MX2012000344A - Metodo y aparatopara tratar sustratos. - Google Patents
Metodo y aparatopara tratar sustratos.Info
- Publication number
- MX2012000344A MX2012000344A MX2012000344A MX2012000344A MX2012000344A MX 2012000344 A MX2012000344 A MX 2012000344A MX 2012000344 A MX2012000344 A MX 2012000344A MX 2012000344 A MX2012000344 A MX 2012000344A MX 2012000344 A MX2012000344 A MX 2012000344A
- Authority
- MX
- Mexico
- Prior art keywords
- processing solution
- substrates
- container
- extraction module
- aparatopara
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H10P70/20—
-
- H10P72/0424—
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
-
- H10P50/287—
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/30—Wastewater or sewage treatment systems using renewable energies
- Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Weting (AREA)
Abstract
En el caso de un método y aparato para tratar sustratos, se remueven o eliminan las capas resistentes de los sustratos mediante el rociado de una solución de procesamiento. Los sustratos son rociados primero con la solución de procesamiento en el modulo de extracción principal y de4spues en un modulo post extracción y dicha solución de procesamiento se recolecta en contenedores debajo de los módulos. Por lo menos se proporciona un contenedor para cada modulo de extracción principal en dos contenedores y primero se alimenta directamente al segundo contenedor. Que se encuentra separado en gran medida del primer contenedor de una pared que es permeable a los líquidos en una región significativamente debajo del nivel de superficie de la solución de procesamiento. La solución de procesamiento es eliminada del primer contenedor sin espuma y se regresa nuevamente al ciclo de proceso para mojar/humedecer los sustratos.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102009032217A DE102009032217A1 (de) | 2009-07-06 | 2009-07-06 | Verfahren und Vorrichtung zur Behandlung von Substraten |
| PCT/EP2010/059589 WO2011003880A2 (de) | 2009-07-06 | 2010-07-05 | Verfahren und vorrichtung zur behandlung von substraten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2012000344A true MX2012000344A (es) | 2012-04-10 |
Family
ID=43307765
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2012000344A MX2012000344A (es) | 2009-07-06 | 2010-07-05 | Metodo y aparatopara tratar sustratos. |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US20120097188A1 (es) |
| EP (1) | EP2452356B1 (es) |
| JP (1) | JP2012532471A (es) |
| KR (1) | KR101717261B1 (es) |
| CN (1) | CN102576199B (es) |
| AU (1) | AU2010270288A1 (es) |
| CA (1) | CA2765288A1 (es) |
| DE (1) | DE102009032217A1 (es) |
| ES (1) | ES2426567T3 (es) |
| IL (1) | IL217326A0 (es) |
| MX (1) | MX2012000344A (es) |
| MY (1) | MY154759A (es) |
| SG (1) | SG177420A1 (es) |
| TW (1) | TWI493730B (es) |
| WO (1) | WO2011003880A2 (es) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2923703C (en) | 2013-09-18 | 2021-10-05 | Flint Group Germany Gmbh | Digitally exposable flexographic printing element and method for producing flexographic printing plates |
Family Cites Families (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1952727A (en) * | 1929-10-26 | 1934-03-27 | United Verde Copper Company | Froth flotation |
| US3846330A (en) * | 1973-08-16 | 1974-11-05 | Du Pont | Apparatus |
| DE2361150B2 (de) * | 1973-12-07 | 1980-12-11 | Agfa-Gevaert Ag, 5090 Leverkusen | Fotografisches Gerät zur Naßbehandlung fotografischer Schichtträger |
| DE2820815C2 (de) * | 1978-05-12 | 1983-09-29 | Gebr. Schmid GmbH & Co, 7290 Freudenstadt | Durchlaufmaschine zum Entfernen von Fotoresisten und/oder Siebdruckfarben von Trägern |
| JPS5928154A (ja) * | 1982-08-06 | 1984-02-14 | Hitachi Chem Co Ltd | アルカリ型感光性フイルムの現像又ははく離方法および現像又ははく離装置 |
| US4722355A (en) * | 1985-08-19 | 1988-02-02 | Rolf Moe | Machine and method for stripping photoresist from wafers |
| JPS6274089A (ja) * | 1985-09-28 | 1987-04-04 | Tanaka Kikinzoku Kogyo Kk | プリント基板製造装置 |
| US4861385A (en) * | 1986-10-02 | 1989-08-29 | Aisaburo Yagishita | Article washing method |
| DE3736578A1 (de) * | 1987-10-26 | 1989-05-03 | Schering Ag | Verfahren zum zerstoeren von schaum und vorrichtung dafuer |
| DE3813518A1 (de) * | 1988-04-22 | 1989-11-02 | Hoellmueller Maschbau H | Maschine zum reinigen und/oder spuelen von bohrungen in leiterplatten |
| JPH0737311Y2 (ja) * | 1990-03-30 | 1995-08-23 | 株式会社芝浦製作所 | 処理装置の気泡発生防止装置 |
| JP2732725B2 (ja) * | 1991-06-14 | 1998-03-30 | 富士写真フイルム株式会社 | 水なし平版印刷版の廃液処理装置 |
| DE9200734U1 (de) * | 1992-01-23 | 1992-05-07 | Gebr. Schmid GmbH & Co, 7290 Freudenstadt | Vorrichtung zur Aufbereitung einer partikelbeladenen in einem Prozess anfallenden Flüssigkeit |
| JPH07509539A (ja) * | 1992-08-01 | 1995-10-19 | アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 特に平坦な被処理物を電解的に処理する方法,及び特にこの方法を実施するための装置 |
| US5759743A (en) * | 1992-10-30 | 1998-06-02 | Nippon Paint Co., Ltd. | Developer-circulating method in flexographic printing plate-making process and apparatus for carrying out developer-circulating method |
| DE4406759A1 (de) * | 1994-03-02 | 1995-09-07 | Gat Handels U Servicegesellsch | Reinigungs- und Wiederaufbereitungsverfahren für Wasser, Entwickler und Fixiererflüssigkeit, im Bereich von Filmentwicklung und Repros |
| US5494644A (en) * | 1994-12-06 | 1996-02-27 | Ecolab Inc. | Multiple product dispensing system including dispenser for forming use solution from solid chemical compositions |
| DE19715893C2 (de) * | 1997-04-16 | 1999-04-29 | Boehringer Ingelheim Int | Vorrichtung zum Entnehmen einer Flüssigkeit aus einem geschlossenen Behälter |
| EP0883027B1 (en) * | 1997-06-05 | 2001-09-19 | AGFA-GEVAERT naamloze vennootschap | A method for making an offset printing plate according to the silver salt diffusion transfer process |
| US6247856B1 (en) * | 1998-01-22 | 2001-06-19 | Toyo Boseki Kabushiki Kaisha | Developing system of photosensitive resin plates and apparatus used therein |
| DE19944908A1 (de) * | 1999-09-10 | 2001-04-12 | Atotech Deutschland Gmbh | Verfahren zum Bilden eines Leitermusters auf dielektrischen Substraten |
| US6454835B1 (en) * | 2000-06-02 | 2002-09-24 | Scitex Digital Printing, Inc. | Two-phase flow separator |
| JP2002292315A (ja) * | 2001-03-29 | 2002-10-08 | Kyocera Corp | 噴霧装置およびそれを用いた現像方法 |
| KR100652044B1 (ko) * | 2001-12-18 | 2006-11-30 | 엘지.필립스 엘시디 주식회사 | 스트립 장치 |
| JP2003218502A (ja) * | 2002-01-22 | 2003-07-31 | Fujikura Ltd | 回路基板製造処理装置 |
| DE10225848A1 (de) * | 2002-06-04 | 2003-12-24 | Schmid Gmbh & Co Geb | Vorrichtung und Verfahren zum Lösen von Schichten von der Oberseite von flächigen Substraten |
| JP2004327962A (ja) * | 2003-04-07 | 2004-11-18 | Matsushita Electric Ind Co Ltd | レジストの剥離装置及び剥離方法 |
| DE102004002421A1 (de) * | 2004-01-16 | 2005-08-18 | Atotech Deutschland Gmbh | Düsenanordnung |
| JP4099489B2 (ja) * | 2005-04-15 | 2008-06-11 | 東京化工機株式会社 | レジスト回収装置 |
| JP4481865B2 (ja) * | 2005-04-15 | 2010-06-16 | 株式会社フジクラ | 現像機におけるスカム除去方法およびその装置 |
| JP2008013389A (ja) * | 2006-07-04 | 2008-01-24 | Nec Corp | エッチング装置及び薄型ガラス基板の製造方法 |
| JP2008085119A (ja) * | 2006-09-28 | 2008-04-10 | Tokyo Kakoki Kk | 薬液処理装置 |
| KR20080036441A (ko) * | 2006-10-23 | 2008-04-28 | 삼성전자주식회사 | 포토레지스트 제거 장치 |
| JP2008137733A (ja) * | 2006-11-30 | 2008-06-19 | Tokyo Kakoki Kk | 表面処理装置のコンベア |
| DE102007063202A1 (de) * | 2007-12-19 | 2009-06-25 | Gebr. Schmid Gmbh & Co. | Verfahren und Vorrichtung zur Behandlung von Silizium-Wafern |
-
2009
- 2009-07-06 DE DE102009032217A patent/DE102009032217A1/de not_active Withdrawn
-
2010
- 2010-07-05 ES ES10728247T patent/ES2426567T3/es active Active
- 2010-07-05 KR KR1020127000222A patent/KR101717261B1/ko active Active
- 2010-07-05 WO PCT/EP2010/059589 patent/WO2011003880A2/de not_active Ceased
- 2010-07-05 CN CN201080031214.5A patent/CN102576199B/zh active Active
- 2010-07-05 SG SG2011097201A patent/SG177420A1/en unknown
- 2010-07-05 AU AU2010270288A patent/AU2010270288A1/en not_active Abandoned
- 2010-07-05 JP JP2012518953A patent/JP2012532471A/ja active Pending
- 2010-07-05 EP EP10728247.7A patent/EP2452356B1/de active Active
- 2010-07-05 MY MYPI2012000056D patent/MY154759A/en unknown
- 2010-07-05 CA CA2765288A patent/CA2765288A1/en not_active Abandoned
- 2010-07-05 MX MX2012000344A patent/MX2012000344A/es not_active Application Discontinuation
- 2010-07-06 TW TW099122210A patent/TWI493730B/zh active
-
2011
- 2011-12-29 US US13/340,269 patent/US20120097188A1/en not_active Abandoned
-
2012
- 2012-01-02 IL IL217326A patent/IL217326A0/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR101717261B1 (ko) | 2017-03-16 |
| SG177420A1 (en) | 2012-02-28 |
| WO2011003880A3 (de) | 2011-07-07 |
| TWI493730B (zh) | 2015-07-21 |
| TW201115636A (en) | 2011-05-01 |
| EP2452356B1 (de) | 2013-06-05 |
| IL217326A0 (en) | 2012-02-29 |
| JP2012532471A (ja) | 2012-12-13 |
| EP2452356A2 (de) | 2012-05-16 |
| CN102576199B (zh) | 2015-05-06 |
| AU2010270288A1 (en) | 2012-01-12 |
| KR20120102033A (ko) | 2012-09-17 |
| CN102576199A (zh) | 2012-07-11 |
| CA2765288A1 (en) | 2011-01-13 |
| WO2011003880A2 (de) | 2011-01-13 |
| MY154759A (en) | 2015-07-15 |
| ES2426567T3 (es) | 2013-10-24 |
| US20120097188A1 (en) | 2012-04-26 |
| DE102009032217A1 (de) | 2011-01-13 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FA | Abandonment or withdrawal |