TW201402492A - Ultra-thin glass manufacturing method - Google Patents
Ultra-thin glass manufacturing method Download PDFInfo
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- TW201402492A TW201402492A TW101124655A TW101124655A TW201402492A TW 201402492 A TW201402492 A TW 201402492A TW 101124655 A TW101124655 A TW 101124655A TW 101124655 A TW101124655 A TW 101124655A TW 201402492 A TW201402492 A TW 201402492A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0095—Solution impregnating; Solution doping; Molecular stuffing, e.g. of porous glass
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
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- H10P72/0422—
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
一種超薄玻璃之製造方法，包括：提供至少一玻璃；將該玻璃固定為垂直站立狀態；對一蝕刻液進行霧化以得到一霧化之蝕刻液；以及透過至少一導液管傳送該霧化之蝕刻液至該導液管具有之至少一噴嘴，經由該噴嘴噴灑該霧化之蝕刻液於該玻璃表面。本發明能製造出平坦之超薄玻璃。A method for manufacturing an ultra-thin glass, comprising: providing at least one glass; fixing the glass to a vertical standing state; atomizing an etching solution to obtain an atomized etching solution; and transmitting the mist through at least one liquid guiding tube The etchant is applied to the catheter having at least one nozzle through which the atomized etchant is sprayed onto the surface of the glass. The present invention enables the production of flat ultra-thin glass.
Description
本發明係關於玻璃技術領域，特別是有關一種超薄玻璃之製造方法。 The present invention relates to the field of glass technology, and more particularly to a method of manufacturing ultra-thin glass.
隨著電子產品輕薄短小的要求下，例如手持式裝置，對超薄玻璃的需求越來越高。 With the demand for thin and light electronic products, such as handheld devices, the demand for ultra-thin glass is increasing.
由於超薄玻璃的厚度非常小，因此在製造上並不容易，目前製造超薄玻璃的製造方法係針對一厚度較大的玻璃進行薄化製程以使其厚度變小，而薄化製程主要以蝕刻的方式來蝕刻玻璃之厚度。 Since the thickness of the ultra-thin glass is very small, it is not easy to manufacture. At present, the manufacturing method of the ultra-thin glass is performed by thinning a glass having a larger thickness to make the thickness smaller, and the thinning process is mainly Etching is performed to etch the thickness of the glass.
然而在蝕刻製程中太多因素會影響超薄玻璃的製造良率，光是蝕刻液就有許多條件不易控制，例如蝕刻液的擾動、蝕刻液的噴淋壓力、蝕刻液流量以及蝕刻液溫度等等。 However, too many factors in the etching process will affect the manufacturing yield of ultra-thin glass. There are many conditions in the etching solution that are difficult to control, such as the disturbance of the etching solution, the spraying pressure of the etching solution, the flow rate of the etching solution, and the temperature of the etching solution. Wait.
舉例來說，當上述蝕刻液的條件控制不精確時，製造出的超薄玻璃其表面平坦度差，一旦表面平坦度差，也會使後續在超薄玻璃上製造電子元件的良率不佳，甚至導致超薄玻璃變形或容易破裂的問題。 For example, when the conditions of the above etching liquid are not precisely controlled, the ultra-thin glass produced is poor in surface flatness, and once the surface flatness is poor, the yield of subsequent electronic components on the ultra-thin glass is poor. Even the problem of deformation or easy breakage of ultra-thin glass.
是以，確有需要對上述超薄玻璃之製造良率不佳的問題提出解決方法。 Therefore, there is a need to propose a solution to the problem of poor manufacturing yield of the above-mentioned ultra-thin glass.
本發明之一目的在於提供一種超薄玻璃之製造方法，其能製造出表面平坦之超薄玻璃並提高超薄玻璃的製造良率。 An object of the present invention is to provide a method for producing an ultra-thin glass which can produce an ultra-thin glass having a flat surface and improve the manufacturing yield of the ultra-thin glass.
為達成上述目的，本發明提供一種超薄玻璃之製造方法，包括：提供至少一玻璃； 將該玻璃固定為垂直站立狀態；對一蝕刻液進行霧化以得到一霧化之蝕刻液；以及透過至少一導液管傳送該霧化之蝕刻液至該導液管具有之至少一噴嘴，經由該噴嘴噴灑該霧化之蝕刻液於該玻璃表面。 In order to achieve the above object, the present invention provides a method for manufacturing ultra-thin glass, comprising: providing at least one glass; Fixing the glass to a vertical standing state; atomizing an etching solution to obtain an atomized etching solution; and transmitting the atomized etching liquid through at least one liquid guiding tube to at least one nozzle of the liquid guiding tube, The atomized etchant is sprayed onto the glass surface via the nozzle.
本發明另一方面提供一種超薄玻璃之製造方法，包括：提供至少一玻璃；將該玻璃固定為垂直站立狀態；對一蝕刻液進行霧化以得到一霧化之蝕刻液；將至少一噴嘴設置於一導液管表面且平行於該導液管之軸心的一條線上，並且與該導液管之內部相通；以及透過該導液管傳送該霧化之蝕刻液至該噴嘴，經由該噴嘴噴灑該霧化之蝕刻液於該玻璃表面。 Another aspect of the present invention provides a method for manufacturing an ultra-thin glass, comprising: providing at least one glass; fixing the glass to a vertical standing state; atomizing an etching solution to obtain an atomized etching solution; and at least one nozzle a wire disposed on a surface of the liquid guiding tube and parallel to the axis of the liquid guiding tube, and communicating with the inner portion of the liquid guiding tube; and transmitting the atomized etching liquid to the nozzle through the liquid guiding tube The nozzle sprays the atomized etchant onto the surface of the glass.
本發明之超薄玻璃之製造方法以霧化之蝕刻液蝕刻玻璃，製造出的超薄玻璃具有平坦的表面，因此能提高超薄玻璃的製造良率。 In the method for producing an ultra-thin glass of the present invention, the glass is etched by an atomized etching liquid, and the ultra-thin glass produced has a flat surface, so that the manufacturing yield of the ultra-thin glass can be improved.
以下結合附圖對本發明的技術方案進行詳細說明。 The technical solution of the present invention will be described in detail below with reference to the accompanying drawings.
請參閱第1圖至第3圖，第1圖係繪示根據本發明之超薄玻璃之製造方法流程圖，第2圖以及第3圖係繪示根據本發明之超薄玻璃之製造方法示意圖。 Please refer to FIG. 1 to FIG. 3 . FIG. 1 is a flow chart showing a method for manufacturing an ultra-thin glass according to the present invention, and FIGS. 2 and 3 are schematic views showing a manufacturing method of the ultra-thin glass according to the present invention. .
首先，於步驟S100中，提供至少一玻璃10。一般來說，玻璃10的厚度約為大於1.5毫米(millimeter；mm)。 First, in step S100, at least one glass 10 is provided. Generally, the thickness of the glass 10 is greater than about 1.5 millimeters (millimeter; mm).
於步驟S110中，將該玻璃10固定為如第2圖所示之垂直站立狀態。舉例來說，以一治具(未圖示)夾持該玻璃10，以使其固定為垂直站立狀態。 In step S110, the glass 10 is fixed in a vertical standing state as shown in Fig. 2. For example, the glass 10 is held by a jig (not shown) to be fixed in a vertical standing state.
於步驟S120中，對一蝕刻液(未圖示)進行霧化以得到一霧化之蝕刻液20。霧化的方法可以為超音速霧化、加壓式霧化或渦流式霧化。 In step S120, an etching solution (not shown) is atomized to obtain an atomized etching solution 20. The method of atomization may be supersonic atomization, pressurized atomization or vortex atomization.
超音速霧化係將蝕刻液經超音速噴射後形成噴霧狀。加壓式霧化係將蝕刻液加壓後形成噴霧狀。渦流式霧化則是利用擾流葉片使蝕刻液產生高速旋轉，再經由一渦流室將蝕刻液形成噴霧狀。 The supersonic atomization sprays the etchant through supersonic speed to form a spray. The pressurized atomization system pressurizes the etching liquid to form a spray. The vortex atomization uses the spoiler blade to rotate the etching liquid at a high speed, and then forms the etchant into a spray shape through a vortex chamber.
蝕刻液至少包含氫氟酸(HF)，也可以使用氫氟酸並調配適量的硫酸(H2SO4)、鹽酸(HCl)或硝酸(HNO3)作為該蝕刻液。 The etching solution contains at least hydrofluoric acid (HF), and hydrofluoric acid may be used and an appropriate amount of sulfuric acid (H 2 SO 4 ), hydrochloric acid (HCl) or nitric acid (HNO 3 ) may be formulated as the etching liquid.
於步驟S130中，透過至少一導液管30傳送霧化之蝕刻液20至其具有之至少一噴嘴300，經由該噴嘴300噴灑霧化之蝕刻液20於該玻璃10表面，以使該玻璃10被薄化至厚度為0.1毫米至1.5毫米，也就是說，薄化至超薄玻璃的厚度。 In step S130, the atomized etching solution 20 is transferred to at least one nozzle 300 through at least one liquid guiding tube 30, and the atomized etching liquid 20 is sprayed on the surface of the glass 10 through the nozzle 300 to make the glass 10 It is thinned to a thickness of 0.1 mm to 1.5 mm, that is, thinned to the thickness of the ultra-thin glass.
於一實施例中，本步驟可以進一步包括控制霧化之蝕刻液20之噴灑範圍、噴灑壓力以及噴灑均勻性之至少一者的步驟。 In one embodiment, the step may further include the step of controlling at least one of a spray range, a spray pressure, and a spray uniformity of the atomized etchant 20.
於另一實施例中，本步驟可以進一步包括將噴嘴300設置於導液管30表面且平行於導液管30之軸心的一條線上，並且與導液管30之內部相通，用以控制噴灑範圍、噴灑壓力以及噴灑均勻性之至少一者的步驟。 In another embodiment, the step may further include disposing the nozzle 300 on a surface of the catheter 30 parallel to the axis of the catheter 30 and communicating with the interior of the catheter 30 for controlling spraying. The step of at least one of range, spray pressure, and spray uniformity.
於另一實施例中，本步驟可以進一步包括使導液管30之內部具有一漸變之管徑(如第3圖所示)，用以控制噴灑範圍、噴灑壓力以及噴灑均勻性之至少一者的步驟。更明確地說，導液管30之內部為漸變之管徑具有加壓之功能，使霧化之蝕刻液20的噴灑範圍、噴灑壓力以及噴灑均勻性更容易控制。由於導液管30之內部為漸變之管徑，因此可以節省霧化之蝕刻 液20的使用量，達到降低超薄玻璃之製造成本。 In another embodiment, the step may further include having a gradual diameter (as shown in FIG. 3) inside the catheter 30 for controlling at least one of a spray range, a spray pressure, and a spray uniformity. A step of. More specifically, the inside of the catheter 30 has a function of pressurizing the tapered tube diameter, and the spray range, spray pressure, and spray uniformity of the atomized etching solution 20 are more easily controlled. Since the inside of the liquid guiding tube 30 is a gradual diameter, the atomization etching can be saved. The amount of liquid 20 used can reduce the manufacturing cost of ultra-thin glass.
要注意的是，將霧化之蝕刻液20噴灑於該玻璃10表面除了能達成薄化玻璃10的目的之外，還能進一步移除玻璃10表面上的微塵粒子，達到清潔玻璃10表面的目的。 It should be noted that spraying the atomized etchant 20 on the surface of the glass 10 can further remove the dust particles on the surface of the glass 10 in addition to the purpose of thinning the glass 10, thereby achieving the purpose of cleaning the surface of the glass 10. .
於步驟S140中，清洗玻璃10之表面，完成超薄玻璃的製造。 In step S140, the surface of the glass 10 is cleaned to complete the manufacture of ultra-thin glass.
本發明之超薄玻璃之製造方法以霧化之蝕刻液蝕刻玻璃，製造出的超薄玻璃具有平坦的表面；再者，透過噴嘴設置於導液管表面且平行於導液管之軸心的一條線上能更容易控制霧化之蝕刻液的噴灑範圍、噴灑壓力以及噴灑均勻性，提高超薄玻璃的製造良率。 The method for manufacturing the ultra-thin glass of the present invention etches the glass with an atomized etching solution, and the ultra-thin glass has a flat surface; further, the through-nozzle is disposed on the surface of the catheter and parallel to the axis of the catheter. The spray range, spray pressure and spray uniformity of the atomized etching solution can be more easily controlled on one line, and the manufacturing yield of the ultra-thin glass can be improved.
綜上所述，雖然本發明已用較佳實施例揭露如上，然其並非用以限定本發明，本發明所屬技術領域中具有通常知識者，在不脫離本發明之精神和範圍內，當可作各種之更動與潤飾，因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 In view of the above, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the invention, and the present invention may be made without departing from the spirit and scope of the invention. Various modifications and refinements are made, and the scope of the present invention is defined by the scope of the appended claims.
10‧‧‧玻璃 10‧‧‧ glass
20‧‧‧霧化之蝕刻液 20‧‧‧Atomized etching solution
30‧‧‧導液管 30‧‧‧ catheter
300‧‧‧噴嘴 300‧‧‧ nozzle
S100-S140‧‧‧步驟 S100-S140‧‧‧Steps
第1圖係繪示根據本發明之超薄玻璃之製造方法流程圖；以及第2圖以及第3圖係繪示根據本發明之超薄玻璃之製造方法。 1 is a flow chart showing a method of manufacturing an ultra-thin glass according to the present invention; and FIGS. 2 and 3 are views showing a method of manufacturing an ultra-thin glass according to the present invention.
S100-S140‧‧‧步驟 S100-S140‧‧‧Steps
Claims (10)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101124655A TW201402492A (en) | 2012-07-09 | 2012-07-09 | Ultra-thin glass manufacturing method |
| CN201210497757.7A CN103539363A (en) | 2012-07-09 | 2012-11-29 | Manufacturing method of ultra-thin glass |
| KR1020130016926A KR20140007252A (en) | 2012-07-09 | 2013-02-18 | Method for manufacturing ultra-thin glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW101124655A TW201402492A (en) | 2012-07-09 | 2012-07-09 | Ultra-thin glass manufacturing method |
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| TW201402492A true TW201402492A (en) | 2014-01-16 |
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| TW101124655A TW201402492A (en) | 2012-07-09 | 2012-07-09 | Ultra-thin glass manufacturing method |
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| Country | Link |
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| KR (1) | KR20140007252A (en) |
| CN (1) | CN103539363A (en) |
| TW (1) | TW201402492A (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US9321677B2 (en) | 2014-01-29 | 2016-04-26 | Corning Incorporated | Bendable glass stack assemblies, articles and methods of making the same |
| US11752730B2 (en) | 2014-08-19 | 2023-09-12 | Corning Incorporated | Bendable glass stack assemblies and methods of making the same |
| US11078102B2 (en) | 2014-11-26 | 2021-08-03 | Corning Incorporated | Thin glass sheet and system and method for forming the same |
| US10622581B2 (en) | 2015-10-13 | 2020-04-14 | Corning Incorporated | Bendable electronic device modules, articles and methods of making the same |
| US11104601B2 (en) | 2016-03-17 | 2021-08-31 | Corning Incorporated | Bendable electronic device modules, articles and bonding methods of making the same |
| KR102414084B1 (en) | 2017-10-11 | 2022-06-28 | 코닝 인코포레이티드 | Foldable electronic device modules with impact resistance and bending resistance |
| CN107946482A (en) * | 2017-11-09 | 2018-04-20 | 信利半导体有限公司 | A kind of production method of flexible display |
| JP2021536389A (en) | 2018-08-24 | 2021-12-27 | コーニング インコーポレイテッド | Articles containing puncture resistant laminates with ultra-thin glass layers |
| CN108978424A (en) * | 2018-09-12 | 2018-12-11 | 四川泓毅通建设工程有限公司 | Colored green road LOGO ground stereoscopic identifies construction technology |
| CN111285612B (en) * | 2020-02-25 | 2021-03-19 | 拓米(成都)应用技术研究院有限公司 | Rotary etching device and rotary etching method for high-precision ultrathin glass |
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| JP3686011B2 (en) * | 2001-06-11 | 2005-08-24 | 住友精密工業株式会社 | Substrate processing equipment |
| CN101051604A (en) * | 2006-04-07 | 2007-10-10 | 悦城科技股份有限公司 | Method and device for panel etching process |
| KR20090070792A (en) * | 2007-12-27 | 2009-07-01 | 주식회사 디에스티 | Etching Device of Glass Substrate |
-
2012
- 2012-07-09 TW TW101124655A patent/TW201402492A/en unknown
- 2012-11-29 CN CN201210497757.7A patent/CN103539363A/en active Pending
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| CN103539363A (en) | 2014-01-29 |
| KR20140007252A (en) | 2014-01-17 |
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