TWI544031B - 聚醯亞胺樹脂及其製造方法與薄膜 - Google Patents
聚醯亞胺樹脂及其製造方法與薄膜 Download PDFInfo
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- TWI544031B TWI544031B TW104121999A TW104121999A TWI544031B TW I544031 B TWI544031 B TW I544031B TW 104121999 A TW104121999 A TW 104121999A TW 104121999 A TW104121999 A TW 104121999A TW I544031 B TWI544031 B TW I544031B
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- Prior art keywords
- bis
- monomers
- dianhydride
- diamine
- resin
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- 229920001721 polyimide Polymers 0.000 title claims description 26
- 239000009719 polyimide resin Substances 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 14
- 238000000034 method Methods 0.000 title claims description 11
- 239000010409 thin film Substances 0.000 title 1
- 239000000178 monomer Substances 0.000 claims description 108
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 65
- 150000004985 diamines Chemical class 0.000 claims description 52
- 239000011347 resin Substances 0.000 claims description 46
- 229920005989 resin Polymers 0.000 claims description 46
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 36
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 claims description 21
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 21
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 18
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims description 16
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims description 11
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 claims description 9
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 8
- 239000001294 propane Substances 0.000 claims description 8
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 claims description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 6
- -1 4,4'-diaminodiphenyl hydrazine Chemical compound 0.000 claims description 5
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims description 5
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 claims description 4
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical group CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 claims description 4
- HHLMWQDRYZAENA-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=C(C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)(C(F)(F)F)C(F)(F)F)C=C1 HHLMWQDRYZAENA-UHFFFAOYSA-N 0.000 claims description 4
- 108010026466 polyproline Proteins 0.000 claims description 4
- FZZMTSNZRBFGGU-UHFFFAOYSA-N 2-chloro-7-fluoroquinazolin-4-amine Chemical compound FC1=CC=C2C(N)=NC(Cl)=NC2=C1 FZZMTSNZRBFGGU-UHFFFAOYSA-N 0.000 claims description 2
- 239000000010 aprotic solvent Substances 0.000 claims description 2
- MGHPNCMVUAKAIE-UHFFFAOYSA-N diphenylmethanamine Chemical compound C=1C=CC=CC=1C(N)C1=CC=CC=C1 MGHPNCMVUAKAIE-UHFFFAOYSA-N 0.000 claims description 2
- AJFDBNQQDYLMJN-UHFFFAOYSA-N n,n-diethylacetamide Chemical compound CCN(CC)C(C)=O AJFDBNQQDYLMJN-UHFFFAOYSA-N 0.000 claims description 2
- 125000005591 trimellitate group Chemical group 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 150000008064 anhydrides Chemical class 0.000 claims 2
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 claims 1
- JPZRPCNEISCANI-UHFFFAOYSA-N 4-(4-aminophenyl)-3-(trifluoromethyl)aniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F JPZRPCNEISCANI-UHFFFAOYSA-N 0.000 claims 1
- 239000005711 Benzoic acid Substances 0.000 claims 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 claims 1
- 229910021603 Ruthenium iodide Inorganic materials 0.000 claims 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 claims 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical group OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims 1
- 125000006159 dianhydride group Chemical group 0.000 claims 1
- LJZVDOUZSMHXJH-UHFFFAOYSA-K ruthenium(3+);triiodide Chemical compound [Ru+3].[I-].[I-].[I-] LJZVDOUZSMHXJH-UHFFFAOYSA-K 0.000 claims 1
- 230000000052 comparative effect Effects 0.000 description 20
- 239000002253 acid Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 13
- 238000003756 stirring Methods 0.000 description 12
- CXISKMDTEFIGTG-UHFFFAOYSA-N [4-(1,3-dioxo-2-benzofuran-5-carbonyl)oxyphenyl] 1,3-dioxo-2-benzofuran-5-carboxylate Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(OC=2C=CC(OC(=O)C=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)=O)=C1 CXISKMDTEFIGTG-UHFFFAOYSA-N 0.000 description 11
- 239000000758 substrate Substances 0.000 description 10
- 230000005540 biological transmission Effects 0.000 description 7
- 238000002329 infrared spectrum Methods 0.000 description 7
- 239000002243 precursor Substances 0.000 description 7
- XNGIFLGASWRNHJ-UHFFFAOYSA-L phthalate(2-) Chemical compound [O-]C(=O)C1=CC=CC=C1C([O-])=O XNGIFLGASWRNHJ-UHFFFAOYSA-L 0.000 description 6
- 229920000106 Liquid crystal polymer Polymers 0.000 description 5
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- XUSNPFGLKGCWGN-UHFFFAOYSA-N 3-[4-(3-aminopropyl)piperazin-1-yl]propan-1-amine Chemical compound NCCCN1CCN(CCCN)CC1 XUSNPFGLKGCWGN-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000004060 quinone imines Chemical class 0.000 description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 108010039918 Polylysine Proteins 0.000 description 2
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920000656 polylysine Polymers 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 238000010561 standard procedure Methods 0.000 description 2
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- XPAQFJJCWGSXGJ-UHFFFAOYSA-N 4-amino-n-(4-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(N)C=C1 XPAQFJJCWGSXGJ-UHFFFAOYSA-N 0.000 description 1
- WOYZXEVUWXQVNV-UHFFFAOYSA-N 4-phenoxyaniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC=C1 WOYZXEVUWXQVNV-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- QHHKLPCQTTWFSS-UHFFFAOYSA-N 5-[2-(1,3-dioxo-2-benzofuran-5-yl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)(C(F)(F)F)C(F)(F)F)=C1 QHHKLPCQTTWFSS-UHFFFAOYSA-N 0.000 description 1
- MQAHXEQUBNDFGI-UHFFFAOYSA-N 5-[4-[2-[4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]phenyl]propan-2-yl]phenoxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC2=CC=C(C=C2)C(C)(C=2C=CC(OC=3C=C4C(=O)OC(=O)C4=CC=3)=CC=2)C)=C1 MQAHXEQUBNDFGI-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 229920000954 Polyglycolide Polymers 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 238000005576 amination reaction Methods 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000004984 aromatic diamines Chemical class 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- HBGGXOJOCNVPFY-UHFFFAOYSA-N diisononyl phthalate Chemical group CC(C)CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCC(C)C HBGGXOJOCNVPFY-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000006358 imidation reaction Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000010295 mobile communication Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004633 polyglycolic acid Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1046—Polyimides containing oxygen in the form of ether bonds in the main chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1042—Copolyimides derived from at least two different tetracarboxylic compounds or two different diamino compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1067—Wholly aromatic polyimides, i.e. having both tetracarboxylic and diamino moieties aromatically bound
- C08G73/1071—Wholly aromatic polyimides containing oxygen in the form of ether bonds in the main chain
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0326—Organic insulating material consisting of one material containing O
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
- C08J2379/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08J2379/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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- C08L2201/00—Properties
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- C08L2203/00—Applications
- C08L2203/16—Applications used for films
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/06—Thermal details
- H05K2201/068—Thermal details wherein the coefficient of thermal expansion is important
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Description
本發明關於一種聚醯亞胺樹脂及其製造方法與薄膜,特別是指一種具有低介電損耗因子及線熱膨脹係數的聚醯亞胺樹脂,可以用在高頻基板之絕緣層。
軟性印刷電路板(Flexible Printed Circuit Board,FPCB)因其可撓曲特性,已廣泛用於高密度化、輕小化及高效能化的行動通訊及可攜式電子產品等。隨著無線傳輸高頻化與數據傳輸高速化,高頻基板將逐漸成為未來發展的重點。高頻基板的其中之一要求為,在高頻高速傳輸下需保留數據訊號的完整性,傳輸過程不能造成訊號損失與被干擾。
聚醯亞胺((Polyimide)軟性銅箔基板(Flexible Copper Clad Laminate,FCCL)因具備良好尺寸安定性、耐熱性、熱膨脹係數、機械強度與電阻絕緣性,已被大量運用在電子產業。不過,聚醯亞胺具有高介電常數、高損耗因子等特性,不適合用在高頻基板之絕緣層。目前常見的高頻軟性基板多以液晶高分子膜(Liquid Crystal Polymer,LCP)壓合銅箔製成。
但是,LCP的獨特分子結構特性容易產生過多順向性排列,造成橫方向之機械性質不佳,而使LCP薄膜加工及產品應用受到嚴重限制。另外,LCP的獨特分子結構特性,也造成其高分子玻璃轉移溫度(Tg)與熔點
(Tm)相近,而使應用其之軟性銅箔基板在熱壓合製程時不易控制尺寸安定性。
有鑑於上述問題,本發明提供一種聚醯亞胺樹脂、其製造方法與薄膜。本發明之聚醯亞胺樹脂保有其材料本身良好的尺寸安定性、耐熱性、熱膨脹係數、機械強度與電阻絕緣性等特性,同時更具有低介電損耗因子,適合應用在高頻基板中。
根據本發明之一方面,提供一種聚醯亞胺樹脂。此聚醯亞胺樹脂係由下列成份衍生而成:(a)至少二種選自由對-伸苯基雙(苯偏三酸酯二酐)、4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐及4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐)所組成之群組的二酐單體;以及(b)至少二種二胺單體,其中一種二胺單體為2,2’-雙(三氟甲基)聯苯胺,且其含量佔二胺單體成份總莫耳數的70-90%;其餘的二胺單體選自由4,4’-二胺基二苯基醚、4,4’-二胺基二苯甲烷、2,2’-雙[4-(4-胺基苯氧基)苯基]丙烷、4,4’-二胺基二苯碸、1,3-雙(4-胺基苯氧基)苯、4,4’-二胺基苯甲醯胺苯、對-苯二胺、4,4’-二氨基-2,2’-二甲基-1,1’-聯苯及2,2-雙[4-(4-胺基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷所組成之群組;上述二酐單體的總莫耳數與該二胺單體的總莫耳數比為0.85-1.15,且此聚醯亞胺樹脂之介電損耗因子小於0.007,線熱膨脹係數介於15-35ppm/K。
根據本發明之另一方面,提供一種製造聚醯亞胺樹脂的方
法,此方法包括下列步驟:(a)使用溶劑溶解至少二種二酐單體以及至少二種二胺單體。二酐單體係選自由對-伸苯基雙(苯偏三酸酯二酐)、4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐及4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐)所組成的群組。其中一種二胺單體為2,2’-雙(三氟甲基)聯苯胺,其餘的二胺單體係選自由4,4’-二胺基二苯基醚、4,4’-二胺基二苯甲烷、2,2’-雙[4-(4-胺基苯氧基)苯基]丙烷、4,4’-二胺基二苯碸、1,3-雙(4-胺基苯氧基)苯、4,4’-二胺基苯甲醯胺苯、對-苯二胺、4,4’-二氨基-2,2’-二甲基-1,1’-聯苯及2,2-雙[4-(4-胺基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷所組成的群組。
(b)將經溶解之二酐單體與經溶解之二胺單體混合,進行聚合反應形成一聚醯胺酸樹脂。二酐單體的總莫耳數與二胺單體的總莫耳數比為0.85-1.15;以及(c)醯亞胺化聚醯胺酸樹脂,以形成聚醯亞胺樹脂。
根據本發明之再一方面,提供一種以前述製造方法製成的聚醯亞胺樹脂。
根據本發明之又一方面,提供一種包括前述聚醯亞胺樹脂之薄膜。
為使本發明之上述及其他方面更為清楚易懂,下文特舉實施例,並配合所附圖式詳細說明。
第1A圖為實施例1之聚醯亞胺樹脂的IR圖譜;第1B圖為實施例1之聚醯亞胺樹脂的DSC(Differential Scanning Calorimeter,示差掃瞄熱分
析儀)圖譜。
第2A圖為實施例2之聚醯亞胺樹脂的IR圖譜;第2B圖為實施例2之聚醯亞胺樹脂的DSC圖譜。
第3A圖為實施例3之聚醯亞胺樹脂的IR圖譜;第3B圖為實施例3之聚醯亞胺樹脂的DSC圖譜。
第4A圖為實施例4之聚醯亞胺樹脂的IR圖譜;第4B圖為實施例4之聚醯亞胺樹脂的DSC圖譜。
第5A圖為實施例5之聚醯亞胺樹脂的IR圖譜;第5B圖為實施例5之聚醯亞胺樹脂的DSC圖譜。
本發明提供之聚醯亞胺樹脂,係先將二酐單體及二胺單體聚合為聚醯胺酸樹脂(聚醯亞胺樹脂前驅物)後,再將聚醯胺酸樹脂進行醯亞胺化程序所形成。
聚合的方法可用溶劑溶解二酐單體及二胺單體,再將經溶解之二酐單體與二胺單體混合反應,便可得到聚醯胺酸樹脂(聚醯亞胺樹脂前驅物)。
上述溶劑例如可為N,N-二甲基乙醯胺、N,N-二乙基乙醯胺、N,N-二甲基甲醯胺及N-甲基-2-吡咯烷酮等非質子性溶劑,但並不限定為此,亦可選用其他適合的非質子性溶劑。
在一實施例之聚合反應中,以二胺單體、二酐單體及溶劑的總重量為基礎,二胺單體及二酐單體的重量約佔5-40wt%。
醯亞胺化的方法可使用高溫熟化,例如連續或分段將聚醯胺
酸樹脂(聚醯亞胺樹脂前驅物)進行加熱。若要將聚醯亞胺樹脂製成薄膜或絕緣層時,則可先將聚醯胺酸樹脂(聚醯亞胺樹脂前驅物)塗抹在基材上,再將整個基材送入烘箱加熱進行熟化。亦可使用習知的醯亞胺化方法,本發明不對此進行限制。
本發明之聚醯亞胺樹脂所使用的二酐單體為芳香族二酐單體,分子量較佳係介於400-600。分子量較小(約200-350)的芳香族二酐單體(例如均苯四甲酸二酐(PMDA)、3,3',4,4'-聯苯四甲酸二酐(BPDA)、3,3',4,4'-二苯甲酮四甲酸二酐(BTDA)等),會使聚醯亞胺樹脂的極性醯亞胺基密度含量較高,造成其介電常數特性偏高。
本發明所使用的芳香族二酐單體可包括下列結構:TAHQ:對-伸苯基雙(苯偏三酸酯二酐)/p-phenylenebis(trimellitate anhydride)
6FDA:4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐
/4,4’-(hexafluoroisopropylidene)diphthalic anhydride
PBADA:4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐)/4,4’-(4,4’-isopropylidenediphenoxy)bis(phthalic anhydride)
本發明之聚醯亞胺樹脂所使用的二胺單體為芳香族二胺單體,例如可為下列結構:BAPP:2,2’-雙[4-(4-胺基苯氧基)苯基]丙烷/2,2-bis[4-(4-aminophenoxy)phenyl]propane
TPE-R:1,3-雙(4-胺基苯氧基)苯/1,3-bis(4-aminophenoxy)benzene
PDA:對-苯二胺/p-phenylenediamine
TFMB:2,2’-雙(三氟甲基)聯苯胺/2,2’-bis(trifluoromethyl)benzidine
4,4’-二胺基二苯基醚/4,4’-oxydianiline
4,4’-二胺基二苯甲烷/4,4’-methylenedianiline
4,4’-二胺基二苯碸/4,4’-diaminodiphenylsulfone
4,4’-二胺基苯甲醯胺苯/4,4’-diaminobenzanilide
4,4’-二氨基-2,2’-二甲基-1,1’-聯苯/m-tolidine
2,2-雙[4-(4-胺基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷/2,2-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane
特別注意的是,本發明係使用二種以上(包含二種)之二酐單體及二種以上之二胺單體聚合成聚醯亞胺樹脂。
本發明聚醯亞胺樹脂中,二酐單體成份的總莫耳數及二胺單體成份的總莫耳數比約為0.85-1.15。
一實施例中,當二酐單體成份包括對-伸苯基雙(苯偏三酸酯二酐)時,其含量佔二酐單體成份總莫耳數的80-95%。
一實施例中,當二酐單體成份包括4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐時,其含量至多佔二酐單體成份總莫耳數的15%。
一實施例中,當二酐單體成份包括4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐)時,其含量至多佔二酐單體成份總莫耳數的15%。
一實施例中,當二胺單體成份包括2,2’-雙(三氟甲基)聯苯胺時,其含量佔二胺單體成份總莫耳數的70-90%。
以上述特定之二種以上二胺單體及兩種以上二酐單體,並以特定比例混合製得之聚醯亞胺樹脂,其介電損耗因子小於0.007,且線熱膨脹係數為15至35ppm/K。
以下以多個實施例介紹本發明之聚醯胺酸樹脂及其製造方法,並測量其特性。
將24.20g(0.076mole)的2,2’-雙(三氟甲基)聯苯胺(TFMB)、1.85g(0.017mole)的對-苯二胺(PDA)、2.36g(0.008mole)的1,3-雙(4-胺基苯氧基)苯(TPE-R)及244.37g的N-甲基-2-吡咯烷酮(NMP)置入三頸燒瓶內。於
30℃下攪拌至完全溶解後,再加入41.75g(0.091mole)的對-伸苯基雙(苯偏三酸酯二酐)(TAHQ)及2.83g(0.005mole)的4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐)(PBADA),接著持續攪拌並於25℃下反應24小時,可得到實施例1之聚醯胺酸溶液。本實施例中,二酐單體及二胺單體的重量佔反應溶液總重量約23wt%[(24.20+1.85+2.36+41.75+2.83)/(24.20+1.85+2.36+41.75+2.83+244.37)×100%=23%]。
將26.28g(0.082mole)的2,2’-雙(三氟甲基)聯苯胺(TFMB)、3.74g(0.009mole)的2,2’-雙[4-(4-胺基苯氧基)苯基]丙烷(BAPP)及215.78g的N-甲基-2-吡咯烷酮(NMP)置入三頸燒瓶內,於30℃下攪拌至完全溶解後,再加入39.88g(0.087mole)的對-伸苯基雙(苯偏三酸酯二酐)(TAHQ)及2.02g(0.005mole)的4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐(6FDA),接著持續攪拌並於25℃下反應24小時,可得到實施例2的聚醯胺酸溶液。本實施例中,二酐單體及二胺單體的重量佔反應溶液總重量約25wt%[(26.28+3.74+39.88+2.02)/(26.28+3.74+39.88+2.02+215.78)×100%=25%]。
將29.13g(0.091mole)的2,2’-雙(三氟甲基)聯苯胺(TFMB)、1.84g(0.017mole)的對-苯二胺(PDA)、1.66g(0.006mole)的1,3-雙(4-胺基苯氧基)苯(TPE-R)及271.31g的N-甲基-2-吡咯烷酮(NMP)置入三頸燒瓶內,於30℃下攪拌至完全溶解後,再加入47.12g(0.102mole)的對-伸苯基雙(苯偏三酸酯二酐)(TAHQ)及5.92g(0.011mole)的4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐)(PBADA),接著持續攪拌並於25℃下反應24小時,得到實施
例3的聚醯胺酸溶液。本實施例中,二酐單體及二胺單體的重量佔反應溶液總重量約24wt%[(29.13+1.84+1.66+47.12+5.92)/(29.13+1.84+1.66+47.12+5.92+271.31)×100%=24%]。
將23.56g(0.074mole)的2,2’-雙(三氟甲基)聯苯胺(TFMB)、1.49g(0.014mole)的對-苯二胺(PDA)、1.89g(0.005mole)的2,2’-雙[4-(4-胺基苯氧基)苯基]丙烷(BAPP)及260.06g的N-甲基-2-吡咯烷酮(NMP)置入三頸燒瓶內,於30℃下攪拌至完全溶解後,再加入38.10g(0.083mole)的對-伸苯基雙(苯偏三酸酯二酐)(TAHQ)及4.09g(0.009mole)的4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐(6FDA),接著持續攪拌並於25℃下反應24小時,得到實施例4的聚醯胺酸溶液。本實施例中,二酐單體及二胺單體的重量佔反應溶液總重量約21wt%[(23.56+1.49+1.89+38.10+4.09)/(23.56+1.49+1.89+38.10+4.09+260.06)×100%=21%]。
將25.00g(0.078mole)的2,2’-雙(三氟甲基)聯苯胺(TFMB)、1.49g(0.014mole)的對-苯二胺(PDA)及244.32g的N-甲基-2-吡咯烷酮(NMP)置入三頸燒瓶內,於30℃下攪拌至完全溶解後,再加入35.94g(0.078mole)的對-伸苯基雙(苯偏三酸酯二酐)(TAHQ)、4.08g(0.009mole)的4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐(6FDA)及2.39g(0.005mole)的4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐)(PBADA),接著持續攪拌並於25℃下反應24小時,得到實施例5的聚醯胺酸溶液。本實施例中,二酐單體及二胺單體的重
量佔反應溶液總重量約22wt%[(25.00+1.49+35.94+4.08+2.39)/(25.00+1.49+35.94+4.08+2.39+244.32)×100%=22%]。
以下另舉出比較例1-3。比較例與實施例的差異在於比較例僅使用一種二酐單體與一種二胺單體進行反應。而上述實施例1-5皆使用二種以上的二酐單體與兩種以上的二酐單體進行反應。
將31.25g(0.098mole)的2,2’-雙(三氟甲基)聯苯胺(TFMB)及227.16g的N-甲基-2-吡咯烷酮(NMP)置入三頸燒瓶內,於30℃下攪拌至完全溶解後,再加入44.47g(0.097mole)的對-伸苯基雙(苯偏三酸酯二酐)(TAHQ),接著持續攪拌並於25℃下反應24小時,得到比較例1的聚醯胺酸溶液。於此比較例中,二酐單體及二胺單體的重量佔反應溶液總重量約25wt%[(31.25+44.47)/(31.25+44.47+227.16)×100%=25%]。
將13.78g(0.127mole)的對-苯二胺(PDA)及250.58g的N-甲基-2-吡咯烷酮(NMP)置入三頸燒瓶內,於30℃下攪拌至完全溶解後,再加入56.90g(0.124mole)的對-伸苯基雙(苯偏三酸酯二酐)(TAHQ),接著持續攪拌並於25℃下反應24小時,得到比較例2的聚醯胺酸溶液。於此比較例中,二酐單體及二胺單體的重量佔反應溶液總重量約22wt%[(13.78+56.90)/(13.78+56.90+250.58)×100%=22%]。
將25.74g(0.088mole)的1,3-雙(4-胺基苯氧基)苯(TPE-R)及260.28g的N-甲基-2-吡咯烷酮(NMP)置入三頸燒瓶內,於30℃下攪拌至完全
溶解後,再加入39.33g(0.085mole)的對-伸苯基雙(苯偏三酸酯二酐)(TAHQ),接著持續攪拌並於25℃下反應24小時,得到比較例3的聚醯胺酸溶液。於此比較例中,二酐單體及二胺單體的重量佔反應溶液總重量約20wt%[(25.74+39.33)/(25.74+39.33+260.28)×100%=20%]
上述實施例及比較例之聚醯胺酸溶液之組成成份與比例整理於下表一。將實施例及比較例之聚醯胺酸溶液(聚醯亞胺樹脂前驅物)醯亞胺化製成聚醯亞胺薄膜後,測量其IR圖譜、介電常數(Dk)、介電損耗因子(Df)、線熱膨脹係數(CTE)、玻璃轉移溫度(Tg)及結晶溫度(Tc)。第1A圖、第2A圖、第3A圖、第4A圖及第5A圖分別為實施例1-5之聚醯亞胺樹脂的IR圖譜;第1B圖、第2B圖、第3B圖、第4B圖及第5B圖則分別為實施例1-5之聚醯亞胺樹脂的DSC(Differential Scanning Calorimeter,示差掃瞄熱分析儀)圖譜,另數據測量的結果整理列於下表二。
表二中各項特性,是將聚醯胺酸溶液製成薄膜後,再以下列方法量測:
介電常數(dielectric constant,Dk):使用量測儀(廠牌:Agilent;型號:HP4291),於10GHz的條件下,採用IPC-TM-650-2.5.5.9標準方法進行量測。
介電耗損因子(dissipation factor,Df):使用量測儀(廠牌:Agilent;型號:HP4291),於10GHz的條件下,採用IPC-TM-650-2.5.5.9標準方法進行量測。
線熱膨脹係數(Coefficient of thermal expansion,CTE):藉由熱機械分析,在負重3g/膜厚20μm、昇溫速度10℃/分中,由試驗片之延伸,計算於50至200℃範圍之平均值做為線熱膨脹係數。線熱膨脹較低的材料,在製造電路板的加熱烘烤製程中可避免過度變形,使產線維持高良率。
玻璃轉移溫度(glass transition temperature,Tg)及結晶溫度(Tc):
使用SII Nano Technology製差示掃描型熱量計裝置(DSC-6220)而測定。在氮氣環境下,使聚醯亞胺樹脂承受下述條件的熱經歷。熱經歷的條件係第1次升溫(升溫速度10℃/min),隨後冷卻(冷卻速度30℃/min),隨後第2次升溫(升溫速度10℃/min)。本發明之玻璃轉移溫度係讀取且決定在第1次升溫、或第2次升溫所觀測的值。結晶化溫度係讀取且決定在第1次降溫所觀測到的放熱峰之峰頂值。
高頻電路的需求內涵就是傳輸訊號的速度及品質,而影響這二項的主要因素是傳輸材料的電氣特性,亦即材料的介電常數(Dk)與介電損失因子(Df),由以下訊號傳輸公式來說明:
αd:傳送損失(transmission loss)
εR:介電常數(Dk)
FGHz:頻率(frequency)
tan δ:介電損耗因子(Df)
由上述公式可知,Df的影響比Dk大,因此Df值越低,其傳送損失越小,越適用於高頻材料。
由表一、表二可知,本發明實施例1-5使用二種以上二酐單體及二種以上二胺單體製成的聚醯亞胺樹脂,相較於比較例使用一種二酐及一種二胺單體製成之聚醯亞胺樹脂,具有較低的介電損耗因子(Df)及線熱膨脹係數(CTE)。這是由於單一二酐單體(例如TAHQ)的芳香族酯官能基與醯亞胺官能基會形成巨大的平面共振結構,此巨大的平面結構會影響聚醯胺酸溶液(聚醯亞胺樹脂前驅物)形成聚醯亞胺高分子的排列情形,排列較無
規則,結晶度較低。相對的,本實施例除了用TAHQ作為主要二酐單體外,更導入分子量400-600的其他二酐單體,一方面可維持樹脂中的醯亞胺基含量,防止介電常數升高,另一方面更可誘導芳香族聚酯官能基的排列,提昇形成之聚醯亞胺樹脂的結晶性,進而獲得介電損耗因子較低的聚醯亞胺樹脂。從實驗結果來看,比較例1-3在不使用其他二酐單體如6FDA與PBADA的情況下,其形成的聚醯亞胺薄膜為無結晶性的透明膜。但如實施例1-5加入適量的6FDA與PBADA後,其高分子的Tg與Tc將有較大的變化,且製成之聚醯亞胺薄膜皆為結晶性半透明膜。
另外可由比較例分析不同的二胺單體對聚醯亞胺樹脂特性的影響。比較例1與實施例相比,其CTE相差不大,但實施例的Df值較低。比較例2使用PDA二胺單體,其CTE明顯較小,但Df值較高。比較例3使用TPE-R二胺單體,雖然Df較低但仍不及實施例1-5之結晶性高分子。這是由於非直線結構的二胺單體如TPE-R、BAPP等,其鍵角迴轉構形變化障礙較小,具有較低的Df值,但CTE值較高。直線結構的二胺單體如PDA、TFMB等,Df較高但CTE值較低。本發明之實施例混合二種以上之二胺單體(例如可混合直線結構及非直線結構的二胺單體),可在低Df值與低CTE兩者間找出平衡點,獲得適合應用在高頻基板的聚醯亞胺樹脂。
雖然本發明以實施例說明如上,惟此些實施例並非用以限制本發明。本領域之通常知識者在不脫離本發明技藝精神的範疇內,當可對此些實施例進行等效實施或變更,故本發明的保護範圍應以其後所附之申請專利範圍為準。
Claims (11)
- 一種聚醯亞胺樹脂,係由下列成份衍生而成:(a)至少二種二酐單體,其中一種二酐單體為對-伸苯基雙(苯偏三酸酯二酐),且其含量佔該些二酐單體總莫耳數的80-95%;其餘的二酐單體選自由4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐及4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐)所組成之群組;以及(b)至少二種二胺單體,其中一種二胺單體為2,2’-雙(三氟甲基)聯苯胺,且其含量佔該些二胺單體總莫耳數的70-90%;其餘的該些二胺單體選自由4,4’-二胺基二苯基醚、4,4’-二胺基二苯甲烷、2,2’-雙[4-(4-胺基苯氧基)苯基]丙烷、4,4’-二胺基二苯碸、1,3-雙(4-胺基苯氧基)苯、4,4’-二胺基苯甲醯胺苯、對-苯二胺、4,4’-二氨基-2,2’-二甲基-1,1’-聯苯及2,2-雙[4-(4-胺基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷所組成之群組,且其含量佔該些二胺單體總莫耳數的10-30%;其中,該些二酐單體的總莫耳數與該些二胺單體的總莫耳數比為0.85-1.15,且該聚醯亞胺樹脂之介電損耗因子小於0.007,線熱膨脹係數介於15-35ppm/K。
- 如申請專利範圍第1項所述之聚醯亞胺樹脂,其中其餘的該些二酐單體包括4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐,且其含量至多佔該些二酐單體總莫耳數的15%。
- 如申請專利範圍第1項所述之聚醯亞胺樹脂,其中其餘的該些二酐單體包括4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐),且其含量至多佔該些二 酐單體總莫耳數的15%。
- 如申請專利範圍第1項所述之聚醯亞胺樹脂,其中其餘的該些二胺單體為非直線結構的二胺單體。
- 一種聚醯亞胺樹脂之製造方法,包括下列步驟:(a)使用一溶劑溶解至少二種二酐單體以及至少二種二胺單體,該些二酐單體其中一種為對-伸苯基雙(苯偏三酸酯二酐),且其含量佔該些二酐單體總莫耳數的80-95%,其餘的該些二酐單體係選自由4,4’-(六氟亞丙基)雙-鄰苯二甲酸酐及4,4’-(4,4’-異丙基二苯氧基)雙(鄰苯二甲酸酐)所組成的群組;該些二胺單體其中一種為2,2’-雙(三氟甲基)聯苯胺,其餘的該些二胺單體係選自由4,4’-二胺基二苯基醚、4,4’-二胺基二苯甲烷、2,2’-雙[4-(4-胺基苯氧基)苯基]丙烷、4,4’-二胺基二苯碸、1,3-雙(4-胺基苯氧基)苯、4,4’-二胺基苯甲醯胺苯、對-苯二胺、4,4’-二氨基-2,2’-二甲基-1,1’-聯苯及2,2-雙[4-(4-胺基苯氧基)苯基]-1,1,1,3,3,3-六氟丙烷所組成的群組;(b)將經溶解之該些二酐單體與經溶解之該些二胺單體混合,進行聚合反應形成一聚醯胺酸樹脂,該些二酐單體的總莫耳數與該些二胺單體的總莫耳數比為0.85-1.15;以及(c)醯亞胺化該聚醯胺酸樹脂,以形成該聚醯亞胺樹脂。
- 如申請專利範圍第5項所述之製造方法,其中2,2’-雙(三氟甲基)聯苯胺之含量佔該些二胺單體總莫耳數的70-90%。
- 如申請專利範圍第5項所述之製造方法,其中該溶劑是非質子性溶劑。
- 如申請專利範圍第7項所述之製造方法,其中該溶劑選自由N,N-二甲基乙 醯胺、N,N-二乙基乙醯胺、N,N-二甲基甲醯胺及N-甲基-2-吡咯烷酮所組成之群組。
- 如申請專利範圍第5項所述之製造方法,其中以該些二胺單體、該些二酐單體及該溶劑的總重量為基礎,該些二胺單體及該些二酐單體的重量佔5-40wt%。
- 一種聚醯亞胺樹脂,其係以申請專利範圍第5項所述之製造方法製成,且該聚醯亞胺樹脂具有小於0.007之介電損耗因子,以及介於15-35ppm/K之線熱膨脹係數。
- 一種薄膜,包括如申請專利範圍第1項所述之聚醯亞胺樹脂。
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| CN117384406A (zh) * | 2023-12-08 | 2024-01-12 | 苏州尊尔光电科技有限公司 | 高粘结性的透明聚酰亚胺薄膜、制备方法及用途 |
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| US5071997A (en) * | 1989-07-20 | 1991-12-10 | University Of Akron | Polyimides comprising substituted benzidines |
| US5484879A (en) * | 1990-12-17 | 1996-01-16 | Occidental Chemical Corporation | Polyimides containing fluorine |
| JP3048703B2 (ja) * | 1991-09-13 | 2000-06-05 | 鐘淵化学工業株式会社 | ポリアミック酸共重合体及びそれからなるポリイミドフィルム |
| JP3635384B2 (ja) * | 1996-10-29 | 2005-04-06 | 株式会社カネカ | 耐熱性ボンディングシート |
| JP2004182757A (ja) * | 2002-11-29 | 2004-07-02 | Kanegafuchi Chem Ind Co Ltd | ポリイミド樹脂及び該ポリイミド樹脂の製造方法 |
| JP2004252373A (ja) * | 2003-02-21 | 2004-09-09 | Kanegafuchi Chem Ind Co Ltd | 液晶配向膜用ポリイミド樹脂 |
| JP2006013419A (ja) * | 2004-05-21 | 2006-01-12 | Manac Inc | フレキシブルプリント基板およびその製造方法 |
| JP2006137881A (ja) * | 2004-11-12 | 2006-06-01 | Kaneka Corp | 可溶性ポリイミド及び光学補償部材 |
| CN101423609B (zh) * | 2008-10-21 | 2010-12-01 | 东华大学 | 一种含活性乙烯基聚酰亚胺粉末的制备方法 |
| JP2011051203A (ja) | 2009-09-01 | 2011-03-17 | Toyobo Co Ltd | 多層ポリイミドフィルムおよびプリント配線板 |
| CN102576735B (zh) * | 2009-09-30 | 2016-01-20 | 大日本印刷株式会社 | 挠性装置用基板、挠性装置用薄膜晶体管基板、挠性装置、薄膜元件用基板、薄膜元件、薄膜晶体管、薄膜元件用基板的制造方法、薄膜元件的制造方法及薄膜晶体管的制造方法 |
| JP5667392B2 (ja) * | 2010-08-23 | 2015-02-12 | 株式会社カネカ | 積層体、及びその利用 |
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| TWI568795B (zh) * | 2011-09-29 | 2017-02-01 | 日產化學工業股份有限公司 | 顯示基板用樹脂組成物 |
| TWI545148B (zh) * | 2014-08-29 | 2016-08-11 | 達邁科技股份有限公司 | 低介電聚醯亞胺膜及其製成方法 |
| TWI490274B (zh) * | 2014-10-29 | 2015-07-01 | Mortech Corp | 聚醯亞胺基聚合物、應用聚醯亞胺基聚合物之聚醯亞胺膜與應用聚醯亞胺基聚合物之聚醯亞胺積層板 |
-
2015
- 2015-07-07 TW TW104121999A patent/TWI544031B/zh active
- 2015-08-17 KR KR1020150115427A patent/KR101740802B1/ko active Active
- 2015-10-15 CN CN201510665169.3A patent/CN106336511B/zh active Active
- 2015-11-27 JP JP2015231245A patent/JP6129285B2/ja active Active
- 2015-11-30 US US14/954,767 patent/US20170009017A1/en not_active Abandoned
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11359051B2 (en) | 2017-03-03 | 2022-06-14 | Ems-Patent Ag | Microwave-resistant mouldings |
| TWI796320B (zh) * | 2017-03-03 | 2023-03-21 | 瑞士商Ems化學股份有限公司 | 非晶或微晶共聚醯胺模製化合物之用途 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR101740802B1 (ko) | 2017-06-08 |
| JP2017019986A (ja) | 2017-01-26 |
| TW201702312A (zh) | 2017-01-16 |
| US20170009017A1 (en) | 2017-01-12 |
| CN106336511A (zh) | 2017-01-18 |
| JP6129285B2 (ja) | 2017-05-17 |
| KR20170006231A (ko) | 2017-01-17 |
| CN106336511B (zh) | 2019-01-25 |
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