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TWI273361B - System and method for real-time quality detection - Google Patents

System and method for real-time quality detection Download PDF

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Publication number
TWI273361B
TWI273361B TW93141358A TW93141358A TWI273361B TW I273361 B TWI273361 B TW I273361B TW 93141358 A TW93141358 A TW 93141358A TW 93141358 A TW93141358 A TW 93141358A TW I273361 B TWI273361 B TW I273361B
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offset
value
weight value
real
control unit
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TW93141358A
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Chinese (zh)
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TW200622526A (en
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Ming-Wei Lee
Fu-Kuan Hsiao
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Ind Tech Res Inst
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Abstract

A process control system capable of real-time-quality-state detection. The system comprises a model analysis unit, a detection unit, and a control unit. The model analysis unit defines model parameters according to historical data of a process. The detection unit determines whether larger offset occurs according to real-time process data and the model parameters. If so, the control unit obtains and compares an offset value with an offset threshold, obtaining a corresponding weighted value according to comparison results, and implements corresponding operations according to the weighted value.

Description

1273361 九、發明說明: 【發明所屬之技術領域】 本發明係有關於一種製程控制系統與方法,且特別有關於 一種具有即時品質狀態偵測功能的製程控制系統與方法。 【先前技術】 光電、半導體製程相當繁複,前後約需經過數百個不同的 步驟,任一製程控制的不穩定,往往可能會影響到接下來的多 個製程,因而造成不可彌補的損失。光電、半導體市場的競爭 激烈,如何透過製程的操作監控及產品品質的管制,以提升產 品品質來有效提高產品良率則為其決定其產品競爭力的重要成 功關鍵因素。 然而,要有效提高產品良率除了靠每個製程在生產前的設 計和生產後的檢驗篩選外,製程的穩定亦相當重要。一般而言, 由於機械設備的磨損、材料的消耗、定期的維修、或是更換新 的製程時,往往會使製程的輸出結果偏離預設的目標值,因而 造成了製程品質的變異,進而可能會降低產品的良率。常見的 品質變異可以分為兩大類:速移(Shift)及漂移(Drift)。「速 移」是指製程輸出的平均值突然發生遽增或遽減的現象。例如 機台在經過預防性保養(Preventive Maintenance,PM)之後, 機台的性能比起保養前已大不相同,此時便會有速移的情況發 生,將使得製程的輸出值會忽然改變到另一個較高或較低的 值。「漂移」則為製程的平均值隨著時間而緩慢地遞增或遞減, 其大多會發生在如半導體的電漿蝕刻製程(Plasma Etching )、 爐管(Furnace )機台的管壁沈積、或是化學機械研磨(Chemical Mechanical Polishing,CMP )製程的研磨墊磨損等,由於沈積、 0718-A20828TWF(N2);P10930030;alexchen 5 1273361 磨抽或腐料原因因而產生製程結果的偏移現象。 =統的統計製程管制(加削㈤p⑽㈣CGntrQi,spc) 古於異常的仙上一旦仙]出有異常的製程偏移之後, 力工决瑕庇的產口口挑出以重新加工(Rework),倘若是無法利用 口口 =補救的話,則將其丟棄。然而此時也已經造成相當可觀 、:、才貝失。此外,儘管異常的製程偏移被偵測出來了,也只 是提出-個警訊,來告知工程師或機台的操作員有變異產生, 但部沒有提供有效的解決方法,只能憑著過去的經驗,來自行 微調機台的設定信。1 + 、 b 一來,反而更容易受到自然變異的影 曰’因而造成過度的控制問題,進而增加製程的不穩定。 因此,必須提供一個有效的補測方法,以快速反應製程來 數,進而維持製程的穩定性。’ 【發明内容】 有t於此,本發明之目的在提供一種具有即時品質狀離偵 測功能的製程控制系統與方法,t製程中發生異f變里時了自 動提供給控制器調整機台的設定值,迅速且有效地的將輸出結 果控制在目標值,以維持製程的穩定性。 土;上it目的,本發明實施例揭露一種具有即時品質狀態 偵測功能的製程控制系統,其包括一模型分析單元、一偵測單 元以及控制單元。該模型分析單元根據一製程之歷史數據 來建立複數模型參數。該_單元根據線上即時取得的製程數 據以及該模型分析單元所建立之賴型參數,_在該製程中 是否有較大偏移量發生。若該_單元麟有較大偏移量發 生’則該控制單元自其取得_偏移量,將該偏移量與_偏移量 臨界值做比較,根據比較結果取得—對應的第—權重值,並且 0718-A20828TWF(N2);P1〇930030;alexchen 6 1273361 移的干擾,都可以很快且有效率的將t程的輸出值維持在目標 值上。然而,若要確保有較隹的製程品質,除了預測模式的準 確性外,EWMA-Based控制器之權重(Weight)選擇亦具有相 當大的影響。 有關EWMA-Based控制器之權重選擇,主要應考量以下的 二個重要因素。第一是靈敏性(Sensitivity ),即所使用的權重 要能靈敏地偵測出製程的變化量。較大的權重較能偵測出較大 的偏移量,而較小的權重較能"ί貞測出較小的偏移。第二是穩健 性(Robustness),即要能減少雜訊所造成的影響,不致於有太 多的錯誤警訊出現。 接下來說明本發明之製程控制系統的實施流程。 第1圖係顯示本發明實施例之具有即時品質狀態偵測功能 之製程控制系統的架構示意圖。本發明實施例之製程控制系統 包括一即時參數運算模組1〇〇、一離線模型分析模組200、一製 程單元300、一量測單元400、以及一資料庫500。離線模型分 析模組200更包括一模型分析單元250,其根據儲存於資料庫 500中之製程或機台的歷史數據來建立模型參數(例如:線性模 式),並將所建立的模型參數運用在即時參數運算模組1〇〇中。 即時參數運算模組100更包括一偵測單元110與一控制單元 130。偵測單元110根據線上(On-line)即時取得的製程數據以 及先前模型分析單元250所建立的模型參數,判斷在製程中是 否有較大偏移量發生,並且將判斷結果傳送給控制單元13〇。控 制單元130根據判斷結果,利用可自我調整控制器權重的 EWMA-Based控制器來調整製程或機台的設定值,以維持製程 品質在目標值上。以下針對偵測單元110與控制單元130做更 詳細的描述。 0718-A20828TWF(N2);P10930030;alexchen 9 1273361 參考第2 ®,其係顯示本發明實施例之 ㈣功能之製程控财㈣俩流程圖。 心 ㈣單元m根據模型參數115並且利用r_統計量 (R-StatlStieal)估算方法來判斷製程的品質是否維持在穩態 (Steady State)(步驟S1)。也就是說,R_統計量是利用製程的 平均值疋碌持在S]定值來做為狀的基準,其公式表示為: 2,/ , 其中,v及"分別為利用·μα方法所估算的製程雜訊變異 數’分別表示為: 其中, 且, 〇<λ^Ι y / = 1,2,3 〇 透過巧的計算,可判斷出是否發生製程擾動(漂移或速移) (尽>尤?)(步驟S2)。若是,則執行步驟S3,否則執行步驟 S4。若製程是處於穩態(即製程平均值為固定值或所加入的製 程擾動為製程非相關(lndependent)訊號且相等地(Identically ) 擾動),貝0的數值將會約等於!。若製程的平均值發生偏移, 或製程的雜訊為具有自我相關性(Am〇 c〇rrelati〇n)的信號, 則式的數值將會大於丨。當製程的平均值發生改變時,此時會造 0718~A20828TWF(N2);P10930030;alexchen 10 1273361 之權重值大於R-統計量管制值,則將η加1,並且令預設權重 值等於目前批次操作時間點之權重值(μΛ)與EWMA-Based控 制器權重的最小值二者中之較大值(= )(步驟S 5 )。 若前一批次操作時間點之權重值不大於R-統計量管制值,則令 預設權重值等於EWMA-Based控制器權重的最小值(%=%)(步 驟 S6)〇 當決定出預設權重值後,設置於控制單元130中之 EWMA-Based控制器即根據所得之值進行調整。 由於本發明實施例之製程控制系統在調整偏移量時,係以 平穩的方式慢慢進行調整,直到製程干擾降至合理的範圍内。 此外,當自我調整機制啟動後,EWMA-Based控制器權重的最 大值(V)會隨著不同程度擾動的偵測而有不同的對應值。理論 上EWM-Based控制器權重可以依照自我調整機制而逐漸遞減 至最小值,若設定適當的EWMA-Based控制器權重最小值 (%),則可使控制器有較好的敏感度,以面對微量的製程干擾。 參考第3圖,其係顯示本發明實施例之為控制器權童參數 的調整示意圖。以波形310來看,其係當製程發生較大干擾時, 啟動自我調整機制以根據控制器權重參數進行調整所示之結果 (如步驟S3所述),而以波形330來看,其係當製程發生較小 干擾時,啟動自我調整機制以根據控制器權重參數進行調整所 示之結果(如步驟S5與S6所述)。最終目的係要將控制器權重 參數調整至等於控制器權重最小值(%)。 接下來,以一較佳實施例說明本發明之具有即時品質狀態 偵測功能的製程控制系統如何調整EWMA-Based控制器權重 值0 0718-A20828TWF(N2);P10930030;alexchen 12 1273361 若某製程單元可表示成: γί=α + βχ^διΛ·ει , 其中,$為製程單元的特殊變異,其可表示為: 其中,1273361 IX. Description of the Invention: [Technical Field] The present invention relates to a process control system and method, and more particularly to a process control system and method having an immediate quality state detection function. [Prior Art] Optoelectronic and semiconductor processes are quite complicated, and hundreds of different steps are required before and after. The instability of any process control may affect the next many processes, resulting in irreparable damage. The competition in the optoelectronic and semiconductor markets is fierce. How to improve product quality through process monitoring and product quality control to effectively improve product yield is an important key factor for determining the competitiveness of its products. However, in order to effectively improve the product yield, in addition to the pre-production design and post-production inspection and screening of each process, the stability of the process is also very important. In general, due to wear and tear of mechanical equipment, material consumption, regular maintenance, or replacement of a new process, the output of the process often deviates from the preset target value, thus causing variation in process quality, and thus Will reduce the yield of the product. Common quality variations can be divided into two broad categories: Shift and Drift. “Speed shift” refers to the phenomenon that the average value of the process output suddenly increases or decreases. For example, after the preventive maintenance (PM) of the machine, the performance of the machine is quite different from that before the maintenance. At this time, there will be a speed shift, which will cause the output value of the process to suddenly change to Another higher or lower value. "Drift" means that the average value of the process slowly increases or decreases with time, most of which occurs in plasma etching processes such as semiconductors, wall deposition on Furnace machines, or Abrasive pad wear of the Chemical Mechanical Polishing (CMP) process, etc., due to deposition, 0718-A20828TWF (N2); P10930030; alexchen 5 1273361 grinding or corrosion causes process shifts. = Statistic process control (additional (five) p (10) (four) CGntrQi, spc) After the abnormal immortalization of the immortal], there is an abnormal process offset, the force is determined to re-process the mouth to rework (Rework), if If you are unable to use the mouth = remedy, discard it. However, at this time, it has already caused considerable considerableity: In addition, although the abnormal process offset was detected, only a warning was issued to inform the engineer or the operator of the machine that there was a mutation, but the Ministry did not provide an effective solution, only by the past. Experience, the setting letter from the fine-tuning machine. 1 + and b, on the other hand, are more susceptible to the effects of natural variation, thus causing excessive control problems, which in turn increases process instability. Therefore, an effective method of retesting must be provided to quickly process the process to maintain process stability. [Description of the Invention] In view of the above, the object of the present invention is to provide a process control system and method with an immediate quality detection function, which is automatically provided to the controller to adjust the machine when an abnormality occurs in the t process. The set value quickly and effectively controls the output to the target value to maintain process stability. The present invention discloses a process control system with an instant quality status detection function, which includes a model analysis unit, a detection unit and a control unit. The model analysis unit establishes complex model parameters based on historical data of a process. The _ unit generates a large offset in the process according to the process data obtained on the line immediately and the sizing parameter established by the model analysis unit. If the _ unit lin has a large offset, then the control unit obtains the _offset from it, compares the offset with the _offset threshold, and obtains the corresponding first weight according to the comparison result. The value, and 0718-A20828TWF (N2); P1 〇 930030; alexchen 6 1273361 shift interference, can quickly and efficiently maintain the output value of the t-range to the target value. However, in order to ensure a relatively high process quality, in addition to the accuracy of the prediction mode, the weight selection of the EWMA-Based controller also has a considerable impact. Regarding the weight selection of the EWMA-Based controller, the following two important factors should be considered. The first is Sensitivity, which uses the weights to be sensitive to the amount of change in the process. Larger weights are more likely to detect larger offsets, while smaller weights are more likely to detect smaller offsets. The second is Robustness, which is to reduce the impact of noise and not to have too many false alarms. Next, the implementation flow of the process control system of the present invention will be described. FIG. 1 is a schematic diagram showing the architecture of a process control system with an instant quality status detection function according to an embodiment of the present invention. The process control system of the embodiment of the present invention includes an instant parameter computing module 1A, an offline model analysis module 200, a process unit 300, a measurement unit 400, and a database 500. The offline model analysis module 200 further includes a model analysis unit 250 that establishes model parameters (for example, a linear mode) according to historical data of a process or a machine stored in the database 500, and applies the established model parameters to Instant parameter computing module 1〇〇. The instant parameter computing module 100 further includes a detecting unit 110 and a control unit 130. The detecting unit 110 determines whether a large offset occurs in the process according to the process data acquired on the line (On-line) and the model parameters established by the previous model analyzing unit 250, and transmits the determination result to the control unit 13 Hey. The control unit 130 adjusts the process or the set value of the machine by using the EWMA-Based controller that can self-adjust the controller weight according to the judgment result, so as to maintain the process quality at the target value. The detection unit 110 and the control unit 130 will be described in more detail below. 0718-A20828TWF(N2); P10930030; alexchen 9 1273361 Referring to the 2nd, which is a flow chart showing the process control (4) of the function of (4) of the embodiment of the present invention. The heart (d) unit m judges whether the quality of the process is maintained at a steady state (Steady State) based on the model parameter 115 and using the r_StatlStieal estimation method (step S1). That is to say, the R_statistic is a benchmark based on the average value of the process and held at the value of S], and the formula is expressed as: 2, / , where v and " respectively are using the μα method The estimated process noise variation 'is expressed as: where, and 〇<λ^Ι y / = 1,2,3 〇 can be judged by the clever calculation to determine whether process disturbance (drift or speed shift) occurs. (End > Especially?) (Step S2). If yes, go to step S3, otherwise go to step S4. If the process is in steady state (ie, the process average is a fixed value or the added process disturbance is a process independent (Independent) signal and equal (Identically) perturbation), the value of Bay 0 will be approximately equal! . If the average value of the process is offset, or if the noise of the process is a self-correlation (Am〇 c〇rrelati〇n) signal, the value of the formula will be greater than 丨. When the average value of the process changes, at this time, 0718~A20828TWF(N2); P10930030; alexchen 10 1273361, the weight value is greater than the R-statistic control value, then η is incremented by 1, and the preset weight value is equal to the current The larger of the weight value (μΛ) of the batch operation time point and the minimum value of the EWMA-Based controller weight (= ) (step S 5 ). If the weight value of the previous batch operation time point is not greater than the R-statistic control value, the preset weight value is equal to the minimum value of the EWMA-Based controller weight (%=%) (step S6). After the weight value is set, the EWMA-Based controller provided in the control unit 130 adjusts according to the obtained value. Since the process control system of the embodiment of the present invention adjusts the offset amount, it is slowly adjusted in a smooth manner until the process disturbance is reduced to a reasonable range. In addition, when the self-adjustment mechanism is activated, the maximum value (V) of the EWMA-Based controller weights will have different corresponding values as the detection of different degrees of disturbance. In theory, the EWM-Based controller weight can be gradually reduced to the minimum according to the self-adjustment mechanism. If the appropriate EWMA-Based controller weight minimum (%) is set, the controller can have better sensitivity. Interference with a small amount of process. Referring to Figure 3, there is shown a schematic diagram of the adjustment of the controller power parameter of the embodiment of the present invention. In the case of waveform 310, when the process has a large interference, the self-adjustment mechanism is activated to adjust the result according to the controller weight parameter (as described in step S3), and in the case of waveform 330, it is When there is less interference in the process, the self-adjustment mechanism is activated to adjust the results as shown by the controller weight parameters (as described in steps S5 and S6). The ultimate goal is to adjust the controller weight parameter to be equal to the controller weight minimum (%). Next, how to adjust the EWMA-Based controller weight value 0 0718-A20828TWF(N2); P10930030; alexchen 12 1273361 if a process unit is used in the process control system with the instant quality state detection function of the present invention. It can be expressed as: γί=α + βχ^διΛ·ει , where $ is a special variation of the process unit, which can be expressed as:

τ Jr卜,S,發生機率爲Pτ Jr Bu, S, probability of occurrence P

,發生機率爲Y - P 以及, s 〜Ν、μ3,σ3 0 本製程操作的目標值設定為3500。參考第4圖,其係顯示 自我調整EWMA-Based控制器與固定參數的EWMA_Based控制 器製程控制結果。由第4圖可明顯的看出自我調整EWMA-Based 控制器的製程控制可以比固定參數的EWMA-Based控制器更快 且更穩定的將製程的品質維持在設定點上,其中 <為較大干擾 出現時之EWMA-Based控制器權重的最大值,其經過調整後會 等於EWMA-Based控制器權重的最小值(% ),而w;為較前次小 之干擾出現時之EWMA-Based控制器權重的最大值,其經過調 整後亦會等於EWMA-Based控制器權重的最小值(,)。第5 圖係根據第4圖所得之自我調整EWMA-Based控制器權重的應 答曲線圖。 綜上所述,本發明實施例之具有即時品質狀態偵測功能的 製程控制系統與方法利用偵測單元中的R-統計量來偵測製造單 元是否有大的偏移量干擾發生。若有,則在控制單元中適度的 調整控制器權重以有效處理較大偏移量製程干擾的問題,然後 再逐漸遞減控制器權重值。如此一來,當有大偏移干擾時,可 0718-A20828TWF{N2);P10930030;alexchen 13 1273361 以利用較大的控制器權重來加以彌補,當製程沒有受到大的擾 動時,控制權重能夠自動的降低,以避免製程反而受到控制器 不當控制的干擾。 藉由本發明實施例之製程控制系統與方法,可使製造單元 控制系統能兼顧靈敏性與穩健性,因而能靈敏地偵測出製程的 變化量,並有效減少雜訊所造成的影響,不致於有太多的錯誤 警訊出現。 雖然本發明已以較佳實施例揭露如上,然其並非用以限定 本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍内, 當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之 申請專利範圍所界定者為準。 0718-A20828TWF(N2);P10930030;alexchen 14 1273361 【圖式簡單說明】 第1圖係顯示本發明實施例之具有即時品質狀態偵測功能 之製程控制系統的架構示意圖。 第2圖係顯示本發明實施例之具有即時品質狀態偵測功能 之製程控制方法的步驟流程圖。 第3圖係顯示本發明實施例之為EWMA-Based控制器權重 參數的調整示意圖。 第4圖係顯示本發明實施例之自我調整EWMA-Based控制 器製程控制結果比較示意圖。 第5圖根據第4圖所得之自我調整EWMA-Based控制器權 重的應答曲線圖。 【主要元件符號說明】 100〜即時參數運算模組 110〜偵測單元 130〜控制單元 200〜離線模型分析模組 250〜模型分析單元 300〜製程單元 400〜量測單元 500〜資料庫 0718-A20828TWF(N2);P10930030;alexchen 15The probability of occurrence is Y - P and, s ~ Ν, μ3, σ3 0 The target value of this process operation is set to 3500. Refer to Figure 4, which shows the results of the EWMA_Based controller process control for self-adjusting EWMA-Based controllers and fixed parameters. It can be clearly seen from Fig. 4 that the process control of the self-adjusting EWMA-Based controller can maintain the quality of the process at the set point faster and more stably than the fixed-parameter EWMA-Based controller, where < The maximum value of the EWMA-Based controller weight when large disturbance occurs, which is adjusted to be equal to the minimum value (%) of the EWMA-Based controller weight, and w; is the EWMA-Based when the previous small interference occurs. The maximum value of the controller weight, which is adjusted to be equal to the minimum (E) of the EWMA-Based controller weight. Figure 5 is a response graph of the self-adjusting EWMA-Based controller weights obtained from Figure 4. In summary, the process control system and method with the instant quality state detection function in the embodiment of the present invention utilizes the R-statistics in the detection unit to detect whether the manufacturing unit has a large offset interference. If so, moderately adjust the controller weights in the control unit to effectively handle the large offset process interference problem, and then gradually reduce the controller weight value. In this way, when there is large offset interference, 0718-A20828TWF{N2); P10930030; alexchen 13 1273361 can be compensated by using larger controller weights. When the process is not greatly disturbed, the control weight can be automatically The reduction is to avoid the interference of the process being improperly controlled by the controller. By the process control system and method of the embodiment of the invention, the manufacturing unit control system can balance the sensitivity and the robustness, thereby sensitively detecting the variation of the process and effectively reducing the influence of the noise, so as not to There are too many error warnings. While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the present invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application. 0718-A20828TWF(N2); P10930030; alexchen 14 1273361 [Simplified Schematic] FIG. 1 is a schematic diagram showing the architecture of a process control system with an instant quality state detection function according to an embodiment of the present invention. Figure 2 is a flow chart showing the steps of a process control method with an instant quality status detection function according to an embodiment of the present invention. Figure 3 is a schematic diagram showing the adjustment of the weight parameter of the EWMA-Based controller in the embodiment of the present invention. Fig. 4 is a view showing a comparison of process control results of the self-adjusting EWMA-Based controller of the embodiment of the present invention. Figure 5 is a response graph of the self-adjusting EWMA-Based controller weights obtained from Figure 4. [Main component symbol description] 100 to instant parameter calculation module 110 to detection unit 130 to control unit 200 to offline model analysis module 250 to model analysis unit 300 to process unit 400 to measurement unit 500 to database 0718-A20828TWF (N2); P10930030; alexchen 15

Claims (1)

修正日期: 95.6.3 、’..:i. Ϋ.I,乂 .r. ' 95. 6 . 0 5 1273汹“358 „請專利範圍修正本 十、申請專利範圍: -模型分狀態偵測功能的製程控制系統,包括·· 型參數; 〃根據一製程之歷史數據來建立複數模 一偵測單元,苴根攄綠 型分析單元所建立之上述模型參=取^的製程數,以及上述模 較大偏移量發生;以及 1蚜在上述製程中是否有 -控制單it 1上述偵測 自其取得-偏移#,將θ 發生,則 根據比較結果取得—對岸-偏移量臨界值做比較, 耳4的弟一柘重值,並且 重值執行相對應的操作。 处弟一柘 2·如申請專利範圍第1 能的製程控制系統,Α中,上、十=曰具f即時品質狀態搞測功 間點所取得,並且上;㈣為在目前批次之操作時 卫且上述控制早凡根據上述偏移量 目前批次之操作時間點之上述第_權$值。對應上速 处的^口f請專利範圍第2項所述的具有即時品質狀態谓測功 :系統’其中,若上述偏移量大於上述偏移量臨界 、:述控制早兀令上述第-權重值等於-第一預設權, 值’亚且根據上述第一預設權重值調整述偏移量的大小、。 t申請專利範圍第2項所述的具有即時品質狀態偵測功 r :减’其中,若上述偏移量小於上述偏移量臨界 上述控制單元接著判斷在前一批次之操作時間點所取得 之一第二權重值是否大於一第二預設權重值。 5.如申請專利範圍第4項所述的具有即時品質狀 ^製程控制系統,其中,若上述在前—批次之操作時間^ 仔之弟二杻重值大於上述第二預設權重值,則上述控制單元 0718~A20828TWF1(N2);P10930030;a 丨 exchen 16 is. 1273361 第二預設權重值中 令上述第一權重值等於一第 較大之值。 ▲ 6·如中請專利範圍帛4項所述的具有即時品質狀態偵測功 月匕的衣転控制系統,其中,若上述在前一批次之操作時間點所 取得之第二權重值不大於上述第二預設權重值,則上述控制單 兀令上述第一權重值等於上述第二預設權重值。 7·—種具有即時品質狀態偵測功能的製程控制方法,勺 下列步驟·· 匕栝 根據一製程之歷史數據來建立複數模型參數; 、、根據線上即時取得的製程數據以及上述模型參數,判斷在 上述製程中是否有較大偏移量發生; 右上述偵測單元判斷有較大偏移量發生,則取得一偏移量· 將上述偏移量與一偏移量臨界值做比較; 根據比較結果取得一對應的第一權重值;以及 根據上述第一權重值執行相對應的操作。 8·如申請專利範圍第7項所述的具有即時品 能的製程控制方法,苴中,卜述傯銘旦炎— 狀心偵測功 門點所s〜中述偏移1為在目前批次之操作時 間;所取侍,並且根據上述偏移量設 作時間點之上述第一權重值。 k上这目-批次之操 9·如申明專利範圍第8項所述的具有 能的製程控制方法,其中,若上述偏移量大於以 值:則令上述第-權重值等於-第-預設權重值, 述弟一預設權重值調整述偏移量的大小。 x康上 ίο.如申請專利範圍第8項所述的具有即時 能的製程控制方法,其中,若上 :恶偵測功 值,則上诫批制时—# — j於上返偏移量臨界 料讀㈣斷在前—μ之操作時間點所取得 〇718-A20828TWF1(N2);P1〇93〇〇3〇;alexchen 17 1273361 年月卢修(更)正替換頁, 之一第二權重值是否大於一第二預設權重值。 如申請專利範圍第10項所述的具有即時品質狀態偵測 功能的製程控制方法,其中,若上述在前一批次之操作時間點 所取得之第二權重值大於上述第二預設權重值,則上述控制單 元令上述第一權重值等於一第三權重值與上述第二預設權重值 中較大之值。 12.如申請專利範圍第1〇項所述的具有即時品質狀態偵測 功能的製程控制方法,其中,若上述在前一批次之操作時間點 所取付之弟一權重值不大於上述第二預设權重值,則上述控制 單元令上述第一權重值等於上述第二預設權重值。 0718-A20828TWF1 (N2);P10930030;aiexchen 18 1273ML 41358號圖式修正頁 倏正日期:95.6.3 +為.#疹(更)正替換頁 affavltoAmendment date: 95.6.3, '..:i. Ϋ.I, 乂.r. ' 95. 6 . 0 5 1273 汹 "358 „Please modify the patent scope ten, the scope of patent application: - model state detection A functional process control system, including a type parameter; 建立 a complex analog-to-one detection unit based on historical data of a process, a number of processes of the above-mentioned model parameter determined by the green type analysis unit, and the above A large offset occurs in the module; and 1) whether there is a control unit in the above process - the above detection is obtained from the offset - offset #, and θ occurs, and the comparison result is obtained - the offset value of the opposite bank - offset For comparison, the younger brother of the ear 4 has a heavy value, and the heavy value performs the corresponding operation.处 柘 · · · · · · · · · · · · · · · 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如 如The defensive and the above control is based on the above-mentioned first _ weight $ value of the current batch operation time point according to the above offset. Corresponding to the upper port at the upper speed, please refer to the second paragraph of the patent scope for the real-time quality state: the system 'where, if the above-mentioned offset is greater than the above-mentioned offset threshold, the control is earlier than the above-mentioned The weight value is equal to - the first preset weight, and the value is sub- and the size of the offset is adjusted according to the first preset weight value. The invention has the real-time quality state detection function r: minus, wherein if the offset is less than the offset threshold, the control unit then determines that the operation time of the previous batch is obtained. Whether one of the second weight values is greater than a second predetermined weight value. 5. The method of claim 4, wherein if the preceding-to-batch operation time is greater than the second predetermined weight value, Then, the above control unit 0718~A20828TWF1(N2); P10930030; a 丨exchen 16 is. 1273361 The second preset weight value makes the first weight value equal to a larger value. ▲ 6· The patent control system with real-time quality state detection function described in the patent scope 帛 4, wherein the second weight value obtained in the previous batch operation time point is not If the value is greater than the second preset weight value, the control unit determines that the first weight value is equal to the second preset weight value. 7·—a process control method with real-time quality status detection function, the following steps are performed: · 复Based on historical data of a process to establish complex model parameters; ,, according to process data obtained on-line immediately and the above model parameters, judging Whether a large offset occurs in the above process; if the right detection unit determines that a large offset occurs, an offset is obtained. The offset is compared with an offset threshold; The comparison result obtains a corresponding first weight value; and performs a corresponding operation according to the first weight value. 8. If the process control method with real-time energy can be described in item 7 of the patent application scope, in the middle, the 偬 偬 偬 旦 — — 状 状 状 状 状 状 状 中 中 中 中 中 中The second operation time; the servo is taken, and the first weight value is set as the time point according to the above offset. The operation-control method according to item 8 of the claim patent scope, wherein if the offset is greater than the value: the first-weight value is equal to - The preset weight value, and the preset weight value adjusts the magnitude of the offset. x Kang Shang ίο. The process control method with instant energy as described in claim 8 of the patent application, wherein if the upper detection force value is used, the upper offset is -# - j is the upper return offset Critical material reading (4) is obtained at the operating time point of the front-μ. 718-A20828TWF1 (N2); P1〇93〇〇3〇; alexchen 17 1273361 Lu Xiu (more) is replacing the page, one of the second weight Whether the value is greater than a second preset weight value. The process control method as claimed in claim 10, wherein the second weight value obtained in the operation time point of the previous batch is greater than the second preset weight value The control unit causes the first weight value to be equal to a larger value of a third weight value and the second preset weight value. 12. The process control method as claimed in claim 1, wherein if the above-mentioned operating time point of the previous batch is not greater than the second value Presetting the weight value, the control unit causes the first weight value to be equal to the second preset weight value. 0718-A20828TWF1 (N2); P10930030; aiexchen 18 1273ML No. 41358 schema correction page Yongzheng Date: 95.6.3 + for .# rash (more) positive replacement page affavlto 1273361 4^s/^^1273361 4^s/^^
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TWI399625B (en) * 2009-03-13 2013-06-21 台灣積體電路製造股份有限公司 Advanced process control method and device
TWI801921B (en) * 2021-07-05 2023-05-11 力晶積成電子製造股份有限公司 Yield correlation-driven in-line tool matching management method

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TWI625615B (en) * 2016-11-29 2018-06-01 財團法人工業技術研究院 Prediction model building method and associated predicting method and computer software product

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI399625B (en) * 2009-03-13 2013-06-21 台灣積體電路製造股份有限公司 Advanced process control method and device
TWI801921B (en) * 2021-07-05 2023-05-11 力晶積成電子製造股份有限公司 Yield correlation-driven in-line tool matching management method

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