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USD1100867S1 - Vertical flow control ring - Google Patents

Vertical flow control ring

Info

Publication number
USD1100867S1
USD1100867S1 US29/900,995 US202329900995F USD1100867S US D1100867 S1 USD1100867 S1 US D1100867S1 US 202329900995 F US202329900995 F US 202329900995F US D1100867 S USD1100867 S US D1100867S
Authority
US
United States
Prior art keywords
flow control
control ring
vertical flow
view
vertical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/900,995
Inventor
WonKi Jeong
YonJong Jeon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASM IP Holding BV
Original Assignee
ASM IP Holding BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASM IP Holding BV filed Critical ASM IP Holding BV
Priority to US29/900,995 priority Critical patent/USD1100867S1/en
Priority to TW113300782F priority patent/TWD237992S/en
Application granted granted Critical
Publication of USD1100867S1 publication Critical patent/USD1100867S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Description

FIG. 1 is a perspective view of a vertical flow control ring, showing our new design;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a front view thereof;
FIG. 4 is a back view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a left side view thereof;
FIG. 7 is a top view thereof;
FIG. 8 is a bottom view thereof; and,
FIG. 9 is a cross-section taken from FIG. 7 .

Claims (1)

    CLAIM
  1. The ornamental design for a vertical flow control ring as shown and described.
US29/900,995 2023-08-28 2023-08-28 Vertical flow control ring Active USD1100867S1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US29/900,995 USD1100867S1 (en) 2023-08-28 2023-08-28 Vertical flow control ring
TW113300782F TWD237992S (en) 2023-08-28 2024-02-20 Vertical flow control ring

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/900,995 USD1100867S1 (en) 2023-08-28 2023-08-28 Vertical flow control ring

Publications (1)

Publication Number Publication Date
USD1100867S1 true USD1100867S1 (en) 2025-11-04

Family

ID=95605328

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/900,995 Active USD1100867S1 (en) 2023-08-28 2023-08-28 Vertical flow control ring

Country Status (2)

Country Link
US (1) USD1100867S1 (en)
TW (1) TWD237992S (en)

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA152633A (en) * 1913-01-25 1913-12-23 George Wallace Grant Dental pliers
GB2083147A (en) * 1980-08-26 1982-03-17 Teves Gmbh Alfred Brake booster
USD699200S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
USD827592S1 (en) * 2017-01-31 2018-09-04 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD876504S1 (en) * 2017-04-03 2020-02-25 Asm Ip Holding B.V. Exhaust flow control ring for semiconductor deposition apparatus
USD891382S1 (en) * 2019-02-08 2020-07-28 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD979524S1 (en) * 2020-03-19 2023-02-28 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1063595S1 (en) * 2023-03-30 2025-02-25 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1066275S1 (en) * 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1071887S1 (en) * 2023-01-31 2025-04-22 Valqua, Ltd. Composite seal for semiconductor manufacturing device
USD1082729S1 (en) * 2023-01-11 2025-07-08 Nuflare Technology, Inc. Susceptor cover

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD802634S1 (en) 2015-10-23 2017-11-14 Flow International Corporation Contour follower for a fluid jet cutting machine

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA152633A (en) * 1913-01-25 1913-12-23 George Wallace Grant Dental pliers
GB2083147A (en) * 1980-08-26 1982-03-17 Teves Gmbh Alfred Brake booster
USD699200S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
USD827592S1 (en) * 2017-01-31 2018-09-04 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD876504S1 (en) * 2017-04-03 2020-02-25 Asm Ip Holding B.V. Exhaust flow control ring for semiconductor deposition apparatus
USD891382S1 (en) * 2019-02-08 2020-07-28 Applied Materials, Inc. Process shield for a substrate processing chamber
USD1051867S1 (en) * 2020-03-19 2024-11-19 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD979524S1 (en) * 2020-03-19 2023-02-28 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1066275S1 (en) * 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1082729S1 (en) * 2023-01-11 2025-07-08 Nuflare Technology, Inc. Susceptor cover
USD1071887S1 (en) * 2023-01-31 2025-04-22 Valqua, Ltd. Composite seal for semiconductor manufacturing device
USD1063595S1 (en) * 2023-03-30 2025-02-25 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Pool Pump Hose Seal Ring, date posted May 14, 2023, data retrieved from the internet at https://www.amazon.in/11228-11412-L-Shape-Gasket-Replacement/dp/B0C4N8FDJD (Year: 2023). *
V-Seals, date posted Jan. 27, 2013, data retrieved from the internet at https://web.archive.org/web/20130127085042/https://www.hitechseals.com/products/v-seals.asp?lang= (Year: 2013). *

Also Published As

Publication number Publication date
TWD237992S (en) 2025-05-01

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