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TW201009119A - Copper foil for printed circuit board, method of preparing the same, and flexible copper clad laminate using polyamic acid precursor and copper foil - Google Patents

Copper foil for printed circuit board, method of preparing the same, and flexible copper clad laminate using polyamic acid precursor and copper foil Download PDF

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Publication number
TW201009119A
TW201009119A TW098124127A TW98124127A TW201009119A TW 201009119 A TW201009119 A TW 201009119A TW 098124127 A TW098124127 A TW 098124127A TW 98124127 A TW98124127 A TW 98124127A TW 201009119 A TW201009119 A TW 201009119A
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Taiwan
Prior art keywords
copper foil
compound
copper
layer
sample
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TW098124127A
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Chinese (zh)
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TWI391531B (en
Inventor
Jong-Ho Ryu
Jong-Chan Won
Yong-Seok Kim
Hyun-Min Jung
Jin-Young Park
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Iljin Copper Foil Co Ltd
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Publication of TW201009119A publication Critical patent/TW201009119A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0154Polyimide
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03Metal processing
    • H05K2203/0307Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/0723Electroplating, e.g. finish plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/384Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)

Abstract

Provided is a surface-treated copper foil for a printed circuit board (PCB), including an antirust layer formed on a copper foil and a surface treatment film formed on the antirust layer, wherein the surface treatment film includes at least one compound selected from the group consisting of silane-based compounds represented by Formulae 1 through 4, or hydrolysates of the silane-based compounds: (Formula 1) (Formula 2) (Formula 3) (Formula 4) wherein R1, R2, and R3 are each independently a C1-C3 alkyl group and R4 and R5 are each independently hydrogen or a C1-C5 alkyl group.

Description

201009119 31972pif 六、發明說明: 【相關申請案】 本申請案主張優先權為2008年7月18日在韓國智財 局申請的韓國專利申請號10-2008-0070081,其揭露内容在 此併入本文參考。 【發明所屬之技術領域】 本發明是有關於一種印刷電路板(printed circuit board ’’ PCB)用的銅箔、銅箔的製備方法以及包含銅箔之可 撓性覆銅層壓板(flexible copper cladlaminate ; FCCL),且 特別是有關於一種包含矽烷基(silane_baseci)化合物或矽烷 基化合物之水解物(hydrolysate)之表面處理薄膜形成於上 之PCB用之經表面處理的銅箔,以及包含此銅箔之fccl。 【先前技術】 可撓性覆銅層壓板(FCCL)為印刷電路板(PCB)之一 種形式’且其現今需求日漸增加。FCCL為由二或三層形 成之多層薄膜,其中聚酿亞胺(p〇lyimide)層壓在銅箔上。 Μ印刷在FCCL上之佈線的準確性增加,姓刻的準確性也 同樣增加,因此需要降低銅箔之表面粗糙度。然而,當降 低銅箔之表面粗糙度時,銅箔與基板(例如,聚醯亞胺薄 膜)之間的剝離強度(peel strength)會下降。在這點上,需 要提高剝離強度之手段。 PCB用的銅箔通常使用矽烷耦合劑為銅箔之表面處 理劑以進行之,用以強化銅镇與基板之間的剝離強度其 揭露於日本專利申請案1990-026097。 201009119 ό iy /zpit 然而,隨著使用在PCB中之銅箔之物理性質的要求 變嚴(tight),仍然需要具有改良物理性質之表面處理薄膜 形成於上之用於PCB的銅羯。 ' 【發明内容】201009119 31972pif VI. Description of the Invention: [Related Application] The present application claims priority to Korean Patent Application No. 10-2008-0070081, filed on Jan. 18, 2008, in the Korean Intellectual Property Office, the disclosure of which is incorporated herein by reference. reference. BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a copper foil for a printed circuit board ('PCB), a method for preparing a copper foil, and a flexible copper clad laminate for a copper foil. And FCCL), and particularly a surface-treated copper foil for a PCB on which a surface-treated film comprising a hydrolysate comprising a silane-based compound or a hydroxyl compound is formed, and comprising the copper foil Fccl. [Prior Art] Flexible copper clad laminate (FCCL) is one of the forms of printed circuit boards (PCBs) and its current demand is increasing. The FCCL is a multilayer film formed of two or three layers in which a p〇lyimide is laminated on a copper foil.准确性 The accuracy of the wiring printed on the FCCL is increased, and the accuracy of the surname is also increased, so it is necessary to reduce the surface roughness of the copper foil. However, when the surface roughness of the copper foil is lowered, the peel strength between the copper foil and the substrate (e.g., polyimide film) may decrease. At this point, there is a need to improve the peel strength. The copper foil for PCB is usually used as a surface treatment agent for copper foil using a decane coupling agent for strengthening the peel strength between the copper and the substrate. It is disclosed in Japanese Patent Application No. 1990-026097. 201009119 ό iy /zpit However, as the physical properties of the copper foil used in the PCB become tight, there is still a need for a copper enamel for a PCB formed by a surface-treated film having improved physical properties. 'Content of the invention】

本發明提供印刷電路板(PCB)用之經表面處理的銅 Ά,其包含提供基板與銅之間優良剝離強度之新的石夕焼 基化合物或碎烧基化合物的水解物,本發明還提供PCB用 之銅箔的製備方法,以及包含聚醯亞胺層堆疊在PCB用之 銅箔上的可撓性覆銅層壓板(FCCL)。 根據本發明之一方面,提供印刷電路板(PCB)用之經 表面處理的銅箔,其包含形成在銅箔上的防鏽層及形成在 防鏽層上的表面處理薄膜,其中表面處理薄膜包含選自由 式1至式4表示的矽烷基化合物所組成之族群的至少一化 合物,或所述矽烷基化合物的水解物: <式1>The present invention provides a surface treated copper crucible for a printed circuit board (PCB) comprising a hydrolysate of a novel agglomerated compound or a calcined compound which provides excellent peel strength between the substrate and copper, and the present invention also provides A method for preparing a copper foil for PCB, and a flexible copper clad laminate (FCCL) comprising a polyimide layer stacked on a copper foil for PCB. According to an aspect of the invention, there is provided a surface-treated copper foil for a printed circuit board (PCB) comprising a rustproof layer formed on a copper foil and a surface treated film formed on the rustproof layer, wherein the surface treated film At least one compound comprising a group selected from the group consisting of a fluorenyl compound represented by Formulas 1 to 4, or a hydrolyzate of the decyl compound: <Formula 1>

〈式3&gt; 201009119 31972pif<Formula 3> 201009119 31972pif

&lt;式4&gt;&lt;Formula 4&gt;

_ 其中R〗、R2及R_3各自獨立為。至。的烷基,且良 及尺5各自獨立為氫或(^至c5的烷基。_ where R, R2 and R_3 are independent of each other. to. The alkyl groups, and the calipers 5 are each independently hydrogen or an alkyl group of (c to c5).

根據本發明之另一方面,提供印刷電路板(pcB)用之 赤阶:處理的鋪的製備方法’此方法包含:於銅羯上形 έ 層'胃洗及乾燥防鏽層形成於上的銅箔,以及塗覆 =盧理^防騎上’且乾燥經塗覆之防鏽層,從而製備表 所心且成物包含選自由式1至式4表示的石夕 二“ Μ之族群的至少—化合物或所述魏基化 &lt;式1&gt;According to another aspect of the present invention, there is provided a red scale for a printed circuit board (PCBB): a method of preparing a treated tile. The method comprises: forming a layer on a copper crucible, a stomach washing and drying a rustproof layer formed thereon. Copper foil, as well as coating = Lu Li ^ anti-riding 'and dry coated rust-proof layer, to prepare the table and the object contains a group selected from the group of Shi Xi two "Μ" represented by Formula 1 to Formula 4 At least - a compound or the above-mentioned Weilkification &lt;Formula 1&gt;

〈式2&gt; 8 201009119<Formula 2> 8 201009119

Jl^/zpu &lt;式3&gt;Jl^/zpu &lt;Formula 3&gt;

〈式4&gt;<Formula 4>

其中Ri、R2及r3各自獨立為 及R5各自獨立為氫或〇1 燒基C3的炫基,且4Wherein Ri, R2 and r3 are each independently and R5 is independently a hydrogen or a thiol group of C1, and 4

根據本發明又一方而=凡基。 (rccL),其包含上述pc ’ ^可撓性覆銅層壓板 形成在銅落之表面處理薄媒上的;以及 為讓本發明之上述特徵和優點能=僅下文特 舉實施例,並配合所附圖式作詳細說明如下。 f實施方式】 以下,將根據本發明之實施例更詳細地描述印刷電路 板(PCB)用之經表面處理的銅箔、PCB用之銅箔的製備方法 9 201009119 31972pit 以及可撓性覆銅層壓板(FCCL)。 根據本實施例,PCB用之經表面處理的銅箔包含形成 在銅箔上的防鏽層及形成在防鏽層上的表面處理薄膜其 中表面處理_包含選自由式1至式4表示㈣烧基化合 物所組成之*群的至少—化合物,或所述^^基化合物的 水解物。 &lt;式1〉According to the invention, one side is the other. (rccL) comprising the above-mentioned pc ' ^ flexible copper clad laminate formed on the copper surface treatment thin film; and in order to enable the above features and advantages of the present invention = only the following specific embodiments, and The drawings are described in detail below. f. Embodiments Hereinafter, a surface-treated copper foil for a printed circuit board (PCB), a copper foil for a PCB, and a method for preparing a copper foil for a PCB will be described in more detail according to an embodiment of the present invention. 9 201009119 31972pit and a flexible copper-clad layer Platen (FCCL). According to the embodiment, the surface-treated copper foil for a PCB comprises a rust-preventing layer formed on the copper foil and a surface-treated film formed on the rust-preventing layer, wherein the surface treatment _ comprises a method selected from the group consisting of Formulas 1 to 4 (four) At least a compound of the * group of the base compound, or a hydrolyzate of the compound. &lt;Formula 1>

&lt;式3〉&lt;Formula 3>

&lt;式4&gt;&lt;Formula 4&gt;

10 20100911910 201009119

PP

cr 其中R!、R2及R3各自獨立為Cl至Cs的烷基’且R4 及R5各自獨立為氫或(^至C5的烷基。 矽烷基化合物在其一端具有矽氧烷基(siloxane gr0UP) 用以與銅箔形成共價鍵,在其另一端具有咪唑基(imidazole group)和/或亞醯胺基(如咖group) ’其中咪唑基和/或亞醯 胺具有與聚醯亞胺薄膜相似的結構,從而提高與聚醯亞胺 薄膜的鍵結強度。所以,可以提高銅箔與聚醯亞胺薄膜之 間的鍵結強度。 特別是,包含於矽烷基化合物中的烷氧基(alkoxy group ’ -OR)與存在於金屬表面中的經基(hydr〇Xy gr〇Up) 反應,以形成石夕氧燒鍵(siloxanebond)。包含於碎烧基化合 物中的矽氧烷基也可以與金屬表面形成矽氧烷鍵。 根據本發明另一實施例,矽烷基化合物中之心、r2 及R3各自獨立為甲錢乙基,且R4&amp;R5可以為氮。 之間-實麵,可⑽-步於輔與防鏽層 由鋅合金形成 阻熱層之金屬或至幾百奈米㈣。形成 本發月另f施例,可以進一步於銅箱與阻熱層 201009119 31972pif 之間插入小節(nodules)。藉由使具有電流密度為10至150 A/dm2之電流在i〇°C至4(Tc的溫度流經電解液,其中電解 液包含1至40 g/L的銅金屬及30至250 g/L的硫酸。 防鏽層可以包含用作防鏽劑之三氧化鉻(chromium trioxide)、鉻酸(chromic acid)、二鉻酸(dichromic acid)、 , 重鉻酸鈉(sodium dichromate)和鉻酸鹽(chromate)。防鏽層 可以藉由使具有電流密度為〇.〇!至1〇 A/dm2之電流在 10 C至50 c的溫度流經電解液,且防鑛劑的濃度為 至10 g/L,以形成具有數十至數百奈米的厚度。阻熱層可 以由鋅合金、鎳合金或鈷合金形成,且可以形成具有數十 魯 至數百奈米的厚度。 銅箔通常形成在基板上為本發明所述領域所熟知。 雖然省略基板的額外描述,但並不排除使用基板。 根據本發明另一實施例,PCB用之銅箔的製備方法可 以包含:於銅箔上形成防鏽層;清洗及乾燥防鏽層形成柃 上的銅羯,以及塗覆組成物於防鏽層上,且乾燥經塗覆^ 防鏽層’從而製備表面處理薄膜,所述組成物包含選自由 式1至式4表示的石夕炫基化合物所組成之族群的至少一 合物和所述梦烧基化合物的水解物。 鳴 &lt;式1&gt;Cr wherein R!, R2 and R3 are each independently an alkyl group of Cl to Cs and R4 and R5 are each independently hydrogen or an alkyl group of (C to C5. The fluorenyl compound has a siloxane oxyalkyl group at one end thereof (siloxane gr0UP) Used to form a covalent bond with copper foil, and has an imidazole group and/or an amidino group (such as a coffee group) at the other end thereof, wherein the imidazolyl group and/or the amidoxime has a film with a polyimide film. A similar structure, thereby increasing the bonding strength with the polyimide film. Therefore, the bonding strength between the copper foil and the polyimide film can be improved. In particular, the alkoxy group contained in the fluorenyl compound ( Alkoxy group '-OR) reacts with a hydrazine Xy gr〇Up present in the metal surface to form a siloxane bond. The oxoalkyl group contained in the calcined compound can also be used. Forming a decane bond with the metal surface. According to another embodiment of the present invention, the core, r2 and R3 in the fluorenyl compound are each independently a acetophenone, and R4&R5 may be a nitrogen. (10)-step in the auxiliary and anti-rust layer from the zinc alloy to form the heat-resistant layer of metal or to a few hundred nanometers (four) In the case of the present invention, a nodules can be further inserted between the copper box and the heat-resistant layer 201009119 31972pif by making the current having a current density of 10 to 150 A/dm 2 at i 〇 ° C to 4 (The temperature of Tc flows through the electrolyte, wherein the electrolyte contains 1 to 40 g/L of copper metal and 30 to 250 g/L of sulfuric acid. The rustproof layer may contain chromium trioxide as a rust inhibitor , chromic acid, dichromic acid, sodium dichromate, and chromate. The anti-rust layer can be made to have a current density of 〇.〇! to 1 The current of 〇A/dm2 flows through the electrolyte at a temperature of 10 C to 50 c, and the concentration of the anti-mining agent is up to 10 g/L to form a thickness of several tens to several hundreds of nanometers. A zinc alloy, a nickel alloy or a cobalt alloy is formed and can be formed to have a thickness of several tens of lux to several hundreds of nanometers. Copper foil is usually formed on a substrate as is well known in the art of the present invention. Although an additional description of the substrate is omitted, The use of the substrate is not excluded. According to another embodiment of the present invention, a method for preparing a copper foil for a PCB can be The method comprises: forming a rustproof layer on the copper foil; cleaning and drying the rustproof layer to form a copper ruthenium on the ruthenium, and coating the composition on the rustproof layer, and drying the coated rustproof layer to prepare the surface treated film The composition contains at least one compound selected from the group consisting of the shisha compound represented by Formulas 1 to 4 and a hydrolyzate of the dream alkyl compound. Ming &lt;Formula 1&gt;

&lt;式2&gt; 12 201009119 jivv-ipu: &lt;式3&gt;&lt;Formula 2&gt; 12 201009119 jivv-ipu: &lt;Formula 3&gt;

&lt;式4&gt;&lt;Formula 4&gt;

〇 其中R!、112及113各自獨立為^至Q的烷基,且R4 及R5各自獨立為氫或(^至C5的烷基。〇 wherein R!, 112 and 113 are each independently an alkyl group of ^ to Q, and R4 and R5 are each independently hydrogen or an alkyl group of (C to C5).

銅箔可以藉由在欲進行電鍍之材料或基板上進行銅 電鍍而製備之。在銅電鍍中,可以使用酸電鍍溶液或鹼電 鍍溶液。酸電鍍溶液可以包含硫酸銅(copper sulfate)、氟硼 酸銅(copper fluoroborate)或績醯胺酸銅(sullphamic acid copper)之電鍍溶液,且鹼電鍍溶液可以包含氰化亞銅 (copper cyanide)或焦填酸銅(copper prophosphate)之電艘溶 液。根據本發明一實施例,使用在銅箔之製備中的電錄溶 液並無特別限制,且可以使用本發明所屬領域使用的任何 13 2〇l〇〇9ii9 3l972pif 電鍍溶液。 防鏽層可以藉由電解沈積(electro-depositing)鉻在銅 箔的表面上以形成之。使用的鉻化合物可以包含(例如)三 氧化鉻、鉻酸、二鉻酸、重鉻酸鈉和鉻酸鹽。鉻化合物之 濃度的範圍可以為0.1至10 g/L,例如1.0至10 g/L。當形 成防鏽層時,可以進一步添加增效劑(synergist)以提高鉻化 合物之電解沈積的效率。增效劑的實例可以包含··鋅化合 物例如乙酸鋅(zinc acetate)、氯化辞(zinc chloride)、氰化鋅 (zinc cyanide)、硝酸鋅(zinc nitrate)或硫酸鋅(zinc sulfate); 磷化合物例如磷酸、聚磷酸鹽焦磷酸鹽(polyphosphate pyrophosphate)、鱗酸鹽(phosphate)或焦填酸鹽 (pyrophosphate);以及有機化合物例如苯並三唑 (benzenetriazole)。防鏽層的厚度之範圍可以為01至1〇奈 米。 根據本發明另一實施例,組成物可以包含選自由式j 至式4表示的石夕烧基化合物所組成之族群的至少一化合 物、所述矽烷基化合物之水解物以及溶劑。 矽烷基化合物之數量的範圍可以為組成物的〇〇〇1至 5重量%。當矽烷基化合物的數量為〇 〇〇1重量%或更低 時’表面處理劑之形成的有機層無法充份地塗覆在銅落 上,因此無法提高剝離強度。當矽烷基化合物之數量為5 重量%或更高時’表面處理劑之形成的有機層的厚度増 加’且覆蓋銅落上的小節,因此無法提高剝離強度。 根據本發明另一實施例,溶劑可以包含選自由水、甲 201009119 ^iy/zpn 醇、乙醇、丙酮、曱基乙基網〇11^11丫以11丫11^1;〇116)、曱基乙 基酮(methylethylketone)、乙酸乙酯(ethylacetate)及苯 (benzene)所組成之族群的至少一種。 根據本發明另一實施例,在上述的方法中,於形成防 鏽層之前’可以進一步進行於銅箔上形成阻熱層。形成阻 熱層的細節與關於PCB用之銅箔的描述相同,因此不再重 複0 根據本發明另一實施例’在上述的方法中,於形成阻 〇 熱層之前’可以進一步進行於銅箔上形成小節。在形成小 節中,藉由使用粉狀氧化銅(cupric oxide)產品於銅箔上形 成小節,因此銅箔與額外塗覆層之間的接觸面積增加,從 而提高銅箔與額外塗覆層之間的剝離強度。 根據本發明另一實施例,可撓性覆銅層壓板可以包含 PCB用的銅領以及形成在銅箱上之表面處理薄膜上的聚醯 亞胺薄膜。 可撓性覆銅層壓板根據其使用可以具有二層結構(2_ φ 層)或三層結構(3-層)。 根據本發明另一實施例,聚醯亞胺薄膜可以為聚酿胺 酸(polyamic acid)溶液之硬化產物,且聚醯胺酸可以為至少 一個二酐(dianhydride)單體及至少一個二胺(diamine)單體 的反應產物,其中至少一個二酐單體可以選自由苯均四酸 二酐(pyromellitic dianhydride)、3,3丨,4,4'·二苯酿|四甲酸二肝 (3,3’,4,4’-biphenonetetrahydrocarboxylic anhydride)、 3,3',4,4’-聯苯四叛酸二野(3, 3,, 4, 4,- 15 201009119 31972pit biphenyltetracarboxylic dianhydride)及 3,3',4,4'-氧雙鄰笨二 甲酸酐(3,3’,4,4’-oxydiphthalic anhydride)所組戒之族群,且 至少一個二胺單體可以選自由4,4'·二氨基二苯醚 (4,4’-〇xydianiline)、對苯二胺(para-phenylene diamine)、石夕 氧院二胺(siloxanediamine ; SD)、3,4-二氨基二苯越(3,4-oxydianiline)及間笨二胺(meta-phenylenediamine)所組成之 族群。 矽氧烷二胺(SD)可以具有以下的結構 ch3 -SiO. fH3 -甲I一CH^CH^The copper foil can be prepared by copper plating on a material or substrate to be electroplated. In copper plating, an acid plating solution or an alkali plating solution can be used. The acid plating solution may comprise a plating solution of copper sulfate, copper fluoroborate or sullphamic acid copper, and the alkali plating solution may contain copper cyanide or coke. Electrolyte solution of copper prophosphate. According to an embodiment of the present invention, the electrophotographic solution used in the preparation of the copper foil is not particularly limited, and any 13 2〇l〇〇9ii9 3l972pif plating solution used in the field to which the present invention pertains can be used. The rustproof layer can be formed by electro-depositing chromium on the surface of the copper foil. The chromium compound used may contain, for example, chromium trioxide, chromic acid, dichromic acid, sodium dichromate, and chromate. The concentration of the chromium compound may range from 0.1 to 10 g/L, for example from 1.0 to 10 g/L. When a rustproof layer is formed, a synergist may be further added to increase the efficiency of electrolytic deposition of the chromium compound. Examples of the synergist may include zinc compounds such as zinc acetate, zinc chloride, zinc cyanide, zinc nitrate or zinc sulfate; Compounds such as phosphoric acid, polyphosphate pyrophosphate, phosphate or pyrophosphate; and organic compounds such as benzotriazole. The thickness of the rustproof layer may range from 01 to 1 nanometer. According to another embodiment of the present invention, the composition may comprise at least one compound selected from the group consisting of the compounds of the formulas j to 4, a hydrolyzate of the alkylene compound, and a solvent. The amount of the decyl compound may range from 1 to 5% by weight of the composition. When the amount of the fluorenyl compound is 〇 重量 1% by weight or less, the organic layer formed by the surface treatment agent cannot be sufficiently coated on the copper, so that the peel strength cannot be improved. When the amount of the mercaptoalkyl compound is 5% by weight or more, the thickness of the organic layer formed by the surface treatment agent increases and covers the bar on which the copper falls, so that the peel strength cannot be improved. According to another embodiment of the present invention, the solvent may comprise a solvent selected from the group consisting of water, methyl 201009119 ^iy/zpn alcohol, ethanol, acetone, mercaptoethyl hydrazine 11^11丫11丫11^1; 〇116), fluorenyl group At least one of a group consisting of methylethylketone, ethylacetate, and benzene. According to another embodiment of the present invention, in the above method, the heat-resistant layer may be further formed on the copper foil before the formation of the rust-preventing layer. The details of forming the heat-resistant layer are the same as those described for the copper foil for PCB, and therefore are not repeated. According to another embodiment of the present invention, 'in the above method, before the formation of the barrier layer, the layer can be further performed on the copper foil. Form a subsection. In forming the section, by using a cupric oxide product to form a measure on the copper foil, the contact area between the copper foil and the additional coating layer is increased, thereby increasing the copper foil and the additional coating layer. Peel strength. According to another embodiment of the present invention, the flexible copper clad laminate may comprise a copper collar for a PCB and a polyimide film formed on the surface treated film on the copper case. The flexible copper clad laminate may have a two-layer structure (2_φ layer) or a three-layer structure (3-layer) depending on its use. According to another embodiment of the present invention, the polyimide film may be a hardened product of a polyamic acid solution, and the polyphthalic acid may be at least one dianhydride monomer and at least one diamine ( Diamine) a reaction product of a monomer, wherein at least one dianhydride monomer may be selected from the group consisting of pyromellitic dianhydride, 3,3,4,4'-diphenyl-tetracarboxylic acid (3, 3',4,4'-biphenonetetrahydrocarboxylic anhydride), 3,3',4,4'-biphenyltetrahydro acid dianhydride (3, 3,, 4, 4, - 15 201009119 31972pit biphenyltetracarboxylic dianhydride) and 3,3 ',4,4'-Oxo 3,4'-oxydiphthalic anhydride, and at least one diamine monomer may be selected from 4,4'·two Aminodiphenyl ether (4,4'-〇xydianiline), para-phenylene diamine, siloxanediamine (SD), 3,4-diaminodiphenyl (3,4) -oxydianiline) and a group of meta-phenylenediamine. The oxirane diamine (SD) may have the following structure: ch3 - SiO. fH3 - A I - CH ^ CH ^

在SD的結構中,n的範圍為2至12。 在一酐單體與二胺單體反應之後,聚醯胺酸為 =哪祕鍵連接的化合物。例如,由苯均四酸二_ -乳基一本晰應而得之聚軸酸具有以下結構。In the structure of SD, n ranges from 2 to 12. After the monoanhydride monomer is reacted with the diamine monomer, the polyglycolic acid is a compound to which the bond is attached. For example, a poly-axis acid obtained from a pyromellitic acid bis-lactyl group has the following structure.

❹ S熱處理聚胺暖日夺, 亞胺。 可以得到具有以下結構的聚醯 16 201009119 3iy/^pit❹ S heat treatment polyamine warm day, imine. A polyfluorene having the following structure can be obtained 16 201009119 3iy/^pit

Ο Ο 聚醢胺睃 聚醯胺酸之熱處理在氮環境下於約6〇〇c開始及最後 於約400°C的高溫結束。在聚醯胺酸及聚醯亞胺中,n的範 圍為40至200。 聚醯胺酸壳光漆(varnish)可以例如是PMDA/〇DA混 合物、BTDA/PDA 混合物、BTDA/PMDA/ODA/PDA 混合 物或PMDA/ODA-SD混合物。可以根據其使用而選擇其適 當的混合比率。热处理 醢 Polyamide hydrazine The heat treatment of polylysine ends at about 6 ° C in a nitrogen atmosphere and finally at a high temperature of about 400 ° C. In polylysine and polyimine, n ranges from 40 to 200. The varnish may be, for example, a PMDA/〇DA mixture, a BTDA/PDA mixture, a BTDA/PMDA/ODA/PDA mixture or a PMDA/ODA-SD mixture. The appropriate mixing ratio can be selected according to its use.

以下,將參照下述實例更詳細描述本發明;然而,本 發明並不以此為限。使用Brucker DRX_3()()MHz iH_NMR 及Jasco 610 FT-IR來確認在下述實例中經合成之化合物的 結構。 (梦烧基化合物(1)之合成) 實例1 :化合物1之合成 根據下面的反應機制1來合成由式丨表示的化合物 &lt;反應機制1&gt; 17 1 ° 201009119 31972pil WWNH2 + 1-(3-氨基丙基)喃嗅Hereinafter, the present invention will be described in more detail with reference to the following examples; however, the invention is not limited thereto. The structure of the synthesized compound in the following examples was confirmed using Brucker DRX_3()() MHz iH_NMR and Jasco 610 FT-IR. (Synthesis of Dreaming Compound (1)) Example 1: Synthesis of Compound 1 The compound represented by the formula [1] was synthesized according to the following Reaction Mechanism 1 &lt; Reaction Mechanism 1&gt; 17 1 ° 201009119 31972pil WWNH2 + 1-(3- Aminopropyl)

3·縮水甘油醚氧丙基三甲氧基矽烷 N 巧3 Η 0 API·矽烷 將 162.68 克的四氫咬π南(tetrahydrofurane)、6.259 克 (0.05莫耳)的縮水甘油醚氧丙基三甲氧基石夕燒 (glycidoxypropyltrimethoxysilane)及 11.817 克(0.05 莫耳)的 ® 1-(3-氨基丙基)σ米0坐(l-(3-aminopropyl)-imidazole)倒入 (charged)反應器中並反應6小時,在氮環境下維持反應器 之溫度為95°C,且機械攪拌器以300rpm旋轉。在完成反 應之後,使用旋轉蒸發器2小時以從生成物移除溶劑。然 後,在真空烤箱中乾燥生成物24小時,從而得到7克(產 率98 %)由式1表示的化合物1。 4 NMR (300 MHz, CD3OD) : δ 0.62〜0.68(m,1H)、 〇 1.89〜1.96(m,8H)、1.64〜1.67(t,2H)、2.54〜2.56(t,7H)、 2.58〜2.61(m,6H)、3.28〜3.31(m,SiOCH3)、3.38〜3.40(d, 3H)、3.42〜3.44(d,4H)、3.50〜3.58(m,5H)、3.64(s,-NH-)、 3.80(s,OH)、4.05〜4.10(m,9H)、6.95(s, 10H)、7·12〜7.13(t, 11H)、7.65(s,12H) IR (純(neat), cm'1) : 3650~3200(vOH)、 3300〜3200(vNH)、1120〜1050(v~炫氧基)) 18 201009119 ^ivvzpit (銅箔用表面處理劑組成物的製造) 實例2 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物’將溶劑混合物與在實例1中製備的化合物1混合,以 • 製備具有ιο重量%之化合物1的混合溶液。 (二層FCCL的製造) ❹ 實例3 在實例2中製備的混合溶液單獨靜置60分鐘以進行 水解,然後喷灑在小節、阻熱層及防鏽層依序形成於上的 滾製(rolled)銅箔(IL-2,由Iljin製造)上。接著,使用塗抹 ’ 器(applicat〇r)(C.K貿易公司’模型名:CKAF1〇〇3)塗覆滾 . 製銅箔,從而製備經塗覆之銅箔。滾製銅箔上的小節、阻 熱層及防鏽層分別由銅(Cu)、鋅合金及鉻所形成。在 中於120°C乾燥30分鐘經塗覆之銅箔。 箱 參 以 KRICT-PAA 亮先 (BPDA:PMDA:PDA:ODA=3:7:6:4)噴灑使用表 f 成物處理的銅箔,並使用刮刀(d0Ct0r blade)塗 劑組 環境下於6(TC進行30分鐘、120X:進行3〇分鐘、1 ° =氮 行30分鐘以及4G0°C進行10分鐘來硬化經 ^進 酸,以製備聚醯亞胺薄膜,因此,製備經聚酿胺 覆於上的銅落。在實例3中製備的鋼箱胺薄膜塗 「骑為樣品1。 201009119 31972pif 實例4 以在實例3中同樣的方式製備經聚醯亞胺薄膜塗覆 於上的銅$ ’除了使用由Jooyoung產業有限公司製造的亮 光漆(產品名:JY_001)取代KRICT_PAA亮光漆。在實例4 中製備的銅箔以下稱為樣品2。 實例5 以在實例3中同樣的方式製備經聚醯亞胺薄膜塗覆 於上的銅箔’除了使用由Nikko材料製造的滚製銅箔(產品 籲 名:BHY-22B-T)取代滾製銅箔(IL-2,由Iljin製造),且由 UBE有限公司製造的Upilex形式之亮光漆取代 ICRICT-PAA亮光漆^在實例5中製備的銅箔以下稱為樣品 3 〇 比較性實例1 以在實例3中同樣的方式製備經聚酿亞胺薄膜塗覆 於上的銅箔’除了省略使用表面處理劑組成物來處理銅箱 表面的步驟。在比較性實例1中製備的銅箔以下稱為比較 ® 性樣品1。 比較性實例2 以在實例4中同樣的方式製備經聚醜亞胺薄膜塗覆 於上的鋼萡,除了省略使用表面處理劑組成物來處理銅羯 表面的步驟。在比較性實例2中製備的銅箔以下稱為比較 20 2010091193. Glycidyloxypropyltrimethoxydecane N Qiao 3 Η 0 API·decane will be 162.68 g of tetrahydrofurane, 6.259 g (0.05 mol) of glycidyloxypropyltrimethoxysilane Glycidoxypropyltrimethoxysilane and 11.81 g (0.05 mol) of ® 1-(3-aminopropyl)-sigmoid (l-(3-aminopropyl)-imidazole) were charged into the reactor and reacted 6 The reactor was maintained at a temperature of 95 ° C under a nitrogen atmosphere and the mechanical stirrer was rotated at 300 rpm. After the reaction was completed, a rotary evaporator was used for 2 hours to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 24 hours to obtain 7 g (yield 98%) of Compound 1 represented by Formula 1. 4 NMR (300 MHz, CD3OD): δ 0.62~0.68 (m, 1H), 〇1.89~1.96 (m, 8H), 1.64~1.67 (t, 2H), 2.54~2.56 (t, 7H), 2.58~2.61 (m, 6H), 3.28~3.31 (m, SiOCH3), 3.38~3.40 (d, 3H), 3.42~3.44 (d, 4H), 3.50~3.58 (m, 5H), 3.64 (s, -NH-) , 3.80(s, OH), 4.05~4.10(m, 9H), 6.95(s, 10H), 7.12~7.13(t, 11H), 7.65(s,12H) IR (neat, cm' 1) : 3650~3200(vOH), 3300~3200(vNH), 1120~1050(v~decyloxy)) 18 201009119 ^ivvzpit (Manufacture of surface treatment composition for copper foil) Example 2 by 1 : 9 by volume ratio of water and methanol to obtain a solvent mixture 'The solvent mixture was mixed with the compound 1 prepared in Example 1 to prepare a mixed solution of Compound 1 having ι % by weight. (Manufacture of two-layer FCCL) 实例 Example 3 The mixed solution prepared in Example 2 was allowed to stand alone for 60 minutes for hydrolysis, and then sprayed on the rolled, heat-resistant layer and rust-proof layer sequentially formed on the rolled (rolled) Copper foil (IL-2, manufactured by Iljin). Next, a copper foil was coated using an applicator (C.K Trading Company's model name: CKAF1〇〇3) to prepare a coated copper foil. The bars, the heat-resistant layer and the rust-proof layer on the rolled copper foil are respectively formed of copper (Cu), zinc alloy and chromium. The coated copper foil was dried at 120 ° C for 30 minutes. The box ginseng was sprayed with KRICT-PAA first (BPDA:PMDA:PDA:ODA=3:7:6:4) using copper foil treated with the table f, and using a doctor blade (d0Ct0r blade) in the paint group environment at 6 (TC was carried out for 30 minutes, 120X: 3 minutes, 1 ° = nitrogen for 30 minutes, and 4G0 °C for 10 minutes to harden the acid to prepare a polyimide film, thus preparing a polyamine-coated On the upper copper drop. The steel box amine film prepared in Example 3 was coated as "Riding as Sample 1. 201009119 31972pif Example 4 Preparation of copper coated with polyimide film in the same manner as in Example 3 The KRICT_PAA varnish was replaced with a varnish (product name: JY_001) manufactured by Jooyoung Industries Co., Ltd. The copper foil prepared in Example 4 is hereinafter referred to as Sample 2. Example 5 Preparation of polyfluorene in the same manner as in Example 3. The copper foil coated with an imide film was replaced with a rolled copper foil (product name: BHY-22B-T) made of Nikko material instead of a rolled copper foil (IL-2, manufactured by Iljin), and Substitious varnish made by UBE Co., Ltd. replaces ICRICT-PAA varnish ^ Copper foil prepared in Example 5 Hereinafter referred to as sample 3 〇Comparative Example 1 A copper foil coated with a polyimide film was prepared in the same manner as in Example 3 except that the surface treatment composition was omitted to treat the surface of the copper box. The copper foil prepared in Comparative Example 1 is hereinafter referred to as Comparative® Sample 1. Comparative Example 2 A steel crucible coated with a poly-imine film was prepared in the same manner as in Example 4 except that the surface treatment was omitted. The composition of the composition to treat the surface of the matte. The copper foil prepared in Comparative Example 2 is hereinafter referred to as comparison 20 201009119

Jl^/zpu 性樣品2。 比較性實例3 以在實例5中同樣的方式製備經聚醯亞胺薄臈塗覆 於上的銅箔,除了省略使用表面處理劑組成物來處理銅箔 表面的步驟。在比較性實例3中製備的銅箔以下稱為比較 性樣品3。 評估實例Μ :剝離強度測試 使用ASTMD-638指定的方法量測樣品1至3及比較 性樣品1至3的剝離強度。橫擔速度(cr〇ss_Hea(j Spee(j)為 25 mm/min且樣品的寬度為5 mm。使用Instnm 8516進行 量測。量測的結果如下面的表1所示。 &lt;表1&gt; 剝離強度[kg/cm] I匕較性砂 上b較性£例 0.73 0.32 0.76 0.38 0.58 0.28 如表1所示, 根據本發明之實施例,相比於沒有使用 21 201009119 31V/2pit 表面處理劑組成物製備之比較性樣品1至3,使用包含矽 烧基化合物之表面處理劑組成物製備之樣品1至3於聚醯 亞胺及銅箔之間顯示大幅增加的剝離強度。 評估實例1-2 :防潮性測試 於50 C、相對濕度8〇 %在怪溫渔器(thermo-hygrostat) HIRAYANAPC-R7中儲存樣品】至3進行7天,樣品1至 3的變色(discoloration)明顯。7天後,樣品1至3的顏色沒Jl^/zpu sex sample 2. Comparative Example 3 A copper foil coated with a polyimide film was prepared in the same manner as in Example 5 except that the step of treating the surface of the copper foil using the surface treatment composition was omitted. The copper foil prepared in Comparative Example 3 is hereinafter referred to as Comparative Sample 3. Evaluation Example 剥离: Peel Strength Test The peel strengths of Samples 1 to 3 and Comparative Samples 1 to 3 were measured using the method specified by ASTM D-638. Cross-pitch speed (cr〇ss_Hea (j Spee(j) was 25 mm/min and the width of the sample was 5 mm. Measurement was performed using Instnm 8516. The results of the measurement are shown in Table 1 below. &lt;Table 1&gt; Peel strength [kg/cm] I匕Comparative sand b fairness Example 0.73 0.32 0.76 0.38 0.58 0.28 As shown in Table 1, according to the embodiment of the present invention, compared with no use 21 201009119 31V/2pit surface treatment composition Comparative Samples 1 to 3 for the preparation of the materials, Samples 1 to 3 prepared using the surface treatment composition containing the bismuth-based compound showed a greatly increased peel strength between the polyimide and the copper foil. : Moisture resistance test at 50 C, relative humidity 8〇% in the thermo-hygrostat HIRAYANAPC-R7 stored samples] to 3 for 7 days, sample 1 to 3 discoloration (discoloration) is obvious. After 7 days , the color of samples 1 to 3 is not

有改變。 (石夕燒基化合物(2)之合成) 實例6A:化合物2A之合成 根據下面的反應機制2合成由式2表示的化合物2A。 &lt;反應機制2&gt; 〇There are changes. (Synthesis of the compound (2)) Example 6A: Synthesis of Compound 2A Compound 2A represented by Formula 2 was synthesized according to the following Reaction Mechanism 2. &lt;Reaction mechanism 2&gt; 〇

其中R為甲基。 將125.712克的四氫呋喃、8 9645克(〇.〇5莫耳)的3-氨基丙基二甲氧基石夕燒(3-aminopropyltrimethoxysilane)及 5.0035克(0 05莫耳)的琥绍酸酐(succinic anhydri(ie)倒入反 應器中並反應6小時,在氮環境下維持反應器之溫度為 -5C至5C,且機械攪拌器以30〇rprn旋轉。在完成反應之 22 201009119 jiy/zpu 後’使用旋轉蒸發器2小時以從生成物移除溶劑。然後, 在真空烤箱中乾燥生成物24小時,從而得到13.9克(產率 99%)由式2表示的化合物2A。 ^NMR (300 MHz): δ 0.53~0.58(m, 1H)&gt; 1.42-1.45(m, 2H)、2.29〜2.31(d, 4H)、2.38〜2.43(m,5H)、2.98〜3.00(m, 3H)、3.40〜3.46(m,SiOCH3)、8.00(s,_NH_)、12.00(s,-OH) IR (純,cm-1) : 3650〜3200(vOH)、3300〜3200(vNH)、 ❹ 1650(vCONH)、ii20〜1050(v 梦(从基)) 實例6B :化合物2B之合成 根據下面的反應機制2合成由式2表示的化合物 2B。 &lt;反應機制2&gt;Wherein R is a methyl group. 125.712 g of tetrahydrofuran, 8 9645 g of 3-aminopropyltrimethoxysilane and 5.035 g of (0 05 mol) of succinic anhydri (ie) poured into the reactor and reacted for 6 hours, maintaining the reactor temperature at -5 C to 5 C under nitrogen, and the mechanical stirrer was rotated at 30 〇 rprn. After the completion of the reaction 22 201009119 jiy/zpu 'use The evaporator was rotated for 2 hours to remove the solvent from the product. Then, the product was dried in a vacuum oven for 24 hours to obtain 13.9 g (yield: 99%) of the compound 2A represented by the formula 2. ^NMR (300 MHz): δ 0.53~0.58(m, 1H)&gt; 1.42-1.45(m, 2H), 2.29~2.31(d, 4H), 2.38~2.43(m, 5H), 2.98~3.00(m, 3H), 3.40~3.46 (m, SiOCH3), 8.00 (s, _NH_), 12.00 (s, -OH) IR (pure, cm-1): 3650~3200 (vOH), 3300~3200 (vNH), ❹ 1650 (vCONH), ii20 ~1050 (v Dream (from base)) Example 6B: Synthesis of Compound 2B The compound 2B represented by Formula 2 was synthesized according to the following Reaction Mechanism 2. <Reaction Mechanism 2>

其中R為乙基。 將125.712克的四氫呋喃、11.0685克(0.05莫耳)的 3-氨基丙基三乙氧基石夕院(3-aminopropyltriethoxysilane)及 5.0035克(0.05莫耳)的琥珀酸酐倒入反應器中並反應6小 時,在氮環境下維持反應器之溫度為-5°C至5°C,且機械 攪拌器以300 rpm旋轉。在完成反應之後,使用旋轉蒸發 23 201009119 31972pif 器2小時從生成物移除溶劑。然後,在真空烤箱中乾燥生 成物24小時,從而得到16克(產率99%)由式2表示的化 合物2B。 】HNMR (300 ΜΗζ): δθ.58〜0.60(m,1H)、1.22〜1.25(m, Si-CH2)、1.60~1.63(m,2H)、2.45〜2.49(m,4Η)、2·51 〜2.54(m, 5H)、3.20〜3.25(m,3H)、3.83〜3.87(m, Si-CH3) IR (純,cm·1) : 3650〜3200(voh)、3300〜3200(vNH)、 1650(vCONH)、1120〜l〇5〇(vq炫氧基)) (銅箔用表面處理劑組成物的製造) 實例7至11 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物,將溶劑混合物與在實例6A中製備的化合物2A混合’ 以製備分別具有0.5重量%、1重量%、2重量%、3重量% 及5重量%之化合物2A的混合溶液。 實例12至16 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物,將溶劑混合物與在實例6B中製備的化合物2B混合, 以製備分別具有0.5重量°/〇、1重量%、2重量%、3重量% 及5重量%之化合物2B的混合溶液。 (二層FCCL之製造) 24 201009119 實例17至26 f實例7至16中製備的混合溶液單獨靜置60分鐘以 由:i解:然後分別噴灑在經&amp;塗覆之滾製銅箔(几_2, P 造)上。接著,使用塗抹器塗覆滾製銅箔,從而 二J塗覆之鋼箱。在烤箱中於赋乾、燥30 *鐘經塗覆 袁本、、Π、-Jooyoung產業有限公司(產品名:jy~00 1)製造的 噴丨麗使絲面處糊組成物處理的㈣,並使用刮 刀覆之。 在氮環境下於60〇C進行30分鐘、12(rc進行3〇分 TC進行30分鐘以及備。c進们〇分鐘來硬化經塗 覆之t醯胺酸,以製備聚醯亞胺_,因此,製備經 =薄膜分別塗覆於上的銅箱。在實例17至26中製備的 銅治以下稱為樣品4至13。 比較性實例4 以在實例17中同樣的方式製備經聚醯亞胺薄膜塗覆 於上的銅荡’除了省略使用表面處理劑組成物來處理銅箱 表面的步驟。在比較性實例4中製備的銅箔以下稱為比 性樣品4。 評估實例2-1 :剝離強度測試 使用ASTM D-638指定的方法量測樣品4至13及比 較性樣品4的剝離強度。橫擔速度為25 mm/min且樣品的 25 201009119 31972pif 寬度為5 mm。使用InStron8516進行量測。量測的結果如 下面的表2所示。 〈表2&gt; 剝離強度[kg/cm] 實例Π (樣品4) 0 78 實例18 (樣品5) 0.86 實例19 (樣品6) 實例20 (樣品7) 0.93 1.05 實例21 (樣品8) 1 0.92 實例22 (樣品9) 0 82 實例23 (檨品1〇) 0.89 實例24 (樣品11) 1.02 實例25 (樣品12) 1.12 實例26 (樣品13) 0.94 較性樣品 4) 0.38 如表2所示’根據本發明之實施例,相比於沒有使用 表面處理敝成物製備之比較性樣品4,使用包含魏基 f合物之表面處理劑組成物製備之樣品4至13於聚醯亞胺 4膜及銅_之間顯示大幅增加的剝離強度。 評估實例2-2 :防潮性測試 於50C、相對濕度8〇 %在恆溫溼器Hirayana 26 201009119 PC-R7中儲存樣品4至13進行7天,樣品4至13的變色 明顯。7天後,樣品4至13的顏色沒有改變。 (矽烷基化合物(3)之合成) 實例27 :化合物3之合成 根據下面的反應機制3合成由式3表示的化合物3。 &lt;反應機制3&gt;Wherein R is an ethyl group. 125.712 grams of tetrahydrofuran, 11.08685 grams (0.05 moles) of 3-aminopropyltriethoxysilane and 5.035 grams (0.05 moles) of succinic anhydride were poured into the reactor and reacted for 6 hours. The reactor temperature was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. After the completion of the reaction, the solvent was removed from the product using a rotary evaporation 23 201009119 31972 pif for 2 hours. Then, the resultant was dried in a vacuum oven for 24 hours, thereby obtaining 16 g (yield 99%) of Compound 2B represented by Formula 2. HNMR (300 ΜΗζ): δθ.58~0.60 (m, 1H), 1.22~1.25 (m, Si-CH2), 1.60~1.63 (m, 2H), 2.45~2.49 (m, 4Η), 2.51 ~2.54 (m, 5H), 3.20~3.25 (m, 3H), 3.83~3.87 (m, Si-CH3) IR (pure, cm·1): 3650~3200 (voh), 3300~3200 (vNH), 1650 (vCONH), 1120 to l〇5〇 (vq methoxy)) (Production of surface treatment composition for copper foil) Examples 7 to 11 By mixing water and methanol in a volume ratio of 1:9 to obtain a solvent The mixture was mixed with the compound 2A prepared in Example 6A to prepare a mixed solution of Compound 2A having 0.5% by weight, 1% by weight, 2% by weight, 3% by weight and 5% by weight, respectively. Examples 12 to 16 The solvent mixture was mixed with the compound 2B prepared in Example 6B by mixing water and methanol in a volume ratio of 1:9 to prepare 0.5 wt%/〇, 1 wt%, respectively. A mixed solution of 2% by weight, 3% by weight, and 5% by weight of Compound 2B. (Manufacturing of two-layer FCCL) 24 201009119 Examples 17 to 26 f The mixed solutions prepared in Examples 7 to 16 were allowed to stand alone for 60 minutes to be solved by: i: then separately sprayed on &amp; coated rolled copper foil (several _2, P made). Next, the rolled copper foil was coated with an applicator to thereby coat the steel box. In the oven, dry and dry 30 * clock coated with Yuan Ben, Π, - Jooyoung Industry Co., Ltd. (product name: jy ~ 00 1) manufactured by squirting the silk paste at the surface of the paste composition (four), And use a scraper to cover it. Under a nitrogen atmosphere, the temperature was 60 ° C for 30 minutes, 12 (rc was carried out for 3 minutes, TC for 30 minutes, and prepared for a minute to harden the coated t-proline to prepare polyimine _, Thus, copper boxes to which the films were respectively applied were prepared. The copper treatments prepared in Examples 17 to 26 are hereinafter referred to as Samples 4 to 13. Comparative Example 4 Preparation of Polypyrene in the same manner as in Example 17 The copper film coated on the amine film was omitted except that the surface treatment composition was omitted to treat the surface of the copper box. The copper foil prepared in Comparative Example 4 is hereinafter referred to as Comparative Sample 4. Evaluation Example 2-1: Peel Strength Test The peel strengths of Samples 4 to 13 and Comparative Sample 4 were measured using the method specified in ASTM D-638. The cross-arm speed was 25 mm/min and the sample 25 201009119 31972 pif width was 5 mm. Measurements were performed using InStron 8516. The results of the measurement are shown in Table 2 below. <Table 2> Peel strength [kg/cm] Example Π (Sample 4) 0 78 Example 18 (Sample 5) 0.86 Example 19 (Sample 6) Example 20 (Sample 7 ) 0.93 1.05 Example 21 (Sample 8) 1 0.92 Example 22 (Sample 9) 0 82 Example 23 (Products) 1〇) 0.89 Example 24 (Sample 11) 1.02 Example 25 (Sample 12) 1.12 Example 26 (Sample 13) 0.94 Comparative Sample 4) 0.38 As shown in Table 2 'According to the embodiment of the present invention, compared to no surface used In Comparative Sample 4, which was prepared for the preparation of the composition, Samples 4 to 13 prepared using the surface treatment composition containing the Wei group of the compound showed a greatly increased peel strength between the polyimide film and the copper. Evaluation Example 2-2: Moisture Resistance Test Samples 4 to 13 were stored in a thermostat humidifier Hirayana 26 201009119 PC-R7 for 7 days at 50 C and a relative humidity of 8 ,, and the discoloration of the samples 4 to 13 was remarkable. After 7 days, the colors of samples 4 to 13 did not change. (Synthesis of fluorenyl compound (3)) Example 27: Synthesis of Compound 3 Compound 3 represented by Formula 3 was synthesized according to the following Reaction Mechanism 3. &lt;Reaction mechanism 3&gt;

ΤΛ vn « Ό FOCA^TimS 將125.712克的四氫呋喃、8.9645克(0.05莫耳)的3_ 氨基丙基三曱氧基矽烷及7.4550克(0.05莫耳)的2,3-吡啶 ❹ 二酸酐(2,3-pyridinedicarboxylic anhydride)倒入反應器中並 反應5小時,在氮環境下維持反應器之溫度為^^至, 且機械攪拌器以300 rpm旋轉。在完成反應之後,使用旋 轉蒸發器2小時以從生成物移除溶劑。然後,在真空烤箱 中乾燥生成物24小時,從而得到μ 4克(產率99 %)由式 3表示的化合物3。 !HNMR (300 MHz) : δ〇.57-〇.59(ί, 1Η)' 1.62-1.80(m, 27 201009119 31972pit 2H)、3.62〜3.67(m,Si-CH3)、3.85〜3.87(t,3H)、7.93〜7.95(t, 4H)、8.56(s, NH)、8.64〜8.67(d, 5H)、9.09〜9.11(d,6H)、 13.80(s,OH) IR (純,cnf1) : 3650〜3200(vOH)、3300〜3200(vNH)、 1650(Vc〇nh)、. 1120〜1050(v 發(统氧基)) (銅镇用表面處理劑組成物的製造) 實例28至29 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 φ 物’將溶劑混合物與在實例27中製備的化合物3混合,以 製備分別具有0.5重量%及1重量之化合物3的混合溶液。 (二層FCCL之製造) - 實例30至31 在實例28至29中製備的混合溶液單獨靜置6〇分鐘 以進行水解,然後分別喷灑在經Cr塗覆之滚製銅箔(IL_2, 由11 細製造)上。接著,使用塗抹器塗覆銅落,從而製備 ^塗覆之銅。在烤箱中於12(rc乾燥3G分鐘經塗覆之銅 ❹ ”ττ上巧有限公,製造的Upilex形式之亮光漆(產 並使)喷驗職㈣理劑組成物處理的銅 品名 箔, 、120°C進行30分鐘、 分鐘來硬化經塗覆之 。在氮環境下於6〇°c進行3〇分鐘 250 C進行3〇分鐘以及4〇(rc進〇 28 201009119 =胺酸,以製備㈣亞胺賴 比較性實例5 於μ 在實例%巾隨的方式製備經祕亞胺薄膜塗覆 ^的峨’除了省略使用表面處理劑組成物來處理銅落 =的步驟。在比較性實例5中製備的㈣以下稱為比較 評估實例3-1 :剝離強度測試 使用ASTMD-638指定的方法量測樣品14至15及比 較性樣品5的剝離強度。橫擔速度為25 mm/min且樣品的 寬度為5 mm。使用DiStron8516進行量測。量測的結果如 下面的表3所示。ΤΛ vn « Ό FOCA^TimS will be 125.712 grams of tetrahydrofuran, 8.9645 grams (0.05 moles) of 3-aminopropyltrimethoxy decane and 7.4550 grams (0.05 moles) of 2,3-pyridinium dianhydride (2, 3-pyridinedicarboxylic anhydride) was poured into the reactor and reacted for 5 hours, the temperature of the reactor was maintained under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. After the completion of the reaction, a rotary evaporator was used for 2 hours to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 24 hours to obtain 4 g (yield 99%) of Compound 3 represented by Formula 3. !HNMR (300 MHz): δ〇.57-〇.59(ί, 1Η)' 1.62-1.80(m, 27 201009119 31972pit 2H), 3.62~3.67 (m, Si-CH3), 3.85~3.87 (t, 3H), 7.93~7.95(t, 4H), 8.56(s, NH), 8.64~8.67(d, 5H), 9.09~9.11(d,6H), 13.80(s,OH) IR (pure, cnf1): 3650~3200(vOH), 3300~3200(vNH), 1650(Vc〇nh), .1120~1050(v hair (all oxygen)) (manufacture of copper surface treatment composition) Examples 28 to 29 The solvent mixture was mixed with the compound 3 prepared in Example 27 by mixing water and methanol in a volume ratio of 1:9 to obtain a mixed solution of Compound 3 prepared in Example 27 to prepare a mixed solution of Compound 3 having 0.5% by weight and 1% by weight, respectively. . (Manufacture of two-layer FCCL) - Examples 30 to 31 The mixed solutions prepared in Examples 28 to 29 were separately allowed to stand for 6 minutes for hydrolysis, and then sprayed separately on a Cr-coated rolled copper foil (IL_2, 11 fine manufacturing). Next, the copper drop was coated using an applicator to prepare a coated copper. In the oven, on the 12 (rc dry 3G min coated copper ❹ τ τ 上 上 , , , , 制造 制造 Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up Up The coating was applied at 120 ° C for 30 minutes and minutes. Under a nitrogen atmosphere at 6 ° C for 3 〇 250 C for 3 〇 and 4 〇 (rc into 28 201009119 = amine acid to prepare (4) Comparative Example 5 The preparation of the imine film coated in the manner of the example % towel was repeated except that the surface treatment composition was omitted to treat the copper drop =. In Comparative Example 5 Prepared (4) hereinafter referred to as Comparative Evaluation Example 3-1: Peel Strength Test The peel strengths of Samples 14 to 15 and Comparative Sample 5 were measured using the method specified in ASTM D-638. The cross-arm speed was 25 mm/min and the width of the sample was It is 5 mm. The measurement was performed using a DiStron 8516. The results of the measurement are shown in Table 3 below.

&lt;表3&gt; --&quot; 剝離強度[kgf/cml 實例30 (樣品14) 0 82 實例31 (樣品15) 0.78 比較性實例5 (比較性樣品5) ---- ------__| — 0.32 如表3所示,根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品5,使用包含矽烷基 29 201009119 319/^ρΐί 化合物之表面處理劑製備之樣品14至15於聚醯亞胺薄膜 及銅fl之間具有大幅增加的剝離強度。 評估實例3-2 :防潮性測試 於50。(:、相對濕度80 %在恆溫溼器HIRAYANA PC_R7中儲存樣品14至15進行7天,樣品14至15的變 色明顯。7天後,樣品14至15的顏色沒有改變。 (矽烷基化合物(4)之合成) 實例32A ··化合物4A之合成 根據下面的反應機制4合成由式4表示的化合物4A。 &lt;反應機制4&gt;&lt;Table 3&gt;--&quot; Peel strength [kgf/cml Example 30 (Sample 14) 0 82 Example 31 (Sample 15) 0.78 Comparative Example 5 (Comparative Sample 5) ---- ------ __| — 0.32 As shown in Table 3, according to an embodiment of the present invention, a comparative sample 5 prepared without using a surface treating agent composition was prepared using a surface treating agent containing a decyl 29 201009119 319/^ρΐί compound. Samples 14 to 15 have a greatly increased peel strength between the polyimide film and copper fl. Evaluation Example 3-2: Moisture resistance test at 50. (:, relative humidity 80% was stored in the thermostat HIRAYANA PC_R7 for 14 days, and the discoloration of the samples 14 to 15 was remarkable. After 7 days, the color of the samples 14 to 15 did not change. (矽alkyl compound (4 Synthesis of Example 32A · Synthesis of Compound 4A Compound 4A represented by Formula 4 was synthesized according to the following Reaction Mechanism 4. <Reaction Mechanism 4>

其中R為甲基。 將125.712克的四氫呋喃、8.9645克(〇.〇5莫耳)的3_ 氨基丙基三甲氧基矽烷及9.6065克(0.05莫耳)的偏苯三酸 酐(l,2,4-benzenetricarboxylic acid anhydride) (2,3-«比咬二酸 酐)倒入反應器中並反應6小時’在氮環境下維持反應器之 溫度為-5°C至5°C,且機械攪拌器以250rpm旋轉。在完成 反應之後,使用旋轉蒸發器1小時以從生成物移除溶劑。 然後,在真空烤箱中乾燥生成物48小時,從而得到185 30 201009119 3iy/2pit 克(產率99%)由式4表示的化合物4A。 hNMR (300 MHz) : δθ.62〜0.65(t,1H)、1.71 〜1.76(m, 2H)、3.41 〜3.47(m,Si-CH3)、3.56〜3.60(m,3H)、7.45(s,NH) IR (純,cnT1) : 3650〜3200(voh)、3300〜3200〇NH)、 1650(Vc〇nh)、1120〜1050(v 矽_(烷氣基)) 實例32B :化合物4B之合成 © 根據下面的反應機制4合成由式4表示的化合物4B〇 &lt;反應機制4&gt;Wherein R is a methyl group. 125.712 grams of tetrahydrofuran, 8.9645 grams of 3 -aminopropyltrimethoxydecane, and 9.6065 grams of (0.05 moles) of trimellitic anhydride (1,2,4-benzenetricarboxylic acid anhydride) (2,3 - «Bite dianhydride was poured into the reactor and reacted for 6 hours'. The temperature of the reactor was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 250 rpm. After the completion of the reaction, a rotary evaporator was used for 1 hour to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 48 hours to obtain 185 30 201009119 3iy / 2 psi (yield 99%) of Compound 4A represented by Formula 4. hNMR (300 MHz): δ θ.62~0.65 (t, 1H), 1.71 to 1.76 (m, 2H), 3.41 to 3.47 (m, Si-CH3), 3.56 to 3.60 (m, 3H), 7.45 (s, NH) IR (pure, cnT1): 3650~3200(voh), 3300~3200〇NH), 1650(Vc〇nh), 1120~1050(v 矽_(alkyl)) Example 32B: Synthesis of Compound 4B © Compound 4B represented by Formula 4 is synthesized according to the following Reaction Scheme 4 &lt; Reaction Mechanism 4&gt;

其中R為乙基。Wherein R is an ethyl group.

將125J12克的四氫吱喃、8.9645克(0.05莫耳)的3_ 氨基丙基三乙氧基矽烷及9.6065克(0.05莫耳)的偏笨三酸 軒(l,2,4-benzenetricarboxylic acid anhydride) (2,3-吼唆二酸 酐)倒入反應器中並反應6小時’在氮環境下維持反應器之 溫度為-5°C至5°C,且機械攪拌器以250rpm旋轉。在完成 反應之後,使用旋轉蒸發器1小時以從生成物移除溶劑。 然後,在真空烤箱中乾燥生成物48小時,從而得到2〇6 克(產率99%)由式4表示的化合物4B。 · 31 201009119 31972pit NMR (300 MHz,CD3〇D) : δ〇.71 〜0.73(t,1H)、 1.14〜1.23(m,Si-CH3)、1.71 〜1.74(m,2H)、3.58〜3.60(t, 3H) ' 3.79-3.86(m, Si-CH2) &gt; 8.55(s, NH) IR (純,cm·1) : 3650〜3200(V〇H)、3300〜3200(vNH)、 1650(vc_)、1120 〜1050(v^(炫氧基)) (銅箔用表面處理劑組成物的製造) 實例33至34 藉由以1:9之體積比率混合水及曱醇以得到溶劑混合 物’將溶劑混合物與在實例32A中製備的化合物4A混合, 以製備分別具有〇·5重量%及】重量%之化合物4A的混合 溶液。 實例35至36125J12g of tetrahydrofuran, 8.9645g (0.05m) of 3-aminopropyltriethoxydecane and 9.6065g (0.05m) of l,2,4-benzenetricarboxylic acid anhydride (2,3-Sebacic anhydride) was poured into the reactor and reacted for 6 hours 'The temperature of the reactor was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 250 rpm. After the completion of the reaction, a rotary evaporator was used for 1 hour to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 48 hours to obtain 2 〇 6 g (yield 99%) of Compound 4B represented by Formula 4. · 31 201009119 31972pit NMR (300 MHz, CD3〇D): δ〇.71 ~0.73(t,1H), 1.14~1.23(m,Si-CH3), 1.71~1.74(m,2H), 3.58~3.60 ( t, 3H) ' 3.79-3.86(m, Si-CH2) &gt; 8.55(s, NH) IR (pure, cm·1): 3650~3200(V〇H), 3300~3200(vNH), 1650( Vc_), 1120 to 1050 (v^(decyloxy)) (manufacture of surface treatment composition for copper foil) Examples 33 to 34 by mixing water and decyl alcohol in a volume ratio of 1:9 to obtain a solvent mixture' The solvent mixture was mixed with Compound 4A prepared in Example 32A to prepare a mixed solution of Compound 4A having 〇·5% by weight and 重量% by weight, respectively. Examples 35 to 36

物,j由以1:9之體積比率混合水及曱醇以得到溶劑混 ^谷劑混合物與在實例32B中製備的化合物犯混名 溶^備分別具有〇.5重量%及1重量%之化合物4B的混 (二層FCCL的製造) 實例37至40 以進33至36巾製備的混合溶液單獨靜置60分鐘 由^然後分別喷灑在經Cr塗覆之滾製鋼箱(IL_2, 造)上。接著,使用塗抹器塗覆銅揭,從而製備 32 201009119 ^ly/zpn 經塗覆之銅箔。在烤箱中於 箔0 、And j, the mixture of water and decyl alcohol was mixed at a volume ratio of 1:9 to obtain a solvent mixture and the compound prepared in Example 32B was mixed with 5% by weight and 1% by weight, respectively. Mixing of Compound 4B (manufacture of two-layer FCCL) Examples 37 to 40 The mixed solution prepared by injecting 33 to 36 towels was separately allowed to stand for 60 minutes, and then separately sprayed on a Cr-coated rolled steel box (IL_2, manufactured). on. Next, copper was coated with an applicator to prepare 32 201009119 ^ly/zpn coated copper foil. In the oven in foil 0,

Uot:乾燥30分鐘經塗覆之銅 ㈣限公司製造的亮光漆(產品名: 刀塗覆之。使絲處理驗處理的_,並使用刮 25〇。〇^魏下於贼進行3G分鐘、賦進行3〇分鐘、 ❹ 聚酿胺齡订3〇 t鐘以及4〇〇°C進行1〇分鐘來硬化經塗覆之 ^,酸’以製備聚輕胺_,因此,製備經聚醯亞胺 /膜刀別塗覆於上的銅。在實例37至4 以下稱為樣品16至19。 比較性實例6 以在實例37中同樣的方式製備經聚酿亞胺薄膜塗覆 於上的銅’除了省略使絲面處理劑組成物來處理銅猪 表面的步驟。在比較性實例6中製備的銅落以下稱為比較 性樣品6。 評估實例4-1 :剝離強度測試 使用ASTMD-638指定的方法量測樣品16至19及比 較性樣品6的剝離強度。橫擔速度為25mm/min且樣品的 寬度為5 mm。使用Instron 8516進行量測。量測的結果如 下面的表4所示。 &lt;表4&gt; 33 201009119 ^iy/2pu ---—_ 剝離強度[kgf/cm] —-37 (樣品 16) 1.60 —-品 17) 1.35 —-品 18) 1.98 ^品 19) 1.57 較性樣品 6) 1 0.38Uot: Drying 30 minutes coated copper (4) limited company made of varnish (product name: knife coated. Make silk treatment treatment _, and use scraping 25 〇. 〇 ^ Wei under the thief for 3G minutes, The preparation is carried out for 3 minutes, 聚 polyamine dosage for 3 〇t clock and 4 〇〇 ° C for 1 来 to harden the coated acid, to prepare poly-light amine _, thus preparing The amine/film blade was coated with copper. Examples 37 to 4 are referred to below as samples 16 to 19. Comparative Example 6 Copper prepared by coating a polyimide film in the same manner as in Example 37 was prepared. 'In addition to the step of omitting the surface treatment composition to treat the copper pig surface. The copper drop prepared in Comparative Example 6 is hereinafter referred to as Comparative Sample 6. Evaluation Example 4-1: Peel strength test specified using ASTM D-638 The method measures the peel strength of samples 16 to 19 and comparative sample 6. The cross-web speed was 25 mm/min and the width of the sample was 5 mm. The measurement was performed using an Instron 8516. The results of the measurement are shown in Table 4 below. &lt;Table 4&gt; 33 201009119 ^iy/2pu ----_ Peel strength [kgf/cm] —-37 (Sample 16) 1.6 0 —-Product 17) 1.35 —-Product 18) 1.98 ^Product 19) 1.57 Comparative sample 6) 1 0.38

如表4所示’根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品6,使用包含矽烷基 化,物之表面處理劑組成物製備之樣品16至19於聚醯亞 胺_及_之間具有大闕加關離強度。 評估實例4-2 :防潮性測試 於50 t:、相對濕度80 %在恆溫溼器HIRAYANA P&lt;=^R7中儲存樣品16至19進行7天,樣品16至19的變 色明顯。7天後’樣品16至19的顏色沒有改變。As shown in Table 4, samples 16 to 19 prepared using a surface treatment composition comprising a ruthenium alkylation were compared to Comparative Sample 6 prepared without using a surface treatment composition, according to an embodiment of the present invention. There is a large enthalpy and entanglement strength between polyimine and _. Evaluation Example 4-2: Moisture Resistance Test Samples 16 to 19 were stored for 7 days at 50 t:, relative humidity of 80% in a thermostatic humidifier HIRAYANA P&lt;=^R7, and the samples 16 to 19 were significantly changed. The color of samples 16 to 19 did not change after 7 days.

(根據聚醜亞胺之形式之剝離強度的比較) (2層FCCL的製造) 實例41至44 以在實例37中同樣的方式製備經聚醯亞胺薄膜塗覆 =上的銅箔,除了使用PMDA/ODA亮光漆、BTDA/PDA 亮光漆、BTDA/PMDA/ODA/PDA亮光漆及 PMDA/ODA-SD亮光漆分別取代由有限公司製造的 34 201009119(Comparison of peel strength according to the form of polyugly imine) (Production of 2-layer FCCL) Examples 41 to 44 Copper sheets coated with polyimide film were prepared in the same manner as in Example 37 except for use. PMDA/ODA varnish, BTDA/PDA varnish, BTDA/PMDA/ODA/PDA varnish and PMDA/ODA-SD varnish respectively replaced by 34 201009119

Upilex形式之亮光漆。此處,使用〇5重田0 以上描述的亮光漆是由以下描述的方 PMDA/ODA亮光漆 ° 將255.000克的N,N-二曱其7絲 χτ , Τ基乙醯胺(DMAc ; Ν,Ν-dimethylacetamide)、21·538 克(0·1〇7563 莫 4 4, ® 二氨基二苯醚及23·462克(〇.職63莫耳)的苯均四酸」軒 依序倒入反應器中並反應24+時,在氮環境下維持反應器 之溫度為-5°C至5°C,且機械攪拌器以35〇rpm旋轉。然 後’從而製備包含15重量%之聚醯胺酸的亮光漆。 . BTDA/PDA亮光漆 將255.000克的DMAc (N,N-二曱基乙酿胺)、n.307 克(0.104561莫耳)的間苯二胺及33.693克(0.104561莫耳) 的 3,3',4,4'- 二苯酮四甲 酸二軒 (3,3,4,4 -biphenontetracarboxylic acid anhydride)倒入反應 器中並反應24小時’在氮環境下維持反應器之溫度為_5。〇 至5 °C ’且機械擾拌器以350 rpm旋轉。然後,從而製儀 包含15重量%之聚醯胺酸的亮光漆。 BTDA/PMDA/ODA/PDA 亮光漆 將 255 克的 DMAc、6.334 克(0.031633 莫耳)的 4,4’- 35 201009119 31972pit 二氨基二苯醚及7.982克(0.073811莫耳)的間笨二胺倒入 反應器中並完全溶解。然後,將23.784克(0.073811莫耳) 的 3,3f,4,4’- 二苯酮四甲 酸二野 (3,3’,4,4’-biphenontetracarboxylic anhydride)及 6.900 克 (0.031633莫耳)的苯均四酸二酐倒入反應器中並反應24小 時,在氮環境下維持反應器之溫度為-5 °C至5 °C,且機械 攪拌器以350 rpm旋轉。然後,從而製備包含15重量。/〇之 聚醯胺酸的亮光漆。 PMDA/ODA-SD 亮光漆 將 127.5 克的 DMAc、9.826 克(0.04907 莫耳)的 4,4,-二氨基二苯醚及1.408克(0.002583莫耳)的SD-545倒入反 應器中並完全溶解。然後,將11.267克(0.0.051653莫耳) 的苯均四酸二酐倒入反應器中並反應24小時,在氮環境下 雉持反應器之溫度為-5°C至5°C,且機械攪拌器以350rpm 旋轉。然後,從而製備包含15重量%之聚醯胺酸的亮光漆。 比較性實例7至10 以在實例41至44中同樣的方式製備經聚醯亞胺薄膜 塗覆於上的銅箔,除了省略使用表面處理劑組成物來處理 銅箔表面的步驟。在比較性實例7至10中製備的銅箔以下 稱為比較性樣品7至10。 評估實例5 -剝離強度測試 36 201009119 ^iy/2Pu 使用ASTM D-638指定的方法量測樣品2〇至23及比 較性樣品7至1〇的剝離強度。橫擔速度為25 mm/min且 樣品的寬度為5 mm。使用Instron 8516進行量測。量測的 結果如下面的表5所示。 &lt;表5&gt; — ——- 剝離強度丨kg/cml __ 實例41 (樣品20) 1.02 _ 實例42 (樣品21) 0.93 __實例43 (樣品22) _ 實例44 (樣品23) _ 1.21 1.53 較性實例7(比較性樣品7) 性實例8(比較性樣品8) 0.52 0.39 _____^較性實例9(比較性樣品9) 0.61 性實例10 (比較性樣品1〇) ----- 0.72 如表5所示,根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品7至1〇,使用包含矽 烷基化合物之表面處理劑組成物製備之樣品2〇至23於聚 酿亞胺薄膜及銅箔之間具有大幅增加的剝離強度。 如上所述’相比於沒有表面處理薄膜形成於上的pcB 或是包含一般矽烷基化合物之表面處理薄膜形成於上的 pCB,根據本發明之包含矽烷基化合物或矽烷基化合物之 水解物之表面處理賴職於上的pcB具有提高的剝離 37 201009119 31972pif 強度 本發已以實施例揭露如上,然其並非用以限定 本發明之精神和範=領以=識者’在不脫離 發明之保護範ϋ當視後附之申請專更動與潤飾’故本 【圖式簡單朗】 '範圍所界定者為準。 無。 【主要元件符號說明】 無。A varnish of the Upilex form. Here, the varnish described above using 〇5重田0 is a square PMDA/ODA varnish as described below. 255.000 g of N,N-dioxin 7 χτ, decyl acetamide (DMAc; Ν, Ν-dimethylacetamide), 21·538 g (0·1〇7563 Mo 4 4, ® diaminodiphenyl ether and 23·462 g (〇. 63 mol) of pyromellitic acid” While reacting 24+, the reactor temperature was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 35 rpm. Then, a 15% by weight poly-proline was prepared. Bright lacquer. BTDA/PDA varnish will have 255.000 grams of DMAc (N,N-dimercaptoamine), n.307 grams (0.104561 moles) of m-phenylenediamine and 33.693 grams (0.104561 moles) 3,3',4,4'-3,3,4,4-biphenontetracarboxylic acid anhydride was poured into the reactor and reacted for 24 hours to maintain the temperature of the reactor under nitrogen _5. 〇 to 5 °C ' and the mechanical scrambler is rotated at 350 rpm. Then, the instrument contains 15% by weight of phthalocyanine varnish. BTDA/PMDA/ODA/PDA varnish will be 255 g DMAc 6.334 g (0.031633 mol) of 4,4'- 35 201009119 31972pit diaminodiphenyl ether and 7.982 g (0.073811 mol) of m-diamine diamine were poured into the reactor and completely dissolved. Then, 23.784 g (0.073811) 3,3f,4,4'-dibenzophenonetetracarboxylic acid (3,3',4,4'-biphenontetracarboxylic anhydride) and 6.900 g (0.031633 mol) of pyromellitic dianhydride The reactor was placed in the reactor and reacted for 24 hours, the temperature of the reactor was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 350 rpm. Then, a polycondensate containing 15 parts by weight was prepared. Amino acid varnish. PMDA/ODA-SD varnish pours 127.5 grams of DMAc, 9.826 grams (0.04907 moles) of 4,4,-diaminodiphenyl ether and 1.408 grams (0.002583 moles) of SD-545 Into the reactor and completely dissolved. Then, 11.267 g (0.0.051653 mol) of pyromellitic dianhydride was poured into the reactor and reacted for 24 hours, and the temperature of the reactor was maintained at -5 under nitrogen atmosphere. °C to 5 ° C, and the mechanical stirrer was rotated at 350 rpm. Then, a varnish containing 15% by weight of polyamic acid was prepared. Comparative Examples 7 to 10 Copper foil coated with a polyimide film was prepared in the same manner as in Examples 41 to 44 except that the step of treating the surface of the copper foil using the surface treating agent composition was omitted. The copper foils prepared in Comparative Examples 7 to 10 are hereinafter referred to as Comparative Samples 7 to 10. Evaluation Example 5 - Peel Strength Test 36 201009119 ^iy/2Pu The peel strengths of the samples 2〇 to 23 and the comparative samples 7 to 1〇 were measured using the method specified in ASTM D-638. The cross roller speed is 25 mm/min and the width of the sample is 5 mm. Measurements were performed using an Instron 8516. The results of the measurements are shown in Table 5 below. &lt;Table 5&gt; ———- Peel strength 丨kg/cml __ Example 41 (Sample 20) 1.02 _ Example 42 (Sample 21) 0.93 __Example 43 (Sample 22) _ Example 44 (Sample 23) _ 1.21 1.53 Sexual Example 7 (Comparative Sample 7) Sexual Example 8 (Comparative Sample 8) 0.52 0.39 _____^Comparative Example 9 (Comparative Sample 9) 0.61 Sexual Example 10 (Comparative Sample 1〇) ----- 0.72 As shown in Table 5, samples 2 to 23 prepared using a surface treatment composition containing a decyl compound were compared to Comparative Samples 7 to 1 prepared without using a surface treatment composition according to an embodiment of the present invention. It has a greatly increased peel strength between the polyimide film and the copper foil. As described above, the surface of the hydrolyzate containing a decyl group compound or a decyl group compound according to the present invention is compared with pCB formed on the surface of a PCB having no surface treatment film formed thereon or a surface treatment film containing a general decyl group compound. The processing of the above-mentioned pcB has an improved stripping. 37 201009119 31972pif Intensity The present invention has been disclosed in the above embodiments, but it is not intended to limit the spirit and scope of the present invention to the knowledge of the invention. Applicants' specializations and retouchings are attached to the original text [simplified in the drawing]. no. [Main component symbol description] None.

3838

Claims (1)

201009119 七、申請專利範圍: 1.一種印刷電路板用之經表面處理的銅箔,包含形成 在銅箔上的防鏽層及形成在所述防鏽層上的表面處理薄 膜,其中所述表面處理薄膜包含選自由式1至式4表示的 矽烷基化合物所組成之族群的至少一化合物,或所述矽烷 基化合物的水解物: &lt;式1&gt;201009119 VII. Patent application scope: 1. A surface-treated copper foil for a printed circuit board comprising a rustproof layer formed on a copper foil and a surface treated film formed on the rustproof layer, wherein the surface The treatment film contains at least one compound selected from the group consisting of the fluorenyl compounds represented by Formulas 1 to 4, or a hydrolyzate of the decyl compound: &lt;Formula 1&gt; 〈式2〉<Formula 2> &lt;式3&gt;&lt;Formula 3&gt; &lt;式4&gt; 39 201009119 iiy/zpu&lt;Formula 4&gt; 39 201009119 iiy/zpu 其中Ri、汉2及r3各自獨立為ci至Cs的烷基,且 R·4及Rs各自獨立為氫或〇1至〇5的烷基。 2.如申請專利範圍第丨項所述之印刷電路板用之經表 面處理的銅箔,其中1^、厌2及尺3各自獨立為甲基或乙基, 且R4及R5為氫。 3,如申請專利範圍第1項所述之印刷電路板用之經表 面處理的銅箔,更包含插入於所述銅箔及所述防鏽層之間 的阻熱層。 4. 如申請專利範圍第3項所述之印刷電路板用之經表 面處理的銅箔,更包含插入於所述銅箔及所述阻埶 的小節層。 ·、 间 5. 一種印刷電路板用之經表面處理的銅箱的製儀方 法,包含: 於銅箔上形成防鏽層;以及 清洗及乾燥所述防鏽層形成於上的所述銅箔, 塗覆組成物於所述防鑛層上,且乾燥經塗覆之 層’從而製備表面處理薄膜,所述組成物包含 = 化合物 至式4表示的梦炫基化合物所組成之族群 小 式1 或所述矽烷基化合物的水解物: ^一 201009119 j Ly /^.yu &lt;式1&gt;Wherein Ri, Han 2 and r 3 are each independently an alkyl group of ci to Cs, and R·4 and Rs are each independently hydrogen or an alkyl group of 〇1 to 〇5. 2. The surface treated copper foil for a printed circuit board according to the invention of claim 2, wherein the 1 , the anaesthes 2 and the sizing 3 are each independently a methyl group or an ethyl group, and R 4 and R 5 are hydrogen. 3. The surface-treated copper foil for a printed circuit board according to claim 1, further comprising a heat-insulating layer interposed between the copper foil and the rust-preventing layer. 4. The surface treated copper foil for a printed circuit board according to claim 3, further comprising a small layer layer interposed between the copper foil and the barrier. And a method for manufacturing a surface-treated copper box for a printed circuit board, comprising: forming a rustproof layer on the copper foil; and cleaning and drying the copper foil on which the rustproof layer is formed Applying a composition on the anti-mine layer and drying the coated layer' to prepare a surface-treated film comprising: a compound to a group consisting of a dream compound represented by Formula 4 Or a hydrolyzate of the decyl compound: ^一201009119 j Ly /^.yu &lt;Formula 1&gt; &lt;式2&gt; &lt;式3&gt; &lt;式4&gt;&lt;Formula 2&gt;&lt;Formula3&gt;&lt;Formula4&gt; 其中仏、R2及R3各自獨立為(^至C3的烷基,且 R4及R5各自獨立為氫或(^至C5的烷基。 6.如申請專利範圍第5項所述之印刷電路板用之經表 面處理的銅箔的製備方法,其中基於所述組成物的所述總 量,所述矽烷基化合物之數量的範圍為0.001至5重量%。 41 201009119 川.Λφιι 面處理圍第5項所述之印刷電路板用之經表 水、甲醇、' 備方法’其中所述組成物包含選自由 成之族群的、甲基乙基酮、乙酸乙醋及苯所組 8 ^ 溶劑。 *處理項所述之印刷電路板用之經表 含於所述銅紅層於形成所述_層之前,更包 面I理t申请專利範圍第8項所述之印刷電路板用之經表 響 含於所述銅訂形成小節。 更匕 2一種可撓性覆銅層壓板,包含巾請專利範圍1至4 之項所述之印刷電路板用之經表面處理的銅镇之;以 及形成在所述銅ϋ之表面處理薄膜上的聚輕胺薄膜。 ❿ 11·如申請專利範圍第19項所述之可撓性覆銅層壓 板其中所述聚酿亞胺薄膜包括聚醯胺酸之硬化產物,且 所述聚酿胺酸由至少—個二軒單體及至少―個二胺單體的 反應產物所組成,其中所述至少_個二酐單體選自由 四酸二酐、3,3,,4,4,·二苯酮四甲酸二酐、3,3,,4,4,.聯苯 酸二軒及3,3.,4,4’-氧雙鄰苯二甲酸酐所組成之族群, 述至少:個二胺單體選自由4,4,·二氨基二笨鱗、對苯二 t魏烧二胺、3,4_二氨基二苯鱗及間苯二胺所組成之 42 201009119 四、 指定代表圖: (一) 本案之指定代表圖:無。 (二) 本代表圖之元件符號簡單說明: 無。 五、 本案若有化學式時,請揭示最能顯示發明特徵 的化學式:Wherein 仏, R 2 and R 3 are each independently an alkyl group of (C to C 3 ), and R 4 and R 5 are each independently hydrogen or an alkyl group of (C to C 5 ). 6. For printed circuit boards according to claim 5 The method for producing a surface-treated copper foil, wherein the amount of the oxime alkyl compound ranges from 0.001 to 5% by weight based on the total amount of the composition. 41 201009119 Chuan.Λφιι Surface treatment section 5 The printed circuit board is used for surface water, methanol, and a method for preparing the composition, wherein the composition comprises a solvent selected from the group consisting of methyl ethyl ketone, ethyl acetate and benzene. The printed circuit board according to the item is included in the copper red layer before the formation of the layer, and the surface of the printed circuit board according to item 8 of the patent application scope is included. Forming a small section on the copper. Further, a flexible copper clad laminate comprising a surface treated copper for use in a printed circuit board according to the scope of claims 1 to 4; A polyamine film on a surface treated film of copper matte. ❿ 11·If applied The flexible copper-clad laminate according to the item 19, wherein the polyiminoimide film comprises a hardened product of polyamic acid, and the poly-aracine is composed of at least one of two monomers and at least one a reaction product of a diamine monomer, wherein the at least one dianhydride monomer is selected from the group consisting of tetracarboxylic dianhydride, 3,3,4,4, benzophenone tetracarboxylic dianhydride, 3, 3, a group consisting of 4,4,. diphenyl benzoate and 3,3.,4,4'-oxydiphthalic anhydride, said at least: a diamine monomer selected from 4, 4, · 2 42 consisting of amino diphenyl scales, p-phenylene di-di-diamine, 3,4-diaminodiphenyl scales and m-phenylenediamines 2010 2010119119 IV. Designation of representative drawings: (1) Representative of the case: No. (2) A brief description of the symbol of the representative figure: None. 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: 5 201009119 爲第98124127號中文說明書無劃線修正本 卜 發明專利說明書 %《2006.01、 (本說明書格式、順序,請勿任意更動,※記號部分請勿填寫) ※申請案號:〜7 ακ % (2〇〇6.〇1&gt; ※申請日: ※^(:分類:C。^ % ^2006.01) % 一、發明名稱: ⑽ο&amp;οη w ^ ^ (2〇〇6.οι&gt; e 印刷電路板用的銅箔及其製備方法以及使用聚醯胺 酸前驅物與銅箔的可撓式覆銅層壓板 COPPER FOIL FOR PRINTED CIRCUIT BOARD, METHOD OF PREPARING THE SAME, AND FLEXIBLE COPPER CLAD LAMINATE USING POLYAMIC ACID PRECURSOR AND COPPER FOIL 二、中文發明摘要: , 一種印刷電路板用之經表面處理的銅箔,其包含形 v 成在銅箔上的防鏽層及形成在防鏽層上的表面處理薄膜, 其中表面處理薄膜包含選自由式1至式4表示的矽烷基化 合物所組成之族群的至少一化合物,或所述矽烧基化合物 _ 的水解物: &lt;式1&gt;5 201009119 For the Chinese manual No. 98124127, there is no slash correction. The patent specification of the invention is %. "2006.01. (The format and order of this manual, please do not change it arbitrarily, please do not fill in the ※ part) ※Application number: ~7 ακ % ( 2〇〇6.〇1&gt; ※Application date: ※^(:Classification: C.^ % ^2006.01) % I. Invention name: (10)ο&οη w ^ ^ (2〇〇6.οι&gt; e for printed circuit boards Copper foil and preparation method thereof, and flexible copper clad laminate using polyacetic acid precursor and copper foil COPPER FOIL FOR PRINTED CIRCUIT BOARD, METHOD OF PREPARING THE SAME, AND FLEXIBLE COPPER CLAD LAMINATE USING POLYAMIC ACID PRECURSOR AND COPPER FOIL II. Abstract of Chinese invention: A surface-treated copper foil for a printed circuit board comprising a rust-preventing layer formed on a copper foil and a surface-treated film formed on the rust-preventing layer, wherein the surface-treated film At least one compound comprising a group selected from the group consisting of a fluorenyl compound represented by Formulas 1 to 4, or a hydrolyzate of the sulfonyl compound _: &lt;Formula 1&gt; 〈式2〉 201009119 3ΐν/^ριπ 六、發明說明: 【相關申請案】 本申請案主張優先權為2008年7月18曰在韓國智財 局申請的韓國專利申請號10-2008-0070081,其揭露内容在 此併入本文參考。 【發明所屬之技術領域】 本發明是有關於一種印刷電路板(printed circuit board ; PCB)用的銅箔、銅箔的製備方法以及包含銅箔之可 撓性覆銅層壓板(flexible copper clad laminate ; FCCL),且 特別是有關於一種包含石夕燒基(silane-based)化合物或石夕燒 基化合物之水解物(hydrolysate)之表面處理薄膜形成於上 之PCB用之經表面處理的銅箔,以及包含此銅箔之fccl。 【先前技術】 可撓性覆銅層壓板(FCCL)為印刷電路板(PCB)之一 種形式,且其現今需求日漸增加。FCCL為由二或三層形 成之多層薄膜,其中聚醯亞胺(p〇lyimide)薄膜層壓在銅 箔上。當印刷在FCCL上之佈線的準確性增加,蝕刻的準 確性也同樣增加,因此需要降低銅箔之表面粗糙度。然 而,當降低銅箔之表面粗糙度時,銅箔與基板(例如,聚 酿亞胺薄膜)之間的剝離強度(peel strength)會下降。在這 點上’需要提局剝離強度之手段。 PCB用的銅箔通常使用矽烷耦合劑為銅箔之表面處 理劑以進行之,用以強化銅箔與基板之間的剝離強度,其 揭露於日本專利申請案^90-026097。 201009119 然而,隨著使用在PCB中之銅箔之物理性質的要求 變嚴(tight),仍然需要具有改良物理性質之表面處理薄膜 形成於上之用於PCB的銅箔。 【發明内容】<Formula 2> 201009119 3ΐν/^ριπ VI. Description of the Invention: [Related application] This application claims priority to Korean Patent Application No. 10-2008-0070081, filed on Jan. 18, 2008, in the Korean Intellectual Property Office. The disclosure is incorporated herein by reference. [Technical Field] The present invention relates to a copper foil for printed circuit board (PCB), a method for preparing a copper foil, and a flexible copper clad laminate comprising a copper foil. ; FCCL), and in particular, a surface-treated copper foil for a PCB on which a surface treated film comprising a silane-based compound or a hydrolysate compound is formed And the fccl containing this copper foil. [Prior Art] Flexible copper clad laminate (FCCL) is one form of printed circuit board (PCB), and its demand today is increasing. The FCCL is a multilayer film formed of two or three layers in which a p〇lyimide film is laminated on a copper foil. As the accuracy of the wiring printed on the FCCL increases, the accuracy of etching also increases, so it is necessary to reduce the surface roughness of the copper foil. However, when the surface roughness of the copper foil is lowered, the peel strength between the copper foil and the substrate (e.g., the polyimide film) is lowered. At this point, it is necessary to propose a means of peeling strength. The copper foil for PCB is usually used as a surface treatment agent for copper foil using a decane coupling agent for strengthening the peeling strength between the copper foil and the substrate, which is disclosed in Japanese Patent Application Laid-Open No. Hei 90-026097. 201009119 However, as the requirements for the physical properties of the copper foil used in the PCB become tight, there is still a need for a copper foil for a PCB on which a surface-treated film having improved physical properties is formed. [Summary of the Invention] 本發明提供印刷電路板(PCB)用之經表面處理的銅 箔,其包含提供基板與銅箔之間優良剝離強度之新的矽烷 基化合物或新的矽烷基化合物的水解物,本發明還提供 PCB用之銅箔的製備方法,以及包含聚醯亞胺層堆疊在 PCB用之銅箔上的可撓性覆銅層壓板(FCCL)。 根據本發明之一方面,提供印刷電路板(PCB)用之經 表面處理的_,其包含形成在銅紅的_層及形成在 防鑛層上的表面處理薄膜,其中表面處理薄膜包含選自由 式1至式4表示的矽烷基化合物所組成之族群的至少一化 合物’或所述麥烧基化合物的水解物·· &lt;式1&gt;The present invention provides a surface treated copper foil for a printed circuit board (PCB) comprising a hydrolyzate of a novel germanium alkyl compound or a novel germanium alkyl compound which provides excellent peel strength between the substrate and the copper foil, and the present invention also provides A method for preparing a copper foil for PCB, and a flexible copper clad laminate (FCCL) comprising a polyimide layer stacked on a copper foil for PCB. According to an aspect of the invention, there is provided a surface-treated _ for a printed circuit board (PCB) comprising: a layer formed of copper red and a surface treated film formed on the anti-mine layer, wherein the surface-treated film comprises selected from the group consisting of At least one compound of the group consisting of a decyl group compound represented by Formula 1 to Formula 4 or a hydrolyzate of the methacrylic compound, &lt;Formula 1&gt; 〈式2&gt; HO<Formula 2> HO h &lt;式3&gt; 7 201009119 〈式4&gt;h &lt;Formula 3&gt; 7 201009119 <Formula 4> 其中RrR2*%各自獨立為的烷基,且R 及心各自獨立為氫或(^至(:5的烷基。Wherein RrR2*% are each independently an alkyl group, and R and each of the cores are independently hydrogen or (^ to (5) alkyl. 根據本發明之另一方面,提供印刷電路板(PCB)用之 理,的製備方法,此方法包含··於織上形 組杰π洗及乾燥防鏽層形成於上的銅箔,以及塗覆 面防鏽層上’且乾燥經塗覆之防鏽層,從而製備表 料城咐糊式1…表= 组成之族群的至少一化合物或所述一 &lt;式1&gt;According to another aspect of the present invention, there is provided a method for preparing a printed circuit board (PCB), the method comprising: a copper foil formed on a woven upper group and a dry rustproof layer, and coated Coating the rust-preventing layer and drying the coated rust-preventing layer to prepare a smear-type smear-type table 1. at least one compound of the constituent group or the one &lt;Formula 1&gt; &lt;式2&gt; 8 2〇l〇〇9ii9&lt;Formula 2&gt; 8 2〇l〇〇9ii9 &lt;式3&gt; &lt;式4&gt;&lt;Formula 3&gt;&lt;Formula4&gt; 及R Ί ώ 1 2及厌3各自獨立為C!至C3的燒基且RAnd R Ί ώ 1 2 and 厌 3 are each independently C! to C3 and R 及I各自獨立錢或C1W5基。 且&amp; (FCcd二^一广面’提供可撓性覆鋼層壓板 /成在鋼ϋ之表面處理薄膜上的聚醯亞胺薄膜。, 為讓本發明之上述特徵和優點能更明顯易懂下文特 举實施例,並配合所關式作詳細說明如下。 【實施方式】 以下’將根據本發明之實施例更詳細地描述印刷電 路板(PCB)用之、經表面處理的鋼領、pCB用之㈣的製備方 9 201009119 ^iy/ζριιι 法以及可撓性覆銅層壓板(FCCL)。 根據本實施例,PCB用之經表面處理的銅箔包含形成 在銅箔上的防鏽層及形成在防鏽層上的表面處理薄膜,其 中表面處理薄膜包含選自由式1至式4表示的矽烷基化合 物所組成之族群的至少一化合物,或所述矽烷基化合物的 水解物。 &lt;式1&gt;And I each have independent money or C1W5 base. And &amp; (FCcd) provides a flexible steel-clad laminate/polyimine film formed on a surface treated film of steel reed. The above features and advantages of the present invention are more obvious. The following specific embodiments are described in detail with reference to the following description. [Embodiment] Hereinafter, a surface-treated steel collar for a printed circuit board (PCB) will be described in more detail according to an embodiment of the present invention. The preparation method of (4) for pCB is 20109119 ^iy/ζριιι method and flexible copper clad laminate (FCCL). According to the embodiment, the surface-treated copper foil for PCB comprises a rustproof layer formed on the copper foil. And a surface-treated film formed on the rust-preventing layer, wherein the surface-treated film contains at least one compound selected from the group consisting of fluorenyl compounds represented by Formulas 1 to 4, or a hydrolyzate of the decyl-based compound. Equation 1&gt; &lt;式2&gt; &lt;式3&gt; &lt;式4&gt; D&lt;Formula 2&gt;&lt;Formula3&gt;&lt;Formula4&gt; D 卜 ❿ ❹ 201009119 其中Ri、R2及R3各自獨立為C!至C3的烷基,且r4 及I各自獨立為氫或&lt;^至C5的烷基。 石夕烧基化合物在其一端具有梦氧烧基(siloxane group) 用以與銅箔形成共價鍵,在其另一端具有咪唑基(imidazole grouP)和/或亞酿胺基(imide group),其中°米嗤基和/或亞醯 胺具有與聚醯亞胺薄膜相似的結構,從而提高與聚醯亞胺 薄膜的鍵結強度。所以,可以提高銅箔與聚醯亞胺薄膜之 間的鍵結強度。 特別是’包含於矽烷基化合物中的烷氧基(alkoxy grc)UP ’ —〇R)與存在於金屬表面中的經基(hydroxy group) 反應’以形成石夕氧院鍵(siloxane bond)。包含於石夕烧基化合 物中的矽氧烷基也可以與金屬表面形成矽氧烷鍵。 根據本發明另一實施例,矽烷基化合物中之R!、R2 及化各自獨立為甲基或乙基,且R4及R5可以為氫。 根據本發明另一實施例,可以進一步於銅箔與防鏽層 之間插入阻熱層(heafbioeking iayer)。阻熱層可以(例如) 由鋅σ金形成且其厚度可以是幾十至幾百奈雜m)。形成 阻熱層之金屬或合金沒有制_,且可以使用本發明所 屬領域用作阻熱層之任何金屬或合金。 根據本發明另—實施例,可以進—步於銅荡與阻熱層 11 201009119 Jiy/^ριπ 之間插入小節(nodules)。藉由使具有電流密度為10至150 A/dm2之電流在10°C至40°C的溫度流經電解液,其中電解 液包含1至40 g/L的銅金屬及30至250 g/L的硫酸。 防鏽層可以包含用作防鏽劑之三氧化鉻(chromium trioxide)、鉻酸(chromic acid)、二絡酸(dichromic acid)、 重鉻酸鈉(sodium dichromate)或鉻酸鹽(chromate)。防鏽層 可以藉由使具有電流密度為〇·〇1至10 A/dm2之電流在 10C至50C的溫度流經電解液,且防鏽劑的濃度為〇1卜 ❿ ❹ 201009119 wherein Ri, R2 and R3 are each independently an alkyl group of C! to C3, and each of r4 and I is independently hydrogen or an alkyl group of &lt;^ to C5. The sulphur-based compound has a siloxane group at one end for forming a covalent bond with the copper foil and an imidazole grouP and/or an imide group at the other end. Among them, the menthol group and/or the decylene have a structure similar to that of the polyimide film, thereby improving the bonding strength with the polyimide film. Therefore, the bonding strength between the copper foil and the polyimide film can be improved. Specifically, the alkoxy grc UP 〇 〇 R contained in the fluorenyl compound reacts with a hydroxy group present in the surface of the metal to form a siloxane bond. The decyloxy group contained in the sulphur-based compound may also form a decane bond with the metal surface. According to another embodiment of the present invention, R!, R2 and each of the fluorenyl compounds are each independently a methyl group or an ethyl group, and R4 and R5 may be hydrogen. According to another embodiment of the present invention, a heat resistance layer (heafbioeking iayer) may be further interposed between the copper foil and the rustproof layer. The heat resistant layer may be formed, for example, of zinc σ gold and may have a thickness of several tens to several hundreds of m). The metal or alloy forming the heat resistant layer is not made, and any metal or alloy used as the heat resistant layer in the field of the present invention can be used. According to another embodiment of the present invention, a nodules can be inserted between the copper yoke and the thermal barrier layer 11 201009119 Jiy/^ριπ. Flowing through the electrolyte at a current having a current density of 10 to 150 A/dm 2 at a temperature of 10 ° C to 40 ° C, wherein the electrolyte contains 1 to 40 g/L of copper metal and 30 to 250 g/L Sulfuric acid. The rustproof layer may contain chromium trioxide, chromic acid, dichromic acid, sodium dichromate or chroma as a rust inhibitor. The rustproof layer can flow through the electrolyte at a temperature of 10C to 50C by a current having a current density of 〇·〇1 to 10 A/dm2, and the concentration of the rust inhibitor is 〇1. 至10 g/L,以形成具有數十至數百奈米的厚度。阻熱層可 以由鋅合金、鎳合金或鈷合金形成,且可以形成具有數十 至數百奈米的厚度。 〃 銅羯通常形成在紐上為本發明所述領域所熟知。 雖然省略基板的額外描述,但並不排除使用基板。、 根據本發明另一實施例,PCB用之銅箔的製 以包含:於銅紅形成防鏽層;清洗及乾燥防鏽 = 上的銅箔,以及塗覆組成物於防鏽層上, a形成方Up to 10 g/L to form a thickness of several tens to several hundreds of nanometers. The heat resistant layer may be formed of a zinc alloy, a nickel alloy or a cobalt alloy, and may be formed to have a thickness of several tens to several hundreds of nanometers.羯 The copper bismuth is usually formed on the ridge and is well known in the art of the present invention. Although an additional description of the substrate is omitted, the use of the substrate is not excluded. According to another embodiment of the present invention, a copper foil for a PCB is formed by: forming a rustproof layer on copper red; cleaning and drying the copper foil on the rust proof; and coating the composition on the rustproof layer, a Forming party 防痛層,從而製備表面處理薄膜,所塗覆4 式!至式4表示的#基化合物所組含選自^ 合物或所述矽烷基化合物的水解物。 、、至少一4 &lt;式1&gt; &lt;式2&gt; 12 201009119 Ilit HOAn anti-pain layer to prepare a surface-treated film, coated with 4! The #-based compound represented by Formula 4 contains a hydrolyzate selected from the compound or the above-described alkylene compound. , at least one 4 &lt;Formula 1&gt;&lt;Formula2&gt; 12 201009119 Ilit HO h &lt;式3&gt;h &lt;式3&gt; R„ R/ 〈式4&gt; 其中R!、R2及R3各自獨立為Cl至C3的烷基’且R4 及r5各自獨立為氫或(^至c5的烷基。R R R / <Formula 4> wherein R!, R2 and R3 are each independently a C1 to C3 alkyl group and R4 and R5 are each independently hydrogen or (^ to c5 alkyl group). 銅箔可以藉由在欲進行電鍍之材料或基板上進行銅 電鐘而尊備之。在銅電鑛中,可以使用酸電鑛溶液或驗電 鍍溶液。酸電鍍溶液可以包含硫酸銅(c〇PPer sulfate)、氟硼 酸銅(copper fluoroborate)或續酿胺酸銅(sulfamic acid copper)之電鐘溶液,且鹼電鍍溶液可以包含氰化亞銅 (copper cyanide)或焦鱗酸銅(copper prophosphate)之電鍍溶 液。根據本發明一實施例’使用在銅箔之製備中的電鍍溶 液並無特別限制,且可以使用本發明所屬領域使用的任何 13 201009119 〇 /二pux 電鍍溶液。 防鏽層可以藉由電解沈積(electro-depositing)鉻在銅 箔的表面上以形成之。使用的鉻化合物可以包含(例如)三 氧化鉻、鉻酸、二鉻酸、重鉻酸鈉或鉻酸鹽。鉻化合物之 濃度的範圍可以為0.1至10 g/L,例如1.0至10 g/L。當形 成防錄層時,可以進一步添加增效劑(synergist)以提高鉻化 合物之電解沈積的效率。增效劑的實例可以包含:鋅化合 物例如乙酸鋅(zinc acetate)、氣化辞(zinc chloride)、氛化鋅 (zinc cyanide)、硝酸鋅(zinc nitrate)或硫酸鋅(zinc sulfate); 磷化合物例如填酸、聚填酸鹽焦填酸鹽(polyphosphate pyrophosphate)、礙酸鹽(phosphate)或焦填酸鹽 (pyrophosphate);以及有機化合物例如笨並三咬 (benzenetriazole)。防鏽層的厚度之範圍可以為〇.丨至1〇奈 米。 根據本發明另一實施例’組成物可以包含選自由式1 至式4表示的矽烷基化合物所組成之族群的至少一化合 物、所述石夕统基化合物之水解物以及溶劑。 碎烧基化合物之數量的範圍可以為組成物的〇〇(n至 5重量%。當石夕院基化合物的數量為〇 重量%或更低 時,表面處理劑之形成的有機層無法充份地塗覆在銅箔 上,因此無法提高剝離強度。當矽烷基化合物之數量為5 重量%或更高時’表φ處理狀形成的有機層的厚度增 加,且覆蓋銅箔上的小節,因此無法提高剝離強度。 根據本發明另一實施例,溶劑可以包含選自由水、曱 201009119 ^iy/ζριπ 醇、乙醇、丙酮、甲基乙基酮(111她咖%11如〇116)、甲基乙 基酮(methylethylketone)、乙酸乙酯(ethylacetate) ^ 苯 (benzene)所組成之族群的至少一種。 根據本發明另一實施例,在上述的方法中,於形成防 鏽層之前,可以進一步進行於銅箔上形成阻熱層。形成阻 熱層的細節與關於PCB用之銅箔的描述相同,因此不再重 複。 根據本發明另一實施例,在上述的方法中,於形成阻 ® 熱層之前,可以進一步進行於銅箔上形成小節。在形成小 節中’藉由使用粉狀氧化銅(cupric oxide)產品於銅羯上形 成小節,因此銅箔與額外塗覆層之間的接觸面積增加,從 而提高銅箔與额外塗覆層之間的剝離強度。 根據本發明另一實施例,可撓性覆銅層壓板可以包含 ' PCB用的銅箔以及形成在銅箔上之表面處理薄膜上的聚醢 亞胺薄膜。 可撓性覆銅層壓板根據其使用可以具有二層結構(2_ 參 層)或三層結構(3·層)。 根據本發明另一實施例,聚醯亞胺薄膜可以為聚醯胺 酸(polyamic acid)溶液之硬化產物,且聚醯胺酸可以為至少 一個二酐(dianhydride)單體及至少一個二胺(diamine)單體 的反應產物,其中至少一個二酐單體可以選自由苯均四酸 二酐(pyromellitic dianhydride)、3,3,,4,4,-二苯酮四曱酸二酐 (3,3 ,4,4 -benzophenone tetracarboxylic dianhydride)、 3,3',4,4’-聯苯四叛酸二針(3, 3,, 4, 4,_ 15 201009119 ^iy/zpui biphenyltetracarboxylic dianhydride)及 3,3',4,4’-氧雙鄰苯二 曱酸酐(3,3’,4,4,_oxydiphthalic anhydride)所組成之族群’且 至少一個二胺單體可以選自由4,4’-二氨基二苯醚 (4,4’-oxydianiline)、對苯二胺(para_phenylene diamine)、石夕 氧烧二胺(siloxanediamine ; SD)、3,4-二氨基二苯醚(3,4-oxydianiline)及間苯二胺(meta-phenylenediamine)所組成之 族群。 矽氧烷二胺(SD)可以具有以下的結構。Copper foil can be honored by performing a copper clock on the material or substrate to be electroplated. In copper ore, an acid ore solution or a electroplating solution can be used. The acid plating solution may comprise a copper bell solution, a copper fluoroborate or a sulfamic acid copper electric clock solution, and the alkali plating solution may comprise copper cyanide (copper cyanide). Or a plating solution of copper prophosphate. The electroplating solution used in the preparation of the copper foil according to an embodiment of the present invention is not particularly limited, and any of the 13 201009119 〇 / dipux plating solutions used in the field to which the present invention pertains can be used. The rustproof layer can be formed by electro-depositing chromium on the surface of the copper foil. The chromium compound used may contain, for example, chromium trioxide, chromic acid, dichromic acid, sodium dichromate or chromate. The concentration of the chromium compound may range from 0.1 to 10 g/L, for example from 1.0 to 10 g/L. When an anti-recording layer is formed, a synergist may be further added to increase the efficiency of electrolytic deposition of the chromium compound. Examples of the synergist may include: a zinc compound such as zinc acetate, zinc chloride, zinc cyanide, zinc nitrate or zinc sulfate; phosphorus compound For example, acid filling, polyphosphate pyrophosphate, phosphate or pyrophosphate; and organic compounds such as benzotriazole. The thickness of the rustproof layer may range from 〇.丨 to 1〇N. According to another embodiment of the present invention, the composition may comprise at least one compound selected from the group consisting of the fluorenyl compounds represented by Formulas 1 to 4, a hydrolyzate of the cyclamate compound, and a solvent. The amount of the calcined base compound may range from 〇〇 to 5% by weight of the composition. When the amount of the compound of the shixi compound is 5% by weight or less, the organic layer formed by the surface treatment agent may not be sufficient. Is applied to the copper foil, so the peel strength cannot be improved. When the amount of the fluorenyl compound is 5% by weight or more, the thickness of the organic layer formed by the treatment of the surface φ increases, and covers the bars on the copper foil, thus The peel strength cannot be improved. According to another embodiment of the present invention, the solvent may comprise a solvent selected from the group consisting of water, 曱201009119^iy/ζριπ alcohol, ethanol, acetone, methyl ethyl ketone (111 her coffee%11 such as 〇116), methyl At least one of a group consisting of methylethylketone, ethylacetate, and benzene. According to another embodiment of the present invention, in the above method, before the formation of the rustproof layer, further A heat resistant layer is formed on the copper foil. The details of forming the heat resistant layer are the same as those described for the copper foil for the PCB, and thus will not be repeated. According to another embodiment of the present invention, in the above method, Before the formation of the barrier layer, a further formation can be formed on the copper foil. In the formation of the section, a small section is formed on the copper crucible by using a cupric oxide product, so that the copper foil and the additional coating layer The contact area between the two increases, thereby increasing the peel strength between the copper foil and the additional coating layer. According to another embodiment of the present invention, the flexible copper clad laminate may comprise 'a copper foil for PCB and formed on the copper foil The polyimide film on the surface treated film. The flexible copper clad laminate may have a two-layer structure (2_parameter layer) or a three-layer structure (3 layer) according to its use. According to another embodiment of the present invention, The polyimide film may be a hardened product of a polyamic acid solution, and the polyphthalic acid may be a reaction product of at least one dianhydride monomer and at least one diamine monomer. At least one of the dianhydride monomers may be selected from the group consisting of pyromellitic dianhydride, 3,3,4,4,-benzophenone tetraphthalic acid dianhydride (3,3,4,4-benzophenone tetracarboxylic acid) Dianhydride), 3,3',4,4 -biphenyltetrahydropyrubic acid (3, 3,, 4, 4, _ 15 201009119 ^iy/zpui biphenyltetracarboxylic dianhydride) and 3,3',4,4'-oxybisphthalic anhydride (3,3 ',4,4,_oxydiphthalic anhydride' and the at least one diamine monomer may be selected from 4,4'-oxydianiline, para-phenylene diamine ), a group of siloxane diamine (SD), 3,4-oxydianiline, and meta-phenylenediamine. The oxane diamine (SD) may have the following structure. ·έ_ι 在SD的結構中,η的範圍為2至12。 在一酐單體與二胺單體反應之後,聚醯胺酸為 -备ί〇)·勝鍵連接的化合物。例如,由笨均四酸二針及 -氣基二苯醚反應而得之輯胺酸具有以下結構。 〇 0 HO-CT -II 0 聚醯胺酸 δ Η η 亞胺當熱處理聚轉酸時’可叫到具有以下結構的聚酿 201009119·έ_ι In the structure of SD, η ranges from 2 to 12. After the monoanhydride monomer is reacted with the diamine monomer, the polyglycolic acid is a compound which is bonded to the bond. For example, the arginine obtained by the reaction of stupidinoic acid di-needle and gas-pure diphenyl ether has the following structure. 〇 0 HO-CT -II 0 Poly-proline δ Η η Imine when heat-treated poly-transacids can be called a brew with the following structure 201009119 聚醯胺酸之熱處理在氮環境下於約6〇。〇開始及最後 於約400°C的高溫結束。在聚酿胺酸及聚酿亞胺中,^的範 圍為40至200。 聚酿胺酸亮光漆(varnish)可以例如是pmda/〇dΑ混 合物、BTDA/PDA 混合物、BTDA/PMDA/ODA/PDA 混合 物或PMDA/ODA-SD混合物。可以根據其使用而選擇其適 當的混合比率。 以下,將參照下述實例更詳細描述本發明;然而,本 發明並不以此為限。使用Brucker DRX-3〇〇MHz i-NMR 及Jasco 610 FT-IR來確認在下述實例中經合成之化合物的 結構。 (矽烷基化合物(1)之合成) 實例1 :化合物1之合成 根據下面的反應機制1來合成由式1表示的化合物 1 ° &lt;反應機制1&gt; 17 201009119 jiy//piiA N^\ CNs/*N/NH2 +The heat treatment of polylysine is about 6 Torr under a nitrogen atmosphere. The 〇 begins and ends at a high temperature of about 400 °C. In polyamic acid and polyamidiamine, the range of ^ is from 40 to 200. The varnish may be, for example, a pmda/〇dΑ mixture, a BTDA/PDA mixture, a BTDA/PMDA/ODA/PDA mixture or a PMDA/ODA-SD mixture. The appropriate mixing ratio can be selected according to its use. Hereinafter, the present invention will be described in more detail with reference to the following examples; however, the invention is not limited thereto. The structure of the synthesized compound in the following examples was confirmed using Brucker DRX-3 〇〇MHz i-NMR and Jasco 610 FT-IR. (Synthesis of a mercaptoalkyl compound (1)) Example 1: Synthesis of Compound 1 The compound represented by Formula 1 was synthesized according to the following Reaction Mechanism 1 &lt; Reaction Mechanism 1&gt; 17 201009119 jiy//piiA N^\ CNs/ *N/NH2 + 3-縮水甘油6|氡丙基三甲氧基發燒 1-(3-氨基丙基)味唑3-glycidyl 6|氡propyltrimethoxy fever 1-(3-aminopropyl) oxazole Hd CH, 'N^N^,Si-«〇«a^3 API-矽烷 ch3 將 162.68 克的四氫吱喝(tetrahydrofurane)、6 259 克 (0.05莫耳)的3-縮水甘油醚氧丙基三甲氧基碎燒 (3-glycidoxypropyltrimethoxysilane)及 11.817 克(〇.〇5 莫耳) ❿ 的 H3-氨基丙基)味唑(l-(3-aminopropyl)-imidazole)倒入 (charged)反應器中並反應6小時,在氮環境下維持反應器 之溫度為95°C,且機械攪拌器以300rpm旋轉。在完成反 應之後,使用旋轉蒸發器2小時以從生成物移除溶劑。然 後,在真空烤箱中乾燥生成物24小時,從而得到7克(產 · 率98 %)由式1表示的化合物1。 ]H NMR (300 MHz, CD3OD) : δ 0.62~0.68(m, 1Η) &gt; ❿ 1.89〜1.96(m,8H)、1.64〜1.67(t,2H)、2.54〜2.56(t, 7H)、 2.58〜2.61(m,6H)、3.28-3.31 (m,SiOCH3)、3·38〜3.40(d, 3H)、3.42〜3.44(d,4H)、3.50〜3.58(m, 5H)、3.64(s,-NH-)、 3.80(s,OH)、4.05〜4.10(m,9H)、6.95(s,10H)、7.12〜7.13(t, 11H) ' 7.65(s, 12H) IR (純(neat), cm·1) : 3650 〜3200(vOH) ' 3300〜3200(Vnh)、1120〜1050(v 矽_(烷氧基)) 18 201009119 Diy/jipin (銅箔用表面處理劑組成物的製造) 實例2 藉由以k 9之體積比率混合水及曱醇以得到溶劑混合 物,將溶劑混合物與在實例1中製備的化合物1混合,以 製備具有1.0重量%之化合物1的混合溶液。 (二層FCCL的製造) ⑩ 實例3 在實例2中製備的混合溶液單獨靜置6〇分鐘以進行 水解,然後喷灑在小節、阻熱層及防鏽層依序形成於上的 滾製(rolled)銅箔(IL-2,由Iljin製造)上。接著,使用塗抹 • 器(aPPlicat〇r)(C.K貿易公司,模型名:CKAF1〇〇3)塗覆滾 . 製銅箔,從而製備經塗覆之銅箔。滾製銅箔上的小節、阻 熱層及防鏽層分別由銅(Cu)、鋅合金及鉻所形成。在烤&amp; 中於120〇C乾燥30分鐘經塗覆之銅荡。 相 φ 以 KRICT-PAA 亮 # 、 (BPDAzPMDAiPDAiODAi:7:6:4)噴灑使用表面處理 成物處理的銅箔’並使用刮刀(doctor blade)塗覆之 環境下於6(TC進行30分鐘、120。(;進行3〇分鐘、。在氮 行30分鐘以及400°C進行10分鐘來硬化經塗 C進 酸,以製備聚酿亞胺薄膜,因此,製備經聚=酿胺 覆於上的銅箱。在實例3中製備的銅箱以下稱為3膜塗 19 201009119 ^iv/zpui 實例4 以在實例3中同樣的方式製備經聚醯亞胺薄膜塗覆 於上的銅箔,除了使用由J〇〇y〇ung產業有限公司製造的亮 光漆(產品名:JY-001)取代KRICT_PAA亮光漆。在實例4 中製備的銅箔以下稱為樣品2。 實例5 以在實例3中同樣的方式製備經聚醯亞胺薄膜塗覆 ,上的鋼# ’除了使用由NikkG材料製造的滾製㈣(產品 τ™^Υ_22Β·Τ)取代滾製銅羯(IL_2 ’由Iljin製造),且由 KRICT-PA^t司製造的UpUeX形式之亮光漆取代 冗光漆。在實例5中製備賴fl以下稱為樣品 比較性實例j 於上的的方式製備經聚醯亞胺薄膜塗覆 表面的步驟。在士祕认使用表面處理劑組成物來處理銅箔 性樣品1。 實例1中製備的銅箔以下稱為比較 比較性實例2 1、丨 JL. .»t_ 於上二的方式製備經聚輕胺薄膜塗覆 表面的步碌。在+㈣^用表面處理劑組成物來處理銅箱 在比較性實例2中製備的銅如下稱為比較 20 201009119 性樣品2。 比較性實例3 以在實例5巾囉的方切触㈣亞胺薄膜塗覆 於上的銅4,除了省略使用表面處理劑組成物來處理銅络 Λ面的步驟。在比較性實例3中製備的_以下稱為比較 性樣品3。 參 評估實例1-1 :剝離強度測試 使用ASTMD-638指定的方法量測樣品1至3及比較 性樣品1至3的剝離強度。橫擔速度(cr0Ss-Head speed)為 25 mm/min且樣品的寬度為5 mm。使用instron 8516進行 • 量測。量測的結果如下面的表1所示。 &lt;表1&gt; 剝離強度[kg/cm] 實例3 (樣品1) 0.73 比較性實例1 (比較性樣品1) 0.32 實例4 (樣品2) 0.76 比較性實例2 (比較性樣品2) 0.38 實例5 (樣品3) 0.58 比較性實例3 (比較性樣品3) 0.28 如表1所示,根據本發明之實施例,相比於沒有使用 21 201009119 J iy/ζριη 表^處理敝成物製備之比較性樣品i至3,使用包含石夕 烧基化合物之表面處_組成物製備之樣品丨至3於聚酿 亞胺薄膜及㈣之_示大幅增加_離強度。 評估實例1-2 :防潮性測試 於50 C、相賴度⑽%在恆溫翻(thennG_hygr〇staf HIRAYANAPC-R7中儲存樣品1至3進行7天,樣品i至Hd CH, 'N^N^, Si-«〇«a^3 API-decane ch3 162.68 g of tetrahydrofurane, 6 259 g (0.05 mol) of 3-glycidyloxypropyl 3-glycidoxypropyltrimethoxysilane and 11.87 g of H3-aminopropyl-imidazole are charged to the reactor. After reacting for 6 hours, the temperature of the reactor was maintained at 95 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. After the reaction was completed, a rotary evaporator was used for 2 hours to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 24 hours to obtain 7 g (yield: 98%) of Compound 1 represented by Formula 1. H NMR (300 MHz, CD3OD): δ 0.62~0.68(m, 1Η) &gt; ❿ 1.89~1.96(m,8H), 1.64~1.67(t,2H), 2.54~2.56(t, 7H), 2.58 ~2.61 (m, 6H), 3.28-3.31 (m, SiOCH3), 3.38~3.40 (d, 3H), 3.42~3.44 (d, 4H), 3.50~3.58 (m, 5H), 3.64 (s, -NH-), 3.80 (s, OH), 4.05 to 4.10 (m, 9H), 6.95 (s, 10H), 7.12 to 7.13 (t, 11H) ' 7.65 (s, 12H) IR (neat (neat), Cm·1) : 3650 to 3200 (vOH) ' 3300 to 3200 (Vnh), 1120 to 1050 (v 矽 _ (alkoxy)) 18 201009119 Diy/jipin (Manufacture of surface treatment composition for copper foil) Example 2 A solvent mixture was mixed with the compound 1 prepared in Example 1 by mixing water and decyl alcohol in a volume ratio of k 9 to prepare a mixed solution having 1.0% by weight of Compound 1. (Manufacturing of two-layer FCCL) 10 Example 3 The mixed solution prepared in Example 2 was allowed to stand alone for 6 minutes for hydrolysis, and then sprayed on the small section, the heat-resistant layer, and the rust-proof layer sequentially formed thereon ( Rolled copper foil (IL-2, manufactured by Iljin). Next, a copper foil was coated with a smear (a. pp., CKAF1 〇〇 3) to prepare a coated copper foil. The bars, the heat-resistant layer and the rust-proof layer on the rolled copper foil are respectively formed of copper (Cu), zinc alloy and chromium. The coated copper was dried in a baking &amp; at 30 ° C for 30 minutes. The phase φ was sprayed with KRICT-PAA bright #, (BPDAzPMDAiPDAiODAi: 7:6:4) using a surface treated metal foil' and applied in a container with a doctor blade at 6 (TC for 30 minutes, 120 (; 3 minutes, 3 minutes in nitrogen line and 10 minutes in 400 ° C to harden the coated C acid to prepare a polyimide film, thus preparing copper coated with poly=branched amine The copper box prepared in Example 3 is hereinafter referred to as 3 film coating 19 201009119 ^iv/zpui Example 4 A copper foil coated with a polyimide film was prepared in the same manner as in Example 3 except The varnish (product name: JY-001) manufactured by J〇〇y〇ung Industries Co., Ltd. replaced the KRICT_PAA varnish. The copper foil prepared in Example 4 is hereinafter referred to as sample 2. Example 5 In the same manner as in Example 3. Preparation of a polyimide film coated with a polyimide film. Instead of using a roll made of NikkG material (four) (product τTM^Υ_22Β·Τ) instead of rolled copper iridium (IL_2 'made by Iljin), and by KRICT - The varnish of the UpUeX form made by PA^t replaced the vat paint. In Example 5, Lai fl was prepared. The procedure for preparing a surface coated with a polyimide film is described below in the manner of the sample comparative example j. The surface treatment composition was used to treat the copper foil sample 1. The copper prepared in Example 1 The foil is hereinafter referred to as Comparative Comparative Example 2 1. 丨JL. . . t_ The preparation of the surface coated with the poly-light amine film in the above manner. The surface treatment composition is used to treat the copper box at +(4) The copper prepared in Comparative Example 2 is hereinafter referred to as Comparative 20 201009119 Sex Sample 2. Comparative Example 3 The copper 4 was coated with the (IV) imine film on the side of the Example 5, except that the surface treatment agent was omitted. The composition was used to treat the copper surface. The sample prepared in Comparative Example 3 is hereinafter referred to as Comparative Sample 3. Reference Evaluation Example 1-1: Peel Strength Test Sample 1 was measured using the method specified in ASTM D-638. 3 and the peel strength of comparative samples 1 to 3. The cross-speed (cr0Ss-Head speed) was 25 mm/min and the width of the sample was 5 mm. Measurements were performed using an instron 8516. The results of the measurement are shown in the following table. 1 is shown. &lt;Table 1&gt; Degree [kg/cm] Example 3 (Sample 1) 0.73 Comparative Example 1 (Comparative Sample 1) 0.32 Example 4 (Sample 2) 0.76 Comparative Example 2 (Comparative Sample 2) 0.38 Example 5 (Sample 3) 0.58 Comparison Sexual Example 3 (Comparative Sample 3) 0.28 As shown in Table 1, according to the examples of the present invention, comparative samples i to 3 prepared without using 21 201009119 J iy/ζριη table were used. The sample containing the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of the composition of Evaluation Example 1-2: Moisture resistance test At 50 C, the degree of dependence (10)% was stored in the thermostat (thennG_hygr〇staf HIRAYANAPC-R7 for 7 days, sample i to 3的變色(d1SC0l0rati0n)明顯。7天後,樣品i至3的顏色沒 有改變。 (梦烷基化合物(2)之合成) 實例6A :化合物2A之合成 根據下面的反應機制2合成由式2表示的化合物2A。 &lt;反應機制2&gt; 〇The discoloration of 3 (d1SC0l0rati0n) is obvious. After 7 days, the colors of samples i to 3 did not change. (Synthesis of Dream Alkyl Compound (2)) Example 6A: Synthesis of Compound 2A Compound 2A represented by Formula 2 was synthesized according to the following Reaction Mechanism 2. &lt;Reaction mechanism 2&gt; 〇 其中R為甲基^Where R is methyl^ 將125.712克的四氬咬喘、8.%45克(〇 〇5莫耳)的3_ 氨基丙基三曱氧基矽烷(3-aminopropyltrimeth〇xysilane)及 5.0035克(0.05莫耳)的琥轴酸針(succinic她咖⑽倒入反 應器中並反應6小時’錢環境下轉反絲之溫度為 5°C至5°C ’且機械擾拌器以3〇〇 rpm旋轉。在完成反應之 22 201009119 j 17 /ζ,μιιι 後,使用旋轉蒸發器2小時以從生成物移除溶劑。然後, 在真空烤箱中乾燥生成物24小時’從而得到13.9克(產率 99 %)由式2表示的化合物2Α。 hNMR (300 ΜΗζ): δ 0.53〜0.58(m,1Η)、1.42〜1.45(m, 2H)、2.29〜2.31(d,4H)、2.38〜2.43(m,5H)、2.98〜3.00(m, 3H)、3.40~3.46(m,SiOCH3)、8.00(s,-NH-)、12.00(s,-OH) IR (純,cm 1) : 3650〜3200(v〇h)、3300〜3200(Vnh)、 • 1650(Vc〇nh)、1120〜1050(v $_(统氡基)) 實例6B :化合物2B之合成 根據下面的反應機制2合成由式2表示的化合物 2B。 &lt;反應機制2&gt;125.712 grams of tetra-argonic ablation, 8.% 45 grams (〇〇5 moles) of 3-aminopropyltrimeth〇xysilane, and 5.035 grams (0.05 moles) of succinic acid The needle (succinic her coffee (10) was poured into the reactor and reacted for 6 hours. 'The temperature of the reverse yarn in the money environment was 5 ° C to 5 ° C ' and the mechanical scrambler was rotated at 3 rpm. 201009119 j 17 /ζ,μιιι, using a rotary evaporator for 2 hours to remove the solvent from the product. Then, the product was dried in a vacuum oven for 24 hours' to obtain 13.9 g (yield 99%) represented by Formula 2. Compound 2Α hNMR (300 ΜΗζ): δ 0.53~0.58 (m, 1Η), 1.42~1.45 (m, 2H), 2.29~2.31 (d, 4H), 2.38~2.43 (m, 5H), 2.98~3.00 ( m, 3H), 3.40~3.46 (m, SiOCH3), 8.00 (s, -NH-), 12.00 (s, -OH) IR (pure, cm 1): 3650~3200 (v〇h), 3300~3200 (Vnh), • 1650 (Vc〇nh), 1120 to 1050 (v $_(system)) Example 6B: Synthesis of Compound 2B The compound 2B represented by Formula 2 was synthesized according to the following Reaction Mechanism 2. Mechanism 2&gt; 其中R為乙基。 將125.712克的四氫呋喃、11.0685克(0.05莫耳)的 3-氨基丙基三乙氧基石夕院(saminopropyitriethoxysiiane)及 5.0035克(0.05莫耳)的琥珀酸酐倒入反應器中並反應6小 時’在氮環境下維持反應器之溫度為-5Ό至5。(:,且機械 攪摔器以300 rpm旋轉。在完成反應之後,使用旋轉蒸發 23 201009119 ^ly/zpm 器2小時從生成物移除溶劑。然後,在真空烤箱中乾燥生 成物24小時,從而得到16克(產率99%)由式2表示的化 合物2B。 lK NMR (300 MHz) : 60.58~0.60(m, lH)'1.22~1.25(m, Si-CH2)、1.60〜1.63(m, 2Η)、2·45〜2.49(m,4H)、2.51 〜2.54(m, 5H)、3.20〜3.25(m,3H)、3.83〜3.87(m, Si-CH3) IR (純,cm·1) : 3650〜3200(vOH)、3300〜3200(vNH)、 1650(Vc〇nh)、1120〜1050(v 矽_( 烷氧基j Φ (銅箔用表面處理劑組成物的製造) 實例7至11 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物’將溶劑混合物與在實例6A中製備的化合物2A混合, 以製備分別具有0.5重量%、1重量%、2重量%、3重量% 及5重量%之化合物2A的混合溶液。 Q 實例12至16 藉由以1:9之體積比率混合水及曱醇以得到溶劑混合 物’將溶劑混合物與在實例6B中製備的化合物2B混合, 以製備分別具有0.5重量%、1重量%、2重量%、3重量% 及5重量%之化合物2B的混合溶液。 (二層FCCL之製造) 24 e ❹ 201009119Wherein R is an ethyl group. 125.712 grams of tetrahydrofuran, 11.085 grams (0.05 moles) of 3-aminopropyl triethoxy saminopropyitriethoxysiiane and 5.035 grams (0.05 moles) of succinic anhydride were poured into the reactor and reacted for 6 hours. The reactor temperature was maintained at -5 Torr to 5 in a nitrogen atmosphere. (:, and the mechanical stirrer was rotated at 300 rpm. After the reaction was completed, the solvent was removed from the product using a rotary evaporation 23 201009119 ^ly/zpm for 2 hours. Then, the product was dried in a vacuum oven for 24 hours, thereby 16 g (yield 99%) of the compound 2B represented by the formula 2 is obtained. lK NMR (300 MHz): 60.58 to 0.60 (m, lH) '1.22 to 1.25 (m, Si-CH2), 1.60 to 1.63 (m, 2Η), 2·45~2.49(m, 4H), 2.51~2.54(m, 5H), 3.20~3.25(m, 3H), 3.83~3.87(m, Si-CH3) IR (pure, cm·1) : 3650 to 3200 (vOH), 3300 to 3200 (vNH), 1650 (Vc〇nh), 1120 to 1050 (v 矽 _ (alkoxy j Φ (manufacture of surface treatment composition for copper foil) Example 7 to 11 The solvent mixture was mixed with the compound 2A prepared in Example 6A by mixing water and methanol in a volume ratio of 1:9 to prepare 0.5% by weight, 1% by weight, 2% by weight, and 3, respectively. % by weight and 5% by weight of a mixed solution of Compound 2A. Q Examples 12 to 16 by mixing water and decyl alcohol in a volume ratio of 1:9 to obtain a solvent mixture 'In a case of Example 6B The prepared Compound 2B was mixed to prepare a mixed solution of Compound 2B each having 0.5% by weight, 1% by weight, 2% by weight, 3% by weight, and 5% by weight. (Manufacture of a two-layer FCCL) 24 e ❹ 201009119 貫例17至26 在實例7至16 t製備的混合溶液單獨靜 ^水解=後分別魏在經Q塗覆之滾細^^, 得到:Γ塗覆二接著,使用塗抹器塗覆滾製鋼箔,從而 之_ _。在烤箱中於12(rc乾燥30分鐘經塗覆 亮光二7://有限公司㈣ 刀=使用表面處理劑組成物處理的銅箱,並使用刮 在氮魏下於6Gt進行3G分鐘、U =1 行3°分鐘以及wc進行10分鐘::二 覆之认胺酸,以製備聚醢亞胺薄膜,因此 令 S薄膜分別塗覆於上的鋪。在實例 銅箔以下稱為樣品4至13。 中製備的 比較性實例4 於上的:=:====, ί::Γ。在比較性實例4中製備的銅落以下稱 評估實例2-1 :剝離強度測試 ^用ASTM D-638指定的方法量測樣品4及 較性樣品4 _離強度。漏速度為25 mm/min且樣= 25 201009119 寬度為5 mm。使用Instron 8516進行量測。量測的結果如 下面的表2所示。 &lt;表2&gt; — 剝離強度[kg/cm] 實例17 (樣品4) 0.78 實例18 (樣品5) 0.86 實例19 (樣品6) 0.93 實例20 (樣品7) 1.05 實例21 (樣品8) μ_ 0.92 實例22 (樣品9) L 0.82 實例23 (樣品1〇) 0.89 實例24 (樣品11) 1.02 實例25 (樣品12) 1.12 實例26 (樣品13) 0.94 比較性實例4 (比較性樣品4) 0.38 如表2所示,根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品4,使用包含矽烷基 化合物之表面處理劑組成物製備之樣品4至13於聚醯亞胺 薄膜及銅落之間顯示大幅增加的剝離強度。 評估實例2-2 :防潮性測試 於50°C、相對濕度80 %在恆溫溼器HIRAYANA 26 201009119 PC-R7中儲存樣品4至l3進行7天,樣品4至13的變色 明顯。7天後’樣品4至13的顏色沒有改變。 (矽烷基化合物(3)之合成) 實例27 ·化合物3之合成 根據下面的反應機制3合成由式3表示的化合物3。 &lt;反應機制3&gt;Example 17 to 26 The mixed solutions prepared in Examples 7 to 16 t were separately hydrolyzed = after the WE coating by the Q coating, respectively, to obtain: Γ coating, followed by coating the rolled steel foil with an applicator And thus _ _. In the oven at 12 (r dry for 30 minutes, coated with bright light 2:7 (4) knife = copper box treated with surface treatment composition, and scraped under nitrogen at 6 Gt for 3G minutes, U = 1 row 3 ° minutes and wc for 10 minutes:: two-coated amino acid to prepare a polyimide film, so that the S film is separately applied to the upper layer. The sample copper foil is hereinafter referred to as sample 4 to 13 Comparative Example 4 prepared in the above: =:====, ί::Γ. The copper drop prepared in Comparative Example 4 is hereinafter referred to as Evaluation Example 2-1: Peel Strength Test ^ Using ASTM D- The method specified in 638 measures sample 4 and comparative sample 4 _ off-strength. The leak rate is 25 mm/min and the sample = 25 201009119 has a width of 5 mm. The measurement is performed using an Instron 8516. The results of the measurement are shown in Table 2 below. &lt;Table 2&gt; - Peel Strength [kg/cm] Example 17 (Sample 4) 0.78 Example 18 (Sample 5) 0.86 Example 19 (Sample 6) 0.93 Example 20 (Sample 7) 1.05 Example 21 (Sample 8) __ 0.92 Example 22 (Sample 9) L 0.82 Example 23 (Sample 1〇) 0.89 Example 24 (Sample 11) 1.02 Example 25 (Sample 12) 1.12 Example 2 6 (Sample 13) 0.94 Comparative Example 4 (Comparative Sample 4) 0.38 As shown in Table 2, according to the embodiment of the present invention, decane was used as compared with Comparative Sample 4 prepared without using the surface treating agent composition. Samples 4 to 13 prepared from the surface treatment composition of the base compound showed a greatly increased peel strength between the polyimide film and the copper drop. Evaluation Example 2-2: moisture resistance test at 50 ° C, relative humidity 80% Samples 4 to 13 were stored in a thermostat humidifier HIRAYANA 26 201009119 PC-R7 for 7 days, and the discoloration of samples 4 to 13 was remarkable. After 7 days, the color of samples 4 to 13 did not change. (Synthesis of fluorenyl compound (3) Example 27 Synthesis of Compound 3 Compound 3 represented by Formula 3 was synthesized according to Reaction Mechanism 3 below. &lt;Reaction mechanism 3&gt; PDCA-TMOS 將125.712克的四氫呋喃、8.9645克(0.05莫耳)的3_ 氨基丙基三曱氡基矽烷及7.4550克(0.05莫耳)的2,3-咣啶 ❿ 二酸酐(2,3-pyridinedicarboxylic anhydride)倒入反應器中並 反應5小時’在氮環境下維持反應器之溫度為巧艽至5°C, 且機械攪拌器以300 rpm旋轉。在完成反應之後,使用旋 轉蒸發器2小時以從生成物移除溶劑。然後,在真空烤箱 中乾燥生成物24小時,從而得到16.4克(產率99 %)由式 3表示的化合物3。 bNMR (300 MHz) : δ0·57〜0.59(t,1H)、1.62〜1.8〇(m, 27 201009119 2H)、3.62~3.67(m,Si-CH3)、3.85~3.87(t,3H)、7.93〜7 95(t, 4H)、8.56(s,NH)、δ·64〜8.67(d,5H)、9.09〜9.11(d,6H)、 13.80(s, OH) IR (純,cm-1) : 3650〜3200(vOH)、3300〜3200(vNH)、 1650(vCONH)、1120〜l〇50(v 矽_(仗氧基)) (銅箔用表面處理劑組成物的製造) 實例28至29 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物’將溶劑混合物與在實例27中製備的化合物3混合,以 製備分別具有0.5重量%及丨重量%之化合物3的混合溶 液。 (二層FCCL之製造) 實例30至31 在實例28至29中製備的混合溶液單獨靜置60分鐘 以進行水解’然後分別喷灑在經Cr塗覆之滚製銅箔(IL_2, 由Hjin製造)上。接著,使用塗抹器塗覆銅落,從而製備 經塗覆之銅箔。在烤箱中於12〇°c乾燥3〇分鐘經塗覆之銅 箔。 〇 以由UBE有限公司製造的Upilex形式之亮光漆(產 =名:U-亮光漆_S)噴灑使用表面處理劑組成物處理的銅 箱’並使用刮刀塗覆之。 在氮環境下於6〇°c進行30分鐘、120。(:進行30分鐘、 201009119 J 1.7 f ^,yiL t 10分鐘來硬化經塗覆之 因此’製備經聚醯亞胺 30至31中製備的銅箔 2聚:c::3〇分鐘以及wc進行 以製備聚酿亞胺薄膜, 1 、刀別塗覆於上的銅箔。在實 以下稱為樣品14至15。貫你 比較性實例5 於實例3 G中同樣的方式製備經聚醯亞胺薄膜塗覆 © 】、5 '备除了省略使用表面處理劑組成物來處理銅羯 的步驟。在比較性實例5中製備的銅猪以下稱為比較 評估實例3-1 :剝離強度測試 使用ASTMD·638指定的方法量測樣品及比 較性樣品5關離鼓。鋪速度為25 mm/min且樣品的 寬度為5 mm。使InStr⑽㈣進行量測。量測的結果如 下面的表3所示。 〈表3&gt; 〜--- 離強度[kgf/cm] 實例30 (樣品14) 、 0 82 實例31 (樣品15) 〜 0.78 比較性實例5 (比較性樣品5) 〜 0.32 如表3所根據本發明之實施例,相比於沒有使用 29 201009119 表面處理劑組成物㈣之味性樣品5,使用包含石夕烧基 化合物之表面處理劑組成物製備之樣品14至15於聚醯亞 胺薄膜及銅箔之間具有大幅增加的剝離強度。 評估實例3-2 :防潮性測試 於5〇°C、相對濕度80 %在恆溫溼器HIRAYANA PC-R7中儲存樣品14至15進行7天,樣品14至15的變 色明顯。7天後,樣品14至15的顏色沒有改變。 (石夕统基化合物(4)之合成) 實例32A :化合物4A之合成 根據下面的反應機制4合成由式4表示的化合物4A。 &lt;反應機制4&gt;PDCA-TMOS will have 125.712 grams of tetrahydrofuran, 8.9645 grams (0.05 moles) of 3-aminopropyltridecyldecane and 7.4550 grams (0.05 moles) of 2,3-acridine phthalic anhydride (2,3-pyridinedicarboxylic). The anhydride was poured into the reactor and reacted for 5 hours. The temperature of the reactor was maintained to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 300 rpm. After the completion of the reaction, a rotary evaporator was used for 2 hours to remove the solvent from the product. Then, the resultant was dried in a vacuum oven for 24 hours, whereby 16.4 g (yield 99%) of Compound 3 represented by Formula 3 was obtained. bNMR (300 MHz): δ0·57~0.59(t,1H), 1.62~1.8〇(m, 27 201009119 2H), 3.62~3.67(m,Si-CH3), 3.85~3.87(t,3H), 7.93 ~7 95(t, 4H), 8.56(s, NH), δ·64~8.67(d,5H), 9.09~9.11(d,6H), 13.80(s, OH) IR (pure, cm-1) : 3650 to 3200 (vOH), 3300 to 3200 (vNH), 1650 (vCONH), 1120 to 1050 (v 矽 _ (decyloxy)) (manufacture of a surface treatment composition for copper foil) Example 28 to 29 A solvent mixture was obtained by mixing water and methanol in a volume ratio of 1:9 to prepare a solvent mixture and a compound 3 prepared in Example 27 to prepare a mixed solution of compound 3 having 0.5% by weight and 丨% by weight, respectively. . (Manufacturing of two-layer FCCL) Examples 30 to 31 The mixed solutions prepared in Examples 28 to 29 were separately allowed to stand for 60 minutes for hydrolysis' and then sprayed separately on a Cr-coated rolled copper foil (IL_2, manufactured by Hjin). )on. Next, the copper drop was coated using an applicator to prepare a coated copper foil. The coated copper foil was dried in an oven at 12 ° C for 3 minutes.喷洒 A copper box treated with a surface treatment composition was sprayed with a varnish of the Upilex form manufactured by UBE Co., Ltd. (product: name: U-varnish _S) and coated with a doctor blade. It was carried out at 6 ° C for 30 minutes and 120 in a nitrogen atmosphere. (: 30 minutes, 201009119 J 1.7 f ^, yiL t 10 minutes to harden the coated thus prepared 'prepared copper foil prepared in polyimine 30 to 31 2: c:: 3 〇 minutes and wc To prepare a polyimide film, 1. The copper foil coated on the knife. It is hereinafter referred to as Samples 14 to 15. Throughout Comparative Example 5, the polyimine was prepared in the same manner as in Example 3 G. Film coating © 】, 5 'Prepared the step of treating the copper ruthenium using the surface treatment composition. The copper pig prepared in Comparative Example 5 is hereinafter referred to as Comparative Evaluation Example 3-1: Peel Strength Test Using ASTM D· The method specified in 638 measures the sample and the comparative sample 5 off the drum. The paving speed is 25 mm/min and the width of the sample is 5 mm. The InStr (10) (4) is measured. The results of the measurement are shown in Table 3 below. Table 3 &gt; ~---Intensity [kgf/cm] Example 30 (Sample 14), 0 82 Example 31 (Sample 15) ~ 0.78 Comparative Example 5 (Comparative Sample 5) ~ 0.32 As shown in Table 3 according to the present invention Example, compared to no use of 29 201009119 surface treatment composition (4) Sample 5, Samples 14 to 15 prepared using the surface treatment composition containing the sulphur-based compound had a greatly increased peel strength between the polyimide film and the copper foil. Evaluation Example 3-2: moisture resistance test Samples 14 to 15 were stored in a thermostat humidifier HIRAYANA PC-R7 for 7 days at 5 ° C and a relative humidity of 80 %, and the discoloration of the samples 14 to 15 was remarkable. After 7 days, the colors of the samples 14 to 15 did not change. Synthesis of Compound Shi (4) Example 32A: Synthesis of Compound 4A Compound 4A represented by Formula 4 was synthesized according to the following Reaction Scheme 4. <Reaction Mechanism 4> 其中R為曱基。 將125.712克的四氫呋喃、8.9645克(0.05莫耳)的3_ 氨基丙基三甲氧基矽烷及9.6065克(0.05莫耳)的偏笨三酸 Sf(l,2,4-benzenetricarboxylic anhydride) (2,3-°比咬二酸酐) 倒入反應器中並反應6小時,在氮環境下維持反應器之溫 度為-5°C至5°C,且機械攪拌器以250rpm旋轉。在完成反 應之後,使用旋轉蒸發器1小時以從生成物移除溶劑。然 201009119 後’在真空烤箱中乾燥生成物48小時,從而得到18.5克(產 率99%)由式4表示的化合物4A。 !H NMR (300 MHz) : 50.62~0.65(t, 1H)' 1.71~1.76(m, 2H)、3.41 〜3.47(m,Si-CH3)、3.56〜3.60(m,3H)、7.45(s,NH) IR (純,cm·1) : 3650〜3200(vOH)、3300〜3200(vNH)、 1650(vCONH)、1120~1050(v 梦-(炫氣基)) ® 實例32B :化合物4B之合成 根據下面的反應機制4合成由式4表示的化合物4B。 &lt;反應機制4&gt;Wherein R is a thiol group. 125.712 grams of tetrahydrofuran, 8.9645 grams (0.05 moles) of 3-aminopropyltrimethoxynonane and 9.6065 grams (0.05 moles) of Sf(1,2,4-benzenetricarboxylic anhydride) (2,3 The mixture was poured into the reactor and reacted for 6 hours, the temperature of the reactor was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 250 rpm. After the reaction was completed, a rotary evaporator was used for 1 hour to remove the solvent from the product. The product was dried in a vacuum oven for 48 hours after 201009119, whereby 18.5 g (yield 99%) of Compound 4A represented by Formula 4 was obtained. !H NMR (300 MHz): 50.62~0.65(t, 1H)' 1.71~1.76(m, 2H), 3.41~3.47(m,Si-CH3), 3.56~3.60(m,3H), 7.45(s, NH) IR (pure, cm·1): 3650~3200(vOH), 3300~3200(vNH), 1650(vCONH), 1120~1050(v dream-(hyun-based)) Example 32B: Compound 4B Synthesis Compound 4B represented by Formula 4 was synthesized according to the following reaction mechanism 4. &lt;Reaction mechanism 4&gt; 將125.712克的四氫呋喃、8.9645克(〇.〇5莫耳)的3- 氨基丙基三乙氧基矽烷及9.6065克(〇.〇5莫耳)的偏苯三酸 酐(l,2,4-benzenetricarboxylic anhydride) (2,3_吡啶二酸酐) 倒入反應器中並反應6小時,在氮環境下維持反應器之溫 度為-5°C至5°C ’且機械攪拌器以250rpm旋轉。&amp;完成$ 應之後’使用旋轉蒸發器1小時以從生成物移除溶劑。然 後’在真空烤箱中乾燥生成物48小時,從而得到2〇·6克 率99%)由式4表示的化合物4Β。 31 201009119 4 NMR (300 MHz,CD3OD) : δθ.71 〜0.73(t, 1H)、 1.14〜1.23(m,Si-CH3)、1.71 〜1.74(m,2H)、3.58〜3.60(t, 3H) &gt; 3.79-3.86(m, Si-CH2) &gt; 8.55(s, NH) IR (純,cm.1) : 3650〜3200(vOH)、3300〜3200〇NH)、 1650(vCONH)、1120~1050(v 矽烷氧基)) (銅箔用表面處理劑組成物的製造) 實例33至34 藉由以1:9之體積比率混合水及甲醇以得到溶劑混合 物’將溶劑混合物與在實例32A中製備的化合物4A混合, 以製備分別具有〇·5重量。/〇及1重量%之化合物4a的混合 溶液。 實例35至36 藉由以1:9之體積比率混合水及曱醇以得到溶劑混合 r,』將溶劑混合物與在實例32B中製備的化合物43混合, 備分別具有〇·5重量%及】重量%之化合物4B的混合 (二層FCCL的製造) 實例37至40 以進/在實例33至36中製備的混合溶液單獨靜置60分鐘 订水解’賴分财m在經〇 μ之滚製網(IL_2, 參 ❿ 201009119 由Hjin製造)上 經塗覆之鋼、著,使用塗抹器塗覆轉,從而製備 箔。 任烤箱中於UNC乾燥30分鐘經塗覆之銅 JY-0〇l^t 刀塗覆之 2耽^〇境4於6〇t進行30分鐘'靴進行30分鐘、 薄媒分別塗製備經聚酿亞胺 以下稱為在加7至㈣備賴 比較性實例6 於μ a/ S實例37中同樣的方式製備經聚酿亞胺薄膜塗覆 表除了省略使用表面處理劑組成物來處理銅猪 tit驟。在比較性實例6中製備的銅箱以下稱為比較 評估實例4-1 :剝離強度測試 使用ASTMD-638指定的方法量測樣品16至19及比 較性樣品6的剝離強度。橫擔速度為25 mm/min且樣品的 寬度為5 mm。使用Instron 8516進行量測。量測的結果如 下面的表4所示。 33 201009119 〈表4&gt; 剝離強度[kgf/cm] Π) 寬例 19) 比轉性實命lj_X^性樣品6) 1.60 1.35 1.98 1.57 0.38125.712 grams of tetrahydrofuran, 8.9645 grams of 3-aminopropyltriethoxydecane, and 9.6065 grams of trimellitic anhydride (1,2,4-benzenetricarboxylic anhydride) (2,3-pyridine dianhydride) was poured into the reactor and reacted for 6 hours, maintaining the reactor temperature at -5 ° C to 5 ° C in a nitrogen atmosphere and the mechanical stirrer was rotated at 250 rpm. &amp;Complete $ should be followed by using a rotary evaporator for 1 hour to remove solvent from the product. Then, the resultant was dried in a vacuum oven for 48 hours to obtain a compound of 4 in terms of 2 〇·6 g rate of 99%. 31 201009119 4 NMR (300 MHz, CD3OD) : δθ.71 ~0.73(t, 1H), 1.14~1.23(m,Si-CH3), 1.71~1.74(m,2H), 3.58~3.60(t, 3H) &gt; 3.79-3.86(m, Si-CH2) &gt; 8.55(s, NH) IR (pure, cm.1): 3650~3200(vOH), 3300~3200〇NH), 1650(vCONH), 1120~ 1050 (v decyloxy)) (manufacture of a surface treatment composition for copper foil) Examples 33 to 34 A solvent mixture was obtained by mixing water and methanol in a volume ratio of 1:9 with the solvent mixture in Example 32A. The prepared Compound 4A was mixed to prepare a weight of 〇·5, respectively. / Mixture of 1% by weight of Compound 4a. Examples 35 to 36 were mixed with water and decyl alcohol in a volume ratio of 1:9 to obtain a solvent mixture r, and the solvent mixture was mixed with the compound 43 prepared in Example 32B to have a weight of 5% by weight and a weight, respectively. Mixing of % of compound 4B (manufacture of two-layer FCCL) Examples 37 to 40 The mixed solutions prepared in/from the examples 33 to 36 were separately allowed to stand for 60 minutes to be hydrolyzed by the lyophilized m. (IL_2, ginseng 201009119 manufactured by Hjin) coated steel, coated with an applicator to prepare a foil. Dry in UNC for 30 minutes in UNC. Coated copper JY-0〇l^t knife coated 2耽^〇4 4 at 6〇t for 30 minutes' boots for 30 minutes, thin medium separately prepared for polymerization The brewed imine is hereinafter referred to as the addition of 7 to (4). Comparative Example 6 was prepared in the same manner as in μ a/S Example 37. The coated polyimide film was coated except that the surface treatment composition was omitted to treat the copper pig. Tit. The copper box prepared in Comparative Example 6 is hereinafter referred to as Comparative Evaluation Example 4-1: Peel Strength Test The peel strengths of Samples 16 to 19 and Comparative Sample 6 were measured using the method specified by ASTM D-638. The cross roller speed is 25 mm/min and the width of the sample is 5 mm. Measurements were performed using an Instron 8516. The results of the measurements are shown in Table 4 below. 33 201009119 <Table 4> Peel strength [kgf/cm] Π) Width Example 19) Specific rotation lj_X^ sample 6) 1.60 1.35 1.98 1.57 0.38 如表4所示’根據本發明之實施例,相比於沒有使用 表面處理敝成物製狀比較性樣品6 ,使用包含矽烷基 化合物之表面處理#1組成物㈣之樣品16至 19於聚醯亞 胺薄膜及銅ϋ之間具有大幅增加的剝離強度。 評估實例4-2 :防潮性測試As shown in Table 4, according to the examples of the present invention, samples 16 to 19 of the surface treatment #1 composition (IV) containing a decyl compound were used in comparison to the comparative sample 6 which was not used for the surface treatment composition. There is a greatly increased peel strength between the quinone imine film and the copper enamel. Evaluation Example 4-2: Moisture Resistance Test 於50 °C、相對濕度80 %在恆溫溼器HIRAYANA PC_R7中儲存樣品16至19進行7天,樣品16至19的變 色明顯。7天後,樣品16至19的顏色沒有改變。 (根據聚醯亞胺之形式之剝離強度的比較) (2層FCCL的製造) 實例41至44 以在實例37中同樣的方式製備經聚醢亞胺薄膜塗覆 於上的銅箔,除了使用PMDA/ODA亮光漆、BTDA/PDA 力光漆、BTDA/PMDA/ODA/PDA 亮光漆及 34 201009119 免光漆分別取代由Jooyoung有限公司製 :::先漆(產品名:JY顧)。此處,使用〇 5重量%之 化&amp;物4B為表面處理劑。在實例41至 以下稱為樣品2G至23。 卩上描述的亮光漆是由町描述的方法製造 PMDA/ODA亮光漆 將255.000克的N,N_二甲基乙醯胺(DMAc ; ❹ N’N_dimethylacetamide)、21.538 克(0.107563 莫耳)的 4,4·-二氨基二苯醚及23.462克(0.107563莫耳)的苯均四酸二酐 依序倒入反應器中並反應24小時,在氮環境下維持反應器 之溫度為-5 °C至5。(:,且機械攪拌器以350 rpm旋轉。然 後,從而製備包含15重量%之聚醯胺酸的亮光漆。 BTDA/PDA亮光漆 將 255.000 克的 DMAc (N,N-二曱基乙醯胺)、11.307 克(0.104561莫耳)的間苯二胺及33.693克(0.104561莫耳) 的 3,3f,4,4’-二苯酮四甲酸二 if (3,3’,4,4’-benzophenone tetracarboxylic dianhydride)倒入反應器中並反應24小時, 在氮環境下維持反應器之溫度為-5 °C至5 °C,且機械攪拌 器以350 rpm旋轉。然後,從雨製備包含15重量%之聚醯 胺酸的亮光漆。 BTDA/PMDA/ODA/PDA 亮光漆 35 201009119 將 255 克的 DMAc、6.334 克(0.031633 莫耳)的 4,4,_ 二氨基二苯醚及7.982克(0.073811莫耳)的間苯二胺倒入 反應器中並完全溶解。然後’將23.784克(0.073811莫耳) 的 3,3’,4,4’-二苯酮四甲酸二酐(3,3’,4,4’-benzophenone tetracarboxylic dianhydride)及 6.900 克(0.031633 莫耳)的苯 均四酸二酐倒入反應器中並反應24小時,在氮環境下維持 反應器之溫度為-5 °C至5 °C,且機械攪拌器以350 rpm旋 轉。然後,從而製備包含15重量%之聚醯胺酸的亮光漆。 PMDA/ODA-SD 亮光漆 將 127.5 克的 DMAc、9.826 克(0.04907 莫耳)的 4,4,-二氨基二苯醚及1.408克(0.002583莫耳)的SD-545倒入反 應器中並完全溶解。然後,將11.267克(0.0.051653莫耳) 的苯均四酸二酐倒入反應器中並反應24小時,在氮環境下 維持反應器之溫度為-5。〇至5°C,且機械攪拌器以350rpm 旋轉。然後,從而製備包含15重量%之聚醯胺酸的亮光漆。 比較性實例7至10 以在實例41至44中同樣的方式製備經聚醯亞胺薄膜 塗覆於上的銅箔,除了省略使用表面處理劑組成物來處理 銅箱表面的步驟。在比較性實例7至10中製備的銅箔以下 稱為比較性樣品7至1〇。 評估實例5-剝離強度測試 36 201009119Samples 16 to 19 were stored in a thermostatic humidifier HIRAYANA PC_R7 at 50 ° C and a relative humidity of 80% for 7 days, and the samples 16 to 19 were significantly changed. After 7 days, the colors of samples 16 to 19 did not change. (Comparison of peel strength according to the form of polyimine) (Production of 2-layer FCCL) Examples 41 to 44 Copper foil coated with a polyimide film was prepared in the same manner as in Example 37 except PMDA/ODA varnish, BTDA/PDA varnish, BTDA/PMDA/ODA/PDA varnish and 34 201009119 The varnish is replaced by Jooyoung Co., Ltd.::: lacquer (product name: JY Gu). Here, 5% by weight of Chemicals &amp; 4B is used as a surface treatment agent. Examples 41 to hereinafter are referred to as samples 2G to 23. The varnish described above is manufactured by the method described by Machi to produce PMDA/ODA varnish with 255.000 g of N,N-dimethylacetamide (DMAc; ❹N'N_dimethylacetamide), 21.538 g (0.107563 mol) of 4 4,-diaminodiphenyl ether and 23.462 g (0.107563 mol) of pyromellitic dianhydride were sequentially poured into the reactor and reacted for 24 hours, maintaining the reactor temperature at -5 ° C under nitrogen atmosphere. To 5. (:, and the mechanical stirrer is rotated at 350 rpm. Then, a varnish containing 15% by weight of polyglycolic acid is prepared. BTDA/PDA varnish will be 255.000 grams of DMAc (N,N-dimercaptoacetamide) ), 11.307 g (0.104561 mol) of m-phenylenediamine and 33.693 g (0.104561 mol) of 3,3f,4,4'-benzophenonetetracarboxylic acid diif (3,3',4,4'- The benzophenone tetracarboxylic dianhydride was poured into the reactor and reacted for 24 hours, the reactor temperature was maintained at -5 ° C to 5 ° C under nitrogen, and the mechanical stirrer was rotated at 350 rpm. Then, the preparation from rain contained 15 weights. 5% melamine varnish lacquer BTDA/PMDA/ODA/PDA varnish 35 201009119 255 g of DMAc, 6.334 g (0.031633 mol) of 4,4,_ diaminodiphenyl ether and 7.982 g (0.073811) The m-phenylenediamine was poured into the reactor and completely dissolved. Then '23.784 g (0.073811 mol) of 3,3',4,4'-benzophenonetetracarboxylic dianhydride (3,3') , 4,4'-benzophenone tetracarboxylic dianhydride) and 6.900 g (0.031633 mol) of pyromellitic dianhydride were poured into the reactor and reacted for 24 hours. The temperature of the reactor was maintained at -5 ° C to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was rotated at 350 rpm. Then, a varnish containing 15% by weight of polyglycolic acid was prepared. PMDA/ODA-SD The varnish pours 127.5 grams of DMAc, 9.826 grams (0.04907 moles) of 4,4,-diaminodiphenyl ether and 1.408 grams (0.002583 moles) of SD-545 into the reactor and completely dissolves. 11.267 g (0.0.051653 mol) of pyromellitic dianhydride was poured into the reactor and reacted for 24 hours. The temperature of the reactor was maintained at -5 Torr to 5 ° C under a nitrogen atmosphere, and the mechanical stirrer was 350 rpm rotation. Then, a varnish containing 15% by weight of polyglycolic acid was prepared. Comparative Examples 7 to 10 Copper foil coated with a polyimide film was prepared in the same manner as in Examples 41 to 44. The step of treating the copper box surface was omitted except that the surface treatment composition was omitted. The copper foils prepared in Comparative Examples 7 to 10 are hereinafter referred to as Comparative Samples 7 to 1 〇. Evaluation Example 5 - Peel Strength Test 36 201009119 使用ASTMD-638指定的方法量測樣品20至23及比 較性樣品7至1〇的剝離強度。橫擔速度為25 mm/min且 樣品的寬度為5 mm。使用Instron 8516進行量測。量測的 結果如下面的表5所示。 &lt;表5&gt; 剝離強度[kg/cm] _ 實例41 (樣品20) 1.02 實例42 (後品21) 0.93 _-實例43(樣品22) 1.21 --實例44 (樣品23) 1.53 -生矣〗生實例7 (比較性樣品7) 0.52 _(比較性樣品8) 0.39 -較性實例9 (比較性樣品% 0.61 一實例10 (比較性樣品1〇) 0.72 ❹ 如表5所示,根據本發明之實施例,相比於沒有使用 表面處理劑組成物製備之比較性樣品7至,使用包含石夕 燒基化合物之表面處理触成物製備之樣品20至 23於聚 亞胺薄膜及域之間具有大幅增加關離強度。 如上所述,相比於沒有表域理_形成於上的 包含—般魏基化合物之表面處理薄膜形成於上的 心根據本㈣之包含魏基化合物或魏基化合物之 之表面處理薄膜形成於上的PCB具有提高的剝離 37 201009119 強度。 雖然本發明已以實施例揭露如上,然其並非用以限定 本發明,任何所屬技術領域中具有通常知識者,在不脫離 本發明之精神和範圍内,當可作些許之更動與潤飾,故本 發明之保護範圍當視後附之申請專利範圍所界定者為準。 【圖式簡單說明】 無。 【主要元件符號說明】 無。 ⑩The peel strengths of samples 20 to 23 and comparative samples of 7 to 1 Torr were measured using the method specified by ASTM D-638. The cross roller speed is 25 mm/min and the width of the sample is 5 mm. Measurements were performed using an Instron 8516. The results of the measurements are shown in Table 5 below. &lt;Table 5&gt; Peel strength [kg/cm] _ Example 41 (Sample 20) 1.02 Example 42 (Post product 21) 0.93 _-Example 43 (Sample 22) 1.21 - Example 44 (Sample 23) 1.53 - Raw oysters Raw Example 7 (Comparative Sample 7) 0.52 _ (Comparative Sample 8) 0.39 - Comparative Example 9 (Comparative Sample % 0.61 - Example 10 (Comparative Sample 1 〇) 0.72 ❹ As shown in Table 5, according to the present invention In the embodiment, samples 20 to 23 prepared using a surface-treated contact comprising a ceramide compound were used between the polyimide film and the domain, compared to the comparative sample 7 to which no surface treatment composition was used. It has a large increase in the off-strength strength. As described above, the surface-treated film containing the above-mentioned Wei-based compound formed on the upper surface is formed by the Wei-based compound or the Wei-based compound according to the present invention. The PCB on which the surface treatment film is formed has an improved peeling strength of 37 201009119. Although the invention has been disclosed above by way of example, it is not intended to limit the invention, and any one of ordinary skill in the art does not The invention Within the scope of God and the scope, the scope of protection of the invention is subject to the definition of the scope of the patent application. [Simplified description of the diagram] None. [Description of main components] None. 10 38 201009119 爲第98124127號中文說明書無劃線修正本 卜 發明專利說明書 %《2006.01、 (本說明書格式、順序,請勿任意更動,※記號部分請勿填寫) ※申請案號:〜7 ακ % (2〇〇6.〇1&gt; ※申請日: ※^(:分類:C。^ % ^2006.01) % 一、發明名稱: ⑽ο&amp;οη w ^ ^ (2〇〇6.οι&gt; e 印刷電路板用的銅箔及其製備方法以及使用聚醯胺 酸前驅物與銅箔的可撓式覆銅層壓板 COPPER FOIL FOR PRINTED CIRCUIT BOARD, METHOD OF PREPARING THE SAME, AND FLEXIBLE COPPER CLAD LAMINATE USING POLYAMIC ACID PRECURSOR AND COPPER FOIL 二、中文發明摘要: , 一種印刷電路板用之經表面處理的銅箔,其包含形 v 成在銅箔上的防鏽層及形成在防鏽層上的表面處理薄膜, 其中表面處理薄膜包含選自由式1至式4表示的矽烷基化 合物所組成之族群的至少一化合物,或所述矽烧基化合物 _ 的水解物: &lt;式1&gt;38 201009119 For the Chinese manual No. 98124127, there is no slash correction. The patent specification for the invention is %. "2006.01. (The format and order of this manual should not be changed at any time. Please do not fill in the ※ part) ※Application number: ~7 ακ % ( 2〇〇6.〇1&gt; ※Application date: ※^(:Classification: C.^ % ^2006.01) % I. Invention name: (10)ο&οη w ^ ^ (2〇〇6.οι&gt; e for printed circuit boards Copper foil and preparation method thereof, and flexible copper clad laminate using polyacetic acid precursor and copper foil COPPER FOIL FOR PRINTED CIRCUIT BOARD, METHOD OF PREPARING THE SAME, AND FLEXIBLE COPPER CLAD LAMINATE USING POLYAMIC ACID PRECURSOR AND COPPER FOIL II. Abstract of Chinese invention: A surface-treated copper foil for a printed circuit board comprising a rust-preventing layer formed on a copper foil and a surface-treated film formed on the rust-preventing layer, wherein the surface-treated film At least one compound comprising a group selected from the group consisting of a fluorenyl compound represented by Formulas 1 to 4, or a hydrolyzate of the sulfonyl compound _: &lt;Formula 1&gt; 〈式2〉 201009119 31972ρίΠ<式2> 201009119 31972ρίΠ &lt;式3&gt;&lt;Formula 3&gt; &lt;式4&gt;&lt;Formula 4&gt; 其中R!、R2及R3各自獨立為q至C3的烷基,且 R4及R5各自獨立為氫或(^至(:5的烷基。 s 201009119 31^72ρΐί1 三、英文發明摘要:Wherein R!, R2 and R3 are each independently an alkyl group of q to C3, and R4 and R5 are each independently hydrogen or (^ to (: 5 alkyl groups. s 201009119 31^72ρΐί1 III. English Abstract: Provided is a surface-treated copper foil for a printed circuit board (PCB), including an antirust layer formed on a copper foil and a surface treatment film formed on the antirust layer, wherein the surface treatment film includes at least one compound selected from the group consisting of silane-based compounds represented by Formulae 1 through 4, or hydrolysates of the silane-based compounds: 〈Formula 1&gt;Provided is a surface-treated copper foil for a printed circuit board (PCB), including an antirust layer formed on a copper foil and a surface treatment film formed on the antirust layer, the surface treatment film includes at least one compound selected from the Group consisting of silane-based compounds represented by Formulae 1 through 4, or hydrolysates of the silane-based compounds: <Formula 1&gt; 〈Formula 4&gt; 201009119 31972piti<Formula 4> 201009119 31972piti wherein R1? R2, and R3 are each independently a C1-C3 alkyl group and R4 and R5 are each independently hydrogen or a C1-C5 alkyl group. 201009119 七、申請專利範圍: 1.一種印刷電路板用之經表面處理的銅箔,包含形成 在銅箔上的防鏽層及形成在所述防鏽層上的表面處理薄 膜,其中所述表面處理薄膜包含選自由式1至式4表示的 矽烷基化合物所組成之族群的至少一化合物,或所述矽烷 基化合物的水解物: &lt;式1&gt;R1? R2, and R3 are each independently a C1-C3 alkyl group and R4 and R5 are each independently hydrogen or a C1-C5 alkyl group. 201009119 VII. Patent application scope: 1. Surface treatment for printed circuit boards a copper foil comprising a rustproof layer formed on a copper foil and a surface treated film formed on the rustproof layer, wherein the surface treated film comprises a cerium alkyl compound selected from the group consisting of Formulas 1 to 4. At least one compound of the group, or a hydrolyzate of the decyl compound: &lt;Formula 1&gt; &lt;式2&gt; &lt;式3&gt;&lt;Formula 2&gt;&lt;Formula3&gt; &lt;式4&gt; 39 201009119 «&gt;17/ ^.UXl A&lt;Formula 4&gt; 39 201009119 «&gt;17/ ^.UXl A 其中R!、R2及r3各自獨立為Cl至C3的烷基,且 R4及Rs各自獨立為氫或(^至〇5的烷基。 2. 如申請專利範圍第1項所述之印刷電路板用之經表 面處理的鋼箔,其中Ri、R2&amp;R3各自獨立為甲基或乙基, 且R4及R5為氫。 3. 如申請專利範圍第1項所述之印刷電路板用之經表 面處理的銅箔,更包含插入於所述銅箔及所述防鏽層之間 的阻熱層。 4·如申請專利範圍第3項所述之印刷電路板用之經表 面處理的銅箔,更包含插入於所述銅箔及所述阻熱層之間 的小節層。 5. —種印刷電路板用之經表面處理的銅箔的製備方 法,包含: 於銅箔上形成防鏽層;以及 清洗及乾燥所述防鏽層形成於上的所述鋼落,以及 塗覆組成物於所述防鏽層上,且乾燥經塗覆之所述防矯 層,從而製備表面處理薄膜,所述組成物包含選自由式i 至式4表示的矽烷基化合物所組成之族群的至少一化合物 或所述矽烷基化合物的水解物: 201009119 &lt;式ι&gt; &lt;式2&gt;Wherein R!, R2 and r3 are each independently a C to C3 alkyl group, and R4 and Rs are each independently hydrogen or (^ to 〇5 alkyl group. 2. The printed circuit board of claim 1 The surface-treated steel foil, wherein Ri, R2, and R3 are each independently a methyl group or an ethyl group, and R4 and R5 are hydrogen. 3. The surface of the printed circuit board according to claim 1 of the patent application. The treated copper foil further comprises a heat-resistant layer interposed between the copper foil and the rust-proof layer. 4. The surface-treated copper foil for a printed circuit board according to claim 3, Further comprising a small layer layer interposed between the copper foil and the heat resistant layer. 5. A method for preparing a surface treated copper foil for a printed circuit board, comprising: forming a rustproof layer on the copper foil; And cleaning and drying the steel falling layer formed on the rustproof layer, and coating the composition on the rustproof layer, and drying the coated anti-correcting layer to prepare a surface treated film. The composition comprises at least one compound selected from the group consisting of fluorenyl compounds represented by formulas i to 4 Alkyl or a hydrolyzate of the silicon compound: 201009119 &lt; Formula ι &gt; &lt; Formula 2 &gt; &lt;式3&gt; &lt;式4&gt;&lt;Formula 3&gt;&lt;Formula4&gt; 其中R4、R2及R3各自獨立為(^至C3的烷基,且 R4及R5各自獨立為氫或(^至C5的烷基。 6.如申請專利範圍第5項所述之印刷電路板用之經表 面處理的銅箔的製備方法,其中基於所述組成物的總量, 所述矽烷基化合物之數量的範圍為0.001至5重量%。 41 201009119 〇 / ^pui 7.如申請專利範圍第5項戶斤述之印刷電路板用之經表 面處理的銅箔的製備方法,其中所述組成物包含選自由 水、甲醇、乙醇、丙酮、甲基乙基酮、乙酸乙酯及苯所組 成之族群的至少一溶劑。 8·如申請專利範圍第5項所述之印刷電路板用之經表 面處理的銅箔的製備方法,於形成所述防鏽層之前,更包 含於所述銅箱上形成阻熱層。Wherein R 4 , R 2 and R 3 are each independently an alkyl group of (C to C 3 ), and R 4 and R 5 are each independently hydrogen or an alkyl group of (C to C 5 ). 6. For printed circuit boards according to claim 5 of claim 5 The method for producing a surface-treated copper foil, wherein the amount of the oxime alkyl compound ranges from 0.001 to 5% by weight based on the total amount of the composition. 41 201009119 〇 / ^pui 7. The invention relates to a method for preparing a surface-treated copper foil for a printed circuit board, wherein the composition comprises a component selected from the group consisting of water, methanol, ethanol, acetone, methyl ethyl ketone, ethyl acetate and benzene. At least one solvent of the group. The method for preparing a surface-treated copper foil for a printed circuit board according to claim 5, further comprising the copper box before forming the rustproof layer A heat resistant layer is formed on the upper surface. 9.如申請專利範圍第8項所述之印刷電路板用之經表 面處理的銅箔的製備方法,於形成所述阻熱層之前,更包 含於所述銅箔上形成小節。 10· 一種可撓性覆銅層壓板,包含申請專利範圍1至4 之任一項所述之印刷電路板用之經表面處理的銅箔之;以 及形成在所述鋼箔之所述表面處理薄膜上的聚醯亞胺薄 膜。 U·如申請專利範圍第1G項所述之可撓性覆銅層壓 板,其中所述㈣亞胺薄膜包括㈣胺酸之硬化產物,且 所述聚酿賊由至少H單體及至少—個二胺單9. The method of preparing a surface-treated copper foil for a printed circuit board according to the invention of claim 8, further comprising forming a measure on the copper foil before forming the heat-resistant layer. A flexible copper-clad laminate comprising the surface-treated copper foil for a printed circuit board according to any one of claims 1 to 4; and the surface treatment formed on the steel foil Polyimine film on the film. U. The flexible copper clad laminate of claim 1 , wherein the (iv) imine film comprises a hardening product of (iv) an amine acid, and the polystyrene comprises at least H monomer and at least one Diamine 2產ΓΓ,成,其中所述至少—個二酐單艘選自由苯均 :酸二針、3,3,4,4,·二苯獅甲酸二酐、3,3,,4,4,_聯苯四羧 酸一酐及3,3’,4,4,-氧雙鄰苯二甲酸肝所組成之族 述至少-個二胺單體選自由4,4,_二氨基二、斤 :群彻二胺、3,4_二氨基二笨越及間笨二胺所 42 201009119 四、 指定代表圖: (一) 本案之指定代表圖:無。 (二) 本代表圖之元件符號簡單說明: 無。 五、 本案若有化學式時,請揭示最能顯示發明特徵 的化學式:2 calving, forming, wherein the at least one dianhydride is selected from the group consisting of benzene: acid two needles, 3,3,4,4, dibenzoic acid dianhydride, 3,3,,4,4, _ biphenyltetracarboxylic acid monoanhydride and 3,3',4,4,-oxydiphthalic acid liver composition of the family of at least one diamine monomer selected from 4,4,-diamino 2, jin : group of diamine, 3,4-diamino di-bung and stupid diamine 42 201009119 Fourth, the designated representative map: (a) the designated representative of the case: no. (2) A brief description of the component symbols of this representative figure: None. 5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: 55
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