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TWI493730B - 處理基板之方法及裝置 - Google Patents

處理基板之方法及裝置 Download PDF

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Publication number
TWI493730B
TWI493730B TW099122210A TW99122210A TWI493730B TW I493730 B TWI493730 B TW I493730B TW 099122210 A TW099122210 A TW 099122210A TW 99122210 A TW99122210 A TW 99122210A TW I493730 B TWI493730 B TW I493730B
Authority
TW
Taiwan
Prior art keywords
container
foam
treatment solution
module
solution
Prior art date
Application number
TW099122210A
Other languages
English (en)
Chinese (zh)
Other versions
TW201115636A (en
Inventor
亨利 凱普勒
約格 蘭普契
Original Assignee
吉伯史密德公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 吉伯史密德公司 filed Critical 吉伯史密德公司
Publication of TW201115636A publication Critical patent/TW201115636A/zh
Application granted granted Critical
Publication of TWI493730B publication Critical patent/TWI493730B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10P70/20—
    • H10P72/0424—
    • H10P50/287—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00—Technologies for wastewater treatment
    • Y02W10/30—Wastewater or sewage treatment systems using renewable energies
    • Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)
TW099122210A 2009-07-06 2010-07-06 處理基板之方法及裝置 TWI493730B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102009032217A DE102009032217A1 (de) 2009-07-06 2009-07-06 Verfahren und Vorrichtung zur Behandlung von Substraten

Publications (2)

Publication Number Publication Date
TW201115636A TW201115636A (en) 2011-05-01
TWI493730B true TWI493730B (zh) 2015-07-21

Family

ID=43307765

Family Applications (1)

Application Number Title Priority Date Filing Date
TW099122210A TWI493730B (zh) 2009-07-06 2010-07-06 處理基板之方法及裝置

Country Status (15)

Country Link
US (1) US20120097188A1 (es)
EP (1) EP2452356B1 (es)
JP (1) JP2012532471A (es)
KR (1) KR101717261B1 (es)
CN (1) CN102576199B (es)
AU (1) AU2010270288A1 (es)
CA (1) CA2765288A1 (es)
DE (1) DE102009032217A1 (es)
ES (1) ES2426567T3 (es)
IL (1) IL217326A0 (es)
MX (1) MX2012000344A (es)
MY (1) MY154759A (es)
SG (1) SG177420A1 (es)
TW (1) TWI493730B (es)
WO (1) WO2011003880A2 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2923703C (en) 2013-09-18 2021-10-05 Flint Group Germany Gmbh Digitally exposable flexographic printing element and method for producing flexographic printing plates

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519690A (en) * 1982-08-06 1985-05-28 Hitachi Chemical Company, Ltd. Process for developing or peeling alkali-type photosensitive film and apparatus used therein
TW200832549A (en) * 2006-10-23 2008-08-01 Samsung Electronics Co Ltd Removing photoresist from substrates by means of treatment liquid, and processing treatment liquid with ozone

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US1952727A (en) * 1929-10-26 1934-03-27 United Verde Copper Company Froth flotation
US3846330A (en) * 1973-08-16 1974-11-05 Du Pont Apparatus
DE2361150B2 (de) * 1973-12-07 1980-12-11 Agfa-Gevaert Ag, 5090 Leverkusen Fotografisches Gerät zur Naßbehandlung fotografischer Schichtträger
DE2820815C2 (de) * 1978-05-12 1983-09-29 Gebr. Schmid GmbH & Co, 7290 Freudenstadt Durchlaufmaschine zum Entfernen von Fotoresisten und/oder Siebdruckfarben von Trägern
US4722355A (en) * 1985-08-19 1988-02-02 Rolf Moe Machine and method for stripping photoresist from wafers
JPS6274089A (ja) * 1985-09-28 1987-04-04 Tanaka Kikinzoku Kogyo Kk プリント基板製造装置
US4861385A (en) * 1986-10-02 1989-08-29 Aisaburo Yagishita Article washing method
DE3736578A1 (de) * 1987-10-26 1989-05-03 Schering Ag Verfahren zum zerstoeren von schaum und vorrichtung dafuer
DE3813518A1 (de) * 1988-04-22 1989-11-02 Hoellmueller Maschbau H Maschine zum reinigen und/oder spuelen von bohrungen in leiterplatten
JPH0737311Y2 (ja) * 1990-03-30 1995-08-23 株式会社芝浦製作所 処理装置の気泡発生防止装置
JP2732725B2 (ja) * 1991-06-14 1998-03-30 富士写真フイルム株式会社 水なし平版印刷版の廃液処理装置
DE9200734U1 (de) * 1992-01-23 1992-05-07 Gebr. Schmid GmbH & Co, 7290 Freudenstadt Vorrichtung zur Aufbereitung einer partikelbeladenen in einem Prozess anfallenden Flüssigkeit
JPH07509539A (ja) * 1992-08-01 1995-10-19 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング 特に平坦な被処理物を電解的に処理する方法，及び特にこの方法を実施するための装置
US5759743A (en) * 1992-10-30 1998-06-02 Nippon Paint Co., Ltd. Developer-circulating method in flexographic printing plate-making process and apparatus for carrying out developer-circulating method
DE4406759A1 (de) * 1994-03-02 1995-09-07 Gat Handels U Servicegesellsch Reinigungs- und Wiederaufbereitungsverfahren für Wasser, Entwickler und Fixiererflüssigkeit, im Bereich von Filmentwicklung und Repros
US5494644A (en) * 1994-12-06 1996-02-27 Ecolab Inc. Multiple product dispensing system including dispenser for forming use solution from solid chemical compositions
DE19715893C2 (de) * 1997-04-16 1999-04-29 Boehringer Ingelheim Int Vorrichtung zum Entnehmen einer Flüssigkeit aus einem geschlossenen Behälter
EP0883027B1 (en) * 1997-06-05 2001-09-19 AGFA-GEVAERT naamloze vennootschap A method for making an offset printing plate according to the silver salt diffusion transfer process
US6247856B1 (en) * 1998-01-22 2001-06-19 Toyo Boseki Kabushiki Kaisha Developing system of photosensitive resin plates and apparatus used therein
DE19944908A1 (de) * 1999-09-10 2001-04-12 Atotech Deutschland Gmbh Verfahren zum Bilden eines Leitermusters auf dielektrischen Substraten
US6454835B1 (en) * 2000-06-02 2002-09-24 Scitex Digital Printing, Inc. Two-phase flow separator
JP2002292315A (ja) * 2001-03-29 2002-10-08 Kyocera Corp 噴霧装置およびそれを用いた現像方法
KR100652044B1 (ko) * 2001-12-18 2006-11-30 엘지.필립스 엘시디 주식회사 스트립 장치
JP2003218502A (ja) * 2002-01-22 2003-07-31 Fujikura Ltd 回路基板製造処理装置
DE10225848A1 (de) * 2002-06-04 2003-12-24 Schmid Gmbh & Co Geb Vorrichtung und Verfahren zum Lösen von Schichten von der Oberseite von flächigen Substraten
JP2004327962A (ja) * 2003-04-07 2004-11-18 Matsushita Electric Ind Co Ltd レジストの剥離装置及び剥離方法
DE102004002421A1 (de) * 2004-01-16 2005-08-18 Atotech Deutschland Gmbh Düsenanordnung
JP4099489B2 (ja) * 2005-04-15 2008-06-11 東京化工機株式会社 レジスト回収装置
JP4481865B2 (ja) * 2005-04-15 2010-06-16 株式会社フジクラ 現像機におけるスカム除去方法およびその装置
JP2008013389A (ja) * 2006-07-04 2008-01-24 Nec Corp エッチング装置及び薄型ガラス基板の製造方法
JP2008085119A (ja) * 2006-09-28 2008-04-10 Tokyo Kakoki Kk 薬液処理装置
JP2008137733A (ja) * 2006-11-30 2008-06-19 Tokyo Kakoki Kk 表面処理装置のコンベア
DE102007063202A1 (de) * 2007-12-19 2009-06-25 Gebr. Schmid Gmbh & Co. Verfahren und Vorrichtung zur Behandlung von Silizium-Wafern

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4519690A (en) * 1982-08-06 1985-05-28 Hitachi Chemical Company, Ltd. Process for developing or peeling alkali-type photosensitive film and apparatus used therein
TW200832549A (en) * 2006-10-23 2008-08-01 Samsung Electronics Co Ltd Removing photoresist from substrates by means of treatment liquid, and processing treatment liquid with ozone

Also Published As

Publication number Publication date
KR101717261B1 (ko) 2017-03-16
SG177420A1 (en) 2012-02-28
WO2011003880A3 (de) 2011-07-07
TW201115636A (en) 2011-05-01
MX2012000344A (es) 2012-04-10
EP2452356B1 (de) 2013-06-05
IL217326A0 (en) 2012-02-29
JP2012532471A (ja) 2012-12-13
EP2452356A2 (de) 2012-05-16
CN102576199B (zh) 2015-05-06
AU2010270288A1 (en) 2012-01-12
KR20120102033A (ko) 2012-09-17
CN102576199A (zh) 2012-07-11
CA2765288A1 (en) 2011-01-13
WO2011003880A2 (de) 2011-01-13
MY154759A (en) 2015-07-15
ES2426567T3 (es) 2013-10-24
US20120097188A1 (en) 2012-04-26
DE102009032217A1 (de) 2011-01-13

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