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MX2012000344A - Metodo y aparatopara tratar sustratos. - Google Patents

Metodo y aparatopara tratar sustratos.

Info

Publication number
MX2012000344A
MX2012000344A MX2012000344A MX2012000344A MX2012000344A MX 2012000344 A MX2012000344 A MX 2012000344A MX 2012000344 A MX2012000344 A MX 2012000344A MX 2012000344 A MX2012000344 A MX 2012000344A MX 2012000344 A MX2012000344 A MX 2012000344A
Authority
MX
Mexico
Prior art keywords
processing solution
substrates
container
extraction module
aparatopara
Prior art date
Application number
MX2012000344A
Other languages
English (en)
Inventor
Heinz Kappler
Joerg Lampprecht
Original Assignee
Schmid Gmbh Gebr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schmid Gmbh Gebr filed Critical Schmid Gmbh Gebr
Publication of MX2012000344A publication Critical patent/MX2012000344A/es

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/42Stripping or agents therefor
    • G03F7/422Stripping or agents therefor using liquids only
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10P70/20
    • H10P72/0424
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3042Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3057Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
    • H10P50/287
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02WCLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
    • Y02W10/00Technologies for wastewater treatment
    • Y02W10/30Wastewater or sewage treatment systems using renewable energies
    • Y02W10/37Wastewater or sewage treatment systems using renewable energies using solar energy

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Weting (AREA)

Abstract

En el caso de un método y aparato para tratar sustratos, se remueven o eliminan las capas resistentes de los sustratos mediante el rociado de una solución de procesamiento. Los sustratos son rociados primero con la solución de procesamiento en el modulo de extracción principal y de4spues en un modulo post extracción y dicha solución de procesamiento se recolecta en contenedores debajo de los módulos. Por lo menos se proporciona un contenedor para cada modulo de extracción principal en dos contenedores y primero se alimenta directamente al segundo contenedor. Que se encuentra separado en gran medida del primer contenedor de una pared que es permeable a los líquidos en una región significativamente debajo del nivel de superficie de la solución de procesamiento. La solución de procesamiento es eliminada del primer contenedor sin espuma y se regresa nuevamente al ciclo de proceso para mojar/humedecer los sustratos.
MX2012000344A 2009-07-06 2010-07-05 Metodo y aparatopara tratar sustratos. MX2012000344A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009032217A DE102009032217A1 (de) 2009-07-06 2009-07-06 Verfahren und Vorrichtung zur Behandlung von Substraten
PCT/EP2010/059589 WO2011003880A2 (de) 2009-07-06 2010-07-05 Verfahren und vorrichtung zur behandlung von substraten

Publications (1)

Publication Number Publication Date
MX2012000344A true MX2012000344A (es) 2012-04-10

Family

ID=43307765

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2012000344A MX2012000344A (es) 2009-07-06 2010-07-05 Metodo y aparatopara tratar sustratos.

Country Status (15)

Country Link
US (1) US20120097188A1 (es)
EP (1) EP2452356B1 (es)
JP (1) JP2012532471A (es)
KR (1) KR101717261B1 (es)
CN (1) CN102576199B (es)
AU (1) AU2010270288A1 (es)
CA (1) CA2765288A1 (es)
DE (1) DE102009032217A1 (es)
ES (1) ES2426567T3 (es)
IL (1) IL217326A0 (es)
MX (1) MX2012000344A (es)
MY (1) MY154759A (es)
SG (1) SG177420A1 (es)
TW (1) TWI493730B (es)
WO (1) WO2011003880A2 (es)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2923703C (en) 2013-09-18 2021-10-05 Flint Group Germany Gmbh Digitally exposable flexographic printing element and method for producing flexographic printing plates

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JPH0737311Y2 (ja) * 1990-03-30 1995-08-23 株式会社芝浦製作所 処理装置の気泡発生防止装置
JP2732725B2 (ja) * 1991-06-14 1998-03-30 富士写真フイルム株式会社 水なし平版印刷版の廃液処理装置
DE9200734U1 (de) * 1992-01-23 1992-05-07 Gebr. Schmid GmbH & Co, 7290 Freudenstadt Vorrichtung zur Aufbereitung einer partikelbeladenen in einem Prozess anfallenden Flüssigkeit
JPH07509539A (ja) * 1992-08-01 1995-10-19 アトーテヒ ドイッチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング 特に平坦な被処理物を電解的に処理する方法,及び特にこの方法を実施するための装置
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DE19944908A1 (de) * 1999-09-10 2001-04-12 Atotech Deutschland Gmbh Verfahren zum Bilden eines Leitermusters auf dielektrischen Substraten
US6454835B1 (en) * 2000-06-02 2002-09-24 Scitex Digital Printing, Inc. Two-phase flow separator
JP2002292315A (ja) * 2001-03-29 2002-10-08 Kyocera Corp 噴霧装置およびそれを用いた現像方法
KR100652044B1 (ko) * 2001-12-18 2006-11-30 엘지.필립스 엘시디 주식회사 스트립 장치
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DE10225848A1 (de) * 2002-06-04 2003-12-24 Schmid Gmbh & Co Geb Vorrichtung und Verfahren zum Lösen von Schichten von der Oberseite von flächigen Substraten
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Also Published As

Publication number Publication date
KR101717261B1 (ko) 2017-03-16
SG177420A1 (en) 2012-02-28
WO2011003880A3 (de) 2011-07-07
TWI493730B (zh) 2015-07-21
TW201115636A (en) 2011-05-01
EP2452356B1 (de) 2013-06-05
IL217326A0 (en) 2012-02-29
JP2012532471A (ja) 2012-12-13
EP2452356A2 (de) 2012-05-16
CN102576199B (zh) 2015-05-06
AU2010270288A1 (en) 2012-01-12
KR20120102033A (ko) 2012-09-17
CN102576199A (zh) 2012-07-11
CA2765288A1 (en) 2011-01-13
WO2011003880A2 (de) 2011-01-13
MY154759A (en) 2015-07-15
ES2426567T3 (es) 2013-10-24
US20120097188A1 (en) 2012-04-26
DE102009032217A1 (de) 2011-01-13

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