201139722 六、發明說明： 【發明所屬之技術領域】 本發明是有關於一種可拆卸式進出氣結構及其導電膜 成膜裝置，且特別是有關於一種具備可替換性的可拆卸式 進出氣結構。 【先前技術】 液晶顯示元件、電激發光元件等之各種顯示元件或薄 • 膜太陽電池之電極，其電極主要為具有可見光線透過率 高，且電阻低之透明導電性之薄膜。因此，透明導電膜成 為完成現今各種顯示器元件中不可或缺的電極材料。例如 氧化銦錫（Indium Tin Oxide，ITO)或氧化錫（Tin Oxide， TO)、摻雜有氟之錫氧化物（Fluorine — doped Tin Oxide，FTO) 等導電性金屬氧化物為主要成分之膜，兼具對可見光優異 之透明性及優異之電性傳導性。 此外，一般製造透明導電膜的裝置係使用，例如電漿 • CVD方法。此方法將既有的靶材’以電漿的方式在基板上 進行成膜。由於製程條件必須在真空（或接近真空）下進 行，所以這樣的製程假如是以連續式操作的話，所必須使 用的設備不僅複雜且昂貴’使得所製造的成品價格甚高。 且銦(In)因為價格昂貴，資源有限，所以並不適合未來產業 的發展。而氧化錫薄膜，由於價格低、在高溫下穩定性佳 • 以及化性穩定，且用來形成氧化錫薄膜的錢膜製程不需要 - 在真空的環境下進行，所以這樣的製程條件對透明導電膜 的發展極具競爭力。 、 m 4 201139722 程時式操作的製 液流在溶融的金屬液面上，浮飄拋光的= 知技=心 程條件對隧道爐進行改襄以符合不同===的製 二：如習知有在常壓下進行的化學氣相 耘。然而，對於沒有具備洋制 d)製 化錫的鍍膜製程。// 、、：商，就無法施行氧 因此有需要提供一插台t；您人Α 置 種夺口刚述需求導電膜成膜裝 【發明内容】 因此，本發明之-態樣是在提供 結構及其導電膜成膜裝置，將習知隨氣 組化成-獨立的裝置，藉以由連接元;c膜裝置模 製程裝置組裝在一起，以節省進行改褒的成本及時間。 法玻發明之另—態樣是在提供—種即使不具備浮 务玻=製私亦可連續量產透明導電薄膜的導電臈成膜襄 成膜裝利用w知的連接元件把數個本發明的導電膜 2膜f置串列成一連續生產製程。本發明之另一態樣是在 。供種可拆卸式進出氣結構及其導電膜成膜裝置，藉由 可拆卸式進出氣結構的獨立設計，因此導電膜成膜裝置的 成膜原料供應管路以及排氣管路具有拆卸方便以及清洗容 S1 5 201139722 易的優點。201139722 VI. Description of the Invention: [Technical Field] The present invention relates to a detachable inlet and outlet gas structure and a film forming device thereof, and more particularly to a detachable inlet and outlet gas structure having an alternative . [Prior Art] The electrodes of various display elements such as liquid crystal display elements and electroluminescence elements, or thin-film solar cells, are mainly films having a transparent conductive film having a high visible light transmittance and a low electric resistance. Therefore, the transparent conductive film becomes an electrode material which is indispensable in various display elements of the present day. For example, a film containing a conductive metal oxide such as indium tin oxide (ITO), tin oxide (Tin Oxide, TO), or fluorine doped tin oxide (FTO) as a main component, It has excellent transparency to visible light and excellent electrical conductivity. Further, generally, a device for manufacturing a transparent conductive film is used, for example, a plasma CVD method. This method forms an existing target material on the substrate by plasma. Since the process conditions must be carried out under vacuum (or near vacuum), if such a process is operated in a continuous operation, the equipment that must be used is not only complicated but expensive, so that the manufactured product is expensive. Indium (In) is not suitable for the development of future industries because of its high price and limited resources. The tin oxide film, because of its low price, good stability at high temperatures, and stable stability, does not need to be used in the formation of a tin oxide film - in a vacuum environment, so the process conditions are transparent and conductive. The development of membranes is extremely competitive. , m 4 201139722 The process flow of the process is on the molten metal surface, floating and polishing = knowledge = heart rate conditions to improve the tunnel furnace to meet the different === system 2: as in the case There are chemical vapor oximes carried out under normal pressure. However, there is no coating process that does not have a ceramic system d). //,,,:,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, The structure and the conductive film forming device thereof are conventionally grouped into a separate device, thereby being assembled by the connecting unit and the c film device molding process device, thereby saving the cost and time for the improvement. Another aspect of the invention of the invention is to provide a conductive film-forming film-forming device which can continuously mass-produce a transparent conductive film even if it does not have a floating glass glass. The conductive film 2 film f is arranged in series to form a continuous production process. Another aspect of the invention is at . The detachable inlet and outlet gas structure and the conductive film forming device thereof have the independent design of the detachable inlet and outlet gas structure, so that the film forming raw material supply pipe and the exhaust pipe of the conductive film forming device have the convenience of disassembly and the like. Cleaning the advantages of S1 5 201139722 easy.
本發明之另一態=1提供一種可與既有浮法坡璃製 以及既有玻璃退火奴備、、Ώ合的導電膜成膜裝置，而 I 一種進行噴霧裂解法的連續生產線以生產透明$+接成 处明導電氧化 踢。 根據本發明之上述目。的，提出一種可拆卸式進姓 構，其包含板體、排氣單元、成膜原料供應單元以乳、: 固元件。排氣單元設置於該板體之-端。成獏原料$ = • 元設置於板體之另一端。兩鎖固元件分別將排氣⑽Γ ‘Γ早 成膜原料供應單元鎖固於板體上。排氣單元包含===及 氣管，每一個抽氣管具有一氣體流量控制閥。這此L 共同具有一抽氣開口。成膜原料供應單元包含容^ 具有一原料供應孔，設置於容室靠近排氣單元之一側:至 根據本發明之上述目的，提出一種導電犋成膜裝置， 其包含爐體、輸送裝置、加熱器、可拆卸式進出氣^構、 第一連接元件以及第二連接元件。爐體具有成膜室^向貫 • 穿爐體，成膜室具有基板輸入端以及基板輪出端。輸送裝 置具有貫穿成膜室之輸送軌道。加熱器設置於輪送^道^ 方。可拆卸式進出氣結構設置於成膜室上方且面對輸=裝 置。第一連接元件設置於基板輸入端’以連接至第一製程 襄置。第二連接元件設置於基板輸出端，以連接至第二製 程裝置。其中可拆卸式進出氣結構包含板體、第一鎖g元 =排氣單元以及成膜原料供應單元。第—鎖固元件園繞 t體以將板體鎖固於爐體上。㈣單元設置於板體之一 端，且鄰近成膜室的基板輸出端。成膜原料供應單元設置 [S1 6 201139722 於板體之另一端，且鄰近成膜室之基板輸出端。 依據本發明之一實施例，上述可拆卸式進出氣結構更 包含第二加熱器，設置於板體中，且位於排氣單元與成膜 原料供應單元之間。 依據本發明之一實施例，上述排氣單元包含至少一個 抽氣管，這些抽氣管具有共同之抽氣室，且這些抽氣管共 同具有一抽氣開口。 依據本發明之一實施例，上述第一製程裝置係基板加 赢 熱裝置。 依據本發明之一實施例，上述第二製程裝置係基板退 火裝置。 藉由運用本發明之導電膜成膜裝置，可節省購買機台 進行改裝的成本，並且藉由連接元件的設置，上述成膜裝 置的前段製程與後段製程具有更彈性的選擇性，且具有可 替換性，達到降低生產成本之目的。 【實施方式】 請參照第1圖，其繪示依照本發明一實施例的一種導 電膜成膜裝置100。導電膜成膜裝置100包含爐體110、輸 送裝置120、加熱器130、可拆卸式進出氣結構140、連接 元件150以及連接元件160。 導電膜的成膜作業係於爐體110内的成膜室111内進 行。成膜室111具有基板輸入端112以及基板輸出端113， 以便於將欲進行成膜作業的基板101經由基板輸入端112 輸入，並經由基板輸出端113輸出。而爐體110具備隔熱 f S1 7 201139722 隔熱材可例如第2圖的保 材，以防止爐體110的熱散失 溫棉114。 請參照第2圖’輸送骏置1〇Λ 6人&、、，± 如可為履帶’用以將進行成_業:基3板：i =給例 端112輸送至基板輸出端113。^一^ w ψ 土、、】入 120可利㈣如滾輪輸送裝置 *，輸送裝置 輪122、繞，些浪輪122外的 i2i SI 裝’而滚輪驅動裝置係受傳動馬達124Another aspect of the present invention provides a conductive film forming apparatus which can be combined with existing float glass and existing glass annealing, and a continuous production line for spray cracking to produce transparent $+ is connected to a conductive oxide kick. According to the above object of the present invention. A detachable input structure is proposed, which comprises a plate body, an exhaust unit, a film forming material supply unit, and a solid component. The exhaust unit is disposed at an end of the plate body.貘 貘 raw material $ = • yuan is set at the other end of the board. The two locking elements respectively lock the exhaust gas (10) Γ Γ early film forming material supply unit to the plate body. The exhaust unit includes === and a gas pipe, and each of the exhaust pipes has a gas flow control valve. These L together have a suction opening. The film forming raw material supply unit comprises a raw material supply hole disposed on one side of the chamber close to the exhaust unit: to the above object of the present invention, a conductive crucible film forming apparatus comprising a furnace body, a conveying device, A heater, a detachable inlet and outlet, a first connecting element, and a second connecting element. The furnace body has a film forming chamber that passes through the furnace body, and the film forming chamber has a substrate input end and a substrate wheel end. The transport device has a transport track that extends through the film forming chamber. The heater is set on the side of the turn. The detachable inlet and outlet structure is disposed above the film forming chamber and faces the input device. The first connection element is disposed at the substrate input end for connection to the first process device. A second connecting element is disposed at the output end of the substrate for connection to the second process device. The detachable inlet and outlet gas structure comprises a plate body, a first lock g element = an exhaust unit, and a film forming material supply unit. The first locking element surrounds the t body to lock the plate body to the furnace body. (4) The unit is disposed at one end of the plate body and adjacent to the substrate output end of the film forming chamber. The film forming raw material supply unit is disposed [S1 6 201139722 at the other end of the plate body and adjacent to the substrate output end of the film forming chamber. According to an embodiment of the invention, the detachable inlet and outlet gas structure further comprises a second heater disposed in the plate body and located between the exhaust unit and the film forming material supply unit. According to an embodiment of the present invention, the exhaust unit includes at least one exhaust pipe having a common pumping chamber, and the exhaust pipes collectively have an exhausting opening. According to an embodiment of the invention, the first process device is a substrate win-win device. According to an embodiment of the invention, the second process device is a substrate annealing device. By using the conductive film forming device of the present invention, the cost of purchasing the machine for modification can be saved, and by the arrangement of the connecting elements, the front-end process and the back-end process of the film forming apparatus have more elastic selectivity, and have Replacement, to achieve the purpose of reducing production costs. [Embodiment] Referring to Figure 1, a conductive film forming apparatus 100 according to an embodiment of the present invention is illustrated. The conductive film forming apparatus 100 includes a furnace body 110, a conveying device 120, a heater 130, a detachable inlet and outlet gas structure 140, a connecting member 150, and a connecting member 160. The film forming operation of the conductive film is performed in the film forming chamber 111 in the furnace body 110. The film forming chamber 111 has a substrate input end 112 and a substrate output end 113 so that the substrate 101 to be subjected to the film forming operation is input through the substrate input end 112 and output via the substrate output end 113. The furnace body 110 is provided with heat insulation f S1 7 201139722 The heat insulating material can be, for example, the material of Fig. 2 to prevent the heat of the furnace body 110 from dissipating the warm cotton 114. Please refer to Fig. 2 for the transmission of 1 〇Λ 6 people &,, ± for the track ‘for the _ industry: base 3: i = for the example end 112 to the substrate output end 113. ^一^ ψ土,,] into 120 can be profitable (4) such as roller conveyor *, conveyor wheel 122, around, i2i SI installed outside the wheel 122 and the roller drive is driven by the motor 124
所驅動。這些滚輪122之、係藉由結合件125結合在- 起。結合件Π5可例如為鏈條或皮帶。滚輪驅動裝置12〇 則與這些滾輪m其中-個的輪轴相互結合，藉由驅動此 滾輪122的輪轴來驅動所有的料122躺。當啟動傳動 馬達124後，滚輪驅動裝置123驅動所有滾輪122轉動， 藉此滾輪122帶動輸送執道121 ’以將基板ι〇1自基板輸 入端112輸送到成膜室111内。在一實施例中，輸送裝置 120更包含控制結構（未繪示）以控制滾輪驅動裝置123的驅 動速度’藉此可控制滚輪122的轉動速度，以達到調整基 板101在成膜室111内的移動速度。 如第1圖所示，加熱器130設置於輸送裝置120的下 方，且設置於爐體110内，以對成膜室111内的基板101 進行加熱處理。在一實施例中，加熱器130的係獨立設置 於輸送裝置120下方。亦即，滾輪122的轉動並不會帶動 加熱器130轉動，使得基板101在受到加熱器130均勻受 熱的情況下，進行成膜製程。 可拆卸式進出氣結構140係獨立設置於成膜室in的 [S1 8 201139722 上方，且面對輸送裝置12〇。請參照第3A圖，此可拆卸式 進出氣結構14〇包含有板體14卜第一鎖固元件142、排氣 單元143以及成膜原料供應單元144。 板體141較佳係以高耐熱的金屬所形成，炎鋪設有隔 熱材，以隔絕爐體内的熱散失。請一併參照第丨圖，第一 鎖固元件142 ’例如包含螺絲142a與螺絲孔i42b之組合。 螺絲孔142b環繞設置於板體141之週邊，藉由螺絲142a 將上述板體141鎖固於爐體11〇上。 φ 請同時參照第1圖與第3B圖，第3B圖係繪示沿著第 3A圖之剖線AA’的剖面示意圖。排氣單元143設置於板體 1。41之一端，且鄰近於成膜室lu的基板輸出端112。排氣 單元」43包含至少-個抽氣管31〇。在本實施例中，這些 抽氣官310中的每一者均具有一氣體流量控制閥32〇位於 管内’藉此可形成均勻的抽氣效果，且這些抽氣管31〇共 同具有抽氣開口 330。藉由抽氣開口 33〇的抽氣可使成膜 室111内產生風道效應，使得成膜室内的氣體會因排氣單 φ 元143的抽取’而自基板輸入端m向基板輸出端II3的 方向流動。因此，當基板101由基板輸入端112移動至基 板輸出端113肖’至此成膜作業已大致完成。在本實施例 中’抽氣開口 330為一條狀結構。在其他實施例中，抽氣 開口 330為一孔狀。在另一實施例中，排氣單元⑷包含 至少一個隔板341 ’使得這些抽氣管中的相鄰每兩者具有 一抽氣室340，如第3D圖所示，藉此可進一步提高抽氣的 均勻性。在一實施例中，氣體流量控制閥32〇可以是球閥 或者蝴蝶閥。 [S1 9 201139722 請同時參照第1圖與第3C圖，第3C圖係繪示沿著第 3A圖之剖線BB’的剖面示意圖。成膜原料供應單元144包 含容室350以及管路360將成膜原料輸送至此容室350 内。容室350更包含至少一個垂直設立之隔板356，以將 容室354分隔成至少二個容室354a以進一步提高成膜原料 之混合均勻性。而原料供應孔352則設置於容室350靠近 排氣單元H3之一侧’而非位於容室350之底部。藉此成 膜原料在容室350底部進一步進行儲存’直至液面高於原 料供應孔352而流向入成膜室111内之基板101，以提高成 膜的均勻度。在一實施例中’成膜原料係以霧氣態喷塗至 基板101上，成膜原料包含，例如可溶性錫鹽的透明導電 化學溶液。 在一實施例中，此可拆卸式進出氣結構更包含加熱器 145，係設置於板體141中，且位於排氣單元143與成膜原 料供應單元144之間。Driven. The rollers 122 are coupled together by a coupling member 125. The coupling member 5 can be, for example, a chain or a belt. The roller drive unit 12 is coupled to one of the axles of the rollers m to drive all of the material 122 to lie by driving the axle of the roller 122. When the drive motor 124 is activated, the roller drive unit 123 drives all of the rollers 122 to rotate, whereby the roller 122 drives the transport path 121' to transport the substrate ι1 from the substrate input end 112 into the film forming chamber 111. In an embodiment, the conveying device 120 further includes a control structure (not shown) to control the driving speed of the roller driving device 123, thereby controlling the rotation speed of the roller 122 to adjust the substrate 101 in the film forming chamber 111. Moving speed. As shown in Fig. 1, the heater 130 is disposed below the conveying device 120 and is disposed in the furnace body 110 to heat the substrate 101 in the film forming chamber 111. In one embodiment, the heaters 130 are independently disposed below the conveyor 120. That is, the rotation of the roller 122 does not cause the heater 130 to rotate, so that the substrate 101 is subjected to a film forming process while being uniformly heated by the heater 130. The detachable inlet and outlet gas structure 140 is independently disposed above the film forming chamber in [S1 8 201139722 and faces the conveying device 12A. Referring to Fig. 3A, the detachable inlet and outlet gas structure 14A includes a plate body 14 and a first locking member 142, an exhaust unit 143, and a film forming material supply unit 144. The plate body 141 is preferably formed of a highly heat-resistant metal, and is provided with a heat insulating material to isolate heat loss in the furnace body. Referring to the first drawing, the first locking member 142' includes, for example, a combination of a screw 142a and a screw hole i42b. The screw hole 142b is disposed around the periphery of the plate body 141, and the plate body 141 is locked to the furnace body 11 by screws 142a. φ Please refer to Fig. 1 and Fig. 3B at the same time. Fig. 3B is a schematic cross-sectional view taken along line AA' of Fig. 3A. The exhaust unit 143 is disposed at one end of the plate body 1.41 and adjacent to the substrate output end 112 of the film forming chamber lu. The exhaust unit "43" includes at least one of the exhaust pipes 31A. In the present embodiment, each of the air extractors 310 has a gas flow control valve 32 located in the tube 'by which a uniform pumping effect can be formed, and the air suction tubes 31 have a pumping opening 330 in common. . The air passage effect is generated in the film forming chamber 111 by the pumping of the air blowing opening 33, so that the gas in the film forming chamber is extracted from the substrate input end m to the substrate output end II3 due to the extraction of the exhaust gas φ element 143. The direction of flow. Therefore, when the substrate 101 is moved from the substrate input end 112 to the substrate output end 113, the film forming operation has been substantially completed. In the present embodiment, the suction opening 330 has a strip-like structure. In other embodiments, the suction opening 330 is a hole. In another embodiment, the venting unit (4) includes at least one baffle 341' such that adjacent ones of the venting tubes have a plenum 340, as shown in Figure 3D, thereby further enhancing pumping Uniformity. In an embodiment, the gas flow control valve 32A may be a ball valve or a butterfly valve. [S1 9 201139722 Please refer to FIG. 1 and FIG. 3C simultaneously, and FIG. 3C is a schematic cross-sectional view taken along line BB' of FIG. 3A. The film forming material supply unit 144 includes a chamber 350 and a line 360 for conveying the film forming material into the chamber 350. The chamber 350 further includes at least one vertically disposed partition 356 to divide the chamber 354 into at least two chambers 354a to further enhance the mixing uniformity of the film forming material. The raw material supply hole 352 is disposed in the chamber 350 near one side of the exhaust unit H3 rather than at the bottom of the chamber 350. Thereby, the film forming material is further stored at the bottom of the chamber 350 until the liquid level is higher than the raw material supply hole 352 and flows to the substrate 101 which is inserted into the film forming chamber 111 to improve the uniformity of film formation. In one embodiment, the film forming material is sprayed onto the substrate 101 in a mist state, the film forming material comprising, for example, a transparent conductive chemical solution of a soluble tin salt. In one embodiment, the detachable inlet and outlet gas structure further includes a heater 145 disposed in the plate body 141 and located between the exhaust unit 143 and the film forming raw material supply unit 144.
睛參照第4圖，兵係繪示根據本發明一實施例的可拆 卸式進出氣結構440。此可拆卸式進出氣結構44〇更包含 第二鎖固兀件以及第三鎖固元件，例如第4圖之複數個扣 環441、442。藉由這些扣環44卜442,分別將排氣單元 143以及成膜原料單元144可拆卸式地鎖固於板體141上。 如此有利於拆卸錢原料供應單& 143，以清除附著於營故 以及排孔早兀 例中，亦可視製程需求^的成膜原料。或者，在其他實施 請同時參照第丨圖與::膜原料供應單元144。 本發明一實施例之導齋1、 圖’其中弟5圖係繪示依據 祺成臈裝置100之立體側示圖。連 10 [S1 201139722 件150、160係分別設置於此導電膜成膜裝置_之基 ^入端m以及基板輸出心3。連接元件15〇係用以連 =導電膜成膜裝置_至第〜製料置，例如基板加熱 ^置50Ga，以使得基板HH |進到此導電膜成膜裝置· 一預，度：連接元件160係用以連接此導電膜 =裝^°°至第二製程裝置，例如基板退火裝置5_， ^吏付練HH錢行祕作業後可 缺 實施例中，第一製程裳置以及第二製程裝㈣ 可根據實際製程需求以替換不同的製程裝置。驟裝置係 由上述本發明實施方式可知， : 膜裝置具有可節省改裝機台成本的二本 性的選擇性，換性，有更彈 此外’藉由可拆卸式進出氣結構的本之目的。 «置的成膜原料供應f路以 I電膜成膜 清洗容易的優點。可以一導電拆卸方便以及 ，出氣結構，在清除附著於管路.内的成^配兩可拆卸式 氣=行替換，藉此生產線不會因清洗而進 雖…、本發明已以實施方式 分止 定本發明’任何熟習此技藝者，：離：其並非用以限 範圍内’當可作各種之更動與發明之精神和 圍當視後附之中請專利範圍所界定者為準。發明之保護範 圖式簡單說明】 目的、特徵、優點與實施例 為讓本發明之上述和其他 201139722 能更明顯易懂，所附圖式之說明如下： 第1圖係繪示依照本發明一實施例之導電膜成膜裝置 的結構示意圖。 第2圖係繪示依照本發明一實施例之輸送裝置的結構 示意圖。 第3A圖係繪示依照本發明一實施例的可拆卸式進出 氣結構的結構示意圖。 第3B圖係繪示沿著第3A圖之剖線AA’的剖面示意圖。 第3C圖係繪示沿著第3A圖之剖線BB’的剖面示意圖。 第3D圖係繪示依照本發明一實施例的排氣單元的剖 面示意圖。 第4圖係繪示依照本發明另一實施例之可拆卸式進出 氣結構之結構示意圖。 第5圖係繪示依照本發明另一實施例之導電膜成膜裝 置的結構示意圖。 【主要元件符號說明】 101 :基板 111 :成膜室 113 :基板輸出端 120 :輸送裝置 122 :滾輪 124 :傳動馬達 130 :加熱器 100 :導電膜成膜裝置 110 :爐體 112 :基板輸入端 114 ·保溫棉 121 :輸送執道 123 :滾輪驅動裝置 125 :結合件 140 :可拆卸式進出氣結構 141 :板體 201139722 142 :第一鎖固元件 142a 142b :螺絲孔 143 ： 144 :成膜原料供應單元 145 ： 310 :抽氣管 150、 330 :抽氣開口 320 ： 341 :隔板 340 ： 350 :容室 352 ： 353 :容室 354 ： 354a :容室 356 ： 440 :可拆卸式進出氣結構 441、 500a :基板加熱裝置 500b :螺絲 排氣單元 加熱器 160 :連接元件 氣體流量控制閥 抽氣室 原料供應孔 容室 隔板 442 :扣環 :基板退火裝置Referring to Figure 4, the continuation unit depicts a detachable inlet and outlet structure 440 in accordance with an embodiment of the present invention. The detachable inlet and outlet structure 44 further includes a second locking member and a third locking member, such as a plurality of buckles 441, 442 of FIG. The venting unit 143 and the film forming material unit 144 are detachably locked to the plate body 141 by the buckles 44 and 442, respectively. This is beneficial to the demolition of the raw material supply sheet & 143 to remove the film-forming raw materials that are attached to the operation and in the case of early venting. Alternatively, in other embodiments, please refer to the following figure:: Membrane material supply unit 144. In accordance with an embodiment of the present invention, a schematic diagram of a device according to the device 100 is shown. 10 [S1 201139722 pieces 150 and 160 are respectively provided at the base terminal m of the conductive film forming apparatus _ and the substrate output core 3. The connecting member 15 is used for connecting the conductive film forming device _ to the first material, for example, the substrate heating device 50Ga, so that the substrate HH | enters the conductive film forming device. 160 is used to connect the conductive film = ^ ° ° to the second process device, such as the substrate annealing device 5_, ^ 吏 练 H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H H Packing (4) Different process units can be replaced according to actual process requirements. The apparatus of the present invention is known from the above embodiments of the present invention: the membrane apparatus has the selectivity of the two natures which can save the cost of the modified machine, and is more flexible and has the purpose of the detachable inlet and outlet gas structure. «The film-forming raw material supply is provided with the advantage of easy cleaning by I film formation. It can be easily disassembled by a conductive and the air outlet structure, and the two detachable gas=rows are replaced in the cleaning and adhering to the pipeline, so that the production line does not advance due to cleaning. The present invention has been implemented by way of example. </ RTI> </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; </ RTI> <RTIgt; BRIEF DESCRIPTION OF THE DRAWINGS [0007] The objects, features, advantages and embodiments of the present invention are made more apparent from the above and other 201139722 of the present invention. The description of the drawings is as follows: Figure 1 shows a A schematic structural view of a conductive film forming apparatus of an embodiment. Figure 2 is a schematic view showing the structure of a conveying apparatus in accordance with an embodiment of the present invention. Fig. 3A is a schematic view showing the structure of a detachable inlet and outlet gas structure according to an embodiment of the present invention. Fig. 3B is a schematic cross-sectional view taken along line AA' of Fig. 3A. Fig. 3C is a schematic cross-sectional view taken along line BB' of Fig. 3A. Fig. 3D is a schematic cross-sectional view showing an exhaust unit in accordance with an embodiment of the present invention. Figure 4 is a schematic view showing the structure of a detachable inlet and outlet gas structure in accordance with another embodiment of the present invention. Fig. 5 is a view showing the structure of a film forming apparatus for a conductive film according to another embodiment of the present invention. [Main component symbol description] 101: Substrate 111: Film forming chamber 113: Substrate output terminal 120: Conveying device 122: Roller 124: Transmission motor 130: Heater 100: Conductive film forming device 110: Furnace body 112: Substrate input end 114 · Insulation cotton 121 : Conveying channel 123 : Roller driving device 125 : Bonding member 140 : Removable inlet and outlet gas structure 141 : Plate body 201139722 142 : First locking element 142a 142b : Screw hole 143 : 144 : Film forming material Supply unit 145: 310: exhaust pipe 150, 330: suction opening 320: 341: partition 340: 350: chamber 352: 353: chamber 354: 354a: chamber 356: 440: detachable inlet and outlet structure 441 , 500a : Substrate heating device 500b : Screw exhaust unit heater 160 : Connecting element gas flow control valve Exhaust chamber raw material supply hole chamber partition 442 : Buckle: Substrate annealing device