TWI401006B - Printed circuit board and fabrication method thereof - Google Patents
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- TWI401006B TWI401006B TW97122637A TW97122637A TWI401006B TW I401006 B TWI401006 B TW I401006B TW 97122637 A TW97122637 A TW 97122637A TW 97122637 A TW97122637 A TW 97122637A TW I401006 B TWI401006 B TW I401006B
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- 238000004519 manufacturing process Methods 0.000 title claims description 33
- 238000000034 method Methods 0.000 title claims description 22
- 239000010410 layer Substances 0.000 claims description 617
- 229910000679 solder Inorganic materials 0.000 claims description 38
- 239000012792 core layer Substances 0.000 claims description 2
- 239000011241 protective layer Substances 0.000 claims 1
- 239000002184 metal Substances 0.000 description 21
- 239000000758 substrate Substances 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000011161 development Methods 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 238000005553 drilling Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 239000002893 slag Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
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- 238000010586 diagram Methods 0.000 description 1
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- 238000012827 research and development Methods 0.000 description 1
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Description
本發明係有關於一種電路板及其製法,尤指一種電路板之層間線路層的電性連接結構及其製法。 The invention relates to a circuit board and a manufacturing method thereof, in particular to an electrical connection structure of an interlayer circuit layer of a circuit board and a manufacturing method thereof.
隨著電子產業的蓬勃發展,電子產品亦逐漸邁入多功能、高性能的研發方向。為滿足半導體封裝件高積集度(Integration)以及微型化(Miniaturization)的封裝需求,承載半導體晶片之封裝基板,逐漸由雙層板演變成多層板(Multi-layer Board),俾於有限的空間下,藉由層間連接技術(Interlayer Connection)以擴大封裝基板上可利用的線路面積,以因應高電子密度之積體電路(Integrated Circuit)的使用需求;為此,遂發展出一種增層技術(build-up),亦即在一核心電路板(core circuit board)表面利用線路增層技術交互堆疊多層介電層及線路層,並於該介電層中開設導電盲孔(conductive via)以供上、下層線路之間電性連接。 With the rapid development of the electronics industry, electronic products have gradually entered the direction of multi-functional, high-performance research and development. In order to meet the packaging requirements of semiconductor package high integration and miniaturization, the package substrate carrying semiconductor wafers has gradually evolved from a double-layer board to a multi-layer board, which is limited to a limited space. Next, an interlayer connection technology (Interlayer Connection) is used to expand the available circuit area on the package substrate to meet the demand for the use of a high electron density integrated circuit; for this reason, a buildup technique has been developed ( Build-up), that is, a plurality of dielectric layers and circuit layers are alternately stacked on the surface of a core circuit board by a line build-up technique, and a conductive via is provided in the dielectric layer for The upper and lower lines are electrically connected.
為因應微處理器、晶片組、繪圖晶片與特殊應用積體電路(ASIC)等高效能晶片之運算需要,佈有線路之半導體封裝基板亦需提昇其傳遞晶片訊號、改善頻寬、控制阻抗等功能,以因應高I/O數封裝件的發展;且為符合半導體封裝件輕薄短小、多功能、高速度、高線路密度及高頻化的開發方向,封裝基板已朝向細線路及小孔徑發展;現有半導體封裝基板製程從傳統100微米之線路尺寸,已縮減 至現在的30微米以下,其中,包括導線寬度(line width)及線路間距(space)等持續朝向更小的線路精度進行研發。 In order to meet the computational needs of high-performance chips such as microprocessors, chipsets, graphics chips, and special application integrated circuits (ASICs), semiconductor package substrates with lines need to be upgraded to transmit chip signals, improve bandwidth, control impedance, etc. Function to meet the development of high I/O number package; and in order to meet the development direction of semiconductor package light, short, multi-function, high speed, high line density and high frequency, the package substrate has been developed towards fine lines and small apertures. Existing semiconductor package substrate process has been reduced from the traditional 100 micron line size Up to now, 30 micrometers or less, including line width and space, continue to be developed toward smaller line accuracy.
請參閱第1A至1G圖所示,係顯示習知封裝基板之製法,如第1A圖所示,提供一核心板10,該核心板10具有兩相對之表面10a,於該表面10a上形成有核心線路層101,並於該核心板10中形成有導電通孔102,以電性連接該核心板10表面10a之核心線路層101;如第1B圖所示,於該核心板10之表面10a及其上之核心線路層101上形成有第一介電層12a,且該第一介電層12a中形成有複數介電層開孔120a,以顯露部份之核心線路層101;如第1C圖所示,於該第一介電層12a上及其介電層開孔120a表面上形成有導電層13,且於該導電層13上形成有阻層14,並使該阻層14中形成有開口區140,以露出該導電層13之部份表面,且部份之開口區140對應各該介電層開孔120a;如第1D圖所示,於該阻層14之開口區140中的導電層13上電鍍形成有第一線路層15a,且於該第一介電層12a之介電層開孔120a中形成有第一導電盲孔151a,以電性連接至該核心線路層101;如第1E圖所示,移除該阻層14及其所覆蓋之導電層13,以露出該第一線路層15a;如第1F圖所示,於該第一線路層15a及第一介電層12a上形成有增層結構16,該增層結構16係包括有至少一第二介電層12b、形成於該第二介電層上之第二線路層15b、以及複數形成於該第三介電層之中並電 性連接該第二線路層之第二導電盲孔151b,其中部份之第二導電盲孔151b電性連接該第一線路層15a;如第1G圖所示,於該增層結構16最外層之第二線路層15b形成有複數電性接觸墊164,且於該增層結構16之最外層上形成有防焊層17,並於該防焊層17中形成有複數個防焊層開孔170以對應露出各該電性接觸墊164。 Referring to FIGS. 1A to 1G, a conventional package substrate is shown. As shown in FIG. 1A, a core board 10 is provided. The core board 10 has two opposite surfaces 10a, and the surface 10a is formed on the surface 10a. a core circuit layer 101, and a conductive via 102 is formed in the core board 10 to electrically connect the core circuit layer 101 of the surface 10a of the core board 10; as shown in FIG. 1B, on the surface 10a of the core board 10 A first dielectric layer 12a is formed on the core circuit layer 101, and a plurality of dielectric layer openings 120a are formed in the first dielectric layer 12a to expose a portion of the core circuit layer 101; As shown in the figure, a conductive layer 13 is formed on the surface of the first dielectric layer 12a and the dielectric layer opening 120a, and a resist layer 14 is formed on the conductive layer 13, and the resist layer 14 is formed. An open area 140 is formed to expose a portion of the surface of the conductive layer 13, and a portion of the open area 140 corresponds to each of the dielectric layer openings 120a; as shown in FIG. 1D, in the open area 140 of the resist layer 14. a first circuit layer 15a is formed on the conductive layer 13 and a first conductive layer is formed in the dielectric layer opening 120a of the first dielectric layer 12a. The blind hole 151a is electrically connected to the core circuit layer 101; as shown in FIG. 1E, the resist layer 14 and the conductive layer 13 covered thereon are removed to expose the first circuit layer 15a; as shown in FIG. As shown in the first circuit layer 15a and the first dielectric layer 12a, a build-up structure 16 is formed. The build-up structure 16 includes at least one second dielectric layer 12b formed on the second dielectric layer. a second circuit layer 15b thereon, and a plurality of layers formed in the third dielectric layer and electrically The second conductive via 151b is electrically connected to the second conductive layer 151b, wherein a portion of the second conductive via 151b is electrically connected to the first circuit layer 15a; as shown in FIG. 1G, at the outermost layer of the buildup structure 16 The second circuit layer 15b is formed with a plurality of electrical contact pads 164, and a solder resist layer 17 is formed on the outermost layer of the buildup structure 16, and a plurality of solder mask openings are formed in the solder resist layer 17. 170 to expose each of the electrical contact pads 164.
又該雷射鑽孔形成之介電層開孔120a係為外大內小之錐形孔,且於該錐形孔之底部因雷射形成有膠渣,使得該介電層開孔120a之孔壁、介電層開孔120a中之核心線路層101等表面與導電層13之間的結合性不佳,必須先進行去膠渣(Desmear)之製程,然後再形成線路;惟去膠渣製程未必能將膠渣完全去除,且當錐形孔之孔徑越小,則膠渣對後續再形成線路之結合性的影響越大;再者,該介電層開孔120a顯露該核心線路層101之底部的口徑較小,因而降低該第一導電盲孔151a與核心線路層101之接觸面積,使得該第一導電盲孔151a與核心線路層101之間的結合性降低,進而影響電性連接的可靠度。 Moreover, the dielectric layer opening 120a formed by the laser drilling is a small outer tapered hole, and a molten metal is formed at the bottom of the tapered hole, so that the dielectric layer opening 120a The bonding between the surface of the hole wall, the core circuit layer 101 in the dielectric layer opening 120a and the conductive layer 13 is not good, and the process of Desmear must be performed first, and then the line is formed; The process may not completely remove the slag, and the smaller the pore size of the tapered hole, the greater the influence of the slag on the subsequent re-formation of the line; further, the dielectric layer opening 120a reveals the core circuit layer. The bottom of the 101 has a small diameter, thereby reducing the contact area between the first conductive via 151a and the core wiring layer 101, so that the bonding between the first conductive via 151a and the core wiring layer 101 is reduced, thereby affecting electrical properties. The reliability of the connection.
且各該雷射鑽孔之精度及開孔的孔徑有其限制,並無法持續縮小,因而影響高密度佈線之使用需求,有礙於細線路製程能力之提升。 Moreover, the precision of each of the laser drilling holes and the aperture of the opening hole are limited, and cannot be continuously reduced, thereby affecting the use requirements of the high-density wiring, which hinders the improvement of the fine line process capability.
因此,如何提高形成於該介電層開孔中之導電盲孔與其電性連接之線路之間的結合強度、及縮小介電層開孔之孔徑以提高佈線密度,仍存在其技術瓶頸而有待克服。 Therefore, how to improve the bonding strength between the conductive blind vias formed in the openings of the dielectric layer and the lines electrically connected thereto, and to reduce the aperture of the dielectric layer openings to increase the wiring density, there is still a technical bottleneck get over.
鑑於以上所述習知技術之缺點,本發明之主要目的係提供一種電路板及其製法,能提高形成開孔之速度。 In view of the above-discussed shortcomings of the prior art, the main object of the present invention is to provide a circuit board and a method of manufacturing the same that can increase the speed at which openings are formed.
本發明之又一目的係提供一種電路板及其製法,能提高形成於該介電層開孔中之導電柱與其電性連接之線路之間的結合強度。 Another object of the present invention is to provide a circuit board and a method of manufacturing the same that can improve the bonding strength between a conductive post formed in an opening of the dielectric layer and a line electrically connected thereto.
本發明之再一目的係提供一種電路板及其製法,能縮小介電層開孔之孔徑以提高佈線密度。 Still another object of the present invention is to provide a circuit board and a method of fabricating the same that can reduce the aperture of the opening of the dielectric layer to increase the wiring density.
為達上述及其他目的,本發明揭露一種電路板,係包括:核心板,其具有相對之二表面,於該表面具有核心線路層;第一介電層,係設於該核心板上;第一線路層,係設於該第一介電層上,且於該第一介電層中設有導電盲孔,以電性連接該核心線路層;第二介電層,係設於該第一介電層及第一線路層上;複數第一導電柱,係設於該第二介電層中,並電性連接該第一線路層,且該第一導電柱之端面與第二介電層之表面齊平;以及第二線路層,係設於該第二介電層上,並具有複數電性連接墊以對應電性連接至各該第一導電柱上。 In order to achieve the above and other objects, the present invention discloses a circuit board comprising: a core board having opposite surfaces, having a core circuit layer on the surface; a first dielectric layer disposed on the core board; a circuit layer is disposed on the first dielectric layer, and a conductive via hole is disposed in the first dielectric layer to electrically connect the core circuit layer; the second dielectric layer is disposed on the first dielectric layer a dielectric layer and a first circuit layer; a plurality of first conductive pillars are disposed in the second dielectric layer, and electrically connected to the first circuit layer, and the end surface of the first conductive pillar and the second dielectric layer The surface of the electrical layer is flush; and the second circuit layer is disposed on the second dielectric layer and has a plurality of electrical connection pads for electrically connecting to the first conductive pillars.
依上述之電路板,該核心板中具有導電通孔以電性連接該核心板之兩表面上的核心線路層;該電性連接墊係大於、等於或小於該第一導電柱。 According to the above circuit board, the core board has conductive through holes for electrically connecting the core circuit layers on both surfaces of the core board; the electrical connection pads are greater than, equal to, or smaller than the first conductive pillars.
依上述之結構,復包括增層結構,係設於該第二介電層及第二線路層上,該增層結構係包括有至少一第三介電層、設於該第三介電層上之第三線路層、以及複數設於該第三介電層之中並電性連接該第二及第三線路層之第二 導電柱,該第三線路層復包括有複數電性連接墊,且該電性連接墊係形成於該第二導電柱上,又該電性連接墊係大於、等於或小於該第二導電柱。 According to the above structure, the multi-layer structure is provided on the second dielectric layer and the second circuit layer, and the build-up structure includes at least one third dielectric layer disposed on the third dielectric layer. a third circuit layer thereon, and a plurality of second dielectric layers disposed in the third dielectric layer and electrically connected to the second and third circuit layers a conductive pillar, the third circuit layer further comprising a plurality of electrical connection pads, wherein the electrical connection pads are formed on the second conductive pillar, and the electrical connection pads are greater than, equal to, or smaller than the second conductive pillar .
依上所述,復包括複數電性接觸墊,係設於該增層結構最外層之第三線路層,於該增層結構之最外層上設有防焊層,並於該防焊層中設有複數個防焊層開孔,以對應露出各該電性接觸墊。 According to the above, the plurality of electrical contact pads are disposed on the third circuit layer of the outermost layer of the buildup structure, and a solder resist layer is disposed on the outermost layer of the buildup structure, and in the solder resist layer A plurality of solder mask openings are provided to correspondingly expose the respective electrical contact pads.
本發明復一種電路板,係包括:核心板,係具有相對之二表面,於該表面具有核心線路層;第一介電層,係設於該核心板上;第一線路層,係設於該第一介電層中並與該第一介電層齊平,且該第一線路層具有複數第一導電孔,以電性連接至該核心線路層;複數第一導電柱,係設於該第一線路層上;以及增層結構,係設於該第一介電層、第一線路層、及第一導電柱上,該增層結構並具有第二線路層,且該第二線路層具有複數電性連接墊,以對應設於各該第一導電柱上。 The circuit board of the present invention comprises: a core board having opposite surfaces, having a core circuit layer on the surface; a first dielectric layer disposed on the core board; and a first circuit layer disposed on the core layer The first dielectric layer is flush with the first dielectric layer, and the first circuit layer has a plurality of first conductive holes electrically connected to the core circuit layer; the plurality of first conductive pillars are disposed on The first circuit layer; and the build-up structure is disposed on the first dielectric layer, the first circuit layer, and the first conductive pillar, the build-up structure has a second circuit layer, and the second circuit The layer has a plurality of electrical connection pads correspondingly disposed on each of the first conductive pillars.
依上述之電路板,該核心板中設有導電通孔以電性連接該核心板之兩表面上的核心線路層;該第一介電層設有複數第一開孔及第一開槽,且該第一開孔露出部份之核心線路層,該第一線路層係設於該第一開槽中,並具有設於各該第一開孔中之第一導電孔,以電性連接至該核心線路層,且該電性連接墊係大於、等於或小於該第一導電柱。 According to the above circuit board, the core board is provided with a conductive through hole for electrically connecting the core circuit layer on both surfaces of the core board; the first dielectric layer is provided with a plurality of first openings and a first slot. And the first opening is exposed in the core circuit layer, the first circuit layer is disposed in the first slot, and has a first conductive hole disposed in each of the first openings to be electrically connected Up to the core circuit layer, and the electrical connection pad is greater than, equal to, or smaller than the first conductive pillar.
依上述之結構,該增層結構係包括有至少一具有第二開槽之第二介電層、設於該第二介電層之第二開槽中之第 二線路層、以及複數設於該第二介電層中並電性連接該第二線路層之第二導電柱,又該第二線路層之表面與第二介電層之表面齊平,該第二線路層復包括有複數電性連接墊,且該些電性連接墊係對應設於各該第二導電柱上,且該電性連接墊係大於、等於或小於該第二導電柱。 According to the above structure, the build-up structure includes at least one second dielectric layer having a second slit, and a second dielectric layer disposed in the second dielectric layer a second circuit layer, and a plurality of second conductive pillars disposed in the second dielectric layer and electrically connected to the second circuit layer, wherein a surface of the second circuit layer is flush with a surface of the second dielectric layer, The second circuit layer further includes a plurality of electrical connection pads, and the electrical connection pads are correspondingly disposed on the second conductive pillars, and the electrical connection pads are greater than, equal to, or smaller than the second conductive pillars.
依上所述,復包括電性接觸墊,係設於該增層結構最外層之第二線路層,於該增層結構之最外層上設有防焊層,並設有複數防焊層開孔,以對應露出各該電性接觸墊。 According to the above, the electrical contact pad comprises a second circuit layer disposed on the outermost layer of the build-up structure, and a solder resist layer is disposed on the outermost layer of the build-up structure, and a plurality of solder resist layers are provided. Holes to correspondingly expose each of the electrical contact pads.
本發明復提供一種電路板之製法,係包括:提供一核心板,係具有相對之二表面,於該表面上具有核心線路層;於該核心板上形成有第一介電層;於該第一介電層上形成有第一線路層,並於該第一介電層中形成有導電盲孔,以電性連接該核心線路層;於部份之第一線路層上電鍍形成有第一導電柱;於該第一介電層、第一線路層及第一導電柱上形成有第二介電層;移除部份之第二介電層,以露出該第一導電柱之端面;於該第二介電層及導電柱之端面上形成有第二導電層;於該第二導電層上形成有第三阻層,且於該第三阻層中形成有複數第三開口區,以露出部份之第二導電層,且部份之第三開口區對應該第一導電柱之端面上的第二導電層;於該第三開口區中形成有具有複數電性連接墊之第二線路層,使該些電性連接墊對應電性連接至各該第一導電柱;以及移除該第三阻層及其所覆蓋之第二導電層。 The invention provides a method for manufacturing a circuit board, comprising: providing a core board having opposite surfaces, having a core circuit layer on the surface; forming a first dielectric layer on the core board; a first circuit layer is formed on a dielectric layer, and a conductive via hole is formed in the first dielectric layer to electrically connect the core circuit layer; and a first layer is formed on the first circuit layer. a conductive pillar; a second dielectric layer is formed on the first dielectric layer, the first wiring layer and the first conductive pillar; and a portion of the second dielectric layer is removed to expose an end surface of the first conductive pillar; a second conductive layer is formed on an end surface of the second dielectric layer and the conductive pillar; a third resist layer is formed on the second conductive layer, and a plurality of third open regions are formed in the third resistive layer, a portion of the second conductive layer is exposed, and a portion of the third open region corresponds to the second conductive layer on the end surface of the first conductive pillar; and a plurality of electrical connection pads are formed in the third open region a second circuit layer, the electrical connection pads are electrically connected to each of the first conductive columns; And the third barrier layer and the second conductive layer is covered removed.
依上述電路板之製法,該核心板中形成有導電通孔以 電性連接該核心板之兩表面上的核心線路層。 According to the manufacturing method of the above circuit board, a conductive via hole is formed in the core board to Electrically connecting the core circuit layers on both surfaces of the core board.
又依上述之製法,該第一線路層及第一導電柱之製法,係包括:於該第一介電層中形成有複數盲孔,以露出部份之核心線路層;於該第一介電層、盲孔之孔壁、及部份之核心線路層上形成有第一導電層;於該第一導電層上形成有第一阻層,且該第一阻層中形成有第一開口區以露出部份之第一導電層,且部份第一開口區對應該盲孔及其孔端周圍之第一導電層;於該第一開口區中形成有第一線路層,並於該盲孔中形成有導電盲孔,以電性連接該核心線路層;於該第一阻層及第一線路層上形成有第二阻層,且該第二阻層中形成有第二開口區,以露出部份之第一線路層;於該第二開口區中電鍍形成有第一導電柱;以及移除該第二阻層、第一阻層及其所覆蓋之第一導電層。 According to the above method, the first circuit layer and the first conductive pillar are formed by: forming a plurality of blind holes in the first dielectric layer to expose a portion of the core circuit layer; a first conductive layer is formed on the electrical layer, the hole wall of the blind hole, and a portion of the core circuit layer; a first resist layer is formed on the first conductive layer, and a first opening is formed in the first resist layer a portion of the first conductive layer is exposed, and a portion of the first opening region corresponds to the first conductive layer around the blind hole and the hole end thereof; a first circuit layer is formed in the first opening region, and a conductive via hole is formed in the blind via to electrically connect the core circuit layer; a second resist layer is formed on the first resist layer and the first circuit layer, and a second open region is formed in the second resist layer And exposing a portion of the first circuit layer; forming a first conductive pillar in the second opening region; and removing the second resist layer, the first resist layer and the first conductive layer covered thereby.
復包括於該第二介電層及第二線路層上形成有增層結構,該增層結構係包括有至少一第三介電層、形成於該第三介電層上之第三線路層、以及複數形成於該第三介電層之中並電性連接該第二及第三線路層之第二導電柱,又該第三線路層復包括有複數電性連接墊,且該些電性連接墊係對應形成於各該第二導電柱上,且該電性連接墊係大於、等於或小於該第二導電柱。 Forming a build-up structure on the second dielectric layer and the second circuit layer, the build-up structure comprising at least one third dielectric layer, and a third circuit layer formed on the third dielectric layer And a plurality of second conductive pillars formed in the third dielectric layer and electrically connected to the second and third circuit layers, wherein the third circuit layer further comprises a plurality of electrical connection pads, and the plurality of electrical The connection pads are formed on each of the second conductive pillars, and the electrical connection pads are greater than, equal to, or smaller than the second conductive pillars.
復包括於該增層結構最外層之第三線路層形成有複數電性接觸墊,於該增層結構之最外層上形成有防焊層,並於該防焊層中形成有複數個防焊層開孔,以對應露出各 該電性接觸墊。 The third circuit layer further including the outermost layer of the buildup structure is formed with a plurality of electrical contact pads, a solder resist layer is formed on the outermost layer of the buildup structure, and a plurality of solder resists are formed in the solder resist layer Layer openings to correspondingly expose each The electrical contact pad.
本發明復提供一種電路板之製法,係包括:提供一核心板,係具有相對之二表面,於該表面上具有核心線路層;於該核心板上形成有第一介電層;於該第一介電層中形成有第一線路層,且該第一線路層與第一介電層表面齊平,並於該第一介電層中形成有第一導電孔,以電性連接至該核心線路層;於部份之第一線路層上電鍍形成有第一導電柱;以及於該第一介電層、第一線路層、及第一導電柱上形成有增層結構,該增層結構中並形成有第二線路層,且該第二線路層具有複數電性連接墊,以對應形成於各該第一導電柱上。 The invention provides a method for manufacturing a circuit board, comprising: providing a core board having opposite surfaces, having a core circuit layer on the surface; forming a first dielectric layer on the core board; a first circuit layer is formed in a dielectric layer, and the first circuit layer is flush with the surface of the first dielectric layer, and a first conductive hole is formed in the first dielectric layer to electrically connect to the first conductive layer. a core circuit layer; a first conductive pillar is formed on a portion of the first circuit layer; and a buildup layer is formed on the first dielectric layer, the first circuit layer, and the first conductive pillar, the buildup layer A second circuit layer is formed in the structure, and the second circuit layer has a plurality of electrical connection pads correspondingly formed on each of the first conductive pillars.
依上述電路板之製法,該核心板中形成有導電通孔以電性連接該核心板之兩表面上的核心線路層。 According to the manufacturing method of the above circuit board, a conductive via hole is formed in the core board to electrically connect the core circuit layer on both surfaces of the core board.
依上述之製法,該增層結構係包括有至少一具有第二開槽之第二介電層、形成於該第二介電層之第二開槽中之第二線路層、以及複數設於該第二介電層中並電性連接該第二線路層之第二導電柱,又該第二線路層之表面與第二介電層之表面齊平,該第二線路層復包括有複數電性連接墊,且該些電性連接墊係對應形成於各該第二導電柱上,且該電性連接墊係大於、等於或小於該第二導電柱。 According to the above method, the build-up structure includes at least one second dielectric layer having a second trench, a second circuit layer formed in the second trench of the second dielectric layer, and a plurality of The second dielectric layer is electrically connected to the second conductive pillar of the second circuit layer, and the surface of the second circuit layer is flush with the surface of the second dielectric layer, and the second circuit layer includes a plurality of The electrical connection pads are formed on each of the second conductive pillars, and the electrical connection pads are greater than, equal to, or smaller than the second conductive pillars.
復包括於該增層結構最外層之第二線路層形成有複數電性接觸墊,於該增層結構之最外層上形成有防焊層,並於該防焊層中形成有複數個防焊層開孔以對應露出各該電性接觸墊。 The second circuit layer further including the outermost layer of the buildup structure is formed with a plurality of electrical contact pads, a solder resist layer is formed on the outermost layer of the buildup structure, and a plurality of solder resists are formed in the solder resist layer The layers are apertured to correspondingly expose each of the electrical contact pads.
本發明之電路板及其製法,能形成導電柱作為層間線路層之電性連接,而可突破習知藉由雷射於介電層進行開孔之孔徑限制及避免產生膠渣的問題,以提高佈線密度及可靠度。 The circuit board of the invention and the method for manufacturing the same can form the conductive column as the electrical connection of the interlayer circuit layer, and can break through the problem of the aperture limitation of the opening by the laser in the dielectric layer and avoiding the problem of generating the glue. Improve wiring density and reliability.
以下藉由特定的具體實施例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點及功效。 The other embodiments of the present invention will be readily understood by those skilled in the art from this disclosure.
請參閱第2A至2M圖,係顯示本發明之電路板之製法第一實施例之剖面示意圖。 Referring to Figures 2A through 2M, there are shown cross-sectional views showing a first embodiment of the method of fabricating the circuit board of the present invention.
如第2A圖所示,首先提供一核心板20,其具有相對之二表面20a,於該表面20a具有核心線路層201,且該核心板20中具有導電通孔202,以電性連接該核心板20之兩表面20a上的核心線路層201。 As shown in FIG. 2A, a core board 20 is provided, which has two opposite surfaces 20a. The surface 20a has a core circuit layer 201, and the core board 20 has a conductive via 202 therein to electrically connect the core. The core circuit layer 201 on both surfaces 20a of the board 20.
如第2B圖所示,於該核心板20上形成有第一介電層21a,且該第一介電層21a中形成有複數盲孔210a,以露出部份之核心線路層201。 As shown in FIG. 2B, a first dielectric layer 21a is formed on the core board 20, and a plurality of blind holes 210a are formed in the first dielectric layer 21a to expose a portion of the core circuit layer 201.
如第2C圖所示,於該第一介電層21a、盲孔210a之孔壁、及部份之核心線路層201上形成有第一導電層22a;之後,於該第一導電層22a上形成有第一阻層23a,且該第一阻層23a中形成有第一開口區230a以露出部份之第一導電層22a,且部份之第一開口區230a對應該盲孔210a及其孔端周圍之第一導電層22a。 As shown in FIG. 2C, a first conductive layer 22a is formed on the first dielectric layer 21a, the hole wall of the blind via 210a, and a portion of the core wiring layer 201; thereafter, on the first conductive layer 22a. a first resistive layer 23a is formed, and a first open region 230a is formed in the first resistive layer 23a to expose a portion of the first conductive layer 22a, and a portion of the first open region 230a corresponds to the blind via 210a and a first conductive layer 22a around the end of the hole.
如第2D圖所示,於該第一開口區230a中形成有第一線路層24a,並於該盲孔210a中形成有導電盲孔241a,以電性連接至該核心線路層201。 As shown in FIG. 2D, a first wiring layer 24a is formed in the first opening region 230a, and a conductive blind hole 241a is formed in the blind hole 210a to be electrically connected to the core wiring layer 201.
如第2E圖所示,於該第一阻層23a上形成有第二阻層23b,且該第二阻層23b中以曝光顯影方式快速形成有複數第二開口區230b,以露出部份之第一線路層24a。 As shown in FIG. 2E, a second resist layer 23b is formed on the first resist layer 23a, and a plurality of second open regions 230b are rapidly formed in the second resist layer 23b by exposure development to expose portions. The first circuit layer 24a.
如第2F圖所示,藉由該第一導電層22a及第一線路層24a作為電流傳導路徑,以於該第二開口區230b中電鍍形成有第一導電柱25a,使該第一導電柱25a形成於該第一線路層24a上。 As shown in FIG. 2F, the first conductive layer 22a and the first circuit layer 24a are used as a current conduction path, and the first conductive pillar 25a is plated in the second opening region 230b to make the first conductive pillar. 25a is formed on the first wiring layer 24a.
如第2G圖所示,移除該第二阻層23b、第一阻層23a及其所覆蓋之第一導電層22a,以露出該第一線路層24a及第一導電柱25a。 As shown in FIG. 2G, the second resist layer 23b, the first resist layer 23a and the first conductive layer 22a covered thereon are removed to expose the first wiring layer 24a and the first conductive pillar 25a.
如第2H圖所示,於該第一介電層21a、第一線路層24a及第一導電柱25a上形成有第二介電層21b。 As shown in FIG. 2H, a second dielectric layer 21b is formed on the first dielectric layer 21a, the first wiring layer 24a, and the first conductive pillar 25a.
如第2I圖所示,以係如刷磨方式移除部份之第二介電層21b,以露出該第一導電柱25a之端面251a。 As shown in FIG. 2I, a portion of the second dielectric layer 21b is removed by brushing to expose the end surface 251a of the first conductive pillar 25a.
如第2J圖所示,於該第二介電層21b及第一導電柱25a之端面251a上形成有第二導電層22b;接著,於該第二導電層22b上形成有第三阻層23c,且於該第三阻層23c中形成有複數第三開口區230c,以露出部份之第二導電層22b,且部份之第三開口區230c對應該第一導電柱25a之端面251a上的第二導電層22b。 As shown in FIG. 2J, a second conductive layer 22b is formed on the second dielectric layer 21b and the end surface 251a of the first conductive pillar 25a. Then, a third resist layer 23c is formed on the second conductive layer 22b. And a plurality of third opening regions 230c are formed in the third resist layer 23c to expose a portion of the second conductive layer 22b, and a portion of the third opening region 230c corresponds to the end surface 251a of the first conductive pillar 25a. The second conductive layer 22b.
如第2K圖所示,於該第三開口區230c中形成具有複 數電性連接墊242b、242b’、242b”之第二線路層24b,且該電性連接墊242b、242b’、242b”位於該第一導電柱25a上,該電性連接墊242b、242b’、242b”並大於、等於或小於該第一導電柱25a。 As shown in FIG. 2K, the formation in the third opening region 230c has a complex The second circuit layer 24b of the electrical connection pads 242b, 242b', 242b", and the electrical connection pads 242b, 242b', 242b" are located on the first conductive pillar 25a, the electrical connection pads 242b, 242b' , 242b" is greater than, equal to, or less than the first conductive pillar 25a.
如第2L圖所示,移除該第三阻層23c及其所覆蓋之第二導電層22b,以露出該第二線路層24b。 As shown in FIG. 2L, the third resist layer 23c and the second conductive layer 22b covered thereby are removed to expose the second wiring layer 24b.
如第2M圖所示,於該第二介電層21b及第二線路層24b上形成有增層結構26,該增層結構26係包括有至少一第三介電層21c、形成於該第三介電層上之第三線路層24c、以及複數形成於該第三介電層之中並電性連接該第三線路層之第二導電柱25b,其中部份之第二導電柱25b電性連接該第二線路層24b,該第三線路層24c復包括複數電性連接墊242c,且該電性連接墊242c係形成於該第二導電柱25b上,該電性連接墊242c係大於、等於或小於該第二導電柱25b,又於該增層結構26最外層之第三線路層24c形成有複數電性接觸墊264,且於該增層結構26之最外層上形成有防焊層27,並於該防焊層27中形成有複數個防焊層開孔270以對應露出各該電性接觸墊264。 As shown in FIG. 2M, a build-up structure 26 is formed on the second dielectric layer 21b and the second circuit layer 24b. The build-up structure 26 includes at least one third dielectric layer 21c formed on the second dielectric layer 21b. a third circuit layer 24c on the three dielectric layers, and a plurality of second conductive pillars 25b formed in the third dielectric layer and electrically connected to the third wiring layer, wherein a portion of the second conductive pillars 25b are electrically The second circuit layer 24b is connected to the second circuit layer 24b. The third circuit layer 24c includes a plurality of electrical connection pads 242c. The electrical connection pads 242c are formed on the second conductive pillars 25b. The electrical connection pads 242c are larger than A plurality of electrical contact pads 264 are formed on the third circuit layer 24c of the outermost layer of the build-up structure 26, and solder resists are formed on the outermost layer of the build-up structure 26, and are equal to or smaller than the second conductive pillars 25b. The layer 27 is formed with a plurality of solder mask openings 270 in the solder resist layer 27 to correspondingly expose the respective electrical contact pads 264.
本發明復提供一種電路板,係包括:核心板20,係具有相對之二表面20a,於該表面20a具有核心線路層201;第一介電層21a,係設於該核心板20上;第一線路層24a,係設於該第一介電層21a上,且於該第一介電層21a中設有導電盲孔241a,以電性連接該核心線路層 201;第二介電層21b,係設於該第一介電層21a及第一線路層24a上;複數第一導電柱25a,係設於該第二介電層21b中,並電性連接該第一線路層24a,且該第一導電柱25a之端面251a與第二介電層21b之表面齊平;第二線路層24b,係設於該第二介電層21b上,並具有複數電性連接墊242b、242b’、242b”,以對應電性連接至各該第一導電柱25a上。 The present invention provides a circuit board comprising: a core board 20 having opposing surfaces 20a, the surface 20a having a core circuit layer 201; a first dielectric layer 21a disposed on the core board 20; A circuit layer 24a is disposed on the first dielectric layer 21a, and a conductive via hole 241a is disposed in the first dielectric layer 21a to electrically connect the core circuit layer The second dielectric layer 21b is disposed on the first dielectric layer 21a and the first circuit layer 24a; the plurality of first conductive pillars 25a are disposed in the second dielectric layer 21b and electrically connected The first circuit layer 24a, and the end surface 251a of the first conductive pillar 25a is flush with the surface of the second dielectric layer 21b; the second circuit layer 24b is disposed on the second dielectric layer 21b and has a plurality of The electrical connection pads 242b, 242b', 242b" are electrically connected to the first conductive pillars 25a.
依上述之電路板,該核心板20中具有導電通孔202以電性連接該核心板20之兩表面20a上的核心線路層201;復包括增層結構26,係設於該第二介電層21b及第二線路層24b上,該增層結構26係包括有至少一第三介電層21c、形成於該第三介電層上之第三線路層24c、以及複數形成於該第三介電層之中並電性連接該第三線路層之第二導電柱25b,其中部份之第二導電柱25b電性連接該第二線路層24b,該第三線路層24c復包括複數電性連接墊242c,且該電性連接墊242c係形成於該第二導電柱25b上,該電性連接墊242c係大於、等於或小於該第二導電柱25b,又於該增層結構26最外層之第三線路層24c形成有複數電性接觸墊264,且於該增層結構26之最外層上形成有防焊層27,並於該防焊層27中形成有複數個防焊層開孔270以對應露出各該電性接觸墊264。 According to the above circuit board, the core board 20 has conductive vias 202 electrically connected to the core circuit layer 201 on the two surfaces 20a of the core board 20; and a build-up structure 26 is disposed on the second dielectric On the layer 21b and the second circuit layer 24b, the build-up structure 26 includes at least one third dielectric layer 21c, a third circuit layer 24c formed on the third dielectric layer, and a plurality formed on the third layer The second conductive pillars 25b of the third circuit layer are electrically connected to the dielectric layer, and a portion of the second conductive pillars 25b are electrically connected to the second circuit layer 24b. The third circuit layer 24c includes a plurality of electrical circuits. The connection pad 242c is formed on the second conductive post 25b. The electrical connection pad 242c is greater than, equal to, or smaller than the second conductive post 25b, and the buildup structure 26 is the most The third circuit layer 24c of the outer layer is formed with a plurality of electrical contact pads 264, and a solder resist layer 27 is formed on the outermost layer of the buildup structure 26, and a plurality of solder resist layers are formed in the solder resist layer 27. The holes 270 are correspondingly exposed to the respective electrical contact pads 264.
請參閱第3A至3P圖,係顯示本發明之電路板之製法第二實施例之剖面示意圖。 Referring to Figures 3A to 3P, there are shown schematic cross-sectional views showing a second embodiment of the method of fabricating the circuit board of the present invention.
如第3A圖所示,提供一係如第2A圖所示之結構。 As shown in Fig. 3A, a structure as shown in Fig. 2A is provided.
如第3B圖所示,於該核心板20上形成有第一介電層21a,且於該第一介電層21a中形成有複數第一開孔211a及第一開槽212a,且該第一開孔211a露出部份之核心線路層201。 As shown in FIG. 3B, a first dielectric layer 21a is formed on the core plate 20, and a plurality of first openings 211a and first slots 212a are formed in the first dielectric layer 21a, and the first An opening 211a exposes a portion of the core wiring layer 201.
如第3C圖所示,於該第一介電層21a、第一開孔211a及第一開槽212a之孔壁、及部份之核心線路層201上形成有第一導電層22a。 As shown in FIG. 3C, a first conductive layer 22a is formed on the first dielectric layer 21a, the first opening 211a, and the first opening 212a, and a portion of the core wiring layer 201.
如第3D圖所示,於該第一導電層22a上形成有第一金屬層241,且於該第一開槽212a中形成有第一線路層24a,並於該第一開孔211a中形成有第一導電孔241b。 As shown in FIG. 3D, a first metal layer 241 is formed on the first conductive layer 22a, and a first circuit layer 24a is formed in the first trench 212a, and is formed in the first opening 211a. There is a first conductive hole 241b.
如第3E及3E’圖所示,薄化該第一金屬層241,以成為第一薄化金屬層241’,如第3E圖所示;或完全移除未形成該第一線路層24a及第一導電孔241b之第一金屬層241及為該第一金屬層所覆蓋之第一導電層22a,以露出該第一線路層24a及第一導電孔241b,再於該第一介電層21a、第一線路層24a及第一導電孔241b上形成有另一導電層22a’,如第3E’圖所示;之後以第3E圖所示之結構作說明。 As shown in FIGS. 3E and 3E', the first metal layer 241 is thinned to become the first thinned metal layer 241' as shown in FIG. 3E; or the first wiring layer 24a is not completely removed and a first metal layer 241 of the first conductive via 241b and a first conductive layer 22a covered by the first metal layer to expose the first circuit layer 24a and the first conductive via 241b, and then the first dielectric layer Another conductive layer 22a' is formed on the first wiring layer 24a and the first conductive via 241b as shown in FIG. 3E'; and the structure shown in FIG. 3E will be described later.
如第3F圖所示,於該第一薄化金屬層241’上形成有第一阻層23a,且於該第一阻層23a中形成有複數第一開口區230a,以對應露出部份之第一薄化金屬層241’。 As shown in FIG. 3F, a first resist layer 23a is formed on the first thinned metal layer 241', and a plurality of first open regions 230a are formed in the first resist layer 23a to correspond to the exposed portions. The first thinned metal layer 241'.
如第3G圖所示,於該第一開口區230a中之第一薄化金屬層241’上電鍍形成有第一導電柱25a。 As shown in Fig. 3G, a first conductive pillar 25a is plated on the first thinned metal layer 241' in the first opening region 230a.
如第3H圖所示,移除該第一阻層23a及其所覆蓋之第一薄化金屬層241’及第一導電層22a,以露出該第一線路層24a,並於該第一線路層24a上形成凸出該第一介電層21a表面之凸部240,且該第一導電柱25a係設於該凸部240上;若以第3E’圖進行後續製程,將使該第一線路層24a與第一介電層21a之表面齊平。 As shown in FIG. 3H, the first resistive layer 23a and the first thinned metal layer 241' and the first conductive layer 22a covered thereon are removed to expose the first wiring layer 24a, and the first line is removed. a protrusion 240 protruding from the surface of the first dielectric layer 21a is formed on the layer 24a, and the first conductive pillar 25a is disposed on the protrusion 240; if the subsequent process is performed in the 3E' diagram, the first The wiring layer 24a is flush with the surface of the first dielectric layer 21a.
如第3I圖所示,於該第一介電層21a、第一線路層24a、及第一導電柱25a上形成有第二介電層21b,且於該第二介電層21b中形成有複數第二開槽211b,且該第二開槽211b露出該些第一導電柱25a之端面251a。 As shown in FIG. 3I, a second dielectric layer 21b is formed on the first dielectric layer 21a, the first wiring layer 24a, and the first conductive pillar 25a, and the second dielectric layer 21b is formed in the second dielectric layer 21b. The plurality of second slots 211b are exposed, and the second slots 211b expose the end faces 251a of the first conductive posts 25a.
如第3J圖所示,於該第二介電層21b、第二開槽211b之孔壁、及第一導電柱25a之端面251a上形成有第二導電層22b。 As shown in FIG. 3J, a second conductive layer 22b is formed on the second dielectric layer 21b, the hole wall of the second slit 211b, and the end surface 251a of the first conductive post 25a.
如第3K圖所示,於該第二導電層22b上形成有第二金屬層242,且於該第二開槽211b中形成具有複數電性連接墊242b、242b’、242b”之第二線路層24b,且該電性連接墊242b、242b’、242b”位於該第一導電柱25a上,該電性連接墊242b、242b’、242b”並大於、等於或小於該第一導電柱25a。 As shown in FIG. 3K, a second metal layer 242 is formed on the second conductive layer 22b, and a second line having a plurality of electrical connection pads 242b, 242b', 242b" is formed in the second trench 211b. The layer 24b, and the electrical connection pads 242b, 242b', 242b" are located on the first conductive pillar 25a, and the electrical connection pads 242b, 242b', 242b" are greater than, equal to, or smaller than the first conductive pillar 25a.
如第3L及3L’圖所示,薄化該第二金屬層242,以成為第二薄化金屬層242’,如第3L圖所示;或移除未形成該第二線路層24b及電性連接墊242b、242b’、242b”之第二金屬層242及第二導電層22b後,再於該第二介電層21b、該第二線路層24b及電性連接墊242b、242b’、242b” 上形成有另一導電層22b’,如第3L’圖所示;之後以第3L圖所示之結構作說明。 As shown in FIGS. 3L and 3L', the second metal layer 242 is thinned to become the second thinned metal layer 242' as shown in FIG. 3L; or the second wiring layer 24b is not formed and removed. After the second metal layer 242 and the second conductive layer 22b of the connection pads 242b, 242b', 242b", the second dielectric layer 21b, the second circuit layer 24b, and the electrical connection pads 242b, 242b', 242b" Another conductive layer 22b' is formed thereon as shown in Fig. 3L'; the structure shown in Fig. 3L will be described later.
如第3M圖所示,於該第二薄化金屬層242’上形成有第二阻層23b,且於該第二阻層23b中形成有複數第二開口區230b,以露出部份之第二薄化金屬層242’。 As shown in FIG. 3M, a second resist layer 23b is formed on the second thinned metal layer 242', and a plurality of second open regions 230b are formed in the second resist layer 23b to expose the portion Two thinned metal layers 242'.
如第3N圖所示,於該第二開口區230b中形成有第二導電柱25b。 As shown in FIG. 3N, a second conductive pillar 25b is formed in the second opening region 230b.
如第30圖所示,移除該第二阻層23b及其所覆蓋之第二薄化金屬層242’及第二導電層22b,以露出該第二線路層24b及第二導電柱25b。 As shown in Fig. 30, the second resist layer 23b and the second thinned metal layer 242' and the second conductive layer 22b covered are removed to expose the second wiring layer 24b and the second conductive pillar 25b.
如第3P圖所示,重覆前述之第3I至30圖之製程,以形成增層結構26,該增層結構26係包括有至少一具有第二開槽211b之第二介電層21b、形成於該第二介電層之第二開槽211b中之第二線路層24b、以及複數形成於該第二介電層中並電性連接該第二線路層24b之第二導電柱25b,又該第二線路層24b之表面與第二介電層21b之表面齊平;於該增層結構26最外層之第二線路層24b形成有複數電性接觸墊264,且於該增層結構26之最外層上形成有防焊層27,並於該防焊層27中形成有複數個防焊層開孔270以對應露出各該電性接觸墊264。 As shown in FIG. 3P, the processes of FIGS. 3I to 30 are repeated to form a build-up structure 26, the build-up structure 26 including at least one second dielectric layer 21b having a second slit 211b, a second circuit layer 24b formed in the second trench 211b of the second dielectric layer, and a plurality of second conductive pillars 25b formed in the second dielectric layer and electrically connected to the second wiring layer 24b, The surface of the second circuit layer 24b is flush with the surface of the second dielectric layer 21b; the second circuit layer 24b of the outermost layer of the buildup structure 26 is formed with a plurality of electrical contact pads 264, and the build-up structure A solder resist layer 27 is formed on the outermost layer of 26, and a plurality of solder resist layer openings 270 are formed in the solder resist layer 27 to correspondingly expose the respective electrical contact pads 264.
本發明復提供一種電路板,係包括:核心板20,係具有相對之二表面20a,於該表面20a具有核心線路層201;第一介電層21a,係設於該核心板20上,並設有複數第一開孔211a及第一開槽212a,且該第一開孔211a 露出部份之核心線路層201;第一線路層24a,係設於該第一開槽212a中,並具有複數第一導電孔241b,且對應設於各該第一開孔211a中,以電性連接至該核心線路層201,又該第一線路層24a之表面與第一介電層21a之表面齊平、或該第一線路層24a具有凸出該第一介電層21a表面之凸部240;複數第一導電柱25a,係設於該第一線路層24a或凸部240上;以及增層結構26,係設於該第一介電層21a、第一線路層24a、及第一導電柱25a上,該增層結構26並具有第二線路層24b,且該第二線路層24b具有複數電性連接墊242b、242b’、242b”,以對應設於各該第一導電柱25a上。 The present invention provides a circuit board comprising: a core board 20 having opposite surface 20a, the surface 20a having a core circuit layer 201; a first dielectric layer 21a is disposed on the core board 20, and a plurality of first openings 211a and first slots 212a are provided, and the first openings 211a An exposed portion of the core circuit layer 201; the first circuit layer 24a is disposed in the first slot 212a, and has a plurality of first conductive holes 241b, and correspondingly disposed in each of the first openings 211a, Connected to the core circuit layer 201, the surface of the first circuit layer 24a is flush with the surface of the first dielectric layer 21a, or the first circuit layer 24a has a convex surface protruding from the surface of the first dielectric layer 21a. The first conductive pillar 25a is disposed on the first circuit layer 24a or the convex portion 240; and the build-up structure 26 is disposed on the first dielectric layer 21a, the first circuit layer 24a, and the first On a conductive pillar 25a, the build-up structure 26 has a second circuit layer 24b, and the second circuit layer 24b has a plurality of electrical connection pads 242b, 242b', 242b" correspondingly disposed on each of the first conductive pillars. 25a.
依上述之電路板,該核心板20中設有導電通孔202以電性連接該核心板20之兩表面20a上的核心線路層201。 According to the above circuit board, the core board 20 is provided with conductive vias 202 for electrically connecting the core circuit layers 201 on the two surfaces 20a of the core board 20.
依上述之結構,該電性連接墊242b係大於、等於或小於該第一導電柱25a。 According to the above structure, the electrical connection pad 242b is greater than, equal to, or smaller than the first conductive pillar 25a.
又依上所述,該增層結構26係包括有至少一具有第二開槽211b之第二介電層21b、設於該第二介電層21b之第二開槽211b中之第二線路層24b、以及複數設於該第二介電層21b中並電性連接該第二線路層24b之第二導電柱25b,又該第二線路層24b之表面與第二介電層21b之表面齊平;該第二線路層24b復包括有複數電性連接墊242b,且該些電性連接墊242b係對應設於各該第二導電柱25b上;又該電性連接墊242b係大於、等於或小於 該第二導電柱25b;復於該增層結構26最外層之第二線路層24b設有電性接觸墊264,於該增層結構26之最外層上並設有防焊層27,且該防焊層27並設有複數防焊層開孔270,以對應露出各該電性接觸墊264。 In addition, the build-up structure 26 includes at least one second dielectric layer 21b having a second recess 211b and a second line disposed in the second trench 211b of the second dielectric layer 21b. a layer 24b, and a plurality of second conductive pillars 25b disposed in the second dielectric layer 21b and electrically connected to the second wiring layer 24b, and a surface of the second wiring layer 24b and a surface of the second dielectric layer 21b The second circuit layer 24b further includes a plurality of electrical connection pads 242b, and the electrical connection pads 242b are correspondingly disposed on the second conductive posts 25b; and the electrical connection pads 242b are greater than Equal to or less than The second conductive pillar 25b; the second circuit layer 24b of the outermost layer of the build-up structure 26 is provided with an electrical contact pad 264, and a solder resist layer 27 is disposed on the outermost layer of the build-up structure 26, and The solder resist layer 27 is provided with a plurality of solder mask openings 270 to correspondingly expose the respective electrical contact pads 264.
本發明之電路板及其製法,能形成導電柱作為層間線路層之電性連接,而可突破習知藉由雷射於介電層進行開孔之孔徑限制及避免產生膠渣的問題,以提高佈線密度及可靠度。 The circuit board of the invention and the method for manufacturing the same can form the conductive column as the electrical connection of the interlayer circuit layer, and can break through the problem of the aperture limitation of the opening by the laser in the dielectric layer and avoiding the problem of generating the glue. Improve wiring density and reliability.
上述實施例係用以例示性說明本發明之原理及其功效,而非用於限制本發明。任何熟習此項技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修改。因此本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above embodiments are intended to illustrate the principles of the invention and its effects, and are not intended to limit the invention. Any of the above-described embodiments may be modified by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as set forth in the appended claims.
10、20‧‧‧核心板 10, 20‧‧‧ core board
10a、20a‧‧‧表面 10a, 20a‧‧‧ surface
101、201‧‧‧核心線路層 101, 201‧‧‧ core circuit layer
102、202‧‧‧導電通孔 102, 202‧‧‧ conductive through holes
12a、21a‧‧‧第一介電層 12a, 21a‧‧‧ first dielectric layer
12b、21b‧‧‧第二介電層 12b, 21b‧‧‧ second dielectric layer
120a‧‧‧介電層開孔 120a‧‧‧Dielectric layer opening
13‧‧‧導電層 13‧‧‧ Conductive layer
14‧‧‧阻層 14‧‧‧Resist layer
140‧‧‧開口區 140‧‧‧Open area
15a、24a‧‧‧第一線路層 15a, 24a‧‧‧ first line layer
151a‧‧‧第一導電盲孔 151a‧‧‧First conductive blind hole
15b、24b‧‧‧第二線路層 15b, 24b‧‧‧second circuit layer
151b‧‧‧第二導電盲孔 151b‧‧‧Second conductive blind hole
16、26‧‧‧增層結構 16, 26‧‧‧ layered structure
164、264‧‧‧電性接觸墊 164, 264‧‧‧Electrical contact pads
17、27‧‧‧防焊層 17, 27‧‧‧ solder mask
170、270‧‧‧防焊層開孔 170, 270‧‧‧ solder mask opening
210a‧‧‧盲孔 210a‧‧‧Blind hole
211a‧‧‧第一開孔 211a‧‧‧First opening
212a‧‧‧第一開槽 212a‧‧‧first slot
211b‧‧‧第二開槽 211b‧‧‧Second slotting
21c‧‧‧第三介電層 21c‧‧‧ third dielectric layer
22a‧‧‧第一導電層 22a‧‧‧First conductive layer
22b‧‧‧第二導電層 22b‧‧‧Second conductive layer
22c‧‧‧第三導電層 22c‧‧‧ third conductive layer
22a’,22b’‧‧‧另一導電層 22a’, 22b’‧‧‧ another conductive layer
23a‧‧‧第一阻層 23a‧‧‧First barrier layer
230a‧‧‧第一開口區 230a‧‧‧First opening area
23b‧‧‧第二阻層 23b‧‧‧second barrier layer
230b‧‧‧第二開口區 230b‧‧‧second open area
23c‧‧‧第三阻層 23c‧‧‧ third resistive layer
230c‧‧‧第三開口區 230c‧‧‧ third open area
240‧‧‧凸部 240‧‧‧ convex
241‧‧‧第一金屬層 241‧‧‧First metal layer
241’‧‧‧第一薄化金屬層 241'‧‧‧First thinned metal layer
242‧‧‧第二金屬層 242‧‧‧Second metal layer
241a‧‧‧導電盲孔 241a‧‧‧ Conductive blind hole
241b‧‧‧第一導電孔 241b‧‧‧first conductive hole
242’‧‧‧第二薄化金屬層 242’‧‧‧Second thinned metal layer
242b、242c‧‧‧電性連接墊 242b, 242c‧‧‧ electrical connection pads
242b’、242b”‧‧‧電性連接墊 242b’, 242b”‧‧‧ electrical connection pads
24c‧‧‧第三線路層 24c‧‧‧ third circuit layer
25a‧‧‧第一導電柱 25a‧‧‧First Conductive Column
251a‧‧‧端面 251a‧‧‧ end face
25b‧‧‧第二導電柱 25b‧‧‧second conductive column
第1A至1G圖係為習知電路板及其製法之剖視示意圖;第2A至2M圖係為本發明電路板及其製法第一實施例剖視圖;第3A至3P圖係為本發明電路板及其製法第二實施例剖視圖;第3E’圖係為第3E圖之另一實施例剖視圖;以及第3L’圖係為第3L圖之另一實施例剖視圖。 1A to 1G are schematic cross-sectional views of a conventional circuit board and a method of manufacturing the same; FIGS. 2A to 2M are cross-sectional views showing a first embodiment of the circuit board and the method of manufacturing the same; and FIGS. 3A to 3P are circuit boards of the present invention; FIG. 3E is a cross-sectional view showing another embodiment of FIG. 3E; and FIG. 3L' is a cross-sectional view showing another embodiment of the third embodiment.
20‧‧‧核心板 20‧‧‧ core board
201‧‧‧核心線路層 201‧‧‧ core circuit layer
21a‧‧‧第一介電層 21a‧‧‧First dielectric layer
21b‧‧‧第二介電層 21b‧‧‧Second dielectric layer
24a‧‧‧第一線路層 24a‧‧‧First circuit layer
24b‧‧‧第二線路層 24b‧‧‧second circuit layer
242b‧‧‧電性連接墊 242b‧‧‧Electrical connection pads
25a‧‧‧第一導電柱 25a‧‧‧First Conductive Column
Claims (35)
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| CN118888529A (en) * | 2024-03-21 | 2024-11-01 | 芯爱科技(南京)有限公司 | Semiconductor package and method of manufacturing the same |
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| JPH06314878A (en) * | 1993-04-30 | 1994-11-08 | Toppan Printing Co Ltd | Method for manufacturing printed wiring board |
| JP2000165049A (en) * | 1998-11-27 | 2000-06-16 | Shinko Electric Ind Co Ltd | Method for manufacturing multilayer circuit board |
| JP2002324974A (en) * | 2001-04-24 | 2002-11-08 | Sony Corp | Multilayer printed wiring board and method of manufacturing multilayer printed wiring board |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06314878A (en) * | 1993-04-30 | 1994-11-08 | Toppan Printing Co Ltd | Method for manufacturing printed wiring board |
| JP2000165049A (en) * | 1998-11-27 | 2000-06-16 | Shinko Electric Ind Co Ltd | Method for manufacturing multilayer circuit board |
| JP2002324974A (en) * | 2001-04-24 | 2002-11-08 | Sony Corp | Multilayer printed wiring board and method of manufacturing multilayer printed wiring board |
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