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TWD215398S - Process shield for a substrate processing chamber - Google Patents

Process shield for a substrate processing chamber Download PDF

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Publication number
TWD215398S
TWD215398S TW109305205F TW109305205F TWD215398S TW D215398 S TWD215398 S TW D215398S TW 109305205 F TW109305205 F TW 109305205F TW 109305205 F TW109305205 F TW 109305205F TW D215398 S TWD215398 S TW D215398S
Authority
TW
Taiwan
Prior art keywords
processing chamber
substrate processing
process shield
design
shield
Prior art date
Application number
TW109305205F
Other languages
Chinese (zh)
Inventor
伊利亞 拉維斯基
凱斯Ａ 米勒
吉留剛一
Original Assignee
美商應用材料股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商應用材料股份有限公司 filed Critical 美商應用材料股份有限公司
Publication of TWD215398S publication Critical patent/TWD215398S/en

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Abstract

【物品用途】;本設計所請求之基板處理腔室的製程護罩係用於半導體製程。;【設計說明】;圖式所揭露之虛線部分，為本案不主張設計之部分。[Use of article]: The process shield of the substrate processing chamber requested by this design is used in the semiconductor process. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.

Description

基板處理腔室的製程護罩 Process shield of substrate processing chamber

本設計所請求之基板處理腔室的製程護罩係用於半導體製程。 The process shield of the substrate processing chamber requested by this design is used in the semiconductor process.

圖式所揭露之虛線部分，為本案不主張設計之部分。 The dotted line disclosed in the diagram is a part of this case that does not advocate design.

TW109305205F 2020-03-20 2020-09-17 Process shield for a substrate processing chamber TWD215398S (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29/728,821 USD941372S1 (en) 2020-03-20 2020-03-20 Process shield for a substrate processing chamber
US29/728,821 2020-03-20

Publications (1)

Publication Number Publication Date
TWD215398S true TWD215398S (en) 2021-11-21

Family

ID=78001005

Family Applications (2)

Application Number Title Priority Date Filing Date
TW109305205D01F TWD215399S (en) 2020-03-20 2020-09-17 Process shield for a substrate processing chamber
TW109305205F TWD215398S (en) 2020-03-20 2020-09-17 Process shield for a substrate processing chamber

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW109305205D01F TWD215399S (en) 2020-03-20 2020-09-17 Process shield for a substrate processing chamber

Country Status (3)

Country Link
US (1) USD941372S1 (en)
JP (2) JP1696764S (en)
TW (2) TWD215399S (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWD229955S (en) 2022-10-28 2024-02-11 美商應用材料股份有限公司 (美國) Process chamber pumping liner
USD1066440S1 (en) 2022-10-28 2025-03-11 Applied Materials, Inc. Process chamber pumping liner

Also Published As

Publication number Publication date
JP1696759S (en) 2021-10-11
JP1696764S (en) 2021-10-11
USD941372S1 (en) 2022-01-18
TWD215399S (en) 2021-11-21

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