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TWI529425B - An optical filter and an image pickup device including the filter - Google Patents

An optical filter and an image pickup device including the filter Download PDF

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Publication number
TWI529425B
TWI529425B TW100127224A TW100127224A TWI529425B TW I529425 B TWI529425 B TW I529425B TW 100127224 A TW100127224 A TW 100127224A TW 100127224 A TW100127224 A TW 100127224A TW I529425 B TWI529425 B TW I529425B
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substrate
group
carbon atoms
structural unit
formula
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TW100127224A
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TW201219854A (en
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Motoki Okaniwa
Takaaki Uno
Shintarou Fujitomi
Takashi Okada
Toshihiro Ootsuki
Katsuya Nagaya
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Jsr Corp
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/28Interference filters
    • G02B5/285Interference filters comprising deposited thin solid films
    • G02B5/287Interference filters comprising deposited thin solid films comprising at least one layer of organic material
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B17/00Details of cameras or camera bodies; Accessories therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polarising Elements (AREA)
  • Polyethers (AREA)
  • Laminated Bodies (AREA)

Description

光學濾光片及含有該濾光片之攝像裝置Optical filter and imaging device containing the same

本發明係關於光學濾光片及含有該濾光片之攝像裝置。The present invention relates to an optical filter and an image pickup apparatus including the same.

以往,攝影機、數位相機、附照相功能之行動電話等為了防止視覺感度修正或解像力下降而使用光學濾光片。In the past, optical filters have been used to prevent visual sensitivity correction or resolution of a camera, a digital camera, a mobile phone with a camera function, and the like.

例如,攝影機、數位相機、附照相功能之行動電話等均使用彩色-畫像之固體攝像元件的CCD或CMOS影像感應器,但該等固體攝像元件由於其受光部中使用對近紅外線具有感度之矽光二極體,故有進行視覺感度修正之必要,且大多使用近紅外線彩色濾光片。For example, a camera, a digital camera, a mobile phone with a camera function, and the like use a CCD or CMOS image sensor of a solid-state image sensor of a color-image, but these solid-state image sensors have sensitivity to near-infrared rays in the light-receiving portion. Since the photodiode is necessary for visual sensitivity correction, most of the near-infrared color filters are used.

又,攝影機、數位相機、附照相功能之行動電話等之透鏡光學系統內使用之光圈裝置或兼用作光圈裝置之快門裝置等之光量調整裝置中,為了防止因捕捉(hunting)或繞射現象造成之解像力降低,而使用ND濾光片等之光學濾光片。Further, in a light amount adjusting device such as a lens device used in a lens optical system such as a camera, a digital camera, or a camera with a camera function, or a shutter device that also functions as a diaphragm device, in order to prevent hunting or diffraction The resolution of the image is reduced, and an optical filter such as an ND filter is used.

至於該等光學濾光片之基材的原料已知有PET(聚對苯二甲酸乙二酯)或PEN(聚萘二甲酸乙二酯)及降冰片烯系樹脂材料(專利文獻1)。然而,該等樹脂材料之玻璃轉移溫度低如70~180℃而有耐熱性不足之情況。As a raw material of the substrate of the optical filters, PET (polyethylene terephthalate) or PEN (polyethylene naphthalate) and a norbornene-based resin material are known (Patent Document 1). However, the glass transition temperature of the resin materials is as low as 70 to 180 ° C and there is insufficient heat resistance.

另外,專利文獻2中,記載以具有茀骨架之聚碳酸酯樹脂、及具有紅外線吸收能之色素構成之紅外線吸收濾光片。Further, Patent Document 2 describes an infrared absorption filter comprising a polycarbonate resin having an anthracene skeleton and a dye having infrared absorption energy.

[先前技術文獻][Previous Technical Literature] [專利文獻][Patent Literature]

[專利文獻1]特開2005-338395號公報[Patent Document 1] JP-A-2005-338395

[專利文獻2]特開2006-119383號公報[Patent Document 2] JP-A-2006-119383

本發明之目的係提供一種光透射性、耐熱性、耐熱著色性及力學強度優異之光學濾光片。An object of the present invention is to provide an optical filter excellent in light transmittance, heat resistance, heat resistant coloring property, and mechanical strength.

本發明人為解決上述課題而積極檢討之結果,發現若利用具有含有具有特定玻璃轉移溫度之芳香族聚醚系聚合物之基材與介電體多層膜之光學濾光片,即可解決前述課題,且耐熱著色性優異,因而完成本發明。As a result of the active review of the above problems, the present inventors have found that the above-mentioned problem can be solved by using an optical filter having a substrate and a dielectric multilayer film containing an aromatic polyether polymer having a specific glass transition temperature. Further, the heat-resistant coloring property is excellent, and thus the present invention has been completed.

亦即,本發明係提供以下之[1]~[9]者。That is, the present invention provides the following [1] to [9].

[1] 一種光學濾光片,其為具有基材、及形成於該基材之至少一面上之介電體多層膜之光學濾光片,該基材包含以示差掃描熱量測定(DSC,升溫速度20℃/分鐘)所得之玻璃轉移溫度(Tg)為230~350℃之芳香族聚醚系聚合物。[1] An optical filter comprising an optical filter having a substrate and a dielectric multilayer film formed on at least one side of the substrate, the substrate comprising a differential scanning calorimetry (DSC, temperature rise) The obtained glass transition temperature (Tg) at a rate of 20 ° C /min) is an aromatic polyether polymer of 230 to 350 ° C.

[2] 如[1]所記載之光學濾光片,其中前述芳香族聚醚系聚合物具有由以下述式(1)表示之構造單位及以下述式(2)表示之構造單位所組成群組選出之至少一種構造單位(i),[2] The optical filter according to [1], wherein the aromatic polyether polymer has a structural unit represented by the following formula (1) and a structural unit represented by the following formula (2) At least one structural unit (i) selected by the group,

【化1】【化1】

(式(1)中,R1~R4各獨立表示碳數1~12之一價有機基,a~d各獨立表示0~4之整數),(In the formula (1), R 1 to R 4 each independently represent a one-valent organic group having 1 to 12 carbon atoms, and a to d each independently represent an integer of 0 to 4),

【化2】[Chemical 2]

(式(2)中,R1~R4及a~d各獨立與前述式(1)中之R1~R4及a~d同義,Y表示單鍵、-SO2-或>C=O,R7及R8各獨立表示鹵素原子、碳數1~12之一價有機基或硝基,g及h各獨立表示0~4之整數,m表示0或1,但,m為0時,R7不為氰基)。(In the formula (2), R 1 ~ R 4 each independently and a ~ d of the formula (R 1) in the 1 ~ R 4 and a ~ d synonymous, Y represents a single bond, -SO 2 - or> C = O, R 7 and R 8 each independently represent a halogen atom, a carbon number of 1 to 12, an organic group or a nitro group, and g and h each independently represent an integer of 0 to 4, and m represents 0 or 1, but m is 0. When R 7 is not a cyano group).

[3] 如[1]或[2]所記載之光學濾光片,其中前述芳香族聚醚系聚合物進而具有由以下述式(3)表示之構造單位及以下述式(4)表示之構造單位所組成群組選出之至少一種構造單位(ii),[3] The optical filter according to the above [1], wherein the aromatic polyether polymer further has a structural unit represented by the following formula (3) and is represented by the following formula (4). At least one structural unit selected from the group consisting of structural units (ii),

【化3】[化3]

(式(3)中,R5及R6各獨立表示碳數1~12之一價有機基,Z表示單鍵、-O-、-S-、-SO2-、>C=O、-CONH-、-COO-或碳數1~12之二價有機基,e及f各獨立表示0~4之整數,n表示0或1),(In the formula (3), R 5 and R 6 each independently represent a one-valent organic group having 1 to 12 carbon atoms, and Z represents a single bond, -O-, -S-, -SO 2 -, >C=O, - CONH-, -COO- or a divalent organic group having a carbon number of 1 to 12, and e and f each independently represent an integer of 0 to 4, and n represents 0 or 1),

【化4】【化4】

(式(4)中,R7、R8、Y、m、g及h各獨立與前述式(2)中之R7、R8、Y、m、g及h同義,R5、R6、Z、n、e及f各獨立與前述式(3)中之R5、R6、Z、n、e及f同義)。(Formula (4), R 7, R 8, Y , m, g and h are each independently of the formula (R 2) in the 7, R 8, Y, m , g and h are synonymous, R 5, R 6 , Z, n, e, and f are each independently synonymous with R 5 , R 6 , Z, n, e, and f in the above formula (3).

[4] 如[3]所記載之光學濾光片,其中前述芳香族聚醚系聚合物中,上述構造單位(i)與上述構造單位(ii)之莫耳比為50:50~100:0。[4] The optical filter according to [3], wherein the aromatic polyether polymer has a molar ratio of the structural unit (i) to the structural unit (ii) of 50:50 to 100: 0.

[5] 如[1]~[4]中任一項所記載之光學濾光片,其中前述芳香族聚醚系聚合物之以凝膠滲透層析儀(GPC)測定之聚苯乙烯換算之重量平均分子量為5,000~500,000。[5] The optical filter according to any one of [1] to [4] wherein the aromatic polyether polymer is converted into polystyrene by a gel permeation chromatography (GPC). The weight average molecular weight is 5,000 to 500,000.

[6] 如[1]~[5]中任一項所記載之光學濾光片,其中前述基材於厚度30μm之以JIS K7105透明度試驗法測定之全光線透射率為85%以上。[6] The optical filter according to any one of [1] to [5] wherein the substrate has a total light transmittance of 85% or more as measured by a JIS K7105 transparency test method at a thickness of 30 μm.

[7] 如[1]~[6]中任一項所記載之光學濾光片,其中前述基材於厚度30μm之YI值(黃化指數)為3.0以下。[7] The optical filter according to any one of [1], wherein the substrate has a YI value (yellowing index) of a thickness of 30 μm of 3.0 or less.

[8] 如[1]~[7]中任一項所記載之光學濾光片,其中前述基材於厚度30μm之厚度方向之相位差(Rth)為200nm以下。[8] The optical filter according to any one of [1], wherein the substrate has a phase difference (Rth) of 200 nm or less in a thickness direction of a thickness of 30 μm.

[9] 一種攝像裝置,包含如[1]~[8]中任一項所記載之光學濾光片。[9] An image pickup device comprising the optical filter according to any one of [1] to [8].

本發明之光學濾光片具有優異之光透射性、耐熱性、耐熱著色性及力學強度,且厚度方向之相位差小。因此,本發明之濾光片可適用於攝像裝置中。The optical filter of the present invention has excellent light transmittance, heat resistance, heat resistance coloring property, and mechanical strength, and has a small phase difference in the thickness direction. Therefore, the filter of the present invention can be applied to an image pickup apparatus.

〈光學濾光片〉<Optical Filter>

本發明之光學濾光片為具有基材、及形成於該基材之至少一面上之介電體多層膜,該基材包含以示差掃描熱量測定(DSC,升溫速度20℃/分鐘)所得之玻璃轉移溫度(Tg)為230~350℃之芳香族聚醚系聚合物。The optical filter of the present invention comprises a substrate and a dielectric multilayer film formed on at least one side of the substrate, wherein the substrate comprises a differential scanning calorimetry (DSC, temperature increase rate of 20 ° C / min). An aromatic polyether polymer having a glass transition temperature (Tg) of 230 to 350 °C.

本發明之光學濾光片之光透射性、耐熱性、耐熱著色性及力學強度優異,且厚度方向之相位差小。因此,本發明之光學濾光片可適合使用於攝像裝置。The optical filter of the present invention is excellent in light transmittance, heat resistance, heat resistance coloring property, and mechanical strength, and has a small phase difference in the thickness direction. Therefore, the optical filter of the present invention can be suitably used for an image pickup apparatus.

又,本發明之光學濾光片尤其於吸收強光時,因其光之吸收導致之濾光片之溫度上升造成之損傷或光學特性之劣化亦較少。Further, in the case where the optical filter of the present invention absorbs strong light, damage due to an increase in temperature of the filter due to absorption of light or deterioration of optical characteristics is also less.

又,本發明中,所謂「耐熱著色性」意指在曝露於高溫時之耐著色性優異,例如,在大氣中、高溫(230℃)下熱處理1小時左右時難以著色。In the present invention, the term "heat-resistant coloring property" means that the coloring resistance is excellent when exposed to a high temperature, and it is difficult to color, for example, when heat-treated in the air at a high temperature (230 ° C) for about 1 hour.

〈基材〉<Substrate> [芳香族聚醚聚合物][Aromatic Polyether Polymer]

前述芳香族聚醚系聚合物之玻璃轉移溫度較好為240~330℃,更好為250~300℃。The glass transition temperature of the aromatic polyether polymer is preferably from 240 to 330 ° C, more preferably from 250 to 300 ° C.

含有該種芳香族聚醚系聚合物之基材由於光透射性、耐熱性、耐熱著色性及力學強度均衡良好而優異,故適用於光學濾光片中。又,由於可在高溫下進行於該基材之至少一面上形成介電體多層膜時之加熱或熱處理,故可獲得光學特性優異之光學濾光片。The base material containing such an aromatic polyether polymer is excellent in light transmittance, heat resistance, heat resistance coloring property, and mechanical strength, and is therefore suitable for use in an optical filter. Further, since heating or heat treatment can be performed at the time of forming a dielectric multilayer film on at least one surface of the substrate at a high temperature, an optical filter excellent in optical characteristics can be obtained.

前述芳香族聚醚系聚合物係藉由於主鏈上形成醚鍵之反應獲得之聚合物,較好為具有由以下述式(1)表示之構造單位(以下亦稱為「構造單位(1)」)及以下述式(2)表示之構造單位(以下亦稱為「構造單位(2)」)所組成群組選出之至少一種構造單位(i)之聚合物。藉由使聚合物具有構造單位(i),可獲得玻璃轉移溫度為230~350℃之芳香族聚醚。含有該種聚合物之基材在光學濾光片之製造時及長期使用環境下可維持無色透明性。The aromatic polyether polymer is a polymer obtained by a reaction of forming an ether bond in a main chain, and preferably has a structural unit represented by the following formula (1) (hereinafter also referred to as "structural unit (1)) And a polymer of at least one structural unit (i) selected from the group consisting of structural units (hereinafter also referred to as "structural unit (2)") represented by the following formula (2). By having the polymer having the structural unit (i), an aromatic polyether having a glass transition temperature of 230 to 350 ° C can be obtained. The substrate containing the polymer maintains colorless transparency at the time of manufacture of the optical filter and in a long-term use environment.

【化5】【化5】

前述式(1)中,R1~R4各獨立表示碳數1~12之一價有機基,a~d各獨立表示0~4之整數,較好為0或1,更好為0。In the above formula (1), R 1 to R 4 each independently represent a one-valent organic group having 1 to 12 carbon atoms, and a to d each independently represent an integer of 0 to 4, preferably 0 or 1, more preferably 0.

碳數1~12之一價有機基可列舉為碳數1~12之一價烴基、及含有由氧原子及氮原子組成群組選出之至少一種原子之碳數1~12之一價有機基等。The one-valent organic group having 1 to 12 carbon atoms may be a one-valent hydrocarbon group having 1 to 12 carbon atoms, and a carbon number of 1 to 12 having at least one atom selected from the group consisting of oxygen atoms and nitrogen atoms. Wait.

至於碳數1~12之一價烴基列舉為碳數1~12之直鏈或分支鏈之烴基、碳數3~12之脂環式烴基及碳數6~12之芳香族烴基等。The one-valent hydrocarbon group having 1 to 12 carbon atoms is exemplified by a linear or branched hydrocarbon group having 1 to 12 carbon atoms, an alicyclic hydrocarbon group having 3 to 12 carbon atoms, and an aromatic hydrocarbon group having 6 to 12 carbon atoms.

前述碳數1~12之直鏈或分支鏈之烴基較好為碳數1~8之直鏈或分支鏈之烴基,更好為碳數1~5之直鏈或分支鏈之烴基。The hydrocarbon group of the linear or branched chain having 1 to 12 carbon atoms is preferably a linear or branched hydrocarbon group having 1 to 8 carbon atoms, more preferably a linear or branched hydrocarbon group having 1 to 5 carbon atoms.

前述直鏈或分支鏈之烴基之較佳具體例列舉為甲基、乙基、正丙基、異丙基、正丁基、第二丁基、第三丁基、正戊基、正己基及正庚基等。Preferred specific examples of the straight or branched hydrocarbon group are methyl, ethyl, n-propyl, isopropyl, n-butyl, t-butyl, t-butyl, n-pentyl, n-hexyl and Positive heptyl and so on.

前述碳數3~12之脂環式烴基較好為碳數3~8之脂環式烴基,更好為碳數3或4之脂環式烴基。The alicyclic hydrocarbon group having 3 to 12 carbon atoms is preferably an alicyclic hydrocarbon group having 3 to 8 carbon atoms, more preferably an alicyclic hydrocarbon group having 3 or 4 carbon atoms.

碳數3~12之脂環式烴基之較佳具體例列舉為環丙基、環丁基、環戊基及環己基等環烷基;環丁烯基、環戊烯基及環己烯基等之環烯基。該脂環式烴基之鍵結部位可為脂環上之任一個碳。Preferred specific examples of the alicyclic hydrocarbon group having 3 to 12 carbon atoms are exemplified by cycloalkyl groups such as cyclopropyl, cyclobutyl, cyclopentyl and cyclohexyl; cyclobutenyl, cyclopentenyl and cyclohexenyl; A cycloalkenyl group. The bonding site of the alicyclic hydrocarbon group may be any carbon on the alicyclic ring.

前述碳數6~12之芳香族烴基列舉為苯基、聯苯基及萘基等。該芳香族烴基之鍵結部位可為芳香族環上之任一個碳。The aromatic hydrocarbon group having 6 to 12 carbon atoms is exemplified by a phenyl group, a biphenyl group, a naphthyl group and the like. The bonding site of the aromatic hydrocarbon group may be any carbon on the aromatic ring.

含有氧原子之碳數1~12之有機基列舉為由氫原子、碳原子及氧原子所成之有機基,其中可列舉較佳者為由醚鍵、羰基及酯鍵及烴基所組成之總碳數1~12之有機基等。The organic group having 1 to 12 carbon atoms containing an oxygen atom is exemplified by an organic group formed by a hydrogen atom, a carbon atom and an oxygen atom, and a total of an ether bond, a carbonyl group, an ester bond and a hydrocarbon group is preferred. An organic group having a carbon number of 1 to 12, and the like.

具有醚鍵之碳數1~12之有機基可列舉為碳數1~12之烷氧基、碳數2~12之烯氧基、碳數2~12之炔氧基、碳數6~12之芳氧基及碳數2~12之烷氧基烷基等。具體而言,列舉為甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、苯氧基、丙烯氧基、環己氧基及甲氧基甲基等。The organic group having a carbon number of 1 to 12 having an ether bond may, for example, be an alkoxy group having 1 to 12 carbon atoms, an alkenyloxy group having 2 to 12 carbon atoms, an alkoxy group having 2 to 12 carbon atoms, or a carbon number of 6 to 12 An aryloxy group and an alkoxyalkyl group having 2 to 12 carbon atoms. Specific examples thereof include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, a phenoxy group, a propyleneoxy group, a cyclohexyloxy group, and a methoxymethyl group.

又,具有羰基之總碳數1~12之有機基可列舉為碳數2~12之醯基。具體而言列舉為乙醯基、丙醯基、異丙醯基及苯甲醯基。Further, the organic group having a total carbon number of 1 to 12 of a carbonyl group may be exemplified by a fluorenyl group having 2 to 12 carbon atoms. Specifically, it is exemplified by an ethyl group, a propyl group, an isopropyl group, and a benzamidine group.

具有酯鍵之總碳數1~12之有機基列舉為碳數2~12之醯氧基等。具體而言,列舉為乙醯氧基、丙醯氧基、異丙醯氧基及苯甲醯氧基等。The organic group having a total carbon number of 1 to 12 having an ester bond is exemplified by a decyloxy group having 2 to 12 carbon atoms. Specifically, it is exemplified by an ethoxycarbonyl group, a propenyloxy group, a isopropyloxy group, a benzamidine group or the like.

含氮原子之碳數1~12之有機基列舉為由氫原子、碳原子及氮原子所成之有機基,具體而言列舉為氰基、咪唑基、三唑基、苯并咪唑基及苯并三唑基等。The organic group having 1 to 12 carbon atoms of the nitrogen atom is exemplified by an organic group formed by a hydrogen atom, a carbon atom and a nitrogen atom, and specifically exemplified by a cyano group, an imidazolyl group, a triazolyl group, a benzimidazolyl group and a benzene group. And triazolyl and the like.

含有氧原子及氮原子之碳數1~12之有機基列舉為由氫原子、碳原子、氧原子及氮原子所成之有機基,具體而言列舉為噁唑基、噁二唑基、苯并噁唑基及苯并噁二唑基等。The organic group having 1 to 12 carbon atoms containing an oxygen atom and a nitrogen atom is exemplified by an organic group formed by a hydrogen atom, a carbon atom, an oxygen atom and a nitrogen atom, and specifically exemplified by an oxazolyl group, an oxadiazolyl group, and a benzene group. And oxazolyl and benzooxadiazolyl and the like.

前述式(1)中之R1~R4較好為碳數1~12之一價烴基,更好為碳數6~12之芳香族烴基,又更好為苯基。R 1 to R 4 in the above formula (1) are preferably a hydrocarbon having 1 to 12 carbon atoms, more preferably an aromatic hydrocarbon group having 6 to 12 carbon atoms, more preferably a phenyl group.

【化6】【化6】

前述式(2)中,R1~R4及a~d各獨立與前述式(1)中之R1~R4及a~d同義,Y表示單鍵、-SO2-或>C=O,R7及R8各獨立表示鹵素原子、碳數1~12之一價有機基或硝基,m表示0或1,但,m為0時,R7不為氰基。g及h各獨立表示0~4之整數,較好為0。The formula (2), R 1 ~ R 4 each independently and a ~ d of the formula (1), the R 1 ~ R 4 and a ~ d synonymous, Y represents a single bond, -SO 2 - or> C = O, R 7 and R 8 each independently represent a halogen atom, a carbon number of 1 to 12, an organic group or a nitro group, and m represents 0 or 1. However, when m is 0, R 7 is not a cyano group. g and h each independently represent an integer of 0 to 4, preferably 0.

碳數1~12之一價有機基可列舉為與前述式(1)中之碳數1~12之一價有機基相同之有機基等。The one-valent organic group having 1 to 12 carbon atoms is exemplified by the same organic group as the one-valent organic group having 1 to 12 carbon atoms in the above formula (1).

前述聚合物之前述構造單位(1)與前述構造單位(2)之莫耳比(但,二者(構造單位(1)+構造單位(2))之合計為100)就光學特性、耐熱性及力學特性之觀點而言,較好構造單位(1):構造單位(2)=50:50~100:0,更好構造單位(1):構造單位(2)=70:30~100:0,又更好構造單位(1):構造單位(2)=80:20~100:0。The molar ratio of the aforementioned structural unit (1) to the structural unit (2) of the polymer (however, the total of the two (structural unit (1) + structural unit (2)) is 100), optical properties, heat resistance From the viewpoint of mechanical properties, the preferred structural unit (1): structural unit (2) = 50: 50 ~ 100: 0, better structural unit (1): structural unit (2) = 70: 30 ~ 100: 0, and better construction unit (1): construction unit (2) = 80:20~100:0.

此處,所謂力學特性意指聚合物之拉伸強度、斷裂伸長率及拉伸彈性率等之性質。Here, the mechanical property means a property such as tensile strength, elongation at break, and tensile modulus of the polymer.

又,前述聚合物亦可進而具有由以下述式(3)表示之構造單位,及以下述式(4)表示之構造單位所組成群組選出之至少一種構造單位(ii)。前述聚合物具有該構造單位(ii)時,可提高包含該聚合物之基材之力學特性故而較佳。Further, the polymer may further have at least one structural unit (ii) selected from the group consisting of the structural unit represented by the following formula (3) and the structural unit represented by the following formula (4). When the polymer has the structural unit (ii), the mechanical properties of the substrate containing the polymer can be improved, which is preferable.

【化7】【化7】

前述式(3)中,R5及R6各獨立表示碳數1~12之一價有機基,Z表示單鍵、-O-、-S-、-SO2-、>C=O、-CONH-、-COO-或碳數1~12之二價有機基,n表示0或1,e及f各獨立表示0~4之整數,較好為0。In the above formula (3), R 5 and R 6 each independently represent a one-valent organic group having 1 to 12 carbon atoms, and Z represents a single bond, -O-, -S-, -SO 2 -, >C=O, - CONH-, -COO- or a divalent organic group having 1 to 12 carbon atoms, n represents 0 or 1, and e and f each independently represent an integer of 0 to 4, preferably 0.

碳數1~12之一價有機基可列舉為與前述式(1)中之碳數1~12之一價有機基相同之有機基等。The one-valent organic group having 1 to 12 carbon atoms is exemplified by the same organic group as the one-valent organic group having 1 to 12 carbon atoms in the above formula (1).

碳數1~12之二價有機基可列舉為碳數1~12之二價烴基、碳數1~12之二價鹵化烴基、含有由氧原子及氮原子所組成群組選出之至少一種原子之碳數1~12之二價有機基、及含有由氧原子及氮原子所組成群組選出之至少一種原子之碳數1~12之二價鹵化有機基等。The divalent organic group having 1 to 12 carbon atoms may be a divalent hydrocarbon group having 1 to 12 carbon atoms, a divalent halogenated hydrocarbon group having 1 to 12 carbon atoms, or at least one atom selected from the group consisting of an oxygen atom and a nitrogen atom. The divalent organic group having 1 to 12 carbon atoms and the divalent halogenated organic group having 1 to 12 carbon atoms and at least one atom selected from the group consisting of an oxygen atom and a nitrogen atom.

碳數1~12之二價烴基列舉為碳數1~12之直鏈或分支鏈之二價烴基、碳數3~12之二價脂環式烴基及碳數6~12之二價芳香族烴基等。The divalent hydrocarbon group having 1 to 12 carbon atoms is exemplified by a linear or branched divalent hydrocarbon group having 1 to 12 carbon atoms, a divalent alicyclic hydrocarbon group having 3 to 12 carbon atoms, and a divalent aromatic hydrocarbon having 6 to 12 carbon atoms. Hydrocarbyl group and the like.

碳數1~12之直鏈或分支鏈之二價烴基列舉為亞甲基、伸乙基、三亞甲基、亞異丙基、五亞甲基、六亞甲基及七亞甲基等。The divalent hydrocarbon group of a straight or branched chain having 1 to 12 carbon atoms is exemplified by a methylene group, an ethylidene group, a trimethylene group, an isopropylidene group, a pentamethylene group, a hexamethylene group, and a heptamethylene group.

碳數3~12之二價脂環式烴基列舉為伸環丙基、伸環丁基、伸環戊基及伸環己基等伸環烷基;伸環丁烯基、伸環戊烯基及伸環己烯基等之伸環烯基等。該脂環式烴基之鍵結部位可為脂環上之任一個碳。The divalent alicyclic hydrocarbon group having 3 to 12 carbon atoms is exemplified by a cycloalkyl group such as a cyclopropyl group, a cyclobutene butyl group, a cyclopentylene group and a cyclohexylene group; a cyclobutenyl group and a cyclopentenyl group; A cycloalkenyl group such as a cyclohexene group. The bonding site of the alicyclic hydrocarbon group may be any carbon on the alicyclic ring.

碳數6~12之二價芳香族烴基列舉為伸苯基、伸萘基及伸聯苯基等。該芳香族烴基之鍵結部位可為芳香族環上之任一個碳。The divalent aromatic hydrocarbon group having 6 to 12 carbon atoms is exemplified by a stretching phenyl group, a stretching naphthyl group, and a stretching phenyl group. The bonding site of the aromatic hydrocarbon group may be any carbon on the aromatic ring.

碳數1~12之二價鹵化烴基列舉為碳數1~12之直鏈或分支鏈之二價鹵化烴基、碳數3~12之二價鹵化脂環式烴基及碳數6~12之二價鹵化芳香族烴基等。The divalent halogenated hydrocarbon group having 1 to 12 carbon atoms is exemplified by a divalent halogenated hydrocarbon group having a linear or branched chain of 1 to 12 carbon atoms, a divalent halogenated aliphatic hydrocarbon group having 3 to 12 carbon atoms, and a carbon number of 6 to 12 A halogenated aromatic hydrocarbon group or the like.

碳數1~12之直鏈或分支鏈之二價鹵化烴基列舉為二氟亞甲基、二氯亞甲基、四氟伸乙基、四氯伸乙基、六氟三伸甲基、六氯三伸甲基、六氟亞異丙基及六氯亞異丙基等。The divalent halogenated hydrocarbon group of a straight or branched chain having 1 to 12 carbon atoms is exemplified by difluoromethylene, dichloromethylene, tetrafluoroextension ethyl, tetrachloroexetylethyl, hexafluorotrimethyl, and hexa. Chlorotriazine methyl, hexafluoroisopropylidene and hexachloroisopropylidene.

碳數3~12之二價鹵化脂環式烴基列舉為前述碳數3~12之二價脂環式烴基中例示之基之至少一部分之氫原子經氟原子、氯原子、溴原子或碘原子取代而成之基等。The divalent halogenated alicyclic hydrocarbon group having 3 to 12 carbon atoms is exemplified by a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom of at least a part of the groups exemplified in the above-mentioned divalent alicyclic hydrocarbon group having 3 to 12 carbon atoms. Replace the base and so on.

碳數6~12之二價鹵化芳香族烴基列舉為前述碳數6~12之二價芳香族烴基中例示之基之至少一部分之氫原子經氟原子、氯原子、溴原子或碘原子取代而成之基等。The divalent halogenated aromatic hydrocarbon group having 6 to 12 carbon atoms is exemplified by a hydrogen atom of at least a part of the groups exemplified in the above-mentioned divalent aromatic hydrocarbon group having 6 to 12 carbon atoms, which is substituted by a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. Cheng Zhiji and so on.

含有由氧原子及氮原子所組成群組選出之至少一種原子之碳數1~12之有機基列舉為由氫原子及碳原子、與氧原子及/或氮原子所成之有機基,且列舉為具有醚鍵、羰基、酯鍵或醯胺鍵及烴基之碳數1~12之二價有機基等。The organic group having 1 to 12 carbon atoms of at least one atom selected from the group consisting of an oxygen atom and a nitrogen atom is exemplified by an organic group formed by a hydrogen atom and a carbon atom, and an oxygen atom and/or a nitrogen atom, and is exemplified. It is a divalent organic group having an ether bond, a carbonyl group, an ester bond or a guanamine bond, and a hydrocarbon group having 1 to 12 carbon atoms.

含有由氧原子及氮原子所組成群組選出之至少一種原子之碳數1~12之二價鹵化烴基具體而言列舉為含有由氧原子及氮原子所組成群組選出之至少一種原子之碳數1~12之二價有機基中例示之基之至少一部分之氫原子經氟原子、氯原子、溴原子或碘原子取代而成之基等。The divalent halogenated hydrocarbon group having 1 to 12 carbon atoms and containing at least one atom selected from the group consisting of an oxygen atom and a nitrogen atom is specifically exemplified as a carbon containing at least one atom selected from the group consisting of an oxygen atom and a nitrogen atom. A group in which at least a part of hydrogen atoms of the exemplified group in the divalent organic group of 1 to 12 are substituted with a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.

前述式(3)中之Z較好為單鍵、-O-、-SO2-、>C=O或碳數1~12之二價有機基,更好為碳數1~12之二價烴基或碳數1~12之二價鹵化烴基,至於碳數1~12之二價烴基較好為碳數1~12之直鏈或分支鏈之二價烴基或碳數3~12之二價脂環式烴基。Z in the above formula (3) is preferably a single bond, -O-, -SO 2 -, >C=O or a divalent organic group having 1 to 12 carbon atoms, more preferably a divalent carbon number of 1 to 12. a hydrocarbon group or a divalent halogenated hydrocarbon group having 1 to 12 carbon atoms; and the divalent hydrocarbon group having 1 to 12 carbon atoms is preferably a divalent hydrocarbon group having a linear or branched chain of 1 to 12 carbon atoms or a divalent hydrocarbon having a carbon number of 3 to 12 An alicyclic hydrocarbon group.

【化8】【化8】

式(4)中,R7、R8、Y、m、g及h各獨立與前述式(2)中之R7、R8、Y、m、g及h同義,R5、R6、Z、n、e及f各獨立與前述式(3)中之R5、R6、Z、n、e及f同義。又,m為0時,R7不為氰基。Formula (4), R 7, R 8, Y , m, g , and h (2) in the R each independently in the above formula 7, R 8, Y, m , g and h are synonymous, R 5, R 6, Z, n, e, and f are each independently synonymous with R 5 , R 6 , Z, n, e, and f in the above formula (3). Further, when m is 0, R 7 is not a cyano group.

前述聚合物之前述構造單位(i)與前述構造單位(ii)之莫耳比(但,二者((i)+(ii))之合計為100),就光學特性、耐熱性及力學特性之觀點而言,較好為(i):(ii)=50:50~100:0,更好為(i):(ii)=70:30~100:0,又更好為(i):(ii)=80:20~100:0。The molar ratio of the aforementioned structural unit (i) to the aforementioned structural unit (ii) (but the total of the two ((i) + (ii)) is 100), in terms of optical properties, heat resistance and mechanical properties From the viewpoint, it is preferably (i): (ii) = 50: 50 to 100: 0, more preferably (i): (ii) = 70: 30 to 100: 0, and more preferably (i) :(ii)=80:20~100:0.

前述聚合物就光學特性、耐熱性及力學特性之觀點而言,較好全部構造單位中之70莫耳%以上包含前述構造單位(i)及前述構造單位(ii),更好包含全部構造單位中之95莫耳%以上。From the viewpoints of optical properties, heat resistance and mechanical properties, the polymer preferably contains 70 mol% or more of all structural units including the structural unit (i) and the structural unit (ii), and more preferably all structural units. 95% of the total is more than 95%.

[聚合物之合成方法][Synthesis method of polymer]

前述聚合物可藉由例如使含有由以下述式(5)表示之化合物(以下亦稱為「化合物(5)」)及以下述式(7)表示之化合物(以下亦稱為「化合物(7)」)所組成群組選出之至少一種化合物之成分(A)與含有以下述式(6)表示之化合物之成分(B)反應而得。The polymer may be, for example, a compound represented by the following formula (5) (hereinafter also referred to as "compound (5)") and a compound represented by the following formula (7) (hereinafter also referred to as "compound (7)" The component (A) of at least one compound selected from the group consisting of reacting with the component (B) containing a compound represented by the following formula (6).

【化9】【化9】

前述式(5)中,X獨立表示鹵素原子,較好為氟原子。In the above formula (5), X independently represents a halogen atom, and is preferably a fluorine atom.

【化10】【化10】

前述式(7)中,R7、R8、Y、m、g及h各獨立與前述式(2)中之R7、R8、Y、m、g及h同義,X獨立與前述式(5)中之X同義。但,m為0時,R7不為氰基。In the formula (7), R 7, R 8, Y, m, g and h are each independently of the formula R (2) in the 7, R 8, Y, m , g and h are synonymous, X is independently of the formula (5) X is synonymous. However, when m is 0, R 7 is not a cyano group.

化11化11

前述式(6)中,Ra各獨立表示氫原子、甲基、乙基、乙醯基、甲烷磺醯基或三氟甲基磺醯基,其中以氫原子較佳。又,式(6)中,R1~R4及a~d分別與前述式(1)中之R1~R4及a~d同義。In the above formula (6), R a each independently represents a hydrogen atom, a methyl group, an ethyl group, an ethyl sulfonyl group, a methanesulfonyl group or a trifluoromethylsulfonyl group, and among them, a hydrogen atom is preferred. Further, in the formula (6), R 1 to R 4 and a to d are synonymous with R 1 to R 4 and a to d in the above formula (1), respectively.

至於上述化合物(5)具體而言可列舉為2,6-二氟苄腈、2,5-二氟苄腈、2,4-二氟苄腈、2,6-二氯苄腈、2,5-二氯苄腈、2,4-二氯苄腈及其等之反應性衍生物。尤其,就反應性及經濟性之觀點而言,以2,6-二氟苄腈及2,6-二氯苄腈較適用。該等化合物亦可組合兩種以上使用。Specific examples of the above compound (5) include 2,6-difluorobenzonitrile, 2,5-difluorobenzonitrile, 2,4-difluorobenzonitrile, 2,6-dichlorobenzonitrile, and 2, Reactive derivative of 5-dichlorobenzonitrile, 2,4-dichlorobenzonitrile and the like. In particular, 2,6-difluorobenzonitrile and 2,6-dichlorobenzonitrile are suitable from the viewpoint of reactivity and economy. These compounds may also be used in combination of two or more.

以前述式(6)表示之化合物(以下亦稱為「化合物(6)」)具體而言列舉為9,9-雙(4-羥基苯基)茀、9,9-雙(3-苯基-4-羥基苯基)茀、9,9-雙(3,5-二苯基-4-羥基苯基)茀、9,9-雙(4-羥基-3-甲基苯基)茀、9,9-雙(4-羥基-3,5-二甲基苯基)茀、9,9-雙(4-羥基-3-環己基苯基)茀及該等之反應性衍生物等。上述化合物中,以9,9-雙(4-羥基苯基)茀及9,9-雙(3-苯基-4-羥基苯基)茀較適用。該等化合物亦可組合兩種以上使用。The compound represented by the above formula (6) (hereinafter also referred to as "compound (6)") is specifically exemplified as 9,9-bis(4-hydroxyphenyl)fluorene, 9,9-bis(3-phenyl). 4-hydroxyphenyl)anthracene, 9,9-bis(3,5-diphenyl-4-hydroxyphenyl)anthracene, 9,9-bis(4-hydroxy-3-methylphenyl)anthracene, 9,9-bis(4-hydroxy-3,5-dimethylphenyl)anthracene, 9,9-bis(4-hydroxy-3-cyclohexylphenyl)anthracene, and the like, and the like. Among the above compounds, 9,9-bis(4-hydroxyphenyl)anthracene and 9,9-bis(3-phenyl-4-hydroxyphenyl)anthracene are suitable. These compounds may also be used in combination of two or more.

至於前述化合物(7)具體而言可列舉為4,4’-二氟二苯甲酮、4,4’-二氟二苯基碸、2,4’-二氟二苯甲酮、2,4’-二氟二苯基碸、2,2’-二氟二苯甲酮、2,2’-二氟二苯基碸、3,3’-二硝基-4,4’-二氟二苯甲酮、3,3’-二硝基-4,4’-二氟二苯基碸、4,4’-二氯二苯甲酮、4,4’-二氯二苯基碸、2,4’-二氯二苯甲酮、2,4’-二氯二苯基碸、2,2’-二氯二苯甲酮、2,2’-二氯二苯基碸、3,3’-二硝基-4,4’-二氯二苯甲酮及3,3’-二硝基-4,4’-二氯二苯基碸等。該等中,以4,4’-二氟二苯甲酮、4,4’-二氟二苯基碸較佳。該等化合物亦可組合兩種以上使用。Specific examples of the above compound (7) include 4,4'-difluorobenzophenone, 4,4'-difluorodiphenylanthracene, 2,4'-difluorobenzophenone, and 2, 4'-Difluorodiphenyl fluorene, 2,2'-difluorobenzophenone, 2,2'-difluorodiphenyl fluorene, 3,3'-dinitro-4,4'-difluoro Benzophenone, 3,3'-dinitro-4,4'-difluorodiphenyl fluorene, 4,4'-dichlorobenzophenone, 4,4'-dichlorodiphenyl fluorene, 2,4'-dichlorobenzophenone, 2,4'-dichlorodiphenyl fluorene, 2,2'-dichlorobenzophenone, 2,2'-dichlorodiphenyl fluorene, 3, 3'-Dinitro-4,4'-dichlorobenzophenone and 3,3'-dinitro-4,4'-dichlorodiphenylphosphonium. Among these, 4,4'-difluorobenzophenone and 4,4'-difluorodiphenylfluorene are preferred. These compounds may also be used in combination of two or more.

由化合物(5)及化合物(7)所組成群組選出之至少一種化合物在成分(A)100莫耳%中較好含有80莫耳%~100莫耳%,更好含有90莫耳%~100莫耳%。The at least one compound selected from the group consisting of the compound (5) and the compound (7) preferably contains 80 mol% to 100 mol%, more preferably 90 mol%, in 100 mol% of the component (A). 100% by mole.

又,成分(B)視需要較好含有以下述式(8)表示之化合物。Further, the component (B) preferably contains a compound represented by the following formula (8) as needed.

化合物(6)在成分(B)100莫耳%中,較好含有50莫耳%~100莫耳%,更好含有80莫耳%~100莫耳%,又更好含有90莫耳%~100莫耳%。The compound (6) preferably contains 50 mol% to 100 mol%, more preferably 80 mol% to 100 mol%, and more preferably 90 mol% in 100 mol% of the component (B). 100% by mole.

【化12】【化12】

前述式(8)中之R5、R6、Z、n、e及f各獨立與前述式(3)中之R5、R6、Z、n、e及f同義,Ra與前述式(6)中之Ra同義。In the aforementioned formula (8) R 5, in the R 6, Z, n, e and f are each independently of the formula (3) R 5, R 6 , Z, n, e and f are synonymous, R a in the above formula (6) R a is synonymous.

至於以前述式(8)表示之化合物列舉為氫醌、間苯二甲酚、2-苯基氫醌、4,4’-聯苯酚、3,3’-聯苯酚、4,4’-二羥基二苯基碸、3,3’-二羥基二苯基碸、4,4’-二羥基二苯甲酮、3,3’-二羥基二苯甲酮、2,2-雙(4-羥基苯基)丙烷、1,1-雙(4-羥基苯基)環己烷、2,2-雙(4-羥基苯基)-1,1,1,3,3,3-六氟丙烷及其等之反應性衍生物等。該等化合物亦可組合兩種以上使用。The compound represented by the above formula (8) is exemplified by hydroquinone, metaxyl phenol, 2-phenylhydroquinone, 4,4'-biphenol, 3,3'-biphenol, 4,4'-di. Hydroxydiphenyl hydrazine, 3,3'-dihydroxydiphenyl hydrazine, 4,4'-dihydroxybenzophenone, 3,3'-dihydroxybenzophenone, 2,2-bis(4- Hydroxyphenyl)propane, 1,1-bis(4-hydroxyphenyl)cyclohexane, 2,2-bis(4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropane And other reactive derivatives and the like. These compounds may also be used in combination of two or more.

上述化合物中,較好為間苯二酚、4,4'-聯苯酚、2,2-雙(4-羥基苯基)丙烷、1,1-雙(4-羥基苯基)環己烷、2,2-雙(4-羥基苯基)-1,1,1,3,3,3-六氟丙烷,就反應性及力學特性之觀點而言,較好使用4,4’-聯苯酚。該等化合物亦可組合兩種以上使用。Among the above compounds, resorcin, 4,4'-biphenol, 2,2-bis(4-hydroxyphenyl)propane, 1,1-bis(4-hydroxyphenyl)cyclohexane, 2,2-bis(4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropane, 4,4'-biphenol is preferred from the viewpoint of reactivity and mechanical properties . These compounds may also be used in combination of two or more.

前述聚合物更具體而言可以以下所示之方法(I’)合成。More specifically, the above polymer can be synthesized by the method (I') shown below.

方法(I'):使成分(B)在有機溶劑中與鹼金屬化合物反應,獲得成分(B)之鹼金屬鹽後,使所得鹼金屬鹽與成分(A)反應。又,可藉由在成分(A)存在下進行成分(B)與鹼金屬化合物之反應,亦可使成分(B)之鹼金屬鹽與成分(A)反應。Process (I'): After reacting the component (B) with an alkali metal compound in an organic solvent to obtain an alkali metal salt of the component (B), the obtained alkali metal salt is allowed to react with the component (A). Further, the alkali metal salt of the component (B) can be reacted with the component (A) by reacting the component (B) with an alkali metal compound in the presence of the component (A).

反應中使用之鹼金屬化合物可列舉為鋰、鉀及鈉等之鹼金屬;氫化鋰、氫化鉀及氫化鈉等氫化鹼金屬;氫氧化鋰、氫氧化鉀及氫氧化鈉等氫氧化鹼金屬;碳酸鋰、碳酸鉀及碳酸鈉等鹼金屬碳酸鹽;碳酸氫鋰、碳酸氫鉀及碳酸氫鈉等之鹼金屬碳酸氫鹽等。該等可使用一種亦可組合兩種以上使用。The alkali metal compound used in the reaction may, for example, be an alkali metal such as lithium, potassium or sodium; a hydrogenated alkali metal such as lithium hydride, potassium hydride or sodium hydride; or an alkali metal hydroxide such as lithium hydroxide, potassium hydroxide or sodium hydroxide; An alkali metal carbonate such as lithium carbonate, potassium carbonate or sodium carbonate; an alkali metal hydrogencarbonate such as lithium hydrogencarbonate, potassium hydrogencarbonate or sodium hydrogencarbonate. These may be used alone or in combination of two or more.

鹼金屬化合物,相對於前述成分(B)中之所有-O-Ra,通常以鹼金屬化合物中之金屬原子之量為1~3倍當量,較好1.1~2倍當量,更好1.2~1.5倍當量之量使用。The alkali metal compound is usually 1 to 3 equivalents, preferably 1.1 to 2 equivalents, more preferably 1.2 to 1.5 times the amount of the metal atoms in the alkali metal compound, relative to all -OR a in the above component (B). The amount of equivalent is used.

反應中使用之有機溶劑可使用N,N-二甲基乙醯胺、N,N-二甲基甲醯胺、N-甲基-2-吡咯烷酮、1,3-二甲基-2-咪唑啉酮、γ-丁內酯、環丁碼、二甲基亞碸、二乙基亞碸、二甲基碸、二乙基碸、二異丙基碸、二苯基碸、二苯基醚、二苯甲酮、二烷氧基苯(烷氧基之碳數1~4)及三烷氧基苯(烷氧基碳數1~4)等。該等溶劑中,最好使用N-甲基-2-吡咯烷酮、N,N-二甲基乙醯胺、環丁碼、二苯基碸及二甲基亞碸等之介電率高之極性有機溶劑。該等可使用一種或亦可組合兩種以上使用。The organic solvent used in the reaction may be N,N-dimethylacetamide, N,N-dimethylformamide, N-methyl-2-pyrrolidone or 1,3-dimethyl-2-imidazole. Linone, γ-butyrolactone, cyclobutyl, dimethyl hydrazine, diethyl hydrazine, dimethyl hydrazine, diethyl hydrazine, diisopropyl hydrazine, diphenyl hydrazine, diphenyl ether , benzophenone, dialkoxybenzene (carbon number 1 to 4 of alkoxy group), and trialkoxybenzene (alkoxy group number 1-4). Among these solvents, it is preferred to use a high dielectric constant such as N-methyl-2-pyrrolidone, N,N-dimethylacetamide, cyclobutyl, diphenylanthracene or dimethylarylene. Organic solvents. These may be used alone or in combination of two or more.

另外,前述反應時,亦可進一步使用苯、甲苯、二甲苯、己烷、環己烷、辛烷、氯苯、二噁烷、四氫呋喃、苯甲醚及苯乙醇等與水共沸之溶劑。該等可使用一種或亦可組合兩種以上使用。Further, in the above reaction, a solvent azeotropic with water such as benzene, toluene, xylene, hexane, cyclohexane, octane, chlorobenzene, dioxane, tetrahydrofuran, anisole or phenylethyl alcohol may be further used. These may be used alone or in combination of two or more.

成分(A)與成分(B)之使用比例以成分(A)與成分(B)之合計作為100莫耳%時,成分(A)較好為45莫耳%以上55莫耳%以下,更好為50莫耳%以上52莫耳%以下,又更好為超過50莫耳%且52莫耳%以下,成分(B)較好為45莫耳%以上55莫耳%以下,更好為48莫耳%以上50莫耳%以下,又更好為48莫耳%以上且未達50莫耳%。When the ratio of the component (A) to the component (B) is 100 mol% based on the total of the component (A) and the component (B), the component (A) is preferably 45 mol% or more and 55 mol% or less. It is preferably 50 mol% or more and 52 mol% or less, more preferably more than 50 mol% and 52 mol% or less, and the component (B) is preferably 45 mol% or more and 55 mol% or less, more preferably 48% by mole or more and 50% by mole or less, more preferably 48% by mole or more and less than 50% by mole.

又,反應溫度較好為60℃~250℃,更好為80℃~200℃之範圍。反應時間較好為15分鐘~100小時,更好為1小時~24小時之範圍。Further, the reaction temperature is preferably from 60 ° C to 250 ° C, more preferably from 80 ° C to 200 ° C. The reaction time is preferably from 15 minutes to 100 hours, more preferably from 1 hour to 24 hours.

[聚合物之物性等][Physical properties of polymers, etc.]

前述聚合物以TOSOH製造之HLC-8220型GPC裝置(管柱:TSKgelα-M,展開溶劑:四氫呋喃(以下亦稱為「THF」)測定,聚苯乙烯換算之重量平均分子量(Mw)較好為5,000~500,000,更好為15,000~400,000,又更好為30,000~300,000。The polymer is measured by a HLC-8220 type GPC apparatus (column: TSKgelα-M, development solvent: tetrahydrofuran (hereinafter also referred to as "THF") manufactured by TOSOH, and the weight average molecular weight (Mw) in terms of polystyrene is preferably 5,000 to 500,000, more preferably 15,000 to 400,000, and even more preferably 30,000 to 300,000.

前述聚合物以熱重量分析法(TGA)測定之熱分解溫度較好為450℃以上,更好為475℃以上,又更好為490℃以上。The thermal decomposition temperature of the polymer measured by thermogravimetric analysis (TGA) is preferably 450 ° C or higher, more preferably 475 ° C or higher, and still more preferably 490 ° C or higher.

[基材之製造方法][Method of Manufacturing Substrate]

前述基材之製造方法並無特別限制,但列舉為將含有前述聚合物之聚合物組成物塗佈於支撐體上形成塗膜,接著自該塗膜去除有機溶劑,於支撐體上形成基材之方法。The method for producing the substrate is not particularly limited, but a polymer composition containing the polymer is applied onto a support to form a coating film, and then an organic solvent is removed from the coating film to form a substrate on the support. The method.

藉由以該種方法形成基材,可防止聚合物之分子以一定方向配向,故可獲得相位差更小之基材。By forming the substrate by such a method, it is possible to prevent the molecules of the polymer from being aligned in a certain direction, so that a substrate having a smaller phase difference can be obtained.

至於前述聚合物組成物可直接使用以前述方法(I’)獲得之聚合物與有機溶劑之混合物。藉由使用該聚合物組成物,可容易地、便宜地製造基材。As the polymer composition described above, a mixture of the polymer obtained by the above method (I') and an organic solvent can be used as it is. By using the polymer composition, the substrate can be easily and inexpensively produced.

又,前述聚合物組成物可由以前述方法(I’)獲得之聚合物與有機溶劑之混合物,將聚合物單離(純化)成固體成分後,再溶解於有機溶劑中調製聚合物組成物。Further, the polymer composition may be obtained by separating (purifying) the polymer into a solid component from a mixture of the polymer obtained in the above method (I') and an organic solvent, and then dissolving in an organic solvent to prepare a polymer composition.

將前述聚合物單離(純化)成固體成分之方法可藉由例如使聚合物於甲醇等聚合物之弱溶劑中再沉澱,隨後經過濾,接著減壓乾燥等進行。The method of separating (purifying) the aforementioned polymer into a solid component can be carried out, for example, by reprecipitating the polymer in a weak solvent of a polymer such as methanol, followed by filtration, followed by drying under reduced pressure or the like.

使前述聚合物溶解之有機溶劑較好使用例如二氯甲烷、四氫呋喃、環己酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮及γ-丁內酯,就塗佈性、經濟性之觀點而言,較好使用二氯甲烷、N,N-二甲基乙醯胺及N-甲基吡咯烷酮。該等溶劑可單獨使用一種亦可併用兩種以上。The organic solvent in which the polymer is dissolved is preferably used, for example, dichloromethane, tetrahydrofuran, cyclohexanone, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and Γ-butyrolactone is preferably dichloromethane, N,N-dimethylacetamide or N-methylpyrrolidone from the viewpoint of coatability and economy. These solvents may be used alone or in combination of two or more.

溶解有前述聚合物之聚合物組成物中之聚合物濃度係依聚合物之分子量而定,但通常為5~40質量%,較好為7~25質量%。聚合物組成物中之聚合物濃度成為前述範圍時,可厚膜化,不易產生針孔,可形成表面平滑性優異之基材。The concentration of the polymer in the polymer composition in which the polymer is dissolved depends on the molecular weight of the polymer, but is usually from 5 to 40% by mass, preferably from 7 to 25% by mass. When the polymer concentration in the polymer composition is within the above range, the film thickness can be increased, pinholes are less likely to occur, and a substrate having excellent surface smoothness can be formed.

聚合物組成物之黏度係依聚合物之分子量或濃度而定,但通常為2,000~100,000mPa‧s,較好為3,000~50,000 mPa‧s。聚合物組成物之黏度在前述範圍內時,成膜中之組成物之滯留性優異,厚度之調整容易,故基材之成形較容易。The viscosity of the polymer composition is determined by the molecular weight or concentration of the polymer, but is usually 2,000 to 100,000 mPa ‧ , preferably 3,000 to 50,000 mPa ‧ s. When the viscosity of the polymer composition is within the above range, the composition in the film formation is excellent in the retention property, and the thickness is easily adjusted, so that the formation of the substrate is easy.

另外,聚合物組成物中可含有抗老化劑,藉由含有抗老化劑,可進一步提高所得基材之耐久性。Further, the polymer composition may contain an anti-aging agent, and by containing an anti-aging agent, the durability of the obtained substrate can be further improved.

至於抗老化劑可列舉較佳者為受阻酚系化合物。As the anti-aging agent, a hindered phenol-based compound is preferred.

本發明中可使用之受阻酚系化合物可列舉為三乙二醇-雙[3-(3-第三丁基-5-甲基-4-羥基苯基)丙酸酯]、1,6-己二醇-雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、2,4-雙-(正辛硫基)-6-(4-羥基-3,5-二-第三丁基苯胺基)-3,5-三嗪、季戊四醇肆[3-(3,5-第三丁基-4-羥基苯基)丙酸酯]、1,1,3-參[2-甲基-4-[3-(3,5-二-第三丁基-4-羥基苯基)丙醯氧基]-5-第三丁基苯基]丁烷、2,2-硫基-二伸乙基雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、十八烷基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯、N,N-六亞甲基雙(3,5-二-第三丁基-4-羥基-氫桂皮醯胺)、1,3,5-三甲基-2,4,6-參(3,5-二-第三丁基-4-羥基苄基)苯、參-(3,5-二-第三丁基-4-羥基苄基)-異氰尿酸酯、及3,9-雙[2-[3-(3-第三丁基-4-羥基-5-甲基苯基)丙醯氧激]-1,1-二甲基乙基]-2,4,8,10-四氧雜螺[5.5]十一碳烷等。The hindered phenol-based compound which can be used in the present invention is exemplified by triethylene glycol-bis[3-(3-t-butyl-5-methyl-4-hydroxyphenyl)propionate], 1,6- Hexanediol-bis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], 2,4-bis-(n-octylthio)-6-(4-hydroxyl -3,5-di-t-butylanilino)-3,5-triazine, pentaerythritol bismuth [3-(3,5-t-butyl-4-hydroxyphenyl)propionate], 1, 1,3-Shen[2-methyl-4-[3-(3,5-di-t-butyl-4-hydroxyphenyl)propenyloxy]-5-t-butylphenyl] Alkane, 2,2-thio-di-extended ethyl bis[3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate], octadecyl-3-(3, 5-di-t-butyl-4-hydroxyphenyl)propionate, N,N-hexamethylenebis(3,5-di-t-butyl-4-hydroxy-hydrocinnamate), 1,3,5-trimethyl-2,4,6-glucosin (3,5-di-t-butyl-4-hydroxybenzyl)benzene, cis-(3,5-di-t-butyl -4-hydroxybenzyl)-isocyanurate, and 3,9-bis[2-[3-(3-tert-butyl-4-hydroxy-5-methylphenyl)propanoxime] -1,1-Dimethylethyl]-2,4,8,10-tetraoxaspiro[5.5]undecane and the like.

前述聚合物組成物中調配抗老化劑時,前述抗老化劑之調配量相對於前述聚合物100重量份,較好為0.01~10重量份。When the anti-aging agent is formulated in the above polymer composition, the amount of the anti-aging agent is preferably from 0.01 to 10 parts by weight based on 100 parts by weight of the polymer.

將前述聚合物組成物塗佈於支撐體上形成塗膜之方法列舉為輥塗法、凹版塗佈法、旋轉塗佈法及使用刮板之方法等。The method of applying the polymer composition onto a support to form a coating film is exemplified by a roll coating method, a gravure coating method, a spin coating method, a method using a squeegee, and the like.

塗膜之厚度並無特別限制,例如為1~250μm,較好為2~150μm,更好為5~125μm。The thickness of the coating film is not particularly limited and is, for example, 1 to 250 μm, preferably 2 to 150 μm, more preferably 5 to 125 μm.

至於前述支撐體列舉為聚對苯二甲酸乙二酯(PET)膜及SUS板等。The support is exemplified by a polyethylene terephthalate (PET) film, a SUS plate, and the like.

自塗膜去除前述有機溶劑之方法並無特別限制,列舉為例如使塗膜加熱之方法。The method for removing the above organic solvent from the coating film is not particularly limited, and is exemplified by a method of heating the coating film.

前述加熱條件只要可自塗膜去除有機溶劑即可,可依據支撐體或聚合物適當決定,例如加熱溫度較好為30℃~300℃,更好為40℃~250℃,又更好為50℃~230℃。加熱時間較好為10分鐘~5小時。The heating conditions are as long as the organic solvent can be removed from the coating film, and may be appropriately determined depending on the support or the polymer. For example, the heating temperature is preferably from 30 ° C to 300 ° C, more preferably from 40 ° C to 250 ° C, and even more preferably 50. °C~230°C. The heating time is preferably from 10 minutes to 5 hours.

又,加熱亦可分兩階段以上進行。具體而言,於30~80℃之溫度下乾燥10分鐘~2小時後,再於100℃~250℃下加熱10分鐘~2小時。另外,亦可視需要在氮氣氛圍下,或者減壓下進行乾燥。Further, the heating may be carried out in two or more stages. Specifically, it is dried at a temperature of 30 to 80 ° C for 10 minutes to 2 hours, and then heated at 100 ° C to 250 ° C for 10 minutes to 2 hours. Alternatively, it may be dried under a nitrogen atmosphere or under reduced pressure as needed.

又,製造前述基材時,自塗膜去除有機溶劑後,較好使去除溶劑之塗膜經燒成。製造基材時,藉由包含燒成步驟,可獲得熱收縮率小的基材。因此,可容易地於基材上形成介電體多層膜。Further, when the substrate is produced, after the organic solvent is removed from the coating film, the coating film from which the solvent is removed is preferably fired. When a substrate is produced, a substrate having a small heat shrinkage rate can be obtained by including a baking step. Therefore, the dielectric multilayer film can be easily formed on the substrate.

前述燒成時,可使前述支撐體上形成之塗膜與支撐體一起燒成,但就不影響支撐體性質之觀點而言,較好自支撐體剝離形成於前述支撐體上之塗膜,隨後進行燒成。又,自塗膜去除有機溶劑之方法亦可藉由燒成塗膜進行,但亦包含於燒成步驟之前,另外去除有機溶劑之步驟。又,自支撐體剝離並燒成塗膜時,較好包含自支撐體剝離塗膜之前預先自塗膜去除有機溶劑之步驟。In the calcination, the coating film formed on the support may be fired together with the support. However, from the viewpoint of not affecting the properties of the support, the coating film formed on the support is preferably peeled off from the support. Subsequent firing. Further, the method of removing the organic solvent from the coating film may be carried out by firing the coating film, but also including the step of removing the organic solvent before the firing step. Further, when the coating film is peeled off from the support and the coating film is fired, it is preferred to include a step of removing the organic solvent from the coating film before peeling off the coating film from the support.

前述燒成步驟較好以特定溫度進行,燒成溫度較好為210℃~350℃,更好為220℃~330℃,又更好為230℃~320℃。燒成時間較好為10分鐘~5小時。The calcination step is preferably carried out at a specific temperature, and the firing temperature is preferably from 210 ° C to 350 ° C, more preferably from 220 ° C to 330 ° C, and even more preferably from 230 ° C to 320 ° C. The firing time is preferably from 10 minutes to 5 hours.

燒成氛圍並無特別限制,較好為大氣下或惰性氣體氛圍下等,最好為惰性氣體氛圍下。The firing atmosphere is not particularly limited, and is preferably an atmosphere or an inert gas atmosphere, and is preferably an inert gas atmosphere.

至於惰性氣體就著色性之觀點而言,列舉為氮、氬、氦等,較好為氮。The inert gas is exemplified by nitrogen, argon, helium or the like from the viewpoint of coloring property, and preferably nitrogen.

所得基材可自支撐體剝離使用,或者視所用支撐體或種類或複合體之用途,亦可未經剝離直接使用。The obtained substrate may be used by peeling from the support, or may be used as it is without peeling depending on the use of the support or the type or the composite used.

前述基材之厚度係依據期望之用途適當選擇,但較好為1~250μm,更好為2~150μm,又更好為10~125μm。The thickness of the substrate is appropriately selected depending on the intended use, but is preferably from 1 to 250 μm, more preferably from 2 to 150 μm, still more preferably from 10 to 125 μm.

考慮基材之相位差及顯示裝置之輕量化等時,以基材之膜厚較薄者較佳。When the phase difference of the substrate and the weight of the display device are considered, the film thickness of the substrate is preferably thin.

[基材之物性等][Physical properties of the substrate, etc.]

前述基材以Rigaku公司製造之8230型DSC測定裝置(升溫速度20℃/分鐘)測定之玻璃轉移溫度(Tg)較好為230~350℃,更好為240~330℃,又更好為250~300℃。The glass transition temperature (Tg) of the substrate measured by a Model 8230 DSC measuring apparatus (temperature rising rate: 20 ° C /min) manufactured by Rigaku Co., Ltd. is preferably 230 to 350 ° C, more preferably 240 to 330 ° C, and even more preferably 250. ~300 °C.

前述基材具有該玻璃轉移溫度時,可在高溫下進行於該基材之至少一面上形成介電體多層膜時之加熱或熱處理,故可容易地製造光學特性特別優異之光學濾光片。When the substrate has the glass transition temperature, heating or heat treatment can be performed when a dielectric multilayer film is formed on at least one surface of the substrate at a high temperature, so that an optical filter having particularly excellent optical characteristics can be easily produced.

前述基材之厚度為30μm時,在JIS K7105透明度試驗法中之全光線透射率較好為85%以上,更好為88%以上。全光線透射率可使用濁度計SC-3H(Suga試驗機公司製造)測定。When the thickness of the substrate is 30 μm, the total light transmittance in the JIS K7105 transparency test method is preferably 85% or more, more preferably 88% or more. The total light transmittance can be measured using a turbidimeter SC-3H (manufactured by Suga Test Machine Co., Ltd.).

前述基材之厚度為30μm時,於波長400nm之光線透射率較好為70%以上,更好為75%以上,又更好為80%以上。於波長400nm之光線透射率可利用紫外‧可見光分光光度計V-570(JASCO公司製造)測定。When the thickness of the substrate is 30 μm, the light transmittance at a wavelength of 400 nm is preferably 70% or more, more preferably 75% or more, still more preferably 80% or more. The light transmittance at a wavelength of 400 nm can be measured by an ultraviolet ‧ visible light spectrophotometer V-570 (manufactured by JASCO Corporation).

藉由使前述基材之透射率成為該範圍,可使基材顯示具有特別高之光線透射率,故前述基材可較好地使用於光學濾光片。By setting the transmittance of the substrate to this range, the substrate can exhibit a particularly high light transmittance, so that the substrate can be preferably used for an optical filter.

前述基材之厚度為30μm時,YI值(黃化指數)較好為3.0以下,更好為2.5以下,又更好為2.0以下。YI值可使用Suga試驗機公司製造之SM-T型色彩測定器測定。藉由使YI值落在該範圍內,可獲得不易著色之基材,而可適用於光學濾光片。When the thickness of the substrate is 30 μm, the YI value (yellowness index) is preferably 3.0 or less, more preferably 2.5 or less, still more preferably 2.0 or less. The YI value can be measured using an SM-T type color measuring device manufactured by Suga Test Machine Co., Ltd. By setting the YI value within this range, a substrate which is not easily colored can be obtained, and it can be applied to an optical filter.

又,前述基材之厚度為30μm時,以熱風乾燥機在大氣中230℃下進行1小時之加熱後之YI值(加熱後之YI值)較好為3.0以下,更好為2.5以下,又更好為2.0以下。藉由使YI值落在該範圍內,可獲得即使在高溫下仍不易著色之基材,可獲得光學特性優異之光學濾光片。Moreover, when the thickness of the base material is 30 μm, the YI value (YI value after heating) after heating in a hot air dryer at 230 ° C for 1 hour in the air is preferably 3.0 or less, more preferably 2.5 or less. Better to be 2.0 or less. By setting the YI value within this range, a substrate which is not easily colored even at a high temperature can be obtained, and an optical filter excellent in optical characteristics can be obtained.

前述基材對於波長633nm之光,較好具有1.55~1.75,更好具有1.60~1.70之折射率。折射率可利用稜鏡耦合器(prism coupler)型號2010(Metricon公司製造)測定。The substrate preferably has a refractive index of 1.60 to 1.75, more preferably 1.60 to 1.70, for light having a wavelength of 633 nm. The refractive index can be measured by a prism coupler model 2010 (manufactured by Metricon Co., Ltd.).

前述基材之拉伸強度較好為50~200MPa,更好為80~150MPa。拉伸強度可利用拉伸試驗機5543(INSTRON公司製造)測定。The tensile strength of the substrate is preferably from 50 to 200 MPa, more preferably from 80 to 150 MPa. The tensile strength can be measured by a tensile tester 5543 (manufactured by INSTRON Co., Ltd.).

前述基材之斷裂伸長率較好為5~100%,更好為15~100%。斷裂伸長率可利用拉伸試驗機5543(INSTRON公司製造)測定。The elongation at break of the substrate is preferably from 5 to 100%, more preferably from 15 to 100%. The elongation at break can be measured by a tensile tester 5543 (manufactured by INSTRON Co., Ltd.).

前述基材之拉伸彈性率較好為2.5~4.0GPa,更好為2.7~3.7GPa。拉伸彈性率可利用拉伸試驗機5543(INSTRON公司製造)測定。The tensile modulus of the substrate is preferably from 2.5 to 4.0 GPa, more preferably from 2.7 to 3.7 GPa. The tensile modulus of elasticity can be measured by a tensile tester 5543 (manufactured by INSTRON Co., Ltd.).

前述基材之厚度為30μm時,於厚度方向之相位差(Rth)較好為200nm以下,更好為50nm以下,又更好為10nm以下。相位差可使用大塚電子公司製造之RETS分光器測定。When the thickness of the substrate is 30 μm, the phase difference (Rth) in the thickness direction is preferably 200 nm or less, more preferably 50 nm or less, still more preferably 10 nm or less. The phase difference can be measured using a RETS spectrometer manufactured by Otsuka Electronics Co., Ltd.

前述基材具有如此低的相位差時,成為光學等向性優異之基材。於攝像裝置中使用含有該基材之光學濾光片時,可較好地防止顯示面上出現著色或干涉條紋,防止攝像裝置之性能降低。因此,本發明之光學濾光片可較好地使用於攝像裝置。When the substrate has such a low phase difference, the substrate is excellent in optical isotropic properties. When an optical filter containing the substrate is used in an image pickup apparatus, coloring or interference fringes on the display surface can be prevented, and the performance of the image pickup apparatus can be prevented from being lowered. Therefore, the optical filter of the present invention can be preferably used in an image pickup apparatus.

前述基材使用Seiko Instruments公司製造之SSC-5200型TMA測定裝置測定之線膨脹係數較好為80ppm/K以下,更好為75ppm/K以下。The substrate has a linear expansion coefficient of preferably 80 ppm/K or less, more preferably 75 ppm/K or less, as measured by an SSC-5200 type TMA measuring apparatus manufactured by Seiko Instruments.

前述基材之濕度膨脹係數較好為15ppm/%RH以下,更好為12ppm/%RH以下。濕度膨脹係數可使用TMA(SII Nano Technology公司製造,TMA-SS6100)濕度控制配備測定。基材之膨脹係數在前述範圍內時,顯示基材之尺寸安定性(環境信賴性)高,故可更適用作為光學濾光片。The humidity expansion coefficient of the substrate is preferably 15 ppm/% RH or less, more preferably 12 ppm/% RH or less. The humidity expansion coefficient can be measured using a TMA (SII Nano Technology, TMA-SS6100) humidity control equipment. When the expansion coefficient of the substrate is within the above range, the substrate exhibits high dimensional stability (environmental reliability), and thus it can be more suitably used as an optical filter.

[含有近紅外線吸收劑之基材][Substrate containing near-infrared absorbing agent]

使用本發明之光學濾光片作為近紅外線截止濾光片時,較好於前述基材中包含例如近紅外線吸收劑。含有該種近紅外線吸收劑之基材可藉由例如,除使用於前述聚合物組成物中調配近紅外線吸收劑而成之組成物以外,以與前述基材之製造方法相同之方法製造。When the optical filter of the present invention is used as a near-infrared cut filter, it is preferred that the substrate include, for example, a near-infrared ray absorbing agent. The substrate containing the near-infrared ray absorbing agent can be produced by the same method as the method for producing the substrate, for example, by using a composition obtained by blending a near-infrared absorbing agent in the polymer composition.

近紅外線吸收劑可列舉為例如在波長600~800nm處有極大吸收(λmax)之化合物。The near-infrared absorbing agent may, for example, be a compound having a maximum absorption (λ max ) at a wavelength of 600 to 800 nm.

該等近紅外線吸收劑列舉為例如菁(cyanine)系染料、酞菁系染料、銨(aminium)系染料、亞胺鎓系色素、偶氮系色素、蒽醌系色素、二亞胺鎓系色素、方酸鎓系色素及卟啉(porphyrin)系色素。Examples of such near-infrared ray absorbing agents include cyanine dyes, phthalocyanine dyes, aminium dyes, iminium dyes, azo dyes, anthraquinone dyes, and diimine quinone pigments. , squaraine dyes and porphyrin pigments.

含有於前述特定波長區域中具有極大吸收之近紅外線吸收劑之基材由於入射光之角度依存性小,可安定地決定在短波長(可見光)側之近紅外線吸收波長,故與僅使用後述之介電體多層膜作成之在短波長(可見光)側之近紅外線反射波長隨著入射角而改變之過去之近紅外線截止濾光片相比較,可獲得相對於入射角之變化、透射特性之變化更小之近紅外線截止濾光片。The base material containing the near-infrared ray absorbing agent having the maximum absorption in the specific wavelength region is small in dependence on the angle of incident light, and can stably determine the near-infrared ray absorption wavelength on the short-wavelength (visible light) side, so that only the latter will be used. Compared with the past near-infrared cut filter in which the near-infrared reflection wavelength of the short-wavelength (visible light) side changes with the incident angle, the dielectric multilayer film can be changed with respect to the incident angle and the change of the transmission characteristic. A smaller near-infrared cut filter.

該近紅外線吸收劑之市售品具體而言可列舉為Lumogen IR765、Lumogen IR788(BASF公司製);ABS643、ABS654、ABS667、ABS670T、ABS694、IRA693N、IRA735(Exciton公司製);SDA3598、SDA6075、SDA8030、SDA8303、SDA8470、SDA3039、SDA3040、SDA3922、SDA7257(H.W.SANDS公司製);TAP-15、IR-706(山田化學工業製造)等。Specific examples of the commercial product of the near-infrared ray absorbing agent include Lumogen IR765 and Lumogen IR788 (manufactured by BASF Corporation); ABS643, ABS654, ABS667, ABS670T, ABS694, IRA693N, and IRA735 (manufactured by Exciton); SDA3598, SDA6075, and SDA8030 , SDA8303, SDA8470, SDA3039, SDA3040, SDA3922, SDA7257 (manufactured by HWSANDS); TAP-15, IR-706 (manufactured by Yamada Chemical Industry Co., Ltd.).

該等近紅外線吸收劑可單獨使用一種,亦可併用兩種以上。These near-infrared ray absorbing agents may be used alone or in combination of two or more.

本發明中,前述近紅外線吸收劑之使用量係依據所需特性適當選擇,但相對於前述基材中所含之聚合物100重量%,通常為0.01~10.0重量%,較好為0.01~8.0重量%,更好為0.01~5.0重量%。In the present invention, the amount of the near-infrared ray absorbing agent used is appropriately selected depending on the desired characteristics, but is usually 0.01 to 10.0% by weight, preferably 0.01 to 8.0, based on 100% by weight of the polymer contained in the substrate. The weight % is more preferably 0.01 to 5.0% by weight.

近紅外線吸收劑之使用量在上述範圍內時,吸收波長之入射角依存性小,可獲得近紅外線截止能、450~600nm之範圍內之透射率及強度優異之近紅外線截止濾光片。When the amount of use of the near-infrared ray absorbing agent is within the above range, the incident angle dependence of the absorption wavelength is small, and a near-infrared cutoff filter having a near-infrared cutoff energy and a transmittance and strength in the range of 450 to 600 nm can be obtained.

近紅外線吸收劑之使用量多於上述範圍時,雖亦有可獲得近紅外線吸收劑之特性表現更強之近紅外線截止濾光片之情況,但有於450~600nm之範圍內之透射率低於期望值之虞,或基材及近紅外線截止濾光片之強度下降之虞,近紅外線吸收劑之使用量少於上述範圍時,雖亦可獲得於450~600nm範圍內之透射率高之近紅外線截止濾光片之情況,但近紅外線吸收劑之特性不易表現,有難以獲得吸收波長之入射角依存性小之近紅外線截止濾光片之情況。When the amount of the near-infrared absorbing agent used is more than the above range, although a near-infrared cut filter having a characteristic of a near-infrared absorbing agent can be obtained, the transmittance in the range of 450 to 600 nm is low. After the desired value or the strength of the substrate and the near-infrared cut filter is lowered, when the amount of the near-infrared absorbing agent used is less than the above range, the transmittance in the range of 450 to 600 nm can be obtained. In the case of the infrared cut filter, the characteristics of the near-infrared absorbing agent are not easily expressed, and it is difficult to obtain a near-infrared cut filter having a small incident angle dependence of the absorption wavelength.

含有近紅外線吸收劑之基材之玻璃轉移溫度、YI值、加熱後之YI值、拉伸強度、斷裂伸長率、拉伸彈性率、線膨脹係數及濕度膨脹係數之較佳值係與記載於前述[基材之物性等]之欄中之玻璃轉移溫度、YI值、加熱後之YI值、拉伸強度、斷裂伸長率、拉伸彈性率、線膨脹係數及濕度膨脹係數之較佳值相同。Preferred values of glass transition temperature, YI value, YI value after heating, tensile strength, elongation at break, tensile modulus, coefficient of linear expansion, and coefficient of humidity expansion of a substrate containing a near-infrared absorbing agent are described in The glass transition temperature, the YI value, the YI value after heating, the tensile strength, the elongation at break, the tensile modulus, the coefficient of linear expansion, and the coefficient of humidity expansion are preferably the same in the column of the physical properties of the substrate. .

又,含有近紅外線吸收劑之基材有因使用之近紅外線吸收劑而著色之情況。據此,含有近紅外線吸收劑之基材之YI值亦有成為負值之情況。由於光學濾光片等之光學構件較好不帶有黃色味,故即使含有近紅外線吸收劑之基材之YI值成為負值,仍可使用作為光學濾光片用之基材。Further, the substrate containing the near-infrared ray absorbing agent may be colored by the near-infrared ray absorbing agent used. Accordingly, the YI value of the substrate containing the near-infrared absorbing agent may also become a negative value. Since the optical member such as the optical filter preferably does not have a yellow taste, even if the YI value of the substrate containing the near-infrared ray absorbing agent becomes a negative value, a substrate for an optical filter can be used.

[含有顏料及/或染料之基材][Substrate containing pigments and/or dyes]

使用本發明之光學濾光片作為ND濾光片時,較好於前述基材中含有例如顏料及/或染料。含有該等顏料及/或染料之基材,除使用於前述聚合物組成物中調配顏料及/或染料而成之組成物以外,可藉由與前述基材之製造方法相同之方法製造。When the optical filter of the present invention is used as the ND filter, it is preferred that the substrate contains, for example, a pigment and/or a dye. The base material containing the pigments and/or dyes can be produced by the same method as the method for producing the base material, except for the composition obtained by mixing the pigments and/or dyes in the polymer composition.

前述顏料並無特別限制,但為在可見光區域中具有吸收之顏料,且較好在可見光區域中具有均勻吸收性(在可見光區域中,顯示平坦之分光透射率曲線)之顏料,較好為由金屬、碳黑、金屬氧化物、金屬氮化物及金屬氮氧化物所成組群選出之至少一種無機粒子。前述無機粒子更好為無機超微粒子。The pigment is not particularly limited, but is a pigment having an absorption pigment in a visible light region, and preferably having a uniform absorption in a visible light region (a flat spectral transmittance curve is displayed in a visible light region), preferably At least one inorganic particle selected from the group consisting of metal, carbon black, metal oxide, metal nitride, and metal oxynitride. The aforementioned inorganic particles are more preferably inorganic ultrafine particles.

前述顏料之使用量,相對於前述基材中使用之聚合物100重量%,較好為0.01~5重量%,更好為0.05~3重量%左右。The amount of the pigment used is preferably from 0.01 to 5% by weight, more preferably from 0.05 to 3% by weight, based on 100% by weight of the polymer used in the substrate.

前述基材中以前述量含有顏料時,在可見光區域中有適度之光吸收,可容易地製造具有所需光學濃度之ND濾光片。When the pigment is contained in the above-mentioned base material in an amount as described above, moderate light absorption is observed in the visible light region, and an ND filter having a desired optical density can be easily produced.

於可見光區域中具有吸收之金屬、金屬氧化物、金屬氮化物及金屬氮氧化物雖亦可為任一種金屬之金屬單體、氧化物、氮化物、氮氧化物,但較好為屬於元素週期表之第4週期之3~11族之金屬之金屬單體、氧化物、氮化物、氮氧化物。元素週期表之第4週期之3~11族中,為鍶(Sc)、鈦(Ti)、釩(V)、鉻(Cr)、錳(Mn)、鐵(Fe)、鈷(Co)、鎳(Ni)及銅(Cu),該等中,以Ti、Mn、Fe或Cu較佳。The metal, metal oxide, metal nitride and metal oxynitride having absorption in the visible light region may be metal monomers, oxides, nitrides, and oxynitrides of any metal, but preferably belong to the elemental period. Metallic monomers, oxides, nitrides, and oxynitrides of metals of Groups 3 to 11 of the fourth cycle of the Table. Among the 3rd to 11th groups of the fourth cycle of the periodic table, it is strontium (Sc), titanium (Ti), vanadium (V), chromium (Cr), manganese (Mn), iron (Fe), cobalt (Co), Nickel (Ni) and copper (Cu), among which Ti, Mn, Fe or Cu is preferred.

再者前述金屬氧化物較好為由兩種以上之金屬構成之複合氧化物,最好為由銅、鐵及錳構成之金屬複合氧化物。該等由銅、鐵及錳構成之金屬複合氧化物之組成比並無特別限制,但以由銅、鐵及錳構成之金屬複合氧化物作為100重量%時,較好為具有銅氧化物為5~30重量%,鐵氧化物為25~70重量%,錳氧化物為25~70重量%之組成比之金屬複合氧化物。Further, the metal oxide is preferably a composite oxide composed of two or more kinds of metals, and is preferably a metal composite oxide composed of copper, iron and manganese. The composition ratio of the metal composite oxide composed of copper, iron, and manganese is not particularly limited. However, when the metal composite oxide composed of copper, iron, and manganese is 100% by weight, it is preferred to have copper oxide. 5 to 30% by weight, iron oxide is 25 to 70% by weight, and manganese oxide is a metal composite oxide having a composition ratio of 25 to 70% by weight.

如前述之組成比之由銅、鐵及錳之氧化物構成之金屬複合氧化物之可見光區域中之分光透射率曲線由於具有平坦性,故使用該金屬複合氧化物之ND濾光片,在可見光區域中顯示平坦之分光透射率曲線,而較佳。The spectral transmittance curve in the visible light region of the metal composite oxide composed of the oxides of copper, iron, and manganese is flat, so the ND filter of the metal composite oxide is used in visible light. A flat spectral transmittance curve is shown in the region, and is preferred.

前述無機粒子之一次粒徑較好為5~100nm,更好為20~70nm。藉由使一次粒徑落在該範圍,而具有抑制ND濾光片之散射光之效果。據此,可防止ND濾光片之解像度降低、畫面之鬼影、眩光故較佳。The primary particle diameter of the inorganic particles is preferably from 5 to 100 nm, more preferably from 20 to 70 nm. The effect of suppressing the scattered light of the ND filter is obtained by causing the primary particle diameter to fall within the range. According to this, it is possible to prevent the resolution of the ND filter from being lowered, ghosting of the screen, and glare.

本發明中,前述基材中之顏料形態可為直接分散一次粒子之形態,亦可為使添加之一次粒子經凝聚,成為二次、三次以上之凝聚粒子分散之形態,亦可混合存在有一次粒子與二次粒子以上之凝聚粒子並分散之形態。即使在任一種情況下,前述基材中之粒子之平均粒徑較好為50~600nm左右,更好為50~400nm左右,又更好為50~200nm左右。使用具有該平均粒徑之顏料時,可降低ND濾光片之濁度值故較佳。In the present invention, the form of the pigment in the base material may be a form in which the primary particles are directly dispersed, or the primary particles to be added may be agglomerated to form a second or three or more aggregated particles, or may be mixed once. A form in which particles and secondary particles are agglomerated and dispersed. In either case, the average particle diameter of the particles in the substrate is preferably from about 50 to 600 nm, more preferably from about 50 to 400 nm, still more preferably from about 50 to 200 nm. When a pigment having the average particle diameter is used, the turbidity value of the ND filter can be lowered, which is preferable.

又,前述染料只要是在可見光區域具有吸收之染料即無特別限制。Further, the dye is not particularly limited as long as it is a dye having absorption in the visible light region.

使用由有機物組成之染料時,因其化學構造導致具有特定波長之吸收。因此,本發明中,於前述基材中僅含有特定之顏料而使ND濾光片之分光透射率曲線不平坦之情況時,藉由將在該分光透射率曲線之極大值附近之波長區域中具有吸收之特定染料與顏料一起調配於前述基材中,可使ND濾光片之分光透射率曲線變平坦。When a dye composed of an organic substance is used, absorption with a specific wavelength is caused by its chemical structure. Therefore, in the present invention, when the substrate contains only a specific pigment and the spectral transmittance curve of the ND filter is not flat, by using a wavelength region in the vicinity of the maximum value of the spectral transmittance curve The specific dye having absorption is blended with the pigment in the aforementioned substrate to flatten the spectral transmittance curve of the ND filter.

據此,在可見光區域中具有吸收之染料列舉為酞菁系、硫醇金屬錯合物系、偶氮系、聚甲炔系、二苯基甲烷系、三苯基甲烷系、醌系、蒽醌系及二亞銨鎓系等之色素化合物。Accordingly, the dye having absorption in the visible light region is exemplified by phthalocyanine, thiol metal complex, azo, polymethine, diphenylmethane, triphenylmethane, lanthanum, lanthanum. A pigment compound such as a lanthanide or a diammonium lanthanide.

本發明中較佳之在可見光區域中具有吸收之染料之市售品列舉為SDA4137、SDA4428、SDA9800、SDA9811、SDB3535(以上為SANDS公司製造)、KAYASORB系列、Kayaset系列(以上為日本化藥公司製造)。Commercially available dyes having absorption in the visible light region in the present invention are listed as SDA4137, SDA4428, SDA9800, SDA9811, SDB3535 (above, manufactured by SANDS), KAYASORB series, Kayaset series (above, manufactured by Nippon Kayaku Co., Ltd.) .

含有顏料及/或染料之基材之玻璃轉移溫度、YI值、加熱後之YI值、拉伸強度、斷裂伸長率、拉伸彈性率、線膨脹係數及濕度膨脹係數之較佳值係與記載於前述[基材之物性等]之欄中之基材之玻璃轉移溫度、YI值、加熱後之YI值、拉伸強度、斷裂伸長率、拉伸彈性率、線膨脹係數及濕度膨脹係數之較佳值相同。Preferred values and records of glass transition temperature, YI value, YI value after heating, tensile strength, elongation at break, tensile modulus, coefficient of linear expansion and coefficient of humidity expansion of a substrate containing a pigment and/or a dye The glass transition temperature, the YI value, the YI value after heating, the tensile strength, the elongation at break, the tensile modulus, the coefficient of linear expansion, and the coefficient of humidity expansion of the substrate in the column of the physical properties of the substrate, etc. The preferred values are the same.

〈介電體多層膜〉<Dielectric Multilayer Film>

前述介電體多層膜可利用過去習知方法製造。The above dielectric multilayer film can be produced by a conventional method.

前述介電體多層膜具體而言可使用交叉層合高折射率材料層與低折射率材料層而成之多層膜。Specifically, the dielectric multilayer film may be a multilayer film in which a high refractive index material layer and a low refractive index material layer are laminated.

構成高折射率材料層之材料可使用折射率為1.7以上之材料,係選擇折射率範圍通常在1.7~2.5之材料。As the material constituting the high refractive index material layer, a material having a refractive index of 1.7 or more can be used, and a material having a refractive index range of usually 1.7 to 2.5 is selected.

該等材料列舉為例如氧化鈦、氧化鋯、五氧化鉭、五氧化鈮、氧化鑭、氧化釔、氧化鋅、硫化鋅或氧化銦作為主成分,且含有少量氧化鈦、氧化錫及/或氧化鈰等者。These materials are exemplified by, for example, titanium oxide, zirconium oxide, antimony pentoxide, antimony pentoxide, antimony oxide, antimony oxide, zinc oxide, zinc sulfide or indium oxide as a main component, and contain a small amount of titanium oxide, tin oxide and/or oxidation. Hey, etc.

構成低折射率材料層之材料可使用折射率1.6以下之材料,係選擇折射率之範圍通常在1.2~1.6之材料。The material constituting the low refractive index material layer may be a material having a refractive index of 1.6 or less, and a material having a refractive index generally selected from 1.2 to 1.6.

該等材料列舉為例如二氧化矽、氧化鋁、氟化鑭、氟化鎂、六氟化鋁鈉等。Such materials are exemplified by, for example, cerium oxide, aluminum oxide, cerium fluoride, magnesium fluoride, sodium aluminum hexafluoride or the like.

於前述基材之至少一面上形成介電體多層膜之方法並無特別限制,可藉由例如CVD法、濺鍍法、真空蒸鍍法等,形成交叉層合高折射率材料層與低折射率材料層而成之介電體多層膜,以接著劑將該等貼合於前述基材上,於前述基材上藉由直接、CVD法、濺鍍法、真空蒸鍍法等交叉層合高折射率材料層與低折射率材料層而獲得。The method of forming the dielectric multilayer film on at least one side of the substrate is not particularly limited, and the cross-laminated high refractive index material layer and the low refractive index can be formed by, for example, a CVD method, a sputtering method, a vacuum evaporation method, or the like. a dielectric multilayer film formed by a material layer, which is bonded to the substrate by an adhesive, and laminated on the substrate by direct, CVD, sputtering, vacuum evaporation, or the like. Obtained from a layer of high refractive index material and a layer of low refractive index material.

該等中,就所得介電體多層膜之均勻性或該多層膜對基材之密著性之觀點而言,較好以濺鍍法於基材上直接成膜。Among these, from the viewpoint of the uniformity of the obtained dielectric multilayer film or the adhesion of the multilayer film to the substrate, it is preferred to form a film directly on the substrate by sputtering.

以濺鍍法形成高折射率材料層及低折射率材料層時之溫度係依使用之材料而定,但較好為150~350℃,更好為180~300℃,又更好為220~260℃。The temperature at which the high refractive index material layer and the low refractive index material layer are formed by sputtering is determined depending on the material to be used, but is preferably 150 to 350 ° C, more preferably 180 to 300 ° C, and more preferably 220 °. 260 ° C.

於基材上形成介電體多層膜時,較好在如此高溫下進行。藉由在高溫下形成介電體多層膜,即使曝露於高溫下仍可獲得不易產生龜裂之光學濾光片。When the dielectric multilayer film is formed on the substrate, it is preferably carried out at such a high temperature. By forming a dielectric multilayer film at a high temperature, an optical filter which is less prone to cracking can be obtained even when exposed to a high temperature.

於基材上形成介電體多層膜之步驟通常在200℃以上之高溫進行。據此,為了耐此高溫,具體而言,由於在Tg減去20~30℃下會引起因基材之動態黏彈性測定(BAIBURON公司製造)所致之彈性率變化,故使用之基材中所含之聚合物要求具有比加熱溫度高20℃以上之Tg(以DSC測定)。形成前述構件之基材要求至少230℃以上之耐熱性,且要求較好230~350℃,更好240~330℃,又更好250~300℃之耐熱性。因此,較好使基材中所含聚合物之玻璃轉移溫度亦落在該範圍內。The step of forming a dielectric multilayer film on a substrate is usually carried out at a high temperature of 200 ° C or higher. Accordingly, in order to withstand such a high temperature, in particular, since the Tg minus 20 to 30 ° C causes a change in the elastic modulus due to the dynamic viscoelasticity measurement of the substrate (manufactured by BAIBURON Co., Ltd.), the substrate is used. The polymer contained is required to have a Tg (measured by DSC) higher than the heating temperature by 20 ° C or higher. The substrate forming the aforementioned member requires heat resistance of at least 230 ° C or higher, and is preferably heat resistance of 230 to 350 ° C, more preferably 240 to 330 ° C, and more preferably 250 to 300 ° C. Therefore, it is preferred that the glass transition temperature of the polymer contained in the substrate also falls within the range.

前述聚合物由於Tg落在前述範圍,故可較好地使用作為形成介電體多層膜之基材的材料。Since the polymer has a Tg within the above range, a material which is a substrate for forming a dielectric multilayer film can be preferably used.

前述基材由於耐熱性優異,故即使在基材上直接形成介電體多層膜時,其可成膜之溫度範圍仍廣。因此,可在不使介電體多層膜所具有之性能劣化之下於前述基材上容易地形成介電體多層膜。Since the base material is excellent in heat resistance, even when a dielectric multilayer film is directly formed on a substrate, the temperature range in which the film can be formed is wide. Therefore, the dielectric multilayer film can be easily formed on the aforementioned substrate without deteriorating the performance of the dielectric multilayer film.

前述高折射率材料層及低折射率材料層之各層厚度通常為欲遮斷之紅外線波長λ(nm)之0.1λ~0.5λ之厚度。厚度落在前述範圍時,折射率(n)與膜厚(d)之乘積(n×d)成為與以式λ/4算出之光學膜厚相同之值,由於維持反射‧折射之光學特性關係,故有可容易地控制特定波長之遮斷‧透射之傾向。The thickness of each of the high refractive index material layer and the low refractive index material layer is usually a thickness of 0.1 λ to 0.5 λ of the infrared wavelength λ (nm) to be interrupted. When the thickness falls within the above range, the product of the refractive index (n) and the film thickness (d) (n × d) becomes the same value as the optical film thickness calculated by the formula λ/4, and the optical characteristic relationship of the reflection ‧ refraction is maintained Therefore, there is a tendency to easily control the interception and transmission of a specific wavelength.

且,前述高折射率材料層及低折射率材料層之各層之層合數較好為5~50層,更好為10~45層。Further, the number of layers of each of the high refractive index material layer and the low refractive index material layer is preferably from 5 to 50 layers, more preferably from 10 to 45 layers.

再者,蒸鍍介電體多層膜時於基材上產生彎曲之情況時,由於消除該等,可進行於基材之兩面蒸鍍介電體多層膜,而於基材之蒸鍍介電體多層膜之面上照射紫外線等輻射線等之方法。又,照射輻射線時,可邊形成介電體多層膜邊照射,亦可在形成介電體多層膜之後另外照射。Further, when the dielectric multilayer film is vapor-deposited on the substrate, the dielectric multilayer film can be deposited on both sides of the substrate by the elimination of the dielectric film, and the vapor deposition dielectric on the substrate can be performed. A method of irradiating a surface of the multilayer film with radiation such as ultraviolet rays. Further, when the radiation is irradiated, it may be irradiated while forming the dielectric multilayer film, or may be additionally irradiated after the formation of the dielectric multilayer film.

〈光學濾光片〉<Optical Filter>

本發明之光學濾光片之光學特性及耐熱著色性等優異。因此可使用作為主要使用於照相模組之CCD或CMOS等之固體攝像元件用視覺感度修正用途中之近紅外線截止濾光片或主要用於防止解像力降低用之光量調節用途之ND(減光)濾光片。The optical filter of the present invention is excellent in optical characteristics, heat-resistant coloring property, and the like. Therefore, it is possible to use a near-infrared cut filter which is used for visual sensitivity correction of a solid-state imaging device which is mainly used for a camera module, such as a CCD or a CMOS, or an ND (dimming) which is mainly used for light amount adjustment for preventing resolution reduction. Filter.

本發明之光學濾光片尤其可使用於數位相機、行動電話用之照相機、數位錄影機、PC相機、監視相機、汽車用相機、行動資訊終端、個人電腦、影像遊戲機、醫療機器、USB記憶體、攜帶式遊戲機、指紋辨識系統、數位音樂播放器、玩具機器人、玩具等。另外,亦可使用作為安裝於汽車或建物等之玻璃之上之熱線截止濾光片等。The optical filter of the present invention can be used in particular for digital cameras, cameras for mobile phones, digital video recorders, PC cameras, surveillance cameras, automotive cameras, mobile information terminals, personal computers, video game consoles, medical devices, USB memories. Body, portable game console, fingerprint identification system, digital music player, toy robot, toys, etc. Further, a hot wire cut filter or the like which is mounted on a glass such as an automobile or a building can be used.

本發明之光學濾光片由於具有可對應於特定操作步驟之耐熱性,故使對於主基板完全自動安裝照相機模組成為可能,基於前述特點,尤其作為照相機模組用之光學濾光片,在品質‧成本‧設計面上可期待大幅利益。Since the optical filter of the present invention has heat resistance corresponding to a specific operation step, it is possible to completely mount the camera module completely for the main substrate, and based on the foregoing characteristics, especially as an optical filter for a camera module, Quality ‧ Cost ‧ The design side can expect substantial benefits.

光學濾光片在使用(組裝)於攝像裝置等中等之際會有加熱之情況。最好為具有可對應於焊錫回焊步驟中之耐熱性。因此,光學濾光片較好為在暴露於高溫下之後(例如在250℃下加熱10分鐘後),仍不會對形成於基材上之介電體多層膜產生龜裂等之引起介電體多層膜之變化。The optical filter may be heated when it is used (assembled) in a medium such as an image pickup apparatus. It is preferable to have heat resistance which can correspond to the solder reflow step. Therefore, the optical filter preferably does not cause cracking or the like on the dielectric multilayer film formed on the substrate after being exposed to a high temperature (for example, after heating at 250 ° C for 10 minutes). The change of the multilayer film.

本發明之光學濾光片由於具有前述耐熱性及耐熱著色性優異之基材,故於該基材上形成介電體多層膜時之溫度可為高溫。由此,本發明之光學濾光片即使暴露於高溫後,亦不易引起龜裂而為熱安定性優異之濾光片。Since the optical filter of the present invention has a substrate excellent in heat resistance and heat-resistant coloring property, the temperature at which the dielectric multilayer film is formed on the substrate can be high. Therefore, even if the optical filter of the present invention is exposed to a high temperature, it is less likely to cause cracking and is a filter excellent in thermal stability.

另外,本發明之光學濾光片可視需要設置抗反射層。抗反射層只要使可防止或減低前述基材與空氣之界面,及/或界電體多層膜與空氣之界面之可見光之反射者,即無特別限制。前述抗反射層較好形成於前述基材之與層合有介電體多層膜之面成相反側之面上。Further, the optical filter of the present invention may be provided with an antireflection layer as needed. The antireflection layer is not particularly limited as long as it can prevent or reduce the interface between the substrate and the air, and/or the visible light at the interface between the boundary layer of the boundary layer and the air. The antireflection layer is preferably formed on the surface of the substrate opposite to the surface on which the dielectric multilayer film is laminated.

抗反射層可藉由例如CVD法、濺鍍法、真空蒸鍍法等,將前述介電體多層膜中說明之高折射率材料與低折射率材料以層合數1~4層層合而形成。The antireflection layer can be laminated by laminating the first to fourth layers of the high refractive index material and the low refractive index material described in the dielectric multilayer film by, for example, a CVD method, a sputtering method, a vacuum deposition method, or the like. form.

又,形成抗反射層之方法列舉為藉由於前述基材之表面上利用壓印法,形成抗反射層之方法,或者分別使用以烷氧基鈦化合物及烷氧基矽烷化合物作為原料之溶凝膠材料等作為高折射率材料及低折射率材料,經濕式塗佈,形成抗反射層之方法。Further, the method of forming the antireflection layer is exemplified by a method of forming an antireflection layer by an imprint method on the surface of the substrate, or by using a titanium alkoxide compound and an alkoxysilane compound as a raw material, respectively. A method of forming an antireflection layer by wet coating as a high refractive index material and a low refractive index material.

又,溶凝膠材料通常使用熱硬化,但亦可藉由使用能量線(例如紫外線等),產生成為縮合觸媒之酸等而硬化之所謂光硬化而形成抗反射層(特開2000-109560、特開2000-1648)。Further, the lyogel material is usually thermally hardened, but an anti-reflection layer can be formed by using energy rays (for example, ultraviolet rays) to generate an acid or the like which is a condensation catalyst and harden it to form an anti-reflection layer (JP-2000-109560). , special open 2000-1648).

該等中,就直接使用形成介電體多層膜時使用之材料、設備方面而言,可使用以與形成前述介電體多層膜相同之方法形成抗反射層之方法,或者,就提高生產性之觀點而言,較好使用藉由前述濕式塗佈形成抗反射層之方法。In the above, as for the material and equipment used for forming the dielectric multilayer film, a method of forming an antireflection layer in the same manner as the formation of the above dielectric multilayer film can be used, or productivity can be improved. From the viewpoint of the above, a method of forming an antireflection layer by the above wet coating is preferably used.

〈攝像裝置〉<Camera device>

本發明之攝像裝置包含前述本發明之光學濾光片。The image pickup apparatus of the present invention comprises the aforementioned optical filter of the present invention.

本發明之光學濾光片由於光學特性優異,耐熱性、耐熱著色性及力學強度均衡良好且優異,而且輕量,耐熱衝擊性優異,故可獲得性能優異、輕量、薄化之攝像裝置。The optical filter of the present invention is excellent in optical characteristics, excellent in heat resistance, heat-resistant coloring property, and mechanical strength, and is excellent in weight, and is excellent in thermal shock resistance. Therefore, an image pickup device having excellent performance, light weight, and thinness can be obtained.

本發明之攝像裝置列舉為數位相機、行動電話用相機、數位錄影機、PC相機、監視相機及汽車用相機等。The imaging device of the present invention is exemplified by a digital camera, a camera for a mobile phone, a digital video recorder, a PC camera, a surveillance camera, and a camera for an automobile.

[實施例][Examples]

以下以實施例具體說明本發明。Hereinafter, the present invention will be specifically described by way of examples.

(1)構造分析(1) Structural analysis

下述實施例及比較例中獲得之聚合物之構造分析係利用IR(ATR法,FT-IR,6700,NICOLET公司製造)及NMR(ADVANCE 500型,BRUKAR公司製造)進行。The structural analysis of the polymer obtained in the following examples and comparative examples was carried out by IR (ATR method, FT-IR, 6700, manufactured by NICOLET) and NMR (ADVANCE 500 type, manufactured by BRUKAR Co., Ltd.).

(2)重量平均分子量(Mw)、數平均分子量(Mn)及分子量分佈(Mw/Mn)(2) Weight average molecular weight (Mw), number average molecular weight (Mn), and molecular weight distribution (Mw/Mn)

下述實施例及比較例中獲得之聚合物之重量平均分子量(Mw)、數平均分子量(Mn)及分子量分佈(Mw/Mn)係使用TOSOH製造之HLC-8220型GPC裝置(管柱:TSKgelα-M,展開溶劑:THF)測定。The weight average molecular weight (Mw), number average molecular weight (Mn), and molecular weight distribution (Mw/Mn) of the polymers obtained in the following examples and comparative examples were HLC-8220 type GPC apparatus manufactured by TOSOH (column: TSKgelα). -M, developing solvent: THF).

(3)玻璃轉移溫度(Tg)(3) Glass transition temperature (Tg)

下述實施例及比較例中獲得之聚合物及評價用薄膜之玻璃轉移溫度係使用Rigaku公司製造之8230型DSC測定裝置,以升溫速度20℃/min測定。The glass transition temperature of the polymer and the evaluation film obtained in the following examples and comparative examples was measured at a temperature increase rate of 20 ° C/min using a Model 8230 DSC measuring apparatus manufactured by Rigaku Corporation.

(3’)熱分解溫度(3') thermal decomposition temperature

下述實施例及比較例中獲得之聚合物之熱分解溫度係利用熱重量分析法(TGA:氮氣氛圍下,升溫速度10℃/分鐘,5%重量減少溫度)測定。The thermal decomposition temperatures of the polymers obtained in the following examples and comparative examples were measured by thermogravimetric analysis (TGA: nitrogen gas atmosphere, temperature increase rate 10 ° C / min, 5% weight reduction temperature).

(4)機械強度(4) Mechanical strength

下述實施例及比較例中獲得之評價用薄膜於室溫之拉伸強度、斷裂伸長率及拉伸彈性率係使用拉伸試驗機5543(INSTRON公司製造),依據JIS K7127測定。The tensile strength, elongation at break and tensile modulus at room temperature of the film for evaluation obtained in the following examples and comparative examples were measured by a tensile tester 5543 (manufactured by INSTRON Co., Ltd.) in accordance with JIS K7127.

(5)環境安全性(5) Environmental safety

下述實施例及比較例中獲得之評價用薄膜之線膨脹係數係使用Seiko Instruments公司製造之SSC-5200型TMA測定裝置測定。自室溫升溫至280℃後,自以3℃/min降溫時在200~100℃下之梯度計算出線膨脹係數。The coefficient of linear expansion of the film for evaluation obtained in the following examples and comparative examples was measured using an SSC-5200 type TMA measuring apparatus manufactured by Seiko Instruments. After heating from room temperature to 280 ° C, the linear expansion coefficient was calculated from the gradient at 200 ° C to 100 ° C when the temperature was lowered at 3 ° C / min.

使用TMA(SII Nano Technology公司製造,TMA-SS6100)濕度控制配備,以下述條件進行下述實施例及比較例中獲得之評價用薄膜之濕度膨脹係數之測定。The humidity expansion coefficient of the film for evaluation obtained in the following examples and comparative examples was measured under the following conditions using a humidity control apparatus of TMA (manufactured by SII Nano Technology Co., Ltd., TMA-SS6100).

濕度條件:以每10%RH自40%RH改變濕度至70%RH(拉伸法:荷重5g),溫度:23℃Humidity conditions: change the humidity from 40% RH to 70% RH per 10% RH (stretching method: load 5g), temperature: 23 °C

(6)光學特性(6) Optical properties

針對下述實施例及比較例中獲得之評價用薄膜,依據JIS K7105透明度試驗法測定全光線透射率及YI值。具體而言,係使用濁度計SC-3H(Suga試驗機公司製造)測定評價用薄膜之全光線透射率,使用Suga試驗機公司製造之SM-T型色彩測定器測定YI值(加熱前之YI)。The total light transmittance and the YI value of the film for evaluation obtained in the following examples and comparative examples were measured in accordance with JIS K7105 transparency test method. Specifically, the total light transmittance of the film for evaluation was measured using a turbidimeter SC-3H (manufactured by Suga Test Instruments Co., Ltd.), and the YI value was measured using an SM-T type color measuring instrument manufactured by Suga Test Instruments Co., Ltd. (before heating) YI).

又,使用Suga試驗機公司製造之SM-T型色彩測定器測定下述實施例及比較例中獲得之評價用薄膜以熱風乾燥機,在大氣中230℃下進行1小時之加熱後之YI值(加熱後之YI)。In addition, the evaluation film obtained in the following Examples and Comparative Examples was measured by a hot air dryer using an SM-T color measuring instrument manufactured by Suga Test Instruments Co., Ltd., and the YI value after heating at 230 ° C for 1 hour in the air. (YI after heating).

下述實施例及比較例中獲得之評價用薄膜之於波長400nm之光線透射率係使用紫外‧可見光分光光度計V-570(JASCO公司製造)測定,且所得評價用薄膜之折射率係使用稜鏡耦合器型號2010(Metricon公司製造)測定。The light transmittance of the film for evaluation obtained in the following examples and comparative examples at a wavelength of 400 nm was measured using an ultraviolet ‧ visible light spectrophotometer V-570 (manufactured by JASCO Co., Ltd.), and the refractive index of the film for evaluation was used. Mirror coupler model 2010 (manufactured by Metricon).

另外,下述實施例及比較例中獲得之評價用薄膜之相位差(Rth)係使用大塚電子公司製造之RETS分光器測定。又,測定時之基準波長為589nm,相位差之評價膜厚係以規格化成30μm之值表示。Further, the phase difference (Rth) of the film for evaluation obtained in the following examples and comparative examples was measured using a RETS spectroscope manufactured by Otsuka Electronics Co., Ltd. Further, the reference wavelength at the time of measurement was 589 nm, and the evaluation film thickness of the phase difference was expressed by a value of 30 μm.

(7)光學薄膜之評價(7) Evaluation of optical film

將下述實施例中獲得之評價用薄膜切成10cm×10cm之方形,於所得薄膜之一面上,於蒸鍍溫度150℃形成可反射近紅外線之多層蒸鍍膜[交互層合二氧化矽(SiO2:膜厚120~190nm)層與二氧化鈦(TiO2:膜厚70~120nm)層而成者,層合數50]。接著,於基板之層合多層蒸鍍膜之面上,藉由使用安裝冷鏡(cold mirror)之金屬鹵化物燈,在氮氣氛圍下照射1J/cm2之紫外線,因而製造光學濾光片。使用分光光度計(日立製作所公司製造,U-3140)測定該光學濾光片之分光透射率曲線。The film for evaluation obtained in the following examples was cut into a square of 10 cm × 10 cm, and a multilayer vapor-deposited film capable of reflecting near-infrared rays was formed on one surface of the obtained film at an evaporation temperature of 150 ° C. [Interlayered cerium oxide (SiO) 2 : a film thickness of 120 to 190 nm) and a layer of titanium dioxide (TiO 2 : film thickness: 70 to 120 nm), the number of laminations is 50]. Next, an optical filter was produced by laminating ultraviolet rays of 1 J/cm 2 in a nitrogen atmosphere using a metal halide lamp to which a cold mirror was attached to the surface of the multilayer deposited film on the substrate. The spectral transmittance curve of the optical filter was measured using a spectrophotometer (manufactured by Hitachi, Ltd., U-3140).

所得光學濾光片之波長750~1000nm之近紅外線區域中之透射率為5%以下時記為「○」。When the transmittance of the obtained optical filter in the near-infrared region of the wavelength of 750 to 1000 nm is 5% or less, it is referred to as "○".

光學濾光片之評價結果示於表1。The evaluation results of the optical filter are shown in Table 1.

(8)光學薄膜之龜裂耐性之評價(8) Evaluation of crack resistance of optical film

將下述實施例及比較例中獲得之評價用薄膜切成10cm×10cm之方形,於所得薄膜之兩面上,於蒸鍍溫度200℃形成可反射近紅外線之多層蒸鍍膜[交互層合二氧化矽(SiO2:膜厚120~190nm)層與二氧化鈦(TiO2:膜厚70~120nm)層而成者,層合數50層],而製造光學濾光片。使所得光學濾光片在烘箱中250℃下加熱10分鐘,以目視評價加熱前後蒸鍍膜是否產生龜裂。未發現龜裂之情況記為「○」。The film for evaluation obtained in the following examples and comparative examples was cut into a square of 10 cm × 10 cm, and a multilayer vapor-deposited film capable of reflecting near-infrared rays was formed on both sides of the obtained film at an evaporation temperature of 200 ° C [interactive lamination oxidation An optical filter was produced by forming a layer of yttrium (SiO 2 : film thickness: 120 to 190 nm) and a layer of titanium oxide (TiO 2 : film thickness: 70 to 120 nm) and laminating 50 layers. The obtained optical filter was heated in an oven at 250 ° C for 10 minutes to visually evaluate whether or not the vapor deposited film was cracked before and after heating. The case where no crack was found was recorded as "○".

光學濾光片之評價結果示於表1。The evaluation results of the optical filter are shown in Table 1.

[實施例1][Example 1]

於3L之四頸燒瓶中添加(A)成分:2,6-二氟苄腈(以下亦稱為「DFBN」)35.12g(0.253mol)、(B)成分:9,9-雙(4-羥基苯基)茀(以下亦稱為「BPFL」)70.08g(0.200mol)、間苯二酚(以下亦稱為「RES」)5.51g(0.050mol)、碳酸鉀41.46g(0.300mol)、N,N-二甲基乙醯胺(以下亦稱為「DMAc」)443g及甲苯111g。接著,於四頸燒瓶上加裝溫度計、攪拌機、附氮氣導入管之三通閥、Dean-Stark管及冷卻管。(A) component was added to a 3 L four-necked flask: 2,6-difluorobenzonitrile (hereinafter also referred to as "DFBN") 35.12 g (0.253 mol), and (B) component: 9,9-bis (4- Hydroxyphenyl) hydrazine (hereinafter also referred to as "BPFL") 70.08 g (0.200 mol), resorcin (hereinafter also referred to as "RES") 5.51 g (0.050 mol), potassium carbonate 41.46 g (0.300 mol), N,N-dimethylacetamide (hereinafter also referred to as "DMAc") 443 g and toluene 111 g. Next, a four-necked flask was equipped with a thermometer, a stirrer, a three-way valve with a nitrogen introduction tube, a Dean-Stark tube, and a cooling tube.

接著,使瓶內經氮氣置換後,使所得溶液在140℃反應3小時,生成之水自Dean-Stark管隨時去除。未確認到水生成之後,緩慢將溫度上升至160℃,在該溫度下反應6小時。Next, after replacing the inside of the flask with nitrogen, the resulting solution was reacted at 140 ° C for 3 hours, and the resulting water was removed from the Dean-Stark tube at any time. After the formation of water was not confirmed, the temperature was slowly raised to 160 ° C, and the reaction was carried out at this temperature for 6 hours.

冷卻至室溫(25℃)後,以濾紙去除所生成之鹽,將濾液倒入甲醇中再沉澱,藉由過濾單離過濾物(殘留物)。所得過濾物在60℃下真空乾燥隔夜,獲得白色粉末(聚合物)(收量95.67g,收率95%)。After cooling to room temperature (25 ° C), the resulting salt was removed with a filter paper, and the filtrate was poured into methanol to reprecipitate, and the filtrate (residue) was separated by filtration. The obtained filtrate was vacuum dried overnight at 60 ° C to obtain a white powder (polymer) (yield: 95.67 g, yield 95%).

所得聚合物之物性示於表1。進行所得聚合物之構造分析及重量平均分子量。結果,紅外線吸收光譜之特性吸收為3035cm-1(C-H伸縮)、2229cm-1(CN)、1574cm-1、1499cm-1(芳香環骨架吸收)、1240cm-1(-O-),重量平均分子量為130,000。The physical properties of the obtained polymer are shown in Table 1. The structural analysis of the obtained polymer and the weight average molecular weight were carried out. As a result, the infrared absorption spectrum of the characteristic absorption of 3035cm -1 (CH stretching), 2229cm -1 (CN), 1574cm -1, 1499cm ( aromatic ring skeleton absorption) -1, 1240cm -1 (-O-) , weight average molecular weight It is 130,000.

接著,使所得聚合物再溶解於DMAc中,獲得聚合物濃度20質量%之聚合物組成物。使用刮板將該聚合物組成物塗佈於由聚對苯二甲酸乙二酯(PET)構成之基板上,於70℃乾燥30分鐘,接著於100℃乾燥30分鐘成為薄膜後,自PET基板剝離。隨後,將薄膜固定於模框上,進而以230℃燒成2小時,獲得膜厚30μm之評價用薄膜。Next, the obtained polymer was redissolved in DMAc to obtain a polymer composition having a polymer concentration of 20% by mass. The polymer composition was applied onto a substrate made of polyethylene terephthalate (PET) using a doctor blade, dried at 70 ° C for 30 minutes, and then dried at 100 ° C for 30 minutes to form a film, and then from a PET substrate. Stripped. Subsequently, the film was fixed on a mold frame, and further fired at 230 ° C for 2 hours to obtain a film for evaluation having a film thickness of 30 μm.

所得評價用薄膜之物性示於表1。The physical properties of the obtained film for evaluation are shown in Table 1.

[實施例2][Embodiment 2]

除使用2,2-雙(4-羥基苯基)丙烷11.41g(0.050mol)代替RES 5.51g以外,餘與實施例1同樣進行。所得聚合物及評價用薄膜之物性示於表1。The same procedure as in Example 1 was carried out except that 11.41 g (0.050 mol) of 2,2-bis(4-hydroxyphenyl)propane was used instead of RES 5.51 g. The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[實施例3][Example 3]

除使用BPFL 78.84g(0.225mol)及2,2-雙(4-羥基苯基)-1,1,1,3,3,3-六氟丙烷8.41g(0.025mol)代替BPFL 70.08g及RES 5.51g作為(B)成分以外,餘與實施例1同樣進行。所得聚合物及評價用薄膜之物性示於表1。In addition to using BPFL 78.84g (0.225mol) and 2,2-bis(4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropane 8.41g (0.025mol) instead of BPFL 70.08g and RES 5.51 g was carried out in the same manner as in Example 1 except for the component (B). The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[實施例4][Example 4]

除使用9,9-雙(3-苯基-4-羥基苯基)茀125.65g(0.250mol)代替BPFL 70.08g及RES 5.51g作為(B)成分以外,餘與實施例1同樣進行。所得聚合物及評價用薄膜之物性示於表1。The same procedure as in Example 1 was carried out except that 9,9-bis(3-phenyl-4-hydroxyphenyl)fluorene 125.65 g (0.250 mol) was used instead of BPFL 70.08 g and RES 5.51 g as the component (B). The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[實施例5][Example 5]

除使用BPFL 87.60g(0.250mol)代替BPFL 70.08g及RES 5.51g作為(B)成分以外,餘與實施例1同樣進行。所得聚合物及評價用薄膜之物性示於表1。The same procedure as in Example 1 was carried out except that BPFL 87.60 g (0.250 mol) was used instead of BPFL 70.08 g and RES 5.51 g as the component (B). The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[實施例6][Embodiment 6]

除使用BPFL 78.84g(0.225mol)及1,1-雙(4-羥基苯基)環己烷6.71g(0.025mol)代替BPFL 70.08g及RES 5.51g作為(B)成分以外,餘與實施例1同樣進行。所得聚合物及評價用薄膜之物性示於表1。In addition to using BPFL 78.84 g (0.225 mol) and 1,1-bis(4-hydroxyphenyl)cyclohexane 6.71 g (0.025 mol) instead of BPFL 70.08 g and RES 5.51 g as the component (B), the remainder and the examples 1 is also done. The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[實施例7][Embodiment 7]

除使用DFBN 28.10g(0.202mol)及4,4-二氟二苯甲酮11.02g(0.051mol)代替DFBN 35.13g作為(A)成分以外,餘與實施例5同樣進行。所得聚合物及評價用薄膜之物性示於表1。The same procedure as in Example 5 was carried out except that DFBN 28.10 g (0.202 mol) and 4,4-difluorobenzophenone 11.02 g (0.051 mol) were used instead of DFBN 35.13 g as the component (A). The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[實施例8][Embodiment 8]

除將(A)成分之調配量變更為DFBN 17.556g(0.126mol)及4,4-二氟二苯甲酮27.55g(0.126mol)以外,餘與實施例7同樣進行。所得聚合物及評價用薄膜之物性示於表1。The same procedure as in Example 7 was carried out except that the amount of the component (A) was changed to 17.556 g (0.126 mol) of DFBN and 27.55 g (0.126 mol) of 4,4-difluorobenzophenone. The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[實施例9][Embodiment 9]

除使用4,4-二氟二苯基碸(DFDS)63.56g(0.250mol)代替DFBN 35.12g作為(A)成分以外,餘與實施例5同樣進行。所得聚合物及評價用薄膜之物性示於表1。The same procedure as in Example 5 was carried out except that 63.56 g (0.250 mol) of 4,4-difluorodiphenylphosphonium (DFDS) was used instead of DFBN 35.12 g as the component (A). The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[實施例10][Embodiment 10]

除調製聚合物濃度20質量%之聚合物組成物時,使所得聚合物再溶解於DMAc中後,於所得溶液中相對於聚合物100重量份添加近紅外線吸收劑ABS670T(0.1重量份)以外,餘與實施例5同樣進行。所得聚合物及評價用薄膜之物性示於表1。When the polymer composition having a polymer concentration of 20% by mass was prepared, the obtained polymer was redissolved in DMAc, and then the near-infrared absorbing agent ABS670T (0.1 part by weight) was added to 100 parts by weight of the polymer in the obtained solution. The same procedure as in Example 5 was carried out. The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[實施例11][Example 11]

除調製聚合物濃度20質量%之聚合物組成物時,使所得聚合物再溶解於DMAc中後,於所得溶液中相對於聚合物100重量份添加近紅外線吸收劑ABS694(0.1重量份)以外,餘與實施例5同樣進行。所得聚合物及評價用薄膜之物性示於表1。When the polymer composition having a polymer concentration of 20% by mass was prepared, the obtained polymer was redissolved in DMAc, and then the near-infrared absorbing agent ABS694 (0.1 part by weight) was added to 100 parts by weight of the polymer in the obtained solution. The same procedure as in Example 5 was carried out. The physical properties of the obtained polymer and the film for evaluation are shown in Table 1.

[比較例1][Comparative Example 1]

除使用2,2-雙(4-羥基苯基)-1,1,1,3,3,3-六氟丙烷84.06g(0.250mol)代替BPFL 70.08g及RES 5.51g作為(B)成分以外,餘與實施例1同樣進行。所得聚合物及評價用薄膜之物性示於表1。又,光學薄膜之評價由於薄膜在著色部形成時變形、熔融而無法實施。In addition to 2,2-bis(4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropane 84.06 g (0.250 mol) instead of BPFL 70.08 g and RES 5.51 g as component (B) The remainder was carried out in the same manner as in Example 1. The physical properties of the obtained polymer and the film for evaluation are shown in Table 1. Further, the evaluation of the optical film could not be performed because the film was deformed and melted when the colored portion was formed.

[比較例2][Comparative Example 2]

使用帝人(股)製造之聚萘二甲酸乙二酯薄膜(Neotex),以與實施例1同樣之方法進行評價(膜厚125μm)。薄膜之物性示於表1。又,光學濾光片之評價由於薄膜在著色部形成時變形、熔融而無法實施。The polyethylene naphthalate film (Neotex) manufactured by Teijin Co., Ltd. was evaluated in the same manner as in Example 1 (film thickness: 125 μm). The physical properties of the film are shown in Table 1. Further, the evaluation of the optical filter could not be performed because the film was deformed and melted when the colored portion was formed.

[比較例3][Comparative Example 3]

於安裝溫度計、攪拌機、氮氣導入管及冷凝管之300mL四頸燒瓶中添加2,2-雙[4-(4-胺基苯氧基)苯基]丙烷9.70g(23.6mmol)。接著,使燒瓶內部經氮氣置換後,添加N-甲基-2-吡咯烷酮(NMP)(60ml)且攪拌至均勻。在室溫下於所得溶液中添加2,3,5-三羧基環戊基乙酸二酐5.30g(23.6mmol),直接在該溫度下持續攪拌12小時進行反應,獲得含聚醯胺酸之溶液。To a 300 mL four-necked flask equipped with a thermometer, a stirrer, a nitrogen gas introduction tube, and a condenser, 9.70 g (23.6 mmol) of 2,2-bis[4-(4-aminophenoxy)phenyl]propane was added. Next, after replacing the inside of the flask with nitrogen, N-methyl-2-pyrrolidone (NMP) (60 ml) was added and stirred until homogeneous. 5.30 g (23.6 mmol) of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride was added to the obtained solution at room temperature, and the mixture was directly stirred at this temperature for 12 hours to carry out a reaction to obtain a polyglycine-containing solution. .

於所得含聚醯胺酸之溶液中添加NMP(75ml)稀釋後,添加吡啶(7.5ml)及乙酸酐(6.7ml),在110℃攪拌6小時進行醯亞胺化。隨後,冷卻至室溫後,倒入大量甲醇,藉由過濾單離過濾物。使所得過濾物在60℃真空乾燥隔夜,獲得白色粉末(聚合物)(收量13.5g,收率95.3%)。After adding NMP (75 ml) to the obtained polyamine-containing acid solution, pyridine (7.5 ml) and acetic anhydride (6.7 ml) were added, and the mixture was stirred at 110 ° C for 6 hours to carry out hydrazine imidization. Subsequently, after cooling to room temperature, a large amount of methanol was poured, and the filtrate was separated by filtration. The obtained filtrate was vacuum dried overnight at 60 ° C to obtain a white powder (polymer) (yield: 13.5 g, yield: 95.3%).

接著,將所得聚合物再溶解於DMAc中,獲得20質量%之樹脂溶液。使用刮板(100μm間隙)將該樹脂溶液塗佈於由聚對苯二甲酸乙二酯(PET)構成之基板上,於100℃乾燥30分鐘,接著在150℃乾燥60分鐘成為薄膜後,自PET基板剝離。隨後,再使薄膜於150℃、減壓下乾燥3小時,獲得膜厚30μm之評價用薄膜。評價係以與實施例1相同之方法進行。結果示於表1。Next, the obtained polymer was redissolved in DMAc to obtain a 20% by mass resin solution. The resin solution was applied onto a substrate made of polyethylene terephthalate (PET) using a squeegee (100 μm gap), dried at 100 ° C for 30 minutes, and then dried at 150 ° C for 60 minutes to form a film. The PET substrate is peeled off. Subsequently, the film was further dried at 150 ° C under reduced pressure for 3 hours to obtain a film for evaluation having a film thickness of 30 μm. The evaluation was carried out in the same manner as in Example 1. The results are shown in Table 1.

由前述結果可知,前述薄膜(基材)之光透射性、耐熱性、耐熱著色性及力學強度之均衡良好而優異。且,可知本發明之光學濾光片具有優異之近紅外線截止性能。因此,本發明之光學濾光片可較好地使用於攝像裝置。From the above results, it is understood that the film (substrate) is excellent in light balance, heat resistance, heat resistance, and mechanical strength. Further, it is understood that the optical filter of the present invention has excellent near-infrared cut-off performance. Therefore, the optical filter of the present invention can be preferably used in an image pickup apparatus.

Claims (9)

一種近紅外線截止濾光片,其為具有:基材、及形成於該基材之至少一面上之介電體多層膜的近紅外線截止濾光片,該基材包含以示差掃描熱量測定(DSC,升溫速度20℃/分鐘)之玻璃轉移溫度(Tg)為230~350℃,且具有由以下述式(1)表示之構造單位及以下述式(2)表示之構造單位所組成群組選出之至少一種構造單位(i)的芳香族聚醚系聚合物、及在波長600~800nm處有極大吸收的化合物, (式(1)中,R1~R4各獨立表示碳數1~12之一價有機基,a~d各獨立表示0~4之整數), (式(2)中,R1~R4及a~d各獨立與前述式(1)中之R1~R4及a~d同義,Y表示單鍵、-SO2-或>C=O,R7及R8各獨立表示碳數1~12之一價有機基或硝基,g及h各獨立表示0~4之整數,m表示0或1,但m為0時,R7不為氰基)。 A near-infrared cut filter, which is a near-infrared cut filter having a substrate and a dielectric multilayer film formed on at least one side of the substrate, the substrate comprising a differential scanning calorimeter (DSC) The glass transition temperature (Tg) of the temperature rise rate of 20 ° C /min is 230 to 350 ° C, and is selected from the group consisting of the structural unit represented by the following formula (1) and the structural unit represented by the following formula (2). At least one structural polystyrene polymer of the structural unit (i) and a compound having a maximum absorption at a wavelength of 600 to 800 nm, (In the formula (1), R 1 to R 4 each independently represent a one-valent organic group having 1 to 12 carbon atoms, and a to d each independently represent an integer of 0 to 4), (In the formula (2), R 1 ~ R 4 each independently and a ~ d of the formula (R 1) in the 1 ~ R 4 and a ~ d synonymous, Y represents a single bond, -SO 2 - or> C = O, R 7 and R 8 each independently represent a one-valent organic group or a nitro group having 1 to 12 carbon atoms, and g and h each independently represent an integer of 0 to 4, m represents 0 or 1, but when m is 0, R 7 Not for cyano). 如申請專利範圍第1項之近紅外線截止濾光片,其中前述介電體多層膜為在150~350℃之溫度下形成者。 The near-infrared cut filter according to claim 1, wherein the dielectric multilayer film is formed at a temperature of 150 to 350 °C. 如申請專利範圍第1或2項之近紅外線截止濾光片,其中前述芳香族聚醚系聚合物進而具有由以下述式(3)表示之構造單位及以下述式(4)表示之構造單位所組成群組選出之至少一種構造單位(ii), (式(3)中,R5及R6各獨立表示碳數1~12之一價有機基,Z表示單鍵、-O-、-S-、-SO2-、>C=O、-CONH-、-COO-或碳數1~12之二價有機基,e及f各獨立表示0~4之整數,n表示0或1), (式(4)中,R7、R8、Y、m、g及h各獨立與前述式(2)中之R7、R8、Y、m、g及h同義,R5、R6、Z、n、e及f各獨立與前述式(3)中之R5、R6、Z、n、e及f同義)。 The near-infrared cut-off filter according to the first or second aspect of the invention, wherein the aromatic polyether polymer further has a structural unit represented by the following formula (3) and a structural unit represented by the following formula (4) At least one structural unit (ii) selected by the group, (In the formula (3), R 5 and R 6 each independently represent a one-valent organic group having 1 to 12 carbon atoms, and Z represents a single bond, -O-, -S-, -SO2-, >C=O, -CONH -, -COO- or a divalent organic group having 1 to 12 carbon atoms, and e and f each independently represent an integer of 0 to 4, and n represents 0 or 1), (Formula (4), R 7, R 8, Y , m, g and h are each independently of the formula (R 2) in the 7, R 8, Y, m , g and h are synonymous, R 5, R 6 , Z, n, e, and f are each independently synonymous with R 5 , R 6 , Z, n, e, and f in the above formula (3). 如申請專利範圍第3項之近紅外線截止濾光片,其中前述芳香族聚醚系聚合物中,前述構造單位(i)與前述構造單位(ii)之莫耳比為50:50~100:0。 The near-infrared cut filter according to claim 3, wherein in the aromatic polyether polymer, the molar ratio of the structural unit (i) to the structural unit (ii) is 50:50 to 100: 0. 如申請專利範圍第1或2項之近紅外線截止濾光片, 其中前述芳香族聚醚系聚合物之以凝膠滲透層析儀(GPC)測定之聚苯乙烯換算之重量平均分子量為5,000~500,000。 For example, the near-infrared cut filter of claim 1 or 2, The polystyrene-equivalent weight average molecular weight of the aromatic polyether polymer measured by a gel permeation chromatography (GPC) is 5,000 to 500,000. 如申請專利範圍第1或2項之近紅外線截止濾光片,其中前述基材於厚度30μm之以JIS K7105透明度試驗法測定之全光線透射率為85%以上。 The near-infrared cut filter according to claim 1 or 2, wherein the substrate has a total light transmittance of 85% or more as measured by a JIS K7105 transparency test method at a thickness of 30 μm. 如申請專利範圍第1或2項之近紅外線截止濾光片,其中前述基材於厚度30μm之YI值(黃化指數)為3.0以下。 The near-infrared cut filter according to claim 1 or 2, wherein the substrate has a YI value (yellowness index) of 3.0 or less in thickness of 30 μm. 如申請專利範圍第1或2項之近紅外線截止濾光片,其中前述基材於厚度30μm之厚度方向之相位差(Rth)為200nm以下。 The near-infrared cut filter according to claim 1 or 2, wherein the substrate has a phase difference (Rth) of 200 nm or less in a thickness direction of 30 μm. 一種攝像裝置,其係包含如申請專利範圍第1~8項中任一項之近紅外線截止濾光片。 An image pickup apparatus comprising the near-infrared cut filter according to any one of claims 1 to 8.
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