TW201815673A - High hardness TaC coated carbon material and manufacturing method for same - Google Patents
High hardness TaC coated carbon material and manufacturing method for same Download PDFInfo
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- TW201815673A TW201815673A TW106117363A TW106117363A TW201815673A TW 201815673 A TW201815673 A TW 201815673A TW 106117363 A TW106117363 A TW 106117363A TW 106117363 A TW106117363 A TW 106117363A TW 201815673 A TW201815673 A TW 201815673A
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- 239000003575 carbonaceous material Substances 0.000 title claims abstract description 54
- 238000004519 manufacturing process Methods 0.000 title description 4
- 238000000576 coating method Methods 0.000 claims abstract description 122
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 118
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 116
- 239000011248 coating agent Substances 0.000 claims abstract description 110
- 239000000758 substrate Substances 0.000 claims description 121
- 238000000034 method Methods 0.000 claims description 30
- 238000005229 chemical vapour deposition Methods 0.000 claims description 12
- 239000011148 porous material Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 abstract description 12
- 239000011247 coating layer Substances 0.000 abstract description 7
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 163
- 229910003468 tantalcarbide Inorganic materials 0.000 description 163
- 239000010410 layer Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000004458 analytical method Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005470 impregnation Methods 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 238000004626 scanning electron microscopy Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 238000012886 linear function Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
- C01B32/914—Carbides of single elements
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
- C23C4/10—Oxides, borides, carbides, nitrides or silicides; Mixtures thereof
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
本發明涉及一種碳基材和碳基材上形成的具有高粘附力的TaC塗層的高硬度TaC塗層碳材料及其製備方法。The invention relates to a carbon substrate and a high-hardness TaC coating carbon material with a high adhesion TaC coating formed on the carbon substrate and a preparation method thereof.
有關在基材表面引入多種材料的薄膜,從而提高材料的耐磨性、耐蝕性等的研究正在多方面被進行。其中,碳化鉭(TaC)塗層在耐熱性、耐磨性、及耐氣體蝕刻性等方面比現有的薄膜材料具有更優秀的特性,因此受到關注。最近,正在將碳材料中形成有TaC塗層的碳化鉭塗層碳材料用於半導體單結晶製造設備部件、精密工作器、引擎部件等多種產業現場。Studies on introducing thin films of various materials on the surface of a substrate to improve the abrasion resistance and corrosion resistance of the materials are being carried out in various aspects. Among them, tantalum carbide (TaC) coatings have attracted attention because they have more excellent properties than conventional thin film materials in terms of heat resistance, abrasion resistance, and gas etching resistance. Recently, tantalum carbide-coated carbon materials having a TaC coating formed on the carbon materials are being used in various industrial sites such as semiconductor single crystal manufacturing equipment parts, precision work tools, and engine parts.
但是由此形成的TaC塗層在與碳基材的粘附性方面具有各種問題。因此,最近為了增加碳基材上的粘附力同時增加表面硬度,進行了有關TaC薄膜塗層方法的多方面研究。However, the TaC coating thus formed has various problems in terms of adhesion to a carbon substrate. Therefore, in order to increase the adhesion on the carbon substrate while increasing the surface hardness, various researches on the TaC thin film coating method have been recently conducted.
技術課題Technical topics
本發明的目的在於提供一種優秀物理性質的TaC塗層碳材料,與碳基材具有優秀的粘附性,同時具有高硬度。An object of the present invention is to provide a TaC-coated carbon material with excellent physical properties, has excellent adhesion to a carbon substrate, and has high hardness.
但是,本發明要解決的課題並不僅局限於上述提及的課題,本領域具通常知識的技術人員通過以下記載還可清楚地理解未提及的或其他的課題。However, the problems to be solved by the present invention are not limited to the problems mentioned above, and those skilled in the art with ordinary knowledge can clearly understand the unmentioned or other problems through the following description.
技術方案Technical solutions
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料,包括:碳基材;和形成在所述碳基材上的TaC塗層,且自所述碳基材表面深度為150μm的區域的TaC含量為15vol%-20vol%。According to an embodiment of the present invention, a high-hardness TaC-coated carbon material is provided, including: a carbon substrate; and a TaC coating formed on the carbon substrate and having a depth of 150 μm from the surface of the carbon substrate. The TaC content in the region is 15 vol% to 20 vol%.
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料,自所述碳基材表面深度為80μm的區域的TaC含量為16vol%-20vol%,且自所述碳基材表面深度為80μm-150μm的區域的TaC含量為13vol%-18vol%。According to an embodiment of the present invention, a high-hardness TaC-coated carbon material is provided. The TaC content from a region with a depth of 80 μm from the surface of the carbon substrate is 16 vol% to 20 vol%, and the depth from the surface of the carbon substrate is The TaC content in the region of 80 μm to 150 μm is 13 vol% to 18 vol%.
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料,所述TaC塗層的表面刮痕值為3.5N以上。According to an embodiment of the present invention, a high-hardness TaC coating carbon material is provided, and a surface scratch value of the TaC coating is 3.5N or more.
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料,所述TaC塗層的表面刮痕值通過以下數學式1獲得, [數學式1] 表面刮痕值(N)=自所述碳基材表面深度為80μm -150μm的區域的TaC含量(vol%)x (1.4至1.6)-19.5。According to an embodiment of the present invention, a high-hardness TaC coating carbon material is provided. The surface scratch value of the TaC coating is obtained by the following mathematical formula 1. [Mathematical formula 1] Surface scratch value (N) = from The carbon substrate has a TaC content (vol%) x (1.4 to 1.6) -19.5 in a region having a surface depth of 80 μm to 150 μm.
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料的製備方法,包括以下步驟:準備平均氣孔率為15vol%-20vol%的碳基材;以及在所述碳基材的表面形成TaC塗層。According to an embodiment of the present invention, a method for preparing a high-hardness TaC-coated carbon material is provided, including the following steps: preparing a carbon substrate having an average porosity of 15 vol% -20 vol%; and forming a carbon substrate on the surface of the carbon substrate TaC coating.
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料的製備方法,形成所述TaC塗層的步驟,是TaC浸漬到所述碳基材的氣孔中,在所述碳基材的內部形成與所述TaC塗層相接的TaC浸漬區域。According to an embodiment of the present invention, a method for preparing a high-hardness TaC-coated carbon material is provided. The step of forming the TaC coating is to immerse TaC in the pores of the carbon substrate. A TaC-impregnated area is formed inside to contact the TaC coating.
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料的製備方法,準備所述碳基材的步驟,是通過以下數學式2,準備根據所述高硬度TaC塗層碳材料的所需表面刮痕值的具有所述平均氣孔率的碳基材, [數學式2] 碳基材的平均氣孔率(vol%)=(表面刮痕值N+19.5) x(0.65至0.7)。According to an embodiment of the present invention, a method for preparing a high-hardness TaC-coated carbon material is provided. The step of preparing the carbon substrate is prepared by the following mathematical formula 2 according to the following formula: For a carbon substrate having the average porosity that requires a surface scratch value, [Mathematical formula 2] The average porosity (vol%) of the carbon substrate = (surface scratch value N + 19.5) x (0.65 to 0.7).
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料的製備方法,形成所述TaC塗層的步驟,是利用化學氣相沉積(CVD)在1900攝氏度至2500攝氏度下被執行。According to an embodiment of the present invention, a method for preparing a high-hardness TaC-coated carbon material is provided. The step of forming the TaC coating is performed by using chemical vapor deposition (CVD) at a temperature of 1900 ° C to 2500 ° C.
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料的製備方法,形成所述TaC塗層的步驟被多次執行,形成多個TaC塗層。 技術效果According to an embodiment of the present invention, a method for preparing a high-hardness TaC coating carbon material is provided. The steps of forming the TaC coating are performed multiple times to form multiple TaC coatings. Technical effect
根據本發明的一個實施例,可提供一種碳材料,含有具優秀粘附力的高硬度TaC塗層。由此,根據本發明的一個實施例的碳材料,可被多樣化地用於需要優秀粘附力及硬度等的塗層材料的各種產業設備中,包括半導體生產設備。According to an embodiment of the present invention, a carbon material may be provided, which contains a high-hardness TaC coating with excellent adhesion. Therefore, the carbon material according to an embodiment of the present invention can be used in various industrial equipment including semiconductor production equipment in various coating materials requiring excellent adhesion and hardness.
以下參照附圖,對本發明的高硬度TaC塗層碳材料及其製備方法的實施例進行詳細說明。以下說明的實施例及附圖可被多樣化地改變。此外,與附圖符號無關,相同的結構要素附於相同的元件符號,且有關其的重複說明被省略。以下說明的實施例並不用於限制實施形態,應理解其包括實施例的所有改變、均等物及替代物。此外,在說明本發明時,有關已知性能或結構的具體說明被判斷使本發明的要點變得模糊不清時,省略詳細說明。Hereinafter, embodiments of the high-hardness TaC-coated carbon material of the present invention and a preparation method thereof will be described in detail with reference to the accompanying drawings. The embodiments and drawings described below can be variously changed. In addition, irrespective of the reference signs, the same structural elements are attached to the same element signs, and repeated descriptions thereof are omitted. The embodiments described below are not intended to limit the embodiments, and it should be understood that they include all changes, equivalents, and alternatives of the embodiments. In the description of the present invention, detailed descriptions of known properties or structures are judged to obscure the gist of the present invention, and detailed descriptions are omitted.
此外,本發明中使用的技術用語作為用於適當表現本發明的優選實施例的用語,其根據使用者、運用者的意圖或本發明所屬的領域規則而有所不同。因此,有關技術用語的定義應根據本說明書的整個內容。各附圖中示出的相同元件符號表示相同的部件。In addition, the technical terms used in the present invention, as the terms used to appropriately represent the preferred embodiments of the present invention, differ according to the intention of the user, the operator, or the rules of the field to which the present invention belongs. Therefore, the definition of technical terms should be based on the entire content of this specification. The same element symbols shown in the drawings indicate the same components.
整個說明書中,當一個部件位於另一部件「之上」時,不僅是指該部件與另一部件相接,還包括兩個部件之間存在其他部件的情況。Throughout the specification, when a component is "on" another component, it not only means that the component is in contact with another component, but also includes the case where there are other components between the two components.
在整個說明書中,描述「包含」某一部分某一結構要素時,其並不表示將無相反記載的其他結構要素除外,其也可以是指進一步包含其他的結構要素。Throughout the specification, when describing a "contained" part of a certain structural element, it does not mean that other structural elements that are not described to the contrary are excluded. It may also refer to further including other structural elements.
一般,在碳材料上形成TaC塗層的工程中存在的問題是被塗抹的TaC層的硬度和作為基材的碳材料的粘附力。最近在多方面進行了相關的研究,來用於提高根據基材的多種物理性質變化的TaC塗層的硬度和粘附力。本發明的目的是對上述研究的延續,著眼於碳材料的氣孔率,提出適合於TaC塗層的碳材料。Generally, problems in the process of forming a TaC coating on a carbon material are the hardness of the applied TaC layer and the adhesion of the carbon material as a substrate. Related studies have recently been conducted in various aspects to improve the hardness and adhesion of TaC coatings that vary according to various physical properties of the substrate. The purpose of the present invention is to continue the above research, focusing on the porosity of carbon materials, and proposing carbon materials suitable for TaC coatings.
根據本發明的一個實施例,提供一種高硬度TaC塗層碳材料,包括:碳基材;和形成在所述碳基材上的TaC塗層,且自所述碳基材表面深度為80μm -150μm的區域的TaC含量為15vol%-20vol%。According to an embodiment of the present invention, a high-hardness TaC coating carbon material is provided, including: a carbon substrate; and a TaC coating formed on the carbon substrate, and a depth of 80 μm from a surface of the carbon substrate- The TaC content in the 150 μm region is 15 vol% to 20 vol%.
所述碳基材,可以是含有石墨,以碳為主要成分的任何基材。所述TaC塗層可包括以鉭(Ta)和碳(C)為主要成分的任何材料。在圖1中示出,本發明的一個實施例中提供的含有氣孔的碳基材(110)的截面概念圖。The carbon substrate may be any substrate containing graphite and containing carbon as a main component. The TaC coating may include any material mainly composed of tantalum (Ta) and carbon (C). FIG. 1 is a conceptual cross-sectional view of a carbon substrate (110) containing pores provided in an embodiment of the present invention.
圖2是示出根據本發明的實施例的高硬度TaC塗層碳材料的截面概念圖,其包括:含有TaC成分浸漬區域(130)的碳基材和碳基材上形成的TaC塗層(120)。所述浸漬區域(130)可包括自所述碳基材表面深度為80μm -150μm的區域(131)。自所述碳基材表面深度為80μm -150μm的區域可以是所述TaC塗層的TaC成分浸漬到所述碳基材的氣孔中形成的區域,實際上是對塗層的表面硬度和基材粘附力產生影響的區域。2 is a conceptual cross-sectional view illustrating a high-hardness TaC-coated carbon material according to an embodiment of the present invention, which includes a carbon substrate containing a TaC component impregnated region (130) and a TaC coating formed on the carbon substrate ( 120). The impregnated region (130) may include a region (131) having a depth of 80 μm to 150 μm from the surface of the carbon substrate. A region having a depth of 80 μm to 150 μm from the surface of the carbon substrate may be a region formed by immersing the TaC component of the TaC coating in the pores of the carbon substrate, which is actually the surface hardness of the coating and the substrate. The area where adhesion is affecting.
此外,自所述碳基材表面深度為80μm -150μm的區域的TaC含量為15vol%-20vol%。當TaC含量為15vol%-20vol%時,可以實現本發明的一側面中提出的具優秀粘附力和表面硬度的高硬度TaC塗層碳材料。當所述區域的TaC含量為15vol%以下時,與TaC塗層的粘附力較弱,具有表面硬度不夠的問題。當TaC含量超過20vol%時,石墨的氣孔過多地被形成,具有會增加表面粗造度或是塗層表面較粗地被形成的問題。此外,優選是所述區域的TaC含量為16.5vol%-20vol%。此外,更優選是所述區域的TaC含量為18vol%-20vol%。所述區域的TaC含量增加時表示碳基材上的氣孔率較高,且實際上,氣孔率越高的碳基材上所形成的TaC塗層材料,越具有優秀的粘附力和表面硬度。In addition, the TaC content in the region from the surface of the carbon substrate to a depth of 80 μm to 150 μm is 15 vol% to 20 vol%. When the TaC content is 15 vol% to 20 vol%, a high-hardness TaC-coated carbon material with excellent adhesion and surface hardness proposed in one aspect of the present invention can be realized. When the TaC content in the region is 15 vol% or less, the adhesion with the TaC coating is weak, and there is a problem that the surface hardness is insufficient. When the TaC content exceeds 20 vol%, graphite pores are excessively formed, and there is a problem that the surface roughness is increased or the coating surface is formed coarsely. Further, it is preferable that the TaC content of the region is 16.5 vol% to 20 vol%. Further, it is more preferable that the TaC content of the region is 18 vol% to 20 vol%. When the TaC content in the region increases, it means that the porosity on the carbon substrate is higher, and in fact, the TaC coating material formed on the carbon substrate with higher porosity has more excellent adhesion and surface hardness. .
作為本發明的一個示例,自所述碳基材表面深度為40μm -75μm的區域的TaC含量為16vol%-20vol%,自所述碳基材表面深度為75μm -150μm的區域的TaC含量可為13vol%-18vol%。As an example of the present invention, the TaC content from a region with a depth of 40 μm to 75 μm on the surface of the carbon substrate is 16 vol% to 20 vol%, and the TaC content from a region with a depth of 75 μm to 150 μm on the surface of the carbon substrate may be 13vol% -18vol%.
如圖2所示,自所述碳基材表面深度為80μm -150μm的區域(131)可區分成TaC含量不同的兩個區域:自所述碳基材表面深度為40μm -75μm的第一區域(132),和自所述碳基材表面深度為75μm -150μm的第二區域(133)。As shown in FIG. 2, a region (131) having a depth of 80 μm to 150 μm from the surface of the carbon substrate can be divided into two regions having different TaC contents: a first region having a depth of 40 μm to 75 μm from the surface of the carbon substrate. (132), and a second region (133) having a depth of 75 μm to 150 μm from the surface of the carbon substrate.
所述第一區域,作為與所述TaC塗層相鄰的層,是TaC成分可充分浸漬到基材的氣孔中的區域。因此,是碳基材中浸漬率最高的區域。雖然所述碳基材上形成的TaC塗層的粘附力和表面硬度,可能根據工程溫度及Ta/C比例等工程條件而有所不同,但TaC塗層形成後所述第一區域的TaC含量為16vol%-20vol%時可具有優秀的表面硬度。所述第二區域相比第一區域自基材表面更深,作為與所述第一區域相鄰的層,是所述塗層的TaC成分相對較少被浸漬的區域。但是,該區域的TaC含量也會對碳基材上形成的TaC塗層的粘附力及表面硬度產生影響。所述第二區域的TaC含量為13vol%-18vol%時,所述碳基材上形成的TaC塗層可具有優秀的粘附力及表面硬度。所述第一區域和第二區域的TaC含量可以是逐漸變化。The first region, as a layer adjacent to the TaC coating layer, is a region where the TaC component can be sufficiently impregnated into the pores of the substrate. Therefore, it is the region with the highest impregnation rate among the carbon substrates. Although the adhesion and surface hardness of the TaC coating formed on the carbon substrate may vary according to engineering conditions such as engineering temperature and Ta / C ratio, the TaC of the first region after the TaC coating is formed When the content is 16vol% -20vol%, it can have excellent surface hardness. The second region is deeper from the surface of the substrate than the first region, and as a layer adjacent to the first region, is a region where the TaC component of the coating is relatively less impregnated. However, the TaC content in this region also affects the adhesion and surface hardness of the TaC coating formed on the carbon substrate. When the TaC content in the second region is 13 vol% to 18 vol%, the TaC coating formed on the carbon substrate may have excellent adhesion and surface hardness. The TaC content of the first and second regions may be gradually changed.
根據本發明的一個示例,所述TaC塗層的表面刮痕值可為3.5N以上。作為確定所述TaC塗層的優秀粘附力的方法,可使用類似於4點式彎曲測試(4-Point Bending test)、剝離測試(Peel-Off test)、百格測試(Scotch tape test)、附著強度測試(adhesion strength test)等的多種測試方法。其中,刮痕測試(Scrach Test)亦為一種容易準備且檢測方便、在產業中經常被使用的確定粘附力的測試方法。所述刮痕測試是利用末端為圓形的觸針(stylus),使薄膜表面負荷增加,同時移動基板,通過薄膜被脫落時的臨界負荷值來計算附著力。因此,刮痕值越高表示粘附力更強大。經本發明的一個示例被提供的高硬度TaC塗層碳材料的所述TaC塗層的表面刮痕值可為3.5N以上。此外,優選是,所述TaC塗層的表面刮痕值為3.5N以上。當所述TaC塗層的表面刮痕值未滿3.5N時,與基材表面的粘附力不足,具有較難在產業中被適用的問題。此外,更優選是,所述TaC塗層的表面刮痕值為8.0N以上。在此發現,自所述碳基材表面深度為80μm -150μm的區域的TaC含量增加時,所述表面刮痕值也隨之均勻地增加。由於所述TaC含量,在所述TaC成分浸漬到碳基材上的氣孔後被確定,因此,自所述碳基材表面深度為80μm -150μm的區域的平均氣孔率增加時,所述TaC塗層與所述碳基材之間的粘附力增加。According to an example of the present invention, a surface scratch value of the TaC coating may be 3.5N or more. As a method for determining the excellent adhesion of the TaC coating, similar to a 4-Point Bending test, Peel-Off test, Scotch tape test, Various test methods such as adhesion strength test. Among them, the Scratch Test is also a test method for determining adhesion that is easy to prepare and convenient to detect, and is often used in the industry. In the scratch test, a stylus with a round end is used to increase the surface load of the film, and at the same time, the substrate is moved, and the adhesion is calculated by the critical load value when the film is peeled off. Therefore, a higher scratch value indicates stronger adhesion. The surface scratch value of the TaC coating of the high-hardness TaC coating carbon material provided through an example of the present invention may be 3.5N or more. In addition, the surface scratch value of the TaC coating is preferably 3.5N or more. When the surface scratch value of the TaC coating is less than 3.5N, the adhesion to the surface of the substrate is insufficient, which has a problem that it is difficult to be applied in the industry. In addition, it is more preferable that the surface scratch value of the TaC coating is 8.0 N or more. It was found here that when the TaC content from a region having a depth of 80 μm to 150 μm on the surface of the carbon substrate increases, the surface scratch value also increases uniformly. The TaC content is determined after the TaC component is impregnated into the pores on the carbon substrate. Therefore, when the average porosity of a region with a depth of 80 μm to 150 μm on the surface of the carbon substrate increases, the TaC coating is applied. The adhesion between the layer and the carbon substrate is increased.
根據本發明的一個示例,所述TaC塗層的表面刮痕值可通過以下數學式1獲得。 [數學式1] 表面刮痕值(N)=自所述碳基材表面深度為80μm -150μm的區域的TaC含量(vol%)x(1.4至1.6)-19.5。According to an example of the present invention, the surface scratch value of the TaC coating can be obtained by the following mathematical formula 1. [Mathematical formula 1] Surface scratch value (N) = TaC content (vol%) x (1.4 to 1.6) -19.5 from a region where the surface depth of the carbon substrate is 80 μm to 150 μm.
用於決定所述碳基材上形成的所述TaC塗層的粘附力的原因有多種,如上所述,自碳基材表面深度為80μm-150μm的區域的TaC含量,即該部分的TaC成分浸漬量對於所述TaC塗層的碳基材的粘附力具有較大的影響。根據本發明的一個示例的所述TaC塗層的表面刮痕值(N),根據自碳基材表面深度為80μm -150μm的區域的TaC含量(vol%)為變數的一次函數算式而有所不同。據此決定的所述TaC塗層的表面刮痕值(N)等於自所述碳基材表面深度為80μm -150μm的區域的TaC含量(vol%)x(1.4至1.6)-19.5的值。There are various reasons for determining the adhesion of the TaC coating formed on the carbon substrate. As described above, the TaC content in the region from the surface of the carbon substrate to a depth of 80 μm to 150 μm, that is, the TaC of the portion. The amount of component impregnation has a large effect on the adhesion of the TaC-coated carbon substrate. According to an example of the present invention, the surface scratch value (N) of the TaC coating is based on a linear function formula in which the TaC content (vol%) from a region with a carbon substrate surface depth of 80 μm to 150 μm is a variable. different. The surface scratch value (N) of the TaC coating determined accordingly is equal to the value of the TaC content (vol%) x (1.4 to 1.6) -19.5 in a region from the surface depth of the carbon substrate of 80 μm to 150 μm.
根據本發明的另一個實施例提供一種高硬度TaC塗層碳材料的製備方法,包括以下步驟:準備平均氣孔率為15vol%-20vol%的碳基材;以及在所述碳基材的表面形成TaC塗層。在本發明的一個實施例,為了製備粘附力較好的高硬度TaC塗層碳材料,可包括:準備平均氣孔率為15vol%-20vol%的碳基材的步驟。由於準備平均氣孔率為15vol%-20vol%的碳基材,因此可以實現本發明的一個實施例中提出的具優秀粘附力和表面硬度的高硬度TaC塗層碳材料。此外,優選是,平均氣孔率為16.5vol%-20vol%.此外,更優選是,平均氣孔率為18vol%-20vol%.碳基材內的TaC含量增加,表示碳基材上的氣孔率較高,且實際上,氣孔率越高的碳基材上所形成的TaC塗層材料,越具有優秀的粘附力和表面硬度。所述碳基材的平均氣孔率檢測方法可經水銀吸附法通過使用孔率計(Porosiemeter)來進行檢測。According to another embodiment of the present invention, a method for preparing a high-hardness TaC-coated carbon material is provided, including the following steps: preparing a carbon substrate having an average porosity of 15 vol% to 20 vol%; and forming a carbon substrate on the surface of the carbon substrate TaC coating. In one embodiment of the present invention, in order to prepare a high-hardness TaC-coated carbon material with good adhesion, the method may include: preparing a carbon substrate having an average porosity of 15 vol% to 20 vol%. Since a carbon substrate having an average porosity of 15 vol% to 20 vol% is prepared, a high-hardness TaC-coated carbon material with excellent adhesion and surface hardness, which is proposed in one embodiment of the present invention, can be realized. In addition, the average porosity is preferably 16.5 vol% to 20 vol%. In addition, the average porosity is more preferably 18 vol% to 20 vol%. The increase in the TaC content in the carbon substrate indicates that the porosity on the carbon substrate is smaller than High, and in fact, the higher the porosity of the TaC coating material formed on the carbon substrate, the more excellent the adhesion and surface hardness. The method for detecting the average porosity of the carbon substrate can be detected by a mercury adsorption method by using a Porosiemeter.
作為本發明的一個示例,所述形成TaC塗層的步驟可包括:TaC成分浸漬到所述碳基材的氣孔,從而在所述碳基材內部形成與所述TaC塗層相接的浸漬區域。所說碳基材上的所述TaC塗層在高溫下被形成時,所述TaC成分從所述碳基材的表層氣孔浸漬導內部的氣孔中。由此,所述碳基材的內部可形成與TaC塗層相接的浸漬區域。自所述浸漬區域的碳基材表面深度為80μm -150μm的區域,可以是在決定所述TaC塗層碳材料的粘附力和表面硬度時具有實際意思的區域。As an example of the present invention, the step of forming a TaC coating layer may include: immersing a TaC component into the pores of the carbon substrate, thereby forming an impregnated region in contact with the TaC coating layer inside the carbon substrate. . When the TaC coating on the carbon substrate is formed at a high temperature, the TaC component is immersed from the surface pores of the carbon substrate into the pores in the interior. As a result, an impregnated region in contact with the TaC coating can be formed inside the carbon substrate. A region having a depth of 80 μm to 150 μm from the surface of the carbon substrate from the impregnated region may be a region having practical meaning when determining the adhesion and surface hardness of the TaC-coated carbon material.
根據本發明的一個示例,準備所述碳基材的步驟,可以是通過以下數學式2,準備根據所述高硬度TaC塗層碳材料的所需表面刮痕值的具有所述平均氣孔率的碳基材。 [數學式2] 碳基材的平均氣孔率(vol%)=(表面刮痕值N+19.5)x (0.65至0.7)。According to an example of the present invention, the step of preparing the carbon substrate may be prepared by the following mathematical formula 2 with the average porosity based on the required surface scratch value of the high-hardness TaC-coated carbon material. Carbon substrate. [Mathematical formula 2] The average porosity (vol%) of the carbon substrate = (surface scratch value N + 19.5) x (0.65 to 0.7).
即,基於所述數學式2,可調整基材的氣孔率,來控制TaC塗層表面的物理性質。That is, based on the mathematical formula 2, the porosity of the substrate can be adjusted to control the physical properties of the surface of the TaC coating.
用於決定所述碳基材上形成的所述TaC塗層的粘附力的原因有多種,且如上所述,碳基材的平均氣孔率對於所述TaC塗層的粘附力具有較大的影響。根據本發明的一個示例的所述碳基材的平均氣孔率如後述的實施例,根據所述TaC塗層的表面刮痕值為變數的一次函數算式而有所不同。據此決定的所述碳基材的平均氣孔率等於(表面刮痕值N+19.5)x (0.65至0.7)的值。由此,根據本發明的一個側面,根據產業現場中材料的使用,計算所需的TaC塗層的粘附力,並換算至表面刮痕值,從而具有可在製造工程中事前準備適合其的碳基材的效果。There are various reasons for determining the adhesion of the TaC coating formed on the carbon substrate, and as described above, the average porosity of the carbon substrate has a large adhesion to the TaC coating. Impact. The average porosity of the carbon substrate according to an example of the present invention is different from the linear equation of the variable value of the surface scratch value of the TaC coating as in the examples described later. The average porosity of the carbon substrate determined based on this is equal to a value of (surface scratch value N + 19.5) x (0.65 to 0.7). Therefore, according to one aspect of the present invention, the required adhesion of the TaC coating is calculated according to the use of materials in the industrial field, and converted into a surface scratch value, so that it can be prepared in advance for the manufacturing process. Effect of carbon substrate.
根據本發明的一個示例,所述形成TaC塗層的步驟,可利用化學氣相沉積法在2000攝氏度至2500攝氏度下被執行。在所述碳基材的表面形成TaC塗層的步驟,可通過化學氣相沉積CVD(Chemical Vapor Deposition)法、濺射(Sputtering)法、轉換法(Conversion technique,CVR)、熔射法或物理氣相沉積(PVD)法被執行。特別是,CVD法具有在較大的基板區域也能以較快的速度形成較薄的層從而來沉積塗層的優點。According to an example of the present invention, the step of forming a TaC coating may be performed at a temperature of 2000 ° C. to 2500 ° C. using a chemical vapor deposition method. The step of forming a TaC coating on the surface of the carbon substrate may be performed by a chemical vapor deposition (CVD) method, a sputtering method, a conversion method (CVR), a spray method, or a physics method. A vapor deposition (PVD) method is performed. In particular, the CVD method has the advantage that a thinner layer can be formed at a faster speed even in a larger substrate area to deposit a coating.
根據本發明的一個示例,所述形成TaC塗層的步驟,可在1900攝氏度至2500攝氏度下被執行。所述形成TaC塗層的步驟中,工程溫度越高,TaC塗層的表面晶粒越大,TaC塗層的表面硬度、耐磨性等可被提高。當為1900攝氏度以下時,具有TaC塗層的氣相沉積率減少,或是結晶現象不穩定的問題。且當超過2500攝氏度時,設備費用增加,且溫度較高,TaC成分較難浸漬到所述碳基材的氣孔內,具有粘附力減少的問題。優選是,在1900攝氏度至2300攝氏度的溫度下被執行According to an example of the present invention, the step of forming a TaC coating may be performed at 1900 degrees Celsius to 2500 degrees Celsius. In the step of forming the TaC coating, the higher the engineering temperature, the larger the surface grains of the TaC coating, and the surface hardness and wear resistance of the TaC coating can be improved. When the temperature is below 1900 degrees Celsius, the vapor deposition rate of the TaC coating is reduced, or the problem of unstable crystallization is observed. And when it exceeds 2500 degrees Celsius, the equipment cost increases, and the temperature is high, it is difficult for the TaC component to be impregnated into the pores of the carbon substrate, and there is a problem that the adhesion is reduced. Preferably, it is performed at a temperature of 1900 degrees Celsius to 2300 degrees Celsius
根據本發明的一個示例,所述形成TaC塗層的步驟,可多次被執行,從而形成多個TaC塗層。即,可包括兩次以上的TaC塗層被形成的過程,由此,可包括兩層以上的TaC塗層被形成的碳材料的製備方法。進一步可包括,形成附加的TaC塗層,執行用於形成類似3個、4個更多塗層的過程來形成更多的塗層。According to an example of the present invention, the step of forming a TaC coating may be performed multiple times, thereby forming multiple TaC coatings. That is, a process of forming a TaC coating layer more than twice may be included, and thus, a method of preparing a carbon material in which two or more TaC coating layers are formed may be included. It may further include forming an additional TaC coating, and performing a process for forming more than 3, 4 more coatings to form more coatings.
圖3是示出根據本發明的另一實施例的高硬度TaC塗層碳材料的截面概念圖,包括碳基材和碳基材上多個層被形成的多個TaC塗層。利用上述的多次執行來形成多個TaC塗層的TaC塗層形成步驟,可確定最初形成塗層的過程中所形成的第一塗層(121)之上具有第二塗層(122)和第三塗層(123)。TaC塗層結晶粒的大小,則成為決定形成的塗層的表面硬度的原因或其中的一個原因。當所述TaC塗層上,再次沉積TaC塗層時,與僅形成一個TaC塗層相比,形成材料外側表面的TaC塗層的結晶粒變大,從而表面硬度也可增加。由此,可以實現本發明的一個側面中所提出的包含多次形成TaC塗層的過程的高硬度TaC塗層碳材料的製備方法。FIG. 3 is a conceptual cross-sectional view illustrating a high-hardness TaC-coated carbon material according to another embodiment of the present invention, including a carbon substrate and a plurality of TaC coatings on which a plurality of layers are formed. By using the TaC coating formation steps described above to form multiple TaC coatings, it can be determined that the first coating (121) formed during the initial coating formation has a second coating (122) and Third coating (123). The size of the crystal grains of the TaC coating becomes one of the reasons for determining the surface hardness of the coating formed. When the TaC coating is deposited again on the TaC coating, compared with forming only one TaC coating, the crystal grains of the TaC coating forming the outer surface of the material become larger, so that the surface hardness can also be increased. Thereby, a method for preparing a high-hardness TaC coating carbon material including a process of forming a TaC coating multiple times, which is proposed in one aspect of the present invention, can be realized.
以下,參照以下實施例和比較例,對本發明進行詳細說明。但是,本發明的技術思想並不因此而受限制或局限於此。Hereinafter, the present invention will be described in detail with reference to the following examples and comparative examples. However, the technical idea of the present invention is not limited or limited by this.
實施例Examples
通過化學氣相沉積法(CVD),製備了本發明的一個實施例中所提出的TaC塗層碳材料。根據本發明的一個實施例,針對具平均氣孔率的,熱膨脹係數為4.9 ~ 6.0×10-6/K,直徑為400mm以及厚度為10 mm的碳基材,在溫度為2000攝氏度,壓力為500托(Torr)以及T前驅物(五氯化鉭,TaCl5 ) 5000 sccm(單位時間標準毫升數(standard-state cubic centimeter per minute)),C前驅物(CH4 ) 50 sccm的化學氣相沉積法(CVD)處理條件下,製備了TaC塗層。在這種情況下,碳化鉭塗層的C/Ta比例調整為1:1.05。各碳基材的氣孔率以水銀吸附法被檢測。The TaC-coated carbon material proposed in one embodiment of the present invention was prepared by chemical vapor deposition (CVD). According to an embodiment of the present invention, for a carbon substrate having an average porosity, a thermal expansion coefficient of 4.9 to 6.0 × 10-6 / K, a diameter of 400 mm, and a thickness of 10 mm, the temperature is 2000 degrees Celsius and the pressure is 500 Torr and T precursor (TaCl 5 ) 5000 sccm (standard-state cubic centimeter per minute), C precursor (CH 4 ) 50 sccm chemical vapor deposition Under the conditions of CVD process, a TaC coating was prepared. In this case, the C / Ta ratio of the tantalum carbide coating is adjusted to 1: 1.05. The porosity of each carbon substrate was measured by a mercury adsorption method.
上述條件中製備的高硬度TaC塗層碳材料,分別被執行了刮痕測試。以下表1示出有關本發明的一個實施例中提供的高硬度TaC塗層碳材料的碳基材的實施例與對比的比較例1和2的刮痕測試結果值。 [表1]
所述實施例1至3是本發明的一個側面中提供的碳基材,在碳基材的平均氣孔率為15vol%-20vol%的該碳基材上以所述工程條件形成TaC塗層。通過該測試結果發現,當使用本發明的一個實施例中提供的所述碳基材的平均氣孔率為15vol%-20vol%的碳基材時,所述刮痕值顯示出為3.5N以上的值。相反,當使用所述碳基材的平均氣孔率為15vol%以下的碳基材時,所述刮痕值顯示出為3.5N以下的值。由此可獲知,使用所述碳基材的平均氣孔率為15vol%以下的碳基材時,較難體現本發明的一個實施例中所提出的高粘附力。The examples 1 to 3 are carbon substrates provided in one aspect of the present invention, and a TaC coating is formed on the carbon substrate with an average porosity of the carbon substrate of 15 vol% to 20 vol% under the engineering conditions. According to the test results, it was found that when a carbon substrate having an average porosity of 15 vol% to 20 vol% of the carbon substrate provided in one embodiment of the present invention was used, the scratch value showed a value of 3.5N or more. value. In contrast, when a carbon substrate having an average porosity of 15 vol% or less was used, the scratch value was a value of 3.5N or less. It can be known from this that, when using a carbon substrate having an average porosity of 15 vol% or less, it is difficult to reflect the high adhesion force proposed in one embodiment of the present invention.
通過該測試可獲知,碳基材的平均氣孔率較高時,所述碳基材的TaC塗層的粘附力可增加。此外,通過測試結果發現,碳基材的平均氣孔率和所述碳基材上的TaC塗層的刮痕值之間,具有所述碳基材上的TaC塗層的表面刮痕值為變數的一次函數的相關關係。該相關關係在上述的數學式2中被示出。此外,對於上述的實施例1至3,使用掃描電子顯微鏡(SEM)拍攝了TaC塗層表面。在本測試中,觀察了對於實施例1至3的TaC塗層表面施加壓力後所產生的裂紋的面積和個數。It can be known from this test that when the average porosity of the carbon substrate is high, the adhesion of the TaC coating of the carbon substrate can be increased. In addition, through test results, it was found that between the average porosity of the carbon substrate and the scratch value of the TaC coating on the carbon substrate, the surface scratch value of the TaC coating having the carbon substrate was a variable Correlation of linear functions. This correlation is shown in the above-mentioned mathematical expression 2. In addition, for Examples 1 to 3 described above, the surface of the TaC coating layer was photographed using a scanning electron microscope (SEM). In this test, the area and number of cracks generated after applying pressure to the surfaces of the TaC coatings of Examples 1 to 3 were observed.
圖4a是根據上述實施例1製備的高硬度TaC塗層碳材料的TaC塗層表面的掃描電子顯微鏡(SEM)分析照片,且4b是將其圖像化的示圖。圖5a是根據上述實施例2製備的高硬度TaC塗層碳材料的TaC塗層表面的掃描電子顯微鏡(SEM)分析照片,且5b是將其圖像化的示圖。圖6a根據上述實施例3製備的高硬度TaC塗層碳材料的TaC塗層表面的掃描電子顯微鏡(SEM)分析照片,且6b是將其圖像化的示圖。FIG. 4a is a scanning electron microscope (SEM) analysis photograph of the TaC coating surface of the high-hardness TaC coating carbon material prepared according to the above Example 1, and 4b is a diagram illustrating it. FIG. 5a is a scanning electron microscope (SEM) analysis photograph of the TaC coating surface of the high-hardness TaC coating carbon material prepared according to the above Example 2, and 5b is a diagram illustrating it. FIG. 6a is a scanning electron microscope (SEM) analysis photograph of the TaC coating surface of the high-hardness TaC coating carbon material prepared according to the above Example 3, and 6b is a diagram illustrating it.
在此發現,所述碳基材的平均氣孔率為18.7vol%的實施例1中,裂紋產生後各片的平均面積最大,且所述碳基材的平均氣孔率為15.5vol%的實施例3中,裂紋產生後各片的平均面積最小。由此,可發現,所述碳基材的平均氣孔率最小,則產生的裂紋越多。Here, it was found that in Example 1 where the average porosity of the carbon substrate was 18.7 vol%, the average area of each sheet was the largest after the occurrence of cracks, and the example whose average porosity was 15.5 vol%. In 3, the average area of each sheet after the crack was generated was the smallest. From this, it can be found that the smaller the average porosity of the carbon substrate, the more cracks are generated.
110‧‧‧碳基材110‧‧‧carbon substrate
120‧‧‧TaC塗層120‧‧‧TaC coating
121‧‧‧第一塗層121‧‧‧ first coating
122‧‧‧第二塗層122‧‧‧Second coating
123‧‧‧第三塗層123‧‧‧Third coating
130‧‧‧浸漬區域130‧‧‧ Impregnation area
131‧‧‧區域131‧‧‧area
132‧‧‧第一區域132‧‧‧First Zone
133‧‧‧第二區域133‧‧‧second zone
圖1是示出本發明的實施例中提供的含有氣孔的碳基材的截面概念圖。 圖2是示出根據本發明的實施例的高硬度TaC塗層碳材料的截面概念圖,其包括:碳基材和碳基材上形成的TaC塗層。 圖3是示出根據本發明的另一實施例的高硬度TaC塗層碳材料的截面概念圖,包括碳基材和碳基材上多個層被形成的多個TaC塗層。 圖4a是根據以下實施例1製備的高硬度TaC塗層碳材料的TaC塗層表面的掃描電子顯微鏡SEM分析照片,且4b是將其圖像化的示圖。 圖5a是根據以下實施例2製備的高硬度TaC塗層碳材料的TaC塗層表面的掃描電子顯微鏡SEM分析照片,且5b是將其圖像化的示圖。 圖6a根據以下實施例3製備的高硬度TaC塗層碳材料的TaC塗層表面的掃描電子顯微鏡SEM分析照片,且6b是將其圖像化的示圖。FIG. 1 is a conceptual cross-sectional view illustrating a pore-containing carbon substrate provided in an embodiment of the present invention. 2 is a conceptual cross-sectional view illustrating a high-hardness TaC-coated carbon material according to an embodiment of the present invention, which includes a carbon substrate and a TaC coating formed on the carbon substrate. FIG. 3 is a conceptual cross-sectional view illustrating a high-hardness TaC-coated carbon material according to another embodiment of the present invention, including a carbon substrate and a plurality of TaC coatings on which a plurality of layers are formed. FIG. 4a is a scanning electron microscope SEM analysis photograph of a TaC coating surface of a high-hardness TaC coating carbon material prepared according to the following Example 1, and 4b is a diagram illustrating it. 5a is a scanning electron microscope SEM analysis photograph of a TaC coating surface of a high-hardness TaC coating carbon material prepared according to Example 2 below, and 5b is a diagram illustrating the same. 6a is a scanning electron microscope SEM analysis photograph of a TaC coating surface of a high-hardness TaC coating carbon material prepared according to the following Example 3, and 6b is a diagram illustrating the same.
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| KR102094183B1 (en) | 2017-04-28 | 2020-03-30 | 주식회사 티씨케이 | CARBON MATERIAL WITH COATING LAYER COMPRISING TaC AND MANUFACTURING METHOD THEREOF |
| KR20190073788A (en) * | 2017-12-19 | 2019-06-27 | 주식회사 티씨케이 | Manufacturing method for carbonized tantalum coating layer using chemical vapor deposition and property of carbonized tantalum using the same |
| KR102600114B1 (en) * | 2020-12-01 | 2023-11-10 | 주식회사 티씨케이 | Tantalum carbide coated material and manufacturing method thereof |
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| CA2559042C (en) * | 2005-02-14 | 2011-03-08 | Toyo Tanso Co., Ltd. | Tantalum carbide-coated carbon material and production method thereof |
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| US11780732B2 (en) | 2018-12-17 | 2023-10-10 | Tokai Carbon Korea Co., Ltd. | Carbonated tantalum coating material |
| TWI820273B (en) * | 2018-12-17 | 2023-11-01 | 韓商韓國東海炭素股份有限公司 | Carbonated tantalum coating material |
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