TW201009119A - Copper foil for printed circuit board, method of preparing the same, and flexible copper clad laminate using polyamic acid precursor and copper foil - Google Patents
Copper foil for printed circuit board, method of preparing the same, and flexible copper clad laminate using polyamic acid precursor and copper foil Download PDFInfo
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- TW201009119A TW201009119A TW098124127A TW98124127A TW201009119A TW 201009119 A TW201009119 A TW 201009119A TW 098124127 A TW098124127 A TW 098124127A TW 98124127 A TW98124127 A TW 98124127A TW 201009119 A TW201009119 A TW 201009119A
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- Prior art keywords
- copper foil
- compound
- copper
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 260
- 239000011889 copper foil Substances 0.000 title claims abstract description 167
- 239000010949 copper Substances 0.000 title claims description 94
- 229910052802 copper Inorganic materials 0.000 title claims description 92
- 238000000034 method Methods 0.000 title claims description 38
- 229920005575 poly(amic acid) Polymers 0.000 title claims description 8
- 239000002243 precursor Substances 0.000 title claims 5
- 150000001875 compounds Chemical class 0.000 claims abstract description 97
- 238000004381 surface treatment Methods 0.000 claims abstract description 46
- 239000001257 hydrogen Substances 0.000 claims abstract description 17
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 17
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 7
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910000077 silane Inorganic materials 0.000 claims abstract description 6
- 125000006273 (C1-C3) alkyl group Chemical group 0.000 claims abstract 2
- 125000006527 (C1-C5) alkyl group Chemical group 0.000 claims abstract 2
- 239000010410 layer Substances 0.000 claims description 115
- 239000000203 mixture Substances 0.000 claims description 86
- 230000000052 comparative effect Effects 0.000 claims description 76
- -1 decyl compound Chemical class 0.000 claims description 51
- 229920001721 polyimide Polymers 0.000 claims description 38
- 239000002966 varnish Substances 0.000 claims description 38
- 238000006243 chemical reaction Methods 0.000 claims description 34
- 239000000047 product Substances 0.000 claims description 34
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 27
- 230000015572 biosynthetic process Effects 0.000 claims description 25
- 125000000217 alkyl group Chemical group 0.000 claims description 24
- 239000002253 acid Substances 0.000 claims description 22
- 238000004519 manufacturing process Methods 0.000 claims description 22
- 230000007246 mechanism Effects 0.000 claims description 22
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 21
- 239000002904 solvent Substances 0.000 claims description 21
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 20
- 238000005259 measurement Methods 0.000 claims description 19
- 239000011259 mixed solution Substances 0.000 claims description 18
- 239000000178 monomer Substances 0.000 claims description 18
- 239000000243 solution Substances 0.000 claims description 18
- 238000003786 synthesis reaction Methods 0.000 claims description 18
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 claims description 17
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims description 16
- 239000011877 solvent mixture Substances 0.000 claims description 16
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 15
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 15
- 238000002360 preparation method Methods 0.000 claims description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 238000011156 evaluation Methods 0.000 claims description 14
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 13
- 150000004985 diamines Chemical class 0.000 claims description 13
- 238000002156 mixing Methods 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 13
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 12
- 238000007747 plating Methods 0.000 claims description 12
- 229910000831 Steel Inorganic materials 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 11
- 239000010959 steel Substances 0.000 claims description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 claims description 10
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 claims description 10
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 10
- 238000001035 drying Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 238000007719 peel strength test Methods 0.000 claims description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- 229940126214 compound 3 Drugs 0.000 claims description 9
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 9
- 150000001412 amines Chemical class 0.000 claims description 8
- 230000008859 change Effects 0.000 claims description 8
- 239000011651 chromium Substances 0.000 claims description 8
- 150000002466 imines Chemical class 0.000 claims description 8
- 238000012360 testing method Methods 0.000 claims description 8
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 7
- 229940125904 compound 1 Drugs 0.000 claims description 7
- 238000002845 discoloration Methods 0.000 claims description 7
- 239000011888 foil Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 239000012756 surface treatment agent Substances 0.000 claims description 7
- OKKJLVBELUTLKV-MZCSYVLQSA-N Deuterated methanol Chemical compound [2H]OC([2H])([2H])[2H] OKKJLVBELUTLKV-MZCSYVLQSA-N 0.000 claims description 6
- 150000001845 chromium compounds Chemical class 0.000 claims description 6
- 239000003792 electrolyte Substances 0.000 claims description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 6
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 6
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 6
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 claims description 5
- 229920000954 Polyglycolide Polymers 0.000 claims description 5
- 229910001297 Zn alloy Inorganic materials 0.000 claims description 5
- 125000003545 alkoxy group Chemical group 0.000 claims description 5
- 239000002585 base Substances 0.000 claims description 5
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 125000006612 decyloxy group Chemical group 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 239000004633 polyglycolic acid Substances 0.000 claims description 5
- 238000011282 treatment Methods 0.000 claims description 5
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 claims description 5
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 claims description 4
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 4
- 150000008064 anhydrides Chemical class 0.000 claims description 4
- 230000004888 barrier function Effects 0.000 claims description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 229940117975 chromium trioxide Drugs 0.000 claims description 4
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 4
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 239000011247 coating layer Substances 0.000 claims description 4
- 239000003086 colorant Substances 0.000 claims description 4
- 238000000151 deposition Methods 0.000 claims description 4
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 claims description 4
- XPPKVPWEQAFLFU-UHFFFAOYSA-J diphosphate(4-) Chemical compound [O-]P([O-])(=O)OP([O-])([O-])=O XPPKVPWEQAFLFU-UHFFFAOYSA-J 0.000 claims description 4
- 235000011180 diphosphates Nutrition 0.000 claims description 4
- 229940093499 ethyl acetate Drugs 0.000 claims description 4
- 235000019439 ethyl acetate Nutrition 0.000 claims description 4
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims description 4
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- IBIKHMZPHNKTHM-RDTXWAMCSA-N merck compound 25 Chemical compound C1C[C@@H](C(O)=O)[C@H](O)CN1C(C1=C(F)C=CC=C11)=NN1C(=O)C1=C(Cl)C=CC=C1C1CC1 IBIKHMZPHNKTHM-RDTXWAMCSA-N 0.000 claims description 4
- 239000012044 organic layer Substances 0.000 claims description 4
- 230000000704 physical effect Effects 0.000 claims description 4
- 229920000768 polyamine Polymers 0.000 claims description 4
- 230000001568 sexual effect Effects 0.000 claims description 4
- 230000003746 surface roughness Effects 0.000 claims description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 4
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 claims description 4
- JVERADGGGBYHNP-UHFFFAOYSA-N 5-phenylbenzene-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1=C(C(O)=O)C(C(=O)O)=CC(C=2C=CC=CC=2)=C1C(O)=O JVERADGGGBYHNP-UHFFFAOYSA-N 0.000 claims description 3
- 108010002350 Interleukin-2 Proteins 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 3
- 108010039918 Polylysine Proteins 0.000 claims description 3
- 239000003513 alkali Substances 0.000 claims description 3
- 239000007795 chemical reaction product Substances 0.000 claims description 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 claims description 3
- 238000010835 comparative analysis Methods 0.000 claims description 3
- DOBRDRYODQBAMW-UHFFFAOYSA-N copper(i) cyanide Chemical compound [Cu+].N#[C-] DOBRDRYODQBAMW-UHFFFAOYSA-N 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000000413 hydrolysate Substances 0.000 claims description 3
- 125000002883 imidazolyl group Chemical group 0.000 claims description 3
- 239000003112 inhibitor Substances 0.000 claims description 3
- 239000004922 lacquer Substances 0.000 claims description 3
- 229940018564 m-phenylenediamine Drugs 0.000 claims description 3
- 229920000656 polylysine Polymers 0.000 claims description 3
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims description 2
- OHVLMTFVQDZYHP-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CN1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O OHVLMTFVQDZYHP-UHFFFAOYSA-N 0.000 claims description 2
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 claims description 2
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 claims description 2
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 claims description 2
- WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 claims description 2
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 claims description 2
- BWGRDBSNKQABCB-UHFFFAOYSA-N 4,4-difluoro-N-[3-[3-(3-methyl-5-propan-2-yl-1,2,4-triazol-4-yl)-8-azabicyclo[3.2.1]octan-8-yl]-1-thiophen-2-ylpropyl]cyclohexane-1-carboxamide Chemical compound CC(C)C1=NN=C(C)N1C1CC2CCC(C1)N2CCC(NC(=O)C1CCC(F)(F)CC1)C1=CC=CS1 BWGRDBSNKQABCB-UHFFFAOYSA-N 0.000 claims description 2
- SXPGQGNWEWPWQZ-UHFFFAOYSA-N 4-(triethoxymethyl)dodecan-1-amine Chemical compound NCCCC(C(OCC)(OCC)OCC)CCCCCCCC SXPGQGNWEWPWQZ-UHFFFAOYSA-N 0.000 claims description 2
- 241000208340 Araliaceae Species 0.000 claims description 2
- 229910000531 Co alloy Inorganic materials 0.000 claims description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 claims description 2
- 229910000990 Ni alloy Inorganic materials 0.000 claims description 2
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 claims description 2
- 235000003140 Panax quinquefolius Nutrition 0.000 claims description 2
- 229920000388 Polyphosphate Polymers 0.000 claims description 2
- 229920001646 UPILEX Polymers 0.000 claims description 2
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 claims description 2
- 150000001413 amino acids Chemical class 0.000 claims description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 claims description 2
- 239000012964 benzotriazole Substances 0.000 claims description 2
- OUFLLVQXSGGKOV-UHFFFAOYSA-N copper ruthenium Chemical compound [Cu].[Ru].[Ru].[Ru] OUFLLVQXSGGKOV-UHFFFAOYSA-N 0.000 claims description 2
- 239000007822 coupling agent Substances 0.000 claims description 2
- 229960004643 cupric oxide Drugs 0.000 claims description 2
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 210000003298 dental enamel Anatomy 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 235000008434 ginseng Nutrition 0.000 claims description 2
- 150000002894 organic compounds Chemical class 0.000 claims description 2
- 239000003973 paint Substances 0.000 claims description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims description 2
- 235000021317 phosphate Nutrition 0.000 claims description 2
- 239000010452 phosphate Substances 0.000 claims description 2
- 239000001205 polyphosphate Substances 0.000 claims description 2
- 235000011176 polyphosphates Nutrition 0.000 claims description 2
- 108010026466 polyproline Proteins 0.000 claims description 2
- 238000002390 rotary evaporation Methods 0.000 claims description 2
- 238000005728 strengthening Methods 0.000 claims description 2
- 229940014800 succinic anhydride Drugs 0.000 claims description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 2
- 239000004246 zinc acetate Substances 0.000 claims description 2
- 239000011592 zinc chloride Substances 0.000 claims description 2
- 235000005074 zinc chloride Nutrition 0.000 claims description 2
- 150000003752 zinc compounds Chemical class 0.000 claims description 2
- GTLDTDOJJJZVBW-UHFFFAOYSA-N zinc cyanide Chemical compound [Zn+2].N#[C-].N#[C-] GTLDTDOJJJZVBW-UHFFFAOYSA-N 0.000 claims description 2
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 claims description 2
- 229910000368 zinc sulfate Inorganic materials 0.000 claims description 2
- 229960001763 zinc sulfate Drugs 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 5
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 claims 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 3
- 239000005864 Sulphur Substances 0.000 claims 3
- 229910045601 alloy Inorganic materials 0.000 claims 2
- 239000000956 alloy Substances 0.000 claims 2
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N alpha-methyl toluene Natural products CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 claims 2
- 235000010290 biphenyl Nutrition 0.000 claims 2
- 239000004305 biphenyl Substances 0.000 claims 2
- 238000012937 correction Methods 0.000 claims 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 claims 2
- 238000009713 electroplating Methods 0.000 claims 2
- 239000007888 film coating Substances 0.000 claims 2
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- 229910052732 germanium Inorganic materials 0.000 claims 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims 2
- NOOLISFMXDJSKH-UTLUCORTSA-N (+)-Neomenthol Chemical group CC(C)[C@@H]1CC[C@@H](C)C[C@@H]1O NOOLISFMXDJSKH-UTLUCORTSA-N 0.000 claims 1
- VIMMECPCYZXUCI-MIMFYIINSA-N (4s,6r)-6-[(1e)-4,4-bis(4-fluorophenyl)-3-(1-methyltetrazol-5-yl)buta-1,3-dienyl]-4-hydroxyoxan-2-one Chemical compound CN1N=NN=C1C(\C=C\[C@@H]1OC(=O)C[C@@H](O)C1)=C(C=1C=CC(F)=CC=1)C1=CC=C(F)C=C1 VIMMECPCYZXUCI-MIMFYIINSA-N 0.000 claims 1
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 claims 1
- AFFLGGQVNFXPEV-UHFFFAOYSA-N 1-decene Chemical group CCCCCCCCC=C AFFLGGQVNFXPEV-UHFFFAOYSA-N 0.000 claims 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 claims 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 claims 1
- BGAJNPLDJJBRHK-UHFFFAOYSA-N 3-[2-[5-(3-chloro-4-propan-2-yloxyphenyl)-1,3,4-thiadiazol-2-yl]-3-methyl-6,7-dihydro-4h-pyrazolo[4,3-c]pyridin-5-yl]propanoic acid Chemical compound C1=C(Cl)C(OC(C)C)=CC=C1C1=NN=C(N2C(=C3CN(CCC(O)=O)CCC3=N2)C)S1 BGAJNPLDJJBRHK-UHFFFAOYSA-N 0.000 claims 1
- MTJGVAJYTOXFJH-UHFFFAOYSA-N 3-aminonaphthalene-1,5-disulfonic acid Chemical compound C1=CC=C(S(O)(=O)=O)C2=CC(N)=CC(S(O)(=O)=O)=C21 MTJGVAJYTOXFJH-UHFFFAOYSA-N 0.000 claims 1
- BCJIMAHNJOIWKQ-UHFFFAOYSA-N 4-[(1,3-dioxo-2-benzofuran-4-yl)oxy]-2-benzofuran-1,3-dione Chemical compound O=C1OC(=O)C2=C1C=CC=C2OC1=CC=CC2=C1C(=O)OC2=O BCJIMAHNJOIWKQ-UHFFFAOYSA-N 0.000 claims 1
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 claims 1
- 108010087765 Antipain Proteins 0.000 claims 1
- 239000004475 Arginine Substances 0.000 claims 1
- YDNKGFDKKRUKPY-JHOUSYSJSA-N C16 ceramide Natural products CCCCCCCCCCCCCCCC(=O)N[C@@H](CO)[C@H](O)C=CCCCCCCCCCCCCC YDNKGFDKKRUKPY-JHOUSYSJSA-N 0.000 claims 1
- 229910052684 Cerium Inorganic materials 0.000 claims 1
- 229920000877 Melamine resin Polymers 0.000 claims 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 claims 1
- ABHSCNLDUBMZKC-UHFFFAOYSA-N NCCCC(C(OC)(OC)OC)CCCCCCC Chemical compound NCCCC(C(OC)(OC)OC)CCCCCCC ABHSCNLDUBMZKC-UHFFFAOYSA-N 0.000 claims 1
- YBKCXAXZVFSSCM-UHFFFAOYSA-N NCCCC(CCCCCCCCC)CCCCCCCCCCCCC Chemical compound NCCCC(CCCCCCCCC)CCCCCCCCCCCCC YBKCXAXZVFSSCM-UHFFFAOYSA-N 0.000 claims 1
- 241000237502 Ostreidae Species 0.000 claims 1
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 claims 1
- 235000014676 Phragmites communis Nutrition 0.000 claims 1
- 239000004793 Polystyrene Substances 0.000 claims 1
- 206010037660 Pyrexia Diseases 0.000 claims 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims 1
- QAAXRTPGRLVPFH-UHFFFAOYSA-N [Bi].[Cu] Chemical compound [Bi].[Cu] QAAXRTPGRLVPFH-UHFFFAOYSA-N 0.000 claims 1
- FHKNFXAIEAYRKQ-UHFFFAOYSA-N [Cu].[Ir] Chemical compound [Cu].[Ir] FHKNFXAIEAYRKQ-UHFFFAOYSA-N 0.000 claims 1
- 238000002679 ablation Methods 0.000 claims 1
- SDNYTAYICBFYFH-TUFLPTIASA-N antipain Chemical compound NC(N)=NCCC[C@@H](C=O)NC(=O)[C@H](C(C)C)NC(=O)[C@H](CCCN=C(N)N)NC(=O)N[C@H](C(O)=O)CC1=CC=CC=C1 SDNYTAYICBFYFH-TUFLPTIASA-N 0.000 claims 1
- ODKSFYDXXFIFQN-UHFFFAOYSA-N arginine Natural products OC(=O)C(N)CCCNC(N)=N ODKSFYDXXFIFQN-UHFFFAOYSA-N 0.000 claims 1
- 239000012965 benzophenone Substances 0.000 claims 1
- 229940106189 ceramide Drugs 0.000 claims 1
- ZVEQCJWYRWKARO-UHFFFAOYSA-N ceramide Natural products CCCCCCCCCCCCCCC(O)C(=O)NC(CO)C(O)C=CCCC=C(C)CCCCCCCCC ZVEQCJWYRWKARO-UHFFFAOYSA-N 0.000 claims 1
- 239000000470 constituent Substances 0.000 claims 1
- HPAXFNMMMBLYJU-UHFFFAOYSA-N copper sulfamic acid Chemical compound [Cu].S(N)(O)(=O)=O HPAXFNMMMBLYJU-UHFFFAOYSA-N 0.000 claims 1
- 229940109275 cyclamate Drugs 0.000 claims 1
- 238000010586 diagram Methods 0.000 claims 1
- FUUFJHZKPQSDQL-UHFFFAOYSA-N dimethoxy-[4-(oxiran-2-ylmethoxy)butoxy]-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound C(C1CO1)OCCCCO[Si](OC)(OC)CCCOCC1CO1 FUUFJHZKPQSDQL-UHFFFAOYSA-N 0.000 claims 1
- 238000005530 etching Methods 0.000 claims 1
- 238000011049 filling Methods 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 125000005462 imide group Chemical group 0.000 claims 1
- 210000004185 liver Anatomy 0.000 claims 1
- 150000004988 m-phenylenediamines Chemical class 0.000 claims 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims 1
- UZOAUVVPRBZUPQ-UHFFFAOYSA-N n,n-bis(sulfanyl)acetamide Chemical compound CC(=O)N(S)S UZOAUVVPRBZUPQ-UHFFFAOYSA-N 0.000 claims 1
- VVGIYYKRAMHVLU-UHFFFAOYSA-N newbouldiamide Natural products CCCCCCCCCCCCCCCCCCCC(O)C(O)C(O)C(CO)NC(=O)CCCCCCCCCCCCCCCCC VVGIYYKRAMHVLU-UHFFFAOYSA-N 0.000 claims 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 claims 1
- 235000020636 oyster Nutrition 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 229920002223 polystyrene Polymers 0.000 claims 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 claims 1
- 150000004060 quinone imines Chemical class 0.000 claims 1
- 150000003377 silicon compounds Chemical class 0.000 claims 1
- 125000005373 siloxane group Chemical group [SiH2](O*)* 0.000 claims 1
- 238000004513 sizing Methods 0.000 claims 1
- 239000001384 succinic acid Substances 0.000 claims 1
- 239000002352 surface water Substances 0.000 claims 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 claims 1
- 229910052725 zinc Inorganic materials 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 19
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 4
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XJDCHDFUMGSEHD-UHFFFAOYSA-N NCCCC(C(OC)(OC)OC)CCCCCCCC Chemical compound NCCCC(C(OC)(OC)OC)CCCCCCCC XJDCHDFUMGSEHD-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 2
- 229920002098 polyfluorene Polymers 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- QRZMITSTLWZLER-UHFFFAOYSA-N 2-hydrazinylethanethiol Chemical compound NNCCS QRZMITSTLWZLER-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- OPVHOFITDJSMOD-UHFFFAOYSA-N 4-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C=1C=C2C(=O)OC(=O)C2=CC=1OC1=CC=CC2=C1C(=O)OC2=O OPVHOFITDJSMOD-UHFFFAOYSA-N 0.000 description 1
- 241000219307 Atriplex rosea Species 0.000 description 1
- 101100328518 Caenorhabditis elegans cnt-1 gene Proteins 0.000 description 1
- USWMCMSAHICGFU-UHFFFAOYSA-N O-aminosilylhydroxylamine Chemical compound NO[SiH2]N USWMCMSAHICGFU-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 230000029936 alkylation Effects 0.000 description 1
- 238000005804 alkylation reaction Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 125000003739 carbamimidoyl group Chemical group C(N)(=N)* 0.000 description 1
- SFZULDYEOVSIKM-UHFFFAOYSA-N chembl321317 Chemical compound C1=CC(C(=N)NO)=CC=C1C1=CC=C(C=2C=CC(=CC=2)C(=N)NO)O1 SFZULDYEOVSIKM-UHFFFAOYSA-N 0.000 description 1
- 239000000571 coke Substances 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- DXVWRJRZCMCNEU-UHFFFAOYSA-N dimercaptoamine Chemical compound SNS DXVWRJRZCMCNEU-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- MCQOWYALZVKMAR-UHFFFAOYSA-N furo[3,4-b]pyridine-5,7-dione Chemical compound C1=CC=C2C(=O)OC(=O)C2=N1 MCQOWYALZVKMAR-UHFFFAOYSA-N 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Substances C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- DXFXMYYJKFIEGI-UHFFFAOYSA-N n-decylacetamide Chemical compound CCCCCCCCCCNC(C)=O DXFXMYYJKFIEGI-UHFFFAOYSA-N 0.000 description 1
- 125000005188 oxoalkyl group Chemical group 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- FZYQHMHIALEGMG-MVOHYUIRSA-N pcbb Chemical compound CCCCOC(=O)CCCC1([C@]23C4=C5C=CC6=C7C=CC8=C9C=CC%10=C%11C=CC%12=C(C=C4)[C@]31C1=C3C4=C2C5=C6C=2C7=C8C5=C9C%10=C(C3=C5C4=2)C%11=C%121)C1=CC=CC=C1 FZYQHMHIALEGMG-MVOHYUIRSA-N 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0154—Polyimide
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0307—Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
Abstract
Description
201009119 31972pif 六、發明說明: 【相關申請案】 本申請案主張優先權為2008年7月18日在韓國智財 局申請的韓國專利申請號10-2008-0070081,其揭露内容在 此併入本文參考。 【發明所屬之技術領域】 本發明是有關於一種印刷電路板(printed circuit board ’’ PCB)用的銅箔、銅箔的製備方法以及包含銅箔之可 撓性覆銅層壓板(flexible copper cladlaminate ; FCCL),且 特別是有關於一種包含矽烷基(silane_baseci)化合物或矽烷 基化合物之水解物(hydrolysate)之表面處理薄膜形成於上 之PCB用之經表面處理的銅箔,以及包含此銅箔之fccl。 【先前技術】 可撓性覆銅層壓板(FCCL)為印刷電路板(PCB)之一 種形式’且其現今需求日漸增加。FCCL為由二或三層形 成之多層薄膜,其中聚酿亞胺(p〇lyimide)層壓在銅箔上。 Μ印刷在FCCL上之佈線的準確性增加,姓刻的準確性也 同樣增加,因此需要降低銅箔之表面粗糙度。然而,當降 低銅箔之表面粗糙度時,銅箔與基板(例如,聚醯亞胺薄 膜)之間的剝離強度(peel strength)會下降。在這點上,需 要提高剝離強度之手段。 PCB用的銅箔通常使用矽烷耦合劑為銅箔之表面處 理劑以進行之,用以強化銅镇與基板之間的剝離強度其 揭露於日本專利申請案1990-026097。 201009119 ό iy /zpit 然而,隨著使用在PCB中之銅箔之物理性質的要求 變嚴(tight),仍然需要具有改良物理性質之表面處理薄膜 形成於上之用於PCB的銅羯。 ' 【發明内容】201009119 31972pif VI. Description of the Invention: [Related Application] The present application claims priority to Korean Patent Application No. 10-2008-0070081, filed on Jan. 18, 2008, in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference. reference. BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a copper foil for a printed circuit board ('PCB), a method for preparing a copper foil, and a flexible copper clad laminate for a copper foil. And FCCL), and particularly a surface-treated copper foil for a PCB on which a surface-treated film comprising a hydrolysate comprising a silane-based compound or a hydroxyl compound is formed, and comprising the copper foil Fccl. [Prior Art] Flexible copper clad laminate (FCCL) is one of the forms of printed circuit boards (PCBs) and its current demand is increasing. The FCCL is a multilayer film formed of two or three layers in which a p〇lyimide is laminated on a copper foil.准确性 The accuracy of the wiring printed on the FCCL is increased, and the accuracy of the surname is also increased, so it is necessary to reduce the surface roughness of the copper foil. However, when the surface roughness of the copper foil is lowered, the peel strength between the copper foil and the substrate (e.g., polyimide film) may decrease. At this point, there is a need to improve the peel strength. The copper foil for PCB is usually used as a surface treatment agent for copper foil using a decane coupling agent for strengthening the peel strength between the copper and the substrate. It is disclosed in Japanese Patent Application No. 1990-026097. 201009119 ό iy /zpit However, as the physical properties of the copper foil used in the PCB become tight, there is still a need for a copper enamel for a PCB formed by a surface-treated film having improved physical properties. 'Content of the invention】
本發明提供印刷電路板(PCB)用之經表面處理的銅 Ά,其包含提供基板與銅之間優良剝離強度之新的石夕焼 基化合物或碎烧基化合物的水解物,本發明還提供PCB用 之銅箔的製備方法,以及包含聚醯亞胺層堆疊在PCB用之 銅箔上的可撓性覆銅層壓板(FCCL)。 根據本發明之一方面,提供印刷電路板(PCB)用之經 表面處理的銅箔,其包含形成在銅箔上的防鏽層及形成在 防鏽層上的表面處理薄膜,其中表面處理薄膜包含選自由 式1至式4表示的矽烷基化合物所組成之族群的至少一化 合物,或所述矽烷基化合物的水解物: <式1>The present invention provides a surface treated copper crucible for a printed circuit board (PCB) comprising a hydrolysate of a novel agglomerated compound or a calcined compound which provides excellent peel strength between the substrate and copper, and the present invention also provides A method for preparing a copper foil for PCB, and a flexible copper clad laminate (FCCL) comprising a polyimide layer stacked on a copper foil for PCB. According to an aspect of the invention, there is provided a surface-treated copper foil for a printed circuit board (PCB) comprising a rustproof layer formed on a copper foil and a surface treated film formed on the rustproof layer, wherein the surface treated film At least one compound comprising a group selected from the group consisting of a fluorenyl compound represented by Formulas 1 to 4, or a hydrolyzate of the decyl compound: <Formula 1>
〈式3> 201009119 31972pif<Formula 3> 201009119 31972pif
<式4><Formula 4>
_ 其中R〗、R2及R_3各自獨立為。至。的烷基,且良 及尺5各自獨立為氫或(^至c5的烷基。_ where R, R2 and R_3 are independent of each other. to. The alkyl groups, and the calipers 5 are each independently hydrogen or an alkyl group of (c to c5).
根據本發明之另一方面,提供印刷電路板(pcB)用之 赤阶:處理的鋪的製備方法’此方法包含:於銅羯上形 έ 層'胃洗及乾燥防鏽層形成於上的銅箔,以及塗覆 =盧理^防騎上’且乾燥經塗覆之防鏽層,從而製備表 所心且成物包含選自由式1至式4表示的石夕 二“ Μ之族群的至少—化合物或所述魏基化 <式1>According to another aspect of the present invention, there is provided a red scale for a printed circuit board (PCBB): a method of preparing a treated tile. The method comprises: forming a layer on a copper crucible, a stomach washing and drying a rustproof layer formed thereon. Copper foil, as well as coating = Lu Li ^ anti-riding 'and dry coated rust-proof layer, to prepare the table and the object contains a group selected from the group of Shi Xi two "Μ" represented by Formula 1 to Formula 4 At least - a compound or the above-mentioned Weilkification <Formula 1>
〈式2> 8 201009119<Formula 2> 8 201009119
Jl^/zpu <式3>Jl^/zpu <Formula 3>
〈式4><Formula 4>
其中Ri、R2及r3各自獨立為 及R5各自獨立為氫或〇1 燒基C3的炫基,且4Wherein Ri, R2 and r3 are each independently and R5 is independently a hydrogen or a thiol group of C1, and 4
根據本發明又一方而=凡基。 (rccL),其包含上述pc ’ ^可撓性覆銅層壓板 形成在銅落之表面處理薄媒上的;以及 為讓本發明之上述特徵和優點能=僅下文特 舉實施例,並配合所附圖式作詳細說明如下。 f實施方式】 以下,將根據本發明之實施例更詳細地描述印刷電路 板(PCB)用之經表面處理的銅箔、PCB用之銅箔的製備方法 9 201009119 31972pit 以及可撓性覆銅層壓板(FCCL)。 根據本實施例,PCB用之經表面處理的銅箔包含形成 在銅箔上的防鏽層及形成在防鏽層上的表面處理薄膜其 中表面處理_包含選自由式1至式4表示㈣烧基化合 物所組成之*群的至少—化合物,或所述^^基化合物的 水解物。 <式1〉According to the invention, one side is the other. (rccL) comprising the above-mentioned pc ' ^ flexible copper clad laminate formed on the copper surface treatment thin film; and in order to enable the above features and advantages of the present invention = only the following specific embodiments, and The drawings are described in detail below. f. Embodiments Hereinafter, a surface-treated copper foil for a printed circuit board (PCB), a copper foil for a PCB, and a method for preparing a copper foil for a PCB will be described in more detail according to an embodiment of the present invention. 9 201009119 31972pit and a flexible copper-clad layer Platen (FCCL). According to the embodiment, the surface-treated copper foil for a PCB comprises a rust-preventing layer formed on the copper foil and a surface-treated film formed on the rust-preventing layer, wherein the surface treatment _ comprises a method selected from the group consisting of Formulas 1 to 4 (four) At least a compound of the * group of the base compound, or a hydrolyzate of the compound. <Formula 1>
<式3〉<Formula 3>
<式4><Formula 4>
10 20100911910 201009119
PP
cr 其中R!、R2及R3各自獨立為Cl至Cs的烷基’且R4 及R5各自獨立為氫或(^至C5的烷基。 矽烷基化合物在其一端具有矽氧烷基(siloxane gr0UP) 用以與銅箔形成共價鍵,在其另一端具有咪唑基(imidazole group)和/或亞醯胺基(如咖group) ’其中咪唑基和/或亞醯 胺具有與聚醯亞胺薄膜相似的結構,從而提高與聚醯亞胺 薄膜的鍵結強度。所以,可以提高銅箔與聚醯亞胺薄膜之 間的鍵結強度。 特別是,包含於矽烷基化合物中的烷氧基(alkoxy group ’ -OR)與存在於金屬表面中的經基(hydr〇Xy gr〇Up) 反應,以形成石夕氧燒鍵(siloxanebond)。包含於碎烧基化合 物中的矽氧烷基也可以與金屬表面形成矽氧烷鍵。 根據本發明另一實施例,矽烷基化合物中之心、r2 及R3各自獨立為甲錢乙基,且R4&R5可以為氮。 之間-實麵,可⑽-步於輔與防鏽層 由鋅合金形成 阻熱層之金屬或至幾百奈米㈣。形成 本發月另f施例,可以進一步於銅箱與阻熱層 201009119 31972pif 之間插入小節(nodules)。藉由使具有電流密度為10至150 A/dm2之電流在i〇°C至4(Tc的溫度流經電解液,其中電解 液包含1至40 g/L的銅金屬及30至250 g/L的硫酸。 防鏽層可以包含用作防鏽劑之三氧化鉻(chromium trioxide)、鉻酸(chromic acid)、二鉻酸(dichromic acid)、 , 重鉻酸鈉(sodium dichromate)和鉻酸鹽(chromate)。防鏽層 可以藉由使具有電流密度為〇.〇!至1〇 A/dm2之電流在 10 C至50 c的溫度流經電解液,且防鑛劑的濃度為 至10 g/L,以形成具有數十至數百奈米的厚度。阻熱層可 以由鋅合金、鎳合金或鈷合金形成,且可以形成具有數十 魯 至數百奈米的厚度。 銅箔通常形成在基板上為本發明所述領域所熟知。 雖然省略基板的額外描述,但並不排除使用基板。 根據本發明另一實施例,PCB用之銅箔的製備方法可 以包含:於銅箔上形成防鏽層;清洗及乾燥防鏽層形成柃 上的銅羯,以及塗覆組成物於防鏽層上,且乾燥經塗覆^ 防鏽層’從而製備表面處理薄膜,所述組成物包含選自由 式1至式4表示的石夕炫基化合物所組成之族群的至少一 合物和所述梦烧基化合物的水解物。 鳴 <式1>Cr wherein R!, R2 and R3 are each independently an alkyl group of Cl to Cs and R4 and R5 are each independently hydrogen or an alkyl group of (C to C5. The fluorenyl compound has a siloxane oxyalkyl group at one end thereof (siloxane gr0UP) Used to form a covalent bond with copper foil, and has an imidazole group and/or an amidino group (such as a coffee group) at the other end thereof, wherein the imidazolyl group and/or the amidoxime has a film with a polyimide film. A similar structure, thereby increasing the bonding strength with the polyimide film. Therefore, the bonding strength between the copper foil and the polyimide film can be improved. In particular, the alkoxy group contained in the fluorenyl compound ( Alkoxy group '-OR) reacts with a hydrazine Xy gr〇Up present in the metal surface to form a siloxane bond. The oxoalkyl group contained in the calcined compound can also be used. Forming a decane bond with the metal surface. According to another embodiment of the present invention, the core, r2 and R3 in the fluorenyl compound are each independently a acetophenone, and R4&R5 may be a nitrogen. (10)-step in the auxiliary and anti-rust layer from the zinc alloy to form the heat-resistant layer of metal or to a few hundred nanometers (four) In the case of the present invention, a nodules can be further inserted between the copper box and the heat-resistant layer 201009119 31972pif by making the current having a current density of 10 to 150 A/dm 2 at i 〇 ° C to 4 (The temperature of Tc flows through the electrolyte, wherein the electrolyte contains 1 to 40 g/L of copper metal and 30 to 250 g/L of sulfuric acid. The rustproof layer may contain chromium trioxide as a rust inhibitor , chromic acid, dichromic acid, sodium dichromate, and chromate. The anti-rust layer can be made to have a current density of 〇.〇! to 1 The current of 〇A/dm2 flows through the electrolyte at a temperature of 10 C to 50 c, and the concentration of the anti-mining agent is up to 10 g/L to form a thickness of several tens to several hundreds of nanometers. A zinc alloy, a nickel alloy or a cobalt alloy is formed and can be formed to have a thickness of several tens of lux to several hundreds of nanometers. Copper foil is usually formed on a substrate as is well known in the art of the present invention. Although an additional description of the substrate is omitted, The use of the substrate is not excluded. According to another embodiment of the present invention, a method for preparing a copper foil for a PCB can be The method comprises: forming a rustproof layer on the copper foil; cleaning and drying the rustproof layer to form a copper ruthenium on the ruthenium, and coating the composition on the rustproof layer, and drying the coated rustproof layer to prepare the surface treated film The composition contains at least one compound selected from the group consisting of the shisha compound represented by Formulas 1 to 4 and a hydrolyzate of the dream alkyl compound. Ming <Formula 1>
<式2> 12 201009119 jivv-ipu: <式3><Formula 2> 12 201009119 jivv-ipu: <Formula 3>
<式4><Formula 4>
〇 其中R!、112及113各自獨立為^至Q的烷基,且R4 及R5各自獨立為氫或(^至C5的烷基。〇 wherein R!, 112 and 113 are each independently an alkyl group of ^ to Q, and R4 and R5 are each independently hydrogen or an alkyl group of (C to C5).
銅箔可以藉由在欲進行電鍍之材料或基板上進行銅 電鍍而製備之。在銅電鍍中,可以使用酸電鍍溶液或鹼電 鍍溶液。酸電鍍溶液可以包含硫酸銅(copper sulfate)、氟硼 酸銅(copper fluoroborate)或績醯胺酸銅(sullphamic acid copper)之電鍍溶液,且鹼電鍍溶液可以包含氰化亞銅 (copper cyanide)或焦填酸銅(copper prophosphate)之電艘溶 液。根據本發明一實施例,使用在銅箔之製備中的電錄溶 液並無特別限制,且可以使用本發明所屬領域使用的任何 13 2〇l〇〇9ii9 3l972pif 電鍍溶液。 防鏽層可以藉由電解沈積(electro-depositing)鉻在銅 箔的表面上以形成之。使用的鉻化合物可以包含(例如)三 氧化鉻、鉻酸、二鉻酸、重鉻酸鈉和鉻酸鹽。鉻化合物之 濃度的範圍可以為0.1至10 g/L,例如1.0至10 g/L。當形 成防鏽層時,可以進一步添加增效劑(synergist)以提高鉻化 合物之電解沈積的效率。增效劑的實例可以包含··鋅化合 物例如乙酸鋅(zinc acetate)、氯化辞(zinc chloride)、氰化鋅 (zinc cyanide)、硝酸鋅(zinc nitrate)或硫酸鋅(zinc sulfate); 磷化合物例如磷酸、聚磷酸鹽焦磷酸鹽(polyphosphate pyrophosphate)、鱗酸鹽(phosphate)或焦填酸鹽 (pyrophosphate);以及有機化合物例如苯並三唑 (benzenetriazole)。防鏽層的厚度之範圍可以為01至1〇奈 米。 根據本發明另一實施例,組成物可以包含選自由式j 至式4表示的石夕烧基化合物所組成之族群的至少一化合 物、所述矽烷基化合物之水解物以及溶劑。 矽烷基化合物之數量的範圍可以為組成物的〇〇〇1至 5重量%。當矽烷基化合物的數量為〇 〇〇1重量%或更低 時’表面處理劑之形成的有機層無法充份地塗覆在銅落 上,因此無法提高剝離強度。當矽烷基化合物之數量為5 重量%或更高時’表面處理劑之形成的有機層的厚度増 加’且覆蓋銅落上的小節,因此無法提高剝離強度。 根據本發明另一實施例,溶劑可以包含選自由水、甲 201009119 ^iy/zpn 醇、乙醇、丙酮、曱基乙基網〇11^11丫以11丫11^1;〇116)、曱基乙 基酮(methylethylketone)、乙酸乙酯(ethylacetate)及苯 (benzene)所組成之族群的至少一種。 根據本發明另一實施例,在上述的方法中,於形成防 鏽層之前’可以進一步進行於銅箔上形成阻熱層。形成阻 熱層的細節與關於PCB用之銅箔的描述相同,因此不再重 複0 根據本發明另一實施例’在上述的方法中,於形成阻 〇 熱層之前’可以進一步進行於銅箔上形成小節。在形成小 節中,藉由使用粉狀氧化銅(cupric oxide)產品於銅箔上形 成小節,因此銅箔與額外塗覆層之間的接觸面積增加,從 而提高銅箔與額外塗覆層之間的剝離強度。 根據本發明另一實施例,可撓性覆銅層壓板可以包含 PCB用的銅領以及形成在銅箱上之表面處理薄膜上的聚醯 亞胺薄膜。 可撓性覆銅層壓板根據其使用可以具有二層結構(2_ φ 層)或三層結構(3-層)。 根據本發明另一實施例,聚醯亞胺薄膜可以為聚酿胺 酸(polyamic acid)溶液之硬化產物,且聚醯胺酸可以為至少 一個二酐(dianhydride)單體及至少一個二胺(diamine)單體 的反應產物,其中至少一個二酐單體可以選自由苯均四酸 二酐(pyromellitic dianhydride)、3,3丨,4,4'·二苯酿|四甲酸二肝 (3,3’,4,4’-biphenonetetrahydrocarboxylic anhydride)、 3,3',4,4’-聯苯四叛酸二野(3, 3,, 4, 4,- 15 201009119 31972pit biphenyltetracarboxylic dianhydride)及 3,3',4,4'-氧雙鄰笨二 甲酸酐(3,3’,4,4’-oxydiphthalic anhydride)所組戒之族群,且 至少一個二胺單體可以選自由4,4'·二氨基二苯醚 (4,4’-〇xydianiline)、對苯二胺(para-phenylene diamine)、石夕 氧院二胺(siloxanediamine ; SD)、3,4-二氨基二苯越(3,4-oxydianiline)及間笨二胺(meta-phenylenediamine)所組成之 族群。 矽氧烷二胺(SD)可以具有以下的結構 ch3 -SiO. fH3 -甲I一CH^CH^The copper foil can be prepared by copper plating on a material or substrate to be electroplated. In copper plating, an acid plating solution or an alkali plating solution can be used. The acid plating solution may comprise a plating solution of copper sulfate, copper fluoroborate or sullphamic acid copper, and the alkali plating solution may contain copper cyanide or coke. Electrolyte solution of copper prophosphate. According to an embodiment of the present invention, the electrophotographic solution used in the preparation of the copper foil is not particularly limited, and any 13 2〇l〇〇9ii9 3l972pif plating solution used in the field to which the present invention pertains can be used. The rustproof layer can be formed by electro-depositing chromium on the surface of the copper foil. The chromium compound used may contain, for example, chromium trioxide, chromic acid, dichromic acid, sodium dichromate, and chromate. The concentration of the chromium compound may range from 0.1 to 10 g/L, for example from 1.0 to 10 g/L. When a rustproof layer is formed, a synergist may be further added to increase the efficiency of electrolytic deposition of the chromium compound. Examples of the synergist may include zinc compounds such as zinc acetate, zinc chloride, zinc cyanide, zinc nitrate or zinc sulfate; Compounds such as phosphoric acid, polyphosphate pyrophosphate, phosphate or pyrophosphate; and organic compounds such as benzotriazole. The thickness of the rustproof layer may range from 01 to 1 nanometer. According to another embodiment of the present invention, the composition may comprise at least one compound selected from the group consisting of the compounds of the formulas j to 4, a hydrolyzate of the alkylene compound, and a solvent. The amount of the decyl compound may range from 1 to 5% by weight of the composition. When the amount of the fluorenyl compound is 〇 重量 1% by weight or less, the organic layer formed by the surface treatment agent cannot be sufficiently coated on the copper, so that the peel strength cannot be improved. When the amount of the mercaptoalkyl compound is 5% by weight or more, the thickness of the organic layer formed by the surface treatment agent increases and covers the bar on which the copper falls, so that the peel strength cannot be improved. According to another embodiment of the present invention, the solvent may comprise a solvent selected from the group consisting of water, methyl 201009119 ^iy/zpn alcohol, ethanol, acetone, mercaptoethyl hydrazine 11^11丫11丫11^1; 〇116), fluorenyl group At least one of a group consisting of methylethylketone, ethylacetate, and benzene. According to another embodiment of the present invention, in the above method, the heat-resistant layer may be further formed on the copper foil before the formation of the rust-preventing layer. The details of forming the heat-resistant layer are the same as those described for the copper foil for PCB, and therefore are not repeated. According to another embodiment of the present invention, 'in the above method, before the formation of the barrier layer, the layer can be further performed on the copper foil. Form a subsection. In forming the section, by using a cupric oxide product to form a measure on the copper foil, the contact area between the copper foil and the additional coating layer is increased, thereby increasing the copper foil and the additional coating layer. Peel strength. According to another embodiment of the present invention, the flexible copper clad laminate may comprise a copper collar for a PCB and a polyimide film formed on the surface treated film on the copper case. The flexible copper clad laminate may have a two-layer structure (2_φ layer) or a three-layer structure (3-layer) depending on its use. According to another embodiment of the present invention, the polyimide film may be a hardened product of a polyamic acid solution, and the polyphthalic acid may be at least one dianhydride monomer and at least one diamine ( Diamine) a reaction product of a monomer, wherein at least one dianhydride monomer may be selected from the group consisting of pyromellitic dianhydride, 3,3,4,4'-diphenyl-tetracarboxylic acid (3, 3',4,4'-biphenonetetrahydrocarboxylic anhydride), 3,3',4,4'-biphenyltetrahydro acid dianhydride (3, 3,, 4, 4, - 15 201009119 31972pit biphenyltetracarboxylic dianhydride) and 3,3 ',4,4'-Oxo 3,4'-oxydiphthalic anhydride, and at least one diamine monomer may be selected from 4,4'·two Aminodiphenyl ether (4,4'-〇xydianiline), para-phenylene diamine, siloxanediamine (SD), 3,4-diaminodiphenyl (3,4) -oxydianiline) and a group of meta-phenylenediamine. The oxirane diamine (SD) may have the following structure: ch3 - SiO. fH3 - A I - CH ^ CH ^
在SD的結構中,n的範圍為2至12。 在一酐單體與二胺單體反應之後,聚醯胺酸為 =哪祕鍵連接的化合物。例如,由苯均四酸二_ -乳基一本晰應而得之聚軸酸具有以下結構。In the structure of SD, n ranges from 2 to 12. After the monoanhydride monomer is reacted with the diamine monomer, the polyglycolic acid is a compound to which the bond is attached. For example, a poly-axis acid obtained from a pyromellitic acid bis-lactyl group has the following structure.
❹ S熱處理聚胺暖日夺, 亞胺。 可以得到具有以下結構的聚醯 16 201009119 3iy/^pit❹ S heat treatment polyamine warm day, imine. A polyfluorene having the following structure can be obtained 16 201009119 3iy/^pit
Ο Ο 聚醢胺睃 聚醯胺酸之熱處理在氮環境下於約6〇〇c開始及最後 於約400°C的高溫結束。在聚醯胺酸及聚醯亞胺中,n的範 圍為40至200。 聚醯胺酸壳光漆(varnish)可以例如是PMDA/〇DA混 合物、BTDA/PDA 混合物、BTDA/PMDA/ODA/PDA 混合 物或PMDA/ODA-SD混合物。可以根據其使用而選擇其適 當的混合比率。热处理 醢 Polyamide hydrazine The heat treatment of polylysine ends at about 6 ° C in a nitrogen atmosphere and finally at a high temperature of about 400 ° C. In polylysine and polyimine, n ranges from 40 to 200. The varnish may be, for example, a PMDA/〇DA mixture, a BTDA/PDA mixture, a BTDA/PMDA/ODA/PDA mixture or a PMDA/ODA-SD mixture. The appropriate mixing ratio can be selected according to its use.
以下,將參照下述實例更詳細描述本發明;然而,本 發明並不以此為限。使用Brucker DRX_3()()MHz iH_NMR 及Jasco 610 FT-IR來確認在下述實例中經合成之化合物的 結構。 (梦烧基化合物(1)之合成) 實例1 :化合物1之合成 根據下面的反應機制1來合成由式丨表示的化合物 <反應機制1> 17 1 ° 201009119 31972pil WWNH2 + 1-(3-氨基丙基)喃嗅Hereinafter, the present invention will be described in more detail with reference to the following examples; however, the invention is not limited thereto. The structure of the synthesized compound in the following examples was confirmed using Brucker DRX_3()() MHz iH_NMR and Jasco 610 FT-IR. (Synthesis of Dreaming Compound (1)) Example 1: Synthesis of Compound 1 The compound represented by the formula [1] was synthesized according to the following Reaction Mechanism 1 < Reaction Mechanism 1> 17 1 ° 201009119 31972pil WWNH2 + 1-(3- Aminopropyl)
3·縮水甘油醚氧丙基三甲氧基矽烷 N 巧3 Η 0 API·矽烷 將 162.68 克的四氫咬π南(tetrahydrofurane)、6.259 克 (0.05莫耳)的縮水甘油醚氧丙基三甲氧基石夕燒 (glycidoxypropyltrimethoxysilane)及 11.817 克(0.05 莫耳)的 ® 1-(3-氨基丙基)σ米0坐(l-(3-aminopropyl)-imidazole)倒入 (charged)反應器中並反應6小時,在氮環境下維持反應器 之溫度為95°C,且機械攪拌器以300rpm旋轉。在完成反 應之後,使用旋轉蒸發器2小時以從生成物移除溶劑。然 後,在真空烤箱中乾燥生成物24小時,從而得到7克(產 率98 %)由式1表示的化合物1。 4 NMR (300 MHz, CD3OD) : δ 0.62〜0.68(m,1H)、 〇 1.89〜1.96(m,8H)、1.64〜1.67(t,2H)、2.54〜2.56(t,7H)、 2.58〜2.61(m,6H)、3.28〜3.31(m,SiOCH3)、3.38〜3.40(d, 3H)、3.42〜3.44(d,4H)、3.50〜3.58(m,5H)、3.64(s,-NH-)、 3.80(s,OH)、4.05〜4.10(m,9H)、6.95(s, 10H)、7·12〜7.13(t, 11H)、7.65(s,12H) IR (純(neat), cm'1) : 3650~3200(vOH)、 3300〜3200(vNH)、1120〜1050(v~炫氧基)) 18 201009119 ^ivvzpit (銅箔用表面處理劑組成物的製造) 實例2 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物’將溶劑混合物與在實例1中製備的化合物1混合,以 • 製備具有ιο重量%之化合物1的混合溶液。 (二層FCCL的製造) ❹ 實例3 在實例2中製備的混合溶液單獨靜置60分鐘以進行 水解,然後喷灑在小節、阻熱層及防鏽層依序形成於上的 滾製(rolled)銅箔(IL-2,由Iljin製造)上。接著,使用塗抹 ’ 器(applicat〇r)(C.K貿易公司’模型名:CKAF1〇〇3)塗覆滾 . 製銅箔,從而製備經塗覆之銅箔。滾製銅箔上的小節、阻 熱層及防鏽層分別由銅(Cu)、鋅合金及鉻所形成。在 中於120°C乾燥30分鐘經塗覆之銅箔。 箱 參 以 KRICT-PAA 亮先 (BPDA:PMDA:PDA:ODA=3:7:6:4)噴灑使用表 f 成物處理的銅箔,並使用刮刀(d0Ct0r blade)塗 劑組 環境下於6(TC進行30分鐘、120X:進行3〇分鐘、1 ° =氮 行30分鐘以及4G0°C進行10分鐘來硬化經 ^進 酸,以製備聚醯亞胺薄膜,因此,製備經聚酿胺 覆於上的銅落。在實例3中製備的鋼箱胺薄膜塗 「骑為樣品1。 201009119 31972pif 實例4 以在實例3中同樣的方式製備經聚醯亞胺薄膜塗覆 於上的銅$ ’除了使用由Jooyoung產業有限公司製造的亮 光漆(產品名:JY_001)取代KRICT_PAA亮光漆。在實例4 中製備的銅箔以下稱為樣品2。 實例5 以在實例3中同樣的方式製備經聚醯亞胺薄膜塗覆 於上的銅箔’除了使用由Nikko材料製造的滚製銅箔(產品 籲 名:BHY-22B-T)取代滾製銅箔(IL-2,由Iljin製造),且由 UBE有限公司製造的Upilex形式之亮光漆取代 ICRICT-PAA亮光漆^在實例5中製備的銅箔以下稱為樣品 3 〇 比較性實例1 以在實例3中同樣的方式製備經聚酿亞胺薄膜塗覆 於上的銅箔’除了省略使用表面處理劑組成物來處理銅箱 表面的步驟。在比較性實例1中製備的銅箔以下稱為比較 ® 性樣品1。 比較性實例2 以在實例4中同樣的方式製備經聚醜亞胺薄膜塗覆 於上的鋼萡,除了省略使用表面處理劑組成物來處理銅羯 表面的步驟。在比較性實例2中製備的銅箔以下稱為比較 20 2010091193. Glycidyloxypropyltrimethoxydecane N Qiao 3 Η 0 API·decane will be 162.68 g of tetrahydrofurane, 6.259 g (0.05 mol) of glycidyloxypropyltrimethoxysilane Glycidoxypropyltrimethoxysilane and 11.81 g (0.05 mol) of ® 1-(3-aminopropyl)-sigmoid (l-(3-aminopropyl)-imidazole) were charged into the reactor and reacted 6 The reactor was maintained at a temperature of 95 ° C under a nitrogen atmosphere and the mechanical stirrer was rotated at 300 rpm. After the reaction was completed, a rotary evaporator was used for 2 hours to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 24 hours to obtain 7 g (yield 98%) of Compound 1 represented by Formula 1. 4 NMR (300 MHz, CD3OD): δ 0.62~0.68 (m, 1H), 〇1.89~1.96 (m, 8H), 1.64~1.67 (t, 2H), 2.54~2.56 (t, 7H), 2.58~2.61 (m, 6H), 3.28~3.31 (m, SiOCH3), 3.38~3.40 (d, 3H), 3.42~3.44 (d, 4H), 3.50~3.58 (m, 5H), 3.64 (s, -NH-) , 3.80(s, OH), 4.05~4.10(m, 9H), 6.95(s, 10H), 7.12~7.13(t, 11H), 7.65(s,12H) IR (neat, cm' 1) : 3650~3200(vOH), 3300~3200(vNH), 1120~1050(v~decyloxy)) 18 201009119 ^ivvzpit (Manufacture of surface treatment composition for copper foil) Example 2 by 1 : 9 by volume ratio of water and methanol to obtain a solvent mixture 'The solvent mixture was mixed with the compound 1 prepared in Example 1 to prepare a mixed solution of Compound 1 having ι % by weight. (Manufacture of two-layer FCCL) 实例 Example 3 The mixed solution prepared in Example 2 was allowed to stand alone for 60 minutes for hydrolysis, and then sprayed on the rolled, heat-resistant layer and rust-proof layer sequentially formed on the rolled (rolled) Copper foil (IL-2, manufactured by Iljin). Next, a copper foil was coated using an applicator (C.K Trading Company's model name: CKAF1〇〇3) to prepare a coated copper foil. The bars, the heat-resistant layer and the rust-proof layer on the rolled copper foil are respectively formed of copper (Cu), zinc alloy and chromium. The coated copper foil was dried at 120 ° C for 30 minutes. The box ginseng was sprayed with KRICT-PAA first (BPDA:PMDA:PDA:ODA=3:7:6:4) using copper foil treated with the table f, and using a doctor blade (d0Ct0r blade) in the paint group environment at 6 (TC was carried out for 30 minutes, 120X: 3 minutes, 1 ° = nitrogen for 30 minutes, and 4G0 °C for 10 minutes to harden the acid to prepare a polyimide film, thus preparing a polyamine-coated On the upper copper drop. The steel box amine film prepared in Example 3 was coated as "Riding as Sample 1. 201009119 31972pif Example 4 Preparation of copper coated with polyimide film in the same manner as in Example 3 The KRICT_PAA varnish was replaced with a varnish (product name: JY_001) manufactured by Jooyoung Industries Co., Ltd. The copper foil prepared in Example 4 is hereinafter referred to as Sample 2. Example 5 Preparation of polyfluorene in the same manner as in Example 3. The copper foil coated with an imide film was replaced with a rolled copper foil (product name: BHY-22B-T) made of Nikko material instead of a rolled copper foil (IL-2, manufactured by Iljin), and Substitious varnish made by UBE Co., Ltd. replaces ICRICT-PAA varnish ^ Copper foil prepared in Example 5 Hereinafter referred to as sample 3 〇Comparative Example 1 A copper foil coated with a polyimide film was prepared in the same manner as in Example 3 except that the surface treatment composition was omitted to treat the surface of the copper box. The copper foil prepared in Comparative Example 1 is hereinafter referred to as Comparative® Sample 1. Comparative Example 2 A steel crucible coated with a poly-imine film was prepared in the same manner as in Example 4 except that the surface treatment was omitted. The composition of the composition to treat the surface of the matte. The copper foil prepared in Comparative Example 2 is hereinafter referred to as comparison 20 201009119
Jl^/zpu 性樣品2。 比較性實例3 以在實例5中同樣的方式製備經聚醯亞胺薄臈塗覆 於上的銅箔,除了省略使用表面處理劑組成物來處理銅箔 表面的步驟。在比較性實例3中製備的銅箔以下稱為比較 性樣品3。 評估實例Μ :剝離強度測試 使用ASTMD-638指定的方法量測樣品1至3及比較 性樣品1至3的剝離強度。橫擔速度(cr〇ss_Hea(j Spee(j)為 25 mm/min且樣品的寬度為5 mm。使用Instnm 8516進行 量測。量測的結果如下面的表1所示。 <表1> 剝離強度[kg/cm] I匕較性砂 上b較性£例 0.73 0.32 0.76 0.38 0.58 0.28 如表1所示, 根據本發明之實施例,相比於沒有使用 21 201009119 31V/2pit 表面處理劑組成物製備之比較性樣品1至3,使用包含矽 烧基化合物之表面處理劑組成物製備之樣品1至3於聚醯 亞胺及銅箔之間顯示大幅增加的剝離強度。 評估實例1-2 :防潮性測試 於50 C、相對濕度8〇 %在怪溫渔器(thermo-hygrostat) HIRAYANAPC-R7中儲存樣品】至3進行7天,樣品1至 3的變色(discoloration)明顯。7天後,樣品1至3的顏色沒Jl^/zpu sex sample 2. Comparative Example 3 A copper foil coated with a polyimide film was prepared in the same manner as in Example 5 except that the step of treating the surface of the copper foil using the surface treatment composition was omitted. The copper foil prepared in Comparative Example 3 is hereinafter referred to as Comparative Sample 3. Evaluation Example 剥离: Peel Strength Test The peel strengths of Samples 1 to 3 and Comparative Samples 1 to 3 were measured using the method specified by ASTM D-638. Cross-pitch speed (cr〇ss_Hea (j Spee(j) was 25 mm/min and the width of the sample was 5 mm. Measurement was performed using Instnm 8516. The results of the measurement are shown in Table 1 below. <Table 1> Peel strength [kg/cm] I匕Comparative sand b fairness Example 0.73 0.32 0.76 0.38 0.58 0.28 As shown in Table 1, according to the embodiment of the present invention, compared with no use 21 201009119 31V/2pit surface treatment composition Comparative Samples 1 to 3 for the preparation of the materials, Samples 1 to 3 prepared using the surface treatment composition containing the bismuth-based compound showed a greatly increased peel strength between the polyimide and the copper foil. : Moisture resistance test at 50 C, relative humidity 8〇% in the thermo-hygrostat HIRAYANAPC-R7 stored samples] to 3 for 7 days, sample 1 to 3 discoloration (discoloration) is obvious. After 7 days , the color of samples 1 to 3 is not
有改變。 (石夕燒基化合物(2)之合成) 實例6A:化合物2A之合成 根據下面的反應機制2合成由式2表示的化合物2A。 <反應機制2> 〇There are changes. (Synthesis of the compound (2)) Example 6A: Synthesis of Compound 2A Compound 2A represented by Formula 2 was synthesized according to the following Reaction Mechanism 2. <Reaction mechanism 2> 〇
其中R為甲基。 將125.712克的四氫呋喃、8 9645克(〇.〇5莫耳)的3-氨基丙基二甲氧基石夕燒(3-aminopropyltrimethoxysilane)及 5.0035克(0 05莫耳)的琥绍酸酐(succinic anhydri(ie)倒入反 應器中並反應6小時,在氮環境下維持反應器之溫度為 -5C至5C,且機械攪拌器以30〇rprn旋轉。在完成反應之 22 201009119 jiy/zpu 後’使用旋轉蒸發器2小時以從生成物移除溶劑。然後, 在真空烤箱中乾燥生成物24小時,從而得到13.9克(產率 99%)由式2表示的化合物2A。 ^NMR (300 MHz): δ 0.53~0.58(m, 1H)> 1.42-1.45(m, 2H)、2.29〜2.31(d, 4H)、2.38〜2.43(m,5H)、2.98〜3.00(m, 3H)、3.40〜3.46(m,SiOCH3)、8.00(s,_NH_)、12.00(s,-OH) IR (純,cm-1) : 3650〜3200(vOH)、3300〜3200(vNH)、 ❹ 1650(vCONH)、ii20〜1050(v 梦(从基)) 實例6B :化合物2B之合成 根據下面的反應機制2合成由式2表示的化合物 2B。 <反應機制2>Wherein R is a methyl group. 125.712 g of tetrahydrofuran, 8 9645 g of 3-aminopropyltrimethoxysilane and 5.035 g of (0 05 mol) of succinic anhydri (ie) poured into the reactor and reacted for 6 hours, maintaining the reactor temperature at -5 C to 5 C under nitrogen, and the mechanical stirrer was rotated at 30 〇 rprn. After the completion of the reaction 22 201009119 jiy/zpu 'use The evaporator was rotated for 2 hours to remove the solvent from the product. Then, the product was dried in a vacuum oven for 24 hours to obtain 13.9 g (yield: 99%) of the compound 2A represented by the formula 2. ^NMR (300 MHz): δ 0.53~0.58(m, 1H)> 1.42-1.45(m, 2H), 2.29~2.31(d, 4H), 2.38~2.43(m, 5H), 2.98~3.00(m, 3H), 3.40~3.46 (m, SiOCH3), 8.00 (s, _NH_), 12.00 (s, -OH) IR (pure, cm-1): 3650~3200 (vOH), 3300~3200 (vNH), ❹ 1650 (vCONH), ii20 ~1050 (v Dream (from base)) Example 6B: Synthesis of Compound 2B The compound 2B represented by Formula 2 was synthesized according to the following Reaction Mechanism 2. <Reaction Mechanism 2>
其中R為乙基。 將125.712克的四氫呋喃、11.0685克(0.05莫耳)的 3-氨基丙基三乙氧基石夕院(3-aminopropyltriethoxysilane)及 5.0035克(0.05莫耳)的琥珀酸酐倒入反應器中並反應6小 時,在氮環境下維持反應器之溫度為-5°C至5°C,且機械 攪拌器以300 rpm旋轉。在完成反應之後,使用旋轉蒸發 23 201009119 31972pif 器2小時從生成物移除溶劑。然後,在真空烤箱中乾燥生 成物24小時,從而得到16克(產率99%)由式2表示的化 合物2B。 】HNMR (300 ΜΗζ): δθ.58〜0.60(m,1H)、1.22〜1.25(m, Si-CH2)、1.60~1.63(m,2H)、2.45〜2.49(m,4Η)、2·51 〜2.54(m, 5H)、3.20〜3.25(m,3H)、3.83〜3.87(m, Si-CH3) IR (純,cm·1) : 3650〜3200(voh)、3300〜3200(vNH)、 1650(vCONH)、1120〜l〇5〇(vq炫氧基)) (銅箔用表面處理劑組成物的製造) 實例7至11 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物,將溶劑混合物與在實例6A中製備的化合物2A混合’ 以製備分別具有0.5重量%、1重量%、2重量%、3重量% 及5重量%之化合物2A的混合溶液。 實例12至16 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物,將溶劑混合物與在實例6B中製備的化合物2B混合, 以製備分別具有0.5重量°/〇、1重量%、2重量%、3重量% 及5重量%之化合物2B的混合溶液。 (二層FCCL之製造) 24 201009119 實例17至26 f實例7至16中製備的混合溶液單獨靜置60分鐘以 由:i解:然後分別噴灑在經&塗覆之滾製銅箔(几_2, P 造)上。接著,使用塗抹器塗覆滾製銅箔,從而 二J塗覆之鋼箱。在烤箱中於赋乾、燥30 *鐘經塗覆 袁本、、Π、-Jooyoung產業有限公司(產品名:jy~00 1)製造的 噴丨麗使絲面處糊組成物處理的㈣,並使用刮 刀覆之。 在氮環境下於60〇C進行30分鐘、12(rc進行3〇分 TC進行30分鐘以及備。c進们〇分鐘來硬化經塗 覆之t醯胺酸,以製備聚醯亞胺_,因此,製備經 =薄膜分別塗覆於上的銅箱。在實例17至26中製備的 銅治以下稱為樣品4至13。 比較性實例4 以在實例17中同樣的方式製備經聚醯亞胺薄膜塗覆 於上的銅荡’除了省略使用表面處理劑組成物來處理銅箱 表面的步驟。在比較性實例4中製備的銅箔以下稱為比 性樣品4。 評估實例2-1 :剝離強度測試 使用ASTM D-638指定的方法量測樣品4至13及比 較性樣品4的剝離強度。橫擔速度為25 mm/min且樣品的 25 201009119 31972pif 寬度為5 mm。使用InStron8516進行量測。量測的結果如 下面的表2所示。 〈表2> 剝離強度[kg/cm] 實例Π (樣品4) 0 78 實例18 (樣品5) 0.86 實例19 (樣品6) 實例20 (樣品7) 0.93 1.05 實例21 (樣品8) 1 0.92 實例22 (樣品9) 0 82 實例23 (檨品1〇) 0.89 實例24 (樣品11) 1.02 實例25 (樣品12) 1.12 實例26 (樣品13) 0.94 較性樣品 4) 0.38 如表2所示’根據本發明之實施例,相比於沒有使用 表面處理敝成物製備之比較性樣品4,使用包含魏基 f合物之表面處理劑組成物製備之樣品4至13於聚醯亞胺 4膜及銅_之間顯示大幅增加的剝離強度。 評估實例2-2 :防潮性測試 於50C、相對濕度8〇 %在恆溫溼器Hirayana 26 201009119 PC-R7中儲存樣品4至13進行7天,樣品4至13的變色 明顯。7天後,樣品4至13的顏色沒有改變。 (矽烷基化合物(3)之合成) 實例27 :化合物3之合成 根據下面的反應機制3合成由式3表示的化合物3。 <反應機制3>Wherein R is an ethyl group. 125.712 grams of tetrahydrofuran, 11.08685 grams (0.05 moles) of 3-aminopropyltriethoxysilane and 5.035 grams (0.05 moles) of succinic anhydride were poured into the reactor and reacted for 6 hours. The reactor temperature was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. After the completion of the reaction, the solvent was removed from the product using a rotary evaporation 23 201009119 31972 pif for 2 hours. Then, the resultant was dried in a vacuum oven for 24 hours, thereby obtaining 16 g (yield 99%) of Compound 2B represented by Formula 2. HNMR (300 ΜΗζ): δθ.58~0.60 (m, 1H), 1.22~1.25 (m, Si-CH2), 1.60~1.63 (m, 2H), 2.45~2.49 (m, 4Η), 2.51 ~2.54 (m, 5H), 3.20~3.25 (m, 3H), 3.83~3.87 (m, Si-CH3) IR (pure, cm·1): 3650~3200 (voh), 3300~3200 (vNH), 1650 (vCONH), 1120 to l〇5〇 (vq methoxy)) (Production of surface treatment composition for copper foil) Examples 7 to 11 By mixing water and methanol in a volume ratio of 1:9 to obtain a solvent The mixture was mixed with the compound 2A prepared in Example 6A to prepare a mixed solution of Compound 2A having 0.5% by weight, 1% by weight, 2% by weight, 3% by weight and 5% by weight, respectively. Examples 12 to 16 The solvent mixture was mixed with the compound 2B prepared in Example 6B by mixing water and methanol in a volume ratio of 1:9 to prepare 0.5 wt%/〇, 1 wt%, respectively. A mixed solution of 2% by weight, 3% by weight, and 5% by weight of Compound 2B. (Manufacturing of two-layer FCCL) 24 201009119 Examples 17 to 26 f The mixed solutions prepared in Examples 7 to 16 were allowed to stand alone for 60 minutes to be solved by: i: then separately sprayed on & coated rolled copper foil (several _2, P made). Next, the rolled copper foil was coated with an applicator to thereby coat the steel box. In the oven, dry and dry 30 * clock coated with Yuan Ben, Π, - Jooyoung Industry Co., Ltd. (product name: jy ~ 00 1) manufactured by squirting the silk paste at the surface of the paste composition (four), And use a scraper to cover it. Under a nitrogen atmosphere, the temperature was 60 ° C for 30 minutes, 12 (rc was carried out for 3 minutes, TC for 30 minutes, and prepared for a minute to harden the coated t-proline to prepare polyimine _, Thus, copper boxes to which the films were respectively applied were prepared. The copper treatments prepared in Examples 17 to 26 are hereinafter referred to as Samples 4 to 13. Comparative Example 4 Preparation of Polypyrene in the same manner as in Example 17 The copper film coated on the amine film was omitted except that the surface treatment composition was omitted to treat the surface of the copper box. The copper foil prepared in Comparative Example 4 is hereinafter referred to as Comparative Sample 4. Evaluation Example 2-1: Peel Strength Test The peel strengths of Samples 4 to 13 and Comparative Sample 4 were measured using the method specified in ASTM D-638. The cross-arm speed was 25 mm/min and the sample 25 201009119 31972 pif width was 5 mm. Measurements were performed using InStron 8516. The results of the measurement are shown in Table 2 below. <Table 2> Peel strength [kg/cm] Example Π (Sample 4) 0 78 Example 18 (Sample 5) 0.86 Example 19 (Sample 6) Example 20 (Sample 7 ) 0.93 1.05 Example 21 (Sample 8) 1 0.92 Example 22 (Sample 9) 0 82 Example 23 (Products) 1〇) 0.89 Example 24 (Sample 11) 1.02 Example 25 (Sample 12) 1.12 Example 26 (Sample 13) 0.94 Comparative Sample 4) 0.38 As shown in Table 2 'According to the embodiment of the present invention, compared to no surface used In Comparative Sample 4, which was prepared for the preparation of the composition, Samples 4 to 13 prepared using the surface treatment composition containing the Wei group of the compound showed a greatly increased peel strength between the polyimide film and the copper. Evaluation Example 2-2: Moisture Resistance Test Samples 4 to 13 were stored in a thermostat humidifier Hirayana 26 201009119 PC-R7 for 7 days at 50 C and a relative humidity of 8 ,, and the discoloration of the samples 4 to 13 was remarkable. After 7 days, the colors of samples 4 to 13 did not change. (Synthesis of fluorenyl compound (3)) Example 27: Synthesis of Compound 3 Compound 3 represented by Formula 3 was synthesized according to the following Reaction Mechanism 3. <Reaction mechanism 3>
ΤΛ vn « Ό FOCA^TimS 將125.712克的四氫呋喃、8.9645克(0.05莫耳)的3_ 氨基丙基三曱氧基矽烷及7.4550克(0.05莫耳)的2,3-吡啶 ❹ 二酸酐(2,3-pyridinedicarboxylic anhydride)倒入反應器中並 反應5小時,在氮環境下維持反應器之溫度為^^至, 且機械攪拌器以300 rpm旋轉。在完成反應之後,使用旋 轉蒸發器2小時以從生成物移除溶劑。然後,在真空烤箱 中乾燥生成物24小時,從而得到μ 4克(產率99 %)由式 3表示的化合物3。 !HNMR (300 MHz) : δ〇.57-〇.59(ί, 1Η)' 1.62-1.80(m, 27 201009119 31972pit 2H)、3.62〜3.67(m,Si-CH3)、3.85〜3.87(t,3H)、7.93〜7.95(t, 4H)、8.56(s, NH)、8.64〜8.67(d, 5H)、9.09〜9.11(d,6H)、 13.80(s,OH) IR (純,cnf1) : 3650〜3200(vOH)、3300〜3200(vNH)、 1650(Vc〇nh)、. 1120〜1050(v 發(统氧基)) (銅镇用表面處理劑組成物的製造) 實例28至29 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 φ 物’將溶劑混合物與在實例27中製備的化合物3混合,以 製備分別具有0.5重量%及1重量之化合物3的混合溶液。 (二層FCCL之製造) - 實例30至31 在實例28至29中製備的混合溶液單獨靜置6〇分鐘 以進行水解,然後分別喷灑在經Cr塗覆之滚製銅箔(IL_2, 由11 細製造)上。接著,使用塗抹器塗覆銅落,從而製備 ^塗覆之銅。在烤箱中於12(rc乾燥3G分鐘經塗覆之銅 ❹ ”ττ上巧有限公,製造的Upilex形式之亮光漆(產 並使)喷驗職㈣理劑組成物處理的銅 品名 箔, 、120°C進行30分鐘、 分鐘來硬化經塗覆之 。在氮環境下於6〇°c進行3〇分鐘 250 C進行3〇分鐘以及4〇(rc進〇 28 201009119 =胺酸,以製備㈣亞胺賴 比較性實例5 於μ 在實例%巾隨的方式製備經祕亞胺薄膜塗覆 ^的峨’除了省略使用表面處理劑組成物來處理銅落 =的步驟。在比較性實例5中製備的㈣以下稱為比較 評估實例3-1 :剝離強度測試 使用ASTMD-638指定的方法量測樣品14至15及比 較性樣品5的剝離強度。橫擔速度為25 mm/min且樣品的 寬度為5 mm。使用DiStron8516進行量測。量測的結果如 下面的表3所示。ΤΛ vn « Ό FOCA^TimS will be 125.712 grams of tetrahydrofuran, 8.9645 grams (0.05 moles) of 3-aminopropyltrimethoxy decane and 7.4550 grams (0.05 moles) of 2,3-pyridinium dianhydride (2, 3-pyridinedicarboxylic anhydride) was poured into the reactor and reacted for 5 hours, the temperature of the reactor was maintained under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. After the completion of the reaction, a rotary evaporator was used for 2 hours to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 24 hours to obtain 4 g (yield 99%) of Compound 3 represented by Formula 3. !HNMR (300 MHz): δ〇.57-〇.59(ί, 1Η)' 1.62-1.80(m, 27 201009119 31972pit 2H), 3.62~3.67 (m, Si-CH3), 3.85~3.87 (t, 3H), 7.93~7.95(t, 4H), 8.56(s, NH), 8.64~8.67(d, 5H), 9.09~9.11(d,6H), 13.80(s,OH) IR (pure, cnf1): 3650~3200(vOH), 3300~3200(vNH), 1650(Vc〇nh), .1120~1050(v hair (all oxygen)) (manufacture of copper surface treatment composition) Examples 28 to 29 The solvent mixture was mixed with the compound 3 prepared in Example 27 by mixing water and methanol in a volume ratio of 1:9 to obtain a mixed solution of Compound 3 prepared in Example 27 to prepare a mixed solution of Compound 3 having 0.5% by weight and 1% by weight, respectively. . (Manufacture of two-layer FCCL) - Examples 30 to 31 The mixed solutions prepared in Examples 28 to 29 were separately allowed to stand for 6 minutes for hydrolysis, and then sprayed separately on a Cr-coated rolled copper foil (IL_2, 11 fine manufacturing). Next, the copper drop was coated using an applicator to prepare a coated copper. In the oven, on the 12 (rc dry 3G min coated copper ❹ τ τ 上 上 , , , , 制造 制造 Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up The coating was applied at 120 ° C for 30 minutes and minutes. Under a nitrogen atmosphere at 6 ° C for 3 〇 250 C for 3 〇 and 4 〇 (rc into 28 201009119 = amine acid to prepare (4) Comparative Example 5 The preparation of the imine film coated in the manner of the example % towel was repeated except that the surface treatment composition was omitted to treat the copper drop =. In Comparative Example 5 Prepared (4) hereinafter referred to as Comparative Evaluation Example 3-1: Peel Strength Test The peel strengths of Samples 14 to 15 and Comparative Sample 5 were measured using the method specified in ASTM D-638. The cross-arm speed was 25 mm/min and the width of the sample was It is 5 mm. The measurement was performed using a DiStron 8516. The results of the measurement are shown in Table 3 below.
<表3> --" 剝離強度[kgf/cml 實例30 (樣品14) 0 82 實例31 (樣品15) 0.78 比較性實例5 (比較性樣品5) ---- ------__| — 0.32 如表3所示,根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品5,使用包含矽烷基 29 201009119 319/^ρΐί 化合物之表面處理劑製備之樣品14至15於聚醯亞胺薄膜 及銅fl之間具有大幅增加的剝離強度。 評估實例3-2 :防潮性測試 於50。(:、相對濕度80 %在恆溫溼器HIRAYANA PC_R7中儲存樣品14至15進行7天,樣品14至15的變 色明顯。7天後,樣品14至15的顏色沒有改變。 (矽烷基化合物(4)之合成) 實例32A ··化合物4A之合成 根據下面的反應機制4合成由式4表示的化合物4A。 <反應機制4><Table 3>--" Peel strength [kgf/cml Example 30 (Sample 14) 0 82 Example 31 (Sample 15) 0.78 Comparative Example 5 (Comparative Sample 5) ---- ------ __| — 0.32 As shown in Table 3, according to an embodiment of the present invention, a comparative sample 5 prepared without using a surface treating agent composition was prepared using a surface treating agent containing a decyl 29 201009119 319/^ρΐί compound. Samples 14 to 15 have a greatly increased peel strength between the polyimide film and copper fl. Evaluation Example 3-2: Moisture resistance test at 50. (:, relative humidity 80% was stored in the thermostat HIRAYANA PC_R7 for 14 days, and the discoloration of the samples 14 to 15 was remarkable. After 7 days, the color of the samples 14 to 15 did not change. (矽alkyl compound (4 Synthesis of Example 32A · Synthesis of Compound 4A Compound 4A represented by Formula 4 was synthesized according to the following Reaction Mechanism 4. <Reaction Mechanism 4>
其中R為甲基。 將125.712克的四氫呋喃、8.9645克(〇.〇5莫耳)的3_ 氨基丙基三甲氧基矽烷及9.6065克(0.05莫耳)的偏苯三酸 酐(l,2,4-benzenetricarboxylic acid anhydride) (2,3-«比咬二酸 酐)倒入反應器中並反應6小時’在氮環境下維持反應器之 溫度為-5°C至5°C,且機械攪拌器以250rpm旋轉。在完成 反應之後,使用旋轉蒸發器1小時以從生成物移除溶劑。 然後,在真空烤箱中乾燥生成物48小時,從而得到185 30 201009119 3iy/2pit 克(產率99%)由式4表示的化合物4A。 hNMR (300 MHz) : δθ.62〜0.65(t,1H)、1.71 〜1.76(m, 2H)、3.41 〜3.47(m,Si-CH3)、3.56〜3.60(m,3H)、7.45(s,NH) IR (純,cnT1) : 3650〜3200(voh)、3300〜3200〇NH)、 1650(Vc〇nh)、1120〜1050(v 矽_(烷氣基)) 實例32B :化合物4B之合成 © 根據下面的反應機制4合成由式4表示的化合物4B〇 <反應機制4>Wherein R is a methyl group. 125.712 grams of tetrahydrofuran, 8.9645 grams of 3 -aminopropyltrimethoxydecane, and 9.6065 grams of (0.05 moles) of trimellitic anhydride (1,2,4-benzenetricarboxylic acid anhydride) (2,3 - «Bite dianhydride was poured into the reactor and reacted for 6 hours'. The temperature of the reactor was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 250 rpm. After the completion of the reaction, a rotary evaporator was used for 1 hour to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 48 hours to obtain 185 30 201009119 3iy / 2 psi (yield 99%) of Compound 4A represented by Formula 4. hNMR (300 MHz): δ θ.62~0.65 (t, 1H), 1.71 to 1.76 (m, 2H), 3.41 to 3.47 (m, Si-CH3), 3.56 to 3.60 (m, 3H), 7.45 (s, NH) IR (pure, cnT1): 3650~3200(voh), 3300~3200〇NH), 1650(Vc〇nh), 1120~1050(v 矽_(alkyl)) Example 32B: Synthesis of Compound 4B © Compound 4B represented by Formula 4 is synthesized according to the following Reaction Scheme 4 < Reaction Mechanism 4>
其中R為乙基。Wherein R is an ethyl group.
將125J12克的四氫吱喃、8.9645克(0.05莫耳)的3_ 氨基丙基三乙氧基矽烷及9.6065克(0.05莫耳)的偏笨三酸 軒(l,2,4-benzenetricarboxylic acid anhydride) (2,3-吼唆二酸 酐)倒入反應器中並反應6小時’在氮環境下維持反應器之 溫度為-5°C至5°C,且機械攪拌器以250rpm旋轉。在完成 反應之後,使用旋轉蒸發器1小時以從生成物移除溶劑。 然後,在真空烤箱中乾燥生成物48小時,從而得到2〇6 克(產率99%)由式4表示的化合物4B。 · 31 201009119 31972pit NMR (300 MHz,CD3〇D) : δ〇.71 〜0.73(t,1H)、 1.14〜1.23(m,Si-CH3)、1.71 〜1.74(m,2H)、3.58〜3.60(t, 3H) ' 3.79-3.86(m, Si-CH2) > 8.55(s, NH) IR (純,cm·1) : 3650〜3200(V〇H)、3300〜3200(vNH)、 1650(vc_)、1120 〜1050(v^(炫氧基)) (銅箔用表面處理劑組成物的製造) 實例33至34 藉由以1:9之體積比率混合水及曱醇以得到溶劑混合 物’將溶劑混合物與在實例32A中製備的化合物4A混合, 以製備分別具有〇·5重量%及】重量%之化合物4A的混合 溶液。 實例35至36125J12g of tetrahydrofuran, 8.9645g (0.05m) of 3-aminopropyltriethoxydecane and 9.6065g (0.05m) of l,2,4-benzenetricarboxylic acid anhydride (2,3-Sebacic anhydride) was poured into the reactor and reacted for 6 hours 'The temperature of the reactor was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 250 rpm. After the completion of the reaction, a rotary evaporator was used for 1 hour to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 48 hours to obtain 2 〇 6 g (yield 99%) of Compound 4B represented by Formula 4. · 31 201009119 31972pit NMR (300 MHz, CD3〇D): δ〇.71 ~0.73(t,1H), 1.14~1.23(m,Si-CH3), 1.71~1.74(m,2H), 3.58~3.60 ( t, 3H) ' 3.79-3.86(m, Si-CH2) > 8.55(s, NH) IR (pure, cm·1): 3650~3200(V〇H), 3300~3200(vNH), 1650( Vc_), 1120 to 1050 (v^(decyloxy)) (manufacture of surface treatment composition for copper foil) Examples 33 to 34 by mixing water and decyl alcohol in a volume ratio of 1:9 to obtain a solvent mixture' The solvent mixture was mixed with Compound 4A prepared in Example 32A to prepare a mixed solution of Compound 4A having 〇·5% by weight and 重量% by weight, respectively. Examples 35 to 36
物,j由以1:9之體積比率混合水及曱醇以得到溶劑混 ^谷劑混合物與在實例32B中製備的化合物犯混名 溶^備分別具有〇.5重量%及1重量%之化合物4B的混 (二層FCCL的製造) 實例37至40 以進33至36巾製備的混合溶液單獨靜置60分鐘 由^然後分別喷灑在經Cr塗覆之滾製鋼箱(IL_2, 造)上。接著,使用塗抹器塗覆銅揭,從而製備 32 201009119 ^ly/zpn 經塗覆之銅箔。在烤箱中於 箔0 、And j, the mixture of water and decyl alcohol was mixed at a volume ratio of 1:9 to obtain a solvent mixture and the compound prepared in Example 32B was mixed with 5% by weight and 1% by weight, respectively. Mixing of Compound 4B (manufacture of two-layer FCCL) Examples 37 to 40 The mixed solution prepared by injecting 33 to 36 towels was separately allowed to stand for 60 minutes, and then separately sprayed on a Cr-coated rolled steel box (IL_2, manufactured). on. Next, copper was coated with an applicator to prepare 32 201009119 ^ly/zpn coated copper foil. In the oven in foil 0,
Uot:乾燥30分鐘經塗覆之銅 ㈣限公司製造的亮光漆(產品名: 刀塗覆之。使絲處理驗處理的_,並使用刮 25〇。〇^魏下於贼進行3G分鐘、賦進行3〇分鐘、 ❹ 聚酿胺齡订3〇 t鐘以及4〇〇°C進行1〇分鐘來硬化經塗覆之 ^,酸’以製備聚輕胺_,因此,製備經聚醯亞胺 /膜刀別塗覆於上的銅。在實例37至4 以下稱為樣品16至19。 比較性實例6 以在實例37中同樣的方式製備經聚酿亞胺薄膜塗覆 於上的銅’除了省略使絲面處理劑組成物來處理銅猪 表面的步驟。在比較性實例6中製備的銅落以下稱為比較 性樣品6。 評估實例4-1 :剝離強度測試 使用ASTMD-638指定的方法量測樣品16至19及比 較性樣品6的剝離強度。橫擔速度為25mm/min且樣品的 寬度為5 mm。使用Instron 8516進行量測。量測的結果如 下面的表4所示。 <表4> 33 201009119 ^iy/2pu ---—_ 剝離強度[kgf/cm] —-37 (樣品 16) 1.60 —-品 17) 1.35 —-品 18) 1.98 ^品 19) 1.57 較性樣品 6) 1 0.38Uot: Drying 30 minutes coated copper (4) limited company made of varnish (product name: knife coated. Make silk treatment treatment _, and use scraping 25 〇. 〇 ^ Wei under the thief for 3G minutes, The preparation is carried out for 3 minutes, 聚 polyamine dosage for 3 〇t clock and 4 〇〇 ° C for 1 来 to harden the coated acid, to prepare poly-light amine _, thus preparing The amine/film blade was coated with copper. Examples 37 to 4 are referred to below as samples 16 to 19. Comparative Example 6 Copper prepared by coating a polyimide film in the same manner as in Example 37 was prepared. 'In addition to the step of omitting the surface treatment composition to treat the copper pig surface. The copper drop prepared in Comparative Example 6 is hereinafter referred to as Comparative Sample 6. Evaluation Example 4-1: Peel strength test specified using ASTM D-638 The method measures the peel strength of samples 16 to 19 and comparative sample 6. The cross-web speed was 25 mm/min and the width of the sample was 5 mm. The measurement was performed using an Instron 8516. The results of the measurement are shown in Table 4 below. <Table 4> 33 201009119 ^iy/2pu ----_ Peel strength [kgf/cm] —-37 (Sample 16) 1.6 0 —-Product 17) 1.35 —-Product 18) 1.98 ^Product 19) 1.57 Comparative sample 6) 1 0.38
如表4所示’根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品6,使用包含矽烷基 化,物之表面處理劑組成物製備之樣品16至19於聚醯亞 胺_及_之間具有大闕加關離強度。 評估實例4-2 :防潮性測試 於50 t:、相對濕度80 %在恆溫溼器HIRAYANA P<=^R7中儲存樣品16至19進行7天,樣品16至19的變 色明顯。7天後’樣品16至19的顏色沒有改變。As shown in Table 4, samples 16 to 19 prepared using a surface treatment composition comprising a ruthenium alkylation were compared to Comparative Sample 6 prepared without using a surface treatment composition, according to an embodiment of the present invention. There is a large enthalpy and entanglement strength between polyimine and _. Evaluation Example 4-2: Moisture Resistance Test Samples 16 to 19 were stored for 7 days at 50 t:, relative humidity of 80% in a thermostatic humidifier HIRAYANA P<=^R7, and the samples 16 to 19 were significantly changed. The color of samples 16 to 19 did not change after 7 days.
(根據聚醜亞胺之形式之剝離強度的比較) (2層FCCL的製造) 實例41至44 以在實例37中同樣的方式製備經聚醯亞胺薄膜塗覆 =上的銅箔,除了使用PMDA/ODA亮光漆、BTDA/PDA 亮光漆、BTDA/PMDA/ODA/PDA亮光漆及 PMDA/ODA-SD亮光漆分別取代由有限公司製造的 34 201009119(Comparison of peel strength according to the form of polyugly imine) (Production of 2-layer FCCL) Examples 41 to 44 Copper sheets coated with polyimide film were prepared in the same manner as in Example 37 except for use. PMDA/ODA varnish, BTDA/PDA varnish, BTDA/PMDA/ODA/PDA varnish and PMDA/ODA-SD varnish respectively replaced by 34 201009119
Upilex形式之亮光漆。此處,使用〇5重田0 以上描述的亮光漆是由以下描述的方 PMDA/ODA亮光漆 ° 將255.000克的N,N-二曱其7絲 χτ , Τ基乙醯胺(DMAc ; Ν,Ν-dimethylacetamide)、21·538 克(0·1〇7563 莫 4 4, ® 二氨基二苯醚及23·462克(〇.職63莫耳)的苯均四酸」軒 依序倒入反應器中並反應24+時,在氮環境下維持反應器 之溫度為-5°C至5°C,且機械攪拌器以35〇rpm旋轉。然 後’從而製備包含15重量%之聚醯胺酸的亮光漆。 . BTDA/PDA亮光漆 將255.000克的DMAc (N,N-二曱基乙酿胺)、n.307 克(0.104561莫耳)的間苯二胺及33.693克(0.104561莫耳) 的 3,3',4,4'- 二苯酮四甲 酸二軒 (3,3,4,4 -biphenontetracarboxylic acid anhydride)倒入反應 器中並反應24小時’在氮環境下維持反應器之溫度為_5。〇 至5 °C ’且機械擾拌器以350 rpm旋轉。然後,從而製儀 包含15重量%之聚醯胺酸的亮光漆。 BTDA/PMDA/ODA/PDA 亮光漆 將 255 克的 DMAc、6.334 克(0.031633 莫耳)的 4,4’- 35 201009119 31972pit 二氨基二苯醚及7.982克(0.073811莫耳)的間笨二胺倒入 反應器中並完全溶解。然後,將23.784克(0.073811莫耳) 的 3,3f,4,4’- 二苯酮四甲 酸二野 (3,3’,4,4’-biphenontetracarboxylic anhydride)及 6.900 克 (0.031633莫耳)的苯均四酸二酐倒入反應器中並反應24小 時,在氮環境下維持反應器之溫度為-5 °C至5 °C,且機械 攪拌器以350 rpm旋轉。然後,從而製備包含15重量。/〇之 聚醯胺酸的亮光漆。 PMDA/ODA-SD 亮光漆 將 127.5 克的 DMAc、9.826 克(0.04907 莫耳)的 4,4,-二氨基二苯醚及1.408克(0.002583莫耳)的SD-545倒入反 應器中並完全溶解。然後,將11.267克(0.0.051653莫耳) 的苯均四酸二酐倒入反應器中並反應24小時,在氮環境下 雉持反應器之溫度為-5°C至5°C,且機械攪拌器以350rpm 旋轉。然後,從而製備包含15重量%之聚醯胺酸的亮光漆。 比較性實例7至10 以在實例41至44中同樣的方式製備經聚醯亞胺薄膜 塗覆於上的銅箔,除了省略使用表面處理劑組成物來處理 銅箔表面的步驟。在比較性實例7至10中製備的銅箔以下 稱為比較性樣品7至10。 評估實例5 -剝離強度測試 36 201009119 ^iy/2Pu 使用ASTM D-638指定的方法量測樣品2〇至23及比 較性樣品7至1〇的剝離強度。橫擔速度為25 mm/min且 樣品的寬度為5 mm。使用Instron 8516進行量測。量測的 結果如下面的表5所示。 <表5> — ——- 剝離強度丨kg/cml __ 實例41 (樣品20) 1.02 _ 實例42 (樣品21) 0.93 __實例43 (樣品22) _ 實例44 (樣品23) _ 1.21 1.53 較性實例7(比較性樣品7) 性實例8(比較性樣品8) 0.52 0.39 _____^較性實例9(比較性樣品9) 0.61 性實例10 (比較性樣品1〇) ----- 0.72 如表5所示,根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品7至1〇,使用包含矽 烷基化合物之表面處理劑組成物製備之樣品2〇至23於聚 酿亞胺薄膜及銅箔之間具有大幅增加的剝離強度。 如上所述’相比於沒有表面處理薄膜形成於上的pcB 或是包含一般矽烷基化合物之表面處理薄膜形成於上的 pCB,根據本發明之包含矽烷基化合物或矽烷基化合物之 水解物之表面處理賴職於上的pcB具有提高的剝離 37 201009119 31972pif 強度 本發已以實施例揭露如上,然其並非用以限定 本發明之精神和範=領以=識者’在不脫離 發明之保護範ϋ當視後附之申請專更動與潤飾’故本 【圖式簡單朗】 '範圍所界定者為準。 無。 【主要元件符號說明】 無。A varnish of the Upilex form. Here, the varnish described above using 〇5重田0 is a square PMDA/ODA varnish as described below. 255.000 g of N,N-dioxin 7 χτ, decyl acetamide (DMAc; Ν, Ν-dimethylacetamide), 21·538 g (0·1〇7563 Mo 4 4, ® diaminodiphenyl ether and 23·462 g (〇. 63 mol) of pyromellitic acid” While reacting 24+, the reactor temperature was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 35 rpm. Then, a 15% by weight poly-proline was prepared. Bright lacquer. BTDA/PDA varnish will have 255.000 grams of DMAc (N,N-dimercaptoamine), n.307 grams (0.104561 moles) of m-phenylenediamine and 33.693 grams (0.104561 moles) 3,3',4,4'-3,3,4,4-biphenontetracarboxylic acid anhydride was poured into the reactor and reacted for 24 hours to maintain the temperature of the reactor under nitrogen _5. 〇 to 5 °C ' and the mechanical scrambler is rotated at 350 rpm. Then, the instrument contains 15% by weight of phthalocyanine varnish. BTDA/PMDA/ODA/PDA varnish will be 255 g DMAc 6.334 g (0.031633 mol) of 4,4'- 35 201009119 31972pit diaminodiphenyl ether and 7.982 g (0.073811 mol) of m-diamine diamine were poured into the reactor and completely dissolved. Then, 23.784 g (0.073811) 3,3f,4,4'-dibenzophenonetetracarboxylic acid (3,3',4,4'-biphenontetracarboxylic anhydride) and 6.900 g (0.031633 mol) of pyromellitic dianhydride The reactor was placed in the reactor and reacted for 24 hours, the temperature of the reactor was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 350 rpm. Then, a polycondensate containing 15 parts by weight was prepared. Amino acid varnish. PMDA/ODA-SD varnish pours 127.5 grams of DMAc, 9.826 grams (0.04907 moles) of 4,4,-diaminodiphenyl ether and 1.408 grams (0.002583 moles) of SD-545 Into the reactor and completely dissolved. Then, 11.267 g (0.0.051653 mol) of pyromellitic dianhydride was poured into the reactor and reacted for 24 hours, and the temperature of the reactor was maintained at -5 under nitrogen atmosphere. °C to 5 ° C, and the mechanical stirrer was rotated at 350 rpm. Then, a varnish containing 15% by weight of polyamic acid was prepared. Comparative Examples 7 to 10 Copper foil coated with a polyimide film was prepared in the same manner as in Examples 41 to 44 except that the step of treating the surface of the copper foil using the surface treating agent composition was omitted. The copper foils prepared in Comparative Examples 7 to 10 are hereinafter referred to as Comparative Samples 7 to 10. Evaluation Example 5 - Peel Strength Test 36 201009119 ^iy/2Pu The peel strengths of the samples 2〇 to 23 and the comparative samples 7 to 1〇 were measured using the method specified in ASTM D-638. The cross roller speed is 25 mm/min and the width of the sample is 5 mm. Measurements were performed using an Instron 8516. The results of the measurements are shown in Table 5 below. <Table 5> ———- Peel strength 丨kg/cml __ Example 41 (Sample 20) 1.02 _ Example 42 (Sample 21) 0.93 __Example 43 (Sample 22) _ Example 44 (Sample 23) _ 1.21 1.53 Sexual Example 7 (Comparative Sample 7) Sexual Example 8 (Comparative Sample 8) 0.52 0.39 _____^Comparative Example 9 (Comparative Sample 9) 0.61 Sexual Example 10 (Comparative Sample 1〇) ----- 0.72 As shown in Table 5, samples 2 to 23 prepared using a surface treatment composition containing a decyl compound were compared to Comparative Samples 7 to 1 prepared without using a surface treatment composition according to an embodiment of the present invention. It has a greatly increased peel strength between the polyimide film and the copper foil. As described above, the surface of the hydrolyzate containing a decyl group compound or a decyl group compound according to the present invention is compared with pCB formed on the surface of a PCB having no surface treatment film formed thereon or a surface treatment film containing a general decyl group compound. The processing of the above-mentioned pcB has an improved stripping. 37 201009119 31972pif Intensity The present invention has been disclosed in the above embodiments, but it is not intended to limit the spirit and scope of the present invention to the knowledge of the invention. Applicants' specializations and retouchings are attached to the original text [simplified in the drawing]. no. [Main component symbol description] None.
3838
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| KR20010089948A (en) * | 2000-03-16 | 2001-10-17 | 안광용 | Adhesive composition for copper foil and copper-foil-clad laminate prepared by using the same |
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|---|---|
| WO2010008214A3 (en) | 2010-05-14 |
| TWI391531B (en) | 2013-04-01 |
| KR101475839B1 (en) | 2014-12-23 |
| WO2010008214A2 (en) | 2010-01-21 |
| KR20100009263A (en) | 2010-01-27 |
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