JP2018155998A - Anti-reflection layer, anti-reflection layer-attached polarizing plate and method for producing the same - Google Patents

Abstract

An antireflection layer and a polarizing plate with an antireflection layer in which peeling and wrinkles of the antireflection layer are suppressed even in a high temperature and high humidity environment are provided. A polarizing plate with an antireflection layer and a reflection-preventing layer according to the present invention includes a polarizer, a polarizing plate having a protective layer provided on one side of the polarizer, and a liquid crystal compound bonded to the protective layer. An anti-reflection layer, an anti-reflection layer substrate, an anti-reflection layer substrate bonded to the anti-reflection layer substrate, and an anti-reflection layer substrate directly. An antireflective layer. In the embodiment of the present invention, the moisture content of the base material for an antireflection layer is 2.0% by weight or more. [Selection] Figure 1

Description

  The present invention relates to an antireflection layer, a polarizing plate with an antireflection layer, and a method for producing the same.

  Image display devices (eg, liquid crystal display devices, organic EL display devices, quantum dot display devices) often have a polarizing plate disposed on at least one side of the display cell due to the image forming method. Yes. An antireflection layer is provided on the viewing side of the polarizing plate arranged on the viewing side of the image display device to prevent reflection of external light on the display screen (antireflection treatment is performed). It is widely known that an anti-reflection layer is provided. The reflection preventing layer typically includes a matrix of a resin or an adhesive and fine particles dispersed in the matrix. By the way, in recent years, along with a demand for thinning of an image display device, there has been a strong demand for thinning of a polarizing plate, and accordingly, a thinning of a reflection preventing layer is also demanded. As a result, a reflection preventing layer that is an alignment solidified layer of a liquid crystal compound has been studied. However, such a reflection-preventing layer has a problem that it easily peels off in a high-temperature and high-humidity environment and tends to cause wrinkles.

JP 2011-191428 A

  The present invention has been made to solve the above-mentioned problems, and its main purpose is to provide an antireflection layer and a polarization layer with an antireflection layer in which peeling and wrinkle of the antireflection layer are suppressed even in a high temperature and high humidity environment. To provide a board.

The polarizing plate with an antireflection layer and an antireflection layer of the present invention includes a polarizer and a polarizing plate having a protective layer provided on one side of the polarizer, and an alignment of a liquid crystal compound bonded to the protective layer. An anti-reflection layer that is a solidified layer, a base material for an anti-reflection layer, a base material for an anti-reflection layer bonded to the base material for an anti-reflection layer, and directly formed on the base material for the anti-reflection layer And the moisture content of the base material for an antireflection layer is 2.0% by weight or more.
In one embodiment, in the polarizing plate with the antireflection layer and the antireflection layer, the dimensional change rate of the antireflection layer substrate after holding at 65 ° C. and 90% RH for 24 hours is 0. 0.03% or less.
In one embodiment, the reflection preventing layer is an alignment solidified layer of a liquid crystal compound.
In one embodiment, the in-plane retardation Re (550) of the reflection preventing layer is 220 nm to 320 nm.
In one embodiment, the polarizing plate with an antireflection layer and an antireflection layer further includes an alignment film between the antireflection layer and the antireflection layer substrate, and the alignment film is polyvinyl. Includes alcoholic resin.
According to another situation of this invention, the manufacturing method of said polarizing plate with an antireflection layer and a reflection prevention layer is provided. This production method includes producing a polarizer laminate including a polarizer and a protective layer, forming an antireflection layer on a base for an antireflection layer, producing an antireflection laminate, and a base for an antireflection layer. Forming an anti-reflection layer on the material to produce an anti-reflection laminate, and laminating the polarizer laminate, the anti-reflection laminate and the anti-reflection laminate, and the reflection The moisture content of the base material for prevention layers is 2.0 weight% or more.
In one embodiment, the antireflection layer substrate is humidified.

  According to the present invention, the antireflection layer and the antireflection layer and the antireflection layer substrate in the polarizing plate with a moisture content of 2.0% by weight or more allow the antireflection layer even in a high temperature and high humidity environment. It is possible to realize a reflection preventing layer and a polarizing plate with a reflection preventing layer in which peeling and wrinkles are suppressed.

1 is a schematic cross-sectional view of an antireflection layer and a polarizing plate with an antireflection layer according to one embodiment of the present invention.

  Hereinafter, although embodiment of this invention is described, this invention is not limited to these embodiment.

A. 1 is a schematic cross-sectional view of an antireflection layer and a polarizing plate with an antireflection layer according to one embodiment of the present invention. The polarizing plate 100 with an antireflection layer and an antireflection layer includes a polarizing plate 10 having a polarizer 11 and a protective layer 12, an antireflection layer 40, a base material 50 for an antireflection layer, and a base for an antireflection layer. The material 20 and the antireflection layer 30 are provided in this order. The reflection preventing layer 40 is typically bonded to the protective layer 12 of the polarizing plate 20 via any appropriate adhesive layer (adhesive layer, adhesive layer: not shown). The adhesive layer is typically an acrylic pressure-sensitive adhesive layer. The reflection preventing layer 40 is an alignment solidified layer of a liquid crystal compound. In the present specification, the “alignment solidified layer” refers to a layer in which a liquid crystal compound is aligned in a predetermined direction in the layer and the alignment state is fixed. The “alignment solidified layer” is a concept including an alignment cured layer obtained by curing a liquid crystal monomer. The anti-reflection layer 40 is typically formed by applying a composition containing a liquid crystal compound to the surface of an alignment film (not shown) formed on the anti-reflection layer substrate 50, and solidifying the application layer. It is formed by curing. The antireflection layer 30 is directly formed on the antireflection layer substrate 20. In this specification, “directly” means that no adhesive layer is interposed. In one embodiment, the base material 20 for antireflection layers may have a hard coat layer and / or an adhesion layer (both not shown) on the surface on the antireflection layer 30 side. This configuration is also included in the form “the antireflection layer is directly formed on the substrate”. An antifouling layer (not shown) may be provided on the surface of the antireflection layer 30 as necessary.

  In the embodiment of the present invention, the moisture content of the antireflection layer substrate 20 is 2.0% by weight or more, preferably 2.4% by weight or more, more preferably 2.7% by weight or more. More preferably, it is 3.0% by weight or more, and particularly preferably 3.5% by weight or more. The upper limit of the moisture content of the base material for an antireflection layer is, for example, 5.0% by weight. When the base material for an antireflection layer has such a high moisture content, peeling and wrinkles of the antireflection layer (alignment solidified layer of the liquid crystal compound) in a high temperature and high humidity environment can be suppressed. In the present specification, the “moisture content of the base material for antireflection layer” refers to the water content of the base material for antireflection layer when the antireflection laminate is bonded in the production method described later in Section I.

  The moisture content of the polarizing plate 10 is preferably 0.5% by weight or more, preferably 0.6% by weight or more, more preferably 0.8% by weight or more, and further preferably 1.0% by weight. That's it. The upper limit of the moisture content of the polarizing plate is, for example, 2.0% by weight. When the polarizing plate has such a high moisture content, the hygroscopic expansion of the polarizing plate can be significantly suppressed. As a result, the dimensional change of the polarizing plate in a high temperature and high humidity environment (particularly, the dimensional change in the absorption axis direction of the polarizer) can be significantly suppressed. Due to a synergistic effect of this and the effect of the moisture content of the base material for the antireflection layer, in the polarizing plate with the antireflection layer and the antireflection layer according to the embodiment of the present invention, it is reflected in a high temperature and high humidity environment. Peeling and wrinkling of the prevention layer (alignment solidified layer of the liquid crystal compound) can be further suppressed. Furthermore, since the polarizing plate has such a high moisture content, the anti-reflection layer and the anti-reflection layer polarizing plate according to the embodiment of the present invention may be curled even if they occur in a high-temperature and high-humidity environment. The direction of curl is opposite to normal. As a result, the antireflection layer-attached polarizing plate according to the embodiment of the present invention can reduce adverse effects on the image display device even if curling occurs. As described above, the anti-reflection layer and the anti-reflection layer polarizing plate are applied to the image display device due to the synergistic effect of suppressing the dimensional change and the curl direction due to the high moisture content of the polarizing plate. In this case, warping, peeling, and / or deterioration of display characteristics in a high temperature and high humidity environment can be remarkably suppressed.

  In the illustrated example, the protective layer 12 is provided only on one side of the polarizer 11, but another protective layer may be provided on the side opposite to the protective layer 12 depending on the purpose. In this case, a protective layer may be provided on both sides of the polarizer, or the protective layer 12 may be omitted and only another protective layer may be provided. When only another protective layer is provided, the reflection preventing layer base material 50 can function as a viewing-side protective layer. Furthermore, any appropriate functional layer may be provided depending on the purpose. Typical examples of the functional layer include a retardation layer and a conductive layer. The type, number, combination, arrangement position, and characteristics (for example, optical characteristics such as refractive index characteristics, in-plane retardation, thickness direction retardation, and Nz coefficient) of the functional layer can be appropriately set according to the purpose. In one embodiment, a first retardation layer (not shown) having a refractive index characteristic of nx> ny> nz may be provided on the opposite side of the polarizer 11 from the protective layer 12. In this case, preferably, a second retardation layer having a refractive index characteristic of nz> nx> ny may be further provided on the opposite side of the first retardation layer from the polarizer. The first retardation layer may also serve as a protective layer opposite to the viewing side of the polarizer. Furthermore, a conductive layer may be provided on the opposite side of the polarizer 11 from the protective layer 12. By providing the conductive layer at such a position, the antireflection layer and the antireflection layer-attached polarizing plate can be suitably used for the inner touch panel type input display device. In this case, the retardation layer may or may not exist.

  Hereinafter, components of the antireflection layer and the antireflection layer-attached polarizing plate will be described.

B. Polarizing plate B-1. Polarizer The polarizer 11 is typically composed of a resin film containing a dichroic substance.

  Any appropriate resin film that can be used as a polarizer can be employed as the resin film. The resin film is typically a polyvinyl alcohol-based resin (hereinafter referred to as “PVA-based resin”) film.

  Any appropriate resin can be used as the PVA resin for forming the PVA resin film. Examples thereof include polyvinyl alcohol and ethylene-vinyl alcohol copolymer. Polyvinyl alcohol is obtained by saponifying polyvinyl acetate. An ethylene-vinyl alcohol copolymer can be obtained by saponifying an ethylene-vinyl acetate copolymer. The degree of saponification of the PVA resin is usually 85 mol% to 100 mol%, preferably 95.0 mol% to 99.95 mol%, more preferably 99.0 mol% to 99.93 mol%. . The saponification degree can be determined according to JIS K 6726-1994. By using a PVA-based resin having such a saponification degree, a polarizer having excellent durability can be obtained. If the degree of saponification is too high, there is a risk of gelation.

  The average degree of polymerization of the PVA-based resin can be appropriately selected according to the purpose. The average degree of polymerization is usually 1000 to 10000, preferably 1200 to 4500, more preferably 1500 to 4300. The average degree of polymerization can be determined according to JIS K 6726-1994.

  Examples of the dichroic substance contained in the resin film include iodine and organic dyes. These may be used alone or in combination of two or more. Preferably, iodine is used. For example, when a non-polarizing part is formed by decoloring by chemical treatment, the iodine complex contained in the resin film (polarizer) is appropriately reduced, so that the non-polarizing part has suitable characteristics when used for a camera part, for example. It is because it can form.

  The resin film may be a single layer resin film or a laminate of two or more layers.

  Specific examples of the polarizer composed of a single-layer resin film include a PVA resin film that has been subjected to a dyeing treatment with iodine and a stretching treatment (typically uniaxial stretching). The dyeing with iodine is performed, for example, by immersing a PVA film in an iodine aqueous solution. The stretching ratio of the uniaxial stretching is preferably 3 to 7 times. The stretching may be performed after the dyeing treatment or may be performed while dyeing. Moreover, you may dye | stain after extending | stretching. If necessary, the PVA-based resin film is subjected to swelling treatment, crosslinking treatment, washing treatment, drying treatment, and the like. For example, by immersing the PVA resin film in water and washing it before dyeing, not only can the surface of the PVA film be cleaned of dirt and antiblocking agents, but also the PVA resin film can be swollen to cause uneven dyeing. Etc. can be prevented.

  As a specific example of a polarizer obtained by using a laminate, a laminate of a resin substrate and a PVA resin layer (PVA resin film) laminated on the resin substrate, or a resin substrate and the resin Examples thereof include a polarizer obtained by using a laminate with a PVA resin layer applied and formed on a substrate. For example, a polarizer obtained by using a laminate of a resin base material and a PVA resin layer applied and formed on the resin base material may be obtained by, for example, applying a PVA resin solution to a resin base material and drying it. A PVA-based resin layer is formed thereon to obtain a laminate of a resin base material and a PVA-based resin layer; the laminate is stretched and dyed to make the PVA-based resin layer a polarizer; obtain. In the present embodiment, stretching typically includes immersing the laminate in an aqueous boric acid solution and stretching. Further, the stretching may further include, if necessary, stretching the laminate in the air at a high temperature (for example, 95 ° C. or higher) before stretching in the boric acid aqueous solution. The obtained resin base material / polarizer laminate may be used as it is (that is, the resin base material may be used as a protective layer of the polarizer), and the resin base material is peeled from the resin base material / polarizer laminate. Any appropriate protective layer according to the purpose may be laminated on the release surface. Details of a method for manufacturing such a polarizer are described in, for example, Japanese Patent Application Laid-Open No. 2012-73580. This publication is incorporated herein by reference in its entirety.

  The thickness of the polarizer is preferably 15 μm or less, more preferably 1 μm to 12 μm, still more preferably 3 μm to 10 μm, and particularly preferably 3 μm to 8 μm. When the thickness of the polarizer is in such a range, curling during heating can be satisfactorily suppressed, and good appearance durability during heating can be obtained. Furthermore, if the thickness of the polarizer is in such a range, it can contribute to the thinning of the polarizing plate with an antireflection layer (as a result, the image display device).

  The polarizer preferably exhibits absorption dichroism at any wavelength between 380 nm and 780 nm. The single transmittance of the polarizer is preferably 43.0% to 46.0%, more preferably 44.5% to 46.0%. The polarization degree of the polarizer is preferably 97.0% or more, more preferably 99.0% or more, and further preferably 99.9% or more.

B-2. Protective layer Any appropriate resin film is used as the protective layer 12. Examples of the resin film forming material include (meth) acrylic resins, cellulose resins such as diacetyl cellulose and triacetyl cellulose, cycloolefin resins such as norbornene resins, olefin resins such as polypropylene, and polyethylene terephthalate resins. And ester resins such as polyamide resins, polycarbonate resins, and copolymer resins thereof. The “(meth) acrylic resin” refers to an acrylic resin and / or a methacrylic resin.

  In one embodiment, a (meth) acrylic resin having a glutarimide structure is used as the (meth) acrylic resin. Examples of (meth) acrylic resins having a glutarimide structure (hereinafter also referred to as glutarimide resins) include, for example, JP-A-2006-309033, JP-A-2006-317560, JP-A-2006-328329, and JP-A-2006-328329. 2006-328334, JP-A 2006-337491, JP-A 2006-337492, JP-A 2006-337493, JP-A 2006-337469, JP-A 2007-009182, JP-A 2009- Nos. 161744 and 2010-284840. These descriptions are incorporated herein by reference.

Moisture permeability of the protective layer 12 is preferably not more than 1.0g ^/ m 2 ^/ 24hr, more preferably not more than 0.8g ^/ m 2 ^/ 24hr, more preferably below 0.6g ^/ m 2 ^/ 24hr There, particularly preferably not more than 0.4g ^/ m 2 ^/ 24hr. When the moisture permeability of the protective layer is in such a range, the dimensional change in a high temperature and high humidity environment can be further suppressed, and as a result, peeling of the reflection preventing layer and wrinkles can be further suppressed.

  The thickness of the protective layer is typically 10 μm to 100 μm, preferably 20 μm to 40 μm. The protective layer is typically laminated on the polarizer via an adhesive layer (specifically, an adhesive layer or an adhesive layer). The adhesive layer is typically formed of a PVA adhesive or an activated energy ray curable adhesive. The pressure-sensitive adhesive layer is typically formed of an acrylic pressure-sensitive adhesive.

C. Anti-reflection layer The anti-reflection layer is provided to prevent reflection of the face of the user of the image display device, the keyboard of the image display device, external light (for example, a fluorescent lamp), and the like. In the embodiment of the present invention, the reflection preventing layer is an alignment solidified layer of a liquid crystal compound. One of the features of the present invention is that peeling and wrinkles of the antireflection layer in a high temperature and high humidity environment are suppressed.

  The reflection preventing layer is typically an alignment solidified layer of a liquid crystal compound. In the present specification, the “alignment solidified layer” refers to a layer in which a liquid crystal compound is aligned in a predetermined direction in the layer and the alignment state is fixed. The “alignment solidified layer” is a concept including an alignment cured layer obtained by curing a liquid crystal monomer. The liquid crystal compound may be a rod-shaped liquid crystal compound, a discotic (disk-shaped) liquid crystal compound, or a combination thereof.

  In one embodiment, the anti-reflection layer comprises a discotic liquid crystal compound. More specifically, the reflection preventing layer is a layer in which a discotic liquid crystal compound is fixed in a state of being oriented in a predetermined direction. The discotic liquid crystal compound generally has a cyclic mother nucleus such as benzene, 1,3,5-triazine, calixarene, etc. arranged at the center of the molecule, a linear alkyl group, an alkoxy group, a substituted benzoyl group. A liquid crystal compound having a discotic molecular structure in which an oxy group or the like is radially substituted as its side chain. Typical examples of discotic liquid crystals include C.I. Destrade et al., Mol. Cryst. Liq. Cryst. 71, 111 (1981), benzene derivatives, triphenylene derivatives, truxene derivatives, phthalocyanine derivatives, B.I. Kohne et al., Angew. Chem. 96, page 70 (1984), and cyclohexane derivatives described in J. Am. M.M. Lehn et al. Chem. Soc. Chem. Commun. , 1794 (1985), J. Am. Zhang et al., J. Am. Chem. Soc. 116, 2655 (1994), and azacrown and phenylacetylene macrocycles. Further specific examples of the discotic liquid crystal compound include compounds described in, for example, JP-A-2006-133652, JP-A-2007-108732, JP-A-2010-244038, and JP-A-2014-214177. The above documents and publications are incorporated herein by reference. The anti-reflection layer containing a discotic liquid crystal compound can typically be a so-called negative A plate having a refractive index characteristic of nx = nz> ny.

  In another embodiment, the anti-reflection layer comprises a rod-like liquid crystal compound. More specifically, the antireflection layer is aligned in a state where the rod-like liquid crystal compounds are aligned in a predetermined direction (typically, the slow axis direction) (homogeneous alignment). Examples of the rod-like liquid crystal compound include a liquid crystal compound (nematic liquid crystal) in which a liquid crystal phase is a nematic phase. As such a liquid crystal compound, for example, a liquid crystal polymer or a liquid crystal monomer can be used. The liquid crystal compound may exhibit liquid crystallinity either lyotropic or thermotropic. The liquid crystal polymer and the liquid crystal monomer may be used alone or in combination. Any appropriate liquid crystal monomer can be adopted as the liquid crystal monomer. For example, polymerizable mesogenic compounds described in JP-T-2002-533742 (WO00 / 37585), EP358208 (US52111877), EP66137 (US4388453), WO93 / 22397, EP02661712, DE195504224, DE44081171, and GB2280445 can be used. Specific examples of such a polymerizable mesogenic compound include, for example, the trade name LC242 from BASF, the trade name E7 from Merck, and the trade name LC-Silicon-CC3767 from Wacker-Chem. As the liquid crystal monomer, for example, a nematic liquid crystal monomer is preferable. Specific examples of the liquid crystal compound are described in, for example, JP-A No. 2006-163343. The description in this publication is incorporated herein by reference. The antireflection layer containing the rod-shaped liquid crystal compound can be a so-called positive A plate having a refractive index characteristic of nx> ny = nz.

  The reflection preventing layer can typically function as a λ / 2 plate. When the reflection preventing layer functions as a λ / 2 plate, reflection can be favorably prevented by controlling the orientation angle (or slow axis direction). The in-plane retardation Re (550) of such a reflection preventing layer is 220 nm to 320 nm, more preferably 240 nm to 300 nm, and further preferably 250 nm to 280 nm. Here, Re (550) is an in-plane retardation measured with light having a wavelength of 550 nm at 23 ° C. Re (550) is obtained by Re (550) = (nx−ny) × d, where d (nm) is the thickness of the layer (film). nx is the refractive index in the direction in which the in-plane refractive index is maximum (ie, the slow axis direction), and ny is the refractive index in the direction perpendicular to the slow axis (ie, the fast axis direction) in the plane. is there.

  The angle formed by the slow axis of the antireflection layer 40 and the absorption axis of the polarizer 11 is preferably 35 ° to 55 °, more preferably 40 ° to 50 °, and even more preferably about 45 °. is there. By arranging the reflection preventing layer functioning as a λ / 2 plate at such an axial angle, reflection can be satisfactorily prevented.

  The thickness of the reflection preventing layer is preferably 1 μm to 5 μm, more preferably 1 μm to 3 μm. According to the embodiment of the present invention, even such a thin antireflection layer can favorably suppress peeling and wrinkles in a high temperature and high humidity environment.

  In the case where an alignment film is used for alignment of the liquid crystal compound, the antireflection layer and the antireflection layer-attached polarizing plate further include an alignment film between the antireflection layer 40 and the antireflection layer substrate 50. The alignment film generally contains a polymer material as a main component. Typical examples of the polymer material include polyvinyl alcohol, polyimide, and derivatives thereof. In the embodiment of the present invention, modified or unmodified polyvinyl alcohol is preferred. As the alignment film, for example, modified polyvinyl alcohol described in WO01 / 88574A1 and Japanese Patent No. 3907735 can be used. The alignment film is typically subjected to an alignment treatment. Typical examples of the alignment treatment include rubbing treatment and photo-alignment treatment. Since the rubbing process is well known in the industry, detailed description is omitted. As the alignment film subjected to the photo-alignment treatment (photo-alignment film), for example, those described in WO 2005/096041 and trade name LPP-JP265CP manufactured by Rolitechnologies can be used. The thickness of the alignment film is, for example, 0.01 μm to 10 μm, preferably 0.01 μm to 1 μm, and more preferably 0.01 μm to 0.5 μm.

  The antireflection layer can be formed, for example, by the following procedure. First, an alignment film-forming coating solution is applied on a reflection preventing layer base material and dried to form a coating film. The coating film is rubbed in a predetermined direction to form an alignment film on the antireflection layer substrate. The predetermined direction may correspond to the slow axis direction of the resulting antireflection layer. Next, a coating solution for forming a reflection preventing layer (for example, a solution containing a liquid crystal compound and, if necessary, a crosslinkable monomer) is applied onto the formed alignment film and heated. By heating, the solvent of the coating solution is removed and the alignment of the liquid crystal compound is advanced. Heating may be performed in one stage, or may be performed in multiple stages by changing the temperature. Next, the crosslinkable (or polymerizable) monomer is crosslinked (or polymerized) by ultraviolet irradiation to fix the alignment of the liquid crystal compound. In this manner, the reflection preventing layer is formed on the substrate for the reflection preventing layer (substantially on the alignment film). A method for aligning a discotic liquid crystal compound is described in, for example, Japanese Patent Application Laid-Open No. 2014-214177, and a method for aligning a rod-shaped liquid crystal compound is described in, for example, Japanese Patent Application Laid-Open No. 2006-163343. The descriptions in these publications are incorporated herein by reference. The alignment film may be omitted depending on the desired alignment state and the type of liquid crystal compound.

D. Reflection-preventing layer base material The anti-reflection layer substrate 50 is used to form the anti-reflection layer 50.

  Any appropriate resin film is used as the substrate for the reflection preventing layer. Examples of the resin film forming material include polyester resins such as polyethylene terephthalate (PET), cycloolefin resins such as norbornene resins, addition of cycloolefin (for example, norbornene) and α-olefin (for example, ethylene). Examples thereof include cellulose resins such as resin (COC) and triacetyl cellulose (TAC) obtained by polymerization.

  The thickness of the reflection-preventing layer base material can be appropriately set according to the purpose. The thickness of the reflection-preventing layer base material is typically 20 μm to 200 μm, and preferably 25 μm to 100 μm.

E. Antireflection layer substrate E-1. Antireflection Layer Substrate Body The antireflection layer substrate 20 is used to form the antireflection layer 30. As will be described later, an antireflection layer is formed on an antireflection layer substrate, and the antireflection layer forming process ( Typically, it is not necessary to use for sputtering. As a result, the polarizing plate is not exposed to a high temperature, so that the moisture content of the polarizing plate can be maintained in the desired range.

  The formation material and thickness of the base material for an antireflection layer are the same as those of the base material for an antireflection layer.

  As described above, the moisture content of the antireflection layer substrate 20 is 2.0% by weight or more, preferably 2.4% by weight or more, more preferably 2.7% by weight or more, and still more preferably. It is 3.0% by weight or more, and particularly preferably 3.5% by weight or more. The upper limit of the moisture content is, for example, 5.0% by weight. When the base material for an antireflection layer has such a high moisture content, the expansion and contraction of the base material for an antireflection layer under a high temperature and high humidity environment can be suppressed. Following this, the expansion and contraction of the base material for the reflection preventing layer can also be suppressed. As a result, the anti-reflection layer (alignment and solidification layer of the liquid crystal compound) can follow the expansion and contraction of the base material for the anti-reflection layer even in a high temperature and high humidity environment, thereby suppressing peeling and wrinkling of the anti-reflection layer. Can be done. Such a high moisture content of the base material for an antireflection layer can be realized by subjecting the base material for an antireflection layer to a humidification treatment. The humidification treatment can be performed by any appropriate method and conditions as long as the desired moisture content can be imparted to the antireflection layer substrate. The humidification treatment can be performed, for example, by placing the antireflection layer substrate in an environment of 65 ° C. and 90% RH for 24 hours.

  The rate of dimensional change after holding the base material for antireflection layer at 65 ° C. and 90% RH for 24 hours is preferably less than 0.03%, more preferably −0.03% to 0.0%. . The dimensional change rate is typically a dimensional change rate in a direction orthogonal to the transport direction. In addition, when the dimensional change rate is positive, it indicates expansion, and when it is negative, it indicates contraction.

E-2. Hard coat layer As mentioned above, the hard coat layer may be formed in the surface at the side of the antireflection layer of the base material for antireflection layers. By forming the hard coat layer, there is an advantage of improving the pencil hardness. Furthermore, the reflectance can be further reduced by appropriately adjusting the refractive index difference between the hard coat layer and the antireflection layer.

  The hard coat layer preferably has sufficient surface hardness, excellent mechanical strength, and excellent light transmittance. The hard coat layer may be formed from any appropriate resin as long as it has such desired properties. Specific examples of the resin include a thermosetting resin, a thermoplastic resin, an ultraviolet curable resin, an electron beam curable resin, and a two-component mixed resin. An ultraviolet curable resin is preferred. This is because the hard coat layer can be formed with a simple operation and high efficiency.

  Specific examples of the ultraviolet curable resin include polyester, acrylic, urethane, amide, silicone, and epoxy ultraviolet curable resins. The ultraviolet curable resin includes an ultraviolet curable monomer, oligomer, and polymer. As a preferable ultraviolet curable resin, a resin composition containing an acrylic monomer component or oligomer component having preferably 2 or more, more preferably 3 to 6 ultraviolet polymerizable functional groups can be mentioned. Typically, a photopolymerization initiator is blended in the ultraviolet curable resin.

  The hard coat layer can be formed by any appropriate method. For example, the hard coat layer can be formed by coating the resin composition for forming a hard coat layer on the base material for antireflection layer, drying it, and irradiating the dried coating film with ultraviolet rays and curing it.

  The thickness of the hard coat layer is, for example, 0.5 μm to 20 μm, preferably 1 μm to 15 μm.

  Details of the hard coat layer and the adhesion structure between the hard coat layer and the antireflection layer are described in, for example, JP-A-2006-224443. The description of the publication is incorporated herein by reference.

F. Antireflection layer Any appropriate configuration can be adopted as the configuration of the antireflection layer. As a typical configuration of the antireflection layer, (1) a single layer of a low refractive index layer having an optical film thickness of 120 nm to 140 nm and a refractive index of about 1.35 to 1.55; (2) for the antireflection layer And a laminate having a medium refractive index layer, a high refractive index layer, and a low refractive index layer in order from the substrate side; and (3) an alternating multilayer laminate of a high refractive index layer and a low refractive index layer.

Examples of the material capable of forming the low refractive index layer include silicon oxide (SiO ₂ ) and magnesium fluoride (MgF ₂ ). The refractive index of the low refractive index layer is typically about 1.35 to 1.55. Examples of materials that can form the high refractive index layer include titanium oxide (TiO ₂ ), niobium oxide (Nb ₂ O ₃ or Nb ₂ O ₅ ), tin-doped indium oxide (ITO), antimony-doped tin oxide (ATO), ZrO ₂ —TiO ₂ may be mentioned. The refractive index of the high refractive index layer is typically about 1.60 to 2.20. Examples of the material capable of forming the medium refractive index layer include titanium oxide (TiO ₂ ), and a mixture of a material capable of forming the low refractive index layer and a material capable of forming the high refractive index layer (for example, titanium oxide and oxide). A mixture with silicon). The refractive index of the medium refractive index layer is typically about 1.50 to 1.85. The thicknesses of the low refractive index layer, the middle refractive index layer, and the high refractive index layer can be set so as to realize an appropriate optical film thickness according to the layer structure of the antireflection layer, desired antireflection performance, and the like.

  The antireflection layer is typically formed by a dry process. Specific examples of the dry process include a PVD (Physical Vapor Deposition) method and a CVD (Chemical Vapor Deposition) method. Examples of the PVD method include a vacuum deposition method, a reactive deposition method, an ion beam assist method, a sputtering method, and an ion plating method. An example of the CVD method is a plasma CVD method. A sputtering method is preferable.

  The thickness of the antireflection layer is, for example, about 20 nm to 300 nm.

  In the antireflection layer, the difference between the maximum reflectance and the minimum reflectance in the wavelength range of 400 nm to 700 nm is preferably 2.0% or less, more preferably 1.9% or less, and still more preferably 1.8. % Or less. If the difference between the maximum reflectance and the minimum reflectance is within such a range, coloring of reflected light can be prevented well.

  If necessary, an antifouling layer may be provided on the surface of the antireflection layer. The antifouling layer contains, for example, a fluorine group-containing silane compound (for example, an alkoxysilane compound having a perfluoropolyether group) or a fluorine group-containing organic compound. The antifouling layer preferably exhibits water repellency with a water contact angle of 110 degrees or more.

G. 1st phase difference layer The 1st phase difference layer may be comprised with the phase difference film which has arbitrary appropriate optical characteristics and / or mechanical characteristics according to the objective. In one embodiment, the first retardation layer can function as a λ / 2 plate. By the first retardation layer functioning as a λ / 2 plate, wavelength dispersion characteristics after lamination with the second retardation layer functioning as a λ / 4 plate (especially, the wavelength at which the phase difference deviates from λ / 4). For the range, the phase difference can be adjusted appropriately. The in-plane retardation Re (550) of the first retardation layer is preferably 220 nm to 320 nm, more preferably 240 nm to 300 nm, and further preferably 250 nm to 280 nm.

  The thickness of the first retardation layer can be set so as to function most appropriately as a λ / 2 plate. In other words, the thickness can be set so as to obtain a desired in-plane retardation. Specifically, the thickness is preferably 10 μm to 60 μm, more preferably 30 μm to 50 μm.

  The first retardation layer preferably has a refractive index characteristic of nx> ny> nz. The Nz coefficient of the first retardation layer is preferably 1.1 to 3.0, more preferably 1.3 to 2.7. The Nz coefficient is obtained by Nz = Rth / Re. Rth is a thickness direction retardation, for example, Rth (550) is a thickness direction retardation measured at 23 ° C. with light having a wavelength of 550 nm. Rth (550) is obtained by Rth = (nx−nz) × d. nz is the refractive index in the thickness direction.

  The first retardation layer is arranged such that its slow axis forms an angle of preferably 10 ° to 20 °, more preferably 12 ° to 18 °, and even more preferably about 15 ° with the absorption axis of the polarizer. Can be done. In addition, when mentioning an angle in this specification, both clockwise and counterclockwise are included.

The first retardation layer preferably has an absolute value of the photoelastic coefficient of 2 × 10 ⁻¹¹ m ² / N or less, more preferably 2.0 × 10 ⁻¹³ m ² / N to 1.5 × 10 ^−11. m ² / N, more preferably from ^{1.0 × 10 -12 m 2 /N~1.2×10 -11} m 2 / N resin. When the absolute value of the photoelastic coefficient is in such a range, a phase difference change is unlikely to occur when a shrinkage stress is generated during heating. Therefore, by forming the first retardation layer using a resin having such an absolute value of the photoelastic coefficient, when the antireflection layer and the polarizing plate with the antireflection layer are applied to an image display device, Unevenness can be prevented well.

  The first retardation layer may exhibit a reverse dispersion wavelength characteristic in which the retardation value increases according to the wavelength of the measurement light, and has a positive chromatic dispersion characteristic in which the retardation value decreases according to the wavelength of the measurement light. It may also be possible to show a flat chromatic dispersion characteristic in which the phase difference value hardly changes depending on the wavelength of the measurement light. It is preferable to exhibit a flat wavelength dispersion characteristic. Specifically, Re (450) / Re (550) of the first retardation layer is preferably 0.99 to 1.03, and Re (650) / Re (550) is preferably 0.98 to 1.02. By arranging a λ / 2 plate (first retardation layer) and a λ / 4 plate (second retardation layer) having flat wavelength dispersion characteristics at a predetermined axial angle, an ideal inverse wavelength dispersion is achieved. A characteristic close to the characteristic can be obtained, and as a result, a very excellent antireflection characteristic can be realized.

  The first retardation layer can be composed of any appropriate resin film that can satisfy the above-described characteristics. Typical examples of such resins include cyclic olefin resins, polycarbonate resins, cellulose resins, polyester resins, polyvinyl alcohol resins, polyamide resins, polyimide resins, polyether resins, polystyrene resins, acrylic resins. Based resins. Among these, cyclic olefin-based resins can be suitably used. The first retardation layer can be obtained, for example, by stretching a film formed from the resin. Details of the method for stretching the cyclic olefin-based resin and the resin film (method for forming a retardation film) are described in, for example, JP-A Nos. 2015-210459 and 2016-105166. The description of this publication is incorporated herein by reference.

H. Second Retardation Layer The second retardation layer can be composed of a retardation film having any appropriate optical property and / or mechanical property depending on the purpose. When the first retardation layer functions as a λ / 2 plate, the second retardation layer can typically function as a λ / 4 plate. A circular polarization function in a wide wavelength range by correcting the wavelength dispersion characteristic of the second retardation layer functioning as a λ / 4 plate by the optical characteristics of the first retardation layer functioning as the λ / 2 plate. Can be demonstrated. The in-plane retardation Re (550) of the second retardation layer is preferably 100 nm to 180 nm, more preferably 110 nm to 170 nm, and further preferably 120 nm to 160 nm.

  The thickness of the second retardation layer can be set so as to function most appropriately as a λ / 4 plate. In other words, the thickness can be set so as to obtain a desired in-plane retardation. Specifically, the thickness is preferably 10 μm to 50 μm, and most preferably 20 μm to 40 μm.

  The second retardation layer preferably has a refractive index characteristic of nz> nx> ny. The Nz coefficient of the second retardation layer is preferably −10 to −0.1, more preferably −5 to −1.

  The second retardation layer is disposed such that the slow axis thereof forms an angle of 70 ° to 80 °, more preferably 72 ° to 78 °, and further preferably about 75 ° with the absorption axis of the polarizer. Can be done.

  The second retardation layer can be composed of any appropriate resin film that can satisfy the above-described characteristics. Such a resin can typically be a polymer having negative intrinsic birefringence. The polymer having negative intrinsic birefringence refers to a polymer having a relatively small refractive index in the orientation direction when the polymer is oriented by stretching or the like. Examples of the polymer having negative intrinsic birefringence include those in which a chemical bond or a functional group having a large polarization anisotropy such as an aromatic group or a carbonyl group is introduced into the side chain of the polymer. Specific examples include modified polyolefin resins (for example, modified polyethylene resins), acrylic resins, styrene resins, maleimide resins, fumarate ester resins, and the like. The second retardation layer can be obtained, for example, by appropriately stretching a film formed from the resin.

I. Manufacturing method of antireflection layer and polarizing plate with antireflection layer According to one embodiment of the present invention, a manufacturing method of an antireflection layer and a polarizing plate with an antireflection layer includes a polarizer laminate including a polarizer and a protective layer. Preparation: forming an antireflection layer by forming an antireflection layer on the base material for the antireflection layer; forming an antireflection layer on the base material for the antireflection layer, and preparing an antireflection layered body. And bonding the polarizer laminate, the reflection-preventing laminate, and the antireflection laminate.

  The polarizer laminate can be produced by any appropriate method. When a polarizer composed of a single-layer resin film is used, the polarizer and the resin film constituting the protective layer are bonded together via any appropriate adhesive layer (adhesive layer or pressure-sensitive adhesive layer). Good. When using the laminated body of the resin base material and the PVA-type resin layer (PVA-type resin film) laminated | stacked on the said resin base material, the said laminated body is used for a dyeing | staining and extending | stretching process, and a PVA-type resin layer is made into a polarizer. The laminate may be used as a polarizer laminate as it is. Alternatively, a resin film constituting a protective layer may be bonded to the polarizer surface of the laminate. In this case, the resin substrate may be peeled off or not peeled off. When using a polarizer obtained by using a laminate of a resin substrate and a PVA-based resin layer coated and formed on the resin substrate, as described in the above section B-1 (for example, JP A laminate of a resin base material / polarizer may be prepared (as described in 2012-73580) and this laminate may be used as a polarizer laminate as it is. Alternatively, a resin film constituting a protective layer may be bonded to the polarizer surface of the laminate. In this case, the resin substrate may be peeled off or not peeled off.

The antireflection laminate is produced by forming an antireflection layer on an antireflection layer substrate. When forming the antireflection layer, the antireflection layer substrate may be subjected to a surface treatment in advance, if necessary. Examples of the surface treatment include low-pressure plasma treatment, ultraviolet irradiation treatment, corona treatment, flame treatment, and acid or alkali treatment. Alternatively, an adhesion layer made of, for example, SiOx may be formed on the surface of the base material for the antireflection layer. As described above, the antireflection layer is typically formed by a dry process (for example, sputtering). For example, when the antireflection layer is an alternating multilayer laminate of a high refractive index layer and a low refractive index layer, for example, an Nb ₂ O ₅ film (high refractive index layer), SiO _{2 is} formed on the surface of the base material for the antireflection layer by sputtering. An antireflection layer can be formed by sequentially forming a film (low refractive index layer), an Nb ₂ O ₅ film (high refractive index layer), and an SiO ₂ film (low refractive index layer).

  The antireflection laminate is produced by forming an antireflection layer on the antireflection layer substrate. The procedure for forming the reflection preventing layer is as described in the above section C.

  Finally, a polarizing plate with an antireflection layer and an antireflection layer can be obtained by pasting together a polarizer laminate, an antireflection laminate and an antireflection laminate. The antireflection laminate may be bonded to the reflection preventing laminate / polarizer laminate, or the antireflection laminate / reflection preventing laminate may be bonded to the polarizer stack. . An antireflection layer and a polarizing plate with an antireflection layer are, for example, an antireflection layered product on the surface of a protective layer of a polarizer layered product via any appropriate adhesive layer (for example, an adhesive layer or an adhesive layer). Can be obtained by laminating the antireflection layer of the antireflection layer of the antireflection laminate, and then bonding the antireflection layer substrate of the antireflection laminate to the surface of the antireflection layer substrate. . In the embodiment of the present invention, as described above, the moisture content of the base material for an antireflection layer at the time of bonding is 2.0% by weight or more. Such a moisture content can be realized by previously humidifying the antireflection layer substrate.

J. et al. Image Display Device The antireflection layer and the antireflection layer-attached polarizing plate according to the embodiment of the present invention can be applied to an image display device. Typically, the antireflection layer and the antireflection layer-attached polarizing plate can be disposed on the viewing side of the image display device so that the antireflection layer is on the viewing side. Typical examples of the image display device include a liquid crystal display device, an organic electroluminescence (EL) display device, and a quantum dot display device.

  EXAMPLES Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited by these Examples. In addition, the measuring method of each characteristic is as follows.

(1) Moisture content of base material for antireflection layer The base material for antireflection layer used in Examples and Comparative Examples was cut into a size of 200 mm × 300 mm so that the transport direction was the short side, and this was used as a measurement sample. The initial weight of the measurement sample was measured. Subsequently, this measurement sample was dried at 120 ° C. for 24 hours, the dry weight was measured, and the moisture content was determined by the following formula.
Moisture content (% by weight) = [(initial weight−dry weight) / initial weight] × 100
(2) Peeling and wrinkling The antireflection layer and the antireflection layer-obtained polarizing plate obtained in Examples and Comparative Examples were cut into 200 mm × 300 mm so that the absorption axis direction of the polarizer would be the short side, and formed on a glass plate A sample to be measured was attached. The measurement sample was subjected to a severe humidification durability test under the following two conditions. Ten test samples were used for the test, and peeling and wrinkles at the four corners of the antireflection layer and the antireflection layer-coated polarizing plate in each measurement sample were observed, and the occurrence rate and average length were calculated. In addition, about the incidence rate, the presence or absence of peeling and wrinkles was visually observed, and the incidence rate was determined from the number of locations where out of 40 locations (10 measurement samples × 4 corners). About average length, length was measured with the ruler and the average value was computed.
<Test condition 1>
The measurement sample was placed in an oven at 85 ° C. and 85% RH for 100 hours.
<Test condition 2>
Glycerin was applied to the periphery of the polarizing plate with the antireflection layer and the antireflection layer in the measurement sample using a syringe, and the coated sample was placed in an oven at 65 ° C. and 90% RH for 24 hours.

[Example 1]
1. Production of Polarizing Plate (Polarizer Laminate) As a resin base material, an amorphous isophthalic acid copolymerized polyethylene terephthalate (IPA copolymerized PET) film (thickness: 0.75%, water absorption 0.75%, Tg 75 ° C.) 100 μm) was used. One side of the substrate was subjected to corona treatment, and polyvinyl alcohol (degree of polymerization 4200, saponification degree 99.2 mol%) and acetoacetyl-modified PVA (degree of polymerization 1200, degree of acetoacetyl modification 4.6) were applied to this corona-treated surface. %, A saponification degree of 99.0 mol% or more, an aqueous solution containing 9: 1 ratio of Nippon Gosei Kagaku Kogyo Co., Ltd., trade name “Gosefimer Z200”) was applied and dried at 25 ° C. to a thickness of 11 μm. A PVA resin layer was formed to prepare a laminate.
The obtained laminate was uniaxially stretched in the longitudinal direction (longitudinal direction) 2.0 times between rolls having different peripheral speeds in an oven at 120 ° C. (air-assisted stretching).
Next, the laminate was immersed in an insolubilization bath (a boric acid aqueous solution obtained by blending 4 parts by weight of boric acid with respect to 100 parts by weight of water) for 30 seconds (insolubilization treatment).
Subsequently, it was immersed in a dyeing bath having a liquid temperature of 30 ° C. while adjusting the iodine concentration and the immersion time so that the polarizing plate had a predetermined transmittance. In this example, 0.2 parts by weight of iodine was blended with 100 parts by weight of water and immersed in an aqueous iodine solution obtained by blending 1.5 parts by weight of potassium iodide (dyeing treatment). .
Subsequently, it was immersed for 30 seconds in a crosslinking bath having a liquid temperature of 30 ° C. (a boric acid aqueous solution obtained by blending 3 parts by weight of potassium iodide and 3 parts by weight of boric acid with respect to 100 parts by weight of water). (Crosslinking treatment).
Thereafter, the laminate was immersed in a boric acid aqueous solution (an aqueous solution obtained by blending 4 parts by weight of boric acid and 5 parts by weight of potassium iodide with respect to 100 parts by weight of water) at a liquid temperature of 70 ° C. However, uniaxial stretching was performed between the rolls having different peripheral speeds in the longitudinal direction (longitudinal direction) so that the total stretching ratio was 5.5 times (in-water stretching).
Thereafter, the laminate was immersed in a cleaning bath (an aqueous solution obtained by blending 4 parts by weight of potassium iodide with respect to 100 parts by weight of water) at a liquid temperature of 30 ° C. (cleaning treatment).
Subsequently, on the surface of the PVA resin layer (polarizer) of the laminate, an aqueous PVA resin solution (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name “Gosefimer (registered trademark) Z-200”, resin concentration: 3% by weight. ), And a methacrylic resin film (thickness: 25 μm, having a glutarimide structure) constituting the protective layer was bonded and heated in an oven maintained at 60 ° C. for 5 minutes. Thereafter, the resin substrate was peeled from the PVA resin layer. Subsequently, on the PVA resin layer surface (resin substrate peeling surface) of the laminate, a PVA resin aqueous solution (manufactured by Nippon Synthetic Chemical Industry Co., Ltd., trade name “Gosefimer (registered trademark) Z-200”, resin concentration: 3% by weight) was applied, a methacrylic resin film (thickness: 40 μm, having a glutarimide structure) constituting the protective layer was bonded, and this was heated in an oven maintained at 60 ° C. for 5 minutes. Thus, the polarizer laminated body (polarizing plate which has the structure of a protective layer / polarizer / protective layer) was obtained. The polarizer had a thickness of 5 μm and a single transmittance of 42.3%.

2. Preparation of anti-reflection laminate By forming a hard coat (HC) layer (thickness: 7 μm) on one side of a TAC film (product name: KC2UA, thickness: 25 μm) manufactured by Konica Minolta Co., Ltd., HC− A TAC film (thickness: 32 μm) was obtained. This HC-TAC film was used as a base material for an antireflection layer. An adhesion layer (thickness: 10 nm) made of SiOx is formed on the surface of the HC layer of the base material for the antireflection layer by sputtering, and an Nb ₂ O ₅ film (high refractive index layer) and an SiO ₂ film are formed on the adhesion layer. (Low refractive index layer), Nb ₂ O ₅ film (high refractive index layer), and SiO ₂ film (low refractive index layer) are sequentially formed to form an antireflection layer (thickness or optical film thickness: 200 nm). Formed. Further, an antifouling layer (thickness: 10 nm) made of an alkoxysilane compound having a perfluoropolyether group was formed on the antireflection layer to produce an antireflection laminate. This antireflection laminate was subjected to a humidification treatment (left in an oven at 65 ° C. and 90% RH for 24 hours). The moisture content of the obtained antireflection laminate (substantially, the base material for the antireflection layer) was 3.8% by weight.

3. Reflection-preventing laminate On one side of a TAC film (product name: KC4UY, thickness: 40 μm) manufactured by Konica Minolta, Inc. as a base material for an anti-reflection layer, <Example 1> of JP-A No. 2014-214177 An alignment film and an alignment solidified layer (reflection preventing layer) of the liquid crystal compound were formed according to the method described above to produce a reflection preventing laminate. The antireflection layer was formed so that the in-plane retardation Re (550) was 270 nm and the slow axis thereof was at an angle of 45 ° with respect to the absorption axis of the polarizer.

4). Preparation of polarizing plate with antireflection layer and antireflection layer Antireflection layer of antireflection layered body through acrylic adhesive (thickness: 20 μm) on the protective layer surface of polarizer laminate (polarizing plate) with a thickness of 40 μm The HC-TAC film of the antireflection laminate is bonded to the surface of the base material for the antireflection layer of the obtained laminate through an acrylic adhesive (thickness: 20 μm), and the antireflection layer And the polarizing plate with a reflection preventing layer was obtained. The obtained polarizing plate with an antireflection layer was subjected to the evaluation of (2) above. The results are shown in Table 1.

[Example 2]
Implemented except that the condition of the humidification treatment of the antireflection laminate was changed to “40 ° C., 92% RH and 24 hours”, and the moisture content of the base material for the antireflection layer at the time of bonding was 3.1 wt% A polarizing plate with an antireflection layer and an antireflection layer was produced in the same manner as in Example 1. The obtained polarizing plate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[Comparative Example 1]
The antireflection layer and the antireflection layer were the same as in Example 1 except that the antireflection laminate was not humidified and the moisture content of the base material for the antireflection layer at the time of bonding was 1.6% by weight. An attached polarizing plate was produced. The obtained polarizing plate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

[Comparative Example 2]
The antireflection laminate and the antireflection layer were the same as in Example 1 except that the antireflection laminate was vacuum-dried for 72 hours, and the moisture content of the base material for the antireflection layer at the time of bonding was 0.4% by weight. An attached polarizing plate was produced. The obtained polarizing plate was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

  As is clear from Table 1, the antireflection layer and the antireflection layer polarizing plate of the examples of the present invention were compared in the antireflection layer peeling and wrinkle generation rate and average length in a high temperature and high humidity environment. It is significantly suppressed compared to the example. It can be seen that such excellent characteristics are realized by adjusting the moisture content of the base material for the antireflection layer.

  The antireflection layer and the antireflection layer-attached polarizing plate of the present invention are suitably used for image display devices such as liquid crystal display devices, organic EL display devices, and quantum dot display devices.

DESCRIPTION OF SYMBOLS 10 Polarizing plate 11 Polarizer 12 Protective layer 20 Base material for antireflection layer 30 Antireflection layer 40 Antireflection layer 50 Base material for antireflection layer 100 Polarizing plate with antireflection layer and antireflection layer

Claims (7)

A polarizer and a polarizing plate having a protective layer provided on one side of the polarizer, an antireflection layer that is an alignment solidified layer of a liquid crystal compound bonded to the protective layer, and an antireflection layer base A material, an antireflection layer substrate bonded to the antireflection layer substrate, and an antireflection layer directly formed on the antireflection layer substrate,
The moisture content of the base material for an antireflection layer is 2.0% by weight or more,
Polarizing plate with antireflection layer and antireflection layer.   The antireflection layer and the antireflection layer according to claim 1, wherein a dimensional change rate of the base material for an antireflection layer after being held at 65 ° C. and 90% RH for 24 hours is less than 0.03%. Polarizer.   The antireflection layer and the antireflection layer-attached polarizing plate according to claim 1, wherein the antireflection layer is an alignment solidified layer of a liquid crystal compound.   The antireflection layer and polarizing plate with an antireflection layer according to any one of claims 1 to 3, wherein an in-plane retardation Re (550) of the antireflection layer is 220 nm to 320 nm.   The antireflection layer according to any one of claims 1 to 4, further comprising an alignment film between the antireflection layer and the base material for the antireflection layer, wherein the alignment film contains a polyvinyl alcohol-based resin. Polarizing plate with anti-reflection layer. A method for producing a polarizing plate with an antireflection layer and a reflection preventing layer according to any one of claims 1 to 5,
Producing a polarizer laminate comprising a polarizer and a protective layer;
Forming an antireflection layer on the base material for the antireflection layer to produce an antireflection laminate,
Forming a reflection preventing layer on the substrate for the reflection preventing layer to produce a reflection preventing laminate, and bonding the polarizer laminate, the reflection preventing laminate and the antireflection laminate;
Including
The moisture content of the base material for an antireflection layer is 2.0% by weight or more,
Production method. The manufacturing method of Claim 6 with which the said base material for antireflection layers is humidified.

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