TWI396923B - Miniature camera module and method for making same - Google Patents
Miniature camera module and method for making same Download PDFInfo
- Publication number
- TWI396923B TWI396923B TW96141440A TW96141440A TWI396923B TW I396923 B TWI396923 B TW I396923B TW 96141440 A TW96141440 A TW 96141440A TW 96141440 A TW96141440 A TW 96141440A TW I396923 B TWI396923 B TW I396923B
- Authority
- TW
- Taiwan
- Prior art keywords
- lens
- wafer
- transparent
- camera module
- unit
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 15
- 239000011521 glass Substances 0.000 claims description 42
- 230000006911 nucleation Effects 0.000 claims description 39
- 238000010899 nucleation Methods 0.000 claims description 39
- 125000006850 spacer group Chemical group 0.000 claims description 33
- 239000000758 substrate Substances 0.000 claims description 27
- 239000004065 semiconductor Substances 0.000 claims description 24
- 230000003287 optical effect Effects 0.000 claims description 16
- 238000004049 embossing Methods 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 230000008569 process Effects 0.000 claims description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 5
- 239000004033 plastic Substances 0.000 claims description 5
- 239000012780 transparent material Substances 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 238000005520 cutting process Methods 0.000 claims description 3
- 230000003068 static effect Effects 0.000 claims description 2
- 239000004408 titanium dioxide Substances 0.000 claims description 2
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical group [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 1
- 229920005989 resin Polymers 0.000 description 7
- 239000011347 resin Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000000465 moulding Methods 0.000 description 5
- 238000005553 drilling Methods 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000012634 optical imaging Methods 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 238000003331 infrared imaging Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
Landscapes
- Solid State Image Pick-Up Elements (AREA)
- Lens Barrels (AREA)
Description
本發明涉及光學成像領域,尤其涉及一種微型相機模組及其製作方法。 The present invention relates to the field of optical imaging, and in particular, to a miniature camera module and a method of fabricating the same.
近年來,具有攝像功能之電子產品,例如手機(Mobile Phone)越來越受到廣大消費者之青睞。然而,隨著手機越來越向輕薄短小方向發展,傳統之相機模組因體積較大而難以整合到手機中以使手機兼具攝像功能。 In recent years, electronic products with camera functions, such as mobile phones, have become more and more popular among consumers. However, as mobile phones are becoming more and more thin and light, the conventional camera modules are difficult to integrate into mobile phones due to their large size, so that the mobile phones have both camera functions.
參見Gautham Viswanadam等人於會議2005 Electronics Packaging Technology Conference上發表之“Novel Wafer Level Package Technology Studies for Image Sensor Devices”一文,其揭示了一種採用晶圓級封裝之微型相機模組,包括一個半導體影像感測晶片(Semiconductor Imaging Chip)及一個與半導體影像感測晶片組裝在一起而構成單一模組(Single Module)之鏡頭模組。該種微型相機模組因具小尺寸及低成本等優勢而有望應用於下一代輕薄短小化之手機中。 See "Novel Wafer Level Package Technology Studies for Image Sensor Devices" by Gautham Viswanadam et al., at the 2005 Electronics Packaging Technology Conference, which discloses a micro camera module in a wafer level package that includes a semiconductor image sensing. A semiconductor (Semiconductor Imaging Chip) and a lens module assembled with a semiconductor image sensing chip to form a single module. This kind of miniature camera module is expected to be applied to the next generation of thin and light mobile phones due to its small size and low cost.
由於該種微型相機模組相對於傳統之相機模組而言具有更小之尺寸,為滿足其尺寸要求及量產要求,其整個製程將會不同於傳統之相機模組;並且其對鏡頭模組之光學性能要求亦將會趨於嚴格以獲取較佳之成像品質。 Since the miniature camera module has a smaller size than the conventional camera module, the entire process will be different from the conventional camera module in order to meet the size requirements and mass production requirements; and the lens module The optical performance requirements of the group will also tend to be strict to achieve better image quality.
有鑒於此,提供一種具較佳成像品質之微型相機模組及其製造方法實為必要。 In view of this, it is necessary to provide a miniature camera module with better imaging quality and a method of manufacturing the same.
一種微型相機模組,其包括:一影像感測單元,其包括一感光區域;以及一透鏡單元,其接合於該影像感測單元之鄰近該感光區域之一側,該透鏡單元包括一玻璃襯底、一位於該玻璃襯底上之透明成核層以及一位於該透明成核層上之透鏡,該透鏡具有一主光軸,該感光區域設置於該透鏡之主光軸上且與該透鏡單元間隔設置。 A miniature camera module includes: an image sensing unit including a photosensitive area; and a lens unit coupled to one side of the image sensing unit adjacent to the photosensitive area, the lens unit including a glass lining a bottom, a transparent nucleation layer on the glass substrate and a lens on the transparent nucleation layer, the lens having a main optical axis disposed on a main optical axis of the lens and associated with the lens Unit interval setting.
以及,一種微型相機模組之製作方法,其包括步驟:提供一半導體晶圓(Wafer),其形成有複數個感光區域;提供一玻璃晶圓,其上沈積有一透明成核層及複數個經由壓印製程形成於該透明成核層上之透鏡,該複數個透鏡分別具有一主光軸;將該玻璃晶圓接合於該半導體晶圓之形成有該複數個感光區域之一側,該複數個感光區域與該玻璃晶圓間隔設置且該複數個感光區域位於與其對應之透鏡的主光軸上,從而形成一晶圓級微型相機模組陣列;以及切割該微型相機模組陣列,以獲取複數個相互分離之單個微型相機模組。 And a method of fabricating a miniature camera module, comprising the steps of: providing a semiconductor wafer (wafer) formed with a plurality of photosensitive regions; providing a glass wafer having a transparent nucleation layer deposited thereon and a plurality of vias An embossing process is formed on the transparent nucleation layer, the plurality of lenses respectively have a main optical axis; and the glass wafer is bonded to the side of the semiconductor wafer on which one of the plurality of photosensitive regions is formed, the plural a photosensitive area spaced from the glass wafer and the plurality of photosensitive areas are located on a main optical axis of the lens corresponding thereto, thereby forming a wafer level micro camera module array; and cutting the micro camera module array to obtain A plurality of individual miniature camera modules separated from each other.
該微型相機模組及其製作方法,其經由設置一透明成核層來控制透鏡單元之透鏡於形成過程中之表面張力以及增強透鏡與玻璃襯底之間的黏附力。一方面,表面張力之控制可抑制透鏡於其形成過程因表面張力過大而過度收縮,以免其光學性能下降;另一方面,黏附力之增強可使透鏡與玻璃襯底緊密結合而不致於脫落。 The miniature camera module and the method of fabricating the same, which control the surface tension of the lens of the lens unit during formation and enhance the adhesion between the lens and the glass substrate by providing a transparent nucleation layer. On the one hand, the control of the surface tension can inhibit the lens from excessively shrinking due to excessive surface tension during its formation to prevent its optical performance from deteriorating; on the other hand, the enhancement of the adhesion force can tightly bond the lens to the glass substrate without falling off.
10、30‧‧‧微型相機模組 10, 30‧‧‧ miniature camera module
12‧‧‧影像感測單元 12‧‧‧Image sensing unit
121‧‧‧半導體襯底 121‧‧‧Semiconductor substrate
123‧‧‧感光區域 123‧‧‧Photosensitive area
13‧‧‧間隔層 13‧‧‧ spacer
14‧‧‧透明蓋板 14‧‧‧Transparent cover
15‧‧‧紅外截止濾光層 15‧‧‧Infrared cut filter
16‧‧‧間隔單元 16‧‧‧Interval unit
17‧‧‧透鏡單元 17‧‧‧ lens unit
171‧‧‧玻璃襯底 171‧‧‧ glass substrate
173‧‧‧透明成核層 173‧‧‧Transparent nucleation layer
175‧‧‧透鏡 175‧‧‧ lens
221‧‧‧半導體晶圓 221‧‧‧Semiconductor wafer
23‧‧‧間隔層晶圓 23‧‧‧ spacer wafer
231‧‧‧通孔 231‧‧‧through hole
24‧‧‧透明蓋板晶圓 24‧‧‧ Transparent Cover Wafer
25‧‧‧紅外截止濾光層 25‧‧‧Infrared cut filter
26‧‧‧間隔單元晶圓 26‧‧‧Interval unit wafer
261‧‧‧通孔 261‧‧‧through hole
271‧‧‧玻璃晶圓 271‧‧‧glass wafer
273‧‧‧透明成核層 273‧‧‧Transparent nucleation layer
36‧‧‧間隔單元 36‧‧‧Interval unit
37‧‧‧透鏡單元 37‧‧‧ lens unit
371‧‧‧玻璃襯底 371‧‧‧ glass substrate
373‧‧‧透明成核層 373‧‧‧Transparent nucleation layer
375‧‧‧透鏡 375‧‧‧ lens
46‧‧‧間隔單元晶圓 46‧‧‧Interval unit wafer
471‧‧‧玻璃晶圓 471‧‧‧glass wafer
473‧‧‧透明成核層 473‧‧‧Transparent nucleation layer
圖1係本發明第一實施例提供之一種微型相機模組之截面示意圖。 1 is a schematic cross-sectional view of a miniature camera module according to a first embodiment of the present invention.
圖2係本發明實施例提供之一種製作圖1所示微型相機模組之方法之一過程 狀態局部示意圖。 FIG. 2 is a schematic diagram of a method for fabricating the miniature camera module of FIG. 1 according to an embodiment of the present invention; FIG. A partial schematic of the state.
圖3係本發明實施例制得之一個晶圓級微型相機模組陣列之俯視示意圖。 3 is a top plan view of an array of wafer level miniature camera modules fabricated in accordance with an embodiment of the present invention.
圖4係本發明第二實施例提供之另一種微型相機模組之截面示意圖。 4 is a schematic cross-sectional view showing another miniature camera module according to a second embodiment of the present invention.
圖5係本發明實施例提供之一種製作圖4所示微型相機模組之方法之一過程狀態局部示意圖。 FIG. 5 is a partial schematic view showing a process state of a method for manufacturing the miniature camera module shown in FIG. 4 according to an embodiment of the present invention.
下面將結合附圖與實施例對本技術方案作進一步詳細說明。 The technical solution will be further described in detail below with reference to the accompanying drawings and embodiments.
請參閱圖1,本發明第一實施例提供之微型相機模組10,其包括一影像感測單元12、一間隔層13、一透明蓋板14、一紅外截止濾光(Infra-red Cut Filter)層15、一間隔單元16以及一透鏡單元17。 Referring to FIG. 1 , a miniature camera module 10 according to a first embodiment of the present invention includes an image sensing unit 12 , a spacer layer 13 , a transparent cover 14 , and an infrared cut filter (Infra-red Cut Filter). A layer 15, a spacer unit 16, and a lens unit 17.
該影像感測單元12為一固態影像感測器件,例如電荷耦合感測器件(CCD)或互補式金氧半導體(CMOS)器件。該影像感測單元可包括一半導體襯底121及一經由半導體製程形成於半導體襯底121一側之感光區域123;該半導體襯底121可為矽襯底。 The image sensing unit 12 is a solid-state image sensing device such as a charge coupled sensing device (CCD) or a complementary metal oxide semiconductor (CMOS) device. The image sensing unit may include a semiconductor substrate 121 and a photosensitive region 123 formed on a side of the semiconductor substrate 121 via a semiconductor process; the semiconductor substrate 121 may be a germanium substrate.
該間隔層13接合於該影像感測單元12之形成有感光區域123之一側,其為一環狀結構,例如方形環狀結構。該方形環狀結構可具有一方形輪廓及一圓形通孔。該間隔層13可經由一黏合劑(圖中未示出),如紫外光可固化樹脂或熱硬化樹脂與該影像感測單元12接合在一起。 The spacer layer 13 is bonded to one side of the image sensing unit 12 on which the photosensitive region 123 is formed, which is an annular structure, such as a square ring structure. The square annular structure can have a square outline and a circular through hole. The spacer layer 13 may be bonded to the image sensing unit 12 via an adhesive (not shown) such as an ultraviolet curable resin or a thermosetting resin.
該透明蓋板14接合於該間隔層13之遠離該影像感測單元12之一側,並經由該間隔層13與該感光區域123間隔一預設距離。該透明蓋板14可經由一黏合劑(圖中未示出),如紫外光可固化樹脂或熱硬化樹脂與該間隔層13接合 在一起,以封蓋住該感光區域123。該透明蓋板14可由玻璃等透明材料製成。 The transparent cover 14 is joined to one side of the spacer layer 13 away from the image sensing unit 12, and is spaced apart from the photosensitive area 123 by a predetermined distance via the spacer layer 13. The transparent cover 14 can be bonded to the spacer layer 13 via an adhesive (not shown) such as an ultraviolet curable resin or a thermosetting resin. Together, the photosensitive area 123 is sealed. The transparent cover 14 may be made of a transparent material such as glass.
該紅外截止濾光層15設置於該透明蓋板14之遠離該感光區域123之一側,用以濾除紅外光。可理解的是,根據微型相機模組10之應用場合不同,例如應用於紅外攝像,該紅外截止濾光層15則需相應地變更為紅外導通(Infra-red Pass Filter)濾光層。 The infrared cut filter layer 15 is disposed on a side of the transparent cover 14 away from the photosensitive area 123 for filtering infrared light. It can be understood that, depending on the application of the miniature camera module 10, for example, for infrared imaging, the infrared cut filter layer 15 needs to be changed to an infrared-infrared filter (Infra-red Pass Filter) filter layer accordingly.
該間隔單元16接合於紅外截止濾光層15與透鏡單元17之間,用以在該紅外截止濾光層15與透鏡單元17之間形成一預定間隔。該間隔單元16為一環形結構,其材料優選為黑色擋光材料。 The spacer unit 16 is bonded between the infrared cut filter layer 15 and the lens unit 17 to form a predetermined interval between the infrared cut filter layer 15 and the lens unit 17. The spacer unit 16 is an annular structure, and the material thereof is preferably a black light blocking material.
該透鏡單元17接合於該間隔單元16之遠離該紅外截止濾光層15之一側,用以對被拍攝物體進行光學成像;該光學成像可由該影像感測單元12之感光區域123感測以產生相應之電子影像訊號。該透鏡單元17包括一玻璃襯底171、一位於該玻璃襯底171上之透明成核層173以及一位於該透明成核層173上之透鏡175,該透鏡175具有一主光軸OO'。該透明成核層173用以控制透鏡175在其形成過程中之表面張力以及透鏡175與玻璃襯底171之間之黏附力;從而一方面可抑制透鏡175於其形成過程因表面張力過大而過度收縮,以免其光學性能下降;另一方面可使透鏡175與玻璃襯底171緊密結合而不致於脫落。該透明成核層173之材料不同於玻璃襯底171與透鏡175,其可選用矽氧化物(SiOx,x之取值為1~2),二氧化鈦(TiO2)等無機透明材料。該透鏡175可為塑膠透鏡,如球面、非球面或折繞混合塑膠透鏡。該透鏡175可由壓印製程形成,例如紫外光壓印(UV Embossing)、熱壓印(Hot Embossing)或氮靜壓壓印(Nitrogen Embossing)等壓印工藝。 The lens unit 17 is coupled to one side of the spacing unit 16 away from the infrared cut filter layer 15 for optical imaging of the object; the optical imaging can be sensed by the photosensitive area 123 of the image sensing unit 12 Generate corresponding electronic image signals. The lens unit 17 includes a glass substrate 171, a transparent nucleation layer 173 on the glass substrate 171, and a lens 175 on the transparent nucleation layer 173. The lens 175 has a main optical axis OO'. The transparent nucleation layer 173 is used to control the surface tension of the lens 175 during its formation and the adhesion between the lens 175 and the glass substrate 171; thus, on the one hand, the lens 175 can be inhibited from being excessively excessive due to excessive surface tension during its formation. Shrinkage to prevent its optical performance from degrading; on the other hand, the lens 175 can be tightly bonded to the glass substrate 171 without falling off. The transparent nucleation layer 173 is made of a material different from the glass substrate 171 and the lens 175, and may be made of an inorganic transparent material such as cerium oxide (SiOx, x is 1 to 2) or titanium dioxide (TiO2). The lens 175 can be a plastic lens such as a spherical, aspherical or folded hybrid plastic lens. The lens 175 can be formed by an imprint process such as UV Embossing, Hot Embossing, or Nitrogen Embossing.
需要指明之是,本發明第一實施例之微型相機模組10亦可不設置該透明蓋板14、紅外截止濾光(Infra-red Cut Fi lter)層15及間隔單元16,而係 將該透鏡單元17經由該間隔層13及黏合劑(圖中未示出)直接接合於該影像感測單元12之鄰近該感光區域123之一側,並經由該間隔層13與該感光區域123間隔一預設距離。另外,可理解的是,該預設距離之大小可經由設定間隔層13之厚度來調整。進一步的,該透鏡單元17並不限於僅在玻璃襯底171之一側設置透明成核層及透鏡,其可於玻璃襯底171之雙面均設置透明成核層及透鏡。 It should be noted that the micro camera module 10 of the first embodiment of the present invention may not be provided with the transparent cover 14, the infrared cut filter layer 15 and the spacer unit 16, but The lens unit 17 is directly bonded to one side of the image sensing unit 12 adjacent to the photosensitive region 123 via the spacer layer 13 and an adhesive (not shown), and the photosensitive layer 123 is disposed via the spacer layer 13 Interval by a preset distance. In addition, it can be understood that the size of the preset distance can be adjusted by setting the thickness of the spacer layer 13. Further, the lens unit 17 is not limited to providing a transparent nucleation layer and a lens on only one side of the glass substrate 171, and a transparent nucleation layer and a lens may be provided on both surfaces of the glass substrate 171.
參見圖2及圖3,下面將具體描述一種製作微型相機模組10之方法,其大致可包括以下步驟: Referring to Figures 2 and 3, a method of fabricating the miniature camera module 10 will be specifically described below, which may generally include the following steps:
步驟(a):提供一半導體晶圓(Wafer)221,其上經由半導體製程形成有複數個感光區域123;本實施例中,該半導體晶圓221為矽晶圓。 Step (a): providing a semiconductor wafer (Wafer) 221 on which a plurality of photosensitive regions 123 are formed via a semiconductor process; in this embodiment, the semiconductor wafer 221 is a germanium wafer.
步驟(b):提供一間隔層晶圓23,利用蝕刻、或雷射鑽孔、或超聲鑽孔等方法於間隔層晶圓23上形成複數個通孔231,例如圓形通孔。 Step (b): providing a spacer wafer 23, forming a plurality of through holes 231, such as circular through holes, on the spacer wafer 23 by etching, or laser drilling, or ultrasonic drilling.
步驟(c):提供一透明蓋板晶圓24,於該透明蓋板晶圓24之一表面上利用濺鍍或蒸鍍等沈積方式形成一紅外截止濾光層25;本實施例中,該透明蓋板晶圓24為一玻璃晶圓。 Step (c): providing a transparent cover wafer 24, and forming an infrared cut filter layer 25 on one surface of the transparent cover wafer 24 by sputtering or evaporation; in this embodiment, The transparent cover wafer 24 is a glass wafer.
步驟(d):提供一黑色間隔單元晶圓26,利用蝕刻、或雷射鑽孔、或超聲鑽孔等方法於間隔單元晶圓26上形成複數個通孔261,例如圓形通孔。 Step (d): providing a black spacer cell wafer 26, forming a plurality of via holes 261, such as circular via holes, on the spacer cell wafer 26 by etching, or laser drilling, or ultrasonic drilling.
步驟(e):提供一玻璃晶圓271,於玻璃晶圓271上沈積一透明成核層273;該透明成核層273可經由蒸鍍或濺鍍方式沈積於該玻璃晶圓271上,用以於後續透鏡175之形成過程中控制其表面張力及透鏡175與玻璃晶圓271之黏附力。該透明成核層273之材料不同於玻璃晶圓271,其可為矽氧化物、二氧化鈦等無機透明材料。然後,於透明成核層273上經由壓印製程形成複數個透鏡175。 Step (e): providing a glass wafer 271, depositing a transparent nucleation layer 273 on the glass wafer 271; the transparent nucleation layer 273 may be deposited on the glass wafer 271 by evaporation or sputtering. The surface tension and the adhesion of the lens 175 to the glass wafer 271 are controlled during the formation of the subsequent lens 175. The material of the transparent nucleation layer 273 is different from the glass wafer 271, which may be an inorganic transparent material such as cerium oxide or titanium dioxide. Then, a plurality of lenses 175 are formed on the transparent nucleation layer 273 via an imprint process.
具體的,該壓印製程可為(i)紫外光壓印:利用一壓模之成型面壓印一形成於透明成核層273上之紫外光可固化樹脂層以形成複數個透鏡預成型體,並利用紫外光照射固化該透鏡預成型體來獲取複數個該透鏡175;(ii)熱壓印:利用一壓模之成型面壓印一形成於透明成核層273上之熱塑性樹脂層,於壓印過程中控制壓印溫度及施加於壓模相對於其成型面之背面的壓力,例如100~2000牛頓(Newton),來獲取複數個透鏡預成型體,冷卻後即可獲得複數個該透鏡175;或(iii)氮靜壓壓印:利用氮氣向壓模之相對於其成型面之背面施加壓力來壓印出複數個該透鏡175,由於氮氣為流體,其作用於壓模背面之壓力的分佈較均勻,進而有利於提升最終形成之透鏡175的品質。需要指明的是,該透鏡175之表面形狀設計可取決於壓模之成型面形狀。 Specifically, the imprint process may be (i) ultraviolet embossing: embossing a UV curable resin layer formed on the transparent nucleation layer 273 by using a molding surface of a stamper to form a plurality of lens preforms, And curing the lens preform by ultraviolet light to obtain a plurality of the lenses 175; (ii) hot stamping: stamping a thermoplastic resin layer formed on the transparent nucleation layer 273 by using a molding surface of a stamper The embossing process controls the embossing temperature and the pressure applied to the back surface of the stamper relative to the molding surface thereof, for example, 100 to 2000 Newtons to obtain a plurality of lens preforms, and after cooling, a plurality of the lenses are obtained. 175; or (iii) nitrogen static pressure imprint: a plurality of the lenses 175 are imprinted by applying pressure to the back surface of the stamper relative to the molding surface thereof by nitrogen gas, and the pressure acting on the back surface of the stamper is due to the fact that nitrogen is a fluid. The distribution is relatively uniform, which in turn helps to improve the quality of the lens 175 that is ultimately formed. It should be noted that the surface shape design of the lens 175 may depend on the shape of the molding surface of the stamper.
步驟(f):將該半導體晶圓221、間隔層晶圓23、透明蓋板晶圓24、間隔單元晶圓26、以及其上依次形成有透明成核層273及複數個透鏡175之玻璃晶圓271,依次疊設在一起,相鄰兩者之間可經由紫外光固化樹脂或熱硬化樹脂(圖未示出)接合在一起,以使該玻璃晶圓271接合於該半導體晶圓221之形成有該複數個感光區域123之一側;該複數個感光區域123和該玻璃晶圓271間隔設置且該複數個感光區域123分別位於與其對應之透鏡175之主光軸O0'上,從而形成一個晶圓級微型相機模組陣列100(如圖3所示)。 Step (f): the semiconductor wafer 221, the spacer wafer 23, the transparent cover wafer 24, the spacer cell wafer 26, and the glass crystal on which the transparent nucleation layer 273 and the plurality of lenses 175 are sequentially formed The circle 271 is stacked one on another, and the adjacent two may be bonded together via an ultraviolet curing resin or a thermosetting resin (not shown) to bond the glass wafer 271 to the semiconductor wafer 221 Forming one side of the plurality of photosensitive regions 123; the plurality of photosensitive regions 123 and the glass wafer 271 are spaced apart and the plurality of photosensitive regions 123 are respectively located on the main optical axis O0' of the lens 175 corresponding thereto, thereby forming A wafer level miniature camera module array 100 (shown in Figure 3).
步驟(g):切割該微型相機模組陣列100,則可獲取複數個相互分離之單個微型相機模組10。 Step (g): Cutting the micro camera module array 100, a plurality of single micro camera modules 10 separated from each other can be obtained.
需要指明的是,本實施例中之步驟(a)~步驟(g)的順序僅為舉例,並非限制本發明;本領域技術人員可適當變更各步驟(a)~(g)之先後順序,只有其不偏離本發明之技術效果均可。 It should be noted that the order of steps (a) to (g) in this embodiment is merely an example, and is not intended to limit the present invention; those skilled in the art may appropriately change the order of steps (a) to (g). Only it does not deviate from the technical effects of the present invention.
請參閱圖4,本發明第二實施例提供之微型相機模組30,其與第一實施例提供之微型相機模組10基本相同,包括一影像感測單元12、一間隔層13、一透明蓋板14、一紅外截止濾光(Infra-red Cut Filter)層15、一間隔單元16及一透鏡單元17;該影像感測單元12包括一半導體襯底121及一形成於該半導體襯底121一側之感光區域123。不同之處在於:該微型相機模組30還包括一透鏡單元37、以及位於透鏡單元37與透鏡單元17之間的另一間隔單元36。該透鏡單元37包括一玻璃襯底371、一位於該玻璃襯底371上之透明成核層373、以及一位於該透明成核層373上之透鏡375。該透鏡單元37之透鏡375設置於透鏡單元17之透鏡175的主光軸OO'上,且該透鏡單元37與該透鏡單元17接合在一起並經由該間隔單元36與透鏡單元17間隔一預設距離。該透明成核層373與第一實施例之透明成核層173基本相同,故不再贅述。該透鏡375與透鏡175可為球面、非球面或折繞混合塑膠透鏡。該種雙透鏡單元17之設置,有利於光學像差之校正,進而可提升整個微型相機模組30之成像品質。 Referring to FIG. 4, a miniature camera module 30 according to a second embodiment of the present invention is substantially the same as the micro camera module 10 provided in the first embodiment, and includes an image sensing unit 12, a spacer layer 13, and a transparent a cover 14 , an infrared cut filter layer 15 , a spacer unit 16 , and a lens unit 17 . The image sensing unit 12 includes a semiconductor substrate 121 and a semiconductor substrate 121 . Photosensitive area 123 on one side. The difference is that the miniature camera module 30 further includes a lens unit 37 and another spacing unit 36 between the lens unit 37 and the lens unit 17. The lens unit 37 includes a glass substrate 371, a transparent nucleation layer 373 on the glass substrate 371, and a lens 375 on the transparent nucleation layer 373. The lens 375 of the lens unit 37 is disposed on the main optical axis OO' of the lens 175 of the lens unit 17, and the lens unit 37 is coupled with the lens unit 17 and is spaced apart from the lens unit 17 by the spacing unit 36. distance. The transparent nucleation layer 373 is substantially the same as the transparent nucleation layer 173 of the first embodiment, and therefore will not be described again. The lens 375 and the lens 175 can be spherical, aspherical or folded plastic lenses. The arrangement of the double lens unit 17 facilitates the correction of optical aberrations, thereby improving the imaging quality of the entire miniature camera module 30.
另外,本領域技術人員可理解的是,本實施例中微型相機模組30並不限於僅包括兩個透鏡單元,其還可包括更多個透鏡單元,具體數量則可根據實際應用之需求而定。 In addition, it can be understood by those skilled in the art that the micro camera module 30 in this embodiment is not limited to only including two lens units, and may further include more lens units, and the specific number may be according to actual application requirements. set.
參見圖5,該微型相機模組30之製作方法與該微型相機模組10之製作方法基本相同,不同之處在於:為使微型相機模組30具雙透鏡單元之結構,於微型相機模組30之製作過程中,還需提供一其上依次形成有透明成核層473及複數個透鏡375之玻璃晶圓471、以及另一間隔單元晶圓46。該透明成核層473與間隔單元晶圓46分別與微型相機模組10之製作方法中之透明成核層273及間隔單元晶圓26基本相同,於此不再贅述。 Referring to FIG. 5 , the micro camera module 30 is manufactured in substantially the same manner as the micro camera module 10 . The difference is that the micro camera module 30 has a dual lens unit structure and is configured in the micro camera module. In the manufacturing process of 30, a glass wafer 471 on which a transparent nucleation layer 473 and a plurality of lenses 375 are sequentially formed, and another spacer unit wafer 46 are further provided. The transparent nucleation layer 473 and the spacer unit wafer 46 are substantially the same as the transparent nucleation layer 273 and the spacer unit wafer 26 in the manufacturing method of the micro camera module 10, and will not be described herein.
綜上所述,本發明確已符合發明專利之要件,遂依法提出專利申請。惟, 以上所述者僅為本發明之較佳實施方式,自不能以此限制本案之申請專利範圍。舉凡熟悉本案技藝之人士援依本發明之精神所作之等效修飾或變化,皆應涵蓋於以下申請專利範圍內。 In summary, the present invention has indeed met the requirements of the invention patent, and has filed a patent application according to law. but, The above is only a preferred embodiment of the present invention, and it is not possible to limit the scope of the patent application of the present invention. Equivalent modifications or variations made by persons skilled in the art in light of the spirit of the invention are intended to be included within the scope of the following claims.
10‧‧‧微型相機模組 10‧‧‧Micro Camera Module
12‧‧‧影像感測單元 12‧‧‧Image sensing unit
121‧‧‧半導體襯底 121‧‧‧Semiconductor substrate
123‧‧‧感光區域 123‧‧‧Photosensitive area
13‧‧‧間隔層 13‧‧‧ spacer
14‧‧‧透明蓋板 14‧‧‧Transparent cover
15‧‧‧紅外截止濾光層 15‧‧‧Infrared cut filter
16‧‧‧間隔單元 16‧‧‧Interval unit
17‧‧‧透鏡單元 17‧‧‧ lens unit
171‧‧‧玻璃襯底 171‧‧‧ glass substrate
173‧‧‧透明成核層 173‧‧‧Transparent nucleation layer
175‧‧‧透鏡 175‧‧‧ lens
Claims (9)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96141440A TWI396923B (en) | 2007-11-02 | 2007-11-02 | Miniature camera module and method for making same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW96141440A TWI396923B (en) | 2007-11-02 | 2007-11-02 | Miniature camera module and method for making same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200921234A TW200921234A (en) | 2009-05-16 |
| TWI396923B true TWI396923B (en) | 2013-05-21 |
Family
ID=44727770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW96141440A TWI396923B (en) | 2007-11-02 | 2007-11-02 | Miniature camera module and method for making same |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI396923B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI422868B (en) * | 2010-04-13 | 2014-01-11 | Himax Tech Ltd | Optical lens on wafer level and related method for forming the optical lens one wafer level |
| TWI456641B (en) * | 2011-07-04 | 2014-10-11 | Himax Tech Ltd | Method of wet etching substrates |
| US10551596B2 (en) | 2016-06-29 | 2020-02-04 | Ams Sensors Singapore Pte. Ltd. | Optical and optoelectronic assemblies including micro-spacers, and methods of manufacturing the same |
| CN112394426A (en) * | 2019-08-13 | 2021-02-23 | 巴奇尼资本私人有限公司 | Optical module, manufacturing method thereof and method for welding optical module on circuit board |
| CN120044748B (en) * | 2025-02-20 | 2026-01-06 | 华天慧创科技(西安)有限公司 | An optical module, its fabrication method and application |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05206429A (en) * | 1992-01-27 | 1993-08-13 | Toshiba Corp | Colored microlens array and manufacturing method thereof |
| US6417022B1 (en) * | 2000-04-12 | 2002-07-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for making long focal length micro-lens for color filters |
| TWM244690U (en) * | 2003-05-09 | 2004-09-21 | Hon Hai Prec Ind Co Ltd | Digital still camera module |
| US20050274968A1 (en) * | 2004-06-10 | 2005-12-15 | Kuo Ching-Sen | Lens structures suitable for use in image sensors and method for making the same |
-
2007
- 2007-11-02 TW TW96141440A patent/TWI396923B/en not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05206429A (en) * | 1992-01-27 | 1993-08-13 | Toshiba Corp | Colored microlens array and manufacturing method thereof |
| US6417022B1 (en) * | 2000-04-12 | 2002-07-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for making long focal length micro-lens for color filters |
| TWM244690U (en) * | 2003-05-09 | 2004-09-21 | Hon Hai Prec Ind Co Ltd | Digital still camera module |
| US20050274968A1 (en) * | 2004-06-10 | 2005-12-15 | Kuo Ching-Sen | Lens structures suitable for use in image sensors and method for making the same |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200921234A (en) | 2009-05-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101419323A (en) | Mini camera module and method for producing the same | |
| CN100440544C (en) | Camera device, method of manufacturing camera device, and wafer-scale packaging | |
| US9419049B2 (en) | Optical assembly including plenoptic microlens array | |
| CN102209622B (en) | Optical block and method of forming optical block | |
| US10147750B2 (en) | Optical imaging apparatus and methods of making the same | |
| TWI402979B (en) | Electronic component wafer module, electronic component module, sensor wafer module, sensor module, lens array disk, sensor module manufacturing method, and electronic information device | |
| US20080131992A1 (en) | Image sensor having integrated infrared-filtering optical device and related method | |
| US8570669B2 (en) | Multi-layer polymer lens and method of making same | |
| US8546739B2 (en) | Manufacturing method of wafer level chip scale package of image-sensing module | |
| JP6670565B2 (en) | Manufacturing method and mold for laminated lens structure | |
| TWI396923B (en) | Miniature camera module and method for making same | |
| JP2011138089A (en) | Wafer-level lens array, lens module and imaging unit | |
| CN102279506A (en) | Camera module and manufacturing method thereof | |
| CN108076671B (en) | Optical assembly comprising a spacer directly adhered to a substrate | |
| US8828174B2 (en) | Method of manufacturing a plurality of optical devices | |
| CN102037383A (en) | Optical device including at least one replicated surface and associated methods | |
| JP6660115B2 (en) | Substrate with lens and method of manufacturing laminated lens structure | |
| TW201340302A (en) | Optical device, photoelectric module and manufacturing method thereof | |
| TWI402162B (en) | Composite micro-lens and composite micro-lens array | |
| US7964432B2 (en) | Method of manufacturing lenses, in particular for an integrated imager | |
| TWI877910B (en) | Camera module having sandwiched lens structure in between two glass substrates | |
| JP2009277885A (en) | Production method of solid-state imaging element | |
| JP2025037805A (en) | Microlens array laminate, optical device and LiDAR sensor unit | |
| TWI446041B (en) | Spacer array, lens assembly and method for making same | |
| JP2012185238A (en) | Method for manufacturing lens array, lens array, and lens module |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |