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JPH06199805A - Production of @(3754/24)3-substituted phenyl)pyrazole derivative - Google Patents

Production of @(3754/24)3-substituted phenyl)pyrazole derivative

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Publication number
JPH06199805A
JPH06199805A JP26435093A JP26435093A JPH06199805A JP H06199805 A JPH06199805 A JP H06199805A JP 26435093 A JP26435093 A JP 26435093A JP 26435093 A JP26435093 A JP 26435093A JP H06199805 A JPH06199805 A JP H06199805A
Authority
JP
Japan
Prior art keywords
group
general formula
represented
reaction
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26435093A
Other languages
Japanese (ja)
Inventor
Yuzo Miura
友三 三浦
Noboru Abe
登 阿部
Hideo Takaishi
日出男 高石
Kenji Tsubata
健治 津幡
Hiroshi Hamaguchi
洋 濱口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nihon Nohyaku Co Ltd
Original Assignee
Nihon Nohyaku Co Ltd
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Application filed by Nihon Nohyaku Co Ltd filed Critical Nihon Nohyaku Co Ltd
Priority to JP26435093A priority Critical patent/JPH06199805A/en
Publication of JPH06199805A publication Critical patent/JPH06199805A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】 【構成】 式(II)のピラゾ−ル類をハロゲン化剤の存在
下にハロゲン化することからなる式(I) の3−(置換フ
ェニル)ピラゾ−ル誘導体の製造方法。 【化1】 (式中、R1はH、低級アルキル;R2は低級アルコキシ、
低級ハロアルコキシ;R3はハロゲン、低級アルコキシ、
カルボキシル、低級アルコキシカルボニル、低級アルキ
ルチオカルボニルアルコキシカルボニル、アミノカルボ
ニルアルコキシ、低級アルコキシカルボニルアルコキ
シ;X及びYはハロゲンを示す。)
(57) [Summary] [Structure] A method for producing a 3- (substituted phenyl) pyrazole derivative of the formula (I), which comprises halogenating a pyrazole of the formula (II) in the presence of a halogenating agent. . [Chemical 1] (Wherein R 1 is H, lower alkyl; R 2 is lower alkoxy,
Lower haloalkoxy; R 3 is halogen, lower alkoxy,
Carboxyl, lower alkoxycarbonyl, lower alkylthiocarbonylalkoxycarbonyl, aminocarbonylalkoxy, lower alkoxycarbonylalkoxy; X and Y represent halogen. )

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は一般式(I)The present invention relates to the general formula (I)

【化3】 〔式中、R1は水素原子又は低級アルキル基を示し、R2
低級アルコキシ基又は低級ハロアルコキシ基を示し、R3
はハロゲン原子、低級アルコキシ基、カルボキシル基、
低級アルコキシカルボニル基、低級アルキルチオカルボ
ニルアルコキシカルボニル基、アミノカルボニルアルコ
キシ基又は低級アルコキシカルボニルアルコキシ基を示
し、X は同一又は異なっても良いハロゲン原子を示し、
Y はハロゲン原子を示す。〕で表される3−(置換フェ
ニル)ピラゾ−ル誘導体の製造方法に関するものであ
る。
[Chemical 3] [In the formula, R 1 represents a hydrogen atom or a lower alkyl group, R 2 represents a lower alkoxy group or a lower haloalkoxy group, and R 3
Is a halogen atom, a lower alkoxy group, a carboxyl group,
A lower alkoxycarbonyl group, a lower alkylthiocarbonylalkoxycarbonyl group, an aminocarbonylalkoxy group or a lower alkoxycarbonylalkoxy group, X represents a halogen atom which may be the same or different,
Y represents a halogen atom. ] It is related with the manufacturing method of the 3- (substituted phenyl) pyrazole derivative represented by these.

【0002】[0002]

【従来の技術】特開平2−300173号、特開平3−
47180号、特開平3−81275号、特開平3−1
51367号及び特開平3−163063号公報等に本
発明の製造方法によって得られる3−(置換フェニル)
ピラゾ−ル誘導体が除草剤として有用であることが開示
されている。
2. Description of the Related Art Japanese Unexamined Patent Publication No. 2-300173 and Japanese Unexamined Patent Publication No.
47180, JP-A-3-81275, JP-A3-1.
3- (Substituted phenyl) obtained by the production method of the present invention, such as 51367 and JP-A-3-163063.
It is disclosed that the pyrazole derivative is useful as a herbicide.

【0003】[0003]

【発明が解決使用とする課題】本発明者等は除草剤とし
て有用な3−(置換フェニル)ピラゾ−ル誘導体の新規
な製造方法に関し、鋭意研究を重ねた結果、本発明を完
成させたものである。
DISCLOSURE OF THE INVENTION The present inventors have completed the present invention as a result of extensive research on a novel method for producing a 3- (substituted phenyl) pyrazole derivative useful as a herbicide. Is.

【0004】[0004]

【課題を解決するための手段】本発明の一般式(I) で表
される3−置換フェニルピラゾ−ル誘導体の製造方法
を、例えば図式的に示すと下記の通りである。
A method for producing a 3-substituted phenylpyrazole derivative represented by the general formula (I) of the present invention is shown schematically, for example, as follows.

【化4】 〔式中、R1、R2、R3、X 及びY は前記に同じ。〕[Chemical 4] [In the formula, R 1 , R 2 , R 3 , X and Y are the same as defined above. ]

【0005】一般式(II)で表されるピラゾ−ル類を不活
性溶媒の存在下又は不存在下にハロゲン化剤でハロゲン
化することにより一般式(I) で表される3−(置換フェ
ニル)ピラゾ−ル誘導体を製造することができる。本反
応で使用できる不活性溶媒としては本反応の進行を著し
く阻害しないものであれば良く、例えば塩化メチレン、
クロロホルム、四塩化炭素等のハロゲン化炭化水素類、
ベンゼン、トルエン、キシレン等の芳香族炭化水素類、
ジエチルエ−テル、メチルセロソルブ等の鎖状エ−テル
類、ジオキサン、テトラヒドロフラン等の環状エ−テル
類、酢酸等の有機酸類、スルホラン、ジメチルスルホキ
シド、N,N−ジメチルホルムアミド、オキシ塩化リ
ン、水等を例示することができ、これらの不活性溶媒は
単独で若しくは混合して使用することができるが、本発
明はこれらの不活性溶媒に限定されるものではない。
The pyrazoles represented by the general formula (II) are halogenated with a halogenating agent in the presence or absence of an inert solvent to give 3- (substituted) represented by the general formula (I). Phenyl) pyrazole derivatives can be prepared. The inert solvent that can be used in this reaction may be any one that does not significantly inhibit the progress of this reaction, for example, methylene chloride,
Halogenated hydrocarbons such as chloroform and carbon tetrachloride,
Aromatic hydrocarbons such as benzene, toluene, xylene,
Chain ethers such as diethyl ether and methyl cellosolve, cyclic ethers such as dioxane and tetrahydrofuran, organic acids such as acetic acid, sulfolane, dimethyl sulfoxide, N, N-dimethylformamide, phosphorus oxychloride, water and the like. Can be used, and these inert solvents can be used alone or as a mixture, but the present invention is not limited to these inert solvents.

【0006】本発明で使用するハロゲン化剤としては、
例えば塩素、臭素、沃素、塩化スルフリル、五塩化リ
ン、五臭化リン、次亜塩素酸ソ−ダ等のハロゲン化剤を
使用することができ、これらのハロゲン化剤は単独で若
しくは混合して使用することもできる。ハロゲン化剤の
使用量は一般式(II)で表されるピラゾ−ル類に対して等
モル乃至過剰モルの範囲で選択して使用すれば良く、好
ましくは若干過剰に使用するのが良い。本反応の進行を
促進させるために触媒量の鉄粉、沃化カリウム、沃素等
を添加することもできる。
The halogenating agent used in the present invention includes
For example, halogenating agents such as chlorine, bromine, iodine, sulfuryl chloride, phosphorus pentachloride, phosphorus pentabromide and sodium hypochlorite can be used, and these halogenating agents can be used alone or in a mixture. It can also be used. The amount of the halogenating agent to be used may be selected and used in the range of from equimolar to excess molar with respect to the pyrazoles represented by the general formula (II), and preferably a slight excess is used. A catalytic amount of iron powder, potassium iodide, iodine or the like may be added to accelerate the progress of this reaction.

【0007】本反応は脱ハロゲン化水素剤の存在下に反
応を行うことも可能で、脱ハロゲン化水素剤としては、
例えば酢酸ナトリウム、酢酸カリウム、炭酸水素ナトリ
ウム、炭酸水素カリウム等の無機塩基を使用することが
できる。その使用量は一般式(II)で表されるピラゾ−ル
類に対して等モル乃至過剰モルの範囲で選択して使用す
れば良い。
This reaction can also be carried out in the presence of a dehydrohalogenating agent, and as the dehydrohalogenating agent,
For example, an inorganic base such as sodium acetate, potassium acetate, sodium hydrogen carbonate, potassium hydrogen carbonate or the like can be used. The amount to be used may be selected and used in the range of equimolar to excess molar with respect to the pyrazoles represented by the general formula (II).

【0008】本反応の反応温度は室温乃至使用する不活
性溶媒の沸点域から適宜選択すれば良い。反応時間は反
応量、反応温度等により一定しないが数分乃至48時間の
範囲である。反応終了後、目的物を含む反応系から常法
により単離し、必要に応じて精製することにより目的物
を製造することができる。本発明の一般式(I) で表され
る3−(置換フェニル)ピラゾ−ル誘導体の原料化合物
である一般式(II)で表されるピラゾ−ル類は、例えば下
記に図示する製法により製造することができる。
The reaction temperature of this reaction may be appropriately selected from room temperature to the boiling point range of the inert solvent used. The reaction time varies depending on the reaction amount, reaction temperature, etc., but is in the range of several minutes to 48 hours. After the completion of the reaction, the desired product can be produced by isolating it from the reaction system containing the desired product by a conventional method and purifying it if necessary. The pyrazoles represented by the general formula (II), which are the starting compounds of the 3- (substituted phenyl) pyrazole derivative represented by the general formula (I) of the present invention, are produced, for example, by the production method illustrated below. can do.

【0009】.[0009].

【化5】 〔式中、R1、R2及びX は前記に同じくし、R3-1はハロゲ
ン原子又は低級アルコキシ基を示し、R2' は低級アルキ
ル基又は低級ハロアルキル基を示し、R5は低級アルキル
基又は低級アルキルチオカルボニルアルキル基を示し、
Z はハロゲン原子を示す。〕
[Chemical 5] [In the formula, R 1 , R 2 and X are the same as defined above, R 3-1 represents a halogen atom or a lower alkoxy group, R 2 'represents a lower alkyl group or a lower haloalkyl group, and R 5 represents a lower alkyl group. A group or a lower alkylthiocarbonylalkyl group,
Z represents a halogen atom. ]

【0010】R3がハロゲン原子、低級アルコキシ基、カ
ルボキシル基、低級アルコキシカルボニル基又は低級ア
ルキルチオカルボニルアルコキシカルボニル基の場合、
一般式(XIV) で表される化合物と一般式(V) で表される
ヒドラジン類とを反応させて一般式(XIII)で表される化
合物とし、該化合物(XIII)を単離し若しくは単離せずし
て一般式(III) で表されるハライド類と反応させること
により一般式(II-1)で表されるピラゾ−ル類を製造する
ことができる。次いで得られた一般式(II-1)で表される
ピラゾ−ル類のR3 1がハロゲン原子で表されるピラゾ−
ル類をカルボキシル化することにより一般式(II-2)で表
されるピラゾ−ル類を製造することができる。更に該ピ
ラゾ−ル類(II-2)をエステル化反応することにより一般
式(II-3)で表されるピラゾ−ル類を製造することができ
る。
When R 3 is a halogen atom, a lower alkoxy group, a carboxyl group, a lower alkoxycarbonyl group or a lower alkylthiocarbonylalkoxycarbonyl group,
A compound represented by the general formula (XIV) is reacted with a hydrazine represented by the general formula (V) to give a compound represented by the general formula (XIII), and the compound (XIII) is isolated or isolated. Alternatively, the pyrazoles represented by the general formula (II-1) can be produced by reacting with the halides represented by the general formula (III). Then represented by the obtained formula (II-1) pyrazole - pyrazole which R 3 1 Le class is represented by a halogen atom -
The pyrazoles represented by the general formula (II-2) can be produced by carboxylating the phenols. Further, the pyrazoles represented by the general formula (II-3) can be produced by subjecting the pyrazoles (II-2) to an esterification reaction.

【0011】表1にの製法により得られた一般式(II)
で表されるピラゾ−ル類の代表例を示す。一般式(II)
The general formula (II) obtained by the production method shown in Table 1
Typical examples of pyrazoles represented by General formula (II)

【化6】 [Chemical 6]

【0012】[0012]

【表1】 [Table 1]

【0013】表1中で物性が粘稠物で示される化合物の
NMRデ−タを表2に示す。
Table 2 shows the NMR data of the compounds whose physical properties are shown in Table 1 as viscous substances.

【表2】 [Table 2]

【0014】.[0014].

【化7】 〔式中、R1、R2' 、R4、X 及びZ は前記に同じくし、R6
は低級アルコキシ基又はアミノ基を示し、M はアルカリ
金属原子を示す。〕
[Chemical 7] [Wherein R 1 , R 2 ′, R 4 , X and Z are the same as defined above, and R 6
Represents a lower alkoxy group or amino group, and M represents an alkali metal atom. ]

【0015】R6がアミノカルボニルアルコキシ基又は低
級アルコキシカルボニルアルコキシ基の場合、一般式(X
II) で表される化合物と一般式(XI)で表されるハライド
類をフリ−デル・クラフツ反応により一般式(X) で表さ
れる化合物とし、該化合物(X) を単離し若しくは単離せ
ずして一般式(IX)で表されるアルカリ金属原子のシアノ
化物と反応することにより一般式(VIII)で表される化合
物とし、該化合物(VIII)を単離し若しくは単離せずして
酸性下に一般式(VII) で表されるアルコ−ル類と反応さ
せて一般式(VI)で表される化合物とし、該化合物(VI)を
単離し若しくは単離せずして一般式(V) で表されるヒド
ラジン類と反応させて一般式(IV)で表される化合物と
し、該化合物(IV)を単離し若しくは単離せずして一般式
(III) で表されるハライド類と反応させることにより一
般式(II-4)で表されるピラゾ−ル類を製造することがで
きる。
When R 6 is an aminocarbonylalkoxy group or a lower alkoxycarbonylalkoxy group, the general formula (X
II) and the halides represented by the general formula (XI) are converted to compounds represented by the general formula (X) by Friedel-Crafts reaction, and the compound (X) is isolated or isolated. Without reacting with the cyanide of the alkali metal atom represented by the general formula (IX) to give a compound represented by the general formula (VIII), the compound (VIII) is isolated or acidified without isolation. A compound represented by the general formula (VI) is obtained by reacting with an alcohol represented by the general formula (VII) below, and the compound (VI) is isolated or not isolated and the compound represented by the general formula (V) To a compound represented by the general formula (IV) by reacting with a hydrazine represented by the general formula (IV) with or without isolation of the compound (IV)
The pyrazoles represented by the general formula (II-4) can be produced by reacting with the halides represented by (III).

【0016】表3にの製法により得られた一般式(II)
で表されるピラゾ−ル類の代表例を示す。一般式(II)
General formula (II) obtained by the production method shown in Table 3
Typical examples of pyrazoles represented by General formula (II)

【化8】 [Chemical 8]

【0017】[0017]

【表3】 [Table 3]

【0018】表3中で物性が粘稠物で示される化合物の
NMRデ−タを表4に示す。
Table 4 shows the NMR data of the compounds whose physical properties are shown in Table 3 as viscous substances.

【表4】 [Table 4]

【0019】[0019]

【実施例】以下に本発明の代表的な実施例を例示する
が、本発明はこれらに限定されるものではない。
EXAMPLES Representative examples of the present invention will be illustrated below, but the present invention is not limited thereto.

【0020】実施例1 3−(5−ブロモ−2,4−ジ
クロロフェニル)−4−クロロ−5−ジフルオロメトキ
シ−1−メチル−1H−ピラゾ−ルの製造(No1)
Example 1 Preparation of 3- (5-bromo-2,4-dichlorophenyl) -4-chloro-5-difluoromethoxy-1-methyl-1H-pyrazole (No. 1)

【化9】 3−(5−ブロモ−2,4−ジクロロフェニル)−5−
ジフルオロメトキシ−1−メチル−1H−ピラゾ−ル
3.30g(8.87ミリモル)、オキシ塩化リン20
ml及び五塩化リン2.22g(10.6ミリモル)の
混合液を還流下に7時間反応を行った。反応終了後、オ
キシ塩化リンを減圧下に留去し、残渣に氷水20mlを
加えて目的物を酢酸エチルで抽出し、有機層を水、5%
重曹水、水及び飽和食塩水の順で洗浄して無水硫酸マグ
ネシウムで乾燥し、溶媒を減圧下に留去することにより
目的物3.52gを得た。 物性:m.p.78.8℃ 収率:97.6%
[Chemical 9] 3- (5-bromo-2,4-dichlorophenyl) -5-
Difluoromethoxy-1-methyl-1H-pyrazole 3.30 g (8.87 mmol), phosphorus oxychloride 20
A mixture of ml and 2.22 g (10.6 mmol) of phosphorus pentachloride was reacted under reflux for 7 hours. After the reaction was completed, phosphorus oxychloride was distilled off under reduced pressure, ice water (20 ml) was added to the residue, and the desired product was extracted with ethyl acetate.
The solution was washed successively with aqueous sodium hydrogen carbonate, water and saturated brine, dried over anhydrous magnesium sulfate, and the solvent was distilled off under reduced pressure to obtain 3.52 g of the desired product. Physical property: mp78.8 ° C Yield: 97.6%

【0021】実施例2 4−クロロ−3−(4−クロロ
−2−フルオロ−5−イソプロポキシフェニル)−5−
ジフルオロメトキシ−1−メチル−1H−ピラゾ−ルの
製造(No7)
Example 2 4-chloro-3- (4-chloro-2-fluoro-5-isopropoxyphenyl) -5-
Production of difluoromethoxy-1-methyl-1H-pyrazole (No7)

【化10】 3−(4−クロロ−2−フルオロ−5−イソプロポキシ
フェニル)−5−ジフルオロメトキシ−1−メチル−1
H−ピラゾ−ル6.69g(20ミリモル)を四塩化炭
素20ml中に溶解させた後、塩化スルフリル3.0g
(22ミリモル)を室温下に滴下し、滴下終了後2時間
室温下に反応を行った。反応終了後、反応液を水20m
l中に注ぎジクロロメタンで目的物を抽出し、ジクロロ
メタン層を水洗し、5%重曹水で洗浄して中性とし、水
及び飽和食塩水の順で洗浄し、無水硫酸マグネシウムで
乾燥後、溶媒を減圧下に留去してペ−スト状の目的物
7.01gを得た。 物性:nD1.5376(22.1℃) 収率95% 同様にして4−クロロ−3−(4−クロロ−2−フルオ
ロ−5−メトキシフェニル)−5−ジフルオロメトキシ
−1−メチル−1H−ピラゾ−ルを製造した(No4)。 物性:m.p.91.7℃ 収率:89%
[Chemical 10] 3- (4-chloro-2-fluoro-5-isopropoxyphenyl) -5-difluoromethoxy-1-methyl-1
After dissolving 6.69 g (20 mmol) of H-pyrazole in 20 ml of carbon tetrachloride, 3.0 g of sulfuryl chloride was added.
(22 mmol) was added dropwise at room temperature, and the reaction was carried out at room temperature for 2 hours after the completion of the addition. After the reaction is completed, the reaction solution is treated with 20 m of water.
The target substance was extracted with dichloromethane, the dichloromethane layer was washed with water, washed with 5% aqueous sodium hydrogen carbonate to neutralize, washed with water and saturated brine in that order, dried over anhydrous magnesium sulfate, and then the solvent was added. It was distilled off under reduced pressure to obtain 7.01 g of the pasty target product. Physical properties: nD1.5376 (22.1 ° C) Yield 95% Similarly, 4-chloro-3- (4-chloro-2-fluoro-5-methoxyphenyl) -5-difluoromethoxy-1-methyl-1H- Pyrazol was produced (No4). Physical property: mp91.7 ° C Yield: 89%

【0022】実施例3 2−〔2−クロロ−4−フルオ
ロ−5−(4−クロロ−5−ジフルオロメトキシ−1−
メチル−1H−ピラゾ−ル−3−イル)フェノキシ〕酢
酸アミドの製造(No14)
Example 3 2- [2-chloro-4-fluoro-5- (4-chloro-5-difluoromethoxy-1-)
Methyl-1H-pyrazol-3-yl) phenoxy] acetic acid amide production (No 14)

【化11】 2−〔2−クロロ−4−フルオロ−5−(5−ジフルオ
ロメトキシ−1−メチル−1H−ピラゾ−ル−3−イ
ル)フェノキシ〕酢酸アミド1.40g(4.0ミリモ
ル)を氷酢酸20mlに溶解させ、該溶液に塩素ガスを
室温下に3分間吹き込んだ。反応終了後、反応液に水1
00mlを加えて目的物を酢酸エチルで抽出し、有機層
をチオ硫酸ナトリウム水溶液、水及び飽和食塩水の順で
洗浄して硫酸マグネシウムで乾燥し、溶媒を減圧下に留
去して得られた残渣をシリカゲルカラムクロマトグラフ
ィ−で精製することにより目的物1.39gを得た。 物性:m.p.158.0−160.5℃ 収率:90.
5%
[Chemical 11] 2- [2-chloro-4-fluoro-5- (5-difluoromethoxy-1-methyl-1H-pyrazol-3-yl) phenoxy] acetic acid amide (1.40 g, 4.0 mmol) was added to glacial acetic acid (20 ml). And chlorine gas was blown into the solution at room temperature for 3 minutes. After the reaction is complete, add 1
00 ml was added, the target product was extracted with ethyl acetate, the organic layer was washed with an aqueous solution of sodium thiosulfate, water and saturated brine in that order, dried over magnesium sulfate, and the solvent was distilled off under reduced pressure. The residue was purified by silica gel column chromatography to obtain 1.39 g of the desired product. Physical properties: mp158.0-160.5 ° C Yield: 90.
5%

【0023】実施例4 2−〔2−クロロ−4−フルオ
ロ−5−(4−クロロ−5−ジフルオロメトキシ−1−
メチル−1H−ピラゾ−ル−3−イル)フェノキシ〕酢
酸エチルの製造(No16)
Example 4 2- [2-chloro-4-fluoro-5- (4-chloro-5-difluoromethoxy-1-)
Methyl-1H-pyrazol-3-yl) phenoxy] ethyl acetate production (No 16)

【化12】 2−〔2−クロロ−4−フルオロ−5−(5−ジフルオ
ロメトキシ−1−メチル−1H−ピラゾ−ル−3−イ
ル)フェノキシ〕酢酸エチル1.80g(4.75ミリ
モル)をジクロロメタン50mlに溶解させ、該溶液に
塩化スルフリル0.80g(5.92ミリモル)を室温
下に滴下し、滴下終了後2時間室温下に反応を行った。
反応終了後、反応液に水100mlを加えて目的物をジ
クロロメタンで抽出し、有機層を水洗して5%重曹水で
中性にし、水及び飽和食塩水で洗浄して硫酸マグネシウ
ムで乾燥し、溶媒を減圧下に留去することにより目的物
の粗結晶1.70gを得た。得られた粗結晶をシリカゲ
ルカラムクロマトグラフィ−にて精製することにより目
的物1.09gを得た。 物性:m.p.127.6℃ 収率:56%
[Chemical 12] Ethyl 2- [2-chloro-4-fluoro-5- (5-difluoromethoxy-1-methyl-1H-pyrazol-3-yl) phenoxy] acetate 1.80 g (4.75 mmol) ethyl acetate in 50 ml dichloromethane. After dissolution, 0.80 g (5.92 mmol) of sulfuryl chloride was added dropwise to the solution at room temperature, and the reaction was performed at room temperature for 2 hours after the completion of the addition.
After the completion of the reaction, 100 ml of water was added to the reaction solution, the desired product was extracted with dichloromethane, the organic layer was washed with water, neutralized with 5% aqueous sodium hydrogen carbonate, washed with water and saturated brine, and dried over magnesium sulfate, The solvent was distilled off under reduced pressure to obtain 1.70 g of crude crystals of the desired product. The crude crystals obtained were purified by silica gel column chromatography to obtain 1.09 g of the desired product. Physical property: mp127.6 ° C Yield: 56%

【0024】実施例5 2−〔2−クロロ−4−フルオ
ロ−5−(4−クロロ−5−ジフルオロメトキシ−1−
メチル−1H−ピラゾ−ル−3−イル)フェノキシ〕酢
酸の製造(No19)
Example 5 2- [2-chloro-4-fluoro-5- (4-chloro-5-difluoromethoxy-1-)
Production of methyl-1H-pyrazol-3-yl) phenoxy] acetic acid (No 19)

【化13】 2−〔2−クロロ−5−(5−ジフルオロメトキシ−1
−メチル−1H−ピラゾ−ル−3−イル)フェノキシ〕
酢酸5g(14.2ミリモル)をN,N−ジメチルホル
ムアミド20mlに溶解させ、該溶液に12%次亜塩素
酸ナトリウム水溶液17.7g(28.4ミリモル)を
40℃で滴下し、滴下終了御40℃で1時間反応を行っ
た。反応終了後、反応液に水25mlを加え、6N塩酸
により酸性として析出する結晶を減圧濾過し、水洗及び
減圧乾燥することにより目的物5.29gを得た。 物性:m.p.141.5℃ 収率:96%
[Chemical 13] 2- [2-chloro-5- (5-difluoromethoxy-1
-Methyl-1H-pyrazol-3-yl) phenoxy]
5 g (14.2 mmol) of acetic acid was dissolved in 20 ml of N, N-dimethylformamide, and 17.7 g (28.4 mmol) of 12% aqueous sodium hypochlorite solution was added dropwise to the solution at 40 ° C. The reaction was carried out at 40 ° C for 1 hour. After completion of the reaction, 25 ml of water was added to the reaction solution, and crystals precipitated by acidification with 6N hydrochloric acid were filtered under reduced pressure, washed with water and dried under reduced pressure to obtain 5.29 g of the desired product. Physical property: mp141.5 ° C Yield: 96%

【0025】以下実施例と同様にして得られた一般式
(I) で表される3−(置換フェニル)ピラゾ−ル誘導体
を表5に示すが本発明はこれらに限定されるものではな
い。一般式(I)
General formulas obtained in the same manner as in the examples below
The 5- (substituted phenyl) pyrazole derivative represented by (I) is shown in Table 5, but the present invention is not limited thereto. General formula (I)

【化14】 [Chemical 14]

【0026】[0026]

【表5】 [Table 5]

【0027】表5中で物性が粘稠物で示される化合物の
NMRデ−タを表6に示す。
Table 6 shows the NMR data of the compounds whose physical properties are shown in Table 5 as viscous substances.

【表6】 [Table 6]

───────────────────────────────────────────────────── フロントページの続き (72)発明者 濱口 洋 京都府京都市伏見区深草堀田町10−1、A −804 ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Hiroshi Hamaguchi 10-1, Fukakusa-Horitacho, Fushimi-ku, Kyoto-shi, Kyoto A-804

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 一般式(II) 【化1】 〔式中、R1は水素原子又は低級アルキル基を示し、R2
低級アルコキシ基又は低級ハロアルコキシ基を示し、R3
はハロゲン原子、低級アルコキシ基、カルボキシル基、
低級アルコキシカルボニル基、低級アルキルチオカルボ
ニルアルコキシカルボニル基、アミノカルボニルアルコ
キシ基又は低級アルコキシカルボニルアルコキシ基を示
し、X は同一又は異なっても良いハロゲン原子を示
す。〕で表されるピラゾ−ル類をハロゲン化剤の存在下
にハロゲン化することを特徴とする一般式(I) 【化2】 〔式中、R1、R2、R3及びX は前記に同じくし、Y はハロ
ゲン原子を示す。〕で表される3−(置換フェニル)ピ
ラゾ−ル誘導体の製造方法。
1. A compound represented by the general formula (II): [In the formula, R 1 represents a hydrogen atom or a lower alkyl group, R 2 represents a lower alkoxy group or a lower haloalkoxy group, and R 3
Is a halogen atom, a lower alkoxy group, a carboxyl group,
It represents a lower alkoxycarbonyl group, a lower alkylthiocarbonylalkoxycarbonyl group, an aminocarbonylalkoxy group or a lower alkoxycarbonylalkoxy group, and X represents a halogen atom which may be the same or different. ] The pyrazoles represented by the formula [I] are characterized in that they are halogenated in the presence of a halogenating agent. [In the formula, R 1 , R 2 , R 3 and X are the same as defined above, and Y represents a halogen atom. ] The manufacturing method of the 3- (substituted phenyl) pyrazole derivative represented by these.
JP26435093A 1992-09-28 1993-09-28 Production of @(3754/24)3-substituted phenyl)pyrazole derivative Pending JPH06199805A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26435093A JPH06199805A (en) 1992-09-28 1993-09-28 Production of @(3754/24)3-substituted phenyl)pyrazole derivative

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP28245692 1992-09-28
JP4-282456 1992-09-28
JP26435093A JPH06199805A (en) 1992-09-28 1993-09-28 Production of @(3754/24)3-substituted phenyl)pyrazole derivative

Publications (1)

Publication Number Publication Date
JPH06199805A true JPH06199805A (en) 1994-07-19

Family

ID=26546472

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Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2293766A (en) * 1994-10-07 1996-04-10 Zeneca Ltd Herbicidal compositions based on synergistic combination of glyphosate and 1,3,4,5-tetrasubstituted pyrazoles
US5962694A (en) * 1995-11-15 1999-10-05 Basf Aktiengesellschaft Substituted 1-methyl-3-phenylpyrazoles and the use thereof as herbicides and for the desiccation or defoliation of plants
US6011052A (en) * 1996-04-30 2000-01-04 Warner-Lambert Company Pyrazolone derivatives as MCP-1 antagonists
US6096689A (en) * 1995-07-06 2000-08-01 Basf Aktiengesellschaft 5-pyrazolylbenzoic acid derivatives as herbicides

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2293766A (en) * 1994-10-07 1996-04-10 Zeneca Ltd Herbicidal compositions based on synergistic combination of glyphosate and 1,3,4,5-tetrasubstituted pyrazoles
US6096689A (en) * 1995-07-06 2000-08-01 Basf Aktiengesellschaft 5-pyrazolylbenzoic acid derivatives as herbicides
US5962694A (en) * 1995-11-15 1999-10-05 Basf Aktiengesellschaft Substituted 1-methyl-3-phenylpyrazoles and the use thereof as herbicides and for the desiccation or defoliation of plants
US6011052A (en) * 1996-04-30 2000-01-04 Warner-Lambert Company Pyrazolone derivatives as MCP-1 antagonists

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