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TW200801851A - Apparatus and method for photoresist removal processing - Google Patents

Apparatus and method for photoresist removal processing

Info

Publication number
TW200801851A
TW200801851A TW096102245A TW96102245A TW200801851A TW 200801851 A TW200801851 A TW 200801851A TW 096102245 A TW096102245 A TW 096102245A TW 96102245 A TW96102245 A TW 96102245A TW 200801851 A TW200801851 A TW 200801851A
Authority
TW
Taiwan
Prior art keywords
vapor
unit
waste liquid
residues
filtering
Prior art date
Application number
TW096102245A
Other languages
English (en)
Other versions
TWI356444B (en
Inventor
Takahiko Wakatsuki
Naoya Hayamizu
Hiroshi Fujita
Akiko Saito
Toshihide Hayashi
Yukinobu Nishibe
Tsutomu Makino
Original Assignee
Toshiba Kk
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kk, Shibaura Mechatronics Corp filed Critical Toshiba Kk
Publication of TW200801851A publication Critical patent/TW200801851A/zh
Application granted granted Critical
Publication of TWI356444B publication Critical patent/TWI356444B/zh

Links

Classifications

    • A—HUMAN NECESSITIES
    • A42—HEADWEAR
    • A42B—HATS; HEAD COVERINGS
    • A42B1/00—Hats; Caps; Hoods
    • A42B1/24—Hats; Caps; Hoods with means for attaching articles thereto, e.g. memorandum tablets or mirrors
    • A42B1/241—Pockets therefor; Head coverings with pockets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • A—HUMAN NECESSITIES
    • A41—WEARING APPAREL
    • A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
    • A41D13/00—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
    • A41D13/05—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
    • A41D13/11—Protective face masks, e.g. for surgical use, or for use in foul atmospheres
    • A—HUMAN NECESSITIES
    • A42—HEADWEAR
    • A42B—HATS; HEAD COVERINGS
    • A42B1/00—Hats; Caps; Hoods
    • A42B1/018—Hats; Caps; Hoods with means for protecting the eyes, ears or nape, e.g. sun or rain shields; with air-inflated pads or removable linings
    • A42B1/0181—Hats; Caps; Hoods with means for protecting the eyes, ears or nape, e.g. sun or rain shields; with air-inflated pads or removable linings with means for protecting the eyes
    • A42B1/0182—Peaks or visors
    • A—HUMAN NECESSITIES
    • A42—HEADWEAR
    • A42B—HATS; HEAD COVERINGS
    • A42B1/00—Hats; Caps; Hoods
    • A42B1/018—Hats; Caps; Hoods with means for protecting the eyes, ears or nape, e.g. sun or rain shields; with air-inflated pads or removable linings
    • A42B1/0186—Hats; Caps; Hoods with means for protecting the eyes, ears or nape, e.g. sun or rain shields; with air-inflated pads or removable linings with means for protecting the ears or nape
    • A42B1/0188—Protection for the ears, e.g. removable ear muffs
    • A—HUMAN NECESSITIES
    • A42—HEADWEAR
    • A42B—HATS; HEAD COVERINGS
    • A42B1/00—Hats; Caps; Hoods
    • A42B1/206—Transformable, convertible or reversible hats
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/427—Stripping or agents therefor using plasma means only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2230/00—Other cleaning aspects applicable to all B08B range
    • B08B2230/01—Cleaning with steam

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Physical Education & Sports Medicine (AREA)
  • Textile Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW096102245A 2006-01-20 2007-01-19 Apparatus and method for photoresist removal proce TWI356444B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006012758A JP4786351B2 (ja) 2006-01-20 2006-01-20 処理装置及び処理方法

Publications (2)

Publication Number Publication Date
TW200801851A true TW200801851A (en) 2008-01-01
TWI356444B TWI356444B (en) 2012-01-11

Family

ID=38449926

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096102245A TWI356444B (en) 2006-01-20 2007-01-19 Apparatus and method for photoresist removal proce

Country Status (4)

Country Link
US (1) US8141567B2 (zh)
JP (1) JP4786351B2 (zh)
KR (1) KR100891631B1 (zh)
TW (1) TWI356444B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI584085B (zh) * 2014-11-18 2017-05-21 Lg 化學股份有限公司 光阻移除裝置及使用其的光阻移除方法

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KR101398980B1 (ko) * 2014-01-10 2014-05-27 정서화 스팀을 이용한 포토레지스트 제거 시스템
CN104391433A (zh) * 2014-12-05 2015-03-04 合肥鑫晟光电科技有限公司 一种喷淋系统及其使用方法
KR102203160B1 (ko) 2016-06-14 2021-01-13 어플라이드 머티어리얼스, 인코포레이티드 웨이퍼로부터 포토레지스트를 제거할 때의 액체 필터링
CN112892041A (zh) * 2021-01-25 2021-06-04 绵阳艾萨斯电子材料有限公司 光刻用稀释剂废液的纯化再生方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI584085B (zh) * 2014-11-18 2017-05-21 Lg 化學股份有限公司 光阻移除裝置及使用其的光阻移除方法

Also Published As

Publication number Publication date
JP2007194489A (ja) 2007-08-02
KR20070077121A (ko) 2007-07-25
US8141567B2 (en) 2012-03-27
JP4786351B2 (ja) 2011-10-05
US20070277853A1 (en) 2007-12-06
KR100891631B1 (ko) 2009-04-03
TWI356444B (en) 2012-01-11

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees