TW201837501A - Polarization plate with anti-reflection layer and anti-glare layer and manufacturing method thereof comprising a polarizing plate having a polarizing element and a protective layer, an anti-glare layer, an anti-glare layer substrate, an anti-reflection layer substrate, and an anti-reflection layer directly formed on the anti-reflection layer substrate - Google Patents
Polarization plate with anti-reflection layer and anti-glare layer and manufacturing method thereof comprising a polarizing plate having a polarizing element and a protective layer, an anti-glare layer, an anti-glare layer substrate, an anti-reflection layer substrate, and an anti-reflection layer directly formed on the anti-reflection layer substrate Download PDFInfo
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- TW201837501A TW201837501A TW107109001A TW107109001A TW201837501A TW 201837501 A TW201837501 A TW 201837501A TW 107109001 A TW107109001 A TW 107109001A TW 107109001 A TW107109001 A TW 107109001A TW 201837501 A TW201837501 A TW 201837501A
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- layer
- glare
- reflection
- reflection layer
- substrate
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3016—Polarising elements involving passive liquid crystal elements
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
- C08L29/02—Homopolymers or copolymers of unsaturated alcohols
- C08L29/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
- G02B5/305—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks including organic materials, e.g. polymeric layers
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
Description
本發明係關於一種附抗反射層及防眩光層之偏光板及其製造方法。The invention relates to a polarizing plate with an anti-reflection layer and an anti-glare layer, and a manufacturing method thereof.
圖像顯示裝置(例如液晶顯示裝置、有機EL顯示裝置、量子點顯示裝置)因其圖像形成方式,多數情況下於顯示單元之至少一側配置有偏光板。對於配置於圖像顯示裝置之視認側之偏光板,為了防止外界光向顯示畫面之映入,眾所周知於其視認側設置抗反射層(實施抗反射處理)、及/或設置防眩光層。防眩光層代表性而言包含樹脂或黏著劑之基質與分散至該基質中之微粒。然,近年來隨著針對圖像顯示裝置之薄型化要求,業界亦強烈要求偏光板之薄型化,伴隨於此,亦要求防眩光層之薄型化。其結果為,研究了作為液晶化合物之配向固化層之防眩光層。但是,此種防眩光層存在於高溫高濕環境下容易剝落,又,容易產生皺褶之問題。 [先前技術文獻] [專利文獻]An image display device (for example, a liquid crystal display device, an organic EL display device, or a quantum dot display device) has a polarizing plate disposed on at least one side of a display unit in many cases because of its image forming method. It is known that an anti-reflection layer (an anti-reflection treatment is performed) and / or an anti-glare layer is provided on a viewing side of a polarizing plate arranged on a viewing side of an image display device in order to prevent reflection of external light onto a display screen. The anti-glare layer typically includes a matrix of a resin or an adhesive and fine particles dispersed in the matrix. However, in recent years, with the demand for thinning of image display devices, the industry has also strongly demanded the thinning of polarizing plates. Along with this, the thickness of the anti-glare layer has also been required. As a result, an anti-glare layer as an alignment cured layer of a liquid crystal compound was studied. However, such an anti-glare layer is liable to be peeled off in a high-temperature and high-humidity environment, and wrinkles are liable to occur. [Prior Art Literature] [Patent Literature]
[專利文獻1]日本專利特開2011-191428號公報[Patent Document 1] Japanese Patent Laid-Open No. 2011-191428
[發明所欲解決之問題][Problems to be solved by the invention]
本發明係為了解決上述問題而成者,其主要目的在於提供一種即便於高溫高濕環境下亦抑制防眩光層之剝落及皺褶的附抗反射層及防眩光層之偏光板。 [解決問題之技術手段]The present invention has been made in order to solve the above-mentioned problems, and a main object thereof is to provide a polarizing plate with an anti-reflection layer and an anti-glare layer that suppresses peeling and wrinkling of the anti-glare layer even in a high-temperature and high-humidity environment. [Technical means to solve the problem]
本發明之附抗反射層及防眩光層之偏光板具備:具有偏光元件及設置於該偏光元件之一側的保護層之偏光板、貼合於該保護層上之液晶化合物之配向固化層即防眩光層、防眩光層用基材、貼合於該防眩光層用基材上之抗反射層用基材、及直接形成於該抗反射層用基材上之抗反射層,該抗反射層用基材之水分率為2.0重量%以上。 於一實施形態中,關於上述附抗反射層及防眩光層之偏光板,於65℃及90%RH下保持24小時後之上述抗反射層用基材之尺寸變化率未達0.03%。 於一實施形態中,上述防眩光層之面內相位差Re(550)為220 nm~320 nm。 於一實施形態中,上述附抗反射層及防眩光層之偏光板於上述防眩光層與上述防眩光層用基材之間進而具備配向膜,該配向膜包含聚乙烯醇系樹脂。 根據本發明之另一態樣,提供一種上述附抗反射層及防眩光層之偏光板之製造方法。該製造方法包括如下步驟:製作包含偏光元件及保護層之偏光元件積層體;於抗反射層用基材上形成抗反射層而製作抗反射積層體;於防眩光層用基材上形成防眩光層而製作防眩光積層體;及將該偏光元件積層體、該防眩光積層體及該抗反射積層體加以貼合;該抗反射層用基材之水分率為2.0重量%以上。 於一實施形態中,上述抗反射層用基材經加濕處理。 [發明之效果]The polarizing plate with an anti-reflection layer and an anti-glare layer of the present invention includes a polarizing plate having a polarizing element and a protective layer provided on one side of the polarizing element, and an alignment curing layer of a liquid crystal compound adhered to the protective layer. Anti-glare layer, base material for anti-glare layer, base material for anti-reflection layer bonded to base material for anti-glare layer, and anti-reflection layer formed directly on base material for anti-reflective layer, the anti-reflection The moisture content of the substrate for the layer is 2.0% by weight or more. In one embodiment, regarding the polarizing plate with the anti-reflection layer and the anti-glare layer, the dimensional change rate of the substrate for the anti-reflection layer after being kept at 65 ° C. and 90% RH for 24 hours did not reach 0.03%. In one embodiment, the in-plane retardation Re (550) of the anti-glare layer is 220 nm to 320 nm. In one embodiment, the polarizing plate with an anti-reflection layer and an anti-glare layer further includes an alignment film between the anti-glare layer and the base material for the anti-glare layer, and the alignment film includes a polyvinyl alcohol resin. According to another aspect of the present invention, a method for manufacturing the above-mentioned polarizing plate with an anti-reflection layer and an anti-glare layer is provided. The manufacturing method includes the following steps: manufacturing a polarizing element laminate including a polarizing element and a protective layer; forming an anti-reflection layer on an anti-reflection layer substrate to produce an anti-reflection laminated body; and forming an anti-glare on the anti-glare layer substrate An anti-glare laminated body is produced; and the polarizing element laminated body, the anti-glare laminated body and the anti-reflection laminated body are bonded together; the moisture content of the base material for the anti-reflection layer is 2.0% by weight or more. In one embodiment, the substrate for the antireflection layer is subjected to a humidification treatment. [Effect of the invention]
根據本發明,藉由將附抗反射層及防眩光層之偏光板中之抗反射層用基材之水分率設定為2.0重量%以上,能夠實現即便於高溫高濕環境下亦抑制防眩光層之剝落及皺褶的附抗反射層及防眩光層之偏光板。According to the present invention, by setting the moisture content of the base material for an anti-reflection layer in a polarizing plate with an anti-reflection layer and an anti-glare layer to 2.0% by weight or more, the anti-glare layer can be suppressed even in a high-temperature and high-humidity environment. Peeling and wrinkling polarizing plate with anti-reflection layer and anti-glare layer.
以下,對本發明之實施形態進行說明,但本發明並不限定於該等實施形態。Hereinafter, embodiments of the present invention will be described, but the present invention is not limited to these embodiments.
A.附抗反射層及防眩光層之偏光板之整體構成 圖1係本發明之一實施形態之附抗反射層及防眩光層之偏光板的概略剖視圖。附抗反射層及防眩光層之偏光板100依序具備:具有偏光元件11及保護層12之偏光板10、防眩光層40、防眩光層用基材50、抗反射層用基材20、及抗反射層30。防眩光層40代表性而言係經由任意之適宜之接著層(接著劑層、黏著劑層:未圖示)而貼合於偏光板10之保護層12上。接著層代表性而言為丙烯酸系黏著劑層。防眩光層40係液晶化合物之配向固化層。本說明書中所謂「配向固化層」係指液晶化合物在層內沿特定方向配向,且其配向狀態固定之層。再者,「配向固化層」係包括使液晶單體硬化而獲得之配向硬化層之概念。防眩光層40代表性而言藉由在形成於防眩光層用基材50上之配向膜(未圖示)之表面塗佈包含液晶化合物之組合物並使該塗佈層固化及/或硬化而形成。抗反射層30係直接形成於抗反射層用基材20上。本說明書中所謂「直接」意指不介隔接著層。於一實施形態中,抗反射層用基材20亦可於抗反射層30側之表面具有硬塗層及/或密接層(均未圖示)。該構成亦包含於「抗反射層直接形成於基材上」之形態中。對於抗反射層30之表面,視需要亦可設置防污層(未圖示)。A. Overall structure of polarizing plate with anti-reflection layer and anti-glare layer FIG. 1 is a schematic cross-sectional view of a polarizing plate with anti-reflection layer and anti-glare layer according to an embodiment of the present invention. The polarizing plate 100 with an anti-reflection layer and an anti-glare layer is sequentially provided with: a polarizing plate 10 having a polarizing element 11 and a protective layer 12, an anti-glare layer 40, a base material 50 for an anti-glare layer, a base material 20 for an anti-reflective layer,和 Anti-reflective layer 30. The anti-glare layer 40 is typically bonded to the protective layer 12 of the polarizing plate 10 via any appropriate adhesive layer (adhesive layer, adhesive layer: not shown). The subsequent layer is typically an acrylic adhesive layer. The anti-glare layer 40 is an alignment cured layer of a liquid crystal compound. The "alignment-cured layer" in this specification refers to a layer in which a liquid crystal compound is aligned in a specific direction in a layer, and the alignment state is fixed. Furthermore, the "alignment-cured layer" includes the concept of an alignment-hardened layer obtained by curing a liquid crystal monomer. The anti-glare layer 40 is typically coated with a composition containing a liquid crystal compound on the surface of an alignment film (not shown) formed on the substrate 50 for the anti-glare layer, and the coating layer is cured and / or hardened. And formed. The antireflection layer 30 is directly formed on the base material 20 for the antireflection layer. The term "directly" as used in this specification means not interposing the adhesive layer. In one embodiment, the base material 20 for the anti-reflection layer may have a hard coat layer and / or an adhesion layer (neither of which is shown) on the surface of the anti-reflection layer 30 side. This configuration is also included in the form of "the antireflection layer is formed directly on the substrate". An anti-fouling layer (not shown) may be provided on the surface of the anti-reflection layer 30 as needed.
於本發明之實施形態中,抗反射層用基材20之水分率為2.0重量%以上,較佳為2.4重量%以上,更佳為2.7重量%以上,進而較佳為3.0重量%以上,尤佳為3.5重量%以上。抗反射層用基材之水分率之上限例如為5.0重量%。藉由使抗反射層用基材具有如此之較高水分率,能夠抑制高溫高濕環境下之防眩光層(液晶化合物之配向固化層)之剝落及皺褶。本說明書中所謂「抗反射層用基材之水分率」係指於下文I項中所述之製造方法中貼合抗反射積層體時之抗反射層用基材之水分率。In the embodiment of the present invention, the moisture content of the base material 20 for the antireflection layer is 2.0% by weight or more, preferably 2.4% by weight or more, more preferably 2.7% by weight or more, and further preferably 3.0% by weight or more, particularly It is preferably 3.5% by weight or more. The upper limit of the moisture content of the base material for the antireflection layer is, for example, 5.0% by weight. By making the base material for the anti-reflection layer have such a high moisture content, it is possible to suppress peeling and wrinkling of the anti-glare layer (alignment-cured layer of the liquid crystal compound) under a high temperature and high humidity environment. The “moisture content of the base material for the antireflection layer” in this specification refers to the moisture content of the base material for the antireflection layer when the antireflection laminate is bonded in the manufacturing method described in item I below.
偏光板10之水分率較佳為0.5重量%以上,較佳為0.6重量%以上,更佳為0.8重量%以上,進而較佳為1.0重量%以上。偏光板之水分率之上限例如為2.0重量%。藉由使偏光板具有如此之較高水分率,能夠顯著地抑制偏光板之吸濕膨脹。其結果為,能夠顯著地抑制高溫高濕環境下之偏光板之尺寸變化(尤其是偏光元件於吸收軸方向上之尺寸變化)。藉由此種效果與因上述抗反射層用基材之水分率帶所獲得之效果之協同效應,對於本發明之實施形態之附抗反射層及防眩光層之偏光板,可進一步抑制高溫高濕環境下之防眩光層(液晶化合物之配向固化層)之剝落及皺褶。進而,藉由使偏光板具有如此之較高水分率,本發明之實施形態之附抗反射層及防眩光層之偏光板即便於高溫高濕環境下假定產生捲曲,該捲曲之方向亦成為與通常相反之方向。其結果為,本發明之實施形態之附抗反射層之偏光板即便假定產生捲曲,對圖像顯示裝置造成之不良影響亦能變得較小。如此,藉由因偏光板具有較高水分率所獲得之尺寸變化之抑制與捲曲方向之協同效應,附抗反射層及防眩光層之偏光板於應用於圖像顯示裝置之情形時,能夠顯著地抑制高溫高濕環境下之翹曲、剝落、及/或顯示特性之下降。The moisture content of the polarizing plate 10 is preferably 0.5% by weight or more, more preferably 0.6% by weight or more, more preferably 0.8% by weight or more, and even more preferably 1.0% by weight or more. The upper limit of the moisture content of a polarizing plate is 2.0 weight%, for example. By having such a high moisture content of the polarizing plate, it is possible to significantly suppress the hygroscopic expansion of the polarizing plate. As a result, it is possible to significantly suppress the dimensional change of the polarizing plate (especially the dimensional change of the polarizing element in the absorption axis direction) in a high temperature and high humidity environment. With the synergistic effect of this effect and the effect obtained by the moisture content band of the above-mentioned base material for the anti-reflection layer, the polarizing plate with the anti-reflection layer and the anti-glare layer according to the embodiment of the present invention can further suppress high temperature and high Peeling and wrinkling of the anti-glare layer (alignment-cured layer of liquid crystal compound) in a wet environment. Furthermore, by making the polarizing plate have such a high moisture content, the polarizing plate with an anti-reflection layer and an anti-glare layer according to the embodiment of the present invention assumes curling even in a high-temperature and high-humidity environment. Usually the opposite direction. As a result, even if the polarizing plate with an anti-reflection layer according to the embodiment of the present invention is assumed to be curled, the adverse effect on the image display device can be reduced. In this way, through the synergistic effect of the suppression of the dimensional change and the curling direction obtained due to the higher moisture content of the polarizing plate, the polarizing plate with an anti-reflection layer and an anti-glare layer can be significantly applied to an image display device. In order to suppress warpage, peeling, and / or degradation of display characteristics in a high temperature and high humidity environment.
於圖示例中,僅於偏光元件11之一側設置有保護層12,但亦可視目的而於與保護層12相反側設置另一保護層。於該情形時,可於偏光元件之兩側設置保護層,亦可省略保護層12而僅設置另一保護層。於僅設置另一保護層時,防眩光層用基材50可作為視認側保護層而發揮功能。進而,亦可視目的而設置任意之適宜之功能層。作為功能層之代表例,可列舉相位差層、導電層。功能層之種類、數量、組合、配置位置、特性(例如折射率特性、面內相位差、厚度方向相位差、Nz係數之類的光學特性)可視目的而適宜地設定。於一實施形態中,可於偏光元件11之與保護層12相反側設置具有nx>ny>nz之折射率特性之第1相位差層(未圖示)。於該情形時,較佳為於第1相位差層之與偏光元件相反側可進而設置具有nz>nx>ny之折射率特性之第2相位差層。第1相位差層亦可兼作與偏光元件之視認側相反側之保護層。進而,亦可於偏光元件11之與保護層12相反側設置導電層。藉由在此種位置設置導電層,附抗反射層及防眩光層之偏光板可適宜地用於內置型觸控面板型輸入顯示裝置。於該情形時,相位差層可存在亦可不存在。In the example shown in the figure, a protective layer 12 is provided only on one side of the polarizing element 11, but another protective layer may be provided on the opposite side of the protective layer 12 depending on the purpose. In this case, a protective layer may be provided on both sides of the polarizing element, or the protective layer 12 may be omitted and only another protective layer may be provided. When only another protective layer is provided, the base material 50 for an anti-glare layer can function as a visible-side protective layer. Furthermore, any appropriate functional layer may be provided depending on the purpose. Examples of the functional layer include a retardation layer and a conductive layer. The type, number, combination, arrangement position, and characteristics of the functional layer (such as optical characteristics such as refractive index characteristics, in-plane phase difference, thickness direction phase difference, and Nz coefficient) can be appropriately set depending on the purpose. In one embodiment, a first retardation layer (not shown) having a refractive index characteristic of nx> ny> nz may be provided on the opposite side of the polarizer 11 from the protective layer 12. In this case, it is preferable that a second retardation layer having a refractive index characteristic of nz> nx> ny may be further provided on the opposite side of the first retardation layer from the polarizing element. The first retardation layer may also serve as a protective layer on the side opposite to the viewing side of the polarizer. Furthermore, a conductive layer may be provided on the polarizing element 11 on the side opposite to the protective layer 12. By providing a conductive layer at such a position, a polarizing plate with an anti-reflection layer and an anti-glare layer can be suitably used for a built-in touch panel type input display device. In this case, the retardation layer may or may not exist.
以下,對附抗反射層及防眩光層之偏光板之構成要素進行說明。Hereinafter, the constituent elements of a polarizing plate with an anti-reflection layer and an anti-glare layer will be described.
B.偏光板 B-1.偏光元件 偏光元件11代表性而言係由包含二色性物質之樹脂膜所構成。B. Polarizing plate B-1. Polarizing element The polarizing element 11 is typically composed of a resin film containing a dichroic material.
作為樹脂膜,可採用可用作偏光元件之任意之適宜之樹脂膜。樹脂膜代表性而言為聚乙烯醇系樹脂(以下,稱為「PVA系樹脂」)膜。As the resin film, any appropriate resin film that can be used as a polarizing element can be used. The resin film is typically a polyvinyl alcohol-based resin (hereinafter referred to as "PVA-based resin") film.
作為形成上述PVA系樹脂膜之PVA系樹脂,可使用任意之適宜之樹脂。例如可列舉聚乙烯醇、乙烯-乙烯醇共聚物。聚乙烯醇係藉由將聚乙酸乙烯酯進行皂化而獲得。乙烯-乙烯醇共聚物係藉由將乙烯-乙酸乙烯酯共聚物進行皂化而獲得。PVA系樹脂之皂化度通常為85莫耳%~100莫耳%,較佳為95.0莫耳%~99.95莫耳%,進而較佳為99.0莫耳%~99.93莫耳%。皂化度可依據JIS K 6726-1994而求出。藉由使用此種皂化度之PVA系樹脂,能夠獲得耐久性優異之偏光元件。於皂化度過高之情形時,有發生凝膠化之虞。As the PVA-based resin forming the PVA-based resin film, any appropriate resin can be used. Examples include polyvinyl alcohol and ethylene-vinyl alcohol copolymer. Polyvinyl alcohol is obtained by saponifying polyvinyl acetate. The ethylene-vinyl alcohol copolymer is obtained by saponifying an ethylene-vinyl acetate copolymer. The saponification degree of the PVA-based resin is usually 85 mol% to 100 mol%, preferably 95.0 mol% to 99.95 mol%, and further preferably 99.0 mol% to 99.93 mol%. The degree of saponification can be determined in accordance with JIS K 6726-1994. By using such a PVA resin having a degree of saponification, a polarizing element having excellent durability can be obtained. When the degree of saponification is too high, gelation may occur.
PVA系樹脂之平均聚合度可視目的而適宜地選擇。平均聚合度通常為1000~10000,較佳為1200~4500,進而較佳為1500~4300。再者,平均聚合度可依據JIS K 6726-1994而求出。The average degree of polymerization of the PVA-based resin is appropriately selected depending on the purpose. The average polymerization degree is usually 1000 to 10,000, preferably 1200 to 4500, and further preferably 1500 to 4,300. The average degree of polymerization can be determined in accordance with JIS K 6726-1994.
作為樹脂膜中所含之二色性物質,例如可列舉碘、有機染料等。該等可單獨使用,或將兩種以上組合而使用。較佳為使用碘。其原因在於,例如於藉由利用化學處理之脫色而形成非偏光部之情形時,由於樹脂膜(偏光元件)中所含之碘絡合物會被適宜地還原,故而在用於例如相機部時能夠形成具有適宜特性之非偏光部。Examples of the dichroic substance contained in the resin film include iodine and organic dyes. These may be used alone or in combination of two or more. Preferably, iodine is used. This is because, for example, in the case where a non-polarized portion is formed by decoloring by chemical treatment, the iodine complex contained in the resin film (polarizing element) is appropriately reduced, and is therefore used in, for example, a camera portion In this case, a non-polarized portion having suitable characteristics can be formed.
樹脂膜可為單層之樹脂膜,亦可為兩層以上之積層體。The resin film may be a single-layer resin film or a laminate of two or more layers.
作為由單層之樹脂膜構成之偏光元件之具體例,可列舉對PVA系樹脂膜實施利用碘之染色處理及延伸處理(代表性而言為單軸延伸)而獲得之膜。上述利用碘之染色例如係藉由將PVA系膜浸漬於碘水溶液中而進行。上述單軸延伸之延伸倍率較佳為3~7倍。延伸可於染色處理後進行,亦可一邊染色一邊進行。此外,亦可於延伸後進行染色。視需要對PVA系樹脂膜實施膨潤處理、交聯處理、洗淨處理、乾燥處理等。例如藉由在染色之前將PVA系樹脂膜浸漬於水中而進行水洗,不僅能夠將PVA系膜表面之污垢、防黏連劑洗淨,而且能夠使PVA系樹脂膜膨潤從而防止染色不均等。Specific examples of the polarizing element composed of a single-layer resin film include a film obtained by subjecting a PVA-based resin film to a dyeing treatment and stretching treatment (typically uniaxial stretching) using iodine. The dyeing using iodine is performed, for example, by immersing a PVA-based film in an iodine aqueous solution. The stretching ratio of the uniaxial stretching is preferably 3 to 7 times. Stretching may be performed after the dyeing treatment, or may be performed while dyeing. Alternatively, dyeing may be performed after stretching. If necessary, the PVA-based resin film is subjected to a swelling treatment, a crosslinking treatment, a washing treatment, a drying treatment, and the like. For example, by immersing a PVA-based resin film in water and washing it before dyeing, not only the dirt and anti-blocking agent on the surface of the PVA-based film can be washed, but also the PVA-based resin film can be swelled to prevent uneven dyeing.
作為使用積層體而獲得之偏光元件之具體例,可列舉使用樹脂基材與積層於該樹脂基材上之PVA系樹脂層(PVA系樹脂膜)之積層體、或者樹脂基材與塗佈形成於該樹脂基材上之PVA系樹脂層之積層體而獲得之偏光元件。使用樹脂基材與塗佈形成於該樹脂基材上之PVA系樹脂層之積層體而獲得之偏光元件例如可藉由如下步驟製作:將PVA系樹脂溶液塗佈於樹脂基材上,使其乾燥而於樹脂基材上形成PVA系樹脂層,從而獲得樹脂基材與PVA系樹脂層之積層體;將該積層體進行延伸及染色而將PVA系樹脂層製成偏光元件。於本實施形態中,延伸代表性而言包括使積層體浸漬於硼酸水溶液中而進行延伸。進而,延伸可視需要在硼酸水溶液中之延伸前進而包括將積層體於高溫(例如,95℃以上)下進行空中延伸。所獲得之樹脂基材/偏光元件之積層體可直接使用(即,可將樹脂基材作為偏光元件之保護層),亦可將樹脂基材自樹脂基材/偏光元件之積層體剝離,於該剝離面上積層符合目的之任意之適宜之保護層。此種偏光元件之製造方法之詳細情況例如記載於日本專利特開2012-73580號公報中。該公報之全部記載內容係作為參考而援引至本說明書中。Specific examples of the polarizing element obtained by using a laminated body include a laminated body using a resin substrate and a PVA-based resin layer (PVA-based resin film) laminated on the resin substrate, or a resin substrate and coating A polarizing element obtained by laminating a PVA-based resin layer on the resin substrate. A polarizing element obtained by using a laminate of a resin substrate and a PVA-based resin layer formed on the resin substrate can be produced, for example, by applying a PVA-based resin solution to the resin substrate to make it A PVA-based resin layer is formed on the resin substrate by drying to obtain a laminated body of the resin substrate and the PVA-based resin layer; the laminated body is extended and dyed to make the PVA-based resin layer into a polarizing element. In this embodiment, extending | stretching typically includes immersing a laminated body in the boric-acid aqueous solution, and extending. Furthermore, if necessary, the stretching in the boric acid aqueous solution may include stretching the laminate at a high temperature (for example, 95 ° C. or higher) in the air. The obtained resin substrate / polarizing element laminated body can be used directly (that is, the resin substrate can be used as a protective layer of the polarizing element), or the resin substrate can be peeled from the resin substrate / polarizing element laminated body, and Any appropriate protective layer is laminated on the peeling surface according to the purpose. The details of the method of manufacturing such a polarizer are described in, for example, Japanese Patent Laid-Open No. 2012-73580. The entire contents of this publication are incorporated herein by reference.
偏光元件之厚度較佳為15 μm以下,更佳為1 μm~12 μm,進而較佳為3 μm~10 μm,尤佳為3 μm~8 μm。若偏光元件之厚度為此種範圍,則能夠良好地抑制加熱時之捲曲,及獲得良好之加熱時之外觀耐久性。進而,若偏光元件之厚度為此種範圍,則可有助於附抗反射層之偏光板(結果是圖像顯示裝置)之薄型化。The thickness of the polarizing element is preferably 15 μm or less, more preferably 1 μm to 12 μm, still more preferably 3 μm to 10 μm, and even more preferably 3 μm to 8 μm. When the thickness of the polarizing element is within this range, curling during heating can be well suppressed, and good appearance durability during heating can be obtained. Furthermore, if the thickness of the polarizing element is within this range, it can contribute to the reduction in thickness of the polarizing plate (resulting in an image display device) with an anti-reflection layer.
偏光元件較佳為於波長380 nm~780 nm中之任一波長下顯示出吸收二色性。偏光元件之單獨體透射率較佳為43.0%~46.0%,更佳為44.5%~46.0%。偏光元件之偏光度較佳為97.0%以上,更佳為99.0%以上,進而較佳為99.9%以上。The polarizing element preferably exhibits absorption dichroism at any one of the wavelengths of 380 nm to 780 nm. The individual body transmittance of the polarizing element is preferably 43.0% to 46.0%, and more preferably 44.5% to 46.0%. The degree of polarization of the polarizing element is preferably 97.0% or more, more preferably 99.0% or more, and even more preferably 99.9% or more.
B-2.保護層 作為保護層12,使用任意之適宜之樹脂膜。作為樹脂膜之形成材料,例如可列舉(甲基)丙烯酸系樹脂、二乙醯纖維素、三乙醯纖維素等纖維素系樹脂、降烯系樹脂等環烯烴系樹脂、聚丙烯等烯烴系樹脂、聚對苯二甲酸乙二酯系樹脂等酯系樹脂、聚醯胺系樹脂、聚碳酸酯系樹脂、該等之共聚物樹脂等。再者,所謂「(甲基)丙烯酸系樹脂」係指丙烯酸系樹脂及/或甲基丙烯酸系樹脂。B-2. Protective layer As the protective layer 12, any appropriate resin film is used. Examples of the material for forming the resin film include (meth) acrylic resins, cellulose resins such as diacetyl cellulose, triethyl cellulose, cycloolefin resins such as norbornene resins, and olefin resins such as polypropylene. Resins, ester resins such as polyethylene terephthalate resins, polyamide resins, polycarbonate resins, and copolymer resins thereof. The "(meth) acrylic resin" refers to an acrylic resin and / or a methacrylic resin.
於一實施形態中,作為上述(甲基)丙烯酸系樹脂,使用具有戊二醯亞胺結構之(甲基)丙烯酸系樹脂。具有戊二醯亞胺結構之(甲基)丙烯酸系樹脂(以下,亦稱為戊二醯亞胺樹脂)例如記載於日本專利特開2006-309033號公報、日本專利特開2006-317560號公報、日本專利特開2006-328329號公報、日本專利特開2006-328334號公報、日本專利特開2006-337491號公報、日本專利特開2006-337492號公報、日本專利特開2006-337493號公報、日本專利特開2006-337569號公報、日本專利特開2007-009182號公報、日本專利特開2009-161744號公報、日本專利特開2010-284840號公報中。該等記載係作為參考援引至本說明書中。In one embodiment, as the (meth) acrylic resin, a (meth) acrylic resin having a glutaridine imine structure is used. A (meth) acrylic resin (hereinafter, also referred to as a glutarimide resin) having a glutarimilide structure is described in, for example, Japanese Patent Laid-Open No. 2006-309033 and Japanese Patent Laid-Open No. 2006-317560. Japanese Patent Laid-Open No. 2006-328329, Japanese Patent Laid-Open No. 2006-328334, Japanese Patent Laid-Open No. 2006-337491, Japanese Patent Laid-Open No. 2006-337492, Japanese Patent Laid-Open No. 2006-337493 Japanese Patent Laid-Open No. 2006-337569, Japanese Patent Laid-Open No. 2007-009182, Japanese Patent Laid-Open No. 2009-161744, and Japanese Patent Laid-Open No. 2010-284840. These records are incorporated herein by reference.
保護層12之透濕度較佳為1.0 g/m2 /24hr以下,更佳為0.8 g/m2 /24hr以下,進而較佳為0.6 g/m2 /24hr以下,尤佳為0.4 g/m2 /24hr以下。若保護層之透濕度為此種範圍,則能夠進一步抑制高溫高濕環境下之尺寸變化,結果能夠進一步抑制防眩光層之剝落及皺褶。The moisture permeability of the protective layer 12 is preferably 1.0 g / m 2 / 24hr or less, more preferably 0.8 g / m 2 / 24hr or less, still more preferably 0.6 g / m 2 / 24hr or less, and even more preferably 0.4 g / m 2 / 24hr or less. If the moisture permeability of the protective layer is within this range, it is possible to further suppress dimensional changes in a high-temperature and high-humidity environment, and as a result, it is possible to further suppress peeling and wrinkles of the anti-glare layer.
保護層之厚度代表性而言為10 μm~100 μm,較佳為20 μm~40 μm。保護層代表性而言係經由接著層(具體為接著劑層、黏著劑層)積層於偏光元件上。接著劑層代表性而言係由PVA系接著劑、活化能量射線硬化型接著劑所形成。黏著劑層代表性而言係由丙烯酸系黏著劑所形成。The thickness of the protective layer is typically 10 μm to 100 μm, and preferably 20 μm to 40 μm. The protective layer is typically laminated on the polarizing element via an adhesive layer (specifically, an adhesive layer and an adhesive layer). The adhesive layer is typically formed of a PVA-based adhesive and an activated energy ray-curable adhesive. The adhesive layer is typically formed of an acrylic adhesive.
C.防眩光層 防眩光層係為了防止圖像顯示裝置之使用者之臉、圖像顯示裝置之鍵盤、外界光(例如,螢光燈)等之眩光而設置。於本發明之實施形態中,防眩光層是液晶化合物之配向固化層。抑制高溫高濕環境下之防眩光層之剝落及皺褶係本發明之特徵之一。C. Anti-glare layer The anti-glare layer is provided to prevent glare on the face of the user of the image display device, the keyboard of the image display device, external light (for example, fluorescent light), and the like. In the embodiment of the present invention, the anti-glare layer is an alignment cured layer of a liquid crystal compound. It is one of the features of the present invention to suppress the peeling and wrinkling of the anti-glare layer in a high temperature and high humidity environment.
防眩光層代表性而言為液晶化合物之配向固化層。本說明書中所謂「配向固化層」係指液晶化合物於層內沿特定方向進行配向,且其配向狀態固定之層。再者,「配向固化層」係包括使液晶單體硬化而獲得之配向硬化層在內之概念。液晶化合物可為棒狀液晶化合物,亦可為碟型(圓盤狀)液晶化合物,亦可為該等之組合。The anti-glare layer is typically an alignment cured layer of a liquid crystal compound. The "alignment-cured layer" in this specification refers to a layer in which a liquid crystal compound is aligned in a specific direction in a layer, and the alignment state is fixed. The term "alignment-cured layer" refers to a concept including an alignment-hardened layer obtained by curing a liquid crystal monomer. The liquid crystal compound may be a rod-shaped liquid crystal compound, a dish-shaped (disk-shaped) liquid crystal compound, or a combination of these.
於一實施形態中,防眩光層包含碟型液晶化合物。更詳細而言,防眩光層係使碟型液晶化合物以沿特定之方向配向之狀態固定化而獲得之層。所謂碟型液晶化合物一般係指具有將苯、1,3,5-三、杯芳烴等環狀母核配置於分子中心,且直鏈之烷基、烷氧基、取代苯甲醯氧基等作為其側鏈以放射狀取代之圓盤狀分子結構的液晶化合物。作為碟型液晶之代表例,可列舉C. Destrade等之研究報告、Mol. Cryst. Liq. Cryst. 71卷、111頁(1981年)中所記載之苯衍生物、聯三伸苯衍生物、參茚并苯衍生物、酞菁衍生物、B.Kohne等之研究報告、Angew. Chem.96卷、70頁(1984年)中所記載之環己烷衍生物、及J. M.Lehn等之研究報告、J. Chem. Soc. Chem. Commun.,1794頁(1985年)、J. Zhang等之研究報告、J. Am. Chem. Soc. 116卷、2655頁(1994年)中所記載之氮雜冠系、苯乙炔系之大環。作為碟型液晶化合物之進一步之具體例,例如可列舉日本專利特開2006-133652號公報、日本專利特開2007-108732號公報、日本專利特開2010-244038號公報、日本專利特開2014-214177號公報中所記載之化合物。上述文獻及公報之記載係作為參考而援引至本說明書中。包含碟型液晶化合物之防眩光層代表性而言可為具有nx=nz>ny之折射率特性之所謂負型A板。In one embodiment, the anti-glare layer includes a dish-type liquid crystal compound. More specifically, the anti-glare layer is a layer obtained by fixing a dish-type liquid crystal compound in a state of being aligned in a specific direction. The so-called dish-shaped liquid crystal compound generally refers to a linear alkyl group, an alkoxy group, a substituted benzamyloxy group, and the like. A liquid crystal compound having a disc-shaped molecular structure in which side chains are radially substituted. Typical examples of dish-type liquid crystals include C. Destrade's research report, Mol. Cryst. Liq. Cryst. Vol. 71, p. 111 (1981), benzene derivatives, terphenylene derivatives, Research reports on indene benzene derivatives, phthalocyanine derivatives, B. Kohne, etc., Angew. Chem. 96, page 70 (1984), cyclohexane derivatives, and research reports by JMLehn, etc. , J. Chem. Soc. Chem. Commun., Page 1794 (1985), research report by J. Zhang et al., J. Am. Chem. Soc. Volume 116, page 2655 (1994) Crown ring, phenylacetylene ring. Further specific examples of the dish-type liquid crystal compound include, for example, Japanese Patent Laid-Open No. 2006-133652, Japanese Patent Laid-Open No. 2007-108732, Japanese Patent Laid-Open No. 2010-244038, and Japanese Patent Laid-Open No. 2014- The compound described in Japanese Patent No. 214177. The descriptions of the above-mentioned documents and gazettes are incorporated herein by reference. The anti-glare layer containing a dish-type liquid crystal compound may be a so-called negative A plate having a refractive index characteristic of nx = nz> ny.
於另一實施形態中,防眩光層包含棒狀液晶化合物。更詳細而言,防眩光層係以棒狀液晶化合物沿特定方向(代表性而言為遲相軸方向)排列之狀態進行配向(水平配向(homogeneous alignment))。作為棒狀液晶化合物,例如可列舉液晶相為向列相之液晶化合物(向列液晶)。作為此種液晶化合物,例如可使用液晶聚合物或液晶單體。液晶化合物之液晶性之表現機制為溶致或熱致均可。液晶聚合物及液晶單體可分別單獨使用,亦可加以組合。作為液晶單體,可採用任意之適宜之液晶單體。例如可使用日本專利特表2002-533742(WO00/37585)、EP358208 (US5211877)、EP66137(US4388453)、WO93/22397、EP0261712、DE19504224、DE4408171、及GB2280445等中所記載之聚合性液晶原基化合物等。作為此種聚合性液晶原基化合物之具體例,例如可列舉BASF公司之商品名LC242、Merck公司之商品名E7、Wacker-Chem公司之商品名LC-Sillicon-CC3767。作為液晶單體,較佳為例如向列性液晶單體。液晶化合物之具體例係記載於例如日本專利特開2006-163343號公報中。該公報之記載係作為參考而援引至本說明書中。包含棒狀液晶化合物之防眩光層代表性而言可為具有nx>ny=nz之折射率特性之所謂正型A板。In another embodiment, the anti-glare layer includes a rod-like liquid crystal compound. In more detail, the anti-glare layer is aligned (homogeneous alignment) in a state where the rod-like liquid crystal compounds are aligned in a specific direction (typically, the direction of the slow axis). Examples of the rod-shaped liquid crystal compound include a liquid crystal compound whose liquid crystal phase is a nematic phase (nematic liquid crystal). As such a liquid crystal compound, for example, a liquid crystal polymer or a liquid crystal monomer can be used. The liquid crystal properties of a liquid crystal compound can be lyotropic or thermotropic. The liquid crystal polymer and the liquid crystal monomer may be used individually or in combination. As the liquid crystal monomer, any appropriate liquid crystal monomer can be used. For example, the polymerizable liquid crystal primitive compounds described in Japanese Patent Publication No. 2002-533742 (WO00 / 37585), EP358208 (US5211877), EP66137 (US4388453), WO93 / 22397, EP0261712, DE19504224, DE4408171, and GB2280445 can be used. . Specific examples of such a polymerizable liquid crystal priming compound include, for example, the trade name LC242 of BASF, the trade name E7 of Merck, and the trade name LC-Sillicon-CC3767 of Wacker-Chem. The liquid crystal monomer is preferably, for example, a nematic liquid crystal monomer. Specific examples of the liquid crystal compound are described in, for example, Japanese Patent Laid-Open No. 2006-163343. The contents of this publication are incorporated herein by reference. The anti-glare layer containing a rod-like liquid crystal compound may be a so-called positive A plate having a refractive index characteristic of nx> ny = nz.
防眩光層代表性而言可作為λ/2板而發揮功能。防眩光層作為λ/2板而發揮功能時,可藉由控制其配向角(或遲相軸方向),而良好地防止眩光。此種防眩光層之面內相位差Re(550)為220 nm~320 nm,更佳為240 nm~300 nm,進而較佳為250 nm~280 nm。此處,Re(550)係23℃下利用波長為550 nm之光所測得之面內相位差。Re(550)於將層(膜)之厚度設為d(nm)時根據Re(550)=(nx-ny)×d而求出。nx係面內之折射率成為最大之方向(即遲相軸方向)之折射率,ny係於面內與遲相軸正交之方向(即進相軸方向)之折射率。The anti-glare layer typically functions as a λ / 2 plate. When the anti-glare layer functions as a λ / 2 plate, it is possible to prevent glare well by controlling its alignment angle (or the direction of the late axis). The in-plane retardation Re (550) of such an anti-glare layer is 220 nm to 320 nm, more preferably 240 nm to 300 nm, and even more preferably 250 nm to 280 nm. Here, Re (550) is an in-plane phase difference measured with light having a wavelength of 550 nm at 23 ° C. Re (550) is calculated from Re (550) = (nx-ny) × d when the thickness of the layer (film) is d (nm). nx is the refractive index in the direction where the refractive index in the plane becomes the largest (that is, the direction of the late phase axis), and ny is the refractive index in the plane that is orthogonal to the late phase axis (that is, the direction of the phase axis).
防眩光層40之遲相軸與偏光元件11之吸收軸所成之角度較佳為35°~55°,更佳為40°~50°,進而較佳為約45°。藉由將作為λ/2板而發揮功能之防眩光層以此種軸角度進行配置,能夠良好地防止眩光。The angle formed by the late phase axis of the anti-glare layer 40 and the absorption axis of the polarizing element 11 is preferably 35 ° to 55 °, more preferably 40 ° to 50 °, and even more preferably about 45 °. By arranging the anti-glare layer functioning as a λ / 2 plate at such an axis angle, it is possible to prevent glare well.
防眩光層之厚度較佳為1 μm~5 μm,更佳為1 μm~3 μm。根據本發明之實施形態,即使為如此薄之防眩光層,亦能夠良好地抑制高溫高濕環境下之剝落及皺褶。The thickness of the anti-glare layer is preferably 1 μm to 5 μm, and more preferably 1 μm to 3 μm. According to the embodiment of the present invention, even with such a thin anti-glare layer, peeling and wrinkling in a high-temperature and high-humidity environment can be well suppressed.
於將配向膜用於液晶化合物之配向之情形時,附抗反射層及防眩光層之偏光板於防眩光層40與防眩光層用基材50之間進而具備配向膜。配向膜一般包含聚合物材料作為主要成分。作為聚合物材料之代表例,可列舉聚乙烯醇、聚醯亞胺、及該等之衍生物。於本發明之實施形態中,較佳為改性或未改性之聚乙烯醇。作為配向膜,例如可使用WO01/88574A1、日本專利第3907735號中所記載之改性聚乙烯醇。對於配向膜,代表性而言係實施配向處理。作為配向處理之代表例,可列舉摩擦處理、光配向處理。摩擦處理由於在業界眾所周知,故而省略詳細說明。作為經光配向處理之配向膜(光配向膜),例如可使用WO2005/096041中所記載之配向膜、Rolic echnologies公司製造之商品名LPP-JP265CP等。配向膜之厚度例如為0.01 μm~10 μm,較佳為0.01 μm~1 μm,更佳為0.01 μm~0.5 μm。When an alignment film is used for the alignment of a liquid crystal compound, a polarizing plate with an anti-reflection layer and an anti-glare layer is further provided with an alignment film between the anti-glare layer 40 and the base material 50 for the anti-glare layer. The alignment film generally includes a polymer material as a main component. Typical examples of the polymer material include polyvinyl alcohol, polyimide, and derivatives thereof. In the embodiment of the present invention, modified or unmodified polyvinyl alcohol is preferred. As the alignment film, for example, the modified polyvinyl alcohol described in WO01 / 88574A1, Japanese Patent No. 3907735 can be used. The alignment film is typically subjected to an alignment process. Typical examples of the alignment process include a rubbing process and a photo-alignment process. Since the rubbing treatment is well known in the industry, detailed description is omitted. As the alignment film (photo-alignment film) subjected to the photo-alignment treatment, for example, an alignment film described in WO2005 / 096041, a trade name LPP-JP265CP manufactured by Rolic echnologies, etc. can be used. The thickness of the alignment film is, for example, 0.01 μm to 10 μm, preferably 0.01 μm to 1 μm, and more preferably 0.01 μm to 0.5 μm.
防眩光層例如可藉由以下之步驟而形成。首先,於防眩光層用基材上塗佈配向膜形成用塗佈液,使其乾燥而形成塗佈膜。對該塗佈膜沿特定方向實施摩擦處理,於防眩光層用基材上形成配向膜。該特定之方向可與所獲得之防眩光層之遲相軸方向對應。其次,於所形成之配向膜上塗佈防眩光層形成用塗佈液(例如包含液晶化合物與視需要之交聯性單體之溶液)並加熱。藉由加熱,將塗佈液之溶劑除去,並且進行液晶化合物之配向。加熱可以1個階段進行,亦可改變溫度而以多階段進行。繼而,藉由紫外線照射使交聯性(或聚合性)單體交聯(或聚合),將液晶化合物之配向固定化。如此進行操作,而於防眩光層用基材上(實質為於配向膜上)形成防眩光層。再者,使碟型液晶化合物配向之方法係記載於例如日本專利特開2014-214177號公報中,使棒狀液晶化合物配向之方法係記載於例如日本專利特開2006-163343號公報中。該等公報之記載係作為參考而援引至本說明書中。再者,配向膜根據所需之配向狀態及液晶化合物之種類等而可省略。The anti-glare layer can be formed by, for example, the following steps. First, a coating liquid for forming an alignment film is applied to a base material for an anti-glare layer, and dried to form a coating film. This coating film is subjected to a rubbing treatment in a specific direction to form an alignment film on a base material for an anti-glare layer. The specific direction may correspond to the retarded axis direction of the obtained anti-glare layer. Next, a coating liquid for forming an anti-glare layer (for example, a solution containing a liquid crystal compound and optionally a crosslinkable monomer) is applied to the formed alignment film, and then heated. By heating, the solvent of the coating liquid is removed, and the liquid crystal compound is aligned. The heating may be performed in one step, or may be performed in multiple steps by changing the temperature. Then, the crosslinkable (or polymerizable) monomer is crosslinked (or polymerized) by ultraviolet irradiation, and the alignment of the liquid crystal compound is fixed. In this way, an anti-glare layer is formed on the base material for an anti-glare layer (essentially on the alignment film). In addition, a method of aligning a dish-type liquid crystal compound is described in, for example, Japanese Patent Laid-Open No. 2014-214177, and a method of aligning a rod-shaped liquid crystal compound is described in, for example, Japanese Patent Laid-Open No. 2006-163343. The descriptions of these publications are incorporated herein by reference. In addition, the alignment film can be omitted depending on the required alignment state, the type of the liquid crystal compound, and the like.
D.防眩光層用基材 防眩光層用基材50係為了形成防眩光層50而使用。D. Base material for anti-glare layer The base material 50 for anti-glare layer is used for forming the anti-glare layer 50.
作為防眩光層用基材,使用任意之適宜之樹脂膜。作為樹脂膜之形成材料,例如可列舉聚對苯二甲酸乙二酯(PET)等聚酯系樹脂、降烯系樹脂等環烯烴系樹脂、藉由環烯烴(例如,降烯)與α-烯烴(例如,乙烯)之加成聚合而獲得之樹脂(COC)、三乙醯纖維素(TAC)等纖維素系樹脂。As the base material for the anti-glare layer, any appropriate resin film is used. Examples of the material for forming the resin film include polyester resins such as polyethylene terephthalate (PET), cycloolefin-based resins such as norbornene-based resins, and cycloolefins (for example, norbornene) and α- Cellulose-based resins such as resins (COC) and triethyl cellulose (TAC) obtained by addition polymerization of olefins (for example, ethylene).
防眩光層用基材之厚度可視目的而適宜地設定。防眩光層用基材之厚度代表性而言為20 μm~200 μm,較佳為25 μm~100 μm。The thickness of the base material for the anti-glare layer is appropriately set depending on the purpose. The thickness of the base material for the anti-glare layer is typically 20 μm to 200 μm, and preferably 25 μm to 100 μm.
E.抗反射層用基材 E-1.抗反射層用基材本體 抗反射層用基材20係為了形成抗反射層30而使用。如下文所述藉由在抗反射層用基材上形成抗反射層,將抗反射層用基材/抗反射層之積層體貼合於偏光板上,變得不需要將偏光板供於抗反射層形成製程(代表性而言為濺鍍)。其結果為,由於偏光板變得不會暴露於高溫中,故而能夠將偏光板之水分率維持於上述所需之範圍內。E. Base material for antireflection layer E-1. Base body for antireflection layer The base material 20 for antireflection layer is used to form the antireflection layer 30. As described below, by forming an anti-reflection layer on the base material for the anti-reflection layer, the laminated body of the base material for the anti-reflection layer / anti-reflection layer is bonded to the polarizing plate, and it becomes unnecessary to provide the polarizing plate for the anti-reflection A layer formation process (typically, sputtering). As a result, since the polarizing plate is not exposed to high temperatures, the moisture content of the polarizing plate can be maintained within the above-mentioned required range.
抗反射層用基材之形成材料及厚度與上述之防眩光層用基材相同。The material and thickness of the base material for the anti-reflection layer are the same as those of the base material for the anti-glare layer.
如上所述,抗反射層用基材20之水分率為2.0重量%以上,較佳為2.4重量%以上,更佳為2.7重量%以上,進而較佳為3.0重量%以上,尤佳為3.5重量%以上。水分率之上限例如為5.0重量%。藉由使抗反射層用基材具有如此之較高水分率,可抑制高溫高濕環境下之抗反射層用基材之膨脹及收縮。追隨於此,亦可抑制防眩光層用基材之膨脹及收縮。其結果為,由於即便於高溫高濕環境下防眩光層(液晶化合物之配向固化層)亦可追隨於防眩光層用基材之膨脹及收縮,故而可抑制防眩光層之剝落及皺褶。抗反射層用基材之如此高之水分率可藉由將抗反射層用基材供於加濕處理而實現。加濕處理只要可對抗反射層用基材賦予上述所需之水分率,則可藉由任意之適宜之方法及條件而進行。加濕處理例如可藉由將抗反射層用基材於65℃及90%RH之環境下放置24小時而進行。As described above, the moisture content of the base material 20 for the antireflection layer is 2.0% by weight or more, preferably 2.4% by weight or more, more preferably 2.7% by weight or more, still more preferably 3.0% by weight or more, and even more preferably 3.5% by weight. %the above. The upper limit of the moisture content is, for example, 5.0% by weight. By making the base material for the antireflection layer have such a high moisture content, it is possible to suppress the expansion and contraction of the base material for the antireflection layer in a high temperature and high humidity environment. Following this, the expansion and contraction of the base material for the anti-glare layer can also be suppressed. As a result, since the anti-glare layer (alignment-cured layer of the liquid crystal compound) can follow the expansion and contraction of the base material for the anti-glare layer even in a high-temperature and high-humidity environment, peeling and wrinkles of the anti-glare layer can be suppressed. Such a high moisture content of the base material for the antireflection layer can be achieved by supplying the base material for the antireflection layer to a humidification treatment. The humidification treatment can be performed by any appropriate method and conditions as long as the base material for the anti-reflection layer can provide the above-mentioned required moisture content. The humidification treatment can be performed, for example, by leaving the base material for the antireflection layer in an environment of 65 ° C. and 90% RH for 24 hours.
抗反射層用基材於65℃及90%RH下保持24小時後之尺寸變化率較佳為未達0.03%,更佳為-0.03%~0.0%。該尺寸變化率代表性而言為與搬送方向正交之方向之尺寸變化率。再者,尺寸變化率為正時表示膨脹,為負時表示收縮。The dimensional change rate of the substrate for the antireflection layer after being held at 65 ° C and 90% RH for 24 hours is preferably less than 0.03%, and more preferably -0.03% to 0.0%. This dimensional change rate is typically a dimensional change rate in a direction orthogonal to the conveyance direction. When the dimensional change rate is positive, it indicates expansion, and when it is negative, it indicates contraction.
E-2.硬塗層 如上所述,亦可於抗反射層用基材之抗反射層側之表面形成硬塗層。藉由形成硬塗層,具有鉛筆硬度提高之優點。進而,藉由適宜地調整硬塗層與抗反射層之折射率差,能夠使反射率進一步下降。E-2. Hard coat layer As described above, a hard coat layer may be formed on the surface of the antireflection layer side of the base material for the antireflection layer. By forming a hard coat layer, there is an advantage that pencil hardness is improved. Furthermore, by appropriately adjusting the refractive index difference between the hard coat layer and the antireflection layer, the reflectance can be further reduced.
硬塗層較佳為具有充分之表面硬度、優異之機械強度、及優異之透光性。硬塗層只要具有此種所需特性,則可由任意之適宜之樹脂形成。作為樹脂之具體例,可列舉熱硬化型樹脂、熱塑型樹脂、紫外線硬化型樹脂、電子束硬化型樹脂、二液混合型樹脂。較佳為紫外線硬化型樹脂。其原因在於,能夠以簡便之操作及高效率形成硬塗層。The hard coating layer preferably has sufficient surface hardness, excellent mechanical strength, and excellent light transmittance. The hard coat layer may be formed of any appropriate resin as long as it has such required characteristics. Specific examples of the resin include a thermosetting resin, a thermoplastic resin, an ultraviolet curing resin, an electron beam curing resin, and a two-liquid mixed resin. An ultraviolet curable resin is preferred. This is because a hard coat layer can be formed with simple operation and high efficiency.
作為紫外線硬化型樹脂之具體例,可列舉聚酯系、丙烯酸系、胺基甲酸酯系、醯胺系、聚矽氧系、環氧系之紫外線硬化型樹脂。紫外線硬化型樹脂中可包含紫外線硬化型之單體、低聚物、聚合物。作為較佳之紫外線硬化型樹脂,可列舉包含具有較佳為2個以上、更佳為3~6個紫外線聚合性之官能基之丙烯酸系之單體成分或低聚物成分的樹脂組合物。代表性而言,紫外線硬化型樹脂中調配有光聚合起始劑。Specific examples of the ultraviolet-curable resin include polyester-based, acrylic-based, urethane-based, ammonium-based, silicone-based, and epoxy-based ultraviolet-curable resins. The ultraviolet-curable resin may include a monomer, oligomer, and polymer of an ultraviolet-curable type. As a preferable ultraviolet curable resin, the resin composition containing the acrylic monomer component or oligomer component which has 2 or more, and more preferably, 3 to 6 ultraviolet polymerizable functional groups is mentioned. Typically, a photopolymerization initiator is blended in the ultraviolet curable resin.
硬塗層可藉由任意之適宜之方法而形成。例如硬塗層可藉由在抗反射層用基材上塗裝硬塗層形成用樹脂組合物,使其乾燥,對乾燥後之塗裝膜照射紫外線使其硬化而形成。The hard coat layer can be formed by any appropriate method. For example, the hard coat layer can be formed by applying a resin composition for forming a hard coat layer on a base material for an antireflection layer and drying it, and irradiating the dried coating film with ultraviolet rays to harden it.
硬塗層之厚度例如為0.5 μm~20 μm,較佳為1 μm~15 μm。The thickness of the hard coat layer is, for example, 0.5 μm to 20 μm, and preferably 1 μm to 15 μm.
關於硬塗層、以及硬塗層與抗反射層之密接結構之詳細情況,記載於例如日本專利特開2016-224443號公報中。該公報之記載係作為參考而援引至本說明書中。Details of the hard coat layer and the adhesion structure between the hard coat layer and the antireflection layer are described in, for example, Japanese Patent Laid-Open No. 2016-224443. The contents of this publication are incorporated herein by reference.
F.抗反射層 作為抗反射層之構成,可採用任意之適宜之構成。作為抗反射層之代表性之構成,可列舉(1)光學膜厚為120 nm~140 nm且折射率為1.35~1.55左右之低折射率層之單一層;(2)自抗反射層用基材側起依序具有中折射率層、高折射率層及低折射率層之積層體;(3)高折射率層與低折射率層之交替多層積層體。F. Anti-reflection layer As the constitution of the anti-reflection layer, any appropriate constitution can be adopted. As a representative structure of the antireflection layer, (1) a single layer of a low refractive index layer having an optical film thickness of 120 nm to 140 nm and a refractive index of about 1.35 to 1.55; (2) a base for the self-reflection layer A laminated body having a middle refractive index layer, a high refractive index layer, and a low refractive index layer in order from the material side; (3) an alternating multilayer laminated body of a high refractive index layer and a low refractive index layer.
作為可形成低折射率層之材料,例如可列舉氧化矽(SiO2 )、氟化鎂(MgF2 )。低折射率層之折射率代表性而言為1.35~1.55左右。作為可形成高折射率層之材料,例如可列舉氧化鈦(TiO2 )、氧化鈮(Nb2 O3 或Nb2 O5 )、摻錫氧化銦(ITO)、摻銻氧化錫(ATO)、ZrO2 -TiO2 。高折射率層之折射率代表性而言為1.60~2.20左右。作為可形成中折射率層之材料,例如可列舉氧化鈦(TiO2 )、可形成低折射率層之材料與可形成高折射率層之材料之混合物(例如氧化鈦與氧化矽之混合物)。中折射率層之折射率代表性而言為1.50~1.85左右。低折射率層、中折射率層及高折射率層之厚度可以實現抗反射層之層結構、與所需之抗反射性能等對應之適宜之光學膜厚之方式設定。Examples of a material capable of forming a low refractive index layer include silicon oxide (SiO 2 ) and magnesium fluoride (MgF 2 ). The refractive index of the low refractive index layer is typically about 1.35 to 1.55. Examples of the material capable of forming a high refractive index layer include titanium oxide (TiO 2 ), niobium oxide (Nb 2 O 3 or Nb 2 O 5 ), tin-doped indium oxide (ITO), antimony-doped tin oxide (ATO), ZrO 2 -TiO 2 . The refractive index of the high refractive index layer is typically about 1.60 to 2.20. Examples of the material capable of forming the middle refractive index layer include titanium oxide (TiO 2 ), a mixture of a material capable of forming a low refractive index layer and a material capable of forming a high refractive index layer (for example, a mixture of titanium oxide and silicon oxide). The refractive index of the middle refractive index layer is typically about 1.50 to 1.85. The thicknesses of the low-refractive index layer, the middle-refractive index layer, and the high-refractive index layer can be set in such a manner that the layer structure of the anti-reflection layer and the appropriate optical film thickness corresponding to the required anti-reflection performance are set.
抗反射層代表性而言係藉由乾式製程而形成。作為乾式製程之具體例,可列舉PVD(Physical Vapor Deposition,物理氣相沈積)法、CVD(Chemical Vapor Deposition,化學氣相沈積)法。作為PVD法,可列舉真空蒸鍍法、反應性蒸鍍法、離子束輔助法、濺鍍法、離子鍍法。作為CVD法,可列舉電漿CVD法。較佳為濺鍍法。The antireflection layer is typically formed by a dry process. Specific examples of the dry process include a PVD (Physical Vapor Deposition) method and a CVD (Chemical Vapor Deposition) method. Examples of the PVD method include a vacuum vapor deposition method, a reactive vapor deposition method, an ion beam assisted method, a sputtering method, and an ion plating method. Examples of the CVD method include a plasma CVD method. A sputtering method is preferable.
抗反射層之厚度例如為20 nm~300 nm左右。The thickness of the anti-reflection layer is, for example, about 20 nm to 300 nm.
抗反射層於波長400 nm~700 nm之範圍內之最大反射率與最小反射率之差較佳為2.0%以下,更佳為1.9%以下,進而較佳為1.8%以下。若最大反射率與最小反射率之差為此種範圍,則可良好地防止反射光之著色。The difference between the maximum reflectance and the minimum reflectance of the anti-reflection layer in the wavelength range of 400 nm to 700 nm is preferably 2.0% or less, more preferably 1.9% or less, and still more preferably 1.8% or less. If the difference between the maximum reflectance and the minimum reflectance is within this range, the coloring of the reflected light can be prevented well.
視需要可於抗反射層之表面設置防污層。防污層例如包含含氟基之矽烷系化合物(例如具有全氟聚醚基之烷氧基矽烷化合物)或含氟基之有機化合物。防污層較佳為顯示出水接觸角為110度以上之防水性。If necessary, an antifouling layer can be provided on the surface of the anti-reflection layer. The antifouling layer contains, for example, a fluorine-containing silane-based compound (for example, an alkoxysilane compound having a perfluoropolyether group) or a fluorine-containing organic compound. The antifouling layer preferably exhibits water resistance with a water contact angle of 110 degrees or more.
G.第1相位差層 第1相位差層可視目的由具有任意之適宜之光學特性及/或機械特性之相位差膜構成。於一實施形態中,第1相位差層可作為λ/2板而發揮功能。藉由使第1相位差層作為λ/2板而發揮功能,針對與作為λ/4板而發揮功能之第2相位差層積層後之波長分散特性(尤其是相位差偏離λ/4之波長範圍),可適宜地調節相位差。此種第1相位差層之面內相位差Re(550)較佳為220 nm~320 nm,更佳為240 nm~300 nm,進而較佳為250 nm~280 nm。G. First retardation layer The first retardation layer may be formed of a retardation film having any suitable optical characteristics and / or mechanical characteristics. In one embodiment, the first retardation layer can function as a λ / 2 plate. By making the first retardation layer function as a λ / 2 plate, the wavelength dispersion characteristics (especially the wavelengths whose retardation deviates from λ / 4) of the second retardation layer functioning as a λ / 4 plate are laminated. Range), the phase difference can be adjusted appropriately. The in-plane retardation Re (550) of such a first retardation layer is preferably 220 nm to 320 nm, more preferably 240 nm to 300 nm, and even more preferably 250 nm to 280 nm.
第1相位差層之厚度可以能夠作為λ/2板最適宜地發揮功能之方式設定。換言之,厚度可以獲得所需之面內相位差之方式設定。具體而言,厚度較佳為10 μm~60 μm,更佳為30 μm~50 μm。The thickness of the first retardation layer can be set as a mode in which the λ / 2 plate functions optimally. In other words, the thickness is set in such a way that the required in-plane phase difference can be obtained. Specifically, the thickness is preferably 10 μm to 60 μm, and more preferably 30 μm to 50 μm.
第1相位差層較佳為折射率特性顯示出nx>ny>nz之關係。第1相位差層之Nz係數較佳為1.1~3.0,更佳為1.3~2.7。Nz係數係藉由Nz=Rth/Re而求出。Rth為厚度方向之相位差,例如Rth(550)為23℃下利用波長550 nm之光所測得之厚度方向之相位差。Rth(550)係藉由Rth=(nx-nz)×d而求出。nz為厚度方向之折射率。The first retardation layer preferably has a refractive index characteristic showing a relationship of nx> ny> nz. The Nz coefficient of the first retardation layer is preferably 1.1 to 3.0, and more preferably 1.3 to 2.7. The Nz coefficient is obtained by Nz = Rth / Re. Rth is the phase difference in the thickness direction. For example, Rth (550) is the phase difference in the thickness direction measured by light with a wavelength of 550 nm at 23 ° C. Rth (550) is obtained by Rth = (nx-nz) × d. nz is the refractive index in the thickness direction.
第1相位差層可以其遲相軸與偏光元件之吸收軸形成較佳為10°~20°、更佳為12°~18°、進而較佳為約15°之角度之方式配置。再者,於本說明書中言及角度時,包括順時針及逆時針兩者。The first retardation layer may be arranged such that the retardation axis and the absorption axis of the polarizing element form an angle of preferably 10 ° to 20 °, more preferably 12 ° to 18 °, and even more preferably about 15 °. In addition, when referring to angle in this specification, it includes both clockwise and counterclockwise.
第1相位差層包含光彈性係數之絕對值較佳為2×10-11 m2 /N以下、更佳為2.0×10-13 m2 /N~1.5×10-11 m2 /N、進而較佳為1.0×10-12 m2 /N~1.2×10-11 m2 /N之樹脂。若光彈性係數之絕對值為此種範圍,則於產生了加熱時之收縮應力之情形時不易產生相位差變化。因此,藉由使用具有此種光彈性係數之絕對值之樹脂而形成第1相位差層,於將附抗反射層及防眩光層之偏光板應用於圖像顯示裝置中之情形時可良好地防止熱不均。The absolute value of the first retardation layer including the photoelastic coefficient is preferably 2 × 10 -11 m 2 / N or less, more preferably 2.0 × 10 -13 m 2 / N to 1.5 × 10 -11 m 2 / N, and further preferably 1.0 × 10 -12 m 2 /N~1.2×10 -11 m 2 / N of the resin. If the absolute value of the photoelastic coefficient is in this range, it is difficult to cause a change in phase difference when a shrinkage stress during heating is generated. Therefore, by using a resin having such an absolute value of the photoelastic coefficient to form the first retardation layer, the polarizing plate with an anti-reflection layer and an anti-glare layer can be used well in an image display device. Prevent heat unevenness.
第1相位差層可顯示出相位差值根據測定光之波長而變大之逆分散波長特性,亦可顯示出相位差值根據測定光之波長而變小之正之波長分散特性,亦可顯示出相位差值根據測定光之波長幾乎不變化之平坦之波長分散特性。較佳為顯示出平坦之波長分散特性。具體而言,第1相位差層之Re(450)/Re(550)較佳為0.99~1.03,Re(650)/Re(550)較佳為0.98~1.02。藉由將具有平坦之波長分散特性之λ/2板(第1相位差層)與λ/4板(第2相位差層)以特定之軸角度進行配置,能夠獲得與理想之逆波長分散特性接近之特性,結果能夠實現非常優異之抗反射特性。The first retardation layer can display inverse dispersion wavelength characteristics in which the retardation value becomes larger according to the wavelength of the measurement light, and can also display positive wavelength dispersion characteristics in which the retardation value becomes smaller according to the wavelength of the measurement light, and can also display The retardation value is based on a flat wavelength dispersion characteristic that hardly changes the wavelength of the measurement light. It is preferable to exhibit flat wavelength dispersion characteristics. Specifically, the Re (450) / Re (550) of the first retardation layer is preferably 0.99 to 1.03, and the Re (650) / Re (550) is preferably 0.98 to 1.02. By arranging the λ / 2 plate (the first retardation layer) and the λ / 4 plate (the second retardation layer) having a flat wavelength dispersion characteristic at a specific axis angle, it is possible to obtain the inverse wavelength dispersion characteristic from the ideal As a result, it is possible to achieve very excellent anti-reflection characteristics.
第1相位差層可由可滿足如上所述特性之任意之適宜之樹脂膜構成。作為此種樹脂之代表例,可列舉環狀烯烴系樹脂、聚碳酸酯系樹脂、纖維素系樹脂、聚酯系樹脂、聚乙烯醇系樹脂、聚醯胺系樹脂、聚醯亞胺系樹脂、聚醚系樹脂、聚苯乙烯系樹脂、丙烯酸系樹脂。其中,可適宜地使用環狀烯烴系樹脂。第1相位差層例如係藉由將由上述樹脂形成之膜進行延伸而獲得。關於環狀烯烴系樹脂及樹脂膜之延伸方法(相位差膜之形成方法)之詳細情況,例如記載於日本專利特開2015-210459號公報、日本專利特開2016-105166號公報中。該公報之記載係作為參考而援引至本說明書中。The first retardation layer may be made of any suitable resin film that can satisfy any of the characteristics described above. Representative examples of such resins include cyclic olefin resins, polycarbonate resins, cellulose resins, polyester resins, polyvinyl alcohol resins, polyamide resins, and polyimide resins. , Polyether resin, polystyrene resin, acrylic resin. Among them, a cyclic olefin-based resin can be suitably used. The first retardation layer is obtained, for example, by stretching a film made of the resin. Details of the cyclic olefin-based resin and the extension method of the resin film (the formation method of the retardation film) are described in, for example, Japanese Patent Laid-Open No. 2015-210459 and Japanese Patent Laid-Open No. 2016-105166. The contents of this publication are incorporated herein by reference.
H.第2相位差層 第2相位差層可視目的由具有任意之適宜之光學特性及/或機械特性之相位差膜構成。第1相位差層於作為λ/2板而發揮功能時,第2相位差層代表性而言可作為λ/4板而發揮功能。藉由將作為λ/4板而發揮功能之第2相位差層之波長分散特性利用作為上述λ/2板而發揮功能之第1相位差層之光學特性進行修正,能夠發揮出寬廣波長範圍之圓偏光功能。此種第2相位差層之面內相位差Re(550)較佳為100 nm~180 nm,更佳為110 nm~170 nm,進而較佳為120 nm~160 nm。H. Second retardation layer The second retardation layer may be formed of a retardation film having arbitrary suitable optical characteristics and / or mechanical characteristics. When the first retardation layer functions as a λ / 2 plate, the second retardation layer typically functions as a λ / 4 plate. By correcting the wavelength dispersion characteristics of the second retardation layer that functions as a λ / 4 plate by using the optical characteristics of the first retardation layer that functions as the λ / 2 plate, it is possible to exhibit a wide wavelength range. Circular polarizing function. The in-plane retardation Re (550) of such a second retardation layer is preferably 100 nm to 180 nm, more preferably 110 nm to 170 nm, and even more preferably 120 nm to 160 nm.
第2相位差層之厚度可以作為λ/4板可最適宜地發揮功能之方式設定。換言之,厚度可以獲得所需面內相位差之方式設定。具體而言,厚度較佳為10 μm~50 μm,最佳為20 μm~40 μm。The thickness of the second retardation layer can be set as a method in which the λ / 4 plate can function optimally. In other words, the thickness can be set in such a manner that the required in-plane phase difference can be obtained. Specifically, the thickness is preferably 10 μm to 50 μm, and most preferably 20 μm to 40 μm.
第2相位差層較佳為折射率特性顯示出nz>nx>ny之關係。第2相位差層之Nz係數較佳為-10~-0.1,更佳為-5~-1。The second retardation layer preferably has a refractive index characteristic showing a relationship of nz> nx> ny. The Nz coefficient of the second retardation layer is preferably -10 to -0.1, and more preferably -5 to -1.
第2相位差層可以其遲相軸與偏光元件之吸收軸形成較佳為70°~80°、更佳為72°~78°、進而較佳為約75°之角度之方式配置。The second retardation layer may be disposed such that the retardation axis and the absorption axis of the polarizing element form an angle of preferably 70 ° to 80 °, more preferably 72 ° to 78 °, and even more preferably about 75 °.
第2相位差層可由可滿足如上所述特性之任意之適宜之樹脂膜構成。此種樹脂代表性而言可為具有負之固有雙折射之聚合物。所謂具有負之固有雙折射之聚合物係指於藉由延伸等使聚合物配向之情形時配向方向上之折射率相對變小之聚合物。作為具有負之固有雙折射之聚合物,例如可列舉於聚合物之側鏈導入有芳香族或羰基等極化各向異性較大之化學鍵或官能基者。作為具體例,可列舉改性聚烯烴系樹脂(例如改性聚乙烯系樹脂)、丙烯酸系樹脂、苯乙烯系樹脂、順丁烯二醯亞胺系樹脂、反丁烯二酸酯系樹脂等。第2相位差層例如可藉由將由上述樹脂形成之膜適宜地進行延伸而獲得。The second retardation layer may be formed of any appropriate resin film that can satisfy the above-mentioned characteristics. Such a resin may typically be a polymer having a negative intrinsic birefringence. A polymer having a negative intrinsic birefringence refers to a polymer whose refractive index in the alignment direction becomes relatively small when the polymer is aligned by extension or the like. As a polymer having a negative intrinsic birefringence, for example, a polymer having a polar anisotropy such as an aromatic group or a carbonyl group or a functional group is introduced into a side chain of the polymer. Specific examples include modified polyolefin-based resins (for example, modified polyethylene-based resins), acrylic resins, styrene-based resins, maleimide-based resins, and fumarate-based resins. . The second retardation layer can be obtained, for example, by appropriately stretching a film made of the resin.
I.附抗反射層及防眩光層之偏光板之製造方法 本發明之一實施形態之附抗反射層及防眩光層之偏光板之製造方法包含如下步驟:製作包含偏光元件及保護層之偏光元件積層體;於抗反射層用基材上形成抗反射層而製作抗反射積層體;於防眩光層用基材上形成防眩光層而製作防眩光積層體;及將該偏光元件積層體、該防眩光積層體及該抗反射積層體加以貼合。I. Manufacturing method of polarizing plate with anti-reflection layer and anti-glare layer One embodiment of the present invention is a method for manufacturing a polarizing plate with anti-reflection layer and anti-glare layer, which includes the following steps: producing polarized light including a polarizing element and a protective layer Element laminate; forming an anti-reflection laminate on an anti-reflection layer substrate; forming an anti-reflection laminate on an anti-glare substrate; forming an anti-glare laminate; and forming the polarizing element laminate, The anti-glare laminated body and the anti-reflection laminated body are bonded together.
偏光元件積層體可藉由任意之適宜之方法而製作。於使用由單層之樹脂膜構成之偏光元件之情形時,只要將偏光元件與構成保護層之樹脂膜經由任意之適宜之接著層(接著劑層或黏著劑層)加以貼合即可。於使用樹脂基材與積層於該樹脂基材上之PVA系樹脂層(PVA系樹脂膜)之積層體之情形時,亦可將該積層體供於染色及延伸處理而將PVA系樹脂層製成偏光元件,將該積層體直接用作偏光元件積層體。或者,亦可於該積層體之偏光元件表面貼合構成保護層之樹脂膜而使用。於該情形時,樹脂基材可剝離,亦可不剝離。於使用利用樹脂基材與塗佈形成於該樹脂基材上之PVA系樹脂層之積層體而獲得之偏光元件之情形時,亦可如上述B-1項中所記載般實施操作(例如,如日本專利特開2012-73580號公報中所記載般實施操作)而製作樹脂基材/偏光元件之積層體,將該積層體直接用作偏光元件積層體。或者,亦可於該積層體之偏光元件表面貼合構成保護層之樹脂膜而使用。於該情形時,樹脂基材可剝離,亦可不剝離。The polarizing element laminated body can be produced by any appropriate method. When a polarizing element composed of a single-layer resin film is used, the polarizing element and the resin film constituting the protective layer may be bonded together via any appropriate adhesive layer (adhesive layer or adhesive layer). When a laminated body of a resin substrate and a PVA-based resin layer (PVA-based resin film) laminated on the resin substrate is used, the laminated body may be subjected to dyeing and stretching treatment to form a PVA-based resin. As a polarizing element, this laminated body was used as a polarizing element laminated body directly. Alternatively, a resin film constituting a protective layer may be bonded to the surface of the polarizing element of the laminated body and used. In this case, the resin substrate may or may not be peeled. When a polarizing element obtained by using a laminate of a resin substrate and a PVA-based resin layer formed on the resin substrate is used, the operation may be performed as described in the above item B-1 (for example, The operation is performed as described in Japanese Patent Application Laid-Open No. 2012-73580) to produce a resin substrate / polarizing element laminated body, and the laminated body is directly used as a polarizing element laminated body. Alternatively, a resin film constituting a protective layer may be bonded to the surface of the polarizing element of the laminated body and used. In this case, the resin substrate may or may not be peeled.
抗反射積層體係藉由在抗反射層用基材上形成抗反射層而製作。於形成抗反射層時,亦可視需要對抗反射層用基材預先實施表面處理。作為表面處理,例如可列舉低壓電漿處理、紫外線照射處理、電暈處理、火焰處理、酸或鹼處理。或者,亦可於抗反射層用基材表面形成例如由SiOx 形成之密接層。抗反射層如上所述代表性而言係藉由乾式製程(例如濺鍍)而形成。例如,於抗反射層為高折射率層與低折射率層之交替多層積層體時,於抗反射層用基材表面藉由濺鍍依序形成例如Nb2 O5 膜(高折射率層)、SiO2 膜(低折射率層)、Nb2 O5 膜(高折射率層)、及SiO2 膜(低折射率層),由此可形成抗反射層。The antireflection laminated system is produced by forming an antireflection layer on a substrate for an antireflection layer. When the anti-reflection layer is formed, a surface treatment may be performed on the base material for the anti-reflection layer in advance if necessary. Examples of the surface treatment include a low-pressure plasma treatment, an ultraviolet irradiation treatment, a corona treatment, a flame treatment, and an acid or alkali treatment. Alternatively, an adhesion layer made of, for example, SiO x may be formed on the surface of the base material for the antireflection layer. As described above, the anti-reflection layer is typically formed by a dry process (for example, sputtering). For example, when the antireflection layer is an alternate multilayer laminate of a high refractive index layer and a low refractive index layer, a Nb 2 O 5 film (high refractive index layer) is sequentially formed on the surface of the base material for the antireflection layer by sputtering, for example. , SiO 2 film (low refractive index layer), Nb 2 O 5 film (high refractive index layer), and SiO 2 film (low refractive index layer), thereby forming an antireflection layer.
防眩光積層體係藉由在防眩光層用基材上形成防眩光層而製作。防眩光層之形成順序如上述C項之記載所述。The anti-glare laminated system is produced by forming an anti-glare layer on a substrate for an anti-glare layer. The formation order of the anti-glare layer is as described in the above item C.
最後,藉由將偏光元件積層體、防眩光積層體及抗反射積層體加以貼合,可獲得附抗反射層及防眩光層之偏光板。可將抗反射積層體貼合於防眩光積層體/偏光元件積層體之積層體上,亦可將抗反射積層體/防眩光積層體之積層體貼合於偏光元件積層體上。附抗反射層及防眩光層之偏光板可藉由例如經由任意之適宜之接著層(例如,接著劑層、黏著劑層)將防眩光積層體之防眩光層貼合於偏光元件積層體之保護層表面,繼而經由任意之適宜之接著層將抗反射積層體之抗反射層用基材貼合於防眩光層用基材之表面而獲得。於本發明之實施形態中,如上所述,貼合時之抗反射層用基材之水分率為2.0重量%以上。此種水分率可藉由將抗反射層用基材預先進行加濕處理而實現。Finally, a polarizing plate with an anti-reflection layer and an anti-glare layer can be obtained by bonding the polarizing element laminate, the anti-glare laminate, and the anti-reflection laminate. The anti-reflection laminated body can be laminated on the anti-glare laminated body / polarizing element laminated body, and the anti-reflection laminated body / anti-glare laminated body can also be attached on the polarizing element laminated body. The polarizing plate with the anti-reflection layer and the anti-glare layer can be bonded to the polarizing element laminated body by, for example, any appropriate adhesive layer (for example, an adhesive layer, an adhesive layer). The surface of the protective layer is obtained by bonding the base material for the anti-reflection layer of the anti-reflection laminate to the surface of the base material for the anti-glare layer through any appropriate adhesive layer. In the embodiment of the present invention, as described above, the moisture content of the base material for the antireflection layer at the time of bonding is 2.0% by weight or more. Such a moisture content can be achieved by subjecting the base material for an antireflection layer to a humidification treatment in advance.
J.圖像顯示裝置 本發明之實施形態之附抗反射層及防眩光層之偏光板可應用於圖像顯示裝置。代表性而言,附抗反射層及防眩光層之偏光板可以抗反射層成為視認側之方式配置於圖像顯示裝置之視認側。作為圖像顯示裝置之代表例,可列舉液晶顯示裝置、有機電致發光(EL)顯示裝置、量子點顯示裝置。 [實施例]J. Image display device The polarizing plate with an anti-reflection layer and an anti-glare layer according to the embodiment of the present invention can be applied to an image display device. Typically, a polarizing plate with an anti-reflection layer and an anti-glare layer can be arranged on the visual side of the image display device in such a manner that the anti-reflective layer becomes the visual side. Typical examples of the image display device include a liquid crystal display device, an organic electroluminescence (EL) display device, and a quantum dot display device. [Example]
以下,藉由實施例對本發明進行具體說明,但本發明不受該等實施例所限定。再者,各特性之測定方法如下所述。Hereinafter, the present invention will be specifically described by examples, but the present invention is not limited by these examples. In addition, the measurement method of each characteristic is as follows.
(1)抗反射層用基材之水分率 將實施例及比較例中所使用之抗反射層用基材以搬送方向成為短邊之方式切出200 mm×300 mm之大小,作為測定試樣,測定該測定試樣之初期重量。繼而,將該測定試樣於120℃下乾燥24小時,測定乾燥重量,並藉由下述式確定水分率。 水分率(重量%)=〔(初期重量-乾燥重量)/初期重量〕×100 (2)剝落及皺褶 將實施例及比較例中所獲得之附抗反射層及防眩光層之偏光板以偏光元件之吸收軸方向成為短邊之方式切出200 mm×300 mm,貼合於玻璃板上作為測定試樣。對於該測定試樣,於以下之兩條件下進行嚴苛加濕耐久性試驗。試驗係使用10個測定試樣,觀測各個測定試樣中之附抗反射層及防眩光層之偏光板之4個角之剝落及皺褶,算出發生率及平均長度。再者,關於發生率,藉由目視觀察有無剝落及皺褶,由40處(10個測定試樣×4個角)中之發生部位之數量求出發生率。關於平均長度,藉由尺子測定長度,算出其平均值。 <試驗條件1> 將測定試樣於85℃及85%RH之烘箱中放置100小時。 <試驗條件2> 於測定試樣中之附抗反射層及防眩光層之偏光板之周緣部,使用注射器塗佈甘油,將該塗佈試樣於65℃及90%RH之烘箱中放置24小時。(1) Moisture content of the base material for the anti-reflection layer The base material for the anti-reflection layer used in the examples and comparative examples was cut into a size of 200 mm × 300 mm so that the conveying direction became short sides, and used as a measurement sample. Measure the initial weight of the measurement sample. Then, this measurement sample was dried at 120 ° C for 24 hours, the dry weight was measured, and the moisture content was determined by the following formula. Moisture content (% by weight) = [(initial weight-dry weight) / initial weight] × 100 (2) Peeling and wrinkling The polarizing plate with the anti-reflection layer and the anti-glare layer obtained in the examples and comparative examples was used Cut out 200 mm × 300 mm so that the direction of the absorption axis of the polarizing element becomes the short side, and attach it to a glass plate as a measurement sample. This measurement sample was subjected to a severe humidification durability test under the following two conditions. In the test, ten measurement samples were used, and the peeling and wrinkling of the four corners of the polarizing plate with the anti-reflection layer and the anti-glare layer in each measurement sample were observed, and the occurrence rate and average length were calculated. Regarding the occurrence rate, the occurrence rate was determined by visually observing the presence or absence of peeling and wrinkles from the number of occurrence sites in 40 places (10 measurement samples × 4 corners). About the average length, the length was measured with a ruler, and the average value was calculated. <Test condition 1> The measurement sample was left in an oven at 85 ° C. and 85% RH for 100 hours. <Test condition 2> Glycerin was coated on the periphery of the polarizing plate with the anti-reflection layer and the anti-glare layer in the measurement sample, and the coated sample was placed in an oven at 65 ° C and 90% RH for 24 hours. hour.
[實施例1] 1.偏光板(偏光元件積層體)之製作 作為樹脂基材,使用長條狀且吸水率為0.75%、Tg為75℃之非晶質之間苯二甲酸共聚合聚對苯二甲酸乙二酯(IPA共聚合PET)膜(厚度:100 μm)。對基材之單面實施電暈處理,於該電暈處理面上,於25℃下塗佈以9:1之比例包含聚乙烯醇(聚合度為4200、皂化度為99.2莫耳%)及乙醯乙醯基改性PVA(聚合度為1200、乙醯乙醯基改性度為4.6%、皂化度為99.0莫耳%以上、日本合成化學工業公司製造、商品名「GOHSEFIMER Z200」)之水溶液並進行乾燥,形成厚度為11 μm之PVA系樹脂層,而製作積層體。 將所獲得之積層體於120℃之烘箱內於圓周速度不同之輥間沿縱向(長度方向)進行自由端單軸延伸(空中輔助延伸)至2.0倍。 繼而,使積層體於液溫為30℃之不溶化浴(相對於水100重量份調配4重量份之硼酸而獲得之硼酸水溶液)中浸漬30秒鐘(不溶化處理)。 繼而,於液溫為30℃之染色浴中,以偏光板成為特定透射率之方式一邊調整碘濃度、浸漬時間一邊進行浸漬。於本實施例中,於相對於水100重量份調配0.2重量份之碘、調配1.5重量份之碘化鉀而獲得之碘水溶液中浸漬60秒鐘(染色處理)。 繼而,於液溫為30℃之交聯浴(相對於水100重量份調配3重量份之碘化鉀、調配3重量份之硼酸而獲得之硼酸水溶液)中浸漬30秒鐘(交聯處理)。 其後,一邊將積層體浸漬於液溫為70℃之硼酸水溶液(相對於水100重量份調配4重量份之硼酸、調配5重量份之碘化鉀而獲得之水溶液)中,一邊於圓周速度不同之輥間沿縱向(長度方向)以總延伸倍率成為5.5倍之方式進行單軸延伸(水中延伸)。 其後,將積層體浸漬於液溫為30℃之洗淨浴(相對於水100重量份調配4重量份之碘化鉀而獲得之水溶液)中(洗淨處理)。 繼而,於積層體之PVA系樹脂層(偏光元件)表面塗佈PVA系樹脂水溶液(日本合成化學工業公司製造、商品名「GOHSEFIMER(註冊商標)Z-200」、樹脂濃度:3重量%),並貼合構成保護層之甲基丙烯酸樹脂膜(厚度:25 μm、具有戊二醯亞胺結構),將其於維持在60℃之烘箱中加熱5分鐘。其後,將樹脂基材自PVA系樹脂層上剝離。繼而,於積層體之PVA系樹脂層表面(樹脂基材剝離面)塗佈PVA系樹脂水溶液(日本合成化學工業公司製造、商品名「GOHSEFIMER(註冊商標)Z-200」、樹脂濃度:3重量%),並貼合構成保護層之甲基丙烯酸樹脂膜(厚度:40 μm、具有戊二醯亞胺結構),將其於維持在60℃之烘箱中加熱5分鐘。如此實施操作,而獲得偏光元件積層體(具有保護層/偏光元件/保護層之構成之偏光板)。再者,偏光元件之厚度為5 μm,單獨體透射率為42.3%。[Example 1] 1. Production of a polarizing plate (layered body of polarizing element) As a resin substrate, a long-shaped amorphous phthalic acid copolymerized polymer having a water absorption of 0.75% and a Tg of 75 ° C was used. Ethylene phthalate (IPA copolymerized PET) film (thickness: 100 μm). Corona treatment was performed on one side of the substrate, and on the corona treated surface, a polyvinyl alcohol (polymerization degree of 4200, saponification degree of 99.2 mol%) was coated at a ratio of 9: 1 at 25 ° C and Acetylacetamyl-modified PVA (Polymerization degree of 1200, Ethylacetamyl modification degree of 4.6%, Saponification degree of 99.0 mol% or more, manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name "GOHSEFIMER Z200") The aqueous solution was dried to form a PVA-based resin layer having a thickness of 11 μm, and a laminate was produced. The obtained laminated body was subjected to free-end uniaxial extension (air-assisted extension) to 2.0 times in the longitudinal direction (length direction) between rollers having different peripheral speeds in an oven at 120 ° C. Next, the laminate was immersed in an insolubilization bath (aqueous boric acid solution obtained by mixing 4 parts by weight of boric acid with 100 parts by weight of water) at a liquid temperature of 30 ° C (insolubilization treatment). Then, in a dyeing bath having a liquid temperature of 30 ° C., immersion was performed while adjusting the iodine concentration and immersion time so that the polarizing plate had a specific transmittance. In this example, the aqueous iodine solution obtained by mixing 0.2 parts by weight of iodine and 1.5 parts by weight of potassium iodide with respect to 100 parts by weight of water was immersed for 60 seconds (dyeing treatment). Then, immerse for 30 seconds in a crosslinking bath (aqueous boric acid solution prepared by mixing 3 parts by weight of potassium iodide with 100 parts by weight of water and 3 parts by weight of boric acid) at a liquid temperature of 30 ° C (crosslinking treatment). Thereafter, the laminated body was immersed in a boric acid aqueous solution having a liquid temperature of 70 ° C. (aqueous solution obtained by mixing 4 parts by weight of boric acid with respect to 100 parts by weight of water and 5 parts by weight of potassium iodide) while varying the peripheral speed. The rolls are uniaxially stretched (stretched in water) so that the total stretch ratio becomes 5.5 times in the longitudinal direction (lengthwise direction). Thereafter, the laminated body was immersed in a washing bath (aqueous solution obtained by mixing 4 parts by weight of potassium iodide with 100 parts by weight of water) at a liquid temperature of 30 ° C (washing treatment). Next, apply a PVA-based resin aqueous solution (manufactured by Nippon Synthetic Chemical Industry Co., Ltd. under the trade name "GOHSEFIMER (registered trademark) Z-200", resin concentration: 3% by weight) on the surface of the PVA-based resin layer (polarizing element) of the laminate, A methacrylic resin film (thickness: 25 μm, having a glutaridine imine structure) constituting a protective layer was attached, and it was heated in an oven maintained at 60 ° C. for 5 minutes. After that, the resin substrate was peeled from the PVA-based resin layer. Next, the PVA-based resin layer surface (resin substrate peeling surface) of the laminated body was coated with an aqueous PVA-based resin solution (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name "GOHSEFIMER (registered trademark) Z-200", resin concentration: 3 weight %), And a methacrylic resin film (thickness: 40 μm, having a glutaridine imine structure) constituting a protective layer was pasted, and it was heated in an oven maintained at 60 ° C. for 5 minutes. In this way, a polarizing element laminate (a polarizing plate having a protective layer / polarizing element / protective layer structure) was obtained. Furthermore, the thickness of the polarizing element was 5 μm, and the individual transmittance was 42.3%.
2.抗反射積層體之製作 藉由在Konica Minolta公司製造之TAC膜(製品名:KC2UA、厚度:25 μm)之單面藉由硬塗處理形成硬塗(HC)層(厚度:7 μm),而獲得HC-TAC膜(厚度:32 μm)。將該HC-TAC膜用作抗反射層用基材。於抗反射層用基材之HC層表面,藉由濺鍍形成由SiOx 形成之密接層(厚度:10 nm),進而藉由在該密接層上依序形成Nb2 O5 膜(高折射率層)、SiO2 膜(低折射率層)、Nb2 O5 膜(高折射率層)、及SiO2 膜(低折射率層),而形成抗反射層(厚度或光學膜厚:200 nm)。進而,於抗反射層上形成由具有全氟聚醚基之烷氧基矽烷化合物形成之防污層(厚度:10 nm),而製作抗反射積層體。將該抗反射積層體供於加濕處理(於65℃及90%RH之烘箱中放置24小時)。所獲得之抗反射積層體(實質為抗反射層用基材)之水分率為3.8重量%。2. Production of anti-reflection laminated body A hard-coated (HC) layer (thickness: 7 μm) was formed by hard coating on one side of a TAC film (product name: KC2UA, thickness: 25 μm) manufactured by Konica Minolta Company. To obtain an HC-TAC film (thickness: 32 μm). This HC-TAC film was used as a base material for an antireflection layer. On the surface of the HC layer of the base material for the anti-reflection layer, an adhesion layer (thickness: 10 nm) made of SiO x was formed by sputtering, and an Nb 2 O 5 film (high refraction) was sequentially formed on the adhesion layer. Rate layer), SiO 2 film (low refractive index layer), Nb 2 O 5 film (high refractive index layer), and SiO 2 film (low refractive index layer) to form an antireflection layer (thickness or optical film thickness: 200) nm). Further, an antifouling layer (thickness: 10 nm) made of an alkoxysilane compound having a perfluoropolyether group was formed on the antireflection layer to prepare an antireflection laminate. This anti-reflection laminated body was subjected to a humidification treatment (placed in an oven at 65 ° C. and 90% RH for 24 hours). The moisture content of the obtained antireflection laminated body (substantially the base material for an antireflection layer) was 3.8% by weight.
3.防眩光積層體 於作為防眩光層用基材之Konica Minolta公司製造之TAC膜(製品名:KC4UY、厚度:40 μm)之單面,依據日本專利特開2014-214177號公報之<實施例1>中所記載之方法形成配向膜及液晶化合物之配向固化層(防眩光層),而製作防眩光積層體。再者,防眩光層之面內相位差Re(550)為270 nm,以其遲相軸相對於偏光元件之吸收軸形成45°之角度之方式形成。3. The single-sided surface of the anti-glare laminated body is a TAC film (product name: KC4UY, thickness: 40 μm) manufactured by Konica Minolta Company as a base material for the anti-glare layer. In the method described in Example 1>, an alignment film and an alignment cured layer (anti-glare layer) of a liquid crystal compound were formed, and an anti-glare laminated body was produced. In addition, the in-plane retardation Re (550) of the anti-glare layer is 270 nm, and is formed so that its late phase axis forms an angle of 45 ° with respect to the absorption axis of the polarizing element.
4.附抗反射層及防眩光層之偏光板之製作 於偏光元件積層體(偏光板)之40 μm保護層面上,經由丙烯酸系黏著劑(厚度:20 μm)貼合防眩光積層體之防眩光層,於所獲得之積層體之防眩光層用基材之表面,經由丙烯酸系黏著劑(厚度:20 μm)貼合抗反射積層體之HC-TAC膜,而獲得附抗反射層及防眩光層之偏光板。將所獲得之附抗反射層之偏光板供於上述(2)之評價。將結果示於表1。4. The polarizing plate with anti-reflection layer and anti-glare layer is made on the 40 μm protective layer of the polarizer layered body (polarizing plate), and the anti-glare layered body is bonded with an acrylic adhesive (thickness: 20 μm). The glare layer is laminated on the surface of the obtained base material for the anti-glare layer with an HC-TAC film of an anti-reflection laminate through an acrylic adhesive (thickness: 20 μm) to obtain an anti-reflection layer and an anti-glare layer. Polarizer for glare layer. The obtained polarizing plate with an anti-reflection layer was used for the evaluation of (2) above. The results are shown in Table 1.
[實施例2] 將抗反射積層體之加濕處理之條件變更為「40℃、92%RH及24小時」,將貼合時之抗反射層用基材之水分率設定為3.1重量%,除此以外,與實施例1同樣地操作而製作附抗反射層及防眩光層之偏光板。將所獲得之偏光板供於與實施例1相同之評價。將結果示於表1。[Example 2] The condition for humidifying the antireflection laminate was changed to "40 ° C, 92% RH, and 24 hours", and the moisture content of the substrate for the antireflection layer at the time of bonding was set to 3.1% by weight. Other than that, a polarizing plate with an anti-reflection layer and an anti-glare layer was produced in the same manner as in Example 1. The obtained polarizing plate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.
[比較例1] 不對抗反射積層體進行加濕處理,將貼合時之抗反射層用基材之水分率設定為1.6重量%,除此以外,與實施例1同樣地操作而製作附抗反射層及防眩光層之偏光板。將所獲得之偏光板供於與實施例1相同之評價。將結果示於表1。[Comparative Example 1] An anti-reflection laminated body was not subjected to a humidification treatment, and the moisture content of the base material for the anti-reflection layer at the time of bonding was set to 1.6% by weight. Polarizing plate with reflective layer and anti-glare layer. The obtained polarizing plate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.
[比較例2] 將抗反射積層體真空乾燥72小時,將貼合時之抗反射層用基材之水分率設定為0.4重量%,除此以外,與實施例1同樣地操作而製作附抗反射層及防眩光層之偏光板。將所獲得之偏光板供於與實施例1相同之評價。將結果示於表1。[Comparative Example 2] An anti-reflection laminate was vacuum-dried for 72 hours, and the moisture content of the base material for the anti-reflection layer at the time of bonding was set to 0.4% by weight. Polarizing plate with reflective layer and anti-glare layer. The obtained polarizing plate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.
[表1]
由表1明確,本發明之實施例之附抗反射層及防眩光層之偏光板於高溫高濕環境下之防眩光層之剝落及皺褶之發生率及平均長度與比較例相比均顯著地獲得抑制。得知此種優異特性係藉由調整抗反射層用基材之水分率而實現。 [產業上之可利用性]It is clear from Table 1 that the incidence rate and average length of peeling and wrinkles of the anti-glare layer of the polarizing plate with an anti-reflection layer and an anti-glare layer in the examples of the present invention under a high-temperature and high-humidity environment are significant compared with the comparative examples. Ground to get suppressed. It was found that such excellent characteristics were achieved by adjusting the moisture content of the base material for the antireflection layer. [Industrial availability]
本發明之附抗反射層及防眩光層之偏光板可適宜地用於液晶顯示裝置、有機EL顯示裝置、量子點顯示裝置之類的圖像顯示裝置。The polarizing plate with an anti-reflection layer and an anti-glare layer of the present invention can be suitably used in an image display device such as a liquid crystal display device, an organic EL display device, and a quantum dot display device.
10‧‧‧偏光板10‧‧‧ polarizing plate
11‧‧‧偏光元件11‧‧‧ polarizing element
12‧‧‧保護層12‧‧‧ protective layer
20‧‧‧抗反射層用基材20‧‧‧ Substrate for anti-reflection layer
30‧‧‧抗反射層30‧‧‧Anti-reflective layer
40‧‧‧防眩光層40‧‧‧Anti-glare layer
50‧‧‧防眩光層用基材50‧‧‧Base material for anti-glare layer
100‧‧‧附抗反射層及防眩光層之偏光板100‧‧‧ polarizing plate with anti-reflection layer and anti-glare layer
圖1係本發明之一實施形態之附抗反射層及防眩光層之偏光板的概略剖視圖。FIG. 1 is a schematic cross-sectional view of a polarizing plate with an anti-reflection layer and an anti-glare layer according to an embodiment of the present invention.
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| JP2007039636A (en) * | 2005-07-07 | 2007-02-15 | Fujifilm Corp | Cellulose acylate film and production method thereof, and antireflection film, polarizing plate, optical compensation film and liquid crystal display device using the same. |
| JP2008230036A (en) * | 2007-03-20 | 2008-10-02 | Fujifilm Corp | Protective film, method for producing the same, polarizing plate, and liquid crystal display device |
| JP2008249896A (en) * | 2007-03-29 | 2008-10-16 | Fujifilm Corp | Protective film for polarizing plate, polarizing plate, and liquid crystal display device |
| JP2010243858A (en) * | 2009-04-07 | 2010-10-28 | Nitto Denko Corp | Polarizing plate, liquid crystal panel, and liquid crystal display device |
| KR20120071745A (en) * | 2010-12-23 | 2012-07-03 | 동우 화인켐 주식회사 | Method for preparing liquid display device |
| JP5273826B2 (en) | 2011-02-04 | 2013-08-28 | 日東電工株式会社 | Laminated film |
| JP5547681B2 (en) * | 2011-03-25 | 2014-07-16 | 富士フイルム株式会社 | Retardation plate, polarizing plate having the same, 3D display device, and 3D display system |
| WO2015005421A1 (en) * | 2013-07-11 | 2015-01-15 | 大日本印刷株式会社 | Moisture-proof substrate production method, moisture-proof substrate, polarizing plate using moisture-proof substrate, and liquid crystal display panel |
| JP6342791B2 (en) | 2013-12-27 | 2018-06-13 | 住友化学株式会社 | Protective film for polarizing plate and polarizing plate using the same |
| JP6428202B2 (en) * | 2014-11-28 | 2018-11-28 | 住友化学株式会社 | Optical laminate |
| JP2016170383A (en) * | 2015-03-10 | 2016-09-23 | 住友化学株式会社 | Polarizing plate with protective film and liquid crystal panel |
| US10107946B2 (en) * | 2015-07-22 | 2018-10-23 | Nitto Denko Corporation | Polarizing plate with a retardation layer and image display apparatus |
-
2017
- 2017-03-21 JP JP2017054289A patent/JP6900213B2/en active Active
-
2018
- 2018-03-16 TW TW107109001A patent/TWI657268B/en active
- 2018-03-19 CN CN201810223067.XA patent/CN108627901B/en active Active
- 2018-03-20 KR KR1020180032298A patent/KR102060795B1/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI744787B (en) * | 2019-03-26 | 2021-11-01 | 日商日東電工股份有限公司 | Optical laminated body and image display device using the optical laminated body |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20180107002A (en) | 2018-10-01 |
| KR102060795B1 (en) | 2019-12-31 |
| JP6900213B2 (en) | 2021-07-07 |
| JP2018155998A (en) | 2018-10-04 |
| TWI657268B (en) | 2019-04-21 |
| CN108627901A (en) | 2018-10-09 |
| CN108627901B (en) | 2022-03-15 |
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