TW202409000A - A new and efficient process for preparing 3-halo-4,5-dihydro-1h-pyrazoles - Google Patents
A new and efficient process for preparing 3-halo-4,5-dihydro-1h-pyrazoles Download PDFInfo
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- TW202409000A TW202409000A TW112129682A TW112129682A TW202409000A TW 202409000 A TW202409000 A TW 202409000A TW 112129682 A TW112129682 A TW 112129682A TW 112129682 A TW112129682 A TW 112129682A TW 202409000 A TW202409000 A TW 202409000A
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- Prior art keywords
- halogen
- alkyl
- formula
- acid
- compound
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- 238000004519 manufacturing process Methods 0.000 title description 2
- 238000000034 method Methods 0.000 claims abstract description 333
- -1 halide salt Chemical class 0.000 claims abstract description 144
- 150000001875 compounds Chemical class 0.000 claims abstract description 86
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 117
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 90
- 229910052736 halogen Inorganic materials 0.000 claims description 90
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical group [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 claims description 80
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical group ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 78
- 150000002367 halogens Chemical class 0.000 claims description 74
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 60
- 239000002245 particle Substances 0.000 claims description 59
- 150000007522 mineralic acids Chemical class 0.000 claims description 58
- 150000004820 halides Chemical class 0.000 claims description 50
- 239000002904 solvent Substances 0.000 claims description 49
- 229910052801 chlorine Inorganic materials 0.000 claims description 46
- 125000000217 alkyl group Chemical group 0.000 claims description 45
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 44
- 150000007524 organic acids Chemical class 0.000 claims description 42
- 229910052794 bromium Inorganic materials 0.000 claims description 39
- 229910052739 hydrogen Inorganic materials 0.000 claims description 39
- 239000001257 hydrogen Substances 0.000 claims description 39
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims description 36
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 34
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 27
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 26
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims description 26
- 125000001424 substituent group Chemical group 0.000 claims description 25
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 24
- 229910052731 fluorine Inorganic materials 0.000 claims description 23
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 claims description 21
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims description 19
- 229910001513 alkali metal bromide Inorganic materials 0.000 claims description 16
- 125000004765 (C1-C4) haloalkyl group Chemical group 0.000 claims description 15
- 235000019270 ammonium chloride Nutrition 0.000 claims description 15
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 15
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical group COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims description 13
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 13
- 235000019253 formic acid Nutrition 0.000 claims description 13
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 claims description 12
- 229910001514 alkali metal chloride Inorganic materials 0.000 claims description 10
- 229910052740 iodine Inorganic materials 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 10
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 claims description 8
- 125000002853 C1-C4 hydroxyalkyl group Chemical group 0.000 claims description 7
- 125000005119 alkyl cycloalkyl group Chemical group 0.000 claims description 7
- 229910001616 alkaline earth metal bromide Inorganic materials 0.000 claims description 6
- 125000005120 alkyl cycloalkyl alkyl group Chemical group 0.000 claims description 6
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 claims description 6
- 125000006656 (C2-C4) alkenyl group Chemical group 0.000 claims description 5
- 125000006650 (C2-C4) alkynyl group Chemical group 0.000 claims description 5
- 150000001649 bromium compounds Chemical class 0.000 claims description 5
- 150000001805 chlorine compounds Chemical class 0.000 claims description 5
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims description 5
- 125000005913 (C3-C6) cycloalkyl group Chemical group 0.000 claims description 4
- XTFIVUDBNACUBN-UHFFFAOYSA-N 1,3,5-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)N1CN([N+]([O-])=O)CN([N+]([O-])=O)C1 XTFIVUDBNACUBN-UHFFFAOYSA-N 0.000 claims description 4
- 229910001617 alkaline earth metal chloride Inorganic materials 0.000 claims description 4
- 125000003545 alkoxy group Chemical group 0.000 claims description 4
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 claims description 4
- 125000004186 cyclopropylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C1([H])[H] 0.000 claims description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 claims description 2
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims 2
- 229940072033 potash Drugs 0.000 claims 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Substances [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 claims 2
- 235000015320 potassium carbonate Nutrition 0.000 claims 2
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract description 53
- 239000002253 acid Substances 0.000 abstract description 10
- 229910052500 inorganic mineral Inorganic materials 0.000 abstract description 3
- 239000011707 mineral Substances 0.000 abstract description 3
- 239000000460 chlorine Substances 0.000 description 137
- 239000000203 mixture Substances 0.000 description 55
- 239000000047 product Substances 0.000 description 44
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 33
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 26
- 238000006243 chemical reaction Methods 0.000 description 26
- 239000010410 layer Substances 0.000 description 26
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 26
- 238000002360 preparation method Methods 0.000 description 25
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 21
- 239000000243 solution Substances 0.000 description 20
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 18
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 18
- 239000003153 chemical reaction reagent Substances 0.000 description 15
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 14
- 239000000284 extract Substances 0.000 description 13
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 13
- 235000019341 magnesium sulphate Nutrition 0.000 description 13
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 12
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 12
- GUAZTUMVVYURLC-UHFFFAOYSA-N ethyl 5-bromo-2-(3-chloropyridin-2-yl)-3,4-dihydropyrazole-3-carboxylate Chemical compound CCOC(=O)C1CC(Br)=NN1C1=NC=CC=C1Cl GUAZTUMVVYURLC-UHFFFAOYSA-N 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 239000007864 aqueous solution Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 238000010898 silica gel chromatography Methods 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 9
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 9
- VCXPTRFMCANKBH-UHFFFAOYSA-N ethyl 5-(benzenesulfonyloxy)-2-(3-chloropyridin-2-yl)-3,4-dihydropyrazole-3-carboxylate Chemical compound N=1N(C=2C(=CC=CN=2)Cl)C(C(=O)OCC)CC=1OS(=O)(=O)C1=CC=CC=C1 VCXPTRFMCANKBH-UHFFFAOYSA-N 0.000 description 9
- 229910017604 nitric acid Inorganic materials 0.000 description 9
- 239000011541 reaction mixture Substances 0.000 description 9
- 229920006395 saturated elastomer Polymers 0.000 description 9
- 235000017557 sodium bicarbonate Nutrition 0.000 description 9
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 8
- 235000006408 oxalic acid Nutrition 0.000 description 7
- 239000002002 slurry Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 125000004494 ethyl ester group Chemical group 0.000 description 6
- 229940116333 ethyl lactate Drugs 0.000 description 6
- 239000000543 intermediate Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- APQIUTYORBAGEZ-UHFFFAOYSA-N 1,1-dibromoethane Chemical compound CC(Br)Br APQIUTYORBAGEZ-UHFFFAOYSA-N 0.000 description 5
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- FJBFPHVGVWTDIP-UHFFFAOYSA-N dibromomethane Chemical compound BrCBr FJBFPHVGVWTDIP-UHFFFAOYSA-N 0.000 description 5
- 239000012634 fragment Substances 0.000 description 5
- 239000012044 organic layer Substances 0.000 description 5
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 229910001508 alkali metal halide Inorganic materials 0.000 description 4
- 150000008045 alkali metal halides Chemical group 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 125000001188 haloalkyl group Chemical group 0.000 description 4
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 238000006467 substitution reaction Methods 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- MCGBIXXDQFWVDW-UHFFFAOYSA-N 4,5-dihydro-1h-pyrazole Chemical group C1CC=NN1 MCGBIXXDQFWVDW-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 229910001615 alkaline earth metal halide Inorganic materials 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 3
- 229940071870 hydroiodic acid Drugs 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 239000002917 insecticide Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011814 protection agent Substances 0.000 description 3
- 125000000475 sulfinyl group Chemical group [*:2]S([*:1])=O 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical group ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- LYQFWZFBNBDLEO-UHFFFAOYSA-M caesium bromide Chemical compound [Br-].[Cs+] LYQFWZFBNBDLEO-UHFFFAOYSA-M 0.000 description 2
- 229910001622 calcium bromide Inorganic materials 0.000 description 2
- WGEFECGEFUFIQW-UHFFFAOYSA-L calcium dibromide Chemical compound [Ca+2].[Br-].[Br-] WGEFECGEFUFIQW-UHFFFAOYSA-L 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001767 cationic compounds Chemical class 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229960001701 chloroform Drugs 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 2
- 229910001411 inorganic cation Inorganic materials 0.000 description 2
- 229910001502 inorganic halide Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- OTCKOJUMXQWKQG-UHFFFAOYSA-L magnesium bromide Chemical compound [Mg+2].[Br-].[Br-] OTCKOJUMXQWKQG-UHFFFAOYSA-L 0.000 description 2
- 229910001623 magnesium bromide Inorganic materials 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 235000010755 mineral Nutrition 0.000 description 2
- 150000002825 nitriles Chemical group 0.000 description 2
- 230000000269 nucleophilic effect Effects 0.000 description 2
- 150000002892 organic cations Chemical class 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 2
- 125000006239 protecting group Chemical group 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 239000004334 sorbic acid Substances 0.000 description 2
- 235000010199 sorbic acid Nutrition 0.000 description 2
- 229940075582 sorbic acid Drugs 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 125000006432 1-methyl cyclopropyl group Chemical group [H]C([H])([H])C1(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000000530 1-propynyl group Chemical group [H]C([H])([H])C#C* 0.000 description 1
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 1
- 125000004200 2-methoxyethyl group Chemical group [H]C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- LVZWSLJZHVFIQJ-UHFFFAOYSA-N Cyclopropane Chemical compound C1CC1 LVZWSLJZHVFIQJ-UHFFFAOYSA-N 0.000 description 1
- PAEYAKGINDQUCT-UHFFFAOYSA-N Ethyl 2-pyrrolecarboxylate Chemical compound CCOC(=O)C1=CC=CN1 PAEYAKGINDQUCT-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- BAVYZALUXZFZLV-UHFFFAOYSA-O Methylammonium ion Chemical compound [NH3+]C BAVYZALUXZFZLV-UHFFFAOYSA-O 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000004071 biological effect Effects 0.000 description 1
- 125000004369 butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000000480 butynyl group Chemical group [*]C#CC([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000004210 cyclohexylmethyl group Chemical group [H]C([H])(*)C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- MSPOSRHJXMILNK-UHFFFAOYSA-N ethyl 1h-pyrazole-5-carboxylate Chemical compound CCOC(=O)C1=CC=NN1 MSPOSRHJXMILNK-UHFFFAOYSA-N 0.000 description 1
- 125000006437 ethyl cyclopropyl group Chemical group 0.000 description 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-O ethylaminium Chemical compound CC[NH3+] QUSNBJAOOMFDIB-UHFFFAOYSA-O 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 239000000383 hazardous chemical Substances 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 238000010653 organometallic reaction Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 150000004291 polyenes Chemical class 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012429 reaction media Substances 0.000 description 1
- 238000006722 reduction reaction Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 description 1
- QEMXHQIAXOOASZ-UHFFFAOYSA-N tetramethylammonium Chemical compound C[N+](C)(C)C QEMXHQIAXOOASZ-UHFFFAOYSA-N 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 125000002813 thiocarbonyl group Chemical group *C(*)=S 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-O triethylammonium ion Chemical compound CC[NH+](CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-O 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/14—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D231/16—Halogen atoms or nitro radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/06—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
- C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
- C07D231/10—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
- C07D231/14—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/04—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings directly linked by a ring-member-to-ring-member bond
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Plural Heterocyclic Compounds (AREA)
Abstract
Description
本揭露關於一種用於製備3-鹵代-4,5-二氫-1 H-吡唑的改進之方法。由本文揭露之方法製備的此類化合物可用於製備作為殺昆蟲劑受人關注的二醯胺作物保護試劑。 The present disclosure relates to an improved method for preparing 3-halo-4,5-dihydro- 1H -pyrazoles. Such compounds prepared by the methods disclosed herein can be used to prepare diamide crop protection agents which are of interest as insecticides.
3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯係製備二醯胺作物保護試劑,例如像殺昆蟲劑溴氰蟲醯胺、氯蟲苯甲醯胺及其衍生物的中間體。使用溴化氫作為氣體或溶液來生產3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯的常規方法受到與儲存、處理和使用含有腐蝕性氣體(例如,溴化氫)的鋼瓶和溶液相關的幾個工業問題的影響。與常規方法相比,鹵鹽減少了環境危害、高成本、試劑反應性、對必要的專用設備的需要、以及以商業規模操作該方法的局限性。 Ethyl 3-bromo-1-(3-chloro-2-pyridinyl)-4,5-dihydro- 1H -pyrazole-5-carboxylate is an intermediate in the preparation of diamide crop protection agents such as the insecticides cyanamide, chloranilamide and their derivatives. The conventional process for the production of ethyl 3-bromo-1-(3-chloro-2-pyridinyl)-4,5-dihydro- 1H -pyrazole-5-carboxylate using hydrogen bromide as a gas or solution is affected by several industrial problems associated with the storage, handling and use of steel cylinders and solutions containing corrosive gases (e.g., hydrogen bromide). Compared to conventional methods, halides reduce environmental hazards, high costs, reagent reactivity, the need for necessary specialized equipment, and limitations in operating the method on a commercial scale.
本揭露提供了可用於製備3-鹵代-4,5-二氫-1 H-吡唑的新穎方法。與先前之方法相比,本揭露方法之益處包括以商業規模操作方法的顯著改善,該方法使用相對低成本、更溫和的反應條件以及在工業量上可商購的危險性更低的試劑。 The present disclosure provides novel methods for preparing 3-halogenated-4,5-dihydro- 1H -pyrazoles. Benefits of the disclosed methods include significant improvements in the process for commercial scale operation compared to previous methods, using relatively low cost, milder reaction conditions, and less hazardous reagents that are commercially available in industrial quantities.
本揭露關於一種用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法 其中 R 1係C(O)R 3、鹵素、氰基、C 1-C 4烷基、C 2-C 4烯基、C 2-C 4炔基、C 1-C 4鹵代烷基或C 1-C 4羥基烷基; X 1係鹵素; R 2係氫、鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; 每個R x獨立地是鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; Z係N或CR z; R 3係H、OH、C 1-C 4烷基或C 1-C 4烷氧基; R z係氫、鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基;並且 k係0、1、2或3;該方法包括: 使 (1)具有式 II的4,5-二氫-1 H-吡唑化合物 其中X 2係OS(O) mR 4、OP(O) n(OR 5) 2或除了X 1之外的鹵素; m係1或2; n係0或1; R 4係C 1-C 4烷基或C 1-C 4鹵代烷基;或視需要被1至3個選自C 1-C 4烷基和鹵素的取代基取代的苯基;並且 每個R 5獨立地是C 1-C 4烷基或C 1-C 4鹵代烷基;或視需要被1至3個選自C 1-C 4烷基和鹵素的取代基取代的苯基; 與 (2)鹵鹽,其中該鹵鹽的鹵素係X 1,以及 (3)無機酸在合適的溶劑的存在下、並且視需要在有機酸的存在下反應以形成該具有式 I的化合物。 The present disclosure relates to a method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound having Formula I Wherein R 1 is C(O)R 3 , halogen, cyano, C 1 -C 4 alkyl, C 2 -C 4 alkenyl, C 2 -C 4 alkynyl, C 1 -C 4 haloalkyl or C 1 -C 4 hydroxyalkyl; X 1 is halogen; R 2 is hydrogen, halogen, cyano, C 1 -C 4 alkyl or C 1 -C 4 haloalkyl; each R C 1 -C 4 alkyl or C 1 -C 4 haloalkyl; Z is N or CR z ; R 3 is H, OH, C 1 -C 4 alkyl or C 1 -C 4 alkoxy; R z is hydrogen, halogen, cyano, C 1 -C 4 alkyl or C 1 -C 4 haloalkyl; and k is 0, 1, 2 or 3; the method includes: making (1) 4,5- having formula II Dihydro- 1H -pyrazole compound Where X 2 is OS(O) m R 4 , OP ( O ) n (OR 5 ) 2 or halogen other than 4 alkyl or C 1 -C 4 haloalkyl; or phenyl optionally substituted with 1 to 3 substituents selected from C 1 -C 4 alkyl and halogen; and each R 5 is independently C 1 - C 4 alkyl or C 1 -C 4 haloalkyl; or phenyl optionally substituted by 1 to 3 substituents selected from C 1 -C 4 alkyl and halogen; with (2) halide salt, wherein the halogen The halogen series of the salt,
本揭露還關於一種製備具有式 III的化合物之方法 其中 R 1係C(O)R 3、鹵素、氰基、C 1-C 4烷基、C 2-C 4烯基、C 2-C 4炔基、C 1-C 4鹵代烷基或C 1-C 4羥基烷基; X 1係鹵素; R 2係氫、鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; 每個R x獨立地是鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; Z係N或CR z; R 3係H、OH、C 1-C 4烷基或C 1-C 4烷氧基; R z係氫、鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基;並且 k係0、1、2或3;該方法的特徵在於,使用如藉由以上所揭露之方法製備的具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物。 The present disclosure also relates to a method of preparing a compound of formula III Wherein R 1 is C(O)R 3 , halogen, cyano, C 1 -C 4 alkyl, C 2 -C 4 alkenyl, C 2 -C 4 alkynyl, C 1 -C 4 haloalkyl or C 1 -C 4 hydroxyalkyl; X 1 is halogen; R 2 is hydrogen, halogen, cyano, C 1 -C 4 alkyl or C 1 -C 4 haloalkyl; each R C 1 -C 4 alkyl or C 1 -C 4 haloalkyl; Z is N or CR z ; R 3 is H, OH, C 1 -C 4 alkyl or C 1 -C 4 alkoxy; R z is Hydrogen, halogen, cyano, C 1 -C 4 alkyl or C 1 -C 4 haloalkyl; and k is 0, 1, 2 or 3; the method is characterized in that it is prepared by the method disclosed above 3-halo-4,5-dihydro- 1H -pyrazole compounds of formula I.
本揭露還關於一種製備具有式 IV的二醯胺化合物之方法 其中 X 1係鹵素; R 2係氫、鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; 每個R x獨立地是鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; Z係N或CR z; R z係氫、鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; k係0、1、2或3; R 6A係鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; R 6B係氫、鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; R 6C係鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基; R 6D係氫、鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基;並且 R 7係C 1-C 4烷基、C 3-C 6環烷基、C 4-C 8環烷基烷基、C 4-C 8烷基環烷基、或C 5-C 8烷基環烷基烷基;該方法使用具有式 Ia的化合物 其中R 3係OH或C 1-C 4烷氧基;該方法的特徵在於,藉由以上所揭露之方法製備具有式 Ia的化合物。 The present disclosure also relates to a method for preparing a diamide compound having formula IV wherein X1 is halogen; R2 is hydrogen, halogen, cyano, C1 - C4 alkyl or C1 - C4 halogenated alkyl; each Rx is independently halogen, cyano, C1 - C4 alkyl or C1 - C4 halogenated alkyl; Z is N or CRz ; Rz is hydrogen, halogen, cyano, C1 - C4 alkyl or C1 -C4 halogenated alkyl; k is 0, 1, 2 or 3; R6A is halogen, cyano, C1 - C4 alkyl or C1 - C4 halogenated alkyl ; R6B is hydrogen, halogen, cyano, C1 - C4 alkyl or C1 - C4 halogenated alkyl; R6C is halogen, cyano, C1 - C4 alkyl or C1 - C4 halogenated alkyl; R 6D is hydrogen, halogen, cyano, C 1 -C 4 alkyl or C 1 -C 4 halogenated alkyl; and R 7 is C 1 -C 4 alkyl, C 3 -C 6 cycloalkyl, C 4 -C 8 cycloalkylalkyl, C 4 -C 8 alkylcycloalkyl, or C 5 -C 8 alkylcycloalkylalkyl; the method uses a compound having formula Ia wherein R 3 is OH or C 1 -C 4 alkoxy; the method is characterized in that the compound having formula Ia is prepared by the method disclosed above.
本揭露之方法通常可適用於多種具有式 II的起始化合物和具有式 I的產物化合物。在本文的敘述中,儘管R 1取代基連接到4,5-二氫-1 H-吡唑環的骨架上,但R 1取代基與反應中心分離。R 1取代基可以包括可藉由現代有機合成化學方法製備的多種基於碳的基團。熟悉該項技術者將認識到,某些基團對於該方法的試劑係敏感的,並且可以在該反應條件下轉化。熟悉該項技術者還將認識到,某些基團係鹼性的並且當與該方法的試劑接觸時可以形成鹽,並且因此本揭露之方法可能需要附加的鹵鹽和無機酸。 The methods of the present disclosure are generally applicable to a variety of starting compounds of Formula II and product compounds of Formula I. In the description herein, although the R 1 substituent is attached to the backbone of the 4,5-dihydro-1 H -pyrazole ring, the R 1 substituent is separated from the reaction center. The R 1 substituents can include a variety of carbon-based groups that can be prepared by modern organic synthetic chemistry methods. Those skilled in the art will recognize that certain groups are sensitive to the reagents of this method and can be transformed under the reaction conditions. Those skilled in the art will also recognize that certain groups are basic and can form salts when contacted with reagents of the method, and therefore the methods of the present disclosure may require additional halide salts and inorganic acids.
如本文所使用的,術語「包含(comprises)」、「包含(comprising)」、「包括(includes)」、「包括(including)」、「具有(has)」、「具有(having)」、「含有(contains)」、「含有(containing)」、「特徵在於(characterized by)」或其任何其他變體,旨在涵蓋非排他性包括,受到明確指出的任何限制。例如,包含一系列要素的組成物、混合物、製程或方法不一定僅限於那些要素,而是可以包括未明確列出的其他要素或此類組成物、混合物、製程或方法固有的其他要素。As used herein, the terms "comprises," "comprising," "includes," "including," "has," "having," "contains," "containing," "characterized by," or any other variations thereof, are intended to cover a non-exclusive inclusion, subject to any limitation expressly stated. For example, a composition, mixture, process, or method that comprises a list of elements is not necessarily limited to those elements but may include other elements not expressly listed or inherent to such composition, mixture, process, or method.
連接短語「由……組成」排除任何未指出的要素、步驟或成分。如果在請求項中,則此短語將使請求項為封閉式,不包括除明確列出那些外的材料,但與其通常相關的雜質除外。當短語「由……組成」出現在請求項主體的子句中而非緊接前序部分時,該短語僅僅限制該子句中闡述的要素;整體上,該請求項並不排除其他要素。The transitional phrase "consisting of" excludes any unspecified element, step, or ingredient. If in a claim, the phrase renders the claim closed, excluding materials other than those expressly listed, except for impurities normally associated therewith. When the phrase "consisting of" appears in a clause of the body of a claim rather than in the immediate preceding clause, the phrase limits only the elements specified in that clause; the claim as a whole does not exclude other elements.
連接短語「基本上由……組成」用於限定除了字面揭露的那些以外還包括材料、步驟、特徵、組分、或要素的組成物、製程或方法,前提係該等附加的材料、步驟、特徵、組分、或要素不會實質影響本揭露之基本和新穎特性。術語「基本上由……組成」居於「包含」和「由……組成」中間。The linking phrase "consisting essentially of" is used to define a composition, process or method that includes materials, steps, features, components, or elements in addition to those literally disclosed, provided that such additional materials, steps , features, components, or elements do not materially affect the basic and novel characteristics of the present disclosure. The term "consisting essentially of" falls somewhere between "includes" and "consisting of."
當申請人已經用開放式術語如「包含(comprising)」定義了實施方式或其一部分時,則應易於理解(除非另外說明),說明書應被解釋為還使用術語「基本上由……組成」或「由……組成」描述該實施方式。When the applicant has defined an embodiment or a part thereof with an open-ended term such as "comprising", it should be readily understood that (unless otherwise stated) the description should be interpreted as also using the term "consisting essentially of" or “consisting of” describes the embodiment.
此外,除非明確相反地說明,否則「或」係指包含性的或而非排他性的或。例如,條件A或B由以下中任一個滿足:A為真(或存在)且B為假(或不存在)、A為假(或不存在)且B為真(或存在)以及A和B皆為真(或存在)。In addition, unless expressly stated to the contrary, "or" refers to an inclusive or and not to an exclusive or. For example, condition A or B is satisfied by any of the following: A is true (or exists) and B is false (or does not exist), A is false (or does not exist) and B is true (or exists), and both A and B are true (or exist).
同樣,在本揭露之元素或組分前的不定冠詞「一個/一種(a/an)」關於元素或組分的例子(即,出現)的數量旨在係非限制性的。因此,「一個/一種(a或an)」應被理解為包括一個/一種或至少一個/一種,並且要素或組分的單數單詞形式也包括複數,除非數字顯然意指單數。Similarly, the indefinite article "a/an" before an element or component of the present disclosure is intended to be non-restrictive with respect to the number of instances (i.e., occurrences) of the element or component. Therefore, "a or an" should be understood to include one or at least one, and the singular word form of an element or component also includes the plural, unless the number obviously means the singular.
如本文所使用的,術語「約」意指該值的正或負10%。還應理解,本文列舉的任何數值範圍包括從下限值到上限值的所有值。例如,如果將數值範圍指定為1至10,則預期本說明書中明確地列舉了如2至9、2.5至8.1、或1至1.6 等值。該等僅是具體意圖之實例,並在所列舉的最低值與最高值之間(並且包括最低值和最高值)的數值的所有可能的組合將被認為在本申請中明確地陳述。應進一步理解,如果以「從/至」或「從約/至約」格式列舉範圍,如從10 : 1至1 : 10,則該範圍包括端點( 即,10 : 1和1 : 10)。 As used herein, the term "about" means plus or minus 10% of the value. It should also be understood that any numerical ranges listed herein include all values from the lower limit to the upper limit. For example, if the numerical range is specified as 1 to 10, it is expected that values such as 2 to 9, 2.5 to 8.1, or 1 to 1.6 are clearly listed in this specification. These are only examples of specific intent, and all possible combinations of numerical values between (and including) the lowest and highest values listed will be considered to be clearly stated in this application. It should be further understood that if a range is listed in a "from/to" or "from about/to about" format, such as from 10: 1 to 1: 10, the range includes endpoints ( i.e. , 10: 1 and 1: 10).
在本揭露之各個方面的任一個中,鹵鹽與具有式 II的化合物的莫耳比係20 : 1、15 : 1、10 : 1、9 : 1、8 : 1、7.9 : 1、7.8 : 1、7.7 : 1、7.6 : 1、7.5 : 1、7.4 : 1、7.3 : 1、7.2 : 1、7.1 : 1、7 : 1、6.9 : 1、6.8 : 1、6.7 : 1、6.6 : 1、6.5 : 1、6.4 : 1、6.3 : 1、6.2 : 1、6.1 : 1、6 : 1、5.9 : 1、5.8 : 1、5.7 : 1、5.6 : 1、5.5 : 1、5.4 : 1、5.3 : 1、5.2 : 1、5.1 : 1、5.1、4.9 : 1、4.8 : 1、4.7 : 1、4.6 : 1、4.5 : 1、4.4 : 1、4.3 : 1、4.2 : 1、4.1 : 1、4 : 1、3.9 : 1、3.8 : 1、3.7 : 1、3.6 : 1、3.5 : 1、3.4 : 1、3.3 : 1、3.2 : 1、3.1 : 1、3 : 1、2.9 : 1、2.8 : 1、2.7 : 1、2.6 : 1、2.5 : 1、2.4 : 1、2.3 : 1、2.2 : 1、2.1 : 1、2 : 1、1.9 : 1、1.8 : 1、1.7 : 1、1.6 : 1、1.4 : 1、1.3 : 1、1.2 : 1、1.1 : 1、1 : 1、0.9 : 1、0.8 : 1、0.7 : 1、0.6 : 1、0.5 : 1、0.4 : 1、0.3 : 1、0.2 : 1或0.1 : 1,以及由該等值構成的任何範圍,如約1 : 1至約6 : 1、約1 : 1至約5 : 1、約2 : 1至約5 : 1、約3.5 : 1至約4.5 : 1、或約3.9 : 1至約4.1 : 1。 In any of the various aspects of the present disclosure, the molar ratio of the halide to the compound of Formula II is 20:1, 15:1, 10:1, 9:1, 8:1, 7.9:1, 7.8:1, 7.7:1, 7.6:1, 7.5:1, 7.4:1, 7.3:1, 7.2:1, 7.1:1, 7:1, 6.9:1, 6.8:1, 6.7:1, 6.6:1, 6.5:1, 6.4:1, 6.3:1, 6.2:1, 6.1:1, 6:1, 5.9:1, 5.8:1, 5.7:1, 5.6:1 1, 5.5 : 1, 5.4 : 1, 5.3 : 1, 5.2 : 1, 5.1 : 1, 5.1, 4.9 : 1, 4.8 : 1, 4.7 : 1, 4.6 : 1, 4.5 : 1, 4.4 : 1, 4.3 : 1, 4.2 : 1, 4.1 : 1, 4 : 1, 3.9 : 1, 3.8 : 1, 3.7 : 1, 3.6 : 1, 3.5 : 1, 3.4 : 1, 3.3 : 1, 3.2 : 1, 3.1 : 1, 3 : 1, 2.9 : 1, 2.8 : 1, 2.7 : 1, 2.6 : 1, 2.5 : 1, 2.4 : 1, 2.3:1, 2.2:1, 2.1:1, 2:1, 1.9:1, 1.8:1, 1.7:1, 1.6:1, 1.4:1, 1.3:1, 1.2:1, 1.1:1, 1:1, 0.9:1, 0.8:1, 0.7:1, 0.6:1, 0.5:1, 0.4:1, 0.3:1, 0.2:1 or 0.1:1, and any ranges consisting of the above values, such as about 1:1 to about 6:1, about 1:1 to about 5:1, about 2:1 to about 5:1, about 3.5:1 to about 4.5:1 1, or about 3.9:1 to about 4.1:1.
在本揭露之各個方面的任一個中,無機酸與具有式 II的化合物的莫耳比係20 : 1、15 : 1、12 : 1、10 : 1、9 : 1、8 : 1、7.9 : 1、7.8 : 1、7.7 : 1、7.6 : 1、7.5 : 1、7.4 : 1、7.3 : 1、7.2 : 1、7.1 : 1、7 : 1、6.9 : 1、6.8 : 1、6.7 : 1、6.6 : 1、6.5 : 1、6.4 : 1、6.3 : 1、6.2 : 1、6.1 : 1、6 : 1、5.9 : 1、5.8 : 1、5.7 : 1、5.6 : 1、5.5 : 1、5.4 : 1、5.3 : 1、5.2 : 1、5.1 : 1、5.1、4.9 : 1、4.8 : 1、4.7 : 1、4.6 : 1、4.5 : 1、4.4 : 1、4.3 : 1、4.2 : 1、4.1 : 1、4 : 1、3.9 : 1、3.8 : 1、3.7 : 1、3.6 : 1、3.5 : 1、3.4 : 1、3.3 : 1、3.2 : 1、3.1 : 1、3 : 1、2.9 : 1、2.8 : 1、2.7 : 1、2.6 : 1、2.5 : 1、2.4 : 1、2.3 : 1、2.2 : 1、2.1 : 1、2 : 1、1.9 : 1、1.8 : 1、1.7 : 1、1.6 : 1、1.4 : 1、1.3 : 1、1.2 : 1、1.1 : 1、1 : 1、0.9 : 1、0.8 : 1、0.7 : 1、0.6 : 1、0.5 : 1、0.4 : 1、0.3 : 1、0.2 : 1或0.1 : 1,以及由該等值構成的任何範圍,如約0.5 : 1至約12 : 1、約0.5 : 1至約6 : 1、約2 : 1至約4 : 1、約2.5 : 1至約3.5 : 1、或約2.9 : 1至約3.1 : 1。 In any of the various aspects of the present disclosure, the molar ratio of the inorganic acid to the compound of Formula II is 20:1, 15:1, 12:1, 10:1, 9:1, 8:1, 7.9: 1, 7.8 : 1, 7.7 : 1, 7.6 : 1, 7.5 : 1, 7.4 : 1, 7.3 : 1, 7.2 : 1, 7.1 : 1, 7 : 1, 6.9 : 1, 6.8 : 1, 6.7 : 1, 6.6: 1, 6.5: 1, 6.4: 1, 6.3: 1, 6.2: 1, 6.1: 1, 6: 1, 5.9: 1, 5.8: 1, 5.7: 1, 5.6: 1, 5.5: 1, 5.4: 1, 5.3 : 1, 5.2 : 1, 5.1 : 1, 5.1, 4.9 : 1, 4.8 : 1, 4.7 : 1, 4.6 : 1, 4.5 : 1, 4.4 : 1, 4.3 : 1, 4.2 : 1, 4.1 : 1, 4: 1, 3.9: 1, 3.8: 1, 3.7: 1, 3.6: 1, 3.5: 1, 3.4: 1, 3.3: 1, 3.2: 1, 3.1: 1, 3: 1, 2.9: 1, 2.8 : 1, 2.7 : 1, 2.6 : 1, 2.5 : 1, 2.4 : 1, 2.3 : 1, 2.2 : 1, 2.1 : 1, 2 : 1, 1.9 : 1, 1.8 : 1, 1.7 : 1, 1.6 : 1, 1.4 : 1, 1.3 : 1, 1.2 : 1, 1.1 : 1, 1 : 1, 0.9 : 1, 0.8 : 1, 0.7 : 1, 0.6 : 1, 0.5 : 1, 0.4 : 1, 0.3 : 1, 0.2:1 or 0.1:1, and any range consisting of such values, such as about 0.5:1 to about 12:1, about 0.5:1 to about 6:1, about 2:1 to about 4:1, about 2.5:1 to about 3.5:1, or about 2.9:1 to about 3.1:1.
在本揭露之各個方面的任一個中,具有式 II的化合物與溶劑的重量與體積比係1 : 500、1 : 50、1 : 40、1 : 35、1 : 30、1 : 25、1 : 24、1 : 23、1 : 22、1 : 21、1 : 20、1 : 19、1 : 18、1 : 17、1 : 16、1 : 15、1 : 14、1 : 13、1 : 12、1 : 11、1 : 10、1 : 9.9、1 : 9.8、1 : 9.7、1 : 9.6、1 : 9.5、1 : 9.4、1 : 9.3、1 : 9.2、1 : 9.1、1 : 9、1 : 8.9、1 : 8.8、1 : 8.7、1 : 8.6、1 : 8.5、1 : 8.4、1 : 8.3、1 : 8.2、1 : 8.1、1 : 8、1 : 7.9、1 : 7.8、1 : 7.7、1 : 7.6、1 : 7.5、1 : 7.4、1 : 7.3、1 : 7.2、1 : 7.1、1 : 7、1 : 6.9、1 : 6.8、1 : 6.7、1 : 6.6、1 : 6.5、1 : 6.4、1 : 6.3、1 : 6.2、1 : 6.1、1 : 6、1 : 5.9、1 : 5.8、1 : 5.7、1 : 5.6、1 : 5.5、1 : 5.4、1 : 5.3、1 : 5.2、1 : 5.1、1 : 5、1 : 4.9、1 : 4.8、1 : 4.7、1 : 4.6、1 : 4.5、1 : 4.4、1 : 4.3、1 : 4.2、1 : 4.1、1 : 4、1 : 3.9、1 : 3.8、1 : 3.7、1 : 3.6、1 : 3.5、1 : 3.4、1 : 3.3、1 : 3.2、1 : 3.1、1 : 3、1 : 2.9、1 : 2.8、1 : 2.7、1 : 2.6、1 : 2.5、1 : 2.4、1 : 2.3、1 : 2.2、1 : 2.1、1 : 2、1 : 1.9、1 : 1.8、1 : 1.7、1 : 1.6、1 : 1.5、1 : 1.4、1 : 1.3、1 : 1.2、1 : 1.1、1 : 1、1 : 0.9、1 : 0.8、1 : 0.75、1 : 0.7、1 : 0.6、1 : 0.5或1 : 0.05,以及由該等值構成的任何範圍,如約0.5 : 1至約12 : 1、約0.5 : 1至約6 : 1、約2 : 1至約4 : 1、約2.5 : 1至約3.5 : 1、或約2.9 : 1至約3.1 : 1。 In any of the various aspects of the disclosure, the weight to volume ratio of the compound of Formula II to the solvent is 1:500, 1:50, 1:40, 1:35, 1:30, 1:25, 1: 24, 1:23, 1:22, 1:21, 1:20, 1:19, 1:18, 1:17, 1:16, 1:15, 1:14, 1:13, 1:12, 1:11, 1:10, 1:9.9, 1:9.8, 1:9.7, 1:9.6, 1:9.5, 1:9.4, 1:9.3, 1:9.2, 1:9.1, 1:9, 1: 8.9, 1 : 8.8, 1 : 8.7, 1 : 8.6, 1 : 8.5, 1 : 8.4, 1 : 8.3, 1 : 8.2, 1 : 8.1, 1 : 8, 1 : 7.9, 1 : 7.8, 1 : 7.7, 1:7.6, 1:7.5, 1:7.4, 1:7.3, 1:7.2, 1:7.1, 1:7, 1:6.9, 1:6.8, 1:6.7, 1:6.6, 1:6.5, 1: 6.4, 1 : 6.3, 1 : 6.2, 1 : 6.1, 1 : 6, 1 : 5.9, 1 : 5.8, 1 : 5.7, 1 : 5.6, 1 : 5.5, 1 : 5.4, 1 : 5.3, 1 : 5.2, 1:5.1, 1:5, 1:4.9, 1:4.8, 1:4.7, 1:4.6, 1:4.5, 1:4.4, 1:4.3, 1:4.2, 1:4.1, 1:4, 1: 3.9, 1 : 3.8, 1 : 3.7, 1 : 3.6, 1 : 3.5, 1 : 3.4, 1 : 3.3, 1 : 3.2, 1 : 3.1, 1 : 3, 1 : 2.9, 1 : 2.8, 1 : 2.7, 1:2.6, 1:2.5, 1:2.4, 1:2.3, 1:2.2, 1:2.1, 1:2, 1:1.9, 1:1.8, 1:1.7, 1:1.6, 1:1.5, 1: 1.4, 1:1.3, 1:1.2, 1:1.1, 1:1, 1:0.9, 1:0.8, 1:0.75, 1:0.7, 1:0.6, 1:0.5 or 1:0.05, and by the same Any range of values, such as about 0.5:1 to about 12:1, about 0.5:1 to about 6:1, about 2:1 to about 4:1, about 2.5:1 to about 3.5:1, or about 2.9 :1 to approximately 3.1 :1.
如本文所使用的,單獨地或在複合詞如「鹵代烷基」、「烷基環烷基」、「環烷基烷基」或「烷基環烷基烷基」中使用的術語「烷基」包括具有一至四個碳原子的直鏈或支鏈的烷基,例如甲基、乙基、 正丙基、 異丙基、或不同的丁基異構物。「烯基」包括直鏈或支鏈的烯烴,如乙烯基、1-丙烯基、2-丙烯基和不同的丁烯基異構物。「烯基」還包括多烯,如1,2-丙二烯基和1,3-丁二烯基。「炔基」包括直鏈或支鏈的炔烴,如乙炔基、1-丙炔基、2-丙炔基和不同的丁炔基異構物。「炔基」還可以包括由多個三鍵構成的部分,如1,3-丁二炔基。 As used herein, the term "alkyl" used alone or in compound words such as "haloalkyl", "alkylcycloalkyl", "cycloalkylalkyl" or "alkylcycloalkylalkyl" includes straight or branched alkyl groups having one to four carbon atoms, such as methyl, ethyl, n -propyl, isopropyl , or different butyl isomers. "Alkenyl" includes straight or branched alkenes, such as vinyl, 1-propenyl, 2-propenyl, and different butenyl isomers. "Alkenyl" also includes polyenes, such as 1,2-propadienyl and 1,3-butadienyl. "Alkynyl" includes straight or branched alkynes, such as ethynyl, 1-propynyl, 2-propynyl, and different butynyl isomers. "Alkynyl" may also include moieties consisting of multiple triple bonds, such as 1,3-butadiynyl.
如本文所使用的,術語「鹵素」包括氟、氯、溴和碘。術語「鹵素」,單獨地或在複合詞如「鹵代烷基」中,包括氟、氯、溴或碘。此外,當在複合詞如「鹵代烷基」中使用時,所述烷基可被可以是相同或不同的鹵素原子部分取代或完全取代。「鹵代烷基」的實例包括F 3C、ClCH 2、CF 3CH 2和CF 3CCl 2。 As used herein, the term "halogen" includes fluorine, chlorine, bromine and iodine. The term "halogen", alone or in compound words such as "haloalkyl", includes fluorine, chlorine, bromine or iodine. Furthermore, when used in compound words such as "haloalkyl", the alkyl group may be partially substituted or fully substituted by halogen atoms which may be the same or different. Examples of "haloalkyl" include F 3 C, ClCH 2 , CF 3 CH 2 and CF 3 CCl 2 .
術語「烷氧基」表示附接到氧原子上並且藉由氧原子連接的烷基,例如像甲氧基、乙氧基、 正丙氧基、 異丙氧基和不同的丁氧基異構物。「羥基烷基」表示被一個末端羥基取代的烷基。「羥基烷基」的實例包括HOCH 2CH 2、CH 3CH 2(OH)CH和HOCH 2CH 2CH 2CH 2。 The term "alkoxy" refers to an alkyl group attached to and linked through an oxygen atom, such as, for example , methoxy, ethoxy, n - propoxy, isopropoxy , and the different butoxy isomers. "Hydroxyalkyl" refers to an alkyl group substituted with a terminal hydroxyl group. Examples of "hydroxyalkyl" include HOCH2CH2 , CH3CH2 (OH)CH, and HOCH2CH2CH2CH2 .
「環烷基」包括例如環丙基、環丁基、環戊基和環己基。術語「烷基環烷基」表示環烷基部分上的烷基取代,並且包括例如乙基環丙基、異丙基環丁基、3-甲基環戊基和4-甲基環己基。術語「環烷基烷基」表示烷基部分上的環烷基取代。「環烷基烷基」的實例包括環丙基甲基、環戊基乙基、環己基甲基以及其他鍵合至直鏈或支鏈烷基的環烷基部分。「烷基環烷基烷基」表示烷基上的烷基環烷基取代。「烷基環烷基烷基」的實例包括甲基環己基甲基和乙基環丙基甲基。"Cycloalkyl" includes, for example, cyclopropyl, cyclobutyl, cyclopentyl, and cyclohexyl. The term "alkylcycloalkyl" refers to alkyl substitution on the cycloalkyl portion, and includes, for example, ethylcyclopropyl, isopropylcyclobutyl, 3-methylcyclopentyl, and 4-methylcyclohexyl. The term "cycloalkylalkyl" refers to cycloalkyl substitution on the alkyl portion. Examples of "cycloalkylalkyl" include cyclopropylmethyl, cyclopentylethyl, cyclohexylmethyl, and other cycloalkyl portions bonded to straight or branched alkyl groups. "Alkylcycloalkylalkyl" refers to alkylcycloalkyl substitution on the alkyl group. Examples of "alkylcycloalkylalkyl" include methylcyclohexylmethyl and ethylcyclopropylmethyl.
如本文所使用的化學縮寫S(O)和S(=O)表示亞磺醯基部分。如本文所使用的化學縮寫SO 2、S(O) 2和S(=O) 2表示磺醯基部分。如本文所使用的化學縮寫C(O)和C(=O)表示羰基部分。如本文所使用的化學縮寫C(S)和C(=S)表示硫代羰基部分。如本文所使用的化學縮寫CO 2、C(O)O和C(=O)O表示氧基羰基部分。「CHO」意指甲醯基。 The chemical abbreviations S(O) and S(=O) as used herein represent a sulfinyl moiety. The chemical abbreviations SO 2 , S(O) 2 and S(=O) 2 as used herein represent sulfonyl moieties. The chemical abbreviations C(O) and C(=O) as used herein represent carbonyl moieties. The chemical abbreviations C(S) and C(=S) as used herein represent thiocarbonyl moieties. The chemical abbreviations CO2 , C(O)O and C(=O)O as used herein represent the oxycarbonyl moiety. "CHO" means nail base.
在片段定義開頭的「-」表示所述片段與分子其餘片段的附接點;例如,「-CH 2CH 2OMe」表示片段2-甲氧基乙基。 A "-" at the beginning of a fragment definition indicates the point of attachment of the fragment to the rest of the molecule; for example, " -CH2CH2OMe " indicates the fragment 2-methoxyethyl.
環片段藉由使用圓括號內兩個「-」來表示;例如,片段1-甲基環丙基由「-C(CH 3)(-CH 2CH 2-)」表示,其中碳原子鍵合到二-碳鏈的兩個末端碳原子上,如以下示出。 Cyclic fragments are represented by the use of two "-"s within parentheses; for example, the fragment 1 - methylcyclopropyl is represented by "-C( CH3 )(- CH2CH2- )" where the carbon atoms are bonded to the two terminal carbon atoms of a di-carbon chain, as shown below.
在取代基中的碳原子的總數用「C h-C i」前綴表示,其中h和i係從1至8的數。例如,C 3-C 6環烷基表示環丙烷至環己烷;C 5烷基環烷基烷基表示例如-CH 2C(CH 3)(-CH 2CH 2-)或-CH 2C(-CH(CH 3)CH 2-);C 6烷基環烷基烷基表示例如-CH 2CH 2C(CH 3)(-CH 2CH 2-)、-CH 2CH 2C(-CH(CH 3)CH 2-)、-CH 2C(CH 2CH 3)(-CH 2CH 2-)、-CH 2C(-CH(CH 2CH 3)CH 2-)、-CH 2C(CH 3)(-CH 2CH 2CH 2-)、-CH 2C(-CH(CH 3)CH 2CH 2-)或-CH 2C(-CH 2CH(CH 3)CH 2-);並且C 8烷基環烷基烷基表示被總共含有八個碳原子的烷基環烷基取代的烷基的各種異構物。 The total number of carbon atoms in a substituent is indicated by the "C h -C i " prefix, where h and i are numbers from 1 to 8. For example, C 3 -C 6 cycloalkyl represents cyclopropane to cyclohexane; C 5 alkylcycloalkylalkyl represents, for example, -CH 2 C(CH 3 )(-CH 2 CH 2 -) or -CH 2 C (-CH(CH 3 )CH 2 -); C 6 alkylcycloalkylalkyl represents for example -CH 2 CH 2 C(CH 3 )(-CH 2 CH 2 -), -CH 2 CH 2 C(- CH(CH 3 )CH 2 -), -CH 2 C(CH 2 CH 3 )(-CH 2 CH 2 -), -CH 2 C(-CH(CH 2 CH 3 )CH 2 -), -CH 2 C(CH 3 )(-CH 2 CH 2 CH 2 -), -CH 2 C(-CH(CH 3 )CH 2 CH 2 -) or -CH 2 C(-CH 2 CH(CH 3 )CH 2 - ); and C 8 alkylcycloalkylalkyl represents the various isomers of alkyl substituted by alkylcycloalkyl containing a total of eight carbon atoms.
當化合物被帶有下標(其指示所述取代基的數目可以超過1)的取代基取代時,所述取代基(當它們超過1時)獨立地選自所定義的取代基的組,例如(R x) k,其中k係0、1、2或3。當基團含有可以為氫的取代基,例如R 2或R 6B時,則當該取代基為氫時,公認這等同於所述基團係未取代的。當顯示出可變基團視需要附接到一個位置,例如(R x) k其中k可以是0時,則氫可以位於該位置,即使在可變基團定義中沒有提及。當基團上的一個或多個位置被稱為係「沒有被取代的」或「未取代的」時,則附接氫原子以佔據任何自由價。 When a compound is substituted by a substituent with a subscript (which indicates that the number of said substituents may exceed 1), said substituents (when they exceed 1) are independently selected from the group of defined substituents, e.g. (R x ) k , where k is 0, 1, 2 or 3. When a group contains a substituent which may be hydrogen, for example R2 or R6B , then when the substituent is hydrogen it is recognized that this is equivalent to the group being unsubstituted. When a variable group is shown to be optionally attached to a position, such as (R x ) k where k may be 0, then a hydrogen may be located at that position even if not mentioned in the variable group definition. When one or more positions on a group are said to be "unsubstituted" or "unsubstituted," a hydrogen atom is attached to occupy any free valence.
如本文所使用的,術語「合適的」指示如此描述的實體適合於在所示的情況或環境中使用。術語「反應」等係指在適當條件下添加、接觸或混合兩種或更多種試劑以產生所指示和/或所期望的產物。應當理解,產生所指示/或所期望的產物的反應不一定直接產生自最初添加的兩種試劑的組合,即在最終導致形成所指示和/或所期望的產物的混合物中可能產生一種或多種中間體。反應可以在存在或不存在溶劑的情況下、在高於室溫或低於室溫的溫度下、在惰性氣氛下等進行。As used herein, the term "suitable" indicates that the entity so described is suitable for use in the situation or environment shown. The term "reaction" and the like refer to the addition, contact or mixing of two or more reagents under appropriate conditions to produce the indicated and/or desired product. It should be understood that the reaction to produce the indicated and/or desired product does not necessarily arise directly from the combination of the two reagents initially added, i.e., one or more intermediates may be produced in the mixture that ultimately leads to the formation of the indicated and/or desired product. The reaction can be carried out in the presence or absence of a solvent, at a temperature above or below room temperature, under an inert atmosphere, etc.
術語「視需要」當在本文中使用時意指視需要的條件可以存在或可以不存在。例如,當反應視需要在有機酸的存在下進行時,該有機酸可以存在或可以不存在。術語「視需要取代的」係指以下基團,其為未被取代的或具有至少一個不消除由未被取代的類似物所具有的化學或生物活性的非氫取代基。如本文所使用的,除非另外指明,否則將應用下列定義。術語「視需要被……取代的」與短語「未被取代的或被……取代的」或與術語「(未)被……取代的」可互換使用。除非另外指明,否則視需要取代的基團可在基團的每個可取代的位置處具有取代基,並且每個取代彼此獨立。The term "optional" when used herein means that an optional condition may or may not be present. For example, when the reaction is optionally carried out in the presence of an organic acid, the organic acid may or may not be present. The term "optionally substituted" refers to a group that is unsubstituted or has at least one non-hydrogen substituent that does not eliminate the chemical or biological activity possessed by the unsubstituted analogue. As used herein, the following definitions will apply unless otherwise specified. The term "optionally substituted" is used interchangeably with the phrase "unsubstituted or substituted" or with the term "(not) substituted." Unless otherwise specified, an optionally substituted group may have a substituent at each substitutable position of the group, and each substitution is independent of the other.
如本文所使用的,術語「鹽(salt/salts)」係指任何陰離子和陽離子複合物。術語「鹵化物」係指鹵素的陰離子。術語「鹵鹽」係指具有一種或多種鹵素陰離子和至少一種不是鹵素的其他原子的鹽。鹵鹽可以包括但不限於無機鹵鹽。術語「無機鹵鹽」意指無機陽離子和一種或多種鹵素陰離子的鹽。無機陽離子可以選自鹼金屬和/或鹼土金屬。如本文所使用的,術語「鹼金屬(alkali)」係指週期表的鹼金屬(即,鋰、鈉、鉀、銣、銫和鈁)。如本文所使用的,術語「鹼土金屬(alkaline earth)」係指週期表的鹼土金屬(即,鈹、鎂、鈣、鍶、鋇和鐳)。術語「有機鹵鹽」意指有機陽離子和一種或多種鹵素陰離子的鹽。有機陽離子的非限制性實例包括例如銨、季銨、和胺陽離子,如銨、四甲基銨、四乙基銨、甲基銨、二甲基銨、三甲基銨、三乙基銨和乙基銨等。As used herein, the term "salt" or "salts" refers to any complex of anions and cations. The term "halide" refers to anions of halogens. The term "halide" refers to a salt having one or more halogen anions and at least one other atom that is not a halogen. Halides may include but are not limited to inorganic halides. The term "inorganic halides" means salts of inorganic cations and one or more halogen anions. The inorganic cations may be selected from alkali metals and/or alkaline earth metals. As used herein, the term "alkali" refers to the alkali metals of the periodic table (i.e., lithium, sodium, potassium, cadmium, cesium, and cobalt). As used herein, the term "alkaline earth" refers to the alkali earth metals of the periodic table (i.e., palladium, magnesium, calcium, strontium, barium, and ferrum). The term "organic halide" means a salt of an organic cation and one or more halogen anions. Non-limiting examples of organic cations include, for example, ammonium, quaternary ammonium, and amine cations, such as ammonium, tetramethylammonium, tetraethylammonium, methylammonium, dimethylammonium, trimethylammonium, triethylammonium, and ethylammonium, etc.
如本文所使用的,術語「無機酸」係指衍生自一種或多種無機化合物的酸,該酸在水中離解以產生氫離子(H +)。無機酸的非限制性實例包括例如氫碘酸、氫溴酸、鹽酸、過氯酸、硫酸、硝酸、亞硫酸、磷酸、硼酸及其組合。 As used herein, the term "inorganic acid" refers to an acid derived from one or more inorganic compounds that dissociates in water to produce hydrogen ions (H + ). Non-limiting examples of inorganic acids include, for example, hydroiodic acid, hydrobromic acid, hydrochloric acid, perchloric acid, sulfuric acid, nitric acid, sulfurous acid, phosphoric acid, boric acid, and combinations thereof.
如本文所使用的,術語「有機酸」係指其特徵在於弱酸特性並且在水的存在下不完全離解的有機化合物。有機酸的實例包括但不限於羧酸如甲酸、乙酸、三氟乙酸、草酸、丙酸、乳酸、丁酸、富馬酸、蘋果酸、馬來酸、琥珀酸、酒石酸、山梨酸、檸檬酸、苯甲酸及其組合。As used herein, the term "organic acid" refers to an organic compound that is characterized by weak acid properties and does not completely dissociate in the presence of water. Examples of organic acids include, but are not limited to, carboxylic acids such as formic acid, acetic acid, trifluoroacetic acid, oxalic acid, propionic acid, lactic acid, butyric acid, fumaric acid, apple acid, maleic acid, succinic acid, tartaric acid, sorbic acid, citric acid, benzoic acid, and combinations thereof.
如本文所使用的,術語「重量與體積比」係指反應物的重量相比於在反應中使用的溶劑的量。除非另外說明,否則重量與體積比的單位以克(g)/毫升(mL)計。例如,具有式 II的化合物與溶劑的1 : 5重量與體積比意指1克具有式 II的化合物相比於5 mL的溶劑。 As used herein, the term "weight to volume ratio" refers to the weight of the reactants compared to the amount of solvent used in the reaction. Unless otherwise stated, weight to volume ratios are expressed in grams (g) per milliliter (mL). For example, a 1:5 weight to volume ratio of compound of formula II to solvent means 1 gram of compound of formula II compared to 5 mL of solvent.
本揭露之如發明內容中所描述的實施方式包括以下描述的那些。在以下實施方式中,除非在實施方式中進一步定義,否則對「具有式 I的化合物」的提及包括在發明內容中指定的取代基的定義。 Implementations of the present disclosure as described in the Summary include those described below. In the following embodiments, references to "a compound of formula I " include the definition of the substituents specified in the Summary of the Invention, unless further defined in the embodiments.
實施方式1. 一種用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中R 1係C(O)R 3、鹵素、氰基、C 1-C 4烷基、C 2-C 4烯基、C 2-C 4炔基或C 1-C 4羥基烷基。 Embodiment 1. A method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound having formula I , wherein R 1 is C(O)R 3 , halogen, cyano, C 1 -C 4 alkyl, C 2 -C 4 alkenyl, C 2 -C 4 alkynyl or C 1 -C 4 hydroxyalkyl.
實施方式2. 如實施方式1所述之方法,其中R 1係C(O)R 3、鹵素、氰基、C 1-C 4烷基或C 1-C 4羥基烷基。 Embodiment 2. The method of Embodiment 1, wherein R 1 is C(O)R 3 , halogen, cyano, C 1 -C 4 alkyl or C 1 -C 4 hydroxyalkyl.
實施方式3. 如實施方式1所述之方法,其中R 1係C(O)R 3、氰基、C 1-C 4烷基或C 1-C 4羥基烷基。 Embodiment 3. The method as described in Embodiment 1, wherein R 1 is C(O)R 3 , cyano, C 1 -C 4 alkyl or C 1 -C 4 hydroxyalkyl.
實施方式3a. 如實施方式3所述之方法,其中R 1係C(O)R 3、氰基、甲基或羥基甲基。 Embodiment 3a. The method of Embodiment 3, wherein R 1 is C(O)R 3 , cyano, methyl or hydroxymethyl.
實施方式3b. 如實施方式1所述之方法,其中R 1係C(O)R 3。 Embodiment 3b. The method as described in Embodiment 1, wherein R 1 is C(O)R 3 .
實施方式4. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中X 1係Cl、Br、或I。 Embodiment 4. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein X1 is Cl, Br , or I.
實施方式5. 如實施方式1至3中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中X 1係Cl、Br或F。 Embodiment 5. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of Embodiments 1 to 3, wherein X 1 is Cl, Br or F.
實施方式6. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中X 1係Cl或Br。 Embodiment 6. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein X1 is Cl or Br .
實施方式7. 如實施方式6所述之方法,其中X 1係Cl。 Embodiment 7. The method according to embodiment 6, wherein X 1 is Cl.
實施方式8. 如實施方式6所述之方法,其中X 1係Br。 Embodiment 8. The method according to embodiment 6, wherein X 1 is Br.
實施方式9. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中R 2係鹵素、氰基、C 1-C 4烷基或C 1-C 4鹵代烷基。 Embodiment 9. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein R 2 is halogen, cyano, C 1 -C 4 alkyl or C 1 -C 4 halogenated alkyl.
實施方式10. 如實施方式9所述之方法,其中R 2係鹵素、氰基、甲基、乙基或C 1-C 4鹵代烷基。 Embodiment 10. The method of embodiment 9, wherein R 2 is halogen, cyano, methyl, ethyl or C 1 -C 4 haloalkyl.
實施方式11. 如實施方式9所述之方法,其中R 2係鹵素、氰基、甲基、乙基或CF 3。 Embodiment 11. The method according to embodiment 9, wherein R 2 is halogen, cyano, methyl, ethyl or CF 3 .
實施方式12. 如實施方式9所述之方法,其中R 2係F、Cl、Br、氰基、甲基、乙基或CF 3。 Embodiment 12. The method according to embodiment 9, wherein R 2 is F, Cl, Br, cyano, methyl, ethyl or CF 3 .
實施方式13. 如實施方式9所述之方法,其中R 2係F、Cl、Br、氰基或CF 3。 Embodiment 13. The method of embodiment 9, wherein R 2 is F, Cl, Br, cyano or CF 3 .
實施方式14. 如實施方式9所述之方法,其中R 2係F、Cl或Br。 Embodiment 14. The method of embodiment 9, wherein R 2 is F, Cl or Br.
實施方式15. 如實施方式9所述之方法,其中R 2係F。 Embodiment 15. The method of embodiment 9, wherein R 2 is F.
實施方式16. 如實施方式9所述之方法,其中R 2係Cl。 Embodiment 16. The method as described in Embodiment 9, wherein R 2 is Cl.
實施方式17. 如實施方式9所述之方法,其中R 2係Br。 Embodiment 17. The method of embodiment 9, wherein R 2 is Br.
實施方式18. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中每個R x獨立地是F、Cl、Br、氰基或CF 3。 Embodiment 18. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein each R x is independently F, Cl, Br, cyano or CF 3 .
實施方式19. 如實施方式18所述之方法,其中每個R x獨立地是F、Cl或Br。 Embodiment 19. The method according to embodiment 18, wherein each R x is independently F, Cl or Br.
實施方式20. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中R 3係OH或C 1-C 4烷氧基。 Embodiment 20. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein R 3 is OH or C 1 -C 4 alkoxy.
實施方式20a. 如實施方式20所述之方法,其中R 3係OH、OCH 3或OCH 2CH 3。 Embodiment 20a. The method according to Embodiment 20, wherein R 3 is OH, OCH 3 or OCH 2 CH 3 .
實施方式20b. 如實施方式20所述之方法,其中R 3係OH或OCH 3。 Embodiment 20b. The method of embodiment 20, wherein R 3 is OH or OCH 3 .
實施方式20c. 如實施方式20所述之方法,其中R 3係OH。 Embodiment 20c. The method according to Embodiment 20, wherein R 3 is OH.
實施方式20d. 如實施方式20所述之方法,其中R 3係OCH 3。 Embodiment 20d. The method of embodiment 20, wherein R 3 is OCH 3 .
實施方式21. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中R z係氫、F、Cl、Br、氰基、甲基或CF 3。 Embodiment 21. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein R z is hydrogen, F, Cl, Br, cyano, methyl or CF 3 .
實施方式22. 如實施方式1至20中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中Z係N。 Embodiment 22. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of Embodiments 1 to 20, wherein Z is N.
實施方式23. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中k係0、1或2。 Embodiment 23. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein k is 0, 1 or 2.
實施方式24. 如實施方式23所述之方法,其中k係0或1。Embodiment 24. The method of embodiment 23, wherein k is 0 or 1.
實施方式25. 如實施方式23所述之方法,其中k係0。Implementation method 25. The method as described in implementation method 23, wherein k is 0.
實施方式26. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中X 2係OS(O) mR 4、或除了X 1之外的鹵素。 Embodiment 26. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein X is OS(O ) m R 4 , or halogen other than X 1 .
實施方式26a. 如實施方式26所述之方法,其中X 2係Cl或OS(O) mR 4。 Embodiment 26a. The method of embodiment 26, wherein X 2 is Cl or OS(O) m R 4 .
實施方式27. 如實施方式26所述之方法,其中X 2係OS(O) mR 4。 Embodiment 27. The method of embodiment 26, wherein X 2 is OS(O) m R 4 .
實施方式28. 如實施方式26所述之方法,其中X 2係除了X 1之外的鹵素。 Embodiment 28. The method of embodiment 26, wherein X 2 is a halogen other than X 1 .
實施方式29. 如實施方式28所述之方法,其中X 2係Cl。 Embodiment 29. The method according to embodiment 28, wherein X 2 is Cl.
實施方式30. 如實施方式1至25中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中X 2係OP(O) n(OR 5) 2。 Embodiment 30. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of Embodiments 1 to 25, wherein X 2 is OP(O) n (OR 5 ) 2 .
實施方式31. 如實施方式1至27中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中m係2。 Embodiment 31. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of embodiments 1 to 27, wherein m is 2.
實施方式32. 如實施方式1至27中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中R 4係C 1-C 4烷基;或視需要被1至3個選自C 1-C 4烷基和鹵素的取代基取代的苯基。 Embodiment 32. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of embodiments 1 to 27, wherein R 4 is C 1 -C 4 alkyl; or phenyl optionally substituted with 1 to 3 substituents selected from C 1 -C 4 alkyl and halogen.
實施方式33. 如實施方式32所述之方法,其中R 4係甲基或乙基;或視需要被1至3個選自甲基、乙基和鹵素的取代基取代的苯基。 Embodiment 33. The method as described in Embodiment 32, wherein R 4 is methyl or ethyl; or phenyl which is optionally substituted with 1 to 3 substituents selected from methyl, ethyl and halogen.
實施方式34. 如實施方式32所述之方法,其中R 4係甲基或乙基;或視需要被1個選自甲基、乙基和鹵素的取代基取代的苯基。 Embodiment 34. The method as described in Embodiment 32, wherein R 4 is methyl or ethyl; or phenyl which is optionally substituted with one substituent selected from methyl, ethyl and halogen.
實施方式35. 如實施方式32所述之方法,其中R 4係甲基、乙基、苯基或4-甲基苯基。 Embodiment 35. The method of embodiment 32, wherein R 4 is methyl, ethyl, phenyl or 4-methylphenyl.
實施方式35a. 如實施方式32所述之方法,其中R 4係甲基、苯基或4-甲基苯基。 Embodiment 35a. The method according to Embodiment 32, wherein R 4 is methyl, phenyl or 4-methylphenyl.
實施方式35b. 如實施方式35所述之方法,其中R 4係甲基。 Embodiment 35b. The method as described in Embodiment 35, wherein R 4 is methyl.
實施方式35c. 如實施方式35所述之方法,其中R 4係苯基或4-甲基苯基。 Embodiment 35c. The method of embodiment 35, wherein R 4 is phenyl or 4-methylphenyl.
實施方式35d. 如實施方式35所述之方法,其中R 4係苯基。 Embodiment 35d. The method as described in Embodiment 35, wherein R 4 is phenyl.
實施方式35e. 如實施方式35所述之方法,其中R 4係4-甲基苯基。 Embodiment 35e. The method of embodiment 35, wherein R 4 is 4-methylphenyl.
實施方式36. 如實施方式1至25中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中n係1。 Embodiment 36. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of embodiments 1 to 25, wherein n is 1.
實施方式37. 如實施方式1至25中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中每個R 5獨立地是C 1-C 4烷基;或視需要被1至3個選自C 1-C 4烷基和鹵素的取代基取代的苯基。 Embodiment 37. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of embodiments 1 to 25, wherein each R 5 is independently C 1 -C 4 alkyl; or phenyl optionally substituted with 1 to 3 substituents selected from C 1 -C 4 alkyl and halogen.
實施方式38. 如實施方式37所述之方法,其中R 5係甲基或乙基;或視需要被1至3個選自甲基、乙基和鹵素的取代基取代的苯基。 Embodiment 38. The method as described in Embodiment 37, wherein R 5 is methyl or ethyl; or phenyl which is optionally substituted with 1 to 3 substituents selected from methyl, ethyl and halogen.
實施方式39. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該鹵鹽選自鹼金屬鹵化物、鹼土金屬鹵化物、銨鹵化物、季銨鹵化物及其組合。 Embodiment 39. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of Formula I as described in any one of the preceding embodiments, wherein the halide salt is selected from the group consisting of bases Metal halides, alkaline earth metal halides, ammonium halides, quaternary ammonium halides and combinations thereof.
實施方式40. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1H-吡唑化合物之方法,其中該鹵鹽選自鹼金屬鹵化物、鹼土金屬鹵化物及其組合。 Embodiment 40. The method for preparing a 3-halogenated-4,5-dihydro-1H-pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the halide is selected from alkali metal halides, alkali earth metal halides and combinations thereof.
實施方式41. 如實施方式40所述之方法,其中該鹵鹽選自鹼金屬鹵化物及其組合。Embodiment 41. The method of embodiment 40, wherein the halide salt is selected from alkali metal halides and combinations thereof.
實施方式42. 如實施方式40所述之方法,其中該鹵鹽選自鹼土金屬鹵化物及其組合。Embodiment 42. The method of embodiment 40, wherein the halide salt is selected from alkaline earth metal halides and combinations thereof.
實施方式43. 如實施方式39所述之方法,其中該鹵鹽選自鹼金屬溴化物、鹼土金屬溴化物、溴化銨、季銨溴化物、鹼金屬氯化物、鹼土金屬氯化物、氯化銨、季銨氯化物及其組合。Embodiment 43. The method as described in embodiment 39, wherein the halide is selected from alkali metal bromides, alkali earth metal bromides, ammonium bromide, quaternary ammonium bromide, alkali metal chlorides, alkali earth metal chlorides, ammonium chloride, quaternary ammonium chlorides and combinations thereof.
實施方式44. 如實施方式39所述之方法,其中該鹵鹽選自鹼金屬溴化物、鹼土金屬溴化物、溴化銨、季銨溴化物及其組合。Embodiment 44. The method of embodiment 39, wherein the halide salt is selected from the group consisting of alkali metal bromide, alkaline earth metal bromide, ammonium bromide, quaternary ammonium bromide and combinations thereof.
實施方式45. 如實施方式1至40中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該鹵鹽選自鹼金屬溴化物、鹼土金屬溴化物及其組合。 Embodiment 45. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of Formula I as described in any one of Embodiments 1 to 40, wherein the halide is selected from alkali metal bromides, alkaline earth metal bromides and combinations thereof.
實施方式46. 如實施方式45所述之方法,其中該鹵鹽選自溴化鋰、溴化鈉、溴化鉀、溴化銫、溴化鎂、溴化鈣及其組合。Embodiment 46. The method of embodiment 45, wherein the halide salt is selected from the group consisting of lithium bromide, sodium bromide, potassium bromide, cesium bromide, magnesium bromide, calcium bromide and combinations thereof.
實施方式47. 如實施方式45所述之方法,其中該鹵鹽選自鹼金屬溴化物及其組合。Embodiment 47. The method as described in embodiment 45, wherein the halide is selected from alkali metal bromides and combinations thereof.
實施方式47a. 如實施方式45所述之方法,其中該鹵鹽選自溴化鋰、溴化鈉、溴化鉀、溴化銫及其組合。Embodiment 47a. The method according to embodiment 45, wherein the halide is selected from lithium bromide, sodium bromide, potassium bromide, cesium bromide and combinations thereof.
實施方式47b. 如實施方式45所述之方法,其中該鹵鹽選自溴化鈉、溴化鉀及其組合。Embodiment 47b. The method of embodiment 45, wherein the halide salt is selected from the group consisting of sodium bromide, potassium bromide and combinations thereof.
實施方式47c. 如實施方式45所述之方法,其中該鹵鹽係溴化鈉或溴化鉀。Embodiment 47c. The method according to Embodiment 45, wherein the halide is sodium bromide or potassium bromide.
實施方式48. 如實施方式45所述之方法,其中該鹵鹽係溴化鈉。Embodiment 48. The method of embodiment 45, wherein the halide salt is sodium bromide.
實施方式49. 如實施方式45所述之方法,其中該鹵鹽係溴化鉀。Embodiment 49. The method of embodiment 45, wherein the halide salt is potassium bromide.
實施方式50. 如實施方式45所述之方法,其中該鹵鹽選自鹼土金屬溴化物及其組合。Embodiment 50. The method of embodiment 45, wherein the halide salt is selected from alkaline earth metal bromides and combinations thereof.
實施方式50a. 如實施方式45所述之方法,其中該鹵鹽選自溴化鎂、溴化鈣及其組合。Embodiment 50a. The method according to embodiment 45, wherein the halide is selected from magnesium bromide, calcium bromide and combinations thereof.
實施方式51. 如實施方式39所述之方法,其中該鹵鹽選自鹼金屬氯化物、鹼土金屬氯化物、氯化銨、季銨氯化物及其組合。Embodiment 51. The method of embodiment 39, wherein the halide salt is selected from the group consisting of alkali metal chlorides, alkaline earth metal chlorides, ammonium chloride, quaternary ammonium chlorides, and combinations thereof.
實施方式51a. 如實施方式51所述之方法,其中該鹵鹽選自鹼金屬氯化物、鹼土金屬氯化物及其組合。Embodiment 51a. The method as described in Embodiment 51, wherein the halide is selected from alkali metal chlorides, alkaline earth metal chlorides and combinations thereof.
實施方式51b. 如實施方式51所述之方法,其中該鹵鹽選自鹼金屬氯化物及其組合。Embodiment 51b. The method of embodiment 51, wherein the halide salt is selected from alkali metal chlorides and combinations thereof.
實施方式52. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸選自氫碘酸、氫溴酸、鹽酸、過氯酸、硫酸、硝酸、亞硫酸、磷酸、硼酸及其組合。 Embodiment 52. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound having Formula I as described in any of the preceding embodiments, wherein the inorganic acid is selected from hydroiodic acid, hydrobromic acid, hydrochloric acid, perchloric acid, sulfuric acid, nitric acid, sulfurous acid, phosphoric acid, boric acid, and combinations thereof.
實施方式53. 如實施方式1至51中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸不是氫碘酸、氫溴酸、鹽酸或氫氟酸。 Embodiment 53. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of Embodiments 1 to 51, wherein the inorganic acid is not hydroiodic acid, hydrobromic acid, hydrochloric acid or hydrofluoric acid.
實施方式53a. 如實施方式1至51中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸不是氫溴酸或鹽酸。 Embodiment 53a. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of Embodiments 1 to 51, wherein the inorganic acid is not hydrobromic acid or hydrochloric acid.
實施方式53b. 如實施方式1至51中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸不是鹽酸。 Embodiment 53b. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of Formula I as described in any one of Embodiments 1 to 51, wherein the inorganic acid is not hydrochloric acid.
實施方式53c. 如實施方式1至51中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸不是氫溴酸。 Embodiment 53c. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of Formula I as described in any one of Embodiments 1 to 51, wherein the inorganic acid is not hydrobromic acid.
實施方式54. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸選自過氯酸、硫酸、硝酸、亞硫酸、磷酸、硼酸及其組合。 Embodiment 54. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the inorganic acid is selected from the group consisting of Chloroic acid, sulfuric acid, nitric acid, sulfurous acid, phosphoric acid, boric acid and combinations thereof.
實施方式54a. 如實施方式54所述之方法,其中該無機酸選自過氯酸、硫酸、硝酸、草酸、亞硫酸及其組合。Embodiment 54a. The method of embodiment 54, wherein the inorganic acid is selected from the group consisting of perchloric acid, sulfuric acid, nitric acid, oxalic acid, sulfurous acid, and combinations thereof.
實施方式54b. 如實施方式54所述之方法,其中該無機酸係過氯酸、硫酸、硝酸、草酸或亞硫酸。Embodiment 54b. The method according to embodiment 54, wherein the inorganic acid is perchloric acid, sulfuric acid, nitric acid, oxalic acid or sulfurous acid.
實施方式54c. 如實施方式54所述之方法,其中該無機酸係硫酸或硝酸。Embodiment 54c. The method of embodiment 54, wherein the inorganic acid is sulfuric acid or nitric acid.
實施方式54d. 如實施方式54所述之方法,其中該無機酸係硫酸。Embodiment 54d. The method as described in Embodiment 54, wherein the inorganic acid is sulfuric acid.
實施方式55. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該溶劑選自腈、酯、醇、醯胺、酮、鹵代烷、醚、芳族烴、水;及其組合。 Embodiment 55. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound having Formula I as described in any one of the preceding embodiments, wherein the solvent is selected from nitriles, esters, alcohols, amides, ketones, halogenated alkanes, ethers, aromatic hydrocarbons, water; and combinations thereof.
實施方式55a. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該溶劑選自二氯甲烷、二氯乙烷、二溴甲烷、二溴乙烷、乙酸乙酯、乙腈、乙醇、甲醇、 N, N-二甲基甲醯胺、乳酸乙酯、水、丙腈、乙酸甲酯、乙酸丁酯、丙酮、甲基乙基酮(MEK)、甲基丁基酮、三氯甲烷;乙醚、甲基 三級丁基醚、苯、對二㗁𠮿、甲苯、氯苯、二氯苯及其組合。 Embodiment 55a. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the solvent is selected from dichloro Methane, dichloroethane, dibromomethane, dibromoethane, ethyl acetate, acetonitrile, ethanol, methanol, N , N -dimethylformamide, ethyl lactate, water, propionitrile, methyl acetate, acetic acid Butyl ester, acetone, methyl ethyl ketone (MEK), methyl butyl ketone, chloroform; diethyl ether, methyl tertiary butyl ether, benzene, p-dichlorobenzene, toluene, chlorobenzene, dichlorobenzene and its combination.
實施方式55b. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該溶劑選自二氯甲烷、二氯乙烷、二溴甲烷、二溴乙烷、乙酸乙酯、乙腈、乙醇、甲醇、 N, N-二甲基甲醯胺、乳酸乙酯、水及其組合。 Embodiment 55b. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the solvent is selected from dichloro Methane, dichloroethane, dibromomethane, dibromoethane, ethyl acetate, acetonitrile, ethanol, methanol, N , N -dimethylformamide, ethyl lactate, water, and combinations thereof.
實施方式55c. 如實施方式55所述之方法,其中該溶劑選自二氯甲烷、二氯乙烷、二溴甲烷、二溴乙烷、乙酸乙酯、乙腈、乳酸乙酯、水及其組合。Embodiment 55c. The method according to embodiment 55, wherein the solvent is selected from dichloromethane, dichloroethane, dibromomethane, dibromoethane, ethyl acetate, acetonitrile, ethyl lactate, water, and combinations thereof.
實施方式55d. 如實施方式55所述之方法,其中該溶劑係二氯甲烷、二氯乙烷、乙酸乙酯或乳酸乙酯。Embodiment 55d. The method of embodiment 55, wherein the solvent is dichloromethane, dichloroethane, ethyl acetate or ethyl lactate.
實施方式55e. 如實施方式55所述之方法,其中該溶劑係二氯甲烷、二氯乙烷或乙酸乙酯。Embodiment 55e. The method according to Embodiment 55, wherein the solvent is dichloromethane, dichloroethane or ethyl acetate.
實施方式55f. 如實施方式55所述之方法,其中該溶劑係乙酸乙酯或乳酸乙酯。Embodiment 55f. The method of embodiment 55, wherein the solvent is ethyl acetate or ethyl lactate.
實施方式55g. 如實施方式55所述之方法,其中該溶劑係乙酸乙酯。Embodiment 55g. The method of embodiment 55, wherein the solvent is ethyl acetate.
實施方式55h. 如實施方式55所述之方法,其中該溶劑係二氯甲烷。Embodiment 55h. The method as described in Embodiment 55, wherein the solvent is dichloromethane.
實施方式55i. 如實施方式55所述之方法,其中該溶劑係二氯乙烷。Embodiment 55i. The method as described in Embodiment 55, wherein the solvent is ethylene dichloride.
實施方式56. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該有機酸選自羧酸及其組合。 Embodiment 56. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the organic acid is selected from carboxylic acid Acids and their combinations.
實施方式56a. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該有機酸選自甲酸、乙酸、三氟乙酸、草酸、丙酸、乳酸、丁酸、富馬酸、蘋果酸、馬來酸、琥珀酸、酒石酸、山梨酸、檸檬酸、苯甲酸及其組合。 Embodiment 56a. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the organic acid is selected from formic acid , acetic acid, trifluoroacetic acid, oxalic acid, propionic acid, lactic acid, butyric acid, fumaric acid, malic acid, maleic acid, succinic acid, tartaric acid, sorbic acid, citric acid, benzoic acid and combinations thereof.
實施方式56b. 如實施方式56a所述之方法,其中該有機酸係甲酸、乙酸或三氟乙酸。Embodiment 56b. The method as described in Embodiment 56a, wherein the organic acid is formic acid, acetic acid or trifluoroacetic acid.
實施方式56c. 如實施方式56a所述之方法,其中該有機酸係甲酸或乙酸。Embodiment 56c. The method as described in Embodiment 56a, wherein the organic acid is formic acid or acetic acid.
實施方式56d. 如實施方式56a所述之方法,其中該有機酸係乙酸。Embodiment 56d. The method of embodiment 56a, wherein the organic acid is acetic acid.
實施方式M1. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該反應係在高於-10°C的溫度下進行的。 Embodiment M1. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the reaction is performed at a temperature higher than Performed at a temperature of -10°C.
實施方式M1a. 如實施方式M1所述之方法,其中該反應係在高於0°C的溫度下進行的。Embodiment M1a. The method of embodiment M1, wherein the reaction is carried out at a temperature higher than 0°C.
實施方式M2. 如實施方式M1所述之方法,其中該反應係在約0°C至約100°C的溫度下進行的。Embodiment M2. The method as described in Embodiment M1, wherein the reaction is carried out at a temperature of about 0°C to about 100°C.
實施方式M2a. 如實施方式M1所述之方法,其中該反應係在約0°C至約60°C的溫度下進行的。Embodiment M2a. The method of embodiment M1, wherein the reaction is performed at a temperature of about 0°C to about 60°C.
實施方式M3. 如實施方式M1所述之方法,其中該反應係在約10°C至約50°C的溫度下進行的。Embodiment M3. The method of embodiment M1, wherein the reaction is performed at a temperature of about 10°C to about 50°C.
實施方式M3a. 如實施方式M1所述之方法,其中該反應係在約10°C至約40°C的溫度下進行的。Embodiment M3a. The method of embodiment M1, wherein the reaction is performed at a temperature of about 10°C to about 40°C.
實施方式M4. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該鹵鹽與該具有式 II的化合物的莫耳比為至少0.1 : 1.0。 Embodiment M4. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the halide salt and the compound having The compounds of formula II have a molar ratio of at least 0.1 : 1.0.
實施方式M4a. 如實施方式M4所述之方法,其中該鹵鹽與該具有式 II的化合物的莫耳比為約0.2 : 1至約20 : 1。 Embodiment M4a. The method as described in Embodiment M4, wherein the molar ratio of the halide to the compound of Formula II is about 0.2:1 to about 20:1.
實施方式M4b. 如實施方式M4所述之方法,其中該鹵鹽與該具有式 II的化合物的莫耳比為約0.5 : 1至約10 : 1。 Embodiment M4b. The method of embodiment M4, wherein the molar ratio of the halide salt to the compound of formula II is from about 0.5:1 to about 10:1.
實施方式M4c. 如實施方式M4所述之方法,其中該鹵鹽與該具有式 II的化合物的莫耳比為約1 : 1至約6 : 1。 Embodiment M4c. The method of embodiment M4, wherein the molar ratio of the halide salt to the compound of formula II is from about 1:1 to about 6:1.
實施方式M4d. 如實施方式M4所述之方法,其中該鹵鹽與該具有式 II的化合物的莫耳比為約1 : 1至約5 : 1。 Embodiment M4d. The method as described in Embodiment M4, wherein the molar ratio of the halide to the compound of Formula II is about 1:1 to about 5:1.
實施方式M4e. 如實施方式M4所述之方法,其中該鹵鹽與該具有式 II的化合物的莫耳比為約1 : 1至約4 : 1。 Embodiment M4e. The method of embodiment M4, wherein the molar ratio of the halide salt to the compound of formula II is from about 1:1 to about 4:1.
實施方式M4f. 如實施方式M4所述之方法,其中該鹵鹽與該具有式 II的化合物的莫耳比為約4 : 1。 Embodiment M4f. The method as described in Embodiment M4, wherein the molar ratio of the halide to the compound of Formula II is about 4:1.
實施方式M5. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸與該具有式 II的化合物的莫耳比為至少0.1 : 1.0。 Embodiment M5. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the inorganic acid and the compound having The compounds of formula II have a molar ratio of at least 0.1 : 1.0.
實施方式M5a. 如實施方式M5所述之方法,其中該無機酸與該具有式 II的化合物的莫耳比為約0.1 : 1.0至約20.0 : 1.0。 Embodiment M5a. The method as described in Embodiment M5, wherein the molar ratio of the inorganic acid to the compound having Formula II is from about 0.1:1.0 to about 20.0:1.0.
實施方式M5b. 如實施方式M5所述之方法,其中該無機酸與該具有式 II的化合物的莫耳比為約0.5 : 1至約12 : 1。 Embodiment M5b. The method of embodiment M5, wherein the molar ratio of the inorganic acid to the compound of formula II is about 0.5:1 to about 12:1.
實施方式M5c. 如實施方式M5所述之方法,其中該無機酸與該具有式 II的化合物的莫耳比為約0.5 : 1至約6 : 1。 Embodiment M5c. The method of embodiment M5, wherein the molar ratio of the inorganic acid to the compound of formula II is about 0.5:1 to about 6:1.
實施方式M5d. 如實施方式M5所述之方法,其中該無機酸與該具有式 II的化合物的莫耳比為約1 : 1至約6 : 1。 Embodiment M5d. The method of embodiment M5, wherein the molar ratio of the inorganic acid to the compound of formula II is from about 1:1 to about 6:1.
實施方式M5e. 如實施方式M5所述之方法,其中該無機酸與該具有式 II的化合物的莫耳比為約2 : 1至約4 : 1。 Embodiment M5e. The method of embodiment M5, wherein the molar ratio of the inorganic acid to the compound of formula II is from about 2:1 to about 4:1.
實施方式M5f. 如實施方式M5所述之方法,其中該無機酸與該具有式 II的化合物的莫耳比為約3 : 1。 Embodiment M5f. The method of embodiment M5, wherein the molar ratio of the inorganic acid to the compound of formula II is about 3:1.
實施方式M6. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸與該鹵鹽與該具有式 II的化合物的莫耳比為約3 : 4 : 1。 Embodiment M6. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the inorganic acid and the halogen The molar ratio of salt to the compound of formula II is about 3:4:1.
實施方式M7. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該具有式 II的化合物與該溶劑的重量與體積比為約1 : 0.05至約1 : 500。 Embodiment M7. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any of the preceding embodiments, wherein the compound of formula II The weight to volume ratio with the solvent is about 1:0.05 to about 1:500.
實施方式M7a. 如實施方式M7所述之方法,其中該具有式 II的化合物與該溶劑的重量與體積比為約1 : 0.5至約1 : 50。 Embodiment M7a. The method as described in Embodiment M7, wherein the weight to volume ratio of the compound having Formula II to the solvent is about 1:0.5 to about 1:50.
實施方式M7b. 如實施方式M7所述之方法,其中該具有式 II的化合物與該溶劑的重量與體積比為約1 : 0.75至約1 : 25。 Embodiment M7b. The method of embodiment M7, wherein the weight and volume ratio of the compound of formula II to the solvent is from about 1:0.75 to about 1:25.
實施方式M7c. 如實施方式M7所述之方法,其中該具有式 II的化合物與該溶劑的重量與體積比為約1 : 1至約1 : 15。 Embodiment M7c. The method of embodiment M7, wherein the weight and volume ratio of the compound of formula II to the solvent is from about 1:1 to about 1:15.
實施方式M7d. 如實施方式M7所述之方法,其中該具有式 II的化合物與該溶劑的重量與體積比為約1 : 1至約1 : 10。 Embodiment M7d. The method of embodiment M7, wherein the weight and volume ratio of the compound of formula II to the solvent is from about 1:1 to about 1:10.
實施方式M7e. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該具有式 II的化合物與該溶劑的重量與體積比為約1 : 5。 Embodiment M7e. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any of the preceding embodiments, wherein the compound of formula II The weight to volume ratio with the solvent is approximately 1:5.
實施方式P1. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該鹵鹽的平均粒度小於1000 µm。 Embodiment P1. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any of the preceding embodiments, wherein the average particle size of the halide salt is less than 1000 μm.
實施方式P2. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約0.1 µm至約1000 µm。Embodiment P2. The method of embodiment P1, wherein the halide salt has an average particle size of about 0.1 µm to about 1000 µm.
實施方式P3. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約1.0 µm至約1000 µm。Embodiment P3. The method of embodiment P1, wherein the halide salt has an average particle size of about 1.0 µm to about 1000 µm.
實施方式P4. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度小於500 µm。Embodiment P4. The method as described in embodiment P1, wherein the average particle size of the halide salt is less than 500 μm.
實施方式P5. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約0.1 µm至約500 µm。Embodiment P5. The method according to embodiment P1, wherein the average particle size of the halide salt is about 0.1 µm to about 500 µm.
實施方式P6. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約1.0 µm至約500 µm。Embodiment P6. The method as described in Embodiment P1, wherein the average particle size of the halide is about 1.0 μm to about 500 μm.
實施方式P7. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約5.0 µm至約500 µm。Embodiment P7. The method of embodiment P1, wherein the halide salt has an average particle size of about 5.0 µm to about 500 µm.
實施方式P8. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約10.0 µm至約500 µm。Embodiment P8. The method as described in Embodiment P1, wherein the average particle size of the halide is about 10.0 μm to about 500 μm.
實施方式P9. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度小於389 µm。Embodiment P9. The method according to embodiment P1, wherein the average particle size of the halide salt is less than 389 μm.
實施方式P10. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約0.1 µm至約389 µm。Embodiment P10. The method of embodiment P1, wherein the halide salt has an average particle size of about 0.1 µm to about 389 µm.
實施方式P11. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約1.0 µm至約389 µm。Embodiment P11. The method as described in Embodiment P1, wherein the average particle size of the halide is about 1.0 μm to about 389 μm.
實施方式P12. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約5.0 µm至約389 µm。Embodiment P12. The method as described in Embodiment P1, wherein the average particle size of the halide is about 5.0 μm to about 389 μm.
實施方式P13. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約10.0 µm至約389 µm。Embodiment P13. The method as described in Embodiment P1, wherein the average particle size of the halide is about 10.0 μm to about 389 μm.
實施方式P14. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度小於300 µm。Implementation method P14. The method as described in Implementation method P1, wherein the average particle size of the halide is less than 300 µm.
實施方式P15. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約0.1 µm至約300 µm。Embodiment P15. The method of embodiment P1, wherein the halide salt has an average particle size of about 0.1 µm to about 300 µm.
實施方式P16. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約1.0 µm至約300 µm。Embodiment P16. The method of embodiment P1, wherein the halide salt has an average particle size of about 1.0 µm to about 300 µm.
實施方式P17. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約5.0 µm至約300 µm。Embodiment P17. The method of embodiment P1, wherein the halide salt has an average particle size of about 5.0 µm to about 300 µm.
實施方式P18. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約10.0 µm至約300 µm。Embodiment P18. The method of embodiment P1, wherein the halide salt has an average particle size of about 10.0 µm to about 300 µm.
實施方式P19. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度小於250 µm。Implementation method P19. The method as described in Implementation method P1, wherein the average particle size of the halide is less than 250 μm.
實施方式P20. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約0.1 µm至約250 µm。Embodiment P20. The method of embodiment P1, wherein the halide salt has an average particle size of about 0.1 µm to about 250 µm.
實施方式P21. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約1.0 µm至約250 µm。Embodiment P21. The method of embodiment P1, wherein the halide salt has an average particle size of about 1.0 µm to about 250 µm.
實施方式P22. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約5.0 µm至約250 µm。Embodiment P22. The method of embodiment P1, wherein the halide salt has an average particle size of about 5.0 µm to about 250 µm.
實施方式P23. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約10.0 µm至約250 µm。Embodiment P23. The method as described in Embodiment P1, wherein the average particle size of the halide is about 10.0 μm to about 250 μm.
實施方式P24. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約20.0 µm至約250 µm。Embodiment P24. The method of embodiment P1, wherein the halide salt has an average particle size of about 20.0 µm to about 250 µm.
實施方式P25. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度小於200 µm。Implementation method P25. The method as described in Implementation method P1, wherein the average particle size of the halide is less than 200 µm.
實施方式P26. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約0.1 µm至約200 µm。Embodiment P26. The method of embodiment P1, wherein the halide salt has an average particle size of about 0.1 µm to about 200 µm.
實施方式P27. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約1.0 µm至約200 µm。Embodiment P27. The method of embodiment P1, wherein the halide salt has an average particle size of about 1.0 µm to about 200 µm.
實施方式P28. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約5.0 µm至約200 µm。Embodiment P28. The method as described in Embodiment P1, wherein the average particle size of the halide is about 5.0 μm to about 200 μm.
實施方式P29. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約10.0 µm至約200 µm。Embodiment P29. The method of embodiment P1, wherein the halide salt has an average particle size of about 10.0 µm to about 200 µm.
實施方式P30. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約20.0 µm至約200 µm。Embodiment P30. The method according to embodiment P1, wherein the average particle size of the halide salt is about 20.0 µm to about 200 µm.
實施方式P31. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度小於150 µm。Implementation method P31. The method as described in Implementation method P1, wherein the average particle size of the halide is less than 150 µm.
實施方式P32. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約0.1 µm至約150 µm。Embodiment P32. The method of embodiment P1, wherein the halide salt has an average particle size of about 0.1 µm to about 150 µm.
實施方式P33. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約1.0 µm至約150 µm。Embodiment P33. The method as described in Embodiment P1, wherein the average particle size of the halide is about 1.0 μm to about 150 μm.
實施方式P34. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約5.0 µm至約150 µm。Embodiment P34. The method of embodiment P1, wherein the halide salt has an average particle size of about 5.0 µm to about 150 µm.
實施方式P35. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約10.0 µm至約150 µm。Embodiment P35. The method of embodiment P1, wherein the halide salt has an average particle size of about 10.0 µm to about 150 µm.
實施方式P36. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約20.0 µm至約150 µm。Embodiment P36. The method of embodiment P1, wherein the halide salt has an average particle size of about 20.0 µm to about 150 µm.
實施方式P37. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該鹵鹽的平均粒度小於100 µm。 Embodiment P37. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any of the preceding embodiments, wherein the average particle size of the halide salt is less than 100 μm.
實施方式P38. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約0.1 µm至約100 µm。Embodiment P38. The method of embodiment P1, wherein the halide salt has an average particle size of about 0.1 µm to about 100 µm.
實施方式P39. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約1.0 µm至約100 µm。Embodiment P39. The method of embodiment P1, wherein the halide salt has an average particle size of about 1.0 µm to about 100 µm.
實施方式P40. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約5.0 µm至約100 µm。Embodiment P40. The method of embodiment P1, wherein the halide salt has an average particle size of about 5.0 µm to about 100 µm.
實施方式P41. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約10.0 µm至約100 µm。Embodiment P41. The method of embodiment P1, wherein the halide salt has an average particle size of about 10.0 µm to about 100 µm.
實施方式P42. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約20.0 µm至約100 µm。Implementation method P42. The method as described in implementation method P1, wherein the average particle size of the halide is about 20.0 μm to about 100 μm.
實施方式P43. 如實施方式P1所述之方法,其中該鹵鹽的平均粒度為約30.0 µm至約100 µm。Embodiment P43. The method as described in Embodiment P1, wherein the average particle size of the halide is about 30.0 μm to about 100 μm.
實施方式P44. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該鹵鹽的平均粒度小於80 µm。 Embodiment P44. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the halide salt has an average particle size Less than 80 µm.
實施方式P45. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該鹵鹽的平均粒度為約30.0 µm至約80 µm。 Embodiment P45. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the halide salt has an average particle size is about 30.0 µm to about 80 µm.
實施方式P46. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該鹵鹽的平均粒度小於75 µm。 Embodiment P46. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the halide salt has an average particle size Less than 75 µm.
實施方式P47. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該鹵鹽的平均粒度為約35.0 µm至約75 µm。 Embodiment P47. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of Formula I as described in any one of the preceding embodiments, wherein the halide salt has an average particle size is about 35.0 µm to about 75 µm.
實施方式S1. 如前述實施方式中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸最後添加。 Embodiment S1. A method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of the preceding embodiments, wherein the inorganic acid is added last.
實施方式S2. 如實施方式1至P47中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸首先與該鹵鹽反應。 Embodiment S2. The method for preparing a 3-halogenated-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of Embodiments 1 to P47, wherein the inorganic acid is first reacted with the halide salt.
實施方式S3. 如實施方式1至P47中任一項所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中該無機酸首先與由該鹵鹽和該有機酸組成的混合物反應。 Embodiment S3. The method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of formula I as described in any one of embodiments 1 to P47, wherein the inorganic acid is first React with a mixture consisting of the halide salt and the organic acid.
實施方式X1. 如發明內容中所述之用於製備具有式 IV的化合物之方法,其中R 6A係F、Cl、Br、I、氰基、CH 3或CF 3。 Embodiment X1. A method for preparing a compound of formula IV as described in the Summary of the Invention, wherein R6A is F, Cl, Br, I, cyano, CH3 or CF3 .
實施方式X2. 如實施方式X1所述之方法,其中R 6A係F、Cl、Br或CH 3。 Embodiment X2. The method as described in Embodiment X1, wherein R 6A is F, Cl, Br or CH 3 .
實施方式X3. 如實施方式X1所述之方法,其中R 6A係Cl或CH 3。 Embodiment X3. The method of embodiment X1, wherein R 6A is Cl or CH 3 .
實施方式X4. 如實施方式X1所述之方法,其中R 6A係CH 3。 Embodiment X4. The method as described in Embodiment X1, wherein R 6A is CH 3 .
實施方式X5. 如實施方式X1至X4中任一項所述之方法,其中R 6B係氫、F、Cl或Br。 Embodiment X5. The method of any one of embodiments X1 to X4, wherein R 6B is hydrogen, F, Cl or Br.
實施方式X6. 如實施方式X5所述之方法,其中R 6B係氫、Cl或Br。 Embodiment X6. The method as described in Embodiment X5, wherein R 6B is hydrogen, Cl or Br.
實施方式X7. 如實施方式X5所述之方法,其中R 6B係氫或Cl。 Embodiment X7. The method as described in Embodiment X5, wherein R 6B is hydrogen or Cl.
實施方式X8. 如實施方式X5所述之方法,其中R 6B係氫。 Embodiment X8. The method according to Embodiment X5, wherein R 6B is hydrogen.
實施方式X9. 如實施方式X1至X8中任一項所述之方法,其中R 6C係F、Cl、Br、I、氰基、CH 3或CF 3。 Embodiment X9. The method of any one of embodiments X1 to X8, wherein R 6C is F, Cl, Br, I, cyano, CH 3 or CF 3 .
實施方式X10. 如實施方式X9所述之方法,其中R 6C係F、Cl、Br、I或氰基。 Embodiment X10. The method as described in Embodiment X9, wherein R 6C is F, Cl, Br, I or cyano.
實施方式X11. 如實施方式X9所述之方法,其中R 6C係Cl、Br、I或氰基。 Embodiment X11. The method of embodiment X9, wherein R 6C is Cl, Br, I or cyano.
實施方式X12. 如實施方式X9所述之方法,其中R 6C係Cl或氰基。 Embodiment X12. The method as described in Embodiment X9, wherein R 6C is Cl or cyano.
實施方式X13. 如實施方式X9所述之方法,其中R 6C係Cl。 Embodiment X13. The method of embodiment X9, wherein R 6C is Cl.
實施方式X14. 如實施方式X9所述之方法,其中R 6C係氰基。 Embodiment X14. The method as described in Embodiment X9, wherein R 6C is cyano.
實施方式X15. 如實施方式X1至X14中任一項所述之方法,其中R 6D係氫、F、Cl或Br。 Embodiment X15. The method according to any one of Embodiments X1 to X14, wherein R 6D is hydrogen, F, Cl or Br.
實施方式X16. 如實施方式X15所述之方法,其中R 6D係氫、Cl或Br。 Embodiment X16. The method according to Embodiment X15, wherein R 6D is hydrogen, Cl or Br.
實施方式X17. 如實施方式X15所述之方法,其中R 6D係氫或Cl。 Embodiment X17. The method according to Embodiment X15, wherein R 6D is hydrogen or Cl.
實施方式X18. 如實施方式X15所述之方法,其中R 6D係氫。 Embodiment X18. The method according to embodiment X15, wherein R 6D is hydrogen.
實施方式X19. 如實施方式X1至X18中任一項所述之方法,其中R 7係C 1-C 4烷基、C 3-C 6環烷基、C 4-C 8環烷基烷基或C 5-C 8烷基環烷基。 Embodiment X19. The method according to any one of embodiments X1 to X18, wherein R 7 is C 1 -C 4 alkyl, C 3 -C 6 cycloalkyl, C 4 -C 8 cycloalkylalkyl Or C 5 -C 8 alkylcycloalkyl.
實施方式X20. 如實施方式X19所述之方法,其中R 7係甲基、乙基、異丙基、環丙基、環丙基甲基或(1-甲基)環丙基。 Embodiment X20. The method as described in Embodiment X19, wherein R 7 is methyl, ethyl, isopropyl, cyclopropyl, cyclopropylmethyl or (1-methyl)cyclopropyl.
實施方式X21. 如實施方式X19所述之方法,其中R 7係甲基或乙基。 Embodiment X21. The method of embodiment X19, wherein R 7 is methyl or ethyl.
實施方式X22. 如實施方式X19所述之方法,其中R 7係甲基。 Embodiment X22. The method as described in Embodiment X19, wherein R 7 is methyl.
本揭露之實施方式(包括以上實施方式1-X22以及本文所述之任何其他實施方式)可以以任何方式組合,並且實施方式中的變數的描述不僅關於具有式 I、 III和 IV的化合物,而且還關於可用於製備具有式 I、 III和 IV的化合物的起始化合物和中間體化合物。此外,本揭露之實施方式(包括以上實施方式1-X22以及本文所述之任何其他實施方式)及其任何組合關於本揭露之方法。 The embodiments of the present disclosure (including the above embodiments 1-X22 and any other embodiments described herein) can be combined in any way, and the description of the variables in the embodiments is not only about compounds with formula I , III and IV , but also about starting compounds and intermediate compounds that can be used to prepare compounds with formula I , III and IV . In addition, the embodiments of the present disclosure (including the above embodiments 1-X22 and any other embodiments described herein) and any combination thereof are about the methods of the present disclosure.
實施方式1-X22的組合由以下示出:The combination of implementation mode 1-X22 is shown below:
實施方式A. 一種如發明內容中所述之用於製備具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物之方法,其中, m係2;並且 n係1。 Embodiment A. A method for preparing a 3-halo-4,5-dihydro- 1H -pyrazole compound of Formula I as described in the Summary of the Invention, wherein m is 2; and n is 1 .
實施方式A1. 如實施方式A所述之方法,其中, X 1係Cl或Br;並且 X 2係OS(O) mR 4、或除了X 1之外的鹵素。 Embodiment A1. The method of embodiment A, wherein X 1 is Cl or Br; and X 2 is OS(O) m R 4 , or a halogen other than X 1 .
實施方式A1A. 如實施方式A或實施方式A1所述之方法,其中, R 1係C(O)R 3、氰基、甲基或羥基甲基; X 1係Cl或Br; X 2係OS(O) mR 4、或除了X 1之外的鹵素;並且 該鹵鹽選自鹼金屬溴化物、鹼土金屬溴化物、溴化銨、季銨溴化物、鹼金屬氯化物、鹼土金屬氯化物、氯化銨、季銨氯化物及其組合。 Embodiment A1A. The method as described in Embodiment A or Embodiment A1, wherein R 1 is C(O)R 3 , cyano, methyl or hydroxymethyl; X 1 is Cl or Br; X 2 is OS (O) m R 4 , or a halogen other than , ammonium chloride, quaternary ammonium chloride and combinations thereof.
實施方式A1B. 如實施方式A或實施方式A1所述之方法,其中, R 1係C(O)R 3、氰基、甲基或羥基甲基; X 1係Cl或Br; X 2係OS(O) mR 4、或除了X 1之外的鹵素; k係0或1;並且 該鹵鹽選自鹼金屬溴化物、鹼土金屬溴化物、溴化銨、季銨溴化物、鹼金屬氯化物、鹼土金屬氯化物、氯化銨、季銨氯化物及其組合。 Embodiment A1B. The method as described in Embodiment A or Embodiment A1, wherein R 1 is C(O)R 3 , cyano, methyl or hydroxymethyl; X 1 is Cl or Br; X 2 is OS(O) m R 4 , or a halogen other than X 1 ; k is 0 or 1; and the halogen salt is selected from alkali metal bromides, alkali earth metal bromides, ammonium bromide, quaternary ammonium bromides, alkali metal chlorides, alkali earth metal chlorides, ammonium chloride, quaternary ammonium chlorides and combinations thereof.
實施方式A1C. 如實施方式A或實施方式A1所述之方法,其中, R 1係C(O)R 3、氰基、甲基或羥基甲基; X 1係Cl或Br; X 2係OS(O) mR 4、或除了X 1之外的鹵素; k係0或1; R 4係甲基或乙基;或視需要被1個選自甲基、乙基和鹵素的取代基取代的苯基;並且 該鹵鹽選自鹼金屬溴化物、鹼土金屬溴化物、溴化銨、季銨溴化物、鹼金屬氯化物、鹼土金屬氯化物、氯化銨、季銨氯化物及其組合。 Embodiment A1C. The method as described in Embodiment A or Embodiment A1, wherein R 1 is C(O)R 3 , cyano, methyl or hydroxymethyl; X 1 is Cl or Br; X 2 is OS (O) m R 4 , or halogen other than phenyl; and the halide salt is selected from alkali metal bromide, alkaline earth metal bromide, ammonium bromide, quaternary ammonium bromide, alkali metal chloride, alkaline earth metal chloride, ammonium chloride, quaternary ammonium chloride and combinations thereof .
實施方式A2. 如實施方式A至A1C中任一項所述之方法,其中, R 1係C(O)R 3; R 2係鹵素; Z係N; R 3係OH或C 1-C 4烷氧基; k係0;並且 R 4係甲基、乙基、苯基或4-甲基苯基。 Embodiment A2. The method according to any one of embodiments A to A1C, wherein R 1 is C(O)R 3 ; R 2 is halogen; Z is N; R 3 is OH or C 1 -C 4 alkoxy; k is 0; and R 4 is methyl, ethyl, phenyl or 4-methylphenyl.
實施方式A3. 如實施方式A至A2中任一項所述之方法,其中, R 2係Cl或Br;並且 R 3係OH、OCH 3或OCH 2CH 3。 Embodiment A3. The method of any one of embodiments A to A2, wherein R 2 is Cl or Br; and R 3 is OH, OCH 3 or OCH 2 CH 3 .
實施方式A3A. 如實施方式A至A3中任一項所述之方法,其中, R 2係Cl;並且 R 3係OH、OCH 3或OCH 2CH 3。 Embodiment A3A. The method of any one of embodiments A to A3, wherein R 2 is Cl; and R 3 is OH, OCH 3 or OCH 2 CH 3 .
實施方式A4. 如實施方式A至A3中任一項所述之方法,其中, R 2係Cl; X 1係Br; X 2係Cl或OS(O) mR 4;並且 該鹵鹽選自鹼金屬溴化物、鹼土金屬溴化物及其組合。 Embodiment A4. The method of any one of embodiments A to A3, wherein R 2 is Cl; X 1 is Br; X 2 is Cl or OS(O) m R 4 ; and the halide salt is selected from Alkali metal bromides, alkaline earth metal bromides and combinations thereof.
實施方式A4A. 如實施方式A至A4中任一項所述之方法,其中, R 2係Cl; X 1係Br; X 2係Cl或OS(O) mR 4;並且 該鹵鹽選自鹼金屬溴化物及其組合。 Embodiment A4A. The method of any one of Embodiments A to A4, wherein R 2 is Cl; X 1 is Br; X 2 is Cl or OS(O) m R 4 ; and the halide is selected from alkali metal bromides and combinations thereof.
實施方式A5. 如實施方式A至A4中任一項所述之方法,其中, R 1係C(O)R 3; X 1係Br; R 2係Cl; Z係N; R 3係OH、OCH 3或OCH 2CH 3; k係0; X 2係OS(O) mR 4、或Cl; m係1; R 4係甲基、乙基、苯基或4-甲基苯基;並且 該鹵鹽選自溴化鈉、溴化鉀及其組合。 Embodiment A5. The method according to any one of embodiments A to A4, wherein R 1 is C(O)R 3 ; X 1 is Br; R 2 is Cl; Z is N; R 3 is OH, OCH 3 or OCH 2 CH 3 ; k is 0; X 2 is OS(O) m R 4 , or Cl; m is 1; R 4 is methyl, ethyl, phenyl or 4-methylphenyl; and The halide salt is selected from sodium bromide, potassium bromide and combinations thereof.
實施方式A5A. 如實施方式A5所述之方法,其中, R 3係OCH 3或OCH 2CH 3;並且 X 2係OS(O) mR 4。 Embodiment A5A. The method according to Embodiment A5, wherein R 3 is OCH 3 or OCH 2 CH 3 ; and X 2 is OS(O) m R 4 .
實施方式A5B. 如實施方式A5或實施方式A5A所述之方法,其中, R 4係4-甲基苯基。 Embodiment A5B. The method as described in Embodiment A5 or Embodiment A5A, wherein R 4 is 4-methylphenyl.
實施方式A5C. 如實施方式A5至A5B中任一項所述之方法,其中, 該無機酸係過氯酸、硫酸、硝酸、草酸或亞硫酸;並且 該視需要的有機酸係甲酸或乙酸。 Implementation A5C. The method as described in any one of Implementations A5 to A5B, wherein, the inorganic acid is perchloric acid, sulfuric acid, nitric acid, oxalic acid or sulfurous acid; and the optional organic acid is formic acid or acetic acid.
實施方式A5D. 如實施方式A5至A5C中任一項所述之方法,其中, 該鹵鹽係溴化鈉或溴化鉀。 Embodiment A5D. The method of any one of embodiments A5 to A5C, wherein, The halide salt is sodium bromide or potassium bromide.
實施方式A6. 如實施方式A至A5中任一項所述之方法,其中, R 1係C(O)R 3; X 1係Br; R 2係Cl; Z係N; R 3係OCH 3或OCH 2CH 3; k係0; X 2係OS(O) mR 4; m係1; R 4係4-甲基苯基; 該鹵鹽係溴化鈉或溴化鉀; 該無機酸係硫酸;並且 該視需要的有機酸係甲酸或乙酸。 Embodiment A6. The method as described in any one of Embodiments A to A5, wherein R 1 is C(O)R 3 ; X 1 is Br; R 2 is Cl; Z is N; R 3 is OCH 3 or OCH 2 CH 3 ; k is 0; X 2 is OS(O) m R 4 ; m is 1; R 4 is 4-methylphenyl; the halogen salt is sodium bromide or potassium bromide; the inorganic acid is sulfuric acid; and the optional organic acid is formic acid or acetic acid.
實施方式A6A. 如實施方式A6所述之方法,其中, 該有機酸係乙酸。 Embodiment A6A. The method as described in embodiment A6, wherein, The organic acid is acetic acid.
實施方式A7. 如實施方式A至A6A中任一項所述之方法,其中, 該溶劑係二氯甲烷、二氯乙烷或乙酸乙酯。 Implementation A7. A method as described in any one of Implementations A to A6A, wherein the solvent is dichloromethane, dichloroethane or ethyl acetate.
實施方式A8. 如實施方式A至A6A中任一項所述之方法,其中, 該溶劑係乙酸乙酯。 Embodiment A8. The method according to any one of embodiments A to A6A, wherein, The solvent is ethyl acetate.
實施方式A9. 如實施方式A至A6A中任一項所述之方法,其中, 該溶劑係二氯甲烷。 Implementation A9. The method as described in any one of Implementation A to A6A, wherein the solvent is dichloromethane.
實施方式A10. 如實施方式A至A6A中任一項所述之方法,其中, 該溶劑係二氯乙烷。 Embodiment A10. The method according to any one of embodiments A to A6A, wherein, The solvent is dichloroethane.
實施方式B. 一種如發明內容中所述之用於製備具有式 III的化合物之方法,其中, R 1係C(O)R 3; X 1係Cl或Br; R 2係鹵素; Z係N; R 3係OH或C 1-C 4烷氧基; k係0; X 2係OS(O) mR 4、或除了X 1之外的鹵素; m係2; R 4係甲基、乙基、苯基或4-甲基苯基;並且 該鹵鹽選自鹼金屬溴化物、鹼土金屬溴化物、溴化銨、季銨溴化物、鹼金屬氯化物、鹼土金屬氯化物、氯化銨、季銨氯化物及其組合。 Embodiment B. A method for preparing a compound of formula III as described in the invention, wherein R 1 is C(O)R 3 ; X 1 is Cl or Br; R 2 is a halogen; Z is N; R 3 is OH or C 1 -C 4 alkoxy; k is 0; X 2 is OS(O) m R 4 , or a halogen other than X 1 ; m is 2; R 4 is methyl, ethyl, phenyl or 4-methylphenyl; and the halogen salt is selected from alkali metal bromides, alkali earth metal bromides, ammonium bromide, quaternary ammonium bromides, alkali metal chlorides, alkali earth metal chlorides, ammonium chlorides, quaternary ammonium chlorides and combinations thereof.
實施方式B1. 如實施方式B所述之方法,其中, X 1係Br; R 2係Cl; R 3係OH、OCH 3或OCH 2CH 3; X 2係Cl或OS(O) mR 4;並且 該鹵鹽選自鹼金屬溴化物及其組合。 Implementation B1. The method as described in Implementation B, wherein X1 is Br ; R2 is Cl; R3 is OH, OCH3 or OCH2CH3 ; X2 is Cl or OS(O) mR4 ; and the halide is selected from alkali metal bromides and combinations thereof .
實施方式B2. 如實施方式B或實施方式B1所述之方法,其中, R 1係C(O)R 3; X 1係Br; R 2係Cl; Z係N; R 3係OH、OCH 3或OCH 2CH 3; k係0; X 2係OS(O) mR 4、或Cl; m係1; R 4係甲基、乙基、苯基或4-甲基苯基;並且 該鹵鹽選自溴化鈉、溴化鉀及其組合。 Implementation method B2. The method as described in implementation method B or implementation method B1, wherein R 1 is C(O)R 3 ; X 1 is Br; R 2 is Cl; Z is N; R 3 is OH, OCH 3 or OCH 2 CH 3 ; k is 0; X 2 is OS(O) m R 4 , or Cl; m is 1; R 4 is methyl, ethyl, phenyl or 4-methylphenyl; and the halide is selected from sodium bromide, potassium bromide and a combination thereof.
實施方式B2A. 如實施方式B2所述之方法,其中, R 3係OCH 3或OCH 2CH 3;並且 X 2係OS(O) mR 4。 Embodiment B2A. The method of embodiment B2, wherein R 3 is OCH 3 or OCH 2 CH 3 ; and X 2 is OS(O) m R 4 .
實施方式B2B. 如實施方式B2或實施方式B2A所述之方法,其中, R 4係4-甲基苯基。 Embodiment B2B. The method as described in Embodiment B2 or Embodiment B2A, wherein R 4 is 4-methylphenyl.
實施方式B2C. 如實施方式B2至B2B中任一項所述之方法,其中, 該無機酸係過氯酸、硫酸、硝酸、草酸或亞硫酸;並且 該視需要的有機酸係甲酸或乙酸。 Embodiment B2C. The method as described in any one of Embodiments B2 to B2B, wherein, the inorganic acid is perchloric acid, sulfuric acid, nitric acid, oxalic acid or sulfurous acid; and the optional organic acid is formic acid or acetic acid.
實施方式B2D. 如實施方式B2至B2C中任一項所述之方法,其中, 該鹵鹽係溴化鈉或溴化鉀。 Embodiment B2D. The method according to any one of embodiments B2 to B2C, wherein, The halide salt is sodium bromide or potassium bromide.
實施方式B3. 如實施方式B至B2中任一項所述之方法,其中, R 1係C(O)R 3; X 1係Br; R 2係Cl; Z係N; R 3係OCH 3或OCH 2CH 3; k係0; X 2係OS(O) mR 4; m係1; R 4係4-甲基苯基; 該鹵鹽係溴化鈉或溴化鉀; 該無機酸係硫酸;並且 該視需要的有機酸係甲酸或乙酸。 Embodiment B3. The method as described in any one of Embodiments B to B2, wherein R 1 is C(O)R 3 ; X 1 is Br; R 2 is Cl; Z is N; R 3 is OCH 3 or OCH 2 CH 3 ; k is 0; X 2 is OS(O) m R 4 ; m is 1; R 4 is 4-methylphenyl; the halide is sodium bromide or potassium bromide; the inorganic acid is sulfuric acid; and the optional organic acid is formic acid or acetic acid.
實施方式B3A. 如實施方式B3所述之方法,其中, 該有機酸係乙酸。 Implementation method B3A. The method as described in Implementation method B3, wherein, the organic acid is acetic acid.
實施方式C. 一種如發明內容中所述之用於製備具有式 IV的化合物之方法,其中, R 6A係F、Cl、Br或CH 3; R 6B係氫、F、Cl或Br; R 6C係F、Cl、Br、I或氰基;並且 R 6D係氫、F、Cl或Br。 Embodiment C. A method for preparing a compound of formula IV as described in the Summary of the Invention, wherein R 6A is F, Cl, Br or CH 3 ; R 6B is hydrogen, F, Cl or Br; R 6C is F, Cl, Br, I, or cyano; and R 6D is hydrogen, F, Cl, or Br.
實施方式C1. 如實施方式C所述之方法,其中, R 1係C(O)R 3; X 1係Cl或Br; R 2係鹵素; Z係N; R 3係OH或C 1-C 4烷氧基; k係0; X 2係OS(O) mR 4、或除了X 1之外的鹵素; m係2; R 4係甲基、乙基、苯基或4-甲基苯基; 該鹵鹽選自鹼金屬溴化物、鹼土金屬溴化物、溴化銨、季銨溴化物、鹼金屬氯化物、鹼土金屬氯化物、氯化銨、季銨氯化物及其組合;並且 R 7係甲基、乙基、異丙基、環丙基、環丙基甲基或(1-甲基)環丙基。 Embodiment C1. The method as described in Embodiment C, wherein R 1 is C(O)R 3 ; X 1 is Cl or Br; R 2 is a halogen; Z is N; R 3 is OH or C 1 -C 4 alkoxy; k is 0; X 2 is OS(O) m R 4 , or a halogen other than X 1 ; m is 2; R 4 is methyl, ethyl, phenyl or 4-methylphenyl; the halogen salt is selected from alkali metal bromides, alkali earth metal bromides, ammonium bromide, quaternary ammonium bromides, alkali metal chlorides, alkali earth metal chlorides, ammonium chlorides, quaternary ammonium chlorides and combinations thereof; and R 7 is methyl, ethyl, isopropyl, cyclopropyl, cyclopropylmethyl or (1-methyl)cyclopropyl.
實施方式C2. 如實施方式C至CA1中任一項所述之方法,其中, X 1係Br; R 2係Cl; R 3係OH、OCH 3或OCH 2CH 3; X 2係Cl或OS(O) mR 4;並且 該鹵鹽選自鹼金屬溴化物及其組合。 Embodiment C2. The method according to any one of embodiments C to CA1, wherein X 1 is Br; R 2 is Cl; R 3 is OH, OCH 3 or OCH 2 CH 3 ; X 2 is Cl or OS (O) m R 4 ; and the halide salt is selected from alkali metal bromides and combinations thereof.
實施方式C2A. 如實施方式C1或C2所述之方法,其中, R 6B係氫或Cl;並且 R 6D係氫或Cl。 Embodiment C2A. The method according to Embodiment C1 or C2, wherein R 6B is hydrogen or Cl; and R 6D is hydrogen or Cl.
實施方式C3. 如實施方式C至C2中任一項所述之方法,其中, R 1係C(O)R 3; X 1係Br; R 2係Cl; Z係N; R 3係OH、OCH 3或OCH 2CH 3; k係0; X 2係OS(O) mR 4、或Cl; m係1; R 4係甲基、乙基、苯基或4-甲基苯基;並且 該鹵鹽選自溴化鈉、溴化鉀及其組合。 Embodiment C3. The method according to any one of embodiments C to C2, wherein R 1 is C(O)R 3 ; X 1 is Br; R 2 is Cl; Z is N; R 3 is OH, OCH 3 or OCH 2 CH 3 ; k is 0; X 2 is OS(O) m R 4 , or Cl; m is 1; R 4 is methyl, ethyl, phenyl or 4-methylphenyl; and The halide salt is selected from sodium bromide, potassium bromide and combinations thereof.
實施方式C3A. 如實施方式C3所述之方法,其中, R 3係OCH 3或OCH 2CH 3;並且 X 2係OS(O) mR 4。 Embodiment C3A. The method according to embodiment C3, wherein R 3 is OCH 3 or OCH 2 CH 3 ; and X 2 is OS(O) m R 4 .
實施方式C3B. 如實施方式C3或實施方式C3A所述之方法,其中, R 4係4-甲基苯基。 Embodiment C3B. The method as described in Embodiment C3 or Embodiment C3A, wherein R 4 is 4-methylphenyl.
實施方式C3C. 如實施方式C3至C3B中任一項所述之方法,其中, 該無機酸係過氯酸、硫酸、硝酸、草酸或亞硫酸;並且 該視需要的有機酸係甲酸或乙酸。 Implementation C3C. The method as described in any one of Implementations C3 to C3B, wherein, the inorganic acid is perchloric acid, sulfuric acid, nitric acid, oxalic acid or sulfurous acid; and the optional organic acid is formic acid or acetic acid.
實施方式C3D. 如實施方式C3至C3C中任一項所述之方法,其中, 該鹵鹽係溴化鈉或溴化鉀。 Embodiment C3D. The method of any one of embodiments C3 to C3C, wherein, The halide salt is sodium bromide or potassium bromide.
實施方式C3E. 如實施方式C3至C3D中任一項所述之方法,其中, R 6A係Cl或CH 3; R 6B係氫或Cl; R 6C係Cl、Br、I或氰基;並且 R 6D係氫或Cl。 Embodiment C3E. The method of any one of embodiments C3 to C3D, wherein R 6A is Cl or CH 3 ; R 6B is hydrogen or Cl; R 6C is Cl, Br, I or cyano; and R 6D is hydrogen or Cl.
實施方式C4. 如實施方式C至C3中任一項所述之方法,其中, R 1係C(O)R 3; X 1係Br; R 2係Cl; Z係N; R 3係OCH 3或OCH 2CH 3; k係0; X 2係OS(O) mR 4; m係1; R 4係4-甲基苯基; 該鹵鹽係溴化鈉或溴化鉀; 該無機酸係硫酸;並且 該視需要的有機酸係甲酸或乙酸。 Embodiment C4. The method according to any one of embodiments C to C3, wherein R 1 is C(O)R 3 ; X 1 is Br; R 2 is Cl; Z is N; R 3 is OCH 3 Or OCH 2 CH 3 ; k is 0 ; is sulfuric acid; and the optional organic acid is formic acid or acetic acid.
實施方式C4A. 如實施方式C4所述之方法,其中, R 6A係CH 3; R 6B係氫; R 6C係Cl或氰基;並且 R 6D係氫。 Embodiment C4A. The method of Embodiment C4, wherein R 6A is CH 3 ; R 6B is hydrogen; R 6C is Cl or cyano; and R 6D is hydrogen.
實施方式C4B. 如實施方式C4或實施方式C4A所述之方法,其中, 該有機酸係乙酸。 Embodiment C4B. The method as described in embodiment C4 or embodiment C4A, wherein, The organic acid is acetic acid.
具有式 I的化合物可以藉由以下如在方案1中描述之方法和變體中的一種或多種來製備。除非另有說明,否則具有式 I- IV的化合物中的取代基的定義如上文發明內容中所定義。具有式 Ia的化合物係具有式 I的化合物的子集。具有式 IIa的化合物係具有式 II的化合物的子集。除非另有說明,否則每個子集式的取代基如其母體式所定義。環境溫度或室溫定義為約20°C-25°C。 Compounds of formula I can be prepared by one or more of the following methods and variants as described in Scheme 1. Unless otherwise stated, the substituents in compounds of formula I - IV are defined as above in the context of the invention. Compounds of formula Ia are a subset of compounds of formula I. Compounds of formula IIa are a subset of compounds of formula II . Unless otherwise stated, the substituents of each subset formula are defined as the parent formula. Ambient temperature or room temperature is defined as about 20°C-25°C.
如方案1中所示,根據本揭露之方法,使具有式 II的4,5-二氫-1 H-吡唑與鹵鹽和無機酸接觸以形成不同的具有式 I的3-鹵代-4,5-二氫-1 H-吡唑化合物,其中該鹵鹽的鹵素係X 1。除非另外指明,否則X 1、X 2、R 1、R 2、Z、R x和k的定義如發明內容和實施方式的描述中所定義。 方案1 As shown in Scheme 1, according to the method of the present disclosure, 4,5-dihydro- 1H -pyrazoles of Formula II are contacted with halide salts and inorganic acids to form different 3-halo-1H-pyrazoles of Formula I. 4,5-dihydro- 1H -pyrazole compound, wherein the halogen of the halide salt is X 1 . Unless otherwise specified , X 1 , plan 1
反應典型地在合適的溶劑中進行,然而,在一些情況下,除了具有式 II的化合物、鹵鹽、無機酸和視需要的有機酸之外,該反應可以在沒有溶劑的情況下進行。為了獲得最佳的結果,該溶劑應當係非親核的,對試劑相對惰性,並且能夠溶解具有式 II的化合物。可以使用多種溶劑以形成用於該方法的合適的溶劑。在合適的溶劑中,具有式 II的化合物較佳的是完全或至少基本上(例如,至少約10%)可溶於所用的溶劑的體積中。用於該方法的合適的溶劑的實例包括腈,如乙腈和丙腈;酯,如乙酸甲酯、乙酸乙酯、乳酸乙酯和乙酸丁酯;醇,如乙醇和甲醇;醯胺,如 N, N-二甲基甲醯胺;鹵代烷,如二氯甲烷、二氯乙烷、二溴甲烷、二溴乙烷和三氯甲烷;醚,如四氫呋喃(THF);水;及前述項的混合物。應注意的溶劑包括二氯甲烷、二氯乙烷、二溴甲烷、二溴乙烷和乙酸乙酯。在方案1之方法中的使用的溶劑的總體積相對於具有式 II的化合物的重量較佳的是在約1 mL/g與約10 mL/g之間。 The reaction is typically carried out in a suitable solvent, however, in some cases, except for the compound of formula II , the halide, the inorganic acid and, if necessary, the organic acid, the reaction can be carried out in the absence of a solvent. In order to obtain the best results, the solvent should be non-nucleophilic, relatively inert to the reagents, and capable of dissolving the compound of formula II . A variety of solvents can be used to form a suitable solvent for the method. In a suitable solvent, the compound of formula II is preferably completely or at least substantially (e.g., at least about 10%) soluble in the volume of the solvent used. Examples of suitable solvents for use in the process include nitriles such as acetonitrile and propionitrile; esters such as methyl acetate, ethyl acetate, ethyl lactate and butyl acetate; alcohols such as ethanol and methanol; amides such as N , N -dimethylformamide; halides such as dichloromethane, dichloroethane, dibromomethane, dibromoethane and trichloromethane; ethers such as tetrahydrofuran (THF); water; and mixtures of the foregoing. Solvents of note include dichloromethane, dichloroethane, dibromomethane, dibromoethane and ethyl acetate. The total volume of solvent used in the process of Scheme 1 is preferably between about 1 mL/g and about 10 mL/g relative to the weight of the compound of Formula II .
在反應過程期間可以將溶劑以各種方式和時間添加,如在反應序列開始時以一批次添加,在反應序列期間分批添加,或在添加一種或多種試劑的過程期間間歇添加。例如,可以將一種或多種試劑分散、溶解或部分溶解在合適的溶劑中,並且然後添加到反應混合物中,該反應混合物包含一種或多種試劑和合適的溶劑。無論添加的順序如何,在反應過程期間添加的試劑的總量係如本文以及實施方式中所描述的。The solvent may be added in various ways and times during the reaction process, such as in one batch at the beginning of the reaction sequence, in batches during the reaction sequence, or intermittently during the addition of one or more reagents. For example, one or more reagents can be dispersed, dissolved or partially dissolved in a suitable solvent and then added to a reaction mixture containing the one or more reagents and a suitable solvent. Regardless of the order of addition, the total amount of reagents added during the course of the reaction is as described herein and in the Examples.
在一個實施方式中,添加順序包括首先形成鹵鹽和視需要的有機酸的漿料,然後將無機酸添加到該漿料中,並且然後將在合適的溶劑中的具有式 II的化合物添加到包含鹵鹽、無機酸和視需要的有機酸的混合物中。這種添加順序在實例1-5中示出。 In one embodiment, the order of addition includes first forming a slurry of the halide and optionally an organic acid, then adding the inorganic acid to the slurry, and then adding the compound of Formula II in a suitable solvent to the mixture comprising the halide, the inorganic acid, and optionally an organic acid. This order of addition is shown in Examples 1-5.
在另一個實施方式中,添加順序包括首先形成具有式 II的化合物在合適的溶劑中的混合物,視需要添加有機酸,然後添加鹵鹽,隨後添加無機酸。這種添加順序在實例6-18中示出。 In another embodiment, the sequence of addition involves first forming a mixture of the compound of formula II in a suitable solvent, optionally adding the organic acid, then the halide salt, and subsequently the inorganic acid. This order of addition is shown in Example 6-18.
該反應典型地在約10°C與50°C之間、最方便地在約10°C與40°C之間、並且最較佳的是在接近環境溫度(例如,約20°C-25°C)下進行。反應時間典型地小於72 h。The reaction is typically between about 10°C and 50°C, most conveniently between about 10°C and 40°C, and most preferably at near ambient temperature (e.g., about 20°C-25 °C). Reaction times are typically less than 72 h.
在方案1之方法中,鹵鹽典型地是鹼金屬鹵化物或鹼土金屬鹵化物、較佳的是鹼金屬鹵化物、更較佳的是鉀鹵化物或鈉鹵化物、並且最較佳的是溴化鉀或溴化鈉。當由鹵鹽提供的鹵化物陰離子變為式 I的X 1時,反應的化學計量需要相對於具有式 II的化合物的莫耳數總和至少一莫耳當量的鹵化物陰離子。典型地,鹵鹽相對於具有式 II的化合物的莫耳比為約1 : 1至約6 : 1。儘管可以使用更高水平的鹵鹽,但這樣做沒有特別的優點,並且更高水平會增加原料以及廢物處理成本。通常用溴化鈉相對於具有式 II的化合物的莫耳比為約4 : 1來實現最高產物產率。 In the method of Option 1, the halide salt is typically an alkali metal halide or an alkaline earth metal halide, preferably an alkali metal halide, more preferably a potassium halide or a sodium halide, and most preferably Potassium bromide or sodium bromide. When the halide anion provided by the halide salt becomes X1 of formula I , the stoichiometry of the reaction requires at least one molar equivalent of the halide anion relative to the sum of the moles of the compounds of formula II . Typically, the molar ratio of the halide salt relative to the compound of Formula II is from about 1:1 to about 6:1. Although higher levels of brine salts can be used, there is no particular advantage to doing so and higher levels increase feedstock and waste disposal costs. The highest product yields are typically achieved with a molar ratio of sodium bromide to compound of formula II of about 4:1.
熟悉該項技術者將理解,增加固體試劑表面積可以展現出有益的效果(例如,增加的反應性、提高的產率、減少的反應時間和減少的試劑莫耳比)。在一個實施方式中,可以減小鹵鹽粒度以提高具有式 I的化合物的產率。典型地,用小於100 µm的平均鹵鹽粒度(即,Dv(50)值)來實現更高的產物產率。 Those skilled in the art will understand that increasing solid reagent surface area can exhibit beneficial effects (eg, increased reactivity, increased yield, decreased reaction time, and decreased reagent molar ratio). In one embodiment, the halide salt particle size can be reduced to increase the yield of compounds of Formula I. Typically, higher product yields are achieved with average halide salt particle sizes (i.e., Dv(50) values) of less than 100 µm.
典型地,無機酸相對於具有式 II的化合物的莫耳比為約0.5 : 1至約12 : 1。儘管可以使用其他水平的無機酸,但這樣做沒有特別的優點。通常用硫酸相對於具有式 II的化合物的莫耳比為約3 : 1來實現最高產物產率。 Typically, the molar ratio of the mineral acid to the compound of Formula II is about 0.5: 1 to about 12: 1. Although other levels of the mineral acid may be used, there is no particular advantage in doing so. The highest product yields are generally achieved with a molar ratio of sulfuric acid to the compound of Formula II of about 3: 1.
在該方法中添加視需要的有機酸也可以影響本發明方法的最佳比率。例如,與不添加乙酸的情況相比,在添加乙酸的情況下,典型地在鹵鹽和無機酸相對於具有式 II的化合物的比率較低的情況下,獲得提供最高產率的具有式 I的化合物的最有利的反應速率(即,在存在乙酸的情況下,鹵鹽和無機酸兩者相對於具有式 II的化合物的比率均較佳的是約2 : 1)。 The addition of an optional organic acid to the process can also affect the optimal ratio of the process of the present invention. For example, the most favorable reaction rate that provides the highest yield of the compound of Formula I is typically obtained at a lower ratio of the halide and the inorganic acid relative to the compound of Formula II when acetic acid is added compared to when acetic acid is not added (i.e., in the presence of acetic acid, the ratio of both the halide and the inorganic acid relative to the compound of Formula II is preferably about 2:1).
可以藉由本領域已知的標準技術(包括pH調節、萃取、蒸發、結晶以及層析法)分離具有式 I的產物。例如,反應介質可以用相對於具有式 II的起始化合物約10至75重量份的水稀釋,可以視需要用酸或鹼調節pH以優化酸或鹼雜質的去除,可以視需要分離水相,並且可以藉由在減壓下蒸餾或蒸發去除大部分溶劑。典型地,藉由使用飽和碳酸氫鈉水溶液或10%氫氧化鈉水溶液去除本揭露之反應中的酸雜質。 The product of Formula I can be isolated by standard techniques known in the art, including pH adjustment, extraction, evaporation, crystallization, and chromatography. For example, the reaction medium can be diluted with about 10 to 75 parts by weight of water relative to the starting compound of formula II , the pH can be adjusted with acid or base as necessary to optimize the removal of acid or base impurities, the aqueous phase can be separated as needed, And most of the solvent can be removed by distillation or evaporation under reduced pressure. Typically, acid impurities in the reactions of the present disclosure are removed by using saturated aqueous sodium bicarbonate solution or 10% aqueous sodium hydroxide solution.
儘管可以藉由此類方法如在減壓下蒸發或蒸餾溶劑從具有式 I的化合物中去除溶劑,但是典型地濃縮和提純式 I化合物係不必要的。用於製備具有式 I的化合物的溶劑通常與本發明製備具有式 III的化合物之方法相容,並且因此本發明之方法從具有式 I的化合物的組成物開始效果良好,其中式 I化合物的濃度小於100%。因此,可用於本發明製備具有式 III的化合物之方法的式 I化合物的組成物典型地還包含溶劑,特別是用於製備式 I化合物的溶劑。典型的溶劑包括二氯甲烷、二氯乙烷或乙酸乙酯。典型地,該組成物包含按重量計約20%至99%的式 I化合物。 Although the solvent can be removed from compounds of Formula I by such methods as evaporation or distillation of the solvent under reduced pressure, concentrating and purifying the compounds of Formula I is typically not necessary. The solvents used for the preparation of compounds of formula I are generally compatible with the method of the invention for the preparation of compounds of formula III , and the method of the invention therefore works well starting from a composition of a compound of formula I , in which the concentration of the compound of formula I Less than 100%. Thus, compositions of compounds of formula I which can be used in the process of the present invention for the preparation of compounds of formula III typically further comprise a solvent, in particular a solvent used for the preparation of compounds of formula I. Typical solvents include dichloromethane, dichloroethane or ethyl acetate. Typically, the composition contains from about 20% to 99% by weight of a compound of formula I.
具有式 II的4,5-二氫-1 H-吡唑可以藉由本領域已知的多種方法製備,參見例如,WO 2004/011453 A2,以及其中引用的參考文獻。 4,5-dihydro- 1H -pyrazoles of formula II can be prepared by a variety of methods known in the art, see, for example, WO 2004/011453 A2, and the references cited therein.
根據反應條件和分離方式,具有式 Ia的化合物上的酯官能基(其中R 3係C 1-C 4烷氧基)可以水解為羧酸,其中R 3係OH。例如,反應混合物中水的存在可以促進此水解。如果形成了羧酸,可以使用本領域熟知的酯化方法將其轉化回酯(即,-C(=O)R 3,其中R 3係C 1-C 4烷氧基)。可以藉由熟悉該項技術者已知之方法分離期望的產物(具有式 1a的化合物),如結晶、萃取或蒸餾。 Depending on the reaction conditions and the mode of separation, the ester functional group on the compound having Formula Ia (wherein R3 is C1 - C4 alkoxy) can be hydrolyzed to a carboxylic acid, where R3 is OH. For example, the presence of water in the reaction mixture can promote this hydrolysis. If a carboxylic acid is formed, it can be converted back to an ester (i.e., -C(=O) R3 , where R3 is C1 - C4 alkoxy) using esterification methods well known in the art. The desired product (compound having Formula Ia ) can be isolated by methods known to those skilled in the art, such as crystallization, extraction or distillation.
應認識到,上述對於製備具有式 I、 III和 IV的化合物所描述的一些試劑和反應條件可能不與中間體中存在的某些官能基相容。在該等情況下,將保護/去保護序列或官能基相互轉化結合到合成中將有助於獲得所期望的產物。保護基團的使用和選擇對於化學合成領域的技術人員來說將是顯而易見的(參見,例如Greene, T. W.;Wuts, P. G. M. Protective Groups in Organic Synthesis [ 有機合成中的保護基團 ], 第2版;威利出版社: 紐約, 1991)。熟悉該項技術者將認識到,在一些情況下,在引入各個方案中描繪的試劑後,可能需要未詳細描述的附加常規合成步驟來完成具有式 I、 III和 IV的化合物的合成。 It will be appreciated that some of the reagents and reaction conditions described above for preparing compounds of formula I , III and IV may not be compatible with certain functional groups present in the intermediates. In such cases, incorporating protection/deprotection sequences or functional group interconversions into the synthesis will aid in obtaining the desired product. The use and selection of protecting groups will be readily apparent to those skilled in the art of chemical synthesis (see, e.g., Greene, TW; Wuts, PGM Protective Groups in Organic Synthesis , 2nd ed.; Wiley: New York, 1991). Those skilled in the art will recognize that, in some cases, additional conventional synthetic steps not described in detail may be required to complete the synthesis of compounds of formula I , III and IV after the reagents described in the various schemes are introduced.
熟悉該項技術者還將認識到,本文所述之具有式 I、 II、 III和 IV的化合物可經受各種親電反應、親核反應、自由基反應、有機金屬反應、氧化反應和還原反應以添加取代基或修飾現有的取代基。例如,具有式 I的化合物可以含有氰基,該氰基可以經由水解條件轉化為羧酸。同樣地,醇、醛和烷基可以被氧化以提供具有式 Ia的羧酸化合物,其中R 3係OH。該等類型的反應在文獻中有詳細記載;參見,例如,March和Smith, March’s Advanced Organic Chemistry [March 高等有機化學 ], 第5版, John Wiley & Sons, Inc. [約翰威利父子公司], 紐約, 2001,以及其中引用的參考文獻。 Those skilled in the art will also recognize that the compounds of formulas I , II , III and IV described herein can undergo various electrophilic, nucleophilic, free radical, organometallic, oxidation and reduction reactions to add Substituents or modification of existing substituents. For example, compounds of formula I may contain a cyano group, which may be converted to a carboxylic acid via hydrolysis conditions. Likewise, alcohols, aldehydes and alkyl groups can be oxidized to provide carboxylic acid compounds of formula Ia , wherein R3 is OH. Reactions of this type are well documented in the literature; see, for example, March and Smith, March's Advanced Organic Chemistry , 5th ed., John Wiley & Sons, Inc., New York, 2001, and references cited therein.
無需進一步詳盡說明,據信熟悉該項技術者使用前述說明可將本揭露利用至其最大程度。因此,以下實例應被解釋為僅是說明性的,並且不以任何方式限制本揭露。以下實例中的步驟示出了在整體合成轉化中每個步驟的程序,並且用於每個步驟的起始材料並不一定由其程序描述於其他實例或步驟中的具體製備試驗來製備。環境溫度或室溫被定義為約20°C-25°C。除非另外指明,否則百分比按重量計。本文引用的所有專利和出版物都藉由援引以其全文完全併入。 1H NMR譜以四甲基矽烷的低場處的ppm報告;「s」意指單峰,「d」意指雙重峰,「t」意指三重峰,「q」意指四重峰,「m」意指多重峰,並且「dd」意指兩個雙重峰。 Without further elaboration, it is believed that one skilled in the art can utilize the present disclosure to its maximum extent using the foregoing description. Therefore, the following examples should be interpreted as being illustrative only and not limiting the present disclosure in any way. The steps in the following examples illustrate the procedures for each step in the overall synthetic transformation, and the starting materials used for each step are not necessarily prepared by specific preparative experiments whose procedures are described in other examples or steps. Ambient temperature or room temperature is defined as about 20°C-25°C. Unless otherwise indicated, percentages are by weight. All patents and publications cited herein are fully incorporated by reference in their entirety. 1 H NMR spectra are reported in ppm downfield from tetramethylsilane; "s" means singlet, "d" means doublet, "t" means triplet, "q" means quartet, "m" means multiplet, and "dd" means two doublets.
如在實例9至18中可以觀察到的,隨著對比實例中的鹵鹽粒度減少,具有式
I的化合物的產率有所提高。使用Malvern Mastersizer MS3000確定Dv50、Dv10和Dv90的粒度分佈數據。在實例9至18中使用的鹵鹽樣品的Dv50粒度分佈數據在表A中示出,使用Retsch MM400混磨機碾磨樣品。縮寫「rpm.」代表轉/分鐘。Dv50值指示其中50%的樣品含有該尺寸或更小的顆粒的粒度。Dv10值指示其中10%的樣品含有該尺寸或更小的顆粒的粒度。Dv90值指示其中90%的樣品含有該尺寸或更小的顆粒的粒度。
[表A]
在15 min的時間段內,向溴化鈉(1.51 g,14.64 mmol)在乙酸(30.5 mL)中的漿料中添加硫酸(1.43 g,14.64 mmol)。將反應混合物在環境溫度下攪拌30 min。將在二氯甲烷(25 mL)中的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)添加到反應混合物中,並且在環境中攪拌24 h。在15°C下,向所得混合物中添加氫氧化鈉(10%水溶液,222.53 g,556.32 mmol)。將有機層分離並在真空下濃縮以得到呈棕色油狀物的標題化合物(2.21 g,91%產率)。 To a slurry of sodium bromide (1.51 g, 14.64 mmol) in acetic acid (30.5 mL) was added sulfuric acid (1.43 g, 14.64 mmol) over a period of 15 min. The reaction mixture was stirred at ambient temperature for 30 min. Ethyl 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy] -1H -pyrazole-5-carboxylate (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in dichloromethane (25 mL) was added to the reaction mixture and stirred at ambient for 24 h. Sodium hydroxide (10% aqueous solution, 222.53 g, 556.32 mmol) was added to the resulting mixture at 15°C. The organic layer was separated and concentrated under vacuum to give the title compound as a brown oil (2.21 g, 91% yield).
1H NMR (CDCl 3, 400 MHz,) δ 8.07 (dd, J= 4.8, 1.5 Hz, 1H), 7.65 (dd, J= 7.9, 1.5 Hz, 1H), 6.86 (dd, J= 7.9, 4.8 Hz, 1H), 5.25 (dd, J= 11.9, 9.1 Hz, 1H), 4.19 (q, J= 7.1 Hz, 2H), 3.43 (dd, J= 17.4, 11.9 Hz, 1H), 3.23 (dd, J= 17.4, 9.1 Hz, 1H), 1.19 (t, J= 7.1 Hz, 3H)。 實例2 在ClCH 2CH 2Cl中製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 1 H NMR (CDCl 3 , 400 MHz,) δ 8.07 (dd, J = 4.8, 1.5 Hz, 1H), 7.65 (dd, J = 7.9, 1.5 Hz, 1H), 6.86 (dd, J = 7.9, 4.8 Hz , 1H), 5.25 (dd, J = 11.9, 9.1 Hz, 1H), 4.19 (q, J = 7.1 Hz, 2H), 3.43 (dd, J = 17.4, 11.9 Hz, 1H), 3.23 (dd, J = 17.4, 9.1 Hz, 1H), 1.19 (t, J = 7.1 Hz, 3H). Example 2 Preparation of ethyl 3-bromo-1-(3-chloro-2-pyridyl)-4,5-dihydro- 1H -pyrazole-5 - carboxylate in ClCH2CH2Cl
在15 min的時間段內,向溴化鈉(1.51 g,14.64 mmol)在乙酸(30.5 mL)中的漿料中添加硫酸(1.43 g,14.64 mmol)。將反應混合物在環境溫度下攪拌30 min。將在二氯乙烷(25 mL)中的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)添加到反應混合物中,並且在環境中攪拌24 h。在15°C下,向所得混合物中添加氫氧化鈉(10%水溶液,222.53 g,556.32 mmol)。將有機層分離並在真空下濃縮以得到呈棕色油狀物的標題化合物(2.20 g,90%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例3 使用比率為1 : 2 : 2 : 6的具有式II的化合物、鹵鹽、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a slurry of sodium bromide (1.51 g, 14.64 mmol) in acetic acid (30.5 mL) was added sulfuric acid (1.43 g, 14.64 mmol) over a period of 15 min. The reaction mixture was stirred at ambient temperature for 30 min. Add 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy]-1 H -pyridinyl in dichloroethane (25 mL). Azole-5-carboxylic acid ethyl ester (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) was added to the reaction mixture and stirred at ambient for 24 h. To the resulting mixture was added sodium hydroxide (10% aqueous solution, 222.53 g, 556.32 mmol) at 15°C. The organic layer was separated and concentrated in vacuo to give the title compound as a brown oil (2.20 g, 90% yield). The 1 H NMR spectrum of this product was identical to that reported for the product of Example 1. Example 3 Preparation of 3-bromo-1-(3-chloro-2-pyridyl)-4,5-di using a compound of formula II, a halide salt, an inorganic acid and an organic acid in a ratio of 1:2:2:6 Hydrogen- 1H -pyrazole-5-carboxylic acid ethyl ester
向溴化鈉(0.15 g,1.46 mmol)在乙酸(0.25 mL)中的漿料中逐滴添加硫酸(0.14 g,1.46 mmol),並且在環境溫度下攪拌30 min。將在二氯甲烷(3 mL)中的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(0.3 g,0.73 mmol)添加到反應混合物中,並且在環境中攪拌3 h。在15°C下,向所得混合物中添加氫氧化鈉(10%水溶液,2.93 g,7.32 mmol)。將有機層分離並在真空下濃縮以得到呈棕色油狀物的標題化合物(0.08 g,33%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例4 使用比率為1 : 2 : 2 : 17的具有式II的化合物、鹵鹽、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a slurry of sodium bromide (0.15 g, 1.46 mmol) in acetic acid (0.25 mL) was added sulfuric acid (0.14 g, 1.46 mmol) dropwise and stirred at ambient temperature for 30 min. 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy] -1H -pyrazole-5-carboxylic acid ethyl ester (PCT Patent Publication WO 2004/011453) (0.3 g, 0.73 mmol) in dichloromethane (3 mL) was added to the reaction mixture and stirred at ambient for 3 h. Sodium hydroxide (10% aqueous solution, 2.93 g, 7.32 mmol) was added to the resulting mixture at 15°C. The organic layer was separated and concentrated under vacuum to give the title compound as a brown oil (0.08 g, 33% yield). The 1 H NMR spectrum of the product was identical to that reported for the product of Example 1. Example 4 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl)-4,5-dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester using a compound of Formula II, a halide, an inorganic acid, and an organic acid in a ratio of 1:2:2:17
向溴化鈉(0.15 g,1.46 mmol)在乙酸(0.71 mL)中的漿料中逐滴添加硫酸(0.14 g,1.46 mmol),並且在環境溫度下攪拌30 min。將在二氯甲烷(3 mL)中的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(0.3 g,0.73 mmol)添加到反應混合物中,並且在環境中攪拌3 h。在15°C下,向所得混合物中添加氫氧化鈉(10%水溶液,5.85 g,14.64 mmol)。將有機層分離並在真空下濃縮以得到呈棕色油狀物的標題化合物(0.19 g,78%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例5 使用比率為1 : 2 : 2 : 36的具有式II的化合物、鹵鹽、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a slurry of sodium bromide (0.15 g, 1.46 mmol) in acetic acid (0.71 mL) was added dropwise sulfuric acid (0.14 g, 1.46 mmol) and stirred at ambient temperature for 30 min. Dissolve 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy]-1 H -pyrazole in dichloromethane (3 mL) -Ethyl 5-formate (PCT Patent Publication WO 2004/011453) (0.3 g, 0.73 mmol) was added to the reaction mixture and stirred at ambient for 3 h. To the resulting mixture was added sodium hydroxide (10% aqueous solution, 5.85 g, 14.64 mmol) at 15°C. The organic layer was separated and concentrated in vacuo to afford the title compound as a brown oil (0.19 g, 78% yield). The 1 H NMR spectrum of this product was identical to that reported for the product of Example 1. Example 5 Preparation of 3-bromo-1-(3-chloro-2-pyridyl)-4,5-di using a compound of formula II, a halide salt, an inorganic acid and an organic acid in a ratio of 1:2:2:36 Hydrogen- 1H -pyrazole-5-carboxylic acid ethyl ester
向溴化鈉(0.15 g,1.46 mmol)在乙酸(1.5 mL)中的漿料中逐滴添加硫酸(0.14 g,1.46 mmol),並且在環境溫度下攪拌30 min。將在二氯甲烷(3 mL)中的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(0.3 g,0.73 mmol)添加到反應混合物中,並且在環境中攪拌3 h。在15°C下,向所得混合物中添加氫氧化鈉(10%水溶液,10.83 g,27.08 mmol)。將有機層分離並在真空下濃縮以得到呈棕色油狀物的標題化合物(0.19 g,78%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例6 使用比率為1 : 4 : 3.1的具有式II的化合物、鹵鹽和無機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a slurry of sodium bromide (0.15 g, 1.46 mmol) in acetic acid (1.5 mL) was added dropwise sulfuric acid (0.14 g, 1.46 mmol) and stirred at ambient temperature for 30 min. Dissolve 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy]-1 H -pyrazole in dichloromethane (3 mL) -Ethyl 5-formate (PCT Patent Publication WO 2004/011453) (0.3 g, 0.73 mmol) was added to the reaction mixture and stirred at ambient for 3 h. To the resulting mixture was added sodium hydroxide (10% aqueous solution, 10.83 g, 27.08 mmol) at 15°C. The organic layer was separated and concentrated in vacuo to afford the title compound as a brown oil (0.19 g, 78% yield). The 1 H NMR spectrum of this product was identical to that reported for the product of Example 1. Example 6 Preparation of 3-bromo-1-(3-chloro-2-pyridyl)-4,5-dihydro- 1H- using a compound of formula II, a halide salt and an inorganic acid in a ratio of 1:4:3.1 Ethyl pyrazole-5-carboxylate
向1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在乙酸乙酯(15 mL)中的溶液中添加溴化鈉(3.01 g,29.28 mmol),隨後在5 min的時間段內添加硫酸(2.20 g,22.40 mmol)。將混合物在20°C下攪拌30 min。向所得混合物中添加飽和碳酸氫鈉水溶液(170 mL)。分離各層,並將水層用乙酸乙酯(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,並過濾。將濾液在真空下濃縮以得到呈棕色油狀物的標題化合物(2.27 g,90%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例7 使用比率為1 : 3 : 3.1的具有式II的化合物、鹵鹽和無機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a solution of ethyl 1-(3-chloro-2-pyridinyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy] -1H -pyrazole-5-carboxylate (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in ethyl acetate (15 mL) was added sodium bromide (3.01 g, 29.28 mmol) followed by sulfuric acid (2.20 g, 22.40 mmol) over a period of 5 min. The mixture was stirred at 20 °C for 30 min. Saturated aqueous sodium bicarbonate (170 mL) was added to the resulting mixture. The layers were separated and the aqueous layer was extracted with ethyl acetate (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, and filtered. The filtrate was concentrated under vacuum to give the title compound as a brown oil (2.27 g, 90% yield). The 1 H NMR spectrum of the product was identical to that reported for the product of Example 1. Example 7 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl)-4,5-dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester using a compound of formula II, a halide and an inorganic acid in a ratio of 1:3:3.1
向1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在乙酸乙酯(15 mL)中的溶液中添加溴化鈉(2.26 g,21.96 mmol),隨後一次性添加硫酸(2.20 g,22.40 mmol)。將混合物在20°C下攪拌15 h。向所得混合物中添加飽和碳酸氫鈉水溶液(170 mL)。分離各層,並將水層用乙酸乙酯(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,並過濾。將濾液在真空下濃縮以得到呈棕色油狀物的標題化合物(2.11 g,87%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例8 使用比率為1 : 2 : 12的具有式II的化合物、鹵鹽和無機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a solution of ethyl 1-(3-chloro-2-pyridinyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy] -1H -pyrazole-5-carboxylate (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in ethyl acetate (15 mL) was added sodium bromide (2.26 g, 21.96 mmol) followed by sulfuric acid (2.20 g, 22.40 mmol) in one portion. The mixture was stirred at 20°C for 15 h. To the resulting mixture was added saturated aqueous sodium bicarbonate (170 mL). The layers were separated and the aqueous layer was extracted with ethyl acetate (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, and filtered. The filtrate was concentrated under vacuum to give the title compound (2.11 g, 87% yield) as a brown oil. The 1 H NMR spectrum of the product was identical to that reported for the product of Example 1. Example 8 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl)-4,5-dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester using a compound of Formula II, a halide, and an inorganic acid in a ratio of 1:2:12
向1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在乙酸乙酯(15 mL)中的溶液中添加溴化鈉(1.51 g,14.64 mmol),隨後一次性添加硫酸(8.61 g,87.84 mmol)。將混合物在20°C下攪拌24 h。向所得混合物中添加飽和碳酸氫鈉水溶液(170 mL)。分離各層,並將水層用乙酸乙酯(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,並過濾。將濾液在真空下濃縮以得到呈棕色油狀物的標題化合物(2.05 g,84%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例9 使用比率為1 : 1.6 : 2 : 3.9的具有式II的化合物、鹵鹽(Dv50 = 389 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a solution of ethyl 1-(3-chloro-2-pyridinyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy] -1H -pyrazole-5-carboxylate (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in ethyl acetate (15 mL) was added sodium bromide (1.51 g, 14.64 mmol) followed by sulfuric acid (8.61 g, 87.84 mmol) in one portion. The mixture was stirred at 20°C for 24 h. To the resulting mixture was added saturated aqueous sodium bicarbonate (170 mL). The layers were separated and the aqueous layer was extracted with ethyl acetate (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, and filtered. The filtrate was concentrated under vacuum to give the title compound (2.05 g, 84% yield) as a brown oil. The 1 H NMR spectrum of the product was identical to that reported for the product of Example 1. Example 9 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl)-4,5-dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester using a compound of formula II, a halide (Dv50 = 389 µm), an inorganic acid, and an organic acid in a ratio of 1:1.6:2:3.9
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在二氯甲烷(7 mL)中的攪拌溶液中添加乙酸(1.62 mL,28.3 mmol),隨後添加溴化鈉(Dv50 = 389 µm)(1.21 g,11.71 mmol)。將混合物冷卻至0°C。在5 min的時間段內將濃硫酸(1.43 g,14.64 mmol)添加到混合物中。將混合物在0°C下攪拌1 h,加熱至20°C,在20°C下攪拌5 h,並且然後冷卻至0°C。向所得混合物中添加氫氧化鈉(10%水溶液,10 g,25 mmol)。分離各層,並將水層用二氯甲烷(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈棕色油狀物的標題化合物(0.47 g,19%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例10 使用比率為1 : 4 : 3.1 : 0的具有式II的化合物、鹵鹽(Dv50 = 389 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy]-1 H -pyrazole-5-carboxylic acid at 20°C To a stirred solution of the ethyl ester (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in dichloromethane (7 mL) was added acetic acid (1.62 mL, 28.3 mmol), followed by sodium bromide (Dv50 = 389 µm) (1.21 g, 11.71 mmol). Cool the mixture to 0°C. Concentrated sulfuric acid (1.43 g, 14.64 mmol) was added to the mixture over a period of 5 min. The mixture was stirred at 0°C for 1 h, heated to 20°C, stirred at 20°C for 5 h, and then cooled to 0°C. To the resulting mixture was added sodium hydroxide (10% aqueous solution, 10 g, 25 mmol). The layers were separated and the aqueous layer was extracted with dichloromethane (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexane) to provide the title compound as a brown oil (0.47 g, 19% yield). The 1 H NMR spectrum of this product was identical to that reported for the product of Example 1. Example 10 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl) using a compound of formula II, a halide salt (Dv50 = 389 µm), an inorganic acid and an organic acid in a ratio of 1 : 4 : 3.1 : 0 -4,5-Dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在乙酸乙酯(15 mL)中的攪拌溶液中添加溴化鈉(Dv50 = 389 µm)(3.01 g,29.28 mmol),隨後在5 min的時間段內添加濃硫酸(2.20 g,22.40 mmol)。將混合物在20°C下攪拌6 h。在15 min的時間段內,向所得混合物中緩慢添加飽和碳酸氫鈉水溶液(50 mL)。分離各層,並且將水層用乙酸乙酯(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈淡黃色油狀物的標題化合物(0.63 g,26%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例11 使用比率為1 : 1.6 : 2 : 3.9的具有式II的化合物、鹵鹽(Dv50 = 73 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy]-1 H -pyrazole-5-carboxylic acid at 20°C To a stirred solution of ethyl ester (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in ethyl acetate (15 mL) was added sodium bromide (Dv50 = 389 µm) (3.01 g, 29.28 mmol) followed by Concentrated sulfuric acid (2.20 g, 22.40 mmol) was added over a period of 5 min. The mixture was stirred at 20°C for 6 h. To the resulting mixture, saturated aqueous sodium bicarbonate solution (50 mL) was slowly added over a period of 15 min. The layers were separated, and the aqueous layer was extracted with ethyl acetate (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexane) to provide the title compound as a pale yellow oil (0.63 g, 26 % yield). The 1 H NMR spectrum of this product was identical to that reported for the product of Example 1. Example 11 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl) using a compound of formula II, a halide salt (Dv50 = 73 µm), an inorganic acid and an organic acid in a ratio of 1 : 1.6 : 2 : 3.9 -4,5-Dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在二氯甲烷(7 mL)中的攪拌溶液中添加乙酸(1.62 mL,28.3 mmol),隨後添加溴化鈉(Dv50 = 73 µm)(1.21 g,11.71 mmol)。在5 min的時間段內將濃硫酸(1.43 g,14.64 mmol)添加到混合物中。將混合物在20°C下攪拌6 h,並且然後冷卻至0°C。向所得混合物中添加氫氧化鈉(10%水溶液,10 g,25 mmol)。分離各層,並將水層用二氯甲烷(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈淡黃色油狀物的標題化合物(0.77 g,32%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例12 使用比率為1 : 4 : 3.1 : 0的具有式II的化合物、鹵鹽(Dv50 = 73 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy]-1 H -pyrazole-5-carboxylic acid at 20°C To a stirred solution of the ethyl ester (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in dichloromethane (7 mL) was added acetic acid (1.62 mL, 28.3 mmol), followed by sodium bromide (Dv50 = 73 µm) (1.21 g, 11.71 mmol). Concentrated sulfuric acid (1.43 g, 14.64 mmol) was added to the mixture over a period of 5 min. The mixture was stirred at 20°C for 6 h and then cooled to 0°C. To the resulting mixture was added sodium hydroxide (10% aqueous solution, 10 g, 25 mmol). The layers were separated and the aqueous layer was extracted with dichloromethane (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexane) to provide the title compound as a pale yellow oil (0.77 g, 32 % yield). The 1 H NMR spectrum of this product was identical to that reported for the product of Example 1. Example 12 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl) using a compound of formula II, a halide salt (Dv50 = 73 µm), an inorganic acid and an organic acid in a ratio of 1 : 4 : 3.1 : 0 -4,5-Dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在乙酸乙酯(15 mL)中的攪拌溶液中添加溴化鈉(Dv50 = 73 µm)(3.01 g,29.28 mmol),隨後在5 min的時間段內添加濃硫酸(2.20 g,22.40 mmol)。將混合物在20°C下攪拌6 h。在15 min的時間段內,向所得混合物中緩慢添加飽和碳酸氫鈉水溶液(50 mL)。分離各層,並且將水層用乙酸乙酯(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈淡黃色油狀物的標題化合物(1.74 g,71%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例13 使用比率為1 : 1.6 : 2 : 3.9的具有式II的化合物、鹵鹽(Dv50 = 73 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a stirred solution of ethyl 1-(3-chloro-2-pyridinyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy] -1H -pyrazole-5-carboxylate (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in ethyl acetate (15 mL) at 20°C was added sodium bromide (Dv50 = 73 µm) (3.01 g, 29.28 mmol) followed by concentrated sulfuric acid (2.20 g, 22.40 mmol) over a period of 5 min. The mixture was stirred at 20°C for 6 h. To the resulting mixture was slowly added saturated aqueous sodium bicarbonate (50 mL) over a period of 15 min. The layers were separated and the aqueous layer was extracted with ethyl acetate (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexanes) to provide the title compound (1.74 g, 71% yield) as a light yellow oil. The 1 H NMR spectrum of the product was identical to that reported for the product of Example 1. Example 13 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl)-4,5-dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester using a compound of Formula II, a halogen salt (Dv50 = 73 µm), an inorganic acid, and an organic acid in a ratio of 1:1.6:2:3.9.
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在二氯甲烷(7 mL)中的攪拌溶液中添加乙酸(1.62 mL,28.3 mmol),隨後添加溴化鈉(Dv50 = 73 µm)(1.21 g,11.71 mmol)。將混合物冷卻至0°C。在5 min的時間段內將濃硫酸(1.43 g,14.64 mmol)添加到混合物中。將混合物在0°C下攪拌1 h,加熱至20°C,並在20°C下攪拌5 h。將混合物冷卻至0°C並攪拌17 h。向所得混合物中添加氫氧化鈉(10%水溶液,10 g,25 mmol)。分離各層,並將水層用二氯甲烷(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈淡黃色油狀物的標題化合物(0.81 g,33%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例14 使用比率為1 : 4 : 3.1 : 0的具有式II的化合物、鹵鹽(Dv50 = 73 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy]-1 H -pyrazole-5-carboxylic acid at 20°C To a stirred solution of ethyl ester (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in dichloromethane (7 mL) was added acetic acid (1.62 mL, 28.3 mmol), followed by sodium bromide (Dv50 = 73 µm) (1.21 g, 11.71 mmol). Cool the mixture to 0°C. Concentrated sulfuric acid (1.43 g, 14.64 mmol) was added to the mixture over a period of 5 min. The mixture was stirred at 0°C for 1 h, heated to 20°C, and stirred at 20°C for 5 h. The mixture was cooled to 0 °C and stirred for 17 h. To the resulting mixture was added sodium hydroxide (10% aqueous solution, 10 g, 25 mmol). The layers were separated and the aqueous layer was extracted with dichloromethane (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexane) to provide the title compound as a pale yellow oil (0.81 g, 33 % yield). The 1 H NMR spectrum of this product was identical to that reported for the product of Example 1. Example 14 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl) using a compound of formula II, a halide salt (Dv50 = 73 µm), an inorganic acid and an organic acid in a ratio of 1 : 4 : 3.1 : 0 -4,5-Dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在乙酸乙酯(15 mL)中的攪拌溶液中添加溴化鈉(Dv50 = 73 µm)(3.01 g,29.28 mmol),隨後在5 min的時間段內添加濃硫酸(2.20 g,22.40 mmol)。將混合物在20°C下攪拌23 h。在15 min的時間段內,向所得混合物中緩慢添加飽和碳酸氫鈉水溶液(50 mL)。分離各層,並且將水層用乙酸乙酯(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈淡黃色油狀物的標題化合物(2.0 g,82%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例15 使用比率為1 : 1.6 : 2 : 3.9的具有式II的化合物、鹵鹽(Dv50 = 40 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy]-1 H -pyrazole-5-carboxylic acid at 20°C To a stirred solution of ethyl ester (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in ethyl acetate (15 mL) was added sodium bromide (Dv50 = 73 µm) (3.01 g, 29.28 mmol) followed by Concentrated sulfuric acid (2.20 g, 22.40 mmol) was added over a period of 5 min. The mixture was stirred at 20°C for 23 h. To the resulting mixture, saturated aqueous sodium bicarbonate solution (50 mL) was slowly added over a period of 15 min. The layers were separated, and the aqueous layer was extracted with ethyl acetate (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexane) to provide the title compound as a pale yellow oil (2.0 g, 82 % yield). The 1 H NMR spectrum of this product was identical to that reported for the product of Example 1. Example 15 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl) using a compound of formula II, a halide salt (Dv50 = 40 µm), an inorganic acid and an organic acid in a ratio of 1 : 1.6 : 2 : 3.9 -4,5-Dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在二氯甲烷(7 mL)中的攪拌溶液中添加乙酸(1.62 mL,28.3 mmol),隨後添加溴化鈉(Dv50 = 40 µm)(1.21 g,11.71 mmol)。將混合物冷卻至0°C。在5 min的時間段內將濃硫酸(1.43 g,14.64 mmol)添加到混合物中。將混合物在0°C下攪拌1 h,加熱至20°C,並在20°C下攪拌5 h。向所得混合物中添加氫氧化鈉(10%水溶液,10 g,25 mmol)。分離各層,並將水層用二氯甲烷(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈淡黃色油狀物的標題化合物(0.85 g,35%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例16 使用比率為1 : 4 : 3.1 : 0的具有式II的化合物、鹵鹽(Dv50 = 40 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a stirred solution of ethyl 1-(3-chloro-2-pyridinyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy] -1H -pyrazole-5-carboxylate (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in dichloromethane (7 mL) at 20°C was added acetic acid (1.62 mL, 28.3 mmol) followed by sodium bromide (Dv50 = 40 µm) (1.21 g, 11.71 mmol). The mixture was cooled to 0°C. Concentrated sulfuric acid (1.43 g, 14.64 mmol) was added to the mixture over a period of 5 min. The mixture was stirred at 0°C for 1 h, heated to 20°C, and stirred at 20°C for 5 h. To the resulting mixture was added sodium hydroxide (10% aqueous solution, 10 g, 25 mmol). The layers were separated and the aqueous layer was extracted with dichloromethane (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexanes) to provide the title compound (0.85 g, 35% yield) as a light yellow oil. The 1 H NMR spectrum of the product was identical to that reported for the product of Example 1. Example 16 Preparation of ethyl 3-bromo-1-(3-chloro-2-pyridinyl)-4,5-dihydro- 1H -pyrazole-5-carboxylate using a compound of formula II, a halide (Dv50 = 40 µm), an inorganic acid and an organic acid in a ratio of 1:4:3.1:0
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在乙酸乙酯(15 mL)中的攪拌溶液中添加溴化鈉(Dv50 = 40 µm)(3.01 g,29.28 mmol),隨後在5 min的時間段內添加濃硫酸(2.20 g,22.40 mmol)。將混合物在20°C下攪拌6 h。在15 min的時間段內,向所得混合物中緩慢添加飽和碳酸氫鈉水溶液(50 mL)。分離各層,並且將水層用乙酸乙酯(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈淡黃色油狀物的標題化合物(1.76 g,72%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例17 使用比率為1 : 1.6 : 2 : 3.9的具有式II的化合物、鹵鹽(Dv50 = 40 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To 1-(3-chloro-2-pyridyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy]-1 H -pyrazole-5-carboxylic acid at 20°C To a stirred solution of ethyl ester (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in ethyl acetate (15 mL) was added sodium bromide (Dv50 = 40 µm) (3.01 g, 29.28 mmol) followed by Concentrated sulfuric acid (2.20 g, 22.40 mmol) was added over a period of 5 min. The mixture was stirred at 20°C for 6 h. To the resulting mixture, saturated aqueous sodium bicarbonate solution (50 mL) was slowly added over a period of 15 min. The layers were separated, and the aqueous layer was extracted with ethyl acetate (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexane) to provide the title compound as a pale yellow oil (1.76 g, 72 % yield). The 1 H NMR spectrum of this product was identical to that reported for the product of Example 1. Example 17 Preparation of 3-bromo-1-(3-chloro-2-pyridinyl) using a compound of formula II, a halide salt (Dv50 = 40 µm), an inorganic acid and an organic acid in a ratio of 1 : 1.6 : 2 : 3.9 -4,5-Dihydro- 1H -pyrazole-5-carboxylic acid ethyl ester
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在二氯甲烷(7 mL)中的攪拌溶液中添加乙酸(1.62 mL,28.3 mmol),隨後添加溴化鈉(Dv50 = 40 µm)(1.21 g,11.71 mmol)。將混合物冷卻至0°C。在5 min的時間段內將濃硫酸(1.43 g,14.64 mmol)添加到混合物中。將混合物在0°C下攪拌1 h,加熱至20°C,並在20°C下攪拌5 h。將混合物冷卻至0°C並攪拌17 h。向所得混合物中添加氫氧化鈉(10%水溶液,10 g,25 mmol)。分離各層,並將水層用二氯甲烷(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈淡黃色油狀物的標題化合物(0.99 g,41%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 實例18 使用比率為1 : 4 : 3.1 : 0的具有式II的化合物、鹵鹽(Dv50 = 40 µm)、無機酸和有機酸製備3-溴-1-(3-氯-2-吡啶基)-4,5-二氫-1 H-吡唑-5-甲酸乙酯 To a stirred solution of ethyl 1-(3-chloro-2-pyridinyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy] -1H -pyrazole-5-carboxylate (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in dichloromethane (7 mL) at 20°C was added acetic acid (1.62 mL, 28.3 mmol) followed by sodium bromide (Dv50 = 40 µm) (1.21 g, 11.71 mmol). The mixture was cooled to 0°C. Concentrated sulfuric acid (1.43 g, 14.64 mmol) was added to the mixture over a period of 5 min. The mixture was stirred at 0°C for 1 h, heated to 20°C, and stirred at 20°C for 5 h. The mixture was cooled to 0 °C and stirred for 17 h. Sodium hydroxide (10% aqueous solution, 10 g, 25 mmol) was added to the resulting mixture. The layers were separated and the aqueous layer was extracted with dichloromethane (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexanes) to provide the title compound (0.99 g, 41% yield) as a light yellow oil. The 1 H NMR spectrum of the product was identical to that reported for the product of Example 1. Example 18 Preparation of ethyl 3-bromo-1-(3-chloro-2-pyridinyl)-4,5-dihydro- 1H -pyrazole-5-carboxylate using a compound of formula II, a halide (Dv50 = 40 µm), an inorganic acid and an organic acid in a ratio of 1:4:3.1:0
向在20°C下的1-(3-氯-2-吡啶基)-4,5-二氫-3-[(苯基磺醯基)氧基]-1 H-吡唑-5-甲酸乙酯(PCT專利公開WO 2004/011453)(3.0 g,7.32 mmol)在乙酸乙酯(15 mL)中的攪拌溶液中添加溴化鈉(Dv50 = 40 µm)(3.01 g,29.28 mmol),隨後在5 min的時間段內添加濃硫酸(2.20 g,22.40 mmol)。將混合物在20°C下攪拌23 h。在15 min的時間段內,向所得混合物中緩慢添加飽和碳酸氫鈉水溶液(50 mL)。分離各層,並且將水層用乙酸乙酯(2 × 30 mL)萃取。將有機萃取物合併,經硫酸鎂乾燥,過濾,並藉由矽膠層析法(用己烷中20%乙酸乙酯洗脫)純化以提供呈淡黃色油狀物的標題化合物(2.03 g,84%產率)。該產物的 1H NMR譜與實例1的產物所報告的相同。 To a stirred solution of ethyl 1-(3-chloro-2-pyridinyl)-4,5-dihydro-3-[(phenylsulfonyl)oxy] -1H -pyrazole-5-carboxylate (PCT Patent Publication WO 2004/011453) (3.0 g, 7.32 mmol) in ethyl acetate (15 mL) at 20°C was added sodium bromide (Dv50 = 40 µm) (3.01 g, 29.28 mmol) followed by concentrated sulfuric acid (2.20 g, 22.40 mmol) over a period of 5 min. The mixture was stirred at 20°C for 23 h. To the resulting mixture was slowly added saturated aqueous sodium bicarbonate (50 mL) over a period of 15 min. The layers were separated and the aqueous layer was extracted with ethyl acetate (2 × 30 mL). The organic extracts were combined, dried over magnesium sulfate, filtered, and purified by silica gel chromatography (eluting with 20% ethyl acetate in hexanes) to provide the title compound (2.03 g, 84% yield) as a light yellow oil. The 1 H NMR spectrum of the product was identical to that reported for the product of Example 1.
藉由本文所述之程序和本領域已知之方法,具有式
II的化合物可以轉化為如表1中具有式
Ia和
IIa示出的具有式
I的化合物。在表中使用以下縮寫:Me係甲基,Et係乙基,
n-Pr係
正丙基,
i-Pr係
異丙基,
t-Bu係
三級丁基,並且Ph係苯基。
[表1]
本發明的3-鹵代-4,5-二氫-1 H-吡唑的製備方法可以用於製備多種具有式 I的化合物,該化合物可用作用於製備作物保護試劑的中間體。 The preparation method of the 3-halogenated-4,5-dihydro- 1H -pyrazole of the present invention can be used to prepare a variety of compounds having formula I , and the compounds can be used as intermediates for preparing crop protection agents.
在本發明的另一個方面,藉由方案1之方法製備的具有式 I的化合物可用作用於製備具有式 III和式 IV的化合物的中間體。 In another aspect of the present invention, the compound of formula I prepared by the method of Scheme 1 can be used as an intermediate for preparing compounds of formula III and formula IV .
如先前在WO 2003/015518和WO 2006/055922中所揭露的,具有式 IV的化合物可用作殺昆蟲劑。 As previously disclosed in WO 2003/015518 and WO 2006/055922, compounds of formula IV are useful as insecticides.
藉由多種先前揭露於WO 2003/016283、WO 2004/067528、WO 2004/087689和WO 2006/062978中之方法,具有式 IV的化合物可以由具有式 III的化合物,並且進而由具有式 II和 I的化合物製備。 By a variety of methods previously disclosed in WO 2003/016283, WO 2004/067528, WO 2004/087689 and WO 2006/062978, compounds of formula IV can be prepared from compounds of formula III , and in turn from compounds of formulas II and I Preparation of compounds.
無without
無without
無without
Claims (21)
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| TWI327566B (en) | 2001-08-13 | 2010-07-21 | Du Pont | Novel substituted ihydro 3-halo-1h-pyrazole-5-carboxylates,their preparation and use |
| TWI325302B (en) | 2001-08-13 | 2010-06-01 | Du Pont | Benzoxazinone compounds |
| TWI343376B (en) | 2002-07-31 | 2011-06-11 | Du Pont | Method for preparing 3-halo-4, 5-dihydro-1h-pyrazoles |
| EP1599463B1 (en) | 2003-01-28 | 2013-06-05 | E.I. Du Pont De Nemours And Company | Cyano anthranilamide insecticides |
| TWI367882B (en) | 2003-03-26 | 2012-07-11 | Du Pont | Preparation and use of 2-substituted-5-oxo-3-pyrazolidinecarboxylates |
| EP2564706A1 (en) | 2004-11-18 | 2013-03-06 | E. I. du Pont de Nemours and Company | Anthranilamide insecticides |
| TWI363756B (en) | 2004-12-07 | 2012-05-11 | Du Pont | Method for preparing n-phenylpyrazole-1-carboxamides |
| CL2008000979A1 (en) * | 2007-04-11 | 2008-10-17 | Sumitomo Chemical Co | PROCESS TO PRODUCE A COMPOUND DERIVED FROM 2-PIRIDIN-2-IL-2H-PIRAZOL-3-PHENYLAMIDE; INTERMEDIARY COMPOUNDS; THE COMPOUND IN YES; PESTICIDE COMPOSITION CONTAINING SUCH COMPOUND; USE OF SUCH COMPOUND AS A PESTICIDE; AND METHOD FOR CONTROL |
| WO2018064119A1 (en) * | 2016-09-28 | 2018-04-05 | Blade Therapeutics, Inc. | Calpain modulators and therapeutic uses thereof |
| CN114057686A (en) * | 2020-08-05 | 2022-02-18 | 沈阳中化农药化工研发有限公司 | Preparation method of bromo-pyrazole carboxylic ester compound |
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