TW201112238A - CoFeNi-based alloy for soft magnetic film layer in vertical magnetic recording medium, and sputtering target material - Google Patents
CoFeNi-based alloy for soft magnetic film layer in vertical magnetic recording medium, and sputtering target material Download PDFInfo
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- TW201112238A TW201112238A TW099118928A TW99118928A TW201112238A TW 201112238 A TW201112238 A TW 201112238A TW 099118928 A TW099118928 A TW 099118928A TW 99118928 A TW99118928 A TW 99118928A TW 201112238 A TW201112238 A TW 201112238A
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- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 57
- 239000000956 alloy Substances 0.000 title claims abstract description 57
- 229910019233 CoFeNi Inorganic materials 0.000 title claims description 36
- 238000005477 sputtering target Methods 0.000 title claims description 8
- 239000013077 target material Substances 0.000 title 1
- 239000000203 mixture Substances 0.000 claims abstract description 9
- 229910052796 boron Inorganic materials 0.000 claims description 15
- 229910052726 zirconium Inorganic materials 0.000 claims description 7
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 2
- 229910052707 ruthenium Inorganic materials 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 230000004907 flux Effects 0.000 abstract description 23
- 238000005260 corrosion Methods 0.000 abstract description 13
- 230000007797 corrosion Effects 0.000 abstract description 13
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 abstract 3
- 239000000463 material Substances 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 8
- 229910052758 niobium Inorganic materials 0.000 description 8
- 229910052735 hafnium Inorganic materials 0.000 description 7
- 229910052715 tantalum Inorganic materials 0.000 description 7
- 229910052742 iron Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000010791 quenching Methods 0.000 description 4
- 230000000171 quenching effect Effects 0.000 description 4
- 238000002441 X-ray diffraction Methods 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910002555 FeNi Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- JAWMENYCRQKKJY-UHFFFAOYSA-N [3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-ylmethyl)-1-oxa-2,8-diazaspiro[4.5]dec-2-en-8-yl]-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]methanone Chemical class N1N=NC=2CN(CCC=21)CC1=NOC2(C1)CCN(CC2)C(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F JAWMENYCRQKKJY-UHFFFAOYSA-N 0.000 description 1
- 210000001361 achilles tendon Anatomy 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910001004 magnetic alloy Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/66—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers
- G11B5/667—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent the record carriers consisting of several layers including a soft magnetic layer
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C19/00—Alloys based on nickel or cobalt
- C22C19/07—Alloys based on nickel or cobalt based on cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/002—Ferrous alloys, e.g. steel alloys containing In, Mg, or other elements not provided for in one single group C22C38/001 - C22C38/60
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/06—Ferrous alloys, e.g. steel alloys containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/10—Ferrous alloys, e.g. steel alloys containing cobalt
- C22C38/105—Ferrous alloys, e.g. steel alloys containing cobalt containing Co and Ni
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/12—Ferrous alloys, e.g. steel alloys containing tungsten, tantalum, molybdenum, vanadium, or niobium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C38/00—Ferrous alloys, e.g. steel alloys
- C22C38/14—Ferrous alloys, e.g. steel alloys containing titanium or zirconium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/13—Amorphous metallic alloys, e.g. glassy metals
- H01F10/131—Amorphous metallic alloys, e.g. glassy metals containing iron or nickel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/13—Amorphous metallic alloys, e.g. glassy metals
- H01F10/132—Amorphous metallic alloys, e.g. glassy metals containing cobalt
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/851—Coating a support with a magnetic layer by sputtering
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
- Soft Magnetic Materials (AREA)
Abstract
Description
201112238 六、發明說明: 互相參照相關申請案 本申請案係依據2009年6月10日所申請之日本國專 利申請案第2009-1 39 1 5 1號’主張優先前者,其全體之揭 示內容依參照組入於本說明書中》 【發明所屬之技術領域】 本發明係有關用以使用來作爲垂直磁性記錄媒體中之 軟磁性膜層之CoFeNi系合金、及其濺鍍靶材者。 【先前技術】 近年’磁性記錄技術之進步很明顯,爲了驅動之大容 量化,磁性記錄媒體之高記錄密度化遂進展起來。例如, 可實現較以往普及之面內磁性記錄媒體更高記錄密度的垂 直磁性記錄方式被實用化。所謂垂直磁性記錄方式係相對 於垂直磁性記錄媒體之磁性膜中的媒體面,形成爲磁化容 易軸配向於垂直方向者,適用於高記錄密度之方法。繼而 ,在垂直磁性記錄方式中係已開發出具有提高記錄感度之 磁性記錄膜層與軟磁性膜層之2層記錄媒體。此磁性記錄 膜層一般使用Co Cr Pt-Si02系合金。201112238 VI. INSTRUCTIONS: Cross-references related applications This application is based on the Japanese Patent Application No. 2009-1 39 1 5 1, which was filed on June 10, 2009, and claims the priority. [Technical Field] The present invention relates to a CoFeNi-based alloy used as a soft magnetic film layer in a perpendicular magnetic recording medium, and a sputtering target thereof. [Prior Art] In recent years, advances in magnetic recording technology have become apparent, and the high recording density of magnetic recording media has progressed in order to quantify the volume of driving. For example, a vertical magnetic recording method capable of realizing a higher recording density than a conventional in-plane magnetic recording medium has been put into practical use. The perpendicular magnetic recording method is a method in which a magnetic recording easy axis is aligned in a vertical direction with respect to a medium surface in a magnetic film of a perpendicular magnetic recording medium, and is suitable for a high recording density. Then, in the perpendicular magnetic recording method, a two-layer recording medium having a magnetic recording film layer and a soft magnetic film layer for improving recording sensitivity has been developed. As the magnetic recording film layer, a Co Cr Pt-SiO 2 based alloy is generally used.
另外,軟磁性膜層已知有以Co或Fe之軟磁性元素作 爲基材,添加可改善非晶質性之Zr、Hf、Ta ' Nb及B的 合金。例如,如揭示於專利文獻1之垂直磁性記錄媒體 中之軟磁性膜層用合金或如揭示於專利文獻2之Co-FeS -5- 201112238 合金濺鍍靶材及其製造方法。 於此垂直磁性記錄媒體之軟磁性膜層中係尋求高飽和 磁束密度、高非晶質性、及高耐蝕性。進一步在近年中, 目的在於減輕磁性記錄媒體用磁碟與讀寫用頭之接觸所產 生的光碟之損傷,於軟磁性膜層遂要求硬度起來。 先前技術文獻 專利文獻 專利文獻1:特開2008-299905號公報 專利文獻2:特開2008-189996號公報 【發明內容】 發明之槪要 本發明人等藉由具有高飽和磁束密度、高非晶質性及 高耐蝕性,且使Ta及/或Nb、與B量爲特定之比率,俾 可得到具有較專利文獻1所提出之合金更高硬度的合金, 而得到此見識。 因此,本發明之目的在於提供一種飽和磁束密度、非 晶質性、耐蝕性及硬度優異之垂直磁性記錄媒體用軟磁性 合金、用以製作此合金之薄膜的灑鍍靶材、及具有由此合 金所構成之軟磁性膜層的垂直磁性記錄媒體。 若依本發明之第一態樣,可提供一種CoFeNi系合金 ’其係垂直磁性記錄媒體中之軟磁性膜層用Co FeNi系合 金’前述CoFeNi系合金就at%含有Co + Fe + Ni : 70〜92% ( 但Ni係包含〇)、 201112238 T a : 1 〜8 %、及、 B :超過7 %且2 0 %以下而成’ 前述CoFeNi系合金之組成(at% )爲滿足以下之比率者· Co/ ( Co + Fe + Ni ) : 0.1〜〇·9、Further, as the soft magnetic film layer, a soft magnetic element of Co or Fe is used as a base material, and an alloy of Zr, Hf, Ta ' Nb and B which can improve amorphous properties is known. For example, an alloy for a soft magnetic film layer as disclosed in the perpendicular magnetic recording medium of Patent Document 1 or a Co-FeS-5-201112238 alloy sputtering target disclosed in Patent Document 2 and a method for producing the same. In the soft magnetic film layer of the perpendicular magnetic recording medium, high saturation magnetic flux density, high amorphous property, and high corrosion resistance are sought. Further, in recent years, the purpose is to reduce the damage of the optical disc produced by the contact between the magnetic recording medium and the head for reading and writing, and to require hardness in the soft magnetic film layer. CITATION LIST OF THE INVENTION The present inventors have a high saturation magnetic flux density and high amorphousness by the inventors of the present invention. The quality and high corrosion resistance, and the ratio of Ta and/or Nb, and B are specific, and an alloy having a higher hardness than the alloy proposed in Patent Document 1 can be obtained, and this knowledge is obtained. Accordingly, an object of the present invention is to provide a soft magnetic alloy for a perpendicular magnetic recording medium having excellent saturation magnetic flux density, amorphous property, corrosion resistance and hardness, a sputter target for producing a film of the alloy, and the like A perpendicular magnetic recording medium of a soft magnetic film layer composed of an alloy. According to the first aspect of the present invention, there is provided a CoFeNi-based alloy which is a Co FeNi-based alloy for a soft magnetic film layer in a perpendicular magnetic recording medium. The CoFeNi-based alloy contains at least Co + Fe + Ni : 70 ~92% (but Ni contains 〇), 201112238 T a : 1 to 8 %, and B: more than 7% and 20% or less. 'The composition of the above CoFeNi-based alloy (at%) is the ratio that satisfies the following ratio · Co/ ( Co + Fe + Ni ) : 0.1~〇·9,
Fe/ ( Co + Fe + Ni ) : 0·1~〇·65、Fe / ( Co + Fe + Ni ) : 0·1~〇·65,
Ni/ ( Co + Fe + Ni ) : 0〜0.35,及 B/Ta : 1~8 。 若依本發明之第二態樣,可提供一種C〇FeNl系合金 ,其係垂直磁性記錄媒體中之軟磁性膜層用CoFeNi系合 金,前述CoFeNi系合金就at%含有Co + Fe + Ni : 70〜92% ( 但Ni係包含0)、Ni / ( Co + Fe + Ni ) : 0 to 0.35, and B/Ta : 1 to 8. According to the second aspect of the present invention, there is provided a C〇FeNl alloy which is a CoFeNi-based alloy for a soft magnetic film layer in a perpendicular magnetic recording medium, and the CoFeNi-based alloy contains Co + Fe + Ni at a%: 70~92% (but Ni contains 0),
Nb + Ta : 1~8%、 B :超過7%且20%以下而成, 前述CoFeNi系合金之組成(at% )爲滿足以下之比率者: Co/ ( Co + Fe + Ni ) : 〇. 1-0.9 'Nb + Ta : 1 to 8%, B: more than 7% and 20% or less, and the composition (at %) of the above CoFeNi-based alloy is such that Co/ ( Co + Fe + Ni ) : 〇. 1-0.9 '
Fe/ ( Co + Fe + Ni ) : 〇. 1 ~0.65、Fe / ( Co + Fe + Ni ) : 〇. 1 ~ 0.65,
Ni/ ( Co + Fe + Ni ) : 0-0.35 > 及 B/ ( Nb + Ta) : 1 ~8。 若依本發明之第三態樣,可提供一種CoFeNi系合金 ’其係垂直磁性記錄媒體中之軟磁性膜層用CoFeNi系合 金,前述CoFeNi系合金就at %含有Co + Fe + Ni : 70〜92 % ( 但Ni係包含0)、Ni / ( Co + Fe + Ni ) : 0-0.35 > and B / ( Nb + Ta) : 1 ~ 8. According to the third aspect of the present invention, there is provided a CoFeNi-based alloy which is a CoFeNi-based alloy for a soft magnetic film layer in a perpendicular magnetic recording medium, and the CoFeNi-based alloy contains Co + Fe + Ni : 70 at at % 92% (but Ni contains 0),
Zr + Hf+Nb + Ta : 1 〜8%、 B :超過7%且20%以下、 201112238Zr + Hf+Nb + Ta : 1 to 8%, B: more than 7% and less than 20%, 201112238
Zr + Hf : 0〜不足2%,及 Al + Cr : 0〜5%而成, 前述CoFeNi系合金之組成(at% )爲滿足以下之比率者: Co/ ( Co + Fe + Ni ) : 0· 1 〜0.9、Zr + Hf : 0 to less than 2%, and Al + Cr : 0 to 5%. The composition (at%) of the CoFeNi-based alloy is such that the following ratio is satisfied: Co / ( Co + Fe + Ni ) : 0 · 1 ~ 0.9,
Fe/ ( Co + Fe + Ni ) : 0,1 〜0.65、Fe / ( Co + Fe + Ni ) : 0,1 to 0.65,
Ni/ ( Co + Fe + Ni ) : 0-0.35 ' 及 B/ ( Nb + Ta):卜8 ° 若依本發明之另一態樣,可提供一種濺鎪靶材,其係 由上述各態樣之CoFeNi系合金所構成。 , 若依本發明之再另一態樣,可提供一種垂直磁性記錄 媒體,其係具有上述各態樣之CoFeNi系合金所構成的軟 磁性膜層。 用以實施發明之形態 以下,詳細說明有關本發明。又,只要無特別聲明, 本發明所記載之百分率(% )意指原子% ( at% )者。 本發明係關於垂直磁性記錄媒體中之軟磁性膜層用 CoFeNi系合金。此CoFeNi系合金就at%含有c〇 + Fe + Ni : 7 0〜9 2 % (但N i係包含0 )、 丁3:1~8%(第一態樣)、1^1) + 丁&:1〜8%(第二態樣)、 或Ni/( Co + Fe + Ni ) : 0-0.35 ' and B/( Nb + Ta): 卜 8 ° According to another aspect of the present invention, a sputtering target can be provided, which is derived from the above states It is composed of a CoFeNi-based alloy. According to still another aspect of the present invention, a perpendicular magnetic recording medium comprising a soft magnetic film layer composed of the above-described various CoFeNi-based alloys can be provided. MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail. Further, the percentage (%) described in the present invention means the atomic % (at%) unless otherwise stated. The present invention relates to a CoFeNi-based alloy for a soft magnetic film layer in a perpendicular magnetic recording medium. This CoFeNi-based alloy contains c〇+Fe + Ni : 7 0 to 9 2 % (but N i contains 0), 3:1 to 8% (first state), 1^1) + &: 1~8% (second aspect), or
Zr + Hf+Nb + Ta : 1 ~8 % (第三態樣)、及、 B:超過7%且20%以下,較佳係從上述元素變成實質上( consisting essentially 〇f),更佳係只由上述元素所構成Zr + Hf+Nb + Ta : 1 to 8% (third aspect), and B: more than 7% and less than 20%, preferably from the above elements to become substantially (consisting essentially 〇f), better Only composed of the above elements
-8 - 201112238 (consisting of)。又,第三態樣之CoFeNi系合金係可進 —步含有Zr + Hf: 0〜不足2%及Al + Cr: 0〜5%。此處,即 使在第一至第三之任一的態樣中,CoFeNi系合金之組成 (at%)爲滿足以下之比率:-8 - 201112238 (consisting of). Further, the third aspect of the CoFeNi-based alloy system may further contain Zr + Hf: 0 to less than 2% and Al + Cr: 0 to 5%. Here, even in the first to third aspects, the composition (at%) of the CoFeNi-based alloy satisfies the following ratios:
Co/ ( Co + Fe + Ni ) : 0·1〜0.9、Co/ ( Co + Fe + Ni ) : 0·1 to 0.9,
Fe/ ( Co + Fe + Ni ) : 0.1-0.65、Fe / ( Co + Fe + Ni ) : 0.1-0.65,
Ni/ ( Co + Fe + Ni ) : 0〜0.35,及 B/Ta : 1〜8 〇Ni/ ( Co + Fe + Ni ) : 0 to 0.35, and B/Ta : 1 to 8 〇
Co、Fe及Ni任一者均具有軟磁性特性之元素。Co、 Fe及Ni之各元素的含量無特別限定,但宜爲Co : 9~80% 、Fe : 5 〜6 0%、Ni : 0〜4 0%,更佳係 Co : 25 〜80%、Fe : 1 5-5 2%、Ni : 0〜10%。本發明之合金中的Co、Fe及Ni之 合計量(亦即Co + Fe + Ni量)爲70~92%,更佳係80~92% 。若此Co + Fe + Ni量不足70%,飽和磁束密度不充分,若 超過92%,反之,Zr、Hf、Ta、Nb、B之合計量變少,無 法得到充分的非晶質性。 若比較此等之 3元素,飽和磁束密度大槪依 Fe>Co>Ni之順序變小,另外,耐蝕性大槪依Ni>Co>Fe之 順序欠缺。考量如此之飽和磁束密度與耐蝕性之均衡,Co 、Fe及Ni之各量對Co + Fe + Ni之比率係在以下之範圍內Any of Co, Fe, and Ni has an element of soft magnetic properties. The content of each element of Co, Fe, and Ni is not particularly limited, but is preferably Co: 9 to 80%, Fe: 5 to 60%, Ni: 0 to 40%, and more preferably Co: 25 to 80%. Fe : 1 5-5 2%, Ni : 0 to 10%. The total amount of Co, Fe and Ni (i.e., the amount of Co + Fe + Ni) in the alloy of the present invention is 70 to 92%, more preferably 80 to 92%. When the amount of Co + Fe + Ni is less than 70%, the saturation magnetic flux density is insufficient, and if it exceeds 92%, the total amount of Zr, Hf, Ta, Nb, and B is reduced, and sufficient amorphous properties cannot be obtained. When these three elements are compared, the saturation magnetic flux density is large in the order of Fe>Co>Ni, and the corrosion resistance is large in the order of Ni>Co>Fe. Considering the balance between the saturation magnetic flux density and the corrosion resistance, the ratio of the amounts of Co, Fe, and Ni to Co + Fe + Ni is within the following range.
Co/ ( Co + Fe + Ni ) : 0.1-0.9,較佳係 0.3 〜0.9,Co / ( Co + Fe + Ni ) : 0.1-0.9, preferably 0.3 to 0.9,
Fe/ ( Co + Fe + Ni ) : 0.1-0.65 > 較佳係 0.2 〜0.55,及Fe / ( Co + Fe + Ni ) : 0.1-0.65 > preferably 0.2 to 0.55, and
Ni/ ( Co + Fe + Ni ) : 0 〜0.35,較佳係 0〜0.10。 S-· -9 - 201112238 若Ni/ ( Co + Fe + Ni )超過〇·35’無法得到充分的飽和 磁束密度。若Fe/(Co + Fe + Ni)低於o.i,無法得到充分 的飽和磁束密度。另外,若超過0.65,耐蝕性會劣化。 如此地,若決定 Ni/( Co + Fe + Ni)及 Fe/( Co + Fe + Ni )之範圍,Co/ ( Co + Fe + Ni )之下限變成 〇之(Ni/ ( Co + Fe + Ni) =0.35 ' Fe/ ( Co + Fe + Ni) =0.65 時),Co 爲極 少時,在Ni/ ( Fe + Ni)爲0.25〜0.40附近,存在飽和磁束 密度變成極小之特異點。因此,使Co/ ( Co + Fe + Ni )之下 限爲0.10,另外,Co/ ( Co + Fe + Ni)之上限變成0.9之( Ni/ ( Co + Fe + Ni ) =0、Fe/ ( Co + Fe + Ni ) =0.1 時)。Ni / ( Co + Fe + Ni ) : 0 to 0.35, preferably 0 to 0.10. S-· -9 - 201112238 If Ni / ( Co + Fe + Ni ) exceeds 〇·35', sufficient saturation magnetic flux density cannot be obtained. If Fe / (Co + Fe + Ni) is lower than o.i, a sufficient saturation magnetic flux density cannot be obtained. Moreover, if it exceeds 0.65, corrosion resistance will deteriorate. Thus, if the range of Ni/( Co + Fe + Ni) and Fe / ( Co + Fe + Ni ) is determined, the lower limit of Co / ( Co + Fe + Ni ) becomes 〇 (Ni / ( Co + Fe + Ni ) ) = 0.35 ' When Fe / ( Co + Fe + Ni) = 0.65), when Co is extremely small, the Ni/(Fe + Ni) is around 0.25 to 0.40, and there is a singular point where the saturation magnetic flux density becomes extremely small. Therefore, the lower limit of Co / ( Co + Fe + Ni ) is 0.10, and the upper limit of Co / ( Co + Fe + Ni) becomes 0.9 ( Ni / ( Co + Fe + Ni ) =0, Fe / ( Co + Fe + Ni ) = 0.1).
Ta、Nb及B係在本發明之合金中,任一者均爲可改 善非晶質性之元素。Ta、Nb及B之各元素的含量無特別 限定,宜T a : 1〜8 %、N b : S 5 %、B超過7 %且2 0 %以下, 更佳係T a : 2〜6 %、N b : 0 ~ 3 %、B : 7.5〜1 5 %。繼而,本發 明之合金中的Nb及Ta的合計量(亦即Nb + Ta量)爲 1〜8%。Nb + Ta量不足1 %,無法得到充分的非晶質性,若 超過8%,無法得到充分的飽和磁束密度。B爲7%以下時 ,無法得到充分的非晶質性,若超過2〇%,無法得到充分 的飽和磁束密度。 在本發明之合金中,B量對Ta + Nb量之比率即B/ ( Ta + Nb)爲1~8,宜爲1.5~6。若爲如此之範圍內’可實現 以往未看到之高硬度。高硬度化之詳細原理係不明,但在 合金中之Ta原子及/或Nb原子、與B原子之結合有可能 影響。此處,B/ ( Ta + Nb )不足1或超過8時,無法得到 201112238 充分的硬度。Among the alloys of the present invention, Ta, Nb and B are all elements which can improve the amorphous property. The content of each element of Ta, Nb, and B is not particularly limited, and is preferably T a : 1 to 8 %, N b : S 5 %, B more than 7% and 20% or less, more preferably T a : 2 to 6 % , N b : 0 ~ 3 %, B : 7.5~1 5 %. Further, the total amount of Nb and Ta (i.e., the amount of Nb + Ta) in the alloy of the present invention is 1 to 8%. When the amount of Nb + Ta is less than 1%, sufficient amorphous properties cannot be obtained, and if it exceeds 8%, a sufficient saturation magnetic flux density cannot be obtained. When B is 7% or less, sufficient amorphous properties cannot be obtained, and if it exceeds 2% by weight, a sufficient saturation magnetic flux density cannot be obtained. In the alloy of the present invention, the ratio of the amount of B to the amount of Ta + Nb, that is, B / ( Ta + Nb) is from 1 to 8, preferably from 1.5 to 6. If it is within such a range, it can achieve high hardness that has not been seen before. The detailed principle of high hardness is unknown, but the combination of Ta atoms and/or Nb atoms in the alloy and B atoms may affect. Here, when B/(Ta + Nb) is less than 1 or exceeds 8, the hardness of 201112238 cannot be obtained.
Zr及Hf任一者均爲可改善非晶質性之元素。Zr及Hf 之各元素的含量無特別限定,但宜Zr : $ 2%、Hf : S 1.0%。Zr、Hf、Nb 及 Ta 之合計量(亦即 Zr + Hf+Nb + Ta 量)可添加1〜8%,Zr及Hf之合計量(亦即Zr + Hf量) 可在〇~不足2%之範圍添加,此態樣相當於本發明之第三 態樣。Zr + Hf+Nb + Ta量不足1 %時’非晶質性不充分,若 超過8%,無法得到充分的飽和磁束密度。Zr + Hf量爲2% 以上時,硬度會降低。 A1及Cr在本發明之合金中爲改善耐蝕性之元素。A1 及Cr之各元素的含量無特別限定,但宜A1各3%、CrS 3% 。A1及Cr之合計量(亦即Al + Cr量)係使上限爲5%。若 A1 + C r量超過5 %,飽和磁束密度降低。 又,一般,在垂直磁性記錄媒體中之軟磁性膜層係濺 鍍與其成分相同之成分的濺鍍靶材,成膜於玻璃基板等之 上而得到。此處,藉濺鍍成膜之薄膜被急冷。然而,以下 敘述之實施例及比較例係使用以單輥式之液體急冷裝置製 作的急冷薄帶作爲供試料。此係實際上藉濺鑛急冷成膜之 薄膜中’對成分之各種特性的影響,藉液體急冷薄帶簡單 地評估。 【實施方式】 實施例 以下,依實施例具體地說明本發明。於表1之急冷薄 -11 - 201112238 帶的成分所秤量之原料3〇g以直徑1〇111111長40mm左右的 水冷銅鑄模在減壓之Ar中進行電弧溶解’作爲急冷薄帶 之熔解母材。急冷薄帶之製作條件係以單輥方式,於直徑 15mm之石英管中安裝於此溶解母材,以出熱水噴嘴徑爲 1mm,環境氣壓61kPa、噴霧壓差69kPa、銅輥(φ 300ηιηι )之旋轉數爲3000rpm,使銅輥與出熱水噴嘴之間隙爲 0.3mm而出熱水。出熱水溫度係各熔解母材之溶掉後。 201112238 m拋 枓鞠s莩 a 鑑 ja /—n 1? ο οό 0 csi CO 0 o CO 〇 (N3 0 csj o Csj LO evi — 叫 σ> ο If? CO ir> Csj ir> CO CO CM C0 — 一 NiACo 十 Fe+Ni) 沿 ο g 0 0 <z> s <=> g 0 S C> g 0 g 〇 0 0 Kf> 00 0 ΙΛ CO 〇 s S g 0 g 0 g c=> ΙΛ CO 〇 0 0 0 0 § 0 S 〇 Fe/CCo十 Fe+Ni) β ο 0 0 o 0 导 o 〇 另 o ΙΛ to in m in in to in CO \n CO g s 0 s s Co/(Co+ Fe+Ni) ο c> s 0 g 0 LO 〇 s 0 s 0 0 0 s 0 in CO 0 0 in c〇 m CO CO LT) σ> 0 Ln 〇 〇 + 0 0 0 〇 0 0 CS3 ΙΛ 0 0 0 ^3· co| 〇 o 0 0 〇 + c^3 0 0 0 〇 〇 〇 CNJ 0 0 0 CM m\ CvJ 〇 o OJ 0 〇 Zr+Hf +Nb+ Ta 一 CO 0〇 CO CO CO in 0 一 〇0 C〇 GO _ — 呀 〇e CO °Ί Co 十 Fe +Ni. 03 CO 00 CO CO 兮 0〇 ir> 00 cc» CO CO 0〇 CO c〇 CO CO 05 g LT3 GO CD eg p 0〇 0〇 CO +» Λ s-x 1S 璉 Φ 1S 0 0 §s 燄 as m 筢 AM? 插 m 筢 m §g 燄 辑 mm 欺 锻 燄 铌 m §s l«W 欺 筢 gM Sn 燄 镝 燄 筢 AM? 瞬 m 燄 i 燄 §s 燄 镝 AM? 跟 筢 (MW m 插 燄 1-1 u ο 0 〇 〇 0 o CO CM 〇 〇 o CnI Ova CO o o o 〇 ο c ο 0 〇 0 0 Ό Cs] CVJ CSJ 〇 〇 0 CO CO 0 0 0 〇 ο CQ CO 00 CO 0〇 CO CO 0〇 L£J c— σ> ir> W in LA 0〇 CO lf> 〇〇 σ> Λ 一 CO CO 04 04 CO ir>| 0 CO CO ro CQ 一 ^3· CO CO 03 •Ο 2 ο 0 CO 0 csi CvJ CO CO 0 0 0 CO CO CO o 0 CO 0 Ο «+-· X ο 0 0 0 0 σ> o 〇 0 〇 0 0 0 ' 0 0 〇 0 0 0 0 Ο u N ο Q 0 0 — 〇 0 03 0 0 0 σ> CO σ> 0 0 a> 0 ο Z 05 CO 〇 CO 00 CM rr 0 0 CO 〇 0 〇 Τ3» CO in CO C\J o 0 0 CP CO 0 0 CO CO 〇> Du g OO CO 00 tfi CO CO 0 CO 卜 od CO eo in CvJ LO m σ> s in 5 σ> CO CO CO 00 CO 〇g CO CO s CD CO in 0 却 Τ3* CO —u J 3 — CO cc ΙΛ CO 卜 OQ σ> 0 二 £J CO ΙΛ CO CO 2 S蠢S邀ss 13 201112238 如上述做法所製作之急冷薄帶作爲供試材,評估以下 之項目》 評估1 :飽和磁束密度 有關15mg左右的供試材,使用VSM裝置(振動試料 型磁力計),以施加磁場1.2 MA/m ( 15 kOe)測定飽和 磁束密度(T)。 評估2 :非晶質性(半寬値) 藉X線繞射進行急冷薄帶之非晶質性的評估。一般, 若測定非晶質材料之X線繞射圖型,看不到繞射譜峯,而 成爲非晶質特有之暈圖型(hala-pattern)。又,並非完全; 的非晶質時,雖可看到繞射譜峯,但與結晶材料比較,譜 峯局度變低,成爲半寬値(成爲繞射譜峯之一半高度時的 角度之寬)的大寬譜峯。此半寬値係與材料之非晶質性有 相關’非晶質性愈高,繞射譜峯係有變成更寬,且半寬値 變大之特徵。因此’依下述之方法而評估非晶質性。 於玻璃板以雙面膠帶貼黏供試材,以X線繞射裝置得 到繞射圖型。此時,測定面係成爲急冷薄帶之銅輥接觸面 ,使供試材貼黏於玻璃板。X線源係以Cu-k α線使掃描速 度形成分速4°而測定。成爲此繞射圖型之主峰的一半高度 時的角度之寬進行圖像解析,求出半寬値,作爲非晶質性 之評估。 201112238 評估3 ·’耐蝕性 於玻璃板以雙面膠帶貼黏供試材,‘ 爲3 5 °C而進行曝露1 6小時之鹽水噴霧 耐蝕性依以下之基準進行評估。 X :全面生銹 △:—部分生銹 〇:約無生銹 評估4 :維氏(Vickers )硬度 使急冷絲帶朝縱方向埋入樹脂,進 Vickers )硬度計測定急冷薄帶之維氏碌 荷重係以50g、n=10之平均進行評估。 左右。此等之評估試驗的結果表示方 g 5%NaCl的溶液 試驗,急冷薄帶之 行硏磨,以維氏( !度(HV )。測定 壓痕之尺寸爲1 〇 >表2中。 -15- 201112238 表2 No 飽和磁 (Τ) 値 (° > 耐蝕性 維氏硬度 (HV) 備 註 1 1.4 0.4 〇 1040 2 1.3 〇 1080 3 1.2 〇 1100 本 4 1.1 6.6 〇 1120 發 5 1.6 1.5 △ 1080 明 6 1.5 丁8 △ 1060 —-- 〇 1080 例 7 1.4 0.6 8 1.4 0.6 〇 1100 9 1.1 ----- 6.4 Δ 1040 10 1.3 0.2 〇 880 11 1.1 〇 900 12 1.1 5.5 〇 940 13 0.8 7.3 △ 1020 比 14 0.9 6.0 Δ 940 15 0.9 5.8 △ 1040 較 16 0.9 1 1 0.4 △ 1000 例 17 0.9 0.7 〇 1060 18 1.2 6.1 X 1060 19 0.9 —II 6.9 〇 1100 20 0.9 7.5 --- 〇 1100 在表1中,例1〜9係本發明例,例11 0〜2 0係比較例。 如表1所示般,例 10係 Ta、B之含量少,( Co + Fe + Ni )之含量多,且(Zr+Hf+Nb + Ta )之含量少,進 一步B/ ( Nb + Ta)値大,故半寬値小,維氏硬度低。例11 係B/ ( Nb + Ta )之値大,故維氏硬度低。例12係B/ ( Nb + Ta )之値小,故維氏硬度低。 -16- 201112238 例13係B之含量高且(Co + Fe + Ni )之含量少,故飽 和磁束密度低。例14係(Zr + Hf+Nb + Ta )之含量高,且 (Zr + Hf)之含量高,故飽和磁束密度低,維氏硬度低。 例15係(Al + Cr)之含量多,故飽和磁束密度低。例16 係Co/ ( Co + Fe + Ni )之値低,故飽和磁束密度低。 例 17 係 Co/ ( Co + Fe + Ni )之値高,且 Fe/ ( Co + Fe + Ni )之値低,故飽和磁束密度低。例1 8係Fe/ ( Co + Fe + Ni )之値高,故耐蝕性差》例19係Ni/ ( Co + Fe + Ni )之値 高,故飽和磁束密度低。例20係 Ta之含量高,且( Zr + Hf+Nb + Ta )之含量高,故飽和磁束密度低。然而,例 1~9係任一者均滿足本發明之條件,故可知任一者之特性 均優。 如以上般,同時添加Ta及/或Nb與B,且藉由形成 特定之B/(Nb + Ta)比,可得到習知合金沒有的高硬度。 藉此,可提供磁性特性、非晶質性、耐蝕性、及硬度優之 合金。 -17-Any of Zr and Hf is an element which can improve the amorphous property. The content of each element of Zr and Hf is not particularly limited, but it is preferably Zr: $2%, Hf: S 1.0%. The total amount of Zr, Hf, Nb and Ta (that is, the amount of Zr + Hf + Nb + Ta) can be added by 1 to 8%, and the total amount of Zr and Hf (that is, the amount of Zr + Hf) can be less than 2%. The range is added, which is equivalent to the third aspect of the invention. When the amount of Zr + Hf + Nb + Ta is less than 1%, the amorphous property is insufficient, and if it exceeds 8%, a sufficient saturation magnetic flux density cannot be obtained. When the amount of Zr + Hf is 2% or more, the hardness is lowered. A1 and Cr are elements for improving corrosion resistance in the alloy of the present invention. The content of each element of A1 and Cr is not particularly limited, but it is preferably 3% of A1 and 3% of CrS. The total amount of A1 and Cr (i.e., the amount of Al + Cr) is such that the upper limit is 5%. If the amount of A1 + C r exceeds 5%, the saturation magnetic flux density decreases. Further, in general, a soft magnetic film layer in a perpendicular magnetic recording medium is obtained by sputtering a sputtering target having the same composition as that of a component, and is formed on a glass substrate or the like. Here, the film deposited by sputtering is quenched. However, the examples and comparative examples described below used a quenched ribbon produced by a single-roller liquid quenching apparatus as a sample. This system is actually evaluated by the liquid quenching ribbon by the influence of the characteristics of the components in the film formed by the splashing of the quenched film. [Embodiment] Hereinafter, the present invention will be specifically described by way of examples. The quenching thinner of Table 1 - 201112238 The raw material weighed by the ingredients is 3〇g. The water-cooled copper mold with a diameter of 1〇111111 and 40mm is arc-dissolved in decompressed Ar' as a melting base material for the quenched ribbon. . The production conditions of the quenched ribbon are mounted on the dissolved base material in a single-roller type quartz tube of 15 mm in diameter, with a nozzle diameter of 1 mm, an ambient pressure of 61 kPa, a spray pressure difference of 69 kPa, and a copper roll (φ 300 ηιηι). The number of rotations was 3000 rpm, and the gap between the copper roller and the outlet nozzle was 0.3 mm to discharge hot water. The outlet hot water temperature is dissolved after each molten base material is dissolved. 201112238 m throwing 枓鞠s莩a ja / -n 1? ο οό 0 csi CO 0 o CO 〇(N3 0 csj o Csj LO evi — called σ> ο If? CO ir> Csj ir> CO CO CM C0 — A NiACo ten Fe+Ni) along ο g 0 0 <z> s <=> g 0 S C> g 0 g 〇0 0 Kf> 00 0 ΙΛ CO 〇s S g 0 g 0 gc=> ΙΛ CO 〇0 0 0 0 § 0 S 〇Fe/CCo 十Fe+Ni) β ο 0 0 o 0 引 o 〇 another o ΙΛ to in m in in to CO \n CO gs 0 ss Co/(Co+ Fe +Ni) ο c> s 0 g 0 LO 〇s 0 s 0 0 0 s 0 in CO 0 0 in c〇m CO CO LT) σ> 0 Ln 〇〇+ 0 0 0 〇0 0 CS3 ΙΛ 0 0 0 3·········· 0 C〇GO _ — 呀〇e CO °Ί Co Ten Fe +Ni. 03 CO 00 CO CO 兮0〇ir> 00 cc» CO CO 0〇CO c〇CO CO 05 g LT3 GO CD eg p 0〇0 〇CO +» Λ sx 1S 琏Φ 1S 0 0 §s flame as m 筢AM? Insert m 筢m §g Flame series mm Bulleting 铌m §sl«W Bullying gM Sn Flame 镝 筢 AM? Flame i flame §s Flame 镝 AM? Achilles tendon (MW m flame 1-1 u ο 0 〇〇0 o CO CM 〇〇o CnI Ova CO ooo 〇ο c ο 0 〇0 0 Ό Cs] CVJ CSJ 〇〇0 CO CO 0 0 0 〇ο CQ CO 00 CO 0〇CO CO 0〇L£J c— σ>ir> W in LA 0〇CO lf>〇〇σ> Λ a CO CO 04 04 CO ir>| 0 CO CO ro CQ ^3· CO CO 03 •Ο 2 ο 0 CO 0 csi CvJ CO CO 0 0 0 CO CO CO o 0 CO 0 Ο «+-· X ο 0 0 0 0 σ> o 〇0 〇0 0 0 ' 0 0 〇0 0 0 0 Ο u N ο Q 0 0 — 〇0 03 0 0 0 σ> CO σ> 0 0 a> 0 ο Z 05 CO 〇CO 00 CM rr 0 0 CO 〇0 〇Τ3» CO in CO C \J o 0 0 CP CO 0 0 CO CO 〇> Du g OO CO 00 tfi CO CO 0 CO od CO eo in CvJ LO m σ> s in 5 σ> CO CO CO 00 CO 〇g CO CO s CD CO in 0 Τ3* CO —u J 3 — CO cc ΙΛ CO 卜 OQ σ> 0 £J CO ΙΛ CO CO 2 S Stupid S invites ss 13 201112238 The quenched ribbon produced by the above method is used as a test material, Evaluation of the following items: Evaluation 1: Saturation magnetic flux density about 15 mg of test material, using VSM device (vibration sample) Type magnetometer), the saturation magnetic flux density (T) was measured by applying a magnetic field of 1.2 MA/m (15 kOe). Evaluation 2: Amorphous (semi-wide) The evaluation of the amorphous nature of the quenched ribbon by X-ray diffraction. In general, if the X-ray diffraction pattern of an amorphous material is measured, the diffraction peak is not seen, and it becomes a halo-pattern unique to amorphous. Further, in the case of amorphous, although the diffraction peak is observed, the peak of the spectrum becomes lower than that of the crystalline material, and becomes a half-width 値 (the angle at which the diffraction peak is one-half height) Wide) broad spectrum peak. This semi-wide lanthanum is related to the amorphous nature of the material. The higher the amorphousness, the wider the diffraction spectrum peak, and the larger the half-width 値. Therefore, the amorphous property was evaluated by the following method. The glass plate was adhered to the test piece by double-sided tape, and the diffraction pattern was obtained by the X-ray diffraction device. At this time, the measurement surface became the contact surface of the copper roll of the quenched ribbon, and the test material was adhered to the glass plate. The X-ray source was measured by forming a scanning speed of 4° with a Cu-k α line. The image was analyzed by the angle of the angle at half the height of the main peak of the diffraction pattern, and the half width was determined to evaluate the amorphousness. 201112238 Evaluation 3 · 'Corrosion resistance The test piece was adhered to the glass plate with double-sided tape, and the salt spray was exposed for 16 hours at 35 ° C. Corrosion resistance was evaluated on the basis of the following criteria. X: Total rust △: - Partially rusted 〇: Approximate rust-free evaluation 4: Vickers hardness causes the quenching ribbon to be embedded in the resin in the longitudinal direction, and the Vickers hardness tester measures the Vickers load of the quenched ribbon The evaluation was performed on the average of 50 g and n=10. about. The results of these evaluation tests indicate a solution test of square g 5% NaCl, honing the strip of chilled strips to Vickers (! (HV). The size of the indentation is 1 〇> in Table 2. 15- 201112238 Table 2 No Saturated Magnetic (Τ) 値 (° > Corrosion Resistance Vickers Hardness (HV) Remark 1 1.4 0.4 〇1040 2 1.3 〇1080 3 1.2 〇1100 41.1 6.6 〇1120 Hair 5 1.6 1.5 △ 1080 Ming 6 1.5 D 8 △ 1060 —- 〇 1080 Example 7 1.4 0.6 8 1.4 0.6 〇 1100 9 1.1 ----- 6.4 Δ 1040 10 1.3 0.2 〇 880 11 1.1 〇 900 12 1.1 5.5 〇 940 13 0.8 7.3 △ 1020 Ratio 14 0.9 6.0 Δ 940 15 0.9 5.8 △ 1040 Compared with 16 0.9 1 1 0.4 △ 1000 Example 17 0.9 0.7 〇 1060 18 1.2 6.1 X 1060 19 0.9 — II 6.9 〇 1100 20 0.9 7.5 --- 〇 1100 In Table 1, Examples 1 to 9 are examples of the present invention, and examples 11 0 to 2 0 are comparative examples. As shown in Table 1, Example 10 has a small content of Ta and B, and has a large content of (Co + Fe + Ni ), and (Zr) The content of +Hf+Nb + Ta ) is small, and further B/(Nb + Ta) is large, so the half width is small and the Vickers hardness is low. Example 11 is B/( Nb + Ta ) When the size is large, the Vickers hardness is low. In Example 12, the B/(Nb + Ta) is small, so the Vickers hardness is low. -16- 201112238 Example 13 is the content of B and the content of (Co + Fe + Ni) The content of the saturated magnetic flux is low, and the content of (Zr + Hf + Nb + Ta ) is high, and the content of (Zr + Hf) is high, so the saturation magnetic flux density is low and the Vickers hardness is low. The content of + Cr) is large, so the saturation magnetic flux density is low. In Example 16 , Co/( Co + Fe + Ni ) is low, so the saturation magnetic flux density is low. Example 17 is the height of Co/ ( Co + Fe + Ni ) And Fe / ( Co + Fe + Ni ) is low, so the saturation magnetic flux density is low. Example 1 8 series Fe / ( Co + Fe + Ni ) is high, so the corrosion resistance is poor. Example 19 is Ni / ( Co + Fe + Ni ) is high, so the saturation magnetic flux density is low. In Example 20, the content of Ta is high, and the content of (Zr + Hf + Nb + Ta ) is high, so the saturation magnetic flux density is low. However, any of Examples 1 to 9 satisfies the conditions of the present invention, and it is understood that either of them has excellent characteristics. As described above, Ta and/or Nb and B are simultaneously added, and by forming a specific B/(Nb + Ta) ratio, high hardness which is not found in conventional alloys can be obtained. Thereby, an alloy excellent in magnetic properties, amorphousness, corrosion resistance, and hardness can be provided. -17-
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| CN104451467B (en) * | 2014-12-15 | 2016-04-27 | 郑州大学 | A kind of cobalt-base body amorphous alloy and preparation method thereof |
| CN114678185B (en) * | 2022-03-17 | 2023-01-10 | 电子科技大学 | A kind of multilayer magnetic core film based on amorphous CoNiFe and preparation method thereof |
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| JP2008189996A (en) * | 2007-02-05 | 2008-08-21 | Hitachi Metals Ltd | Co-Fe-BASED ALLOY SPUTTERING TARGET MATERIAL AND METHOD FOR PRODUCING THE SAME |
| JP5031443B2 (en) * | 2007-05-29 | 2012-09-19 | 山陽特殊製鋼株式会社 | Alloy for soft magnetic film layer in perpendicular magnetic recording media |
| JP2009032356A (en) * | 2007-07-30 | 2009-02-12 | Showa Denko Kk | Perpendicular magnetic recording medium, its manufacturing method, and magnetic recording and reproducing device |
| JP2009070444A (en) * | 2007-09-11 | 2009-04-02 | Hitachi Global Storage Technologies Netherlands Bv | Perpendicular magnetic recording medium |
| JP2009076166A (en) * | 2007-09-21 | 2009-04-09 | Sony Corp | Optically assisted magnetic head device, optically assisted magnetic recording device, and optically assisted magnetic recording method |
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