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TW200632719A - Multivariate control of semiconductor processes - Google Patents

Multivariate control of semiconductor processes

Info

Publication number
TW200632719A
TW200632719A TW094132186A TW94132186A TW200632719A TW 200632719 A TW200632719 A TW 200632719A TW 094132186 A TW094132186 A TW 094132186A TW 94132186 A TW94132186 A TW 94132186A TW 200632719 A TW200632719 A TW 200632719A
Authority
TW
Taiwan
Prior art keywords
model
manufacturing process
manufacturing
semiconductor processes
related variables
Prior art date
Application number
TW094132186A
Other languages
English (en)
Inventor
Kuo-Chin Lin
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of TW200632719A publication Critical patent/TW200632719A/zh

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • G05B19/02—Programme-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/4184—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by fault tolerance, reliability of production system
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/31—From computer integrated manufacturing till monitoring
    • G05B2219/31357—Observer based fault detection, use model
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45031—Manufacturing semiconductor wafers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/80—Management or planning

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Testing And Monitoring For Control Systems (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
TW094132186A 2004-09-17 2005-09-16 Multivariate control of semiconductor processes TW200632719A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US61113604P 2004-09-17 2004-09-17

Publications (1)

Publication Number Publication Date
TW200632719A true TW200632719A (en) 2006-09-16

Family

ID=35677363

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094132186A TW200632719A (en) 2004-09-17 2005-09-16 Multivariate control of semiconductor processes

Country Status (5)

Country Link
US (1) US7151976B2 (zh)
EP (1) EP1794659A2 (zh)
JP (1) JP2008514015A (zh)
TW (1) TW200632719A (zh)
WO (1) WO2006034179A2 (zh)

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TWI399660B (zh) * 2008-07-09 2013-06-21 Inotera Memories Inc 偵測半導體製程變異之方法
CN105702595A (zh) * 2014-11-27 2016-06-22 华邦电子股份有限公司 晶圆的良率判断方法以及晶圆合格测试的多变量检测方法
TWI623838B (zh) * 2012-06-29 2018-05-11 應用材料股份有限公司 用於巨量資料分析的方法、非暫時性電腦可讀儲存媒體及系統
TWI647770B (zh) * 2014-11-17 2019-01-11 華邦電子股份有限公司 晶圓的良率判斷方法以及晶圓合格測試的多變量偵測方法
TWI723116B (zh) * 2016-02-22 2021-04-01 德商科尼亞克公司 藉由使用抽樣計畫製造半導體裝置的方法

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI399660B (zh) * 2008-07-09 2013-06-21 Inotera Memories Inc 偵測半導體製程變異之方法
TWI623838B (zh) * 2012-06-29 2018-05-11 應用材料股份有限公司 用於巨量資料分析的方法、非暫時性電腦可讀儲存媒體及系統
TWI647770B (zh) * 2014-11-17 2019-01-11 華邦電子股份有限公司 晶圓的良率判斷方法以及晶圓合格測試的多變量偵測方法
CN105702595A (zh) * 2014-11-27 2016-06-22 华邦电子股份有限公司 晶圆的良率判断方法以及晶圆合格测试的多变量检测方法
CN105702595B (zh) * 2014-11-27 2019-05-07 华邦电子股份有限公司 晶圆的良率判断方法以及晶圆合格测试的多变量检测方法
TWI723116B (zh) * 2016-02-22 2021-04-01 德商科尼亞克公司 藉由使用抽樣計畫製造半導體裝置的方法

Also Published As

Publication number Publication date
EP1794659A2 (en) 2007-06-13
JP2008514015A (ja) 2008-05-01
WO2006034179A3 (en) 2006-05-18
WO2006034179A2 (en) 2006-03-30
US7151976B2 (en) 2006-12-19
US20060111804A1 (en) 2006-05-25

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