時,如步驟S260與步驟S270所示,控制器130可依據基準測試值更新閂鎖臨界值,並可依據第二子區間更新測試區間。 Furthermore, the latch test apparatus 100 can repeat steps S210 to S230 to facilitate The test of the test wafer 210 is again performed with the reset trigger pulse, and the test result of the test wafer 210 is analyzed again. On the other hand, when the controller 130 determines that the test wafer 210 is in the latched state (ie, the integrated circuit in the test wafer 210 generates a latch-up effect), and the difference between the latch-off threshold and the reference test value is greater than the preset error. When the value is as shown in step S260 and step S270, the controller 130 may update the latching threshold according to the reference test value, and may update the test interval according to the second subinterval.

舉例來說,如圖3所示,當利用測試值VA32所取得的測試結果為測試晶片210產生閂鎖效應,且閂鎖臨界值與基準測試值的差值大於預設誤差值時,控制器130可依據基準測試值(亦即,測試值VA32)更新閂鎖臨界值,並可依據第二子區間322來更新測試區間,進而致使測試區間被更新成從測試值VA31至測試值VA32的數值區間330。此外,閂鎖測試裝置100可重複步驟S210,以從更新後的測試區間(亦即,數值區間330)中選出測試值VA33作為新的基準測試值,並利用新的基準測試值(亦即,測試值VA33)來重新設定觸發脈衝與預設誤差值。其中,新的基準測試值(亦即,測試值VA33)可將更新後的測試區間(亦即,數值區間330)劃分成第一子區間331與第二子區間332。 For example, as shown in FIG. 3, when the test result obtained by using the test value VA32 generates a latch-up effect for the test wafer 210, and the difference between the latch-off threshold value and the reference test value is greater than the preset error value, the controller 130 may update the latch threshold according to the benchmark value (ie, test value VA32), and may update the test interval according to the second subinterval 322, thereby causing the test interval to be updated to a value from the test value VA31 to the test value VA32. Interval 330. In addition, the latch test apparatus 100 may repeat step S210 to select the test value VA33 from the updated test interval (ie, the value interval 330) as a new reference test value, and utilize the new reference test value (ie, Test value VA33) to reset the trigger pulse and preset error value. The new benchmark value (ie, the test value VA33) may divide the updated test interval (ie, the value interval 330) into the first sub-interval 331 and the second sub-interval 332.

以此類推,閂鎖測試裝置100可不斷地更新測試區間,並利用更新後的測試區間來重新設定觸發脈衝,進而再次進行測試晶片210的測試。此外,當測試晶片210的測試結果為測試晶片210處於閂鎖狀態,且閂鎖臨界值與基準測試值的差值不大於預設誤差值時,則如步驟S280所示,閂鎖測試裝置100將停止測 試晶片210的測試。此外,閂鎖測試裝置100最終所取得的閂鎖臨界值將可用以界定測試晶片210中的積體電路對於閂鎖效應的防護能力。 By analogy, the latch test apparatus 100 can continuously update the test interval and use the updated test interval to reset the trigger pulse to perform the test of the test wafer 210 again. In addition, when the test result of the test wafer 210 is that the test wafer 210 is in the latched state, and the difference between the latch threshold and the reference test value is not greater than the preset error value, the latch test apparatus 100 is as shown in step S280. Will stop testing Test the test wafer 210. In addition, the latching threshold ultimately achieved by the latch test device 100 will be used to define the ability of the integrated circuit in the test wafer 210 to protect against latch-up effects.

值得一提的是,由於閂鎖測試裝置100可不斷地更新測試區間,因此閂鎖測試裝置100可耗費較少的測試次數來可完成測試晶片210的測試。舉例來說,圖4為依據本發明一實施例之用以說明基準測試值隨著測試區間之改變的變動示意圖。在圖4實施例中,最初的測試區間可例如是從0~500mA。在第1次的測試中,閂鎖測試裝置100依據基準測試值VA41(亦即,250mA)對測試晶片210進行測試,且所分析出的測試結果為測試晶片210未處於閂鎖狀態,因此閂鎖測試裝置100利用測試區間中的上半區間(亦即,第一子區間)來更新測試區間。藉此,在第2次的測試中,閂鎖測試裝置100將可依據更大的基準測試值VA42(亦即,375mA)來對測試晶片210進行測試。 It is worth mentioning that since the latch test device 100 can continuously update the test interval, the latch test device 100 can take less test times to complete the test of the test wafer 210. For example, FIG. 4 is a schematic diagram illustrating changes in a benchmark test value as a function of a test interval, in accordance with an embodiment of the present invention. In the embodiment of Figure 4, the initial test interval can be, for example, from 0 to 500 mA. In the first test, the latch test apparatus 100 tests the test wafer 210 according to the reference test value VA41 (ie, 250 mA), and the analyzed test result is that the test wafer 210 is not in a latched state, so the latch The lock test device 100 updates the test interval using the upper half interval (ie, the first subinterval) in the test interval. Thereby, in the second test, the latch test apparatus 100 will be able to test the test wafer 210 based on a larger reference test value VA42 (ie, 375 mA).

此外,第2次的測試結果為測試晶片210產生閂鎖效應,且閂鎖臨界值與基準測試值的差值大於預設誤差值。因此,閂鎖測試裝置100可利用測試區間中的下半區間(亦即,第二子區間)來更新測試區間,並利用基準測試值VA42來更新閂鎖臨界值。藉此,在第3次的測試中,閂鎖測試裝置100將可依據較小的基準測試值VA43(亦即,312.5mA)來對測試晶片210進行測試。此外,依據第3次的測試結果,閂鎖測試裝置100可利用基準測試值VA43來更新閂鎖臨界值。 In addition, the second test result produces a latch-up effect on the test wafer 210, and the difference between the latch-off threshold and the reference test value is greater than the preset error value. Therefore, the latch test apparatus 100 can update the test section using the lower half interval (ie, the second subinterval) in the test section, and update the latch threshold using the reference test value VA42. Thereby, in the third test, the latch test apparatus 100 will be able to test the test wafer 210 based on the smaller reference test value VA43 (i.e., 312.5 mA). Further, based on the third test result, the latch test apparatus 100 can update the latch threshold using the reference test value VA43.

以此類推,閂鎖測試裝置100可不斷地更新測試區間,並據以調整基準測試值。此外,閂鎖測試裝置100可依據測試結果依序利用基準測試值VA44(亦即,304.6875mA)與基準測試值VA45(亦即,300.78125mA)來更新閂鎖臨界值。此外,在第9次的測試中,閂鎖測試裝置100可依據基準測試值VA46(亦即,299.8203125mA)對測試晶片210進行測試。此外,第9次的測試結果為測試晶片210處於閂鎖狀態,且閂鎖臨界值與基準測試值的差值不大於預設誤差值(1mA)。因此,閂鎖測試裝置100將停止測試晶片210進行測試,且最終所取得的閂鎖臨界值(亦即,300.78125mA)將可用以界定測試晶片210中之積體電路的抗閂鎖能力。 By analogy, the latch test apparatus 100 can continually update the test interval and adjust the reference test value accordingly. In addition, the latch test apparatus 100 can update the latch threshold value by using the reference test value VA44 (ie, 304.6875 mA) and the reference test value VA45 (ie, 300.78125 mA) in sequence according to the test result. Further, in the ninth test, the latch test apparatus 100 can test the test wafer 210 based on the reference test value VA46 (ie, 299.8203125 mA). In addition, the ninth test result is that the test wafer 210 is in a latched state, and the difference between the latch threshold and the reference test value is not greater than a preset error value (1 mA). Thus, the latch test apparatus 100 will stop testing the wafer 210 for testing, and the resulting latched threshold (i.e., 300.78125 mA) will be used to define the latch-up resistance of the integrated circuitry in the test wafer 210.

值得一提的是,現有的閂鎖測試方法是以線性方式逐漸遞增觸發脈衝。因此,對現有的閂鎖測試方法而言,其必須依序利用1mA、2mA、3mA、...、300mA的觸發脈衝來反覆進行測試晶片210的閂鎖測試。換言之,現有的閂鎖測試方法必須反覆進行300次的閂鎖測試,才能驗證測試晶片210的抗閂鎖能力。因此,相較現有的閂鎖測試方法而言,閂鎖測試裝置100可有效地降低測試晶片210的測試時間。除此之外,閂鎖測試裝置100可直接對待測晶圓200中的測試晶片210進行測試,亦即閂鎖測試裝置100可針對在晶片製造階段的積體電路進行閂鎖測試。因此,與現有的閂鎖測試方法相較之下,閂鎖測試裝置100也可有效地降低積體電路的生產成本與生產時間。 It is worth mentioning that the existing latch test method is to gradually increase the trigger pulse in a linear manner. Therefore, for the existing latch test method, it is necessary to repeatedly perform the latch test of the test wafer 210 by using the trigger pulses of 1 mA, 2 mA, 3 mA, ..., 300 mA in sequence. In other words, the existing latch test method must perform a latch test of 300 times in order to verify the latch-up resistance of the test wafer 210. Therefore, the latch test apparatus 100 can effectively reduce the test time of the test wafer 210 compared to the existing latch test method. In addition, the latch test apparatus 100 can directly test the test wafer 210 in the wafer 200 to be tested, that is, the latch test apparatus 100 can perform a latch test for the integrated circuit at the wafer fabrication stage. Therefore, the latch test apparatus 100 can also effectively reduce the production cost and production time of the integrated circuit as compared with the existing latch test method.

為了致使本領域具有通常知識者可以更了解本發明,以下將針對圖2中的步驟S220與步驟S230的細部步驟做更進一步地說明。舉例來說,圖5為依據本發明一實施例之用以說明步驟S220與步驟S230的細部流程圖。 In order to make the present invention more familiar to those skilled in the art, the detailed steps of step S220 and step S230 in FIG. 2 will be further explained below. For example, FIG. 5 is a detailed flowchart for explaining steps S220 and S230 according to an embodiment of the present invention.

就步驟S220的細部步驟而言,如步驟S510與步驟S520所示,訊號產生器110可提供電源電壓至測試晶片210的電源焊墊,並可提供觸發脈衝至測試晶片210的輸入焊墊。此外,如步驟S530所示,在觸發脈衝被提供之前與之後,訊號偵測器120可分別偵測流經電源焊墊的電流,以取得至少一偵測訊號中的第一初始電流與第一偵測電流。 For the detailed steps of step S220, as shown in steps S510 and S520, the signal generator 110 can supply a power supply voltage to the power pad of the test wafer 210 and can provide a trigger pulse to the input pad of the test wafer 210. In addition, as shown in step S530, before and after the trigger pulse is provided, the signal detector 120 can respectively detect the current flowing through the power pad to obtain the first initial current and the first of the at least one detection signal. Detect current.

舉例來說,圖6為依據本發明一實施例之用以說明閂鎖測試的波形示意圖。如圖6所示,在期間T61~T63內,訊號產生器110可提供電源電壓610至測試晶片210的電源焊墊。此外,在期間T62內,訊號產生器110可提供觸發脈衝620至測試晶片210的輸入焊墊。再者,在觸發脈衝620被提供之前,亦即在期間T61內,訊號偵測器120可偵測流經電源焊墊的電流,以取得第一初始電流。在觸發脈衝620被提供之後,亦即在期間T63內,訊號偵測器120也可偵測流經電源焊墊的電流,以取得第一偵測電流。此外,觸發脈衝620可例如是一正脈衝電流。在另一實施例中,觸發脈衝620也可例如是一負脈衝電流。 For example, FIG. 6 is a waveform diagram for explaining a latch test according to an embodiment of the invention. As shown in FIG. 6, during the period T61~T63, the signal generator 110 can supply the power supply voltage 610 to the power pad of the test wafer 210. Additionally, during a period T62, the signal generator 110 can provide a trigger pulse 620 to the input pads of the test wafer 210. Moreover, before the trigger pulse 620 is provided, that is, during the period T61, the signal detector 120 can detect the current flowing through the power pad to obtain the first initial current. After the trigger pulse 620 is provided, that is, during the period T63, the signal detector 120 can also detect the current flowing through the power pad to obtain the first detection current. Additionally, the trigger pulse 620 can be, for example, a positive pulse current. In another embodiment, the trigger pulse 620 can also be, for example, a negative pulse current.

就步驟S230的細部步驟而言,如步驟S540所示,控制器130可比較第一偵測電流與第一初始電流,以判別第一偵測電 流是否大於第一初始電流。再者,當第一偵測電流大於第一初始電流時,如步驟S550所示,控制器130可判定測試晶片210處於閂鎖狀態。另一方面,當第一偵測電流不大於第一初始電流時,控制器130可判定測試晶片210不處於閂鎖狀態。 For the detailed step of step S230, as shown in step S540, the controller 130 may compare the first detection current with the first initial current to determine the first detection power. Whether the flow is greater than the first initial current. Moreover, when the first detection current is greater than the first initial current, as shown in step S550, the controller 130 may determine that the test wafer 210 is in a latched state. On the other hand, when the first detection current is not greater than the first initial current, the controller 130 may determine that the test wafer 210 is not in the latched state.

圖7為依據本發明又一實施例之用以說明步驟S220與步驟S230的細部流程圖,且圖8為依據本發明一實施例之用以說明閂鎖測試的波形示意圖。就步驟S220的細部步驟而言,如步驟S710所示,訊號產生器110可提供觸發脈衝至測試晶片210的電源焊墊。舉例來說,參照圖8,在期間T82內,訊號產生器110可提供觸發脈衝810至測試晶片210的電源焊墊,且觸發脈衝810可例如是一正脈衝電壓。 FIG. 7 is a detailed flow chart for explaining steps S220 and S230 according to still another embodiment of the present invention, and FIG. 8 is a waveform diagram for explaining a latch test according to an embodiment of the present invention. In the detailed step of step S220, as shown in step S710, the signal generator 110 can provide a power supply pad to the test wafer 210. For example, referring to FIG. 8, during a period T82, the signal generator 110 can provide a trigger pulse 810 to the power pad of the test wafer 210, and the trigger pulse 810 can be, for example, a positive pulse voltage.

再者,如步驟S720所示,在觸發脈衝被提供之前與之後,訊號偵測器120可分別偵測流經電源焊墊的電流,以取得至少一偵測訊號中的初始電流與偵測電流。舉例來說,參照圖8,在觸發脈衝810被提供之前,亦即在期間T81內,訊號偵測器120可偵測流經電源焊墊的電流,以取得初始電流。在觸發脈衝810被提供之後,亦即在期間T83內,訊號偵測器120可偵測流經電源焊墊的電流,以取得偵測電流。 Moreover, as shown in step S720, before and after the trigger pulse is provided, the signal detector 120 can respectively detect the current flowing through the power pad to obtain the initial current and the detection current in the at least one detection signal. . For example, referring to FIG. 8, before the trigger pulse 810 is provided, that is, during the period T81, the signal detector 120 can detect the current flowing through the power pad to obtain the initial current. After the trigger pulse 810 is provided, that is, during the period T83, the signal detector 120 can detect the current flowing through the power pad to obtain the detection current.

就步驟S230的細部步驟而言,如步驟S730所示,控制器130會比較偵測電流與初始電流,以判別偵測電流是否大於初始電流。此外,當偵測電流大於初始電流時,如步驟S740所示,控制器130可判定測試晶片210處於閂鎖狀態。另一方面,當偵 測電流不大於初始電流,如步驟S750所示,控制器130可判定測試晶片不處於閂鎖狀態。 In the detailed step of step S230, as shown in step S730, the controller 130 compares the detected current with the initial current to determine whether the detected current is greater than the initial current. In addition, when the detected current is greater than the initial current, as shown in step S740, the controller 130 may determine that the test wafer 210 is in a latched state. On the other hand, when The measured current is not greater than the initial current. As shown in step S750, the controller 130 may determine that the test wafer is not in a latched state.

綜上所述,本發明可調整測試區間,並可因應測試區間選取出對應的基準測試值,以藉此設定用以測試待測晶圓的觸發脈衝。藉此,將可有效地降低待測晶圓的測試次數,從而有助於縮減測試時間。此外,本發明可針對在晶片製造階段的積體電路進行閂鎖測試,因此可有效地降低積體電路的生產成本與生產時間。 In summary, the present invention can adjust the test interval, and can select a corresponding reference test value according to the test interval, thereby setting a trigger pulse for testing the wafer to be tested. Thereby, the number of tests of the wafer to be tested can be effectively reduced, thereby helping to reduce the test time. Further, the present invention can perform a latch test for the integrated circuit at the wafer manufacturing stage, and thus can effectively reduce the production cost and production time of the integrated circuit.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the present invention. The scope of the invention is defined by the scope of the appended claims.

S210~S280‧‧‧圖2實施例中的步驟 S210~S280‧‧‧Steps in the embodiment of Figure 2

Claims (8)

一種閂鎖測試方法,包括:執行一設定操作,以從一測試區間所涵蓋的多個測試值中擇一作為一基準測試值,並利用該基準測試值設定一觸發脈衝與一預設誤差值,該基準測試值將該測試區間劃分成一第一子區間與一第二子區間;將該觸發脈衝傳送至一待測晶圓中的一測試晶片以進行該測試晶片的測試,並偵測來自該測試晶片的訊號以取得至少一偵測訊號;依據該至少一偵測訊號判別該測試晶片是否處於一閂鎖狀態;當該測試晶片未處於該閂鎖狀態時,依據該第一子區間更新該測試區間,並回到執行該設定操作的步驟;當該測試晶片處於該閂鎖狀態,且一閂鎖臨界值與該基準測試值的差值大於該預設誤差值時,依據該基準測試值與該第二子區間分別更新該閂鎖臨界值與該測試區間,並回到執行該設定操作的步驟;以及當該測試晶片處於該閂鎖狀態,且該閂鎖臨界值與該基準測試值的差值不大於該預設誤差值時,停止該測試晶片的測試。 A latch test method includes: performing a setting operation to select one of a plurality of test values covered by a test interval as a reference test value, and use the benchmark test value to set a trigger pulse and a preset error value The benchmark test value divides the test interval into a first sub-interval and a second sub-interval; transmitting the trigger pulse to a test wafer in a wafer to be tested for testing the test wafer, and detecting from The signal of the test chip is used to obtain at least one detection signal; determining whether the test chip is in a latched state according to the at least one detection signal; and updating the first sub-interval according to the first sub-interval when the test chip is not in the latched state The test interval, and returning to the step of performing the setting operation; when the test wafer is in the latched state, and a difference between the latch threshold and the reference test value is greater than the preset error value, according to the benchmark test And updating the latch threshold and the test interval respectively to the second subinterval and returning to the step of performing the setting operation; and when the test wafer is in the latched state When the latch and the reference test threshold value difference is not greater than the predetermined error value, stop the test of the test wafer. 如申請專利範圍第1項所述的閂鎖測試方法,其中將該觸發脈衝傳送至該待測晶圓中的該測試晶片以進行該測試晶片的測試,並偵測來自該測試晶片的訊號以取得該至少一偵測訊號的 步驟包括:提供一電源電壓至該測試晶片的一電源焊墊;提供該觸發脈衝至該測試晶片的一輸入焊墊;以及在提供該觸發脈衝之前與之後,分別偵測流經該電源焊墊的電流,以取得該至少一偵測訊號中的一第一初始電流與一第一偵測電流。 The latch test method of claim 1, wherein the trigger pulse is transmitted to the test wafer in the wafer to be tested to perform the test of the test wafer, and the signal from the test wafer is detected. Obtaining at least one detection signal The method includes: providing a power voltage to a power pad of the test chip; providing the trigger pulse to an input pad of the test chip; and detecting the flow through the power pad before and after providing the trigger pulse The current is obtained to obtain a first initial current and a first detection current of the at least one detection signal. 如申請專利範圍第2項所述的閂鎖測試方法;其中依據該至少一偵測訊號判別該測試晶片是否處於該閂鎖狀態的步驟包括:比較該第一偵測電流與該第一初始電流;當該第一偵測電流大於該第一初始電流時,則判定該測試晶片處於該閂鎖狀態;以及當該第一偵測電流不大於該第一初始電流時,則判定該測試晶片不處於該閂鎖狀態。 The latch test method of claim 2, wherein the step of determining whether the test wafer is in the latched state according to the at least one detection signal comprises: comparing the first detection current with the first initial current When the first detection current is greater than the first initial current, determining that the test wafer is in the latched state; and when the first detection current is not greater than the first initial current, determining that the test wafer is not In this latched state. 如申請專利範圍第1項所述的閂鎖測試方法,其中將該觸發脈衝傳送至該待測晶圓中的該測試晶片以進行該測試晶片的測試,並偵測來自該測試晶片的訊號以取得該至少一偵測訊號的步驟包括:提供該觸發脈衝至該測試晶片的一電源焊墊;在提供該觸發脈衝之前與之後,分別偵測流經該電源焊墊的電流,以取得該至少一偵測訊號中的一初始電流與一偵測電流。 The latch test method of claim 1, wherein the trigger pulse is transmitted to the test wafer in the wafer to be tested to perform the test of the test wafer, and the signal from the test wafer is detected. The step of obtaining the at least one detection signal includes: providing the trigger pulse to a power pad of the test chip; detecting current flowing through the power pad before and after providing the trigger pulse to obtain the at least An initial current and a detection current in a detection signal. 如申請專利範圍第4項所述的閂鎖測試方法,其中依據 該至少一偵測訊號判別該測試晶片是否處於該閂鎖狀態的步驟包括:比較該偵測電流與該初始電流;當該偵測電流大於該初始電流時,則判定該測試晶片處於該閂鎖狀態;以及當該偵測電流不大於該初始電流時,則判定該測試晶片不處於該閂鎖狀態。 The latch test method according to claim 4, wherein the basis is The step of determining whether the test chip is in the latched state by the at least one detecting signal comprises: comparing the detecting current with the initial current; and when the detecting current is greater than the initial current, determining that the test wafer is in the latching a state; and when the detection current is not greater than the initial current, determining that the test wafer is not in the latched state. 一種閂鎖測試裝置,包括:一控制器,從一測試區間所涵蓋的多個測試值中擇一作為一基準測試值,並利用該基準測試值設定一觸發脈衝與一預設誤差值,且該基準測試值將該測試區間劃分成一第一子區間與一第二子區間;一訊號產生器,依據該基準測試值產生該觸發脈衝,並將該觸發脈衝傳送至一待測晶圓中的一測試晶片,以致使該閂鎖測試裝置進行該測試晶片的測試;以及一訊號偵測器,偵測來自該測試晶片的訊號,以取得至少一偵測訊號,且該控制器依據該至少一偵測訊號判別該測試晶片是否處於一閂鎖狀態,當該測試晶片未處於該閂鎖狀態時,該控制器依據該第一子區間更新該測試區間,並依據更新後的該測試區間重新設定該觸發脈衝,以致使該閂鎖測試裝置再次進行該測試晶片的測試,當該測試晶片處於該閂鎖狀態,且一閂鎖臨界值與該基準測 試值的差值大於該預設誤差值時,該控制器依據該基準測試值與該第二子區間分別更新該閂鎖臨界值與該測試區間,以致使該閂鎖測試裝置再次進行該測試晶片的測試,當該測試晶片處於該閂鎖狀態,且該閂鎖臨界值與該基準測試值的差值不大於該預設誤差值時,該閂鎖測試裝置停止該測試晶片的測試。 A latch test device includes: a controller that selects one of a plurality of test values covered by a test interval as a reference test value, and uses the reference test value to set a trigger pulse and a preset error value, and The reference test value divides the test interval into a first sub-interval and a second sub-interval; a signal generator generates the trigger pulse according to the reference test value, and transmits the trigger pulse to a wafer to be tested a test chip for causing the latch test device to perform the test of the test chip; and a signal detector for detecting a signal from the test chip to obtain at least one detection signal, and the controller is based on the at least one The detecting signal determines whether the test chip is in a latched state. When the test chip is not in the latched state, the controller updates the test interval according to the first sub-interval and resets according to the updated test interval. The trigger pulse causes the latch test device to perform the test of the test wafer again, when the test wafer is in the latched state, and a latch threshold is Benchmarks When the difference between the trial values is greater than the preset error value, the controller updates the latch threshold and the test interval according to the reference test value and the second sub-interval respectively, so that the latch test device performs the test again. The test of the wafer, when the test wafer is in the latched state, and the difference between the latch threshold and the reference test value is not greater than the preset error value, the latch test device stops the test of the test wafer. 如申請專利範圍第6項所述的閂鎖測試裝置,其中該訊號產生器提供一電源電壓至該測試晶片的一電源焊墊,並提供該觸發脈衝至該測試晶片的一輸入焊墊,在該觸發脈衝被提供之前與之後,該訊號偵測器分別偵測流經該電源焊墊的電流以取得該至少一偵測訊號中的一第一初始電流與一第一偵測電流,該控制器比較該第一偵測電流與該第一初始電流,當該第一偵測電流大於該第一初始電流時,則該控制器判定該測試晶片處於該閂鎖狀態,當該第一偵測電流不大於該第一初始電流時,則該控制器判定該測試晶片不處於該閂鎖狀態。 The latch test device of claim 6, wherein the signal generator supplies a power supply voltage to a power pad of the test chip and provides the trigger pulse to an input pad of the test chip. Before and after the trigger pulse is supplied, the signal detector detects the current flowing through the power pad to obtain a first initial current and a first detection current of the at least one detection signal, the control Comparing the first detection current with the first initial current, when the first detection current is greater than the first initial current, the controller determines that the test wafer is in the latched state, when the first detection When the current is not greater than the first initial current, the controller determines that the test wafer is not in the latched state. 如申請專利範圍第6項所述的閂鎖測試裝置,其中該訊號產生器提供該觸發脈衝至該測試晶片的一電源焊墊,在該觸發脈衝被提供之前與之後,該訊號偵測器分別偵測流經該電源焊墊的電流,以取得該至少一偵測訊號中的一初始電流與一偵測電流,該控制器比較該偵測電流與該初始電流,當該偵測電流大於 該初始電流時,則該控制器判定該測試晶片處於該閂鎖狀態,當該偵測電流不大於該初始電流,則該控制器判定該測試晶片不處於該閂鎖狀態。 The latch test device of claim 6, wherein the signal generator provides the trigger pulse to a power pad of the test chip, before and after the trigger pulse is provided, the signal detector respectively Detecting a current flowing through the power pad to obtain an initial current and a detection current in the at least one detection signal, the controller comparing the detection current with the initial current, when the detection current is greater than At the initial current, the controller determines that the test wafer is in the latched state. When the detected current is not greater than the initial current, the controller determines that the test wafer is not in the latched state.
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