TWI462091B - CoFeNi alloy and sputtering target for soft magnetic film in vertical magnetic recording medium - Google Patents
CoFeNi alloy and sputtering target for soft magnetic film in vertical magnetic recording medium Download PDFInfo
- Publication number
- TWI462091B TWI462091B TW099118928A TW99118928A TWI462091B TW I462091 B TWI462091 B TW I462091B TW 099118928 A TW099118928 A TW 099118928A TW 99118928 A TW99118928 A TW 99118928A TW I462091 B TWI462091 B TW I462091B
- Authority
- TW
- Taiwan
- Prior art keywords
- cofeni
- based alloy
- recording medium
- magnetic recording
- soft magnetic
- Prior art date
Links
- 239000000956 alloy Substances 0.000 title claims description 54
- 229910045601 alloy Inorganic materials 0.000 title claims description 54
- 229910019233 CoFeNi Inorganic materials 0.000 title claims description 38
- 238000005477 sputtering target Methods 0.000 title claims description 9
- 229910052796 boron Inorganic materials 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 9
- 229910052726 zirconium Inorganic materials 0.000 claims description 8
- 230000004907 flux Effects 0.000 description 21
- 238000005260 corrosion Methods 0.000 description 11
- 230000007797 corrosion Effects 0.000 description 11
- 239000000463 material Substances 0.000 description 10
- 229910052758 niobium Inorganic materials 0.000 description 10
- 229910052735 hafnium Inorganic materials 0.000 description 7
- 229910052742 iron Inorganic materials 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 229910052715 tantalum Inorganic materials 0.000 description 7
- 229910052759 nickel Inorganic materials 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910020598 Co Fe Inorganic materials 0.000 description 1
- 229910002519 Co-Fe Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/06—Ferrous alloys, e.g. steel alloys containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
- C22C38/105—Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/14—Ferrous alloys, e.g. steel alloys containing titanium or zirconium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/13—Amorphous metallic alloys, e.g. glassy metals
- H01F10/131—Amorphous metallic alloys, e.g. glassy metals containing iron or nickel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/13—Amorphous metallic alloys, e.g. glassy metals
- H01F10/132—Amorphous metallic alloys, e.g. glassy metals containing cobalt
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Soft Magnetic Materials (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009139151A JP5425530B2 (ja) | 2009-06-10 | 2009-06-10 | 垂直磁気記録媒体における軟磁性膜層用ＣｏＦｅＮｉ系合金およびスパッタリングターゲット材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201112238A TW201112238A (en) | 2011-04-01 |
| TWI462091B true TWI462091B (zh) | 2014-11-21 |
Family
ID=43308857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW099118928A TWI462091B (zh) | 2009-06-10 | 2010-06-10 | CoFeNi alloy and sputtering target for soft magnetic film in vertical magnetic recording medium |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JP5425530B2 (ja) |
| CN (1) | CN102804266B (ja) |
| MY (1) | MY166667A (ja) |
| SG (1) | SG176782A1 (ja) |
| TW (1) | TWI462091B (ja) |
| WO (1) | WO2010143602A1 (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5698023B2 (ja) * | 2011-02-16 | 2015-04-08 | 山陽特殊製鋼株式会社 | 磁気記録用軟磁性合金及びスパッタリングターゲット材ならびに磁気記録媒体 |
| JP5778052B2 (ja) * | 2012-02-03 | 2015-09-16 | 山陽特殊製鋼株式会社 | 磁気記録媒体に用いる低飽和磁束密度を有する軟磁性膜層用合金およびスパッタリングターゲット材 |
| CN104451467B (zh) * | 2014-12-15 | 2016-04-27 | 郑州大学 | 一种钴基块体非晶合金及其制备方法 |
| CN114678185B (zh) * | 2022-03-17 | 2023-01-10 | 电子科技大学 | 一种基于非晶CoNiFe的多层磁芯膜及其制备方法 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007048790A (ja) * | 2005-08-05 | 2007-02-22 | Sony Corp | 記憶素子及びメモリ |
| JP2008299905A (ja) * | 2007-05-29 | 2008-12-11 | Sanyo Special Steel Co Ltd | 垂直磁気記録媒体における軟磁性膜層用合金 |
| JP2009070444A (ja) * | 2007-09-11 | 2009-04-02 | Hitachi Global Storage Technologies Netherlands Bv | 垂直磁気記録媒体 |
| TW200919461A (en) * | 2007-09-21 | 2009-05-01 | Sony Corp | Light-assisted magnetic head apparatus, light-assisted magnetic recording apparatus, and light-assisted magnetic recording method |
| TW200921662A (en) * | 2007-10-17 | 2009-05-16 | Sony Corp | Optical pickup and disc drive apparatus |
| TW200923926A (en) * | 2007-07-30 | 2009-06-01 | Showa Denko Kk | Perpendicular magnetic recording medium and process for producing same, and magnetic recording reproducing apparatus |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59136444A (ja) * | 1983-01-24 | 1984-08-06 | Sony Corp | 非晶質磁性合金 |
| JP2008189996A (ja) * | 2007-02-05 | 2008-08-21 | Hitachi Metals Ltd | Ｃｏ−Ｆｅ系合金スパッタリングターゲット材およびその製造方法 |
| JP5472688B2 (ja) * | 2008-06-12 | 2014-04-16 | 日立金属株式会社 | Ｆｅ−Ｃｏ系合金スパッタリングターゲット材およびその製造方法 |
| US20110143168A1 (en) * | 2008-11-05 | 2011-06-16 | Hitachi Metals, Ltd. | Co-fe alloy for soft magnetic films, soft magnetic film, and perpendicular magnetic recording medium |
-
2009
- 2009-06-10 JP JP2009139151A patent/JP5425530B2/ja not_active Expired - Fee Related
-
2010
- 2010-06-07 CN CN201080032150.0A patent/CN102804266B/zh not_active Expired - Fee Related
- 2010-06-07 MY MYPI2011005974A patent/MY166667A/en unknown
- 2010-06-07 SG SG2011091469A patent/SG176782A1/en unknown
- 2010-06-07 WO PCT/JP2010/059605 patent/WO2010143602A1/ja not_active Ceased
- 2010-06-10 TW TW099118928A patent/TWI462091B/zh not_active IP Right Cessation
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007048790A (ja) * | 2005-08-05 | 2007-02-22 | Sony Corp | 記憶素子及びメモリ |
| JP2008299905A (ja) * | 2007-05-29 | 2008-12-11 | Sanyo Special Steel Co Ltd | 垂直磁気記録媒体における軟磁性膜層用合金 |
| TW200923926A (en) * | 2007-07-30 | 2009-06-01 | Showa Denko Kk | Perpendicular magnetic recording medium and process for producing same, and magnetic recording reproducing apparatus |
| JP2009070444A (ja) * | 2007-09-11 | 2009-04-02 | Hitachi Global Storage Technologies Netherlands Bv | 垂直磁気記録媒体 |
| TW200919461A (en) * | 2007-09-21 | 2009-05-01 | Sony Corp | Light-assisted magnetic head apparatus, light-assisted magnetic recording apparatus, and light-assisted magnetic recording method |
| TW200921662A (en) * | 2007-10-17 | 2009-05-16 | Sony Corp | Optical pickup and disc drive apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102804266B (zh) | 2015-04-22 |
| JP2010287269A (ja) | 2010-12-24 |
| JP5425530B2 (ja) | 2014-02-26 |
| CN102804266A (zh) | 2012-11-28 |
| SG176782A1 (en) | 2012-01-30 |
| WO2010143602A1 (ja) | 2010-12-16 |
| TW201112238A (en) | 2011-04-01 |
| MY166667A (en) | 2018-07-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |