1327755 九、發明說明： 【發明所屬之技術領域】 本發明係涉及一種晶圓密封供氣設備之相關裝置，特 別是指其氣體檢測裝置之創新型態設計者。 【先前技術】 按’晶圓於製程輸送過程中，必須將其置於晶圓盒中 ，以確保晶圓處於最潔淨的環境中，且進一步再藉由氣體 自動充填裝置的組配，將氮氣或鈍氣輸入晶圓盒空間中， 復藉由抽真空裝置將該輸入晶圓盒中之氮氣或鈍氣加以抽 出，此抽出過程中，可將對晶圓表面造成傷害之腐蝕性氣 體併抽出，使晶圓盒空間内達到充滿高純度氮氣或鈍氣 之狀癌’藉此以提昇晶圓製程之品質。 有關上述氣體自動充填裝置之結構型態，如臺灣專利 公告第527681號之「將氣體自動充人裝載埠上的晶圓盒之 裝置」所揭露者，其大致上係包括貫穿晶圓盒底座之進、 排氣孔，設置於裝载埠下方之進、排氣閥及管路，以 體提供裝置、抽真空裝置和控制電路，其運作i = 轧體提供裝置輸出氣體’經進氣閥及進氣管 日' = 置之運作，編盒中之氣體經由排 目 ^閥抽出外部；惟，此種習知 上仍存在下述之問題點： 貫際應用 中雖未揭露說明^此所述氣體自 其管路預定位署旁丹衣1於 置處通I會進一步組設有氣體偵測器’藉以 5 13277” 及晶圓盒空間中之氣體濃度狀態，藉此以控管 真之品質及運.作正常性、然而，此其間仍舊存在一 ’即’目前習知結構中’係將所述氣體_器組 汉於官路上，麸，瞢致由 ”、 中之乳體係為流動之不穩定狀態， 2體_器所檢測到的氣體濃度正確性顯然存在著相當 =差值…曰圓盒為可移動拆換之空間，故氣體偵測 -亦不可能組裝於該晶圓盒空間巾，是以，針對此一問題 點如何研發出一種更具理想實用性之創新構造 相關業界再加以思索突破之目標及方向者。 有鑑於此，發明人本於多年從事相關產品之製造開發 3汁經驗，針對上述之目#，詳加設計與審慎評估後， 終得一確具實用性之本發明。 【發明内容】 一種晶圓密封供氣設備 題點’係針對習知晶圓 於管路上而存在無法獲 心索突破；所述晶圓密 、一藉以連結該氣體供 氣裝置、—藉以連結該 中該進、排氣管路上並 置係藉以檢測該等管路 在於該氣體檢測裝置係 氣部’該進、出氣部係 本發明之主要目的’係在提供 之氣體檢測裝置，其所欲解決之問 密封供氣設備之氣體偵測器係組設 得正確氣體濃度狀態之問題點加以 封供氣設備係包括一氣體供應裝置 應裝置與晶圓盒之進氣管路、一抽 抽氣裝置與晶圓盒之排氣管路，直 組設有控制閥；而所述氣體檢測裝 與晶圓盒空間中之氣體狀態。 本發明解決問題之技術特點， 包括：一氣室，該氣室設有進、出 6 1327755 與晶圓盒之排氣管路相通，藉以可將該排氣管路中之氣體 導入氣室令’·至少一氣體感測器，藉以感測前述中 氣體狀態者。 、t τ < 進一步地，該氣室後置位置之排氣管路上並可再組設 有一旁通閥，藉該旁通闊之設置，以令該氣室及晶圓合内 之氣壓得與外部環境氣壓保持—致，使晶圓盒不 : 變者。 稭此創新獨特設計，使本發明對照先前技術而言，大 ❿致可達到如下優點·· 。 由於本創作係提供一氣室以將晶圓盒排氣管路中之氣 體導入俾可藉由該氣室形成一穩定之氣體容置空間，再 於該氣室組設氣體感㈣器，#此將能夠測得車交為穩定精確 之氣體濃度狀態，獲得一精確之檢測值，進以有效提昇晶 圓密封供氣設備之氣體監控品質者。 【實施方式】 广凊參閱第1、2圖所示，係本發明晶圓密封供氣設備 之氣體檢測裝置之較佳實施例，惟此等實施例僅供說明之 用，在專利申請上並不受此結、構之限制；所述晶圓密封供 氣設備A係包括—氣體供應裝置1〇、一藉以連結該氣體供 應裝置10與晶圓盒20之進氣管路11、-抽氣裝置30、-藉 以連該抽氣裝置3〇與晶圓盒2〇之排氣管路Μ，其中該 進氣&路11、排氣管路31上並各別組設有控制閥12、32 ; 而所述氣體檢測裝置4〇，係藉以檢測前述該等管路與晶圓 7 1327755 孤20二間中之氣體狀態（如含氮氣之濃度），該氣體檢測 裝置40係包括： 一氣室41，該氣室41係設有至少一進氣部411及一出 氣部412 ，該進、出氣部4U 、412之相對外端係與前述 晶圓盒20之排氣管路31相連通，藉以可將該排氣管路31中 之氣體導入該氣室41中； 至少一氣體感測器42，係可組設於氣室41之一側部， 藉以可感測前述氣室41令之氣體狀態者； 一旁通閥43，係組設於該氣室41後置位置之排氣管路 31上，藉以令泫氣室41以及晶圓盒2〇空間内之氣壓與外部 環境氣壓保持一致，亦即，設置該旁通閥43之目的，係當 抽氣裝置30之抽氣動作所造成之負壓大於氣體供應裝置ι〇 之氣體輸出壓力時，可透過該旁通閥43引入外部氣壓，以 達到穩壓、防止晶圓盒20、氣室41因負壓而内凹變形損壞 之防護目的者。 ' < 卜其中，所述氣體感測器42係可藉以感測該氣室中所含 虱氣或鈍氣之濃度；亦或者可藉由該氣體感測器42之設置 ，達到偵測是否有氣體導入錯誤情形之偵錯功能者。 藉由上揭之結構組成設計，茲就本發明之使用狀態 明如下： u /本發明之主要核心設計係在於該氣體檢測裝置仙係包 括*1室41、氣體感測器42、旁通閥43所構成之構造型緣匕 至於該晶圓密封供氣設備A之運作原理及結構部份係:習 8 2拉其運作時，請參第卜2圖所示，氣體供應裝錢 動時所輸出之氣胃（如氮氣或鈍氣）係經由其進氣管路 :控制閥'、進入晶圓盒2〇空間中，另一方面，藉由該 =置3G之運作抽吸，使得晶圓盒2()内之氣體得再經由 乳官路31、控制閥32排出外部；此過程中，經過該排氣 官路31之氣體W如第2圖所示，將可進入所述之氣室4” 形成-穩定容置而流動性趨於緩慢之狀態，此時，即可藉 由該氣體感測㈣進行該氣室41内部氣Μ之狀態檢财 【本發明之優點】 由於本創作係提供_氣室以將晶圓盒排氣管路中之氣 肢導入，俾可藉由垓氣室形成一穩定之氣體容置空間，再 於該氣室組設氣體感測器，故可將晶圓盒排氣管路中之氣 體導入一個空間中令其穩定容置其中’藉此將能夠測得較 為穩定精確之氣體濃度狀態，獲得更加精確之檢測值，進 以有效提昇晶圓密封供氣設備之氣體監控品質者。 上述實施例所揭示者係藉以具體說明本發明，且文中 雖透過特定的術語進行說明，當不能以此限定本發明之專 利範圍；熟悉此項技術領域之人士當可在瞭解本發明之精 神與原則後對其進行變更與修改而達到等效之目的，而此 等變更與修改，皆應涵蓋於如后所述之申請專利範圍所界 定範_中。 13-27755 【圖式簡單說明】 第1圖：本發明所揭氣體檢測裝置與晶 配狀態之平面簡示圖。 第2圖：本發明所揭氣體檢測裝置之平 【主要元件符號說明】1327755 IX. Description of the Invention: [Technical Field] The present invention relates to a device for sealing a gas supply device for a wafer, and in particular to an innovative design of a gas detecting device. [Prior Art] According to the 'wafer in the process of transport, it must be placed in the wafer cassette to ensure that the wafer is in the cleanest environment, and further by the combination of gas automatic filling device, nitrogen Or the blunt gas is input into the wafer cassette space, and the nitrogen or the blunt gas in the input wafer cassette is extracted by the vacuuming device, and the corrosive gas that damages the surface of the wafer can be extracted during the extraction process. To achieve high-purity nitrogen or blunt gas in the cell space to enhance the quality of the wafer process. The structural type of the gas automatic filling device described above, such as the device disclosed in Taiwan Patent Publication No. 527681, "Automatically charging a gas cartridge on a wafer cassette", generally includes a substrate extending through the wafer cassette. Inlet and exhaust holes, inlet and exhaust valves and pipes disposed under the load port, body supply device, vacuum pumping device and control circuit, operation i = rolling body supply device output gas 'via intake valve and The intake pipe is operating at the same time, and the gas in the box is taken out through the exhaust valve; however, the following problems still exist in this conventional knowledge: Although not disclosed in the continuous application Gas from the pipeline is scheduled to be located next to the Danyi 1 at the location I will further set up a gas detector 'by 5 13277' and the gas concentration state in the wafer box space, in order to control the true quality And transport. For normality, however, there is still a 'that' in the current structure of the 'system of the gas _ group on the official road, bran, 瞢 caused by", the milk system in the flow Unstable state, the gas detected by the 2 body _ is thick There is obviously a difference between the degree of correctness and the difference... The round box is a space for removable and removable, so gas detection - it is impossible to assemble the space in the wafer cassette. Therefore, how to develop this problem? A more ideal and practical innovation structure related to the industry and then consider the goals and directions of breakthrough. In view of this, the inventor has been engaged in the manufacturing and development of related products for many years. For the above-mentioned purpose #, after detailed design and careful evaluation, the invention has finally become practical. SUMMARY OF THE INVENTION A wafer-sealed gas supply device is incapable of breaking through a conventional wafer on a pipeline; the wafer is densely coupled to the gas supply device, thereby The juxtaposition on the intake and exhaust lines is to detect that the pipelines are in the gas detecting portion of the gas detecting device. The main purpose of the present invention is to provide a gas detecting device, which is to be solved by the gas detecting device. The gas detector of the gas supply device is set to the correct gas concentration state. The gas supply device includes a gas supply device, an inlet pipe of the device and the wafer cassette, a pumping device and a wafer cassette. The exhaust line is provided with a control valve in a straight group; and the gas detects the state of the gas in the space of the wafer cassette. The technical feature of the invention solves the problem, comprising: a gas chamber, wherein the gas chamber is provided with an inlet and an outlet 6 1327755 communicating with the exhaust pipe of the wafer cassette, so that the gas in the exhaust gas line can be introduced into the gas chamber to make ' At least one gas sensor for sensing the aforementioned gas state. Further, t τ < further, the exhaust pipe of the rear position of the air chamber may be further provided with a bypass valve, by which the setting of the bypass is wide, so that the air pressure in the air chamber and the wafer is obtained Keeping with the external ambient air pressure, so that the wafer cassette does not: change. This innovative and unique design allows the present invention to achieve the following advantages over the prior art. Since the creation system provides a gas chamber to introduce the gas in the discharge tube of the wafer cassette, a stable gas accommodation space can be formed by the air chamber, and a gas sensation (4) is set in the gas chamber. It will be able to measure the state of the gas concentration in a stable and accurate manner, and obtain a precise detection value to improve the gas monitoring quality of the wafer sealed gas supply equipment. [Embodiment] Referring to Figures 1 and 2, there is shown a preferred embodiment of the gas detecting device for the wafer sealing gas supply device of the present invention, but the embodiments are for illustrative purposes only, and The wafer sealing gas supply device A includes a gas supply device 1 , an inlet pipe 11 for connecting the gas supply device 10 and the wafer cassette 20 , and a pumping gas. The device 30 is connected to the exhaust pipe 3 of the pumping device 3〇 and the wafer cassette 2, wherein the intake valve 1 and the exhaust pipe 31 are respectively provided with a control valve 12, And the gas detecting device 4 is configured to detect a gas state (such as a concentration of nitrogen) in the pipeline between the pipeline and the wafer 7 1327755. The gas detecting device 40 includes: a gas chamber 41. The air chamber 41 is provided with at least one air inlet portion 411 and one air outlet portion 412. The opposite outer ends of the inlet and outlet portions 4U and 412 are in communication with the exhaust line 31 of the wafer cassette 20, thereby The gas in the exhaust line 31 can be introduced into the air chamber 41; at least one gas sensor 42 can be assembled in the gas One side of the 41, whereby the gas state of the gas chamber 41 can be sensed; a bypass valve 43 is disposed on the exhaust line 31 at the rear position of the gas chamber 41, thereby allowing the helium chamber 41 And the air pressure in the space of the wafer cassette is consistent with the air pressure of the external environment, that is, the purpose of setting the bypass valve 43 is that the negative pressure caused by the pumping action of the air extracting device 30 is greater than the gas supply device ι〇 When the gas is outputting pressure, the external air pressure can be introduced through the bypass valve 43 to achieve voltage regulation and prevent the wafer case 20 and the gas chamber 41 from being damaged by the negative pressure. ' The gas sensor 42 can sense the concentration of helium or blunt gas contained in the gas chamber; or can be detected by the gas sensor 42 There is a debug function for gas import error situations. By using the structural design of the above, the state of use of the present invention is as follows: u / The main core design of the present invention is that the gas detecting device includes a *1 chamber 41, a gas sensor 42, and a bypass valve. The structure of the structure of the 43-part structure of the gas-sealed gas supply equipment A is as follows: When the operation of the air-conditioning equipment A is carried out, please refer to Figure 2, when the gas supply is loaded. The output of the stomach (such as nitrogen or blunt gas) through its inlet line: control valve ', into the space of the wafer cassette 2, on the other hand, by the operation of the = 3G pumping, so that the wafer The gas in the cartridge 2 () is again discharged to the outside via the milk official road 31 and the control valve 32; in the process, the gas W passing through the exhaust official passage 31, as shown in Fig. 2, will enter the gas chamber. 4" formation - stable accommodation and fluidity tends to be slow, at this time, the state of the gas chamber 41 can be checked by the gas sensing (four) [the advantages of the present invention] Provide a gas chamber to introduce the gas limbs in the venting line of the wafer cassette, and a stable gas can be formed by the helium chamber The accommodating space is further provided with a gas sensor in the air chamber, so that the gas in the venting line of the wafer cassette can be introduced into a space to stably accommodate it, thereby making it possible to measure relatively stable and precise. The state of the gas concentration is obtained to obtain a more accurate detection value, and the gas monitoring quality of the wafer sealing air supply device is effectively improved. The embodiments disclosed in the above embodiments are used to specifically describe the present invention, and the description is by specific terms. The scope of the present invention is not limited thereto; those skilled in the art can change and modify the spirit and principles of the present invention to achieve equivalent purposes, and such changes and modifications are It should be covered by the scope defined in the patent application scope as described later. 13-27755 [Simplified description of the drawings] Fig. 1 is a schematic plan view showing the state of the gas detecting device and the crystal matching state of the present invention. : The flatness of the gas detecting device disclosed in the present invention [main component symbol description]
晶圓密封供氣設備 A 氣體供應裝置 10Wafer sealed gas supply equipment A gas supply unit 10
圓密封供氣設備組 面圖。 進氣管路 11 控制閥 12 晶圓盒 20 抽氣裝置 30 排氣管路 31 控制閥 32 氣體檢測裝置 40 氣室 4 1 進氣部 411 出氣部 412 氣體感測器 42 旁通閥 43 10Round seal gas supply equipment group diagram. Intake line 11 Control valve 12 Cassette 20 Aspirator 30 Exhaust line 31 Control valve 32 Gas detection unit 40 Air chamber 4 1 Inlet 411 Outlet 412 Gas sensor 42 Bypass valve 43 10