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TWI340299B - Immersion lithography and treatment system thereof - Google Patents

Immersion lithography and treatment system thereof

Info

Publication number
TWI340299B
TWI340299B TW095123517A TW95123517A TWI340299B TW I340299 B TWI340299 B TW I340299B TW 095123517 A TW095123517 A TW 095123517A TW 95123517 A TW95123517 A TW 95123517A TW I340299 B TWI340299 B TW I340299B
Authority
TW
Taiwan
Prior art keywords
treatment system
immersion lithography
lithography
immersion
treatment
Prior art date
Application number
TW095123517A
Other languages
English (en)
Other versions
TW200700933A (en
Inventor
Ching Yu Chang
Vincent Yu
Chin Hsiang Lin
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Publication of TW200700933A publication Critical patent/TW200700933A/zh
Application granted granted Critical
Publication of TWI340299B publication Critical patent/TWI340299B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • H10P76/204—

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW095123517A 2005-06-30 2006-06-29 Immersion lithography and treatment system thereof TWI340299B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69556205P 2005-06-30 2005-06-30
US11/384,624 US20070002296A1 (en) 2005-06-30 2006-03-20 Immersion lithography defect reduction

Publications (2)

Publication Number Publication Date
TW200700933A TW200700933A (en) 2007-01-01
TWI340299B true TWI340299B (en) 2011-04-11

Family

ID=37589060

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095123517A TWI340299B (en) 2005-06-30 2006-06-29 Immersion lithography and treatment system thereof

Country Status (6)

Country Link
US (1) US20070002296A1 (zh)
JP (1) JP2007013163A (zh)
KR (1) KR100814040B1 (zh)
CN (2) CN102540761B (zh)
NL (1) NL1032068C2 (zh)
TW (1) TWI340299B (zh)

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US7993808B2 (en) 2005-09-30 2011-08-09 Taiwan Semiconductor Manufacturing Company, Ltd. TARC material for immersion watermark reduction
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US9019466B2 (en) * 2007-07-24 2015-04-28 Asml Netherlands B.V. Lithographic apparatus, reflective member and a method of irradiating the underside of a liquid supply system
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Also Published As

Publication number Publication date
NL1032068C2 (nl) 2007-10-25
US20070002296A1 (en) 2007-01-04
CN1892436A (zh) 2007-01-10
CN102540761B (zh) 2014-09-03
TW200700933A (en) 2007-01-01
CN102540761A (zh) 2012-07-04
KR20070003602A (ko) 2007-01-05
KR100814040B1 (ko) 2008-03-17
NL1032068A1 (nl) 2007-01-04
JP2007013163A (ja) 2007-01-18

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