[go: up one dir, main page]

TWI435045B - Heat dissipation structure for heat dissipation device - Google Patents

Heat dissipation structure for heat dissipation device Download PDF

Info

Publication number
TWI435045B
TWI435045B TW100149677A TW100149677A TWI435045B TW I435045 B TWI435045 B TW I435045B TW 100149677 A TW100149677 A TW 100149677A TW 100149677 A TW100149677 A TW 100149677A TW I435045 B TWI435045 B TW I435045B
Authority
TW
Taiwan
Prior art keywords
heat dissipation
heat
whisker
chamber
section
Prior art date
Application number
TW100149677A
Other languages
Chinese (zh)
Other versions
TW201326718A (en
Inventor
Hsiu Wei Yang
Chih Yeh Lin
Original Assignee
Asia Vital Components Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asia Vital Components Co Ltd filed Critical Asia Vital Components Co Ltd
Priority to TW100149677A priority Critical patent/TWI435045B/en
Publication of TW201326718A publication Critical patent/TW201326718A/en
Application granted granted Critical
Publication of TWI435045B publication Critical patent/TWI435045B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28DHEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28DHEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D15/00Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies
    • F28D15/02Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes
    • F28D15/04Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with tubes having a capillary structure
    • F28D15/046Heat-exchange apparatus with the intermediate heat-transfer medium in closed tubes passing into or through the conduit walls ; Heat-exchange apparatus employing intermediate heat-transfer medium or bodies in which the medium condenses and evaporates, e.g. heat pipes with tubes having a capillary structure characterised by the material or the construction of the capillary structure
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28FDETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F13/00Arrangements for modifying heat-transfer, e.g. increasing, decreasing
    • F28F13/003Arrangements for modifying heat-transfer, e.g. increasing, decreasing by using permeable mass, perforated or porous materials
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28FDETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F13/00Arrangements for modifying heat-transfer, e.g. increasing, decreasing
    • F28F13/14Arrangements for modifying heat-transfer, e.g. increasing, decreasing by endowing the walls of conduits with zones of different degrees of conduction of heat
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28FDETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F13/00Arrangements for modifying heat-transfer, e.g. increasing, decreasing
    • F28F13/18Arrangements for modifying heat-transfer, e.g. increasing, decreasing by applying coatings, e.g. radiation-absorbing, radiation-reflecting; by surface treatment, e.g. polishing
    • F28F13/185Heat-exchange surfaces provided with microstructures or with porous coatings
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28HEAT EXCHANGE IN GENERAL
    • F28FDETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
    • F28F2215/00Fins
    • F28F2215/04Assemblies of fins having different features, e.g. with different fin densities

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Dispersion Chemistry (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Cooling Or The Like Of Electrical Apparatus (AREA)

Description

散熱裝置之散熱結構 Heat dissipation structure of heat sink

一種散熱裝置之散熱結構,尤指一種可提升散熱裝置內部工作流體汽液循環效率的散熱裝置之散熱結構。 A heat dissipating structure of a heat dissipating device, in particular, a heat dissipating structure of a heat dissipating device capable of improving the vapor-liquid circulation efficiency of a working fluid inside the heat dissipating device.

現行電子設備內部為講求高散熱效率已大量選擇熱管、均溫板、環路熱管、熱交換器等熱傳元件進行熱傳導工作。 In the current electronic equipment, in order to achieve high heat dissipation efficiency, heat transfer devices such as heat pipes, temperature equalizing plates, loop heat pipes, and heat exchangers have been selected for heat conduction.

並,該等熱傳元件其熱傳導率是銅、鋁等金屬的數倍至數十倍左右而相當的優異,因此是作為冷卻用元件而被運用於各種熱對策相關機器。從形狀來看,熱管可分成圓管形狀的熱管、扁平形狀及D型形狀的熱管。為了冷卻CPU或其他因執行運算或工作而產生熱之電子零件等的電子機器的被冷卻零件,基於容易安裝於被冷卻零件且能獲得寬廣接觸面積的觀點,也採用均溫板或扁平型熱管或薄型熱交換器來進行散熱。隨著冷卻機構的小型化、省空間化,在使用熱管的冷卻機構的情況,更有嚴格要求該熱管的極薄型化之必要。 In addition, since these heat transfer elements are excellent in electrical conductivity of several times to several tens of times of metals such as copper and aluminum, they are used as various components for heat countermeasures as components for cooling. From the shape, the heat pipe can be divided into a heat pipe in the shape of a circular pipe, a heat pipe having a flat shape and a D shape. In order to cool a CPU or other cooled parts of an electronic device that generates hot electronic parts or the like by performing calculations or work, a temperature equalizing plate or a flat type heat pipe is also adopted from the viewpoint of easy attachment to a cooled part and a wide contact area. Or a thin heat exchanger for heat dissipation. With the miniaturization and space saving of the cooling mechanism, in the case of using a cooling mechanism of the heat pipe, it is more necessary to strictly reduce the thickness of the heat pipe.

所述該等熱傳元件內部工作流體欲進行汽液循環時,其內部需設置具有毛細力之毛細結構(溝槽、金屬網格體結構、燒結結構等),使得令工作流體得以順利於該熱傳元件進行汽液循環之工作。 When the internal working fluid of the heat transfer elements is to be subjected to vapor-liquid circulation, a capillary structure having a capillary force (groove, metal mesh structure, sintered structure, etc.) is required inside, so that the working fluid can be smoothly operated. The heat transfer element performs the work of vapor-liquid circulation.

若該等熱傳元件需使用於較為窄小之處,則勢必需製成薄型化,而該內部之毛細結構則將會是除了熱傳元件本身厚度問題外,令該熱傳元件無法製成薄型化最主要之問題。 If the heat transfer elements are to be used in a relatively narrow area, they must be made thinner, and the internal capillary structure will be made in addition to the thickness of the heat transfer element itself, so that the heat transfer element cannot be made. The main problem of thinning.

再者,製成薄型化後之毛細結構則會因薄型化後其毛細力亦 下降,影響該熱傳元件之內部工作流體汽液循環效率進而令熱傳導效率大幅降低,故習知技術具有下列缺點:1.熱傳效率不佳;2.熱傳元件薄型化有限。 Furthermore, the capillary structure after being made thinner will also have a capillary force after being thinned. The drop affects the internal working fluid vapor-liquid circulation efficiency of the heat transfer element and further reduces the heat transfer efficiency. Therefore, the prior art has the following disadvantages: 1. The heat transfer efficiency is poor; 2. The heat transfer element is limited in thickness.

爰此,為解決上述習知技術之缺點,本發明之主要目的,係提供一種可提升導熱及散熱效率的散熱裝置之散熱結構。 Therefore, in order to solve the above disadvantages of the prior art, the main object of the present invention is to provide a heat dissipation structure of a heat dissipation device capable of improving heat conduction and heat dissipation efficiency.

本發明次要目的係提供一種提升薄型化之散熱裝置其內部工作流體汽液循環的散熱裝置之散熱結構。 A secondary object of the present invention is to provide a heat dissipation structure for a heat dissipating device that enhances the internal working fluid vapor-liquid circulation of a thinned heat sink.

為達上述之目的,本發明係提供一散熱裝置之散熱結構,係包含:一散熱裝置本體具有一腔室,所述腔室設有至少一鬚晶結構層及一工作流體,該鬚晶(Whisker)結構層延伸設於該腔室內壁。 In order to achieve the above object, the present invention provides a heat dissipating structure for a heat dissipating device, comprising: a heat dissipating device body having a chamber, the chamber being provided with at least one whisker structure layer and a working fluid, the whisker ( The Whisker) structural layer extends over the interior walls of the chamber.

所述散熱裝置本體係可為熱管及環路熱管及平板式熱管及均溫板及熱交換器其中任一。 The heat dissipating device may be any one of a heat pipe and a loop heat pipe, a flat plate heat pipe, a temperature equalizing plate and a heat exchanger.

所述鬚晶結構層係可大幅提升該散熱裝置本體內部工作流體之汽液循環之效率,並因其結構縝密,令該散熱裝置薄型化時仍可維持其毛細力,令散熱裝置本體內部工作流體得以順利進行汽液循環。 The whisker structure layer can greatly improve the efficiency of the vapor-liquid circulation of the working fluid in the heat dissipating device body, and because the structure is dense, the heat-dissipating device can maintain the capillary force when the heat-dissipating device is thinned, so that the heat-dissipating device body The working fluid is able to smoothly carry out the vapor-liquid circulation.

本發明之上述目的及其結構與功能上的特性,將依據所附圖式之較佳實施例予以說明。 The above object of the present invention, as well as its structural and functional features, will be described in accordance with the preferred embodiments of the drawings.

請參閱第1、2、2A圖,係為本發明之散熱裝置之散熱結構第一實施例之立體及A-A剖視及局部放大圖,如圖所示,所述散熱 裝置之散熱結構,係包含:一具有一腔室11之散熱裝置本體1,所述腔室11設有至少一鬚晶結構層111及一工作流體112,該鬚晶(Whisker)結構層111係完整或局部的延伸置設於該腔室11內壁,該鬚晶結構層111係由複數鬚晶(Whisker)單體所構成,該鬚晶單體之一端係為固結端被設置於該腔室11內壁上,其另一端朝腔室11內部延伸形成自由端,該自由端係為銳狀者(參閱附件一)。 Please refer to Figures 1, 2 and 2A, which are perspective and A-A cross-sectional views and a partial enlarged view of the first embodiment of the heat dissipation structure of the heat sink of the present invention. The heat dissipation structure of the device comprises: a heat sink body 1 having a chamber 11 provided with at least one whisker structure layer 111 and a working fluid 112, the whisker structure layer 111 a complete or partial extension is disposed on the inner wall of the chamber 11. The whisker structure layer 111 is composed of a plurality of whisker monomers, and one end of the whisker monomer is a fixed end. The inner wall of the chamber 11 has the other end extending toward the inside of the chamber 11 to form a free end which is sharp (see Annex 1).

所述散熱裝置本體1係為均溫板及平板式熱管及環路熱管及熱交換器其中任一,本發明係以平板式熱管作為說明,但並不引以為限,並所述腔室11內壁係為平滑壁面。 The heat dissipating device body 1 is a temperature equalizing plate, a flat plate heat pipe, a loop heat pipe and a heat exchanger. The present invention is a flat heat pipe as an illustration, but is not limited thereto, and the chamber is not limited thereto. 11 The inner wall is a smooth wall.

請參閱第3圖,係為本發明之散熱裝置之散熱結構第二實施例之剖視圖,如圖所示,本實施例散熱裝置本體1係以熱管作為說明,但並不引以為限,該鬚晶結構層111軸向延伸設於該熱管之腔室11內壁。 FIG. 3 is a cross-sectional view showing a second embodiment of the heat dissipation structure of the heat dissipation device of the present invention. As shown in the figure, the heat dissipation device body 1 of the present embodiment is illustrated by a heat pipe, but is not limited thereto. The whisker structure layer 111 extends axially on the inner wall of the chamber 11 of the heat pipe.

請參閱第4圖,係為本發明之散熱裝置之散熱結構第三實施例之剖視圖,如圖所示,本實施例散熱裝置本體1係以熱管作為說明,但並不引以為限,所述腔室11更具有至少一第一區段113及一第二區段114及一第三區段115,所述第一、二、三區段113、114、115相互連接,所述鬚晶結構層111係選擇設置於所述第一區段113、第二區段114及第三區段115其中任一,本實施例係將鬚晶結構層111僅設置於該第二區段114,但並不引以為限。 FIG. 4 is a cross-sectional view showing a third embodiment of the heat dissipation structure of the heat dissipation device of the present invention. As shown in the figure, the heat dissipation device body 1 of the present embodiment is illustrated by a heat pipe, but is not limited thereto. The chamber 11 further has at least a first section 113 and a second section 114 and a third section 115. The first, second and third sections 113, 114, 115 are connected to each other. The structural layer 111 is selectively disposed in any one of the first segment 113, the second segment 114, and the third segment 115. In this embodiment, the whisker structure layer 111 is disposed only in the second segment 114. But it is not limited.

請參閱第5圖,係為本發明之散熱裝置之散熱結構第四實施 例之剖視圖,如圖所示,本實施例係與前述第三實施例部分結構相同,故在此將不再贅述,惟本實施例與前述第三實施例之不同處係為所述腔室11更設有一鍍膜2(具有超親水性及超疏水性之特性),該鍍膜2係選擇設置於所述第一區段113及第二區段114及第三區段115其中任一,本實施例該鍍膜2係設置於該第三區段115。 Please refer to FIG. 5, which is a fourth implementation of the heat dissipation structure of the heat dissipation device of the present invention. The cross-sectional view of the embodiment is the same as that of the third embodiment described above, and therefore will not be described again here, but the difference between the present embodiment and the foregoing third embodiment is the chamber. 11 is further provided with a coating 2 (having a characteristic of super-hydrophilicity and super-hydrophobicity), and the coating 2 is selectively disposed in any one of the first section 113 and the second section 114 and the third section 115. Embodiment The coating 2 is disposed in the third section 115.

請參閱第6圖,係為本發明之散熱裝置之散熱結構第五實施例之剖視圖,如圖所示,本實施例係與前述第三實施例部分結構相同,故在此將不再贅述,惟本實施例與前述第三實施例之不同處係為所述腔室11更具有一鍍膜2,該鍍膜2同時設置於所述第一區段113及第三區段115。 FIG. 6 is a cross-sectional view showing a fifth embodiment of the heat dissipation structure of the heat dissipation device of the present invention. As shown in the figure, the embodiment is identical to the structure of the third embodiment, and thus will not be further described herein. The difference between this embodiment and the foregoing third embodiment is that the chamber 11 further has a coating 2, and the coating 2 is simultaneously disposed on the first section 113 and the third section 115.

請參閱第7圖,係為本發明之散熱裝置之散熱結構第六實施例之剖視圖,如圖所示,本實施例係與前述第二實施例部分結構相同,故在此將不再贅述,惟本實施例與前述第二實施例之不同處係為所述腔室11內壁與該鬚晶結構層111間更具有一毛細結構3,所述所述毛細結構3係為燒結粉末及網格體及纖維體及多孔性結構體及溝槽其中任一,或其兩兩相加組合,本實施例係以溝槽作為說明但並不引以為限,所述溝槽凹設於該腔室11內壁,並該鬚晶結構層111同時披附於該溝槽及腔室11內壁。 FIG. 7 is a cross-sectional view showing a sixth embodiment of the heat dissipation structure of the heat dissipation device of the present invention. As shown in the figure, the embodiment is identical to the second embodiment, and therefore will not be described again. The difference between this embodiment and the foregoing second embodiment is that there is a capillary structure 3 between the inner wall of the chamber 11 and the whisker structure layer 111, and the capillary structure 3 is a sintered powder and a mesh. The grid body and the fibrous body and the porous structure and the groove are added or combined, and the embodiment is not limited by the groove, and the groove is recessed in the The inner wall of the chamber 11 and the whisker structure layer 111 are simultaneously attached to the inner wall of the groove and the chamber 11.

請參閱第8圖,係為本發明之散熱裝置之散熱結構第七實施例之剖視圖,如圖所示,本實施例係與前述第二實施例部分結構相同,故在此將不再贅述,惟本實施例與前述第二實施例之不同 處係為所述腔室11內壁與該鬚晶結構層111間更具有一鍍膜2。 FIG. 8 is a cross-sectional view showing a seventh embodiment of the heat dissipation structure of the heat dissipation device of the present invention. As shown in the figure, the embodiment is identical to the second embodiment, and thus will not be described again. However, this embodiment is different from the foregoing second embodiment. There is a coating 2 between the inner wall of the chamber 11 and the whisker structure layer 111.

請參閱第9圖,係為本發明之散熱裝置之散熱結構第八實施例之剖視圖,如圖所示,本實施例係與前述第三實施例部分結構相同,故在此將不再贅述,惟本實施例與前述第三實施例之不同處係為所述腔室11更具有至少一第一區段113及一第二區段114及一第三區段115,所述第一、二、三區段113、114、115相互連接,所述第二區段114上之鬚晶結構層111係分佈較密。 FIG. 9 is a cross-sectional view showing the eighth embodiment of the heat dissipation structure of the heat dissipation device of the present invention. As shown in the figure, the embodiment is identical to the structure of the third embodiment, and therefore will not be described again. The difference between the embodiment and the foregoing third embodiment is that the chamber 11 further has at least a first section 113 and a second section 114 and a third section 115, the first and second sections. The three segments 113, 114, 115 are connected to each other, and the whisker structure layer 111 on the second segment 114 is densely distributed.

請參閱第10圖,係為本發明之散熱裝置之散熱結構第九實施例之剖視圖,如圖所示,本實施例係與前述第三實施例部分結構相同,故在此將不再贅述,惟本實施例與前述第三實施例之不同處係為所述腔室11更具有至少一第一區段113及一第二區段114及一第三區段115,所述第一、二、三區段113、114、115相互連接,所述第一、三區段113、115上之鬚晶結構層111係分佈較密。 FIG. 10 is a cross-sectional view showing a ninth embodiment of the heat dissipation structure of the heat dissipation device of the present invention. As shown in the figure, the embodiment is identical to the structure of the third embodiment, and thus will not be further described herein. The difference between the embodiment and the foregoing third embodiment is that the chamber 11 further has at least a first section 113 and a second section 114 and a third section 115, the first and second sections. The three segments 113, 114, and 115 are connected to each other, and the whisker structure layer 111 on the first and third segments 113 and 115 is densely distributed.

於該熱管及均溫板及平板式熱管及環路熱管中將其內部設置鬚晶結構層111,該鬚晶結構層111係可改變該工作流體112於其內部之表面張力,加快回流速度而具有極佳之汽液循環效率,藉以大幅提升熱傳效能者。 In the heat pipe and the temperature equalizing plate and the flat heat pipe and the loop heat pipe, a whisker structure layer 111 is disposed inside, and the whisker structure layer 111 can change the surface tension of the working fluid 112 in the interior thereof to accelerate the reflow speed. It has excellent vapor-liquid circulation efficiency, which can greatly improve the heat transfer efficiency.

所述鬚晶結構層111係參閱(附件一)附件一為鬚晶結構層111掃瞄式電子顯微鏡之影像圖,所述鬚晶結構層111係可披附於另一毛細結構上。 The whisker structure layer 111 is referred to (Attachment 1). Attachment 1 is an image of a whisker structure layer 111 scanning electron microscope, and the whisker structure layer 111 can be attached to another capillary structure.

1‧‧‧散熱裝置本體 1‧‧‧heat sink body

11‧‧‧腔室 11‧‧‧ chamber

111‧‧‧鬚晶結構層 111‧‧‧ whisker structure

112‧‧‧工作流體 112‧‧‧Working fluid

113‧‧‧第一區段 113‧‧‧First section

114‧‧‧第二區段 114‧‧‧Second section

115‧‧‧第三區段 115‧‧‧ third section

2‧‧‧鍍膜 2‧‧‧ coating

3‧‧‧毛細結構 3‧‧‧Capillary structure

第1圖係為本發明之散熱裝置之散熱結構第一實施例之立體圖; 第2圖係為本發明之散熱裝置之散熱結構第一實施例之A-A剖視圖;第2A圖係為本發明之散熱裝置之散熱結構第一實施例之A-A剖視之局部放大圖;第3圖係為本發明之散熱裝置之散熱結構第二實施例之剖視圖;第4圖係為本發明之散熱裝置之散熱結構第三實施例之剖視圖;第5圖係為本發明之散熱裝置之散熱結構第四實施例之剖視圖;第6圖係為本發明之散熱裝置之散熱結構第五實施例之剖視圖;第7圖係為本發明之散熱裝置之散熱結構第六實施例之剖視圖;第8圖係為本發明之散熱裝置之散熱結構第七實施例之剖視圖;第9圖係為本發明之散熱裝置之散熱結構第八實施例之剖視圖;第10圖係為本發明之散熱裝置之散熱結構第九實施例之剖視圖;附件一係為鬚晶結構層掃瞄式電子顯微鏡影像圖。 1 is a perspective view of a first embodiment of a heat dissipation structure of a heat sink of the present invention; 2 is a cross-sectional view of the first embodiment of the heat dissipation structure of the heat dissipation device of the present invention; FIG. 2A is a partial enlarged view of the first embodiment of the heat dissipation structure of the heat dissipation device of the present invention; FIG. FIG. 4 is a cross-sectional view showing a third embodiment of the heat dissipation structure of the heat dissipation device of the present invention; FIG. 4 is a cross-sectional view showing a heat dissipation structure of the heat dissipation device of the present invention; FIG. 6 is a cross-sectional view showing a fifth embodiment of a heat dissipation structure of a heat dissipation device according to the present invention; and FIG. 7 is a cross-sectional view showing a sixth embodiment of a heat dissipation structure of the heat dissipation device of the present invention; FIG. 9 is a cross-sectional view showing a heat dissipation structure of a heat dissipation device according to a seventh embodiment of the present invention; FIG. 9 is a cross-sectional view showing a heat dissipation structure of the heat dissipation device of the present invention; FIG. 10 is a heat dissipation structure of the heat dissipation device of the present invention. A cross-sectional view of the ninth embodiment; the attachment 1 is a scanning electron microscope image of the whisker structure layer.

1‧‧‧散熱裝置本體 1‧‧‧heat sink body

11‧‧‧腔室 11‧‧‧ chamber

111‧‧‧鬚晶結構層 111‧‧‧ whisker structure

112‧‧‧工作流體 112‧‧‧Working fluid

Claims (9)

一種散熱裝置之散熱結構,係包含:一散熱裝置本體,具有一腔室,所述腔室設有至少一鬚晶結構層及一工作流體,該鬚晶結構層局部延伸設於該腔室內壁,所述散熱裝置本體係為一熱管,該腔室更具有至少一第一區段及一第二區段及一第三區段,所述第一、二、三區段相互連接,所述鬚晶結構層係單一或同時設置於該所述第一、二、三區段其中任一區段,所述鬚晶結構層係由複數鬚晶單體所構成,該鬚晶單體之一端係為固結端被設置於該腔室內壁上,其另一端朝腔室內部延伸形成自由端,該自由端係為銳狀者。 A heat dissipating structure of a heat dissipating device comprises: a heat dissipating device body having a chamber, wherein the chamber is provided with at least one whisker structure layer and a working fluid, and the whisker layer is partially extended on the inner wall of the chamber The heat dissipating device is a heat pipe, the chamber further has at least a first section and a second section and a third section, the first, second and third sections are connected to each other, The whisker structure layer is disposed singly or simultaneously in any one of the first, second, and third segments, and the whisker structure layer is composed of a plurality of whisker monomers, one end of the whisker monomer The fixed end is disposed on the inner wall of the chamber, and the other end thereof extends toward the inner portion of the chamber to form a free end, and the free end is sharp. 如申請專利範圍第1項所述之散熱裝置之散熱結構,其中所述腔室內壁係為平滑壁面。 The heat dissipation structure of the heat dissipation device according to claim 1, wherein the inner wall of the chamber is a smooth wall surface. 如申請專利範圍第1項所述之散熱裝置之散熱結構,其中所述腔室更具有一鍍膜,該鍍膜係選擇設置於所述第一區段、第二區段及第三區段其中任一。 The heat dissipation structure of the heat dissipating device of claim 1, wherein the chamber further has a plating film, and the coating film is selected to be disposed in the first section, the second section, and the third section. One. 如申請專利範圍第1項所述之散熱裝置之散熱結構,其中所述散熱裝置本體係為均溫板及熱管及環路熱管及熱交換器其中任一。 The heat dissipation structure of the heat dissipation device according to claim 1, wherein the heat dissipation device is any one of a temperature equalization plate and a heat pipe and a loop heat pipe and a heat exchanger. 如申請專利範圍第1項所述之散熱裝置之散熱結構,其中所述腔室之內壁與該鬚晶結構層間更具有一毛細結構。 The heat dissipation structure of the heat dissipation device according to claim 1, wherein the inner wall of the chamber and the whisker structure layer have a capillary structure. 如申請專利範圍第1項所述之散熱裝置之散熱結構,其中所述所述毛細結構係為燒結粉末及網格體及纖維體及多孔性結構 體及溝槽其中任一。 The heat dissipation structure of the heat dissipation device according to claim 1, wherein the capillary structure is a sintered powder, a mesh body, a fiber body, and a porous structure. Any of the body and the groove. 如申請專利範圍第1項所述之散熱裝置之散熱結構,其中所述散熱裝置本體係為一熱管,該鬚晶結構層軸向延伸設於該熱管之腔室內壁。 The heat dissipation structure of the heat dissipation device of claim 1, wherein the heat dissipation device is a heat pipe, and the whisker structure layer is axially extended on the inner wall of the heat pipe. 如申請專利範圍第1項所述之散熱裝置之散熱結構,其中所述第二區段上之鬚晶結構層係分佈較密者。 The heat dissipation structure of the heat dissipation device according to claim 1, wherein the whisker structure layer on the second section is densely distributed. 如申請專利範圍第1項所述之散熱裝置之散熱結構,其中所述第一區段及第三區段之鬚晶結構層係分佈較密者。 The heat dissipation structure of the heat dissipation device of claim 1, wherein the first and third sections of the heat dissipation structure are densely distributed.
TW100149677A 2011-12-29 2011-12-29 Heat dissipation structure for heat dissipation device TWI435045B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW100149677A TWI435045B (en) 2011-12-29 2011-12-29 Heat dissipation structure for heat dissipation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW100149677A TWI435045B (en) 2011-12-29 2011-12-29 Heat dissipation structure for heat dissipation device

Publications (2)

Publication Number Publication Date
TW201326718A TW201326718A (en) 2013-07-01
TWI435045B true TWI435045B (en) 2014-04-21

Family

ID=49224925

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100149677A TWI435045B (en) 2011-12-29 2011-12-29 Heat dissipation structure for heat dissipation device

Country Status (1)

Country Link
TW (1) TWI435045B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112393634B (en) * 2019-08-12 2022-01-28 中北大学 Waste heat utilization loop heat pipe system

Also Published As

Publication number Publication date
TW201326718A (en) 2013-07-01

Similar Documents

Publication Publication Date Title
TWI443944B (en) Thin hot plate structure
US20130213612A1 (en) Heat pipe heat dissipation structure
TW202026583A (en) Heatsink
TW201937126A (en) Heat sink device
CN216960588U (en) Heat dissipation device and electronic equipment
US9802240B2 (en) Thin heat pipe structure and manufacturing method thereof
US20130306275A1 (en) Heat dissipation structure for heat dissipation device
CN103185476B (en) Heat dissipation structure of heat dissipation unit
US20130306274A1 (en) Heat dissipation structure for heat dissipation unit
TWM452370U (en) Heat dissipation device
TWI435045B (en) Heat dissipation structure for heat dissipation device
CN102646651A (en) Thin type hot plate structure
US20130213609A1 (en) Heat pipe structure
WO2017117937A1 (en) Heat dissipation device for chip
CN104168739A (en) Supporting structure of heat dissipation unit
TWI477729B (en) Heat dissipation structure of heat dissipation unit
TWI593930B (en) Heat dissipation structure for heat dissipation unit
US20130126131A1 (en) Heat pipe structure
JP3174870U (en) Heat dissipation structure of heat dissipation device
TWM429083U (en) Heat dissipation structure of cooling device
TW202329799A (en) Heat dissipating device and heat dissipating device assembling method
CN202747869U (en) Heat dissipation structure of heat dissipation unit
US20130126133A1 (en) Heat pipe structure
CN103188917B (en) Heat dissipation structure of heat dissipation device
TWM619182U (en) Heat-dissipation module