200806119 九、發明說明： 【發明所屬之技術領域】 本發明，係有關軟性基板材的表面處理裝置。例如， 被使用於可撓性基板的製造過程，而關於對此基板材進行 表面處理的表面處理裝置。 【先前技術】 被用於電子機器之電路基板，輕量化、極薄化、高密、 度電路化之進展非常驚人，關於其軟硬，也與習知之剛性 基板等硬性基板相比，可撓性基板等之軟性基板的進展， 增加非常顯著。 可是，表面處理裝置則被使用於像這種電路基板的製 造過程，在其各處理室，以輸送器水平搬運基板材，用被 噴射之處理液來進行表面處理。例如，噴射顯像液、蝕刻 液、剝離液、水洗液等的處理液，以進行顯像、蝕刻、剝 離、洗淨等的表面處理。 像在這種表面處理裝置的處理室內，關於被搬運之基 板材，防止附著處理液的混合，成爲重要的課題。特別是， 在上游側之處理室所噴射而附著於基板材的處理液被帶 出，但不會被帶進下游側之處理室，成爲重要的課題。 因此，像這種往例’則在像這種處理室間的輸送器介 設有除液滾子，藉由上下1對除液滾子挾著基板材輸送， 而除掉附著於基板材的處理液，以圖謀防止處理液的混 合。 像這種作爲除液滾子，例如，可列舉有如下之專利文 200806119 獻1所揭示。 專利文獻1 :日本專利特公平7-4742 1號公報 【發明內容】 可是’關於像這種往例，被指摘有如下的問題。 1 · 將軟性基板，被上下的除液滾子挾著輸送時，經 常發生被除液滾子吸著、掛住、捲住、捲入等意外。因此， 使用除液滾子作爲除掉附著處理液之用，是有問題。 總之’在該種往例被使用之除液滾子，對於剛性基板 材等硬性基板，適合作爲除掉附著處理液之用，而被採用 作爲在處理室內防止處理液的混合。然而，對於極薄且柔 軟之膠帶狀軟性基板材，使用上就有問題。 2. 可是，若發生像這種處理液的混合，各處理室之 處理液的性能就會降低。 例如，無論在同一藥液（例如蝕刻液）之處理室相互 之間，異種藥液（蝕刻液與剝離液）之處理室間，藥液與 水洗液之處理室間，或水洗液之處理室相互之間，若一旦 發生像這種處理液的混合，其處理液的性能就會降低，使 壽命變短 ° 又，例如水洗液中混合多量藥液時，事後當排放水洗 液之際，淨化裝置的負擔將變大。 3 · 因此，在該種往例有邊使用除液滾子，同時採用 先行板，而作爲防止軟性基板材被捲住等方法。 即，在軟性基板材的前端，作爲先行板、拋棄板，以 手工先將剛性板用膠帶等黏貼，然後以輸送器搬運通過除 200806119 液滾子，之後，再用手工將該膠帶等揭下。 然而，這被指摘花費人力而且麻煩，降低作業性，生 產效率差，成爲量產的障礙等問題。 4 · 將軟性基板’被上下的除液滾子挟著輸送時，被 指摘其微細之高密度電路易損傷的問題。即，被製造之軟 性基板的電路易留有.傷痕，而缺乏信賴性。 本發明有鑑於這種實情，爲了解決上述課題而提供一 種軟性基板材的表面處理裝置。 所以本發明之目的：係可實現第1、防止在處理室間 處理液的混合；第2、可因此而維持處理液的性能；第3、 可不靠人工作業而達成，並實現優良效率；第 4、亦可不 損傷電路而達成目的。 爲了解決該種課題，本發明之技術手段如下。 關於申請專利範圍第1項之軟性基板材的表面處理裝 置，係被使用於軟性基板的製造過程，軟性基板材以輸送 器水平搬運，同時在處理室內以處理液作表面處理，其特 徵在於：該輸送器於.該處理室間，令搬運之該軟性基板材 前後傾斜，因此使附著於該軟性基板材的該處理液可返回 到該處理室。 關於申請專利範圍第2項之表面處理裝置，係如申請 專利範圍第1項之軟性基板材的表面處理裝置，其中在該 表面處理裝置之該輸送器於處理室間的間隔具有凸狀滾 子。該凸狀滾子之軸的高度水平，係設定較其他搬運滾子 高或其直徑尺寸設定較其他搬運滾子大。 200806119 關於申請專利範圍第3項之表面處理裝置，係如申請 專利範圍第2項之軟性基板材的表面處理裝置，其中在處 理室間搬運於該輸送器上之軟性基板材，係在該凸狀滾子 的位置被舉起而變高，而在其他該搬運滾子的位置則變 低、形成前後傾斜， 根據此前後傾斜之向下傾斜，附著於該軟性基板材表 面之該處理液，在上游側之該處理室所噴射者，向上游側 之該處理室的出口流下，同時在下游側之該處理室所噴射 # 者，向下游側之該處理室的入口流下， 因此，藉由在上游側與在下游側之該處理室間該處理 液的帶進帶出，可防止該處理液的混合。 關於申請專利範圍第4項之表面處理裝置，係如申請 專利範圍第3項之表面處理裝置，其中該凸狀滾子，係對 應地配設於上游側之該處理室的出口附近，同時對應地配 設於下游側之該處理室的入口附近。 關於申請專利範圍第5項之表面處理裝置，係如申請 專利範圍第1，2，3或4項之表面處理裝置，其中該凸狀 滾子，其高度水平係可改變，同時該高度水平能比例於該 輸送器的搬運速度而調節，搬運速度越快，則該高度水平 設疋越局。 本發明，係由該種手段達成如下作用： (1) 軟性基板材以輸送器邊水平搬運，同時在表面處 理裝置之處理室噴射處理液進行表面處理。 (2) 軟性基板材，係以輸送器從上游側之處理室搬運 200806119 到下游側之處理室。 (3) 如此在處理室間所搬運之軟性基板材的表面，附 著有處理液。 (4) 處理室間的輸送器配設有凸狀滾子，以使軟性基 板材前後傾斜。 (5) 從而第1，使附著於軟性基板材的處理液，基於軟 性基板材之前後傾斜，可流回到原處理室。因此，可防止 由於在上游側與在下游側之處理室間處理液的帶進帶出， ®而使處理液混合。 第2，因可防止該等處理液的混合，故可維持處理液 的性能。 第3,而且，藉由處理室內的輸送器配設有凸狀滾子， 不需要任何簡單容易的手操作即可實現。 第4，因爲藉由使軟性基板材前後傾斜即可實現，故 不會損傷高密度電路。 (6) 本發明之軟性基板材的表面處理裝置，可發揮如 _下效果。 第1，可防止在處理室間處理液的混合。即，在本發 明之軟性基板材的表面處理裝置，軟性基板材，係在處理 室間可藉由凸狀滾子令其前後傾斜。 因此，附著於軟性基板材的處理液將可流回到原處理 室。所以，可確實防止處理室間處理液的帶進帶出之處理 液混合。 而且，此可藉由傾斜方式實現，故不像上述往例用除 200806119 液滾子除液的方式，會發生軟性基板材被捲住等的意外， 而可穩定的實現。 第2，因此，可維持處理液的持性。即，本發明之軟 性基板材的表面處理裝置，像這樣可防止處理室間處理液 的混合。 因此，在各處理室可避免處理液性能的降...低，而可使 藥液的壽命持續爲該種往例的3倍以上。關於水洗液，因 可防止與藥液的混合，故事後當排放水洗液之際，淨化裝 置的負擔將可降低。 第3，而且，這在效率方面也表現優異。即，本發明 之軟性基板材的表面處理裝置，藉由傾斜方式，可簡單容 易地防止處理液的混合。 而且，因爲不必要如該種往例那樣，爲了防止除液方 式造成的捲住意外而使用先行板，所以可省掉這部分的工 夫，提高作業性，亦可量產化等，生產效率方面優良。 第4，此不致損傷電路即可被實現，即，本發明之軟 性基板材的表面處理裝置，係藉由傾斜方式，,,不像該種往 例，用除液滾子除液的方式容易損傷電路，而被製造之軟 性基板材的電路亦不致遺留傷痕，可提高可靠度，生產良 率可大幅改善。 如此，該種往例所存在的課題均可被解決等，本發明 所發揮之效果大而且顯著。 【實施方式】 以下，根據圖式詳細說明本發明的最佳實施形態。 -10- 200806119 第1圖及第2圖，係提供本發明最佳實施形態的說明。 而第1圖，係全體的側面說明圖。第2圖係主要部分的側 面說明圖，第2圖之（1)圖係第1例，第2圖之（2)圖係第2 例，第2圖之（3)圖係第3例，第2圖之（4)圖係第4例，第 2圖之（5)圖係表示第5例。 本發明之軟性基板材A的表面處理裝置1，係被使用 於軟性基板的製造過程。因此，首先就電路基板加以說明。 被使用於電子機器之印刷電路板等的電路基板，近 ® 來，輕量化，極薄化，高密度電路化，多層化等的進展非 常驚人。因此，關於電路基板之軟硬，與習知之硬性基板 相比，最近軟性基板的進展，增加狀況顯著。 例如對於硬性基板的代表例，厚度約爲1 0 0 μπι之玻璃 補強剛性基板，而軟性基板的代表例之聚亞醯胺樹脂製的 可撓性基板，其厚度僅爲60 μιη左右，成爲極薄柔軟的膠 片狀。 然而’該種電路基板，例如係循下列過程製造。即， ® 在由貼銅之積層板而成之基板材的外表面，—將感光性光 阻塗佈成膜狀或張貼感光性光阻，然後—放置電路的底片 曝光後，—藉由顯像溶解除去形成電路部分以外的光阻，— 藉由蝕刻溶解除去形成電路部分以外的銅箔，—藉由剝膜 除去形成電路部分的光阻’—而在基板材的外表面以銅箔 形成電路，—因而製造電路基板。 電路基板等，係如此形成。 《關於表面處理裝置1》 -11- 200806119 而表面處理裝置1，係被使用於上述製造過程，將基 板材之軟性基板材A用輸送器2連續的水平搬運，同時在 處理室3，3 ’內以處理液B作表面處理。 關於像這樣的表面處理裝置1，更詳述如下。表面處 理裝置1，係在電路基板軟性基板的製造過程中，例如在 顯像過程、蝕刻過程、剝離過程、洗淨過程，乾燥過程等， 被使用作爲顯像裝置、蝕刻裝置、剝離裝置、水洗裝置， 或去水乾燥裝置等。 而且，像該種各表面處理裝置1，係分別在處理室3， 3 ’（雖然也有一個室的情形，但複數個室的情形爲多）內， 對用輸送器2水平搬運之軟性基板材A，從噴嘴4噴射例 如顯像液、蝕刻液、剝離液或水洗液等處理液B，因而使 軟性基板材A進行藥液處理、洗淨處理等表面處理。此外， 在去水乾燥裝置的處理室3，3 ’，從空氣噴嘴吹出乾燥後之 暖風空氣。 處理液B，從液槽5透過泵6或配管7，壓送到各噴嘴 4，因而噴谢在軟性基板材A。而且，將軟性基板材·· A表面 處理後，流入液槽5回收，事後也可循環使用。此外，在 圖所示之例，各噴嘴4雖被配設於軟性基板材A的正上方， 但有時亦可配設於正下方。 表面處理裝置1，係如此形成。 《關於本發明》 以下，再針對本發明加以說明◊軟性基板材A在各表 面處理裝置1的處理室3，3 ’間以輸送器2連續搬運。而其 -12- 200806119 時，連接處理室3，3 5間的輸送器2，在處理室3，3 ’間的 間隔空間C具有凸狀滾子8，用以將搬運之軟性基板材A， 沿著搬運方回前後傾斜D，使附著於軟性基板材A的處理 液B，可返回到其處理室3，3，。 此外，作爲輸送器2的搬運滾子9或凸狀滾子8，橫 向寬度薄的輪子爲代表使用，但亦有可能使用橫向寬度廣 的直滾子。使用輪子時，在左右寬度方向相互隔有間隔， 多數個被配設成1套，同時輪子的搬運滾子9，在前後的 ® 搬運方向被配設有多套。 關於該種處理室3，3 ’間之輸送器2，更詳述如下。首 先，在處理室3，3 ’間的間隔空間C，在輸送器2上被搬運 之軟性基板材A，在凸狀滾子的位置被舉起而變高，其他 水平運送用的搬運滾子9的位置則變低而前後傾斜D。 因此，在上游側之處理室3 (在圖面上係左側）所噴 射而附著於軟性基板材A表面的處理液B，在附著的狀態 下從處理室3的出口 1 0被搬出來到間隔空間C的處理液 B ’係基於向該軟性基板材a的前後傾斜D的上游側朝下 傾斜’沿著軟性基板材A向處理室3的出口 1 〇流下。而被 其處理室3的液槽5回收。 更且，在下游側的處理室3，（在圖面上係右側）所噴 射而附著於軟性基板材A表面的處理液B，亦即，從處理 室3 ’的入口〗〗溢出至上游的處理液B，係基於向軟性基板 材A前後傾斜〇的下游側朝下傾斜，而沿著軟性基板材a 向處理室3 ’的入口 1 1流下。而被其處理室3，的液槽5回 200806119 本發明係槪略如此形成。 《關於各種態樣》 其次’關於本發明之凸狀滾子8的各種態樣加以說 明。首先，第1圖中所顯示凸狀滾子8，係由輪子形成（以 下關於其他的例也相同），在間隔空間C的中央配設丨.套 (左右之寬度方向設有多個）。 而，該凸狀滾子8，其直徑尺寸，係設定與其他輪製 (以下關於其他的例也相同）的搬運滾子9同一直徑，同 時其軸的高度水平，係被設定較其他搬運滾子9高。 第2圖之（1 )圖中所顯示凸狀滾子8，係在間隔空間c 的中央被配設1套，其直徑尺寸，係設定較其他搬運滾子 9大，同時其軸的高度水平，係設定與其他搬運滾子9同 樣整齊。 第2圖之（2)圖中所顯示凸狀滾子8，係在間隔空間c 的中央被配設1套，其直徑尺寸，係設定較其他搬運滾子 9大，同時其軸的高度水平，係被設定較其他搬運滾子9 高。 第2圖之（3)圖中所顯示凸狀滾子8，係被配設3套1 組於間隔空間C的中央部。而中央的1套係設定與第2圖 之（2)圖同樣，同時前後2套，係設定與第1圖的同樣，中 央的1套，其滾子的頂面設定高於前後2套。 第2圖之（4)圖中所顯示凸狀滾子8，係多數被配設於 全體間隔空間C，其直徑尺寸，係設定與其他搬運滾子9 -14- 200806119 同一直徑，同時軸的高度水平，係在間隔空間C的中央最 高，前後者則被設定逐漸變低。 第2圖之（5)圖中所顯示凸狀滾子8，係被配設於間隔 空間C內的上游部與下游部，分別設定與第1圖者相同。 而上游部者，係對應地被配設於上游側之處理室3的出.口 1 〇附近，下游部者，係對應地被配設於下游側之處理室3 ’ 的入口 1 1附近。 如各該圖所顯示之例，凸狀滾子8，其軸的高度水平 • 係設定較其他搬運滾子9高，或其直徑尺寸較大。因此雖 可使搬運之軟性基板材A前後傾斜D，但亦有可能如圖所 顯示之例以外的各種狀態。當然，關於前後傾斜D的傾斜 斜度，其斜度更急劇者或緩和者，對應於軟性基板材A之 搬運速度，將自如地被設定。 關於凸狀滾子8，亦可考慮如下之構成。即，其高度 水平係可改變，同時該高度水平能比例於該輸送器2的搬 運速度而調節，因此，搬運速度越快，則該高度水平可考 _ - 慮設定越局。 ！ 即’在凸狀滾子8附設上下動機構（圖未顯示），因 此’對應於藉由輸送器2的搬運滾子9之軟性基板材A的 搬運速度，可令凸狀滾子8上下動作。而搬運速度越快， 由於凸狀滾子8的高度水平’亦設定越高，使軟性基板材 A的則後傾斜D更爲急劇。所以，附著之處理液B的流下 速度更快，而有處理液B返回到處理室3，3，及回收更順 利的優點。 200806119 此外，第1圖中’ 12係返回板。該返回板 設於間隔空間C之輸送器2的下方，中央高前: 附著於以輸送器2搬運之軟性基板材a之處理 到下面時，有將該處理液B流向處理室3，3 能。 凸狀滾子8，可考慮有如此各種狀態。 《作用等》 本發明之軟性基板材A的表面處理裝置 明所構成。於是，形成如下： (1 )軟性基板材A以輸送器2水平搬運， 面處理裝置1各自的處理室3，3，，依序噴射 表面處理。 (2) 而軟性基板材A，係從上游側之處理 側之處理室3 ’以輸送器2搬運，同時通過處Ϊ 的間隔空間C而交接。 (3) 如此，在處理室3，3 ’間所搬運的軟' 附著有處理液B。 即，從上游側之處理室3的出口 1 0向間1¾ 出之軟性基板材A的表面，附著有在處理室： 理液B(參考第1圖、第2圖的（1)圖、（2)圖’ 同時向下游側之處理室3 ’搬入之軟性基板材 室3 ’內所噴射之處理液B，亦有可能從入口 1 (參考第2圖的（3)圖、（4)圖）。 (4) 因此，在該表面處理裝置1，於處理 1 2，係被配 t低而傾斜， 液B，當落 而返回的功 1，如以上說 同時在各表 處理液B作 室3向下游 里室3 ， 3’間 I4生基板材A， i空間C所搬 3所噴射之處 ‘（5 )圖等）。 A，在其處理 1溢出而附著 室3，3 ’間之 -16- 200806119 .間隔空間c的輸送器2，配設有凸狀滾子8。所以利用該凸 狀滾子8使通過間隔空間C的軟性基板材A前後傾斜D ° (5)從而，根據該表面處理裝置1，將成爲如下列第1 至第4。 第1，附著於軟性基板材A表面的處理液B，係基於 凸狀滾子8造成的軟性基板材A之前後,._傾斜D的向下傾 斜，而返回到原處理室3，3 5。 即，在上游側之處理室3附著的處理液B，係從間隔 ^ 空間C側向其處理室3側，沿軟性基板材A的表面流下， 而被回收。而且，從下游側之處理室3，附著的處理液B， 亦朝向其處理室3 ’側，沿軟性基板材A的表面流下，而被 回收。 因此’可防止在上游側與在下游側之處理室3，3 ’間由 於該處理液B的帶進帶出而混合。 第2，因可防止在處理室3，3 ’間處理液B的混合，故 0 可維持各處理室3，3 ’之處理液的性能。 例如，兩處理室3，3 ’的處理液B係異種時（例如， 蝕刻液與剝離液時，或蝕刻液與水洗液的情況），當然是， 即使兩處理室3，3 ’的處理液B相同時（例如，均爲飽刻 液時’或均爲水洗液時），處理液B間的混合，將成爲其 性能降低的主因，故可防止該種混合或性能降低。 此外’在上游側之處理室3爲洗淨用，而下游側之處 理室3 ’爲去水乾燥用時，處理液b之洗淨液，不會附著而 被帶進去水乾燥用的處理室3，，可促進去水乾燥的優點。 -17- 200806119 第3，而且這些由於在處理室3 ’ 3 ’間之間隔空間c的 輸送器2配設凸狀滾子8 ’藉由簡單的構成而容易實現。 又可不靠人工作業自動的實現。 第4，而且這些實現不會損傷軟性基板材A表面的微 細高密度電路。即，在凸狀滾子8令軟性基板材A前後傾 斜D之方式，故不會夾進軟性基板材A ’而造成損傷電路 之虞。 【圖式簡單說明】 第1圖係有關本發明之軟性基板材的表面處理裝置’ 提供發明之最佳實施形態的全體側面說明圖。 第2圖係提供同發明之最佳實施形態的說明之主要部 分的側面說明圖，其中（1)圖顯示第1例，（2)圖顯示第2例， (3)圖顯示第3例，（4)圖顯示第4例，（5)圖顯示第5例。· 【主要元件符號說明】 1 表面處理裝置 2 輸送器 3 處理室 · 3， 處理室 4 噴嘴 5 液槽 6 泵 7 配管 8 凸狀滾子 9 搬運滾子 -18- 200806119 10 出口 11 入口 12 返回板 A 軟性基板材 B 處理液 C 間隔空間C D 前後傾斜200806119 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a surface treatment apparatus for a soft substrate. For example, it is used in the manufacturing process of a flexible substrate, and a surface treatment apparatus for surface-treating the substrate. [Prior Art] The circuit board used in electronic equipment is extremely lightweight, extremely thin, and high-density, and the degree of circuitization is very impressive. It is also soft and hard, and is flexible compared with a rigid substrate such as a rigid substrate. The progress of soft substrates such as substrates has increased significantly. However, the surface treatment apparatus is used in a manufacturing process of such a circuit board, and in each of the processing chambers, the base material is conveyed horizontally by the conveyor, and the surface treatment is performed by the sprayed treatment liquid. For example, a treatment liquid such as a developing solution, an etching solution, a peeling liquid, or a water washing liquid is sprayed to perform surface treatment such as development, etching, peeling, and washing. In the processing chamber of such a surface treatment apparatus, it is an important subject to prevent the mixing of the adhesion treatment liquid with respect to the substrate to be conveyed. In particular, the processing liquid sprayed on the upstream processing chamber and adhered to the substrate is taken out, but it is not brought into the processing chamber on the downstream side, which is an important issue. Therefore, in this case, a liquid removal roller is interposed between the conveyors such as the processing chamber, and the liquid-repellent roller is conveyed by the upper and lower pairs of the liquid-repellent roller, and the substrate is removed. The treatment liquid is designed to prevent mixing of the treatment liquid. As such a liquid-removing roller, for example, the following patent document 200806119 is disclosed. [Patent Document 1] Japanese Patent Publication No. Hei 7-4742 No. 1 SUMMARY OF THE INVENTION [Review] However, the following problems have been pointed out. 1 • When the flexible substrate is transported by the upper and lower liquid removal rollers, accidents such as suction, catching, winding, and getting caught by the liquid removal roller often occur. Therefore, the use of the liquid removal roller as a means for removing the adhesion treatment liquid is problematic. In other words, the liquid-repellent roller used in such a conventional example is suitable for use as a hard substrate such as a rigid substrate material to remove the adhesion treatment liquid, and is used as a mixture for preventing the treatment liquid in the treatment chamber. However, there is a problem in use for a very thin and soft tape-like soft base material. 2. However, if mixing of such a treatment liquid occurs, the performance of the treatment liquid in each treatment chamber is lowered. For example, between the processing chambers of the same chemical solution (for example, etching solution), between the processing chambers of the different kinds of chemical liquids (etching liquid and stripping liquid), between the processing chambers of the chemical liquid and the washing liquid, or the processing chamber of the washing liquid. When mixing with such a treatment liquid occurs, the performance of the treatment liquid is lowered, and the life is shortened. Further, for example, when a large amount of the chemical liquid is mixed in the washing liquid, the water washing liquid is discharged afterwards. The burden on the device will increase. 3 · Therefore, in this case, the liquid removal roller is used side by side, and the advance plate is used as a method to prevent the soft base material from being caught. That is, at the front end of the flexible substrate, as the leading plate or the disposable plate, the rigid plate is first adhered by tape or the like, and then conveyed by the conveyor through the liquid roller except the 200806119, and then the tape is removed by hand. . However, this has been accused of labor and trouble, reduced workability, poor production efficiency, and problems such as mass production obstacles. 4 • When the flexible substrate is transported by the upper and lower liquid removal rollers, the problem that the fine high-density circuit is easily damaged is pointed out. That is, the circuit of the manufactured flexible substrate is liable to have scratches and lacks reliability. In view of the above circumstances, the present invention provides a surface treatment apparatus for a soft base material in order to solve the above problems. Therefore, the object of the present invention is to achieve the first, to prevent the mixing of the treatment liquid between the treatment chambers, the second, to maintain the performance of the treatment liquid, and the third, which can be achieved without manual work, and achieve excellent efficiency; 4, can also achieve the purpose without damaging the circuit. In order to solve such problems, the technical means of the present invention are as follows. The surface treatment apparatus for the soft base material of the first application of the patent scope is used in the manufacturing process of the flexible substrate, the flexible substrate is conveyed horizontally by the conveyor, and the treatment liquid is surface-treated in the treatment chamber, and is characterized in that: The conveyor moves the flexible substrate between the processing chambers back and forth, so that the processing liquid adhering to the flexible substrate can be returned to the processing chamber. The surface treatment apparatus of claim 2, wherein the surface treatment apparatus of the surface treatment apparatus has a convex roller at intervals between the processing chambers. . The height level of the shaft of the convex roller is set higher than that of the other conveying rollers or the diameter thereof is set larger than other conveying rollers. The surface treatment apparatus of the third aspect of the invention is the surface treatment apparatus of the soft base material of claim 2, wherein the soft base material conveyed on the conveyor between the processing chambers is in the convex The position of the roller is raised and raised, and the position of the other roller is lowered, and the front and rear are inclined. According to the downward inclination of the front and rear, the treatment liquid adhered to the surface of the flexible substrate is The injector in the processing chamber on the upstream side flows down to the outlet of the processing chamber on the upstream side, while the injector in the processing chamber on the downstream side flows down to the inlet of the processing chamber on the downstream side, thereby The treatment liquid is carried in and out between the upstream side and the processing chamber on the downstream side to prevent mixing of the treatment liquid. The surface treatment apparatus of the fourth aspect of the invention is the surface treatment apparatus of claim 3, wherein the convex roller is correspondingly disposed near the outlet of the processing chamber on the upstream side, and corresponds to The ground is disposed near the inlet of the processing chamber on the downstream side. The surface treatment apparatus of claim 5, which is the surface treatment apparatus of claim 1, wherein the height of the convex roller is changeable, and the height level can be changed. The ratio is adjusted by the conveying speed of the conveyor, and the faster the conveying speed, the higher the level is set. The present invention achieves the following effects by the means: (1) The flexible substrate is horizontally conveyed by the conveyor side while the treatment liquid is sprayed in the treatment chamber of the surface treatment apparatus for surface treatment. (2) The flexible base material is transported from the processing chamber on the upstream side by the conveyor to the processing chamber on the downstream side from 200806119. (3) The surface of the flexible substrate to be transported between the processing chambers is attached with a treatment liquid. (4) The conveyor between the processing chambers is equipped with convex rollers to tilt the flexible substrate back and forth. (5) Therefore, the treatment liquid adhered to the flexible base material can be returned to the original treatment chamber based on the soft base material before and after tilting. Therefore, it is possible to prevent the treatment liquid from being mixed due to the carry-in and take-out of the treatment liquid between the upstream side and the processing chamber on the downstream side. Second, since the mixing of the treatment liquids can be prevented, the performance of the treatment liquid can be maintained. Thirdly, the conveyor in the processing chamber is provided with a convex roller, which can be realized without any simple and easy hand operation. Fourth, since the flexible substrate is tilted back and forth, the high-density circuit is not damaged. (6) The surface treatment apparatus for a soft base material of the present invention can exert the following effects. First, mixing of the treatment liquid between the treatment chambers can be prevented. That is, in the surface treatment apparatus for a flexible base material of the present invention, the flexible base material can be tilted forward and backward by a convex roller between the processing chambers. Therefore, the treatment liquid attached to the soft substrate can flow back to the original processing chamber. Therefore, it is possible to surely prevent the mixing of the treatment liquid brought in and out of the treatment liquid between the treatment chambers. Further, this can be realized by the tilting method. Therefore, unlike the above-described conventional example, the liquid substrate is removed by the liquid removal method of the 200806119 liquid, and the accident that the soft base material is wound up may occur, and it can be stably realized. Second, therefore, the holding property of the treatment liquid can be maintained. That is, the surface treatment apparatus for a flexible base material of the present invention can prevent mixing of the treatment liquid between the treatment chambers. Therefore, it is possible to avoid a decrease in the performance of the treatment liquid in each treatment chamber, and the life of the chemical solution can be maintained more than three times that of the conventional example. Regarding the washing liquid, since the mixing with the chemical liquid can be prevented, the burden of the purifying device can be reduced when the washing liquid is discharged after the story. Third, and this is also excellent in terms of efficiency. That is, in the surface treatment apparatus for a flexible base material of the present invention, the mixing of the treatment liquid can be easily and easily prevented by the inclined method. Moreover, since it is not necessary to use the leading plate in order to prevent the winding accident caused by the liquid removal method as in the case of the conventional example, the work of this part can be omitted, the workability can be improved, and the mass production can be performed. excellent. Fourthly, the damage circuit can be realized, that is, the surface treatment device of the flexible substrate of the present invention is inclined, and unlike the conventional example, the liquid removal by the liquid removal roller is easy. Damage to the circuit, and the circuit of the soft base material to be manufactured does not leave any scars, which can improve reliability and greatly improve the production yield. As described above, the problems existing in the conventional examples can be solved, and the effects exerted by the present invention are large and remarkable. [Embodiment] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the drawings. -10- 200806119 1 and 2 are views for providing a preferred embodiment of the present invention. The first drawing is a side view of the whole. Fig. 2 is a side view of the main part, Fig. 2 (1) is the first example, Fig. 2 (2) is the second example, and Fig. 2 (3) is the third example. Fig. 2(4) shows the fourth example, and Fig. 2(5) shows the fifth example. The surface treating apparatus 1 of the flexible substrate A of the present invention is used in the manufacturing process of a flexible substrate. Therefore, the circuit board will first be described. The use of circuit boards such as printed circuit boards for electronic equipment, such as lightweight, extremely thin, high-density circuit, and multilayering, is remarkable. Therefore, regarding the softness and hardness of the circuit board, the progress of the soft substrate has recently increased significantly compared with the conventional hard substrate. For example, in the case of a representative example of a rigid substrate, a glass-reinforced rigid substrate having a thickness of about 100 μm, and a flexible substrate made of a polyimide substrate, which is a typical example of a flexible substrate, has a thickness of only about 60 μm. Thin and soft film. However, such a circuit substrate is manufactured, for example, by the following process. That is, ® is applied to the outer surface of the base material formed by the laminated board of copper, the photosensitive photoresist is coated into a film shape or the photosensitive photoresist is applied, and then the film placed on the circuit is exposed, by The photoresist is formed by dissolving and removing the portion other than the portion where the circuit is formed, by etching to remove the copper foil other than the portion forming the circuit, by removing the photoresist forming the circuit portion by stripping, and forming the copper foil on the outer surface of the substrate. Circuit, thus manufacturing a circuit substrate. A circuit board or the like is formed in this manner. <<About Surface Treatment Apparatus 1>> -11- 200806119 The surface treatment apparatus 1 is used in the above-described manufacturing process, and the flexible base material A of the base material is continuously conveyed horizontally by the conveyor 2 while being in the processing chamber 3, 3' The treatment liquid B is used as a surface treatment. The surface treatment apparatus 1 like this is described in more detail below. The surface treatment apparatus 1 is used as a developing device, an etching device, a peeling device, and a water washing process in a manufacturing process of a circuit substrate flexible substrate, for example, in a developing process, an etching process, a peeling process, a washing process, a drying process, and the like. Device, or dewatering device, etc. Further, in each of the surface treatment apparatuses 1 described above, the flexible substrate A is horizontally conveyed by the conveyor 2 in the processing chambers 3, 3' (although there are also one chamber, but a plurality of cases are plural). The processing liquid B such as a developing liquid, an etching liquid, a peeling liquid, or a water washing liquid is ejected from the nozzle 4, and the soft base material A is subjected to surface treatment such as a chemical liquid treatment or a washing treatment. Further, in the processing chambers 3, 3' of the dewatering device, the dried warm air is blown from the air nozzle. The treatment liquid B is sent from the liquid tank 5 through the pump 6 or the pipe 7 to the respective nozzles 4, and is thus sprayed on the soft base material A. Further, after the surface of the soft base material·· A is treated, it is collected into the liquid tank 5 and can be recycled afterwards. Further, in the example shown in the figure, each of the nozzles 4 is disposed directly above the flexible substrate A, but may be disposed directly below. The surface treatment apparatus 1 is formed as such. <<Regarding the Invention>> Hereinafter, the present invention will be described. The soft base sheet A is continuously conveyed by the conveyor 2 between the processing chambers 3, 3' of the surface treatment apparatuses 1. And at -12-200806119, the conveyor 2 connecting the processing chambers 3, 35 has a convex roller 8 in the space C between the processing chambers 3, 3' for transporting the flexible substrate A, The process liquid B adhering to the flexible base material A can be returned to the processing chambers 3, 3 by tilting D back and forth along the conveyance side. Further, as the carrying roller 9 or the convex roller 8 of the conveyor 2, a wheel having a thin lateral width is used as a representative, but it is also possible to use a straight roller having a wide lateral width. When the wheels are used, they are spaced apart from each other in the width direction of the left and right, and a plurality of them are arranged in one set, and the carrying rollers 9 of the wheels are provided with a plurality of sets in the front and rear direction of the conveyance. The conveyor 2 between the processing chambers 3, 3' will be described in more detail below. First, in the space C between the processing chambers 3, 3', the flexible base material A conveyed on the conveyor 2 is lifted up at the position of the convex roller, and the other horizontal transporting roller is transported. The position of 9 is lowered and tilted back and forth by D. Therefore, the processing liquid B which is ejected on the upstream side of the processing chamber 3 (on the left side in the drawing) and adheres to the surface of the flexible substrate A is carried out from the outlet 10 of the processing chamber 3 to the interval in the adhered state. The treatment liquid B' of the space C flows downward along the soft base material A toward the outlet 1 of the processing chamber 3 based on the inclination toward the upstream side of the front and back inclination D of the flexible base material a. It is recovered by the liquid tank 5 of the processing chamber 3. Further, in the processing chamber 3 on the downstream side, the processing liquid B which is ejected (on the right side in the drawing) and adheres to the surface of the flexible substrate A, that is, overflows from the inlet of the processing chamber 3' to the upstream The treatment liquid B is inclined downward toward the downstream side of the flexible base material A, and flows down the inlet 11 of the treatment chamber 3' along the soft base material a. The liquid tank 5, which is treated by the processing chamber 3, is returned to 200806119. <<About various aspects>> Next, various aspects of the convex roller 8 of the present invention will be described. First, the convex roller 8 shown in Fig. 1 is formed of a wheel (the same applies to the other examples), and a sleeve is provided in the center of the space C (a plurality of left and right width directions are provided). On the other hand, the diameter of the convex roller 8 is set to the same diameter as that of the other rollers (the same applies to other examples), and the height of the shaft is set to be higher than that of the other rollers. Sub 9 is high. The convex roller 8 shown in the figure (1) of Fig. 2 is provided with one set in the center of the space c, and its diameter is set to be larger than that of the other carrying rollers 9, and the height level of the shaft is also The setting is the same as that of the other carrying rollers 9. The convex roller 8 shown in the figure (2) of Fig. 2 is provided with one set in the center of the space c, and its diameter is set to be larger than that of the other carrying rollers 9, and the height level of the shaft is also The system is set higher than the other transport rollers 9. The convex roller 8 shown in the figure (3) of Fig. 2 is provided with three sets of one set at the center of the space C. The setting of one set in the center is the same as that in the figure (2) of Fig. 2, and the two sets are set in the same way as in the first figure. The center of one set has the top surface of the roller set higher than the front and rear. The convex roller 8 shown in the figure (4) of Fig. 2 is mostly disposed in the entire space C, and its diameter is set to the same diameter as the other conveying rollers 9-14-200806119, while the shaft is The height level is highest in the center of the space C, and the front and the back are set to become lower. The convex roller 8 shown in the figure (5) of Fig. 2 is disposed in the upstream portion and the downstream portion in the space C, and is set to be the same as in the first figure. On the other hand, the upstream portion is disposed in the vicinity of the outlet port 1 of the processing chamber 3 on the upstream side, and the downstream portion is disposed in the vicinity of the inlet 1 1 of the processing chamber 3' on the downstream side. As shown in the figures, the height of the shaft of the male roller 8 is set higher than that of the other carrying rollers 9, or its diameter is large. Therefore, although the conveyed flexible base material A can be tilted forward and backward by D, there are cases in which various states other than the examples shown in the drawings are possible. Of course, the inclination of the front and rear inclinations D is steeper or more moderate, and the conveyance speed of the flexible base material A is set freely. Regarding the convex roller 8, the following configuration can also be considered. That is, the height level can be changed while the height level can be adjusted in proportion to the transport speed of the conveyor 2, and therefore, the faster the transport speed, the higher the level can be considered. ! That is, 'the up-and-down mechanism (not shown) is attached to the convex roller 8, so that the convex roller 8 can be moved up and down in accordance with the conveyance speed of the flexible base material A by the conveyance roller 9 of the conveyor 2. . The faster the conveyance speed, the higher the height level ' of the convex roller 8 is set, and the rear inclination D of the soft base material A is made sharper. Therefore, the flow rate of the attached treatment liquid B is faster, and the treatment liquid B is returned to the treatment chambers 3, 3, and the recovery is more advantageous. 200806119 In addition, the '12 series return plate in Fig. 1 is shown. The returning plate is disposed below the conveyor 2 of the space C, and the center high front: when attached to the lower surface of the flexible substrate a conveyed by the conveyor 2, the processing liquid B flows to the processing chamber 3, 3 . The convex roller 8 can be considered in various states. <<Effects and the like>> The surface treatment apparatus of the flexible base material A of the present invention is clearly constituted. Then, it is formed as follows: (1) The flexible substrate A is conveyed horizontally by the conveyor 2, and the processing chambers 3, 3 of the surface treating apparatus 1 are sequentially sprayed with surface treatment. (2) The flexible substrate A is conveyed by the transfer chamber 2 from the processing chamber 3' on the processing side on the upstream side, and is delivered through the space C of the weir. (3) In this manner, the treatment liquid B adheres to the softness conveyed between the processing chambers 3, 3'. In other words, from the outlet 10 of the processing chamber 3 on the upstream side to the surface of the flexible substrate A, the processing chamber is attached to the surface of the flexible substrate A (refer to Fig. 1 and Fig. 2 (1), ( 2) The processing liquid B sprayed in the soft substrate chamber 3' that is moved into the processing chamber 3' on the downstream side is also possible from the inlet 1 (refer to (3) and (4) in Fig. 2) (4) Therefore, in the surface treatment apparatus 1, in the treatment 12, the t is lowered and tilted, and the liquid B, when it falls, returns the work 1, as described above, at the same time, the treatment liquid B in each table 3 to the downstream compartment 3, 3' between the I4 raw base plate A, i space C, where the 3 injections are carried out '(5) map, etc.). A, in the case where the treatment 1 overflows, between the attachment chambers 3, 3', -16-200806119. The conveyor 2 of the space c is provided with a convex roller 8. Therefore, the flexible substrate 8 is inclined by the gradient of the soft base material A passing through the space C by D ° (5). According to the surface treatment apparatus 1, the first to fourth aspects are as follows. First, the treatment liquid B adhering to the surface of the soft substrate A is returned to the original treatment chamber 3, 3 5 based on the slope of the slope D before and after the soft substrate A due to the convex roller 8 is returned. . In other words, the treatment liquid B adhering to the processing chamber 3 on the upstream side flows down from the space of the space C to the side of the processing chamber 3 along the surface of the flexible substrate A, and is recovered. Further, the processing liquid B adhered from the processing chamber 3 on the downstream side is also discharged toward the surface of the processing chamber 3' along the surface of the flexible substrate A, and is recovered. Therefore, it can be prevented from being mixed between the upstream side and the processing chambers 3, 3' on the downstream side due to the carry-in of the processing liquid B. Secondly, since the mixing of the processing liquid B between the processing chambers 3, 3' can be prevented, the performance of the processing liquid in each of the processing chambers 3, 3' can be maintained. For example, when the processing liquids B of the two processing chambers 3, 3' are different (for example, in the case of an etching liquid and a stripping liquid, or in the case of an etching liquid or a water washing liquid), of course, even the processing liquids of the two processing chambers 3, 3' When B is the same (for example, when both are full of liquids or both are washing liquids), the mixing between the treatment liquids B is a major cause of deterioration in performance, so that such mixing or performance degradation can be prevented. In addition, when the processing chamber 3 on the upstream side is for cleaning, and the processing chamber 3' on the downstream side is used for dewatering, the cleaning liquid of the treatment liquid b is not adhered and is brought into the treatment for drying the water. Room 3, can promote the advantages of dewatering. -17- 200806119 No. 3, and the conveyors 2 disposed in the space c between the processing chambers 3' 3 ' are provided with the convex rollers 8' which are easily realized by a simple configuration. It can be implemented automatically without manual work. Fourth, and these implementations do not damage the fine high-density circuit on the surface of the flexible substrate A. That is, in the case where the convex roller 8 tilts the flexible base material A back and forth D, the flexible base material A' is not caught, and the circuit is damaged. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a side surface view showing a preferred embodiment of the invention according to a surface treatment apparatus for a flexible base material of the present invention. Fig. 2 is a side elevational view showing the main part of the description of the preferred embodiment of the invention, wherein (1) shows a first example, (2) shows a second example, and (3) shows a third example. (4) The figure shows the fourth example, and (5) shows the fifth example. · [Main component symbol description] 1 Surface treatment device 2 Conveyor 3 Processing chamber · 3, Processing chamber 4 Nozzle 5 Liquid tank 6 Pump 7 Piping 8 Convex roller 9 Transport roller -18- 200806119 10 Exit 11 Entrance 12 Return Board A Soft base sheet B Treatment liquid C Space separation CD Front and rear tilt