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TWI456081B - 蒸鍍裝置 - Google Patents

蒸鍍裝置 Download PDF

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Publication number
TWI456081B
TWI456081B TW099146499A TW99146499A TWI456081B TW I456081 B TWI456081 B TW I456081B TW 099146499 A TW099146499 A TW 099146499A TW 99146499 A TW99146499 A TW 99146499A TW I456081 B TWI456081 B TW I456081B
Authority
TW
Taiwan
Prior art keywords
cross
sectional area
collar
vapor
vaporizer
Prior art date
Application number
TW099146499A
Other languages
English (en)
Other versions
TW201134963A (en
Inventor
Dong-Won Han
Damien Boesch
Martin Rosenblum
Original Assignee
Samsung Display Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Display Co Ltd filed Critical Samsung Display Co Ltd
Publication of TW201134963A publication Critical patent/TW201134963A/zh
Application granted granted Critical
Publication of TWI456081B publication Critical patent/TWI456081B/zh

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01BBOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/06Preventing bumping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/06Flash distillation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D1/00Evaporating
    • B01D1/16Evaporating by spraying
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B17/00Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups
    • B05B17/04Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods
    • B05B17/06Apparatus for spraying or atomising liquids or other fluent materials, not covered by the preceding groups operating with special methods using ultrasonic or other kinds of vibrations
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S165/00Heat exchange
    • Y10S165/911Vaporization

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Nozzles (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Claims (22)

  1. 一種蒸鍍器,其包含:一蒸發室,其具有一液體入口與一蒸氣出口;一蒸氣噴嘴,其係在該蒸氣出口之中;及一軸環,其係定位在該蒸發室與該蒸氣噴嘴之間,該軸環提高一在該蒸發室中的壓力,而通過該噴嘴之該出口的傳導係未改變;其中該軸環鄰近該蒸發室之一側之横截面面積係恆不大於該軸環鄰近該蒸氣噴嘴之一側之横截面面積,且該軸環之每個横截面面積皆小於該蒸氣噴嘴的横截面面積。
  2. 如申請專利範圍第1項之蒸鍍器,其中該軸環包含一可插入該蒸氣出口的第一部分。
  3. 如申請專利範圍第2項之蒸鍍器,其中該軸環包含一環圈。
  4. 如申請專利範圍第2項之蒸鍍器,其中該第一部分更包含一朝外延伸部分。
  5. 如申請專利範圍第4項之蒸鍍器,其中該第一部分包含一具有一環狀凸緣的環圈。
  6. 如申請專利範圍第4項之蒸鍍器,其中該朝外延伸部分包含至少一個耳片。
  7. 如申請專利範圍第2項之蒸鍍器,其中該第一部分具有一横截面面積小於該蒸氣噴嘴的一横截面面積。
  8. 如申請專利範圍第1項之蒸鍍器,其中該軸環包含一第一軸環與一第二軸環,該第一軸環具有一可插入該蒸氣出口的第一部分, 該第二軸環係插入該第一部分,該第二軸環具有一横截面面積小於該蒸氣噴嘴的一横截面面積。
  9. 如申請專利範圍第1項之蒸鍍器,其中該軸環包含一可插入該蒸氣出口的第一部分與一連接到該第一部分的第二部分,該第二部分具有一横截面面積小於該蒸氣噴嘴的一横截面面積。
  10. 如申請專利範圍第9項之蒸鍍器,其中該第一部分具有一凸緣,且其中該第二部分係連接到該凸緣。
  11. 如申請專利範圍第10項之蒸鍍器,其中該凸緣係從該軸環而朝外延伸。
  12. 如申請專利範圍第10項之蒸鍍器,其中該凸緣係從該軸環而朝內延伸。
  13. 如申請專利範圍第10項之蒸鍍器,其中該凸緣係從該軸環而朝內及朝外二者延伸。
  14. 如申請專利範圍第9項之蒸鍍器,其中該第二部分係可拆卸式連接到該第一部分。
  15. 如申請專利範圍第9項之蒸鍍器,其中該第二部分係永久式連接到該第一部分。
  16. 如申請專利範圍第9項之蒸鍍器,其中該第一部分包含一環圈。
  17. 如申請專利範圍第9項之蒸鍍器,其中該第一部分包含一具有一環狀凸緣的環圈。
  18. 如申請專利範圍第17項之蒸鍍器,其中該第二部分包含一第二環狀凸緣,且其中該第二環狀凸緣係連接到該環狀凸緣,且其中該第二環狀凸緣具有該横截面面積小於該蒸氣噴嘴的該横截面面積。
  19. 如申請專利範圍第9項之蒸鍍器,其中該第一部分更包含一朝外延伸部分。
  20. 如申請專利範圍第19項之蒸鍍器,其中該朝外延伸部分包含至少一個耳片。
  21. 如申請專利範圍第1項之蒸鍍器,其中該軸環係可拆卸的。
  22. 一種蒸鍍器,其包含:一蒸發室,其具有一液體入口與一蒸氣出口,該蒸發室具有一横截面面積,且該蒸氣出口具有一横截面面積小於該蒸發室的該横截面面積;一蒸氣噴嘴,其係在該蒸氣出口之中,該蒸氣噴嘴具有一横截面面積小於該蒸氣出口的該横截面面積;及一可拆卸式軸環,其係定位在該蒸發室與該蒸氣噴嘴之間;其中該可拆卸式軸環鄰近該蒸發室之一側之横截面面積係恆不大於該可拆卸式軸環鄰近該蒸氣噴嘴之一側之横截面面積,且該可拆卸式軸環之每個横截面面積皆小於該蒸氣噴嘴的横截面面積。
TW099146499A 2009-12-31 2010-12-29 蒸鍍裝置 TWI456081B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/650,586 US8590338B2 (en) 2009-12-31 2009-12-31 Evaporator with internal restriction
KR1020100123484A KR101243923B1 (ko) 2009-12-31 2010-12-06 증착 장치

Publications (2)

Publication Number Publication Date
TW201134963A TW201134963A (en) 2011-10-16
TWI456081B true TWI456081B (zh) 2014-10-11

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Family Applications (1)

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TW099146499A TWI456081B (zh) 2009-12-31 2010-12-29 蒸鍍裝置

Country Status (5)

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US (3) US8590338B2 (zh)
JP (1) JP5166509B2 (zh)
KR (1) KR101243923B1 (zh)
CN (2) CN105920864A (zh)
TW (1) TWI456081B (zh)

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KR20130089039A (ko) 2012-02-01 2013-08-09 삼성디스플레이 주식회사 증착 소스, 증착 장치 및 유기 발광 표시 장치 제조 방법
JPWO2014141330A1 (ja) 2013-03-13 2017-02-16 パナソニック株式会社 電子デバイス
CN104561905B (zh) * 2014-12-29 2017-07-14 昆山国显光电有限公司 一种线性蒸发源
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CN105920864A (zh) 2016-09-07
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US8904819B2 (en) 2014-12-09
JP2011137232A (ja) 2011-07-14
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US8590338B2 (en) 2013-11-26
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