TW201206987A - Composite and display device that contains same - Google Patents

Abstract

The disclosed composite has a substrate that contains an aromatic polyether polymer with a glass transition temperature (Tg) of 230-350 DEG C, as measured by differential scanning calorimetry (DSC, rate of increase of 20 DEG C/min), and at least one type of member selected from a group consisting of a transparent conductive film formed on at least one surface of the substrate, a coloured portion and a switching element.

Description

201206987 VI. Description of the Invention [Technical Field of the Invention] The present invention relates to a composite and a display device therewith. More specifically, it relates to a composite of a transparent conductive film, a color filter substrate, a switching element substrate, and the like, and a display device including the composite. [Prior Art] In recent years, a touch panel or the like has been used for a transparent conductive member in which a transparent conductive film is formed on a substrate. In addition, in a display device such as a liquid crystal display, a color filter substrate having a colored portion formed on a substrate is used for the purpose of full coloring, and is used for a substrate because high contrast can be achieved. A switching element substrate including a three-terminal element represented by a thin film transistor element and a switching element such as a two-terminal element represented by a MIM (Metal Insulator Metal) element is formed. As a base material of such a transparent conductive member, a color filter substrate, and a switching element substrate, it is based on the excellent heat resistance and light transmittance, and a substrate made of glass is used today (Patent Document 伴随. When the weight of the touch panel or the liquid crystal display is reduced, and the thickness of the transparent conductive member, the color filter substrate, or the switching element substrate is required to be lighter and thinner, when a glass substrate is used as the substrate thereof, In addition, it is difficult to reduce the weight and thickness, etc. It is also necessary to be flexible depending on the application. Therefore, in recent years, in addition to flexibility and workability, it is excellent in impact resistance and light weight. The use of a plastic film is also required, and a transparent conductive member in which various plastic films such as polyethylene terephthalate film or polycarbonate film are used as a substrate is disclosed in Patent Document No. 5-201206987 2 and 3. Patent Document 4 discloses a switching element substrate using a substrate made of polyimide. Further, in Patent Documents 5 and 6, the substrate for a plastic liquid crystal display element is transparent and flexible. A transparent conductive film in which a transparent conductive film is provided on a substrate. [PRIOR ART DOCUMENT] [Patent Document 1] Japanese Laid-Open Patent Publication No. 2010-54753 [Patent Document 2] Japanese Patent Laid-Open Publication No. 2010-20473 Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. [Invention] [Problems to be Solved by the Invention] However, the polyethylene terephthalate or polycarbonate which is a general-purpose transparent plastic, and the substrate described in Patent Document 5 or 6 have low heat resistance, and are used. When a resin is used as the substrate, it is difficult to form a transparent conductive film, a colored portion, or a member such as a switching element thereon. Further, the substrate composed of polyimine is misaligned by intramolecular and intramolecular charges due to charge. The formation of the object results in coloration to a yellow-brown color, and is difficult to use for applications that are required to have high light transmittance. Moreover, when the polyimide is formed into a thin film of -6-201206987 film, it is necessary to carry out high temperature. Imine, so on manufacturing The load of the process is high. The present invention has been made in view of the above problems, and aims to provide a composite excellent in coloring resistance, light transmittance, heat resistance and mechanical strength. In order to solve the above problems, the inventors of the present invention have found that a composite obtained from a substrate containing an aromatic polyether polymer having a specific glass transition temperature can solve the above problems and find that the polymer is contained. The present invention has been completed by the fact that the phase difference of the substrate is also small. That is, the present invention provides the following [1] to [11]. [1] A composite having a differential scanning calorimetry (DSC) a heating temperature of 2 〇 ° C / min) measured glass transition temperature (Tg) of 230 ~ 3 50 ° C of aromatic polyether polymer substrate, and formed on the substrate to one side A member selected from the group consisting of a transparent conductive film, a colored portion, and a switching element. [2] The composite according to [1], wherein the aromatic polyether polymer has a group selected from the structural unit represented by the following formula (1) and the structural unit represented by the following formula (2). At least one structural unit (i). (1) (1)201206987 [Chemical 1]

(In the formula (1), R to R each independently represent an organic group in which the carbon number of the carbon number is 1 to 12, and a to d each independently represent an integer of 〇 to 4).

(In the formula (2), RLR4 and a to d are each independently the same as R1 to R4 and a~d in the above formula (1). Y represents a single bond, -S02- or >C=〇' R7 and R8 Each of them independently represents a halogen atom, an organic group or a nitro group having a carbon number of 1 to 12, and g and h each independently represent an integer of 〇~4, and m represents 〇 or 1. However, when m is 〇, r7 is not cyanide. [3] The composite of [丨] or [2], wherein the aromatic polyether-based polymer further has a structural unit selected from the group consisting of the following formula (3) and represented by the following formula (4) At least the structural unit (1) of the group of structural units. 201206987

(In the formula (3), R5 and r6 each independently represent a monovalent organic group having a carbon number of 1 to 12, and Z represents a single bond, _0 -, -S __ s 0 2 -, >c = 0, _C ο Ν Η -, _ coo- or the two-valent organic group of carbon number U2 '6 and f each independently represent an integer of 〇~4, and n represents 〇 or 1.) 4] .03⁄4

Z

(R7)c (4) (In the formula (4), each of R7, R., Y, m, g, and h has the same meaning as R7, R8, Y, m, g & h in the above formula (2) R5, R6, Z, n, e and f are each independently equivalent to r5, R6, Z, n, e and f in the above formula.) [4] The complex of [3] wherein the aforementioned aromatic In the polyether polymer, the molar ratio of the above structural unit (1) to the above structural unit (ϋ) is 50: 50-100 : 0 ° [5] The composite of any one of [1] to [4] The polystyrene-equivalent weight average molecular weight of the aromatic polyether polymer obtained by gel permeation chromatography (GPC) is 5,000 to 500,000. [6] The composite according to any one of [1] to [5] wherein, when the thickness of the substrate is 30 μm, the light transmittance of the entire 201206987 measured by the JIS K7105 transparency test method is 85% or more. [7] The composite according to any one of [1] to [6] wherein the substrate has a YI 値 (yellow index) of 3.0 or less at a thickness of 30 μm. [8] The composite according to any one of [1] to [7], wherein a phase difference (Rth) in a thickness direction of the substrate at a thickness of 30 μm is 200 nm or less. [9] The composite according to any one of [1] to [8] wherein the member is a transparent conductive film, and at least one surface of the substrate or the transparent conductive film is provided with a polarizing plate. [10] A display device comprising the composite according to any one of [1] to [9]. [11] A touch panel comprising the composite according to any one of [1] to [9]. [Effects of the Invention] The composite of the present invention is excellent in light transmittance, heat resistance, heat resistance colorability, and mechanical strength, and has a small phase difference in the thickness direction. Therefore, the composite of the present invention is easy to manufacture, and can be suitably used as a display device and a touch panel. [Embodiment] <<Complex>> The composite of the present invention has a glass transition temperature (Tg) measured by differential scanning calorimetry (DSC, temperature increase rate of 20 ° C / min) - 10-201206987 230~3 The base material of the aromatic polyether polymer (hereinafter also referred to as "polymer (I)") at 50 ° C and the one side formed on the substrate are selected from a transparent conductive film. At least one component of the group of the coloring portion and the switch member. Further, the "aromatic polyether polymer" means a polymer obtained by a reaction of forming an ether group in a main chain. <Substrate> [Polymer (I)] The substrate used in the present invention contains the above polymer (I). The glass transition temperature of the above polymer (1) is preferably from 240 to 3,300 ° C, more preferably from 250 to 300 ° C. The step of forming a member such as a transparent conductive film, a colored portion or a switching element on a substrate is usually carried out at a high temperature of 200 ° C or higher. Therefore, in order to withstand this high temperature, in particular, since the substrate may cause a change in the elastic modulus measured by dynamic viscoelasticity measurement (manufactured by Vibron) at a Tg minus 20 to 30 ° C, it is required The polymer contained in the substrate to be used usually has a Tg (measured by DSC) which is higher than the heating temperature by 20 ° C or higher. The substrate forming the above member is required to have heat resistance of at least 230 ° C or more, and is preferably 230 to 350 ° C, more preferably 240 to 33 (TC, more preferably 2 5 0 to 3 0 0). The heat resistance of ° C. Therefore, the glass transition temperature of the polymer contained in the substrate is preferably in this range. The polymer (I) is suitably used as a transparent conductive material because its Tg is in the above range. A substrate material of a member such as a film, a colored portion, or a switching element, by using a substrate formed of the above polymer (I), when a member is formed on the substrate, since it can be processed at a high temperature, A composite of low -11 - 201206987 resistance and high-speed processing (upward yield) is available. The substrate containing the polymer (I) is light-transmitting, heat-resistant, heat-resistant, and mechanically strong. All of them are excellent in balance, and a composite (optical part) such as a transparent conductive film, a color filter substrate, and a switching element substrate can be suitably used. Further, since the substrate contains the polymer (I) having the aforementioned characteristics, At least one side of the substrate is formed selected from When a member of at least one of the group of the conductive film, the colored portion, and the switching element is formed, and a protective film made of a transparent resin or a transparent conductive film is formed on the colored portion or the like as desired, heating or heat treatment is performed. Since it can be carried out at a high temperature, the composite can be easily produced without being restricted by such a formation method. Further, the substrate containing the polymer (I) is not easily colored at the time of forming a member and in a long-term use environment. Therefore, in particular, the manufacture of a transparent conductive film having high electric characteristics and high reliability, the manufacture of a color filter substrate having high contrast and high definition, high resolution, extremely fine tone performance, high contrast and high can be achieved. In the present invention, the term "heat-resistant coloring property" means the coloring resistance when exposed to a high temperature, for example, at a high temperature (2 3 0 ° C) in the atmosphere. The polymer (I) has a structural unit selected from the following formula (1) (hereinafter also referred to as "structural sheet"). At least one structural unit (i) of a group of structural units represented by the following formula (2) and a structural unit represented by the following formula (2) (hereinafter also referred to as "structural unit (2)") (hereinafter also referred to as "Polymer (II)") is preferred. The polymer has an aromatic polyether polymer having a glass transition temperature of from -12 to 201206987 by having a constituent unit (i)'. ) Since both the transparency and the heat-resistant coloring property are excellent, the substrate containing the polymer has high light transmittance and excellent heat-resistant coloring property in the production of the composite and in a long-term use environment. Since the base material has such excellent properties in balance, it can be suitably used for a transparent conductive film, a touch panel, a color filter substrate, a switching element substrate, and the like. 【化5】

In the above formula (1), R1 to R4 each independently represent a monovalent organic group having 1 to 12 carbon atoms. a to d each independently represent an integer of 〇~4, preferably 〇 or 1, more preferably 〇. The organic group of the valence of 1 to 12 carbon atoms may be a hydrocarbon group having a monovalent number of carbon atoms of 1 to 12 and a carbon number of 1 to 12 containing an atom selected from at least one of an oxygen atom and a nitrogen atom. One-valent organic group and the like. The hydrocarbon group having a monovalent number of carbon atoms of 1 to 12 may be a hydrocarbon group having a linear or branched chain having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 12 carbon atoms, and an aromatic hydrocarbon group having a carbon number of -12. The hydrocarbon group of the linear or branched chain having 1 to 12 carbon atoms is preferably a hydrocarbon group having a linear or branched bond having 1 to 8 carbon atoms, preferably a hydrocarbon group having a direct bond or a branched bond having 1 to 5 carbon atoms. 13-201206987 Suitable specific examples of the above-mentioned linear or branched hydrocarbon group, group, ethyl, η-propyl, isopropyl, η-butyl, sec-butyl, η-pentyl, η-hexyl and Η-heptyl. The alicyclic hydrocarbon group having 3 to 12 carbon atoms is preferably a hydrocarbon having 3 to 8 carbon atoms, more preferably an alicyclic hydrocarbon group having 3 or 4 carbon atoms. Specific examples of the alicyclic hydrocarbon group having 3 to 12 carbon atoms include a cycloalkyl group such as a cyclobutyl group, a cyclopentyl group or a cyclohexyl group: a cycloalkenyl group such as a cyclopentenyl group or a cyclohexenyl group. The alicyclic hydrocarbon group may be on any of the carbons on the alicyclic ring. Examples of the aromatic hydrocarbon group having 6 to 12 carbon atoms include a phenyl group and a naphthyl group. The bonding site of the aromatic hydrocarbon group may be on the aromatic one carbon. The organic group having an oxygen atom and having 1 to 12 carbon atoms may be an organic group composed of a hydrogen atom and an oxygen atom, and the total carbon number of the preferred group, the carbonyl group or the ester bond and the hydrocarbon group may be the same. The organic group having a total carbon number of 1 to 12 having an ether group may, for example, be an alkoxy group having 2 to 12 carbon atoms, an aryloxy group having 6 to 12 carbon atoms of 2 to 12 carbon atoms, and carbon. Alkoxyalkyl group of 2 to 12 or the like. Examples thereof include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, a propyleneoxy group, a cyclohexyloxy group, and a methoxymethyl group. Further, an organic group having a total carbon number of 1 to 12 of a carbonyl group may be a fluorenyl group of 2 to 12 or the like. Specific examples thereof include an ethyl hydrazide group, a propyl fluorenyl group, and a benzindenyl group. The alicyclic group of the methyl group and the tert-butyl group may be a fluorenyl group, a ring bond site, or an atom on the biphenyl ring. Carbon refers to an organic group based on ether, 12 oxy, carbon specifically carbonyl, phenyloxy, carbon number, isopropyl sulfonium-14-201206987, organic radical having a total carbon number of 1 to 12 with an ester bond. A decyloxy group having a carbon number of 2 to 12 or the like is given. Specific examples thereof include an ethenyloxy group, a propenyloxy group, an isopropoxycarbonyl group, and a benzamidineoxy group. The organic group having a carbon number of 12 and having a carbon atom is exemplified by an organic group composed of a hydrogen atom, a carbon atom and a nitrogen atom. Specific examples thereof include a cyano group, an imidazolyl group, a triazolyl group, a benzimidazolyl group and a benzene. And three 哩 base. The organic group having a carbon number of 1 to 12 containing an oxygen atom and a nitrogen atom is exemplified by an organic group composed of a hydrogen atom, a carbon atom, an oxygen atom and a nitrogen atom. Specifically, an oxazolyl group or an oxadiazolyl group is exemplified. , benzoxazolyl and benzooxadiazolyl and the like. In the above formula (1), Ri to R4 are preferably a hydrocarbon group having a monovalent number of carbon atoms of from 1 to 12, preferably an aromatic hydrocarbon group having from 6 to 12 carbon atoms, more preferably a phenyl group.

In the above formula (2), 'R1 to R4 and a to d are each independently the same as R1 to R4 and a to d in the above formula (1), and Y represents a single bond, -S〇2- or >C=〇. R7 and R8 each independently represent a halogen atom, an organic group having a monovalent number of carbon atoms of 1 to 12, or a nitro group 'm represents hydrazine or 1. However, when 'm is 0', R7 is not a cyano group. g and h each independently represent an integer of 〇~4, and preferably an organic group which is a monovalent number of carbon atoms of 1 to 12, which is the same as the organic group having a carbon number of 1 to 12 in the above formula (1) Organic base and the like. -15- 201206987 In the above polymer (II), the molar ratio of the above structural unit (1) to the above structural unit (2) (however, the total of the two (structural unit (1) + structural unit (2)) is 1 〇〇), from the viewpoint of optical properties, heat resistance and mechanical properties, in structural units (1): structural unit (2) = 5 0 : 5 0~1〇〇: 〇 is better, structural unit (1) : Construction unit (2) = 70: 30~100: 〇 is better, construction unit (1): construction unit (2) = 80: 20~100: 〇 is better. Here, the mechanical properties refer to properties such as tensile strength, elongation at break, tensile modulus of elasticity, and the like of the polymer. Further, the polymer (Π) may have at least one structural unit (Π) selected from the group consisting of the structural unit represented by the following formula (3) and the structural unit represented by the following formula (4). When the polymer (II) has such a structural unit (ii), the mechanical properties of the substrate containing the polymer (Π) are preferably improved.

In the above formula (3), R5 and R6 each independently represent a carbon number of 1 to 12, and the organic group 'Z represents a single bond, -〇-, -S-'-S02-, > C=〇, -CONH -, -COO- or a two-valent organic group having a carbon number of 1 to 12, wherein n represents 〇 or 1»e and f each independently represents an integer of 〇4, preferably 〇. The organic group having a monovalent value of the carbon number of 1 to 12 is the same as the organic group having the same organic number as the carbon number of 1 to 12 in the above formula (1). -16-201206987 The organic group having a carbon number of 1 to 12, which is a divalent hydrocarbon group having a carbon number of 1 to 12, a halogenated hydrocarbon group having a carbon number of 1 to 12, and a halogen atom selected from the group consisting of an oxygen atom and a nitrogen atom. a divalent organic group having a carbon number of at least one of the atoms of the group, and a halogenated organic group having a carbon number of 1 to 12 and containing at least one atom selected from the group consisting of an oxygen atom and a nitrogen atom . The hydrocarbon group having a carbon number of from 1 to 12, which may be a divalent hydrocarbon group having a linear or branched chain of 1 to 12 carbon atoms, an alicyclic hydrocarbon group having a carbon number of 3 to 12, and a carbon number of 6 to 12 A divalent aromatic hydrocarbon group or the like. Examples of the divalent hydrocarbon group of a linear or branched chain having 1 to 12 carbon atoms include a methylene group, an exoethyl group, a trimethylene group, an isopropylidene group, a pentamethylene group, a hexamethylene group, and a heptaylene group. Base. Examples of the alicyclic hydrocarbon group having a carbon number of from 3 to 12, and examples thereof include a cycloalkyl group such as a cyclopropyl group, a cyclobutyl group, a cyclopentyl group, and a cyclohexyl group; a cyclobutene group and a ring extension; a cycloalkenylene group such as a pentenyl group and a cyclohexenylene group. The bonding site of the alicyclic hydrocarbon group may be on any of the carbons on the alicyclic ring. Examples of the aromatic hydrocarbon group having a carbon number of 6 to 12 and the like include a stretching phenyl group, a stretching naphthyl group, and a stretching phenyl group. The bonding site of the aromatic hydrocarbon group may be any carbon on the aromatic ring. The divalent halogenated hydrocarbon group having a carbon number of 1 to 12 may, for example, be a halogenated hydrocarbon group having a linear or branched chain of 1 to 12 carbon atoms, a halogenated alicyclic hydrocarbon group having a carbon number of 3 to 12, and a carbon number. A halogenated aromatic hydrocarbon group of 2 to 12 valences. The divalent halogenated hydrocarbon group of a linear or branched chain having 1 to 12 carbon atoms may, for example, be difluoromethylene, dichloromethylene, tetrafluoroextension ethyl, tetrachloroethylene or hexafluorotrimethylene. , hexachlorotrimethylene, hexafluoropropylene and hexachloroisopropylidene-17- 201206987 basis. The divalent halogenated alicyclic hydrocarbon group having a carbon number of from 3 to 12, which is a hydrogen atom of at least a part of the group exemplified in the alicyclic hydrocarbon group having a carbon number of from 3 to 12, is a fluorine atom or a chlorine atom. A bromine atom or a group substituted by an atom. The halogenated aromatic hydrocarbon group having a carbon number of from 6 to 12, which is a hydrogen atom of at least a part of the group of the aromatic hydrocarbon group having a carbon number of from 6 to 12, is a fluorine atom, a chlorine atom or a bromine. A group substituted by an atom or an iodine atom. The organic group having 1 to 12 carbon atoms and containing an atom selected from at least one of an oxygen atom and a nitrogen atom may, for example, be a hydrogen atom or a carbon atom, and an organic group composed of an oxygen atom and/or a nitrogen atom. The oxime may be an organic group having an ether group, a carbonyl group, an ester bond or a guanamine bond and a hydrocarbon group having a total carbon number of 1 to 12, and the like. The halogenated organic group having a carbon number of from 1 to 12, which is selected from the group consisting of at least one of an oxygen atom and a nitrogen atom, and specifically includes a group selected from the group consisting of an oxygen atom and a nitrogen atom. At least one hydrogen atom of at least one of the carbon atoms having a carbon number of from 1 to 12, at least one of the atoms, is substituted with a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. In the above formula (3), Z is preferably a single bond, -0-, -S02-, >C=0 or a carbon number of 1 to 12, preferably a hydrocarbon group having a carbon number of 1 to 12; Or a divalent halogenated hydrocarbon group having a carbon number of 1 to 12 is more preferable, and a hydrocarbon group having a carbon number of 1 to 12 is a hydrocarbon group having a carbon number of 1 to 12 or a branched or branched chain hydrocarbon group or a carbon number of 3 to 12 The divalent alicyclic hydrocarbon group is preferred. -18- 201206987

In the above formula (4), r7, r8, γ, m, g and h are each independently of the same meaning as R7, R8, Y, m, g & h in the above formula (2), R5, R6, Z, η , e and f are each independently equivalent to R5, R6, 2, 11, 6, and ^ in the above formula (3). However, when 111 is 〇, :^ is not a cyano group. In the polymer (II), the molar ratio of the structural unit (1) to the structural unit (Π) (however, the sum of the two ((ί)+(η)) is 100), and optical properties and heat resistance. And the viewpoint of mechanical properties, with (i) : (ii) = 50 : 50~100: 0 is better '(1): (Η) = 7〇: 3〇~1〇〇: 〇 is better, (i) · (ii) = 80: 20~1〇〇: 〇 is better. The polymer (II) preferably contains the structural unit (i) and the structural unit (Π) of 70 mol% or more in the entire structural unit from the viewpoints of optical properties, heat resistance, and mechanical properties, and is preferably in the entire structural unit. More than 95% by mole is more preferred. [Synthesis method of the polymer (II)] The polymer (II) may be, for example, a compound selected from the group consisting of the following formula (5) (hereinafter also referred to as "compound (5)") and the following The component (A) of at least one compound of the compound represented by the formula (7) (hereinafter also referred to as "compound (7)") is reacted with the component (B) containing the compound represented by the following formula (6). Got it. -19- 201206987 【化9】

CN

Χ"ΤΓ 7Τχ (5) In the above formula (5), X represents a halogen atom independently, and a fluorine atom is preferred. [化1 〇] (R8)h

In the above formula (7), R7, R8, Y, m, g and h are each independently of the same meaning as 117, 118, 丫, 111, 8 and 11 in the above formula (2), and the oxime is independent from the above formula ( 5) The meaning of X is the same. However, when m is 0, R7 is not a cyano group. 【化11】

In the above formula (6), Ra independently represents a hydrogen atom, a methyl group, an ethyl group, a ethane-20-201206987 fluorenyl group, a methanesulfonyl group or a trifluoromethylsulfonyl group, and a hydrogen atom is also preferred. Further, in the formula (6), R1 to R4 and a to d are each independently equivalent to R1 to R4 and a to d in the above formula (1). Specific examples of the above compound (5) include 2,6-difluorobenzonitrile, 2,5-difluorobenzonitrile, 2,4-difluorobenzonitrile, and 2,6-dichlorobenzonitrile. 2,5-Dichlorobenzonitrile, 2,4-dichlorobenzonitrile and reactive derivatives thereof. Particularly, from the viewpoints of reactivity and economy, 2,6-difluorobenzonitrile and 2,6-dichlorobenzonitrile can be suitably used. These compounds may be used in combination of two or more kinds. The compound represented by the above formula (6) (hereinafter also referred to as "compound (6)"), specifically, 9,9-bis(4-hydroxyphenyl)fluorene, 9,9-bis(3-benzene) _4·hydroxyphenyl)anthracene, 9,9-bis(3,5-diphenyl-4-hydroxyphenyl) burial, 9,9-bis(4-hydroxy-3-methylphenyl)anthracene 9,9-bis(4-hydroxy-3,5-dimethylphenyl)anthracene, 9,9-bis(4-hydroxy-3-cyclohexylphenyl) fluorene, and the like, and the like . Among the above compounds, 9,9-bis(4-hydroxyphenyl)fluorene and 9,9-bis(3-phenyl-4-hydroxyphenyl)fluorene may also be suitably used. These compounds may also be used in combination of two or more kinds. Specific examples of the above compound (7) include 4,4'-difluorobenzophenone, 4,4'-difluorodiphenyl maple, 2,4'-difluorobenzophenone, and 2,4'- Difluorodiphenyl hydrazine, 2,2'-difluorobenzophenone, 2,2'-difluorodiphenyl hydrazine, 3,3'-dinitro-4,4,-difluorobenzophenone, 3,3,-Dinitro-4,4'-difluorodiphenyl hydrazine, 4,4'-dichlorobenzophenone, 4,4,-dichlorodiphenyl hydrazine, 2,4'-dichloro Benzophenone, 2,4,-dichlorodiphenyl hydrazine, 2,2,-dichlorobenzophenone, 2,2'-dichlorodiphenyl hydrazine, 3,3,-dinitro-4, 4,-Dichlorobenzophenone and 3,3'-dinitro-4,4'-dichlorodiphenyl maple. Among them, 4,4'-difluorobenzophenone and 4,4'-di-21 - 201206987 fluorodiphenyl hydrazine are preferred. These compounds may be used in combination of two or more kinds. At least one compound selected from the group consisting of the compound (5) and the compound (?) is contained in an amount of 100 mol% of the component (A) to contain 8 mol% to 1 mol%. It is better to contain 90%%~1 〇 〇 耳 %. Further, the component (B) is preferably a compound represented by the following formula (8). The compound (6) is preferably contained in an amount of 5 〇 mol% to 100 mol%, and preferably 8 mol% to 1 mol%, in the component (B). It is more preferable to contain 90 mol% of 1 mol%. [1 2]

In the above formula (8), 'R5, R6, z, n, e and f are each independently the same as R5, R6, Z, n, e and f in the above formula (3), and the Ra system is independent from the above formula. (6) The same meaning of Ra in the middle. Examples of the compound represented by the above formula (8) include hydrogen waking, resorcin, 2-phenylhydroquinone, 4,4'-biphenol, 3,3,-biphenol, 4,4,-di Hydroxydiphenyl hydrazine, 3,3'-dihydroxydiphenyl hydrazine, 4,4,-dihydroxybenzophenone, 3,3'-dihydroxybenzophenone, 2,2-bis(4-hydroxybenzene) Base) propane, hydrazine-bis(4-hydroxyphenyl)cyclohexane, 2,2-bis(4-hydroxyphenyl^^^ + hexafluoropropene and reactive derivatives thereof, etc. The compound may be used in combination of two or more kinds. Among the above compounds, resorcinol, 4,4,-biphenyl fluorene, -22-201206987 bis(4-hydroxyphenyl)propane, 1,1-double are also used. (4-hydroxyphenyl)cyclohexane, 2,2-bis(4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropane, preferably by reactivity and mechanical properties In view of the above, 4,4'-biphenol may be suitably used. These compounds may be used in combination of two or more kinds. The above polymer (Π), more specifically, can be synthesized by the method (Γ) shown below. (Γ): reacting the component (B) with an alkali metal compound in an organic solvent to obtain an alkali metal of the component (B) Thereafter, the obtained alkali metal salt is allowed to react with the component (A). Further, the reaction of the component (B) with the alkali metal compound can be carried out in the presence of the component (A), and the alkali metal of the component (B) can also be used. The salt is reacted with the component (A). The alkali metal compound used in the reaction includes alkali metals such as lithium, potassium and sodium; hydrogenated alkali metals such as lithium hydride, potassium hydride and sodium hydride; lithium hydroxide and potassium hydroxide; And an alkali metal hydroxide such as sodium hydroxide; an alkali metal carbonate such as lithium carbonate, potassium carbonate or sodium carbonate; an alkali metal hydrogencarbonate such as lithium hydrogencarbonate, potassium hydrogencarbonate or sodium hydrogencarbonate; and the like. One type or a combination of two or more types of the alkali metal compound is used in the above-mentioned component (B), and the amount of the metal atom in the metal compound is usually 1 to 3 equivalents, preferably 1.1 to 1. 2 times equivalent, more preferably 1.2 to 1.5 times the equivalent amount. For the organic solvent used in the reaction, N,N-dimethylacetamide, N,N-dimethylformamide, N-methyl can be used. -2-pyrrolidone, iota, 3-dimethyl-2-imidazolidinone, γ-butyrolactone 'cyclobutanthene, Athene, diethyl hydrazine, dimethyl hydrazine, diethyl maple, diisopropyl hydrazine, diphenyl hydrazine, diphenyl -23-201206987 ether, benzophenone 'dialkoxy benzene (alkane) The carbon number of the oxy group is 1 to 4) and the trialkoxybenzene (the carbon number of the alkoxy group is 1 to 4), etc. Among these solvents, N-methyl-2-pyrrolidone and N are particularly used. A polar organic solvent having a high dielectric constant such as N-dimethylacetamide, cyclobutyl hydrazine, diphenyl hydrazine, and dimethyl sulfoxide may be suitably used. These may be used alone or in combination of two or more. Further, in the above reaction, benzene, toluene, hydrazine, hexane, cyclohexane, octane, chlorobenzene, dioxane, tetrahydrofuran, anisole and phenethyl ether may be used together with water. Boiling solvent. These may be used alone or in combination of two or more. When the ratio of the component (A) to the component (B) is 100 mol% in total of the component (A) and the component (B), the component (A) is preferably 45 mol% or more and 5 5 mol%. The following is more preferably 50% by mole or more and 5 2% by mole or less, more preferably more than 50% by mole and 52% by mole or less, and the component (B) is preferably 45% by mole or more and 5 5 moles. % or less, more preferably 4 8 mol% or more and 5 mol% or less, more preferably 48 mol% or more and less than 50 mol%. Further, the reaction temperature is preferably in the range of 60 to 25 CTC, more preferably in the range of 80 to 200 t. The reaction time is preferably from 15 minutes to 1 hour, more preferably in the range of from i to 24 hours. [The physical properties of the polymer (I), etc.] The polymer (I) does not require a polyimide polymer. The high temperature treatment for the imidization required for the synthesis is low in the manufacturing process of the polymer, and the polymer can be easily produced. The polymer (I) is a HPC- 8 220 GPC device manufactured by TOSOH-24-201206987 (column: TSKgel α-Μ, developing solvent: tetrahydrofuran (hereinafter also referred to as "THF j"), in terms of polystyrene The weight average molecular weight (Mw) is preferably 5,000 to 500,000, more preferably 15,000 to 400,000, still more preferably 30,000 to 300,000. The thermal decomposition temperature of the polymer (1) measured by thermogravimetric analysis (TGA) is preferably 450 ° C or more, more preferably 475 ° C or more, and more preferably 49 (TC or more. [Method for Producing Substrate] The method for producing the substrate is not particularly limited, and the polymer (I) is contained. a method in which a polymer composition is applied onto a support to form a coating film, and then a substrate is formed on the support by removing an organic solvent from the coating film. By forming the substrate in this manner, it is prevented The molecules of the polymer are oriented in a certain direction, and a substrate having a smaller phase difference can be obtained. The polymer composition can be directly used as a mixture of the polymer (II) obtained by the aforementioned method (Γ) and an organic solvent. Using such a polymer composition The substrate can be easily and inexpensively produced. Further, the polymer composition can also be isolated (purified) by a mixture of the polymer (II) obtained by the above method (Γ) and an organic solvent. After dispersing the solid, it is dissolved in an organic solvent to prepare a polymer composition. The polymer (II) is isolated (purified) into a solid fraction, for example, by reprecipitating the polymer in methanol or the like. In the poor solvent of the polymer -25 to 201206987, the filtration is carried out, followed by drying under reduced pressure, etc. The organic solvent in which the polymer (Π) is dissolved, for example, dichloromethane, tetrahydrofuran or cyclohexanone can be suitably used. N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone and γ-butyrolactone are preferably used as appropriate from the viewpoints of coatability and economy. Dichloromethane, hydrazine, hydrazine-dimethylacetamide, and hydrazine-methylpyrrolidone. These solvents may be used singly or in combination of two or more. The concentration of the polymer in the material varies depending on the molecular weight of the polymer. Usually, it is 5 to 40% by mass, preferably 7 to 25% by mass. If the concentration of the polymer (I) in the polymer composition is within the above range, the pinhole can be easily produced by thick film formation, and The substrate having excellent surface smoothness can be formed. The viscosity of the polymer composition varies depending on the molecular weight or concentration of the polymer, and is usually 2,000 to 10,000,000 mPa·s, preferably 3,000 to 50,0 00 mPa·s. When the viscosity of the polymer composition is within the above range, the composition in the film formation is excellent in retention, and since the thickness is easily adjusted, the substrate is easily formed. Further, the polymer composition may contain an anti-aging agent, and by containing an anti-aging agent, the durability of the obtained substrate can be further improved. The antioxidant is preferably a hindered phenol compound. The hindered phenol-based compound which can be used in the present invention is exemplified by triethylene glycol-bis[3-(3-tert-butyl-5-methyl-4-hydroxyphenyl)propionate], 1,6- Hexanediol-bis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], 2,4-bis-(n-octylthio)-6-(4 -hydroxy-3,5-di-tert-butylanilino)-3,5-tri-26- 201206987 xiao, pentaerythritol 肆[3-(3,5-tert-butyl-4-ylphenyl) Two acid salts], 1, 1,3-para [2-methyl-4-[3·(3,5-di-tert-butyl-4-hydroxyphenyl)propenyloxy]-5-tert -butylphenyl]butane, 2,2-thio-di-extension ethyl bis[3_(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], octadecyl _ 3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate, hydrazine, hydrazine-hexamethylene bis(3,5-di-tert-butyl-4-hydroxy-hydrogen Cinnamylamine, 1,3,5-trimethyl-2,4,6-gin (3,5-di-tert-butyl-4-hydroxybenzyl)benzene, ginseng-(3>5-two -tert-butyl-4-hydroxybenzyl)-trimeric isocyanate, and 3,9-bis[2-[3-(3-tert-butyl-4-hydroxy-5-methylbenzene) Base) propionyloxy]-1,1-dimethylethyl]-2,4,8,10-tetraoxaspiro[5.5]undecane, and the like. When the anti-aging agent is blended with the polymer composition, the amount of the antioxidant is 0.01 to 10 parts by weight based on 1 part by weight of the polymer (1). A method of forming a coating film by applying the polymer composition to a support may be a method using a roll coating method, a gravure coating method, a spin coating method, or a doctor blade coating method. . The thickness of the coating film is not particularly limited, and is, for example, 1 to 25 0 μηι, preferably 2 to 150 μηι, more preferably 5 to 125 μηη β. The support may, for example, be a polyethylene terephthalate (PET) film or a SUS plate. The method for removing the organic solvent from the coating film is not particularly limited, and examples thereof include a method of heating the coating film. The heating condition may be such that the organic solvent can be removed by the coating film, and the support or the polymer may be appropriately determined. For example, the heating temperature is preferably 30 to 300 ° C, and preferably 40 to 250 ° C, 50 °. 23 0 ° C is better. Heating -27- 201206987 The time is preferably 10 minutes to 5 hours. Moreover, the heating can also be carried out by the second stage or more. Specifically, after drying at a temperature of 30 to 80 ° C for 10 minutes to 2 hours, the mixture is further heated at 1 to 250 ° C for 1 minute to 2 hours. Further, it may be dried in a nitrogen atmosphere or under reduced pressure as necessary. Further, when the substrate is produced, a method of removing the coating film by removing the organic solvent from the coating film and then removing the solvent may be mentioned. When the substrate is produced, a substrate having a small heat shrinkage rate can be obtained by containing a baking step. Therefore, a composite having excellent electrical characteristics and reliability can be obtained. In the case of the above-mentioned baking, the coating film formed on the support may be fired together with the support, but the coating film formed on the support may be self-supporting from the viewpoint of not affecting the properties of the support. Peeling, and then burning is preferred. Further, the method of removing the organic solvent from the coating film may be carried out by baking the coating film, and the step of removing the organic solvent may be additionally carried out before the baking step. Further, when the coating film peeled off from the support is fired, it is preferred to previously remove the organic solvent from the coating film before peeling off the coating film from the support. The calcination step is preferably carried out at a specific temperature, and the firing temperature is preferably from 210 ° C to 350 ° C, more preferably from 220 ° C to 3 30 ° C, more preferably 2 3 0°C~3 2 (TC. The firing time is preferably 10 minutes to 5 hours. The firing environment is not particularly limited, and is preferably in the atmosphere or in an inert gas atmosphere, and is particularly suitable in an inert gas atmosphere. The inert gas may, for example, be nitrogen, argon or ammonia from the viewpoint of coloring, but preferably nitrogen. The obtained substrate may be used after being peeled off from the support, or according to the use of the support -28-201206987 The type or the use of the composite may be different, and may be directly used without being peeled off. The thickness of the substrate may be appropriately selected depending on the intended use, and is preferably 1 to 2 50 μm, more preferably 2 to 150 μm. More preferably, it is preferably 10 to 125 μm. In consideration of the phase difference of the substrate and the weight reduction of the display device or the touch panel, the film thickness of the substrate is preferably thin. [Substance property, etc.] The substrate The glass transition temperature (Tg) measured by a Rigaku Corporation Model 8230 DSC measuring device (temperature rising rate 20 ° C / min) was 230. ~3 50 ° C is better, 240 to 3 3 0 ° C is more preferable, 250 ~ 300 〇 C is more preferable. If the substrate has such a glass transition temperature, forming at least one side of the substrate When at least one type of the transparent transparent conductive film, the colored portion, and the switching element are grouped, the protective film made of a transparent resin or the transparent conductive film is formed on the colored portion or the like as desired. Or the heat treatment can be carried out at a high temperature, and the method of forming the member is not limited, and the composite can be easily manufactured. When the thickness of the substrate is 30 μm, the total light transmittance in the JIS K7105 transparency test method is 85. % or more is preferable, and 88% or more is more preferable. The total light transmittance can be measured by using a sigma meter SC-3H (manufactured by Suga Test Machine Co., Ltd.). The substrate is at a thickness of 30 μm, at a wavelength of 400 nm. The light transmittance is preferably 70% or more, more preferably 75% or more, and still more preferably 80% or more. The light transmittance at a wavelength of 400 nm can be used for ultraviolet light and visible points -29 - 201206987 Photometer V-570 (Measured by JASCO). Light penetration of the aforementioned substrate In the above range, since the substrate particularly exhibits high light transmittance, it can be suitably used for a composite of a transparent conductive film, a color filter substrate, a switching element substrate, etc. The substrate has a thickness of 30. When μπι is used, the ΥΙ値 (yellow index) is preferably 3 or less, preferably 2 2 or less, and more preferably 2.0 or less. The ΥI値 system can use the SM-T color measuring device manufactured by Suga Test Machine Co., Ltd. In addition, since the base material which is not easily colored can be obtained in such a range, it can be suitably used for a composite of a transparent conductive film, a color filter substrate, and a switching element substrate. When the thickness of the material is 30 μm, the γ I 値 which is heated in the air at 130 ° C for 1 hour in a hot air dryer is preferably 3.0 or less, more preferably 2.0 or less, and more preferably 2.0 or less. In the above-mentioned range, a substrate which is hard to be colored even at a high temperature can be obtained, and a composite of a transparent conductive film, a color filter substrate, a switching element substrate, and the like excellent in optical characteristics can be obtained. The substrate preferably has a refractive index of 1.55 to 1.75 with respect to light having a wavelength of 63 3 nm, and more preferably has a refractive index of 1.60 to 1.70. The refractive index system can be measured using a 稜鏡 coupler Model 2010 (manufactured by Metricon Co., Ltd.). The tensile strength of the substrate is preferably 50 to 200 MPa, more preferably 80 to 150 MPa. Tensile strength can be measured using a tensile tester 5 5 43 (manufactured by INSTRON Co., Ltd.). The elongation at break of the substrate is preferably from 5 to 100%, and from 15 to 100% is preferably from -30 to 201206987. The elongation at break can be measured using a tensile tester 5543 (manufactured by INSTRON Co., Ltd.). The tensile elastic modulus of the substrate is preferably 2.5 to 4. OGPa, more preferably 2.7 to 3.7 GPa. The tensile modulus of elasticity can be measured using a tensile tester 5 543 (manufactured by INSTRON Co., Ltd.). When the thickness of the substrate is 30 μm, the phase difference (Rth) in the thickness direction is preferably 200 nm or less, more preferably 50 nm or less, and still more preferably 10 nm or less. The phase difference can be measured using a RETS spectroscope manufactured by Otsuka Electronics Co., Ltd. When the substrate has such a low phase difference, the substrate is excellent in optical equivalence, and when the composite having the substrate is used in a touch panel or a display device, it is possible to suitably prevent coloration or drying from appearing on the display surface. Stripes cause a decrease in display quality. Therefore, the composite of the present invention having the above-mentioned substrate can be suitably used for a touch panel or a display device. The substrate has a coefficient of linear expansion of 80 ppm as measured by a SICA-5200 TMA Nading apparatus manufactured by Seiko Instruments. Below / K, it is more preferably 75 ppm / Κ or less. The substrate has a humidity expansion coefficient of preferably 15 ppm / % RH or less, more preferably 12 ppm / % RH or less. The humidity expansion coefficient can be measured using the TMA (SII Nanotechnology, TMA-SS6100) humidity control option. When the expansion coefficient of the substrate is within the above range, the substrate exhibits high dimensional stability (environmental reliability), and can be suitably used for a composite or touch of a transparent conductive film, a color filter substrate, and a switching element substrate. panel. In particular, it can be suitably used in a vehicle-mounted guide that requires high environmental reliability - 31 - 201206987, etc. The heat shrinkage rate of the above substrate in JIS Κ 7133 (heat treatment temperature 220 ° C, 60 minutes) is -0.1 to 0 1%, preferably -0.05 to 0.05%, more preferably -0. 03 to 0. 03%. In addition, the "heat shrinkage ratio" is determined based on JIS Κ 7133. Specifically, the heat treatment is performed by placing the substrate (10 0 mm XI 0 0 mm) of the correct length in advance without stress. Set to a predetermined temperature (220 ° C) in a constant temperature chamber, take it after 60 minutes, and read the change in size after returning to room temperature. And, the length L before heat treatment. The heat shrinkage ratio was determined by the following formula after the heat treatment with the length L. Heat shrinkage ratio = (LQ - L) xl00 / L 〇 (%) In addition, the temperature of the base material is changed to 24 (the same as the above, the heat shrinkage rate is preferably -〇) .2 to 0.2%, more preferably -0.1 to 0.1%, still more preferably -0.05 to 0.05%, particularly preferably -0.03 to 0.03 %. The substrate having a heat shrinkage ratio within the aforementioned range is When a member such as a transparent conductive film, a colored portion, or a switching element is formed on a substrate, even when exposed to a high temperature, the dimensional change is small, and the stress and displacement amount of the member formed by the member are preferably small. <Complex> The composite of the present invention is formed by forming at least one surface selected from the group consisting of a transparent conductive film, a colored portion, and a switching element on at least one surface of the substrate. A transparent conductive film formed by forming at least one surface of the substrate - 32 - 201206987, a transparent conductive film formed on at least one surface of the substrate, and a color filter substrate formed on at least one surface of the substrate Optical component such as a switching element substrate formed by forming a switching element on at least one side [Transparent Conductive Film] The transparent conductive film is formed by forming a transparent conductive film on at least one surface of the substrate. The transparent conductive film is not particularly limited as long as it is transparent and exhibits conductivity, and examples thereof include tin oxide. a metal oxide film composed of indium oxide, cerium oxide, zinc oxide, cadmium oxide, indium tin oxide (ITO) or indium zinc oxide (IZO), or a composite film of such metal oxides as a host, gold, silver A metal film composed of copper, tin, nickel, aluminum, or palladium. The method for forming the transparent conductive film is not particularly limited, and examples thereof include a vacuum vapor deposition method, a sputtering method, an ion plating method, and a CVD method. In the method, it is preferable to form a film by sputtering by the uniformity of the film or the adhesion of the substrate to the film. The temperature at which a film made of a metal or a metal oxide is formed by a sputtering method or the like 150~3 5 0°(: preferably, 180~3 00. (: is preferred, 22 0~2 60 °<: is better. The aforementioned substrate contains the aforementioned polymer (I), and the glass is transferred. The temperature is high. Therefore, even if it is necessary to heat it at such a high temperature The method can also form a transparent conductive film on a substrate to produce a transparent conductive film having high electrical characteristics and high reliability. Moreover, a polythiophene-based or polyaniline-based conductive polymer can also be coated- 33- 201206987 A transparent conductive film is formed on the substrate by film formation. The thickness of the transparent conductive film is preferably 30 A or more, and when it is thinner than this, the specific resistance (volume resistance) is 1 x 1 0_3 Ω·cm or less. However, it is difficult to form a continuous film having good conductivity. The other side, if it is too thick, may cause a decrease in transparency, etc., so it is suitable for a thickness of 50 to 2000 A. These transparent conductive films may be used. It is one layer and can also be composed of multiple layers. When the transparent conductive film is formed on the substrate, the surface of the substrate is subjected to plasma treatment, corona treatment, alkali treatment, coating treatment, etc., from the viewpoint of improving the adhesion between the substrate and the transparent gas barrier film. Surface treatment is preferred. The transparent conductive film may have an anti-reflection film or a hard coat film on at least one side thereof, or may be subjected to an anti-Newton ring treatment. The specific resistance 値 (volume resistance 测定) measured by the low-resistance meter "Loresta-GP" manufactured by Mitsubishi Chemical Corporation is preferably 2 χ 10 _ 3 Ω·cm or less, and more preferably 5 χ 10 _ 4 Ω·cm or less. By setting the specific resistance within the above range, it is possible to obtain a film having excellent conductivity, and since the touch panel containing such a film can respond quickly and accurately even for rapid operation, it is preferable. The composite of the present invention preferably comprises a polarizing plate on at least one surface of the transparent conductive film, and a polarizing plate is laminated on a surface opposite to a surface of the transparent conductive film on which the substrate is laminated. good. The polarizing plate may be a circular polarizing plate or a linear polarizing plate, and when the composite is used for a touch panel, a circular polarizing plate is preferably used because of improved viewing performance. -34- 201206987 The circular polarizing plate is preferably one in which one linear polarizing plate and one or two or more retarding plates are included. The method of laminating the polarizing plate and the transparent conductive film is not particularly limited, and lamination can be carried out using an adhesive or the like which does not impair the effects of the present invention and properties such as a touch panel. [Color filter substrate] The color filter substrate is formed by forming a colored portion on at least one surface of the substrate. The colored portion can be formed on the substrate by a conventionally known method. Specifically, the surface of the substrate is first washed. Next, a black matrix material such as chromium or black resin is formed on one surface of the substrate by sputtering or the like. Thereafter, the surface of the black matrix material film is coated with a photoresist or the like, and if necessary, it is dried, and then exposed and developed using a photomask to pattern the resist. Thereafter, the etching and the peeling of the resist are performed, and the black matrix material remains only in a necessary portion, and the black matrix can be formed by hardening it by heat treatment. The temperature during the heat treatment may be appropriately adjusted depending on the material, preferably 150 to 300 ° C, preferably 180 to 2 50 ° C, more preferably 220 ° C or more. Next, coloring portions of respective colors such as red, green, and blue (RGB) are formed. For example, when a red colored portion is formed, a red pigment material is applied and a red pigment material film is obtained by prebaking. Next, the surface of the red pigment material film is coated with a photoresist, and if necessary, it is dried, and then exposed, developed, and patterned with a reticle. -35- 201206987 Thereafter, etching and resist stripping are performed and left in the necessary part, and the temperature during heat treatment by heat treatment is preferably 150 to 300 ° C depending on the material used, 180 to 250 ° C Preferably, the colored portions of the remaining colors such as color and blue may be formed. Further, the red color pigment material is simultaneously applied to the black matrix, and the base material can be formed in the same manner. Since the base material has high heat resistance, the color pigment materials are sufficiently cured. Therefore, the color filter substrate can be fine. In addition to the method of resisting the pattern of the black matrix or the colored portions of the respective colors, it is also possible to use a matrix material or a coloring material of each color, and a method of resisting the touch pattern is not used. Further, the black matrix can be directly performed by a printing method such as screen printing. Further, as a black matrix material, a metal of each color, and a black material such as carbon black or the like, an acrylic resin, an epoxy resin, or a mixture is exhibited. As the photoresist material, a resin such as an acrylic resin or an amine resin, a matrix material of any additive additive, a coloring matter material and a photoresist material i are used, and the red pigment material is only left to be cured, and the red colored portion is cured. The material is suitable for adjustment, and it is more preferably 220 ° C or more. Green repeats the same operation for each color shader such as green or blue (RGB). A black matrix material or a high-contrast and high-formation method can be used, in addition to using a photosensitive black moment, and directly using a photomask to perform brushing, gravure printing, and ink-jet or color-colored portions of the coloring matter. An epoxy resin such as a red, green or blue color polyimine resin or a polybenzazole mixture or the like is used. From the viewpoint of applicability, from -36 to 201206987, it is preferred to use a solution to which a solvent or the like which does not dissolve the substrate is added. Next, for the purpose of flattening and protecting the surface of the colored portion, it is also necessary to form a protective layer on the surface of the colored portion. The protective layer is a hardened resin, and an epoxy-based or acrylic-based resin is used mainly, and the thickness thereof is usually from 1 to 10 μm. Further, a transparent conductive film composed of a known metal oxide film may be formed as necessary. On the coloring or protective layer. For example, indium oxide, cadmium oxide, and tin oxide to which tin, antimony, cadmium, molybdenum, tungsten, fluorine, zinc, antimony or the like are added as impurities, zinc oxide to which aluminum is added as an impurity, and oxidation may be mentioned. A metal oxide film composed of titanium or the like. Among them, a transparent conductive film made of indium oxide containing 2 to 15% by weight of tin oxide is preferably used because of its excellent transparency and electrical conductivity. The film thickness of the transparent conductive film can be set in accordance with the surface resistance of the object, but it is preferably 5ηιη to 10μηη. These transparent conductive films may be laminated on the colored portion or the protective layer by a sputtering method, a vacuum deposition method, an ion plating method, a plasma CVD method, or the like. In order to make the specific resistance of the transparent conductive film to be 1 χ 1 (Γ3 Ω·cm or less, the substrate temperature when forming a transparent conductive film on a substrate is desirably 20 to 400 ° C, preferably 180 to 3 50 ° C. Switching element substrate] The switching element substrate is formed by forming a switching element on at least one surface of the substrate. The switching element is not particularly limited, and examples thereof include a thin film transistor (TFT) -37 - 201206987 element, and MIM (Metal Insulator Metal) Among these, a TFT element is preferable from the viewpoint of excellent switching performance. The TFT element is not particularly limited, and examples thereof include a TFT element composed of a gate electrode, a source electrode, a drain electrode, and an active layer. The method for forming the TFT element on the substrate is, for example, a method comprising the following (1) to (5). (1) Splashing from the substrate After forming a film made of a conductive material such as a metal or a metal oxide, a gate electrode is formed by etching or the like, and a temperature of a film made of a metal or a metal oxide is formed by a sputtering method or the like. At 150~350 °C Preferably, 180 to 300 ° C is preferable, and 220 to 2 60 ° C is more preferable. (2) Next, a gate insulating film such as a tantalum nitride film is formed by a plasma CVD method or the like on a substrate provided with a gate electrode. (3) Further, an active layer made of an organic semiconductor or the like is formed on the gate insulating film by a plasma CVD method or the like. The temperature at which a film such as a gate insulating film or an organic semiconductor is formed by a plasma CVD method or the like is used. It is preferably 150 to 3 50 ° C, preferably 180 to 300 ° C, and more preferably 220 to 260 ° C. (4) Secondly, a metal or metal oxide is formed by sputtering or the like on the active layer. After the film is formed by etching or the like, the source electrode and the drain electrode are disposed*

(5) Finally, a tantalum nitride film or the like is formed on the source electrode or the drain electrode by a plasma CVD method or the like, and a TFT-38-201206987 element can be formed by forming a protective film. The bottom gate type TFT element has been described above, but the above TFT element is not limited to this configuration, and may be of the top gate type. Since the substrate has high heat resistance, the gate electrode, the source electrode, the drain electrode, the active layer, and the like can be formed at the desired temperature. Therefore, a switch element substrate having high resolution, extremely fine tone performance, high contrast, and high definition can be manufactured. The gate electrode, the source electrode, and the drain electrode are not particularly limited as long as they are formed of a conductive material. Examples of the conductive material include a metal or a metal oxide metal, and examples thereof include uranium, gold, silver, nickel, chromium, copper, iron, tin, antimony, lead, molybdenum, indium, aluminum, zinc, magnesium, and the like. Examples of the alloy and the metal oxide include ITO, IZO, ZnO, In-Ga-Zn〇4, and Ιη203. In addition, a conductive polymer may be used as the conductive material in consideration of adhesion to a substrate. Among these, it is preferable that a transparent electrode can be formed by using a metal oxide. The active layer may be formed of any material, but it is preferably one having a high dielectric constant and low conductivity. Examples of the material for forming the active layer include inorganic semiconductors such as amorphous germanium, polycrystalline germanium, CdS, GaS, ZnS, CdSe, CaSe, ZnSe, CdTe, SiC, and Si; and polythiophene and derivatives thereof. Poly(p-phenylene vinylene) and its derivatives, polyparaphenylene and its derivatives, polyfluorene and its derivatives, polythiophene vinylene and its derivatives, polythiophene-heterocyclic aromatic copolymers and derivatives thereof 'Fused pentene, condensed tetraphenyl with -39-201206987 and naphthalene and other oligoacene and derivatives thereof, α-6-thiophene and α-5-thiophene and other oligothiophenes and derivatives thereof , phthalocyanine and its derivatives, pyromellitic dianhydride or dimethymine pyromide and derivatives thereof, perylenetetracarboxylic dianhydride or ruthenium tetracarboxylic acid diimine and such An organic semiconductor such as a derivative. An inorganic substance and/or an organic substance can be used for the formation of the above-mentioned gate insulating film. Examples of the inorganic substance include Si3N4, SiO2, SiNx, Α12〇3, TiO2, Ta205, Hf02, Zr02, BST (barium titanate), and strontium (lead titanate), and the organic substance can be generally used in general. Molecular (polymethyl methacrylate resin, polystyrene resin), polymer derivative having phenol group, acrylic polymer, quinone imine polymer, aryl ether polymer, guanamine polymer, A fluorine-based polymer, a vinyl alcohol-based polymer, and the like. Further, as the gate insulating film, an inorganic-organic laminated film can also be used. Further, a barrier layer may be provided on the surface of the substrate opposite to the surface on which the TFT element is formed, in order to prevent moisture from penetrating into the TFT element through the substrate. The barrier layer is not particularly limited, and a layer in which an inorganic layer and a polymer layer are combined may be mentioned. The inorganic layer may be a layer composed of a metal oxide, a metal nitride, a metal carbide, a metal oxynitride or the like. Examples of the metal oxide include cerium oxide, aluminum oxide, titanium oxide, indium oxide, tin oxide, indium tin oxide, and the like. Examples of the metal nitride include aluminum nitride and tantalum nitride, and metal carbides include barium carbide and the like. Examples of the metal oxynitride include barium oxynitride. Such an inorganic layer can be formed by vapor deposition. -40-201206987 The above-mentioned MIM element is not particularly limited as long as it is a diode provided with an insulating layer between the metals, and can be manufactured by a conventionally known method. The method of forming the MIM element on the substrate may, for example, be a method comprising the following (1) to (3). (1) A film made of a metal or a metal oxide or the like is formed on the substrate by a sputtering method or the like, and then an electrode is provided by etching or the like. (2) Next, an insulating layer such as a tantalum nitride film is formed on the substrate on which the electrode is provided by a plasma CVD method or the like. (3) Thereafter, a film of a metal or a metal oxide or the like is formed on the insulating layer by sputtering or the like, and then an electrode is provided by etching or the like. Examples of the metal include platinum, gold, silver, nickel, chromium, copper, iron, tin, antimony, molybdenum, indium, aluminum, zinc, magnesium, and the like. Examples of the metal oxide include a metal oxide. ITO, IZO, ZnO, and 203η203. In addition to this, a conductive polymer may be used as the conductive material in consideration of adhesion to a substrate. Among these, it is preferable to form a transparent electrode by using a metal oxide. <<Display device>> The display device of the present invention is characterized by containing the composite of the present invention described above. Therefore, a display device having excellent display characteristics can be obtained. Further, a display device in which coloring or dry streaks are less likely to occur on the display surface can be obtained. Examples of the display device include various liquid crystal display devices such as a touch panel, a mobile phone, an electronic information terminal, a pager, a navigator, a vehicle liquid crystal display, a liquid crystal screen, a dimming panel, an OA device display, and an AV device display. . -41 - 201206987 &lt;&lt;Touch Panel&gt;&gt; The touch panel of the present invention is composed of the above-mentioned composite, and preferably includes the transparent conductive film. A touch panel including the transparent conductive film and a transparent conductive film that is opposed to the transparent conductive film of the film and that faces the transparent conductive film. When the touch panel includes a composite having a polarizing plate on at least one surface of the transparent conductive film, the low-reflection touch panel can suppress the amount of reflected light from the outside of sunlight or a fluorescent lamp. It is better. The touch panel is essentially formed by such elements, but in practice, in order to realize the operation of the touch panel, a member supporting the transparent conductive film or a coating material, a spacer for forming a void, or the like is used. Further, since the member supporting the transparent conductive film must have controlled optical characteristics, the member composed of the polymer used in the present invention is extremely suitable. [Examples] Hereinafter, the present invention will be specifically described by way of examples. (1) Structural analysis The structural analysis of the polymer obtained by the following examples and comparative examples was carried out by IR (ATR method, FT-IR, 6700, manufactured by NICOLET) and NMR (ADVANCE500 type, manufactured by BRUKAR). . (2) Weight average molecular weight (Mw), number average molecular weight (Mw), and molecular weight distribution (Mw / Μη) -42 - 201206987 Weight average molecular weight (Mw) of the polymer obtained by the following Examples and Comparative Examples The molecular weight (Mw) and the molecular weight distribution (Mw/Mn) were measured using a HLC-8220 GPC apparatus (column: TSKgela-M, developing solvent: THF) manufactured by TOSOH. (3) Glass transition temperature (Tg) The glass transition temperature of the polymer or the evaluation film obtained in the following Examples and Comparative Examples was a 823 0 type DSC measuring apparatus manufactured by Rigaku Co., Ltd. at a temperature rising rate of 20 ° C/min. The measurement was carried out. (3') Thermal decomposition temperature The thermal decomposition temperature of the polymer obtained by the following Examples and Comparative Examples was by thermogravimetric analysis (TGA: nitrogen atmosphere, temperature increase rate 10 ° C / min, 5% weight reduction temperature) ) and measured. (4) Mechanical strength The tensile strength at room temperature, the elongation at break, and the tensile modulus of elasticity of the film for evaluation obtained in the following Examples and Comparative Examples were measured by a tensile tester 5543 (manufactured by INSTRON Co., Ltd.). It was measured in accordance with JIS K7127. (5) Environmental stability The linear expansion coefficient of the film for evaluation obtained in the following examples and comparative examples was measured using a SBA-5200 type TMA measuring apparatus manufactured by Seiko Instruments. After the temperature was raised from room temperature to 2 80 ° C, the linear expansion coefficient was calculated from the gradient at 200 ° to 10 ° C when the temperature was lowered at 3 ° C / min. Further, the humidity expansion coefficients of the films for evaluation obtained in the following examples and comparative examples were measured under the following conditions using a humidity control option of TMA (manufactured by SII Nanotechnology Co., Ltd., D.8-SS6 10 0). -43- 201206987

Humidity conditions: 40% RH to 70% RH, humidity is changed every 10% RH (stretching method: weighting 5 g) Temperature: 23 〇 C (6) Optical properties The film for evaluation obtained by the following Examples and Comparative Examples, The total light transmittance and YI enthalpy were measured in accordance with the JIS K7 105 transparency test method. Specifically, the total light transmittance of the film for evaluation was measured using a SC-3H type sputum meter manufactured by Suga Test Machine Co., Ltd., and the YI 値 was measured using a SM-T type color measuring instrument manufactured by Suga Test Machine Co., Ltd. (YI before heating) ). In addition, the film for evaluation obtained in the following examples and comparative examples was heated in a hot air dryer at 23 ° C for 1 hour in a hot air dryer, and the SM-T color measuring device manufactured by Suga Test Machine Co., Ltd. was used. And measured (YI after heating). The light transmittance at a wavelength of 400 nm of the film for evaluation obtained in the following Examples and Comparative Examples was measured using an ultraviolet-ray-visible spectrophotometer V-570 (manufactured by JASCO Corporation). The phase difference (Rth) of the film for evaluation obtained in the following examples and comparative examples was measured using a RETS spectroscope manufactured by Otsuka Electronics Co., Ltd. Further, the reference wavelength at the time of measurement was 589 nm, and the evaluation film thickness of the phase difference was expressed by the specification to 30 μm. The refractive index of the film for evaluation obtained in the following examples and comparative examples was measured using a 稜鏡 coupler Model 2010 (manufactured by MetriC〇n Co., Ltd.). In addition, the refractive index was measured using a wavelength of 633 nm. (7) Specific resistance 値 Using a low-resistance meter "Loresta-GP" manufactured by Mitsubishi Chemical Corporation, 44 - 201206987 The following samples and comparative examples were determined. The specific resistance of the transparent conductive film of the transparent conductive film (Ω·cm) (8) Evaluation of the color filter substrate The film for evaluation obtained in the following examples and comparative examples was cut into 1 〇cm X 10 cm square, on both sides. A bismuth oxide film having a thickness of 0.2 μm was formed using a direct current (DC) magnetron sputtering apparatus using Si as a standard palladium material. Further, a surface of the film opposite to the surface on which the ruthenium oxide film is formed is used, and a chromium film is formed using chromium as a standard palladium material, and then a positive photosensitive resin composition is used. And a black matrix of a given shape is formed. Next, a pigment-based color resist (trade name "JCRRED689" JSR (manufactured by JSR)) was applied onto a film of a black matrix having a predetermined shape by a spin coater, and was carried out on a hot plate at 9 (TC). After pre-baking for 150 seconds to form a coating film, the ghi line (intensity ratio of wavelengths of 436 nm, 405 nm, and 365 nm = 2.7 is obtained by using a polarizer CanonPLA501F (manufactured by Kanon)) through a predetermined pattern mask: 2.5 : 4.8) Irradiation with an exposure amount of 2,000 J/r2 in terms of i-line, followed by development with 〇.〇5 wt% potassium hydroxide aqueous solution, and rinsing with ultrapure water for 60 seconds, and then The oven was heated at 30 ° C for 30 minutes to form a red colored portion. In addition to JCRRED 689, which is a pigment-based color resist, JCR GREEN 706 (manufactured by JSR) and "CR8200B" (JSR) were used. The color filter substrate is obtained by separately forming the green and blue colored portions in the same manner. The stripe width of the three-color stripe-shaped colored portion is 1 〇〇μιη, the stripe interval is 20 μm, and the resulting color filter is obtained. The color of the pixels of the substrate is colored Analytical meter-45-201206987 MCPD2000 (manufactured by Otsuka Electronics Co., Ltd.) was measured and evaluated according to the following criteria. The color filter substrate obtained by the above method was attached to the glass substrate in the same manner as described above. The color difference (ΔΕ) of the glass substrate of the color device is "〇" when the respective portions of the red, green, and blue color portions are less than 5, and any one of the red, green, and blue portions is 5 or more. The appearance of the switch element substrate obtained by the following examples and comparative examples was visually observed for the appearance of the "x" (9) switch element substrate. [Example 1] A component (A) was added to a 3 L four-necked flask: 2,6-difluorobenzonitrile (hereinafter also referred to as "DFBN") 35.12 g (0.253 mol), and (B) component: 9,9-bis(4-hydroxyphenyl)fluorene (hereinafter also referred to as "BPFLj" 70.08g (0-200mol), and resorcinol (hereinafter also referred to as "RES") 5.51g (0.050mol), potassium carbonate 41.46g (0.300mol), N,N-dimethylacetamide (hereinafter also It is called "DMAc") 443g and toluene lllg. Thereafter, a four-necked flask is equipped with a thermometer, a stirrer, a three-way valve with a nitrogen introduction tube, and Dean-Sta. The rk tube and the cooling tube. Next, after the flask was replaced with nitrogen, the resulting solution was reacted at 40 ° C for 3 hours, and the generated water was removed from the Dean-Stark tube at any time until no water formation was observed. The temperature was gradually raised to 1 60 ° C, and directly reacted at this temperature for 6 hours. After cooling to room temperature (25), the resulting salt was removed by filter paper, and the -46-201206987 filtrate was put into methanol. It is reprecipitated, and the filtrate (residue) is separated by filtration separation. The obtained filtrate was vacuum dried at 60 ° C overnight to obtain a white powder (polymer) (yield: 95.67 g, yield: 95%). The physical properties of the obtained polymer are shown in Table 1. The structural analysis and weight average molecular weight of the obtained polymer were measured. As a result, the absorption characteristics of the infrared absorption spectrum were SiUScnr^CH stretching, 1 574 CHT1, 1 499 CHT1 (absorption of the aromatic ring skeleton), 1 240 (:11^(-0-), and the weight average molecular weight was 1 30,000. The obtained polymer was redissolved in DM Ac to obtain a polymer composition having a polymer concentration of 20% by mass. The polymer was coated by doctor blade coating on a substrate composed of polyethylene terephthalate (PET). The composition was dried at 70 ° C for 30 minutes, and then dried at 100 ° C for 30 minutes to form a film, which was then peeled off from the PET substrate. Thereafter, the film was fixed on a gold type and dried at 23 ° C. In the hour, a film (substrate) for evaluation having a film thickness of 30 μm was obtained. The physical properties of the obtained film for evaluation are shown in Table 1. Further, using a sputtering apparatus, it was 30 ° C and 5 minutes in an argon atmosphere. Under the film condition, a transparent conductive film was formed on one surface of the obtained evaluation film. Further, ITO was used as the standard palladium material, and the specific resistance 値 of the obtained transparent conductive film was 2χ10·4 (Ω·cm). The obtained evaluation film was sputtered at 230 ° C. A chromium film having a thickness of 300 nm is formed into a film, and then etched to form a gate electrode having a predetermined shape. Secondly, a thickness of 300 nm is formed by a plasma CVD method at 230 ° C on the surface on which the gate electrode is formed. 47 - 201206987 The tantalum nitride film is used as a gate insulating film. Thereafter, on the surface of the film on which the gate insulating film is formed, the thickness of the film is 120 nm by the plasma CVD method at 23 ° C. A high-resistance amorphous germanium film is formed on the film, and a low-resistance amorphous germanium film having a thickness of 3 Onm is formed thereon. Secondly, a dry film is obtained by dry etching the obtained low-resistance amorphous germanium film to obtain a predetermined shape. Then, a chromium film having a thickness of 40 nm is formed on the surface of the film on which the tantalum film is formed by sputtering at a temperature of 23 ° C, and then etching is performed to form a source electrode and a drain electrode. Second, by dry type Etching, removing the low-resistance amorphous germanium film between the source electrode and the drain electrode. Secondly, a 500 nm-thick tantalum nitride film is formed by plasma CVD on the surface of the thin film forming the active electrode and the drain electrode. After that, the dry shape is used to form a predetermined shape. Film (Insulating Film) Through the above steps, a switching element substrate in which an amorphous germanium thin film transistor element is formed on the film for evaluation is obtained. When the appearance of the substrate of the obtained switching element substrate is visually observed, there is no substrate. The deformation was as colorless and transparent. [Example 2] The same procedure as in Example 1 was carried out except that 11.41 g (0.050 mol) of 2,2-bis(4-hydroxyphenyl)propane was used instead of RES. The physical properties of the polymer, the evaluation film, the transparent conductive film, the color filter substrate, and the switching element substrate are shown in Table 1. [Example 3] -48-201206987 In addition to substituting BPFL 70.08g and RES 5.51g as component (B), 8?卩1^78.84§(0.2251«〇1) and 2,2-bis(4-hydroxyl group were used instead. The same procedure as in Example 1 was carried out except that phenyl)-1,1,1,3,3,3-hexafluoropropane 8.418 (0.025111〇1). Further, the physical properties of the obtained polymer, evaluation film, transparent conductive film, color filter substrate, and switching element substrate are shown in Table 1. [Example 4] Except that 9,9-bis(3-phenyl-4-hydroxyphenyl)indole 25. 25.65 g (0.250 mol) was used instead of BPFL70.08g and RES5.51 as the component (B). This was carried out in the same manner as in Example 1. The physical properties of the obtained polymer, evaluation film, transparent conductive film, color filter substrate, and switching element substrate are shown in Table 1. [Example 5] The same procedure as in Example 1 was carried out, except that BPFL 70.08 g and RES 5.51 g as the component (B) were used instead of BPFL 87.60 g (0.2 50 mol). The physical properties of the obtained polymer, evaluation film, transparent conductive film, color filter substrate, and switching element substrate are shown in Table 1. [Example 6] BPFL7 8.84 g (0.225 mol) and 1,1 bis(4-phenylphenyl)cyclohexane 6-71 g (0.025) were used instead of BPFL70.08g and RES5.51g as the component (B). The same procedure as in Example 1 was carried out except for mol. The physical properties of the obtained -49-201206987 polymer, evaluation film, transparent conductive film, color filter substrate, and switching element substrate are shown in Table 1. [Example 7] Example 5 was carried out except that DFBN 28.10 g (0.202 mol) and 4,4-difluorobenzophenone 11.02 g (0.051 mol) were used instead of DFBN 35.12 g as the component (A). The same goes on. The physical properties of the obtained polymer, the evaluation film, the transparent conductive film, the color filter substrate, and the switching element substrate are shown in Table 1. [Example 8] The same procedure as in Example 7 was carried out except that the amount of the component (A) was changed to DFBN 17.56 g (0.126 mol) and 4,4-difluorobenzophenone 27.55 g (0.126 mol). The physical properties of the obtained polymer, evaluation film, transparent conductive film, color filter substrate, and switching element substrate are shown in Table 1. [Example 9] The same procedure as in Example 5 was carried out except that 4,4-difluorobiphenyl fluorene (63 568 ) 3) 63.568 (0.25 0111 〇 1) was used as the component (A). The physical properties of the obtained polymer, the evaluation film, the transparent conductive film, the color filter substrate, and the switching element substrate are shown in Table 1. [Comparative Example 1] 2,2-bis(4-hydroxyphenyl)-1,1,1,3,3 was used for -50 to 201206987 except for substituting BPFL70.08g and RES5.51g as component (B). A polymer and a film for evaluation were obtained in the same manner as in Example 1 except that 3-hexafluoropropane 84 and oxime 68 (0.250 mol) were used. The physical properties of the obtained polymer and the film for evaluation are shown in Table 。. Further, a transparent film was formed on one surface of the obtained evaluation film under a argon atmosphere under a film forming condition of 50 ° C and 5 ° in a argon atmosphere.尙, the standard palladium material is ITO. The specific resistance 値 of the obtained transparent conductive film was 5 χ 1 (Γ 3 (Ω·cm). Further, when the film formation temperature was set to 23 ° C in the same manner as in Example 1, the film was not deformed by the film. In addition, the evaluation of the color filter substrate was impossible because the film was deformed or melted during the formation of the colored portion. Further, the obtained evaluation film was used to form an amorphous sand film in the same manner as in the first embodiment. In the case of the crystal element, the switching element substrate could not be produced due to the deformation of the film. [Comparative Example 2] A film of polyethylene naphthalate manufactured by Teijin Co., Ltd.: Neotex, and evaluation was carried out in the same manner as in Example 1 (film) The thickness of the film for evaluation was as shown in Table 1. Further, a transparent conductive film was formed on one surface of the above-mentioned evaluation film under a film forming condition of 150 ° C and 5 minutes in an argon atmosphere using a sputtering apparatus.膜, the standard palladium material is IT0. The specific conductive 値 of the obtained transparent conductive film is 7χ10·3 (Ω·cm). Moreover, the film formation temperature is set to be the same as in the examples 1 - 51 - 201206987. At 230 ° C, due to film deformation The uniform transparent conductive film was not formed. The evaluation of the color filter substrate was impossible because the film was deformed or melted during the formation of the colored portion. Further, the obtained evaluation film was used to form amorphous as in the first embodiment.矽 Thin film transistor element, but the switching element substrate could not be manufactured due to film deformation. [Comparative Example 3] 2,2_double [4] was added to a 300-neck four-necked flask equipped with a thermometer, a stirrer, a nitrogen introduction tube, and a cooling tube. -(4-Aminophenoxy)phenyl]propane 9.70 g (23.6 mmol). Next, after replacing the flask with nitrogen, N-methyl-2-pyrrolidone (NMP) (60 ml) was added. The mixture was stirred until homogeneous. 5.30 g (23.6 mmol) of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride was added to the obtained solution at room temperature, and the mixture was directly stirred at this temperature for 12 hours to cause a reaction. A solution containing polylysine. After the obtained polyglycine-containing solution was added to NMP (75 ml) and diluted, pyridine (7.5 ml) and anhydrous acetic acid (6.7 ml) were added, and the mixture was stirred at 110 ° C for 6 hours to carry out hydrazine. Imine. After cooling to room temperature, a large amount of methanol is injected by filtration. The filtered product was separated, and the obtained filtrate was dried under vacuum at 60 ° C overnight to obtain a white powder (polymer) (yield: 13.5 g, yield: 95.3%). The product was redissolved in DMAc to obtain a 20% by mass polymer solution. The polymer solution was coated on a substrate composed of PET using a doctor blade-52-201206987 coating (100 μm interval), followed by 150 After drying at 60 °C for 60 minutes, the film was peeled off. Thereafter, the film was further dried at 3 50 ° C to a thickness of 30 μm of the evaluation film. This was carried out in the same manner as in Example 1 using this evaluation month. Further, the obtained polymerized shirt transparent conductive film, color filter substrate, and switch unit are shown in Table 1. i After drying the film at 100 ° C, the film is obtained from the PET base, and the film is obtained, and the film is evaluated, and the physical properties of the substrate are: -53-201206987 !& rrrt S 4 4 £ : . p 5: i 1箬Bt* fit» : mm Μ SS «3 4& mmmmp 1 · block i &lt;a] 暴瓶1« i 1 1震养盟鉴ii 1 &gt; vs, &gt; f 8 & C mm. &gt; ο ο ο 〇O 〇o 〇. 1 X 义 s? 1 灵 II .t -t' XXX ι ra cm 1111 XXXX ea οα •t 9C X ea «η 1 Ts XX r— 〇nj want I &gt; EB Household Order CO &lt; 3 3 S : 60 e co ,; 0) «·! Qiao r* 〇 4 Sa 33 —:珐:_ im E弓§ a; κ. J 3&gt; co t- σ&gt; 3 3 3 5 5 § Stupid:! · 1 1 · &lt; Mill § •芸m sleeve · i 运马月: a co ^ u&gt; ^ «R «» «R e co •^: CO c? *R Series II ss 〇&gt; CO CQ c OO OO CO o &gt; CO CO 133 o CO c〇〇〇S3 &amp; S ii ss S S ΐ t u&gt; «〇«〇a ea cs fi〇£3 S 理i发co co «〇cc &gt; cd r*&gt; r- co r— 〇〇» 09 I li Is j &amp; frfr S Ϊ铨培 This £g S s s 1 1 3 TM 5 3 P ! »- SS 5 a 丽mm ;? S «&gt; S S3 u? So work knot 5 ^ m ii 1莒^ as » s S % ii E s S g S to kc> ir> 苕窖 § s , 莩 E g 〇 ▼» O 筠 G筠 S3 r*4 SS &gt;»— *〇1 θ J ZE · ce eo eo 3 2 3 5 1 s 53⁄4 g C^ cw 1 1 JE i i. t i. Write sc | . 1 S 5f II 1 1 J ei Eo ill 811 it • 1 &gt; burying e&gt;j eo to make ms s * * * nw* mc〇e;. c .. broadcast «典:倾1 s certificate 1 M CO ssii -54- 201206987 by the above As a result, it was found that the substrate used in the present invention is excellent in balance in light transmittance, heat resistance, heat resistance, and mechanical strength. In addition, since the base material is excellent in heat resistance, a method of forming a transparent conductive film, a colored portion, and a member such as a switching element is formed on at least one surface thereof, and the formation conditions are not limited, so that a transparent conductive film having a small surface resistance can be formed. The film has a composite of a color filter substrate or the like having a chromaticity of an excellent pixel similar to that of a color filter substrate using a glass substrate. Therefore, the composite of the present invention can suitably use a touch panel or a display device. -55-

Claims (1)

201206987 VII. Application for patents 1. A composite having a glass transition temperature (Tg) measured by differential scanning calorimetry (DSC, heating rate 20 ° C / min) is 2 3 0 to 3 5 The base material of the aromatic polyether polymer of 0 ° C and at least one member selected from the group consisting of a transparent conductive film, a colored portion, and a switching element formed on at least one surface of the substrate. 2. The composite according to claim 1, wherein the aromatic polyether-based polymer has at least one selected from the group consisting of a structural unit represented by the following formula (1) and a structural unit represented by the following formula (2); a structural unit (i); [chemical 1] In the formula (1), R1 to R4 each independently represent a monovalent organic group having a carbon number of 1 to 12, and a to d each independently represent an integer of 0 to 4; (2) In the formula (2), 'RLR4 and a to d are each unique and the same meaning as R1 to R4 and a~d in the formula (1) 'γ denotes a single bond, _S〇2- or > ;c=〇' R7 and R8 each independently represent a halogen atom, a carbon number of 1 to 12 is -56-201206987 machine base or nitro group, g and h each independently represent an integer of 0 to 4, m represents 0 or 1; However, when m is 0, R7 is not a cyano group. 3. The composite according to claim 1 or 2, wherein the aromatic polyether polymer further has a structural unit selected from the structural unit represented by the following formula (3) and the structural unit represented by the following formula (4). At least one structural unit of the group [化3] In the formula (3), R5 and R6 each independently represent a monovalent organic group having a carbon number of 1 to 12, and Z represents a single bond, -0-, -3-, -302-, &gt; €=0, - CONH-, -COO- or a two-valent organic group having a carbon number of 1 to 12, and e and f each independently represent an integer of 〇~4, and η represents 0 or 1. In the formula (4), R7, R8, Y, m, g and h are each independently equivalent to R7, R8, Y, m, g and h in the above formula (2), and R5, R6, Z, n, Each of e and f is independently the same as R5, R6, Z, n, e and f in the above formula (3). 4. The composite according to claim 3, wherein in the above aromatic polyether-57-201206987 polymer, the molar ratio of the above structural unit (i) to the above structural unit (π) is 50: 50-100: The compound according to any one of claims 1 to 4, wherein the aromatic polyether polymer has a weight average in terms of polystyrene measured by gel permeation chromatography (GPC). The molecular weight is 5,000 to 500,000. 6. The composite according to any one of claims 1 to 5, wherein the substrate has a total light scale transmittance of 85% or more as measured by a JIS K7105 transparency test method at a thickness of 30 μm. 7. The composite according to any one of claims 1 to 6, wherein the substrate has a ΥΙ値 (yellow index) of 3.0 or less at a thickness of 30 μm. 8. The composite according to any one of claims 1 to 7, wherein the substrate has a phase difference (Rth) in the thickness direction at a thickness of 30 μm of 2 〇〇 nm or less. 9. The composite according to any one of claims 1 to 8, wherein the member is a transparent conductive film' and at least one side of the substrate or the transparent conductive film is provided with a polarizing plate. 10. A display device' which comprises a composite according to any one of claims 9. A touch panel comprising the composite according to any one of claims 1 to 9. -58- 201206987 IV. Designated representative circle: (1) The representative representative of the case is: No (2) The symbol of the representative figure is simple: No 201206987 If there is a chemical formula in the case, please disclose the chemical formula that best shows the characteristics of the invention. ·no