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TWI408285B - Vacuum apparatus - Google Patents

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TWI408285B
TWI408285B TW99124209A TW99124209A TWI408285B TW I408285 B TWI408285 B TW I408285B TW 99124209 A TW99124209 A TW 99124209A TW 99124209 A TW99124209 A TW 99124209A TW I408285 B TWI408285 B TW I408285B
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Taiwan
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valve member
unit
vacuum
pumping device
vacuum pumping
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TW99124209A
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Chinese (zh)
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TW201204932A (en
Inventor
Hung Ti Hsu
Chung Yau Wu
Jhen Wei Chen
Cheng Shang Wang
Hau Lan Chang
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Au Optronics Corp
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Priority to TW99124209A priority Critical patent/TWI408285B/en
Publication of TW201204932A publication Critical patent/TW201204932A/en
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Publication of TWI408285B publication Critical patent/TWI408285B/en

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Abstract

A vacuum apparatus for providing vacuum environments to chambers is provided. The vacuum apparatus includes a plurality of air-extracting units and a third pipe unit. Each of the air-extracting units is connected to one of the chambers and includes a low vacuum air-extracting device, at least a high vacuum air-extracting device, a first pipe unit and a second pipe unit. The high vacuum air-extracting device is disposed between the low vacuum air-extracting device and the corresponding chamber. The first pipe unit is connected between the high air-extracting device and the low vacuum air-extracting device, wherein at least a first valve is disposed therein. The second pipe unit is connected to the corresponding chamber and the first pipe unit, wherein a second valve is disposed therein. A joined portion of the second pipe unit and the first pipe unit is located between the first valve and the low vacuum air-extracting device. The third pipe unit is connected to the first pipe units and at least a third valve is disposed therein, wherein the third valve is located between two neighboring first pipe units.

Description

真空設備Vacuum equipment

本發明是有關於一種抽氣設備,且特別是有關於一種真空設備。This invention relates to a pumping apparatus, and more particularly to a vacuum apparatus.

圖1是習知一種真空設備的示意圖。請參照圖1,習知真空設備100包括多個個別獨立的抽氣單元200。每一抽氣單元200用以提供一個腔室50內的真空環境。每一抽氣單元200包括乾式泵(dry pump)210、升壓泵(booster pump)220以及兩個渦輪泵(booster pump)230,其中升壓泵220連接於乾式泵210與渦輪泵230之間。渦輪泵230連接至對應的腔室50,且渦輪泵230與腔室50之間設有閥件240。渦輪泵230透過管路單元250連接至升壓泵220,且每一渦輪泵230與升壓泵220之間設有閥件260。此外,升壓泵220更透過管路單元270而直接連接至對應的腔室50,且管路單元270設有閥件280。1 is a schematic view of a conventional vacuum apparatus. Referring to FIG. 1 , the conventional vacuum apparatus 100 includes a plurality of individual independent pumping units 200. Each pumping unit 200 is used to provide a vacuum environment within a chamber 50. Each pumping unit 200 includes a dry pump 210, a booster pump 220, and two booster pumps 230, wherein the booster pump 220 is coupled between the dry pump 210 and the turbo pump 230. . The turbo pump 230 is coupled to a corresponding chamber 50 and a valve member 240 is disposed between the turbo pump 230 and the chamber 50. The turbo pump 230 is connected to the booster pump 220 through the line unit 250, and a valve member 260 is disposed between each of the turbo pump 230 and the booster pump 220. Further, the booster pump 220 is directly connected to the corresponding chamber 50 through the pipe unit 270, and the pipe unit 270 is provided with a valve member 280.

習知真空設備100的操作方法是先關閉閥件240、260並開啟閥件280,接著啟動乾式泵210,以抽取腔室50內的氣體,進而將腔室50內的壓力先降低至約6.6千帕(kPa)以下。接著,啟動升壓泵220,以將腔室50內的壓力進一步降低至約266帕(Pa)以下。然後,關閉閥件280並開啟閥件240、260,同時啟動渦輪泵230,以使腔室50內維持高真空環境。在圖1中,箭頭F1表示渦輪泵230啟動時的氣體流動方向。The conventional vacuum apparatus 100 operates by first closing the valve members 240, 260 and opening the valve member 280, and then activating the dry pump 210 to extract the gas in the chamber 50, thereby reducing the pressure in the chamber 50 to about 6.6. Below kilopascals (kPa). Next, boost pump 220 is activated to further reduce the pressure within chamber 50 to below about 266 Pascals. Valve member 280 is then closed and valve members 240, 260 are opened while turbine pump 230 is activated to maintain a high vacuum environment within chamber 50. In Fig. 1, an arrow F1 indicates a gas flow direction when the turbo pump 230 is started.

在渦輪泵230啟動後,乾式泵210及升壓泵220只需維持渦輪泵230啟動時所需的啟動壓力,不讓渦輪泵230運轉時的背壓(back pressure)過高即可。然而,習知真空設備100的這些抽氣單元200係彼此獨立,所以在渦輪泵230啟動後,每一抽氣單元200的乾式泵210及升壓泵220仍須維持運轉狀態。如此,不僅耗費較多的能源,還會增加真空設備100的維護成本。After the turbo pump 230 is started, the dry pump 210 and the booster pump 220 need only maintain the starting pressure required when the turbo pump 230 is started, and the back pressure when the turbo pump 230 is not operated may be excessively high. However, these pumping units 200 of the conventional vacuum apparatus 100 are independent of each other, so after the turbo pump 230 is started, the dry pump 210 and the booster pump 220 of each pumping unit 200 must remain in an operating state. In this way, not only the energy is consumed, but also the maintenance cost of the vacuum device 100 is increased.

本發明提供一種真空設備,以節省能源。The present invention provides a vacuum device to save energy.

本發明另提供一種真空設備的操作方法,以節省能源。The invention further provides a method of operating a vacuum device to save energy.

為達上述優點,本發明提出一種真空設備,其適於提供多個腔室內的真空環境。此真空設備包括多個抽氣單元以及第三管路單元。每一抽氣單元連接至所述多個腔室其中之一,且每一抽氣單元包括低真空抽氣裝置、至少一高真空抽氣裝置、第一管路單元及第二管路單元。高真空抽氣裝置設置於低真空抽氣裝置與對應的腔室之間,並連接至對應的腔室。第一管路單元連接至高真空抽氣裝置與低真空抽氣裝置,且第一管路單元設有至少一第一閥件。第二管路單元連接至對應的腔室與第一管路單元。第二管路單元與第一管路單元的連接處位於第一閥件與低真空抽氣裝置之間,且第二管路單元設有第二閥件。第三管路單元連接這些抽氣單元的第一管路單元,其中第三管路單元設有至少一第三閥件,且每一第三閥件位於相鄰的二第一管路單元之間。To achieve the above advantages, the present invention provides a vacuum apparatus adapted to provide a vacuum environment within a plurality of chambers. The vacuum apparatus includes a plurality of pumping units and a third line unit. Each of the pumping units is coupled to one of the plurality of chambers, and each of the pumping units includes a low vacuum pumping device, at least one high vacuum pumping device, a first line unit, and a second line unit. The high vacuum pumping device is disposed between the low vacuum pumping device and the corresponding chamber and is connected to the corresponding chamber. The first pipeline unit is connected to the high vacuum suction device and the low vacuum suction device, and the first pipeline unit is provided with at least one first valve member. The second conduit unit is coupled to the corresponding chamber and the first conduit unit. The junction of the second conduit unit and the first conduit unit is between the first valve member and the low vacuum suction device, and the second conduit unit is provided with the second valve member. The third pipeline unit connects the first pipeline unit of the air suction unit, wherein the third pipeline unit is provided with at least one third valve member, and each third valve member is located at the adjacent two first pipeline units between.

在本發明之一實施例中,上述之每一第一管路單元更設有第四閥件,位於低真空抽氣裝置與第二管路單元之間,而第一閥件位於高真空抽氣裝置與第二管路單元之間。In an embodiment of the invention, each of the first pipeline units is further provided with a fourth valve member located between the low vacuum pumping device and the second pipeline unit, and the first valve member is located in the high vacuum pumping unit. Between the gas device and the second conduit unit.

在本發明之一實施例中,上述之第一閥件、第二閥件、第三閥件與第四閥件為手動閥件或電腦控制閥件。In an embodiment of the invention, the first valve member, the second valve member, the third valve member and the fourth valve member are manual valve members or computer controlled valve members.

在本發明之一實施例中,上述之每一抽氣單元更包括至少一第五閥件,設置於高真空抽氣裝置與對應的腔室之間。In an embodiment of the invention, each of the pumping units further includes at least one fifth valve member disposed between the high vacuum pumping device and the corresponding chamber.

在本發明之一實施例中,上述之每一第五閥件為適應性壓力控制器(adaptive pressure controller,APC)。In an embodiment of the invention, each of the fifth valve members is an adaptive pressure controller (APC).

在本發明之一實施例中,上述之每一低真空抽氣裝置包括乾式泵以及升壓泵,其中升壓泵連接於乾式泵與高真空抽氣裝置之間。In an embodiment of the invention, each of the low vacuum pumping devices comprises a dry pump and a booster pump, wherein the booster pump is coupled between the dry pump and the high vacuum pumping device.

在本發明之一實施例中,上述之每一高真空抽氣裝置包括一渦輪泵。In one embodiment of the invention, each of the high vacuum pumping devices described above includes a turbo pump.

本發明另提出一種真空設備的操作方法,其適用於上述之真空設備。此真空設備的操作方法包括:關閉第一閥件及第三閥件並開啟第二閥件,且啟動低真空抽氣裝置,以降低腔室內的壓力。接著,當腔室內的壓力降低至第一預設值後,關閉第二閥件並開啟第一閥件及第三閥件,且啟動高真空抽氣裝置並關閉部分低真空抽氣裝置。The present invention further provides a method of operating a vacuum apparatus that is suitable for use in the vacuum apparatus described above. The method of operating the vacuum apparatus includes closing the first valve member and the third valve member and opening the second valve member, and activating the low vacuum suction device to reduce the pressure in the chamber. Then, after the pressure in the chamber is lowered to the first preset value, the second valve member is closed and the first valve member and the third valve member are opened, and the high vacuum suction device is activated and a part of the low vacuum suction device is closed.

在本發明之一實施例中,上述之每一第一管路單元更設有一第四閥件,位於低真空抽氣裝置與第二管路單元之間,且第一閥件位於高真空抽氣裝置與第二管路單元之間。此外,在啟動低真空抽氣裝置時,更包括開啟第四閥件,而在關閉部分低真空抽氣裝置時,更包括關閉對應的部分第四閥件。In an embodiment of the invention, each of the first pipeline units is further provided with a fourth valve member located between the low vacuum pumping device and the second pipeline unit, and the first valve member is located in the high vacuum pumping unit. Between the gas device and the second conduit unit. In addition, when the low vacuum suction device is activated, the fourth valve member is further opened, and when the partial vacuum suction device is closed, the corresponding fourth valve member is further closed.

在本發明之一實施例中,上述之每一低真空抽氣裝置包括一乾式泵以及連接於乾式泵與高真空抽氣裝置之間的一升壓泵,而開啟低真空抽氣裝置的方法包括:開啟乾式泵,以降低腔室內的壓力。接著,當腔室內的壓力降低至一第二預設值後,開啟升壓泵,而第二預設值大於第一預設值。In an embodiment of the present invention, each of the low vacuum pumping devices includes a dry pump and a booster pump connected between the dry pump and the high vacuum pumping device, and the method of turning on the low vacuum pumping device Includes: Turn on the dry pump to reduce the pressure inside the chamber. Then, after the pressure in the chamber is lowered to a second preset value, the booster pump is turned on, and the second preset value is greater than the first preset value.

在高真空抽氣裝置啟動時,低真空抽氣裝置只需避免高真空抽氣裝置運轉時的背壓過高即可。在本發明之真空設備及其操作方法中,由於藉由第三管路單元連接所述多個抽氣單元的第一管路單元,所以當使用低真空抽氣裝置將每一腔室內的壓力降低至第一預設值進而啟動高真空抽氣裝置後,可關閉部分低真空抽氣裝置。亦即,在高真空抽氣裝置運轉時,僅需藉由部分低真空抽氣裝置運轉來防止高真空抽氣裝置運轉時的背壓過高,所以本發明之真空設備及其操作方法可節省能源。When the high vacuum pumping device is started, the low vacuum pumping device only needs to avoid the back pressure being too high when the high vacuum pumping device is operated. In the vacuum apparatus of the present invention and the method of operating the same, since the first line unit of the plurality of pumping units is connected by the third line unit, the pressure in each chamber is used when the low vacuum pumping device is used After lowering to the first preset value and then starting the high vacuum pumping device, part of the low vacuum pumping device can be turned off. That is, when the high vacuum pumping device is operated, it is only necessary to operate the partial low vacuum pumping device to prevent the back pressure from being too high during the operation of the high vacuum pumping device, so the vacuum device and the operating method thereof of the invention can save energy.

為讓本發明之上述和其他目的、特徵和優點能更明顯易懂,下文特舉較佳實施例,並配合所附圖式,作詳細說明如下。The above and other objects, features and advantages of the present invention will become more <RTIgt;

圖2是本發明一實施例之一種真空設備的示意圖,其中圖2省略了每一抽氣單元的第二管路單元。圖3是圖2中單一抽氣單元的示意圖。請參照圖2與圖3,本實施例之真空設備300適於提供多個腔室60內的真空環境。此真空設備300包括多個抽氣單元400以及第三管路單元310。每一抽氣單元400連接至所述多個腔室60其中之一,且每一抽氣單元400包括低真空抽氣裝置410、至少一高真空抽氣裝置420(圖2是以兩個高真空抽氣裝置420為例)、第一管路單元430及第二管路單元440。高真空抽氣裝置420設置於低真空抽氣裝置410與對應的腔室60之間,並連接至對應的腔室60。第一管路單元430連接至高真空抽氣裝置420與低真空抽氣裝置410。第二管路單元440連接至對應的腔室60與第一管路單元430。第三管路單元310連接這些抽氣單元400的第一管路單元430。2 is a schematic view of a vacuum apparatus according to an embodiment of the present invention, wherein FIG. 2 omits the second piping unit of each of the pumping units. Figure 3 is a schematic illustration of the single pumping unit of Figure 2. Referring to Figures 2 and 3, the vacuum apparatus 300 of the present embodiment is adapted to provide a vacuum environment within a plurality of chambers 60. This vacuum apparatus 300 includes a plurality of pumping units 400 and a third duct unit 310. Each of the pumping units 400 is coupled to one of the plurality of chambers 60, and each of the pumping units 400 includes a low vacuum pumping device 410 and at least one high vacuum pumping device 420 (FIG. 2 is two high) The vacuum pumping device 420 is an example), a first pipe unit 430, and a second pipe unit 440. The high vacuum pumping device 420 is disposed between the low vacuum pumping device 410 and the corresponding chamber 60 and is coupled to the corresponding chamber 60. The first line unit 430 is connected to the high vacuum pumping unit 420 and the low vacuum pumping unit 410. The second conduit unit 440 is coupled to the corresponding chamber 60 and the first conduit unit 430. The third line unit 310 connects the first line unit 430 of the pumping unit 400.

上述之每一低真空抽氣裝置410例如包括乾式泵412以及升壓泵414,其中升壓泵412連接於乾式泵414與高真空抽氣裝置420之間。此外,每一抽氣單元400的高真空抽氣裝置420的數量可視腔室60的大小而定,雖然本實施例的每一抽氣單元400之高真空抽氣裝置420的數量為兩個,但其亦可為一個或兩個以上。每一高真空抽氣裝置420例如是渦輪泵。另外,每一抽氣單元400可更包括至少一第五閥件450。每一第五閥件450設置於一個高真空抽氣裝置420與此高真空抽氣裝置420所對應的腔室60之間。每一第五閥件450例如為適應性壓力控制器,亦即第五閥件450的開合度可以調整。Each of the low vacuum pumping devices 410 described above includes, for example, a dry pump 412 and a booster pump 414, wherein the booster pump 412 is coupled between the dry pump 414 and the high vacuum pumping device 420. In addition, the number of high vacuum pumping devices 420 of each pumping unit 400 may depend on the size of the chamber 60, although the number of high vacuum pumping units 420 of each of the pumping units 400 of the present embodiment is two, But it can also be one or two or more. Each high vacuum pumping device 420 is, for example, a turbo pump. In addition, each of the pumping units 400 may further include at least one fifth valve member 450. Each of the fifth valve members 450 is disposed between a high vacuum pumping device 420 and a chamber 60 corresponding to the high vacuum pumping device 420. Each of the fifth valve members 450 is, for example, an adaptive pressure controller, that is, the opening degree of the fifth valve member 450 can be adjusted.

第一管路單元430係將抽氣單元400的高真空抽氣裝置420連接至低真空抽氣裝置410。第一管路單元430設有至少一第一閥件432。更詳細地說,第一閥件432的數量例如是與高真空抽氣裝置420的數量相對應,而每一第一閥件432設置於對應的高真空抽氣裝置420與低真空抽氣裝置410之間。在另一實施例中,亦可多個高真空抽氣裝置420共用一個第一閥件432。另外,每一第一管路單元430可更設有第四閥件434,其位於低真空抽氣裝置410與第二管路單元440之間,而第一閥件432位於高真空抽氣裝置420與第二管路單元430之間。The first line unit 430 connects the high vacuum pumping unit 420 of the pumping unit 400 to the low vacuum pumping unit 410. The first pipe unit 430 is provided with at least one first valve member 432. In more detail, the number of the first valve members 432 is, for example, corresponding to the number of high vacuum pumping devices 420, and each of the first valve members 432 is disposed in the corresponding high vacuum pumping device 420 and the low vacuum air extracting device. Between 410. In another embodiment, a plurality of high vacuum pumping devices 420 may also share a first valve member 432. In addition, each of the first pipe units 430 may further be provided with a fourth valve member 434 between the low vacuum pumping device 410 and the second pipe unit 440, and the first valve member 432 is located in the high vacuum pumping device. 420 is between the second conduit unit 430.

承上述,第二管路單元440與第一管路單元430的連接處C位於第一閥件432與低真空抽氣裝置410之間,且第二管路單元440設有第二閥件442。此外,第三管路單元310設有至少一第三閥件312,且每一第三閥件312位於相鄰的二第一管路單元430之間。也就是說,第三閥件312的數量視抽氣單元400的數量而定。舉例來說,當抽氣單元400數量為兩個時,第一管路單元430的數量為兩個,而第三閥件312的數量至少需要一個。在本實施例中,抽氣單元400的數量是以四個為例,所以第一管路單元430的數量亦為四個,而第三閥件312的數量例如是三個。另外,上述之第一閥件432、第二閥件442、第三閥件312與第四閥件434可為手動閥件或電腦控制閥件。In the above, the connection C of the second pipe unit 440 and the first pipe unit 430 is located between the first valve member 432 and the low vacuum pumping device 410, and the second pipe unit 440 is provided with the second valve member 442. . In addition, the third pipe unit 310 is provided with at least one third valve member 312, and each third valve member 312 is located between the adjacent two first pipe units 430. That is, the number of the third valve members 312 depends on the number of the pumping units 400. For example, when the number of the pumping units 400 is two, the number of the first duct units 430 is two, and the number of the third valve members 312 is at least one. In the present embodiment, the number of the air extraction units 400 is exemplified by four, so the number of the first duct units 430 is also four, and the number of the third valve members 312 is, for example, three. In addition, the first valve member 432, the second valve member 442, the third valve member 312 and the fourth valve member 434 may be manual valve members or computer controlled valve members.

本實施例之真空設備300因使用第三管路單元310連接各抽氣單元400之第一管路單元430,所以可在高真空抽氣裝置420啟動時,關閉部分抽氣單元400的低真空抽氣裝置410,以達到省電的效果。下文將詳細說明此真空設備的操作方法。The vacuum apparatus 300 of the present embodiment connects the first piping unit 430 of each of the pumping units 400 by using the third piping unit 310, so that the low vacuum of the partial pumping unit 400 can be turned off when the high vacuum pumping unit 420 is started. The air pumping device 410 is used to achieve the effect of power saving. The method of operation of this vacuum apparatus will be described in detail below.

圖4是本發明一實施例之真空設備的操作方法的流程圖,圖5繪示圖2之真空設備的單一抽氣單元在低真空抽氣裝置啟動且高真空抽氣裝置關閉時的氣體流動示意圖,而圖6繪示圖2之真空設備在高真空抽氣裝置啟動時的氣體流動示意圖。請先參照圖4與圖5,本實施例之真空設備的操作方法適用於上述之真空設備300。此真空設備的操作方法如步驟S110所示:關閉第一閥件432及第三閥件312並開啟第二閥件442,且啟動低真空抽氣裝置410,以降低腔室60內的壓力。此外,在第一管路單元430設有第四閥件434的實施例中,在啟動低真空抽氣裝置410時更包括開啟第四閥件434。換言之,在步驟S110中,由於第三閥件312是關閉的,所以各個抽氣單元400是彼此獨立。每一抽氣單元400藉由各自的低真空抽氣裝置410來降低對應的腔室60內的壓力。另外,在本實施例中,開啟低真空抽氣裝置410的方法例如是先開啟乾式泵412,以抽取腔室60內的氣體,進而降低腔室60內的壓力。在圖5中,箭頭F2表示低真空抽氣裝置410啟動時的氣體流動方向。接著,當腔室60內的壓力降低至第二預設值後,開啟升壓泵414,以同時藉由乾式泵412及升壓泵414來降低腔室60內的壓力。此第二預設值例如約6.6千帕,但不以此為限。4 is a flow chart of a method of operating a vacuum apparatus according to an embodiment of the present invention, and FIG. 5 is a diagram showing a gas flow of a single pumping unit of the vacuum apparatus of FIG. 2 when the low vacuum pumping device is started and the high vacuum pumping device is turned off. FIG. 6 is a schematic view showing the gas flow of the vacuum apparatus of FIG. 2 when the high vacuum pumping device is started. Referring first to FIG. 4 and FIG. 5, the operation method of the vacuum apparatus of this embodiment is applied to the above-described vacuum apparatus 300. The operation of the vacuum apparatus is as shown in step S110: closing the first valve member 432 and the third valve member 312 and opening the second valve member 442, and activating the low vacuum suction device 410 to reduce the pressure in the chamber 60. Further, in the embodiment in which the first conduit unit 430 is provided with the fourth valve member 434, the fourth valve member 434 is further included when the low vacuum suction device 410 is activated. In other words, in step S110, since the third valve member 312 is closed, the respective pumping units 400 are independent of each other. Each of the pumping units 400 reduces the pressure within the corresponding chamber 60 by a respective low vacuum pumping device 410. In addition, in the present embodiment, the method of turning on the low vacuum pumping device 410 is, for example, first turning on the dry pump 412 to extract the gas in the chamber 60, thereby reducing the pressure in the chamber 60. In Fig. 5, an arrow F2 indicates the direction of gas flow when the low vacuum pumping device 410 is activated. Next, after the pressure in the chamber 60 has decreased to a second predetermined value, the booster pump 414 is turned on to simultaneously reduce the pressure within the chamber 60 by the dry pump 412 and the booster pump 414. This second preset value is, for example, about 6.6 kPa, but is not limited thereto.

接著,請參照步驟S120及圖6,當腔室60內的壓力降低至第一預設值後,關閉第二閥件442並開啟第一閥件432及第三閥件312,且啟動高真空抽氣裝置420並關閉部分低真空抽氣裝置410,以使各腔室60維持高真空環境。上述之第一預設值小於第二預設值,第一預設值例如約266帕,但不以此為限。在圖6中,箭頭F3表示高真空抽氣裝置420啟動時的氣體流動方向。此外,在各抽氣單元400包括第五閥件450的實施例中,開啟高真空抽氣裝置420時,更包括開啟第五閥件450。在第一管路單元430設有第四閥件434的實施例中,在關閉部分低真空抽氣裝置410時更包括關閉對應的第四閥件434,也就是說,低真空抽氣裝置410被關閉時,其所對應的第四閥件434亦需關閉,以使各腔室60內的氣體能順利被維持運轉狀態的低真空抽氣裝置410所抽出。Next, referring to step S120 and FIG. 6, after the pressure in the chamber 60 is lowered to the first preset value, the second valve member 442 is closed and the first valve member 432 and the third valve member 312 are opened, and the high vacuum is started. The aspirator 420 and a portion of the low vacuum aspirator 410 are closed to maintain each chamber 60 in a high vacuum environment. The first preset value is less than the second preset value, and the first preset value is, for example, about 266 Pa, but is not limited thereto. In Fig. 6, an arrow F3 indicates the direction of gas flow when the high vacuum pumping device 420 is activated. Further, in the embodiment in which each of the pumping units 400 includes the fifth valve member 450, the opening of the high vacuum pumping device 420 further includes opening the fifth valve member 450. In the embodiment in which the first conduit unit 430 is provided with the fourth valve member 434, the closing of the partial vacuum evacuation device 410 further includes closing the corresponding fourth valve member 434, that is, the low vacuum suction device 410. When closed, the corresponding fourth valve member 434 also needs to be closed so that the gas in each chamber 60 can be smoothly withdrawn by the low vacuum pumping device 410 that maintains the operating state.

更詳細地說,高真空抽氣裝置420啟動後,低真空抽氣裝置410只需維持高真空抽氣裝置420啟動時所需的啟動壓力,不讓高真空抽氣裝置420運轉時的背壓過高即可。所以,本實施例在高真空抽氣裝置420運轉時關閉第二閥件442並開啟第一閥件432,以使每一抽氣單元400的第一管路單元430藉由第三管路單元310而彼此連通。如此,可關閉部分抽氣單元400的低真空抽氣裝置410,以藉由數量較少的低真空抽氣裝置410(例如一個低真空抽氣裝置410)來防止高真空抽氣裝置420運轉時的背壓過高。In more detail, after the high vacuum pumping device 420 is started, the low vacuum pumping device 410 only needs to maintain the starting pressure required when the high vacuum pumping device 420 is started, and does not allow the back pressure of the high vacuum pumping device 420 to operate. Too high. Therefore, in the embodiment, the second valve member 442 is closed and the first valve member 432 is opened when the high vacuum pumping device 420 is operated, so that the first pipe unit 430 of each pumping unit 400 is passed through the third pipe unit. 310 is connected to each other. In this manner, the low vacuum pumping device 410 of the partial pumping unit 400 can be turned off to prevent the high vacuum pumping device 420 from being operated by a small number of low vacuum pumping devices 410 (eg, a low vacuum pumping device 410). The back pressure is too high.

由於本實施例之真空設備300及其操作方法在高真空抽氣裝置420運轉時,可關閉部分的低真空抽氣裝置420,所以能達到節省能源的功效。此外,由於在高真空抽氣裝置420運轉時,僅需開啟部分低真空抽氣裝置410,所以能減少低真空抽氣裝置410的運轉時數,進而減少本實施例之真空設備300的設備維護成本。Since the vacuum apparatus 300 of the present embodiment and the method of operating the same can be used to turn off the low vacuum pumping unit 420 when the high vacuum pumping unit 420 is operated, the energy saving effect can be achieved. In addition, since only a part of the low vacuum pumping device 410 needs to be turned on when the high vacuum pumping device 420 is operated, the number of operating hours of the low vacuum pumping device 410 can be reduced, thereby reducing the equipment maintenance of the vacuum device 300 of the present embodiment. cost.

雖然本發明已以較佳實施例揭露如上,然其並非用以限定本發明,本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above preferred embodiments, it is not intended to limit the invention, and it is intended to be a part of the invention. The scope of protection of the present invention is therefore defined by the scope of the appended claims.

50、60...腔室50, 60. . . Chamber

100...真空設備100. . . Vacuum equipment

200...抽氣單元200. . . Pumping unit

210...乾式泵210. . . Dry pump

220...升壓泵220. . . Booster pump

230...渦輪泵230. . . Turbo pump

240、260、280...閥件240, 260, 280. . . Valve

250、270...管路單元250, 270. . . Pipe unit

300...真空設備300. . . Vacuum equipment

310...第三管路單元310. . . Third pipe unit

312...第三閥件312. . . Third valve

400...抽氣單元400. . . Pumping unit

410...低真空抽氣裝置410. . . Low vacuum pumping device

412...乾式泵412. . . Dry pump

414...升壓泵414. . . Booster pump

420...高真空抽氣裝置420. . . High vacuum pumping device

430...第一管路單元430. . . First pipe unit

432...第一閥件432. . . First valve

434...第四閥件434. . . Fourth valve

440...第二管路單元440. . . Second pipe unit

442...第二閥件442. . . Second valve

450...第五閥件450. . . Fifth valve

C...第二管路單元與第一管路單元的連接處C. . . a junction of the second conduit unit and the first conduit unit

F1、F2、F3...氣體流動方向F1, F2, F3. . . Gas flow direction

S110、S120...步驟S110, S120. . . step

圖1是習知一種真空設備的示意圖。1 is a schematic view of a conventional vacuum apparatus.

圖2是本發明一實施例之一種真空設備的示意圖。2 is a schematic view of a vacuum apparatus according to an embodiment of the present invention.

圖3是圖2中單一抽氣單元的示意圖。Figure 3 is a schematic illustration of the single pumping unit of Figure 2.

圖4是本發明一實施例之真空設備的操作方法的流程圖。4 is a flow chart showing a method of operating a vacuum apparatus according to an embodiment of the present invention.

圖5繪示圖2之真空設備的單一抽氣單元在低真空抽氣裝置啟動且高真空抽氣裝置關閉時的氣體流動示意圖。FIG. 5 is a schematic view showing the gas flow of the single pumping unit of the vacuum apparatus of FIG. 2 when the low vacuum pumping device is started and the high vacuum pumping device is turned off.

圖6繪示圖2之真空設備在高真空抽氣裝置啟動時的氣體流動示意圖。6 is a schematic view showing the gas flow of the vacuum apparatus of FIG. 2 when the high vacuum pumping device is started.

60...腔室60. . . Chamber

300...真空設備300. . . Vacuum equipment

310...第三管路單元310. . . Third pipe unit

312...第三閥件312. . . Third valve

400...抽氣單元400. . . Pumping unit

410...低真空抽氣裝置410. . . Low vacuum pumping device

412...乾式泵412. . . Dry pump

414...升壓泵414. . . Booster pump

420...高真空抽氣裝置420. . . High vacuum pumping device

430...第一管路單元430. . . First pipe unit

432...第一閥件432. . . First valve

434...第四閥件434. . . Fourth valve

450...第五閥件450. . . Fifth valve

F3...氣體流動方向F3. . . Gas flow direction

Claims (10)

一種真空設備,適於提供多個腔室內的真空環境,該真空設備包括:多個抽氣單元,每一抽氣單元連接至該些腔室其中之一,每一抽氣單元包括:一低真空抽氣裝置;至少一高真空抽氣裝置,設置於該低真空抽氣裝置與對應的該腔室之間,並連接至對應的該腔室;一第一管路單元,連接至該高真空抽氣裝置與該低真空抽氣裝置,且該第一管路單元設有至少一第一閥件;一第二管路單元,連接至對應的該腔室與該第一管路單元,該第二管路單元與該第一管路單元的連接處位於該第一閥件與該低真空抽氣裝置之間,且該第二管路單元設有一第二閥件;以及一第三管路單元,設置於該些抽氣單元的該些第一管路單元與該些低真空抽氣裝置之間,且該第三管路單元連接該些抽氣單元的該些第一管路單元,其中該第三管路單元設有至少一第三閥件,每一第三閥件位於相鄰的二第一管路單元之間。 A vacuum apparatus adapted to provide a vacuum environment in a plurality of chambers, the vacuum apparatus comprising: a plurality of pumping units, each pumping unit being coupled to one of the chambers, each pumping unit comprising: a low a vacuum pumping device; at least one high vacuum pumping device disposed between the low vacuum pumping device and the corresponding chamber and connected to the corresponding chamber; a first pipe unit connected to the high a vacuum pumping device and the low vacuum pumping device, wherein the first pipe unit is provided with at least one first valve member; a second pipe unit is connected to the corresponding chamber and the first pipe unit, a connection between the second pipe unit and the first pipe unit is between the first valve member and the low vacuum pumping device, and the second pipe unit is provided with a second valve member; and a third a pipeline unit disposed between the first pipeline units of the air suction units and the low vacuum suction devices, and the third pipeline unit is connected to the first pipelines of the air suction units Unit, wherein the third pipeline unit is provided with at least one third valve member, each third A first conduit member positioned between two adjacent cells. 如申請專利範圍第1項所述之真空設備,其中每一第一管路單元更設有一第四閥件,位於該低真空抽氣裝置與該第二管路單元之間,而該第一閥件位於該高真空抽氣裝置與該第二管路單元之間。 The vacuum apparatus of claim 1, wherein each of the first pipeline units further has a fourth valve member located between the low vacuum suction device and the second conduit unit, and the first A valve member is located between the high vacuum pumping device and the second conduit unit. 如申請專利範圍第2項所述之真空設備,其中該些第一閥件、該些第二閥件、該些第三閥件與該些第四閥件為手動閥件或電腦控制閥件。 The vacuum device of claim 2, wherein the first valve member, the second valve member, the third valve member and the fourth valve member are manual valve members or computer controlled valve members. . 如申請專利範圍第1項所述之真空設備,其中每一抽氣 單元更包括至少一第五閥件,設置於該高真空抽氣裝置與對應的該腔室之間。 Such as the vacuum device described in claim 1, wherein each pumping The unit further includes at least a fifth valve member disposed between the high vacuum pumping device and the corresponding chamber. 如申請專利範圍第4項所述之真空設備,其中每一第五閥件為適應性壓力控制器。 The vacuum apparatus of claim 4, wherein each of the fifth valve members is an adaptive pressure controller. 如申請專利範圍第1項所述之真空設備,其中每一低真空抽氣裝置包括:一乾式泵;以及一升壓泵,連接於該乾式泵與該高真空抽氣裝置之間。 The vacuum apparatus of claim 1, wherein each low vacuum pumping device comprises: a dry pump; and a booster pump connected between the dry pump and the high vacuum pumping device. 如申請專利範圍第1項所述之真空設備,其中每一高真空抽氣裝置包括一渦輪泵。 The vacuum apparatus of claim 1, wherein each high vacuum pumping device comprises a turbo pump. 一種真空設備的操作方法,適用於申請專利範圍第1項之真空設備,該真空設備的操作方法包括:關閉該些第一閥件及該第三閥件並開啟該些第二閥件,且啟動該些低真空抽氣裝置,以降低該些腔室內的壓力;以及當該些腔室內的壓力降低至一第一預設值後,關閉該些第二閥件並開啟該些第一閥件及該第三閥件,且啟動該些高真空抽氣裝置並關閉部分該些低真空抽氣裝置。 A method for operating a vacuum apparatus, which is suitable for the vacuum apparatus of claim 1, wherein the vacuum apparatus operates by closing the first valve member and the third valve member and opening the second valve member, and Activating the low vacuum suction devices to reduce the pressure in the chambers; and when the pressure in the chambers is lowered to a first predetermined value, closing the second valve members and opening the first valves And the third valve member, and the high vacuum suction devices are activated and some of the low vacuum suction devices are closed. 如申請專利範圍第8項之真空設備的操作方法,其中每一第一管路單元更設有一第四閥件,位於該低真空抽氣裝置與該第二管路單元之間,該第一閥件位於該高真空抽氣裝置與該第二管路單元之間,且在啟動該些低真空抽氣裝置時,更包括開啟該些第四閥件,而在關閉部分該些低真空抽氣裝置時,更包括關閉對應的部分該些第四閥件。 The operating method of the vacuum apparatus of claim 8 , wherein each of the first pipeline units further comprises a fourth valve member between the low vacuum pumping device and the second pipeline unit, the first The valve member is located between the high vacuum pumping device and the second pipeline unit, and when the low vacuum pumping devices are activated, further comprising: opening the fourth valve members, and in the closing portion, the low vacuum pumping The gas device further includes closing the corresponding portions of the fourth valve members. 如申請專利範圍第8項之真空設備的操作方法,其中每一低真空抽氣裝置包括一乾式泵以及連接於該乾式泵與該高真空抽氣裝置之間的一升壓泵,而開啟該低真空抽氣裝置的 方法包括:開啟該乾式泵,以降低該些腔室內的壓力;以及當該些腔室內的壓力降低至一第二預設值後,開啟該升壓泵,而該第二預設值大於該第一預設值。The method of operating a vacuum apparatus according to claim 8 wherein each low vacuum pumping device comprises a dry pump and a booster pump connected between the dry pump and the high vacuum pumping device Low vacuum pumping unit The method includes: opening the dry pump to reduce pressure in the chambers; and turning on the booster pump when the pressure in the chambers is lowered to a second predetermined value, and the second preset value is greater than the The first preset value.
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