TWI616930B - flexible substrate processing equipment - Google Patents
flexible substrate processing equipment Download PDFInfo
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- TWI616930B TWI616930B TW106107718A TW106107718A TWI616930B TW I616930 B TWI616930 B TW I616930B TW 106107718 A TW106107718 A TW 106107718A TW 106107718 A TW106107718 A TW 106107718A TW I616930 B TWI616930 B TW I616930B
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- liquid
- drainage
- hole group
- flexible substrate
- tank
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- 239000000758 substrate Substances 0.000 title claims abstract description 37
- 239000007788 liquid Substances 0.000 claims abstract description 150
- 238000010521 absorption reaction Methods 0.000 claims description 5
- 238000007599 discharging Methods 0.000 claims description 5
- 230000004308 accommodation Effects 0.000 claims description 3
- 238000000034 method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000003491 array Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000013589 supplement Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Electroplating Methods And Accessories (AREA)
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Abstract
一種軟性基板處理設備,包含有儲液槽以及複數個引流器,引流器係設置於儲液槽內,且引流器連接有供液器以及吸液器,軟性基板於進入儲液槽後,係依序繞經引流器,而該引流器於靠近軟性基板之表面設置有複數個排液孔組以及複數個吸液孔組,排液孔組係連通於供液器,吸液孔組係連通於吸液器,且排液孔組與吸液孔組係呈交錯間隔設置,利用引流器縮小處理槽體積,並可加速處理液循環以及避免軟性基板接觸引流器。A soft substrate processing device comprises a liquid storage tank and a plurality of drainage devices, the drainage device is arranged in the liquid storage tank, and the liquid inlet device and the liquid suction device are connected to the drainage device, and the soft substrate is inserted into the liquid storage tank. The drainer is sequentially wound, and the drainer is provided with a plurality of liquid discharge hole groups and a plurality of liquid suction hole groups on the surface close to the flexible substrate, and the liquid discharge hole group is connected to the liquid supply device, and the liquid suction hole group is connected. The liquid suction device is arranged at a staggered interval between the liquid discharge hole group and the liquid suction hole group, and the drainage tank is used to reduce the volume of the treatment tank, and the circulation of the treatment liquid can be accelerated and the soft substrate can be prevented from contacting the flow guide.
Description
一種軟性基板處理設備,尤指利用引流器使軟性基板於蝕刻、電鍍等製程中,大幅縮小蝕刻、電鍍等處理設備之體積,並可加速處理設備中處理液之循環速度。A soft substrate processing device, in particular, uses a drain to make a flexible substrate in a process such as etching and electroplating, which greatly reduces the volume of processing equipment such as etching and plating, and can accelerate the circulation speed of the processing liquid in the processing device.
按,軟性電路板是在軟性基板上反覆進行數次的電解電鍍以及蝕刻等製程,使軟性基板上形成有電路佈線,一般的處理方法是使軟性基板通過處理槽,並與處理槽內的處理液作用,但因軟性基板在製程中,不得與處理液以外的物體接觸(雙面板),因此處理槽的體積會相當的大,以加長軟性基板通過處理設備的時間,以確保軟性基板製程穩定,此種作法會使處理設備佔有相當大的空間造成浪費;再者,處理槽會利用外接循環裝置對處理液進行補充,此種作法會造成處理液濃度不均之問題發生,導致良率下降。According to the method, the flexible circuit board is repeatedly subjected to electrolytic plating and etching on the flexible substrate, and the circuit board is formed on the flexible substrate. The general processing method is to pass the flexible substrate through the processing tank and the processing in the processing tank. Liquid action, but because the soft substrate is not in contact with objects other than the treatment liquid during the process (double panel), the volume of the treatment tank will be quite large to lengthen the time that the flexible substrate passes through the processing equipment to ensure stable process of the flexible substrate. This method will cause the processing equipment to occupy a considerable space and cause waste; in addition, the treatment tank will use an external circulation device to replenish the treatment liquid, which will cause the problem of uneven concentration of the treatment liquid, resulting in a decrease in yield. .
是以,要如何解決上述習知之問題與缺失,即為相關業者所亟欲研發之課題所在。Therefore, how to solve the above-mentioned problems and shortcomings is the subject of research and development that the relevant industry is eager to develop.
本發明之主要目的乃在於,利用處理設備於儲液槽內所設置之引流器,讓軟性基板進入儲液槽後係依序繞經引流器,以縮小處理槽之體積,且引流器上設置有複數組交錯設置之吸液孔組與排液孔組,以加速處理液循環並可避免軟性基板接觸引流器。The main purpose of the present invention is to use a drainage device disposed in a liquid storage tank by a processing device to allow the flexible substrate to pass through the drainage device after entering the liquid storage tank, thereby reducing the volume of the treatment tank and setting on the drainage device. The liquid collection hole group and the liquid discharge hole group are arranged in a staggered arrangement of the multiple arrays to accelerate the circulation of the treatment liquid and prevent the flexible substrate from contacting the flow guide.
為達上述目的,本發明之軟性基板處理設備包含有儲液槽以及複數個引流器,引流器係設置於儲液槽內,且引流器連接有供液器以及吸液器,軟性基板於進入儲液槽後,係依序繞經引流器,而該引流器於靠近軟性基板之表面設置有複數個排液孔組以及複數個吸液孔組,排液孔組係連通於供液器,吸液孔組係連通於吸液器,且排液孔組與吸液孔組係呈交錯間隔設置。In order to achieve the above object, the flexible substrate processing apparatus of the present invention comprises a liquid storage tank and a plurality of drainage devices, the drainage device is disposed in the liquid storage tank, and the liquid inlet device and the liquid suction device are connected to the drainage device, and the soft substrate is inserted. After the liquid storage tank, the drainage device is sequentially wound, and the drainage device is provided with a plurality of liquid discharge hole groups and a plurality of liquid absorption hole groups on the surface close to the flexible substrate, and the liquid discharge hole group is connected to the liquid supply device. The liquid suction hole group is connected to the liquid suction device, and the liquid discharge hole group and the liquid suction hole group are arranged at a staggered interval.
前述之軟性基板處理設備,其中該引流器具有引流管、進液管、下蓋與上蓋,引流管內具有容置空間,引流管於容置空間之側壁上剖設有複數個吸液槽,前述之排液孔組係連通於容置空間,吸液孔組係連通於吸液槽;該進液管具有本體以及本體兩側所設置之定位部,本體內具有連通定位部之進液空間,且本體表面設置有複數個連通於進液空間之出液槽,而本體係容置於引流管之容置空間,並使出液槽連通於排液孔組;該下蓋與上蓋分別蓋合於引流管兩側,且下蓋設置有吸液口,並使吸液口連通於引流管之吸液槽。In the above soft substrate processing apparatus, the drainer has a drainage tube, a liquid inlet tube, a lower cover and an upper cover, and the drainage tube has an accommodation space therein, and the drainage tube is provided with a plurality of liquid absorption slots on the side wall of the accommodation space. The liquid drain hole group is connected to the accommodating space, and the liquid suction hole group is connected to the liquid absorbing groove; the liquid inlet pipe has a body and a positioning portion disposed on both sides of the body, and the body has a liquid inlet space connecting the positioning portion And the surface of the body is provided with a plurality of liquid outlets connected to the liquid inlet space, and the system is accommodated in the receiving space of the drainage tube, and the liquid discharging tank is connected to the liquid discharging hole group; the lower cover and the upper cover are respectively covered The two sides of the drainage tube are combined, and the lower cover is provided with a liquid suction port, and the liquid suction port is connected to the liquid suction groove of the drainage tube.
前述之軟性基板處理設備,其中該引流管表面設置有複數個集液槽,吸液孔組係設置於集液槽內。In the above soft substrate processing apparatus, the surface of the drainage tube is provided with a plurality of liquid collection tanks, and the liquid suction hole group is disposed in the liquid collection tank.
前述之軟性基板處理設備,其中該進液管表面凸設有複數定位肋,定位肋末端定位於引流管之吸液槽內。In the above soft substrate processing apparatus, the surface of the liquid inlet tube is convexly provided with a plurality of positioning ribs, and the end of the positioning rib is positioned in the liquid suction groove of the drainage tube.
請參閱第八圖至第十圖所示,由圖中可清楚看出,本發明包含有儲液槽1以及複數個引流器2,引流器2係設置於儲液槽1內,且引流器2連接有供液器3以及吸液器4,軟性基板5於進入儲液槽1後,係依序繞經引流器2。Referring to the eighth to tenth drawings, it can be clearly seen from the figure that the present invention comprises a liquid storage tank 1 and a plurality of drainage devices 2, and the drainage device 2 is disposed in the liquid storage tank 1, and the drainage device 2 The liquid supply device 3 and the liquid suction device 4 are connected, and after entering the liquid storage tank 1, the flexible substrate 5 is sequentially passed through the flow guide 2.
請參閱第一圖至第七圖所示,由圖中可清楚看出,本發明之引流器2具有引流管21、進液管22、下蓋23與上蓋24,其中:Referring to the first to seventh figures, it can be clearly seen from the figure that the flow guide 2 of the present invention has a drainage tube 21, a liquid inlet tube 22, a lower cover 23 and an upper cover 24, wherein:
該引流管21表面設置有複數個排液孔組213以及複數個吸液孔組215,複數個排液孔組213以及複數個吸液孔組215係以交錯間隔設置,而引流管21內具有容置空間211,引流管21於容置空間211之側壁上剖設有複數個吸液槽212,前述之排液孔組213係連通於容置空間211,吸液孔組215係連通於吸液槽212,再者,引流管21表面設置有複數個集液槽214,各吸液孔組215係分別設置於集液槽214內。The drainage tube 21 is provided with a plurality of drainage holes 213 and a plurality of liquid suction holes 215, a plurality of liquid discharge holes 213 and a plurality of liquid suction holes 215 are arranged at staggered intervals, and the drainage tube 21 has The accommodating space 211, the drainage tube 21 is disposed on the side wall of the accommodating space 211 with a plurality of liquid absorbing grooves 212. The liquid discharging hole group 213 is connected to the accommodating space 211, and the liquid collecting hole group 215 is connected to the suction space. The liquid tank 212 is further provided with a plurality of liquid collecting tanks 214 on the surface of the drafting tube 21, and each of the liquid collecting hole groups 215 is disposed in the liquid collecting tank 214.
該進液管22具有本體221以及本體221兩側所設置之定位部222,本體221內具有連通定位部222之進液空間225,且本體221表面設置有複數個連通於進液空間225之出液槽223,以及本體221表面於兩相鄰之出液槽223之間凸設有定位肋224,而本體221係容置於引流管21之容置空間211,讓定位肋224末端定位於引流管21之吸液槽212內,並使出液槽223連通於排液孔組213。The liquid inlet tube 22 has a body 221 and a positioning portion 222 disposed on both sides of the body 221. The body 221 has a liquid inlet space 225 communicating with the positioning portion 222, and the surface of the body 221 is provided with a plurality of outlets communicating with the liquid inlet space 225. The liquid groove 223 and the surface of the body 221 are provided with positioning ribs 224 between the two adjacent liquid discharge grooves 223, and the body 221 is received in the accommodating space 211 of the drainage tube 21, and the end of the positioning rib 224 is positioned at the drainage. The liquid suction tank 212 of the tube 21 is connected to the liquid discharge hole group 213.
該下蓋23與上蓋24分別蓋合於引流管21兩側,下蓋23與上蓋24分別設置有下通孔231與上通孔241,讓進液管22兩端之定位部222分別由下通孔231與上通孔241露出,而下蓋23內設置有集液空間232,集液空間232係連通於引流管21之吸液槽212,且下蓋23設置有吸液口233,並使吸液口233透過集液空間232連通於引流管21之吸液槽212。The lower cover 23 and the upper cover 24 respectively cover the two sides of the drainage tube 21, and the lower cover 23 and the upper cover 24 are respectively provided with a lower through hole 231 and an upper through hole 241, so that the positioning portions 222 at both ends of the liquid inlet tube 22 are respectively The through hole 231 and the upper through hole 241 are exposed, and the liquid collecting space 232 is disposed in the lower cover 23, the liquid collecting space 232 is connected to the liquid suction groove 212 of the drainage pipe 21, and the lower cover 23 is provided with the liquid suction port 233, and The liquid suction port 233 is communicated with the liquid suction tank 212 of the draft tube 21 through the liquid collection space 232.
請參閱第一圖至第十圖所示,由圖中可清楚看出,當本發明於使用時,係讓引流器2之排液孔組213以及吸液孔組215靠近於軟性基板5表面,並讓供液器3與吸液器4會同時作動,此時供液器3所提供之處理液會由進液管22兩端之定位部222進入進液空間225內,再由出液槽223與引流管21之排液孔組213排出,而吸液器4則會透過下蓋23之吸液口233吸取集液空間232內之處理液,俾使處理液由引流管21之吸液孔組215進入吸液槽212後,流入集液空間232供吸液器4吸取。Referring to the first to tenth drawings, it can be clearly seen from the figure that when the present invention is used, the liquid discharge hole group 213 and the liquid suction hole group 215 of the flow guide 2 are brought close to the surface of the flexible substrate 5. And the liquid supply device 3 and the liquid suction device 4 are simultaneously actuated. At this time, the treatment liquid supplied from the liquid supply device 3 enters the liquid inlet space 225 from the positioning portion 222 at both ends of the liquid inlet tube 22, and then the liquid is discharged. The tank 223 and the liquid discharge hole group 213 of the draft tube 21 are discharged, and the liquid suction device 4 sucks the treatment liquid in the liquid collection space 232 through the liquid suction port 233 of the lower cover 23, so that the treatment liquid is sucked by the drainage tube 21. After the liquid hole group 215 enters the liquid suction tank 212, it flows into the liquid collection space 232 for suction by the liquid suction device 4.
藉上,本發明為可解決習知技術之不足與缺失,並可增進功效,其關鍵技術在於:In addition, the present invention can solve the deficiencies and defects of the prior art, and can improve the efficiency. The key technologies are:
(一)本發明利用引流器2供軟性基板5繞行,因此可增加軟性基板5於儲液槽1內的停留時間,大幅減少儲液槽1之體積,且利用排液孔組213排出處理液推動軟性基板5,讓軟性基板5與引流器2之間形成有間距,以可使用於雙面之軟性基板5製作。(1) The present invention utilizes the flow finder 2 to bypass the flexible substrate 5, thereby increasing the residence time of the flexible substrate 5 in the liquid storage tank 1, greatly reducing the volume of the liquid storage tank 1, and discharging it by the liquid discharge hole group 213. The liquid pushes the flexible substrate 5 to form a space between the flexible substrate 5 and the flow finder 2, so that the flexible substrate 5 for both sides can be produced.
(二)本發明利用引流器2交錯間隔設置之排液孔組213與吸液孔組215,讓排液孔組213排出之處理液推動軟性基板5後,再由吸液孔組215吸取回收,因此引流器2與軟性基板5之間會形成有複數個處理液循環之狀態,俾使供液器3所提供之處理液可直接對軟性基板5進行反應後,再由吸液器4回收以及進行補充,而可提升製程良率。(2) In the present invention, the liquid discharge hole group 213 and the liquid suction hole group 215 which are arranged at intervals in the draining device 2 are used, and the treatment liquid discharged from the liquid discharge hole group 213 is pushed by the liquid substrate 5, and then sucked and collected by the liquid suction hole group 215. Therefore, a plurality of processing liquids are formed between the flow guide 2 and the flexible substrate 5, so that the processing liquid supplied from the liquid supply device 3 can be directly reacted to the flexible substrate 5, and then recovered by the liquid suction device 4. And to supplement, but to improve process yield.
1‧‧‧儲液槽1‧‧‧ reservoir
2‧‧‧引流器2‧‧‧Drainer
21‧‧‧引流管21‧‧‧Drainage tube
211‧‧‧容置空間211‧‧‧ accommodating space
212‧‧‧吸液槽212‧‧‧Aqueous tank
213‧‧‧排液孔組213‧‧‧Draining hole group
214‧‧‧集液槽214‧‧ ‧ sump
215‧‧‧吸液孔組215‧‧ ‧ aspirating hole group
22‧‧‧進液管22‧‧‧Inlet pipe
221‧‧‧本體221‧‧‧ Ontology
222‧‧‧定位部222‧‧‧ Positioning Department
223‧‧‧出液槽223‧‧‧drain tank
224‧‧‧定位肋224‧‧‧ positioning ribs
225‧‧‧進液空間225‧‧‧Into the liquid space
23‧‧‧下蓋23‧‧‧Under the cover
231‧‧‧下通孔231‧‧‧Under hole
232‧‧‧集液空間232‧‧ ‧ liquid collection space
233‧‧‧吸液口233‧‧ ‧ suction port
24‧‧‧上蓋24‧‧‧Upper cover
241‧‧‧上通孔241‧‧‧Upper through hole
3‧‧‧供液器3‧‧‧Supply dispenser
4‧‧‧吸液器4‧‧ ‧ aspirator
5‧‧‧軟性基板5‧‧‧Soft substrate
第一圖係為本發明引流器之立體外觀圖。 第二圖係為本發明引流器之立體分解圖。 第三圖係為本發明引流器之前視圖。 第四圖係為第三圖A_A剖面線之剖視圖。 第五圖係為第三圖B_B剖面線之剖視圖。 第六圖係為本發明引流器之側視圖。 第七圖係為第六圖C_C剖面線之剖視圖。 第八圖係為本發明之使用狀態示意圖。 第九圖係為本發明引流器之使用狀態示意圖。 第十圖係為本發明之方塊圖。The first figure is a perspective view of the drain of the present invention. The second figure is an exploded perspective view of the flow guide of the present invention. The third figure is a front view of the flow guide of the present invention. The fourth figure is a cross-sectional view taken along the line A-A of the third figure. The fifth figure is a cross-sectional view taken along line B_B of the third figure. The sixth drawing is a side view of the flow guide of the present invention. The seventh figure is a cross-sectional view taken along line C_C of the sixth figure. The eighth figure is a schematic view showing the state of use of the present invention. The ninth diagram is a schematic view showing the state of use of the flow director of the present invention. The tenth figure is a block diagram of the present invention.
Claims (3)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106107718A TWI616930B (en) | 2017-03-09 | 2017-03-09 | flexible substrate processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW106107718A TWI616930B (en) | 2017-03-09 | 2017-03-09 | flexible substrate processing equipment |
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| Publication Number | Publication Date |
|---|---|
| TWI616930B true TWI616930B (en) | 2018-03-01 |
| TW201833986A TW201833986A (en) | 2018-09-16 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW106107718A TWI616930B (en) | 2017-03-09 | 2017-03-09 | flexible substrate processing equipment |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200806119A (en) * | 2006-07-03 | 2008-01-16 | Tokyo Kakoki Co Ltd | A surface process equipment of flexible substrate material |
| TWM390825U (en) * | 2010-05-14 | 2010-10-21 | Heng-Yuan Liu | Automatic cleansing device for storage container |
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2017
- 2017-03-09 TW TW106107718A patent/TWI616930B/en active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200806119A (en) * | 2006-07-03 | 2008-01-16 | Tokyo Kakoki Co Ltd | A surface process equipment of flexible substrate material |
| TWM390825U (en) * | 2010-05-14 | 2010-10-21 | Heng-Yuan Liu | Automatic cleansing device for storage container |
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| Publication number | Publication date |
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| TW201833986A (en) | 2018-09-16 |
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